JP2009514205A - プラズマ除害デバイス - Google Patents
プラズマ除害デバイス Download PDFInfo
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Abstract
【選択図】図3
Description
Claims (23)
- プラズマ除害デバイスであって、
デバイスによって処理されるべきガスを受け入れるためのガス入口と、ガス出口と、を有するガスチャンバを含み、
ガスチャンバの内面の少なくとも一部が、ハロゲン化合物および水蒸気を含有するガスの処理中腐食に抵抗する導電性材料で形成され、あるいはコーティングされる、
ことを特徴とするプラズマ除害デバイス。 - ガスチャンバの内面は、少なくとも一部がガスチャンバを構成するハウジングの内面に形成された前記導電性材料の層を含む、請求項1に記載のデバイス。
- ハウジングは、ステンレス鋼で形成される、請求項2に記載のデバイス。
- ガスチャンバは、少なくとも一部が前記導電性材料で形成されたハウジングによって構成される、請求項1に記載のデバイス。
- 前記導電性材料は、常磁性である、請求項1乃至4のいずれか1項に記載のデバイス。
- 前記導電性材料は、チタンからなる、請求項1乃至5のいずれか1項に記載のデバイス。
- 前記導電性材料は、反磁性である、請求項1乃至4のいずれか1項に記載のデバイス。
- プラズマ除害デバイスであって、デバイスによって処理されるべきガスを受け入れるためのガス入口と、ガス出口と、を有するガスチャンバを含み、
ガスチャンバの内面の少なくとも一部が、チタンで形成され、あるいはコーティングされる、
ことを特徴とするプラズマ除害デバイス。 - ガスチャンバの内面は、少なくとも一部がガスチャンバを構成するハウジングの内面に形成されたチタンの層を有する、請求項8に記載のデバイス。
- ハウジングは、ステンレス鋼で形成される、請求項9に記載のデバイス。
- ガスチャンバは、少なくとも一部がチタンで形成されたハウジングによって構成される、請求項10に記載のデバイス。
- マイクロ波プラズマ除害デバイスの形態である、請求項1乃至11のいずれか1項に記載のデバイス。
- 前記ガスチャンバの内面の少なくとも一部は、デバイスの共振空洞の内面の一部を形成する、請求項12に記載のデバイス。
- ガスチャンバの中に突出する導電性部材を含み、導電性部材は、チタンで形成され、あるいはコーティングされる、請求項12または13に記載のデバイス。
- マイクロ波プラズマ除害デバイスであって、
ガス入口と、ガス出口と、を有するマイクロ波共振空洞と、
共振空洞にマイクロ波放射を導くための導波管と、を含み、
共振空洞は、ハロゲン化合物および水蒸気を含有するガスの処理中腐食に抵抗する導電性材料で形成され、あるいはコーティングされた内面を有する、
ことを特徴とするマイクロ波プラズマ除害デバイス。 - 空洞の内面は、少なくとも一部が空洞を構成するハウジングの内面を形成する前記導電性材料の層を含む、請求項15に記載のデバイス。
- ハウジングは、ステンレス鋼で形成される、請求項16に記載のデバイス。
- 空洞は、少なくとも一部が、前記導電性材料で形成されたハウジングによって構成される、請求項15に記載のデバイス。
- 前記導電性材料は、常磁性である、請求項15乃至18のいずれか1項に記載のデバイス。
- 前記導電性材料は、チタンからなる、請求項15乃至19のいずれか1項に記載のデバイス。
- 前記導電性材料は、反磁性である、請求項15乃至18のいずれか1項に記載のデバイス。
- ガスチャンバの中に突出する導電性部材を含み、導電性部材は、前記導電性材料で形成され、あるいはコーティングされている、請求項15乃至21のいずれか1項に記載のデバイス。
- マイクロ波プラズマ除害デバイスであって、
ガス入口と、ガス出口と、を有するマイクロ波共振空洞と、
マイクロ波放射を共振空洞に導くための導波管と、を含み、
共振空洞は、チタンで形成され、あるいはコーティングされる内面を有する、
ことを特徴とするマイクロ波プラズマ除害デバイス。
Applications Claiming Priority (3)
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GBGB0522088.4A GB0522088D0 (en) | 2005-10-28 | 2005-10-28 | Plasma abatement device |
GB0522088.4 | 2005-10-28 | ||
PCT/GB2006/003489 WO2007048993A2 (en) | 2005-10-28 | 2006-09-21 | Plasma abatement device |
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JP2009514205A true JP2009514205A (ja) | 2009-04-02 |
JP4966973B2 JP4966973B2 (ja) | 2012-07-04 |
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US (1) | US9333460B2 (ja) |
EP (1) | EP1951422B1 (ja) |
JP (1) | JP4966973B2 (ja) |
KR (1) | KR101320251B1 (ja) |
CN (1) | CN101296745B (ja) |
AT (1) | ATE509694T1 (ja) |
GB (1) | GB0522088D0 (ja) |
TW (1) | TWI417931B (ja) |
WO (1) | WO2007048993A2 (ja) |
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GB0522088D0 (en) * | 2005-10-28 | 2005-12-07 | Boc Group Plc | Plasma abatement device |
CN101939079B (zh) * | 2008-02-05 | 2013-06-12 | 应用材料公司 | 用于处理来自制程的可燃性废气的系统及方法 |
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GB2516267B (en) * | 2013-07-17 | 2016-08-17 | Edwards Ltd | Head assembly |
US9240308B2 (en) * | 2014-03-06 | 2016-01-19 | Applied Materials, Inc. | Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system |
US9230780B2 (en) | 2014-03-06 | 2016-01-05 | Applied Materials, Inc. | Hall effect enhanced capacitively coupled plasma source |
CN104480468A (zh) * | 2014-12-31 | 2015-04-01 | 深圳市华星光电技术有限公司 | 干式蚀刻机及用于捕集气体中磁性颗粒的捕集装置 |
US10435787B2 (en) | 2016-11-14 | 2019-10-08 | Applied Materials, Inc. | Hydrogen partial pressure control in a vacuum process chamber |
US10777394B2 (en) | 2016-12-09 | 2020-09-15 | Applied Materials, Inc. | Virtual sensor for chamber cleaning endpoint |
KR102210393B1 (ko) | 2017-02-09 | 2021-02-01 | 어플라이드 머티어리얼스, 인코포레이티드 | 수증기 및 산소 시약을 이용하는 플라즈마 저감 기술 |
US10342110B1 (en) * | 2018-09-14 | 2019-07-02 | Serendipity Technologies LLC. | Plasma power generator (z-box and z-tower) |
DE102019006639A1 (de) * | 2019-09-20 | 2021-03-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Kontinuierliches Verfahren zum Erhitzen von Medien mittels Mikrowellenstrahlung und dafür geeignete Mikrowellenanlage |
KR20240011259A (ko) * | 2019-11-07 | 2024-01-25 | 비에이치티 서비시스 피티이. 엘티디. | 플라즈마로 가스상 오염 물질을 처리하기 위한 장치 |
GB2588906A (en) * | 2019-11-13 | 2021-05-19 | Edwards Ltd | Gas purged valve |
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JP4966973B2 (ja) | 2012-07-04 |
US20090183684A1 (en) | 2009-07-23 |
CN101296745B (zh) | 2011-10-05 |
GB0522088D0 (en) | 2005-12-07 |
EP1951422B1 (en) | 2011-05-18 |
US9333460B2 (en) | 2016-05-10 |
WO2007048993A2 (en) | 2007-05-03 |
CN101296745A (zh) | 2008-10-29 |
ATE509694T1 (de) | 2011-06-15 |
KR20080059405A (ko) | 2008-06-27 |
TW200729273A (en) | 2007-08-01 |
TWI417931B (zh) | 2013-12-01 |
EP1951422A2 (en) | 2008-08-06 |
WO2007048993A3 (en) | 2007-08-16 |
KR101320251B1 (ko) | 2013-10-22 |
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