JP2009514018A5 - - Google Patents
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- Publication number
- JP2009514018A5 JP2009514018A5 JP2008537759A JP2008537759A JP2009514018A5 JP 2009514018 A5 JP2009514018 A5 JP 2009514018A5 JP 2008537759 A JP2008537759 A JP 2008537759A JP 2008537759 A JP2008537759 A JP 2008537759A JP 2009514018 A5 JP2009514018 A5 JP 2009514018A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- imaged
- pendant epoxy
- outer layer
- polymer binder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000003700 epoxy group Chemical group 0.000 claims 11
- 229920005596 polymer binder Polymers 0.000 claims 5
- 239000002491 polymer binding agent Substances 0.000 claims 5
- 239000004593 Epoxy Substances 0.000 claims 3
- -1 3,4-epoxycyclohexyl group Chemical group 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 125000004435 hydrogen atoms Chemical class [H]* 0.000 claims 2
- 238000003384 imaging method Methods 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- GDUZPNKSJOOIDA-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-yl 2-methylprop-2-enoate Chemical compound C1C(OC(=O)C(=C)C)CCC2OC21 GDUZPNKSJOOIDA-UHFFFAOYSA-N 0.000 claims 1
- VAYCBEIMJNGBGH-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-yl prop-2-enoate Chemical compound C1C(OC(=O)C=C)CCC2OC21 VAYCBEIMJNGBGH-UHFFFAOYSA-N 0.000 claims 1
- 239000004925 Acrylic resin Substances 0.000 claims 1
- 229920000178 Acrylic resin Polymers 0.000 claims 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N Glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims 1
- 230000002378 acidificating Effects 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 125000001309 chloro group Chemical group Cl* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 claims 1
- 241000894007 species Species 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/257,864 | 2005-10-25 | ||
| US11/257,864 US7160653B1 (en) | 2005-10-25 | 2005-10-25 | Multilayer imageable element containing epoxy resin |
| PCT/US2006/040316 WO2007050336A2 (en) | 2005-10-25 | 2006-10-16 | Multilayer imageable element containing epoxy resin |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009514018A JP2009514018A (ja) | 2009-04-02 |
| JP2009514018A5 true JP2009514018A5 (US20080242721A1-20081002-C00053.png) | 2009-11-26 |
| JP4898821B2 JP4898821B2 (ja) | 2012-03-21 |
Family
ID=37633433
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008537759A Expired - Fee Related JP4898821B2 (ja) | 2005-10-25 | 2006-10-16 | エポキシ樹脂を含有する多層画像形成性要素 |
Country Status (5)
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7163770B1 (en) * | 2006-01-23 | 2007-01-16 | Eastman Kodak Company | Multilayer imageable element containing sulfonamido resin |
| JP5068681B2 (ja) * | 2008-02-27 | 2012-11-07 | 富士フイルム株式会社 | 平版印刷版原版 |
| EP2194429A1 (en) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
| ATE555904T1 (de) | 2009-08-10 | 2012-05-15 | Eastman Kodak Co | Lithografische druckplattenvorläufer mit betahydroxy-alkylamid-vernetzern |
| EP2293144B1 (en) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Method of drying lithographic printing plates after single-step-processing |
| US20110097666A1 (en) | 2009-10-27 | 2011-04-28 | Celin Savariar-Hauck | Lithographic printing plate precursors |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5166125A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Method of forming color filter array element with patternable overcoat layer |
| US6152036A (en) | 1998-05-28 | 2000-11-28 | Agfa-Gevaert, N.V. | Heat mode sensitive imaging element for making positive working printing plates |
| EP0960728B1 (en) * | 1998-05-28 | 2003-05-21 | Agfa-Gevaert | A heat mode sensitive imaging element for making positive working printing plates. |
| US6352811B1 (en) | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6358669B1 (en) | 1998-06-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6352812B1 (en) | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| DE69816618T2 (de) * | 1998-10-26 | 2004-06-09 | Agfa-Gevaert | Im Wärmeverfahren arbeitendes Aufzeichnungsmaterial zur Herstellung von positiv arbeitenden Druckplatten |
| US6294311B1 (en) | 1999-12-22 | 2001-09-25 | Kodak Polychrome Graphics Llc | Lithographic printing plate having high chemical resistance |
| US6528228B2 (en) | 1999-12-22 | 2003-03-04 | Kodak Polychrome Graphics, Llc | Chemical resistant underlayer for positive-working printing plates |
| WO2002011996A1 (en) | 2000-08-09 | 2002-02-14 | Labo Co., Ltd. | Thermo-sensitive recording type lithographical block material, method of making up lithographical block, and lithographical block made up by the making up method |
| US6593055B2 (en) | 2001-09-05 | 2003-07-15 | Kodak Polychrome Graphics Llc | Multi-layer thermally imageable element |
| US6858359B2 (en) | 2002-10-04 | 2005-02-22 | Kodak Polychrome Graphics, Llp | Thermally sensitive, multilayer imageable element |
| ATE391602T1 (de) | 2002-12-27 | 2008-04-15 | Fujifilm Corp | Wärmeempfindlicher lithographischer druckplattenvorläufer |
| JP2004268562A (ja) * | 2003-02-17 | 2004-09-30 | Fuji Photo Film Co Ltd | 感熱性平版印刷版 |
| US7425402B2 (en) | 2003-08-13 | 2008-09-16 | Agfa Graphics, N.V. | Heat-sensitive lithographic printing plate precursor |
| WO2005097502A1 (en) * | 2004-03-26 | 2005-10-20 | Presstek, Inc. | Printing members having solubility-transition layers and related methods |
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2005
- 2005-10-25 US US11/257,864 patent/US7160653B1/en not_active Expired - Fee Related
-
2006
- 2006-10-16 WO PCT/US2006/040316 patent/WO2007050336A2/en active Application Filing
- 2006-10-16 EP EP06816962.2A patent/EP1940621B1/en not_active Expired - Fee Related
- 2006-10-16 JP JP2008537759A patent/JP4898821B2/ja not_active Expired - Fee Related
- 2006-10-16 CN CN200680039959.XA patent/CN101296798B/zh not_active Expired - Fee Related
