JP2009501280A5 - - Google Patents
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- Publication number
- JP2009501280A5 JP2009501280A5 JP2008521572A JP2008521572A JP2009501280A5 JP 2009501280 A5 JP2009501280 A5 JP 2009501280A5 JP 2008521572 A JP2008521572 A JP 2008521572A JP 2008521572 A JP2008521572 A JP 2008521572A JP 2009501280 A5 JP2009501280 A5 JP 2009501280A5
- Authority
- JP
- Japan
- Prior art keywords
- mask
- substrate
- roller
- drum
- receiving roller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 claims 16
- 238000000151 deposition Methods 0.000 claims 5
- 230000008021 deposition Effects 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 230000002093 peripheral effect Effects 0.000 claims 1
Claims (1)
前記基材を供給する基材供給ローラーと、
第１の基材受けローラーであり、前記基材が前記基材供給ローラーから前記基材受けローラーへと広がり、前記基材が前記基材供給ローラーから前記基材受けローラーへと連続的に移動するように前記基材を支持する第１の基材受けローラーと、
第１の模様を定義する開口を含む第１のマスクであり、１以上の前記開口が１００μｍ以下の最小寸法を有する第１のマスクと、
前記第１のマスクを供給する第１のマスク供給ローラーと、
第１のマスク受けローラーであり、前記マスクが前記マスク供給ローラーから前記マスク受けローラーへと広がり、前記第１のマスクが前記第１のマスク供給ローラーから前記第１のマスク受けローラーへと連続的に移動するように前記第１のマスクを支持する第１のマスク受けローラーと、
第１のドラムであり、前記基材及びマスクの供給ローラーより供給されてから前記基材及びマスク受けローラーにより支持されるまでの間に、前記基材と前記第１のマスクとが前記第１のドラムの周辺の一部で接触し、連続的に回転する第１のドラムと、
第１の付着源であり、少なくとも第１の付着材料の一部が前記第１のマスクに設けられた前記開口を通り抜けて前記第１の材料の前記第１の模様が前記基材上に連続的に付着するように、前記第１のドラムの周辺部分に位置する前記第１のマスクの部分に向けて前記第１の付着材料を連続的に誘導するために配置される第１の付着源と、を含む装置。 An apparatus for continuously depositing a material pattern on a substrate,
A substrate supply roller for supplying the substrate;
A first substrate receiving roller, wherein the substrate extends from the substrate supply roller to the substrate receiving roller, and the substrate continuously moves from the substrate supply roller to the substrate receiving roller A first substrate receiving roller for supporting the substrate so as to
A first mask including an opening defining a first pattern, wherein the one or more openings have a minimum dimension of 100 μm or less;
A first mask supply roller for supplying the first mask;
A first mask receiving roller, wherein the mask extends from the mask supply roller to the mask receiving roller, and the first mask is continuous from the first mask supply roller to the first mask receiving roller. A first mask receiving roller that supports the first mask to move to
The first drum is a first drum, and is supplied from the substrate and the mask supply roller until it is supported by the substrate and the mask receiving roller, and the substrate and the first mask are the first drum. A first drum that is in contact with a part of the periphery of the drum and rotates continuously;
A first deposition source, at least a portion of the first deposition material passes through the opening provided in the first mask, and the first pattern of the first material is continuous on the substrate. A first deposition source arranged to continuously guide the first deposition material toward a portion of the first mask located in a peripheral portion of the first drum so as to adhere And a device comprising:
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17941805A | 2005-07-12 | 2005-07-12 | |
| PCT/US2006/027063 WO2007008992A2 (en) | 2005-07-12 | 2006-07-11 | Apparatus and methods for continuously depositing a pattern of material onto a substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009501280A JP2009501280A (en) | 2009-01-15 |
| JP2009501280A5 true JP2009501280A5 (en) | 2009-07-30 |
Family
ID=37637931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008521572A Withdrawn JP2009501280A (en) | 2005-07-12 | 2006-07-11 | Apparatus and method for continuously depositing a material pattern on a substrate |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1902601A2 (en) |
| JP (1) | JP2009501280A (en) |
| CN (1) | CN100596256C (en) |
| WO (1) | WO2007008992A2 (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080171422A1 (en) * | 2007-01-11 | 2008-07-17 | Tokie Jeffrey H | Apparatus and methods for fabrication of thin film electronic devices and circuits |
| KR101504388B1 (en) | 2008-06-26 | 2015-03-19 | 가부시키가이샤 니콘 | Method and apparatus for manufacturing display element |
| US8339573B2 (en) | 2009-05-27 | 2012-12-25 | 3M Innovative Properties Company | Method and apparatus for photoimaging a substrate |
| US20110065282A1 (en) * | 2009-09-11 | 2011-03-17 | General Electric Company | Apparatus and methods to form a patterned coating on an oled substrate |
| KR101201755B1 (en) * | 2010-11-02 | 2012-11-15 | 삼성에스디아이 주식회사 | Vaccum evaporator and vaccum evaporating method using the same |
| JP5736857B2 (en) * | 2011-03-09 | 2015-06-17 | 凸版印刷株式会社 | Deposition equipment |
| JP5733507B2 (en) * | 2011-03-17 | 2015-06-10 | 凸版印刷株式会社 | Deposition method |
| JP5937876B2 (en) * | 2012-04-18 | 2016-06-22 | 名古屋メッキ工業株式会社 | Plated fiber manufacturing apparatus and method |
| CN103668047A (en) * | 2012-09-03 | 2014-03-26 | 香港纺织及成衣研发中心有限公司 | Vacuum coating pattern generation device and vacuum coating pattern generation method |
| CN112226730A (en) * | 2020-09-30 | 2021-01-15 | 广州国显科技有限公司 | Flexible mask and evaporation device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5172632A (en) * | 1990-08-31 | 1992-12-22 | Ricoh Company, Ltd. | Friction attachment for a stencil to a rotary printing drum |
| GB2259661A (en) * | 1991-09-18 | 1993-03-24 | Ibm | Depositing solder on printed circuit boards |
| AU2751801A (en) * | 1999-11-08 | 2001-06-06 | Speedline Technologies, Inc. | Improvements in solder printers |
| US6897164B2 (en) | 2002-02-14 | 2005-05-24 | 3M Innovative Properties Company | Aperture masks for circuit fabrication |
| US7296717B2 (en) * | 2003-11-21 | 2007-11-20 | 3M Innovative Properties Company | Method and apparatus for controlling a moving web |
-
2006
- 2006-07-11 EP EP06787025A patent/EP1902601A2/en not_active Withdrawn
- 2006-07-11 CN CN200680025659A patent/CN100596256C/en not_active Expired - Fee Related
- 2006-07-11 WO PCT/US2006/027063 patent/WO2007008992A2/en active Application Filing
- 2006-07-11 JP JP2008521572A patent/JP2009501280A/en not_active Withdrawn
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