JP2009288444A - Alignment treatment method of alignment film, and method of manufacturing liquid crystal device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To suitably apply anchoring force to an alignment film formed on a substrate having ruggedness. <P>SOLUTION: An alignment treatment method includes: a first irradiation step of irradiating the alignment film (13) formed on the substrates (10, 20) with a beam (L) so that the beam may be made incident from a direction of an elevation angle forming a first angle (θ1) on the surfaces of the substrates; and a second irradiation step of irradiating the alignment film formed on the substrates with the beam so that the beam may be made incident from a direction of an elevation angle forming a second angle (θ2) smaller than the first angle on the surfaces of the substrates. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a technical field of, for example, an alignment film alignment method provided in a liquid crystal device and a manufacturing method for manufacturing the liquid crystal device.

  There is a liquid crystal device in which a liquid crystal is sandwiched between a pair of substrates as an electro-optical material. In such a liquid crystal device, for example, the liquid crystal is in a predetermined alignment state between a pair of substrates, and a predetermined voltage is applied to the liquid crystal, for example, for each pixel portion formed in the image display region. The gradation display is performed by changing the order and modulating the light. In the liquid crystal device, the alignment of the liquid crystal is controlled by an alignment film having a specific surface shape and applied on at least one of the pair of substrates. As such an alignment film, an organic alignment film obtained by performing an alignment treatment on an organic film formed of an organic material such as polyimide, an inorganic alignment film obtained by performing an alignment treatment, or the like is used.

  As an alignment treatment method for performing such an alignment treatment, for example, a rubbing method disclosed in Patent Document 1 is widely used. In the rubbing method, the alignment treatment is performed by rubbing the surface of the alignment film with a buff (cloth) material. For this reason, the orientation regulating force (or anisotropy or orientation) is controlled by the indentation pressure, moving speed, rotational speed, etc. of the buff material. However, the rubbing method has a technical problem that dust is generated due to rubbing the alignment film with a buff material. Further, there is a technical problem that the alignment film is peeled off or rubbing scratches occur unless the control of the indentation pressure, moving speed, rotational speed, etc. of the buff material is performed properly. Furthermore, when the spacer for maintaining the liquid crystal thickness uniform is provided on the substrate, the rubbing method described above has the following technical problems. Specifically, light leakage may occur due to a portion where the buff material is not sufficiently hit in the shadowed portion of the spacer. On the other hand, if the buff material is pushed in excessively, the spacer falls down, and as a result, streaks and unevenness may occur.

  For this reason, as a non-contact alignment processing method instead of the rubbing method, as disclosed in Patent Document 1, a photo-alignment method for irradiating light to an alignment film and an ion beam alignment method for irradiating an ion beam are developed. Is underway. In the ion beam alignment method, an alignment regulating force is applied to the alignment film by selectively breaking the bonds of molecules constituting the alignment film by light or ion beam irradiation. Thereby, the alignment treatment can be suitably performed without causing the technical problem of the rubbing method described above.

JP 2001-296528 A

  However, in most cases, the surface of the substrate, which is the base on which the alignment film is formed, has a step. More specifically, for example, on the TFT array substrate, a data line, a scanning line, a pixel electrode, and the like have a laminated structure on the substrate, and the thickness generates unevenness. On the counter substrate facing the TFT array substrate, a step is similarly generated due to the presence of a light shielding film, a color filter, and the like. Since the alignment film is formed on a substrate having such unevenness, the surface of the alignment film which is a thin film also has unevenness. Therefore, when light or ion beam irradiation is performed with a step on the surface of the substrate, the region opposite to the unevenness as viewed from the light or ion beam irradiation side (in other words, the light or ion beam is irradiated by the unevenness. This causes a technical problem that the orientation regulating force in the shadow area) is reduced. For this reason, the alignment defect of a liquid crystal arises, As a result, the technical problem that the display quality of a liquid crystal device will fall may generate | occur | produce.

  The present invention has been made in view of, for example, the conventional problems described above. For example, an alignment film alignment method capable of suitably imparting alignment regulating force to an alignment film formed on an uneven substrate, for example. It is another object of the present invention to provide a method for manufacturing a liquid crystal device.

(Liquid crystal device)
In order to solve the above-described problems, an alignment film alignment method of the present invention is incident on an alignment film formed on a substrate from an elevation direction that forms a first angle with respect to the surface of the substrate. As described above, the first irradiation step of irradiating the beam for providing the alignment regulating force, and the second smaller than the first angle with respect to the surface of the substrate with respect to the alignment film formed on the substrate. And a second irradiation step of irradiating the beam so as to be incident from an elevation angle direction forming the angle.

  According to the alignment treatment method of the alignment film of the present invention, the alignment film can be subjected to alignment treatment by irradiating light or a beam such as an ion beam. That is, an alignment regulating force can be applied to the alignment film.

  In the alignment treatment method of the alignment film of the present invention, in particular, the irradiation of the alignment film with the beam is performed twice. Specifically, first, in the first irradiation step of performing the first beam irradiation, the substrate on which the alignment film is formed so as to be incident from the elevation direction that forms the first angle with respect to the substrate. A beam is irradiated. That is, with respect to the substrate on which the alignment film is formed so as to be incident on the substrate at a first angle (in other words, “90 degrees—first angle” with respect to the normal of the substrate). A beam is irradiated. Subsequent to the first irradiation step, in the second irradiation step in which the second beam irradiation is performed, the substrate on which the alignment film is formed so as to be incident from the elevation direction that forms the second angle with respect to the substrate. Beam irradiation is performed. That is, with respect to the substrate on which the alignment film is formed so as to be incident on the substrate at a second angle (in other words, incident at “90 degrees−second angle” with respect to the normal of the substrate). A beam is irradiated.

  Here, the first angle is larger than the second angle. In other words, in the alignment film alignment method of the present invention, the beam is irradiated so as to be incident from a relatively large elevation angle direction, and then the beam is irradiated so as to be incident from a relatively small elevation angle direction. .

  For this reason, various structures (for example, various electrodes, various wirings, various circuits, etc.) formed on the substrate by the first irradiation process in which the beam is irradiated so as to be incident from a relatively large elevation angle direction. It is possible to relatively reduce the size of a region (shadow region) that is shaded by unevenness caused by the thickness of the surface. In other words, it is possible to relatively reduce the size of the shadow region that is not irradiated with the beam due to being located on the opposite side of the unevenness as viewed from the beam irradiation side. In other words, as compared with the second irradiation step in which the beam is irradiated so as to be incident from a relatively small elevation angle direction, a region (shadowed by unevenness caused by the thickness of various structures formed on the substrate ( The size of the shadow area can be reduced. Therefore, in the first irradiation step, it is possible to relatively reduce the region in which the alignment regulation force is weakened because the beam is not irradiated. That is, the alignment regulating force can be appropriately applied to a partial region of the alignment film that can be a shadow region with respect to a beam incident from a relatively small elevation angle direction. On the other hand, by the second irradiation step in which the beam is irradiated so as to be incident from a relatively small elevation angle direction, for example, the alignment regulating force for controlling the alignment so that the pretilt angle of the liquid crystal molecules becomes a desired angle. It can be applied to the alignment film. Therefore, according to the alignment treatment method of the alignment film of the present invention including the first irradiation step and the second irradiation step, as compared with the alignment treatment method in which only the first irradiation step or only the second irradiation step is performed, In particular, an alignment regulation force is suitably applied to an alignment film formed on a substrate with unevenness (particularly for a portion of the alignment film that can become a shadow region with respect to a beam incident from a relatively small elevation angle direction. In addition, the alignment treatment can be performed so that the pretilt angle of the liquid crystal molecules can be suitably controlled while giving an alignment regulating force accordingly.

  In particular, in a liquid crystal device employing a lateral electric field driving method such as an IPS (In Plane Switching) method or an FFS (Fringe Field Switching) method, the pretilt angle of liquid crystal molecules is small. For this reason, if only the 2nd irradiation process in which a beam is irradiated so that it may inject from a relatively small elevation angle direction according to the target pretilt angle will be performed, a shadow area will become relatively large. For this reason, the orientation regulating force of the shadow region becomes weak, and as a result, the display quality may be lowered. However, according to the present invention, it is possible to irradiate the beam by the first irradiation step even on the region that becomes a shadow region only by the second irradiation step. Therefore, even in a liquid crystal device adopting a horizontal electric field driving method in which the shadow region becomes relatively large only by the alignment process according to the pretilt angle, the alignment regulating force is exerted on the alignment film formed on the uneven substrate. The pretilt angle of the liquid crystal molecules is preferably applied while giving a suitable orientation regulating force to the alignment film in a portion that can be a shadow region with respect to a beam incident from a relatively small elevation angle direction. The orientation treatment can be performed so that the orientation can be controlled.

  Of course, even in a liquid crystal device employing a vertical electric field driving method such as a TN (twisted nematic) method, an ECB (birefringence field effect) method, or a VA (vertical alignment) method, the present invention has irregularities. Alignment control force is suitably applied to the alignment film formed on the substrate (particularly, even for a portion of the alignment film that can become a shadow region with respect to a beam incident from a relatively small elevation angle direction. The alignment treatment can be performed so that the pretilt angle of the liquid crystal molecules can be controlled appropriately.

  In one aspect of the alignment film alignment method of the present invention, the first angle is not less than 40 degrees and less than 90 degrees, and the second angle is greater than 0 ° and not more than 50 degrees.

  According to this aspect, while suitably providing an alignment regulating force to the alignment film formed on the uneven substrate (particularly, in a portion that can be a shadow region with respect to a beam incident from a relatively small elevation angle direction). The alignment treatment can be performed so that the pretilt angle of the liquid crystal molecules can be suitably controlled while giving an alignment regulating force to the alignment film accordingly.

  In another aspect of the alignment treatment method of the alignment film of the present invention, the first angle is not less than 60 degrees and less than 90 degrees, and the second angle is greater than 0 ° and not more than 20 degrees.

  According to this aspect, while suitably providing an alignment regulating force to the alignment film formed on the uneven substrate (particularly, in a portion that can be a shadow region with respect to a beam incident from a relatively small elevation angle direction). The alignment treatment can be performed so that the pretilt angle of the liquid crystal molecules can be suitably controlled while giving an alignment regulating force to the alignment film accordingly.

  In another aspect of the alignment film alignment method of the present invention, the irradiation amount of the beam irradiated in the first irradiation step is less than or equal to the irradiation amount of the beam irradiated in the second irradiation step.

  According to this aspect, the second irradiation step has a greater influence on the alignment regulating force applied to the alignment film than the first irradiation step. Therefore, the second irradiation step provides an alignment regulating force capable of suitably controlling the pretilt angle of the liquid crystal molecules, and the first irradiation step aligns the alignment film formed on the uneven substrate. A regulating force can be suitably given (particularly, an orientation regulating force can be given correspondingly to a portion of the alignment film that can be a shadow region with respect to a beam incident from a relatively small elevation angle direction).

  The “irradiation amount” in the present invention includes, for example, the beam irradiation amount per unit area.

(Manufacturing method of liquid crystal device)
A method of manufacturing a liquid crystal device according to the present invention includes a pair of substrates each having an alignment film formed thereon, and a liquid crystal sandwiched between surfaces of the pair of substrates on which the alignment films are formed. The alignment regulating force is applied so that the alignment film formed on the substrate is incident from an elevation direction that forms a first angle with respect to the surface of the substrate. A first irradiation step of irradiating a beam for the purpose, and an elevation direction that forms a second angle smaller than the first angle with respect to the surface of the substrate with respect to the alignment film formed on the substrate A second irradiation step of irradiating the beam so as to be incident.

  According to the method for manufacturing a liquid crystal device of the present invention, the liquid crystal device can be preferably manufactured while enjoying the various effects enjoyed by the alignment film alignment method of the present invention described above. Therefore, in the liquid crystal device manufactured by the method for manufacturing a liquid crystal device of the present invention, the alignment of the liquid crystal molecules is suitably controlled by the alignment film. For this reason, it is possible to manufacture a liquid crystal device having a relatively high display quality as compared with a method for manufacturing a liquid crystal device using an alignment treatment method in which only the first irradiation step or only the second irradiation step is performed. .

  Incidentally, in response to the various aspects in the alignment film alignment method of the present invention described above, the liquid crystal device manufacturing method of the present invention can also take various aspects.

  The operation and other advantages of the present invention will become more apparent from the embodiments described below.

  The best mode for carrying out the present invention will be described below with reference to the drawings.

(1) Basic Configuration of Liquid Crystal Device First, the configuration of the liquid crystal device according to the present embodiment will be described with reference to FIGS. 1 and 2. FIG. 1 is a plan view showing the configuration of the liquid crystal device according to this embodiment, and FIG. 2 is a cross-sectional view taken along the line HH ′ of FIG.

  1 and 2, in the liquid crystal device according to the present embodiment, a TFT array substrate 10 as an example of a “substrate” according to the present invention and a counter substrate 20 as an example of a “substrate” according to the present invention are arranged to face each other. ing. A liquid crystal layer 50 is sealed between the TFT array substrate 10 and the counter substrate 20, and the TFT array substrate 10 and the counter substrate 20 are in a frame-shaped or frame-shaped seal region located around the image display region 10a. The sealing material 52 provided is bonded to each other.

  The sealing material 52 is made of, for example, an ultraviolet curable resin, a thermosetting resin, or the like for bonding the two substrates, and is applied on the TFT array substrate 10 in the manufacturing process and then cured by ultraviolet irradiation, heating, or the like. It is. In the sealing material 52, spacers such as glass fibers or glass beads for dispersing the distance between the TFT array substrate 10 and the counter substrate 20 (inter-substrate gap) to a predetermined value are dispersed.

  A light-shielding frame light-shielding film 53 that defines the frame area of the image display area 10a is provided on the counter substrate 20 side in parallel with the inside of the seal area where the sealing material 52 is disposed. A data line driving circuit 101 and an external circuit connection terminal 102 are provided along one side of the TFT array substrate 10 in a region located outside the sealing region in which the sealing material 52 is disposed in the peripheral region. However, the data line driving circuit 101 may be provided inside the seal region so that the data line driving circuit 101 is covered with the frame light shielding film 53. Further, the scanning line driving circuit 104 is provided so as to be covered with the frame light-shielding film 53 inside the seal region along two sides adjacent to the one side.

  In FIG. 2, on the TFT array substrate 10, there is formed a laminated structure in which pixel switching TFTs (Thin Film Transistors), which are driving elements, and wirings such as scanning lines and data lines are formed. Specifically, in the image display area 10a, the common electrode 11, the insulating layer 12, and the pixel electrode 9a are formed in this order on the upper layer of the pixel switching TFT, the scanning line, the data line, and the like. That is, the liquid crystal device 100 according to the present embodiment employs a lateral electric field driving method (particularly, an FFS method) in which the alignment state of the liquid crystal layer 50 is controlled by an electric field generated between the pixel electrode 9a and the common electrode 11. . Here, the pixel electrodes 9a are provided in a matrix so as to form each pixel constituting the image display region 10a. On the other hand, the common electrode 11 may be provided in a matrix like the pixel electrode 9a, or may be provided in common for each of the plurality of pixel electrodes 9a. An alignment film 13 is stacked on the pixel electrode 9a (in other words, on the TFT array substrate 10 on which the components such as the pixel electrode 9a are formed). On the other hand, a light shielding film 23 is formed on the surface of the counter substrate 20 facing the TFT array substrate 10. The light shielding film 23 is formed of, for example, a light shielding metal film or the like, and is patterned, for example, in a lattice shape in the image display region 10a on the counter substrate 20. An alignment film 13 is formed on the light shielding film 23. Further, the liquid crystal layer 50 is made of, for example, a liquid crystal in which one or several types of nematic liquid crystals are mixed, and takes a predetermined alignment state between the pair of alignment films.

  Although not shown here, in addition to the data line driving circuit 101 and the scanning line driving circuit 104, the TFT array substrate 10 is used for inspecting the quality, defects, and the like of the liquid crystal device during manufacturing or at the time of shipment. An inspection circuit, an inspection pattern, or the like may be formed.

(2) Alignment Treatment Method for Alignment Film Next, with reference to FIGS. 3 and 4, the alignment film 13 formed on each of the TFT array substrate 10 and the counter substrate 20 included in the liquid crystal device 100 according to this embodiment. The orientation processing method will be described. 3 is a cross-sectional view of the TFT array substrate 10 conceptually showing the alignment processing method of the alignment film 13, and FIG. 4 is a cross-sectional view of the TFT array substrate 10 conceptually showing the alignment processing method of the alignment film 13. It is an expanded sectional view which expanded a part of section. 3 and 4, the alignment processing method for the alignment film 13 formed on the TFT array substrate 10 will be described. It goes without saying that may be used.

  In the following description, pixel switching TFTs (Thin Film Transistors) that are driving elements, wirings such as scanning lines and data lines are formed on the TFT substrate 10, and the alignment film 13 is formed thereon. An alignment treatment method performed after the process is described. For this reason, you may use the existing process suitably for the various processes until the orientation processing method is performed. Further, even after the alignment processing method is performed, the liquid crystal device 100 may be completed using various existing processes.

  Further, in most cases, the surface of the TFT array substrate 10 which is a base on which the alignment film 13 is formed has a step. More specifically, for example, on the TFT array substrate 10, various wirings such as data lines and scanning lines and structures such as the pixel electrodes 9 a form a laminated structure. Depending on the thickness of these structures, as shown in FIGS. 3A and 3B, the surface of the TFT array substrate 10 has a step. Since the alignment film 13 is formed on the TFT array substrate 10 having such a step, as shown in FIGS. 3A and 3B, the surface of the alignment film 13 which is a thin film is also formed. There will be a step. Therefore, the alignment processing method according to the present embodiment performs alignment processing on the alignment film 13 formed on the TFT substrate array substrate 10 having a step. Of course, in order to perform the alignment process on the alignment film 13 formed on the TFT substrate array substrate 10 having no step by performing the planarization process, the alignment process method according to the present embodiment may be used. Needless to say, it is good.

  In the present embodiment, an ion beam alignment processing method for irradiating the alignment film 13 with the ion beam L is used as the alignment processing method. In particular, in this embodiment, the irradiation of the ion beam L to the alignment film 13 is performed in two steps.

  Specifically, as shown in FIG. 3A, first, as the first-stage ion beam L irradiation, the ion beam L is emitted from an incident direction in which the elevation angle with respect to the surface of the TFT array substrate 10 is θ1. Irradiated. In other words, the ion beam L is irradiated from the incident direction inclined by “90 degrees−θ1” with respect to the normal line of the TFT array substrate 10. Here, θ1 is preferably 40 ° ≦ θ1 <90 °. Alternatively, θ1 is more preferably 60 ° ≦ θ1 <90 °.

  Subsequently, as shown in FIG. 3B, as the second stage ion beam L irradiation, the ion beam L is irradiated from an incident direction in which the elevation angle with respect to the surface of the TFT array substrate 10 is θ2. In other words, the ion beam L is irradiated from the incident direction inclined by “90 ° −θ2” with respect to the normal line of the TFT array substrate 10. Here, θ2 is θ2 <θ1. Further, θ2 is preferably 0 ° <θ2 ≦ 50 °. Alternatively, in consideration of the fact that the alignment method according to the present embodiment is used when manufacturing the lateral electric field drive type liquid crystal device 100 in which the pretilt angle of the liquid crystal molecules is relatively small, θ2 is 0 ° <θ2. More preferably, it is ≦ 20 °.

  That is, in the present embodiment, after the ion beam L is irradiated so that the incident angle is such that the elevation angle with respect to the TFT array substrate 10 is relatively large, the elevation angle with respect to the TFT array substrate 10 is relatively small. Irradiation of the ion beam L is performed so as to be incident from such an incident direction.

  In addition, the irradiation amount (for example, the irradiation amount per unit area) of the ion beam L irradiated so as to be incident from an incident direction defined by a relatively large elevation angle (that is, θ1) has a relatively small elevation angle. In other words, it is preferable that the ion beam L be irradiated so as to be incident from an incident direction defined by (θ2) (for example, an irradiation amount per unit area) or less. The second stage ion beam L is irradiated later, and the irradiation amount is equal to or greater than the irradiation amount of the first stage ion beam L. Therefore, the second stage ion beam L is irradiated on the alignment film 13. This greatly affects the alignment regulating force (particularly the pretilt angle). Therefore, in addition to or instead of setting the elevation angle (that is, θ2) with respect to the TFT array substrate 10 in the incident direction of the second stage ion beam L in accordance with the above-described conditions, the alignment regulating force of the alignment film 13 It is preferable to set the angle according to (especially the pretilt angle). However, the elevation angle with respect to the TFT array substrate 10 in the incident direction of the second stage ion beam L is generally relatively small. This is particularly noticeable in the liquid crystal device 100 that employs the lateral electric field driving method in which the pretilt angle of the liquid crystal molecules is relatively small. For this reason, as shown in FIG. 4B in which one step formed by the pixel electrode 9a in FIG. 3B is enlarged, the alignment film in which the ion beam L is not irradiated by the step formed by the pixel electrode 9a and the like. 13 area portions (that is, shadow areas) become relatively large.

  On the other hand, in this embodiment, prior to the second stage ion beam L irradiation, the first stage ion beam L irradiation is performed. The elevation angle (that is, θ1) with respect to the TFT array substrate 10 in the incident direction of the first stage ion beam L is larger than the elevation angle (that is, θ2) with respect to the TFT array substrate 10 in the incident direction of the second stage ion beam L. For this reason, at the time of irradiation with the ion beam L in the first stage, as shown in FIG. 4A in which one step formed by the pixel electrode 9a in FIG. Compared to the state, the shadow area is reduced. For this reason, irradiation of the first stage ion beam L is also performed on a region portion (or at least a part thereof) of the alignment film 13 where the alignment regulation force is not suitably given by the second stage ion beam L irradiation. The orientation regulating force can be given accordingly. Accordingly, the elevation angle (that is, θ1) of the first stage ion beam L in the incident direction with respect to the TFT array substrate 10 is set according to the above-described conditions, or in addition to the above, instead of the second stage ion beam L. It is preferable to set the angle at which the ion beam L1 can be irradiated to a region portion that becomes a shadow region or a part of the region portion.

  Thus, according to the alignment processing method according to the present embodiment, the following advantages compared with the alignment processing method of irradiating the ion beam L from the incident direction defining a single angle with respect to the TFT array substrate 10. have. Specifically, the alignment treatment is performed so that the pre-tilt angle of the liquid crystal molecules can be appropriately controlled while suitably providing the alignment regulating force to the alignment film 13 formed on the TFT array substrate 10 having a step. It can be performed. In particular, the alignment film 13 formed on the stepped TFT array substrate 10 can be a shadow region with respect to the ion beam L irradiated from the incident direction defined by a relatively small elevation angle (that is, θ2). An alignment process can be performed on the region portion so that the alignment of the liquid crystal molecules can be appropriately controlled. Considering that the shadow region increases as the elevation angle with respect to the TFT array substrate 10 in the incident direction of the ion beam L becomes smaller, the lateral electric field driving method in which the pretilt angle of the liquid crystal molecules is relatively small can be obtained. This is particularly effective when performing the alignment treatment of the alignment film 13 in the liquid crystal device 100 to be employed.

  In the above description, the pixel electrode 9a and the common electrode 11 are provided in different layers, and the pixel electrode 9a and the common electrode 11 sandwich the insulating layer 12 therebetween, so that the pixel electrode 9a on the liquid crystal layer 50 side has the pixel electrode 9a. Although the description of the liquid crystal device 100 that employs the FFS method having an opening is in progress, the liquid crystal layer 50 side may be the common electrode 11 having an opening. Needless to say, the liquid crystal device adopting the IPS method in which the pixel electrode 9a and the common electrode 11 are provided in the same layer can also enjoy the various effects described above by adopting the above-described configuration. Further, not only a liquid crystal device adopting a horizontal electric field driving method, but also adopting a vertical electric field driving method such as a TN (twisted nematic) method, an ECB (birefringence field effect) method, a VA (vertical alignment) method, or the like. Also in the liquid crystal device, by adopting the above-described configuration, the various effects described above can be enjoyed accordingly.

(3) Electronic Device Next, an example of an electronic device including the liquid crystal device 100 described above will be described with reference to FIGS. 5 and 6.

  FIG. 5 is a perspective view of a mobile personal computer to which the liquid crystal device described above is applied. In FIG. 5, a computer 1200 includes a main body 1204 provided with a keyboard 1202 and a liquid crystal display unit 1206 including the liquid crystal device 100 described above. The liquid crystal display unit 1206 is configured by adding a backlight to the back surface of the liquid crystal device 100.

  Next, an example in which the above-described liquid crystal device 100 is applied to a mobile phone will be described. FIG. 6 is a perspective view of a mobile phone which is an example of an electronic device. In FIG. 6, a mobile phone 1300 includes a liquid crystal device 1005 that adopts a reflective display format and has the same configuration as the liquid crystal device 100 described above, together with a plurality of operation buttons 1302.

  Since these electronic devices also include the liquid crystal device 100 described above, the various effects described above can be suitably enjoyed.

  In addition to the electronic devices described with reference to FIGS. 5 and 6, a liquid crystal television, a viewfinder type or a monitor direct-view type video tape recorder, a car navigation device, a pager, an electronic notebook, a calculator, a word processor, a workstation A video phone, a POS terminal, a device provided with a touch panel, a projection display device such as a liquid crystal projector, and the like. Needless to say, the present invention can be applied to these various electronic devices.

  The present invention is not limited to the above-described embodiments, and can be appropriately changed without departing from the spirit or idea of the invention that can be read from the claims and the entire specification, and the alignment film accompanying such changes The alignment processing method and the liquid crystal device manufacturing method are also included in the technical scope of the present invention.

It is a top view which shows the structure of the liquid crystal device which concerns on embodiment. It is H-H 'sectional drawing of FIG. It is sectional drawing of the TFT array substrate which shows notionally the alignment processing method of an alignment film. It is the expanded sectional view which expanded a part of section of the TFT array substrate which shows notionally the alignment processing method of an alignment film. It is a perspective view of a mobile personal computer to which a liquid crystal device is applied. 1 is a perspective view of a mobile phone to which a liquid crystal device is applied.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 9a ... Pixel electrode, 10 ... TFT array substrate, 11 ... Common electrode, 13 ... Orientation film, 20 ... Opposite substrate, 50 ... Liquid crystal layer, 100 ... Liquid crystal device

Claims (5)

A first irradiation step of irradiating an alignment film formed on the substrate with a beam for providing an alignment regulating force so that the alignment film is incident from an elevation direction that forms a first angle with respect to the surface of the substrate; ,
Second irradiation for irradiating the alignment film formed on the substrate with the beam so as to be incident from an elevation direction that forms a second angle smaller than the first angle with respect to the surface of the substrate. An alignment treatment method for an alignment film comprising the steps of: The first angle is not less than 40 degrees and less than 90 degrees;
The alignment processing method according to claim 1, wherein the second angle is greater than 0 ° and equal to or less than 50 degrees. The first angle is not less than 60 degrees and less than 90 degrees;
The alignment processing method according to claim 1, wherein the second angle is greater than 0 ° and equal to or less than 20 degrees.   4. The irradiation amount of the beam irradiated in the first irradiation step is equal to or less than an irradiation amount of the beam irradiated in the second irradiation step. 5. Orientation processing method. A manufacturing method for manufacturing a liquid crystal device comprising: a pair of substrates each having an alignment film formed thereon; and a liquid crystal sandwiched between surfaces of the pair of substrates on which the alignment films are formed.
First irradiation for irradiating the alignment film formed on the substrate with a beam for providing an alignment regulating force so as to be incident from an elevation angle direction that forms a first angle with respect to the surface of the substrate. Process,
Second irradiation for irradiating the alignment film formed on the substrate with the beam so as to be incident from an elevation direction that forms a second angle smaller than the first angle with respect to the surface of the substrate. A process for producing a liquid crystal device comprising the steps of:

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