JP2009285529A - Plasma-treatment apparatus - Google Patents

Plasma-treatment apparatus Download PDF

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JP2009285529A
JP2009285529A JP2008137920A JP2008137920A JP2009285529A JP 2009285529 A JP2009285529 A JP 2009285529A JP 2008137920 A JP2008137920 A JP 2008137920A JP 2008137920 A JP2008137920 A JP 2008137920A JP 2009285529 A JP2009285529 A JP 2009285529A
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liquid
electrode
plasma
processing apparatus
upper electrode
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JP5236357B2 (en
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Toshio Awaji
敏夫 淡路
Takashi Nakayama
貴志 中山
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CLEAN TECHNOLOGY CO Ltd
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a plasma-treatment apparatus that has a simple structure, effectively cools its electrodes, and can remarkably extend the life of the electrodes. <P>SOLUTION: The plasma treatment apparatus that generates plasma between an upper electrode 1 and a lower electrode 2 to treat an object to be treated comprises a liquid supply mechanism 6 that supplies a liquid in a manner causing the liquid to penetrate the upper electrode 1. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、プラズマ処理装置に関し、特に、簡易な構造で効果的に電極を冷却し、電極の寿命を大幅に伸ばすことができるプラズマ処理装置に関するものである。   The present invention relates to a plasma processing apparatus, and more particularly to a plasma processing apparatus capable of effectively cooling an electrode with a simple structure and greatly extending the life of the electrode.

例えば、電極間に発生するプラズマを利用して排ガスに含まれる有害物質を分解、処理するプラズマ処理装置が提案されている。
このようなプラズマ処理装置において、プラズマを発する上部電極の冷却方法は一般的に内部冷却が主流であるが、内部冷却を行うためには上部電極に複雑な加工を施す必要がある。
また、現状は内部冷却でも冷却が追い付かず、上部電極の短寿命がほとんどのプラズマ処理装置のボトルネックになっている。 For example, a plasma processing apparatus that decomposes and processes harmful substances contained in exhaust gas using plasma generated between electrodes has been proposed.
In such a plasma processing apparatus, the cooling method of the upper electrode that emits plasma is generally internal cooling. However, in order to perform internal cooling, it is necessary to perform complicated processing on the upper electrode.
In addition, at present, cooling cannot catch up even with internal cooling, and the short life of the upper electrode is the bottleneck of most plasma processing apparatuses.

一方、排ガス処理装置に関しては、除害効率向上又は耐食性向上のために水蒸気を添加しているケースが多いが、その場合、別途水蒸気導入機構を設けるようにしている。
また、本件出願人は、先に、上部電極を水噴霧により冷却する方法（特願２００７−２９１７５）を提案しているが、実際にプラズマが立っている状態で上部電極に水噴霧を行うと、プラズマの生成状態が不安定になることがあった。 On the other hand, regarding the exhaust gas treatment apparatus, in many cases, steam is added to improve the detoxification efficiency or the corrosion resistance. In that case, a separate steam introduction mechanism is provided.
In addition, the present applicant has previously proposed a method (Japanese Patent Application No. 2007-29175) for cooling the upper electrode by water spraying. However, if the upper electrode is actually sprayed with water, The plasma generation state may become unstable.

本発明は、上記従来のプラズマ処理装置の有する問題点に鑑み、簡易な構造で効果的に電極を冷却し、電極の寿命を大幅に伸ばすことができるプラズマ処理装置を提供することを目的とする。   In view of the problems of the conventional plasma processing apparatus, it is an object of the present invention to provide a plasma processing apparatus capable of effectively cooling an electrode with a simple structure and greatly extending the life of the electrode. .

上記目的を達成するため、本発明のプラズマ処理装置は、電極間にプラズマを発生させ、被処理物を処理するプラズマ処理装置において、電極に液体を浸潤するように供給する液体供給機構を設けたことを特徴とする。   In order to achieve the above object, the plasma processing apparatus of the present invention is provided with a liquid supply mechanism that supplies plasma so as to infiltrate the liquid in the plasma processing apparatus that generates plasma between the electrodes and processes an object to be processed. It is characterized by that.

この場合、電極が多孔体からなり、液体供給機構が電極自体に液体を浸潤するように供給することができる。   In this case, the electrode is formed of a porous body, and the liquid supply mechanism can supply the liquid so as to infiltrate the electrode itself.

また、電極を吸液性を有するシート材で巻回し、液体供給機構が該シート材に液体を浸潤するように供給することができる。   Further, the electrode can be wound with a sheet material having a liquid absorbing property, and the liquid supply mechanism can supply the sheet material so as to infiltrate the liquid.

また、液体供給機構が、毛細管現象により多孔体からなる電極又はシート材に液体を供給することができる。   Further, the liquid supply mechanism can supply liquid to the electrode or sheet material made of a porous body by capillary action.

また、液体に電解液を用いることができる。   Further, an electrolytic solution can be used as the liquid.

また、プラズマの周囲を被覆する反応管を設置するとともに、該反応管に排ガスを導入して分解するようにすることができる。   Moreover, while installing the reaction tube which coat | covers the circumference | surroundings of plasma, exhaust gas can be introduce | transduced into this reaction tube and it can be made to decompose | disassemble.

また、反応管の周囲に冷却ジャケットを設け、液体供給機構が、該冷却ジャケットから多孔体からなる電極又はシート材に液体を供給することができる。   In addition, a cooling jacket is provided around the reaction tube, and the liquid supply mechanism can supply liquid from the cooling jacket to the electrode or sheet material made of a porous body.

本発明のプラズマ処理装置によれば、電極間にプラズマを発生させ、被処理物を処理するプラズマ処理装置において、電極に液体を浸潤するように供給する液体供給機構を設けることから、プラズマの点火により電極が発熱すると電極の液体が蒸発し、それと同時にタンクから電極に液体が供給され、これが順次繰り返されることで電極を冷却し、電極の寿命を大幅に伸ばすことができる。
また、従来のように内部冷却を行うためには電極に複雑な加工を施す必要があるが、本発明のプラズマ処理装置であれば、冷却のための電極加工は必要がなく、電極自体も任意の形状を選択することができる。 According to the plasma processing apparatus of the present invention, in the plasma processing apparatus that generates plasma between the electrodes and processes the object to be processed, the liquid supply mechanism that supplies the liquid so as to infiltrate the electrodes is provided. When the electrode generates heat, the liquid of the electrode evaporates, and at the same time, the liquid is supplied from the tank to the electrode, and this is sequentially repeated to cool the electrode and greatly extend the life of the electrode.
Further, in order to perform internal cooling as in the prior art, it is necessary to perform complicated processing on the electrode. However, with the plasma processing apparatus of the present invention, there is no need for electrode processing for cooling, and the electrode itself is arbitrary. The shape can be selected.

また、電極が多孔体からなり、液体供給機構が電極自体に液体を供給することにより、容易に液体を浸潤するように供給することができる。   Further, the electrode is made of a porous body, and the liquid supply mechanism supplies the liquid to the electrode itself, so that the liquid can be supplied so as to easily infiltrate.

また、電極を吸液性を有するシート材で巻回し、液体供給機構が該シート材に液体を供給することにより、容易に液体を浸潤するように供給することができる。   Moreover, the electrode can be wound so as to easily infiltrate the liquid by winding the electrode with a sheet material having liquid absorbency and supplying the liquid to the sheet material by the liquid supply mechanism.

また、液体供給機構が、毛細管現象により多孔体からなる電極又はシート材に液体を供給することにより、液体が蒸発した多孔体からなる電極やシート材に自動的に液体を供給することができる。   In addition, the liquid supply mechanism supplies the liquid to the electrode or sheet material made of a porous body by capillary action, so that the liquid can be automatically supplied to the electrode or sheet material made of the porous body from which the liquid has evaporated.

また、液体に電解液を用いることにより、電極の電導度を高めてプラズマの生成状態を安定させることができる。   In addition, by using an electrolytic solution as the liquid, the conductivity of the electrode can be increased and the plasma generation state can be stabilized.

また、プラズマの周囲を被覆する反応管を設置するとともに、該反応管に排ガスを導入して分解することにより、プラズマ処理装置による排ガス処理において、電極の冷却と同時に液体が蒸発することにより反応管へ水蒸気が供給され、排ガスの分解反応を促進されるとともに、電極の周囲が水蒸気でカバーされることで、電極の性能低下を引き起こす絶縁性生成物の付着を防止し、メンテナンスフリーの長時間連続運転をすることができる。
この場合、従来のような水蒸気導入機構を設ける必要がなく、また、電極に水噴霧する方法に比較し、プラズマの生成状態を安定させることができる。 In addition, by installing a reaction tube that covers the periphery of the plasma and introducing and decomposing exhaust gas into the reaction tube, in the exhaust gas treatment by the plasma processing apparatus, the liquid evaporates simultaneously with the cooling of the electrode, so that the reaction tube Water vapor is supplied to the exhaust gas, and the decomposition reaction of the exhaust gas is promoted, and the periphery of the electrode is covered with water vapor to prevent the adhesion of insulating products that cause deterioration of the electrode performance and maintenance-free operation for a long time. You can drive.
In this case, it is not necessary to provide a conventional water vapor introduction mechanism, and the plasma generation state can be stabilized as compared with the method of spraying water on the electrode.

また、反応管の周囲に冷却ジャケットを設け、液体供給機構が、該冷却ジャケットから多孔体からなる電極又はシート材に液体を供給することにより、液体供給機構の液体タンクを省略することができる。   In addition, a cooling jacket is provided around the reaction tube, and the liquid supply mechanism supplies the liquid to the porous electrode or sheet material from the cooling jacket, whereby the liquid tank of the liquid supply mechanism can be omitted.

以下、本発明のプラズマ処理装置の実施の形態を、図面に基づいて説明する。   Hereinafter, embodiments of the plasma processing apparatus of the present invention will be described with reference to the drawings.

図１に、本発明のプラズマ処理装置の第１実施例を示す。
このプラズマ処理装置は、上下に対向する上部電極１（高圧電極）と下部電極２（接地電極）との間にプラズマ３を発生させて、被処理物を処理するもので、プラズマ３の周囲を被覆するように反応管４を設置するとともに、該反応管４に排ガス（図示省略）を導入し、例えば、ＣＦ４やＳＦ６等のＰＦＣガスのような排ガスに含まれる有害物質をプラズマ３により分解処理するようにしている。 FIG. 1 shows a first embodiment of the plasma processing apparatus of the present invention.
This plasma processing apparatus generates a plasma 3 between an upper electrode 1 (high voltage electrode) and a lower electrode 2 (ground electrode) that are vertically opposed to each other to process an object to be processed. The reaction tube 4 is installed so as to be covered, and exhaust gas (not shown) is introduced into the reaction tube 4, and harmful substances contained in the exhaust gas such as PFC gas such as CF 4 and SF 6 are caused by the plasma 3. I try to disassemble.

そして、このプラズマ処理装置は、上部電極１を一定の気孔率を有し、好ましくは、気孔が連続した多孔体で構成するようにし、液体供給機構６が電極自体に液体を供給することにより、液体を浸潤するように供給するようにしている。
具体的には、上部電極１と液体タンク６１とを、液体がしたたり落ちない程度のクリアランス（このクリアランスは、上部電極１を気孔が連続した多孔体で構成した場合には、上部電極１と液体タンク６１との間にシール部材（図示省略）を配設することにより実質的になくすようにしてもよい。）で連結している。 In the plasma processing apparatus, the upper electrode 1 has a certain porosity, and preferably, the upper electrode 1 is formed of a porous body having continuous pores, and the liquid supply mechanism 6 supplies liquid to the electrode itself. The liquid is supplied so as to infiltrate.
Specifically, the clearance between the upper electrode 1 and the liquid tank 61 is such that the liquid does not drip or fall (this clearance is the same as the upper electrode 1 when the upper electrode 1 is formed of a porous body having continuous pores. A seal member (not shown) may be disposed between the liquid tank 61 and the liquid tank 61 so as to be substantially eliminated.

上部電極１を構成する多孔体（ポーラス材料）としては、炭化珪素（ＳｉＣ）や炭素（Ｃ）を焼結して形成したもの等を好適に用いることができ、例えば、製造時に気孔率を５０〜８０％の範囲で調整することができる。
このように、上部電極１を多孔体で構成し、液体供給機構６が電極１自体に液体を供給することにより、容易に液体を浸潤するように供給することができる。 As the porous body (porous material) constituting the upper electrode 1, a material formed by sintering silicon carbide (SiC) or carbon (C) can be preferably used. It can be adjusted within a range of ˜80%.
As described above, the upper electrode 1 is formed of a porous body, and the liquid supply mechanism 6 supplies the liquid to the electrode 1 itself, so that the liquid can be supplied so as to easily infiltrate.

液体供給機構６から供給する液体としては、通常の水（純水を含む。）等の液体のほか、ＮａＣｌ、ＣａＣｌ２、ＭｇＣｌ２、ＮＨ４Ｃｌ、ＮａＯＨ等の電解質を溶解した電解液を用いることができ、特に、液体として電解液を用いることにより、電極の電導度を高めてプラズマの生成状態を安定させることができる。 As the liquid supplied from the liquid supply mechanism 6, in addition to liquid such as normal water (including pure water), an electrolytic solution in which an electrolyte such as NaCl, CaCl 2 , MgCl 2 , NH 4 Cl, or NaOH is dissolved is used. In particular, by using an electrolyte as the liquid, it is possible to increase the conductivity of the electrode and stabilize the plasma generation state.

また、図２に示すように、液体供給機構６が、毛細管現象によりこの上部電極１に液体を供給することもでき、これにより、液体が蒸発した多孔体の上部電極１に自動的に液体を供給することができる。
本実施例では、反応管４の周囲に冷却ジャケット７を設けるとともに、この冷却ジャケット７と上部電極１とを液体がしみ込む綿状のものを詰めた配管６２で繋ぎ、冷却ジャケット７を液体供給機構６の液体タンクとしている。
これにより、液体供給機構６の液体タンクを省略することができる。
なお、冷却ジャケット７は、装置本体とは絶縁するようにしておく。 In addition, as shown in FIG. 2, the liquid supply mechanism 6 can also supply liquid to the upper electrode 1 by capillary action, so that the liquid is automatically supplied to the upper electrode 1 of the porous body from which the liquid has evaporated. Can be supplied.
In this embodiment, a cooling jacket 7 is provided around the reaction tube 4, and the cooling jacket 7 and the upper electrode 1 are connected by a pipe 62 filled with a cotton-like material soaked with liquid, and the cooling jacket 7 is connected to a liquid supply mechanism. 6 liquid tanks.
Thereby, the liquid tank of the liquid supply mechanism 6 can be omitted.
The cooling jacket 7 is insulated from the apparatus main body.

かくして、本実施例のプラズマ処理装置は、電極間にプラズマ３を発生させ、被処理物を処理するプラズマ処理装置において、上部電極１を多孔体で形成するとともに、該多孔体の上部電極１に液体を浸潤するように供給する液体供給機構６を設けることから、プラズマ３の点火により上部電極１が発熱すると浸潤した液体が蒸発し、それと同時に液体タンク６１から上部電極１に液体が供給され、これが順次繰り返されることで上部電極１を冷却し、上部電極１の寿命を大幅に伸ばすことができる。
また、従来のように内部冷却を行うためには上部電極１に複雑な加工を施す必要があるが、本実施例のプラズマ処理装置であれば、冷却のための電極加工は必要がなく、上部電極自体も任意の形状を選択することができる。 Thus, in the plasma processing apparatus of this embodiment, the plasma 3 is generated between the electrodes, and the upper electrode 1 is formed of a porous body in the plasma processing apparatus for processing an object to be processed. Since the liquid supply mechanism 6 for supplying the liquid so as to infiltrate is provided, the infiltrated liquid evaporates when the upper electrode 1 generates heat by the ignition of the plasma 3, and at the same time, the liquid is supplied from the liquid tank 61 to the upper electrode 1, By repeating this sequentially, the upper electrode 1 can be cooled, and the life of the upper electrode 1 can be greatly extended.
Further, in order to perform internal cooling as in the prior art, it is necessary to perform complicated processing on the upper electrode 1, but in the case of the plasma processing apparatus of the present embodiment, there is no need for electrode processing for cooling, and the upper electrode 1 An arbitrary shape can be selected for the electrode itself.

また、液体供給機構６が、毛細管現象により多孔体からなる電極１に液体を供給することにより、液体が蒸発した多孔体の上部電極１に自動的に液体を供給することができる。   Further, the liquid supply mechanism 6 can automatically supply the liquid to the upper electrode 1 of the porous body from which the liquid has evaporated by supplying the liquid to the electrode 1 made of the porous body by capillary action.

また、プラズマ３の周囲を被覆する反応管４を設置するとともに、該反応管４に排ガスを導入して分解することにより、プラズマ処理装置による排ガス処理において、上部電極１の冷却と同時に液体が蒸発することにより反応管４へ水蒸気が供給され、排ガスの分解反応を促進されるとともに、上部電極１の周囲を水蒸気でカバーすることで、上部電極１の性能低下を引き起こす絶縁性生成物の付着を防止し、メンテナンスフリーの長時間連続運転をすることができる。
この場合、従来のような水蒸気導入機構を設ける必要がなく、また、上部電極１に水噴霧する方法に比較し、プラズマ３の生成状態を安定させることができる。 In addition, by installing a reaction tube 4 covering the periphery of the plasma 3 and introducing and decomposing exhaust gas into the reaction tube 4, the liquid evaporates simultaneously with the cooling of the upper electrode 1 in the exhaust gas treatment by the plasma processing apparatus. As a result, water vapor is supplied to the reaction tube 4 and the decomposition reaction of the exhaust gas is promoted, and the periphery of the upper electrode 1 is covered with water vapor, thereby adhering an insulating product that causes the performance degradation of the upper electrode 1. It can prevent and maintain maintenance-free continuous operation for a long time.
In this case, it is not necessary to provide a conventional water vapor introducing mechanism, and the generation state of the plasma 3 can be stabilized as compared with the method of spraying water on the upper electrode 1.

図３に、本発明のプラズマ処理装置の第２実施例を示す。
このプラズマ処理装置は、上下に対向する上部電極１（高圧電極）と下部電極２（接地電極）との間にプラズマ３を発生させて、被処理物を処理するもので、プラズマ３の周囲を被覆するように反応管４を設置するとともに、該反応管４に排ガス（図示省略）を導入し、例えば、ＣＦ４やＳＦ６等のＰＦＣガスのような排ガスに含まれる有害物質をプラズマ３により分解処理するようにしている。 FIG. 3 shows a second embodiment of the plasma processing apparatus of the present invention.
This plasma processing apparatus generates a plasma 3 between an upper electrode 1 (high voltage electrode) and a lower electrode 2 (ground electrode) that are vertically opposed to each other to process an object to be processed. The reaction tube 4 is installed so as to be covered, and exhaust gas (not shown) is introduced into the reaction tube 4, and harmful substances contained in the exhaust gas such as PFC gas such as CF 4 and SF 6 are caused by the plasma 3. I try to disassemble.

そして、このプラズマ処理装置は、上部電極１の外周面を吸液性を有するシート材５で巻回するとともに、該シート材５に浸潤するように液体を供給する液体供給機構６を設けている。
具体的には、図３に示すように、上部電極１の外周面に吸液性の布５１を貼り付け、布５１と液体タンク６１とを、液体がしたたり落ちない程度のクリアランスで連結している。
あるいは、図４に示すように、上部電極１と液体タンク６１を離し、その間を液体がしみ込む綿状のものを詰めた配管６２で繋ぎ、毛細管現象を利用した、配管６２の内径と液体タンク６１の位置関係でシート材５への液体の供給量をコントロールすることができる。
なお、液体タンク６１は、装置本体とは絶縁するようにしておく。 The plasma processing apparatus is provided with a liquid supply mechanism 6 for winding the outer peripheral surface of the upper electrode 1 with a sheet material 5 having liquid absorbency and supplying a liquid so as to infiltrate the sheet material 5. .
Specifically, as shown in FIG. 3, a liquid-absorbing cloth 51 is attached to the outer peripheral surface of the upper electrode 1, and the cloth 51 and the liquid tank 61 are connected with a clearance that prevents liquid from dripping or dropping. ing.
Alternatively, as shown in FIG. 4, the upper electrode 1 and the liquid tank 61 are separated from each other and connected between them by a pipe 62 filled with a cotton-like material soaked with liquid, and the inner diameter of the pipe 62 and the liquid tank 61 using the capillary phenomenon are used. Thus, the amount of liquid supplied to the sheet material 5 can be controlled.
The liquid tank 61 is insulated from the apparatus main body.

シート材５は、グラスウールやロックウール等の耐熱性のものを使用することが好ましいが、上部電極１の温度はそれほど高温にならないため、通常の天然繊維や合成繊維からなる布や不織布等を使用することもでき、材質は特に限定されない。   The sheet material 5 is preferably made of heat-resistant material such as glass wool or rock wool. However, since the temperature of the upper electrode 1 does not become so high, cloth or nonwoven fabric made of ordinary natural fibers or synthetic fibers is used. The material is not particularly limited.

液体供給機構６から供給する液体としては、第１実施例と同様、通常の水（純水を含む。）等の液体のほか、ＮａＣｌ、ＣａＣｌ２、ＭｇＣｌ２、ＮＨ４Ｃｌ、ＮａＯＨ等の電解質を溶解した電解液を用いることができ、特に、液体として電解液を用いることにより、電極の電導度を高めてプラズマの生成状態を安定させることができる。 The liquid supplied from the liquid supply mechanism 6 is not only liquid such as normal water (including pure water), but also electrolytes such as NaCl, CaCl 2 , MgCl 2 , NH 4 Cl, and NaOH as in the first embodiment. In particular, by using an electrolyte as a liquid, the conductivity of the electrode can be increased and the plasma generation state can be stabilized.

この状態でプラズマ３を点火させると、上部電極１が発熱することで布５１にしみ込んだ液体が蒸発する。それと同時に液体タンク６１から布５１に液体がしみ込む形で供給される。これが順次繰り返されることで上部電極１が冷却され、上部電極１の寿命が大幅に伸びる。
冷却のために液体を意図的に導入するのではなく、液体がある状態（上部電極が液体で濡れている状態）にしておいて、上部電極自体の発熱で蒸発した液体が自然と自動供給されるようにする。
これにより、上部電極１の冷却が必要なときに必要なだけ行え、ポンプやノズルといったものが不要であるため、機械的にもシンプルにすることができる。 When the plasma 3 is ignited in this state, the liquid soaked into the cloth 51 is evaporated as the upper electrode 1 generates heat. At the same time, the liquid is supplied from the liquid tank 61 into the cloth 51. By repeating this sequentially, the upper electrode 1 is cooled, and the life of the upper electrode 1 is greatly extended.
Instead of intentionally introducing the liquid for cooling, the liquid that is evaporated due to the heat generated by the upper electrode itself is automatically supplied automatically when the liquid is in a state (the upper electrode is wet with the liquid). So that
Thereby, when the upper electrode 1 needs to be cooled, it can be performed as much as necessary, and a pump or a nozzle is not necessary, so that it can be simplified mechanically.

図３に示す本実施例のプラズマ処理装置を用い、運転の実験を行った。
その結果、プラズマ３の着火性及び着火後の安定性ともに問題はなかった。
さらに、運転後の上部電極１の重量測定の結果、本実施例のプラズマ処理装置は、他の冷却方式と比べて上部電極１の重量減少率が著しく小さいことが分かった。
下記表１に、その実験結果を示す。
なお、上部電極１と下部電極２にはタングステン電極を使用し、下部電極２は液体に浸漬することにより冷却をしている。 An operation experiment was conducted using the plasma processing apparatus of this example shown in FIG.
As a result, there was no problem in the ignitability of the plasma 3 and the stability after ignition.
Furthermore, as a result of measuring the weight of the upper electrode 1 after operation, it was found that the rate of weight reduction of the upper electrode 1 was remarkably small in the plasma processing apparatus of this example compared with other cooling methods.
Table 1 below shows the experimental results.
The upper electrode 1 and the lower electrode 2 are tungsten electrodes, and the lower electrode 2 is cooled by being immersed in a liquid.

Figure 2009285529
Figure 2009285529

かくして、本実施例のプラズマ処理装置は、電極間にプラズマ３を発生させ、被処理物を処理するプラズマ処理装置において、上部電極１を吸液性を有するシート材５で巻回するとともに、該シート材５に液体を浸潤するように供給する液体供給機構６を設けることから、プラズマ３の点火により上部電極１が発熱するとシート材５の液体が蒸発し、それと同時に液体タンク６１からシート材５に液体が供給され、これが順次繰り返されることで上部電極１を冷却し、上部電極１の寿命を大幅に伸ばすことができる。
また、従来のように内部冷却を行うためには上部電極１に複雑な加工を施す必要があるが、本実施例のプラズマ処理装置であれば、冷却のための電極加工は必要がなく、上部電極自体も任意の形状を選択することができる。 Thus, in the plasma processing apparatus of the present embodiment, the plasma 3 is generated between the electrodes, and in the plasma processing apparatus for processing an object to be processed, the upper electrode 1 is wound with the sheet material 5 having liquid absorption, Since the liquid supply mechanism 6 for supplying the liquid so as to infiltrate the sheet material 5 is provided, the liquid of the sheet material 5 evaporates when the upper electrode 1 generates heat by the ignition of the plasma 3, and at the same time, the sheet material 5 from the liquid tank 61 is evaporated. The liquid is supplied to the liquid crystal, and this is sequentially repeated, whereby the upper electrode 1 can be cooled and the life of the upper electrode 1 can be greatly extended.
Further, in order to perform internal cooling as in the prior art, it is necessary to perform complicated processing on the upper electrode 1, but in the case of the plasma processing apparatus of the present embodiment, there is no need for electrode processing for cooling, and the upper electrode 1 An arbitrary shape can be selected for the electrode itself.

また、液体供給機構６が、毛細管現象によりシート材５に液体を供給することにより、液体が蒸発したシート材５に自動的に液体を供給することができる。   In addition, the liquid supply mechanism 6 can automatically supply the liquid to the sheet material 5 from which the liquid has evaporated by supplying the liquid to the sheet material 5 by capillary action.

また、プラズマ３の周囲を被覆する反応管４を設置するとともに、該反応管４に排ガスを導入して分解することにより、プラズマ処理装置による排ガス処理において、上部電極１の冷却と同時に液体が蒸発することにより反応管４へ水蒸気が供給され、排ガスの分解反応を促進されるとともに、上部電極１の周囲を水蒸気でカバーすることで、上部電極１の性能低下を引き起こす絶縁性生成物の付着を防止し、メンテナンスフリーの長時間連続運転をすることができる。
この場合、従来のような水蒸気導入機構を設ける必要がなく、また、上部電極１に水噴霧する方法に比較し、プラズマ３の生成状態を安定させることができる。 In addition, by installing a reaction tube 4 covering the periphery of the plasma 3 and introducing and decomposing exhaust gas into the reaction tube 4, the liquid evaporates simultaneously with the cooling of the upper electrode 1 in the exhaust gas treatment by the plasma processing apparatus. As a result, water vapor is supplied to the reaction tube 4 and the decomposition reaction of the exhaust gas is promoted, and the periphery of the upper electrode 1 is covered with water vapor, thereby adhering an insulating product that causes a decrease in the performance of the upper electrode 1. It can prevent and maintain maintenance-free continuous operation for a long time.
In this case, it is not necessary to provide a conventional water vapor introducing mechanism, and the generation state of the plasma 3 can be stabilized as compared with the method of spraying water on the upper electrode 1.

以上、本発明のプラズマ処理装置について、その実施例に基づいて説明したが、本発明は上記実施例に記載した構成に限定されるものではなく、その趣旨を逸脱しない範囲において適宜その構成を変更することができる。
例えば、下部電極を吸液性を有するシート材で巻回するとともに、該シート材に液体を浸潤するように供給する液体供給機構を設けることもできる。 The plasma processing apparatus of the present invention has been described based on the embodiments thereof. However, the present invention is not limited to the configurations described in the above embodiments, and the configuration is appropriately changed without departing from the spirit of the present invention. can do.
For example, it is possible to provide a liquid supply mechanism for winding the lower electrode with a sheet material having liquid absorbency and supplying the sheet material so as to infiltrate the sheet material.

本発明のプラズマ処理装置は、簡易な構造で効果的に電極を冷却し、電極の寿命を大幅に伸ばすという特性を有することから、例えば、プラズマ処理を用いる排ガス処理装置やワークの表面改質処理装置、繊維の浄化装置等に広く好適に用いることができる。   Since the plasma processing apparatus of the present invention has characteristics of effectively cooling the electrode with a simple structure and greatly extending the life of the electrode, for example, an exhaust gas processing apparatus using plasma processing or a surface modification treatment of a workpiece It can be used widely and suitably for devices, fiber purification devices, and the like.

本発明のプラズマ処理装置の第１実施例を示す断面図である。It is sectional drawing which shows 1st Example of the plasma processing apparatus of this invention. 冷却ジャケットを液体タンクとした変形実施例を示す断面図である。It is sectional drawing which shows the modification Example which used the cooling jacket as the liquid tank. 本発明のプラズマ処理装置の第２実施例を示す断面図である。It is sectional drawing which shows 2nd Example of the plasma processing apparatus of this invention. 液体供給機構の変形実施例を示す説明図である。It is explanatory drawing which shows the deformation | transformation Example of a liquid supply mechanism.

符号の説明Explanation of symbols

１ 上部電極
２ 下部電極
３ プラズマ
４ 反応管
５ シート材
５１ 布
６ 液体供給機構
６１ 液体タンク
６２ 配管
７ 冷却ジャケット DESCRIPTION OF SYMBOLS 1 Upper electrode 2 Lower electrode 3 Plasma 4 Reaction tube 5 Sheet material 51 Cloth 6 Liquid supply mechanism 61 Liquid tank 62 Piping 7 Cooling jacket

Claims (7)

電極間にプラズマを発生させ、被処理物を処理するプラズマ処理装置において、電極に液体を浸潤するように供給する液体供給機構を設けたことを特徴とするプラズマ処理装置。   A plasma processing apparatus for generating plasma between electrodes and processing an object to be processed, comprising a liquid supply mechanism for supplying a liquid so as to infiltrate the electrodes. 電極が多孔体からなり、液体供給機構が電極自体に液体を供給することを特徴とする請求項１記載のプラズマ処理装置。   The plasma processing apparatus according to claim 1, wherein the electrode is made of a porous body, and the liquid supply mechanism supplies the liquid to the electrode itself. 電極を吸液性を有するシート材で巻回し、液体供給機構が該シート材に液体を供給することを特徴とする請求項１記載のプラズマ処理装置。   2. The plasma processing apparatus according to claim 1, wherein the electrode is wound with a sheet material having a liquid absorbing property, and the liquid supply mechanism supplies the liquid to the sheet material. 液体供給機構が、毛細管現象により多孔体からなる電極又はシート材に液体を供給することを特徴とする請求項２又は３記載のプラズマ処理装置。   4. The plasma processing apparatus according to claim 2, wherein the liquid supply mechanism supplies the liquid to the electrode or sheet material made of a porous body by a capillary phenomenon. 液体に電解液を用いたことを特徴とする請求項１、２、３又は４記載のプラズマ処理装置。   5. The plasma processing apparatus according to claim 1, wherein an electrolytic solution is used as the liquid. プラズマの周囲を被覆する反応管を設置するとともに、該反応管に排ガスを導入して分解するようにしたことを特徴とする請求項１、２、３、４又は５記載のプラズマ処理装置。   6. The plasma processing apparatus according to claim 1, wherein a reaction tube that covers the periphery of the plasma is installed, and exhaust gas is introduced into the reaction tube for decomposition. 反応管の周囲に冷却ジャケットを設け、液体供給機構が、該冷却ジャケットから多孔体からなる電極又はシート材に液体を供給することを特徴とする請求項６記載のプラズマ処理装置。   The plasma processing apparatus according to claim 6, wherein a cooling jacket is provided around the reaction tube, and the liquid supply mechanism supplies the liquid from the cooling jacket to an electrode or sheet material made of a porous body.
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