JP2009279813A - Photocatalytic substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a photocatalytic resin substrate good in adhesion and capable of preventing the degradation of the substrate and being embossed on the surface. <P>SOLUTION: The photocatalytic resin substrate is obtained by laminating an adhesive layer, a primer layer and a photocatalyst layer in this order a resin substrate comprising an olefin resin, and the adhesive layer contains a urethane resin. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a resin base material having a photocatalyst layer that is excellent in antifouling property and can be embossed on a surface.

  In recent years, organic matter decomposition and antibacterial deodorizing materials using a titanium dioxide photocatalyst have attracted attention. Titanium dioxide has a function as a photocatalyst, and has an action of decomposing organic substances and nitrogen oxides and antibacterial and deodorizing. Its function is attributed to electrons and holes generated when titanium dioxide, a semiconductor, is irradiated with light, particularly ultraviolet rays. That is, when titanium dioxide, which is a semiconductor, is irradiated with light having energy greater than the band gap, it generates electrons and holes. The generated electrons and holes decompose water adsorbed on the titanium dioxide surface to generate H radicals and OH radicals. The organic substance can be decomposed by the reaction of the OH radical with the organic substance. For this reason, if a photocatalyst is used, an organic substance can be decomposed as an antibacterial and deodorant material to obtain a material effective for environmental purification. Such a photocatalyst can be applied on an inorganic base material such as metal, ceramics, or glass.・ Laminated and supplied in a wide range of fields, from building materials such as windows and walls, road materials, and industrial materials such as housings for electronic devices.

  However, when the base material is made of an organic material such as a synthetic resin, it is impossible to apply a high-temperature treatment such as sintering when the photocatalyst layer is adhered to the base material, so the base material is melted by heating. It was necessary to adhere the photocatalyst layer without any problems. In addition, even when trying to laminate a primer layer on a synthetic resin substrate, there is a problem that the primer is repelled on the substrate surface and cannot be applied uniformly, and the photocatalyst layer and the substrate cannot be adhered. Furthermore, it was necessary to protect the base material from being decomposed and deteriorated by the influence of titanium oxide contained in the photocatalyst layer. For these reasons, unlike an inorganic base material, it was difficult to laminate a photocatalyst on a resin base material. In order to solve such a problem, Patent Document 1 includes an organic adhesive layer and an inorganic protective layer (primer layer) between the photocatalyst layer and the base material, so that the carbon dioxide in the photocatalyst layer on the surface is provided. A synthetic resin composite molded body that is hardly deteriorated by titanium or the like, has good adhesiveness, and has no photocatalyst layer peeling is disclosed. In Patent Document 2, a photocatalyst layer, an organic adhesive layer, and an inorganic protective layer (primer layer) are integrated, and this is superimposed on a base material as a transfer film to improve adhesiveness. ing.

JP 2001-239607 A JP 2001-260597 A

  As described above, in Patent Documents 1 and 2, an organic adhesive layer, an inorganic protective layer (primer layer), and a photocatalyst layer are laminated in this order on a synthetic resin substrate. The synthetic resin composite molded body (photocatalyst base material) with good adhesion can be prevented. However, when an adhesive layer is provided between the base material, the photocatalyst layer, and the inorganic protective layer (primer layer) as described above, the adhesive layer is too hard, which is one of the characteristics of the synthetic resin base material. When the embossing is performed, the flexibility is lost, and it is difficult to form unevenness on the surface of the base material, and the adhesive layer is broken. From such a problem, there has been a demand for an adhesive layer that is highly compatible with the primer layer and the photocatalyst layer and the resin base material layer, and does not become too hard even when dried, and is rich in flexibility. Furthermore, for applications such as wallpaper and metal decorative steel sheets that require embossing, among synthetic resins, especially resin base materials containing olefin-based resins with excellent chemical resistance, flexibility, stain resistance, and cost. There has been a current situation in which a photocatalyst coating is desired.

  Therefore, the present invention is a photocatalyst resin base material in which a photocatalyst layer is laminated on a resin base material containing an olefin resin, has good adhesiveness, and can prevent deterioration of the base material. It is another object of the present invention to provide a photocatalytic resin base material that can be embossed.

  The present invention will be described below. In order to facilitate understanding of the present invention, reference numerals in the accompanying drawings are added in parentheses, but the present invention is not limited to the illustrated embodiment.

  In the present invention, an adhesive layer (20), a primer layer (30), and a photocatalyst layer (40) are laminated in this order on a resin substrate (10) containing an olefin resin, and the adhesive layer is made of a urethane resin. It is a photocatalyst resin base material (100) characterized by including embossing on the surface.

  The primer layer (30) of the present invention preferably contains silica and an acrylic resin. The photocatalyst resin which has the favorable block property which does not affect the base material (10), and has the softness | flexibility suitable for an embossing by containing the substance concerning a primer layer. It can be a substrate (100).

  The primer layer (30) of the present invention preferably contains acrylic modified silicon. By including the substance related to the primer layer, the adhesive layer (20) and the photocatalyst layer (40) can be more firmly bonded, and even if embossed, the photocatalyst resin base material (100) that does not peel off can do.

  The photocatalyst resin base material 100 of the present invention is a photocatalyst resin base material 100 suitable for applications such as wallpaper and metal decorative steel plate, etc., in which the base material 10 contains an olefin resin and needs to be embossed. Moreover, since it has the structure where the adhesive layer 20, the primer layer 30, and the photocatalyst layer 40 are laminated in this order on the base material 10, the deterioration of the base material 10 due to the photocatalytic effect can be prevented, and the adhesiveness is good. The photocatalytic substrate 100 can be obtained. Furthermore, since the adhesive layer 20 contains a urethane-based resin, the photocatalyst layer 40 and the primer layer 30 and the base material 10 can be favorably bonded even on the resin base material 10 that is difficult to bond. Further, even when embossing is performed by the adhesive layer 20 containing silicon-modified urethane, the primer layer 30 containing silica and an acrylic resin, and the primer layer 30 further containing acrylic-modified silicon. It can be set as the photocatalyst resin base material 100 provided with the adhesiveness which does not peel, the softness | flexibility which can give embossing, and sufficient block property which does not give the photocatalytic action with respect to a base material. Therefore, the photocatalyst resin substrate 100 of the present invention is a photocatalyst resin substrate suitable for embossing the surface.

  Such actions and gains will be clarified from the best mode for carrying out the invention described below.

  Hereinafter, the present invention will be described based on embodiments shown in the drawings. In the following description, a planar form in which the adhesive layer 20, the primer layer 30, and the photocatalyst layer 40 are laminated in this order on the resin base material 10 containing the olefin resin is exemplified, but the present invention is limited to this form. It may be a curved surface, an uneven surface or the like.

<Photocatalytic resin base material 100>
FIG. 1 schematically shows the layer structure of the photocatalytic resin substrate 100 of the present invention. The photocatalyst resin base material 100 of the present invention is configured by laminating an adhesive layer 20, a primer layer 30, and a photocatalyst layer 40 in this order on a base material 10 containing an olefin resin, and is an adhesive suitable for embossing, Includes primers.

(Substrate 10)
The base material 10 is a resin base material containing an olefin resin. Examples of olefin-based resins include polyethylene, high-density polyethylene, low-density polyethylene, linear low-density polyethylene, polypropylene, boribten, and other comonomer (vinyl ester, unsaturated carboxylic acid ester) that can copolymerize olefin with the olefin. Etc.) and the like. Further, if the base material contains the olefin-based resin in an amount of 50% or more, preferably 60% by weight or more, and more preferably 70% by weight or more based on the total weight of the base material layer, another thermoplastic resin. Etc. may be included. By including the olefin-based resin in the resin base material, it is possible to obtain a base material 10 suitable for applications such as wallpaper or metal-decorated steel sheets that require embossing to provide a concavo-convex pattern on the surface.

  Although it will not specifically limit if it is the thickness suitable for embossing provision as thickness of the resin base material 10, It is preferable that it is 7 micrometers-50 micrometers. If it is thinner than 7 μm, the film may be curled or torn during processing after the photocatalyst is applied. If it is thicker than 50 μm, the workability may be deteriorated because it becomes hard as a wallpaper. In addition, when embossing, a fine design may not be expressed, and furthermore, since material costs are required, quality and economy may be inferior.

(Adhesive layer 20)
The adhesive layer 20 is laminated between the resin base material 10 containing the olefin resin and the primer layer 30 and has a function of adhering the resin base material 10 containing the olefin resin and the primer layer 30. Further, the adhesive layer 20 has a characteristic of maintaining flexibility even after drying. As a result, even if the photocatalyst resin substrate 100 is embossed, the adhesive layer 20 is not broken and the finish is satisfactory.

  The adhesive layer 20 includes a urethane resin. The urethane-based resin has good adhesion to the resin base material 10 and the primer layer 30. As a result, the primer layer 30 and the photocatalyst layer 40, which have been difficult to stack, can be stacked on the resin base material 10 containing the olefin resin. Moreover, the adhesive layer 20 containing a urethane-based resin can maintain flexibility even after drying, and can be an adhesive layer 20 suitable for embossing. The adhesive layer 20 preferably contains silicon-modified urethane. By including silicon-modified urethane, the adhesive layer 20 and the primer layer 30 can be bonded more firmly.

  The urethane-based resin contained in the adhesive layer 20 is 20% by mass to 80% by mass, more preferably 25% by mass to 75% by mass, with the entire adhesive layer 20 being 100% by mass. If the urethane resin contained in the adhesive layer 20 is too small, the resin substrate 10 and the primer layer 30 may not be sufficiently bonded, and if too much, the compatibility with the primer layer may be deteriorated. is there.

  The silicon-modified urethane contained in the adhesive layer 20 is 20% by mass to 80% by mass, more preferably 25% by mass to 75% by mass, with the entire adhesive layer 20 being 100% by mass. If the amount of the silicon-modified urethane contained in the adhesive layer 20 is within the above range, the base material 10 and the primer layer 30 can be bonded better. When there is too much content of silicon modified urethane, adhesiveness with a base material may be impaired.

  The urethane contained in the adhesive layer 20 may be a mixture of the urethane resin and the silicon-modified urethane resin. In the case of mixing the urethane resin and the silicon-modified urethane resin, the ratio of the urethane resin and the silicon-modified urethane is 20:80 to 80:20, preferably 30:70 to 70:30, more preferably by mass ratio. Preferably it is 40: 60-60: 40.

  The thickness of the adhesive layer 20 is preferably 1 μm to 10 μm, and more preferably 2 μm to 7 μm. If it is thinner than 1 μm, sufficient adhesion may not be obtained. On the other hand, if it is thicker than 10 μm, the flexibility may be hindered and embossing may be difficult to be applied. Further, the adhesiveness is hardly improved, and the material cost is wasted. There is a case.

(Primer layer 30)
The primer layer 30 is laminated between the adhesive layer 20 and the photocatalyst layer 40. Since the photocatalytic effect is blocked by the primer layer 30, the photocatalytic layer 40 does not adversely affect the oxidative decomposition of the resin substrate 10 itself. The primer layer 30 also has a function of stably bonding the adhesive layer 20 and the photocatalyst layer 40.

  The primer layer 30 preferably contains silica and an acrylic resin. By including the substance related to the primer layer 30, the adhesive layer 20 and the photocatalyst layer 40 can be more firmly bonded. The ratio of silica to acrylic resin is preferably such that the primer layer 30 contains 100% by mass of the entire layer and 5-25% by mass of silica and 75-95% by mass of acrylic resin in terms of mass ratio. By setting it as such content, it can be set as the primer layer 30 with which compatibility with both the adhesive layer 20 and the photocatalyst layer 40 is good, and even if embossing is given, there is no deterioration such as peeling, and sufficient strength It can be set as the photocatalyst resin base material 100 with.

  In addition to silica and acrylic resin, the primer layer 30 includes a primer that does not affect the photocatalytic action on the substrate 10 side and that has a function of stably bonding the adhesive layer 20 and the photocatalytic layer 40. Preferably. Specifically, those formed from a composition containing acryl-modified silicon, alkoxysilane, silicon-modified acryl, acryl titanate, etc. are preferable, and those containing acryl-modified silicon are particularly preferable. The primer layer 30 containing such a substance exhibits better adhesion to both the adhesive layer 20 and the photocatalyst layer 40.

  The thickness of the primer layer 30 is preferably 0.01 μm to 5 μm, and more preferably 0.05 μm to 2 μm. If it is thinner than 0.01 μm, sufficient adhesion performance cannot be obtained, and there is no block property to protect the base material layer from the oxidative decomposition reaction by the photocatalyst. Even if it is thicker than 5 μm, almost no improvement in block property is observed, and the material is wasted, which is not preferable from the viewpoint of economy.

(Photocatalyst layer 40)
The photocatalyst layer 40 contains photocatalyst particles and preferably a binder, and is laminated on the primer layer 30 so that the surface of the photocatalyst layer 40 is exposed to the outside air. Examples of the photocatalyst contained in the photocatalyst layer 40 include metal oxides such as titanium dioxide, zinc oxide, tin oxide, lead oxide, ferric oxide, dibismuth trioxide, tungsten trioxide, and strontium titanate. Of these, titanium dioxide is preferable because it is harmless, chemically stable, and inexpensive. As titanium dioxide, any of anatase type titanium dioxide, rutile type titanium dioxide and brookite type titanium dioxide can be used. Among these, the main component is a highly active anatase-type titanium dioxide having a photocatalytic reaction, but two or more of these may be included.

  The particle diameter of the photocatalyst particles is not particularly limited, but the average particle diameter determined by the dynamic scattering measurement method is preferably 1 nm to 500 nm, more preferably 3 nm to 300 nm. The particle size is not necessarily a single particle, and there may be two or more peaks in the particle size distribution.

  As described above, the photocatalyst layer 40 preferably contains a binder. The binder has an effect of allowing the photocatalyst in the photocatalyst layer 40 to exist stably. The photocatalyst layer 40 also has a function of firmly bonding to the primer layer 30. The binder used in the present invention is not particularly limited as long as it can stabilize the photocatalyst particles and can satisfactorily bond the photocatalyst layer 40 and the primer layer 30, but zirconia, amorphous titanium oxide, titanium peroxide, alkoxy Those containing at least one of silane, acrylic-modified silicon, and alkyl titanate are preferable. Among these, an alkoxysilane, in particular, a tetraalkoxysilane, and among them, one containing at least one of tetramethoxysilane and tetraethoxysilane is preferable. By using such a substance as a binder, the photocatalytic layer 40 having good adhesiveness can be obtained.

  The content ratio of the photocatalyst particles and the binder in the photocatalyst layer 40 is preferably contained so that the binder is 10% by mass or more and less than 60% by mass with respect to the photocatalyst particles. If the binder is too much, the photocatalytic activity is not sufficient, and if the binder is too little, the adhesiveness between the photocatalyst particles and the adhesiveness between the photocatalyst layer 40 and the primer layer 30 are not preferable.

  The thickness of the photocatalyst layer 40 is preferably 0.05 μm to 5 μm, and more preferably 0.1 μm to 2 μm. If it is thinner than 0.05 μm, sufficient photocatalytic activity may not be obtained. On the other hand, if it is thicker than 5 μm, the coating speed may be lowered, and further, the photocatalytic activity is hardly improved, and the catalyst cost may be deteriorated.

  Si such as acryl-modified silicon, silicon-modified acryl, and silica contained in the primer layer 30 and the binder contained in the photocatalyst layer 40 attract each other at the interface between the primer layer 30 and the photocatalyst layer 40 to form a siloxane bond (Si Those which form a crosslink by forming (-O-Si) are preferred. By forming the bond, the photocatalyst layer 40 and the primer layer 30 are strongly bonded, and deterioration of the layer such as peeling can be suppressed.

<Method for producing photocatalytic resin substrate>
The method for laminating the adhesive layer 20, the primer layer 30, and the photocatalyst layer 40 is not particularly limited as long as it can be laminated with a predetermined thickness. Specifically, coating liquids for applying the adhesive layer 20, the primer layer 30, and the photocatalyst layer 40 are respectively prepared, and adhered onto the substrate 10 using a method such as gravure coating, spray coating, dip coating, or the like. The method of laminating | stacking the layer 20, the primer layer 30, and the photocatalyst layer 40 in order is mentioned. Further, on the release film, the photocatalyst layer 40, the primer layer 30, and the adhesive layer 20 are laminated in this order and integrated, and then transferred onto the substrate 10 and subjected to heat and pressure treatment so as to be integrated onto the substrate 10. Alternatively, a method of stacking the respective layers may be used.

  The composition and concentration of the coating liquid are not particularly limited, and may be appropriately adjusted according to the purpose. Examples of the solvent for the coating liquid include water and organic solvents, but are not particularly limited. What is necessary is just to determine suitably in consideration of drying time etc. Specifically, water, monohydric lower alcohols such as methyl alcohol, ethyl alcohol and isopropyl alcohol, polyhydric alcohols such as ethylene glycol and propylene glycol, and their esters, Cellsolve, ethyl acetate, methyl isobutyl ketone Isobutanol, methyl ethyl ketone, toluene, xylene and the like can be used.

  In preparing the photocatalyst coating liquid, it is preferable to coexist with a dispersion stabilizer in order to prevent change in particle size and sedimentation due to particle aggregation. The dispersion stabilizer can coexist from the time of adjusting the particles, or may be added when adjusting the photocatalyst coating liquid. As the dispersion stabilizer, various chemicals can be used, but since titanium dioxide tends to aggregate near neutrality, an acidic or alkaline dispersion stabilizer is preferable. Examples of the acidic dispersion stabilizer include mineral acids such as nitric acid and hydrochloric acid, and organic acids such as carboxylic acid, oxycarboxylic acid and polycarboxylic acid. Examples of the alkaline dispersion stabilizer include one or more compounds selected from carboxylic acids, alkali metal salts of polycarboxylic acids and ammonia, primary to quaternary amines, and alkanolamines having a hydroxyl group added thereto. As mentioned. In particular, the use of an organic acid is preferable because it has good miscibility with an organic solvent described later, is not extremely low in pH, and does not easily corrode equipment used in production. As the organic acid, acetic acid, oxalic acid, glycolic acid, lactic acid, tartaric acid, malic acid, citric acid and the like can be preferably used, and the dispersion can be stabilized with one or more kinds of acids selected from these.

  Moreover, when adjusting the photocatalyst coating liquid, the photocatalyst can be mixed in a powder state, but can also be added and mixed in a slurry or sol state with less sedimentation. Further, commercially available titanium dioxide slurry or sol may be used as long as necessary physical properties are satisfied.

  The composition of the coating liquid containing the photocatalyst particles is not particularly limited, but those containing the photocatalyst particles in a solid content concentration of 2 to 30% by mass, particularly 5 to 20% by mass are preferable. If it is less than 2%, the effect of the photocatalyst after coating may be small and the effect of preventing stains may not be sufficient, and if it exceeds 30%, the stability of the coating solution may be lowered and the pot life may be lowered. Moreover, it is preferable that 0.04-40 mass%, especially 1-2 mass% is contained in the coating liquid, and the component provided with the Si-O bond becomes 10 mass% or more and less than 25 mass% with respect to a photocatalyst. It is preferable to be included.

  Alternatively, the layers may be aged for the required time after the layers are stacked and the drying is completed. Thereby, the peeling strength of the coated film can be improved. It is preferable to perform aging at 40 to 60 degreeC for 24 hours or more.

Example 1
A non-stretched PP resin substrate (thickness 50 μm) is coated with a urethane resin-containing adhesive “PDV medium (manufactured by Inktec Co., Ltd.): urethane resin content of about 50%” by a gravure roll coater and dried. A primer “Tynoc Primer A (manufactured by Taki Chemical Co., Ltd.): 2% by mass of silica, 8% by mass of acrylic resin” was applied with a gravure roll coater and dried. “CZK-MP3” was applied by a gravure roll coater and dried. The coating thickness of the adhesive layer was 5 g / m ² , the drying temperature was 120 ° C., and the drying time was 30 seconds. The layer thickness after drying was 5 μm. The application thickness of the primer layer and the photocatalyst layer was 2 g / m ² , the drying temperature was 135 ° C., and the drying time was 60 seconds. Each layer thickness after drying was 2 μm.

(Comparative Example 1)
Comparative Example 1 is obtained by removing the adhesive layer from Example 1. That is, a primer “Tynoc Primer A (manufactured by Taki Chemical Co., Ltd.)” was applied to an unstretched PP resin substrate (thickness 50 μm) with a gravure roll coater, dried, and then the same as in Example 1 The photocatalyst layer was applied and dried. The drying temperature, drying time, coating thickness, and layer thickness after drying were all the same as in Example 1.

(Comparative Example 2)
An acrylic resin-containing adhesive “LR-1065 (manufactured by Mitsubishi Rayon Co., Ltd.)” is applied on an unstretched PP resin base material with a gravure roll coater and dried, and then a primer “Tynoc Primer A (Taki Chemical) The photocatalyst coat “CZK-MP3 (manufactured by Taki Chemical Co., Ltd.)” was further applied and dried by a gravure roll coater. The drying temperature, drying time, coating thickness, and layer thickness after drying were all the same as in Example 1.

(Comparative Example 3)
A non-stretched PP resin base material is coated with a vinyl acetate resin-containing adhesive “Konishi CX-50 (manufactured by Konishi Co., Ltd.)” using a gravure roll coater, dried, and a primer “Tynoc Primer A” is gravured thereon. After applying by a roll coater and drying, a photocatalyst coat “CZK-MP3 (manufactured by Taki Chemical Co., Ltd.)” was further applied thereon and dried by a gravure roll coater. The drying temperature, drying time, coating thickness, and layer thickness after drying were all the same as in Example 1.

(Comparative Example 4)
An epoxy resin-containing adhesive “Acmex ER-6661FA / B (manufactured by Nippon Synthetic Chemical Industry Co., Ltd.)” is applied to an unstretched PP resin substrate with a gravure roll coater and dried. "A (manufactured by Taki Chemical Co., Ltd.)" was applied with a gravure roll coater and dried, and then a photocatalyst coat "CZK-MP3 (manufactured by Taki Chemical Co., Ltd.)" was applied thereon with a gravure roll coater and dried. The drying temperature, drying time, coating thickness, and layer thickness after drying were all the same as in Example 1.

(Evaluation 1)
Based on JIS K5600, the peeling test was done by the cross-cut method. The results are shown in Table 1.

(Evaluation 2: Film strength test)
Repetitive scratching was carried out while applying a pressure of 9.8 × 10 ⁴ Pa to the plastic eraser on the photocatalyst layer side surface of the laminate prepared in the above Examples and Comparative Examples. AA when the film has not disappeared after 200 scratches, A when the film disappears after 100 to 200 scratches, B when the film disappears after 50 to 99 scratches, less than 50 times C was defined as the film disappeared by scratch. The results are shown in Table 1.

(Evaluation 3: Emboss transferability)
The laminates produced in the above examples and comparative examples were embossed. An embossing machine consisting of a metal engraving roll with a temperature of 40 ° C. and a pressure roll coated with semi-hard rubber is installed between the doubling device with a heating drum temperature of 140 ° C. and a cooling drum, and a satin with an arithmetic average roughness Ra of 10 μm The embossed pattern was embossed, and the embossing transferability of the sheet obtained by the embossing was examined. Specifically, the ratio of the arithmetic average roughness Ra of the sheet to the Ra of the engraving roll is calculated in%, 80% or less is x, 80 to 90% or more is Δ, 90 to 100% is ○. did.

(Evaluation results)
About Example 1, it turns out that favorable film | membrane intensity | strength is shown from the result of Evaluation 1 and Evaluation 2. Moreover, it turns out that it has favorable emboss transferability from the result of evaluation 3. On the other hand, from Comparative Example 1 to 4, it can be seen from the results of Evaluation 1 that peeling is observed at each layer interface, and from the results of Evaluation 2, the film strength is inferior and the emboss transferability is also inferior. From this, it was confirmed that Example 1 according to the present invention was a photocatalyst resin substrate excellent in both film strength and emboss transferability.

  While the present invention has been described in connection with embodiments that are presently the most practical and preferred, the present invention is not limited to the embodiments disclosed herein. However, the present invention can be appropriately changed without departing from the gist or concept of the invention that can be read from the claims and the entire specification, and a photocatalyst resin substrate with such a change is also included in the technical scope of the present invention. It must be understood as a thing.

It is a schematic diagram which shows the layer structure of the photocatalyst resin base material of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Resin base material containing olefin resin 20 Adhesive layer 30 Primer layer 40 Photocatalyst layer 100 Photocatalyst resin base material

Claims (3)

An adhesive layer, a primer layer, and a photocatalyst layer are laminated in this order on a resin substrate containing an olefin resin, and the adhesive layer contains a urethane resin,
A photocatalyst resin base material, characterized in that the surface is embossed. The photocatalyst resin base material according to claim 1, wherein the primer layer contains silica and an acrylic resin. The photocatalyst resin base material according to claim 1, wherein the primer layer contains acrylic-modified silicon.

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