JP2009271474A - Color filter substrate, method for producing the same and liquid crystal display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem, wherein at least one or more kinds of colored layers are formed on a translucent substrate, and in a boundary region at which the adjoining colored layers are interposed each other, the arrangement of a photospacer is difficult, the problem where this tends to be the cause of disturbance in liquid crystal alignment and the problem where the fracture of a transparent electrode and the increase of resistance are generated. <P>SOLUTION: On a translucent substrate, at least, a light-shielding pattern, one or more kinds of colored layers, a resin layer so as to cover the boundary region at which the adjoining colored layers are superimposed and first columnar projections are formed. The first columnar projections are formed on each resin layer, and also, each resin layer and each first columnar projection are integrated. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a color filter substrate provided with a photo spacer used in a liquid crystal display device.

  In a liquid crystal display device, a liquid crystal is sandwiched between a pair of translucent substrates. A driving circuit such as a TFT is formed on one light-transmitting substrate, and a light-shielding film, a color filter, and the like are formed on the other light-transmitting substrate. As the liquid crystal display device becomes larger, it is necessary to accurately maintain a distance of several μm between the translucent substrates (hereinafter referred to as cell gap). Therefore, conventional resin or glass bead spacers are dispersed in the liquid crystal. The method of holding is shifting to a method of forming columnar protrusions made of a resin composition by a photolithography technique (see, for example, Patent Document 1 and Patent Document 2).

  In a liquid crystal display device using a method of dispersing beads, light leaks through the spacer beads during black display or liquid crystal alignment is disturbed in the vicinity of the beads, resulting in a decrease in contrast and display image quality. was there. On the other hand, protrusions formed by photolithography technology, so-called photo spacers, have a degree of freedom of arrangement, uniformity of height, do not move in the liquid crystal, and less contamination in the process. It has many advantages over the bead dispersion method and is usually disposed above the color filter layer on the color filter substrate side. This is because it can be manufactured in the same process as the color filter manufacturing.

On the other hand, in the color filter substrate, a colored layer composed of three colors of red, green, and blue is generally arranged in an appropriate pattern such as a linear shape or a triangle arrangement on the translucent substrate. First, a light shielding pattern serving as a partition weir for partitioning colored pixels and preventing color mixture is formed on a translucent substrate. As the light shielding layer material, a metal thin film or a black photosensitive resin composition is used, and a pattern is formed by a conventional photolithography method. Subsequently, a green photosensitive resin composition is applied, and this is also patterned, for example, in a linear manner by a photolithography method to form a green colored layer. This process can be repeated for the red and blue photosensitive resin compositions to obtain a color filter substrate in which green, red and blue colored layers are arranged.
JP 2001-201750 A JP 2003-186021 A

  The photo spacer method is certainly a desirable method, but it is more desirable to provide the photo spacer in the light shielding pattern portion not used for display than in the colored layer portion used for display as a pixel. However, since the light shielding pattern portion is actually a boundary portion where the edges of the adjacent colored layers meet, a projection called a horn step is generated due to the edge of the colored layer overlapping the light shielding pattern. In addition, since the size of the light-transmitting substrate is increased and the exposure accuracy is lowered, a convex portion where edges of adjacent colored layers overlap each other or a dent where the colored layer edges are separated from each other is generated. It will exhibit a structure. Accordingly, in general, the photo spacers are not arranged on the uneven portions, and there is a problem that even if arranged, the height varies and it is not practical.

Further, in such a boundary region, there is a problem that the alignment process after forming the color filter and the transparent electrode is not sufficiently performed and becomes incomplete, the liquid crystal alignment is disturbed, and it spreads to the vicinity of the pixel. Furthermore, if a step occurs at the overlapping edge of the colored layer and the cross section becomes vertical or inversely tapered, the film quality of the transparent electrode layer formed in the subsequent process becomes non-uniform and the electrical resistance on the color filter substrate side increases. In addition, there is a problem that cracks and the like are caused in the transparent electrode layer due to stress concentration.

  Therefore, the present invention has a problem that it is difficult to dispose a photo spacer at the boundary portion where the edges of the colored layer meet on the light shielding pattern, a problem that the liquid crystal alignment is easily disturbed, and a breakage of the transparent electrode layer. An object of the present invention is to provide a color filter substrate that solves the problem of increased resistance.

    According to a first aspect of the present invention, there is provided a resin layer and the resin layer on a translucent substrate so as to cover at least a light shielding pattern, one or more colored layers, and a boundary region where the adjacent colored layers meet. A color filter substrate having a first columnar protrusion formed thereon, and the resin layer and the first columnar protrusion being integrated.

  The second invention according to claim 2 is characterized in that a second columnar protrusion having a height different from that of the first columnar protrusion is further formed on the resin layer. It is a color filter substrate as described.

  According to a third aspect of the present invention, in the color filter according to the first or second aspect, the light-shielding pattern is formed below a boundary region where the adjacent colored layers meet. It is a substrate.

  According to a fourth aspect of the present invention, a part of the colored layer is a transparent layer, and the first and / or second columnar protrusions are also formed on the resin layer on the transparent layer. The color filter substrate according to claim 1, wherein the color filter substrate is a color filter substrate.

  According to a fifth aspect of the present invention, a transparent electrode is laid on an upper portion of the resin layer other than the first and / or second columnar protrusions. 5. The color filter substrate according to any one of 4 above.

  A sixth aspect of the invention according to claim 6 is characterized in that the resin layer and the first and / or second columnar protrusions are formed in a lump. The manufacturing method of the color filter board | substrate of description.

  A seventh invention according to claim 7 uses the color filter substrate according to any one of claims 1 to 5 or the color filter substrate manufactured by the manufacturing method according to claim 6. The liquid crystal display device.

  According to the present invention, since the photo spacer is disposed in the light shielding pattern region, the display image quality of the liquid crystal display device is not affected. In addition, unlike the case where the photo spacer is formed on a base material made of a different material, the photo spacer is formed of the same material integrally with the base, and thus has excellent durability and cushioning properties. Furthermore, since there is no disorder of liquid crystal alignment near the display pixel and there is no disconnection of the transparent electrode, a liquid crystal display device with excellent display quality can be provided.

  Hereinafter, an example of the configuration and manufacturing method of the color filter substrate according to the present invention will be described with reference to FIGS.

  First, a black photosensitive resin composition is applied on the light-transmitting substrate 1, dried (FIG. 1 (a)), and then exposed to a predetermined pattern using a photomask 10 (FIG. 1 (b)). The light shielding pattern 2 is formed by performing development and post-baking (FIG. 1C). The film thickness of the light shielding pattern 2 is desirably set to a desired film thickness by estimating the required optical density from the amount of carbon black contained, and is generally about 1 to 2 μm. The light-shielding pattern 2 may be formed by applying a coating method such as a spin coating method, a slit coating method, or a bar coating method, followed by patterning using a photolithography method, an inkjet method, a printing method, or the like. It is also possible to form a pattern directly using it.

  The translucent substrate 1 includes inorganic glass such as quartz glass, borosilicate glass, and soda glass, plastic substrates such as PET, PES, and PC, or silicon oxide, aluminum oxide, silicon nitride on these glass substrates or plastic substrates. Those obtained by forming an inorganic thin film such as silicon oxynitride can be used depending on the purpose and application of use.

  Next, a colored layer 3 to be a color filter is formed on the translucent substrate 1 on which the light shielding pattern 2 is formed. The colored layer 3 is composed of pixels of a plurality of colors, and examples of the color include a combination of red, green, and blue (RGB) or a combination of yellow, magenta, and cyan (YMC). As a manufacturing method of the colored layer 3, a colored layer is formed by a coating method such as a slit coating method, a spin coating method, or a roll coating method, and then patterned by a photolithography method, or an inkjet method, a gravure printing method, a flexographic printing method. Can be used. However, in consideration of high definition, controllability and reproducibility of spectral characteristics, a transparent colored resin composition dispersed in an appropriate solvent together with pigments, photoinitiators, polymerizable monomers, etc. in a transparent resin is transparent. A coating layer is formed on a substrate to form a colored layer of a specific color, and this colored layer is subjected to pattern exposure and development to form a colored pixel of a specific color, and this process is repeated for the required number of colors. The photolithographic method as a filter is most preferable.

  Specifically, first, after applying and drying a red negative photosensitive resin composition (FIG. 1 (d)), pattern exposure is performed using a photomask 10 having openings corresponding to the pattern of the red colored layer. Then (FIG. 1 (e)), the red colored layer 31 can be formed (FIG. 1 (f)) by performing the usual development and post-bake treatment. Thereafter, by repeating the steps of FIGS. 1D to 1F for three colors, the color filter substrate 20 on which the green colored layer 32 and the blue colored layer 33 are formed can be obtained (FIG. 1G). )). The coating thickness of each color is usually about 1 to 2 μm after pre-baking considering the spectral transmittance and the like. An alkaline aqueous solution is used as the developer. Examples of the alkaline aqueous solution include a sodium carbonate aqueous solution, a sodium hydrogen carbonate aqueous solution, a mixed aqueous solution of the two, or a mixture obtained by adding an appropriate surfactant to them. After development, it is washed with water and dried to obtain a colored pattern or colored pixels of a specific color.

  The photosensitive colored resin composition for the light-shielding pattern 2 and the colored layers 31, 32, and 33 is obtained by dispersing a pigment serving as a colorant, a photoinitiator, a polymerizable monomer, and the like in a transparent resin with an appropriate solvent. To manufacture. There are various methods such as mill base, three rolls, jet mill and the like, and there are no particular limitations. An example of the raw material of the photosensitive colored resin composition that can be used in the present invention will be described in the following order including the steps.

<Light shielding material>
As the light shielding material, metal oxides and pigments such as carbon black, titanium oxide, titanium oxynitride, and iron tetroxide, and other known light shielding materials can be used. Further, in order to adjust the color tone of the light shielding layer, the following complementary color pigments may be mixed as necessary.

<Coloring pigment>
Examples of the red coloring composition for forming a red coloring layer or a red pixel include C.I. I. Pi
gment Red 7, 9, 14, 41, 48: 1, 48: 2, 48: 3, 48: 4, 81: 1, 81: 2, 81: 3, 97, 122, 123, 146, 149, 168, 177, 178, 179, 180, 184, 185, 187, 192, 200, 202, 208, 210, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 246, 254, 255, Red pigments such as H.264, 272, and 279 can be used. A yellow pigment and an orange pigment can be used in combination with the red coloring composition.

Examples of yellow pigments include C.I. I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 6
0, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 144, 146, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214 and the like. Examples of orange pigments include C.I. I. Pigment Orange 36, 43, 51, 55, 59, 61, 71, 73 and the like.

  Examples of the green coloring composition include C.I. I. Green pigments such as Pigment Green 7, 10, 36, and 37 can be used. The green coloring composition can be used in combination with the same yellow pigment as the red coloring composition.

  Examples of the blue coloring composition include C.I. I. Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, 80, etc., preferably C.I. I. Pigment Blue 15: 6 can be used. In addition, C.I. I. Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 42, 50 and the like, preferably C.I. I. Pigment Violet 23 can be used in combination.

  In combination with the above-described coloring composition or organic pigment, an inorganic pigment can also be used in combination in order to ensure good coatability, sensitivity, developability and the like while balancing saturation and lightness. Inorganic pigments include yellow lead, zinc yellow, red bean (red iron oxide (III)), cadmium red, ultramarine, bitumen, chromium oxide green, cobalt green and other metal oxide powders, metal sulfide powders, metal powders, etc. Can be mentioned. Furthermore, for color matching, a dye can be contained in a range that does not lower the heat resistance.

<Transparent resin>
The transparent resin is a resin having a transmittance of preferably 80% or more, more preferably 95% or more in a wavelength region of 400 to 700 nm in the visible light region. The transparent resin includes a thermoplastic resin, a thermosetting resin, and a photosensitive resin. If necessary, the transparent resin can be used alone or in admixture of two or more monomers or oligomers that are precursors thereof that are cured by irradiation with radiation to produce a transparent resin.

Examples of the thermoplastic resin include butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, polyurethane resin, and polyester resin. , Acrylic resins, alkyd resins, polystyrene, polyamide resins, rubber resins, cyclized rubber resins, celluloses, polyethylene, polybutadiene, polyimide resins, and the like. Examples of the thermosetting resin include epoxy resins, benzoguanamine resins, rosin-modified maleic acid resins, rosin-modified fumaric acid resins, melamine resins, urea resins, and phenol resins.

  Examples of the photosensitive resin include (meth) acrylic compounds having a reactive substituent such as an isocyanate group, an aldehyde group, and an epoxy group on a linear polymer having a reactive substituent such as a hydroxyl group, a carboxyl group, or an amino group, A resin obtained by reacting an acid and introducing a photocrosslinkable group such as a (meth) acryloyl group or a styryl group into the linear polymer is used. Further, a linear polymer containing an acid anhydride such as a styrene-maleic anhydride copolymer or an α-olefin-maleic anhydride copolymer is converted into a (meth) acrylic compound having a hydroxyl group such as hydroxyalkyl (meth) acrylate. Half-esterified products are also used.

  Polymerizable monomers and oligomers include methyl (meth) acrylate, ethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, cyclohexyl (meth) acrylate, β-carboxyethyl (meta ) Acrylate, diethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, penta Erythritol tri (meth) acrylate, 1,6-hexanediol diglycidyl ether di (meth) acrylate, bisphenol A diglycidyl ether di (meth) acrylate Neopentyl glycol diglycidyl ether di (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tricyclodecanyl (meth) acrylate, ester acrylate, methylolated melamine (meth) acrylate, epoxy (meth) acrylate, Various acrylic esters and methacrylic esters such as urethane acrylate, (meth) acrylic acid, styrene, vinyl acetate, hydroxyethyl vinyl ether, ethylene glycol divinyl ether, pentaerythritol trivinyl ether, (meth) acrylamide, N-hydroxymethyl (meth) Examples include acrylamide, N-vinylformamide, acrylonitrile and the like. These can be used alone or in admixture of two or more.

When curing by ultraviolet irradiation, a photopolymerization initiator or the like is added. Examples of the photopolymerization initiator include 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- Acetophenone compounds such as hydroxycyclohexyl phenyl ketone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyl Benzoin compounds such as dimethyl ketal, benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4-benzoyl-4 ' Benzophenone-based compounds such as methyldiphenyl sulfide, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4- Thioxanthone compounds such as diisopropylthioxanthone and 2,4-diethylthioxanthone, 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p- Methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2-piperonyl-4,6-bis ( Trichloromethyl) -s-triazine, 2,4-bis (trichloro) Methyl) -6-styryl-s-triazine, 2- (naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxy-naphth-1-yl) -4 , 6-Bis (trichloromethyl) -s-triazine, 2,4-trichloromethyl- (piperonyl) -6-triazine, 2,4-trichloromethyl (4′-methoxystyryl) -6-triazine 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)], O- (acetyl) -N- (1-phenyl-2-oxo-2- (4 ′ -Methoxy-naphthyl) ethylidene) oxime ester compounds such as hydroxylamine, bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide, 2,4,6-to Phosphine compounds such as methylbenzoyldiphenylphosphine oxide, quinone compounds such as 9,10-phenanthrenequinone, camphorquinone, and ethylanthraquinone, borate compounds, carbazole compounds, imidazole compounds, titanocene compounds, and the like are used. . These photopolymerization initiators can be used alone or in combination. The amount of the photopolymerization initiator used is preferably 0.5 to 50% by weight, more preferably 3 to 30% by weight, based on the total solid content of the colored composition.

  Further, as sensitizers, triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 2-Ethylhexyl 4-dimethylaminobenzoate, N, N-dimethylparatoluidine, 4,4′-bis (dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, 4,4′-bis (ethylmethyl) Amine-based compounds such as amino) benzophenone can also be used in combination. These sensitizers can be used alone or in combination. The amount of the sensitizer used is preferably 0.5 to 60% by weight, more preferably 3 to 40% by weight based on the total amount of the photopolymerization initiator and the sensitizer.

  Furthermore, a polyfunctional thiol that functions as a chain transfer agent can be contained. The polyfunctional thiol may be a compound having two or more thiol groups. For example, hexanedithiol, decanedithiol, 1,4-butanediol bisthiopropionate, 1,4-butanediol bisthioglycolate, ethylene Glycol bisthioglycolate, ethylene glycol bisthiopropionate, trimethylolpropane tristhioglycolate, trimethylolpropane tristhiopropionate, trimethylolpropane tris (3-mercaptobutyrate), pentaerythritol tetrakisthioglycolate, Pentaerythritol tetrakisthiopropionate, trimercaptopropionic acid tris (2-hydroxyethyl) isocyanurate, 1,4-dimethylmercaptobenzene, 2,4,6-trimercap -s- triazine, 2- (N, N- dibutylamino) -4,6-dimercapto -s- triazine. These polyfunctional thiols can be used alone or in combination. The amount of the polyfunctional thiol used is preferably 0.1 to 30% by weight, more preferably 1 to 20% by weight based on the total solid content of the colored composition. If it is less than 0.1% by mass, the effect of adding a polyfunctional thiol is insufficient, and if it exceeds 30% by mass, the sensitivity is too high and the resolution is lowered.

  Moreover, an organic solvent can be contained as needed. Examples of the organic solvent include cyclohexanone, ethyl cellosolve acetate, butyl cellosolve acetate, 1-methoxy-2-propyl acetate, diethylene glycol dimethyl ether, ethylbenzene, ethylene glycol diethyl ether, xylene, ethyl cellosolve, methyl-n amyl ketone, propylene glycol monomethyl ether toluene, Examples include methyl ethyl ketone, ethyl acetate, methanol, ethanol, isopropyl alcohol, butanol, isobutyl ketone, petroleum solvent, and the like. These may be used alone or in combination.

  A photosensitive colored resin composition was prepared using the above materials, and the colored layers 31, 32, and 33 were patterned as described above, and then the colored layer pattern was observed. Then, in the upper part of the light shielding pattern where adjacent colored layers meet each other, as shown in FIG. 2, the colored layer 3 rides on the light shielding pattern 2 so that the protrusions 301 called horn steps and the colored layers ride on each other and overlap. Various uneven structures such as the convex portion 302 generated by the above and the concave portion 303 in which the colored layers do not overlap with each other to form a gap are exhibited. In addition, a region having a reverse tapered shape 9 was found when the colored layers having a forward tapered shape overlap each other if formed on a flat surface (FIG. 2B). In this portion, the transparent electrode to be formed later is disconnected, and the electrical resistance value on the surface of the color filter is likely to increase. Moreover, since stress tends to concentrate in such a part, it can be predicted that the panel quality is surely deteriorated by cracks occurring in the transparent electrode film in the heating / cooling process after the transparent electrode forming process.

  Therefore, in the present invention, the boundary portion where the colored layers meet is flattened by covering with a resin layer. The area to be covered may be determined according to the design of the panel. However, when the colored layer 3 and the colored layer 3 ′ are formed in a linear shape, the boundary area portion where the colored layers 3 and 3 ′ meet is As shown in FIG. 3A in a plan view and in FIG. 3B in a cross-sectional view, the resin layer 4 may be covered in a linear shape. The range covered by the resin layer 4 needs to cover at least the boundary region where the colored layers meet, but it is preferable to be within a range approximately equal to the width of the light shielding pattern 2. However, when the columnar protrusions 6 to be described later are disposed, the resin layer 4 at that portion may exceed the width of the light shielding pattern. Further, it is not always necessary to cover the entire boundary region.

  The columnar protrusions 6 for holding the cell gap when the panels are bonded together are formed on the resin layer 4 formed along the light shielding pattern 2. As the order of forming the columnar protrusions 6, after forming the resin layer 4, a pattern may be formed again at a predetermined position on the resin layer 4 using a photocurable resin. In addition, by patterning the resin layer 4 by providing a mosaic-shaped opening, a half-tone, a gray-tone, etc., and a portion where the amount of transmitted light is partially adjusted, and exposing and developing through this photomask, The columnar protrusions 6 can also be formed by patterning all at once (FIG. 1 (h)). This method can significantly reduce the man-hours and the amount of material used. In addition, by forming them integrally in a lump, there is no problem of the adhesion of the columnar protrusions 6 to the resin layer 4, and a strong columnar protrusion can be formed over the entire surface. Furthermore, since the thickness of the resin layer 4 is the lower layer of the columnar protrusion 6 as a base layer, there is an advantage that the base portion becomes a cushion layer and the elastic characteristics of the columnar protrusion 6 are improved.

  Further, as shown in FIG. 3B, when the transparent layer 5 for increasing the external light reflectance is formed on the colored layer 3 in the transflective color filter substrate for a liquid crystal display device, Already part of the boundary area between the colored layer 3 and the colored layer 3 ′ is covered with the transparent layer, but the resin layer 4 is formed by extending the resin layer 4 linearly on the light shielding pattern 2 and also on the transparent layer 5 It is desirable to do. Also in this case, the linear resin layer 4 and the columnar protrusion 6 are formed in a lump. Further, if necessary, columnar protrusions 61 having different heights can be additionally formed.

<Resin materials, etc.>
The material of the resin layer 4 and the columnar protrusions 6 and 61 is preferably a photosensitive resin, and a commercially available photosensitive resin such as an acrylic resin, a novolac resin, an epoxy resin, or a polyimide resin can be used. As a forming method, a material is applied using a coating method such as a slit coating method, a spin coating method, a dip coating method, a roll coating method, a laminating method, or a transfer method, and then patterned using a photolithography method. Although the film thickness of the columnar protrusion 6 varies depending on the method of the liquid crystal display device, it is about 3 to 5 μm from the colored layer surface.

<Solvent for resin>
There is no restriction | limiting in particular as a solvent of the said photosensitive resin, n-butyl alcohol, ethylene glycol monoethyl ether, ethylene glycol diethyl ether, ethylene glycol monomethyl ether, ethylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monomethyl ether Acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, N, N-dimethylformamide, 1, 2, 3-trichloropropane, o-chlorotoluene, o- Silene, m-xylene, 3-methoxy-3-methyl-1-butanol, 1,3-butanediol, 3-methyl-1,3-butanediol, 2-methyl-1,3-propanediol, diisobutyl ketone, Ethylene glycol monobutyl ether, ethylene glycol monohexyl ether, ethylene glycol monobutyl ether acetate, ethylene glycol dibutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol diethyl ether, diethylene glycol monoisopropyl ether, propylene glycol monobutyl ether, propylene glycol diacetate, Dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether Dipropylene glycol monopropyl ether, dipropylene glycol dimethyl ether, tripropylene glycol monomethyl ether, ethyl 3-ethoxypropionate, 3-methoxybutyl acetate, 3-methoxy-3-methylbutyl acetate, γ-butyrolactone, N 2, N-dimethyl Acetamide, N-methylpyrrolidone, p-chlorotoluene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, o-dichlorobenzene, m-dichlorobenzene, n-butylbenzene, sec-butylbenzene, tert-butylbenzene, cyclo Hexanol, methylcyclohexanol, 2-heptanone, 4-heptanone, cyclohexanone, n-butyl acetate, isobutyl acetate, isoamyl acetate, n-amyl acetate, Chill isobutyl ketone can be used as a mixture one or more, more preferably comprises boiling point one or more 140 ° C. to 250 DEG ° C. of the solvent, it is possible to adjust the viscosity and leveling properties. In addition to these solvents, surfactants, silane coupling agents, dispersants, stabilizers, and the like may be added for the purpose of improving coatability, adhesion, storage stability, and the like.

  Next, the transparent electrode layer 7 is formed (FIG. 1 (i)). Here, when the columnar protrusions 6 and the lower resin layer 4 are formed in a lump, the columnar protrusions 6 exist before the transparent electrode layer 7 is formed, but the second columnar shape is different from the columnar protrusions 6 in height. The protrusion 61 may be formed before or after the transparent electrode layer 7. The second columnar protrusion 61 may be higher or lower than the first columnar protrusion 6, but the height difference is approximately 0.2 to 1.0 μm. In terms of surface.

  However, since the transparent electrode layer 7 has conductivity, if the transparent electrode layer 7 is formed on the columnar protrusions 6 and 61, the transparent electrode layer 7 is electrically connected to the counter electrode when the panels are bonded together. It is necessary to remove the upper transparent electrode layer by an etching method or the like to form a gap 8 (FIG. 1 (j)). At this time, the range for removing the transparent electrode layer 7 by the etching method is achieved if at least the columnar protrusions are removed, but the purpose is achieved, but by removing a part of the transparent electrode layer on the colored layer 3 by removing it larger. (FIG. 1 (k)), it was found that the alignment of liquid crystal molecules can be controlled at the gap 8 and the display quality of the panel is greatly improved. The shape of the gap 8 may be a ◯ shape, a ◇ shape, or a □ shape as necessary. FIG. 1 (k) is a plan view of the portion of the gap 8 in FIG. 1 (j).

  Further, when the transparent layer 5 is formed on a part of the colored layer 3, the transparent electrode layer 7 formed on at least the columnar protrusion 6 is similarly applied to the columnar protrusion 6 formed on the transparent layer 5. It is necessary to remove the gap 8 and to adjust the size and shape of the gap in order to control the liquid crystal alignment.

  The material of the transparent electrode layer 7 is not particularly limited as long as both conductivity and transparency are compatible, but general indium tin oxide, aluminum zinc oxide, and indium zinc oxide can be suitably used. The film thickness is 100 to 200 nm. As a film forming method, an evaporation method, a plasma assisted evaporation method, a sputtering method, a CVD method, an ion plating method, or the like can be used depending on the material.

  After applying non-alkali glass as the translucent substrate 1 and applying a black photosensitive resin composition in which carbon black is dispersed in a photosensitive acrylic resin using a spin coating method and pre-baking on a hot plate. Then, a predetermined pattern exposure and alkali development were performed with a photomask, and post-baking was performed to obtain a patterned light-shielding pattern 2 having a thickness of 1 μm.

  Next, the red photosensitive resin composition in which a red pigment or the like is dispersed in a photosensitive acrylic resin is applied using a spin coating method, prebaked on a hot plate, and then predetermined with a photomask 10. By performing pattern exposure and alkali development, and post-baking, the red colored layer 31 and the green colored layer 32 and the blue colored layer 33 are sequentially formed in the same process, whereby the film thickness is 1.5 μm. A color filter composed of layer 3 was formed.

  Next, after applying a negative photosensitive acrylic resin by spin coating, a line is formed on the boundary portion where the two colored layers 31, 32, and 33 on the light shielding pattern 2 are associated with each other by photolithography. The resin layer 4 was formed into a pattern. At this time, a linear opening pattern is formed in the photomask. Further, the photomask is provided with a pattern such as a circular pattern or a quadrangular pattern larger than the linear opening pattern at a portion where the columnar protrusion is to be formed. Thus, the columnar protrusions 6 were collectively formed at predetermined locations on the linear resin layer 4 while forming the linear resin layer pattern.

  Next, as the transparent electrode layer 5, 0.14 μm of indium tin oxide is laminated using a sputtering method, and then the base portion of the columnar protrusion 6 and a part of the colored layer 3 are exposed using an aqueous iron chloride solution. The transparent electrode layer 5 was removed to form a gap 8.

  When a liquid crystal display device was manufactured using this color filter substrate, the disorder of the liquid crystal alignment in the boundary region of the colored layer was suppressed, and the liquid crystal was uniformly aligned by the fine gaps provided around the columnar protrusions, thereby displaying It was found that the liquid crystal display device was excellent in quality.

(A)-(j) It is sectional drawing which shows an example of the manufacturing method of the color filter substrate which comprises the columnar protrusion which becomes this invention. (K) is a plan view of (j). (A), (b) It is sectional drawing explaining typically the mode of the colored layer of the boundary part where the colored layer of a light shielding pattern upper part meets. (A)-(c) The figure of the planar view explaining arrangement | positioning and shape of the columnar protrusion of a transparent layer upper part, and the figure of sectional view in XX 'and YY'.

Explanation of symbols

1: translucent substrate 2: light shielding pattern 3: colored layer 31: R colored layer 32: G colored layer 33: B colored layer 301: horn step 302: protrusion 303: concave portion 4: linear resin layer 5: transparent layer 6 : (First) columnar protrusion 61: second columnar protrusion 7: transparent electrode layer 8: gap between transparent electrode layers 10: photomask 20: color filter

Claims (7)

  On the translucent substrate, at least a light shielding pattern, at least one colored layer, a resin layer covering a boundary region where the adjacent colored layers meet, a first columnar protrusion is formed on the resin layer, and The color filter substrate, wherein the resin layer and the first columnar protrusion are integrated.   The color filter substrate according to claim 1, wherein a second columnar protrusion having a height different from that of the first columnar protrusion is further formed on the resin layer.   The color filter substrate according to claim 1, wherein the light shielding pattern is formed below a boundary region where the adjacent colored layers meet.   A part of the colored layer is a transparent layer, and the first and / or second columnar protrusions are also formed on a resin layer on the transparent layer. Item 4. The color filter substrate according to any one of Items 3 to 3.   5. The color filter substrate according to claim 1, wherein a transparent electrode is laid on an upper portion of the resin layer other than the first and / or second columnar protrusions. .   The method for manufacturing a color filter substrate according to any one of claims 1 to 5, wherein the resin layer and the first and / or second columnar protrusions are formed in a lump. ,
A liquid crystal display device using the color filter substrate according to any one of claims 1 to 5 or the color filter substrate manufactured by the manufacturing method according to claim 6.

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