JP2009271253A5 - - Google Patents

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Publication number
JP2009271253A5
JP2009271253A5 JP2008120530A JP2008120530A JP2009271253A5 JP 2009271253 A5 JP2009271253 A5 JP 2009271253A5 JP 2008120530 A JP2008120530 A JP 2008120530A JP 2008120530 A JP2008120530 A JP 2008120530A JP 2009271253 A5 JP2009271253 A5 JP 2009271253A5
Authority
JP
Japan
Prior art keywords
resist composition
immersion exposure
cyclic ketone
chain ether
exposure according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008120530A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009271253A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008120530A priority Critical patent/JP2009271253A/ja
Priority claimed from JP2008120530A external-priority patent/JP2009271253A/ja
Publication of JP2009271253A publication Critical patent/JP2009271253A/ja
Publication of JP2009271253A5 publication Critical patent/JP2009271253A5/ja
Pending legal-status Critical Current

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JP2008120530A 2008-05-02 2008-05-02 液浸露光用レジスト組成物及びそれを用いたパターン形成方法 Pending JP2009271253A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008120530A JP2009271253A (ja) 2008-05-02 2008-05-02 液浸露光用レジスト組成物及びそれを用いたパターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008120530A JP2009271253A (ja) 2008-05-02 2008-05-02 液浸露光用レジスト組成物及びそれを用いたパターン形成方法

Publications (2)

Publication Number Publication Date
JP2009271253A JP2009271253A (ja) 2009-11-19
JP2009271253A5 true JP2009271253A5 (enExample) 2011-04-21

Family

ID=41437867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008120530A Pending JP2009271253A (ja) 2008-05-02 2008-05-02 液浸露光用レジスト組成物及びそれを用いたパターン形成方法

Country Status (1)

Country Link
JP (1) JP2009271253A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5540757B2 (ja) * 2010-02-18 2014-07-02 Ｊｓｒ株式会社 重合体の製造方法
JP5761175B2 (ja) * 2010-03-17 2015-08-12 Jsr株式会社 感放射線性樹脂組成物及びレジストパターン形成方法
JP2022088041A (ja) 2020-12-02 2022-06-14 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006098733A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4774302B2 (ja) * 2005-01-24 2011-09-14 富士フイルム株式会社 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP2007017889A (ja) * 2005-07-11 2007-01-25 Fujifilm Corp レジスト組成物及び該レジスト組成物を用いたパターン形成方法
JP4524237B2 (ja) * 2005-09-28 2010-08-11 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP2007140188A (ja) * 2005-11-18 2007-06-07 Fujifilm Corp ポジ型感光性組成物及びそれを用いたパターン形成方法
JP4991326B2 (ja) * 2006-01-24 2012-08-01 富士フイルム株式会社 ポジ型感光性組成物及びそれを用いたパターン形成方法

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