JP2009252550A - Contact material, and manufacturing method thereof - Google Patents

Contact material, and manufacturing method thereof Download PDF

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JP2009252550A
JP2009252550A JP2008099423A JP2008099423A JP2009252550A JP 2009252550 A JP2009252550 A JP 2009252550A JP 2008099423 A JP2008099423 A JP 2008099423A JP 2008099423 A JP2008099423 A JP 2008099423A JP 2009252550 A JP2009252550 A JP 2009252550A
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JP5116538B2 (en
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Takefumi Ito
武文 伊藤
Tomokazu Yoshida
友和 吉田
Taigen Kin
太▲げん▼ 金
Toshinori Kimura
俊則 木村
Shinichi Miki
真一 三木
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Mitsubishi Electric Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a contact material for combining cut-off performance, withstand voltage performance and weld releasing performance, and to provide a manufacturing method thereof. <P>SOLUTION: The contact material consists of Cu, Cr, Te. Cr particles, Cu-Cr-Te particles in which Te-Cu-Cr phases and Cu-Te phases are mixed, and Cr-Te particles are dispersed in a base material mainly consisting of Cu, where Te-containing phases are formed in particle boundaries between the base material and the Cr particles and a Cr content is 40-50 mass%, a Te content is 0.1-2.0 mass%, and the rest is Cu. In the manufacturing method, mixed powder is filled in a sintering mold, and pulse energization pressure sintering is applied thereto at a temperature of 700-1,080°C and a pressure of 30-200 MPa. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は接点材料およびその製造方法に関し、特に真空遮断器等に用いられる真空バルブ用に適した接点材料およびその製造方法に関するものである。   The present invention relates to a contact material and a manufacturing method thereof, and more particularly to a contact material suitable for a vacuum valve used for a vacuum circuit breaker and the like and a manufacturing method thereof.

遮断器、特に真空遮断器の大容量化、高耐圧化、小型化への要求が一段と厳しくなっており、真空遮断器の中に搭載されている真空バルブの性能向上が望まれている。真空バルブは、高真空に保たれた絶縁容器内に固定電極と可動電極が同軸上に対向配置されており、可動電極はベローズを介して操作機構部に接続され、軸方向に移動するようになっていて、過負荷電流や短絡電流が発生した場合、電極を瞬時に開極して遮断する。このような真空バルブの固定電極と可動電極の接触部分に使用されている接点材料には、主に遮断性能、耐電圧性能、低溶着力性能が要求されている。   The demand for larger capacity, higher pressure resistance, and smaller size of circuit breakers, especially vacuum circuit breakers, has become more severe, and it is desired to improve the performance of vacuum valves mounted in vacuum circuit breakers. In a vacuum valve, a fixed electrode and a movable electrode are coaxially opposed to each other in an insulating container maintained at a high vacuum, and the movable electrode is connected to an operation mechanism unit via a bellows so as to move in an axial direction. When an overload current or a short circuit current occurs, the electrode is instantaneously opened and cut off. The contact material used in the contact portion between the fixed electrode and the movable electrode of such a vacuum valve is mainly required to have a breaking performance, a withstand voltage performance, and a low welding power performance.

しかし、これらの要求特性は接点材料に対して互いに相反する性質を要求するので、接点材料を単一材料で製造することは困難であって、従来から二種以上の元素を組み合わせた材料からなる接点材料が使用されている。真空バルブ用接点材料としては、遮断性能と耐電圧性能に優れるCu−Cr材料が知られている(例えば特許文献1)。また、Cu−Cr材料を低溶着力化させるためにTeを添加した接点材料が提案されている(例えば特許文献2)。   However, since these required characteristics require mutually contradictory properties for the contact material, it is difficult to manufacture the contact material from a single material, and conventionally, it is made of a material combining two or more elements. Contact material is used. As a contact material for a vacuum valve, a Cu—Cr material excellent in breaking performance and withstand voltage performance is known (for example, Patent Document 1). In addition, a contact material to which Te is added in order to reduce the welding force of the Cu—Cr material has been proposed (for example, Patent Document 2).

特公昭54−71375号公報 (第1頁右欄の下から7行目〜第2頁左上欄の下から4行目)JP-B-54-71375 (7th line from the bottom of the right column on page 1 to 4th line from the bottom of the top left column on page 2) 特開2006−140073号公報 (第2頁 請求項2)JP 2006-140073 A (page 2 claim 2)

真空バルブ等に用いられる接点材料は、短時間電流通電時に発生するジュール熱、または電流遮断時に発生するアーク熱などにより接点表面が溶融し、その後に凝固して溶着が発生する。従来のCu−Cr材料は溶着力が大きく、溶着した接点を引き外すために操作力が大きな機構部を真空遮断器に設ける必要があった。そのため、接点材料には溶着しても引き外し易い材料、あるいは溶着し難い材料が求められている。Cu−Cr材料にTeを含有させたものは、母材のCuを脆くして溶着引き外し力を低減する効果があることは従来から知られている。しかし、通電時のジュール熱や電流遮断時のアーク熱により、Teが蒸発して真空バルブ内を汚損して真空度を低下させ、耐電圧性能の低下や遮断性能が不安定になるという問題がある。   In contact materials used for vacuum valves and the like, contact surfaces are melted by Joule heat generated when current is applied for a short time or arc heat generated when current is interrupted, and then solidified to cause welding. The conventional Cu—Cr material has a large welding force, and it is necessary to provide a mechanism having a large operating force in the vacuum circuit breaker in order to remove the welded contact. For this reason, there is a demand for a material that can be easily removed even after welding or a material that is difficult to weld. It has been conventionally known that Cu—Cr material containing Te has an effect of making the base material Cu brittle and reducing the welding tear-off force. However, due to Joule heat during energization and arc heat during current interruption, Te evaporates and fouls the inside of the vacuum valve, lowering the degree of vacuum, resulting in reduced withstand voltage performance and unstable interruption performance. is there.

一方、従来の焼結法は、Cr量が40質量%より多い場合では焼結性が悪く緻密化が困難で、ガス含有量が多いために遮断性能の低下が問題であった。また、溶浸法は加熱・溶浸工程でTeが蒸発し、接点材料の組成ずれや組成のバラツキが発生する問題があった。   On the other hand, in the conventional sintering method, when the Cr content is more than 40% by mass, the sinterability is poor and densification is difficult, and the gas content is large, so that the interruption performance is deteriorated. Further, the infiltration method has a problem that Te evaporates in the heating / infiltration process, resulting in a composition deviation of the contact material and a variation in composition.

本発明は上記のような問題点を解決するためになされたものであり、本発明の目的は、溶着引き外しが容易な接点材料を提供することである。本発明の他の目的は、遮断性能、耐電圧性能に優れ、しかも溶着引き外しが容易な接点材料およびその製造方法を提供することである。   The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a contact material that can be easily removed by welding. Another object of the present invention is to provide a contact material that is excellent in breaking performance and withstand voltage performance and that can be easily removed by welding and a method for manufacturing the contact material.

本発明の第一の接点材料は、Cu母材中にCrとTeを含む接点材料において、Cr−Te粒子を含むことを特徴とするものである。   A first contact material of the present invention is characterized in that a contact material containing Cr and Te in a Cu base material contains Cr—Te particles.

本発明の第二の接点材料は、Cu母材中にCrとTeを含む接点材料において、Cr粒子、上記母材と上記Cr粒子との粒界に形成されたTe含有相を含むことを特徴とするものである。   A second contact material of the present invention is a contact material containing Cr and Te in a Cu base material, and includes a Cr-containing particle and a Te-containing phase formed at a grain boundary between the base material and the Cr particle. It is what.

本発明の第三の接点材料は、Cu母材中にCr粒子、Te−Cu−Cr相とCu−Te相とが混在したCu−Cr−Te粒子、Cr−Te粒子、および上記Cu母材と上記Cr粒子との粒界に形成されたTe含有相を含むことを特徴とするものである。   The third contact material of the present invention includes a Cu base material, Cr particles, Cu—Cr—Te particles in which a Te—Cu—Cr phase and a Cu—Te phase are mixed, Cr—Te particles, and the above Cu base material. And a Te-containing phase formed at a grain boundary with the Cr particles.

本発明の接点材料の製造方法は、平均粒径が35μm以上150μm以下の範囲のCr粉末を40質量%以上50質量%以下の範囲、平均粒径が1μm以上100μm以下の範囲のTe粉末を0.1質量%以上2質量以下の範囲、および平均粒径が1μm以上75μm以下の範囲のCu粉末を残部とする混合物を焼結型に充填して700℃以上1080℃以下、30MPa以上200MPa以下の範囲の圧力下で加圧焼結を行うことを特徴とするものである。   In the method for producing a contact material of the present invention, Cr powder having an average particle size of 35 μm or more and 150 μm or less is in a range of 40% by mass or more and 50% by mass or less, and Te powder having an average particle size of 1 μm or more and 100 μm or less is 0 A mixture containing Cu powder with a balance of 1% by mass to 2% by mass and an average particle size of 1 μm to 75 μm as a balance is charged into a sintered mold to be 700 ° C. or higher and 1080 ° C. or lower, 30 MPa or higher and 200 MPa or lower. The pressure sintering is performed under a pressure in the range.

本発明の上記第一および第二の接点材料は、いずれも優れた溶着引き外し性を実現し得るという効果があって、低い操作力でも溶着引き外しが可能となる効果があり、本発明の上記第三の接点材料は、遮断性能と耐電圧性能を確保しながら優れた溶着引き外し性を実現し得るという効果があって、真空バルブに本発明の上記接点材料を使用した場合、従来よりも短い電極間距離で遮断性能と耐電圧性能を確保でき、しかも低い操作力でも溶着引き外しが可能となる効果がある。本発明の接点材料の製造方法は、かかる高性能の接点材料を製造し得る効果がある。   Both the first and second contact materials of the present invention have the effect of being able to realize excellent welding and tearing-out properties, and have the effect of being able to be removed by welding with a low operating force. The third contact material has an effect that it can realize excellent welding / detachability while ensuring the breaking performance and withstand voltage performance, and when the contact material of the present invention is used for a vacuum valve, In addition, it is possible to ensure the breaking performance and the withstand voltage performance with a short distance between the electrodes, and to have the effect that the welding can be removed with a low operating force. The contact material manufacturing method of the present invention is effective in manufacturing such a high-performance contact material.

実施の形態1.
図1および図2は、本発明の実施の形態1を説明するものであって、図1は本発明の接点材料の一例の断面図であり、図2は当該接点材料を有する遮断器の一例として真空遮断器に搭載される真空バルブを示す断面図である。
Embodiment 1 FIG.
1 and 2 illustrate Embodiment 1 of the present invention. FIG. 1 is a cross-sectional view of an example of a contact material of the present invention, and FIG. 2 is an example of a circuit breaker having the contact material. It is sectional drawing which shows the vacuum valve mounted in a vacuum circuit breaker.

図2において、真空バルブ8の遮断室9は円筒状に形成された絶縁材料製の絶縁容器10と、この両端に封止金具11a、11bを介して設けた金属製蓋12a、12bとで構成され、遮断室9内は真空気密となっている。遮断室9内の固定電極棒13と可動電極棒14の端部には、固定電極15と可動電極16が対向するようにロウ付けにより取り付けられている。固定電極15の接触部には固定接点17が、また可動電極15の接触部には可動接点18がロウ付けにより取り付けられている。可動電極棒14にはベローズ19が取り付けられ、遮断室9の内部を真空気密に保持しながら、可動電極16の軸方向の移動を可能にしている。上記の固定接点17および可動接点18は、本発明の接点材料にて形成されており、共に同材料からなっている。   In FIG. 2, the shut-off chamber 9 of the vacuum valve 8 is constituted by an insulating container 10 made of an insulating material formed in a cylindrical shape, and metal lids 12a and 12b provided at both ends via sealing metal fittings 11a and 11b. The inside of the shut-off chamber 9 is vacuum-tight. The fixed electrode 15 and the movable electrode 16 are attached to the ends of the fixed electrode rod 13 and the movable electrode rod 14 in the blocking chamber 9 by brazing so as to face each other. A fixed contact 17 is attached to the contact portion of the fixed electrode 15, and a movable contact 18 is attached to the contact portion of the movable electrode 15 by brazing. A bellows 19 is attached to the movable electrode rod 14 to allow the movable electrode 16 to move in the axial direction while keeping the inside of the shut-off chamber 9 vacuum-tight. The fixed contact 17 and the movable contact 18 are made of the contact material of the present invention, and both are made of the same material.

固定電極15と可動電極16は平板電極の他にも、遮断性能を上げるためにスパイラル状の溝を切ったスパイラル電極、カップ状の接点に溝を付けたコントレート電極、電極間に発生するアークと並行に磁界を与える縦磁界電極が用いられる。ベローズ19の上部には金属製のベローズ用アークシールド20が設けられている。ベローズ用アークシールド20は、発弧域より発生した金属蒸気がベローズ19に付着することを防止している。また、固定電極15と可動電極16を覆うように、遮断室9内に金属製の絶縁容器用アークシールド21が設けられ、これにより発弧域より発生する金属蒸気が絶縁容器10の内面に付着することを防止している。この真空バルブの開閉操作は、図示しない駆動機構に連結された可動電極棒14を介して行われる。   In addition to the flat plate electrode, the fixed electrode 15 and the movable electrode 16 include a spiral electrode with a spiral groove cut to improve the blocking performance, a control electrode with a cup-shaped contact groove, and an arc generated between the electrodes. A longitudinal magnetic field electrode that applies a magnetic field in parallel with the magnetic field is used. A metal bellows arc shield 20 is provided on the top of the bellows 19. The bellows arc shield 20 prevents metal vapor generated from the arcing region from adhering to the bellows 19. In addition, a metal insulating container arc shield 21 is provided in the shutoff chamber 9 so as to cover the fixed electrode 15 and the movable electrode 16, whereby metal vapor generated from the arcing region adheres to the inner surface of the insulating container 10. To prevent it. The opening / closing operation of the vacuum valve is performed via a movable electrode rod 14 connected to a driving mechanism (not shown).

図1において、Cuを主体とした母材(以下Cu母材)1中には、Cr粒子(右下がり線のハッチングを施したもの)2、Cu−Te相3とTe−Cu−Cr相4とが混在したCu−Cr−Te粒子5、およびCr−Te粒子6(左下がり線のハッチングを施したもの)とが分散した状態で存在しており、さらに母材1と各Cr粒子2との各粒界にはTe含有相7(太黒線で示す)が存在している。   In FIG. 1, in a base material 1 (hereinafter referred to as Cu base material) 1 mainly composed of Cu, there are Cr particles (things with hatching of the right-down line) 2, Cu-Te phase 3 and Te-Cu-Cr phase 4. Cu—Cr—Te particles 5 and Cr—Te particles 6 (having a left-down line hatching) dispersed therein, and the base material 1 and each of the Cr particles 2 Te-containing phases 7 (shown by thick black lines) are present at each grain boundary.

次に本発明の接点材料の組成に就き説明する。上記第一〜上記第三の各接点材料におけるCu母材1としては、Cu原料に含まれている微量の不可避の不純物、例えばAg、Al、Fe、Si、P、O、N、Hなどを各0.01質量%未満であればそれらを含有するものであってもよい。   Next, the composition of the contact material of the present invention will be described. As the Cu base material 1 in each of the first to third contact materials, a small amount of inevitable impurities contained in the Cu raw material, such as Ag, Al, Fe, Si, P, O, N, and H, are included. If each is less than 0.01 mass%, you may contain them.

また上記第一〜上記第三の各接点材料において、Cr含有量は40質量%〜50質量%であることが好ましく、Cr量が40質量%未満では耐電圧性能が不十分であり50質量%を超えると遮断性能は低下する。一方、Te含有量は0.1質量%以上2質量%以下であることが好ましい。Te量が0.1質量%未満では、溶着引き外し性が乏しく、2質量%を越える場合では溶着引き外し性は向上するが材料自体が脆くなり接点材料としては実用上で不適当である。   In the first to third contact materials, the Cr content is preferably 40% by mass to 50% by mass. If the Cr content is less than 40% by mass, the withstand voltage performance is insufficient and 50% by mass. If it exceeds, the shut-off performance decreases. On the other hand, the Te content is preferably 0.1% by mass or more and 2% by mass or less. When the amount of Te is less than 0.1% by mass, the weldability is poor, and when it exceeds 2% by mass, the weldability is improved, but the material itself becomes brittle and is unsuitable for practical use as a contact material.

本発明の上記第一の接点材料においては、さらにCr−Te粒子の平均径が5μm以下であり、かつ接点材料の全断面積中に占める前記Cr−Te粒子の平均面積が上記全断面積の0.5面積%以下であるものが好ましい。なお上記平均径が過小であると溶着引き外し性が乏しくなる点で問題があり、一方、平均径が過大であると耐電圧性能のバラツキが大きくなる点で問題があり、Cr−Te粒子の占める全面積が前記断面の全面積に対して過小であると溶着引き外し性が乏しくなる点で問題があり、一方、過大であると耐電圧性能のバラツキが大きくなる点で問題があるので、上記Cr−Te粒子の平均径は0.1μm以上5μm以下、Cr−Te粒子の上記平均面積は、上記全断面積の0.001面積%以上0.5面積%以下のものが特に好ましい。   In the first contact material of the present invention, the average diameter of the Cr—Te particles is 5 μm or less, and the average area of the Cr—Te particles in the total cross-sectional area of the contact material is the total cross-sectional area. What is 0.5 area% or less is preferable. In addition, if the average diameter is too small, there is a problem in that the weld-peelability becomes poor. On the other hand, if the average diameter is too large, there is a problem in that the variation in withstand voltage performance is large. If the total area occupied is too small with respect to the total area of the cross section, there is a problem in that the weldability is poor, whereas if it is excessive, there is a problem in that the variation in withstand voltage performance is large, The average diameter of the Cr—Te particles is 0.1 μm or more and 5 μm or less, and the average area of the Cr—Te particles is particularly preferably 0.001 area% or more and 0.5 area% or less of the total cross-sectional area.

本発明の上記第二の接点材料においては、さらに上記Te含有相は、その平均厚みが5μm以下、Te含有量が90質量%以下のものが好ましく、平均厚みが過小であると溶着引き外し性が乏しくなる点で問題があり、一方、平均厚みが過大であると耐電圧性能のバラツキが大きくなる点で問題があり、含有量が過小であると溶着引き外し性が乏しくなる点で問題があり、一方、含有量が過大であると材料自体が脆くなる点で問題があるので、上記Te含有相は、その平均厚みが0.1μm以上5μm以下、Te含有量が50質量%以上90質量%以下のものが特に好ましい。   In the second contact material of the present invention, the Te-containing phase further preferably has an average thickness of 5 μm or less and a Te content of 90% by mass or less. On the other hand, if the average thickness is excessively large, there is a problem in that the variation in withstand voltage performance is large, and if the content is too small, the problem is that the weldability is poor. On the other hand, if the content is excessive, there is a problem in that the material itself becomes brittle. Therefore, the Te-containing phase has an average thickness of 0.1 to 5 μm and a Te content of 50 to 90% by mass. % Or less is particularly preferred.

本発明の上記第三の接点材料においては、上記Cr粒子、Te−Cu−Cr相とCu−Te相とが混在したCu−Cr−Te粒子、Cr−Te粒子、および上記Cu母材と上記Cr粒子との粒界に形成されたTe含有相を含むが、上記Cr−Te粒子およびTe含有相の両方を含むことにより、前記した両方の顕著な効果が得られる。その際、Cr含有量が40質量%以上50質量%以下の範囲、Te含有量が0.1質量%以上2質量%以下の範囲である。なおCr含有量とTe含有量の好ましい範囲と理由については前記の通りである。   In the third contact material of the present invention, the Cr particles, Cu—Cr—Te particles in which Te—Cu—Cr phase and Cu—Te phase are mixed, Cr—Te particles, and the Cu base material and the above The Te-containing phase formed at the grain boundary with the Cr particles is included, but by including both the Cr-Te particles and the Te-containing phase, the above-described remarkable effects can be obtained. In that case, Cr content is the range of 40 mass% or more and 50 mass% or less, and Te content is the range of 0.1 mass% or more and 2 mass% or less. In addition, about the preferable range and reason of Cr content and Te content are as above-mentioned.

Cr粒子は、その平均粒径が過小であると耐電圧性能が低下する点で問題があり、一方、平均粒径が過大であると遮断性能のバラツキが大きくなる点で問題がある。また、Cr粒子の面積比が過少であると耐電圧性能が不十分であり、過多であると遮断性能は低下する点で問題がある。そのため、Cr粒子の平均粒径は150μm以下で、好ましくは平均粒径が35μm以上150μm以下である。かつ接点材料の全断面積中に占める上記Cr粒子の平均面積が上記全断面積の55面積%以下で、好ましくは45面積%以上55面積%以下である。   If the average particle diameter is too small, the Cr particles have a problem in that the withstand voltage performance is lowered. On the other hand, if the average particle diameter is too large, there is a problem in that the variation in the breaking performance increases. Further, when the area ratio of the Cr particles is too small, the withstand voltage performance is insufficient, and when it is excessive, there is a problem in that the blocking performance is lowered. Therefore, the average particle diameter of Cr particles is 150 μm or less, preferably the average particle diameter is 35 μm or more and 150 μm or less. The average area of the Cr particles in the total cross-sectional area of the contact material is 55 area% or less, preferably 45 area% or more and 55 area% or less of the total cross-sectional area.

Cu−Cr−Te粒子は、その平均粒径が過小であると溶着引き外し性が低下する点で問題があり、一方、平均粒径が過大であると耐電圧性能のバラツキが大きくなる点で問題があり、含有量が過少であると溶着引き外し性が低下する点で問題があり、一方、含有量が過多であると耐電圧性能のバラツキが大きくなる点で問題がある。そのため、上記Cu−Cr−Te粒子の平均粒径は100μm以下で、好ましくは平均粒径が1μm以上100μm以下である。かつ接点材料の全断面積中に占める上記Cu−Cr−Te粒子の平均面積が上記全断面積の2.5面積%以下であり、好ましくは0.1面積%以上2.5面積%以下である。なおCu−Cr−Te粒子中におけるTe−Cu−Cr相とCu−Te相との存在量比に就いては特に制限はなく、後記する本発明の接点材料の製造方法で生じる存在量比であってよく、そのTe−Cu−Cr相の面積1に対してCu−Te相の面積は0.3〜1.2程度である。   Cu-Cr-Te particles have a problem in that if the average particle size is too small, the weld-peeling property is deteriorated. On the other hand, if the average particle size is too large, the variation in withstand voltage performance increases. There is a problem, and if the content is too small, there is a problem in that the weldability is reduced. On the other hand, if the content is excessive, there is a problem in that the variation in withstand voltage performance becomes large. Therefore, the average particle diameter of the Cu—Cr—Te particles is 100 μm or less, and preferably the average particle diameter is 1 μm or more and 100 μm or less. And the average area of the said Cu-Cr-Te particle which occupies in the total cross-sectional area of contact material is 2.5 area% or less of the said total cross-sectional area, Preferably it is 0.1 area% or more and 2.5 area% or less is there. In addition, there is no restriction | limiting in particular about the abundance ratio of the Te-Cu-Cr phase and Cu-Te phase in Cu-Cr-Te particle, It is the abundance ratio which arises with the manufacturing method of the contact material of this invention mentioned later. The area of the Cu—Te phase is about 0.3 to 1.2 with respect to the area 1 of the Te—Cu—Cr phase.

Cr−Te粒子は、その平均粒径が過小であると溶着引き外し性が乏しくなる点で問題があり、一方、平均粒径が過大であると耐電圧性能のバラツキが大きくなる点で問題がある。Cr−Te粒子の占める全面積が前記断面の全面積に対して過少であると溶着引き外し性が乏しくなる点で問題があり、一方、過多であると耐電圧性能のバラツキが大きくなる点で問題がある。そのため、上記Cr−Te粒子の平均粒径は5μm以下であり、好ましくは0.1μm以上5μm以下である。Cr−Te粒子の平均面積が上記全断面積の0.5面積%以下で、好ましくは上記全断面積の0.001面積%以上0.5面積%以下である。   If the average particle size is too small, Cr-Te particles have a problem in that the ability to weld and peel becomes poor. On the other hand, if the average particle size is too large, there is a problem in that the variation in withstand voltage performance increases. is there. If the total area occupied by the Cr-Te particles is too small with respect to the total area of the cross section, there is a problem in that the weldability is poor, whereas if it is excessive, the variation in withstand voltage performance becomes large. There's a problem. Therefore, the average particle diameter of the Cr—Te particles is 5 μm or less, preferably 0.1 μm or more and 5 μm or less. The average area of the Cr—Te particles is 0.5 area% or less of the total cross-sectional area, preferably 0.001 area% or more and 0.5 area% or less of the total cross-sectional area.

Te含有相は、平均厚みが過小であると溶着引き外し性が乏しくなる点で問題があり、一方、平均厚みが過大であると耐電圧性能のバラツキが大きくなる点で問題があり、含有量が過小であると溶着引き外し性が乏しくなる点で問題があり、一方、含有量が過大であると材料自体が脆くなる点で問題がある。そのため、上記Te含有相は、平均厚みが5μm以下、好ましくは平均厚みが0.1μm以上5μm以下である。また、Te含有量が90質量%以下で、好ましくはTe含有量が50質量%以上90質量%以下である。   The Te-containing phase has a problem in that if the average thickness is too small, the welding and peeling property is poor. On the other hand, if the average thickness is too large, there is a problem in that the variation in withstand voltage performance becomes large. If the content is too small, there is a problem in that the weldability of the weld becomes poor. On the other hand, if the content is excessive, there is a problem in that the material itself becomes brittle. Therefore, the Te-containing phase has an average thickness of 5 μm or less, preferably an average thickness of 0.1 μm or more and 5 μm or less. Moreover, Te content is 90 mass% or less, Preferably Te content is 50 to 90 mass%.

また、本発明の上記した各接点材料は、真空バルブ用接点材料として使用され場合、高真空中で使用されるため、接点材内部の残留ガスが少なく、密度比は理論密度に近い方が好ましく、特に、性能に悪影響を与えない90%以上の密度比を有するものが好ましい。なお上記密度比は、下式から求める。
密度比=(焼結体の密度/組成分析値から求めた接点材料の理論密度)×100
Further, when each of the above contact materials of the present invention is used as a contact material for a vacuum valve, it is used in a high vacuum. Therefore, the residual gas inside the contact material is small, and the density ratio is preferably close to the theoretical density. In particular, those having a density ratio of 90% or more that do not adversely affect performance are preferable. The density ratio is obtained from the following equation.
Density ratio = (the density of the sintered body / theoretical density of the contact material obtained from the composition analysis value) × 100

本発明において、当該接点材料に含まれるCr粒子、Cr−Te粒子、およびCu-C
r-Te粒子の各平均粒径や各平均面積、Cu−Cr−Te粒子中に含まれているCu−
Te相とTe−Cu−Cr相の平均厚さ、さらにTe含有相の平均厚さは、当該接点材料の断面を研磨し、当該研磨面を走査電子顕微鏡(SEM)により観察し、観察領域内の各粒子径、各面積、および各相の厚みを画像処理により積算し、観察領域内で割り出して各平均値を求めた。具体的には200μm角程度の観察領域をランダムに選んだ5箇所を観察し、各観察領域の粒子径、面積、および厚みの各平均値を求めた。
また、接点材料に含まれるCr粒子、Cu-Cr-Te粒子、Cr-Te粒子の含有量は、当該研磨面をSEMにより観察し、観察領域内の各粒子の全面積を画像処理により積算し、観察領域内で割り出して求めた。具体的には200μm角の観察領域をランダムに選んだ5箇所を観察し、各観察領域の各粒子の面積比(面積%)を平均して求めた。
Te含有相のTe含有量は、電子プローブマイクロアナライザ(EPMA)による波長分散型X線分光(WDS)法で定量分析を行い、Te含有相のランダムに選んだ5箇所を測定した算術平均値を質量%として求めた。
In the present invention, Cr particles, Cr-Te particles, and Cu-C contained in the contact material
Each average particle diameter and each average area of r-Te particles, Cu- contained in Cu-Cr-Te particles
The average thickness of the Te phase and the Te-Cu-Cr phase, and the average thickness of the Te-containing phase are determined by polishing the cross section of the contact material and observing the polished surface with a scanning electron microscope (SEM). Each particle diameter, area, and thickness of each phase were integrated by image processing, and calculated within the observation region to obtain each average value. Specifically, five locations where observation regions of about 200 μm square were randomly selected were observed, and average values of the particle diameter, area, and thickness of each observation region were obtained.
The content of Cr particles, Cu—Cr—Te particles, and Cr—Te particles contained in the contact material is obtained by observing the polished surface with an SEM and integrating the total area of each particle in the observation region by image processing. Determined within the observation area. Specifically, five locations where 200 μm square observation regions were randomly selected were observed, and the area ratio (area%) of each particle in each observation region was averaged.
The Te content of the Te-containing phase is the arithmetic average value obtained by conducting quantitative analysis by wavelength dispersive X-ray spectroscopy (WDS) method using an electron probe microanalyzer (EPMA) and measuring five randomly selected Te-containing phases. It calculated | required as mass%.

本発明に係る前記第一および第二の各接点材料は、各接点材料を構成する成分金属の必要量を含む組成物を温度700℃以上1080℃以下、圧力30MPa以上200MPa以下の条件で加熱焼結することにより製造することができる。その際、第一接点材料におけるCr−Te粒子の平均径と含有量とは、加熱焼結される組成物におけるCrとTeの含有量を加減することにより調節可能であり、第二接点材料におけるTe含有相の平均厚みと含有量とは、加熱焼結される組成物におけるTeの含有量を加減することにより調節可能である。一方、上記第三の接点材料の製造においてもその接点材料を構成する成分金属の必要量を含む組成物を温度700℃以上1080℃以下、圧力30MPa以上200MPa以下の条件で且つパルス通電加圧焼結することにより、Cu−Te相、Cu−Te相とTe−Cu−Cr相とが混在した粒子、Cr−Te粒子が分散し、さらにTe含有相が形成された組織を有する接点材料を製造することができる。   In each of the first and second contact materials according to the present invention, a composition containing a necessary amount of component metals constituting each contact material is heated and fired at a temperature of 700 ° C. to 1080 ° C. and a pressure of 30 MPa to 200 MPa. It can be manufactured by tying. At that time, the average diameter and content of the Cr—Te particles in the first contact material can be adjusted by adjusting the contents of Cr and Te in the composition to be heat-sintered. The average thickness and content of the Te-containing phase can be adjusted by adjusting the content of Te in the composition to be heat-sintered. On the other hand, also in the production of the third contact material, a composition containing a necessary amount of component metals constituting the contact material is subjected to pulsed electric pressure firing under conditions of a temperature of 700 ° C. to 1080 ° C., a pressure of 30 MPa to 200 MPa. By bonding, a contact material having a structure in which a Cu-Te phase, a particle in which a Cu-Te phase and a Te-Cu-Cr phase are mixed, a Cr-Te particle is dispersed and a Te-containing phase is formed is manufactured. can do.

なお、本発明に係る前記第一〜第三の各接点材料の製造において、加熱焼結時における温度が低いと、密度比90%以上の焼結体を得るために200MPa以上の高圧が必要となるが、プレス型を形成するカーボン材料の強度の観点から200MPaまでが好ましい。一方、Cuの融点である1083℃以上の温度で焼結した場合は、溶融したCuが上記プレス型の隙間に注し込み、組成ずれの原因となる。また圧力30MPa未満の低圧下で焼結した場合は、密度比90%以上の焼結体が得られない。よって、本発明に係る前記第一〜第三の各接点材料の製造においては、各接点材料を構成する成分金属の必要量を含む組成物を、温度720℃以上1000℃以下、圧力40MPa以上150MPa以下の条件、さらに温度750℃以上950℃以下、圧力50MPa以上100MPa以下の条件で加熱焼結することが好ましい。   In the production of the first to third contact materials according to the present invention, if the temperature during the heat sintering is low, a high pressure of 200 MPa or more is required to obtain a sintered body having a density ratio of 90% or more. However, up to 200 MPa is preferable from the viewpoint of the strength of the carbon material forming the press die. On the other hand, when sintering is performed at a temperature of 1083 ° C. or higher, which is the melting point of Cu, the molten Cu is poured into the gaps of the press die, causing a composition shift. Moreover, when sintered under a low pressure of less than 30 MPa, a sintered body having a density ratio of 90% or more cannot be obtained. Therefore, in the production of the first to third contact materials according to the present invention, a composition containing a necessary amount of component metals constituting each contact material is subjected to a temperature of 720 ° C. to 1000 ° C., a pressure of 40 MPa to 150 MPa. It is preferable to heat sinter under the following conditions, further, a temperature of 750 ° C. to 950 ° C. and a pressure of 50 MPa to 100 MPa.

なお第三の接点材料は、上記した温度、圧力に加えてパルス通電加圧焼結されるが、当該パルス通電加圧焼結は、斯界で多用されている周知のパルス通電加圧焼結装置を用いて行ってよい。パルス通電の好ましい条件は、例えば通電パルス電流500〜5000A、パルス間隔時間は3ms程度である。本発明においては、上記第一〜第三の各接点材料とも加熱焼結で製造した接点材料を所望の形状並びに寸法となるように成形してもよいが、被処理の混合粉を所望の形状並びに寸法のカーボン型に充填した状態で焼結すると、焼結物を直接あるいは軽度の後処理を施して実用に供し得る。次に、実施例と比較例とにより本発明を一層詳細に説明する。   Note that the third contact material is pulsed and pressurized and sintered in addition to the above temperature and pressure. The pulsed and pressurized sintering is a well-known pulsed and pressurized sintering apparatus widely used in the field. May be used. The preferable conditions for pulse energization are, for example, an energization pulse current of 500 to 5000 A and a pulse interval time of about 3 ms. In the present invention, each of the first to third contact materials may be formed so that the contact material produced by heat-sintering has a desired shape and dimensions, but the mixed powder to be processed is formed into a desired shape. In addition, when sintered in a carbon mold having a size, the sintered product can be put to practical use directly or after being subjected to a light post-treatment. Next, the present invention will be described in more detail with reference to examples and comparative examples.

実施例1.
平均粒径35μmで純度99.9質量%のCu粉末と、平均粒径40μmで純度99.9質量%のCr粉末と、平均粒径40μmで純度99.9質量%のTe粉末とを、Cuが59.5質量%、Crが40質量%、Teが0.1質量%となるように配合し、Vミキサ
ーで混合した。得られた混合粉末を内径25mmのカーボン型に充填し、そのカーボン型ごと6Paの真空中で圧力50MPa、焼結温度1050℃で60分間加圧焼結を行って、直径25mm、厚さ5mm、密度比98.5%のCu−Cr−Te接点材料を得た。当該Cu−Cr−Te接点材料に就き、前記の方法で定量分析したところ、生成したCr−Te粒子は平均粒径が0.5μmであり、その含有量は0.001面積%であった。
Example 1.
Cu powder having an average particle size of 35 μm and a purity of 99.9% by mass, Cr powder having an average particle size of 40 μm and a purity of 99.9% by mass, Te powder having an average particle size of 40 μm and a purity of 99.9% by mass, Was 59.5% by mass, Cr was 40% by mass, and Te was 0.1% by mass, and mixed by a V mixer. The obtained mixed powder was filled into a carbon mold having an inner diameter of 25 mm, and the carbon mold was subjected to pressure sintering in a vacuum of 6 Pa at a pressure of 50 MPa and a sintering temperature of 1050 ° C. for 60 minutes to obtain a diameter of 25 mm, a thickness of 5 mm, A Cu—Cr—Te contact material having a density ratio of 98.5% was obtained. When the Cu-Cr-Te contact material was quantitatively analyzed by the above-described method, the produced Cr-Te particles had an average particle size of 0.5 μm and a content of 0.001 area%.

実施例2〜4
上記実施例2から4では、Crが40質量%でTeが2質量%であり(実施例2)、Crが50質量%でTeが0.1質量%であり(実施例3)、Crが50質量%でTeが2質量%(実施例4)となるように各配合し、その後は実施例1と同条件で混合し、焼結し、得られたCu−Cr−Te接点材料を得、実施例1と同方法で定量分析した。その結果、実施例2ではCr−Te粒子は平均粒径が3μm、その含有量は0.1面積%であり、実施例3ではCr−Te粒子は平均粒径が1μm、その含有量は0.01面積%であり、実施例4ではCr−Te粒子は平均粒径が5μm、その含有量は0.3面積%であった。
Examples 2-4
In Examples 2 to 4, Cr is 40% by mass and Te is 2% by mass (Example 2), Cr is 50% by mass and Te is 0.1% by mass (Example 3). Each compound was blended so that Te would be 2% by mass (Example 4) at 50% by mass, and then mixed and sintered under the same conditions as in Example 1 to obtain the obtained Cu—Cr—Te contact material. Quantitative analysis was performed in the same manner as in Example 1. As a result, in Example 2, the average particle size of Cr—Te particles is 3 μm and the content thereof is 0.1 area%. In Example 3, the average particle size of Cr—Te particles is 1 μm and the content is 0. In Example 4, the average particle diameter of the Cr—Te particles was 5 μm, and the content thereof was 0.3 area%.

実施例1〜4の各Cu−Cr−Te接点材料に就き、下記の方法並びに条件にて溶着引き外し力(以下、溶着引外力と略称)を測定した。後記する比較例3(Cu:Cr:Te比が60:40:0のもの)の接点材料の溶着引外力は1.1kNであった。これに対し実施例1〜4のいずれもは溶着引外力が、0.5〜0.6kNの範囲であって、比較例3のそれの約1/2と小さくて引き外しが容易であった。
溶着引外力:直径20mm、厚み5mmの被試験の接点材料を組み込んだ真空バルブに30kgfの接圧を負荷し、電流12.5kAを2秒間通電し、引張試験により溶着外力を測定し評価した。
With respect to each of the Cu—Cr—Te contact materials of Examples 1 to 4, the welding trip force (hereinafter abbreviated as “welding trip force”) was measured by the following method and conditions. The welding external force of the contact material of Comparative Example 3 (with a Cu: Cr: Te ratio of 60: 40: 0) described later was 1.1 kN. On the other hand, in all of Examples 1 to 4, the welding pull-out force was in the range of 0.5 to 0.6 kN, which was as small as about 1/2 that of Comparative Example 3, and was easy to remove. .
Welding pulling force: A contact pressure of 30 kgf was applied to a vacuum valve incorporating a contact material to be tested having a diameter of 20 mm and a thickness of 5 mm, a current of 12.5 kA was applied for 2 seconds, and the welding external force was measured and evaluated by a tensile test.

実施例5〜8
平均粒径35μmで純度99.9質量%のCu粉末と、平均粒径40μmで純度99.9質量%のCr粉末と、平均粒径20μmで純度99.9質量%のTe粉末とを、Cuが59.5質量%、Crが40質量%、Teが0.1質量%(実施例5)、Teが0.5質量%(実施例6)、Teが1質量%(実施例7)、Teが2質量%(実施例8)となるようにそれぞれ配合し、Vミキサーで混合した。
Examples 5-8
Cu powder having an average particle size of 35 μm and a purity of 99.9% by mass, Cr powder having an average particle size of 40 μm and a purity of 99.9% by mass, Te powder having an average particle size of 20 μm and a purity of 99.9% by mass, 59.5% by mass, Cr 40% by mass, Te 0.1% by mass (Example 5), Te 0.5% by mass (Example 6), Te 1% by mass (Example 7), Each of them was blended so that Te was 2% by mass (Example 8), and mixed with a V mixer.

得られた各混合粉末を内径25mmのカーボン型に充填し、そのカーボン型ごと真空中で圧力50MPa、焼結温度800℃で20分間加圧焼結を行って、直径25mm、厚さ5mm、密度比98.5%の4種のCu−Cr−Te接点材料を得た。各Cu−Cr−Te接点材料に就き、前記の方法で分析したところ、生成した実施例5でのTe含有相は平均厚み0.1μmであり、そのTe含有量は85質量%、実施例6でのTe含有相は平均厚みが0.4μmであり、そのTe含有量は70質量%、実施例7でのTe含有相は平均厚みが1μmであり、そのTe含有量は60質量%、実施例8でのTe含有相は平均厚みが3μmであり、そのTe含有量は55質量%であった。   Each obtained mixed powder was filled in a carbon mold having an inner diameter of 25 mm, and the carbon mold was subjected to pressure sintering in a vacuum at a pressure of 50 MPa and a sintering temperature of 800 ° C. for 20 minutes to obtain a diameter of 25 mm, a thickness of 5 mm, and a density. Four Cu—Cr—Te contact materials with a ratio of 98.5% were obtained. When each Cu—Cr—Te contact material was analyzed by the above method, the Te-containing phase in Example 5 thus produced had an average thickness of 0.1 μm, and its Te content was 85% by mass. The Te-containing phase in Example 1 has an average thickness of 0.4 μm, the Te content is 70% by mass, the Te-containing phase in Example 7 has an average thickness of 1 μm, and the Te content is 60% by mass. The Te-containing phase in Example 8 had an average thickness of 3 μm, and the Te content was 55% by mass.

実施例5〜8の各Cu−Cr−Te接点材料に就き、前記の方法並びに条件にて溶着引外力を測定し、前記比較例3の接点材料の特性を1として相対比較したところ、実施例5〜8のいずれもは溶着引外力が、0.5〜0.6kNの範囲にあって、比較例3のそれの約1/2と小さくて引き外しが容易であった。   When each of the Cu-Cr-Te contact materials of Examples 5 to 8 was measured for welding external force by the above-mentioned method and conditions, the properties of the contact material of Comparative Example 3 were set as 1, and the relative comparison was made. In all of Nos. 5 to 8, the welding pull-out force was in the range of 0.5 to 0.6 kN, which was as small as about 1/2 of that of Comparative Example 3, and was easy to remove.

実施例9.
平均粒径35μmで純度99.9%のCu粉末と、平均粒径80μmで純度99.9質量%のCr粉末と、平均粒径40μmで純度99.9質量%のTe粉末とを、Cuが59.5質量%、Crが40.0質量%、Teが0.5質量%となるように配合し、Vミキサーで混合した。得られた混合粉末を内径25mmのカーボン型に充填し、そのカーボン型ごと真空中で焼結圧力50MPa、焼結温度800℃で20分間、ピーク電流1200A、電流パルス間隔3msの条件でパルス通電加圧焼結を行って、直径25mm、厚さ5mm、密度比99%のCu−Cr−Te接点材料を得た。
Example 9
A Cu powder having an average particle size of 35 μm and a purity of 99.9%, a Cr powder having an average particle size of 80 μm and a purity of 99.9% by mass, and a Te powder having an average particle size of 40 μm and a purity of 99.9% by mass, They were blended so that 59.5% by mass, Cr was 40.0% by mass, and Te was 0.5% by mass, and mixed by a V mixer. The obtained mixed powder is filled into a carbon mold having an inner diameter of 25 mm, and the carbon mold is subjected to pulse energization under the conditions of a sintering pressure of 50 MPa, a sintering temperature of 800 ° C. for 20 minutes, a peak current of 1200 A, and a current pulse interval of 3 ms. Pressure sintering was performed to obtain a Cu—Cr—Te contact material having a diameter of 25 mm, a thickness of 5 mm, and a density ratio of 99%.

上記接点材料に就き、湿式切断機を用いて切断し、その断面の研磨面をSEMとEPMAにより拡大し観察・分析したところ、前記図2と同様の、Cu母材中に、Cr粒子、Cu−Te相とTe−Cu−Cr相とが混在したCu−Cr−Te粒子、Cr−Te粒子とが分散した状態で存在しており、さらに母材1とCr粒子との粒界に存在しているTe含有相が観察された。このことは、後続の実施例も同様である。次に前記した画像処理による方法で上記各粒子の大きさと含有量、並びにTe含有相7の平均厚みと平均Te含有量とを定量分析した(このことは、後続の実施例でも同じである。)ところ、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、平均粒径は40μm、含有量が0.5面積%あり、Cr−Te粒子は、平均粒径は1μm、含有量が0.002面積%であり、Te含有相は、平均厚みが0.5μmであり、Te含有量が70質量%であって、密度比が99%、遮断性能が可であり、耐電圧性能が1.0であり、溶着引外力が0.5〜0.6kNであった。   The contact material was cut using a wet cutting machine, and the polished surface of the cross section was enlarged by SEM and EPMA for observation / analysis. As in FIG. 2, in the Cu base material, Cr particles, Cu -Te phase and Te-Cu-Cr phase co-existing Cu-Cr-Te particles, Cr-Te particles exist in a dispersed state, and further exist at the grain boundary between the base material 1 and Cr particles. A Te-containing phase was observed. The same applies to the subsequent embodiments. Next, the size and content of each particle and the average thickness and average Te content of the Te-containing phase 7 were quantitatively analyzed by the above-described image processing method (this is the same in the subsequent examples). However, the Cr particles have an average particle size of 80 μm and a content of 45 area%, and the Cu—Cr—Te particles have an average particle diameter of 40 μm and a content of 0.5 area%, and the Cr—Te particles The average particle diameter is 1 μm, the content is 0.002 area%, the Te-containing phase has an average thickness of 0.5 μm, the Te content is 70% by mass, the density ratio is 99%, The breaking performance was acceptable, the withstand voltage performance was 1.0, and the welding pulling external force was 0.5 to 0.6 kN.

なお本発明において、上記遮断性能および耐電圧性能は、それぞれ次ぎの方法並びに条件で測定し判定した。当該測定と判定は、後続の実施例および比較例についても同様である。
遮断性能:直径30mm、厚み5mmの被試験の接点材料を真空バルブに組み込み、接点間距離4.5mm、遮断電流12.5kAの短絡遮断試験を実施し、遮断した場合は可、遮断しなかった場合は否とした。
耐電圧性能:直径20mm、厚み5mmの被試験の接点材料を真空バルブに組み込み、接点間距離2mmでインパルス電圧試験を行い、Cu60質量%とCr40質量%とからなる後記の比較例3の接点材料の耐電圧特性を1として相対比較値で表した。
In the present invention, the breaking performance and withstand voltage performance were measured and judged by the following methods and conditions, respectively. The measurement and determination are the same for the following examples and comparative examples.
Breaking performance: A contact material to be tested having a diameter of 30 mm and a thickness of 5 mm was incorporated in a vacuum valve, and a short-circuit breaking test was performed with a distance between contacts of 4.5 mm and a breaking current of 12.5 kA. The case was rejected.
Withstand voltage performance: Contact material of a test sample having a diameter of 20 mm and a thickness of 5 mm is incorporated in a vacuum valve, an impulse voltage test is performed at a distance between contacts of 2 mm, and a contact material of Comparative Example 3 described later comprising 60 mass% Cu and 40 mass% Cr The withstand voltage characteristics were expressed as relative comparison values.

実施例10.
前記実施例9とは、Cuが59.0質量%であり、Teが1.0質量%である点のみ異なり、他は同じである配合並びに製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、平均粒径は40μm、含有量が1.3面積%あり、Cr−Te粒子は、平均粒径は3μm、含有量が0.07面積%であり、Te含有相は、平均厚みが3μmであり、Te含有量が70質量%であって、密度比が98%、遮断性能が可であり、耐電圧性能が1.1であり、溶着引外力が0.5〜0.6kNであった。
Example 10
It differs from Example 9 only in that Cu is 59.0% by mass and Te is 1.0% by mass, and the other is the same. A Cr—Te contact material was obtained. In the contact material, the Cr particles have an average particle diameter of 80 μm and the content is 45 area%, and the Cu—Cr—Te particles have an average particle diameter of 40 μm and a content of 1.3 area%. The Te particles have an average particle diameter of 3 μm and a content of 0.07 area%, the Te-containing phase has an average thickness of 3 μm, a Te content of 70% by mass, and a density ratio of 98%. The breaking performance was acceptable, the withstand voltage performance was 1.1, and the welding pulling external force was 0.5 to 0.6 kN.

実施例11.
前記実施例9とは、Cuが58.0質量%であり、Teが2.0質量%である点のみ異なり、他は同じである配合並びに製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該点材料は、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、平均粒径は40μm、含有量が2.6面積%あり、Cr−Te粒子は、平均粒径は3μm、含有量が0.1面積%であり、Te含有相は、平均厚みが3μmであり、Te含有量が70質量%であって、密度比が98%、遮断性能が可であり、耐電圧性能が1.1であり、溶着引外力が0.5〜0.6kNであった。
Example 11
It differs from Example 9 only in that Cu is 58.0% by mass and Te is 2.0% by mass, and the others are the same. A Cr—Te contact material was obtained. In the point material, the Cr particles have an average particle diameter of 80 μm and the content is 45 area%, and the Cu—Cr—Te particles have an average particle diameter of 40 μm and a content of 2.6 area%. Te particles have an average particle size of 3 μm and a content of 0.1 area%, a Te-containing phase has an average thickness of 3 μm, a Te content of 70% by mass, a density ratio of 98%, The breaking performance was acceptable, the withstand voltage performance was 1.1, and the welding pulling external force was 0.5 to 0.6 kN.

実施例12.
前記実施例9とは、Cuが54.5質量%、Crが45質量%、Teが0.5質量%である点のみ異なり、他は同じ製造条件にて直径25mm、厚さ5mm、密度比98%のCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が50面積%であり、Cu−Cr−Te粒子は、平均粒径は40μm、含有量が0.6面積%あり、Cr−Te粒子は、平均粒径は1μm、含有量が0.01面積%であり、Te含有相は、平均厚みが0.5μmであり、Te含有量が70質量%であって、密度比が98%、遮断性能が可であり、耐電圧性能が1.1であり、溶着引外力が0.5〜0.6kNであった。
Example 12
Example 9 differs from Example 9 only in that Cu is 54.5% by mass, Cr is 45% by mass, and Te is 0.5% by mass. Other than that, the diameter is 25 mm, the thickness is 5 mm, and the density ratio is the same. 98% Cu-Cr-Te contact material was obtained. In the contact material, Cr particles have an average particle diameter of 80 μm and a content of 50 area%, Cu—Cr—Te particles have an average particle diameter of 40 μm, a content of 0.6 area%, Cr— The Te particles have an average particle size of 1 μm and a content of 0.01 area%, the Te-containing phase has an average thickness of 0.5 μm, a Te content of 70% by mass, and a density ratio of 98. %, The breaking performance was acceptable, the withstand voltage performance was 1.1, and the welding pulling external force was 0.5 to 0.6 kN.

実施例13.
前記実施例9とは、Cuが49.9質量%、Crが50.0質量%、Teが0.1質量%、焼結温度が900℃、焼結圧力が80MPaである点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が55面積%であり、Cu−Cr−Te粒子は、平均粒径は40μm、含有量が0.1面積%あり、Cr−Te粒子は、平均粒径は1μm、含有量が0.01面積%であり、Te含有相は、平均厚みが0.1μmであり、Te含有量が60質量%であって、密度比が98%、遮断性能が可であり、耐電圧性能が1.3であり、溶着引外力が0.5〜0.6kNであった。
Example 13
It differs from Example 9 in that Cu is 49.9% by mass, Cr is 50.0% by mass, Te is 0.1% by mass, the sintering temperature is 900 ° C., and the sintering pressure is 80 MPa. Obtained a Cu—Cr—Te contact material having a diameter of 25 mm and a thickness of 5 mm under the same production conditions. In the contact material, Cr particles have an average particle size of 80 μm and a content of 55 area%, Cu—Cr—Te particles have an average particle diameter of 40 μm, a content of 0.1 area%, Cr— The Te particles have an average particle size of 1 μm and a content of 0.01 area%, the Te-containing phase has an average thickness of 0.1 μm, a Te content of 60% by mass, and a density ratio of 98. %, The breaking performance was acceptable, the withstand voltage performance was 1.3, and the welding pulling external force was 0.5 to 0.6 kN.

実施例14.
前記実施例9とは、Cuが48.0質量%、Crが50.0質量%、Teが2.0質量%、焼結温度が900℃、焼結圧力が80MPaである点で異なり、他は同じ製造条件にて直径25mm、厚さ5mm、密度比98%のCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が55面積%であり、Cu−Cr−Te粒子は、平均粒径は40μm、含有量が2.5面積%あり、Cr−Te粒子は、平均粒径は5μm、含有量が0.2面積%であり、Te含有相は、平均厚みが3μmであり、Te含有量が60質量%であって、密度比が98%、遮断性能が可であり、耐電圧性能が1.1であり、溶着引外力が0.5〜0.6kNであった。
Example 14
The difference from Example 9 is that Cu is 48.0% by mass, Cr is 50.0% by mass, Te is 2.0% by mass, the sintering temperature is 900 ° C., and the sintering pressure is 80 MPa. Obtained a Cu—Cr—Te contact material having a diameter of 25 mm, a thickness of 5 mm, and a density ratio of 98% under the same production conditions. In the contact material, Cr particles have an average particle diameter of 80 μm and a content of 55 area%, Cu—Cr—Te particles have an average particle diameter of 40 μm, a content of 2.5 area%, Cr— Te particles have an average particle size of 5 μm and a content of 0.2 area%, a Te-containing phase has an average thickness of 3 μm, a Te content of 60% by mass, a density ratio of 98%, The breaking performance was acceptable, the withstand voltage performance was 1.1, and the welding pulling external force was 0.5 to 0.6 kN.

実施例15.
前記実施例9とは、Cuが59.5質量%、Crが40.0質量%、Teが0.5質量%、焼結温度が950℃、焼結圧力が30MPaである点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、平均粒径は40μm、含有量が0.7面積%あり、Cr−Te粒子は、平均粒径は0.7μm、含有量が0.002面積%であり、Te含有相は、平均厚みが0.8μmであり、Te含有量が55質量%であって、密度比が98%、遮断性能が可であり、耐電圧性能が0.9であり、溶着引外力が0.5〜0.6kNであった。
Example 15.
The difference from Example 9 is that Cu is 59.5% by mass, Cr is 40.0% by mass, Te is 0.5% by mass, the sintering temperature is 950 ° C., and the sintering pressure is 30 MPa. Obtained a Cu—Cr—Te contact material having a diameter of 25 mm and a thickness of 5 mm under the same production conditions. In the contact material, Cr particles have an average particle size of 80 μm and a content of 45 area%, and Cu—Cr—Te particles have an average particle diameter of 40 μm and a content of 0.7 area%. The Te particles have an average particle size of 0.7 μm and a content of 0.002 area%, the Te-containing phase has an average thickness of 0.8 μm, a Te content of 55% by mass, and a density ratio Was 98%, the breaking performance was acceptable, the withstand voltage performance was 0.9, and the welding external force was 0.5 to 0.6 kN.

実施例16.
前記実施例9とは、Cuが59.5質量%、Crが40.0質量%、Teが0.5質量%、焼結温度が700℃、焼結圧力が70MPaである点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、平均粒径は40μm、含有量が0.7面積%あり、Cr−Te粒子は、平均粒径は0.2μm、含有量が0.001面積%であり、Te含有相は、平均厚みが0.5μmであり、Te含有量が85質量%であって、密度比が98%、遮断性能が可であり、耐電圧性能が0.9であり、溶着引外力が0.5〜0.6kNであった。
Example 16
It differs from Example 9 in that Cu is 59.5% by mass, Cr is 40.0% by mass, Te is 0.5% by mass, the sintering temperature is 700 ° C., and the sintering pressure is 70 MPa. Obtained a Cu—Cr—Te contact material having a diameter of 25 mm and a thickness of 5 mm under the same production conditions. In the contact material, Cr particles have an average particle size of 80 μm and a content of 45 area%, and Cu—Cr—Te particles have an average particle diameter of 40 μm and a content of 0.7 area%. The Te particles have an average particle size of 0.2 μm and a content of 0.001 area%, the Te-containing phase has an average thickness of 0.5 μm, a Te content of 85% by mass, and a density ratio Was 98%, the breaking performance was acceptable, the withstand voltage performance was 0.9, and the welding external force was 0.5 to 0.6 kN.

ここで、実施例10のCu−Cr−Te接点材料を代表に選んでその断面を電子顕微鏡により観察した例について述べる。材料中のTeは、本発明の製造方法により焼結することにより、TeはTe−Cu−Cr相とCu−Te相が混在したCu−Cr−Te粒子、Cu−Te相、Cr−Te粒子、さらにCu母材とCr粒子との粒界に存在するTe含有相に分散して存在し、本発明の特有の合金相が分散した組織となる。上記Cu−Cr−Te粒子は、粒径0より大きく100μm以下、Cr−Te粒子は0より大きく5μm以下であった。Cr粒子とCu母材の粒界に不連続なTe含有相が存在し、その厚さは0より大きく厚さ5μm以下であった。   Here, an example in which the Cu—Cr—Te contact material of Example 10 is selected as a representative and its cross section is observed with an electron microscope will be described. Te in the material is sintered by the manufacturing method of the present invention, and Te is Cu-Cr-Te particles, Cu-Te phases, Cr-Te particles in which Te-Cu-Cr phase and Cu-Te phase are mixed. Furthermore, it is dispersed in the Te-containing phase present at the grain boundary between the Cu base material and the Cr particles, resulting in a structure in which the unique alloy phase of the present invention is dispersed. The Cu—Cr—Te particles were larger than 0 and 100 μm or less, and the Cr—Te particles were larger than 0 and 5 μm or less. There was a discontinuous Te-containing phase at the grain boundary between the Cr particles and the Cu base material, and the thickness was greater than 0 and 5 μm or less.

また上記Cu−Cr−Te粒子の粒径は、出発原料として用いられたTe粒子径に依存して変化し、一方、単独のCu−Te相、Cr−Te粒子、Te含有相は、出発原料として用いられたTe粒子径よりも小さく、本発明におけるTe粒径、Te配合量、焼結条件に依存せず微細なサイズとなる。したがって、0より大きく5μm以下のCr−Te粒子と、厚さが0より大きく5μm以下のCr粒子とCu母材の粒界の不連続なTe含有相は安定した好ましいサイズと考えられる。   The particle size of the Cu-Cr-Te particles changes depending on the Te particle size used as the starting material, while the single Cu-Te phase, Cr-Te particles, and Te-containing phase are the starting materials. The particle size is smaller than the Te particle size used in the present invention, and becomes a fine size independent of the Te particle size, Te blending amount, and sintering conditions in the present invention. Therefore, it is considered that a Cr-Te particle having a particle size greater than 0 and not more than 5 μm, and a discontinuous Te-containing phase between a Cr particle having a thickness greater than 0 and not more than 5 μm and a Cu base material are stable and preferable sizes.

さらに混在したCu−Te相とTe−Cu−Cr相についてEPMAによるWDS法で定量分析を行った結果、Cu−Te相はCuが51質量%以上54質量%以下、Teが46質量%以上49質量%以下で化学構造的にはCu2Teに近いものであった。また、Te−Cu−Cr相はTeが63質量%以上67質量%以下、Cuが23質量%以上25質量%以下、Crが8質量%以上12質量%以下であった。 Further, as a result of quantitative analysis of the mixed Cu—Te phase and Te—Cu—Cr phase by the WDS method using EPMA, the Cu—Te phase is Cu 51 mass% to 54 mass%, Te is 46 mass% to 49 mass%. The chemical structure was less than mass% and was close to Cu 2 Te in terms of chemical structure. In the Te—Cu—Cr phase, Te was 63 mass% to 67 mass%, Cu was 23 mass% to 25 mass%, and Cr was 8 mass% to 12 mass%.

一方、微小なCr−Te粒子、およびCu母材とCr粒子との粒界に形成されたTe含有相は、EPMAによる面分析とWDS法の定量分析により確認したところ、Cr−Te粒子は、Cr3Te4、Cr2Te3、CrTe3などから構成されているように考えられ
、Te含有相は、Te−Cu−Cr合金相やCu−Te合金相などから構成されているように考えられた。また、SEMとEPMAにより観察・分析した結果、Cr粒子の粒径は主に35μm以上150μm以下であるが、最小で0.5μmのCr粒子が確認された。Te−Cu−Cr相とCu−Te相との混在相の径は75μm以下で、最小1μmの混在相が確認された。なお、Cr−Te相は0.5μm以上5μm以下であった。また図1には図示していないが、直径1μm以上20μm以下のCu−Te相が単独でも存在することも確認された。
On the other hand, the fine Cr-Te particles and the Te-containing phase formed at the grain boundary between the Cu base material and the Cr particles were confirmed by surface analysis by EPMA and quantitative analysis by the WDS method. It seems to be composed of Cr 3 Te 4 , Cr 2 Te 3 , CrTe 3, etc., and the Te-containing phase is thought to be composed of Te—Cu—Cr alloy phase, Cu—Te alloy phase, etc. It was. Further, as a result of observation and analysis by SEM and EPMA, the particle diameter of Cr particles was mainly 35 μm or more and 150 μm or less, but a minimum of 0.5 μm Cr particles was confirmed. The diameter of the mixed phase of the Te—Cu—Cr phase and the Cu—Te phase was 75 μm or less, and a mixed phase having a minimum of 1 μm was confirmed. The Cr—Te phase was 0.5 μm or more and 5 μm or less. Although not shown in FIG. 1, it was also confirmed that a Cu—Te phase having a diameter of 1 μm or more and 20 μm or less was present alone.

比較例1.
前記実施例9とは、Cuが69.0質量%、Crが30.0質量%、Teが1.0質量%である点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が35面積%であり、Cu−Cr−Te粒子は、平均粒径は40μm、含有量が1.3面積%あり、Cr−Te粒子は、平均粒径は1μm、含有量が0.02面積%であり、Te含有相は、平均厚みが1μmであり、Te含有量が70質量%であって、密度比が99%、遮断性能が否であり、耐電圧性能が0.9であり、溶着引外力が0.4〜0.6kNであった。
Comparative Example 1
Example 9 differs from Example 9 in that Cu is 69.0% by mass, Cr is 30.0% by mass, and Te is 1.0% by mass. Other than that, the diameter is 25 mm and the thickness is 5 mm under the same manufacturing conditions. A Cu—Cr—Te contact material was obtained. In the contact material, the Cr particles have an average particle diameter of 80 μm and the content is 35 area%, and the Cu—Cr—Te particles have an average particle diameter of 40 μm and a content of 1.3 area%. Te particles have an average particle size of 1 μm and a content of 0.02 area%, a Te-containing phase has an average thickness of 1 μm, a Te content of 70% by mass, a density ratio of 99%, The interruption performance was negative, the withstand voltage performance was 0.9, and the welding external force was 0.4 to 0.6 kN.

比較例2.
前記実施例9とは、Cuが39.0質量%、Crが60.0質量%、Teが1.0質量%、焼結温度が900℃、焼結圧力が70MPaである点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が65面積%であり、Cu−Cr−Te粒子は、平均粒径は40μm、含有量が1.2面積%あり、Cr−Te粒子は、平均粒径は1.2μm、含有量が0.05面積%であり、Te含有相は、平均厚みが1μmであり、Te含有量が60質量%であって、密度比が98%、遮断性能が否であり、耐電圧性能が1.2であり、溶着引外力が0.4〜0.6kNであった。
Comparative Example 2
Example 9 differs from Example 9 in that Cu is 39.0% by mass, Cr is 60.0% by mass, Te is 1.0% by mass, the sintering temperature is 900 ° C., and the sintering pressure is 70 MPa. Obtained a Cu—Cr—Te contact material having a diameter of 25 mm and a thickness of 5 mm under the same production conditions. In the contact material, Cr particles have an average particle size of 80 μm and a content of 65 area%, and Cu—Cr—Te particles have an average particle diameter of 40 μm and a content of 1.2 area%. The Te particles have an average particle diameter of 1.2 μm and a content of 0.05 area%, the Te-containing phase has an average thickness of 1 μm, a Te content of 60% by mass, and a density ratio of 98. %, The breaking performance was negative, the withstand voltage performance was 1.2, and the welding pulling external force was 0.4 to 0.6 kN.

比較例3.
前記実施例9とは、Cuが60.0質量%、Crが40.0質量%であり、Teが0質量%である点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、含有量が0面積%あり、Cr−Te粒子は含有量が0面積%であり、Te含有相は、Te含有量が0質量%であって、密度比が98%、遮断性能が可であり、耐電圧性能が1であり、溶着引外力が1.1kNであった。
Comparative Example 3
Example 9 differs from Example 9 in that Cu is 60.0% by mass, Cr is 40.0% by mass, and Te is 0% by mass. Other than that, the diameter is 25 mm and the thickness is 5 mm under the same manufacturing conditions. A Cu-Cr contact material was obtained. In the contact material, Cr particles have an average particle size of 80 μm and a content of 45 area%, Cu—Cr—Te particles have a content of 0 area%, and Cr—Te particles have a content of 0 area. The Te-containing phase has a Te content of 0% by mass, a density ratio of 98%, an interrupting performance is possible, a withstand voltage performance is 1, and a welding pulling external force is 1.1 kN. It was.

比較例4.
前記実施例9とは、Cuが57.0質量%、Crが40.0質量%、Teが3.0質量%である点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、含有量が3.9面積%あり、Cr−Te粒子は含有量が3.9面積%であり、Te含有相は、Te含有量が65質量%であって、密度比が98%、遮断性能が否であり、耐電圧性能が0.7であり、溶着引外力が0.3〜0.6kNであった。
Comparative Example 4
Example 9 differs from Example 9 in that Cu is 57.0% by mass, Cr is 40.0% by mass, and Te is 3.0% by mass. Other than that, the diameter is 25 mm and the thickness is 5 mm under the same manufacturing conditions. A Cu—Cr—Te contact material was obtained. In the contact material, the Cr particles have an average particle diameter of 80 μm and the content is 45 area%, the Cu—Cr—Te particles have a content of 3.9 area%, and the Cr—Te particles have a content of 3.9 area%, Te-containing phase has a Te content of 65% by mass, a density ratio of 98%, interrupting performance is negative, withstand voltage performance is 0.7, welding pulling external force Was 0.3 to 0.6 kN.

比較例5.
前記実施例9とは、Cuが59.0質量%、Crが40.0質量%であり、Teが1.0質量%である点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が170μm、含有量が45面積%であり、Cu−Cr−Te粒子は、含有量が1.3面積%あり、Cr−Te粒子は含有量が0.05面積%であり、Te含有相は、Te含有量が65質量%であって、密度比が98%、遮断性能が否であり、耐電圧性能が0.7〜0.9であり、溶着引外力が0.4〜0.6kNであった。
Comparative Example 5
Example 9 differs from Example 9 in that Cu is 59.0% by mass, Cr is 40.0% by mass, and Te is 1.0% by mass. A 5 mm Cu—Cr—Te contact material was obtained. In the contact material, Cr particles have an average particle diameter of 170 μm and a content of 45 area%, Cu—Cr—Te particles have a content of 1.3 area%, and Cr—Te particles have a content of It is 0.05 area%, and the Te-containing phase has a Te content of 65% by mass, a density ratio of 98%, a non-breaking performance, and a withstand voltage performance of 0.7 to 0.9. The welding pulling external force was 0.4 to 0.6 kN.

比較例6.
前記実施例9とは、Cuが59.0質量%、Crが40.0質量%、Teが1.0質量%である点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が10μm、含有量が45面積%であり、Cu−Cr−Te粒子は、含有量が1.3面積%あり、Cr−Te粒子は含有量が0.05面積%であり、Te含有相は、Te含有量が65質量%であって、密度比が98%、遮断性能が可であり、耐電圧性能が0.7〜0.9であり、溶着引外力が0.4〜0.6kNであった。
Comparative Example 6
Example 9 differs from Example 9 in that Cu is 59.0% by mass, Cr is 40.0% by mass, and Te is 1.0% by mass. Other than that, the diameter is 25 mm and the thickness is 5 mm under the same manufacturing conditions. A Cu—Cr—Te contact material was obtained. In the contact material, Cr particles have an average particle diameter of 10 μm and a content of 45 area%, Cu—Cr—Te particles have a content of 1.3 area%, and Cr—Te particles have a content of It is 0.05 area%, and the Te-containing phase has a Te content of 65% by mass, a density ratio of 98%, an interruption performance is possible, and a withstand voltage performance is 0.7 to 0.9. The welding pulling external force was 0.4 to 0.6 kN.

比較例7.
前記実施例9とは、Cuが59.0質量%、Crが40.0質量%、Teが1.0質量%である点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、平均粒径が120μm、含有量が1.3面積%あり、Cr−Te粒子は含有量が0.05面積%であり、Te含有相は、Te含有量が65質量%であって、密度比が98%、遮断性能が可であり、耐電圧性能が0.8であり、溶着引外力が0.5〜0.9kNであった。
Comparative Example 7
Example 9 differs from Example 9 in that Cu is 59.0% by mass, Cr is 40.0% by mass, and Te is 1.0% by mass. Other than that, the diameter is 25 mm and the thickness is 5 mm under the same manufacturing conditions. A Cu—Cr—Te contact material was obtained. In the contact material, Cr particles have an average particle size of 80 μm and a content of 45 area%, and Cu—Cr—Te particles have an average particle diameter of 120 μm and a content of 1.3 area%, Cr— The Te particles have a content of 0.05 area%, the Te-containing phase has a Te content of 65% by mass, a density ratio of 98%, an interruption performance, and a withstand voltage performance of 0.8%. The welding pulling external force was 0.5 to 0.9 kN.

比較例8.
前記実施例9とは、Cuが59.0質量%、Crが40.0質量%、Teが1.0質量%、焼結温度が900℃、焼結圧力25MPaである点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、含有量が1.3面積%あり、Cr−Te粒子は含有量が1面積%であり、Te含有相は、Te含有量が60質量%であって、密度比が89%、遮断性能が否であり、耐電圧性能が0.8であり、溶着引外力が0.4〜0.6kNであった。
Comparative Example 8
The difference from Example 9 is that Cu is 59.0% by mass, Cr is 40.0% by mass, Te is 1.0% by mass, the sintering temperature is 900 ° C., and the sintering pressure is 25 MPa. A Cu—Cr—Te contact material having a diameter of 25 mm and a thickness of 5 mm was obtained under the same manufacturing conditions. In the contact material, Cr particles have an average particle size of 80 μm and a content of 45 area%, Cu—Cr—Te particles have a content of 1.3 area%, and Cr—Te particles have a content of The Te-containing phase has a Te content of 60% by mass, a density ratio of 89%, an interrupting performance of no, a withstand voltage performance of 0.8, and a welding pulling external force of 0. .4 to 0.6 kN.

比較例9.
前記実施例9とは、Cuが59.0質量%、Crが40.0質量%、Teが1.0質量%、焼結温度が600℃、焼結圧力80MPaである点で異なり、他は同じ製造条件にて直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、含有量が0面積%あり、Cr−Te粒子は含有量が0面積%であり、Te含有相は、Te含有量が0面積%であって、密度比が95%、遮断性能が否であり、耐電圧性能が0.9であり、溶着引外力が0.4〜0.6kNであった。
Comparative Example 9
The difference from Example 9 is that Cu is 59.0% by mass, Cr is 40.0% by mass, Te is 1.0% by mass, the sintering temperature is 600 ° C., and the sintering pressure is 80 MPa. A Cu—Cr—Te contact material having a diameter of 25 mm and a thickness of 5 mm was obtained under the same manufacturing conditions. In the contact material, Cr particles have an average particle size of 80 μm and a content of 45 area%, Cu—Cr—Te particles have a content of 0 area%, and Cr—Te particles have a content of 0 area. The Te-containing phase has a Te content of 0 area%, a density ratio of 95%, a blocking performance of no, a withstand voltage performance of 0.9, and a welding pulling external force of 0.4. -0.6 kN.

比較例10.
Cuが59.0質量%、Crが40.0質量%、Teが1.0質量%であり、焼結温度が1060℃、焼結圧力が0MPaの焼結法で製造されて、直径25mm、厚さ5mmのCu−Cr−Te接点材料を得た。当該接点材料は、Cr粒子は、平均粒径が80μm、含有量が45面積%であり、Cu−Cr−Te粒子は、含有量が1面積%あり、Cr−Te粒子は含有量が0面積%であり、Te含有相は、Te含有量が0質量%であって、密度比が89%、遮断性能が否であり、耐電圧性能が0.9であり、溶着引外力が0.4〜0.6kNであった。
Comparative Example 10
Cu is 59.0% by mass, Cr is 40.0% by mass, Te is 1.0% by mass, the sintering temperature is 1060 ° C., and the sintering pressure is 0 MPa. A Cu—Cr—Te contact material having a thickness of 5 mm was obtained. In the contact material, the Cr particles have an average particle size of 80 μm and the content is 45 area%, the Cu—Cr—Te particles have a content of 1 area%, and the Cr—Te particles have a content of 0 area. The Te-containing phase has a Te content of 0% by mass, a density ratio of 89%, an interrupting performance of no, a withstand voltage performance of 0.9, and a welding pulling external force of 0.4. -0.6 kN.

以上の実施例9〜16と比較例1〜10とを対比すると、比較例1〜6は、組成、各合金相の有無、Cr粒径、Cu−Cr−Te粒子の各粒子径のうちの少なくとも一つが本発明の接点材料の条件を満たしていないものである。また、比較例7〜9は圧力、焼結温度、焼結方法の少なくとも一つが本発明の接点材料の製造条件を満たしていないものである。比較例1と比較例2の接点材料は、Cr量が本発明の接点材料の条件を満たしていない場合で、耐圧性能と溶着引き外し性は得られるものの遮断性能が不可であった。これに対し、実施例9〜実施例14に示す本発明の接点材料は、耐圧性能と溶着引外力を維持しながら、高い遮断性能を得る効果があることが明らかになった。なお、実施例14〜実施例16の遮断性能は、実施例9〜実施例14のそれらに比べて若干低下しているが実用上問題の無い範囲であった。   When the above Examples 9-16 and Comparative Examples 1-10 are compared, Comparative Examples 1-6 are composition, the presence or absence of each alloy phase, Cr particle diameter, and each particle diameter of Cu-Cr-Te particle | grains. At least one does not satisfy the conditions of the contact material of the present invention. In Comparative Examples 7 to 9, at least one of pressure, sintering temperature, and sintering method does not satisfy the manufacturing conditions for the contact material of the present invention. The contact materials of Comparative Example 1 and Comparative Example 2 were in the case where the Cr amount did not satisfy the conditions of the contact material of the present invention, and although the pressure resistance performance and the welding detachability were obtained, the interruption performance was not possible. On the other hand, it has become clear that the contact materials of the present invention shown in Examples 9 to 14 have the effect of obtaining high breaking performance while maintaining the pressure resistance performance and the welding pulling external force. In addition, although the interruption | blocking performance of Example 14-Example 16 was falling a little compared with those of Example 9-Example 14, it was the range without a problem practically.

なお、因みに前記実施例10の接点材料の断面組織をSEMとEPMAにより観察・分析した結果、Cr粒子の粒径は38μm以上150μm以下のものが大部分であるが、最小で0.5μmのCr粒子が確認された。Te−Cu−Cr相とCu−Te相が混在するCu−Cr−Te粒子の径は、75μm以下で最小1μmであることが確認された。なお、Cr−Te相は1μm以上5μm以下であった。また、図1に図示していないが、直径1μm以上20μm以下のCu−Te相が単独でも存在することも確認された。   Incidentally, as a result of observing and analyzing the cross-sectional structure of the contact material of Example 10 with SEM and EPMA, the particle size of the Cr particles is mostly from 38 μm to 150 μm, but the minimum is 0.5 μm Cr. Particles were confirmed. It was confirmed that the diameter of the Cu—Cr—Te particles in which the Te—Cu—Cr phase and the Cu—Te phase coexist is 75 μm or less and the minimum is 1 μm. The Cr—Te phase was 1 μm or more and 5 μm or less. Further, although not shown in FIG. 1, it was also confirmed that a Cu—Te phase having a diameter of 1 μm or more and 20 μm or less was present alone.

一方、比較例3と比較例4は、Teを含有していない場合とTeが2.5質量%で、本発明のTe量の条件を満たしていない場合である。Teが含有していないものは溶着が発生し、この時の引き外した時の特性を1として実施例1〜8の特性を調べた。Te量が2質量%を超える場合、溶着引外性は得られるものの耐電圧性能が低下し、遮断性能は不可であった。また、接点材料自体が脆くなり加工性が低下した。比較例5は、Cr粒径が170μmで、本発明のCr粒径の上限値である150μmを超えた場合である。Cr粒径が150μmを超える粒子が混在する場合、Cuの母材中にCr粒子が均一に分散せず遮断性能にバラツキが生じ、遮断性能が不可であった。また、比較例6は、本発明のCr粒径の下限値である35μm以下の場合で、耐電圧性能にバラツキを生じた。比較例4と比較例5に対して、実施例9〜実施例16では溶着引外性を維持しながら良好な遮断性能、耐電圧性能を得ることができ、Cr粒径は35μm以上150μm以下が好ましい範囲であることがわかる。   On the other hand, Comparative Example 3 and Comparative Example 4 are a case where Te is not contained and a case where Te is 2.5 mass% and does not satisfy the Te amount condition of the present invention. In the case where Te was not contained, welding occurred, and the characteristics of Examples 1 to 8 were examined by setting the characteristics when removed at this time to 1. When the amount of Te exceeds 2% by mass, the resistance to withstand voltage is deteriorated but the breaking performance is not possible, although the weld resistance is obtained. In addition, the contact material itself became brittle and the workability decreased. In Comparative Example 5, the Cr particle size is 170 μm, which exceeds the upper limit of 150 μm of the Cr particle size of the present invention. When particles having a Cr particle size exceeding 150 μm were mixed, Cr particles were not uniformly dispersed in the Cu base material, resulting in variations in the blocking performance, and the blocking performance was not possible. In Comparative Example 6, the withstand voltage performance varied in the case of 35 μm or less which is the lower limit value of the Cr particle diameter of the present invention. Compared to Comparative Example 4 and Comparative Example 5, in Examples 9 to 16, good breaking performance and voltage resistance performance can be obtained while maintaining weldability, and the Cr particle size is from 35 μm to 150 μm. It turns out that it is a preferable range.

比較例7は、Te粒径が120μmのTeを用い、本発明のTe粒径の上限値である100μmを超えた場合である。これにより、Te−Cu−Cr相とCu−Te相の混在相の粒径が100μmを超える結果となり、分散が不均一になることから溶着引き外し力にバラツキを生じた。比較例8は、製造条件の圧力が25MPaで、本発明の圧力の下限値である30MPa未満の場合である。密度比89%と低くなり遮断性能が低下し遮断性能は不可であった。但し、密度比を向上させるために、既知の方法である再圧縮と再焼結を行って本発明の接点を得てもよい。例えば、比較例8で得た焼結体を圧力30MPa以上で再圧縮加工し、その後700℃以上1080℃以下の温度で再焼結を行ってもよい。   Comparative Example 7 is a case where Te having a Te particle diameter of 120 μm was used and exceeded the upper limit of 100 μm of the Te particle diameter of the present invention. As a result, the particle size of the mixed phase of the Te—Cu—Cr phase and the Cu—Te phase exceeded 100 μm, and the dispersion became uneven, resulting in variations in the welding trip force. The comparative example 8 is a case where the pressure of manufacturing conditions is 25 MPa and is less than 30 MPa which is the lower limit value of the pressure of the present invention. The density ratio was as low as 89%, and the interruption performance was lowered, and the interruption performance was not possible. However, in order to improve the density ratio, the contacts of the present invention may be obtained by performing recompression and re-sintering, which are known methods. For example, the sintered body obtained in Comparative Example 8 may be recompressed at a pressure of 30 MPa or higher and then re-sintered at a temperature of 700 ° C. or higher and 1080 ° C. or lower.

比較例9は、製造条件の焼結温度が600℃で、本発明の焼結温度の下限値である700℃未満の場合である。この条件で製造した場合、Cuを主体とした母材中にはCr粒子、Cu−Te相およびTe−Cu−Cr相が形成され分散しているが、上記両相が混在した相、Cr−Te粒子、さらにCr粒子と母材との粒界にTe含有相は形成できず、密度比も実施例9〜16に比べて低い。その結果、耐電圧性能が低下し、遮断性能も不可であった。比較例10は、Cuが59質量%、Crが40質量%、Teが1質量%の圧粉体をCuの融点未満で固相焼結した場合で、本発明の製造工程を含まなかった場合である。Cuを主体とした母材中にはCr粒子、Te−Cu−Cr相とCu−Te相が混在した粒子が形成され分散しているが、Cu−Te相、Cr−Te粒子、さらにCr粒子と母材との粒界にTe含有相は形成されていなかった。また、密度比も実施例9〜16に比べて低い。その結果、耐電圧性能が低下し、遮断性能も不可であった。   The comparative example 9 is a case where the sintering temperature of manufacturing conditions is 600 degreeC, and is less than 700 degreeC which is the minimum value of the sintering temperature of this invention. When manufactured under these conditions, Cr particles, a Cu—Te phase and a Te—Cu—Cr phase are formed and dispersed in the base material mainly composed of Cu. A Te-containing phase cannot be formed at the grain boundaries between Te particles, and further Cr particles and the base material, and the density ratio is also lower than in Examples 9-16. As a result, the withstand voltage performance was lowered and the interruption performance was not possible. Comparative Example 10 is a case where a green compact of 59% by mass of Cu, 40% by mass of Cr, and 1% by mass of Te is solid-phase sintered below the melting point of Cu and does not include the manufacturing process of the present invention. It is. In the base material mainly composed of Cu, Cr particles and particles in which a Te—Cu—Cr phase and a Cu—Te phase are mixed are formed and dispersed, but the Cu—Te phase, Cr—Te particles, and further Cr particles. A Te-containing phase was not formed at the grain boundary between the base material and the base material. Also, the density ratio is low compared to Examples 9-16. As a result, the withstand voltage performance was lowered and the interruption performance was not possible.

以上、本発明を実施の形態および実施例により詳細に説明したが、本発明はそれらの実施の形態および実施例に限定されず、本発明の課題並びに解決手段の精神に則った各種の変型形態をも包含する。   The present invention has been described in detail with reference to the embodiments and examples. However, the present invention is not limited to these embodiments and examples, and various modifications may be made in accordance with the problems of the present invention and the spirit of the solution. Is also included.

本発明は、例えば真空遮断器の接点材料として利用される可能が高い。   The present invention is likely to be used as a contact material for a vacuum circuit breaker, for example.

本発明の接点材料の一例の断面図である。It is sectional drawing of an example of the contact material of this invention. 本発明の接点材料を有する真空バルブを示す断面図である。It is sectional drawing which shows the vacuum valve which has the contact material of this invention.

符号の説明Explanation of symbols

1:Cu母材、2:Cr粒子、3:Cu−Te相、4:Te−Cu−Cr相、
5:Cu−Cr−Te粒子、6:Cr−Te粒子、7:Te含有相、8:真空バルブ、
9:遮断室、10:絶縁容器、11a:封止金具、11b:封止金具、12a:金属製蓋、
12b:金属製蓋、13:固定電極棒、14:可動電極棒、15:固定電極、
16:可動電極、17:固定接点、18:可動接点、19:ベローズ、
20:ベローズ用アークシールド、21:絶縁容器用アークシールド。
1: Cu base material, 2: Cr particles, 3: Cu—Te phase, 4: Te—Cu—Cr phase,
5: Cu—Cr—Te particles, 6: Cr—Te particles, 7: Te-containing phase, 8: Vacuum valve,
9: shut-off chamber, 10: insulating container, 11a: sealing metal fitting, 11b: sealing metal fitting, 12a: metal lid,
12b: metal lid, 13: fixed electrode rod, 14: movable electrode rod, 15: fixed electrode,
16: movable electrode, 17: fixed contact, 18: movable contact, 19: bellows,
20: Arc shield for bellows, 21: Arc shield for insulating container.

Claims (8)

Cu母材中にCrとTeを含む接点材料において、Cr−Te粒子を含むことを特徴とする接点材料。   A contact material containing Cr and Te in a Cu base material, wherein the contact material contains Cr-Te particles. Cr含有量が40質量%以上50質量%以下の範囲、Te含有量が0.1質量%以上2質量%以下の範囲であり、上記Cr−Te粒子の平均粒径が5μm以下であり、かつ接点材料の全断面積中に占める上記Cr−Te粒子の平均面積が上記全断面積の0.5面積%以下であることを特徴とする請求項1に記載の接点材料。   The Cr content is in the range of 40% by mass or more and 50% by mass or less, the Te content is in the range of 0.1% by mass or more and 2% by mass or less, the average particle size of the Cr—Te particles is 5 μm or less, and The contact material according to claim 1, wherein an average area of the Cr-Te particles occupying in a total cross-sectional area of the contact material is 0.5 area% or less of the total cross-sectional area. Cu母材中にCrとTeを含む接点材料において、Cr粒子、上記母材と上記Cr粒子との粒界に形成されたTe含有相を含むことを特徴とする接点材料。   A contact material comprising Cr and Te in a Cu base material, comprising a Cr particle, and a Te-containing phase formed at a grain boundary between the base material and the Cr particle. Cr含有量が40質量%以上50質量%以下の範囲、Te含有量が0.1質量%以上2質量%以下の範囲であり、上記Te含有相は、その平均厚みが5μm以下であり、Te含有量が90質量%以下であることを特徴とする請求項3に記載の接点材料。   The Cr content is in the range of 40% by mass to 50% by mass, the Te content is in the range of 0.1% by mass to 2% by mass, the Te-containing phase has an average thickness of 5 μm or less, Te Content is 90 mass% or less, Contact material of Claim 3 characterized by the above-mentioned. Cu母材中にCr粒子、Te−Cu−Cr相とCu−Te相とが混在したCu−Cr−Te粒子、Cr−Te粒子、および上記Cu母材と上記Cr粒子との粒界に形成されたTe含有相を含むことを特徴とする接点材料。   Formed at the grain boundary between the Cu base material and the Cr particle, and the Cu base material and the Cr particle, in which the Cr base material contains a mixture of Cr particles, Te—Cu—Cr phase and Cu—Te phase. A contact material comprising a modified Te-containing phase. Cr含有量が40質量%以上50質量%以下の範囲、Te含有量が0.1質量%以上2質量%以下の範囲であり、Cr粒子の平均粒径は150μm以下、かつ接点材料の全断面積中に占める上記Cr粒子の平均面積が上記全断面積の0.5面積%以下であり、上記Cu−Cr−Te粒子の平均粒径が100μm以下、かつ接点材料の全断面積中に占める上記Cu−Cr−Te粒子の平均面積が上記全断面積の2.5面積%以下であり、上記Cr−Te粒子の平均粒径は5μm以下、かつ接点材料の全断面積中に占める上記Cr−Te粒子の平均面積が上記全断面積の0.5面積%以下であり、上記Te含有相は、その平均厚みが5μm以下であり、Te含有量が90質量%以下であることを特徴とする請求項5に記載の接点材料。   The Cr content is in the range of 40% by mass or more and 50% by mass or less, the Te content is in the range of 0.1% by mass or more and 2% by mass or less, the average particle size of the Cr particles is 150 μm or less, and the contact material is completely disconnected. The average area of the Cr particles occupying the area is 0.5 area% or less of the total cross-sectional area, the average particle diameter of the Cu—Cr—Te particles is 100 μm or less, and occupies the total cross-sectional area of the contact material. The average area of the Cu—Cr—Te particles is 2.5 area% or less of the total cross-sectional area, the average particle size of the Cr—Te particles is 5 μm or less, and the Cr occupies the total cross-sectional area of the contact material. -The average area of Te particles is 0.5 area% or less of the total cross-sectional area, the Te-containing phase has an average thickness of 5 µm or less, and a Te content of 90 mass% or less. The contact material according to claim 5. 平均粒径が35μm以上150μm以下の範囲のCr粉末を40質量%以上50質量%以下の範囲、平均粒径が1μm以上100μm以下の範囲のTe粉末を0.1質量%以上2質量以下の範囲、および平均粒径が1μm以上75μm以下の範囲のCu粉末を残部とする混合物を焼結型に充填して700℃〜1080℃、30MPa以上200MPa以下の範囲の圧力下で加圧焼結を行うことを特徴とする接点材料の製造方法。   Cr powder having an average particle size of 35 μm or more and 150 μm or less in the range of 40% by mass or more and 50% by mass or less, Te powder having an average particle size in the range of 1 μm or more and 100 μm or less of 0.1% by mass or more and 2% by mass or less , And the mixture having the average particle size of Cu powder in the range of 1 μm or more and 75 μm or less as a balance is filled in a sintering mold and subjected to pressure sintering under a pressure in the range of 700 ° C. to 1080 ° C. and 30 MPa to 200 MPa. A method for manufacturing a contact material. 上記加圧焼結が、パルス通電加圧焼結であることを特徴とする請求項7に記載の接点材料の製造方法。   The method for producing a contact material according to claim 7, wherein the pressure sintering is pulsed current pressure sintering.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102259188A (en) * 2011-07-20 2011-11-30 温州银泰合金材料有限公司 Method for producing high-energy rare earth powder alloy electrical contact material
CN112458328A (en) * 2020-10-16 2021-03-09 陕西斯瑞新材料股份有限公司 Process for preparing consumable electrode for arc melting by using CuCr alloy powder material

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1173830A (en) * 1997-09-01 1999-03-16 Shibafu Eng Kk Vacuum valve
JP2007332429A (en) * 2006-06-16 2007-12-27 Mitsubishi Electric Corp Contact material and production method therefor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1173830A (en) * 1997-09-01 1999-03-16 Shibafu Eng Kk Vacuum valve
JP2007332429A (en) * 2006-06-16 2007-12-27 Mitsubishi Electric Corp Contact material and production method therefor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102259188A (en) * 2011-07-20 2011-11-30 温州银泰合金材料有限公司 Method for producing high-energy rare earth powder alloy electrical contact material
CN102259188B (en) * 2011-07-20 2013-06-12 温州银泰合金材料有限公司 Method for producing high-energy rare earth powder alloy electrical contact material
CN112458328A (en) * 2020-10-16 2021-03-09 陕西斯瑞新材料股份有限公司 Process for preparing consumable electrode for arc melting by using CuCr alloy powder material

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