JP2009235032A - Method for producing ruthenium complex compound - Google Patents
Method for producing ruthenium complex compound Download PDFInfo
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- JP2009235032A JP2009235032A JP2008085891A JP2008085891A JP2009235032A JP 2009235032 A JP2009235032 A JP 2009235032A JP 2008085891 A JP2008085891 A JP 2008085891A JP 2008085891 A JP2008085891 A JP 2008085891A JP 2009235032 A JP2009235032 A JP 2009235032A
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 58
- 239000012327 Ruthenium complex Substances 0.000 title claims abstract description 20
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 239000003446 ligand Substances 0.000 claims abstract description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 15
- 239000001257 hydrogen Substances 0.000 claims abstract description 15
- 125000000962 organic group Chemical group 0.000 claims abstract description 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims abstract description 10
- 230000007935 neutral effect Effects 0.000 claims abstract description 10
- 125000000129 anionic group Chemical group 0.000 claims abstract description 9
- 150000004678 hydrides Chemical class 0.000 claims abstract description 6
- 125000005843 halogen group Chemical group 0.000 claims abstract description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 150000002894 organic compounds Chemical class 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 abstract description 5
- 239000012535 impurity Substances 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 25
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 125000000217 alkyl group Chemical group 0.000 description 20
- -1 cyclic olefins Chemical class 0.000 description 17
- 239000000843 powder Substances 0.000 description 17
- 238000005160 1H NMR spectroscopy Methods 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- 125000003118 aryl group Chemical group 0.000 description 14
- 239000000460 chlorine Substances 0.000 description 13
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 12
- 229910052801 chlorine Inorganic materials 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 9
- 229910052707 ruthenium Inorganic materials 0.000 description 8
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 8
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 7
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 125000001309 chloro group Chemical group Cl* 0.000 description 7
- HZVOZRGWRWCICA-UHFFFAOYSA-N methanediyl Chemical compound [CH2] HZVOZRGWRWCICA-UHFFFAOYSA-N 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 229910052736 halogen Inorganic materials 0.000 description 6
- 150000002367 halogens Chemical class 0.000 description 6
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 6
- 229940052810 complex b Drugs 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- MRSDSBMESKXSNZ-UHFFFAOYSA-N phosphane;tricyclohexylphosphane Chemical compound P.C1CCCCC1P(C1CCCCC1)C1CCCCC1 MRSDSBMESKXSNZ-UHFFFAOYSA-N 0.000 description 5
- UORVCLMRJXCDCP-UHFFFAOYSA-N propynoic acid Chemical compound OC(=O)C#C UORVCLMRJXCDCP-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- JAMNSIXSLVPNLC-UHFFFAOYSA-N (4-ethenylphenyl) acetate Chemical compound CC(=O)OC1=CC=C(C=C)C=C1 JAMNSIXSLVPNLC-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- UEXCJVNBTNXOEH-UHFFFAOYSA-N Ethynylbenzene Chemical group C#CC1=CC=CC=C1 UEXCJVNBTNXOEH-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- VURFVHCLMJOLKN-UHFFFAOYSA-N diphosphane Chemical group PP VURFVHCLMJOLKN-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical group OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 238000005649 metathesis reaction Methods 0.000 description 3
- 229910052762 osmium Inorganic materials 0.000 description 3
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical group OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- ZYECOAILUNWEAL-NUDFZHEQSA-N (4z)-4-[[2-methoxy-5-(phenylcarbamoyl)phenyl]hydrazinylidene]-n-(3-nitrophenyl)-3-oxonaphthalene-2-carboxamide Chemical compound COC1=CC=C(C(=O)NC=2C=CC=CC=2)C=C1N\N=C(C1=CC=CC=C1C=1)/C(=O)C=1C(=O)NC1=CC=CC([N+]([O-])=O)=C1 ZYECOAILUNWEAL-NUDFZHEQSA-N 0.000 description 2
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 238000005865 alkene metathesis reaction Methods 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- PNPBGYBHLCEVMK-UHFFFAOYSA-L benzylidene(dichloro)ruthenium;tricyclohexylphosphane Chemical compound Cl[Ru](Cl)=CC1=CC=CC=C1.C1CCCCC1P(C1CCCCC1)C1CCCCC1.C1CCCCC1P(C1CCCCC1)C1CCCCC1 PNPBGYBHLCEVMK-UHFFFAOYSA-L 0.000 description 2
- 125000001246 bromo group Chemical group Br* 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- ZJIPHXXDPROMEF-UHFFFAOYSA-N dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O ZJIPHXXDPROMEF-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 125000005425 toluyl group Chemical group 0.000 description 2
- VYXHVRARDIDEHS-QGTKBVGQSA-N (1z,5z)-cycloocta-1,5-diene Chemical compound C\1C\C=C/CC\C=C/1 VYXHVRARDIDEHS-QGTKBVGQSA-N 0.000 description 1
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ZRZHXNCATOYMJH-UHFFFAOYSA-N 1-(chloromethyl)-4-ethenylbenzene Chemical compound ClCC1=CC=C(C=C)C=C1 ZRZHXNCATOYMJH-UHFFFAOYSA-N 0.000 description 1
- BZWJDKJBAVXCMH-UHFFFAOYSA-N 1-diazopropane Chemical compound CCC=[N+]=[N-] BZWJDKJBAVXCMH-UHFFFAOYSA-N 0.000 description 1
- CGHIBGNXEGJPQZ-UHFFFAOYSA-N 1-hexyne Chemical compound CCCCC#C CGHIBGNXEGJPQZ-UHFFFAOYSA-N 0.000 description 1
- IBXNCJKFFQIKKY-UHFFFAOYSA-N 1-pentyne Chemical compound CCCC#C IBXNCJKFFQIKKY-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- GCVZSUHWNATXQT-UHFFFAOYSA-L BrC1=CC=C(C=[Ru](Cl)Cl)C=C1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1 Chemical compound BrC1=CC=C(C=[Ru](Cl)Cl)C=C1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1 GCVZSUHWNATXQT-UHFFFAOYSA-L 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ODVWKYZBIUTOGY-UHFFFAOYSA-L C(C)(=O)OC1=CC=C(C=[Ru](Br)Br)C=C1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1 Chemical compound C(C)(=O)OC1=CC=C(C=[Ru](Br)Br)C=C1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1 ODVWKYZBIUTOGY-UHFFFAOYSA-L 0.000 description 1
- CGBDKNYGGBAIQD-UHFFFAOYSA-N C(C)(=O)OC1=CC=C(C=[Ru])C=C1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1 Chemical compound C(C)(=O)OC1=CC=C(C=[Ru])C=C1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1.C1(CCCCC1)P(C1CCCCC1)C1CCCCC1 CGBDKNYGGBAIQD-UHFFFAOYSA-N 0.000 description 1
- MKUIZRRZVZZOCY-UHFFFAOYSA-L COC1=CC=C(C=[Ru](Cl)Cl)C=C1 Chemical compound COC1=CC=C(C=[Ru](Cl)Cl)C=C1 MKUIZRRZVZZOCY-UHFFFAOYSA-L 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- KLDXINAZLYCVGI-UHFFFAOYSA-L ClC1=CC=C(C=[Ru](Cl)Cl)C=C1 Chemical compound ClC1=CC=C(C=[Ru](Cl)Cl)C=C1 KLDXINAZLYCVGI-UHFFFAOYSA-L 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical group O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 125000005227 alkyl sulfonate group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910000074 antimony hydride Inorganic materials 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- 125000005228 aryl sulfonate group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000007942 carboxylates Chemical group 0.000 description 1
- SIVAUWDYXQEPJN-UHFFFAOYSA-M chloro(hydrido)ruthenium Chemical compound [RuH]Cl SIVAUWDYXQEPJN-UHFFFAOYSA-M 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- WLXALCKAKGDNAT-UHFFFAOYSA-N diazoethane Chemical compound CC=[N+]=[N-] WLXALCKAKGDNAT-UHFFFAOYSA-N 0.000 description 1
- JRYYRXMRZCOTDH-UHFFFAOYSA-L dichloro(2-phenylethylidene)ruthenium;tricyclohexylphosphane Chemical compound Cl[Ru](Cl)=CCC1=CC=CC=C1.C1CCCCC1P(C1CCCCC1)C1CCCCC1.C1CCCCC1P(C1CCCCC1)C1CCCCC1 JRYYRXMRZCOTDH-UHFFFAOYSA-L 0.000 description 1
- HAUZOCAZWRQMPP-UHFFFAOYSA-L dichloro-[(4-methylphenyl)methylidene]ruthenium tricyclohexylphosphane Chemical compound CC1=CC=C(C=[Ru](Cl)Cl)C=C1.C1CCCCC1P(C1CCCCC1)C1CCCCC1.C1CCCCC1P(C1CCCCC1)C1CCCCC1 HAUZOCAZWRQMPP-UHFFFAOYSA-L 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 125000000592 heterocycloalkyl group Chemical group 0.000 description 1
- BICAGYDGRXJYGD-UHFFFAOYSA-N hydrobromide;hydrochloride Chemical compound Cl.Br BICAGYDGRXJYGD-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 238000007040 multi-step synthesis reaction Methods 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical group [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 125000005538 phosphinite group Chemical group 0.000 description 1
- XRBCRPZXSCBRTK-UHFFFAOYSA-N phosphonous acid Chemical compound OPO XRBCRPZXSCBRTK-UHFFFAOYSA-N 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003333 secondary alcohols Chemical class 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- OUULRIDHGPHMNQ-UHFFFAOYSA-N stibane Chemical compound [SbH3] OUULRIDHGPHMNQ-UHFFFAOYSA-N 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 150000003509 tertiary alcohols Chemical class 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- DHWBYAACHDUFAT-UHFFFAOYSA-N tricyclopentylphosphane Chemical compound C1CCCC1P(C1CCCC1)C1CCCC1 DHWBYAACHDUFAT-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- IGNTWNVBGLNYDV-UHFFFAOYSA-N triisopropylphosphine Chemical compound CC(C)P(C(C)C)C(C)C IGNTWNVBGLNYDV-UHFFFAOYSA-N 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
本発明は、ルテニウム錯体化合物の製造方法に関する。更に詳しくは、高活性で安定なルテニウムカルベン錯体化合物の製造方法に関する。 The present invention relates to a method for producing a ruthenium complex compound. More specifically, the present invention relates to a method for producing a highly active and stable ruthenium carbene complex compound.
メタセシス触媒は、オレフィンのメタセシス反応(不均化反応)に用いられるが、最近では、環状オレフィンの開環重合用触媒としても賞用されている。
最近では、遷移金属メタセシス触媒、特にルテニウム触媒が数多く開発されている。これらのルテニウム触媒には、しかし、その合成に多段階を要する、反応開始速度が遅いといった問題を有しているものも多い。
The metathesis catalyst is used for an olefin metathesis reaction (disproportionation reaction), and recently, it has been awarded as a catalyst for ring-opening polymerization of cyclic olefins.
Recently, many transition metal metathesis catalysts, especially ruthenium catalysts, have been developed. However, many of these ruthenium catalysts have problems such as a multi-step synthesis and a slow reaction initiation rate.
特許文献1には、種々の官能基の存在下で安定であり、歪なしの環状及び非環状のオレフィンに対するオレフィンメタセシス反応の触媒として好適な、下記の一般式で表わされるルテニウム及びオスミウムカルベン化合物が開示されている。 Patent Document 1 discloses ruthenium and osmium carbene compounds represented by the following general formula, which are stable in the presence of various functional groups, and are suitable as catalysts for olefin metathesis reactions on unstrained cyclic and acyclic olefins. It is disclosed.
この化合物は、例えば、X=XA=Cl、L=LA=PPh3、RA=H、R=フェニル又はp−置換フェニルである場合、下記経路に示すように、RuCl2(PPh3)3と、ジアゾエタン、ジアゾプロパン又はp−置換アリールジアゾアルカン(p−C6H4XCHN2)との迅速反応によるRuCl2(=CH−p−C6H4X)(PPh3)3の合成を経て、得られている。
しかし、この合成方法で使用するジアゾ化合物は、有毒で爆発性であり、安全性の確保に費用を要する。
For example, when X = X A = Cl, L = L A = PPh 3 , R A = H, R = phenyl or p-substituted phenyl, this compound is represented by RuCl 2 (PPh 3 ) 3 and a rapid reaction of diazoethane, diazopropane or p-substituted aryldiazoalkanes (p-C 6 H 4 XCHN 2 ) with RuCl 2 (= CH-p-C 6 H 4 X) (PPh 3 ) 3 It is obtained through synthesis.
However, the diazo compound used in this synthesis method is toxic and explosive, and costs are required to ensure safety.
一方、特許文献2には、一般式(D1)で表わされる金属塩を、塩基及び第二又は第三アルコールの存在下で、第三ホスフィン若しくはホスフィット又はジ第三ジホスフィン若しくはジホスフィットと反応させ、そしてその後、酸の存在下で式(D2)のアルキンと反応させて、式(D3)で得られる錯体化合物を得、次いで、この錯体化合物(D3)に式(D4)のアルケンを反応させて、式(D5)で表わされる錯体化合物を得る方法が開示されている。
実施例には、RuCl2(cis,cis−1,5−シクロオクタジエン)、1,8−ジアザビシクロ[5.4.0]ウンデカ−7−エン及びトリ(シクロヘキシル)ホスフィンを含有する反応液に、1−ヘキシン(又は1−ペンチン)とスチレンとを添加して、Cl2(P(C6H11)3)2Ru=CH−C6H5を得たことが示されている。
On the other hand, in Patent Document 2, the metal salt represented by the general formula (D1) is reacted with a tertiary phosphine or phosphite or a ditertiary diphosphine or diphosphite in the presence of a base and a secondary or tertiary alcohol. And after that, it is reacted with an alkyne of formula (D2) in the presence of an acid to obtain a complex compound obtained by formula (D3), and then this alkene of formula (D4) is reacted with this complex compound (D3). A method for obtaining a complex compound represented by the formula (D5) is disclosed.
Examples include a reaction solution containing RuCl 2 (cis, cis-1,5-cyclooctadiene), 1,8-diazabicyclo [5.4.0] undec-7-ene and tri (cyclohexyl) phosphine. 1-hexyne (or 1-pentyne) and styrene were added to give Cl 2 (P (C 6 H 11 ) 3 ) 2 Ru═CH—C 6 H 5 .
上記式(D1)〜(D5)において、Meはルテニウム原子又はオスミウム原子;X01及びX02はそれぞれ互いに独立してハロゲン原子;T1及びT2はそれぞれ互いに独立して第三ホスフィン又はホスフィットであるか、又はT1及びT2は一緒になってジ第三ジホスフィン又はジホスフィット;また、T3は水素原子、又は置換基を有していてもよいアルキル基、シクロアルキル基、ヘテロシクロアルキル基、アリール基若しくはヘテロアリール基である。
しかしながら、この方法では、Ru化合物の10〜20倍モルと多量のスチレンを使用しなければならず、これが生成物中に不純物として残存するほか、コスト面で問題がある。また、スチレンの使用量を10倍モル未満とした場合、生成するルテニウムカルベン錯体が複数種の混合物となり、触媒活性の制御が困難となる問題がある。
In the above formulas (D1) to (D5), Me is a ruthenium atom or osmium atom; X 01 and X 02 are each independently a halogen atom; T 1 and T 2 are each independently a third phosphine or phosphite Or T 1 and T 2 are taken together to form a di-tertiary diphosphine or diphosphite; and T 3 is a hydrogen atom or an optionally substituted alkyl group, cycloalkyl group, heterocycloalkyl A group, an aryl group or a heteroaryl group.
However, this method requires the use of a large amount of styrene, which is 10 to 20 times the mole of the Ru compound, which remains as an impurity in the product and has a problem in cost. Moreover, when the usage-amount of styrene is less than 10 times mole, there exists a problem that the ruthenium carbene complex to produce | generate becomes a mixture of multiple types, and control of catalyst activity becomes difficult.
従って、本発明の目的は、安全に、経済的に有利に、不純物の含有量が少ないルテニウム錯体を効率よく得る方法を提供することにある。 Accordingly, an object of the present invention is to provide a method for efficiently and efficiently obtaining a ruthenium complex having a low impurity content, in a safe and economical manner.
本発明者は、上記目的の達成のため鋭意検討を重ねた結果、特定の化合物を介在させることにより、高選択率で目的とする化合物が得られることを見出し、この知見に基づき本発明を完成するに至った。 As a result of intensive studies to achieve the above object, the present inventor has found that the target compound can be obtained with high selectivity by interposing a specific compound, and the present invention has been completed based on this finding. It came to do.
かくして本発明によれば、一般式(2)で表される化合物(2)に、Yの水素化物(HY)及び一般式(3)で表される化合物(3)を接触させる工程〔1〕、及びその後に、一般式(4)で表される化合物(4)を接触させる工程〔2〕を含んでなる、一般式(1)で表されるルテニウム錯体化合物の製造方法が提供される。 Thus, according to the present invention, the step of contacting the compound (2) represented by the general formula (2) with the hydride of Y (HY) and the compound (3) represented by the general formula (3) [1] And the manufacturing method of the ruthenium complex compound represented by General formula (1) including the process [2] which contacts the compound (4) represented by General formula (4) after that is provided.
R6―C≡C―COOR7 (3)
(式(3)中、R6及びR7は、それぞれ、水素又は有機基を表す。)
R 6 -C≡C-COOR 7 (3)
(In formula (3), R 6 and R 7 each represent hydrogen or an organic group.)
本発明のルテニウム錯体化合物製造方法において、化合物(3)がH―C≡C―COOR7(R7は、水素又は有機基を表す。)であることが好ましい。
また、本発明のルテニウム錯体化合物製造方法において、化合物(3)がR6―C≡C―COOH(R6は、水素又は有機基を表す。)であることが好ましい。
更に、本発明のルテニウム錯体化合物製造方法において、化合物(3)がH―C≡C―COOHであることが特に好ましい。
In the method for producing a ruthenium complex compound of the present invention, the compound (3) is preferably H—C≡C—COOR 7 (R 7 represents hydrogen or an organic group).
In the method for producing a ruthenium complex compound of the present invention, the compound (3) is preferably R 6 —C≡C—COOH (R 6 represents hydrogen or an organic group).
Furthermore, in the method for producing a ruthenium complex compound of the present invention, it is particularly preferable that the compound (3) is H—C≡C—COOH.
更に本発明のルテニウム錯体化合物製造方法において、工程〔1〕において一般式(5)で表される化合物(5)を存在させることが好ましい。
R8―CN (5)
(式(5)中、R8は、1価の有機基である。)
Furthermore, in the method for producing a ruthenium complex compound of the present invention, it is preferable that the compound (5) represented by the general formula (5) is present in the step [1].
R 8 -CN (5)
(In formula (5), R 8 is a monovalent organic group.)
本発明によれば、安全に、経済的に有利に、不純物の含有量が少ないルテニウム錯体を効率よく得ることができる。本発明方法で得られたルテニウム触媒は、高活性であり、メタセシス重合等の触媒として有用である。 According to the present invention, a ruthenium complex having a low impurity content can be obtained efficiently and safely and advantageously. The ruthenium catalyst obtained by the method of the present invention has high activity and is useful as a catalyst for metathesis polymerization and the like.
本発明のルテニウム錯体の製造方法は、式(1)で表わされるルテニウム錯体を製造するための方法である。
式(1)中、X及びYは、それぞれ、アニオン性配位子であり、同一であっても、異なっていてもよい。
アニオン性配位子は、特に限定されないが、その具体例としては、ハロゲン、水素、炭素数1〜20のアルキル基、アリール基、炭素数1〜20のアルコキシ基、アリールオキシ基、炭素数3〜20のアルキルジケトネート基、アリールジケトネート基、炭素数1〜20のカルボキシレート基、アリールスルホネート基、炭素数1〜20のアルキルスルホネート基、炭素数1〜20のアルキルチオ基、炭素数1〜20のアルキルスルホニル基、及び炭素数1〜20のアルキルスルフィニル基を示すことができる。これらの基は、炭素数1〜5のアルキル基、ハロゲン、炭素数1〜5のアルコキシ基又はフェニル基で置換されていてもよく、このフェニル基は、更に、ハロゲン、炭素数1〜5のアルキル基、又は、炭素数1〜5のアルコキシ基で置換されていてもよい。
In the formula (1), X and Y are anionic ligands, which may be the same or different.
The anionic ligand is not particularly limited, and specific examples thereof include halogen, hydrogen, an alkyl group having 1 to 20 carbon atoms, an aryl group, an alkoxy group having 1 to 20 carbon atoms, an aryloxy group, and 3 carbon atoms. -20 alkyl diketonate group, aryl diketonate group, C1-C20 carboxylate group, aryl sulfonate group, C1-C20 alkyl sulfonate group, C1-C20 alkylthio group, carbon number A 1-20 alkylsulfonyl group and a C1-C20 alkylsulfinyl group can be shown. These groups may be substituted with an alkyl group having 1 to 5 carbon atoms, halogen, an alkoxy group having 1 to 5 carbon atoms, or a phenyl group. The phenyl group is further substituted with halogen, 1 to 5 carbon atoms. It may be substituted with an alkyl group or an alkoxy group having 1 to 5 carbon atoms.
アニオン性配位子は、好ましくは、塩素、臭素、ヨウ素、水素、ベンゾエート基、炭素数1〜5のカルボキシレート基、炭素数1〜5のアルキル基、フェノキシ基、炭素数1〜5のアルコキシ基、炭素数1〜5のアルキルチオ基、アリール基又は炭素数1〜5のアルキルスルホネート基である。これらの基は、炭素数1〜5のアルキル基又はフェニル基で置換されていてもよく、このフェニル基は、更に、ハロゲン、炭素数1〜5のアルキル基又は炭素数1〜5のアルコキシ基で置換されていてもよい。
アニオン性配位子は、更に好ましくは、Cl、Br、I、CF3CO2、CH3CO2、CFH2CO2、(CH3)3CO、(CF3)2(CH3)CO、(CF3)(CH3)2CO、PhO、MeO、EtO、トシレート、メシレート、及びトリフルオロメタンスルホネートである。
アニオン性配位子は、特に好ましくは、塩素であり、最も好ましくは、X及びYが共に塩素である。
The anionic ligand is preferably chlorine, bromine, iodine, hydrogen, benzoate group, carboxylate group having 1 to 5 carbon atoms, alkyl group having 1 to 5 carbon atoms, phenoxy group, or alkoxy having 1 to 5 carbon atoms. Group, an alkylthio group having 1 to 5 carbon atoms, an aryl group, or an alkyl sulfonate group having 1 to 5 carbon atoms. These groups may be substituted with an alkyl group having 1 to 5 carbon atoms or a phenyl group, and this phenyl group is further halogen, an alkyl group having 1 to 5 carbon atoms or an alkoxy group having 1 to 5 carbon atoms. May be substituted.
More preferably, the anionic ligand is Cl, Br, I, CF 3 CO 2 , CH 3 CO 2 , CFH 2 CO 2 , (CH 3 ) 3 CO, (CF 3 ) 2 (CH 3 ) CO, (CF 3 ) (CH 3 ) 2 CO, PhO, MeO, EtO, tosylate, mesylate, and trifluoromethanesulfonate.
The anionic ligand is particularly preferably chlorine, and most preferably X and Y are both chlorine.
L1及びL2は、それぞれ、中性配位子であり、同一であっても、異なっていてもよい。
中性配位子は、特に限定されないが、その具体例としては、ホスフィン、スルホン化ホスフィン、ホスファイト、ホスフィナイト、ホスホナイト、アルシン、スチビン、エーテル、アミン、アミド、スルホキシド、カルボキシル、ニトロシル、ピリジン及びチオエーテルを挙げることができる。
中性配位子は、好ましくは、ホスフィンであり、更に好ましくは、1つの第二級アルキル基又はシクロアルキル基と、アリール、炭素数1〜10の第一級アルキル基、第二級アルキル基及びシクロアルキル基からなる群から独立に選ばれる2つの基とを、有するホスフィンであり、特に好ましくは、トリ(シクロヘキシル)ホスフィン、トリ(シクロペンチル)ホスフィン、トリ(イソプロピル)ホスフィン及びトリ(フェニル)ホスフィンである。
L 1 and L 2 are each a neutral ligand and may be the same or different.
The neutral ligand is not particularly limited, and specific examples thereof include phosphine, sulfonated phosphine, phosphite, phosphinite, phosphonite, arsine, stibine, ether, amine, amide, sulfoxide, carboxyl, nitrosyl, pyridine and thioether. Can be mentioned.
The neutral ligand is preferably a phosphine, more preferably one secondary alkyl group or cycloalkyl group, aryl, a primary alkyl group having 1 to 10 carbon atoms, and a secondary alkyl group. And a phosphine having two groups independently selected from the group consisting of cycloalkyl groups, particularly preferably tri (cyclohexyl) phosphine, tri (cyclopentyl) phosphine, tri (isopropyl) phosphine and tri (phenyl) phosphine It is.
R1〜R5は、それぞれ、水素、ハロゲン、ヒドロキシ基、ヒドロキシカルボニル基、アルキル基若しくはアリール基を有していてもよいアミノ基、ニトロ基、アルキル基若しくはアリール基を有していてもよいシリル基、炭素数1〜10のアシル基、アルキル基若しくはアリール基を有していてもよいスルホニル基、炭素数1〜5のアルキルチオ基、炭素数1〜5のアルコキシ基、炭素数1〜10のアシロキシ基、又は置換基を有していてもよい炭素数1〜20のアルキル基若しくはアリール基である。アルキル基又はアリール基が有していてもよい置換基の例としては、ハロゲン、ヒドロキシ基、アルキル基若しくはアリール基を有していてもよいアミノ基、ニトロ基、炭素数1〜5のアルコキシ基、及び炭素数1〜10のアシロキシ基を挙げることができる。
本発明は、特に、R1〜R5として、ハロゲン置換アルキル基又はアシロキシ基を有するルテニウム錯体化合物の製造に好適に使用することができる。
R 1 to R 5 each may have an amino group, a nitro group, an alkyl group, or an aryl group that may have hydrogen, halogen, a hydroxy group, a hydroxycarbonyl group, an alkyl group, or an aryl group. A silyl group, an acyl group having 1 to 10 carbon atoms, a sulfonyl group optionally having an alkyl group or an aryl group, an alkylthio group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, and 1 to 10 carbon atoms Or an alkyl group or an aryl group having 1 to 20 carbon atoms which may have a substituent. Examples of the substituent that the alkyl group or aryl group may have include a halogen, a hydroxy group, an amino group that may have an alkyl group or an aryl group, a nitro group, and an alkoxy group having 1 to 5 carbon atoms. And an acyloxy group having 1 to 10 carbon atoms.
The present invention is particularly, as R 1 to R 5, can be suitably used for the preparation of a ruthenium complex compound having a halogen-substituted alkyl group or an acyloxy group.
式(1)で表わされるルテニウム錯体化合物の製造方法においては、一般式(2)で表される化合物(2)を使用する。 In the method for producing the ruthenium complex compound represented by the formula (1), the compound (2) represented by the general formula (2) is used.
式(2)中、X、L1及びL2は、それぞれ、式(1)において定義したものと同じである。
L3は、中性配位子であり、その具体例としては、L1及びL2の具体例として挙げたものと同じものを挙げることができる。
n及びmは、それぞれ、0〜2の整数である。
In the formula (2), X, L 1 and L 2 are the same as those defined in the formula (1).
L 3 is a neutral ligand, and specific examples thereof include the same ones as given as specific examples of L 1 and L 2 .
n and m are each an integer of 0-2.
式(2)で表わされる化合物は、例えば、以下に示す文献に従って合成することができる。
M.L.Christ, S.Sabo−Etienne, B.Chaudret、 Oraganometallics、1994年、第13巻、p.3800.
J.Wolf,W.Stuer, C.Grunwald, O.Gevert, M.Laubender, H.Werner、 Eur. J. Inorg. Chem.、1998年、p.1827
P.A.van der Schaaf, R.Kolly, A.Hafner、 Chem.Commun.、2000年、p.1045.
特表2001−503434号公報
J.N.Coalter III, K.G.Caulton、 New J. Chem.、2001年、第25巻、p.679.
S.Jung, C.D.Brandt、 J.Wolf, H.Werner、 Dalton Trans.、2004年、p.375.
W.Stuer, B.Weberndorfer、 J.Wolf, H.Werner、 Dalton Trans.、2005年、p.1796.
The compound represented by the formula (2) can be synthesized, for example, according to the following literature.
M.M. L. Christ, S.M. Sabo-Etienne, B.M. Chaudret, Organometallics, 1994, Vol. 13, p. 3800.
J. et al. Wolf, W.M. Stuer, C.I. Grunwald, O .; Gevert, M.M. Laubender, H.M. Werner, Eur. J. et al. Inorg. Chem. 1998, p. 1827
P. A. van der Schaaf, R.A. Kolly, A.M. Hafner, Chem. Commun. 2000, p. 1045.
Japanese translation of PCT publication No. 2001-503434 N. Coalter III, K.M. G. Culton, New J .; Chem. 2001, Vol. 25, p. 679.
S. Jung, C.I. D. Brandt, J.M. Wolf, H.M. Werner, Dalton Trans. 2004, p. 375.
W. Stuer, B.B. Weberndorf, J.A. Wolf, H.M. Werner, Dalton Trans. 2005, p. 1796.
工程〔1〕で使用するYの水素化物(HY)の例としては、ハロゲン化水素、水素、アルコール、フェノール類、カルボン酸、ケトン、ジケトン、アルキルスルホン酸及びアリールスルホン酸を挙げることができる。
これらのうち、水素酸が好適であり、その具体例としては、塩化水素、臭化水素、ヨウ化水素、酢酸、プロピオン酸、アクリル酸、メタクリル酸、クロトン酸、プロピオール酸、安息香酸、トリクロロ酢酸、トリフルオロ酢酸、メタンスルホン酸、p−トルエンスルホン酸、トリフルオロメタンスルホン酸等を挙げることができる。
Examples of the Y hydride (HY) used in the step [1] include hydrogen halide, hydrogen, alcohol, phenols, carboxylic acid, ketone, diketone, alkyl sulfonic acid and aryl sulfonic acid.
Of these, hydrogen acid is preferred, and specific examples thereof include hydrogen chloride, hydrogen bromide, hydrogen iodide, acetic acid, propionic acid, acrylic acid, methacrylic acid, crotonic acid, propiolic acid, benzoic acid, trichloroacetic acid. Trifluoroacetic acid, methanesulfonic acid, p-toluenesulfonic acid, trifluoromethanesulfonic acid and the like.
工程〔1〕では、一般式(3)で表される化合物を使用する。
R6―C≡C―COOR7 (3)
式(3)中、R6及びR7は、それぞれ、水素又は有機基を表す。
R6及びR7で表わされる有機基の具体例としては、炭素数1〜20のアルキル基及びアリール基を挙げることができる。更に具体的には、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、sec−ブチル基、i−ブチル基、t−ブチル基、ペンチル基、シクロペンチル基、ヘキシル基、シクロヘキシル基、ベンジル基、フェニル基、トルイル基等を挙げることができる。
一般式(3)で表される化合物(3)は、H―C≡C―COOR7であることが好ましく、H―C≡C―COOHであることが特に好ましい。
In the step [1], a compound represented by the general formula (3) is used.
R 6 -C≡C-COOR 7 (3)
In formula (3), R 6 and R 7 each represent hydrogen or an organic group.
Specific examples of the organic group represented by R 6 and R 7 include an alkyl group having 1 to 20 carbon atoms and an aryl group. More specifically, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, sec-butyl group, i-butyl group, t-butyl group, pentyl group, cyclopentyl group, hexyl group Cyclohexyl group, benzyl group, phenyl group, toluyl group and the like.
The compound (3) represented by the general formula (3) is preferably H—C≡C—COOR 7 and particularly preferably H—C≡C—COOH.
工程〔1〕では、一般式(2)で表される化合物に、Yの水素化物(HY)及び一般式(3)で表される化合物(3)を接触させる。
一般式(2)で表わされる化合物(2)と一般式(3)で表される化合物(3)との比率は、通常、化合物(2)1モルに対して化合物(3)0.5〜5モルの範囲である。
また、Yの水素化物(HY)の使用量は、通常、化合物(2)1モルに対して0.5〜3モルの範囲である。
In the step [1], the hydride of Y (HY) and the compound (3) represented by the general formula (3) are brought into contact with the compound represented by the general formula (2).
The ratio of the compound (2) represented by the general formula (2) and the compound (3) represented by the general formula (3) is usually from 0.5 to 0.5 per 1 mol of the compound (2). The range is 5 moles.
Moreover, the usage-amount of the hydride (HY) of Y is the range of 0.5-3 mol normally with respect to 1 mol of compounds (2).
これらの化合物を互いに接触させる方法は、特に限定されないが、化合物(2)と化合物(3)とを反応させた後、反応生成物を単離することなく、反応混合物にYの水素化物(HY)を添加して反応させるのが好ましい。 The method of bringing these compounds into contact with each other is not particularly limited, but after reacting compound (2) and compound (3), the reaction mixture is isolated without any reaction product being isolated. ) To be reacted.
工程〔1〕においては、一般式(5)で表される化合物(5)を存在させることが好ましい。
R8―CN (5)
式(5)中、R8は、1価の有機基である。
R8で表わされる1価の有機基の具体例としては、炭素数1〜20のアルキル基及びアリール基を挙げることができる。更に具体的には、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、sec−ブチル基、i−ブチル基、t−ブチル基、ペンチル基、シクロペンチル基、ヘキシル基、シクロヘキシル基、ベンジル基、フェニル基、トルイル基等を挙げることができる。
R8で表わされる1価の有機基としては、アルキル基が好ましく、メチル基がより好ましい。
一般式(5)で表される化合物(5)の量は、一般式(2)で表される化合物100重量部に対して、0.5〜30重量部、好ましくは3〜10の範囲である。
In the step [1], it is preferable that the compound (5) represented by the general formula (5) is present.
R 8 -CN (5)
In formula (5), R 8 is a monovalent organic group.
Specific examples of the monovalent organic group represented by R 8 include an alkyl group having 1 to 20 carbon atoms and an aryl group. More specifically, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, sec-butyl group, i-butyl group, t-butyl group, pentyl group, cyclopentyl group, hexyl group Cyclohexyl group, benzyl group, phenyl group, toluyl group and the like.
The monovalent organic group represented by R 8 is preferably an alkyl group, and more preferably a methyl group.
The amount of the compound (5) represented by the general formula (5) is in the range of 0.5 to 30 parts by weight, preferably 3 to 10 parts per 100 parts by weight of the compound represented by the general formula (2). is there.
工程〔1〕において、反応は、通常、溶媒中で行なう。溶媒は、反応を阻害しないものであれば特に限定されないが、その具体例としては、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、2−メチルテトラヒドロフラン、エチレングリコールジメチルエーテル等のエーテル溶媒;ペンタン、ヘキサン、石油エーテル、ヘプタン、オクタン、シクロペンタン、シクロヘキサン等の炭化水素溶媒;ベンゼン、トルエン、キシレン等の芳香族溶媒;メタノール、エタノール、n−プロパノール、i−プロパノール、n−ブタノール、sec−ブタノール、i−ブタノール、t−ブタノール、ベンジルアルコール、エチレングリコール、プロピレングリコール等のアルコール溶媒;等を挙げることができる。
反応は、不活性ガス雰囲気下で行なうのが好ましく、不活性ガスの具体例としては、アルゴン等の希ガス、窒素ガス等を示すことができる。
反応温度は、特に限定されないが、反応を−90〜10℃の範囲で行なうのが好ましく、−50〜−10℃の範囲で行なうのがより好ましい。
反応時間は、特に限定されないが、通常、1分〜12時間程度である。
In step [1], the reaction is usually carried out in a solvent. The solvent is not particularly limited as long as it does not inhibit the reaction. Specific examples thereof include ether solvents such as diethyl ether, tetrahydrofuran, 1,4-dioxane, 2-methyltetrahydrofuran, and ethylene glycol dimethyl ether; pentane, hexane, Hydrocarbon solvents such as petroleum ether, heptane, octane, cyclopentane, cyclohexane; aromatic solvents such as benzene, toluene, xylene; methanol, ethanol, n-propanol, i-propanol, n-butanol, sec-butanol, i- And alcohol solvents such as butanol, t-butanol, benzyl alcohol, ethylene glycol, and propylene glycol;
The reaction is preferably performed in an inert gas atmosphere, and specific examples of the inert gas may include a rare gas such as argon, nitrogen gas, and the like.
The reaction temperature is not particularly limited, but the reaction is preferably performed in the range of −90 to 10 ° C., more preferably in the range of −50 to −10 ° C.
The reaction time is not particularly limited, but is usually about 1 minute to 12 hours.
工程〔1〕により、下式に示す構造の反応生成物が得られる。
この反応生成物(5)は、単離することなく、次の工程〔2〕に供する。
工程〔2〕では、上記反応生成物(5)と、一般式(4)で表される化合物(4)とを接触させる。
反応の条件は、工程〔1〕における条件と同様でよい。
反応終了後、徐々に室温まで昇温した後、目的の化合物(1)を単離する。
化合物(1)の単離は、常法に従って行なえばよく、通常、溶媒を減圧で除去し、必要に応じて、アルコール等で洗浄した後、減圧下で乾燥を行なえばよい。
This reaction product (5) is subjected to the next step [2] without isolation.
In the step [2], the reaction product (5) is brought into contact with the compound (4) represented by the general formula (4).
The reaction conditions may be the same as those in step [1].
After completion of the reaction, the temperature is gradually raised to room temperature, and then the target compound (1) is isolated.
Isolation of compound (1) may be carried out according to a conventional method. Usually, the solvent is removed under reduced pressure, and after washing with alcohol or the like, if necessary, drying is carried out under reduced pressure.
本発明の製造方法で得られるルテニウム錯体化合物(1)の具体例としては、ビス((トリシクロヘキシル)ホスフィン)(p−アセトキシベンジリデン)ルテニウム(IV)ジクロリド〔L1=L2=(トリシクロヘキシル)ホスフィン、X=Y=塩素、R1=R2=R4=R5=H、R3=アセトキシの化合物〕、ビス((トリシクロヘキシル)ホスフィン)(p−クロロメチルベンジリデン)ルテニウム(IV)ジクロリド〔L1=L2=(トリシクロヘキシル)ホスフィン、X=Y=塩素、R1=R2=R4=R5=H、R3=クロロメチルの化合物〕ビス((トリシクロヘキシル)ホスフィン)(ベンジリデン)ルテニウム(IV)ジクロリド〔L1=L2=(トリシクロヘキシル)ホスフィン、X=Y=塩素、R1=R2=R3=R4=R5=Hの化合物〕、ビス((トリシクロヘキシル)ホスフィン)(p−クロロベンジリデン)ルテニウム(IV)ジクロリド〔L1=L2=(トリシクロヘキシル)ホスフィン、X=Y=塩素、R1=R2=R4=R5=H、R3=クロルの化合物〕、ビス((トリシクロヘキシル)ホスフィン)(p−ブロモベンジリデン)ルテニウム(IV)ジクロリド〔L1=L2=(トリシクロヘキシル)ホスフィン、X=Y=塩素、R1=R2=R4=R5=H、R3=ブロモの化合物〕、ビス((トリシクロヘキシル)ホスフィン)(p−メチルベンジリデン)ルテニウム(IV)ジクロリド〔L1=L2=(トリシクロヘキシル)ホスフィン、X=Y=塩素、R1=R2=R4=R5=H、R3=メチルの化合物〕、ビス((トリシクロヘキシル)ホスフィン)(p−メトキシベンジリデン)ルテニウム(IV)ジクロリド〔L1=L2=(トリシクロヘキシル)ホスフィン、X=Y=塩素、R1=R2=R4=R5=H、R3=メトキシの化合物〕、ビス((トリシクロヘキシル)ホスフィン)(p−アセトキシベンジリデン)ルテニウム(IV)ジブロミド〔L1=L2=(トリシクロヘキシル)ホスフィン、X=Y=臭素、R1=R2=R4=R5=H、R3=アセトキシの化合物〕、ビス((トリシクロヘキシル)ホスフィン)(p−アセトキシベンジリデン)ルテニウム(IV)ブロミドクロリド〔L1=L2=(トリシクロヘキシル)ホスフィン、X=塩素、Y=臭素、R1=R2=R4=R5=H、R3=アセトキシの化合物〕等を示すことができる。 Specific examples of the ruthenium complex compound (1) obtained by the production method of the present invention include bis ((tricyclohexyl) phosphine) (p-acetoxybenzylidene) ruthenium (IV) dichloride [L 1 = L 2 = (tricyclohexyl). Phosphine, X = Y = chlorine, R 1 = R 2 = R 4 = R 5 = H, R 3 = acetoxy compound], bis ((tricyclohexyl) phosphine) (p-chloromethylbenzylidene) ruthenium (IV) dichloride [L 1 = L 2 = (tricyclohexyl) phosphine, X = Y = chlorine, R 1 = R 2 = R 4 = R 5 = H, R 3 = chloromethyl compound] bis ((tricyclohexyl) phosphine) ( benzylidene) ruthenium (IV) dichloride [L 1 = L 2 = (tricyclohexylphosphine) phosphine, X = Y = Containing a compound of R 1 = R 2 = R 3 = R 4 = R 5 = H ], bis ((tricyclohexylphosphine) phosphine) = (p-chlorobenzylidene) ruthenium (IV) dichloride [L 1 L 2 = (tri Cyclohexyl) phosphine, X = Y = chlorine, R 1 = R 2 = R 4 = R 5 = H, R 3 = chloro compound], bis ((tricyclohexyl) phosphine) (p-bromobenzylidene) ruthenium (IV) Dichloride [L 1 = L 2 = (tricyclohexyl) phosphine, X = Y = chlorine, R 1 = R 2 = R 4 = R 5 = H, R 3 = bromo compound], bis ((tricyclohexyl) phosphine) (p- methylbenzylidene) ruthenium (IV) dichloride [L 1 = L 2 = (tricyclohexylphosphine) phosphine, X = Y = chlorine, R 1 = R 2 = R = R 5 = H, the compound of R 3 = methyl], bis ((tricyclohexylphosphine) phosphine) (p-methoxy benzylidene) ruthenium (IV) dichloride [L 1 = L 2 = (tricyclohexylphosphine) phosphine, X = Y = Chlorine, R 1 = R 2 = R 4 = R 5 = H, R 3 = methoxy compound], bis ((tricyclohexyl) phosphine) (p-acetoxybenzylidene) ruthenium (IV) dibromide [L 1 = L 2 = (Tricyclohexyl) phosphine, X = Y = bromine, R 1 = R 2 = R 4 = R 5 = H, R 3 = acetoxy compound], bis ((tricyclohexyl) phosphine) (p-acetoxybenzylidene) ruthenium ( IV) Bromide chloride [L 1 = L 2 = (tricyclohexyl) phosphine, X = chlorine, Y = bromine, R 1 = R 2 = R 4 = R 5 = H, R 3 = Acetoxy compound] and the like.
以下に合成例及び実施例を挙げて本発明を更に具体的に説明する。なお、各例中の部及び%は特に断りのない限り、質量基準である。 Hereinafter, the present invention will be described more specifically with reference to synthesis examples and examples. In addition, the part and% in each example are mass references | standards unless there is particular notice.
錯体の純度は、1H−NMR及び31P−NMRで測定した。
全カルベン中における各成分の比率は、1H−NMR(標準物質テトラメチルシラン:0ppm)における19ppm〜21ppmのピーク積分比によって決定した。
The purity of the complex was measured by 1 H-NMR and 31 P-NMR.
The ratio of each component in the total carbene was determined by a peak integration ratio of 19 ppm to 21 ppm in 1 H-NMR (standard substance tetramethylsilane: 0 ppm).
〔実施例1〕
ビス(トリ(シクロヘキシル)ホスフィン)(p−アセトキシベンジリデン)ルテニウム(IV)ジクロリド(錯体a)の合成
ビス(トリ(シクロヘキシル)ホスフィン)(ジハイドロジェン)ヒドリドルテニウム(II)クロライド0.77部をシュレンク管にとり、アルゴン置換した。そこにアルゴン置換したテトラヒドロフラン9部を加え溶解し、−30℃に冷却した。そこに攪拌しながらプロピオール酸0.08部を添加した。溶液の色は赤褐色に変化した。その後、10分攪拌し、1mol/lのHCl/ジエチルエーテル溶液0.78部、続いてp−アセトキシスチレン0.18部を添加した。−30℃で10分攪拌後、3時間掛けて20℃まで昇温したのち溶媒を減圧除去し、暗桃色粉末1.06部を得た。
1H−NMRにより分析したところ、全カルベン中における錯体aの割合は81%であった。得られた粉末をメタノール20部で3回洗浄し、減圧乾燥して錯体aを桃色粉末0.48部として得た。この粉末を1H−NMRにより分析したところ、全カルベン中における錯体aの割合は100%であった。また、31P−NMRにより分析したところ、単一のピークを示した。
[Example 1]
Synthesis of bis (tri (cyclohexyl) phosphine) (p-acetoxybenzylidene) ruthenium (IV) dichloride (complex a) 0.77 parts of bis (tri (cyclohexyl) phosphine) (dihydrogen) hydridoruthenium (II) chloride was schlenk The tube was replaced with argon. Thereto, 9 parts of tetrahydrofuran substituted with argon was added and dissolved, and cooled to -30 ° C. Thereto was added 0.08 part of propiolic acid while stirring. The color of the solution changed to reddish brown. Thereafter, the mixture was stirred for 10 minutes, and 0.78 part of a 1 mol / l HCl / diethyl ether solution was added, followed by 0.18 part of p-acetoxystyrene. After stirring at −30 ° C. for 10 minutes, the temperature was raised to 20 ° C. over 3 hours, and then the solvent was removed under reduced pressure to obtain 1.06 parts of dark pink powder.
As a result of analysis by 1 H-NMR, the ratio of complex a in all carbenes was 81%. The obtained powder was washed three times with 20 parts of methanol and dried under reduced pressure to obtain 0.48 parts of complex a as a pink powder. When this powder was analyzed by 1 H-NMR, the proportion of complex a in all carbene was 100%. Moreover, when analyzed by 31 P-NMR, it showed a single peak.
得られた錯体aのNMRスペクトルデータを以下に示す。
1H−NMR(CDCl3、25℃)δppm:19.90(s、1H)、8.49(d、2H)、7.04(d、2H)、2.61(brs、6H)、2.30(s、3H)、1.90−1.02(m、60H)
31P−NMR(CDCl3、25℃)δppm:36.4(s)
The NMR spectrum data of the obtained complex a is shown below.
1 H-NMR (CDCl 3 , 25 ° C.) δ ppm: 19.90 (s, 1H), 8.49 (d, 2H), 7.04 (d, 2H), 2.61 (brs, 6H), 2 .30 (s, 3H), 1.90-1.02 (m, 60H)
31 P-NMR (CDCl 3 , 25 ° C.) δ ppm: 36.4 (s)
〔実施例2〕
p−アセトキシスチレンの仕込み量を0.18部から1.80部に変更した以外は実施例1と同様にして反応を行ない、赤紫色粘性液体2.75部を得た。1H−NMRにより分析したところ、全カルベン中における錯体aの割合は90%であった。得られた液をメタノール20部で3回洗浄し、減圧乾燥して錯体aを桃色粉末0.51部として得た。1H−NMRにより分析したところ、全カルベン中における錯体aの割合は100%であった。
[Example 2]
The reaction was conducted in the same manner as in Example 1 except that the amount of p-acetoxystyrene charged was changed from 0.18 parts to 1.80 parts to obtain 2.75 parts of a red-violet viscous liquid. As a result of analysis by 1 H-NMR, the ratio of complex a in all carbenes was 90%. The obtained liquid was washed 3 times with 20 parts of methanol and dried under reduced pressure to obtain 0.51 part of complex a as a pink powder. As a result of analysis by 1 H-NMR, the ratio of complex a in all carbenes was 100%.
〔実施例3〕
プロピオール酸の添加の直前にアセトニトリル0.10部を添加した以外は実施例1と同様に操作を行なって、暗桃色粉末1.19部を得た。
1H−NMRにより分析したところ、全カルベン中における錯体aの割合は81%であった。得られた粉末をメタノール20部で3回洗浄し、減圧乾燥して錯体aを桃色粉末0.59部として得た。1H−NMRにより分析したところ、全カルベン中における錯体aの割合は100%であった。
Example 3
The same operation as in Example 1 was carried out except that 0.10 parts of acetonitrile was added immediately before the addition of propiolic acid to obtain 1.19 parts of dark pink powder.
As a result of analysis by 1 H-NMR, the ratio of complex a in all carbenes was 81%. The obtained powder was washed 3 times with 20 parts of methanol and dried under reduced pressure to obtain 0.59 parts of complex a as a pink powder. As a result of analysis by 1 H-NMR, the ratio of complex a in all carbenes was 100%.
〔実施例4〕
p−アセトキシスチレン添加量を0.18部から0.90部に変更した以外は実施例3と同様にして反応を行ない、赤紫色粘性液1.69部を得た。
1H−NMRにより分析したところ、全カルベン中における錯体aの割合は95%であった。得られた液をメタノール20部で3回洗浄し、減圧乾燥して錯体aを桃色粉末0.69部として得た。1H−NMRにより分析したところ、全カルベン中における錯体aの割合は100%であった。
Example 4
The reaction was conducted in the same manner as in Example 3 except that the addition amount of p-acetoxystyrene was changed from 0.18 part to 0.90 part to obtain 1.69 parts of a red-violet viscous liquid.
As a result of analysis by 1 H-NMR, the ratio of the complex a in the total carbene was 95%. The obtained liquid was washed 3 times with 20 parts of methanol and dried under reduced pressure to obtain Complex a as 0.69 parts of pink powder. As a result of analysis by 1 H-NMR, the ratio of complex a in all carbenes was 100%.
〔実施例5〕
ビス(トリ(シクロヘキシル)ホスフィン)(p−クロロメチルベンジリデン)ルテニウム(IV)ジクロリド(錯体b)の合成
p−アセトキシスチレン0.18部に代えて、p−クロロメチルスチレン0.17部を用いた以外は実施例3と同様にして反応を行ない、暗桃色粉末1.10部を得た。
1H−NMRにより分析したところ、全カルベン中における錯体bの割合は75%であった。得られた粉末をメタノール20部で3回洗浄し、減圧乾燥して錯体bを桃色粉末0.51部として得た。この粉末を1H−NMRにより分析したところ、全カルベン中における錯体bの割合は100%であった。また、31P−NMRにより分析したところ、単一のピークを示した。
Example 5
Synthesis of bis (tri (cyclohexyl) phosphine) (p-chloromethylbenzylidene) ruthenium (IV) dichloride (complex b) Instead of 0.18 part of p-acetoxystyrene, 0.17 part of p-chloromethylstyrene was used. The reaction was conducted in the same manner as in Example 3 except that 1.10 parts of dark pink powder was obtained.
As a result of analysis by 1 H-NMR, the ratio of the complex b in the total carbene was 75%. The obtained powder was washed three times with 20 parts of methanol and dried under reduced pressure to obtain 0.51 part of complex b as a pink powder. When this powder was analyzed by 1 H-NMR, the ratio of the complex b in the total carbene was 100%. Moreover, when analyzed by 31 P-NMR, it showed a single peak.
得られた錯体bのNMRスペクトルデータを以下に示す。
1H−NMR(CDCl3、25℃)δppm:20.04(s、1H)、8.44(d、2H)、7.34(d、2H)、4.41(s、2H)、2.61(brs、6H)、1.90−1.05(m、60H)
31P−NMR(CDCl3、25℃)δppm:36.6(s)
The NMR spectrum data of the obtained complex b are shown below.
1 H-NMR (CDCl 3 , 25 ° C.) δ ppm: 20.04 (s, 1H), 8.44 (d, 2H), 7.34 (d, 2H), 4.41 (s, 2H), 2 .61 (brs, 6H), 1.90-1.05 (m, 60H)
31 P-NMR (CDCl 3 , 25 ° C.) δ ppm: 36.6 (s)
〔比較例1〕
プロピオール酸0.08部に代えてフェニルアセチレン0.22部を用いた以外は実施例1と同様にして反応を行ない、赤褐色粉末1.20部を得た。
1H−NMRにより分析したところ、全カルベン中における錯体aの割合は81%であった。それ以外にビス(トリシクロヘキシルホスフィン)ベンジリデンルテニウム(IV)ジクロリド(錯体c)12%及びビス(トリシクロヘキシルホスフィン)(2−フェニルエチリデン)ルテニウム(IV)ジクロリド(錯体d)7%が観測された。また、31P−NMRにより分析したところ、3本のピークが確認された。得られた粉末にメタノール20部を加え3回洗浄を行なったが、錯体c及び錯体dを除去することができなかった。
[Comparative Example 1]
The reaction was conducted in the same manner as in Example 1 except that 0.22 part of phenylacetylene was used instead of 0.08 part of propiolic acid to obtain 1.20 parts of a reddish brown powder.
As a result of analysis by 1 H-NMR, the ratio of complex a in all carbenes was 81%. In addition, 12% of bis (tricyclohexylphosphine) benzylidene ruthenium (IV) dichloride (complex c) and 7% of bis (tricyclohexylphosphine) (2-phenylethylidene) ruthenium (IV) dichloride (complex d) were observed. Moreover, when analyzed by 31 P-NMR, three peaks were confirmed. Although 20 parts of methanol was added to the obtained powder and washed three times, complex c and complex d could not be removed.
〔比較例2〕
プロピオール酸0.08部に代えて、フェニルアセチレン0.11部を用いた以外は実施例3と同様にして反応を行ない、赤褐色粉末1.25部を得た。1H−NMRにより分析したところ、全カルベン中における錯体aの割合は80%であった。それ以外に錯体c11%及び錯体d9%が観測された。また、31P−NMRにより分析したところ、3本のピークが確認された。得られた粉末にn−ヘキサン20部を加え3回洗浄を行なったが、錯体c及び錯体dを除去することができなかった。
[Comparative Example 2]
The reaction was conducted in the same manner as in Example 3 except that 0.11 part of phenylacetylene was used instead of 0.08 part of propiolic acid to obtain 1.25 parts of a reddish brown powder. As a result of analysis by 1 H-NMR, the ratio of complex a in all carbenes was 80%. In addition, 11% of complex c and 9% of complex d were observed. Moreover, when analyzed by 31 P-NMR, three peaks were confirmed. Although 20 parts of n-hexane was added to the obtained powder and washed three times, the complex c and the complex d could not be removed.
Claims (4)
R6―C≡C―COOR7 (3)
(式(3)中、R6及びR7は、それぞれ、水素又は有機基を表す。)
R 6 -C≡C-COOR 7 (3)
(In formula (3), R 6 and R 7 each represent hydrogen or an organic group.)
R8―CN (5)
(式(5)中、R8は、1価の有機基である。) The method for producing a ruthenium complex compound according to any one of claims 1 to 3, wherein the compound (5) represented by the general formula (5) is present in the step [1].
R 8 -CN (5)
(In formula (5), R 8 is a monovalent organic group.)
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JP2013522351A (en) * | 2010-03-22 | 2013-06-13 | ユニバーシティー コート オブ ザ ユニバーシティー オブ セイント アンドリューズ | Ruthenium complexes for use in olefin metathesis |
US9233994B2 (en) | 2010-03-22 | 2016-01-12 | University Court Of The University Of St. Andrews | Ruthenium complexes for use in olefin metathesis |
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