JP2009211904A - Electro-optical device and electronic apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electro-optical device that includes a functional layer with a uniform film thickness achieved through proper wetting and spreading of functional liquid within a bank, and to provide an electronic apparatus having such an electro-optical device. <P>SOLUTION: An organic EL device 100 that is used as an electro-optical device includes a substrate 8, a number of pixels 2 arranged on the substrate 8, a bank part 30 that is provided on the substrate 8 to segment each region 2a of multiple pixels 2, a groove 38 that is formed on the side face of the bank part 30 in the direction along the upper face of the substrate 8 to surround each region 2a of multiple pixels 2, and an organic functional layer 40 formed on the substrate 8 by arranging functional liquid at regions segmented by the bank part 30. An upper face 38a and a lower face 38b on the groove 38 are lyophilic. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an electro-optical device and an electronic apparatus.

  As a method for manufacturing an organic EL electro-optical device, a method of forming an organic functional layer by a droplet discharge method is known (for example, Patent Document 1). In the droplet discharge method, a functional liquid in which the constituent material of the organic functional layer is dissolved or dispersed in a solvent is selectively placed in the pixel area partitioned by the bank, and the solvent is evaporated from the functional liquid to organic function. Form a layer. For this reason, the process can be simplified and the amount of raw materials used can be reduced.

  On the other hand, in the droplet discharge method, the functional liquid does not necessarily land at a certain position in the pixel region. For this reason, the film thickness of the organic functional layer formed becomes non-uniform | heterogenous, and a display quality may fall. As a method for making the film thickness of the organic functional layer uniform, in the bank of the two-layer structure of the inorganic bank layer and the organic bank layer, a groove is provided on the side surface of the bank by over-etching the lower inorganic bank layer, and this groove A method has been proposed in which a functional liquid is wetted and spread in a bank using a capillary phenomenon (for example, Patent Document 2). According to such a method, the functional liquid spreads over a wider range than the pixel region, so that the uniformity of the film thickness can be improved.

Japanese Patent No. 3328297 JP 2007-80765 A

  However, even if the lower surface of such a groove is lyophilic, if the upper surface is an upper organic bank layer and is liquid-repellent, there is a possibility that the functional liquid will not spread evenly over the entire groove. is there. Moreover, it is not easy to form a groove having a desired shape in the inorganic bank layer by partially removing the base side of the inorganic bank layer in the bank portion by wet etching.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  Application Example 1 An electro-optical device according to this application example is provided on a base body, a plurality of pixels arranged on the base body, and the base body, and divides each region of the plurality of pixels. The functional liquid is applied to the bank section, a groove section surrounding each area of the plurality of pixels, and a region partitioned by the bank section. And a functional layer formed on the substrate, wherein the upper surface and the lower surface of the groove portion are lyophilic.

  According to this configuration, the groove portion is formed on the side surface of the bank portion. For this reason, when the functional liquid is arranged in each region of the plurality of pixels surrounded by the bank part, the functional liquid enters the groove part by capillary action. At this time, since the upper surface and the lower surface are both lyophilic in the groove portion, the functional liquid spreads well along the upper surface and the lower surface. As a result, the functional liquid spreads well around the respective areas of the plurality of pixels, so that the functional liquid can be more uniformly arranged in the entire areas of the plurality of pixels. Therefore, the uniformity of the functional layer thickness can be improved.

  Application Example 2 In the electro-optical device according to the application example, the bank unit includes a first bank layer formed on the base and a second bank layer stacked on the first bank layer. A bank layer, wherein the second bank layer has an opening that overlaps a periphery of each region of the plurality of pixels, and the first bank layer includes each of the plurality of pixels. An opening that is larger than the periphery of the region, and a portion of the surface of the second bank layer on the first bank layer side that does not overlap the first bank layer defines the upper surface of the groove. It may be done.

  According to this configuration, the groove portion can be easily formed between the base and the second bank layer by forming the opening portion of the first bank layer larger than the opening portion of the second bank layer.

  Application Example 3 In the electro-optical device according to the application example, the second bank layer may be made of a lyophilic material.

  According to this configuration, since the second bank layer is made of a lyophilic material, the upper surface of the groove can be made lyophilic.

  Application Example 4 In the electro-optical device according to the application example described above, the first bank layer with respect to an etchant capable of etching the material of the first bank layer and the material of the second bank layer. The etching rate of the material may be larger than the etching rate of the material of the second bank layer.

  According to this configuration, for the same etchant, the amount by which the first bank layer is etched is greater than the amount by which the second bank layer is etched. Thus, when the opening is formed by isotropically etching the second bank layer, the first bank layer is also etched, and the opening of the first bank layer is changed to the opening of the second bank layer. Can be made larger.

  Application Example 5 In the electro-optical device according to the application example described above, the first bank layer may be made of a metal material, and the second bank layer may be made of an inorganic material.

  According to this configuration, the opening of the first bank layer can be easily formed in a desired size by selective etching using an etchant suitable for the metal material of the first bank layer. Thereby, a desired depth can be easily obtained in the groove.

  Application Example 6 In the electro-optical device according to the application example, the bank unit further includes a third bank layer stacked on the second bank layer, and the third bank layer includes: It has an opening overlapping the opening of the second bank layer, and may be made of an organic material.

  According to this configuration, the bank portion can be thickened by stacking the third bank layer made of an organic material on the second bank layer. Thereby, it can prevent that a functional liquid overflows from a bank part.

  Application Example 7 In the electro-optical device according to the application example, the lower surface of the groove portion is a first electrode provided on the surface of the base, and the functional layer includes an organic light emitting layer. It is a functional layer, and the second electrode may be provided on the organic functional layer.

  According to this configuration, since the uniformity of the film thickness of the organic functional layer is improved in each region of the plurality of pixels, an organic EL device without display unevenness can be provided.

  Application Example 8 In the electro-optical device according to the application example described above, the lower surface of the groove portion may be the base body, and the functional layer may be a colored layer that selectively transmits predetermined color light.

  According to this configuration, since the uniformity of the thickness of the colored layer is improved in each region of the plurality of pixels, an electro-optical device including a color filter without color unevenness can be provided.

  Application Example 9 An electronic apparatus according to this application example includes the electro-optical device described above.

  According to this configuration, since the electronic device includes the organic electroluminescence device without display unevenness or the color filter without color unevenness, an electronic device having excellent display quality can be provided.

  The present embodiment will be described below with reference to the drawings. In each drawing to be referred to, in order to show the configuration in an easy-to-understand manner, the film thicknesses, dimensional ratios, and the like of the respective components are appropriately changed.

(First embodiment)
<Organic EL device>
First, the configuration of an organic electroluminescence device (hereinafter referred to as an organic EL device) as an electro-optical device according to the first embodiment will be described with reference to the drawings. FIG. 1 is a plan view showing the organic EL device according to the first embodiment. FIG. 2 is a circuit configuration diagram of the organic EL device according to the first embodiment. FIG. 3 is a partial plan view showing a driving portion of each pixel of the organic EL device according to the first embodiment. FIG. 4 is a partial plan view showing a bank portion of each pixel of the organic EL device according to the first embodiment. FIG. 5 is a cross-sectional view illustrating a schematic configuration of the organic EL device according to the first embodiment. Specifically, FIG. 5 is a partial cross-sectional view taken along the line AA ′ in FIGS. 3 and 4. In addition, in each drawing, illustration may be abbreviate | omitted except the component required for description.

  As shown in FIG. 1, the organic EL device 100 includes a substrate 10 and a plurality of pixels 2 arranged on the substrate 10. The pixels 2 are the minimum unit of display of the organic EL device 100 and are arranged in a matrix at intervals. Pixel 2 contributes to the display of red (R), green (G), or blue (B) and is referred to as pixel 2R, 2G, or 2B corresponding to each color (when the corresponding colors are not distinguished) Is simply referred to as pixel 2). The X axis indicates the row direction of the pixels 2, and the Y axis indicates the column direction of the pixels 2.

  The pixel 2 includes an organic electroluminescence element (hereinafter referred to as an organic EL element) 6 as a display element, and the light obtained by the organic EL elements 6R, 6G, and 6B that emit light to R, G, and B, respectively. It is designed to output as display light. A pixel group 4 is composed of the pixels 2R, 2G, and 2B. In the organic EL device 100, various colors can be displayed by appropriately changing the display brightness of each of the pixels 2R, 2G, and 2B in the pixel group 4.

  A bank unit 30 is provided on the substrate 10. The bank unit 30 is formed in a substantially lattice shape in plan view, and partitions each region 2 a of the pixel 2. The region 2a of the pixel 2 is, for example, a quadrangle with rounded corners. The region 2a of the pixel 2 may be circular, oval, or other shape.

  Next, the circuit configuration of the organic EL device 100 will be described with reference to FIG. As shown in FIG. 2, the organic EL device 100 includes a switching TFT (thin film transistor) 11, a driving TFT 12, a storage capacitor 13, and a first capacitor provided on the substrate 10 corresponding to each of the pixels 2. A pixel electrode 28 as an electrode, a common electrode 46 as a second electrode, and an organic functional layer 40. The pixel electrode 28, the common electrode 46, and the organic functional layer 40 constitute the organic EL element 6. In the organic EL element 6, the pixel electrode 28 is an anode and the common electrode 46 is a cathode.

  On the substrate 10, a data line driving circuit 14, a scanning line driving circuit 15, a plurality of scanning lines 16 extending along the X-axis direction, and a plurality of signal lines 17 extending along the Y-axis direction are further provided. And a plurality of power supply lines 18 extending in parallel to the signal lines 17 are provided. As in FIG. 1, the X axis indicates the row direction of the pixels 2, and the Y axis indicates the column direction of the pixels 2. A scanning line 16 is connected to the scanning line driving circuit 15, and a scanning signal is supplied to the gate electrode of the switching TFT 11 via the scanning line 16.

  On the other hand, a signal line 17 is connected to the data line driving circuit 14, and when the switching TFT 11 is turned on, an image signal supplied via the signal line 17 is held in the holding capacitor 13. Depending on the state, the on / off state of the driving TFT 12 is determined. When electrically connected to the power supply line 18 via the driving TFT 12, a drive current flows from the power supply line 18 to the pixel electrode 28, and further a current flows to the common electrode 46 through the organic functional layer 40. The organic functional layer 40 emits light with a luminance corresponding to the amount of current flowing between the pixel electrode 28 and the common electrode 46.

  Next, the structure of the organic EL device 100 will be described with reference to FIGS. 3, 4, and 5. As shown in FIG. 3, the pixel electrode 28 has a substantially rectangular shape in plan view. The pixel electrode 28 is provided corresponding to each of the pixels 2 and has a larger area than the area 2 a of the pixel 2. The four sides of the pixel electrode 28 are surrounded by the signal line 17, the power supply line 18, the scanning line 16, and scanning lines (not shown) for other pixel electrodes 28. The driving TFT 12 is provided corresponding to each of the pixels 2 and is disposed so as not to overlap the region 2 a of the pixel 2.

  As shown in FIG. 5, the organic EL device 100 includes a driving TFT 12, interlayer insulating layers 25 and 26, a pixel electrode 28, a bank unit 30, an organic functional layer 40, and a common electrode 46 on a substrate 10. And. The organic EL device 100 is a bottom emission method in which light emitted from the organic functional layer 40 is emitted to the substrate 10 side.

In the present embodiment, the substrate 8 is composed of the substrate 10, the driving TFT 12, the interlayer insulating layers 25 and 26, and the pixel electrode 28. The substrate 10 is made of a light-transmitting material. Examples of the light-transmitting material include glass, quartz, and resin (plastic and plastic film). The substrate 10 may be covered with a protective layer made of, for example, SiO ₂ .

  The driving TFT 12 is provided on the substrate 10. The driving TFT 12 includes a semiconductor film 20, a gate insulating layer 21, a gate electrode 22, a drain electrode 23, and a source electrode 24. Although not shown, the semiconductor film 20 includes a source region, a drain region, and a channel region. The semiconductor film 20 is covered with a gate insulating layer 21. The gate electrode 22 is positioned so as to overlap the channel region of the semiconductor film 20 with the gate insulating layer 21 interposed therebetween.

  The interlayer insulating layer 25 covers the gate insulating layer 21 and the gate electrode 22. The drain electrode 23 and the source electrode 24 are disposed on the interlayer insulating layer 25. The drain electrode 23 is conductively connected to the drain region of the semiconductor film 20 through a contact hole provided in the interlayer insulating layer 25. Similarly, the source electrode 24 is conductively connected to the source region of the semiconductor film 20 through a contact hole.

The interlayer insulating layer 26 is disposed on the interlayer insulating layer 25 and covers the drain electrode 23 and the source electrode 24. The pixel electrode 28 is located on the interlayer insulating layer 26. The pixel electrode 28 is made of a translucent conductive material, for example, ITO (Indium Tin Oxide). The pixel electrode 28 is conductively connected to the drain electrode 23 through a contact hole provided in the interlayer insulating layer 26. Thereby, the pixel electrode 28 is electrically connected to the driving TFT 12. The surface of the pixel electrode 28 may be subjected to a lyophilic process such as an O ₂ plasma process.

  The bank unit 30 is provided on the base body 8. The bank unit 30 includes three layers including an inorganic bank layer 32 as a first bank layer, an inorganic bank layer 34 as a second bank layer, and an organic bank layer 36 as a third bank layer. . On the side surface of the bank part 30, a groove part 38 is formed in a direction along the upper surface of the substrate 8 (the surface of the pixel electrode 28).

  The inorganic bank layer 32 is formed on the interlayer insulating layer 26 and the pixel electrode 28. The inorganic bank layer 32 rides on the peripheral edge of the pixel electrode 28 and has an opening 32 a located on the pixel electrode 28. The inorganic bank layer 32 is made of an inorganic material having a higher etching rate than a material of the inorganic bank layer 34 with respect to a certain same etchant (for example, hydrofluoric acid solution). The material of the inorganic bank layer 32 is, for example, SiN.

The inorganic bank layer 34 is stacked on the inorganic bank layer 32. The inorganic bank layer 34 has an opening 34 a located on the pixel electrode 28. The inorganic bank layer 34 is made of an inorganic material having an etching rate smaller than that of the material of the inorganic bank layer 32 with respect to a certain same etchant (for example, hydrofluoric acid solution). The material of the inorganic bank layer 34 is, for example, SiO ₂ . Since SiO ₂ has a high affinity (lyophilicity) for the liquid material, if the material of the inorganic bank layer 34 is SiO ₂ , the functional liquid disposed in the bank portion 30 is moved along the surface of the inorganic bank layer 34. Can spread well. The surface of the inorganic bank layer 34 may be subjected to lyophilic treatment such as O ₂ plasma treatment.

  The organic bank layer 36 is stacked on the inorganic bank layer 34. The organic bank layer 36 is located on the pixel electrode 28 and has an opening 36 a that is tapered in cross section. The organic bank layer 36 is made of an organic material, for example, acrylic resin. The material of the organic bank layer 36 may be a polymer material such as a polyimide resin, an olefin resin, or a melamine resin, an organic / inorganic hybrid material containing polysilazane, polysiloxane, or the like. The layer thickness of the organic bank layer 36 is, for example, about 1 μm to 2 μm. Since the bank part 30 is thickened by laminating the organic bank layer 36, it is possible to prevent the functional liquid disposed in the bank part 30 from overflowing from the bank part 30.

  The surface of the organic bank layer 36 may be subjected to a liquid repellency treatment. When the surface of the organic bank layer 36 is subjected to a liquid repellency treatment, it exhibits non-affinity (liquid repellency) with respect to the functional liquid disposed in the bank unit 30. Thereby, the function as a partition member which divides the area | region 2a of the pixel 2 can be performed favorably. Instead of the liquid repellent treatment, the organic bank layer 36 itself may be filled with a liquid repellent component such as a fluorine group in advance.

  Here, the planar structure of the bank part 30 and the groove part 38 is demonstrated with reference to FIG. Both the opening 34 a of the inorganic bank layer 34 and the inner periphery 36 b of the opening 36 a of the organic bank layer 36 overlap the periphery of the region 2 a of the pixel 2. In other words, the region 2a of the pixel 2 is defined by the inner periphery 36b of the opening 36a and the opening 34a. The opening 32 a of the inorganic bank layer 32 is larger than the periphery of the region 2 a of the pixel 2 and smaller than the region of the pixel electrode 28. The groove portion 38 surrounds the area 2 a of the pixel 2. The groove 38 is disposed in a region between the periphery of the region 2 a of the pixel 2 and the opening 32 a of the inorganic bank layer 32 in plan view.

Returning to FIG. 5, the groove 38 is constituted by the surface of the pixel electrode 28, the opening 32 a of the inorganic bank layer 32, and the surface of the inorganic bank layer 34 on the inorganic bank layer 32 side. A portion of the surface of the inorganic bank layer 34 on the inorganic bank layer 32 side that does not overlap with the inorganic bank layer 32 is an upper surface 38 a in the groove 38. Since the upper surface 38a is the surface of the inorganic bank layer 34 made of SiO ₂ , it has lyophilic properties. The portion of the surface of the pixel electrode 28 that overlaps the upper surface 38 a in plan view is the lower surface 38 b of the groove 38. The lower surface 38b is lyophilic because it is the surface of the pixel electrode 28 made of ITO. The height of the upper surface 38 a relative to the lower surface 38 b is the same as the layer thickness of the inorganic bank layer 32.

  The organic functional layer 40 is formed in the region 2 a of the pixel 2 partitioned by the bank unit 30 and is located on the pixel electrode 28. The organic functional layer 40 is formed so as to enter the groove 38 on the pixel electrode 28 side. The organic functional layer 40 includes a hole injection transport layer 42 and a light emitting layer 44 that are sequentially stacked. In the organic functional layer 40, light emission is obtained by recombination of holes injected from the hole injection transport layer 42 and electrons injected from the common electrode 46 in the light emitting layer 44. The light emitting layer 44 emits light to any of R, G, and B corresponding to the pixels 2R, 2G, and 2B.

  As the material of the hole injection transport layer 42, polyphenylene vinylene whose polymer precursor is polytetrahydrothiophenylphenylene, 1,1-bis- (4-N, N-ditolylaminophenyl) cyclohexane, tris (8-hydroxy). Quinolinol) aluminum, polystyrene sulfonic acid, a mixture of polyethylenedioxythiophene and polystyrene sulfonic acid (PEDOT / PSS), or the like can be used.

  As a material of the light emitting layer 44, polyfluorene derivatives (PF), polyparaphenylene vinylene derivatives (PPV), polyphenylene derivatives (PP), polyphenylene derivatives (PF), which are known polymer light emitting materials capable of emitting fluorescence or phosphorescence. Polysilanes such as paraphenylene derivatives (PPP), polyvinylcarbazole (PVK), polythiophene derivatives, polydialkylfluorene (PDAF), polyfluorenebenzothiadiazole (PFBT), polyalkylthiophene (PAT), and polymethylphenylsilane (PMPS) Etc. can be used. In addition, these light-emitting materials include polymer materials such as perylene dyes, coumarin dyes, rhodamine dyes, rubrene, perylene, 9,10-diphenylanthracene, tetraphenylbutadiene, Nile red, coumarin 6, quinacridone, and the like. The low molecular weight material may be doped.

The common electrode 46 is formed so as to cover the bank part 30 and the organic functional layer 40. Although not shown, the common electrode 46 is configured by, for example, sequentially stacking a LiF layer and an Al layer. With this configuration, the common electrode 46 also serves as an electron injection layer and a reflection layer. A cathode protective layer may be formed on the common electrode 46. As a material for the cathode protective layer, SiO ₂ , SiN, SiON or the like can be used. When the cathode protective layer is formed, it is possible to prevent oxygen and the like from entering the common electrode 46 during the manufacturing process and prevent the common electrode 46 from being corroded.

  The common electrode 46 is covered with a sealing layer 48. The sealing layer 48 is made of epoxy resin, acrylic resin, liquid glass, or the like, and glass, metal, resin film, plastic, or other sealing members may be laminated and bonded.

  In the organic EL device 100 of the present embodiment, light emitted from the organic functional layer 40 to the substrate 10 side is emitted to the substrate 10 side, and light emitted from the organic functional layer 40 to the common electrode 46 side is emitted. And is emitted to the substrate 10 side.

  The organic EL device 100 may be a top emission type organic EL device in which light emitted from the organic functional layer 40 is emitted to the sealing layer 48 side. When the organic EL device 100 is a top emission method, the substrate 10 may use either a transparent material or an opaque material. The driving TFT 12 may overlap the region 2 a of the pixel 2. In the case of the top emission method, a light-transmitting conductive material is used for the common electrode 46, and a light-transmitting material is used for the sealing layer 48.

<Method for manufacturing organic EL device>
Next, a method for manufacturing the organic EL device according to the first embodiment will be described with reference to the drawings. 6, 7 and 8 are diagrams for explaining a method of manufacturing the organic EL device according to the first embodiment. In the following description, an example in which the organic functional layer 40 is formed using a droplet discharge method (inkjet method) will be described. However, the following procedure and the material configuration of the functional liquid are examples, and are not limited thereto.

  First, as shown in FIG. 6A, the base 8 is formed. The base 8 is obtained by forming the driving TFT 12, the interlayer insulating layers 25 and 26, and the pixel electrode 28 on the substrate 10 using a known method.

Next, as illustrated in FIG. 6B, an inorganic material layer 32 f that covers the interlayer insulating layer 26 and the pixel electrode 28 is formed. As a material of the inorganic material layer 32f, for example, SiN is used. Subsequently, as shown in FIG. 6C, an inorganic material layer 34f covering the inorganic material layer 32f is formed. For example, SiO ₂ is used as the material of the inorganic material layer 34f. Next, as shown in FIG. 6D, an organic material layer 36f covering the inorganic material layer 34f is formed. As a material of the organic material layer 36f, for example, an acrylic resin is used. The layer thickness of the organic material layer 36f is, for example, about 1 μm to 2 μm.

  Next, as shown in FIG. 7A, the organic material layer 36f is patterned by photolithography, and a portion overlapping the periphery of the region 2a of the pixel 2 is opened. At this time, since the organic material layer 36f is thick, the opening 36a is formed in a tapered shape. As a result, the organic bank layer 36 having the opening 36 a whose inner periphery 36 b overlaps the periphery of the region 2 a of the pixel 2 is formed.

Here, if necessary, the surface of the organic bank layer 36 may be subjected to a liquid repellency treatment. As a liquid repellent treatment method, a plasma treatment method using a gas containing a fluorine compound (fluorine-containing gas) as a treatment gas can be applied. By using a fluorine compound, a fluorine group is introduced to the surface of the organic bank layer 36 and liquid repellency is imparted. For example, CF ₄ , SF ₆ , CHF ₃ or the like can be used as the fluorine-based compound.

  Next, using the organic bank layer 36 as a mask, the inorganic material layer 34f and the inorganic material layer 32f are patterned to open portions overlapping the respective opening portions 36a. Here, the patterning of the inorganic material layer 34f and the inorganic material layer 32f is preferably performed by wet etching using a hydrofluoric acid solution (HF) as an etchant. By using wet etching, the inorganic material layer 34f and the inorganic material layer 32f are isotropically etched. Note that the method of patterning the inorganic material layer 34f and the inorganic material layer 32f is not limited to wet etching as long as it is isotropic etching.

  In this patterning, the etching is stopped when the opening 34a formed in the inorganic material layer 34f just overlaps the inner periphery 36b of the opening 36a. At this time, since the material of the inorganic material layer 32f has a higher etching rate than the material of the inorganic material layer 34f, the amount of etching of the inorganic material layer 32f is larger than the amount of etching of the inorganic material layer 34f. Accordingly, the opening 32 a of the inorganic bank layer 32 is formed larger than the opening 34 a of the inorganic bank layer 34.

  As a result, as shown in FIG. 7B, an inorganic bank layer 34 having an opening 34a and an inorganic bank layer 32 having an opening 32a are formed, and a region in the opening 32a of the pixel electrode 28 is exposed. Is done. As a result, a groove portion 38 formed by the surface of the pixel electrode 28, the opening 32a of the inorganic bank layer 32, and the surface of the inorganic bank layer 34 on the inorganic bank layer 32 side is formed.

  The depth (the size of the opening 32a relative to the opening 34a) and the height (layer thickness of the inorganic bank layer 32) in the groove 38 are determined by observing the composition, viscosity, and behavior after placement of the functional liquid 42a described later. It may be set experimentally, theoretically, or simulated. In a later step, when the functional liquid 42 a arranged in the bank unit 30 enters the groove 38, at least a part of the air that has been in the groove 38 is pushed into the groove 38. Therefore, it is desirable to secure a depth that allows the functional liquid 42a to sufficiently enter the groove portion 38 even when air is pushed in. In the present embodiment, the depth in the groove 38 can be adjusted by the difference in the etching rate difference between the inorganic bank layer 32 and the inorganic bank layer 34.

  In addition, by using wet etching, it is possible to remove development residues of the organic bank layer 36 that cause uneven application of the organic functional layer 40, deposits generated when the organic bank layer 36 is subjected to liquid repellency, and the like. . When the pixel electrode 28 is made of ITO, the work function (that is, the efficiency of hole injection into the hole injection / transport layer 42) can be adjusted by treating the surface with a hydrofluoric acid solution.

  As described above, the bank portion 30 having the three-layer structure of the inorganic bank layer 32, the inorganic bank layer 34, and the organic bank layer 36 is formed on the substrate 8. Further, on the side surface of the bank portion 30, a groove portion 38 surrounding the periphery of the region 2 a of the pixel 2 is formed in a direction along the upper surface of the base 8 (the surface of the pixel electrode 28). The opening 36a of the organic bank layer 36, the opening 34a of the inorganic bank layer 34, and the opening 32a of the inorganic bank layer 32 communicate with each other, and the pixel electrode 28 is exposed in the opening 32a.

  Next, as shown in FIG. 8A, the functional liquid 42 a for forming the hole injecting and transporting layer 42 is ejected from a liquid droplet ejection head (not shown), and the pixel 2 partitioned by the bank unit 30. It arrange | positions to the area | region 2a. The functional liquid 42a includes a material for forming the hole injection transport layer 42 and a solvent. When the functional liquid 42a is disposed in the bank portion 30 on the base 8, the functional liquid 42a tends to spread in the horizontal direction because of its high fluidity. Since the uppermost layer of the bank unit 30 is the organic bank layer 36, the functional liquid 42 a does not spread beyond the organic bank layer 36.

  On the other hand, since the groove part 38 is formed in the side surface of the bank part 30, the functional liquid 42a enters the groove part 38 by capillary action. At this time, since the upper surface 38a and the lower surface 38b are both lyophilic in the groove portion 38, the functional liquid spreads well along the upper surface 38a and the lower surface 38b. Thereby, since the functional liquid 42a spreads well around the area 2a of the pixel 2, the functional liquid 42a can be more uniformly arranged in the entire area 2a of the pixel 2.

  Subsequently, the hole in the transport layer 42 is formed on the substrate 8 by evaporating the solvent of the functional liquid 42 a by heating or light irradiation. As a method of evaporating the solvent of the functional liquid 42a, baking may be performed at a predetermined temperature and time (for example, 200 ° C., 10 minutes) in an air environment or a nitrogen gas atmosphere, or in a pressure environment lower than atmospheric pressure (under a reduced pressure environment). ), The solvent may be removed. In this embodiment, since the functional liquid 42a is uniformly arranged in the entire region 2a of the pixel 2, the uniformity of the film thickness of the hole injection / transport layer 42 to be formed can be improved. Since the uniformity of the thickness of the hole injection transport layer 42 is improved, the flatness of the surface of the hole injection transport layer 42 is also improved.

  Next, as shown in FIG. 8B, the functional liquid 44 a for forming the light emitting layer 44 is ejected from the liquid droplet ejection head, and is disposed on the hole injecting and transporting layer 42 in the bank unit 30. The functional liquid 44a includes a material for forming the light emitting layer 44 and a solvent. The functional liquid 44a is a functional liquid containing a material that emits red colored light, a functional liquid containing a material that emits green colored light, or a functional liquid containing a material that emits blue colored light. , 2G, 2B (see FIG. 1).

  Subsequently, as illustrated in FIG. 8C, the solvent of the functional liquid 44 a is evaporated to form the light emitting layer 44 on the hole injection transport layer 42. Since the surface of the hole injecting and transporting layer 42 is satisfactorily flattened, the uniformity of the film thickness of the light emitting layer 44 formed thereon can be improved. As a result, the organic functional layer 40 is formed on the substrate 8.

  Next, as shown in FIG. 5, a common electrode 46 is formed so as to cover the bank part 30 and the organic functional layer 40. As a method for forming the common electrode 46, for example, an evaporation method is applied. Next, the sealing layer 48 is formed on the common electrode 46. Thus, the organic EL device 100 can be manufactured.

  According to the first embodiment, the following effects can be obtained.

  (1) On the side surface of the bank part 30, a groove part 38 having both an upper surface 38a and a lower surface 38b having lyophilic properties is formed. For this reason, when the functional liquid 42a is arranged in the region 2a of the pixel 2 surrounded by the bank part 30, the functional liquid 42a enters the groove part 38 by capillary action and spreads well along the upper surface 38a and the lower surface 38b. Since the functional liquid 42a spreads well around the region 2a of the pixel 2 and is uniformly disposed throughout the region 2a, the uniformity of the film thickness of the formed hole injection / transport layer 42 is improved, and the hole injection / transport is improved. The flatness of the surface of the layer 42 is also improved. Thereby, the uniformity of the film thickness of the light emitting layer 44 formed thereon is improved. Therefore, since the uniformity of the film thickness of the organic functional layer 40 is improved in each of the regions 2a of the pixels 2, the organic EL device 100 without display unevenness can be provided.

  (2) Since the material of the inorganic material layer 32f has a higher etching rate than the material of the inorganic material layer 34f, the opening 32a of the inorganic bank layer 32 is formed larger than the opening 34a of the inorganic bank layer 34 in the same etching process. Is done. Thereby, the groove part 38 can be formed easily. Moreover, since the inorganic bank layer 34 is comprised with the lyophilic inorganic material, the upper surface 38a in the groove part 38 can be made lyophilic.

  (3) By laminating the organic bank layer 36 on the inorganic bank layer 34, the bank part 30 can be thickened and the functional liquids 42 a and 44 a can be prevented from overflowing from the bank part 30.

(Second Embodiment)
<Organic EL device>
Next, the configuration of the organic EL device according to the second embodiment will be described with reference to the drawings. FIG. 9 is a cross-sectional view illustrating a schematic configuration of the organic EL device according to the second embodiment. In addition, about the component which is common in 1st Embodiment, the same code | symbol is attached | subjected and the description is abbreviate | omitted.

  The organic EL device 200 according to the second embodiment is different from the organic EL device 100 according to the first embodiment in that the bank unit 50 includes a metal bank layer 52 instead of the inorganic bank layer 32. However, the other configurations are the same.

  The bank unit 50 is located on the base 8. The bank unit 50 includes three layers including a metal bank layer 52, an inorganic bank layer 34, and an organic bank layer 36. A groove portion 38 is formed on the side surface of the bank portion 50.

  The metal bank layer 52 is formed on the interlayer insulating layer 26 and the pixel electrode 28. The metal bank layer 52 rides on the peripheral edge of the pixel electrode 28 and has an opening 52 a located on the pixel electrode 28. The opening 52 a is larger than the periphery of the region 2 a of the pixel 2 and smaller than the region of the pixel electrode 28. Although not shown, the metal bank layer 52 is divided for each pixel 2. The metal bank layer 52 is made of, for example, aluminum. The material of the metal bank layer 52 may be an aluminum neodymium alloy, an aluminum copper alloy, molybdenum, chromium, or the like.

  The inorganic bank layer 34 is stacked on the metal bank layer 52. The groove 38 is disposed in a region between the periphery of the region 2 a of the pixel 2 and the opening 52 a of the metal bank layer 52 in plan view. The groove portion 38 is constituted by the surface of the pixel electrode 28, the opening 52a of the metal bank layer 52, and the surface of the inorganic bank layer 34 on the metal bank layer 52 side.

<Method for manufacturing organic EL device>
Next, a method for manufacturing an organic EL device according to the second embodiment will be described with reference to the drawings. FIG. 10 is a diagram illustrating a method for manufacturing the organic EL device according to the second embodiment.

  As shown in FIG. 10A, a metal material layer 52 f that covers the interlayer insulating layer 26 and the pixel electrode 28 is formed on the substrate 8. As a material of the metal material layer 52f, for example, aluminum is used. Subsequently, an inorganic material layer 34f that covers the metal material layer 52f is formed. Next, an organic material layer covering the inorganic material layer 34f is formed and patterned to form an organic bank layer 36 having an opening 36a. In this patterning, an opening is also made between adjacent pixels 2 in the X-axis direction and the Y-axis direction (see FIG. 1). The reason for opening between the adjacent pixels 2 is to divide the metal bank layer 52 for each pixel 2.

  Next, as shown in FIG. 10B, the inorganic material layer 34f is patterned by wet etching using a hydrofluoric acid solution, for example, using the organic bank layer 36 as a mask. In this patterning, the etching is stopped when the opening 34a formed in the inorganic material layer 34f just overlaps the inner periphery 36b of the opening 36a. As a result, an inorganic bank layer 34 (not shown) having an opening 34a and opening between adjacent pixels 2 is formed. For the patterning of the inorganic material layer 34f, dry etching may be used.

  Next, using the organic bank layer 36 and the inorganic bank layer 34 as a mask, the metal material layer 52f is patterned by wet etching, for example. When the material of the metal material layer 52f is aluminum, an aluminum neodymium alloy, an aluminum copper alloy, or molybdenum, a mixed solution of phosphoric acid, acetic acid, and an aqueous nitric acid solution can be used as an etchant. When the material of the metal material layer 52f is chromium, a mixed solution of nitric acid and a ceric ammonium nitrate aqueous solution can be used as an etchant. Thereby, the metal material layer 52f is selectively etched. Note that the method for patterning the metal material layer 52f is not limited to wet etching as long as it is isotropic etching.

  In this patterning, as shown in FIG. 10C, the opening 52a formed in the metal material layer 52f has a desired size with respect to the inner periphery 36b of the opening 36a, that is, in the groove 38. The etching is stopped at the point where the depth is obtained. Thereby, the metal bank layer 52 having the opening 52a is formed, and the region in the opening 52a of the pixel electrode 28 is exposed. The metal bank layer 52 is opened between adjacent pixels 2 (not shown), and is divided for each pixel 2. As a result, a groove portion 38 formed by the surface of the pixel electrode 28, the opening 52a of the metal bank layer 52, and the surface of the inorganic bank layer 34 on the metal bank layer 52 side is formed.

  According to the second embodiment, the following effects can be obtained.

  (1) Since the groove portion 38 is formed on the side surface of the bank portion 50, when the functional liquid 42 a is disposed in the region 2 a of the pixel 2 surrounded by the bank portion 50, the functional liquid 42 a is placed around the region 2 a of the pixel 2. Good distribution. Since the functional liquid 42a is uniformly disposed in the entire region 2a of the pixel 2, the uniformity of the film thickness of the hole injection / transport layer 42 to be formed is improved, and the flatness of the surface of the hole injection / transport layer 42 is also improved. improves. Thereby, the uniformity of the film thickness of the light emitting layer 44 formed thereon is improved. Therefore, since the uniformity of the film thickness of the organic functional layer 40 is improved in each of the regions 2a of the pixels 2, the organic EL device 200 without display unevenness can be provided.

  (2) By selectively etching using an etchant suitable for the metal material of the metal bank layer 52, the opening 52a of the metal bank layer 52 can be easily formed in a desired size. Thereby, a desired depth can be easily obtained in the groove portion 38.

(Third embodiment)
<Liquid crystal device>
Next, a configuration of a liquid crystal device as an electro-optical device according to the third embodiment will be described with reference to the drawings. FIG. 11 is a plan view showing a liquid crystal device according to the third embodiment. FIG. 12 is a cross-sectional view illustrating a schematic configuration of the liquid crystal device according to the third embodiment. Specifically, FIG. 12 is a partial cross-sectional view taken along line BB ′ of FIG. In addition, in each drawing, illustration may be abbreviate | omitted except the component required for description.

  As shown in FIG. 12, the liquid crystal device 300 according to the third embodiment includes an element substrate 9, a color filter substrate 70, and a liquid crystal layer 80 positioned between the element substrate 9 and the color filter substrate 70. This is an active matrix liquid crystal device provided. In the present embodiment, the color filter substrate 70 includes a bank unit 60 having the same configuration as the bank unit 30 of the organic EL device 100 according to the first embodiment.

  As shown in FIG. 11, on the element substrate 9 and the color filter substrate 70, pixels 3R, 3G, and 3B that contribute to the display of R, G, and B (referred to simply as pixels 3 if the corresponding colors are not distinguished). ) Are arranged. The pixels 3 are the minimum unit of display of the liquid crystal device 300 and are arranged in a matrix at intervals. The X axis indicates the row direction of the pixels 3, and the Y axis indicates the column direction of the pixels 3. A pixel group 5 is composed of the pixels 3R, 3G, and 3B. In the liquid crystal device 300, various colors can be displayed by appropriately changing the display brightness of the pixels 3R, 3G, and 3B in the pixel group 5.

  The color filter substrate 70 is provided with a bank unit 60. The bank unit 60 is formed in a substantially lattice shape in plan view, and partitions each region of the pixel 3. The region of the pixel 3 is, for example, a quadrangle.

  Next, the structure of the liquid crystal device 300 will be described with reference to FIG. The element substrate 9 includes a substrate 10, a driving TFT 12, interlayer insulating layers 25 and 26, and a pixel electrode 28. The substrate 10 is made of a light-transmitting material. On the substrate 10, interlayer insulating layers 25 and 26 including a plurality of driving TFTs 12 are provided. A plurality of pixel electrodes 28 connected to each of the driving TFTs 12 are provided on the interlayer insulating layer 26. The pixel electrode 28 is made of, for example, ITO.

  The color filter substrate 70 includes a substrate 72 as a base, a bank unit 60, a colored layer 74, and an overcoat layer 76. The substrate 72 is made of a light-transmitting material, for example, glass.

  The bank unit 60 is provided on the liquid crystal layer 80 side of the substrate 72. The bank unit 60 includes three layers including an inorganic bank layer 62 as a first bank layer, an inorganic bank layer 64 as a second bank layer, and an organic bank layer 66 as a third bank layer. . On the side surface of the bank unit 60, a groove unit 68 is formed in a direction along the surface of the substrate 72 on the liquid crystal layer 80 side. A light shielding layer may be provided between the substrate 72 and the bank unit 60 so as to overlap the bank unit 60.

The inorganic bank layer 62 is formed on the substrate 72. The inorganic bank layer 62 is made of a material having a higher etching rate than the material of the inorganic bank layer 64. The material of the inorganic bank layer 62 is, for example, SiN. The inorganic bank layer 64 is stacked on the inorganic bank layer 62. The inorganic bank layer 64 is made of a material having an etching rate smaller than that of the material of the inorganic bank layer 62. The material of the inorganic bank layer 64 is, for example, SiO ₂ . The organic bank layer 66 is stacked on the inorganic bank layer 64. The organic bank layer 66 is made of, for example, acrylic resin.

  The inorganic bank layer 62, the inorganic bank layer 64, and the organic bank layer 66 have an opening corresponding to the pixel 3. Both the opening of the inorganic bank layer 64 and the inner periphery of the opening of the organic bank layer 66 overlap the periphery of the pixel 3 region. The opening of the inorganic bank layer 62 is larger than the periphery of the pixel 3 region. The groove 68 surrounds the area of the pixel 3. The groove 68 is arranged in a region between the periphery of the pixel 3 and the opening of the inorganic bank layer 62 in plan view.

The groove 68 is constituted by the surface of the substrate 72, the opening of the inorganic bank layer 62, and the surface of the inorganic bank layer 64 on the inorganic bank layer 62 side. In the groove portion 68, the upper surface 68 a viewed from the substrate 72 side is a surface of the inorganic bank layer 64 made of SiO ₂ and thus has lyophilic properties. In the groove 68, the lower surface 68b is lyophilic because it is the surface of the substrate 72 made of glass.

  The colored layer 74 is formed in the region of the pixel 3 partitioned by the bank unit 60. The colored layer 74 is formed so as to enter the groove 68 on the substrate 72 side. A combination of colored layers 74R, 74G, and 74B that selectively transmit one of R, G, and B color light (simply referred to as colored layer 74 when the corresponding colors are not distinguished) and three pixel electrodes 28 Thus, the three color pixels 3R, 3G, and 3B are configured.

  The overcoat layer 76 is formed so as to cover the bank part 60 and the colored layer 74. A common electrode 78 is formed on the overcoat layer 76. The common electrode 78 is made of, for example, ITO.

  The liquid crystal layer 80 is located between the element substrate 9 and the color filter substrate 70. Although not shown, an alignment film is formed on the element substrate 9 on the side in contact with the liquid crystal layer 80 so as to cover the interlayer insulating layer 26 and the pixel electrode 28. Although not shown, an alignment film is formed on the color filter substrate 70 on the side in contact with the liquid crystal layer 80 so as to cover the common electrode 78. The alignment direction of the liquid crystal layer 80 is regulated by the alignment treatment performed on these alignment films. Although not shown, polarizing plates are disposed on the element substrate 9 on the side opposite to the liquid crystal layer 80 and the color filter substrate 70 on the side opposite to the liquid crystal layer 80, respectively.

  As a method of forming the color filter substrate 70 included in the liquid crystal device 300 of the present embodiment, the method for manufacturing the organic EL device of the first embodiment can be applied. When the color filter substrate 70 is formed by applying the method for manufacturing the organic EL device, the bank portion 60 and the groove portion 68 may be formed in the same manner as the method for forming the bank portion 30 and the groove portion 38. Moreover, what is necessary is just to use the functional liquid containing the colored layer forming material of predetermined color light (for example, any of three colors of R, G, and B) instead of the functional liquids 42a and 44a.

  According to the third embodiment, the following effects can be obtained.

  (1) Since the groove portion 68 is formed on the side surface of the bank portion 60, when the colored layer forming material is disposed in the region of the pixel 3 surrounded by the bank portion 60, the colored layer forming material is placed around the region of the pixel 3. Since it spreads well and is uniformly arranged in the entire region of the pixel 3, the uniformity of the film thickness of the colored layer 74 to be formed is improved. Since the uniformity of the thickness of the colored layer 74 formed in the region of the pixel 3 is improved, the liquid crystal device 300 including the color filter substrate 70 without color unevenness can be provided.

  Note that the bank unit 60 of the color filter substrate 70 may have the same configuration as the bank unit 50 of the organic EL device 200 according to the second embodiment. According to such a configuration, the same effects as those of the second embodiment can be obtained in the color filter substrate 70.

  Although the electro-optical device has been described above, the pixel referred to in the electro-optical device includes a unit element for the pixel to form an image indirectly in addition to the case where the pixel itself directly forms an image. According to this, the electro-optical device includes an exposure head used for an electrophotographic image forming apparatus, for example.

<Electronic equipment>
The organic EL devices 100 and 200 and the liquid crystal device 300 described above can be mounted and used in a mobile phone 500 as an electronic device, for example, as shown in FIG. The mobile phone 500 includes the organic EL devices 100 and 200 or the liquid crystal device 300 in the display unit 502. With this configuration, the mobile phone 500 including the display unit 502 has excellent display quality.

  The electronic device may be an electronic book, a personal computer, a digital still camera, a viewfinder type or a monitor direct-view type video tape recorder, a car navigation device, and the like. Furthermore, the organic EL devices 100 and 200 can also be used as exposure means of a line printer as an electronic device.

  As mentioned above, although embodiment of this invention was described, various deformation | transformation can be added with respect to the said embodiment in the range which does not deviate from the meaning of this invention. As modifications, for example, the following can be considered.

(Modification 1)
In the organic EL devices 100 and 200 and the liquid crystal device 300 of the above-described embodiment, the bank units 30, 50, and 60 are configured by stacking three bank layers, but the present invention is not limited to this configuration. The bank unit may be composed of two bank layers or may be composed of one bank layer. In the groove portion formed in the bank portion, when the upper surface has liquid repellency, the surface of the bank layer serving as the upper surface may be subjected to lyophilic treatment.

(Modification 2)
In the organic EL devices 100 and 200 of the above embodiment, the organic functional layer 40 is composed of the hole injection transport layer 42 and the light emitting layer 44, but is not limited to this form. The organic functional layer may be composed of three or more functional layers including a light emitting layer.

(Modification 3)
In the organic EL devices 100 and 200 of the above embodiment, the light emitting layer 44 is configured to emit light in any of R, G, and B, but is not limited to this form. The light emitting layer may be configured to emit white light. When the light emitting layer is configured to emit white light, the color filter substrate 70 of the third embodiment may be combined to obtain three colors of R, G, and B.

(Modification 4)
The liquid crystal device 300 of the third embodiment is an FFS transflective liquid crystal device, but is not limited to this configuration. The liquid crystal device 300 may be, for example, an IPS (In-Plane Switching) liquid crystal device, an ECB (Electrically Controlled Birefringence) liquid crystal device, or a VA (Vertical Alignment) liquid crystal device.

1 is a plan view showing an organic EL device according to a first embodiment. 1 is a circuit configuration diagram of an organic EL device according to a first embodiment. FIG. 3 is a partial plan view showing a drive portion of each pixel of the organic EL device according to the first embodiment. FIG. 3 is a partial plan view showing a bank portion of each pixel of the organic EL device according to the first embodiment. 1 is a cross-sectional view illustrating a schematic configuration of an organic EL device according to a first embodiment. The figure explaining the manufacturing method of the organic electroluminescent apparatus concerning 1st Embodiment. The figure explaining the manufacturing method of the organic electroluminescent apparatus concerning 1st Embodiment. The figure explaining the manufacturing method of the organic electroluminescent apparatus concerning 1st Embodiment. Sectional drawing which shows schematic structure of the organic EL apparatus which concerns on 2nd Embodiment. The figure explaining the manufacturing method of the organic electroluminescent apparatus concerning 2nd Embodiment. FIG. 6 is a plan view showing a liquid crystal device according to a third embodiment. Sectional drawing which shows schematic structure of the liquid crystal device which concerns on 3rd Embodiment. FIG. 6 illustrates an electronic device in this embodiment.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 2 ... Pixel, 2a ... Area, 3 ... Pixel, 4 ... Pixel group, 5 ... Pixel group, 6 ... Organic EL element, 8 ... Base, 9 ... Element substrate, 10 ... Substrate, 11 ... Switching TFT, 12 ... Drive TFT, 13 ... holding capacitor, 14 ... data line driving circuit, 15 ... scanning line driving circuit, 16 ... scanning line, 17 ... signal line, 18 ... power line, 20 ... semiconductor film, 21 ... gate insulating layer, 22 ... Gate electrode, 23 ... Drain electrode, 24 ... Source electrode, 25, 26 ... Interlayer insulating layer, 28 ... Pixel electrode, 30 ... Bank part, 32 ... Inorganic bank layer, 32a ... Opening part, 32f ... Inorganic material layer, 34 ... Inorganic bank layer, 34a ... opening, 34f ... inorganic material layer, 36 ... organic bank layer, 36a ... opening, 36b ... inner periphery, 36f ... organic material layer, 38 ... groove, 38a ... upper surface, 38b ... lower surface, 40 ... organic functional layer, 42 ... hole injection transport Layer, 42a ... functional liquid, 44 ... light emitting layer, 44a ... functional liquid, 46 ... common electrode, 48 ... sealing layer, 50 ... bank part, 52 ... metal bank layer, 52a ... opening, 52f ... metal material layer, 60 ... Bank part, 62 ... Inorganic bank layer, 64 ... Inorganic bank layer, 66 ... Organic bank layer, 68 ... Groove part, 70 ... Color filter substrate, 72 ... Substrate, 74 ... Colored layer, 76 ... Overcoat layer, 78 ... Common electrode, 80 ... liquid crystal layer, 100, 200 ... organic EL device, 300 ... liquid crystal device, 500 ... mobile phone, 502 ... display unit.

Claims (9)

A substrate;
A plurality of pixels disposed on the substrate;
A bank part provided on the substrate, and partitioning each region of the plurality of pixels;
A groove portion that is formed on a side surface of the bank portion in a direction along an upper surface of the base body, and surrounds a periphery of each region of the plurality of pixels;
A functional layer formed on the substrate by disposing a functional liquid in a region partitioned by the bank unit,
An electro-optical device, wherein an upper surface and a lower surface of the groove portion are lyophilic. The electro-optical device according to claim 1,
The bank portion includes a first bank layer formed on the base body, and a second bank layer stacked on the first bank layer,
The second bank layer has an opening that overlaps around each region of the plurality of pixels,
The first bank layer has an opening larger than the periphery of each region of the plurality of pixels,
An electro-optical device, wherein a portion of the surface of the second bank layer on the first bank layer side that does not overlap the first bank layer forms the upper surface of the groove. The electro-optical device according to claim 2,
The electro-optical device, wherein the second bank layer is made of a lyophilic material. The electro-optical device according to claim 2, wherein
In contrast to an etchant capable of etching the material of the first bank layer and the material of the second bank layer, the etching rate of the material of the first bank layer is the etching rate of the material of the second bank layer. An electro-optical device that is larger than the electro-optical device. The electro-optical device according to claim 2, wherein
The first bank layer is made of a metal material,
The electro-optical device, wherein the second bank layer is made of an inorganic material. The electro-optical device according to any one of claims 2 to 5,
The bank unit further includes a third bank layer stacked on the second bank layer,
The electro-optical device, wherein the third bank layer has an opening overlapping the opening of the second bank layer and is made of an organic material. The electro-optical device according to any one of claims 1 to 6,
The lower surface of the groove is a first electrode provided on a surface of the base;
The functional layer is an organic functional layer including an organic light emitting layer,
An electro-optical device comprising a second electrode on the organic functional layer. The electro-optical device according to any one of claims 1 to 6,
The lower surface of the groove is the base;
The electro-optical device, wherein the functional layer is a colored layer that selectively transmits predetermined color light.   An electronic apparatus comprising the electro-optical device according to claim 1.

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