JP2009196945A5 - - Google Patents
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- Publication number
- JP2009196945A5 JP2009196945A5 JP2008041012A JP2008041012A JP2009196945A5 JP 2009196945 A5 JP2009196945 A5 JP 2009196945A5 JP 2008041012 A JP2008041012 A JP 2008041012A JP 2008041012 A JP2008041012 A JP 2008041012A JP 2009196945 A5 JP2009196945 A5 JP 2009196945A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008041012A JP5191759B2 (en) | 2008-02-22 | 2008-02-22 | Novel acrylic ester derivative and process for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008041012A JP5191759B2 (en) | 2008-02-22 | 2008-02-22 | Novel acrylic ester derivative and process for producing the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009196945A JP2009196945A (en) | 2009-09-03 |
| JP2009196945A5 true JP2009196945A5 (en) | 2010-10-21 |
| JP5191759B2 JP5191759B2 (en) | 2013-05-08 |
Family
ID=41140875
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008041012A Expired - Fee Related JP5191759B2 (en) | 2008-02-22 | 2008-02-22 | Novel acrylic ester derivative and process for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5191759B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5635890B2 (en) * | 2009-12-21 | 2014-12-03 | 住友化学株式会社 | Resin, photoresist composition and method for producing resist pattern |
| WO2016125585A1 (en) * | 2015-02-02 | 2016-08-11 | 株式会社クラレ | Acrylic acid ester derivative, mixture, polymer compound, and photoresist composition |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2759369B1 (en) * | 1997-02-13 | 1999-04-02 | Essilor Int | NOVEL MONO (THIO) (METH) ACRYLATES, INTERMEDIATE COMPOUNDS FOR THE SYNTHESIS OF THE SAME, POLYMERIZABLE COMPOSITIONS AND POLYMERS OBTAINED THEREFROM AND OPTICAL AND OPHTHALMIC APPLICATIONS THEREOF |
| JP3982950B2 (en) * | 1998-09-17 | 2007-09-26 | 富士フイルム株式会社 | Positive photosensitive resin composition |
| JP3880457B2 (en) * | 2002-06-10 | 2007-02-14 | キヤノン株式会社 | Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus, and method of manufacturing electrophotographic photosensitive member |
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2008
- 2008-02-22 JP JP2008041012A patent/JP5191759B2/en not_active Expired - Fee Related