JP2009189946A - Dipping treatment apparatus - Google Patents

Dipping treatment apparatus Download PDF

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JP2009189946A
JP2009189946A JP2008032951A JP2008032951A JP2009189946A JP 2009189946 A JP2009189946 A JP 2009189946A JP 2008032951 A JP2008032951 A JP 2008032951A JP 2008032951 A JP2008032951 A JP 2008032951A JP 2009189946 A JP2009189946 A JP 2009189946A
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tank
processing
treatment
immersion
replenishing
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Hiroyuki Ishii
洋行 石井
Susumu Shirasaki
享 白崎
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Seiko Epson Corp
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Seiko Epson Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a dipping treatment apparatus capable of stably carrying out the surface treatment of a work. <P>SOLUTION: The dipping treatment apparatus 1 for carrying out the surface treatment of the work W by dipping the work W into a treatment solution includes: a treating vessel part 5A for dip-treating the work W with the stored treatment solution; a replenishing vessel part 5B for replenishing the treatment solution to the treating vessel part 5A; a work treating vessel 5 having a partition plate 42 for parting the treating vessel part 5a from the replenishing vessel part 5B and overflowing the treatment solution in the treating vessel part 5A to the replenishing vessel part 5B; a replenishing flow path 78 communicating the replenishing vessel part 5B with the treating vessel part 5A; a delivery pump 34 provided in the replenishing flow path 78 and for delivering the treating solution in the replenishing vessel part 5B to the treating vessel part 5A; and a controlling means 9 for controlling the delivery pump 34. The controlling means replenishes the treatment solution into the treating vessel part 5A by driving the delivering pump 34 at a time period for waiting treatment between one dip treatment and a next dip treatment. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、処理対象物であるワークを処理溶液に浸漬することにより前記ワークの表面処理を行う浸漬処理装置に関するものである。   The present invention relates to an immersion treatment apparatus that performs surface treatment of a workpiece by immersing a workpiece, which is a treatment object, in a treatment solution.

従来、この種の浸漬処理装置として、ワークに対して表面処理を行う浸漬槽(処理タンク)と、浸漬槽からオーバーフローしたコーティング用液体(処理溶液)を回収する貯液槽(補充層)と、貯液槽と浸漬槽とを接続する配管と、配管に介設され、コーティング用液体中に混入した異物を除去するフィルタと、配管に介設され、貯液槽のコーティング用液体を浸漬槽に送液するポンプと、を有するコーティング装置が知られている(特許文献1参照)。このコーティング装置では、定量ポンプやディスペンサ等の液体定量吐出装置又は点滴装置を用いて、コーティング用液体の有機溶媒を貯液槽に短時間間隔で連続的に補充する一方、ポンプを駆動し、コーティング用液体を浸漬槽からオーバーフローさせながら、貯液槽と浸漬槽との間で循環させる。これにより、コーティング用液体の濃度を一定に保ち、コーティング膜厚を一定に保持するようにしている。
特開2004−113935号公報
Conventionally, as this type of immersion treatment apparatus, an immersion tank (treatment tank) that performs surface treatment on a workpiece, a liquid storage tank (replenishment layer) that collects a coating liquid (treatment solution) overflowed from the immersion tank, A pipe connecting the liquid storage tank and the immersion tank, a filter interposed in the pipe to remove foreign matter mixed in the coating liquid, and a pipe interposed between the storage tank and the coating liquid in the liquid storage tank A coating apparatus having a pump for feeding liquid is known (see Patent Document 1). In this coating device, a liquid metering discharge device such as a metering pump or a dispenser or an infusion device is used to continuously replenish an organic solvent of the coating liquid into the liquid storage tank at short time intervals, while driving the pump to perform coating. The working liquid is circulated between the liquid storage tank and the immersion tank while overflowing from the immersion tank. Thus, the concentration of the coating liquid is kept constant, and the coating film thickness is kept constant.
JP 2004-113935 A

このように、従来の浸漬処理装置は、コーティング用液体の濃度を一定に保つため、コーティング用液体を貯液槽と浸漬槽との間で循環させるようにしている。このため、使用するコーティング用液体(処理溶液)にもよるが、浸漬槽における液面の波立ちにより、ワークの引上げ時に成膜が不安定になり、コーティング膜厚が不均一になる(縞模様となる)問題があった。   Thus, the conventional immersion treatment apparatus circulates the coating liquid between the liquid storage tank and the immersion tank in order to keep the concentration of the coating liquid constant. For this reason, although depending on the coating liquid used (treatment solution), the film surface becomes unstable when the workpiece is pulled up due to the undulation of the liquid surface in the immersion tank, and the coating film thickness becomes non-uniform (stripe pattern and There was a problem.

本発明は、ワークの表面処理を安定に行うことができる浸漬処理装置を提供することをその課題としている。   This invention makes it the subject to provide the immersion treatment apparatus which can perform the surface treatment of a workpiece | work stably.

本発明の浸漬処理装置は、ワークを処理溶液に浸漬することによりワークの表面処理を行う浸漬処理装置であって、貯留した処理溶液によりワークを浸漬処理する処理槽部、処理槽部に処理溶液を補充する補充槽部、および処理槽部と補充槽部とを画成すると共に処理槽部の処理溶液を補充槽部にオーバーフローさせる隔板、を有するワーク処理槽と、補充槽部と処理槽部とを連通する補充流路と、補充流路に介設され、補充槽部の処理溶液を処理槽部に送液する送液手段と、送液手段を制御する制御手段と、を備え、制御手段は、1の浸漬処理を行っている間、送液手段を停止状態とすることを特徴とする。   The immersion treatment apparatus of the present invention is an immersion treatment apparatus that performs a surface treatment of a workpiece by immersing the workpiece in a treatment solution. The treatment bath unit immerses the workpiece with a stored treatment solution, and the treatment solution in the treatment vessel unit. A work tank having a replenishing tank section for replenishing, a separator tank for defining a processing tank section and a replenishing tank section, and overflowing a processing solution in the processing tank section to the replenishing tank section, a replenishing tank section and a processing tank A replenishing channel communicating with the unit, a liquid feeding unit interposed in the replenishing channel, for feeding the processing solution of the replenishing tank unit to the processing tank unit, and a control unit for controlling the liquid feeding unit, The control means is characterized in that the liquid feeding means is stopped while performing one immersion treatment.

この場合、制御手段は、1の浸漬処理と次の浸漬処理との間の処理待ち時に、送液手段を駆動し、処理槽部に処理溶液を補充することが、好ましい。   In this case, it is preferable that the control means drives the liquid feeding means and replenishes the treatment solution to the treatment tank unit when waiting for treatment between one immersion treatment and the next immersion treatment.

これらの構成によれば、送液手段を駆動し、補充槽部に貯留された処理溶液を処理槽部に送液することで、補充槽部から処理槽部に処理溶液を補充されるが、1の浸漬処理を行っている間、送液手段を停止状態とするようにしているため、1の浸漬処理時において、処理溶液の補充は行われず、処理槽部の液面が波立つことがない。したがって、ワークの表面処理を安定に行うことができる。また、1の浸漬処理と次の浸漬処理との間の処理待ち時に、処理槽部に処理溶液を補充するため、次の浸漬処理に処理溶液の補充が影響を及ぼすことがない。   According to these configurations, the processing solution is replenished from the replenishing tank part to the processing tank part by driving the liquid feeding means and feeding the processing solution stored in the replenishing tank part to the processing tank part. Since the liquid feeding means is in a stopped state during the immersion process 1, the treatment solution is not replenished during the immersion process 1, and the liquid level in the treatment tank may be undulated. Absent. Therefore, the surface treatment of the workpiece can be performed stably. In addition, since the treatment solution is replenished to the treatment tank unit when waiting for a treatment between one immersion treatment and the next immersion treatment, the replenishment of the treatment solution does not affect the next immersion treatment.

また、制御手段は、処理待ち時毎に送液手段を駆動し、処理槽部からオーバーフローするまで処理溶液を補充することが、好ましい。   Further, it is preferable that the control means drives the liquid feeding means every time waiting for processing to replenish the processing solution until it overflows from the processing tank section.

この構成によれば、処理待ち時毎に且つ処理槽部からオーバーフローするまで処理溶液を補充するようにしているため、処理槽部において浸漬処理毎に常に同一の液位で処理が行われることになる。このため、常にワークの表面処理を安定に行うことができる。   According to this configuration, since the processing solution is replenished every time when waiting for processing and until it overflows from the processing tank unit, processing is always performed at the same liquid level for each immersion process in the processing tank unit. Become. For this reason, the surface treatment of the workpiece can always be performed stably.

この場合、制御手段は、送液手段による処理溶液の補充をタイマー制御で行うことが、好ましい。   In this case, it is preferable that the control means performs replenishment of the processing solution by the liquid feeding means by timer control.

この構成によれば、処理溶液のオーバーフローと相俟って、簡単な制御動作により処理溶液の補充を確実に行うことができる。   According to this configuration, in combination with the overflow of the processing solution, the processing solution can be reliably replenished by a simple control operation.

これらの場合、補充流路は、上流端で補充槽部の下部に接続され、下流端で処理槽部の下部に接続されていることが、好ましい。   In these cases, it is preferable that the replenishment flow path is connected to the lower part of the replenishing tank part at the upstream end and connected to the lower part of the processing tank part at the downstream end.

この構成によれば、処理溶液の補充時にあっても、処理槽部の液面の波立ちを抑制することができるため、波立ちが収まる時間を短縮することができ、全体としてワーク処理のタクトタイムを短縮することができる。   According to this configuration, even when the processing solution is replenished, it is possible to suppress the undulation of the liquid level in the processing tank, so that the time for the undulation to settle can be shortened, and the tact time of the workpiece processing as a whole can be reduced. It can be shortened.

この場合、処理槽部の底部および補充槽部の底部には、処理溶液を廃液するための廃液流路に連通する集液部がそれぞれ設けられ、処理槽部の底面および補充槽部の底面は、それぞれ各集液部に向って下り勾配に形成されていることが、好ましい。   In this case, the bottom of the processing tank and the bottom of the replenishing tank are provided with a liquid collecting part that communicates with a waste liquid channel for draining the processing solution, and the bottom of the processing tank and the bottom of the replenishing tank are It is preferable that each of the liquid collecting portions is formed in a downward gradient.

この構成によれば、処理槽部および補充槽部に貯留された処理溶液を廃液する際に、全ての処理溶液を送液することができ、同時に処理溶液に混入した異物も排出することができる。したがって、処理溶液に異物が混入した場合でも、処理溶液を入れ替える(使捨てする)ことにより、処理槽部の処理溶液をきれいな状態に保ち、適切に表面処理することができる。或いは、全て処理溶液を抜き取ってからフィルタリングすることで、濾過効率を向上させることができる。   According to this configuration, when the processing solution stored in the processing tank unit and the replenishing tank unit is drained, all the processing solutions can be fed, and at the same time, foreign matters mixed in the processing solution can be discharged. . Therefore, even when foreign matters are mixed in the processing solution, the processing solution in the processing bath can be kept clean and appropriately surface-treated by replacing (disposing of) the processing solution. Alternatively, the filtration efficiency can be improved by filtering after extracting the treatment solution.

この場合、処理溶液は、ワーク処理槽に導入した溶媒に溶剤を投入し混合したものであり、制御手段は、送液手段を駆動し、処理溶液を処理槽部から補充槽部を経て処理槽部に戻す循環を繰り返すことで、溶媒と溶剤とを混合することが、好ましい。   In this case, the processing solution is a mixture of the solvent introduced into the workpiece processing tank and mixed, and the control means drives the liquid feeding means to transfer the processing solution from the processing tank section to the replenishment tank section. It is preferable to mix the solvent and the solvent by repeating the circulation returning to the part.

この構成によれば、新たに処理溶液を調整するときに、送液手段を活用し、ワーク処理槽に貯留した溶媒に溶剤を完全に溶け込ませることができる。したがって、処理溶液の濃度を一定に保つことができ、適切に表面処理することができる。   According to this structure, when newly adjusting a processing solution, a liquid sending means can be utilized and a solvent can be completely dissolved in the solvent stored in the workpiece processing tank. Therefore, the concentration of the treatment solution can be kept constant, and an appropriate surface treatment can be performed.

この場合、ワーク処理槽を開閉する開閉蓋を、更に備え、ワーク処理槽の上周縁部には、閉塞した開閉蓋との間をシールするシール部材が埋め込まれていることが、好ましい。   In this case, it is preferable that an opening / closing lid for opening and closing the workpiece processing tank is further provided, and a sealing member for sealing the closed opening / closing lid is embedded in the upper peripheral edge of the workpiece processing tank.

この構成によれば、処理槽部へワークの搬入および搬出するとき以外は、開閉蓋によりワーク処理槽を密閉することができるため、処理溶液(の溶媒)の気化を抑制することができ、安定な表面処理が可能になる。また、稼動待機時にもワーク処理槽は開閉蓋により密閉されているため、ワーク処理槽に貯留されている処理溶液に異物が混入するのを防止することができる。   According to this configuration, since the work processing tank can be sealed by the open / close lid except when the work is carried into and out of the processing tank unit, the vaporization of the processing solution (solvent thereof) can be suppressed and stable. Surface treatment becomes possible. In addition, since the work processing tank is sealed by the open / close lid even during standby, it is possible to prevent foreign matters from being mixed into the processing solution stored in the work processing tank.

以下、添付した図面を参照して、本発明の一実施形態に係る浸漬処理装置について説明する。この浸漬処理装置は、処理溶液にワークを浸漬してコーティング等の表面処理を行う、いわゆるDipコータである。   Hereinafter, an immersion treatment apparatus according to an embodiment of the present invention will be described with reference to the accompanying drawings. This immersion treatment apparatus is a so-called Dip coater that performs surface treatment such as coating by immersing a workpiece in a treatment solution.

図1および図2に示すように、浸漬処理装置1は、下部のタンクキャビネット2と、タンクキャビネット2の上面に配設した機台3と、機台3上に設置され、ワーク処理槽5を有する処理装置本体4と、処理装置本体4を収容し、機台3の上部空間を覆うようにして設けられた装置カバー6と、を備えている。タンクキャビネット2および装置カバー6は、図外の排気設備に連通しており、内部雰囲気が適宜換気されるようになっている。また、浸漬処理装置1には、装置カバー6の背面側に設けた電装ボックス7と、装置カバー6の正面(前面)に設けた制御装置本体8とから成る制御装置9が組み込まれている。   As shown in FIGS. 1 and 2, the immersion treatment apparatus 1 includes a lower tank cabinet 2, a machine base 3 disposed on the upper surface of the tank cabinet 2, and a work treatment tank 5 installed on the machine base 3. And a device cover 6 that accommodates the processing device main body 4 and that covers the upper space of the machine base 3. The tank cabinet 2 and the device cover 6 communicate with exhaust equipment not shown in the figure, and the internal atmosphere is appropriately ventilated. Further, the immersion processing apparatus 1 incorporates a control device 9 including an electrical box 7 provided on the back side of the device cover 6 and a control device main body 8 provided on the front surface (front surface) of the device cover 6.

処理対象物であるワークWは、方形の金属板であり、その複数枚(20枚)を単位としてワークマガジン11に収容して、浸漬処理装置1に対し徐給材される。より具体的には、複数枚のワークWを並べて収容した2個のワークマガジン11,11が、マガジントレイ12に搭載され、マガジントレイ12と共に2個のワークマガジン11,11が一括して、浸漬処理装置1に対し徐給材される。そして、複数枚のワークWは、ワークマガジン11と共にワーク処理槽5に浸漬され、表面処理される。   The workpiece W, which is the object to be processed, is a rectangular metal plate, and is accommodated in the workpiece magazine 11 in units of a plurality (20) thereof and is gradually fed to the immersion treatment apparatus 1. More specifically, two work magazines 11, 11 storing a plurality of workpieces W arranged side by side are mounted on the magazine tray 12, and the two work magazines 11, 11 together with the magazine tray 12 are immersed together. The material is gradually fed to the processing apparatus 1. The plurality of workpieces W are immersed in the workpiece processing tank 5 together with the workpiece magazine 11 and subjected to surface treatment.

処理装置本体4は、ワークを浸漬処理するワーク処理槽5と、ワーク処理槽5の上端開放部を開閉する開閉蓋14と、ワーク処理槽5に隣接するワーク給材部15に配設したマガジンセット機構16と、複数枚のワークWをワークマガジン11と共に、ワーク給材部15とワーク処理槽5との間で浸漬移動させる浸漬移動機構17と、ワーク処理槽5に対し開閉蓋14を開閉移動させる蓋移動機構18と、を備えている。ワーク処理槽5とマガジンセット機構16とは、機台3の前部に配設され、浸漬移動機構17と蓋移動機構18とは、上下に重なった状態で機台3の後部に配設されている。   The processing apparatus main body 4 includes a workpiece processing tank 5 for dipping the workpiece, an opening / closing lid 14 for opening and closing the upper end opening of the workpiece processing tank 5, and a magazine disposed in the workpiece supply unit 15 adjacent to the workpiece processing tank 5. A set mechanism 16, an immersion movement mechanism 17 for immersing and moving a plurality of workpieces W together with the workpiece magazine 11 between the workpiece supply unit 15 and the workpiece processing tank 5, and an opening / closing lid 14 for the workpiece processing tank 5. And a lid moving mechanism 18 to be moved. The work processing tank 5 and the magazine setting mechanism 16 are arranged at the front part of the machine base 3, and the immersion movement mechanism 17 and the lid movement mechanism 18 are arranged at the rear part of the machine base 3 in a state where they overlap each other. ing.

浸漬移動機構17は、ワークマガジン11をフッキングしてワーク処理槽5の直上部まで移動させ、蓋移動機構18が開閉蓋14を開放するのを待って、ワークマガジン11をワーク処理槽5に浸漬する。この浸漬処理では、浸漬移動機構17は、ワークマガジン11を処理溶液にゆっくり沈めてゆき、液面の波立ちが静まるのを待ってゆっくり引き上げてゆく。これにより、ワークマガジン11内の複数枚のワークWに表面処理が適切に行われる。後述するように、処理溶液は揮発性の高い溶媒を含んでおり、このワークマガジン11の引き上げ中に、ワークマガジン11やワークWに付着した処理溶液(溶媒)は、急速に気化してゆく(乾燥)。ワークマガジン11の引き上げが完了すると、直ちに蓋移動機構18が開閉蓋14を閉塞する。一方、引き上げられたワークマガジン11は、ワーク給材部15のマガジントレイ12に戻される。以上の動作を2回行って、2個のワークマガジン(ワークW)11,11の浸漬処理が終了したら、ワークマガジン11をマガジントレイ12と共に徐材し、新たなワークマガジン(未処理のワークW)11を給材する。   The immersion moving mechanism 17 hooks the work magazine 11 and moves it to the position directly above the workpiece processing tank 5, waits for the lid moving mechanism 18 to open the opening / closing lid 14, and immerses the workpiece magazine 11 in the workpiece processing tank 5. To do. In this immersion treatment, the immersion movement mechanism 17 slowly submerges the work magazine 11 in the treatment solution, and slowly lifts it up after the undulation of the liquid surface has subsided. Thereby, the surface treatment is appropriately performed on the plurality of workpieces W in the workpiece magazine 11. As will be described later, the processing solution contains a highly volatile solvent, and the processing solution (solvent) adhering to the work magazine 11 or the work W is rapidly vaporized while the work magazine 11 is pulled up ( Dry). When the lifting of the work magazine 11 is completed, the lid moving mechanism 18 immediately closes the opening / closing lid 14. On the other hand, the lifted work magazine 11 is returned to the magazine tray 12 of the work material supply unit 15. When the above operation is performed twice and the immersion processing of the two work magazines (work W) 11, 11 is completed, the work magazine 11 is gradually removed together with the magazine tray 12, and a new work magazine (unprocessed work W is processed). ) 11 is supplied.

一方、タンクキャビネット2内には、ワーク処理槽5に処理溶液を供給する給液タンク21と、使用済みの処理溶液をワーク処理槽5から回収する廃液タンク22と、フィルタリングのためにワーク処理槽5から処理溶液を抜き取って回収するバッファタンク23と、が収容されている。さらに、タンクキャビネット2内には、これらタンク21,22,23に併設するように、各種のポンプおよびバルブが各種配管(詳細は後述する。)と共に収容されている。   On the other hand, in the tank cabinet 2, a liquid supply tank 21 for supplying a processing solution to the work processing tank 5, a waste liquid tank 22 for collecting the used processing solution from the work processing tank 5, and a work processing tank for filtering And a buffer tank 23 for extracting and collecting the processing solution from 5. Further, in the tank cabinet 2, various pumps and valves are accommodated together with various pipes (details will be described later) so as to be provided in the tanks 21, 22, and 23.

処理溶液は、表面処理の主成分となる溶剤と、溶剤を溶かし込む溶媒とから成り、溶媒は給液タンク21からワーク処理槽5に供給され、溶剤はワーク処理槽5の供給した溶媒に直接投入され混合される。また、溶媒には、揮発性の高いものが用いられている。このため、ワーク処理槽5は、浸漬処理を実施するとき以外は、上記の開閉蓋14で気密に閉塞され、また浸漬処理時にワーク処理槽5から蒸散した気化溶媒は、装置カバー6内の雰囲気と共に排気ダクト25を介して、上記の排気設備(排気処理設備)に排気される。   The treatment solution is composed of a solvent that is a main component of the surface treatment and a solvent that dissolves the solvent. The solvent is supplied from the liquid supply tank 21 to the work treatment tank 5, and the solvent is directly applied to the solvent supplied from the work treatment tank 5. Charged and mixed. In addition, a highly volatile solvent is used. For this reason, the work treatment tank 5 is airtightly closed by the opening / closing lid 14 except when the immersion treatment is performed, and the vaporized solvent evaporated from the work treatment tank 5 during the immersion treatment is the atmosphere in the apparatus cover 6. At the same time, it is exhausted through the exhaust duct 25 to the exhaust equipment (exhaust treatment equipment).

図3の配管系統図に示すように、処理装置本体4は、上述したワーク処理槽5、給液タンク21、廃液タンク22およびバッファタンク23を備えると共に、ワーク処理槽5と給液タンク21およびバッファタンク23を接続する往流路31と、ワーク処理槽5と廃液タンク22およびバッファタンク23を接続する返流路32と、往流路31と返流路32とを接続するバイパス流路33と、往流路31の介設した往ポンプ(送液手段)34と、返流路に介設した返ポンプ35と、を備えている。   As shown in the piping system diagram of FIG. 3, the processing apparatus main body 4 includes the work processing tank 5, the liquid supply tank 21, the waste liquid tank 22, and the buffer tank 23, and the work processing tank 5, the liquid supply tank 21, and the like. A forward flow path 31 connecting the buffer tank 23, a return flow path 32 connecting the work processing tank 5, the waste liquid tank 22 and the buffer tank 23, and a bypass flow path 33 connecting the forward flow path 31 and the return flow path 32. And a forward pump (liquid feeding means) 34 interposed in the forward flow path 31 and a return pump 35 interposed in the return flow path.

ワーク処理槽5は、ワークWを直接表面処理する処理槽部5Aと、処理槽部5Aに処理溶液を補充するための補充槽部5Bと、処理槽部5Aと補充槽部5Bとを画成すると共に処理槽部5Aの処理溶液を補充槽部5Bにオーバーフローさせる隔板42、とを有している。   The workpiece processing tank 5 defines a processing tank section 5A for directly surface-treating the workpiece W, a replenishing tank section 5B for replenishing the processing tank section 5A with a processing solution, a processing tank section 5A and a replenishing tank section 5B. And a partition plate 42 that overflows the processing solution in the processing tank 5A to the replenishing tank 5B.

図4および図5に示すように、ワーク処理槽5は、ドレンパン27上に設置されており、ステンレス等で略方形に形成されている。また、ワーク処理槽5は、内部を隔板42により処理槽部5Aと補充槽部5Bとに画成した処理槽本体41と、処理槽本体41をドレンパン27上に支持する4つの脚片43と、処理槽本体41の上端部に設けられ上記の開閉蓋14を受ける蓋載置部44と、で構成されている。蓋載置部44には、開閉蓋14との間隙をシールする蓋シール45が上向きに埋め込まれている。   As shown in FIGS. 4 and 5, the work processing tank 5 is installed on the drain pan 27 and is formed in a substantially square shape with stainless steel or the like. Further, the work processing tank 5 includes a processing tank main body 41 having an inside defined by a partition plate 42 as a processing tank portion 5A and a replenishing tank portion 5B, and four leg pieces 43 that support the processing tank main body 41 on the drain pan 27. And a lid mounting portion 44 that is provided at the upper end portion of the processing tank main body 41 and receives the opening / closing lid 14. A lid seal 45 that seals the gap with the opening / closing lid 14 is embedded in the lid mounting portion 44 upward.

処理槽部5Aの底部47は、隔板42の位置から対向する側壁48に向って下り傾斜(下り勾配)に形成され、側壁48側の中央には集液部となる処理槽排水口49が形成されている。同様に、補充槽部5Bの底部51は、隔板42の位置から対向する側壁52に向って下り傾斜(下り勾配)に形成され、側壁52側の中央には集液部となる補充槽排水口53が形成されている。そして、この処理槽排水口49および補充槽排水口53は、後述する補充流路78に接続されている。すなわち、補充流路78は、上流端で補充槽部5Bの下部に接続され、下流端で処理槽部5Aの下部に接続されている。   The bottom 47 of the treatment tank 5A is formed in a downward slope (down slope) from the position of the partition plate 42 toward the opposing side wall 48, and a treatment tank drain port 49 serving as a liquid collection part is formed in the center on the side wall 48 side. Is formed. Similarly, the bottom 51 of the replenishing tank part 5B is formed in a downward slope (downward slope) from the position of the partition plate 42 toward the opposing side wall 52, and in the center on the side of the side wall 52, the replenishing tank drainage serving as a liquid collection part. A mouth 53 is formed. And this processing tank drain 49 and the replenishment tank drain 53 are connected to the replenishment flow path 78 mentioned later. That is, the replenishment flow path 78 is connected to the lower part of the replenishing tank part 5B at the upstream end, and connected to the lower part of the processing tank part 5A at the downstream end.

また、図中の符号55は、補充槽部5Bの底部51から立ち上がった(補充槽排水口53に隣接している)オーバーフロー管であり、例えば給液タンク21から処理溶液の供給停止が誤作動により実施されない場合に、この部分から処理溶液を排液し、ワーク処理槽5から処理溶液が溢れるのを防止している。なお、処理槽部5Aの底部47を、処理槽排水口49に向かってロート状の下り勾配とすることが、好ましい。同様に、補充槽部5Bの底部51にあっても、補充槽排水口53に向かってロート状の下り勾配とすることが、好ましい。また、バッファタンク23の底部にあっても、上記のような形態とすることが、好ましい。   Reference numeral 55 in the figure denotes an overflow pipe that rises from the bottom 51 of the replenishing tank 5B (adjacent to the replenishing tank drain 53). For example, the supply stop of the processing solution from the liquid supply tank 21 malfunctions. When the process is not carried out, the processing solution is drained from this portion to prevent the processing solution from overflowing from the work processing tank 5. In addition, it is preferable to make the bottom part 47 of 5 A of processing tanks into a funnel downward slope toward the processing tank drain port 49. FIG. Similarly, it is preferable that the bottom 51 of the replenishing tank 5B has a funnel-shaped downward slope toward the replenishing tank drain 53. Further, it is preferable to adopt the above-described form even at the bottom of the buffer tank 23.

図3に示すように、往流路31は、下流端を処理槽部5Aに接続した主往流路61と、主往流路61の上流端に合流する循環往流路62および給液流路63と、で構成されている。主往流路61には、上記の往ポンプ34が介設され、往ポンプ34の下流側には、フィルタ36および送液センサ37が介設されている。また、往ポンプ34の上流側に位置して主往流路61には、第2合流切替バルブ65が介設され、第2合流切替バルブ65には、バイパス流路33が合流接続されている。さらに、主往流路61の上流端には、第1合流切替バルブ64を介して、バッファタンク23に接続した循環往流路62および給液タンク21に接続した給液流路63がそれぞれ接続されている。また、循環往流路62は、バッファタンク23の底部に接続され、給液流路63は、給液タンク21の上端部に接続され、その先端は給液タンク21の底部近傍に達している。   As shown in FIG. 3, the forward flow path 31 includes a main forward flow path 61 having a downstream end connected to the processing tank 5A, a circulation forward flow path 62 that joins the upstream end of the main forward flow path 61, and a liquid supply flow. And a path 63. The forward pump 34 is interposed in the main forward flow path 61, and a filter 36 and a liquid feeding sensor 37 are interposed downstream of the forward pump 34. Further, a second merging switching valve 65 is interposed in the main forward channel 61 located upstream of the forward pump 34, and the bypass channel 33 is mergingly connected to the second merging switching valve 65. . Further, the circulation forward flow path 62 connected to the buffer tank 23 and the liquid supply flow path 63 connected to the liquid supply tank 21 are connected to the upstream end of the main forward flow path 61 via the first junction switching valve 64, respectively. Has been. The circulation forward flow path 62 is connected to the bottom of the buffer tank 23, the liquid supply flow path 63 is connected to the upper end of the liquid supply tank 21, and the tip thereof reaches the vicinity of the bottom of the liquid supply tank 21. .

一方、返流路32は、補充槽部5Bと処理槽部5Aとを通連する連通する連通流路67と、連通流路67の中間位置から分岐した主返流路68と、主返流路68の下流端から分岐した廃液流路69および循環返流路70と、で構成されている。連通流路67は、主返流路68の分岐部を境にして、処理槽部5Aに接続された処理側短流路71と補充槽部5Bに接続された補充側短流路72とから成り、処理側短流路71には処理側開閉バルブ73が、補充側短流路72には補充側開閉バルブ74がそれぞれ介設されている。   On the other hand, the return flow path 32 includes a communication flow path 67 communicating with the replenishment tank section 5B and the processing tank section 5A, a main return flow path 68 branched from an intermediate position of the communication flow path 67, and a main return flow. A waste liquid channel 69 and a circulation return channel 70 branched from the downstream end of the channel 68 are configured. The communication flow path 67 includes a processing side short flow path 71 connected to the processing tank section 5A and a replenishment side short flow path 72 connected to the replenishing tank section 5B with the branch portion of the main return flow path 68 as a boundary. The processing side short flow path 71 is provided with a processing side opening / closing valve 73, and the replenishment side short flow path 72 is provided with a replenishment side opening / closing valve 74.

主返流路68には、上記の返ポンプ35が介設され、返ポンプ35の上流側には、第1分岐切替バルブ75を介して上記のバイパス流路33が分岐接続されている。そして、主返流路68の下流端には、第2分岐切替バルブ76を介して、廃液タンク22に接続した廃液流路69およびバッファタンク23に接続した循環返流路70がそれぞれ接続されている。また、廃液流路69は、廃液タンク22の上端部に接続され、同様に循環返流路70は、バッファタンク23の上端部に接続されている。なお、実施形態にいう補充流路78は、補充側短流路72、第1分岐切替バルブ75までの主返流路68、バイパス流路33および第2合流切替バルブ65以降の主往流路61により、構成されている。   The main return flow path 68 is provided with the return pump 35, and the bypass flow path 33 is branched and connected to the upstream side of the return pump 35 via a first branch switching valve 75. The downstream end of the main return flow path 68 is connected to the waste liquid flow path 69 connected to the waste liquid tank 22 and the circulation return flow path 70 connected to the buffer tank 23 via the second branch switching valve 76. Yes. In addition, the waste liquid channel 69 is connected to the upper end portion of the waste liquid tank 22, and similarly, the circulation return channel 70 is connected to the upper end portion of the buffer tank 23. In addition, the replenishment flow path 78 referred to in the embodiment includes a replenishment side short flow path 72, a main return flow path 68 to the first branch switching valve 75, a bypass flow path 33, and a main forward flow path after the second merge switching valve 65. 61.

次に、図3を参照して、上記の制御装置9による浸漬処理装置1の運転方法について説明する。浸漬処理装置1の運転動作には、表面処理に先立って、給液タンク21に貯留された処理溶液(溶媒)をワーク処理槽5に給液して溶剤と混合する調整動作と、処理溶液を補充槽部5Bから処理槽部5Aに補充する補充動作と、処理溶液中の異物をフィルタ36を通過させて除去する濾過動作と、使用済みの処理溶液を廃液タンク22に廃棄する廃液動作と、がある。   Next, with reference to FIG. 3, the operation method of the immersion processing apparatus 1 by said control apparatus 9 is demonstrated. Prior to the surface treatment, the immersion treatment apparatus 1 is operated by supplying a treatment solution (solvent) stored in the liquid supply tank 21 to the work treatment tank 5 and mixing it with the solvent, and a treatment solution. A replenishment operation for replenishing the processing tank unit 5A from the replenishing tank unit 5B, a filtering operation for removing foreign substances in the processing solution through the filter 36, a waste liquid operation for discarding the used processing solution in the waste liquid tank 22, There is.

調整動作では、第1合流切替バルブ64を給液流路63側に切り替えると共に、第2合流切替バルブ65を主往流路61側に切り替え、往ポンプ34を駆動する。これにより、給液タンク21の処理溶液(溶媒)はワーク処理槽5に給液され、その後、ワーク処理槽5に貯留する処理溶液(溶媒)に所定の濃度になるように少量の溶剤を添加する。次に、処理側開閉バルブ73を「閉」、補充側開閉バルブ74を「開」とし、且つ第1分岐切替バルブ75および第2合流切替バルブ65を、それぞれバイパス流路33側に切り替え、往ポンプ34を駆動する。これにより、補充槽部5Bの処理溶液は、補充側短流路72、主返流路68、バイパス流路33および主往流路61(合せて補充流路78)を流れて処理槽部5Aに送液され、更に処理槽部5Aからオーバーフローして補充槽部5Bに戻る。この循環動作を複数回(実際には、所定時間)繰り返すことにより、処理溶液(溶媒)と溶剤とが均一に混合して、所定濃度の処理溶液が調整される。   In the adjustment operation, the first merging switching valve 64 is switched to the liquid supply flow path 63 side, the second merging switching valve 65 is switched to the main forward flow path 61 side, and the forward pump 34 is driven. As a result, the processing solution (solvent) in the liquid supply tank 21 is supplied to the work processing tank 5, and then a small amount of solvent is added to the processing solution (solvent) stored in the work processing tank 5 so as to have a predetermined concentration. To do. Next, the processing side opening / closing valve 73 is “closed”, the replenishment side opening / closing valve 74 is “open”, and the first branch switching valve 75 and the second merging switching valve 65 are respectively switched to the bypass flow path 33 side. The pump 34 is driven. As a result, the processing solution in the replenishing tank unit 5B flows through the replenishment side short flow path 72, the main return flow path 68, the bypass flow path 33, and the main forward flow path 61 (together with the replenishing flow path 78), thereby processing tank 5A. And then overflows from the processing tank 5A and returns to the replenishing tank 5B. By repeating this circulation operation a plurality of times (actually, for a predetermined time), the processing solution (solvent) and the solvent are uniformly mixed to prepare a processing solution having a predetermined concentration.

補充動作では、上記と同様に、処理側開閉バルブ73を「閉」、補充側開閉バルブ74を「開」とし、また第1分岐切替バルブ75および第2合流切替バルブ65をそれぞれバイパス流路33側に切り替え、往ポンプ34を駆動する。これにより、補充槽部5Bの処理溶液は、補充側短流路72、主返流路68、バイパス流路33および主往流路61(合せて補充流路78)を流れて処理槽部5Aに送液される。そして、処理槽部5Aから処理溶液がオーバーフローしたところで(満液)、往ポンプ34を停止して処理溶液の補充を完了する。なお、処理槽部5Aに補充される処理溶液は、主往流路61においてフィルタ36を通過し適宜濾過される。   In the replenishment operation, similarly to the above, the processing side opening / closing valve 73 is “closed”, the replenishment side opening / closing valve 74 is “open”, and the first branch switching valve 75 and the second merging switching valve 65 are respectively connected to the bypass flow path 33. The forward pump 34 is driven. As a result, the processing solution in the replenishing tank unit 5B flows through the replenishment side short flow path 72, the main return flow path 68, the bypass flow path 33, and the main forward flow path 61 (together with the replenishing flow path 78), thereby processing tank 5A. The liquid is sent to When the processing solution overflows from the processing tank 5A (full solution), the forward pump 34 is stopped to complete the replenishment of the processing solution. Note that the processing solution supplemented to the processing tank 5A passes through the filter 36 in the main forward flow path 61 and is appropriately filtered.

濾過動作は、ワークWの浸漬処理によって処理溶液に混入した異物の除去が必要な場合に行う。まず、処理側開閉バルブ73および補充側開閉バルブ74を共に「開」とし、第1分岐切替バルブ75を主返流路68側に切り替え、且つ第2分岐切替バルブ76を循環返流路70側に切り替えた後、返ポンプ35を駆動する。これにより、処理槽部5Aおよび補充槽部5Bに貯留されている全ての処理溶液は、それぞれ処理側短流路71および補充側短流路72から主返流路68に流れ、更に循環返流路70を流れていったんバッファタンク23に貯留(液抜き)される。   The filtering operation is performed when it is necessary to remove foreign matter mixed in the processing solution by the immersion treatment of the workpiece W. First, both the processing side opening / closing valve 73 and the replenishment side opening / closing valve 74 are set to “open”, the first branch switching valve 75 is switched to the main return flow path 68 side, and the second branch switching valve 76 is switched to the circulation return flow path 70 side. After switching to, the return pump 35 is driven. As a result, all the processing solutions stored in the processing tank 5A and the replenishing tank 5B flow from the processing-side short flow path 71 and the replenishing-side short flow path 72 to the main return flow path 68, respectively, and are further circulated and returned. It flows through the passage 70 and is once stored (drained) in the buffer tank 23.

次に、第1合流切替バルブ64を循環往流路62側に切り替え、且つ第2合流切替バルブ65を主往流路61側に切り替え、往ポンプ34を駆動する。この往ポンプ34を駆動は、バッファタンク23が空になるまで続行され、バッファタンク23の処理溶液は、循環往流路62および主往流路61を流れて処理槽部5Aに、その一部はさらにオーバーフローして補充槽部5Bに送液される。このとき、全ての処理溶液は、主往流路61に介設したフィルタ36を通過し濾過が行われる。すなわち、全ての処理溶液がフィルタ36を通過することになるため、処理溶液に混入する異物が一斉に濾過される。   Next, the first merging switching valve 64 is switched to the circulating forward flow path 62 side, the second merging switching valve 65 is switched to the main forward flow path 61 side, and the forward pump 34 is driven. The driving of the forward pump 34 is continued until the buffer tank 23 is emptied, and the processing solution in the buffer tank 23 flows through the circulating forward flow path 62 and the main forward flow path 61 to a part of the processing tank 5A. Overflows further and is fed to the replenishing tank 5B. At this time, all the processing solutions pass through the filter 36 interposed in the main forward flow path 61 and are filtered. That is, since all the processing solutions pass through the filter 36, the foreign matters mixed in the processing solutions are filtered all at once.

廃棄動作では、処理側開閉バルブ73および補充側開閉バルブ74をそれぞれ「開」とし、且つ第1分岐切替バルブ75を主返流路68側に切り替え、且つ第2分岐切替バルブ76を廃液流路69側に切り替えて、返ポンプ35を駆動する。これにより、処理溶液に濾過しきれない異物が混入した場合あるいは経時的な劣化により交換が必要になった処理溶液は、それぞれ処理側短流路71および補充側短流路72から主返流路68を流れ、更に廃液流路69を流れて全て廃液タンク22に廃液される。   In the disposal operation, the processing side opening / closing valve 73 and the replenishment side opening / closing valve 74 are each opened, the first branch switching valve 75 is switched to the main return flow path 68 side, and the second branch switching valve 76 is switched to the waste liquid flow path. The return pump 35 is driven by switching to the 69 side. As a result, when foreign substances that cannot be filtered are mixed into the processing solution or the processing solution that needs to be replaced due to deterioration over time, the processing return short flow channel 71 and the replenishment side short flow channel 72 are returned from the main return flow channel, respectively. 68, and further flows through the waste liquid flow path 69, and all is discharged into the waste liquid tank 22.

ここで、上記の補充動作とワークWの浸漬処理動作との関係について説明する。上述したように、複数枚のワークWはワークマガジン11にセットされた状態で、浸漬移動機構17によりワーク処理槽5に搬入され、且つ処理槽部5Aに浸漬される。また、浸漬処理装置1には、2個のワークマガジン11,11が一括して運び込まれ(給材)、2回を単位として浸漬処理が行われる。これに対して、補充動作は1回の浸漬処理毎に行われる。すなわち、補充動作は、1の浸漬処理と次の浸漬処理との間の処理待ち時間の間に行われ、各浸漬処理は、常に処理槽部5Aが満液になった状態で行われる。   Here, the relationship between the above-described replenishment operation and the immersion processing operation of the workpiece W will be described. As described above, the plurality of workpieces W are set in the workpiece magazine 11 and are carried into the workpiece processing tank 5 by the immersion moving mechanism 17 and are immersed in the processing tank section 5A. In addition, two work magazines 11 and 11 are brought into the immersion treatment apparatus 1 at a time (feeding), and immersion treatment is performed in units of two. On the other hand, the replenishment operation is performed for each immersion process. That is, the replenishment operation is performed during the processing waiting time between one immersion process and the next immersion process, and each immersion process is always performed in a state where the processing tank portion 5A is full.

上述したように、補充動作は、隔板42を介して処理槽部5Aから処理溶液がオーバーフローするまで行われるが、これは上記の往ポンプ34のタイマー制御により実施される。タイマー制御は、浸漬処理時の処理溶液のオーバーフロー量、引き上げたワークWおよびワークマガジン11に付着して持ち去られる処理溶液の消耗量、および浸漬処理時の処理溶液の蒸散量を合計した減液量と、往ポンプ34の吐出量との関係から、予め余裕を見込んで定めた往ポンプ34の駆動時間となる。また、補充動作は、浸漬処理が完了した直後に行い、少なくとも浸漬処理が開始される時点では、補充動作が完了しかつ液面の波立ちが収まっている状態とする。   As described above, the replenishment operation is performed until the processing solution overflows from the processing tank 5A through the partition plate 42, and this is performed by the timer control of the forward pump 34 described above. The timer control is an amount of decrease in liquid that is the sum of the overflow amount of the treatment solution during the immersion treatment, the consumption amount of the treatment solution attached to the pulled workpiece W and the work magazine 11, and the transpiration amount of the treatment solution during the immersion treatment. And the drive time of the forward pump 34 that is determined in advance with a margin from the relationship between the discharge amount of the forward pump 34. Further, the replenishment operation is performed immediately after the immersion process is completed, and at least when the immersion process is started, the replenishment operation is completed and the ripple of the liquid level is stopped.

なお、上記のように、処理待ち時間毎に補充動作を行わない運転方法を執る場合には、処理槽部5Aに減液センサを設け、減液センサがONしたところで往ポンプ34を所定時間(オーバーフローするまで)駆動することが好ましい。また、補充槽部5Bには、満液センサおよび減液センサを設けておき、処理溶液の給液時には満液センサONで往ポンプ34を停止し(給液完了)、減液センサONで補充用処理溶液が不足である旨、警報を発するようにすることが好ましい。   As described above, when the operation method in which the replenishment operation is not performed every processing waiting time is performed, a liquid reducing sensor is provided in the processing tank 5A, and when the liquid reducing sensor is turned on, the forward pump 34 is turned on for a predetermined time ( It is preferable to drive until it overflows. The replenishing tank 5B is provided with a full liquid sensor and a liquid reduction sensor. When the processing solution is supplied, the forward pump 34 is stopped when the full liquid sensor is ON (liquid supply is completed), and the liquid supply sensor 5 is replenished with the liquid reduction sensor ON. It is preferable to issue an alarm to the effect that the treatment solution is insufficient.

このように、本実施形態では、浸漬処理時に処理溶液の補充動作を行わない(停止)するようにしているため、ワークWの浸漬処理を開始するときには、処理溶液の液面には一切の波立ちが生じておらず、浸漬処理を適切に行うことができる。また、浸漬動作(昇降)もゆっくり行われ、特に成膜において重要な引上動作では液面の波立ちが収まってからゆっくり行われるため、より一層浸漬処理を適切に行うことができる。しかも、補充動作は1回の浸漬処理毎に行われるため、各回の浸漬処理を常に同じ液位、すなわち同じ条件で行うことができ、浸漬処理を安定して行うことができる。   As described above, in this embodiment, the replenishment operation of the processing solution is not performed (stopped) during the dipping process. Therefore, when the dipping process of the workpiece W is started, there is no ripple on the liquid level of the processing solution. Is not generated, and the immersion treatment can be appropriately performed. Further, the dipping operation (raising and lowering) is also performed slowly. In particular, the pulling operation important in the film formation is performed slowly after the undulation of the liquid level is settled, so that the dipping process can be performed more appropriately. Moreover, since the replenishment operation is performed for each immersion process, each immersion process can be performed at the same liquid level, that is, under the same conditions, and the immersion process can be performed stably.

第1実施形態にかかる浸漬処理装置の正面側から見た外観斜視図である。It is the external appearance perspective view seen from the front side of the immersion treatment apparatus concerning 1st Embodiment. 第1実施形態にかかる浸漬処理装置の背面側から見た外観斜視図である。It is the external appearance perspective view seen from the back side of the immersion treatment apparatus concerning a 1st embodiment. 第1実施形態にかかる浸漬処理装置の配管系統図である。It is a piping system diagram of the immersion treatment apparatus concerning a 1st embodiment. ワーク処理槽廻りの斜視図である。It is a perspective view around a workpiece processing tank. ワーク処理槽の断面図である。It is sectional drawing of a workpiece processing tank.

符号の説明Explanation of symbols

1 浸漬処理装置、4 処理装置本体、5 ワーク処理槽、5A 処理槽部、5B 補充槽部、9 制御装置、11 ワークマガジン、17 浸漬移動機構、31 往流路、32 返流路、33 バイパス流路、34 往ポンプ、41 処理槽本体、42 隔板、47 底部、49 処理槽排出口、51 底部、53 補充槽排出口、61 主往流路、67 連通流路、68 主返流路、78 補充流路、W ワーク   DESCRIPTION OF SYMBOLS 1 Immersion processing apparatus, 4 Processing apparatus main body, 5 Work processing tank, 5A Processing tank part, 5B Replenishment tank part, 9 Control apparatus, 11 Work magazine, 17 Immersion moving mechanism, 31 Outward flow path, 32 Return flow path, 33 Bypass Flow path, 34 Outward pump, 41 Processing tank body, 42 Separator, 47 Bottom, 49 Processing tank outlet, 51 Bottom, 53 Replenisher outlet, 61 Main forward path, 67 Communication path, 68 Main return path 78 Replenishment flow path, W work

Claims (8)

ワークを処理溶液に浸漬することにより前記ワークの表面処理を行う浸漬処理装置であって、
貯留した処理溶液により前記ワークを浸漬処理する処理槽部、前記処理槽部に前記処理溶液を補充する補充槽部、および前記処理槽部と前記補充槽部とを画成すると共に前記処理槽部の前記処理溶液を前記補充槽部にオーバーフローさせる隔板、を有するワーク処理槽と、
前記補充槽部と前記処理槽部とを連通する補充流路と、
前記補充流路に介設され、前記補充槽部の前記処理溶液を前記処理槽部に送液する送液手段と、
前記送液手段を制御する制御手段と、を備え、
前記制御手段は、1の前記浸漬処理を行っている間、前記送液手段を停止状態とすることを特徴とする浸漬処理装置。
An immersion treatment apparatus that performs surface treatment of the workpiece by immersing the workpiece in a treatment solution,
A processing tank section for immersing the workpiece with the stored processing solution, a replenishing tank section for replenishing the processing tank section with the processing solution, and defining the processing tank section and the replenishing tank section, and the processing tank section. A work treatment tank having a partition plate that overflows the treatment solution of the replenishment tank part,
A replenishment flow path communicating the replenishing tank section and the processing tank section;
A liquid feeding means interposed in the replenishing flow path, for feeding the processing solution in the replenishing tank section to the processing tank section;
Control means for controlling the liquid feeding means,
The said control means makes the said liquid feeding means a stop state while performing the said 1 immersion process, The immersion processing apparatus characterized by the above-mentioned.
前記制御手段は、1の前記浸漬処理と次の前記浸漬処理との間の処理待ち時に、前記送液手段を駆動し、前記処理槽部に前記処理溶液を補充することを特徴とする請求項1に記載の浸漬処理装置。   The said control means drives the said liquid feeding means at the time of the process waiting between the said 1 immersion process and the next said immersion process, and replenishes the said process solution to the said processing tank part. The immersion treatment apparatus according to 1. 前記制御手段は、前記処理待ち時毎に前記送液手段を駆動し、前記処理槽部からオーバーフローするまで前記処理溶液を補充することを特徴とする請求項2に記載の浸漬処理装置。   3. The immersion processing apparatus according to claim 2, wherein the control means drives the liquid feeding means every time the process waits and replenishes the processing solution until the processing tank section overflows. 前記制御手段は、前記送液手段による前記処理溶液の補充をタイマー制御で行うことを特徴とする請求項2または3に記載の浸漬処理装置。   The immersion processing apparatus according to claim 2 or 3, wherein the control means performs replenishment of the processing solution by the liquid feeding means by timer control. 前記補充流路は、上流端で前記補充槽部の下部に接続され、下流端で前記処理槽部の下部に接続されていることを特徴とする請求項1ないし4のいずれかに記載の浸漬処理装置。   5. The immersion according to claim 1, wherein the replenishing flow path is connected to a lower part of the replenishing tank part at an upstream end and connected to a lower part of the processing tank part at a downstream end. Processing equipment. 前記処理槽部の底部および前記補充槽部の底部には、前記処理溶液を廃液するための廃液流路に連通する集液部がそれぞれ設けられ、
前記処理槽部の底面および前記補充槽部の底面は、それぞれ各集液部に向って下り勾配に形成されていることを特徴とする請求項1ないし5のいずれかに記載の浸漬処理装置。
The bottom of the treatment tank and the bottom of the replenishment tank are each provided with a liquid collection part that communicates with a waste liquid flow path for waste of the treatment solution,
6. The immersion treatment apparatus according to claim 1, wherein a bottom surface of the treatment tank part and a bottom surface of the replenishment tank part are respectively formed in a downward gradient toward each liquid collection part.
前記処理溶液は、前記ワーク処理層に導入した溶媒に溶剤を投入し混合したものであり、
前記制御手段は、前記送液手段を駆動し、前記処理溶液を前記処理槽部から前記補充槽部を経て前記処理槽部に戻す循環を繰り返すことで、前記溶媒と前記溶剤とを混合することを特徴とする請求項1ないし6のいずれかに記載の浸漬処理装置。
The treatment solution is a mixture of a solvent introduced into the work treatment layer and mixed.
The control means drives the liquid feeding means and mixes the solvent and the solvent by repeating circulation of returning the treatment solution from the treatment tank to the treatment tank via the replenishment tank. An immersion treatment apparatus according to any one of claims 1 to 6.
前記ワーク処理槽を開閉する開閉蓋を、更に備え、
前記ワーク処理槽の上周縁部には、閉塞した前記開閉蓋との間をシールするシール部材が埋め込まれていることを特徴とする請求項1ないし7のいずれかに記載の浸漬処理装置。
An opening / closing lid for opening and closing the workpiece processing tank;
The immersion processing apparatus according to any one of claims 1 to 7, wherein a seal member that seals between the closed lid is embedded in an upper peripheral edge portion of the work processing tank.
JP2008032951A 2008-02-14 2008-02-14 Dipping treatment apparatus Pending JP2009189946A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014100805A (en) * 2012-11-16 2014-06-05 Ricoh Co Ltd Treatment liquid application device and image formation system including the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014100805A (en) * 2012-11-16 2014-06-05 Ricoh Co Ltd Treatment liquid application device and image formation system including the same

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