JP2009151095A - Color filter and method for manufacturing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter having a liquid crystal alignment control means, the color filter capable of preventing light leakage during black display and showing high electric reliability when the filter is used for a liquid crystal display device, and to provide a method for manufacturing the color filter. <P>SOLUTION: The color filter comprises: a transparent substrate; color layers formed on the transparent substrate; a transparent electrode layer formed on the color layers; a black matrix layer formed between the color layers and defining pixels; and a liquid crystal alignment control means formed on the transparent electrode layer in a region corresponding to the color layers; in which a light-shielding portion having a light-shielding property and made of an inorganic material is formed between the transparent electrode layer and the liquid crystal alignment control means. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a color filter used in a liquid crystal display device or the like.

  In a liquid crystal display device, a color filter and a liquid crystal driving side substrate are opposed to each other, a liquid crystal compound is sealed between them to form a thin liquid crystal layer, and the liquid crystal alignment in the liquid crystal layer is electrically controlled by the liquid crystal driving side substrate. Then, display is performed by selectively changing the amount of transmitted light or reflected light of the liquid crystal panel.

  As such a liquid crystal display device, a multi-domain vertical aligned (MVA) type liquid crystal display device, which is known as a multi-alignment division type vertical alignment mode capable of realizing a wide viewing angle and high contrast, has been developed. The color filter used in the MVA liquid crystal display device usually has a liquid crystal alignment control protrusion for controlling the alignment of the liquid crystal molecules. The liquid crystal alignment control protrusion is used to tilt the liquid crystal molecules. The liquid crystal alignment is divided (see Patent Document 1). Such liquid crystal alignment control protrusions are usually formed using a transparent material so as not to affect the color display. However, in the side portion of the liquid crystal alignment control projection, the tilt angle of the liquid crystal molecules is exactly an intermediate angle between when the voltage is turned on and when the voltage is turned off. There has been a problem that light leakage occurs through the alignment control protrusions, thereby reducing the contrast.

  As a method for solving such a problem, a method of preventing light leakage by forming a liquid crystal alignment control protrusion with a material containing a colorant and blocking light transmission can be considered. Here, in order to obtain a liquid crystal alignment control protrusion having a light shielding ratio necessary for preventing light leakage, it is necessary to use a material having a low Y value with a C light source in an XYZ display system. A method of increasing the content of the colorant is employed. However, when the projection for controlling the alignment of liquid crystal is formed using a material having a high content of such a colorant, impurities such as pigments are eluted in the liquid crystal layer when this color filter is used in a liquid crystal display device. There was a problem of lowering the overall reliability.

Further, as a method for solving the above-described light leakage problem, a light shielding portion is formed in a pixel region on a transparent substrate separately from a black matrix layer usually formed in a color filter, and a color formed thereon A method of forming a liquid crystal alignment control protrusion on the layer is also conceivable. In such a method, since the liquid crystal alignment control protrusions need to be formed without protruding from the light shielding part formation region, the light shielding part formation region must be wider than the liquid crystal alignment control protrusion formation region. I must. However, the area occupied by the light-shielding portion becomes too large with respect to the entire color filter, and there is a problem that the luminance at the time of color display decreases.
In addition, when the colored layer is formed, there is a problem that the colored layer is inferior in flatness because it swells around the light shielding portion formed in the pixel region on the transparent substrate.

JP 2003-75839 A

  The present invention has been made in view of the above-described problems, and a color filter having a liquid crystal alignment control means can prevent light leakage during black display when used in a liquid crystal display device. It is a main object to provide a highly reliable color filter and a method for manufacturing the same.

  In order to achieve the above object, the present invention provides a transparent substrate, a colored layer formed on the transparent substrate, a transparent electrode layer formed on the colored layer, and a pixel formed between the colored layers. A color filter having a black matrix layer to be defined and liquid crystal alignment control means formed in a region corresponding to the colored layer on the transparent electrode layer, the transparent electrode layer and the liquid crystal alignment control means, A color filter having a light shielding property and having a light shielding portion made of an inorganic material is provided.

According to the present invention, when this color filter is used in a liquid crystal display device, the colorant or the like is not eluted into the liquid crystal layer, and the electrical reliability can be maintained.
In addition, since there is no positional deviation between the liquid crystal alignment control means and the light shielding part, and it is not necessary to form the light shielding part larger than necessary, a color filter with high luminance can be obtained.
Furthermore, since the light-shielding portion is not formed in the pixel region on the transparent substrate, when the colored layer is formed, there is little swell, so that a color filter with high flatness can be obtained.

  In the present invention, the black matrix layer has a layer structure formed on the transparent electrode layer, and has a transparent layer made of the same material as the liquid crystal alignment control means on the black matrix layer. May be. This is because the black matrix layer can be formed together with the light-shielding portion, and the number of processes is reduced, so that the cost can be reduced.

  Moreover, in the said invention, the columnar spacer is formed on the said transparent electrode layer, the said light-shielding part is formed between the said columnar spacer and the said transparent electrode layer, and the said columnar spacer is said means for liquid crystal orientation control. It may be made of the same material. This is because the liquid crystal alignment control means and the columnar spacer are integrated and formed at the same time, so that a separate step of forming the columnar spacer is not required and the cost can be reduced.

  In the present invention, the liquid crystal alignment control means is preferably a liquid crystal alignment control protrusion. This is because the liquid crystal alignment control protrusion is suitable for tilting the liquid crystal molecules and realizing the division of the liquid crystal alignment.

  In the present invention, the OD value of the light shielding part is preferably 2.0 or more. This is because a color filter with less light leakage can be obtained.

  The present invention provides a colored layer forming step of forming a colored layer on a transparent substrate, a transparent electrode layer forming step of forming a transparent electrode layer so as to cover the transparent substrate and the colored layer, and covering the transparent electrode layer. A light shielding portion forming layer forming step for forming a light shielding portion forming layer made of an inorganic material, and a photosensitive property for forming a photosensitive resin layer made of a photosensitive resin on the light shielding portion forming layer. A resin layer forming step, a liquid crystal alignment controlling means and a transparent layer forming step of exposing and developing the photosensitive resin layer using an exposure mask and developing to form a liquid crystal alignment controlling means and a transparent layer, and the liquid crystal alignment A light-shielding part and a black matrix layer forming step of forming a light-shielding part and a black matrix layer by etching the light-shielding part forming layer using the control means and the transparent layer as a resist layer. It provides a method of manufacturing a color filter having a.

  According to the present invention, since the black matrix layer and the light shielding portion can be formed in a lump, there is no need to separately form a light shielding portion, so that the cost can be reduced.

  In the above invention, in the liquid crystal alignment control means and the transparent layer forming step, the photosensitive resin layer is exposed using a gradation mask, developed, and a columnar spacer is integrally formed on the transparent layer. May be. By batch exposure using a gradation mask, a plurality of members can be formed at the same time, and the manufacturing process of the color filter can be simplified.

  The present invention also provides a black matrix layer forming step of forming a black matrix layer defining pixels on a transparent substrate, and a colored layer forming step of forming a colored layer in the opening of the black matrix layer on the transparent substrate. A transparent electrode layer forming step of forming a transparent electrode layer so as to cover the transparent substrate, the colored layer, and the black matrix layer; and a light-shielding property so as to cover the transparent electrode layer, and made of an inorganic material. A light shielding part forming layer forming step for forming a light shielding part forming layer, a photosensitive resin layer forming process for forming a photosensitive resin layer made of a photosensitive resin on the light shielding part forming layer, and the photosensitive resin layer Is exposed to light using an exposure mask and developed to form a liquid crystal alignment control means, and the light shielding portion forming layer is etched using the liquid crystal alignment control means as a resist layer. To provide a method for manufacturing a color filter; and a light shielding part forming step of forming a light-shielding portion by quenching.

  According to the present invention, since the light shielding portion is formed using the liquid crystal alignment control means as a resist layer, it is possible to form the light shielding portion without designing it thicker than the liquid crystal alignment control means.

  According to the present invention, for a color filter having a liquid crystal alignment control means, when used in a liquid crystal display device, it is possible to prevent light leakage during black display and to manufacture a color filter with high electrical reliability. There is an effect that is possible.

  The present invention relates to a color filter and a manufacturing method thereof.

A. Color Filter First, the color filter of the present invention will be described.
The color filter of the present invention includes a transparent substrate, a colored layer formed on the transparent substrate, a transparent electrode layer formed on the colored layer, and a black matrix layer defining pixels formed between the colored layers. And a liquid crystal alignment control means formed in a region corresponding to the colored layer on the transparent electrode layer, wherein the color filter has a light shielding property between the transparent electrode layer and the liquid crystal alignment control means. And a light-shielding portion made of an inorganic material is formed.

In the present invention, the color filter layer structure can be divided into two modes. Specifically, the black matrix layer has a layer structure formed on the transparent electrode layer, and has a transparent layer made of the same material as the liquid crystal alignment control means on the black matrix layer ( Hereinafter, it is referred to as a first aspect.) And a layer configuration in which the black matrix layer is formed on the transparent substrate, and the transparent electrode layer is formed so as to cover the black matrix layer and the colored layer. It can be divided into an embodiment having the following (hereinafter referred to as a second embodiment). In the present invention, the first aspect is particularly preferable. According to the first aspect, the black matrix layer and the light shielding portion can be formed at the same time, and the manufacturing process of the color filter can be simplified.
Each will be described below.

I. 1st aspect The color filter of this aspect defines the transparent substrate, the colored layer formed on the said transparent substrate, the transparent electrode layer formed on the said colored layer, and the pixel formed between the said colored layers. And a liquid crystal alignment control means formed in a region corresponding to the colored layer on the transparent electrode layer, and a light shielding property between the transparent electrode layer and the liquid crystal alignment control means. The black matrix layer has a layer structure formed on the transparent electrode layer, and the liquid crystal is formed on the black matrix layer. It has a transparent layer made of the same material as the orientation control means.

  Fig.1 (a) is a schematic sectional drawing which shows an example of the color filter of this aspect. As illustrated in FIG. 1A, the color filter 1 of this embodiment includes a transparent substrate 2, a colored layer 3 (3R, 3G, and 3B in FIG. 1) formed on the transparent substrate 2, and a colored layer. 3 between the transparent electrode layer 5 formed so as to cover 3, the liquid crystal alignment control means 6 formed in a region corresponding to the colored layer 3 on the transparent electrode layer 5, and the colored layer 3 on the transparent electrode layer 5. And a transparent layer 8 formed on the black matrix layer 4. Here, a light shielding portion 7 is formed between the transparent electrode layer 5 and the liquid crystal alignment control means 6.

According to this aspect, since the black matrix layer and the light-shielding portion can be formed in one step, it is not necessary to separately form the black matrix layer, and costs can be reduced.
Hereinafter, each configuration of the color filter of this aspect will be described.

1. Light Shielding Part The light shielding part used in the color filter of this embodiment is formed between the transparent electrode layer and the liquid crystal alignment control means, and has a light shielding property and is made of an inorganic material.

  The light-shielding portion is formed to impart light-shielding properties to the liquid crystal alignment control means described later. As a result, the liquid crystal alignment control means does not need to contain a colorant or the like having a light-shielding property. Therefore, when the color filter of the present invention is used in a liquid crystal display device, the electrical reliability is not lowered. Is possible.

  The thickness of the light shielding part used in this embodiment is preferably in the range of 100 to 4000 mm, more preferably in the range of 500 to 2500 mm, and particularly preferably in the range of 500 to 2000 mm. This is because when the above range is exceeded, defects are likely to occur during etching, and when the above range is not reached, the light shielding part cannot maintain a desired light shielding property.

  Further, the shape and size of the light shielding part are appropriately adjusted by means for controlling the alignment of liquid crystal described later.

  The material used for the light-shielding portion is not particularly limited as long as it is a light-shielding inorganic film-forming inorganic material, but chromium or a chromium-based material such as chromium oxide, chromium nitride, or chromium oxynitride Is preferred. This is because such a chromium-based material can be formed into a thin film and is preferable in terms of cost and quality.

  The OD value of the light-shielding part is preferably 2.0 or more, more preferably about 2.0 to 4.0, and particularly preferably about 3.0 to 4.0. This is because light leakage may occur when the color filter using the light shielding portion is used when the above range is not satisfied.

  Since the method for forming the light shielding portion used in this embodiment will be described in detail in the section “B. Manufacturing method of color filter” described later, description thereof is omitted here.

2. Liquid crystal alignment control means
The liquid crystal alignment control means used in the color filter of this embodiment is a region corresponding to the colored layer on the transparent electrode layer, and is formed on the above-described light shielding portion to control the liquid crystal alignment.

  The shape of the bottom surface of the liquid crystal alignment control means is the same as the shape of the light shielding portion described above. This is because the liquid crystal alignment control means is used as a resist layer when forming the light-shielding portion when manufacturing the color filter of this aspect. As a result, no positional deviation occurs between the liquid crystal alignment control means and the light shielding portion, so that the formation region of the light shielding portion, which was a problem in the conventional method, is larger than the formation region of the alignment control means. It is possible to prevent a decrease in luminance of the colored layer that occurs in some cases.

The liquid crystal alignment control means used in this embodiment is not particularly limited as long as it can be divided as desired when the color filter of the present invention is used in a liquid crystal display device. And a liquid crystal alignment control protrusion and a thin film insulating layer. In this embodiment, as illustrated in FIG. 1, a liquid crystal alignment control protrusion is preferable. This is because the liquid crystal alignment control protrusion is particularly used for an MVA liquid crystal display device and is suitable for controlling the alignment by inclining liquid crystal molecules.
Hereinafter, the liquid crystal alignment control protrusion will be described.

(A) Liquid crystal alignment control protrusion The shape of the liquid crystal alignment control protrusion used in this aspect is not particularly limited as long as the liquid crystal alignment can be controlled. For example, the liquid crystal alignment control protrusion is conical or pyramidal. Alternatively, it may be a truncated cone shape or a truncated pyramid shape. The shape of the liquid crystal alignment control protrusion is appropriately selected according to the type of the liquid crystal display device.

  The resin composition used for forming the liquid crystal alignment control protrusions may be a negative curable resin composition or a positive curable resin composition. As a negative curable resin composition, it can be set as the composition containing a polyfunctional acrylate monomer, a polymer, and a photoinitiator, for example. Further, the positive curable resin composition can be a composition containing at least a positive curable resin.

  As the polyfunctional acrylate monomer used in the negative curable resin composition, a compound having two or more ethylenically unsaturated bond-containing groups such as an acryl group or a methacryl group is used. (Meth) acrylate, diethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, hexane di (meth) acrylate , Neopentyl glycol di (meth) acrylate, glycerin di (meth) acrylate, glycerin tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, 1,4-butanedioldia Relate, pentaerythritol (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate can be exemplified dipentaerythritol penta (meth) acrylate.

  You may use a polyfunctional acrylate monomer in combination of 2 or more types. In the present invention, (meth) acryl means either acryl or methacryl, and (meth) acrylate means either an acrylate group or methacrylate.

  Examples of the polymer used in the negative curable resin composition include ethylene-vinyl acetate copolymer, ethylene-vinyl chloride copolymer, ethylene-vinyl copolymer, polystyrene, acrylonitrile-styrene copolymer, ABS. Resin, polymethacrylic acid resin, ethylene-methacrylic acid resin, polyvinyl chloride resin, chlorinated vinyl chloride, polyvinyl alcohol, cellulose acetate propionate, cellulose acetate butyrate, nylon 6, nylon 66, nylon 12, polyethylene terephthalate, poly Butylene terephthalate, polycarbonate, polyvinyl acetal, polyether ether ketone, polyether sulfone, polyphenylene sulfide, polyarylate, polyvinyl butyral, epoxy resin, phenoxy Resin, polyimide resin, polyamideimide resin, polyamic acid resin, polyether imide resin, phenol resin, may be mentioned urea resin and the like.

  Furthermore, as the polymer, polymerizable monomers such as methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, sec-butyl (meth) acrylate, isobutyl (meth) acrylate , Tert-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, n-octyl (meth) acrylate, n-decyl (meth) acrylate, styrene , Α-methylstyrene, N-vinyl-2-pyrrolidone, glycidyl (meth) acrylate and a dimer of (meth) acrylic acid and acrylic acid (for example, Toagosei Chemical Co., Ltd.) M-5600), itaconic acid, ku Tonsan, maleic acid, fumaric acid, vinyl acetate, polymers or copolymers comprising one or more selected from among these anhydrides can also be exemplified. Moreover, although the polymer etc. which added the ethylenically unsaturated compound which has a glycidyl group or a hydroxyl group to said copolymer can be illustrated, it is not limited to these.

  Moreover, as a photoinitiator used for a negative type curable resin composition, the radical photopolymerization initiator which can be activated with an ultraviolet ray, ionizing radiation, visible light, or other each wavelength, especially an energy ray below 365 nm is used. Can be used. Specific examples of such a photopolymerization initiator include benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamine) benzophenone, 4,4-bis (diethylamine) benzophenone, α-amino acetophenone, 4,4-dichlorobenzophenone, 4-benzoyl-4-methyldiphenyl ketone, dibenzyl ketone, fluorenone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2-hydroxy-2-methylpro Piophenone, p-tert-butyldichloroacetophenone, thioxanthone, 2-methylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, diethylthioxanthone, benzyldimethyl ketal, benzylmethoxyethyl acetal, Nzoin methyl ether, benzoin butyl ether, anthraquinone, 2-tert-butylanthraquinone, 2-amylanthraquinone, β-chloroanthraquinone, anthrone, benzanthrone, dibenzsuberone, methyleneanthrone, 4-azidobenzylacetophenone, 2,6-bis ( p-azidobenzylidene) cyclohexane, 2,6-bis (p-azidobenzylidene) -4-methylcyclohexanone, 2-phenyl-1,2-butadion-2- (o-methoxycarbonyl) oxime, 1-phenyl-propanedione 2- (o-ethoxycarbonyl) oxime, 1,3-diphenyl-propanetrione-2- (o-ethoxycarbonyl) oxime, 1-phenyl-3-ethoxy-propanetrione-2- (o-benzoyl) Oxime, Michler's ketone, 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone, naphthalene Sulfonyl chloride, quinoline sulfonyl chloride, n-phenylthioacridone, 4,4-azobisisobutyronitrile, diphenyl disulfide, benzthiazole disulfide, triphenylphosphine, camphorquinone, Adeka N1717, carbon tetrabromide, tri Examples include combinations of photoreducing dyes such as bromophenyl sulfone, benzoin peroxide, eosin, and methylene blue with reducing agents such as ascorbic acid and triethanolamine. In the present invention, these photopolymerization initiators can be used alone or in combination of two or more.

  Examples of the positive curable resin composition include quinone diazides such as naphthoquinone diazide and benzoquinone diazide, diazo compounds such as diazomethyl drum acid, diazodimedone and 3-diazo-2,4-dione, and o-nitrobenzyl. Esters, onium salts, photodegradants (dissolution inhibitors) such as a mixture of onium salts and polyphthalaldehyde, t-butyl cholate, hydroquinone, phloroglucine, 2,3,4 -Mixtures of monomers such as monomers such as trihydroxybenzophenone, novolak resins such as phenol novolak resin and cresol novolak resin, copolymers of styrene and maleic acid and maleimide, and copolymers of phenolic and methacrylic acid, styrene and acrylonitrile. Or condensate Polymethyl methacrylate, polymethyl methacrylate, polyhexafluorobutyl methacrylate, polydimethyltetrafluoropropyl methacrylate, polytrichloroethyl methacrylate, methyl methacrylate-acrylonitrile copolymer, polymethyl isopropenyl ketone, poly α-cyano Examples thereof include acrylate and polytrifluoroethyl-α-chloroacrylate. Among these, from the viewpoint of versatility, a mixed / condensed product containing a novolak resin as a main component is preferably used.

  The method for forming the liquid crystal alignment control protrusion is not particularly limited as long as it can form the liquid crystal alignment control protrusion in the shape described above, and a general method such as a photolithography method may be used. it can. Details will be described in the section “B. Color Filter Manufacturing Method”.

(B) Thin Film Insulating Layer As the liquid crystal alignment control means, for example, a thin film insulating layer may be used in addition to the liquid crystal alignment control protrusion described above.

A thin film insulating layer shows insulation when a voltage is applied. Here, the term “insulating” as used in the present invention means a high resistance to a voltage applied to the transparent electrode layer when used in a liquid crystal display device. It is preferably 10 ¹³ Ω · cm or more. Thereby, when a voltage is applied to the liquid crystal display device, an electric field is not generated on the thin film insulating layer, and the alignment of the liquid crystal can be adjusted.
In addition, the said volume resistance value is the value measured by Mitsubishi Chemical Corporation MCP-450.

  The shape of the thin film insulating layer used in the present invention is preferably such that it does not affect the alignment of the liquid crystal. As a result, the liquid crystal injected between the liquid crystal driving side substrate and the color filter can be prevented from being affected by the shape of the thin film insulating layer, and when a voltage is applied, the liquid crystal is directed in the intended direction. This is because it becomes possible to orient.

  Specifically, the thickness of such a thin film insulating layer is preferably 0.2 μm to 0.5 μm, more preferably 0.2 μm to 0.4 μm, and particularly preferably in the range of 0.3 μm to 0.4 μm. . This is because by setting the thickness of the thin-film insulating layer within the above range, it is possible to obtain a desired insulating property and not to affect the alignment of the liquid crystal. In addition, by setting the thickness as described above, the unevenness of the surface of the color filter can be reduced, and the cell gap between the color filter and the liquid crystal driving side substrate can be easily controlled. .

Examples of the material for the thin film insulating layer used in the present invention include an insulating photosensitive resin, and the same material as the liquid crystal alignment control protrusion described above can be used.
In addition, the forming method can be the same method as the liquid crystal alignment control protrusion described above.

3. Transparent substrate If the transparent substrate used for this invention is a board | substrate transparent with respect to visible light, it will not specifically limit, It can be set as the same thing as the transparent substrate used for a general color filter.

4). Next, the colored layer used in the present invention will be described. The colored layer used in the present invention is formed on a transparent substrate.

Although the number of colors of the colored layer in the present invention is not particularly limited, it is composed of a plurality of colors, and is generally composed of a red colored layer, a green colored layer, and a blue colored layer.
The colored pattern shape in the colored layer can be a known arrangement such as a stripe type, a mosaic type, a triangle type, or a four-pixel arrangement type, and the colored area can be arbitrarily set.

  The color layer material of each color is obtained by dispersing or dissolving a colorant such as a pigment or dye of each color in a photosensitive resin.

Examples of the colorant used in the red coloring layer include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments. These pigments may be used alone or in combination of two or more.
Examples of the colorant used in the green colored layer include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, isoindoline pigments, and isoindolinone pigments. And pigments. These pigments or dyes may be used alone or in combination of two or more.
Examples of the colorant used in the blue colored layer include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. These pigments may be used alone or in combination of two or more.

  In addition, as the photosensitive resin, either a negative photosensitive resin or a positive photosensitive resin can be used, but a negative photosensitive resin is usually used. Examples of the negative photosensitive resin include those having reactive vinyl groups such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber.

  A photopolymerization initiator may be added to the photosensitive resin composition for the colored layer containing the colorant and the photosensitive resin, and further, if necessary, a sensitizer, a coating property improver, and a development improver. Further, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant and the like may be added.

5. Black matrix layer
The black matrix layer used in this embodiment is formed on the transparent electrode layer and defines pixels.
The material of the black matrix layer used in this embodiment is the same as that of the light shielding portion described above. The dimensions of the black matrix layer are appropriately adjusted depending on the type of liquid crystal display device used.

6). Transparent layer The transparent layer used in this embodiment is formed on the black matrix layer and is formed from the same material as the liquid crystal alignment control means.
About the material of the said transparent layer, since it is the same as that of the material used for the means for liquid crystal orientation control mentioned above, description here is abbreviate | omitted.
The thickness of the transparent layer is appropriately adjusted depending on the height of the liquid crystal alignment control means.
The dimension of the transparent layer is appropriately adjusted according to the dimension of the black matrix layer described above.

7). Transparent electrode layer Next, the transparent electrode layer used for the color filter of this aspect is demonstrated. The transparent electrode layer used in the color filter of this embodiment can be the same as the transparent electrode layer used in a general color filter. For example, indium tin oxide (ITO), zinc oxide (ZnO), tin oxide ( It can be formed by a general film forming method such as a sputtering method, a vacuum vapor deposition method, a CVD method using SnO) or the like and an alloy thereof. The thickness of such a transparent electrode layer can usually be about 0.01 μm to 1 μm.

8). Columnar spacers In this embodiment, columnar spacers may be integrally formed on the transparent layer.
Hereinafter, the columnar spacer will be described.

  The columnar spacer used in this embodiment is formed integrally on the above-described transparent layer, and is provided to keep the thickness of the liquid crystal layer constant and uniform when the color filter of this embodiment is used in a liquid crystal display device. It is. Here, the columnar spacer is formed of the same material as the liquid crystal alignment control means described above.

  FIG. 1B is a schematic cross-sectional view showing an example of the color filter of this aspect. As illustrated in FIG. 1B, in the color filter of this aspect, the columnar spacer 9 may be integrally formed on the transparent layer 8. Since the configuration of the color filter not described is the same as that in FIG. 1A, the description thereof is omitted here.

  The shape of such a columnar spacer is not particularly limited as long as the liquid crystal layer can be kept constant when the color filter of this aspect is used in a liquid crystal display device. Specifically, examples of the shape of the columnar spacer include a columnar shape, a prismatic shape, and a truncated cone shape.

  The size of the bottom surface of the columnar spacer is appropriately selected depending on the size of the non-pixel region, the size of the color filter, and the like.

  Further, the height of the columnar spacer is preferably about the same as the cell gap when the color filter of this embodiment is used in a liquid crystal display device. Specifically, the height of the columnar spacer is preferably about 0.5 μm to 10 μm, more preferably in the range of 1 μm to 8 μm.

  The number of columnar spacers is not particularly limited as long as the cell gap can be kept constant when the color filter of this embodiment is used in a liquid crystal display device. It is appropriately selected depending on the size and the like.

  In this embodiment, if necessary, auxiliary columnar spacers can be formed in addition to the columnar spacers.

  The auxiliary columnar spacer in this aspect is lower in height than the columnar spacer. In general, it is preferable that the gap between the color filter of the liquid crystal display device and the liquid crystal driving side substrate is easily narrowed or widened against a minute load. This is because a liquid crystal display device in which low-temperature foaming, gravity unevenness and the like do not occur can be obtained. Further, when a large load is applied, it is preferable that the gap does not become narrower than a certain level, and when the load is removed, it easily returns to the original gap. This is because a liquid crystal display device that is resistant to external impact and the like can be obtained.

  In this embodiment, when an auxiliary columnar spacer having a height lower than that of the columnar spacer is formed on the transparent electrode layer, the load is supported only by the columnar spacer in the case of a small load. The gap with the drive side substrate can be easily displaced. On the other hand, when a large load is applied, since the load is supported by the columnar spacers and the auxiliary columnar spacers, the gap between the color filter of the liquid crystal display device and the liquid crystal driving side substrate cannot be changed more than a certain level. It is also possible to prevent the columnar spacer from being deformed by a large load. Therefore, by forming the columnar spacer, it is possible to provide a color filter that can form a liquid crystal display device that has a large amount of displacement in a minute load region and has sufficient resistance to a local load. Have

  The height of the auxiliary columnar spacer is appropriately selected depending on the type of the liquid crystal display device and the like, but is usually about 65% to 90%, especially about 70% to 90% of the height of the columnar spacer. It can be. Further, the position where the auxiliary columnar spacer is formed is usually a region not used for display when a color filter is used in a liquid crystal display device, that is, a light shielding portion formed between a colored layer and a colored layer. And the corresponding area.

9. Others The color filter of this embodiment is particularly limited as long as it has the above-described light-shielding portion, liquid crystal alignment control means, colored layer, transparent substrate, black matrix layer, transparent electrode layer, and columnar spacer. Instead, if necessary, other configurations can be appropriately formed on the transparent layer.

II. Second Aspect The color filter of this aspect defines a transparent substrate, a colored layer formed on the transparent substrate, a transparent electrode layer formed on the colored layer, and a pixel formed between the colored layers. And a liquid crystal alignment control means formed in a region corresponding to the colored layer on the transparent electrode layer, and a light shielding property between the transparent electrode layer and the liquid crystal alignment control means. The black matrix layer is formed on the transparent substrate and covers the black matrix layer and the colored layer so as to cover the black matrix layer and the colored layer. It has a layer structure in which a transparent electrode layer is formed.

  FIG. 2A is a schematic cross-sectional view showing an example of the color filter of this aspect. 2A, the color filter 1 of this embodiment includes a transparent substrate 2, a colored layer 3 (3R, 3G, and 3B in FIG. 2) formed on the transparent substrate 2, and a transparent substrate. 2, a transparent electrode layer 5 formed so as to cover the colored layer 3 and the black matrix layer 4, and a region corresponding to the colored layer 3 on the transparent electrode layer 5. The liquid crystal alignment control means 6 is provided. Here, a light shielding portion 7 is formed between the transparent electrode layer 5 and the liquid crystal alignment control means 6.

According to the present invention, when this color filter is used in a liquid crystal display device, a transparent one can be used as a liquid crystal alignment control means, so that impurities such as pigments do not elute in the liquid crystal, so that electrical reliability is reduced Can be prevented.
In addition, since the light-shielding portion is not formed between the transparent substrate and the colored layer, when the colored layer is formed, there is little swell, so that a color filter with high flatness can be obtained.
Further, since the material for the liquid crystal alignment control means does not contain a pigment, there is an advantage that the plate-making property is improved.

  Hereinafter, each configuration will be described.

  The light-shielding part, the liquid crystal alignment control means, the colored layer, the transparent substrate, and the transparent electrode layer in this aspect are the same as those in “I. First aspect”, and thus the description thereof is omitted here.

1. Next, the black matrix layer used in the present invention will be described. The black matrix layer in the present invention is formed on a transparent substrate and defines pixels. Such a region where the black matrix layer is formed is a non-display region not related to display when the color filter of the present invention is used as a liquid crystal display device.

  Such a black matrix layer can be generally the same as that used as a black matrix layer of a color filter for a liquid crystal display device. For example, the thickness is 1000 to 2000 mm by a sputtering method, a vacuum evaporation method, or the like. A thin metal film such as chromium may be formed, and the thin film may be patterned. For example, light shielding particles such as carbon fine particles, metal oxides, inorganic pigments, and organic pigments may be placed in a resin binder. A layer formed by a photolithography method, a printing method, or the like may be used.

2. Others The color filter of the present embodiment is not particularly limited as long as it has the above-described light-shielding portion, liquid crystal alignment control means, colored layer, transparent substrate, black matrix layer, and transparent electrode layer, and is necessary. Such a member can be formed as appropriate, and examples thereof include a columnar spacer.

As illustrated in FIG. 2B, the columnar spacer 9 used in the color filter of this embodiment is formed on the transparent electrode layer 5 on the black matrix layer 4, and the color filter of this embodiment is a liquid crystal. When used in a display device, it is provided to keep the thickness of the liquid crystal layer constant and uniform. Here, the columnar spacer 9 and the liquid crystal alignment control means 6 are made of the same material. Further, a light shielding portion 7 is formed between the columnar spacer 9 and the transparent electrode layer 5.
In addition, about the code | symbol which is not demonstrated here, it is the same as that of Fig.2 (a).

  Since the columnar spacer can be formed simultaneously with the liquid crystal alignment control means described above, the color filter manufacturing process can be simplified.

  Since the columnar spacer used in this embodiment has been described in detail in the above-mentioned section “I. First Embodiment 8. Columnar Spacer”, description thereof is omitted here.

B. Next, a method for producing a color filter of the present invention will be described.
The color filter manufacturing method of the present invention has two modes corresponding to the color filter of the “first mode” and the color filter of the “second mode” described in the section “A. Color filter”. . The manufacturing method of the color filter of the first aspect will be described below as a third aspect, and the manufacturing method of the color filter of the second aspect will be described as a fourth aspect.

I. 3rd aspect The manufacturing method of the color filter of this aspect consists of the colored layer formation process which forms a colored layer on a transparent substrate, and the transparent electrode layer formation which forms a transparent electrode layer so that the said transparent substrate and the said colored layer may be covered A light shielding part forming layer forming step for forming a light shielding part forming layer made of an inorganic material and having a light shielding property so as to cover the transparent electrode layer, and a photosensitive resin on the light shielding part forming layer. A photosensitive resin layer forming step for forming a photosensitive resin layer, and a liquid crystal alignment control means for exposing the photosensitive resin layer using an exposure mask and developing to form a liquid crystal alignment control means and a liquid crystal alignment control means for forming a transparent layer And a transparent layer forming step, the liquid crystal alignment control means and the transparent layer as a resist layer, and etching the light shielding portion forming layer to form a light shielding portion and a black matrix layer. And a trix layer forming step.

  FIG. 3 is a process diagram showing an example of a method for producing a color filter of this embodiment. As illustrated in FIG. 3, the color filter manufacturing method of the present embodiment includes a colored layer forming step (FIG. 3A) of forming a colored layer 3 (3 </ b> R, 3 </ b> G, and 3 </ b> B in FIG. 3) on the transparent substrate 2. ), A transparent electrode layer forming step (FIG. 3B) for forming the transparent electrode layer 5 so as to cover the transparent substrate 2 and the colored layer 3, and a light shielding property so as to cover the transparent electrode layer 5. Then, a light shielding part forming layer forming step (FIG. 3C) for forming a light shielding part forming layer 7 ′ made of an inorganic material, and a photosensitive resin made of a photosensitive resin on the light shielding part forming layer 7 ′. The photosensitive resin layer forming step for forming the layer 10 (FIG. 3D), the photosensitive resin layer 10 is exposed using an exposure mask, developed, and the liquid crystal alignment control means 6 and the transparent layer 8 are formed. Means for controlling liquid crystal orientation to be formed and transparent layer forming step (FIG. 3 (e)), and the above-mentioned liquid crystal orientation controlling hand 6 and the transparent layer 8 as a resist layer, and the light shielding part forming layer 7 ′ is etched to form the light shielding part 7 and the black matrix layer 4, thereby forming a light shielding part and black matrix layer (FIG. 3F). It is a manufacturing method which has this.

According to this aspect, since the light-shielding portion and the black matrix layer can be formed in one process, the number of processes can be reduced and the cost can be reduced.
Hereinafter, each process will be described.

1. Colored layer forming step This step is a step of forming a colored layer in the opening of the black matrix layer on the transparent substrate.

The colored layer forming coating solution for forming the colored layer used in this step is obtained by dispersing or dissolving a colorant such as a pigment or dye of each color and a photosensitive resin material in a solvent.
The colorant and the photosensitive resin are the same as those described in the section “A. Color filter”. Further, since the solvent is the same as that used in a general color filter manufacturing method, detailed description thereof is omitted here.

  The color layer method used in this step is the same as that used in a general color filter manufacturing method, and examples thereof include an ink jet method and a photolithography method.

2. Transparent electrode layer formation process This process is a process of forming a transparent electrode layer so that a transparent substrate, a colored layer, and a black matrix layer may be covered.
Since the material and forming method of the transparent electrode layer used in this step have been described in the section “A. Color filter”, description thereof is omitted here.

3. Light shielding part forming layer forming step This step is a step of forming a light shielding part forming layer made of an inorganic material having a light shielding property so as to cover the transparent electrode layer.

  Since the material and film thickness of the light shielding part forming layer used in this step are the same as those formed in the section “1. Light shielding part” of “A. Color filter”, description is omitted here. To do.

  The method for forming the light shielding part forming layer used in this step is not particularly limited as long as it can uniformly form a chromium-based material in a desired film thickness. For example, sputtering, ion plating, etc. Or physical vapor deposition (PVD) such as vacuum vapor deposition.

4). Photosensitive resin layer forming step This step is a step of forming a photosensitive resin layer made of a photosensitive resin on the light shielding part forming layer.
The photosensitive resin used in this step is the same as the material of the liquid crystal alignment control means described in the section “2. Liquid crystal alignment control means” of “A. Color filter”, so description thereof is omitted here. To do.
The thickness of the photosensitive resin layer is appropriately adjusted depending on the shape of the liquid crystal alignment control means to be formed.
Further, when the columnar spacer is formed together with the liquid crystal alignment control means, it is appropriately adjusted depending on the shape of the columnar spacer.

The method for forming the photosensitive resin layer is not particularly limited as long as the photosensitive resin can be uniformly applied onto the light shielding part forming layer, and can be formed using a general application method. Examples of such coating methods include spin coating, spray coating, dip coating, roll coating, and bead coating.
In addition, you may pre-bake the apply | coated photosensitive resin layer as needed.

5. Liquid crystal alignment control means and transparent layer forming step This step is a step of forming the liquid crystal alignment control means and the transparent layer by exposing and developing the photosensitive resin layer using an exposure mask.

  The exposure mask used in this step is not particularly limited as long as at least the region of the liquid crystal alignment control means and the transparent resin layer is formed. When forming a general color filter It can be the same as that used.

  In this step, columnar spacers, auxiliary columnar spacers, and the like may be formed in addition to the liquid crystal alignment control means and the transparent resin layer using, for example, a gradation mask.

FIG. 4 is a process diagram for forming columnar spacers using a gradation mask during exposure in this process. As illustrated in FIG. 4, the transparent resin layer 10 (FIG. 4A) formed on the light shielding part forming layer 7 ′ is exposed by irradiating the exposure light 12 using the gradation mask 11 ( 4 (b)), the columnar spacer 9 is integrally formed on the liquid crystal alignment controlling means 6, the transparent layer 8, and the transparent layer 8 by developing (FIG. 4 (c)).
In addition, since the code | symbol which is not described is the same as that of FIG. 3, description here is abbreviate | omitted.

The gradation mask used in the above case has a light shielding region, a semi-transparent region, and a transmission region.
The shapes of the light-shielding region, translucent region, and transmissive region are not particularly limited, and are appropriately adjusted depending on the liquid crystal alignment control means to be formed, the transparent layer, and the columnar spacer.

  The gradation mask material and the formation method can be the same as the gradation mask material and the formation method used in manufacturing a general color filter, and thus description thereof is omitted here.

  The exposure method and development method of the photosensitive resin layer are the same as those used in the production of a general color filter, and thus description thereof is omitted here.

  When the liquid crystal alignment control means is a liquid crystal alignment control protrusion, heat treatment or the like is usually performed after development in order to make the liquid crystal easy to tilt.

6). Light shielding part and black matrix layer forming step This process is a step of forming the light shielding part and the black matrix layer by etching the light shielding part forming layer using the liquid crystal alignment control means and the transparent layer as a resist layer.

  The etching method used in this step is not particularly limited as long as it is a method capable of removing only the unnecessary light shielding portion forming layer without affecting the liquid crystal alignment control means and the transparent electrode layer, but wet etching is not particularly limited. It is preferable to use it. Wet etching is advantageous in terms of cost and production efficiency. In addition, since the wet etching is dissolved by a chemical reaction, it is preferable from the viewpoint that the etching rate can be easily controlled by selecting an etchant.

  As the etching agent, a cerium nitrate wet etchant is preferably used. This is because the cerium nitrate wet etchant is suitable for etching a chromium material.

  The manufacturing method of the color filter of this aspect can be suitably performed if there are necessary steps in addition to the steps described above.

II. Fourth aspect A method for producing a color filter according to this aspect includes a black matrix layer forming step of forming a black matrix layer defining pixels on a transparent substrate, and a colored layer at an opening of the black matrix layer on the transparent substrate. A colored layer forming step of forming a transparent electrode layer so as to cover the transparent substrate, the colored layer, and the black matrix layer; and a light shielding property so as to cover the transparent electrode layer A light shielding part forming layer forming step for forming a light shielding part forming layer made of an inorganic material, and forming a photosensitive resin layer made of a photosensitive resin on the light shielding part forming layer A step of forming a liquid crystal alignment control means by exposing the photosensitive resin layer using an exposure mask and developing to form a liquid crystal alignment control means, and the liquid crystal alignment control means as a resist. And a light shielding part forming step of forming the light shielding part by etching the light shielding part forming layer as a layer.

  FIG. 5 is a process diagram showing an example of a method for producing a color filter of this aspect. As illustrated in FIG. 5, the black matrix layer forming step (FIG. 5A) for forming the black matrix layer 4 on the transparent substrate 2, and the colored layer 3 at the opening of the black matrix layer 4 on the transparent substrate 2. (In FIG. 5, the colored layer forming step (FIG. 5B) for forming 3R, 3G, and 3B) and the transparent electrode layer 5 so as to cover the transparent substrate 2, the colored layer 3, and the black matrix layer 4. A transparent electrode layer forming step (FIG. 5C) for forming a light shielding portion and a light shielding portion forming layer for forming a light shielding portion forming layer 7 ′ made of an inorganic material having a light shielding property so as to cover the transparent electrode layer 5 A forming step (FIG. 5D), a photosensitive resin layer forming step (FIG. 5E) for forming the photosensitive resin layer 10 on the light shielding portion forming layer 7 ′, and exposing the photosensitive resin layer 10; The liquid crystal alignment control means 6 is exposed to light and developed to form the liquid crystal alignment control means 6. And a light shielding part forming step (FIG. 5 (g)) for forming the light shielding part 7 by etching the light shielding part forming layer 7 ′ using the liquid crystal alignment control means 6 as a resist layer. )).

  According to this aspect, since the liquid crystal alignment control means is used as a resist layer to form the light shielding portion, the liquid crystal alignment control means and the light shielding portion, which are problematic in the conventional method, do not cause misalignment. It is not necessary to form a large portion and the aperture ratio can be designed to be large, so that a color filter with high transmittance can be formed.

  Since the colored layer forming step, the transparent electrode layer forming step, and the light shielding portion forming layer forming step in this embodiment are the same as the steps described in the above-mentioned section of “I. Third Embodiment”, Description is omitted.

1. Black matrix layer formation process This process is a process of forming a black matrix layer on a transparent substrate.
Since the formation method of the black matrix layer used in this step is the same as that used in a general color filter manufacturing method, detailed description thereof is omitted here.

2. Photosensitive resin layer forming step This step is a step of forming a photosensitive resin layer made of a photosensitive resin on the light shielding part forming layer.

  Since the photosensitive resin used in this step and the method for forming the photosensitive resin layer forming layer are the same as those described in the section “I. Third Aspect”, description thereof is omitted here.

The thickness of the photosensitive resin layer formed in this step is appropriately determined depending on the shape of the liquid crystal alignment control means.
Moreover, when forming a columnar spacer on a transparent layer, it adjusts suitably according to the height of the columnar spacer desired.

3. Liquid crystal alignment control means forming step This step is a step of exposing the photosensitive resin layer using an exposure mask and developing to form liquid crystal alignment control means.

  The exposure method and the development method can be the same as those used when forming liquid crystal alignment control means in a general color filter. If necessary, the liquid crystal alignment control means after development may be baked.

  Further, since the liquid crystal alignment control means formed in this step has been described in the section “A. Color filter” described above, description thereof is omitted here.

  In this step, when the columnar spacer is formed together with the liquid crystal alignment control means, exposure is performed using a gradation mask during exposure.

  In the above case, the gradation mask to be used can be the same as that described in the above-mentioned “I. Third Aspect” section, and thus the description thereof is omitted here.

  When the liquid crystal alignment control means is a liquid crystal alignment control protrusion, heat treatment or the like is usually performed after development in order to make the liquid crystal easy to tilt.

4). Light Shielding Part Forming Step This step is a step of forming the light shielding part by etching the light shielding part forming layer using the liquid crystal alignment control means as a resist layer.
Since the etching method and the etching agent are the same as those described in the section “I. Third Aspect”, description thereof is omitted here.

  The manufacturing method of the color filter of this aspect can be suitably performed if there are necessary steps in addition to the steps described above.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  The following examples illustrate the present invention more specifically.

[Example 1]
(Production of color filter)
As the substrate, a glass substrate (Corning 1737 glass) having a size of 300 mm × 400 mm and a thickness of 0.7 mm was prepared. After this substrate is cleaned according to a regular method, a negative photosensitive resist (CFPR DN-83 manufactured by Tokyo Ohka Kogyo Co., Ltd.) is applied to the entire surface of one side of the substrate, and exposed, developed, and heat-treated through a predetermined mask A black matrix layer having a line width of 20 μm and a pitch of 100 μm was formed.
Next, a negative photosensitive resin composition for a red colored layer, a negative photosensitive resin composition for a green colored layer, and a negative photosensitive resin composition for a blue colored layer having the following compositions were prepared.

<Negative photosensitive resin composition for red colored layer>
・ Red organic pigment (Chromophthal Red A2B manufactured by Ciba Specialty Chemicals)
4.8 parts by weight / yellow organic pigment (BASF Pariotor Yellow D1819) 1.2 parts by weight / pigment dispersant (Bicchemy Disperbic 161) 3.0 parts by weight / monomer (Sartomer SR399) 0 parts by weight, Polymer I 5.0 parts by weight, initiator (Irgacure 907, manufactured by Ciba Specialty Chemicals)
1.4 parts by weight / initiator (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-biimidazole) 0.6 parts by weight / solvent ( Propylene glycol monomethyl ether acetate) 80.0 parts by weight

<Negative photosensitive resin composition for green colored layer>
Green organic pigment (Avisia Monastral Green 9Y-C) 4.2 parts by weight Yellow organic pigment (BASF Pariol Yellow D1819) 1.8 parts by weight Pigment dispersant (Bicchemy Disperbic 161) 3.0 parts by weight / monomer (SR 399 manufactured by Sartomer) 4.0 parts by weight / polymer I 5.0 parts by weight / initiator (Irgacure 907 manufactured by Ciba Specialty Chemicals)
1.4 parts by weight / initiator (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-biimidazole) 0.6 parts by weight / solvent ( Propylene glycol monomethyl ether acetate) 80.0 parts by weight

<Negative photosensitive resin composition for blue colored layer>
Blue organic pigment (BASF Heliogen Blue L6700F) 6.0 parts by weight Pigment derivative (Abyssia Solsperse 5000) 0.6 parts by weight Pigment dispersant (Bic Chemie Dispersic 161) 2.4 parts by weight -Monomer (SR399, SR399) 4.0 parts by weight-Polymer I 5.0 parts by weight-Initiator (Ciba Specialty Chemicals Irgacure 907)
1.4 parts by weight / initiator (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-biimidazole) 0.6 parts by weight / solvent ( Propylene glycol monomethyl ether acetate) 80.0 parts by weight The above polymer I is benzyl methacrylate: styrene: acrylic acid: 2-hydroxyethyl methacrylate = 15.6: 37.0: 30.5: 16.9 (mol) Ratio) is obtained by adding 16.9 mol% of 2-methacryloyloxyethyl isocyanate to 100 mol% of the copolymer, and the weight average molecular weight is 42500.

Next, a negative photosensitive resin composition for a red colored layer is applied by a spin coating method so as to cover the black matrix layer on the glass substrate, and exposed and developed through a photomask for the red colored layer, A red colored layer was formed. The red colored layer was rectangular (100 μm × 300 μm).
Then, the green colored layer and the blue colored layer were formed by the same operation using the negative photosensitive resin composition for the green colored layer and the negative photosensitive resin composition for the blue colored layer. Thereby, a colored layer in which a red colored layer, a green colored layer, and a blue colored layer were arranged was formed.
Next, a transparent electrode layer (thickness 1500 mm) made of indium tin oxide (ITO) was formed by sputtering so as to cover the black matrix layer and the colored layer.

  Further, a chromium thin film was formed on the transparent conductive film by a sputtering method so as to cover the transparent conductive film (thickness 1000 mm, optical density 3.8). A positive photoresist (LC-130 manufactured by Rohm and Haas) was applied onto the formed chromium film by spin coating, and exposure, development, and baking were performed through a photomask to form liquid crystal alignment control protrusions. .

Thereafter, the chromium thin film was etched using an etching solution having the following composition so that the chromium thin film was formed only between the liquid crystal alignment control protrusion and the transparent conductive film.
<Etching solution composition>
・ Ceric ammonium nitrate 20%
・ Nitric acid 7%
・ 73% of water

  Then, a photosensitive resin composition for columnar spacers with cell gap retention (Optomer NN780 manufactured by JSR Co., Ltd.) is applied on the glass substrate by a spin coating method, exposed and developed through a photomask, and columnar. A spacer was formed. This columnar spacer had a dot shape (lower bottom 30 μmφ, height 3.5 μm).

(Production of liquid crystal cell)
An alignment film made of polyimide was formed on the transparent electrode film on the surface of the color filter formed as described above. Thereafter, a required amount of vertical alignment liquid crystal is dropped on the glass substrate on which the TFT is formed, and then the color filter formed as described above is overlaid, and a UV curable resin is used as a sealing material to form 0.3 kgf / cm ^{2 at} room temperature. A cell was prepared by bonding by exposing at a dose of 400 mJ / cm ² while applying pressure, and a polarizing plate was attached to the upper and lower portions of the cell so that the polarization axis was 90 degrees to obtain a liquid crystal cell.

[Example 2]
Without forming the black matrix layer on the transparent substrate, a colored layer, a transparent conductive film, and a chromium thin film are formed, and when forming the liquid crystal alignment control protrusion, a positive photo is applied to the region where the black matrix layer is to be formed. A color filter was produced in the same manner as in Example 1 except that a resist was formed, and then cell assembly was performed to produce a liquid crystal cell.

[Comparative Example 1]
A liquid crystal cell is manufactured by preparing a color filter by the same method as in Example 1 except that a protrusion for controlling liquid crystal alignment is formed without forming a chromium thin film on the transparent conductive film. did.

[Comparative Example 2]
When forming the black matrix layer, in consideration of misalignment due to alignment, the black matrix layer was formed 2 μm larger than the liquid crystal alignment control protrusion formation pattern in the region where the alignment control protrusions should be formed. Produced a color filter by the same method as in Example 1, and then assembled cells to produce a liquid crystal cell.

[Evaluation]
The liquid crystal cell produced as described above was energized on the backlight, and the luminance at the time of voltage application was measured with an SR-3 spectral radiance meter manufactured by TOPCON. Further, the contrast of the liquid crystal cell was calculated from the ratio of luminance before voltage application and at the time of voltage application. The results are shown in Table 1.

  In Example 1 and Example 2 having the light-shielding portion having the same size as the bottom surface of the liquid crystal alignment control protrusion, the contrast was higher than in Comparative Example 1 and Comparative Example 2.

It is a schematic sectional drawing which shows an example of the color filter of this invention. It is a schematic sectional drawing which shows another example of the color filter of this invention. It is process drawing which shows an example of the manufacturing method of the color filter of this invention. It is process drawing which shows another example of the manufacturing method of the color filter of this invention. It is process drawing which shows another example of the manufacturing method of the color filter of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Color filter 2 ... Transparent substrate 3, 3R, 3G, 3B ... Colored layer 4 ... Black matrix layer 5 ... Transparent electrode layer 6 ... Liquid crystal alignment control means 7 ... Light-shielding part 7 '... Light-shielding part formation layer 8 ... Transparent Layer 9 ... columnar spacer 10 ... photosensitive resin layer 11 ... gradation mask 12 ... exposure light

Claims (8)

A transparent substrate, a colored layer formed on the transparent substrate, a transparent electrode layer formed on the colored layer, a black matrix layer defining pixels formed between the colored layers, and the transparent electrode layer A liquid crystal alignment control means formed in a region corresponding to the colored layer of the color filter,
A color filter having a light shielding property and comprising a light shielding part made of an inorganic material between the transparent electrode layer and the liquid crystal alignment control means.   The black matrix layer has a layer structure formed on the transparent electrode layer, and has a transparent layer made of the same material as the liquid crystal alignment control means on the black matrix layer. The color filter according to 1.   A columnar spacer is formed on the transparent electrode layer, the light shielding portion is formed between the columnar spacer and the transparent electrode layer, and the columnar spacer is formed of the same material as the liquid crystal alignment control means. The color filter according to claim 1, wherein the color filter is provided.   The color filter according to any one of claims 1 to 3, wherein the liquid crystal alignment control means is a liquid crystal alignment control protrusion.   5. The color filter according to claim 1, wherein an OD value of the light shielding portion is 2.0 or more. A colored layer forming step of forming a colored layer on the transparent substrate;
A transparent electrode layer forming step of forming a transparent electrode layer so as to cover the transparent substrate and the colored layer;
A light shielding part forming layer forming step of forming a light shielding part forming layer made of an inorganic material having a light shielding property so as to cover the transparent electrode layer;
A photosensitive resin layer forming step of forming a photosensitive resin layer made of a photosensitive resin on the light shielding portion forming layer;
A liquid crystal alignment control means and a transparent layer forming step of exposing the photosensitive resin layer using an exposure mask and developing to form a liquid crystal alignment control means and a transparent layer; and
A light shielding portion and a black matrix layer forming step of forming a light shielding portion and a black matrix layer by etching the light shielding portion forming layer using the liquid crystal alignment control means and the transparent layer as a resist layer. A method for producing a color filter.   The columnar spacer is integrally formed on the transparent layer by exposing and developing the photosensitive resin layer using a gradation mask in the liquid crystal alignment control means and the transparent layer forming step. 6. A method for producing a color filter according to 6. A black matrix layer forming step of forming a black matrix layer defining pixels on a transparent substrate;
A colored layer forming step of forming a colored layer in an opening of the black matrix layer on the transparent substrate;
A transparent electrode layer forming step of forming a transparent electrode layer so as to cover the transparent substrate, the colored layer, and the black matrix layer;
A light shielding part forming layer forming step of forming a light shielding part forming layer made of an inorganic material having a light shielding property so as to cover the transparent electrode layer;
A photosensitive resin layer forming step of forming a photosensitive resin layer made of a photosensitive resin on the light shielding portion forming layer;
A liquid crystal alignment control means forming step of exposing the photosensitive resin layer using an exposure mask and developing to form a liquid crystal alignment control means; and
A method for producing a color filter, comprising: forming a light shielding part by etching the light shielding part forming layer using the liquid crystal alignment control means as a resist layer.

Images