JP2009140924A5 - - Google Patents
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- Publication number
- JP2009140924A5 JP2009140924A5 JP2008297643A JP2008297643A JP2009140924A5 JP 2009140924 A5 JP2009140924 A5 JP 2009140924A5 JP 2008297643 A JP2008297643 A JP 2008297643A JP 2008297643 A JP2008297643 A JP 2008297643A JP 2009140924 A5 JP2009140924 A5 JP 2009140924A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007058443A DE102007058443B4 (de) | 2007-12-05 | 2007-12-05 | Korrektor für axialen und außeraxialen Strahlengang und TEM damit |
DE102007058443.3 | 2007-12-05 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009140924A JP2009140924A (ja) | 2009-06-25 |
JP2009140924A5 true JP2009140924A5 (ja) | 2010-03-25 |
JP5294811B2 JP5294811B2 (ja) | 2013-09-18 |
Family
ID=40262001
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008297643A Active JP5294811B2 (ja) | 2007-12-05 | 2008-11-21 | 軸上及び軸外ビーム経路のための補正器 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7807965B2 (ja) |
EP (1) | EP2068344B1 (ja) |
JP (1) | JP5294811B2 (ja) |
DE (1) | DE102007058443B4 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007049816B3 (de) * | 2007-10-20 | 2009-04-16 | Ceos Corrected Electron Optical Systems Gmbh | Korrektor |
CA2725544C (en) * | 2008-05-30 | 2017-12-19 | The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University | A radio-frequency-free hybrid electrostatic/magnetostatic cell for transporting, trapping, and dissociating ions in mass spectrometers |
JP5250350B2 (ja) * | 2008-09-12 | 2013-07-31 | 株式会社日立ハイテクノロジーズ | 荷電粒子線応用装置 |
EP2413345B1 (en) | 2010-07-29 | 2013-02-20 | Carl Zeiss NTS GmbH | Charged particle beam system |
DE102010054541A1 (de) * | 2010-12-15 | 2012-06-21 | Ceos Corrected Electron Optical Systems Gmbh | Korrektor |
DE102011009954A1 (de) * | 2011-02-01 | 2012-08-02 | Ceos Corrected Electron Optical Systems Gmbh | Korrektor |
EP2682978B1 (en) | 2012-07-05 | 2016-10-19 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Contamination reduction electrode for particle detector |
EP2883237B1 (en) | 2012-08-16 | 2020-11-25 | The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University | Electromagnetostatic electron-induced dissociation cell |
EP2722868B1 (en) | 2012-10-16 | 2018-02-21 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Octopole device and method for spot size improvement |
US11239045B1 (en) * | 2020-09-30 | 2022-02-01 | Fei Company | Method and system for correcting two-fold, fifth-order parasitic aberrations in charged particle systems |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19739290A1 (de) * | 1997-09-08 | 1999-03-11 | Ceos Gmbh | Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen |
DE10159308A1 (de) * | 2001-12-04 | 2003-06-12 | Ceos Gmbh | Teilchenoptischer Korrektor |
DE10159454B4 (de) * | 2001-12-04 | 2012-08-02 | Carl Zeiss Nts Gmbh | Korrektor zur Korrektion von Farbfehlern erster Ordnung, ersten Grades |
JP4204902B2 (ja) * | 2002-06-28 | 2009-01-07 | 日本電子株式会社 | 収差補正装置を備えた荷電粒子ビーム装置 |
US6770887B2 (en) * | 2002-07-08 | 2004-08-03 | Ondrej L. Krivanek | Aberration-corrected charged-particle optical apparatus |
JP4133619B2 (ja) * | 2003-06-24 | 2008-08-13 | 日本電子株式会社 | 多極子レンズ及び多極子レンズを備えた観察装置並びに多極子レンズの製造方法 |
US7378667B2 (en) * | 2005-04-05 | 2008-05-27 | Fei Company | Particle-optical appliance provided with aberration-correcting means |
JP2007128656A (ja) * | 2005-11-01 | 2007-05-24 | Jeol Ltd | 収差補正装置を備えた荷電粒子ビーム装置 |
US7989776B2 (en) * | 2005-12-06 | 2011-08-02 | Ceos Corrected Electron Optical Systems Gmbh | Corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial, chromatic aberration |
DE102006017686A1 (de) * | 2006-04-15 | 2007-10-18 | Ceos Corrected Electron Optical Systems Gmbh | Elektronenoptischer Korrektor für aplanatische Abbildungssysteme |
DE102007049816B3 (de) * | 2007-10-20 | 2009-04-16 | Ceos Corrected Electron Optical Systems Gmbh | Korrektor |
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2007
- 2007-12-05 DE DE102007058443A patent/DE102007058443B4/de not_active Expired - Fee Related
-
2008
- 2008-09-03 US US12/230,632 patent/US7807965B2/en not_active Expired - Fee Related
- 2008-11-21 JP JP2008297643A patent/JP5294811B2/ja active Active
- 2008-11-22 EP EP08020365.6A patent/EP2068344B1/de not_active Expired - Fee Related