JP2009140924A5 - - Google Patents

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Publication number
JP2009140924A5
JP2009140924A5 JP2008297643A JP2008297643A JP2009140924A5 JP 2009140924 A5 JP2009140924 A5 JP 2009140924A5 JP 2008297643 A JP2008297643 A JP 2008297643A JP 2008297643 A JP2008297643 A JP 2008297643A JP 2009140924 A5 JP2009140924 A5 JP 2009140924A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2008297643A
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JP2009140924A (ja
JP5294811B2 (ja
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Priority claimed from DE102007058443A external-priority patent/DE102007058443B4/de
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Publication of JP2009140924A publication Critical patent/JP2009140924A/ja
Publication of JP2009140924A5 publication Critical patent/JP2009140924A5/ja
Application granted granted Critical
Publication of JP5294811B2 publication Critical patent/JP5294811B2/ja
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JP2008297643A 2007-12-05 2008-11-21 軸上及び軸外ビーム経路のための補正器 Active JP5294811B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007058443A DE102007058443B4 (de) 2007-12-05 2007-12-05 Korrektor für axialen und außeraxialen Strahlengang und TEM damit
DE102007058443.3 2007-12-05

Publications (3)

Publication Number Publication Date
JP2009140924A JP2009140924A (ja) 2009-06-25
JP2009140924A5 true JP2009140924A5 (ja) 2010-03-25
JP5294811B2 JP5294811B2 (ja) 2013-09-18

Family

ID=40262001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008297643A Active JP5294811B2 (ja) 2007-12-05 2008-11-21 軸上及び軸外ビーム経路のための補正器

Country Status (4)

Country Link
US (1) US7807965B2 (ja)
EP (1) EP2068344B1 (ja)
JP (1) JP5294811B2 (ja)
DE (1) DE102007058443B4 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007049816B3 (de) * 2007-10-20 2009-04-16 Ceos Corrected Electron Optical Systems Gmbh Korrektor
CA2725544C (en) * 2008-05-30 2017-12-19 The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University A radio-frequency-free hybrid electrostatic/magnetostatic cell for transporting, trapping, and dissociating ions in mass spectrometers
JP5250350B2 (ja) * 2008-09-12 2013-07-31 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
EP2413345B1 (en) 2010-07-29 2013-02-20 Carl Zeiss NTS GmbH Charged particle beam system
DE102010054541A1 (de) * 2010-12-15 2012-06-21 Ceos Corrected Electron Optical Systems Gmbh Korrektor
DE102011009954A1 (de) * 2011-02-01 2012-08-02 Ceos Corrected Electron Optical Systems Gmbh Korrektor
EP2682978B1 (en) 2012-07-05 2016-10-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Contamination reduction electrode for particle detector
EP2883237B1 (en) 2012-08-16 2020-11-25 The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University Electromagnetostatic electron-induced dissociation cell
EP2722868B1 (en) 2012-10-16 2018-02-21 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Octopole device and method for spot size improvement
US11239045B1 (en) * 2020-09-30 2022-02-01 Fei Company Method and system for correcting two-fold, fifth-order parasitic aberrations in charged particle systems

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19739290A1 (de) * 1997-09-08 1999-03-11 Ceos Gmbh Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen
DE10159308A1 (de) * 2001-12-04 2003-06-12 Ceos Gmbh Teilchenoptischer Korrektor
DE10159454B4 (de) * 2001-12-04 2012-08-02 Carl Zeiss Nts Gmbh Korrektor zur Korrektion von Farbfehlern erster Ordnung, ersten Grades
JP4204902B2 (ja) * 2002-06-28 2009-01-07 日本電子株式会社 収差補正装置を備えた荷電粒子ビーム装置
US6770887B2 (en) * 2002-07-08 2004-08-03 Ondrej L. Krivanek Aberration-corrected charged-particle optical apparatus
JP4133619B2 (ja) * 2003-06-24 2008-08-13 日本電子株式会社 多極子レンズ及び多極子レンズを備えた観察装置並びに多極子レンズの製造方法
US7378667B2 (en) * 2005-04-05 2008-05-27 Fei Company Particle-optical appliance provided with aberration-correcting means
JP2007128656A (ja) * 2005-11-01 2007-05-24 Jeol Ltd 収差補正装置を備えた荷電粒子ビーム装置
US7989776B2 (en) * 2005-12-06 2011-08-02 Ceos Corrected Electron Optical Systems Gmbh Corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial, chromatic aberration
DE102006017686A1 (de) * 2006-04-15 2007-10-18 Ceos Corrected Electron Optical Systems Gmbh Elektronenoptischer Korrektor für aplanatische Abbildungssysteme
DE102007049816B3 (de) * 2007-10-20 2009-04-16 Ceos Corrected Electron Optical Systems Gmbh Korrektor

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