JP2009099612A5 - - Google Patents

Claims (2)

A rotating part that holds the substrate to be processed and rotates it, a processing part that forms an insertion groove into which the peripheral edge of the substrate to be processed held by the rotating part enters, the insertion groove and the above-mentioned that has entered the insertion groove A flow path formed in combination with the peripheral edge, a cleaning liquid supply port provided in the processing unit, and a suction port provided in the processing unit and provided at a position separated from the processing substrate in the circumferential direction, The pressure in the flow path is reduced by the suction force from the suction port, the gas outside the processing unit is sucked to generate a high-speed air flow in the flow path, and the cleaning liquid flowing out from the supply port together with the high-speed air flow A substrate processing apparatus configured to be guided to the flow path, further to suck and discharge the gas and the cleaning liquid guided to the flow path from the suction port, and to clean the peripheral portion of the substrate to be processed with the cleaning liquid flowing in the flow path together with the high-speed air flow. . In the insertion groove of the processing section, the interval formed between the surface of the insertion groove facing the outer peripheral edge of the substrate to be processed that has entered the processing section and the outer peripheral edge of the substrate to be processed that has entered the insertion groove is narrowed. The substrate processing apparatus according to claim 1, further comprising a structure to be processed.