JP2009058891A - Method for correcting defect in color filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for correcting a defect in a color filter with which a defective part of the color filter can be corrected in a short time and identification of a corrected part is difficult. <P>SOLUTION: The method for correcting the defect in the color filter includes a pattern transfer step of transferring at least a part of a black matrix pattern by using a transfer film having the black matrix pattern onto a colored image defective region on a substrate and a colored layer formation step of forming a prescribed colored layer at least onto a part of the colored image defective region divided by the transferred black matrix patter. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a defect correction method for correcting a defect of a color filter.

In the manufacturing process of a color filter for a liquid crystal display device, it is known to correct defects on the color filter in order to improve the yield. As the defect correction method, for example, there is a method of correcting by attaching a resist to the tip of a needle and dropping this resist on the defective portion. Another defect correction method is a film transfer method. In this method, a film having a colored layer is brought into close contact with a white defect portion having no colored layer of the color filter substrate, and the defective portion is corrected by transferring the colored layer from the film (for example, see Patent Document 1).
JP 2005-95971 A

However, in the method in which the resist is dropped onto the defective portion, the dropping amount varies depending on the viscosity of the resist. Therefore, it is difficult to control the dropping amount and the correction accuracy, and it is difficult to correct stably. In addition, a drying process is required, and it takes a long time for correction and productivity is low. In particular, when the size of the defective portion is large, for example, when the major axis of the defective portion exceeds 100 μm, it is difficult to correct the defective portion in a short time, and the correction has to be abandoned.
Further, in the method described in Patent Document 1, it is possible to correct a defective portion in a short time, but particularly when the size of the defective portion is large, the corrected portion can be easily identified visually, and a liquid crystal display device is obtained. In some cases, the display quality may deteriorate.

  An object of the present invention is to provide a color filter defect correcting method that can correct a defective portion of a color filter in a short time and makes it difficult to identify the corrected portion.

Specific means for solving the above problems are as follows.
<1> A pattern transfer step of transferring at least a part of the black matrix pattern to a colored image missing region on the substrate using a transfer film having a black matrix pattern, and the section partitioned by the transferred black matrix pattern And a colored layer forming step of forming a predetermined colored layer in at least a part of the colored image missing region.
<2> The color filter defect correcting method according to <1>, wherein the colored image missing region is a region formed by removing a defective portion of the colored image on the substrate by laser light irradiation.
<3> The color filter defect correcting method according to <1> or <2>, wherein the colored layer forming step is a step of forming the colored layer using an inkjet method.
<4> The color filter defect correction method according to any one of <1> to <3>, wherein a maximum length of the colored image missing region is 100 μm or more.

  ADVANTAGE OF THE INVENTION According to this invention, the defect correction method of the color filter which can correct the defect part of a color filter in a short time, and it is difficult to identify the correction part can be provided.

The color filter defect correcting method of the present invention includes a pattern transfer step of transferring at least a part of the black matrix pattern to a colored image missing region on a substrate using a transfer film having a black matrix pattern; And a colored layer forming step of forming a colored layer in at least a part of the colored image missing region partitioned by a black matrix pattern.
By transferring the black matrix pattern formed in advance to the colored image missing area, the portion of the colored image missing area where the black matrix is scheduled to be formed can be stably corrected in a short time. . Further, a color filter in which it is difficult to identify a corrected portion can be reproduced by coloring a concave portion formed on the substrate by the transferred black matrix pattern to form a colored layer and obtaining a predetermined hue.

The colored image missing area is an area on the substrate where the colored layer and the black matrix constituting the color filter are not formed. Even if the colored image missing area is formed at the time of manufacturing the color filter, the color filter defect It may be a colored image missing region formed by removing a portion or the like.
In the present invention, a mode in which a defective portion on the color filter is removed by laser beam irradiation to form a colored image missing region, and then the defect is corrected is preferable.

  In the present invention, the defective portion on the color filter means a region on the substrate where the colored layer and / or the black matrix is not formed in a desired manner. For example, missing colored layers, insufficient colored layer thickness, mixed color of colored layers, missing black matrix, adhering colored foreign matters, adhering colorless foreign matters and the like can be mentioned. The presence of such a defective portion on the substrate causes a deterioration in display characteristics of the display device when the display device is configured.

In the present invention, the maximum length of the colored image missing region on the color filter is preferably 100 μm or more, and more preferably 100 μm or more and 1000 μm or less. Here, the maximum length of the defective portion means the longest distance in the shape of the defective portion.
The defect correction method for a color filter of the present invention has a remarkable effect in that the defect correction efficiency and the correction portion are difficult to identify, particularly when a large defect whose maximum length is 100 μm or more is corrected.

  As the light source of the laser light in the present invention, any laser light source can be used without particular limitation as long as it can remove the defective portion on the substrate. Among these, a pulse laser light source is preferable from the viewpoint of defect removal efficiency. In the present invention, from the viewpoint of defect removal efficiency, a YAG laser is preferable, and a Q-switched YAG laser is more preferable.

  Further, the laser beam in the present invention can be formed into a spot shape suitable for defect removal by a beam forming mechanism. As the beam shaping mechanism, a known beam shaping mechanism including an aperture, a slit, a lens and the like can be used.

The method for removing the defective portion on the color filter by laser light irradiation is not particularly limited as long as the colored layer and the black matrix constituting the defective portion can be removed. In the present invention, ablation with a laser beam is preferable from the viewpoint of removal efficiency of defective portions and removal of fine regions.
In the removal of the defective portion, in addition to the defective portion, the peripheral region of the defective portion may be simultaneously removed from the viewpoint of repair efficiency.

  The transfer film having a black matrix pattern used in the pattern transfer step is one in which at least a black matrix pattern is formed on a temporary support. The black matrix pattern may include a colored resin layer. Further, a thermoplastic resin layer may be provided between the temporary support and the colored resin layer. Moreover, the transfer film may further have a protective film.

  The temporary support may be made of a material that is chemically and thermally stable and flexible. Furthermore, it is preferable to be made of a substance that does not absorb the laser beam. Specifically, a thin sheet of Teflon (registered trademark), polyethylene terephthalate, polycarbonate, polyethylene, polypropylene, or a laminate thereof can be used. The thickness of the support can be 5 to 300 μm, in particular 20 to 150 μm.

The colored resin layer can include at least a colorant and a curable composition.
As the colorant, known pigments and dyes can be used without particular limitation as long as they can form a black matrix. For example, the pigments and dyes described in JP-A-2005-17716 [0038] to [0054], the pigments described in JP-A-2004-361447 [0068] to [0072], and JP-A-2005-17521 Colorants described in the publications [0080] to [0088] can be mentioned. Specific examples include Fat Black HB (CI 26150), Monolite First Black B (CI Pigment Black 1), and carbon black. The content of the colorant in the colored resin layer is preferably 30 to 70% by mass and more preferably 40 to 60% by mass from the viewpoint of the optical density and strength of the black matrix pattern to be formed. More preferably, it is 50-55 mass%.

The curable composition may be a photocurable composition or a thermosetting composition, and can be appropriately selected according to the purpose.
In the present invention, when the black matrix pattern is formed by a photolithography method, the curable composition is preferably a photocurable composition. Moreover, when forming a black matrix pattern by the inkjet method, it is preferable that the said curable composition is a thermosetting composition.

The photocurable composition can comprise at least a binder polymer, an ethylenically unsaturated bond-containing monomer, and a photopolymerization initiator.
For the binder polymer, the ethylenically unsaturated bond-containing monomer, and the photopolymerization initiator, known materials can be used without particular limitation. Examples thereof include materials described in JP-A-2005-3861.

  The thermosetting composition can be used without any particular limitation as long as it is a composition that cures by heating. For example, the thermosetting composition can include a thermosetting compound having a known thermosetting functional group.

  The thickness of the colored resin layer can be set to a thickness that is substantially the same as the thickness of the black matrix of the color filter to be corrected, and can be set to 1 to 5 μm, for example.

As the protective film, for example, a protective film described in JP-A-2005-3861 can be preferably used.
As the thermoplastic resin layer, for example, the thermoplastic resin layer described in JP-A-2005-3861, JP-A-11-338134, and the like can be suitably used.
The transfer film in the present invention is preferably a transfer film having a configuration described in JP-A-11-338134 from the viewpoint of transfer efficiency of the colored resin layer. Thereby, good transferability can be obtained, and the support and the thermoplastic resin layer can be peeled from the colored resin layer at the same time, so that productivity is improved.

The transfer film having a black matrix pattern in the present invention can be produced, for example, as follows.
A thermoplastic resin layer coating solution is applied onto a temporary support by a known coating method and dried to form a thermoplastic resin layer, and a photosensitive colored resin layer coating solution is further applied onto the thermoplastic resin layer. By applying and drying by a method to form a photosensitive colored resin layer, a laminate in which a thermoplastic resin layer and a photosensitive colored resin layer are laminated on a temporary support is produced. Next, pattern exposure and development are performed through a mask having a black matrix pattern, whereby a transfer film having a black matrix pattern, which is composed of a thermoplastic resin layer and a colored resin layer on the temporary support, can be produced. .

  Further, the colored resin layer ink is ejected onto the thermoplastic resin layer formed as described above, dried, and the thermoplastic resin layer and the colored resin layer are formed on the temporary support, and the colored resin layer is a black matrix. A transfer film having the following pattern can be produced.

  In the present invention, from the viewpoint of time required for defect correction, the black matrix pattern formed on the transfer film is preferably substantially the same pattern as the black matrix pattern of the color filter to be defect corrected.

  In the present invention, the pattern transfer step of transferring the black matrix pattern on the transfer film to the colored image missing region on the substrate includes fixing the transfer film at a position on the substrate to which the black matrix pattern is transferred, And transferring at least a part of the black matrix pattern onto the substrate.

  The step of fixing the transfer film at a position on the substrate to which the black matrix pattern is transferred can be formed in a structure in which the black matrix pattern on the transfer film and the black matrix pattern constituting the color filter to be defect-corrected are continuous after transfer. A step of fixing the transfer film at a position is preferable.

In the step of transferring the black matrix pattern from the transfer film onto the substrate, the black matrix pattern on the transfer film can be transferred to a colored image missing region on the substrate by, for example, heating and / or pressure bonding. In the present invention, it is preferable to transfer by thermocompression bonding from the viewpoint of transfer efficiency. There is no particular limitation on the thermocompression bonding method. From the viewpoint of defect correction efficiency, thermocompression bonding with a heater block is preferable.
Further, prior to thermocompression bonding with a heater block, a preheating treatment with infrared rays or the like may be performed.

In the colored layer forming step constituting the defect correcting method of the color filter of the present invention, a colored layer is formed in at least a part of the colored image missing region defined by the black matrix pattern transferred in the pattern transfer step.
A known colored layer forming method can be applied to the colored layer forming step in the present invention without any particular limitation. For example, an ink jet method, a transfer method, a photolithography method, and the like can be given. In the present invention, the inkjet method is preferable from the viewpoint of defect correction efficiency.

  About the said inkjet method, the general method used for preparation of a color filter can be applied suitably also in this invention.

  An example of an embodiment of the color filter defect correcting method of the present invention will be described in more detail with reference to the drawings. FIG. 1 is a schematic diagram showing an example of the configuration of a defect correction apparatus that can be used in the practice of the present invention. 1 is a short pulse laser light source, 2 is a beam shaping mechanism, 3 is a half mirror, 4 is an objective lens, 5 is a film, 6 is a substrate, 7 is a stage, 8 is a film reel, 9 is a lamp light source, 10 is a filter, 11 Is a half mirror, 12 is a CCD camera, 13 is an air jetting means, and 14 is a film reel rotating means.

  In this embodiment, the substrate 6 to be corrected for defects is a color filter substrate used for a liquid crystal panel of a liquid crystal display device. The color filter substrate 6 is usually provided with a colored layer and a black matrix constituting pixels on a transparent glass substrate. The stage 7 includes an XY drive mechanism (not shown) and is an XY stage that can move in the XY directions, and can move the substrate 6 to an arbitrary position. The defect correction apparatus according to the present invention includes a defect detection mechanism for detecting defects on the substrate 6 and a defect correction mechanism for correcting the detected defects, and the substrate 6 is placed horizontally on the stage 7. Thus, it is possible to determine whether each pixel of the color filter substrate has a defect and correct it. Specifically, after the position of the defect is grasped by the defect detection mechanism, the defect portion of the substrate 6 is irradiated with laser by the defect correction mechanism, and the defect portion is removed and corrected. The configuration of the optical system and the like of the illustrated defect detection mechanism and defect correction mechanism is merely an example, and other optical components such as a filter, a lens, and a mirror may be provided.

  First, the defect detection mechanism will be described. The defect detection mechanism detects defects using the lamp light source 9, the filter 10, the half mirror 11, and the CCD camera 12. A lamp light source 9 is provided as an observation light source, and the lamp light source 9 emits white light for illuminating the surface of the substrate 6. The observation light emitted from the lamp light source 9 passes through the filter 10 and enters the half mirror 11. The filter 10 is a wavelength tunable filter and can shield only a predetermined wavelength. Here, the filter 10 may correct the wavelength in accordance with the transmittance of the film 5 so that the detected light becomes white light. Light incident on the half mirror 11 is reflected in the direction of the substrate 6. The reflected light passes through the half mirror 3 and enters the objective lens 4. A film 5 made of polyimide having a thickness of about 10 μm is provided between the objective lens 4 and the substrate 6 so as to face the substrate 6. Then, the light condensed by the objective lens 4 passes through the film 5 and enters the surface of the substrate 6 to illuminate a part of the substrate. The light reflected by the substrate 6 passes through the film 5, the objective lens 4, the half mirror 3 and the half mirror 11 and enters the CCD camera 12. The CCD camera 12 detects an image based on the reflected light reflected from the surface of the substrate 6. The CCD camera 12 is connected to an information processing device such as a personal computer (PC), and determines the presence or absence of a defect in the substrate 6 based on the detected image. As a method for determining the presence or absence of a substrate defect, for example, a die-to-die method in which a detected image is compared with a reference die can be used. If the detected image is different from the reference die, it is determined as a defective portion. With this defect detection mechanism, an opaque black defect and a transparent white defect can be distinguished and detected.

Further, the PC is connected to the XY drive mechanism of the stage 7, the detection location is specified from the position of the stage 7 at the time of defect detection, and the coordinates of the defective pixel on the substrate are detected. Further, by moving the stage 7, the relative position of the light from the substrate 6 and the lamp light source 9 is changed to detect defects on the entire surface of the substrate 6.
Of course, the defect detection mechanism is not limited to the illustrated configuration, and a defect detection mechanism having a configuration other than this may be used. About this defect detection mechanism, the structure similar to the conventional defect detection apparatus can be used.

  The defect detected by the above-described defect detection mechanism is corrected by the defect correction mechanism. The defect correction mechanism will be described below. The defect correcting mechanism uses the short pulse short laser light source 1, the beam shaping mechanism 2, and the half mirror 3 to correct the defect. The pulse laser light source 1 is, for example, a Q switch YAG laser, and can emit short pulse light of 10 nsec or less. The short pulse laser beam emitted from the short pulse laser light source 1 enters the beam shaping mechanism 2. The beam shaping mechanism 2 includes an aperture, a slit, a lens, and the like, and can form a short pulse light spot into a beam spot having an appropriate shape. For example, the beam spot of the short pulse light on the substrate is formed into a rectangular shape substantially the same as the pixel of the color filter. Or you may make it shape | mold in the shape substantially the same as the shape of a defect. The half mirror 3 reflects short pulse light in the direction of the substrate 6. Here, the respective optical components are arranged so that the light from the short pulse laser light source 1 and the lamp light source 9 are coaxial. The short pulse light reflected by the half mirror 3 is applied to the film 5.

  The film 5 is wound around two film reels 8 connected to the film reel rotating means 14. The film reel rotating means 14 includes a motor or the like, and can rotate each of the film reels 8. By rotating the two film reels 8, the film 5 is continuously fed in the Y direction. Before the defect is corrected, the film reel rotating means 14 is driven so that the film 5 is bent, and one of the film reels 8 is rotated. Here, the film 5 is allowed to bend so as not to come into contact with the substrate 6. The air ejecting means 13 includes an air tank, piping, an ionizer, a filter, and the like, and can eject ionized air from above the film 5. For example, a cylinder having an open bottom on the substrate side is provided under the objective lens 4. This cylinder is tapered, and the opening diameter on the substrate side is small. A pipe is connected to the side surface so that air can flow into the cylinder. By flowing the air supplied from the pipe, the internal pressure in the cylinder increases, and the air is ejected to the film 5 side. At the time of defect correction, air is blown to bring the film 5 closer to the substrate side, and the film 5 and the substrate 6 are brought close to each other. By bringing the film 5 and the substrate 6 close to each other, a minute gap is provided between the substrate 6 and the film 5 in the defective portion. In this case, the protruding portion other than the defective portion of the substrate 6 and the film 5 may be in contact with each other. The distance between the film 5 and the substrate 6 is adjusted by the ejection amount of the air ejection means 13 or the like. Alternatively, the deflection and tension of the film 5 may be adjusted by the film reel rotating means 14. Further, the interval may be adjusted by providing the stage 7 with a mechanism for moving in the Z direction. By bringing the film 5 and the substrate 6 closer to each other by the air ejection means 13, it is not necessary to make the film 5 adhere to the substrate. Thereby, stable correction can be performed and the influence on the pattern of the substrate 6 can be reduced.

  The film 5 is changed to a different film depending on the type of defect to be corrected as shown in FIG. The film of the defect correcting apparatus includes at least a defect removing film 5a and a film reel 8a, a defect correcting film 5b on which a black matrix is formed, and a film reel 8b, and a defect correcting film on which a colored layer is formed, and You may have a film reel further. The film reel 8 is attached to a reel moving means (not shown) such as a linear guide and is slidable in the X direction. The film reel 8a and the film reel 8b are moved in the X direction, and the film 5 corresponding to the defect to be corrected is irradiated with the short pulse light. That is, when removing the defective portion, the film 5 a is moved to the position of the laser spot 15 of the short pulse light from the short pulse laser light source 1. On the other hand, when correcting the white defect, the film 5 b is moved to the position of the laser spot 15 of the short pulse light from the short pulse laser light source 1. Since the light from the short pulse laser light source 1 and the lamp light source 9 is adjusted so as to be on the same optical axis, the laser spot 15 on the film 5 and the observation light are substantially in the same position. When the film reel 8 is moved and when the film 5 is sent out, the film reel 8 is rotated to give an appropriate tension to the film 5 so that a gap is provided between the substrate 6 and the film 5. Then, the film is moved and sent out without blowing air. On the other hand, when the defect is removed and corrected, the film 5 can be deflected and air can be ejected by the air ejecting means 14 to bring the film 5 close to the substrate surface.

  The configuration of the film 5a and the substrate 6 will be described with reference to FIG. FIG. 3 is an enlarged cross-sectional view showing the configuration of the corrected portion. FIG. 3A shows the film and substrate arrangement during irradiation with short pulse light. FIG. 3B shows the configuration of the substrate from which the defect has been removed. A red (R) colored layer 61, a green (G) colored layer 62, a blue (B) colored layer 63, and a black matrix (BM) 64 are provided on the substrate 6 to form a color filter. As shown in FIG. 3A, when the foreign matter 65 is attached on the color filter, the defective portion to which the foreign matter 65 is attached is detected as a black defect that does not transmit light by the defect detection mechanism. At this time, the film 5 a is substantially in contact with the color filter on the substrate 6.

  When the short pulse light of 10 nsec or less from the short pulse laser light source 1 is irradiated to the defect portion to which the foreign matter 65 has adhered, the short pulse light collected by the objective lens 4 approaches the substrate 6 by the air jetting means. Incident on the film 5a. The power of this short pulse light is adjusted so that the film 5a can be partially opened by laser ablation. Here, as an example, a polyimide film is used as the film 5a. If the third harmonic 355 nm or the fourth harmonic 266 nm of the YAG short pulse laser light source 1 is used, the polyimide film absorbs the short pulse light, so that an opening can be easily provided in the film 5 a. Further, since the polyimide film is substantially transparent without absorption in the visible light region, observation is easy, and the defect can be detected using the lamp light source 9. The film 5a is not limited to polyimide, but may be made of a material that is opened by chemical irradiation, thermal decomposition, sublimation, ablation, or the like when irradiated with light. Since the laser beam is shaped by the beam shaping mechanism 2 so as to have a defect shape or a pixel shape, the shape of the opening of the film 5a can be made substantially the same as the shape of the defect portion, for example. . The foreign matter 65 and a part of the film can be removed almost simultaneously by laser ablation.

  The removed foreign matter 65a is detached from the substrate through the opening of the film 5a as shown in FIG. In addition, since the periphery of the correction portion is covered with the film, the foreign matter 65 does not adhere to the film around the correction portion and does not create a new defect around the correction portion. Thus, the film and defects can be removed almost simultaneously by laser ablation. Although the removed foreign matter 65a is a single piece, it may become a large number of debris and land on the film.

  Further, the power of the short pulse laser light source 1 may be adjusted so as to gradually open a hole in the film 5a, or may be adjusted so that the film is punched and the foreign matter is removed simultaneously. When holes are gradually formed in the film 5a, the film 5a is in a thinned state, and a portion where the film 5a is thinned is irradiated with a short pulse laser beam to remove foreign matters.

  When the size of the opening is small, the opening may be provided while the film is being sent out. Since the film 5a is chemically decomposed by using far ultraviolet rays, if film residues remain on the substrate surface after removing foreign matter, the film residues can be removed by irradiating far ultraviolet rays.

  When the foreign matter 65 is transparent, laser ablation does not occur even if the foreign matter is irradiated with short pulse light because no light is absorbed. On the other hand, when a film such as polyimide that absorbs light is used as the film 5 and a short pulse laser beam is irradiated in a state where the absorbing film is substantially in contact with the upper part of the foreign material, the film opens simultaneously by laser ablation. A foreign substance is momentarily pressed against the substrate by the gas or debris that has come forward, and can be detached from the substrate by a subsequent recoil.

  Since the black matrix 64 and the colored layers 61 and 62 are removed together with the foreign matter 65 on the substrate by the above processing, the black defect becomes a colored image missing region 66 that transmits light. In order to correct the colored image missing region 66, the film reel 8a and the film reel 8b are moved in the X direction as shown in FIG. 4, and the film 5b is moved to the position of the laser spot 15. Then, the colored image missing area 66 is corrected by thermocompression bonding the film 5 b to the colored image missing area 66.

  A method of correcting the colored image missing area will be described with reference to FIG. FIG. 5 is an enlarged cross-sectional view showing an arrangement configuration between the film 5 b and the substrate 6. A black matrix 54 is formed on the surface of the film 5b on the substrate 6 side. As the film 5b, a dry film resist in which a polyethylene terephthalate film having a thickness of about 100 μm is used as a base film and a black matrix 54 having a thickness of about 1 μm is formed on the base film can be used. Moreover, it is preferable that a thermoplastic resin layer having a thickness of about 10 μm is further formed between the base film and the black matrix pattern.

  The film 5b is not limited to polyethylene, and polypropylene, PET film, or the like can be used, and the thickness is not limited to the above thickness. The black matrix 54 can be made of substantially the same material as the black matrix 64 on the substrate 6 side. Thereby, deterioration of the quality of a liquid crystal display device can be prevented more effectively. Of course, the material and thickness of the film 5b and the black matrix 54 are not limited to those described above.

Further, a heater block 20 is provided for thermally transferring the colored layer 54 formed on the film 5b onto the substrate. The heater block 20 is provided so as to be movable up and down. When the colored layer 54 of the film 5b is attached, the heater block 20 moves downward to press and heat the film 5b against the substrate 6. Thereby, the black matrix pattern 54a can be transferred to the colored pixel missing region.
In the present invention, it is preferable that the film 5 opened with a laser is sandwiched between the film 5 b and the substrate 6. By transferring the colored layer 54 through the opening of the film 5, it is possible to prevent the colored layer 54 from adhering to a region other than the defective portion. Thus, the black matrix pattern 54a can be transferred only to the defective portion with a simple configuration, and the defect can be corrected accurately. In addition, since the colored layer is not attached to an extra region, productivity can be improved.

  Since the defect correction at one place can be corrected only by moving the film reel 8 without moving the optical system or the stage, all the above operations can be performed while observing under one objective lens. Furthermore, the foreign matter can be removed and colored with only one short pulse laser light source 1, and white defects and black defects can be corrected. Further, it may be detected by the CCD camera 12 whether or not the correction is accurately performed after the correction operation is completed.

  After transferring the black matrix pattern as described above, it is preferable to form a colored layer in the colored image missing region defined by the black matrix pattern using an inkjet method in accordance with a predetermined predetermined hue. Thereby, even if it is a case where a defective part with a large area is corrected, it can correct more efficiently.

  In the above description, the color filter substrate for a liquid crystal display device has been described. However, the present invention can also be used for a color filter substrate for a solid-state imaging device such as a CCD camera. Of course, it can be used for pattern substrates other than the color filter substrate. For example, it can be used to correct a phosphor such as a PDP or a cathode ray tube. In the above description, the foreign material 65 is an opaque material that becomes a black defect. However, the foreign material 65 may be a transparent material. Furthermore, a colored layer or the like that is not provided with high accuracy may be removed. These foreign matters that must be removed are called defects. By removing this defect, the defect can be corrected.

  EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. Unless otherwise specified, “part” and “%” are based on mass.

(Example 1)
-Fabrication of color filter-
A color filter was produced by the method described in paragraph numbers [0064] to [0069] of JP-A-2006-276818.

-Production of transfer film-
Using polyethylene terephthalate having a thickness of 100 μm as a base film (temporary support), a coating solution for forming a thermoplastic resin layer having the following composition is applied and dried on this film to a dry film thickness of 10 μm. A temporary support was obtained in which an ethylene-ethyl acrylate copolymer resin film was formed as a thermoplastic resin layer.

Coating liquid for forming thermoplastic resin layer:
・ Ethylene-ethyl acrylate copolymer resin 10g
(Mitsui-Dupont Polychemical Co., Ltd., trade name: EVAFLEX-EEA-709, ethyl acrylate content 35%)
・ Toluene 100g

  Next, on the thermoplastic resin layer of the temporary support, the following colored photosensitive resin layer coating solution was applied and dried to a thickness of 1.8 μm to form a colored photosensitive resin layer.

Colored photosensitive resin coating solution:
Polymer: Polymer A 70 parts Monomer: Pentaerythritol tetraacrylate 30 parts Photoinitiator Irgacure 369 2.2 parts
(Ciba Specialty Chemicals)
N, N-tetraethyl-4,4′-diaminobenzophenone
... 2.2 parts · Solvent: Propylene glycol monomethyl ether ... 492 parts · Polymerization inhibitor: p-methoxyphenol ... 0.1 parts · Surfactant: Perfluoroalkylalkoxylate ... 0.01 parts · Colorant: Carbon black ... 22 parts Polymer A is a copolymer resin of styrene, methyl methacrylate, ethyl acrylate, acrylic acid and glycidyl methacrylate, having a weight average molecular weight of about 35,000 and an acid value of 110.

The coated photosensitive resin layer was exposed at 100 mJ / cm ² through a negative mask on which a black matrix pattern was formed, using a parallel light exposure machine MAP1200L (manufactured by Dainippon Screen). Next, spray development is performed at 25 ° C. for 60 seconds with a KOH-based developer (trade name CDK-1, manufactured by FUJIFILM Electronics Materials) using a spray-type developing device DVW911 (manufactured by Dainippon Screen). The black matrix pattern was formed by removing and drying.
Furthermore, it was covered with a 40 μm polypropylene film as a cover film, wound up in a roll shape as a transfer film, and a transfer film in which a thermoplastic resin layer, a black matrix pattern layer, and a cover film were sequentially laminated on the base film was prepared.

  The color filter obtained above is inspected using the transfer film and the color filter defect correcting apparatus shown in FIG. 1, and the maximum length detected on the color filter is 500 μm. The following defect was corrected.

-Removal of defective parts-
Using a Q-switched YAG laser (wavelength 266 nm, pulse time 10 nsec) as a laser light source, a short pulse laser beam is irradiated to the defective portion through a 10 μm polyimide film, and the polyimide film and the defective portion on the defective portion are irradiated by laser ablation. Was removed to form a colored image missing region.
At this time, the laser beam was made to have substantially the same shape as the defective portion by the beam shaping mechanism.

-Black matrix pattern transfer-
After removing the cover film, the transfer film having the black matrix pattern obtained above was brought close to the colored image missing region, and the heater block (temperature 120 ° C.) was 0.5 at a pressure of 9.8 × 10 ⁴ Pa. The black matrix pattern was thermally transferred by pressing against the transfer film for 2 seconds.
At this time, the position of the transfer film was adjusted so that the transferred black matrix pattern formed a continuous pattern with the black matrix pattern formed on the substrate.

-Formation of colored layer by inkjet method-
<Preparation of blue inkjet ink for color filter>
(1) Preparation of pigment dispersion Each pigment, pigment dispersant, and organic solvent in the following composition are mixed at the following ratio, and 500 parts of zirconia beads having a diameter of 0.3 mm are added, and a paint shaker (manufactured by Asada Steel) Was used for 4 hours to prepare PB15: 6 (CI Pigment Blue 15: 6) pigment dispersion and PV23 (CI Pigment Violet 23) pigment dispersion.

[Composition of pigment dispersion]
-Pigment: 10 parts-Pigment dispersant (Disperbyk161, manufactured by Big Chemie Japan): 10 parts (solid content in solvent BCA: 30% by mass)
Pigment dispersion aid (N-phenylmaleimide / benzyl methacrylate copolymer) 10 parts (solid content in solvent BCA 30% by mass))
・ BCA (Diethylene glycol monobutyl ether acetate)
... 70 copies

(2) Preparation of Binder Composition A Teflon (registered trademark) -coated rotor was placed in a sample bottle and placed on a magnetic stirrer. In this sample bottle, the following binder epoxy compound, polyfunctional epoxy resin and the like are added according to the following ratio, and sufficiently stirred and dissolved at room temperature. This was filtered to obtain a binder composition.

[Binder composition ratio]
・ The following binder epoxy compound: 15 parts (solid content 30% by mass in solvent BCA)
・ Polyfunctional epoxy resin (trade name Epicoat 154, made by oil-based shell epoxy)
... 3 parts Neopentyl glycol glycidyl ether 1.5 parts Trimellitic acid 3 parts BCA (diethylene glycol monobutyl ether acetate)
… 7.5 parts

  The binder epoxy compound was prepared according to the description in paragraph numbers [0128] to [0129] of JP-A No. 2006-284752.

(3) Preparation of inkjet ink After thoroughly mixing 46.8 parts of PB15: 6 pigment dispersion prepared above, 3.2 parts of PV23 pigment dispersion, 30 parts of binder composition, and 15 parts of BCA, n-dodecane was added so that it might become 5% with respect to the total amount of ink, and the blue inkjet ink for color filters was obtained.

<Preparation of red inkjet ink for color filter>
(1) Preparation of pigment dispersion The pigment, pigment dispersant, and organic solvent in the following composition are mixed in the following ratio, 500 parts of zirconia beads having a diameter of 0.3 mm are added, and a paint shaker (manufactured by Asada Steel Corporation) is added. And dispersed for 4 hours to prepare PR254 (CI Pigment Red 254) pigment dispersion and PR177 (CI Pigment Red 177) pigment dispersion, respectively.

[Composition of pigment dispersion]
-Pigment: 10 parts-Pigment dispersant (Disperbyk161, manufactured by Big Chemie Japan): 10 parts (solid content in solvent BCA 30% by mass))
Pigment dispersion aid (N-phenylmaleimide / benzyl methacrylate copolymer) 10 parts (solid content 30% by mass in solvent BCA)
・ BCA (Diethylene glycol monobutyl ether acetate)
... 70 copies

(2) Preparation of inkjet ink 68.85 parts of PR254 pigment dispersion prepared above, 6.15 parts of PR177 pigment dispersion, 20 parts of the binder composition, and 5 parts of BCA were sufficiently mixed. Thereafter, 5 parts of n-dodecane was added to obtain a red inkjet ink for a color filter.

<Preparation of green inkjet ink for color filter>
(1) Preparation of pigment dispersion The pigment, pigment dispersant, and organic solvent in the following composition are mixed in the following ratio, 500 parts of zirconia beads having a diameter of 0.3 mm are added, and a paint shaker (manufactured by Asada Steel Corporation) is added. PG36 (CI Pigment Green 36) pigment dispersion, PG7 (CI Pigment Green 7) pigment dispersion, and PY138 (CI Pigment Yellow 138) pigment dispersion. And a PY150 (CI Pigment Yellow 150) pigment dispersion.

[Composition of pigment dispersion]
-Pigment: 10 parts-Pigment dispersant (Disperbyk161, manufactured by Big Chemie Japan): 10 parts (solid content in solvent BCA 30% by mass))
Pigment dispersion aid (N-phenylmaleimide / benzyl methacrylate copolymer) 10 parts (solid content 30% by mass in solvent BCA)
・ BCA (Diethylene glycol monobutyl ether acetate)
... 70 copies

(2) Preparation of inkjet ink 19.25 parts of the PG36 pigment dispersion prepared above, 13.65 parts of PG7 pigment dispersion, 24.64 parts of PY138 pigment dispersion, 12.46 parts of PY150 pigment dispersion, Then, 22 parts of the binder composition and 3 parts of BCA were sufficiently mixed. Thereafter, 5 parts of n-dodecane was added to obtain a green inkjet ink for a color filter.

<Formation of colored layer>
The blue inkjet ink for the color filter obtained above is applied to the concave portion where the blue pixel of the colored image missing region whose black matrix pattern is corrected by thermal transfer is to be formed. The inkjet head (SE-128, head temperature 28 ° C., manufactured by Dimatix) The liquid was discharged until the desired concentration was obtained, and was adhered accurately and uniformly.
Similarly, the green inkjet ink for color filter and the red inkjet ink for color filter were adhered accurately and uniformly to the recesses where the green pixel and the red pixel were to be formed.

  Then, it dried under reduced pressure at 1333 Pa (10 Torr) for 120 seconds, and also pre-baked for 10 minutes on an 80 degreeC hotplate. Then, in a clean oven, post-baking is performed by heating at 200 ° C. for 30 minutes, and further post-baking is performed by heating at 230 ° C. for 30 minutes, and the average film thickness after drying and curing is 1.8 μm on the substrate. An RGB three-color pixel pattern was formed to correct a color filter defect.

Next, after cleaning and drying the substrate on which the RGB pixel pattern is formed, the ITO (indium tin oxide) electrode has a thickness of 120 nm under a vacuum of a substrate setting temperature of 200 ° C. and 0.8 Pa (6 × 10 ⁻³ Torr). Thus, a color filter formed into a film was obtained.

  According to the color filter correcting method of the present invention, the time required for correcting the defect is shorter than that of the conventional correcting method. In addition, when the color filter after defect correction was visually observed, the corrected portion was easily visually recognized with the color filter corrected with the conventional defect correction method, but with the color filter corrected with the defect correction method of the present invention, The corrected part could not be visually confirmed.

It is the schematic which shows the structure of the defect correction apparatus of a color filter. It is a top view which shows the structure of the film of the defect correction apparatus of a color filter. It is an expanded sectional view for demonstrating the formation process of a coloring image missing area, (a) is an expanded sectional view which shows the state which the foreign material adhered on the color filter, (b) is a colored image by which a foreign material is removed. It is an expanded sectional view showing the state where a missing region was formed. It is a top view which shows the structure of the film of the defect correction apparatus of a color filter. It is an enlarged cross-sectional view for explaining a pattern transfer process for transferring a black matrix pattern to a colored image missing region, (a) is an enlarged cross-sectional view showing the positional relationship between a black matrix and a heater block on a transfer film, (B) is an enlarged sectional view showing a state where a black matrix pattern is transferred to a colored image missing region.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Short pulse laser light source 2 Beam shaping mechanism 3 Half mirror 4 Objective lens 5 Film 6 Substrate 7 Stage 8 Film reel 9 Lamp light source 10 Wavelength variable filter 11 Half mirror 12 CCD camera 13 Air ejection means 14 Film reel rotation means 15 Laser spot 20 Heater block 54 Black matrix 61 Red colored layer 62 Green colored layer 63 Blue colored layer 64 Black matrix 65 Foreign matter 66 Colored image missing area

Claims (4)

A pattern transfer step of transferring at least part of the black matrix pattern to a colored image missing region on the substrate using a transfer film having a black matrix pattern;
A colored layer forming step of forming a predetermined colored layer on at least a part of the colored image missing region partitioned by the transferred black matrix pattern;
A defect correction method for color filters including   The color filter defect correction method according to claim 1, wherein the colored image missing region is a region formed by removing a defective portion of the colored image on the substrate by laser light irradiation.   The color filter defect correction method according to claim 1, wherein the colored layer forming step is a step of forming the colored layer using an inkjet method. The color filter defect correction method according to any one of claims 1 to 3, wherein a maximum length of the colored image missing region is 100 µm or more.

Images