JP2009053632A - Polymerizable composition, lithographic printing plate precursor and alkali-soluble resin - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide: a polymerizable composition excellent in film forming property and alkali developability, generating no development scum in a developer after development, and suitable for a photosensitive layer of a negative lithographic printing plate precursor; a lithographic printing plate precursor having a photosensitive layer comprising the polymerizable composition; and an alkali-soluble polyurethane resin suitable for the polymerizable composition. <P>SOLUTION: The polymerizable composition comprises (A) an alkali-soluble polyurethane resin having a side chain structure represented by general formula (I) and a side chain structure represented by general formula (II) within a molecule, (B) a compound having an addition polymerizable ethylenically unsaturated bond, and (C) a photo- or thermopolymerization initiator, wherein U represents a polyurethane main chain skeleton; L<SP>3</SP>represents a linking group; L<SP>6</SP>represents a single bond or a linking group, provided that when L<SP>6</SP>represents the linking group, the number of atoms constituting the main skeleton of the linking group is 1-6; n represents an integer of 1-5; and P represents a functional group which can be converted to an acid group by alkali hydrolysis. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a polymerizable composition, a lithographic printing plate precursor, and an alkali-soluble polyurethane resin. More specifically, a polymerizable composition suitable for a photosensitive layer of a negative lithographic printing plate precursor capable of high-sensitivity writing with a laser beam, and solubility in an aqueous alkali solution contained in such a polymerizable composition. The present invention relates to an excellent alkali-soluble polyurethane resin and a negative lithographic printing plate precursor containing the polymerizable composition in a photosensitive layer.

  Conventionally, PS plates having a structure in which an oleophilic photosensitive resin layer is provided on a hydrophilic support are widely used as photosensitive lithographic printing plates, and the plate making method is usually mask exposure via a lithographic film. After (surface exposure), the desired printing plate was obtained by dissolving and removing the non-image area.

  In recent years, digitization techniques that electronically process, store, and output image information using a computer have become widespread. Various new image output methods corresponding to such digitization techniques have come into practical use. As a result, computer-to-plate (CTP) technology that scans highly directional light such as laser light according to digitized image information and directly manufactures printing plates without going through a lithographic film has attracted attention. Obtaining a lithographic printing plate precursor adapted to this is an important technical issue.

  As such a lithographic printing plate precursor capable of scanning exposure, an oleophilic photosensitive resin layer containing a photosensitive compound capable of generating active species such as radicals and bronzed acids by laser exposure on a hydrophilic support (hereinafter referred to as “lithographic printing plate precursor”) , Which is also referred to as a photosensitive layer) has been proposed and is already on the market. This lithographic printing plate precursor is subjected to laser scanning exposure based on digital information to generate active species only in the laser irradiation area, which causes physical or chemical changes in the photosensitive layer and insolubilization, and subsequent development processing. A negative lithographic printing plate can be obtained. In particular, a photopolymerization type photosensitizer comprising a photopolymerization initiator excellent in photosensitive speed, a compound having a polymerizable ethylenically unsaturated double bond, and a binder polymer soluble in an alkali developer on a hydrophilic support. A lithographic printing plate precursor provided with a layer, and optionally an oxygen-blocking protective layer, is excellent in productivity, is easy to develop, and has good printing performance because of its advantages such as good resolution and thickness. A printing plate having

The polymerizable composition that forms the photosensitive layer of such a lithographic printing plate precursor rapidly cures the energy application region to form a high-strength film, and dissolves quickly in an unexposed area with an alkali developer. The property to be removed is required.
Conventionally, a polyurethane resin binder containing an alkali-soluble group has been used in such a photosensitive polymerizable composition for the purpose of improving the cured film strength and increasing the printing durability of an image area in a lithographic printing plate ( For example, see Patent Documents 1 and 2.) As the alkali-soluble group contained in such a polyurethane resin binder, dimethylolpropionic acid and dimethylolbutanoic acid are generally used, but the polyurethane resin binder has a high cohesiveness attributed to the urethane bond portion. Therefore, the developability is not sufficient, and there is a concern that development residue is deposited over time in the development layer and may adhere to the lithographic plate after plate making and cause stains. When used in the photosensitive layer of a lithographic printing plate precursor There is a problem that it is difficult to obtain excellent image forming properties.

For such problems, for example, in urethane resin, for the purpose of improving alkali developability, a method such as using a carboxylic acid unit having a specific structure or using a compound that generates an acid group by hydrolysis as a raw material. Thus, a technique for introducing a unit for the purpose of assisting developer solubility in a urethane resin has been proposed (see, for example, Patent Document 3). In the polymerizable composition containing the urethane resin obtained by such a method, alkali developability is improved, and precipitation with time such as development residue in the developer is effectively suppressed. However, by improving the solubility in an alkali developer, it affects the excellent film properties inherently possessed by the polyurethane resin, and the film properties of the resulting film are reduced. When used as the photosensitive layer of a lithographic printing plate precursor, There is a concern of problems such as a decrease in printing durability.
As described above, in the polymerizable composition, the strength of the cured film and the developability of the uncured region are generally contradictory properties, but particularly when used as a photosensitive layer of a lithographic printing plate precursor, In the present situation, there is a strong demand for a polymerizable composition that can achieve both of these, because it affects the printing durability of a part and the stain resistance of a non-image part.
Japanese Patent Publication No.8-12424 Japanese Patent Application Laid-Open No. 1-271741 JP 2006-225432 A

The object of the present invention, which has been made in consideration of the above problems, is to form a high-strength film by curing by applying energy, and has excellent alkali developability in an uncured area and is developed in a developer after development. An object of the present invention is to provide a polymerizable composition suitable for the photosensitive layer of a negative lithographic printing plate precursor that does not generate residue, and an alkali-soluble polyurethane resin contained in such a polymerizable composition.
A further object of the present invention is to provide a lithographic printing plate precursor having a photosensitive layer containing the polymerizable composition of the present invention and having excellent printing durability in image areas and developability in non-image areas. It is in.

  As a result of intensive studies to achieve the above object, the present inventor uses an alkali-soluble polyurethane resin containing a specific carboxylic acid unit and a unit having a functional group that can be hydrolyzed by an alkaline aqueous solution to become an acid group. As a result, the inventors have found that the above object can be achieved, and have accomplished the present invention.

  That is, the polymerizable composition of the present invention comprises (A) an alkali-soluble polyurethane having a side chain structure represented by the following general formula (I) and a side chain structure represented by the following general formula (II) in the molecule. A resin, (hereinafter, referred to as “specific polyurethane resin” as appropriate), (B) a compound having an ethylenically unsaturated bond capable of addition polymerization, and (C) a light or thermal polymerization initiator. To do.

(In general formula (I), U represents a polyurethane main chain skeleton, L ³ represents a linking group, and n represents an integer of 1 to 5.)

(In the general formula (II), U represents a polyurethane backbone skeleton, .P L ⁶ is a single bond or a linking group represents a functional group capable of being a group by alkaline hydrolysis. However, linked L ⁶ is In the case of representing a group, the number of atoms constituting the main skeleton of the linking group is 1 or more and 6 or less.)

  The specific polyurethane resin (A) used in the polymerizable composition of the present invention has a compound represented by the general formula (I) and a side chain structure represented by the general formula (II) in the molecule. Features. The (A) specific polyurethane resin used here is a novel polymer having excellent film-forming properties, excellent alkali developability of uncured parts, and physical properties that do not cause precipitation in an alkaline developer. This (A) specific polyurethane resin is characterized in that no precipitation occurs after it is dissolved in an alkaline aqueous solution having a pH of 12 or more and left at room temperature for 60 days. Here, no precipitation occurs when 12.5 g of a specific polyurethane resin is dissolved in 500 ml of an alkaline aqueous solution having a pH of 12, and after storage for 60 days in an atmosphere at 25 ° C., no polymer precipitation is visually observed. Point to.

  The lithographic printing plate precursor according to the invention is characterized in that a photosensitive layer containing the polymerizable composition of the invention is provided on a support.

The (A) specific polyurethane resin according to the present invention has a terminal carboxyl group, and is characterized in that precipitation of the polymer over time due to hydrolysis of the ester bond is suppressed.
In a preferred embodiment of the specific polyurethane resin of the present invention, it has a carboxylic acid group represented by the general formula (I) in the side chain, is represented by the general formula (II), and is hydrolyzed with an aqueous alkaline solution (developer). It has a functional group that can be decomposed to become an acid group (hereinafter referred to as “specific functional group” as appropriate) as a side chain structure, and is hydrolyzed in the structure of the general formula (II) in an alkaline aqueous solution such as an alkaline developer. It is considered that due to the action of the acid group generated by the decomposition, sufficient alkali solubility is expressed even after the terminal carboxyl group partially disappears, and the residue in the developer is suppressed.
In addition, by adopting a side chain structure represented by the general formula (II), alkali solubility can be sufficiently exhibited by introducing a small amount of such a functional group with respect to the weight of the entire polyurethane resin. Therefore, compared to introducing a large amount of acid groups, there is no concern of reducing the original performance of the resin (for example, printing durability), and excellent printing durability is maintained while improving alkali developability. It is considered possible. Therefore, by applying such a polymerizable composition as a photosensitive layer of a lithographic printing plate precursor, the alkali solubility is improved without impairing the printing durability of the photosensitive layer, resulting in a developer after use. Presumably, the precipitation (development residue) of the binder polymer therein is suppressed.

  The specific polyurethane resin having such a side chain structure is obtained using a compound represented by the following general formula (I-1) and a compound represented by the following general formula (II-1) as raw materials.

(In General Formula (I-1), X ¹ represents a trivalent or higher valent atom. L ¹ and L ² each independently represent an alkylene group which may have a single bond or a substituent, (L ¹ and L ² are not single bonds, L ³ represents a linking group, and n represents an integer of 1 to 5.)

(In General Formula (II-2), X ² represents a trivalent or higher valent atom. L ⁴ and L ⁵ each independently represents an alkylene group which may have a single bond or a substituent, Both L ⁴ and L ⁵ do not form a single bond, L ⁶ represents a single bond or a linking group, and P represents a functional group that can become an acid group by alkaline hydrolysis, provided that L ⁶ is a linking group. Represents the number of atoms constituting the main skeleton of the linking group is 1 or more and 6 or less.)

According to the present invention, a negative lithographic printing which is cured by applying energy to form a high-strength film, is excellent in alkali developability in an uncured area, and does not generate development residue in a developer after development. A polymerizable composition suitable for a photosensitive layer of a plate precursor and an alkali-soluble polyurethane resin contained in such a polymerizable composition can be provided.
Further, by applying the polymerizable composition of the present invention to the photosensitive layer, it is possible to provide a lithographic printing plate precursor having excellent printing durability in image areas and developability in non-image areas.

Hereinafter, the present invention will be described in detail.
<Polymerizable composition>
The polymerizable composition of the present invention comprises (A) an alkali-soluble polyurethane resin having a side chain structure represented by the following general formula (I) and a side chain structure represented by the following general formula (II) in the molecule, It contains (B) a compound having an ethylenically unsaturated bond capable of addition polymerization, and (C) a light or thermal polymerization initiator.
In the polymerizable composition, (C) a light or thermal polymerization initiator described later is decomposed by light or heat to generate radicals, and (B) a compound having an ethylenically unsaturated bond is polymerized by the generated radicals. It has a mechanism to cause.
Hereinafter, each component contained in the polymerizable composition of the present invention will be described in detail.
First, (A) specific polyurethane resin which is a characteristic component of the present invention will be described.

[(A) Alkali-soluble polyurethane resin (specific polyurethane resin) having a side chain structure represented by the following general formula (I) and a side chain structure represented by the following general formula (II) in the molecule]
The specific polyurethane resin of the present invention is characterized by having a side chain structure represented by the following general formula (I) and a side chain structure represented by the following general formula (II).

(In general formula (I), U represents a polyurethane main chain skeleton, L ³ represents a linking group, and n represents an integer of 1 to 5.)

(In the general formula (II), U represents a polyurethane backbone skeleton, .P L ⁶ is a single bond or a linking group represents a functional group capable of being a group by alkaline hydrolysis. However, linked L ⁶ is In the case of representing a group, the number of atoms constituting the main skeleton of the linking group is 1 or more and 6 or less.)
Such a specific polyurethane resin is synthesized using a diol compound represented by the following general formula (I-1) and a diol compound represented by the general formula (II-2) as raw materials. These are high molecular compounds obtained by reacting a diol compound containing two types of diol compounds with an isocyanate compound.
Hereinafter, the diol compound represented by formula (I-1) will be described.

In the general formula (I-1), X ¹ represents a trivalent or higher valent atom. L ¹ and L ² each independently represent a single bond or an alkylene group which may have a substituent, but both L ¹ and L ² do not become a single bond. L ³ represents a linking group. n represents an integer of 1 to 5.

  There are no particular restrictions on the means by which the specific polyurethane resin can be prevented from precipitating over time in an alkaline aqueous solution, effectively suppressing the decrease in polymer solubility due to the disappearance of carboxyl groups, which are alkali-soluble groups, over time. For example, the introduction of another functional group that is modified in an alkaline aqueous solution and exhibits alkali solubility, the introduction of another functional group having high alkali solubility that can improve the solubility of the entire polymer, or itself Although it does not function as an alkali-soluble group, measures such as introduction of a structure capable of improving solubility, for example, a structure having high affinity with an aqueous alkali solution can be taken.

Preferable specific embodiments include, for example, an embodiment having a functional group represented by the general formula (II) that can be converted into an acid group by alkaline hydrolysis.
Hereinafter, preferred specific embodiments of the specific polyurethane resin will be described in detail.

The compound represented by formula (I-1) will be described in detail.
In the general formula ^{(I-1), X} 1 represents a trivalent or more atoms. As a trivalent or more atom, a nitrogen atom, a carbon atom, a silicon atom, etc. are mentioned, for example. Among these, a nitrogen atom and a carbon atom are preferable. Here, the atom represented by X ¹ is trivalent or more means that at least X ¹ has three bonds in which the terminal —COOH is bonded via L ¹ , L ² , and L ^3. X ¹ may further have a hydrogen atom or a substituent.
Examples of the substituent that can be introduced into X ¹ include a substituent that includes an atom selected from the group consisting of a hydrogen atom, an oxygen atom, a sulfur atom, and a halogen atom. 1-50 hydrocarbon groups are preferred.

L ¹ and L ² in the general formula (I-1) each independently represent a single bond or an alkylene group which may have a substituent, and both L ¹ and L ² are a single bond. There is no. The alkylene group is preferably an alkylene group having 1 to 20 carbon atoms, and more preferably an alkylene group having 2 to 10 carbon atoms. Examples of the substituent that can be introduced into the alkylene group include a halogen atom (—F, —Br, —Cl, —I), an alkyl group that may have a substituent, and the like.

In general formula (I-1), L ³ represents a linking group. The linking group here is preferably one that does not contain a ring structure as part of its structure. Examples of the linking group represented by L ³ include a linking group including two or more atoms selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom, and a sulfur atom. More specifically, the number of atoms constituting the main skeleton of the linking group represented by L ³ is preferably 1-30, more preferably 3-25, and 4-20. More preferred is 5-10. The “main skeleton of the linking group” in the present invention refers to an atom or an atomic group used only for linking X ¹ and the terminal COOH in the general formula (I-1). When there are a plurality of atoms, the atoms or atomic groups constituting the path with the smallest number of atoms are used.

Below, it illustrates the structure of the compound represented by the general formula (I-1), also shown in their structure the number of atoms constituting the main skeleton of the linking group represented by L ³ and its calculation method.

More specifically, examples of the linking group represented by L ³ in formula (I-1) include alkylene, substituted alkylene, arylene, substituted arylene, and the like. These divalent groups are represented by —O—, —S—, —N (R ^A ) —, —C (═O) —, —OC (═O) —, —C (═O) O—, —NHC (═O) O—, —NHC (= O) NH-, etc. may be used alone or in combination. Here, R ^A represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms.
Examples of the linking group having a chain structure include ethylene and propylene. A structure in which these alkylenes are linked via an ester bond can also be exemplified as a preferable example.

  In general formula (I-1), n represents an integer of 1 to 5, and is preferably 1 from the viewpoint of printing durability when applied to the photosensitive layer of a lithographic printing plate precursor.

  Furthermore, among the compounds represented by the general formula (I-1), a compound represented by the following general formula (Ia) or a compound represented by the general formula (Ib) is more preferable.

In the general formula ^(I-a), L 1, ^{L 2} and n1 have the same meanings as ^L 1, ^{L 2} and n in the general formula (I-1). R ¹³ represents an alkylene group. R ¹⁴ represents a linear or cyclic alkyl group. Y represents an oxygen atom, a nitrogen atom or a sulfur atom. A ¹¹ represents a linear linking group which may have a substituent.

In the general formula ^{(I-b), L 1} , L 2 and n1 have the same meanings as ^L 1, ^{L 2,} and n in the general formula (I-1). R ¹³ represents an alkylene group. Y represents an oxygen atom, a nitrogen atom or a sulfur atom. A ¹¹ represents a linear linking group which may have a substituent.

In the general formula (Ia) or the general formula (Ib), the number of atoms constituting the main skeleton of the linear linking group represented by A ¹¹ is preferably 1 to 20, and preferably 2 to 10 More preferred is 3-7.
In the formula (I-a) or general formula ^(I-b), the alkylene group represented by ^{R 13,} preferably an alkylene group having 1 to 20 carbon atoms, an alkylene group having 1 to 10 carbon atoms More preferred is an alkylene group having 1 to 5 carbon atoms. The alkylene group may have a substituent, and examples of the substituent that can be introduced include an alkyl group and an ethylene oxide group. The alkylene group is more preferably an embodiment having no substituent.

In general formula (Ia), the alkyl group represented by R ¹⁴ is preferably an alkyl group having 1 to 50 carbon atoms, more preferably an alkyl group having 1 to 20 carbon atoms, It is further more preferable that it is a C1-C15 alkyl group. Specific examples of the alkyl group include a methyl group and an ethyl group. The alkyl group may further have a substituent, and examples of the substituent that can be introduced include a halogen atom and an alkyl group.

  Although the preferable specific example of a compound represented by general formula (I-1) below is shown, this invention is not limited to these.

One type of the side chain structure represented by the general formula (I) derived from the compound represented by the general formula (I-1) may be included in the specific polyurethane resin, or two or more types. It may be included.
In the specific polyurethane resin, the total content of the repeating units derived from the compound represented by the general formula (I-1) is appropriately determined depending on the structure, the design of the photosensitive layer to which the polymerizable composition is applied, and the like. However, it is preferably contained in the range of 1 to 50 mol%, more preferably 10 to 50 mol%, and still more preferably 15 to 50 mol%, based on the total molar amount of the polymer component.

  Next, the compound represented by the general formula (II-1) useful for the synthesis of the specific polyurethane resin of the present invention will be described. The compound is characterized by having a functional group (hereinafter referred to as “specific functional group” as appropriate) that can be hydrolyzed by an aqueous alkali solution (particularly, an alkaline developer having a pH of 10 or more) to become an acid group.

In General Formula (II-1), X ² represents a trivalent or higher valent atom. As a trivalent or more atom, a nitrogen atom, a carbon atom, a silicon atom, etc. are mentioned, for example. Among these, a nitrogen atom and a carbon atom are preferable. Here, the atom represented by X ² is trivalent or more means that at least X ² has three bonds to which the substituent P is bonded via L ⁴ , L ⁵ , and L ^6. X ² may further have a hydrogen atom or a substituent.
Examples of the substituent that can be introduced into X ² include a substituent that includes an atom selected from the group consisting of a hydrogen atom, an oxygen atom, a sulfur atom, and a halogen atom. 1-50 hydrocarbon groups are preferred.
L ⁴ and L ⁵ each independently represent a single bond or an alkylene group which may have a substituent, but both L ⁴ and L ⁵ do not become a single bond. L ⁶ represents a single bond or a linking group. Here, when L ⁶ is a linking group, the number of atoms constituting the main skeleton of the linking group is 6 or less.
Examples of the linking group represented by L ⁶ include a linking group including two or more atoms selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom, and a sulfur atom. More specifically, the total number of atoms constituting the main skeleton of the linking group represented by L ⁶ is preferably 2 to 6, more preferably 3 to 6, and 4 to 6. Is more preferable. Here, the “main skeleton of the linking group” refers to an atom or an atomic group used only for linking X ² and P in the general formula (II-1), and a method for calculating the number of atoms of the main skeleton Is the same as that described in L ³ above.

P represents a functional group that can become an acid group by alkaline hydrolysis.
The pKa of the acid group generated from P after hydrolysis is preferably 10 or less, and examples thereof include a carboxy group, a sulfo group, a phosphate group, and a phenolic hydroxyl group. Especially, it is more preferable that pKa is 3-10, and what produces | generates an acid group like -COOH from such a viewpoint is preferable, for example.
The specific functional group P is not particularly limited as long as it is a functional group that is hydrolyzed with an aqueous alkali solution to generate an acid group. For example, the specific functional group P is obtained by reacting a protective group with the exemplified acid group. The functional group which becomes. Here, as the protecting group constituting P, for example, a protecting group described in “Protective Groups in Organic Synthesis” (Theodora W Greene et al.) (1999) can be used.

L ⁶ may be a trivalent or higher valent linking group, and in this case, the compound represented by the general formula (II-1) is represented by the following general formula (II-a). N2 represents an integer selected from 1 to 5.

  Further, the specific functional group according to the present invention is more preferably a functional group (—COR) possessed by a compound represented by the following general formula (III).

In the general formula (III), ^{X 3} has the same meaning as ^{X 2} in the general formula (II-1), preferred embodiments are also the same as. L ⁷ and L ⁸ are synonymous with L ⁴ and L ^{5 in} formula (II-1), and preferred embodiments are also the same. L ⁹ has the same meaning as L ^{6 in} formula (II-1), and preferred embodiments are also the same. n3 has the same meaning as n2 in formula (II-1).

R ^{is, -NR 41 R 42, -SR 43} , it represents a ^{-OR 44.} Here, R ^{41 to} R ⁴⁴ each independently represents a substitution comprising at least one atom selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom, a sulfur atom, and a halogen atom. Represents an alkyl group that may have a substituent, an aryl group that may have a substituent, and the like.
R can be arbitrarily set to adjust the hydrolysis rate, but is preferably -OR ⁴⁴ .

Examples of the alkyl group when R ^{41 to} R ⁴⁴ represent an alkyl group include linear, branched, or cyclic alkyl groups having 1 to 20 carbon atoms. Specific examples thereof include: Methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, hexadecyl, octadecyl, eicosyl, isopropyl , Isobutyl group, s-butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group, 2-norbornyl group I can give you. Of these, linear alkyl groups having 1 to 12 carbon atoms, branched alkyl groups having 3 to 12 carbon atoms, and cyclic alkyl groups having 5 to 10 carbon atoms are more preferable.

  Moreover, as a substituent which can be introduce | transduced into such an alkyl group, the monovalent | monohydric nonmetallic atomic group except a hydrogen atom can be mentioned. Examples of the monovalent nonmetallic atomic group include a halogen atom (—F, —Br, —Cl, —I), an alkoxy group, an aryloxy group, a mercapto group, an alkylthio group, an arylthio group, an alkyldithio group, an aryldithio group, Amino group, N-alkylamino group, N, N-dialkylamino group, N-arylamino group, N, N-diarylamino group, N-alkyl-N-arylamino group, acyloxy group, carbamoyloxy group, N- Alkylcarbamoyloxy group, N-arylcarbamoyloxy group, N, N-dialkylcarbamoyloxy group, N, N-diarylcarbamoyloxy group, N-alkyl-N-arylcarbamoyloxy group, alkylsulfoxy group, arylsulfoxy group , Acylthio group, acylamino group, N-alkylacylamino group N-arylacylamino group, ureido group, N′-alkylureido group, N ′, N′-dialkylureido group, N′-arylureido group, N ′, N′-diarylureido group, N′-alkyl-N '-Arylureido group, N-alkylureido group, N-arylureido group, N'-alkyl-N-alkylureido group, N'-alkyl-N-arylureido group, N', N'-dialkyl-N- Alkylureido group, N ′, N′-dialkyl-N-arylureido group, N′-aryl-N-alkylureido group, N′-aryl-N-arylureido group, N ′, N′-diaryl-N— Alkylureido group, N ′, N′-diaryl-N-arylureido group, N′-alkyl-N′-aryl-N-alkylureido group, N′— Rualkyl-N′-aryl-N-arylureido group, alkoxycarbonylamino group, aryloxycarbonylamino group, N-alkyl-N-alkoxycarbonylamino group, N-alkyl-N-aryloxycarbonylamino group, N-aryl -N-alkoxycarbonylamino group, N-aryl-N-aryloxycarbonylamino group, formyl group, acyl group,

Alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N, N-diarylcarbamoyl group, N-alkyl-N-arylcarbamoyl group, Alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, alkoxysulfonyl group, aryloxysulfonyl group, sulfinamoyl group, N-alkylsulfinamoyl group, N, N-dialkylsulfinamoyl group, N-aryls Rufinamoyl group, N, N-diarylsulfinamoyl group, N-alkyl-N-arylsulfinamoyl group, sulfamoyl group,
N-alkylsulfamoyl group, N, N-dialkylsulfamoyl group, N-arylsulfamoyl group, N, N-diarylsulfamoyl group, N-alkyl-N-arylsulfamoyl group, N- Acylsulfamoyl group and its conjugate base group, N-alkylsulfonylsulfamoyl group (—SO ₂ NHSO ₂ (alkyl)) and its conjugate base group, N-arylsulfonylsulfamoyl group (—SO ₂ NHSO ₂ ( aryl)) and its conjugate base group, N-alkylsulfonylcarbamoyl group (—CONHSO ₂ (alkyl)) and its conjugate base group, N-arylsulfonylcarbamoyl group (—CONHSO ₂ (aryl)) and its conjugate base group, etc. Can be mentioned.

When R ^{41 to} R ⁴⁴ represent an aryl group, the aryl group includes a benzene ring, a ring in which 2 to 3 benzene rings form a condensed ring, and a ring in which a benzene ring and a 5-membered unsaturated ring form a condensed ring Specific examples include a phenyl group, a naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenabutenyl group, a fluorenyl group, and the like. Among these, a phenyl group and a naphthyl group are exemplified. More preferred.
Examples of the substituent that can be introduced into the aryl group include the alkyl group and the substituent that can be introduced into the alkyl group.

Among such R, preferred examples of the substituted amino group represented by —NR ⁴¹ R ⁴² include acylamino group, N-alkylacylamino group, N-arylacylamino group, ureido group, N′— Alkylureido group, N ′, N′-dialkylureido group, N′-arylureido group, N ′, N′-diarylureido group, N′-alkyl-N′-arylureido group, N-alkylureido group, N -Arylureido group, N'-alkyl-N-alkylureido group, N'-alkyl-N-arylureido group, N ', N'-dialkyl-N-alkylureido group, N', N'-dialkyl-N -Arylureido group, N'-aryl-N-alkylureido group, N'-aryl-N-arylureido group, N ', N'-diaryl-N-alkylureido group, N', N '-Diaryl-N-arylureido group, N'-alkyl-N'-aryl-N-alkylureido group, N'-alkyl-N'-aryl-N-arylureido group, alkoxycarbonylamino group, aryloxycarbonyl Amino group, N-alkyl-N-alkoxycarbonylamino group, N-alkyl-N-aryloxycarbonylamino group, N-aryl-N-alkoxycarbonylamino group, N-aryl-N-aryloxycarbonylamino group It is done. Examples of the alkyl group and aryl group in these include those described above as the alkyl group, substituted alkyl group, aryl group, and substituted aryl group. Further, an acylamino group, N- alkylacylamino group, N- for R ⁸ aryl acyl acyl group in the amino group (R 8 ^CO-) also, the above-described alkyl groups, substituted alkyl group, aryl group and substituted aryl group The ones shown can be mentioned. Of these, more preferred are an N-alkylamino group, an N, N-dialkylamino group, an N-arylamino group, and an acylamino group. Specific examples of preferred substituted amino groups include methylamino group, ethylamino group, diethylamino group, morpholino group, piperidino group, pyrrolidino group, phenylamino group, benzoylamino group, acetylamino group and the like.

  Examples of a method for introducing such a specific functional group into a polymer compound include a method in which a monomer having a specific functional group in the molecule is copolymerized using a known polymerization method. At this time, if necessary, another monomer having no specific functional group can be copolymerized. In the present invention, in the polymer compound obtained by the copolymerization, a structural unit composed of such a monomer may be referred to as a “unit”.

  Although the preferable specific example of the compound which has a specific side chain structure represented by general formula (II-1) below is shown, this invention is not limited to these.

Only one type of unit having the specific functional group may be contained in the specific polyurethane resin, or two or more types may be contained.
Further, the specific polyurethane resin of the present invention includes only a unit having a side chain structure represented by the general formula (I) and a unit having a specific functional group represented by the side chain structure represented by the general formula (II). However, it is usually used in combination with a unit comprising other copolymerization components described later. The total content of the unit having a specific functional group in the copolymer is appropriately determined depending on the structure, the design of the photosensitive layer to which the specific polyurethane resin is applied, etc., but preferably 1 to 99 with respect to the total molar amount of the polymer component. It is contained in a range of mol%, more preferably 5 to 90 mol%, still more preferably 10 to 70 mol%.

  In the specific polyurethane resin of the present invention, the content of the specific functional group is preferably 0.05 to 10.0 mmol, more preferably 0.10 to 5.0 mmol per 1 g of the alkali-soluble polymer. Most preferably, it is 0.20 to 3.00 mmol.

-Basic skeleton of specific polyurethane resin-
The specific polyurethane resin in the present invention is represented by a reaction product of at least one diisocyanate compound represented by the following general formula (1) and at least one diol compound represented by the general formula (2). A polyurethane resin having a structural unit as a basic skeleton. The specific polyurethane resin of the present invention is represented, for example, by a compound represented by the general formula (I-1) and a general formula (II-2) as a diol compound represented by the following general formula (2). By synthesizing at least one diol compound having a specific functional group, the side chain structure represented by the general formula (I) and the general formula (II) are represented in the molecule. It can have a side chain structure.

OCN-X ⁰ -NCO (1)
^HO-Y 0 -OH (2)
In the general formulas (1) and (2), X ⁰ and Y ⁰ each independently represent a divalent organic residue.

  The specific polyurethane resin may be synthesized from, for example, only a diisocyanate compound, a compound represented by the general formula (I-1), and a compound having a specific functional group represented by the general formula (II-1). Usually synthesized in combination with a diisocyanate compound and a plurality of diol compounds including other diol compounds in addition to the diol compounds represented by general formula (I-1) and general formula (II-1). However, it is preferable from the standpoint that film physical properties such as film strength, film hardness and elasticity can be easily adjusted to a preferable state, and solvent solubility can be imparted.

  The weight average molecular weight of the specific polyurethane resin is preferably from 5,000 to 500,000, more preferably from 8000 to 300,000, and most preferably from 10,000 to 150,000, from the viewpoint of image formability and printing durability by exposure.

  In addition, the specific polyurethane resin in the present invention preferably includes a functional group having an unsaturated bond in its side chain. The functional group having such an unsaturated bond is preferably a group represented by the following general formulas (3) to (5), and most preferably has a group represented by the following general formula (3). preferable. Hereinafter, groups represented by the general formulas (3) to (5) will be described in detail.

In the general formula (3), R ^{1 to} R ³ each independently represents a monovalent organic group, and R ¹ is preferably a hydrogen atom or an alkyl group which may have a substituent. Among them, a hydrogen atom and a methyl group are preferable because of high radical reactivity. R ² and R ³ are each independently a hydrogen atom, a halogen atom, an amino group, a carboxyl group, an alkoxycarbonyl group, a sulfo group, a nitro group, a cyano group, an alkyl group which may have a substituent, or a substituted group. An aryl group that may have a group, an alkoxy group that may have a substituent, an aryloxy group that may have a substituent, an alkylamino group that may have a substituent, and a substituent An arylamino group which may have a substituent, an alkylsulfonyl group which may have a substituent, an arylsulfonyl group which may have a substituent, and the like. Among them, a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, a substituent An alkyl group which may have a substituent and an aryl group which may have a substituent are preferable because of high radical reactivity.

X in the general formula (3) represents an oxygen atom, a sulfur atom, or —N (R ¹² ) —, and R ¹² represents a hydrogen atom or a monovalent organic group. Here, examples of R ¹² include an alkyl group which may have a substituent. Among them, a hydrogen atom, a methyl group, an ethyl group, and an isopropyl group are preferable because of high radical reactivity.

  Here, examples of the substituent that can be introduced include an alkyl group, an alkenyl group, an alkynyl group, an aryl group, an alkoxy group, an aryloxy group, a halogen atom, an amino group, an alkylamino group, an arylamino group, a carboxyl group, an alkoxycarbonyl group, A sulfo group, a nitro group, a cyano group, an amide group, an alkylsulfonyl group, an arylsulfonyl group and the like can be mentioned.

In the general formula (4), R ^{4 to} R ⁸ each independently represents a monovalent organic group, and R ^{4 to} R ⁸ are preferably a hydrogen atom, a halogen atom, an amino group, a dialkylamino group, Carboxyl group, alkoxycarbonyl group, sulfo group, nitro group, cyano group, alkyl group which may have a substituent, aryl group which may have a substituent, alkoxy group which may have a substituent, substituted An aryloxy group which may have a group, an alkylamino group which may have a substituent, an arylamino group which may have a substituent, an alkylsulfonyl group which may have a substituent, a substituent An arylsulfonyl group that may have an alkyl group may be mentioned, among which a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, an alkyl group that may have a substituent, and an aryl group that may have a substituent are preferable. Arbitrariness.

Examples of the substituent that can be introduced are the same as those in the general formula (3). Y represents an oxygen atom, a sulfur atom, or —N (R ¹² ) —. R < ¹² > is synonymous with the case of R < ¹² > of General formula (3), and its preferable example is also the same.

In the general formula (5), R ⁹ is preferably a hydrogen atom or an alkyl group which may have a substituent, among which a hydrogen atom or a methyl group has high radical reactivity. preferable. R ¹⁰ and R ¹¹ are each independently a hydrogen atom, a halogen atom, an amino group, a dialkylamino group, a carboxyl group, an alkoxycarbonyl group, a sulfo group, a nitro group, a cyano group, or an alkyl group that may have a substituent. An aryl group which may have a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an alkylamino group which may have a substituent, a substituent An arylamino group that may have, an alkylsulfonyl group that may have a substituent, an arylsulfonyl group that may have a substituent, and the like, among them, a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, An alkyl group which may have a substituent and an aryl group which may have a substituent are preferable because of high radical reactivity.

Here, examples of the substituent that can be introduced are the same as those in the general formula (3). Further, Z is an oxygen atom, a sulfur atom, -N ^{(R 13)} -, or a phenylene group which may have a substituent. Examples of R ¹³ include an alkyl group which may have a substituent. Among them, a methyl group, an ethyl group, and an isopropyl group are preferable because of high radical reactivity.

  In order to introduce an unsaturated bond into the side chain of the specific polyurethane resin, at least one of the diisocyanate compound represented by the general formula (1) or the diol compound represented by the general formula (2) If it has at least one of the groups represented by the general formulas (3) to (5), as a reaction product of the diisocyanate compound and the diol compound, the side chain has the general formula (3) to The specific polyurethane resin into which the group represented by (5) is introduced is produced. According to this method, the specific polyurethane resin can be produced more easily than the substitution and introduction of a desired side chain after the reaction of the polyurethane resin.

As a diisocyanate compound used for introducing an unsaturated bond into a side chain of a specific polyurethane resin, for example, a triisocyanate compound is added to a monofunctional alcohol having an unsaturated group or 1 equivalent of a monofunctional amine compound. There is a product obtained.
Examples of the triisocyanate compound include those shown below, but are not limited thereto.

  Examples of the monofunctional alcohol or monofunctional amine compound having an unsaturated group include those shown below, but are not limited thereto.

  Here, as a method for introducing an unsaturated group into the side chain of the polyurethane resin, a method using a diisocyanate compound containing an unsaturated group in the side chain as a raw material for producing the polyurethane resin is suitable. Examples of the diisocyanate compound obtained by addition reaction of a triisocyanate compound and a monofunctional alcohol having an unsaturated group or 1 equivalent of a monofunctional amine compound having an unsaturated group in the side chain include, for example, Although the following are mentioned, it is not limited to this.

  As a method for introducing an unsaturated group into the side chain of the specific polyurethane resin, a method using a diol compound containing an unsaturated group in the side chain as a raw material for producing the polyurethane resin is also suitable. Such a diol compound may be a commercially available one such as glycerin monomethacrylate or trimethylolpropane monoallyl ether, a halogenated diol compound, a triol compound, an aminodiol compound, and an unsaturated group. It may be a compound that is easily produced by a reaction with a carboxylic acid, acid chloride, isocyanate, alcohol, amine, thiol, or alkyl halide compound. Specific examples of these compounds include compounds described in paragraph numbers [0064] to [0066] of JP-A No. 2002-251008.

  In the production of the specific polyurethane resin, in addition to those described above in combination with the diol compound represented by the general formula (I-1) and the diol compound represented by the general formula (II-1), there are other conventionally known ones. These diisocyanate compounds and other diol compounds can be used without limitation as long as the effects of the present invention are not impaired. Specific examples include the compounds described in “Polymer Data Handbook -Basic Edition- (Edited by Polymer Society, Bafukan, 1986)”. Such other diisosonate compounds and other diol compounds may be used alone or in combination of two or more.

  Specific examples of other diisocyanate compounds include 2,4-tolylene diisocyanate, dimer of 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, p-xylylene diisocyanate, m-xylylene diisocyanate, Aromatic diisocyanate compounds such as 4,4′-diphenylmethane diisocyanate, 1,5-naphthylene diisocyanate, 3,3′-dimethylbiphenyl-4,4′-diisocyanate; hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, lysine diisocyanate , Aliphatic diisocyanate compounds such as dimer acid diisocyanate; isophorone diisocyanate, 4,4′-methylenebis (cyclohexyl isocyanate), methylcyclohexane-2 Alicyclic diisocyanate compounds such as 4 (or 2,6) diisocyanate, 1,3- (isocyanatomethyl) cyclohexane; adducts of 1 mol of 1,3-butylene glycol and 2 mol of tolylene diisocyanate, etc. The diisocyanate compound etc. which are the reaction material of diol and diisocyanate are mentioned.

  Specific examples of other diol compounds include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, propylene glycol, dipropylene glycol, polyethylene glycol, polypropylene glycol, neopentyl glycol, 1,3-butylene glycol, 1, 6-hexanediol, 2-butene-1,4-diol, 2,2,4-trimethyl-1,3-pentanediol, 1,4-bis-β-hydroxyethoxycyclohexane, cyclohexanedimethanol, tricyclodecanedi With methanol, hydrogenated bisphenol A, hydrogenated bisphenol F, ethylene oxide adduct of bisphenol A, propylene oxide adduct of bisphenol A, ethylene oxide of bisphenol F , Propylene oxide adduct of bisphenol F, ethylene oxide adduct of hydrogenated bisphenol A, propylene oxide adduct of hydrogenated bisphenol A, hydroquinone dihydroxyethyl ether, p-xylylene glycol, dihydroxyethyl sulfone, bis (2-hydroxy Ethyl) -2,4-tolylenedicarbamate, 2,4-tolylene-bis (2-hydroxyethylcarbamide), bis (2-hydroxyethyl) -m-xylylenedicarbamate, bis (2-hydroxyethyl) isophthalate, 1,3-propanediol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, 1,7-heptanediol, 1,8-octanediol, 2-butene-1,4- Diol, cis-2-bute 1,4-diol, trans-2-butene-1,4-diol, catechol, resorcin, hydroquinone, 4-methylcatechol, 4-t-butylcatechol, 4-acetylcatechol, 3-methoxycatechol, 4- Phenylcatechol, 4-methylresorcin, 4-ethylresorcin, 4-t-butylresorcin, 4-hexylresorcin, 4-chlororesorcin, 4-benzylresorcin, 4-acetylresorcin, 4-carbomethoxyresorcin, 2-methylresorcin 5-methylresorcin, t-butylhydroquinone, 2,5-di-t-butylhydroquinone, 2,5-di-t-amylhydroquinone, tetramethylhydroquinone, tetrachlorohydroquinone, methylcarboaminohydroquinone, methylurea Hydroquinone, methylthiohydroquinone, benzonorbornene-3,6-diol, bisphenol A, bisphenol S, 3,3'-dichlorobisphenol S, 4,4'-dihydroxybenzophenone, 4,4'-dihydroxybiphenyl, 4,4'- Thiodiphenol, 2,2'-dihydroxydiphenylmethane, 3,4-bis (p-hydroxyphenyl) hexane, 1,4-bis (2- (p-hydroxyphenyl) propyl) benzene, bis (4-hydroxyphenyl) Methylamine, 1,3-dihydroxynaphthalene, 1,4-dihydroxynaphthalene, 1,5-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, 1,5-dihydroxyanthraquinone, 2-hydroxybenzyl alcohol, 4-hydroxyben Alcohol, 2-hydroxy-3,5-di-t-butylbenzyl alcohol, 4-hydroxy-3,5-di-t-butylbenzyl alcohol, 4-hydroxyphenethyl alcohol, 2-hydroxyethyl-4-hydroxybenzoate 2-hydroxyethyl-4-hydroxyphenyl acetate, resorcinol mono-2-hydroxyethyl ether, diethylene glycol, triethylene glycol, tetraethylene glycol, pentaethylene glycol, hexaethylene glycol, heptaethylene glycol, octaethylene glycol, di- 1,2-propylene glycol, tri-1,2-propylene glycol, tetra-1,2-propylene glycol, hexa-1,2-propylene glycol, di-1,3-propylene glycol Recall, tri-1,3-propylene glycol, tetra-1,3-propylene glycol, di-1,3-butylene glycol, tri-1,3-butylene glycol, hexa-1,3-butylene glycol,

  Polyethylene glycol with an average molecular weight of 1000, polyethylene glycol with an average molecular weight of 1500, polyethylene glycol with an average molecular weight of 2000, polyethylene glycol with an average molecular weight of 3000, polyethylene glycol with an average molecular weight of 7500, polypropylene glycol with an average molecular weight of 400, polypropylene glycol with an average molecular weight of 700, average Polypropylene glycol with a molecular weight of 1000, polypropylene glycol with an average molecular weight of 2000, polypropylene glycol with an average molecular weight of 3000, polypropylene glycol with an average molecular weight of 4000, PTMG650, PTMG1000, PTMG20000, PTMG3000, New Paul PE-61, New Pole, Sanyo Chemical Industries PE-62, New Pole PE-64, New Pau PE-68, New Pole PE-71, New Pole PE-74, New Pole PE-75, New Pole PE-78, New Pole PE-108, New Pole PE-128, New Pole BPE-20, New Pole BPE- 20F, New Pole BPE-20NK, New Pole BPE-20T, New Pole BPE-20G, New Pole BPE-40, New Pole BPE-60, New Pole BPE-100, New Pole BPE-180, New Pole BP-2P, New Pole BPE-23P, New Pole BPE-3P, New Pole BPE-5P, New Pole 50HB-100, New Pole 50HB-260, New Pole 50HB-400, New Pole 50HB-660, New Pole 50HB-2000, Yuporu 50HB-5100 polyether diol compounds such as include further polyester diol compounds and polycarbonate diol compounds.

  3,5-dihydroxybenzoic acid, 2,2-bis (hydroxymethyl) propionic acid, 2,2-bis (2-hydroxyarea) propionic acid, 2,2-bis (3-hydroxypropyl) propionic acid, Bis (hydroxymethyl) acetic acid, bis (4-hydroxyphenyl) acetic acid, 2,2-bis (hydroxymethyl) butyric acid, 4,4-bis (4-hydroxyphenyl) pentanoic acid, tartaric acid, N, N-dihydroxyethylglycine , N, N-bis (2-hydroxyethyl) -3-carboxy-propionamide and the like can also be used in combination with a diol compound containing a carboxyl group.

Furthermore, ethylenediamine, propylenediamine, tetramethylenediamine, pentamethylenediamine, hexamethylenediamine, heptamethylenediamine, octamethylenediamine, dodecamethylenediamine, propane-1,2-diamine, bis (3-aminopropyl) methylamine, 1 , 3-bis (3-aminopropyl) tetramethylsiloxane, piperazine, 2,5-dimethylpiperazine, N- (2-aminoethyl) piperazine, 4-amino-2,2-6,6-tetramethylpiperidine, N , N-dimethylethylenediamine, lysine, L-cystine, isophoronediamine, and the like; o-phenylenediamine, m-phenylenediamine, p-phenylenediamine, 2,4-tolylenediamine, benzidine, o- The Louisin, o-dianisidine, 4-nitro-m-phenylenediamine, 2,5-dimethoxy-p-phenylenediamine, bis- (4-aminophenyl) sulfone, 4-carboxy-o-phenylenediamine, 3-carboxy-m -Aromatic diamine compounds such as phenylenediamine, 4,4'-diaminophenyl ether, 1,8-naphthalenediamine, etc .; 2-aminoimidazole, 3-aminotriazole, 5-amino-1H-tetrazole, 4-aminopyrazole 2-aminobenzimidazole, 2-amino-5-carboxy-triazole, 2,4-diamino-6-methyl-s-triazine, 2,6-diaminopyridine, L-histidine, DL-tryptophan, adenine, etc. Heterocyclic amine compounds; ethanolamine, N-mes Ruethanolamine, N-ethylethanolamine, 1-amino-2-propanol, 1-amino-3-propanol, 2-aminoethoxyethanol, 2-aminothioethoxyethanol, 2-amino-2-methyl-1-propanol P-aminophenol, m-aminophenol, o-aminophenol, 4-methyl-2-aminophenol, 2-chloro-4-aminophenol, 4-methoxy-3-aminophenol, 4-hydroxybenzylamine, 4 -Amino-1-naphthol, 4-aminosalicylic acid, 4-hydroxy-N-phenylglycine, 2-aminobenzyl alcohol, 4-aminophenethyl alcohol, 2-carboxy-5-amino-1-naphthol, L-tyrosine, etc. Amino alcohol or aminopheno Le compounds may also be used.

  In polymer synthesis, a urethane polymer in which the unreacted terminal isocyanate group is capped with a radical polymerizable group-containing alcohol compound and the reaction is stopped is more preferable because the printing durability is further improved. Examples of the radical polymerizable group-containing alcohol compound include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-chloropropyl (meth) acrylate, and 2-hydroxy-3-allyloxypropyl. (Meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, glycerol diacrylate, glycerol acrylate methacrylate, glycerol dimethacrylate, pentaerythritol triacrylate, tris (acryloyloxyethyl) Examples include isocyanurate.

The component (A) contained in the polymerizable composition of the present invention has a specific carboxy group represented by the general formula (I) derived from the compound represented by the general formula (I-1) which is a raw material diol compound. It has both a side chain structure having and a side chain structure having a specific functional group represented by the general formula (II) derived from the compound represented by the general formula (II-1) in the molecule. It is a novel polyurethane resin having excellent solubility in an alkali developer and having no property of polymer precipitation over time, and can be suitably used in a polymerizable composition as in the present invention.
A method for synthesizing a specific polyurethane resin, which is such a novel alkali-soluble binder polymer, and its identification data will be clearly shown in the examples described later.

(A) Specific polyurethane resin in this invention may be used independently, and may be used combining plurality.
The content of the specific polyurethane resin (A) in the polymerizable composition is preferably 4.0 to 50.0 mass%, more preferably 10.0 to 30.0 mass%, in terms of solid content. preferable.

In the polymerizable composition of the present invention, in addition to the specific polyurethane resin (A), one or more other alkali-soluble binder polymers may be used in combination as long as the effects of the present invention are not impaired.
The other binder polymer used in combination is used in the range of 1 to 60% by mass, preferably 1 to 40% by mass, and more preferably 1 to 20% by mass with respect to the total mass of all binder polymer components.
As other binder polymers that can be used in combination, conventionally known ones can be used without limitation. Specifically, acrylic main chain binders, urethane binders, acetal-modified polyvinyl alcohol resins (butyral resins, etc.) often used in the industry. An acrylic main chain binder, a urethane binder, etc. are preferably used.

  In the polymerizable composition of the present invention, the total content of all binder polymers, that is, in the case of the (A) specific polyurethane resin alone, when the content is combined with other binder polymers, the component (A) The total amount of the binder polymer and the combined use binder polymer can be determined as appropriate. Particularly when the polymerizable composition is used as a photosensitive layer of a lithographic printing plate precursor described later, the total amount of nonvolatile components in the polymerizable composition is used. On the other hand, it is usually 10 to 90% by mass, preferably 20 to 80% by mass, and more preferably 30 to 70% by mass.

[(B) Compound having an ethylenically unsaturated bond capable of addition polymerization]
The compound (B) having an ethylenically unsaturated bond capable of addition polymerization (addition polymerizable compound) in the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond, and is terminal ethylenically unsaturated. It is selected from compounds having at least one bond, preferably two or more bonds. Such a compound group is widely known in the industrial field, and can be used without any particular limitation in the present invention. These have chemical forms such as monomers, prepolymers, i.e. dimers, trimers and oligomers, or mixtures thereof and copolymers thereof. Examples of monomers and copolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), and esters and amides thereof. In this case, an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, or an amide of an unsaturated carboxylic acid and an aliphatic polyvalent amine compound is used. In addition, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxyl group, amino group or mercapto group with a monofunctional or polyfunctional isocyanate or epoxy, and monofunctional or polyfunctional A dehydration condensation reaction product with a functional carboxylic acid is also preferably used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an epoxy group or an epoxy group with a monofunctional or polyfunctional alcohol, amine or thiol, a halogen group or Also suitable are substitution reaction products of unsaturated carboxylic acid esters or amides having a leaving substituent such as a tosyloxy group with monofunctional or polyfunctional alcohols, amines or thiols. As another example, it is also possible to use a group of compounds substituted with unsaturated phosphonic acid, styrene, vinyl ether or the like instead of the unsaturated carboxylic acid.

  Specific examples of the monomer of an ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol. Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate , Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate , Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer.

  Methacrylic acid esters include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, 1,3-butanediol dimethacrylate, Hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy- 2-hydroxypro ) Phenyl] dimethyl methane, bis - [p- (methacryloxyethoxy) phenyl] dimethyl methane.

  Itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate And sorbitol tetritaconate.

  Examples of crotonic acid esters include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, and sorbitol tetradicrotonate.

  Examples of isocrotonic acid esters include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate.

  Examples of maleic acid esters include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, and sorbitol tetramaleate.

  Examples of other esters include aliphatic alcohol esters described in JP-B-46-27926, JP-B-51-47334, JP-A-57-196231, and JP-A-59-5240. Those having an aromatic skeleton described in JP-A-59-5241, JP-A-2-226149, and those containing an amino group described in JP-A-1-165613 are also preferably used. Furthermore, the ester monomers described above can also be used as a mixture.

  Specific examples of amide monomers of aliphatic polyvalent amine compounds and unsaturated carboxylic acids include methylene bis-acrylamide, methylene bis-methacrylamide, 1,6-hexamethylene bis-acrylamide, 1,6-hexamethylene bis. -Methacrylamide, diethylenetriamine trisacrylamide, xylylene bisacrylamide, xylylene bismethacrylamide and the like.

  Examples of other preferable amide monomers include those having a cyclohexylene structure described in JP-B No. 54-21726.

  In addition, urethane-based addition polymerizable compounds produced by using an addition reaction of isocyanate and hydroxyl group are also suitable, and specific examples thereof include, for example, one molecule described in JP-B-48-41708. A vinyl urethane containing two or more polymerizable vinyl groups in one molecule obtained by adding a vinyl monomer containing a hydroxyl group represented by the following general formula (i) to a polyisocyanate compound having two or more isocyanate groups. Compounds and the like.

^{_{CH 2 = C (R 4)}} COOCH 2 CH (R 5) OH (i)
(In the general formula (i), R ⁴ and R ⁵ represent H or CH _3. )

  Also, urethane acrylates such as those described in JP-A-51-37193, JP-B-2-32293, JP-B-2-16765, JP-B-58-49860, JP-B-56- Urethane compounds having an ethylene oxide skeleton described in Japanese Patent No. 17654, Japanese Patent Publication No. 62-39417, and Japanese Patent Publication No. 62-39418 are also suitable.

  Furthermore, addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238 are used. Depending on the case, it is possible to obtain a photopolymerizable composition excellent in the photosensitive speed.

  Other examples include polyester acrylates, epoxy resins and (meth) acrylic acid as described in JP-A-48-64183, JP-B-49-43191, JP-B-52-30490, and JP-A-52-30490. Mention may be made of polyfunctional acrylates and methacrylates such as reacted epoxy acrylates. Further, specific unsaturated compounds described in JP-B-46-43946, JP-B-1-40337, JP-B-1-40336, and vinylphosphonic acid compounds described in JP-A-2-25493 are also included. be able to. In some cases, a structure containing a perfluoroalkyl group described in JP-A-61-22048 is preferably used. Furthermore, Journal of Japan Adhesion Association vol. 20, no. 7, pages 300 to 308 (1984), which are introduced as photocurable monomers and oligomers, can also be used.

  About these addition polymeric compounds, the details of usage methods, such as the structure, single use, combined use, and addition amount, can be arbitrarily set according to the performance design of final polymerizable composition. For example, when the polymerizable composition of the present invention is used as a recording layer (photosensitive layer) of a negative lithographic printing plate precursor, it is selected from the following viewpoints. From the viewpoint of photosensitive speed, a structure having a high unsaturated group content per molecule is preferable, and in many cases, a bifunctional or higher functionality is preferable. Further, in order to increase the strength of the image portion, that is, the cured film, those having three or more functionalities are preferable, and furthermore, different functional numbers and different polymerizable groups (for example, acrylic acid ester, methacrylic acid ester, styrene compound, vinyl ether type). A method of adjusting both photosensitivity and intensity by using a compound) is also effective. A compound having a large molecular weight or a compound having high hydrophobicity is excellent in photosensitive speed and film strength, but is not preferable in terms of development speed and precipitation in a developer. Also, for compatibility with other components in the photosensitive layer (for example, binder polymer such as component (A), light or thermal polymerization initiator (C) component, colorant, etc.), dispersibility, The selection and use method of the addition polymerization compound is an important factor. For example, the compatibility may be improved by using a low-purity compound or using two or more kinds in combination.

(B) The addition polymerizable compound may be used alone or in combination of two or more.
The content of the (B) addition polymerizable compound in the polymerizable composition of the present invention is preferably 5 to 80% by mass, more preferably 25 to 75% by mass with respect to the nonvolatile component. .

  As described in detail below, the polymerizable composition of the present invention can be suitably used for the recording layer (photosensitive layer) of a lithographic printing plate precursor, but when applied to such applications, such a lithographic printing plate An addition polymerizable compound (B) having a specific structure may be selected for the purpose of improving the adhesion of the support of the original plate or the overcoat layer. Regarding the compounding ratio of the addition polymerizable compound in the photosensitive layer, a larger amount is more advantageous in terms of sensitivity. However, when the amount is too large, an undesired phase separation of the composition or a production process due to the adhesiveness of the photosensitive layer occurs. (For example, transfer of photosensitive layer components, manufacturing defects due to adhesion), precipitation from the developer, and the like may occur.

From these viewpoints, when the polymerizable composition of the present invention is used as a photosensitive layer of a lithographic printing plate precursor, the (B) addition polymerizable compound contained therein is 5 to 5% of the non-volatile components in the photosensitive layer. The content is preferably 80% by mass, and more preferably in the range of 25 to 75% by mass.
In addition, the use method of the addition polymerizable compound can be arbitrarily selected from the viewpoint of polymerization inhibition with respect to oxygen, resolution, fogging, refractive index change, surface adhesiveness, etc. Depending on the case, the photosensitive layer itself may not be contained, but a layer constitution / coating method such as undercoating or overcoating, that is, an embodiment in which it is contained in a layer adjacent to the photosensitive layer may be carried out.

[(C) photo or thermal polymerization initiator]
The polymerizable composition of the present invention contains a polymerization initiator capable of generating an initiating species that causes and accelerates the curing reaction of the (B) addition polymerizable compound by applying energy by exposure, heating, or both. .
(Photopolymerization initiator)
As the photopolymerization initiator in the present invention, various photopolymerization initiators known in patents, literatures, etc., or a combination system of two or more photopolymerization initiators (photopolymerization initiation system) depending on the wavelength of the light source used. Can be appropriately selected and used.

  In the case of using a blue semiconductor laser, Ar laser, second harmonic of an infrared semiconductor laser, or SHG-YAG laser as a light source, various photopolymerization initiators (systems) have been proposed. Certain photoreducible dyes described in the specification of 850,445, such as rose bengal, eosin, erythrosine, etc., or a combination of a dye and an initiator, such as a complex initiator system of a dye and an amine (Japanese Patent Publication No. 44) -20099), a combination system of hexaarylbiimidazole, a radical generator and a dye (Japanese Patent Publication No. 45-37377), a system of hexaarylbiimidazole and p-dialkylaminobenzylidene ketone (Japanese Patent Publication No. 47-2528). JP, 54-155292, cyclic cis-α-dicarbonyl compound and dye system (JP 48) 84183), a system of cyclic triazine and a merocyanine dye (Japanese Patent Laid-Open No. 54-151024), a system of 3-ketocoumarin and an activator (Japanese Patent Laid-Open No. 52-112682, Japanese Patent Laid-Open No. 58-15503). , Biimidazole, styrene derivative, thiol system (JP 59-140203 A), organic peroxide and dye system (JP 59-1504 A, JP 59-140203 JP, JP JP-A 59-189340, JP-A 62-174203, JP-B 62-1641, US Pat. No. 4,766,055), a system of dye and active halogen compound (JP-A 63-1718105, JP-A-63-258903, JP-A-3-264771, etc.), a system of a dye and a borate compound (JP-A-62-143044) JP-A-62-15242, JP-A-64-13140, JP-A-64-13141, JP-A-64-13142, JP-A-64-13143, JP-A-64-64. No. 13144, JP-A 64-17048, JP-A 1-222903, JP-A 1-298348, JP-A 1-138204, etc.), a dye having a rhodanine ring and a radical generator System (JP-A-2-179433, JP-A-2-244050), titanocene and 3-ketocoumarin dye system (JP-A 63-221110), titanocene and xanthene dye, further containing amino group or urethane group Combinations of ethylenically unsaturated compounds capable of addition polymerization (JP-A-4-221958, JP-A-4-219756) , Titanocene and systems (JP-A-6-295061) a specific merocyanine dye, a dye system with titanocene and benzopyran ring (JP-A-8-334897 JP), and the like.

  In the present invention, a particularly preferred photopolymerization initiator (system) contains at least one titanocene. The titanocene compound used as a photopolymerizable initiator (system) in the present invention may be any titanocene compound that can generate an active radical when irradiated with light in the presence of other sensitizing dyes. For example, JP 59-152396 A, JP 61-151197 A, JP 63-41483 A, JP 63-41484 A, JP 2-249 A, and JP 2 -291, JP-A-3-27393, JP-A-3-12403, and JP-A-6-41170 can be appropriately selected and used.

  More specifically, di-cyclopentadienyl-Ti-di-chloride, di-cyclopentadienyl-Ti-bis-phenyl, di-cyclopentadienyl-Ti-bis-2,3,4,5 , 6-pentafluorophen-1-yl (hereinafter also referred to as “T-1”), di-cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di- -Cyclopentadienyl-Ti-bis-2,4,6-trifluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, di-cyclo Pentadienyl-Ti-bis-2,4-difluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,4,5,6-pentafluorophen-1-yl Di-methylcyclopentadie Ru-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,4-difluorophen-1-yl, bis (cyclo And pentadienyl) -bis (2,6-difluoro-3- (pyr-1-yl) phenyl) titanium (hereinafter also referred to as “T-2”).

  These titanocene compounds can be further subjected to various chemical modifications for improving the characteristics of the photosensitive layer. For example, bonding with sensitizing dyes, addition polymerizable unsaturated compounds and other radical generating parts, introduction of hydrophilic sites, compatibility improvement, introduction of substituents to suppress crystal precipitation, introduction of substituents to improve adhesion A method such as polymerization can be used.

  The use method of these titanocene compounds can be arbitrarily set as appropriate depending on the performance design of the polymerizable composition and the later-described lithographic printing plate precursor to which the polymerizable composition is applied, like the above-described addition polymerizable compound. For example, when applied to the photosensitive layer of a lithographic printing plate precursor, compatibility with the photosensitive layer can be enhanced by using two or more types in combination. A larger amount of the photopolymerization initiator such as the titanocene compound is usually advantageous in terms of photosensitivity, and the content in the polymerizable composition is the same when used in the photosensitive layer of a lithographic printing plate precursor. Sufficient photosensitivity is obtained by using it in the range of 0.5 to 80 parts by mass, preferably 1 to 50 parts by mass with respect to 100 parts by mass of the nonvolatile component. On the other hand, for use in white lighting such as yellow, it is preferable that the amount of titanocene used is small in terms of fogging by light near 500 nm, but the amount of titanocene used is 6 in combination with other sensitizing dyes. Sufficient photosensitivity can be obtained even if it is lowered to not more than parts by mass, further not more than 1.9 parts by mass, and further not more than 1.4 parts by mass.

(Thermal polymerization initiator)
As the thermal polymerization initiator used in the present invention for initiating and advancing the curing reaction of the addition polymerizable compound, a thermal decomposition type radical generator that decomposes by heat to generate radicals is useful. Such a radical generator is used in combination with the above-described infrared absorber, and when the infrared laser is irradiated, the infrared absorber generates heat and generates radicals by the heat. Recording is possible by combining these. It becomes.
Examples of the radical generator include onium salts, triazine compounds having a trihalomethyl group, peroxides, azo polymerization initiators, azide compounds, quinonediazides, oxime ester compounds, triaryl monoalkylborate compounds, etc. Or an oxime ester compound has high sensitivity and is preferable. Below, the onium salt which can be used suitably as a polymerization initiator in this invention is demonstrated. Preferred onium salts include iodonium salts, diazonium salts, and sulfonium salts. In the present invention, these onium salts function not as acid generators but as radical polymerization initiators. The onium salt suitably used in the present invention is an onium salt represented by the following general formulas (A) to (C).

In general formula (A), Ar ¹¹ and Ar ¹² each independently represents an aryl group having 20 or less carbon atoms which may have 1 to 6 substituents, and preferred substituents are alkyl having 1 to 12 carbon atoms. Group, an alkenyl group having 1 to 12 carbon atoms, an alkynyl group having 1 to 12 carbon atoms, an aryl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aryloxy group having 1 to 12 carbon atoms, a halogen atom, C1-C12 alkylamino group, C1-C12 dialkylamino group, C1-C12 alkylamide group or arylamide group, carbonyl group, carboxyl group, cyano group, sulfonyl group, C1-C1 Examples include 12 thioalkyl groups and thioaryl groups having 1 to 12 carbon atoms.
(Z ¹¹ ) ⁻ represents a monovalent anion, which is a halogen ion, perchlorate ion, hexafluorophosphate ion, tetrafluoroborate ion, sulfonate ion, sulfinate ion, thiosulfonate ion, sulfate ion, and is stable. From the viewpoints of properties and reactivity, perchlorate ions, hexafluorophosphate ions, tetrafluoroborate ions, sulfonate ions, sulfinate ions, and carboxylate ions are preferred.

In the general formula (B), Ar ²¹ represents an aryl group having 20 or less carbon atoms which may have 1 to 6 substituents, and preferred substituents include an alkyl group having 1 to 12 carbon atoms and 1 to 1 carbon atoms. 12 alkenyl groups, C 1-12 alkynyl groups, C 1-12 aryl groups, C 1-12 alkoxy groups, C 1-12 aryloxy groups, halogen atoms, C 1-12 carbon atoms Alkylamino group, C1-C12 dialkylamino group, C1-C12 alkylamide group or arylamide group, carbonyl group, carboxyl group, cyano group, sulfonyl group, C1-C12 thioalkyl group, carbon The thioaryl group of number 1-12 is mentioned.
(Z ²¹ ) ⁻ represents a monovalent anion, which is a halogen ion, perchlorate ion, hexafluorophosphate ion, tetrafluoroborate ion, sulfonate ion, sulfinate ion, thiosulfonate ion, sulfate ion, and is stable. From the viewpoint of properties, perchlorate ions, hexafluorophosphate ions, tetrafluoroborate ions, sulfonate ions, and sulfinate ions are preferable.

In the general formula (C), R ³¹ , R ³² , and R ³³ each independently represent an aryl group having 20 or less carbon atoms, an alkyl group, an alkenyl group, or an alkynyl group that may have 1 to 6 substituents. From the viewpoint of reactivity and stability, an aryl group is preferable. Preferred substituents are alkyl groups having 1 to 12 carbon atoms, alkenyl groups having 1 to 12 carbon atoms, alkynyl groups having 1 to 12 carbon atoms, aryl groups having 1 to 12 carbon atoms, alkoxy groups having 1 to 12 carbon atoms, Aryloxy group having 1 to 12 carbon atoms, halogen atom, alkylamino group having 1 to 12 carbon atoms, dialkylamino group having 1 to 12 carbon atoms, alkylamide group or arylamide group having 1 to 12 carbon atoms, carbonyl group, carboxyl Group, a cyano group, a sulfonyl group, a thioalkyl group having 1 to 12 carbon atoms, and a thioaryl group having 1 to 12 carbon atoms.
(Z ³¹ ) ⁻ represents a monovalent anion, which is a halogen ion, perchlorate ion, hexafluorophosphate ion, tetrafluoroborate ion, sulfonate ion, sulfinate ion, thiosulfonate ion, sulfate ion, and is stable. From the viewpoints of reactivity and reactivity, perchlorate ions, hexafluorophosphate ions, tetrafluoroborate ions, sulfonate ions, sulfinate ions, and carboxylate ions are preferable, and particularly, carboxylate ions of Japanese Patent Application No. 2000-160323 are more preferable. Are preferably the carboxylate ions of Japanese Patent Application Nos. 2001-177150 and 2000-266797.

  In the present invention, specific examples of onium salts that can be suitably used as a polymerization initiator (radical generator) include those described in JP-A-2007-62051. In the present invention, onium salts represented by general formula (A) ([OI-1] to [OI-10]) and onium salts represented by general formula (B) ([ON] which can be suitably used in the present invention are shown below. -1] to [ON-5]), and specific examples of the onium salts ([OS-1] to [OS-7]) represented by the general formula (C), are not limited thereto. .

  The polymerization initiator (C) used in the present invention preferably has a maximum absorption wavelength of 400 nm or less, and more preferably 360 nm or less. By making the absorption wavelength in the ultraviolet region in this way, the lithographic printing plate precursor can be handled under white light.

  Other preferable polymerization initiators include specific aromatic sulfonium salts described in Japanese Patent Application Nos. 2000-266797, 2001-177150, 2000-160323, and 2000-184603. Is mentioned.

  Examples of the (C) polymerization initiator other than the onium salt compound preferably include triazine compounds and borate compounds as shown below.

  In addition, an oxime ester compound is mentioned as a compound which can be used suitably as a polymerization initiator in this invention. This oxime ester compound will be described. Preferable oxime ester compounds include compounds represented by the following general formula (D).

In general formula (D), X represents a carbonyl group, a sulfone group, or a sulfoxide group, and Y represents a cyclic or chain alkyl group having 1 to 12 carbon atoms, an alkenyl group, an alkynyl group, or 6 to 18 carbon atoms. Represents an aryl group or a heterocyclic group.
Examples of the aryl group in the general formula (D) include aromatic hydrocarbon compounds such as a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene group, a pyrene group, and a triphenylene group. The heterocyclic group refers to an aromatic compound having at least one nitrogen atom, sulfur atom, or oxygen atom in the ring structure, for example, a pyrrole group, a furan group, a thiophene group, a selenophenone group, a pyrazole group, an imidazole group. , Triazole group, tetrazole group, oxazole group, thiazole group, indole group, benzofuran group, benzimidazole group, benzoxazole group, benzothiazole group, pyridine group, pyrimidine group, pyrazine group, triazine group, quinoline group, carbazole group, acridine Group, phenoxazine, phenothiazine and the like.
These substituents represented by Y are halogen atoms, hydroxyl groups, nitrile groups, nitro groups, carboxyl groups, aldehyde groups, alkyl groups, thiol groups, aryl groups or alkenyl groups, alkynyl groups, ether groups, ester groups, ureas. Group, amino group, amide group, sulfide group, disulfide group, sulfoxide group, sulfo group, sulfone group, hydrazine group, carbonyl group, imino group, halogen atom, hydroxyl group, nitrile group, nitro group, carboxyl group, carbonyl group, urethane It can be substituted by a compound containing a group, an alkyl group, a thiol group, an aryl group, a phosphoroso group, a phospho group, or a carbonyl ether group.

  Z in the general formula (D) is synonymous with Y or a nitrile group, a halogen atom, a hydrogen atom or an amino group, and these Z compounds are a halogen atom, a hydroxyl group, a nitrile group, a nitro group, a carboxyl group, an aldehyde group. , Alkyl group, thiol group, aryl group or alkenyl group, alkynyl group, ether group, ester group, urea group, amino group, amide group, sulfide group, disulfide group, sulfoxide group, sulfo group, sulfone group, hydrazine group, carbonyl Substitutable with compounds containing groups, imino groups, halogen atoms, hydroxyl groups, nitrile groups, nitro groups, carboxyl groups, carbonyl groups, urethane groups, alkyl groups, thiol groups, aryl groups, phosphoroso groups, phospho groups, carbonyl ether groups It is.

  W in the general formula (D) represents a divalent organic group, and represents a methylene group, a carbonyl group, a sulfoxide group, a sulfone group, or an imino group. The methylene group and the imino group are an alkyl group, an aryl group, an ester group, and a nitrile. It can be substituted by a compound containing a group, a carbonyl ether group, a sulfo group, a sulfo ether group, an ether group or the like. n represents an integer of 0 or 1.

V in the general formula (D) is a C1-C12 cyclic or chain alkyl group, alkenyl group, alkynyl group, C6-C18 aryl group, alkoxy group or aryloxy group. Aromatic hydrocarbon compounds such as benzene ring, naphthalene ring, anthracene ring, phenanthrene group, pyrene group, triphenylene group, pyrrole group, furan group, thiophene group, selenophene group, pyrazole group, imidazole group, triazole group, tetrazole group, oxazole Group, thiazole group, indole group, benzofuran group, benzimidazole group, benzoxazole group, benzothiazole group, pyridine group, pyrimidine group, pyrazine group, triazine group, quinoline group, carbazole group, acridine group, phenoxazine, phenothiazine, etc. Heteroatom containing Aromatic compounds and the like. These V compounds are halogen atoms, hydroxyl groups, nitrile groups, nitro groups, carboxyl groups, aldehyde groups, alkyl groups, thiol groups, aryl groups or alkenyl groups, alkynyl groups, ether groups, ester groups, urea groups, amino groups, amides. Group, sulfide group, disulfide group, sulfoxide group, sulfo group, sulfone group, hydrazine group, carbonyl group, imino group, halogen atom, hydroxyl group, nitrile group, nitro group, carboxyl group, carbonyl group, urethane group, alkyl group, thiol It can be substituted by a compound containing a group, an aryl group, a phosphoroso group, a phospho group, or a carbonyl ether group.
V and Z may be bonded to each other to form a ring.

As the oxime ester compound represented by the general formula (D), from the viewpoint of sensitivity, X is carbonyl, Y is an aryl group or benzoyl group, Z group is an alkyl group or aryl group, W is a carbonyl group, V Is preferably an aryl group. More preferably, the aryl group of V has a thioether substituent.
Note that the structure of the N—O bond in the general formula (D) may be E-form or Z-form.

  Other oxime ester compounds that can be suitably used in the present invention include Progress in Organic Coatings, 13 (1985) 123-150; C. S Perkin II (1979) 1653-1660; Journal of Photopolymer Science and Technology (1995) 205-232; C. S Perkin II (1979) 156-162; JP-A 2000-66385; JP-A 2000-80068.

  Although the specific example of the oxime ester compound which can be used suitably for this invention is shown below, it is not limited to this.

These (C) polymerization initiators may be used alone or in combination of two or more.
(C) The polymerization initiator is, for example, polymerizable from the viewpoint of sensitivity when the polymerizable composition of the present invention is applied as a photosensitive layer of a negative lithographic printing plate precursor, and contamination of a non-image area generated during printing. It can be added in a proportion of 0.1 to 50% by mass, preferably 0.5 to 30% by mass, particularly preferably 1 to 20% by mass, based on the total solid content constituting the composition or photosensitive layer. In addition, when these polymerization initiators are applied to the photosensitive layer of a lithographic printing plate precursor, they may be added to the same layer as other components, or the photosensitive layer has a multilayer structure and is adjacent to other components. It may be added to the layer.

The polymerizable composition of the present invention can be applied to various uses utilizing these mechanisms. For example, an image recording layer (photosensitive layer) of a negative image recording material (for example, a lithographic printing plate precursor), a high It is also suitable as a sensitive material for optical modeling, and can be applied to hologram materials by utilizing the change in refractive index accompanying polymerization, and to the production of electronic materials such as photoresists.
Among these, the polymerizable composition of the present invention is suitable as an image recording layer of a negative lithographic printing plate precursor that can be directly drawn by scanning exposure or the like, and when applied to such applications, It is preferable from the viewpoint of sensitivity to further contain a sensitizing dye that is compatible with light used for scanning exposure.
That is, when the polymerizable composition of the present invention is applied to the photosensitive layer of a negative lithographic printing plate precursor, it is particularly suitable for plate making by direct drawing with a laser beam having a wavelength of 300 to 1,200 nm. The image recording layer preferably contains an infrared absorber as shown below as (D) sensitizing dye.

[(D) Sensitizing dye]
A sensitizing dye can be used in the polymerizable composition of the present invention. As the sensitizing dye, those having an absorption wavelength corresponding to the exposure antigen are selected, and those having an absorption peak at 350 to 1200 nm are generally preferred. Examples of such sensitizing dyes include spectral sensitizing dyes and the following dyes or pigments that absorb light from a light source and interact with a photopolymerization initiator.
Preferred spectral sensitizing dyes or dyes include polynuclear aromatics (eg, pyrene, perylene, triphelene), xanthenes (eg, fluorescein, eosin, erythrolan, rhodamine B, rose bengal), cyanines (eg, , Thiacarbocyanine, oxacarbocyanine), merocyanines (eg, merocyanine, carbomerocyanine), thiazines (eg, thioene, methylene blue, toluidine blue), acridines (eg, acridine orange, chloroflavin, acriflavine), phthalocyanene (Eg, phthalocyanine, metal phthalocyanine), porphyrins (eg, tetraphenylporphyrin, central metal-substituted porphyrin), chlorophylls (eg, chlorophyll, chlorophyllin, center) Genus substituted chlorophyll), metal complexes, anthraquinones (e.g., anthraquinone), Sutaariumu compound (such as Sutaariumu), and the like.

  Examples of more preferable spectral sensitizing dyes or dyes include styryl dyes described in JP-B-37-13034, cationic dyes described in JP-A-62-143044, and quinoxalinium described in JP-B-59-24147. Salts, new methylene blue compounds described in JP-A No. 64-33104, anthraquinones described in JP-A No. 64-56767, benzoxanthene dyes described in JP-A No. 2-1714, JP-A No. 2-226148 and Acridines described in JP-A-2-226149, pyrylium salts described in JP-A-40-28499, cyanines described in JP-B-46-42363, benzofuran dyes described in JP-A-2-63053, Conjugated ketone dyes described in Kaihei 2-85858 and JP-A-2-216154 57-10605 described in JP-dye. Azocinnamylidene derivatives described in JP-B-2-30321, cyanine dyes described in JP-A-1-287105, JP-A-62-31844, JP-A-62-31848, JP-A-62-143043 Xanthene dyes described in Japanese Patent Publication Nos. JP-A Nos. 59-28325, merocyanine dyes described in JP-B No. 61-9621, and dyes described in JP-A No. 2-179433. A merocyanine dye described in JP-A-2-244050, a merocyanine dye described in JP-B-59-28326, a merocyanine dye described in JP-A-59-89803, a merocyanine dye described in JP-A-8-129257, and Examples thereof include benzopyran dyes described in JP-A-8-334897.

(Infrared absorber)
In the present invention, in the case of performing exposure using a laser emitting an infrared ray of 760 to 1,200 nm as a light source, an infrared absorber is usually used. The infrared absorber has a function of converting absorbed infrared rays into heat. Due to the heat generated at this time, the radical generator (polymerization initiator) is thermally decomposed to generate radicals. The infrared absorber used in the present invention is a dye or pigment having an absorption maximum at a wavelength of 760 nm to 1200 nm.

As the dye, commercially available dyes and known dyes described in documents such as “Dye Handbook” (edited by the Society for Synthetic Organic Chemistry, published in 1970) can be used. Specifically, dyes such as azo dyes, metal complex azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, metal thiolate complexes, etc. Is mentioned.
Preferred dyes include, for example, cyanine dyes described in JP-A-58-125246, JP-A-59-84356, JP-A-59-202829, JP-A-60-78787, and the like. Methine dyes described in JP-A-58-173696, JP-A-58-181690, JP-A-58-194595, JP-A-58-112793, JP-A-58-224793, JP-A-59- 48187, JP-A-59-73996, JP-A-60-52940, JP-A-60-63744, etc., naphthoquinone dyes, JP-A-58-112792, etc. And cyanine dyes described in British Patent 434,875.

Also, a near infrared absorption sensitizer described in US Pat. No. 5,156,938 is preferably used, and a substituted arylbenzo (thio) pyrylium salt described in US Pat. No. 3,881,924, Trimethine thiapyrylium salts described in JP-A-57-142645 (US Pat. No. 4,327,169), JP-A-58-181051, 58-220143, 59-41363, 59-84248 Nos. 59-84249, 59-146063, 59-146061, pyranlium compounds, cyanine dyes described in JP-A-59-216146, US Pat. No. 4,283,475 The pentamethine thiopyrylium salts described above and the pyrylium compounds disclosed in Japanese Patent Publication Nos. 5-13514 and 5-19702 are also preferably used. . Moreover, as another example preferable as a dye, the near-infrared absorptive dye described as the formula (I) and (II) in US Patent 4,756,993 can be mentioned.
Other preferred examples of the infrared absorbing dye of the present invention include specific indolenine cyanine dyes described in Japanese Patent Application Nos. 2001-6326 and 2001-237840 as exemplified below.

  Particularly preferred among these dyes are cyanine dyes, squarylium dyes, pyrylium salts, nickel thiolate complexes, and indolenine cyanine dyes. Further, cyanine dyes and indolenine cyanine dyes are preferred, and particularly preferred examples include cyanine dyes represented by the following general formulas (a) to (e).

In general formula (a), X ¹ represents a hydrogen atom, a halogen atom, —NPh ₂ , —X ² -L ¹ or a group shown below. Here, X ² represents an oxygen atom, a nitrogen atom, or a sulfur atom, and L ¹ represents a hydrocarbon group having 1 to 12 carbon atoms, an aromatic ring having a hetero atom, or 1 to 1 carbon atom including a hetero atom. 12 hydrocarbon groups are shown. In addition, a hetero atom here shows N, S, O, a halogen atom, and Se. X _a ^- is Z _a which will be described below ^- has the same definition as, R ^a represents a hydrogen atom, an alkyl group, an aryl group, a substituted or unsubstituted amino group, substituted or unsubstituted amino group and a halogen atom.

R ¹ and R ² each independently represent a hydrocarbon group having 1 to 12 carbon atoms. From the storage stability of the photosensitive layer coating solution, R ¹ and R ² are preferably hydrocarbon groups having 2 or more carbon atoms, and R ¹ and R ² are bonded to each other to form a 5-membered ring or It is particularly preferable that a 6-membered ring is formed.

Ar ¹ and Ar ² may be the same or different and each represents an aromatic hydrocarbon group which may have a substituent. Preferred aromatic hydrocarbon groups include a benzene ring and a naphthalene ring. Moreover, as a preferable substituent, a C12 or less hydrocarbon group, a halogen atom, and a C12 or less alkoxy group are mentioned. Y ¹ and Y ² may be the same or different and each represents a sulfur atom or a dialkylmethylene group having 12 or less carbon atoms. R ³ and R ⁴ may be the same or different and each represents a hydrocarbon group having 20 or less carbon atoms which may have a substituent. Preferred substituents include alkoxy groups having 12 or less carbon atoms, carboxyl groups, and sulfo groups. R ⁵ , R ⁶ , R ⁷ and R ⁸ may be the same or different and each represents a hydrogen atom or a hydrocarbon group having 12 or less carbon atoms. From the availability of raw materials, a hydrogen atom is preferred. Z _a ⁻ represents a counter anion. However, when the cyanine dye represented by formula (a) has an anionic substituent in the structure thereof, Z _a is does not require charge neutralization ^- is not necessary. Preferred Z _a ⁻ is a halogen ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, and a sulfonate ion, particularly preferably a perchlorate ion, from the storage stability of the photosensitive layer coating solution. Hexafluorophosphate ions and aryl sulfonate ions.

  Specific examples of the cyanine dye represented by formula (a) that can be suitably used in the present invention include those exemplified below, and paragraph numbers [0017] to [0017] of Japanese Patent Application No. 11-310623. [0019], paragraphs [0012] to [0038] of Japanese Patent Application No. 2000-224031, and paragraphs [0012] to [0023] of Japanese Patent Application No. 2000-2111147. .

In the general formula (b), L represents a methine chain having 7 or more conjugated carbon atoms, the methine chain may have a substituent, and the substituents may be bonded to each other to form a ring structure. Good. Z _b ⁺ represents a counter cation. Preferred counter cations include ammonium, iodonium, sulfonium, phosphonium, pyridinium, alkali metal cations (Na ⁺ , K ⁺ , Li ⁺ ) and the like. R ^{9 to} R ¹⁴ and R ^{15 to} R ²⁰ are each independently a hydrogen atom or halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, carbonyl group, thio group, sulfonyl group, sulfinyl group, oxy group Or a substituent selected from amino groups, or a combination of two or three of these, and may be bonded to each other to form a ring structure. Here, in general formula (b), those in which L represents a methine chain having 7 conjugated carbon atoms, and those in which R ^{9 to} R ¹⁴ and R ^{15 to} R ²⁰ all represent hydrogen atoms are easily available. It is preferable from the viewpoint of effect.

  Specific examples of the dye represented by formula (b) that can be suitably used in the present invention include those exemplified below.

In the general formula (c), Y ³ and Y ⁴ each represent an oxygen atom, a sulfur atom, a selenium atom, or a tellurium atom. M represents a methine chain having 5 or more conjugated carbon atoms. R ^{21 to} R ²⁴ and R ^{25 to} R ²⁸ may be the same or different, and are each a hydrogen atom, a halogen atom, a cyano group, an alkyl group, an aryl group, an alkenyl group, an alkynyl group, a carbonyl group, thio Represents a group, a sulfonyl group, a sulfinyl group, an oxy group, or an amino group. Further, wherein _{Z a} ^- represents a counter anion, _{Z a} in the general formula (a) ^- is synonymous.

  In the present invention, specific examples of the dye represented by formula (c) that can be suitably used include those exemplified below.

In the general formula (d), R ²⁹ to R ³¹ each independently represent a hydrogen atom, an alkyl group, or an aryl group. R ³³ and R ³⁴ each independently represents an alkyl group, a substituted oxy group, or a halogen atom. n and m each independently represents an integer of 0 to 4. R ²⁹ and R ³⁰ , or R ³¹ and R ³² may be bonded to each other to form a ring, R ²⁹ and / or R ³⁰ is R ^33, and R ³¹ and / or R ³² is R ³⁴ taken together, may form a ring, further, when R ³³ or R ³⁴ there are a plurality, R ³³ or between R ³⁴ each other may be bonded to each other to form a ring. X ² and X ³ are each independently a hydrogen atom, an alkyl group, or an aryl group, and at least one of X ² and X ³ represents a hydrogen atom or an alkyl group. Q is a trimethine group or a pentamethine group which may have a substituent, and may form a ring structure together with a divalent organic group. Z _c ^- represents a counter anion, _{Z a} in the general formula (a) ^- synonymous.

  In the present invention, specific examples of the dye represented by the general formula (d) that can be suitably used include those exemplified below.

In general formula (e), R ^{35 to} R ⁵⁰ are each independently a hydrogen atom, halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, hydroxyl group, carbonyl group, thio group, sulfonyl group, sulfinyl. When a group, an oxy group, an amino group, or an onium salt structure is shown and a substituent can be introduced into these groups, it may have a substituent. M represents two hydrogen atoms or metal atoms, a halometal group, and an oxymetal group, and the metal atoms contained therein include IA, IIA, IIIB, IVB group atoms of the periodic table, first, second, second Three-period transition metals and lanthanoid elements can be mentioned, among which copper, magnesium, iron, zinc, cobalt, aluminum, titanium, and vanadium are preferable.

  In the present invention, specific examples of the dye represented by formula (e) that can be suitably used include those exemplified below.

  Examples of the pigment used in the present invention include commercially available pigments and color index (CI) manual, “Latest Pigment Handbook” (edited by Japan Pigment Technology Association, published in 1977), “Latest Pigment Application Technology” (CMC Publishing, 1986), “Printing Ink Technology”, CMC Publishing, 1984) can be used.

Examples of the pigment include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, metal powder pigments, and other polymer-bonded dyes. Specifically, insoluble azo pigments, azo lake pigments, condensed azo pigments, chelate azo pigments, phthalocyanine pigments, anthraquinone pigments, perylene and perinone pigments, thioindigo pigments, quinacridone pigments, dioxazine pigments, isoindolinone pigments In addition, quinophthalone pigments, dyed lake pigments, azine pigments, nitroso pigments, nitro pigments, natural pigments, fluorescent pigments, inorganic pigments, carbon black, and the like can be used. Among these pigments, carbon black is preferable.

  These pigments may be used without surface treatment, or may be used after surface treatment. The surface treatment method includes a method of surface coating with a resin or wax, a method of attaching a surfactant, a method of bonding a reactive substance (eg, silane coupling agent, epoxy compound, polyisocyanate, etc.) to the pigment surface, etc. Can be considered. The above-mentioned surface treatment methods are described in “Characteristics and Applications of Metal Soap” (Shobobo), “Printing Ink Technology” (CMC Publishing, 1984) and “Latest Pigment Application Technology” (CMC Publishing, 1986). Yes.

  The particle diameter of the pigment is preferably in the range of 0.01 μm to 10 μm, more preferably in the range of 0.05 μm to 1 μm, and particularly preferably in the range of 0.1 μm to 1 μm. When the particle diameter of the pigment is less than 0.01 μm, it is not preferable from the viewpoint of the stability of the dispersion in the image-sensitive layer coating solution, and when it exceeds 10 μm, it is not preferable from the viewpoint of uniformity of the image-sensitive layer.

  As a method for dispersing the pigment, a known dispersion technique used in ink production, toner production, or the like can be used. Examples of the disperser include an ultrasonic disperser, a sand mill, an attritor, a pearl mill, a super mill, a ball mill, an impeller, a disperser, a KD mill, a colloid mill, a dynatron, a three-roll mill, and a pressure kneader. Details are described in "Latest Pigment Applied Technology" (CMC Publishing, 1986).

These sensitizing dyes (D) such as infrared absorbers added to accelerate the curing of the polymerizable composition apply the polymerizable composition of the present invention as a photosensitive layer of a negative lithographic printing plate precursor. In this case, it may be added to the photosensitive layer, or another layer such as an overcoat layer or an undercoat layer may be provided and added thereto. In particular, when the polymerizable composition of the present invention is applied to the photosensitive layer of a negative photosensitive lithographic printing plate, these (D) sensitizing dyes have a wavelength of 760 nm of the photosensitive layer from the viewpoint of sensitivity. The optical density at the absorption maximum in the range of 1200 nm is preferably between 0.1 and 3.0. Since the optical density is determined by the amount of the infrared absorber added and the thickness of the photosensitive layer, the predetermined optical density can be obtained by controlling both conditions.
The optical density of the photosensitive layer can be measured by a conventional method. As a measuring method, for example, on a transparent or white support, a photosensitive layer having a thickness appropriately determined in a range where the coating amount after drying is necessary as a lithographic printing plate is formed, and a transmission type optical densitometer is used. Examples thereof include a method of measuring, a method of forming a photosensitive layer on a reflective support such as aluminum, and measuring a reflection density.
Moreover, if it describes about the general addition amount to a polymeric composition, it is preferable that 0.5-20 mass% is added in a total solid. Within this range, it is preferable because the sensitivity of the characteristic change due to exposure is high, high sensitivity is achieved, and there is no fear of adversely affecting the uniformity and strength of the film.

[Other ingredients]
In addition to the above components, the polymerizable composition of the present invention, for example, a co-sensitizer, a polymerization inhibitor, a colorant, a plasticizer, and other components suitable for its use and production method are appropriately added. can do. Hereinafter, examples of preferred additives when the polymerizable composition of the present invention is applied as a recording layer of a negative type image recording material will be described.

(Co-sensitizer)
By using a co-sensitizer for the photopolymerizable photosensitive layer, the sensitivity of the photosensitive layer can be further improved. These mechanisms of action are not clear, but many are thought to be based on the following chemical processes. That is, various intermediate active species (radicals, peroxides, oxidizing agents, reducing agents, etc.) generated in the course of the photoreaction initiated by light absorption of the above-mentioned photopolymerization initiator (system) and the subsequent addition polymerization reaction. It is presumed that the co-sensitizer reacts to generate a new active radical. These can be broadly divided into (a) those that can be reduced to generate active radicals, (b) those that can be oxidized to generate active radicals, and (c) radicals that are more active by reacting with less active radicals. Can be classified into those that act as chain transfer agents, but there is often no generality as to which of these individual compounds belong.

  (A) Compound that is reduced to produce an active radical Compound having a carbon-halogen bond: It is considered that the carbon-halogen bond is reductively cleaved to generate an active radical. Specifically, for example, trihalomethyl-s-triazines and trihalomethyloxadiazoles can be preferably used.

  Compound having nitrogen-nitrogen bond: It is considered that the nitrogen-nitrogen bond is reductively cleaved to generate an active radical. Specifically, hexaarylbiimidazoles and the like are preferably used.

  Compound having oxygen-oxygen bond: It is considered that the oxygen-oxygen bond is reductively cleaved to generate an active radical. Specifically, for example, organic peroxides are preferably used.

  Onium compounds: It is considered that carbon-hetero bonds and oxygen-nitrogen bonds are reductively cleaved to generate active radicals. Specifically, for example, diaryliodonium salts, triarylsulfonium salts, N-alkoxypyridinium (azinium) salts and the like are preferably used. Ferrocene and iron arene complexes: An active radical can be reductively generated.

  (B) Compound alkylate complex which is oxidized to generate an active radical: It is considered that a carbon-hetero bond is oxidatively cleaved to generate an active radical. Specifically, for example, triarylalkyl borates are preferably used.

  Alkylamine compound: It is considered that the C—X bond on carbon adjacent to nitrogen is cleaved by oxidation to generate an active radical. X is preferably a hydrogen atom, a carboxyl group, a trimethylsilyl group, a benzyl group or the like. Specific examples include ethanolamines, N-phenylglycines, N-trimethylsilylmethylanilines, and the like.

  Sulfur-containing and tin-containing compounds: Compounds in which the nitrogen atoms of the above-described amines are replaced with sulfur atoms and tin atoms can generate active radicals by the same action. Further, a compound having an SS bond is also known to be sensitized by SS cleavage.

  α-Substituted methylcarbonyl compound: An active radical can be generated by oxidative cleavage of the carbonyl-α carbon bond. Moreover, what converted carbonyl into the oxime ether also shows the same effect | action. Specifically, 2-alkyl-1- [4- (alkylthio) phenyl] -2-morpholinopronone-1 and oximes obtained by reacting these with hydroxyamines and then etherifying N—OH Mention may be made of ethers.

  Sulfinic acid salts: An active radical can be reductively generated. Specific examples include sodium arylsulfinate.

  (C) A compound that reacts with a radical to be converted into a highly active radical or acts as a chain transfer agent, for example, a group of compounds having SH, PH, SiH, GeH in the molecule. These can generate hydrogen by donating hydrogen to a low-activity radical species to generate radicals, or after being oxidized and deprotonated. Specifically, 2-mercaptobenzimidazoles etc. are mentioned, for example.

  More specific examples of these co-sensitizers are described, for example, in JP-A-9-236913 as additives for the purpose of improving sensitivity. Some examples are shown below, but those used for the photosensitive layer of the lithographic printing plate precursor according to the invention are not limited thereto.

  These cosensitizers can also be subjected to various chemical modifications for improving the characteristics of the photosensitive layer. For example, bonds with sensitizing dyes, titanocene, addition polymerizable unsaturated compounds and other radical generating parts, introduction of hydrophilic sites, improved compatibility, introduction of substituents for suppressing crystal precipitation, substituents for improving adhesion Methods such as introduction and polymerization can be used.

  These co-sensitizers can be used alone or in combination of two or more. The amount used is 0.05 to 100 parts by mass, preferably 1 to 80 parts by mass, and more preferably 3 to 50 parts by mass with respect to 100 parts by mass of the compound having an ethylenically unsaturated double bond.

(Polymerization inhibitor)
In addition, in the photo- or heat-polymerizable negative photosensitive layer of a lithographic printing plate precursor to which the polymerizable composition of the present invention is applied, it is possible to polymerize an ethylenically nonpolymerizable polymer during the production or storage of the negative photosensitive composition. In order to prevent unnecessary thermal polymerization of the compound having a saturated double bond, it is desirable to add a small amount of a thermal polymerization inhibitor. Suitable thermal polymerization inhibitors include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol ), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like. The addition amount of the thermal polymerization inhibitor is preferably about 0.01% by mass to about 5% by mass with respect to the mass of the nonvolatile components in the entire composition. If necessary, a higher fatty acid derivative such as behenic acid or behenic acid amide may be added to prevent polymerization inhibition due to oxygen, and it may be unevenly distributed on the surface of the photosensitive layer in the course of drying after coating. . The addition amount of the higher fatty acid derivative is preferably about 0.5% by mass to about 10% by mass with respect to the nonvolatile components in the entire composition.

(Coloring agent)
Furthermore, when the polymerizable composition of the present invention is applied to the photosensitive layer of a lithographic printing plate precursor, a dye or pigment may be added for the purpose of coloring. Thereby, so-called plate inspection properties such as visibility after plate making and suitability for an image density measuring machine as a printing plate can be improved. As the colorant, many dyes cause a decrease in the sensitivity of the photopolymerization type photosensitive layer. Therefore, it is particularly preferable to use a pigment as the colorant. Specific examples include pigments such as phthalocyanine pigments, azo pigments, carbon black and titanium oxide, and dyes such as ethyl violet, crystal violet, azo dyes, anthraquinone dyes, and cyanine dyes. The addition amount of the dye and the pigment is preferably about 0.5% by mass to about 5% by mass with respect to the non-volatile components in the entire composition.

(Other additives)
Furthermore, in order to improve the physical properties of the cured film, inorganic fillers, other plasticizers, and ink deposition on the surface of the photosensitive layer when the polymerizable composition of the present invention is applied to the photosensitive layer of a lithographic printing plate precursor You may add well-known additives, such as a fat-sensitizing agent which can improve property.

  Examples of plasticizers include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, and triacetyl glycerin. In general, it can be added in a range of 10% by mass or less with respect to the total mass.

  Further, for the purpose of improving the film strength (printing durability), which will be described later, a UV initiator, a thermal crosslinking agent, or the like can be added to enhance the effect of heating and exposure after development.

<Lithographic printing plate precursor>
The lithographic printing plate precursor according to the invention is characterized in that a photosensitive layer containing the polymerizable composition of the invention is provided on a support. The lithographic printing plate precursor according to the invention may be provided with other layers such as an intermediate layer and a protective layer, if necessary, in addition to the photosensitive layer.

(Photosensitive layer)
The photosensitive layer in the lithographic printing plate precursor according to the invention contains the above-described polymerizable composition according to the invention.
The photosensitive layer is formed by dissolving the constituent components of the photosensitive layer in various organic solvents and coating the coating solution on a support or intermediate layer described later.
Solvents used here include acetone, methyl ethyl ketone, cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran, toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, Acetylacetone, cyclohexanone, diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether acetate, 3-methoxypropanol, methoxymethoxyethanol, diethylene glycol monomethyl ether, Ethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-methoxypropyl acetate, N, N-dimethylformamide, dimethyl sulfoxide, γ-butyrolactone, methyl lactate, lactic acid There are ethyl and the like. These solvents can be used alone or in combination. The solid content in the coating solution is suitably 2 to 50% by mass.

The coating amount of the photosensitive layer mainly affects the sensitivity of the photosensitive layer, the developability, the strength of the exposed film, and the printing durability, and is preferably selected as appropriate according to the application. When the coating amount is too small, the printing durability is not sufficient. On the other hand, if the amount is too large, the sensitivity is lowered, it takes time for exposure, and a longer time is required for development processing, which is not preferable. For the lithographic printing plate precursor for scanning exposure which is the main object of the present invention, the coating amount is suitably in the range of about 0.1 g / m ² to about 10 g / m ² in terms of the mass after drying. More preferably from 0.5 to 5 g / ^{m 2.}

[Support]
As the support for the lithographic printing plate precursor according to the invention, a conventionally known hydrophilic support for use in a lithographic printing plate precursor can be used without limitation.
The support used is preferably a dimensionally stable plate, for example, paper, paper laminated with plastic (eg, polyethylene, polypropylene, polystyrene, etc.), metal plate (eg, aluminum, zinc). , Copper, etc.), plastic films (for example, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc.) Paper or plastic film, etc. on which such metals are laminated or vapor-deposited are included. Appropriately known physical and chemical treatments are applied to these surfaces for the purpose of imparting hydrophilicity and improving strength as necessary. You may give it.

  In particular, preferred supports include paper, polyester film or aluminum plate, among which dimensional stability is good, relatively inexpensive, and a surface with excellent hydrophilicity and strength is provided by surface treatment as required. An aluminum plate that can be formed is more preferable. A composite sheet in which an aluminum sheet is bonded on a polyethylene terephthalate film as described in Japanese Patent Publication No. 48-18327 is also preferable.

An aluminum plate is a metal plate mainly composed of dimensionally stable aluminum. In addition to a pure aluminum plate, an alloy plate containing aluminum as a main component and containing a trace amount of foreign elements, or aluminum (alloy) is laminated. Or it is chosen from the vapor-deposited plastic film or paper. In the following description, the above-mentioned support made of aluminum or an aluminum alloy is generically used as an aluminum support. Examples of the foreign element contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel, and titanium. The content of the foreign element in the alloy is 10% by mass or less. In the present invention, a pure aluminum plate is suitable, but completely pure aluminum is difficult to manufacture in terms of refining technology, and therefore may contain a slightly different element. Thus, the composition of the aluminum plate applied to the present invention is not specified, and it is a conventionally known material such as JIS A 1050, JIS A 1100, JIS A 3103, JIS A 3005, etc. Can be used as appropriate.
Moreover, the thickness of the aluminum support body used for this invention is about 0.1 mm-about 0.6 mm. This thickness can be changed as appropriate according to the size of the printing press, the size of the printing plate, and the desire of the user. The aluminum support may be subjected to a support surface treatment described later as necessary. Of course, it may not be applied.

(Roughening treatment)
Examples of the surface roughening method include mechanical surface roughening, chemical etching, and electrolytic grain as disclosed in JP-A-56-28893. Furthermore, the electrochemical surface roughening method in which the surface is electrochemically roughened in hydrochloric acid or nitric acid electrolyte solution, the aluminum surface is scratched with a metal wire, the wire brush grain method, the surface of the aluminum is polished with a polishing ball and an abrasive. A mechanical graining method such as a pole grain method, a brush grain method in which the surface is roughened with a nylon brush and an abrasive, can be used, and the above roughening methods can be used alone or in combination. Among them, a method usefully used for roughening is an electrochemical method in which roughening is chemically performed in hydrochloric acid or nitric acid electrolyte, and a suitable amount of electricity during anode is 50 C / dm ^{2 to} 400 C / dm ² . It is a range. More specifically, in the electrolytic solution containing from 0.1 to 50 percent of hydrochloric acid or nitric, temperature 20 to 80 ° C., for 1 second to 30 minute, alternating at a current density of 100C ^/ dm ² ~400C ^/ dm 2 It is preferable to perform direct current electrolysis.

  The roughened aluminum support may be chemically etched with acid or alkali. Etching agents suitably used are caustic soda, sodium carbonate, sodium aluminate, sodium metasilicate, sodium phosphate, potassium hydroxide, lithium hydroxide, and the like. Preferred ranges of concentration and temperature are 1 to 50% and 20%, respectively. ~ 100 ° C. Pickling is performed to remove dirt (smut) remaining on the surface after etching. As the acid used, nitric acid, sulfuric acid, phosphoric acid, chromic acid, hydrofluoric acid, borohydrofluoric acid and the like are used. In particular, as a method for removing smut after the electrochemical surface roughening treatment, contact with 15 to 65 mass% sulfuric acid at a temperature of 50 to 90 ° C. as described in JP-A-53-12739 is preferable. And the alkali etching method described in Japanese Patent Publication No. 48-28123. After the treatment as described above, the method condition is not particularly limited as long as the center line average roughness Ra of the treatment surface is preferably 0.2 to 0.5 μm.

(Anodizing treatment)
The aluminum support treated as described above is preferably anodized after that.
In the anodizing treatment, sulfuric acid, phosphoric acid, oxalic acid, or an aqueous solution of boric acid / sodium borate is used as a main component of the electrolytic bath singly or in combination. In this case, the electrolyte solution may of course contain at least components normally contained in at least an Al alloy plate, an electrode, tap water, groundwater, and the like. Further, the second and third components may be added. Here, the second and third components are, for example, metal ions such as Na, K, Mg, Li, Ca, Ti, Al, V, Cr, Mn, Fe, Co, Ni, Cu, and Zn, and ammonium ions. Examples include cations, nitrate ions, carbonate ions, chloride ions, phosphate ions, fluorine ions, sulfite ions, titanate ions, silicate ions, borate ions, and the like, and the concentration is 0 to 10,000 ppm. May be included. There are no particular limitations on the conditions of the anodizing treatment, but the treatment is preferably performed by direct current or alternating current electrolysis at a treatment liquid temperature of 10 to 70 ° C. and a current density of 0.1 to 40 A / m ² at 30 to 500 g / liter. . The thickness of the formed anodic oxide film is in the range of 0.5 to 1.5 μm. Preferably it is the range of 0.5-1.0 micrometer. The support produced by the above treatment is treated so that the pore diameter of the micropores existing in the anodized film is in the range of 5 to 10 nm and the pore density is in the range of 8 × 10 ¹⁵ to 2 × 10 ¹⁶ pieces / m ^2. It is preferred that the conditions are selected.

A widely known method can be applied as the hydrophilic treatment of the support surface. As a particularly preferable treatment, a hydrophilic treatment with silicate or polyvinylphosphonic acid is performed. A film | membrane is formed by 2-40 mg / m < ² > as Si or P element amount, More preferably, it is 4-30 mg / m < ² >. The coating amount can be measured by fluorescent X-ray analysis.

  The hydrophilization treatment is carried out by applying an anodized film to an aqueous solution containing 1 to 30% by mass, preferably 2 to 15% by mass of alkali metal silicate or polyvinylphosphonic acid, and having a pH of 10 to 13 at 25 ° C. This is carried out by immersing the aluminum support on which is formed, for example, at 15 to 80 ° C. for 0.5 to 120 seconds.

  As the alkali metal silicate used for the hydrophilization treatment, sodium silicate, potassium silicate, lithium silicate, or the like is used. Examples of the hydroxide used for increasing the pH of the aqueous alkali metal silicate solution include sodium hydroxide, potassium hydroxide, and lithium hydroxide. In addition, you may mix | blend alkaline-earth metal salt or Group IVB metal salt with said process liquid. Alkaline earth metal salts include nitrates such as calcium nitrate, strontium nitrate, magnesium nitrate, and barium nitrate, and water-soluble substances such as sulfate, hydrochloride, phosphate, acetate, oxalate, and borate. Salt. Group IVB metal salts include titanium tetrachloride, titanium trichloride, potassium fluoride titanium, potassium oxalate, titanium sulfate, titanium tetraiodide, zirconium chloride, zirconium dioxide, zirconium oxychloride, zirconium tetrachloride, etc. Can be mentioned.

  Alkaline earth metal salts or Group IVB metal salts can be used alone or in combination of two or more. A preferable range of these metal salts is 0.01 to 10% by mass, and a more preferable range is 0.05 to 5.0% by mass. Silicate electrodeposition as described in US Pat. No. 3,658,662 is also effective. Surface obtained by combining a support with electrolytic grains as disclosed in JP-B-46-27481, JP-A-52-58602, JP-A-52-30503, and the above anodizing treatment and hydrophilization treatment Processing is also useful.

[Middle layer]
In the lithographic printing plate precursor according to the invention, an intermediate layer (also referred to as an undercoat layer) may be provided for the purpose of improving the adhesion between the photosensitive layer and the support and the stain resistance of the non-image area. Specific examples of such an intermediate layer include JP-B-50-7481, JP-A-51-71123, JP-A-54-72104, JP-A-59-101651, JP-A-60. -14991, JP-A-60-232998, JP-A-2-304441, JP-A-3-56177, JP-A-4-282737, JP-A-5-16558, JP-A-5- No. 246171, JP-A-5-341532, JP-A-7-159983, JP-A-7-314937, JP-A-8-202025, JP-A-8-320551, JP-A-9-34104 JP-A-9-236911, JP-A-9-269593, JP-A-10-69092, JP-A-10-115931, JP-A-10-161317, JP-A-10-260536, JP-A-10-282679, JP-A-10-282682, JP-A-11-84684, JP-A-10-69092, JP-A-10 -115931, JP-A-11-38635, JP-A-11-38629, JP-A-10-282645, JP-A-10-301262, JP-A-11-24277, JP-A-11-109641 JP, 10-319600, JP 11-84684, JP 11-327152, JP 2000-10292, JP 11-36377, JP 11-11 No. 165861, Japanese Patent Application No. 11-284091, Japanese Patent Application No. 2000-14697, etc. Mention may be made placing of.

[Protective layer]
As in the present invention, a lithographic printing plate precursor having a light- or heat-polymerizable negative-type photosensitive layer is usually exposed in the air. Therefore, a protective layer (overcoat) is further formed on the above-mentioned photosensitive layer. It is preferable to provide a layer). The protective layer prevents exposure of low molecular weight compounds such as oxygen and basic substances present in the atmosphere that hinder the image formation reaction caused by exposure in the photosensitive layer, and enables exposure in the atmosphere. To do. Therefore, the properties desired for such a protective layer are low permeability of low-molecular compounds such as oxygen, and further, transmission of light used for exposure is not substantially inhibited, and adhesion to the photosensitive layer is excellent. And it is desirable that it can be easily removed in the development process after exposure. Such a device relating to the protective layer has been conventionally devised and is described in detail in US Pat. No. 3,458,311 and Japanese Patent Publication No. 55-49729.

As a material that can be used for the protective layer, for example, a water-soluble polymer compound having relatively excellent crystallinity is preferably used. Specifically, polyvinyl alcohol, polyvinyl pyrrolidone, acidic celluloses, gelatin, gum arabic, Water-soluble polymers such as acrylic acid are known, but among these, the use of polyvinyl alcohol as a main component gives the best results in terms of basic properties such as oxygen barrier properties and development removability. The polyvinyl alcohol used for the protective layer may be partially substituted with an ester, an ether and an acetal as long as it contains an unsubstituted vinyl alcohol unit for having necessary oxygen barrier properties and water solubility. Similarly, some of them may have other copolymer components. Specific examples of polyvinyl alcohol include those having a hydrolysis rate of 71 to 100% and a molecular weight in the range of 300 to 2400.
Specifically, Kuraray Co., Ltd. PVA-105, PVA-110, PVA-117, PVA-117H, PVA-120, PVA-124, PVA-124H, PVA-CS, PVA-CST, PVA-HC, PVA-203, PVA-204, PVA-205, PVA-210, PVA-217, PVA-220, PVA-224, PVA-217EE, PVA-217E, PVA-220E, PVA-224E, PVA-405, PVA- 420, PVA-613, L-8 and the like.

Components of the protective layer (selection of PVA, use of additives), coating amount, and the like are selected in consideration of fogging, adhesion, and scratch resistance in addition to oxygen barrier properties and development removability. In general, the higher the hydrolysis rate of the PVA used (the higher the content of the unsubstituted vinyl alcohol unit in the protective layer), the thicker the film thickness, the higher the oxygen barrier property, which is advantageous in terms of sensitivity. However, when the oxygen barrier property is extremely increased, there arises a problem that unnecessary polymerization reaction occurs during production and raw storage, and unnecessary fogging and image line thickening occur during image exposure. In addition, adhesion to the image area and scratch resistance are extremely important in handling the plate. That is, when a hydrophilic layer made of a water-soluble polymer is laminated on an oleophilic photosensitive layer, film peeling due to insufficient adhesive force is likely to occur, and the peeled part causes defects such as poor film hardening due to inhibition of oxygen polymerization. On the other hand, various proposals have been made to improve the adhesion between these two layers. For example, U.S. Patent Application No. 292,501 and U.S. Patent Application No. 44,563 disclose an acrylic emulsion or a water-insoluble vinylpyrrolidone-vinyl acetate copolymer in a hydrophilic polymer mainly composed of polyvinyl alcohol. It is described that sufficient adhesiveness can be obtained by mixing 20 to 60% by mass and the like and laminating on the photosensitive layer.
Any of these known techniques can be applied to the protective layer in the present invention. Such a coating method of the protective layer is described in detail in, for example, US Pat. No. 3,458,311 and JP-B-55-49729.

  In addition, as a plate making process for making a lithographic printing plate from the lithographic printing plate precursor of the present invention

[Plate making of lithographic printing plate precursor]
In order to make a lithographic printing plate precursor according to the present invention, at least exposure and development processes are performed.
As a light source for exposing the negative planographic printing plate precursor of the present invention, a known light source can be used without limitation. The wavelength of a desirable light source is 300 nm to 1200 nm, and specifically, it is preferable to use various lasers as the light source, and among them, an infrared laser having a wavelength of 780 nm to 1200 nm is preferably used.
The exposure mechanism may be any of an internal drum system, an external drum system, a flat bed system, and the like.

  In addition, as other exposure beams for the lithographic printing plate precursor of the present invention, ultra-high pressure, high pressure, medium pressure, low pressure mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, various visible and ultraviolet laser lamps Fluorescent lamps, tungsten lamps, sunlight, etc. can also be used.

  The lithographic printing plate precursor according to the invention is developed after being exposed. As the developer used in such development processing, an alkaline aqueous solution having a pH of 14 or less is particularly preferred, and an alkaline aqueous solution having a pH of 8 to 12 containing an anionic surfactant is more preferably used. For example, tribasic sodium phosphate, potassium, ammonium, dibasic sodium phosphate, potassium, ammonium, sodium carbonate, potassium, ammonium, sodium bicarbonate, potassium, ammonium, sodium borate, Examples include inorganic alkaline agents such as potassium, ammonium, sodium hydroxide, ammonium, potassium and lithium. Moreover, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, Organic alkali agents such as ethyleneimine, ethylenediamine, and pyridine are also used. These alkali agents are used alone or in combination of two or more.

In the development processing of the lithographic printing plate precursor according to the invention, 1 to 20% by mass of an anionic surfactant is added to the developer, and more preferably 3 to 10% by mass. If the amount is too small, the developability deteriorates. If the amount is too large, the strength such as the abrasion resistance of the image deteriorates. Examples of the anionic surfactant include sodium salt of lauryl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, such as sodium salt of isopropyl naphthalene sulfonic acid, sodium salt of isobutyl naphthalene sulfonic acid, polyoxy Higher carbon number such as sodium salt of ethylene glycol mononaphthyl ether sulfate ester, sodium salt of dodecylbenzene sulfonic acid, alkylaryl sulfonate such as sodium salt of metanitrobenzene sulfonic acid, secondary sodium alkyl sulfate, etc. Aliphatic alcohol phosphates such as alcohol sulfates, sodium salts of cetyl alcohol phosphates, eg C _{17 H 33 CON (CH 3)} CH 2 CH 2 SO 3 sulfonates of alkylamides such as Na, for example, sodium sulfosuccinate dioctyl ester, sulfonate of dibasic aliphatic esters such as sodium sulfosuccinate dihexyl ester Salts are included.

  If necessary, an organic solvent such as benzyl alcohol mixed with water may be added to the developer. As the organic solvent, those having a solubility in water of about 10% by mass or less are suitable, and preferably selected from those having 5% by mass or less. For example, 1-phenylethanol, 2-phenylethanol, 3-phenylpropanol, 1,4-phenylbutanol, 2,2-phenylbutanol, 1,2-phenoxyethanol, 2-benzyloxyethanol, o-methoxybenzyl alcohol, m -Methoxybenzyl alcohol, p-methoxybenzyl alcohol, benzyl alcohol, cyclohexanol, 2-methylcyclohexanol, 4-methylcyclohexanol, 3-methylcyclohexanol and the like can be mentioned. The content of the organic solvent is preferably 1 to 5% by mass with respect to the total mass of the developer at the time of use. The amount used is closely related to the amount of surfactant used, and it is preferable to increase the amount of anionic surfactant as the amount of organic solvent increases. This is because when the amount of the organic solvent is large and the amount of the anionic surfactant is small, the organic solvent is not dissolved, so that it is impossible to expect good developability.

Furthermore, additives such as an antifoaming agent and a hard water softening agent can be further contained as necessary. Examples of the hard water softener include Na ₂ P ₂ O ₇ , Na ₅ P ₃ O ₃ , Na ₃ P ₃ O ₉ , Na ₂ O ₄ P (NaO ₃ P) PO ₃ Na ₂ , and Calgon (sodium polymetaphosphate). Such as polyphosphates, aminopolycarboxylic acids (eg, ethylenediaminetetraacetic acid, its potassium salt, its sodium salt; diethylenetriaminepentaacetic acid, its potassium salt, its sodium salt; triethylenetetraminehexaacetic acid, its potassium salt, its sodium salt Hydroxyethylethylenediaminetriacetic acid, its potassium salt, its sodium salt; nitrilotriacetic acid, its potassium salt, its sodium salt; 1,2-diaminocyclohexanetetraacetic acid, its potassium salt, its sodium salt; 1,3-diamino-2 -Propanol tetraacetic acid , Its potassium salt, its sodium salt), other polycarboxylic acids (for example, 2-phosphonobutanetricarboxylic acid-1,2,4, its potassium salt, its sodium salt; 2 monophosphonobutanone tricarboxylic acid-2, 3,4, its potassium salt, its sodium salt, etc.), organic phosphonic acids (eg, 1-phosphonoethanetricarboxylic acid-1,2,2, its potassium salt, its sodium salt; 1-hydroxyethane-1,1 -Diphosphonic acid, its potassium salt, its sodium salt; aminotri (methylenephosphonic acid), its potassium salt, its sodium salt, etc.). The optimum amount of such a hard water softener varies depending on the hardness of the hard water used and the amount used, but is generally 0.01 to 5% by weight, more preferably in the developer at the time of use. It is made to contain in 0.01-0.5 mass%.

  Furthermore, when the lithographic printing plate precursor is developed using an automatic developing machine, the developing solution becomes fatigued according to the processing amount, so that the processing ability is restored by using a replenishing solution or a fresh developing solution. May be. In this case, it is preferable to replenish by the method described in US Pat. No. 4,882,246. Developers described in JP-A-50-26601, 58-54341, JP-B-56-39464, 56-42860, and 57-7427 are also preferable.

  The (A) specific polyurethane resin used for the photosensitive layer in the lithographic printing plate precursor according to the present invention is excellent in solubility in a developing solution, so there is no residual film in a non-image area, and in the developing solution over time. Since precipitation is suppressed, even if processing is repeated using an automatic developing machine, the plate surface failure such that the polymer deposited in the developing bath adheres to the plate surface and stains are suppressed. Can be suitably used.

  The lithographic printing plate precursor thus developed is subjected to washing water, surface activity as described in JP-A Nos. 54-8002, 55-11545, 59-58431, and the like. It may be post-treated with a rinsing liquid containing an agent, a desensitizing liquid containing gum arabic, starch derivatives, and the like. These treatments can be used in various combinations for the post-treatment of the lithographic printing plate precursor according to the invention.

As the plate-making process of the lithographic printing plate precursor according to the invention, the entire surface may be heated before exposure, during exposure, and between exposure and development, if necessary. By such heating, the image forming reaction in the photosensitive layer is promoted, and advantages such as improvement in sensitivity and printing durability and stabilization of sensitivity may occur. Further, for the purpose of improving the image strength and printing durability, it is also effective to subject the developed image to full post heating or full exposure.
Usually, heating before development is preferably performed under mild conditions of 150 ° C. or less from the viewpoint of occurrence of an undesired curing reaction. Also, very strong conditions can be used for heating after development. Usually, the heating temperature is in the range of 200 to 500 ° C. from the viewpoint of image strengthening action and thermal decomposition of the image area.

The planographic printing plate obtained by the above processing is loaded on an offset printing machine and used for printing a large number of sheets.
Note that the stain on the planographic printing plate subjected to printing can be removed by a plate cleaner. As a plate cleaner used for removing stains on a plate during printing, a conventionally known plate cleaner for PS plate is used. For example, CL-1, CL-2, CP, CN-4, CN, CG-1 PC-1, SR, IC (manufactured by Fuji Photo Film Co., Ltd.) and the like.

EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited to these.
[Synthesis Example 1: Compound represented by formula (I-1)]
Compound (I-1) represented by general formula (I-1) was synthesized according to the scheme shown below. Details will be described later.

[Synthesis of Compound A]
To a 1 L three-necked round bottom flask equipped with a calcium chloride tube and a stirrer, 20 g of trimethylolethane (manufactured by Tokyo Chemical Industry Co., Ltd.), 26 g of 2,2-dimethoxypropane (manufactured by Wako Pure Chemical Industries, Ltd.), 15 g of acetone, p -Toluenesulfonic acid monohydrate 0.32 g was added.
Stir at room temperature for 4 hours. After completion of the reaction, an aqueous solution in which 0.6 g of sodium bicarbonate was dissolved in 20 ml of water was added to the reaction solution. The reaction solution was extracted with ethyl acetate, and the organic layer was washed with saturated brine. The organic layer was dried over sodium sulfate and then concentrated under reduced pressure using an evaporator. 10 ml of acetonitrile was added to the concentrate, and the mixture was again concentrated under reduced pressure using an evaporator. The solvent was distilled off using a vacuum pump to obtain 22.3 g of Compound A. Boiling point 83 ° C./1 mmHg.

[Synthesis of Compound B]
22.3 g of compound A and 14.8 g of triethylamine were dissolved in 20 g of acetonitrile. This mixture was ice-cooled, and 14.3 g of solid succinic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) was added in portions at an internal temperature of 5 ° C. At this time, heat was generated up to 45 ° C. After completion of the reaction, 11.8 ml of concentrated hydrochloric acid was added at an internal temperature of 5 ° C. After stirring at the same temperature for 2 hours, 40 ml of water was added, extracted with ethyl acetate, the organic layer was washed with saturated brine, and dried over sodium sulfate. The organic layer was concentrated under reduced pressure using an evaporator to obtain 29.4 g of Compound B.

[Synthesis of Compound I-1 (1)]
28.1 g of compound B and 0.47 ml of concentrated hydrochloric acid were added to 40 g of water and stirred at room temperature. After completion of the reaction, 0.48 g of solid sodium hydrogen carbonate was added to the reaction solution. The reaction solution was concentrated with an evaporator. The obtained residue was recrystallized from acetonitrile to obtain 7.5 g of Compound (I-1).

[Synthesis of Compound I-1 (2)]
28.1 g of compound B, 3.5 g of water, 0.45 ml of concentrated hydrochloric acid, and 56 g of acetonitrile were mixed and stirred at room temperature. After completion of the reaction, the reaction solution was ice-cooled. The precipitated crystals were separated by filtration and washed with cooled acetonitrile to obtain 9 g of Compound (I-1).

[Synthesis Example 2: Synthesis of Compound Represented by General Formula (II-1)]
Compound (II-1) represented by general formula (II-1) was synthesized as follows. This compound can be easily synthesized using the Michael reaction. A solvent may be used without using a solvent, and a catalyst (for example, an organic base such as trialkylamine or an inorganic base such as sodium hydroxide) may be used.

[Synthesis of Compound II-1]
40 g of thioglycerol (manufactured by Wako Pure Chemical Industries, Ltd.) and 400 mg of triethylamine were dissolved in 20 ml of ethyl acetate, and the mixture was ice-cooled. A solution prepared by dissolving 35 g of methyl acrylate in 20 ml of ethyl acetate was added dropwise to this solution. After completion of the dropwise addition, the cooling was stopped and the reaction was allowed to proceed at room temperature for 5 hours. The reaction solution was decompressed with an aspirator and subsequently with a vacuum pump, and volatile components were distilled off to obtain 70 g of Compound (II-1).

[Synthesis Example 3: Polyurethane resin (P-1)]
“Polyurethane resin (P-1)”, which is a specific polyurethane resin according to the present invention, was synthesized as follows.
In a 500 ml three-necked round bottom flask equipped with a condenser and a stirrer, the following compound 1 (15.84 g), hexamethylene diisocyanate (5.08 g, manufactured by Wako Pure Chemical Industries, Ltd.), diphenylmethane diisocyanate (30.24 g, Wako Pure Chemical Industries, Ltd.) (Manufactured)), polypropylene glycol having an average molecular weight of 1000 (43.16 g, Wako Pure Chemical Industries, Ltd.), the following compound 2 (5.59 g), 1-methyl-2-pyrrolidone (100 g, Wako Pure Chemical Industries, Ltd.) , And Neostan U-600 (5 drops, manufactured by Nitto Kasei Co., Ltd.) were added and heated at 100 ° C. for 8 hours. Then, it diluted with methanol (100 ml) and 1-methyl-2-pyrrolidone (560 g). The reaction solution was poured into water (4 L) with stirring to precipitate a white polymer. The polymer was filtered off, washed with water, and then vacuum-dried to obtain (A) specific polyurethane resin (P-1) (14.96 g) described as exemplary compound (P-1) below.
When the weight average molecular weight of the obtained specific polyurethane resin (P-1) was measured by gel permeation chromatography, it was 98,000 in terms of polystyrene, and the acid value was 0.70 meq / g.

  In the same manner as in Synthesis Example 1, using the diisocyanate compound and diol compound shown in Table 1, the specific polyurethane resins (P-2) to (P-6) according to the present invention and the comparative polyurethane resin (CP- 1) to (CP-2) were obtained.

  In addition, about the specific polyurethane resin [(P-1)-(P-6)] obtained by the above, the time-dependent precipitation test of the polymer was done. That is, 12.5 g of a polyurethane resin was dissolved in 0.5 liter of an alkaline aqueous solution having a pH of 12, and sealed, and then stored in an atmosphere at 25 ° C. for 60 days. When the presence or absence of polymer precipitation was visually observed after storage, in the specific polyurethane resins (alkali-soluble polymers) of P-1 to P-6 of the present invention, no polymer deposition was observed even after 60 days. On the other hand, in CP-2 which is a polymer of the comparative example, polymer precipitation was visually confirmed.

(Examples 1-7, Comparative Examples 1-3)
In the following procedure, negative lithographic printing plate precursors of Examples 1 to 7 and Comparative Examples 1 to 3 shown in Table 1 were prepared, and printing performance was evaluated. The results are also shown in Table 1.

[Production of support]
Using a JIS A 1050 aluminum plate having a thickness of 0.24 mm and a width of 1030 mm, the treatment was continuously performed as follows.

  (A) Roller-type nylon that rotates using an existing mechanical roughening device while supplying a slurry of a specific gravity of 1.12 (pumice) and water as a polishing slurry to the surface of an aluminum plate Mechanical roughening was performed with a brush. The average particle size of the abrasive was 40 to 45 μm, and the maximum particle size was 200 μm. The material of the nylon brush was 6.10 nylon, the hair length was 50 mm, and the hair diameter was 0.3 mm. The nylon brush was planted so as to be dense by making a hole in a stainless steel tube having a diameter of 300 mm. Three rotating brushes were used. The distance between the two support rollers (φ200 mm) at the bottom of the brush was 300 mm. The brush roller was pressed until the load of the drive motor that rotates the brush was 7 kW plus the load before the brush roller was pressed against the aluminum plate. The rotation direction of the brush was the same as the movement direction of the aluminum plate, and the rotation speed was 200 rpm.

(B) The aluminum plate was spray-etched at a caustic soda concentration of 2.6 mass%, an aluminum ion concentration of 6.5 mass%, and a temperature of 70 ° C. to dissolve 0.3 g / m ^{2 of the} aluminum plate. Thereafter, washing with water was performed by spraying.

  (C) A desmut treatment was performed by spraying with a 1% by mass aqueous solution of nitric acid having a temperature of 30 ° C. (including 0.5% by mass of aluminum ions), and then washed with water by spraying. The nitric acid aqueous solution used for the desmut was the waste liquid from the step of electrochemical surface roughening using alternating current in nitric acid aqueous solution.

(D) An electrochemical surface roughening treatment was continuously performed using an alternating voltage of 60 Hz. The electrolytic solution at this time was a 1% by mass aqueous nitric acid solution (including 0.5% by mass aluminum ions and 0.007% by mass ammonium ions) at a temperature of 40 ° C. The AC power source was subjected to electrochemical surface roughening using a carbon electrode as a counter electrode, using a trapezoidal rectangular wave alternating current with a time TP of 2 msec until the current value reaches a peak from zero, a duty ratio of 1: 1. Ferrite was used for the auxiliary anode. The current density was 30 A / dm ² at the current peak value, and the amount of electricity was 255 C / cm ² in terms of the total amount of electricity when the aluminum plate was the anode. 5% of the current flowing from the power source was shunted to the auxiliary anode. Then, water washing by spraying was performed.

(E) The aluminum plate is etched by spraying at 32 ° C. with a caustic soda concentration of 26% by mass and an aluminum ion concentration of 6.5% by mass, the aluminum plate is dissolved by 0.2 g / m ² , and electricity is obtained using the previous AC The removal of the smut component mainly composed of aluminum hydroxide generated during chemical roughening and the edge portion of the generated pit were dissolved to smooth the edge portion. Then, it was washed with water with a spray.

  (F) A desmut treatment by spraying was performed with a 25% by weight aqueous solution of sulfuric acid having a temperature of 60 ° C. (containing 0.5% by weight of aluminum ions), and then washing with water by spraying.

(G) An anodizing apparatus using an existing two-stage feed electrolytic treatment method (first and second electrolysis unit length 6 m, first feed unit length 3 m, second feed unit length 3 m, first and second feed electrode lengths 2.4 m each ) Was used to perform anodization at a sulfuric acid concentration of 170 g / liter (containing 0.5 mass% of aluminum ions) at a temperature of 38 ° C. Thereafter, washing with water was performed by spraying. At this time, in the anodizing device, the current from the power source flows to the first power supply electrode provided in the first power supply unit, flows to the plate-like aluminum via the electrolytic solution, An oxide film is formed on the surface, passes through the electrolytic electrode provided in the first power feeding portion, and returns to the power source. On the other hand, the current from the power source flows to the second power feeding electrode provided in the second power feeding portion, similarly flows to the plate-like aluminum via the electrolytic solution, and an oxide film is formed on the surface of the plate-like aluminum by the second electrolysis portion. Although the amount of electricity fed from the power source to the first feeding unit and the amount of electricity fed from the power source to the second feeding unit are the same, the feeding current density on the oxide film surface in the second feeding unit is about It was 25 A / dm ² . In the 2nd electric power feeding part, it came to feed from the oxide-film surface of 1.35 g / m < ² >. The final oxide film amount was 2.7 g / m ² . The aluminum support so far is referred to as [AS-1].

[Hydrophilic treatment]
The aluminum support [AS-1] was subjected to a silicate treatment in order to increase hydrophilicity as a non-image portion of the printing plate. The treatment was carried with a 1.5% aqueous solution of sodium silicate 3 maintained at 70 ° C. so that the contact time of the aluminum web was 15 seconds, and further washed with water. The adhesion amount of Si was 10 mg / m ² . This support is referred to as [AS-2].

[Coating photosensitive layer]
A photosensitive layer coating solution having the following composition is coated on the aluminum support treated as described above so that the dry coating amount is 1.0 to 1.2 g / m ^2, and dried at 100 ° C. for 1 minute. Formed.

(Photosensitive layer coating solution)
-(C) addition polymerizable compound (compound described in Table 1) 1.5 g
・ (A) Specific polyurethane resin or comparative binder polymer (resin described in Table 1) 2.0 g
-(D) Sensitizing dye (compound described in Table 1) 0.2 g
(B) Photopolymerization initiator (compound described in Table 1) 0.4 g
Cosensitizing dye (compound described in Table 1) 0.4 g
・ Fluorine nonionic surfactant 0.03g
(Dai Nippon Ink Chemical Co., Ltd., MegaFuck F-177)
・ Thermal polymerization inhibitor 0.01g
(N-nitrosophenylhydroxylamine aluminum salt)
・ 2.0 g of colored pigment dispersion having the following composition
・ Methyl ethyl ketone 20.0g
・ Propylene glycol monomethyl ether 20.0g

-Colored pigment dispersion composition-
Pigment Blue 15: 6 15 parts by mass Allyl methacrylate / methacrylic acid copolymer (copolymerization molar ratio 80/20, mass average molecular weight 40,000) 10 parts by mass Cyclohexanone 15 parts by mass Methoxypropyl acetate 20 parts by mass Propylene glycol 40 parts by mass of monomethyl ether

[Coating of protective layer]
On the obtained photosensitive layer, a 3% by weight aqueous solution of polyvinyl alcohol (saponification degree 98 mol%, polymerization degree 550) was applied so that the dry coating weight was 2 g / m ² and dried at 100 ° C. for 2 minutes. did.

[Exposure of planographic printing plate precursor]
The lithographic printing plate precursor obtained as described above is subjected to exposure power so that the plate surface exposure energy density is 200 μJ / cm ² using an FD-YAG (532 nm) laser exposure machine (Heidelberg plate setter: Gutenberg). The solid image exposure and the halftone dot image exposure of 1 to 99% in 1% increments were performed.

[Development / plate making]
After the exposure, the developer shown in Table 1 and the finisher FP-2W manufactured by Fuji Photo Film Co., Ltd. were charged into an automatic developing machine FLP-813 manufactured by Fuji Photo Film Co., Ltd., respectively, and the developer temperature was 30 ° C. and the development time was 18 The exposed plate was developed / engraved under the conditions of seconds to obtain a lithographic printing plate.

[Image area printing durability test]
R201 manufactured by Roland was used as a printing machine, and graph G (N) manufactured by Dainippon Ink & Chemicals, Inc. was used as ink. The printed matter in the solid image area was observed, and the printing durability of the image area was examined based on the number of images where the image started to fade. The larger the number, the better the printing durability.

[Development residue evaluation test]
Each obtained lithographic printing plate precursor (area 0.88 m ² ) was exposed to a non-image area of 0.75 m ^2, and then the protective layer was removed to a developing machine LP-1310 manufactured by Fuji Photo Film Co., Ltd. Using a device provided with an apparatus, 1200 sheets were continuously developed with a developer having a pH of 11.90 (30 ° C.). The developers used are as shown in Table 1.
The evaluation was performed by visually checking whether or not development residue was deposited in the processed developer. The results are also shown in Table 1.

  The addition-polymerizable compounds, polymerization initiators, sensitizing dyes, infrared absorbers, other additives, and used developers described in Table 1 are used in other examples described later ( (Indicated in Table 2 and Table 3)

<Addition polymerizable compound>
M-1: Pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd .; NK ester A-TMMT)
M-2: Glycerin dimethacrylate hexamethylene diisocyanate urethane prepolymer (manufactured by Kyoeisha Chemical Co., Ltd .; UA101H)
M-3: Shin-Nakamura Chemical Co., Ltd .; NK ester A-BPE-4
M-4:

<Polymerization initiator>

<Sensitizing dye>

<Infrared absorber>

<Other additives>

<Developer>
D-1:
An aqueous solution of pH 10 having the following composition: 0.1 parts by mass of monoethanolamine, 1.5 parts by mass of triethanolamine, 4.0 parts by mass of the compound of the following formula 1, 2.5 parts by mass of the compound of the following formula 2 Compound 3 of 3 0.2 parts by mass and water 91.7 parts by mass

In the above (Formula 1), R ¹⁴ represents a hydrogen atom or a butyl group.

D-2:
Aqueous solution comprising the following composition: 1K potassium silicate 3.0 parts by mass Potassium hydroxide 1.5 parts by mass Compound of formula 3 0.2 parts by mass Water 95.3 parts by mass

D-3: 1: 4 diluted solution of DH-N manufactured by Fuji Film Co., Ltd.

(Examples 8-14, Comparative Examples 4-6)
In the same manner as in Examples 1 to 7 and Comparative Examples 1 to 3, negative lithographic printing plate precursors of Examples 8 to 14 and Comparative Examples 4 to 6 shown in Table 2 were produced. About the obtained lithographic printing plate precursor, printing performance was evaluated in the same manner as in Examples 1 to 7 and Comparative Examples 1 to 3. In Examples and Comparative Examples, the photosensitive layer was applied such that the coating amount after drying was 1.3 to 1.5 g / m ² . The results are also shown in Table 2.

(Examples 15 to 21, Comparative Examples 7 to 9)
[Create support]
In order to remove rolling oil on the surface of an aluminum plate (material 1050) having a thickness of 0.3 mm, a degreasing treatment was performed at 50 ° C. for 30 seconds using a 10 mass% sodium aluminate aqueous solution, and then the hair diameter was 0.3 mm. The aluminum surface was grained using three bundle-planted nylon brushes and a pumice-water suspension (specific gravity 1.1 g / cm ³ ) having a median diameter of 25 μm and washed thoroughly with water. This plate was etched by being immersed in a 25% aqueous sodium hydroxide solution at 45 ° C. for 9 seconds, washed with water, further immersed in 20% nitric acid at 60 ° C. for 20 seconds, and washed with water. At this time, the etching amount of the grained surface was about 3 g / m ² .
Next, an electrochemical roughening treatment was performed continuously using an alternating voltage of 60 Hz. The electrolytic solution at this time was a 1% by mass nitric acid aqueous solution (containing 0.5% by mass of aluminum ions) and a liquid temperature of 50 ° C. The AC power source waveform is electrochemical roughening treatment using a trapezoidal rectangular wave alternating current with a time ratio TP of 0.8 msec until the current value reaches a peak from zero, a duty ratio of 1: 1, and a trapezoidal rectangular wave alternating current. Went. Ferrite was used for the auxiliary anode. The current density was 30 A / dm ² at the peak current value, and 5% of the current flowing from the power source was shunted to the auxiliary anode. The amount of electricity in nitric acid electrolysis was 175 C / dm ² when the aluminum plate was the anode. Then, water washing by spraying was performed.
Next, a 0.5% by mass hydrochloric acid aqueous solution (containing 0.5% by mass of aluminum ions) and an electrolytic solution having a liquid temperature of 50 ° C. and nitric acid electrolysis under the condition of an electric quantity of 50 C / dm ² when the aluminum plate is an anode. In the same manner as above, an electrochemical surface roughening treatment was performed, followed by washing with water by spraying. The plate was provided with a direct current anodic oxide coating of 2.5 g / m ² at a current density of 15 A / dm ² using 15% sulfuric acid (containing 0.5% by mass of aluminum ions) as an electrolyte, washed with water and dried. A. The centerline average roughness (Ra) of this substrate was measured using a needle having a diameter of 2 μm and found to be 0.51 μm. The support thus obtained is designated [AS-3].

<Undercoat layer>
Next, the following undercoat layer coating solution was applied to the aluminum support surface [AS-3] with a wire bar and dried at 100 ° C. for 10 seconds. The coating amount was 10 mg / m ² .

-Undercoat layer coating solution-
-Polymer compound A having the following structure (weight average molecular weight: 10,000) 0.05 g
・ Methanol 27g
・ Ion exchange water 3g

[Coating photosensitive layer]
On this, a photosensitive layer coating solution having the following composition was prepared, and coated with a wire bar so that the coating amount after drying was 0.9 g / m ^2. The photosensitive layer was formed by drying for 34 seconds.

(Photosensitive layer coating solution)
-(D) Infrared absorber (compound described in Table 3) 0.038 g
-(B) Polymerization initiator A (compound described in Table 3) 0.061 g
-(B) Polymerization initiator B (compound described in Table 3) 0.094 g
・ Mercapto compound (SH-1: the following structure) 0.015 g
-(C) addition polymerizable compound (compound described in Table 3) 0.311 g
-Binder polymer (B-1: the following structure) 0.311 g
-(A) Specific polyurethane resin (compound described in Table 3) 0.311 g
Additive (compound described in Table 3) 0.079 g
-Polymerization inhibitor (Q-1: following structure) 0.0012g
・ Ethyl violet (EV-1: the following structure) 0.021 g
・ Fluorine surfactant 0.0081g
(Megafac F-780-F Dainippon Ink Chemical Co., Ltd.,
Methyl isobutyl ketone (MIBK) 30% by mass solution)
・ Methyl ethyl ketone 5.886g
・ Methanol 2.733g
・ 1-methoxy-2-propanol 5.886 g

[Coating of protective layer]
<Lower protective layer>
On the surface of the photosensitive layer, synthetic mica (Somasif MEB-3L, 3.2% aqueous dispersion, manufactured by Coop Chemical Co., Ltd.), polyvinyl alcohol (Goselan CKS-50: saponification degree 99 mol%, polymerization degree 300, sulfonic acid Modified polyvinyl alcohol (manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) Surfactant A (Nihon Emulsion Co., Emalex 710) and Surfactant B (Adeka Pluronic P-84: Asahi Denka Kogyo Co., Ltd.) mixed aqueous solution (protective layer) Coating solution) was applied with a wire bar, and dried at 125 ° C. for 30 seconds with a hot air dryer.
The content ratio of synthetic mica (solid content) / polyvinyl alcohol / surfactant A / surfactant B in the mixed aqueous solution (coating liquid for protective layer) was 7.5 / 89/2 / 1.5 (mass). The coating amount (the coating amount after drying) was 0.5 g / m ² .

<Upper protective layer>
On the surface of the lower protective layer, an organic filler (Art Pearl J-7P, manufactured by Negami Industrial Co., Ltd.), synthetic mica (Somasif MEB-3L, 3.2% aqueous dispersion, manufactured by Coop Chemical Co., Ltd.), polyvinyl alcohol ( L-3266: Saponification degree 87 mol%, polymerization degree 300, sulfonic acid-modified polyvinyl alcohol, manufactured by Nippon Synthetic Chemical Industry Co., Ltd., thickener (Serogen FS-B, manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), polymer A mixed aqueous solution (protective layer coating solution) of compound A (the above structure) and a surfactant (manufactured by Nippon Emulsion Co., Ltd.) is applied with a wire bar, and heated at 125 ° C. for 30 seconds with a hot air dryer. Dried.
The content ratio of the organic filler / synthetic mica (solid content) / polyvinyl alcohol / thickener / polymer compound A / surfactant in the mixed aqueous solution (protective layer coating solution) is 4.7 / 2.8. /67.4/18.6/2.3/4.2 (mass%), and the coating amount (the coating amount after drying) was 1.8 g / m ² .
Thus, the planographic printing plate precursors of Examples 15 to 21 and Comparative Examples 7 to 9 were obtained.

[Exposure of planographic printing plate precursor]
The lithographic printing plate precursor of Example obtained as described above was output by a Creo Trendsetter 3244VFS equipped with a water-cooled 40 W infrared semiconductor laser, output 9 W, outer drum rotation speed 210 rpm, plate surface energy 100 mJ / cm ² , resolution 2400 dpi. Exposure was performed under conditions.

[Development / plate making]
After exposure, LP-1310News manufactured by Fuji Film Co., Ltd. was charged with the developer described in Table 3 and the 1: 1 water dilution solution development of finisher Fuji Photo Film Co., Ltd. GN-2K, respectively. A lithographic printing plate was obtained.

[Image area printing durability test]
A Lislon manufactured by Komori Corporation was used as a printing machine, and a graph G (N) manufactured by Dainippon Ink & Chemicals, Inc. was used as an ink. The printed matter in the solid image area was observed, and the printing durability of the image area was examined based on the number of sheets where the image began to fade. Larger numbers indicate better printing durability.

[Development residue evaluation test]
Each obtained lithographic printing plate precursor (area 0.88 m ² ) was exposed to a non-image area of 0.75 m ^2, and then the protective layer was removed to a developing machine LP-1310 manufactured by Fuji Photo Film Co., Ltd. Using a device provided with an apparatus, 1200 sheets were continuously developed with a developer having a pH of 11.90 (30 ° C.). The developers used are as shown in Table 3.
The evaluation was performed by visually checking whether or not development residue was deposited in the processed developer. The results are also shown in Table 3.

  As is apparent from Tables 1 to 3, the lithographic printing plate precursor provided with a photosensitive layer comprising a polymerizable composition containing the specific polyurethane resin (A) of the present invention (polymerizable composition of the present invention) is 405 nm, Even when an image was formed by exposure at any wavelength of 532 nm or 830 nm, it was confirmed that the film had very excellent printing durability, and no development residue was deposited even by continuous processing. From this, it can be seen that the polymerizable composition of the present invention can form a film with good film quality and is excellent in solubility in a developer. By having a photosensitive layer containing such a polymerizable composition, the lithographic printing plate precursor of the present invention is a lithographic printing plate precursor suitable for high-speed writing by laser exposure as in the present example. Recognize. Therefore, it can be said that the lithographic printing plate precursor to which the present invention is applied exhibits high productivity.

Claims (4)

(A) Alkali-soluble polyurethane resin having a side chain structure represented by the following general formula (I) and a side chain structure represented by the following general formula (II) in the molecule, (B) ethylenic acid capable of addition polymerization A polymerizable composition comprising a compound having an unsaturated bond and (C) a light or thermal polymerization initiator.

(In general formula (I), U represents a polyurethane main chain skeleton, L ³ represents a linking group, and n represents an integer of 1 to 5.)

(In the general formula (II), U represents a polyurethane backbone skeleton, .P L ⁶ is a single bond or a linking group represents a functional group capable of being a group by alkaline hydrolysis. However, linked L ⁶ is In the case of representing a group, the number of atoms constituting the main skeleton of the linking group is 1 or more and 6 or less.)   A lithographic printing plate precursor comprising a photosensitive layer containing the polymerizable composition according to claim 1 on a support. It is an alkali-soluble polyurethane resin used for the polymerizable composition according to claim 1, wherein the side chain structure represented by the following general formula (I) and the side represented by the following general formula (II) are present in the molecule. An alkali-soluble polyurethane resin having a chain structure.

(In general formula (I), U represents a polyurethane main chain skeleton, L ³ represents a linking group, and n represents an integer of 1 to 5.)

(In the general formula (II), U represents a polyurethane backbone skeleton, .P L ⁶ is a single bond or a linking group represents a functional group capable of being a group by alkaline hydrolysis. However, linked L ⁶ is In the case of representing a group, the number of atoms constituting the main skeleton of the linking group is 1 or more and 6 or less.) The alkali-soluble polyurethane resin according to claim 3, obtained by using a compound represented by the following general formula (I-1) and a compound represented by the following general formula (II-1) as raw materials.

(In General Formula (I-1), X ¹ represents a trivalent or higher valent atom. L ¹ and L ² each independently represent an alkylene group which may have a single bond or a substituent, (L ¹ and L ² are not single bonds, L ³ represents a linking group, and n represents an integer of 1 to 5.)

(In General Formula (II-2), X ² represents a trivalent or higher valent atom. L ⁴ and L ⁵ each independently represents an alkylene group which may have a single bond or a substituent, Both L ⁴ and L ⁵ do not form a single bond, L ⁶ represents a single bond or a linking group, and P represents a functional group that can become an acid group by alkaline hydrolysis, provided that L ⁶ is a linking group. Represents the number of atoms constituting the main skeleton of the linking group is 1 or more and 6 or less.)