JP2009048980A - Electro-optical device and manufacturing method of electro-optical device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electro-optical device which can apply a liquid composition in a predetermined area without forming barrier ribs called as bank with a big height dimension and provide its manufacturing method. <P>SOLUTION: In a manufacturing process of an organic EL device 100, when a hole injection layer 12a of an organic functional layer 12 is formed by a droplet discharge method, a forming area of the hole injection layer 12a is surrounded by a liquid repellant area 4 formed by a plasma treatment on a surface of a resin layer 17, and a pixel electrode 11 on an upper layer of which there is formed the hole injection layer 12a and a surface of a pixel separation insulating membrane 18 are used as a lyophilic area 3a. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an electro-optical device provided with a coating film formed by a coating method on an upper layer side of a resin layer, and an electro-optical device.

Liquid crystal devices and organic electroluminescence (hereinafter referred to as EL (Electroluminescence)) devices are used as color display devices for electronic devices such as mobile phones, personal computers, and PDAs (Personal Digital Assistants). In manufacturing such an electro-optical device, it is necessary to form an organic functional layer of each color such as a color filter or a light emitting layer of an organic EL element. When forming such an organic functional layer, a coating method such as an inkjet method is used. It has been proposed. In addition, it has been proposed to form partition walls on the substrate that define the functional layer formation region when forming the organic functional layer so that the liquid composition for forming the organic functional layer does not protrude into adjacent pixels. Such a partition wall is also called a bank because of its high height (see, for example, Patent Documents 1 and 2).
JP 2004-103502 A JP 2004-198486 A

  However, when partition walls are formed in an organic EL device, when a liquid composition is applied to the inside of the organic EL device, the liquid composition is pushed away by the liquid repellency of the partition walls, and film thickness unevenness is likely to occur in the organic functional layer. There is. In addition, when the partition walls are formed, large irregularities are formed on the surface, and as a result, there is a problem that the counter electrode layer cannot be suitably formed. However, if the formation of the barrier ribs is omitted, for example, when an organic EL device for color display is manufactured, the green (G) or blue (B ) Protrudes into the pixel.

  In view of the above problems, an object of the present invention is to provide an electro-optical device capable of applying a liquid composition in a predetermined region without forming a partition wall having a large height called a bank, and It is in providing the manufacturing method.

  In order to solve the above problems, in the present invention, in an electro-optical device including a resin layer and a coating film formed in a predetermined region by a coating method on the upper layer side of the resin layer, the surface side of the resin layer Formed with a lyophilic region formed in the coating film forming region and a lyophobic region surrounding the lyophilic region, the lyophobic region being formed on the surface of the resin layer. It is formed by.

  In the present invention, in a method of manufacturing an electro-optical device, which includes a resin layer and a coating film formed in a predetermined region by a coating method on the upper side of the resin layer, a liquid composition for forming the coating film Is applied to the surface side of the resin layer, a lyophilic region is formed in the formation region of the coating film on the surface side of the resin layer and surrounds the lyophilic region. In addition, a liquid-repellent region made of the surface of the resin layer is formed.

  In the present invention, when the liquid composition for forming the coating film is applied to the surface side of the resin layer, a lyophilic region is formed in the formation region of the coating film on the upper side of the resin layer. In order to surround the lyophilic region with the lyophobic region, the liquid composition is selectively applied in the lyophilic region, so that it is prevented from inadvertently protruding from the predetermined region. Can do. Here, since the liquid repellent region is formed by the surface of the resin layer itself, it is not necessary to form a partition around the region where the coating film is formed. Therefore, since the liquid composition is not pushed away by the liquid repellency of the partition walls, it is possible to prevent the occurrence of film thickness unevenness in the coating film. Moreover, since it is not necessary to form a partition, a large unevenness | corrugation is not formed on the upper layer side of the resin layer.

  In the present invention, the lyophilic region is formed by an inorganic film formed on the surface of the resin layer, and the liquid repellent region is a region where a liquid repellent treatment is performed on the surface of the resin layer. A configuration can be employed. With this configuration, it is possible to provide a large difference in the affinity of the liquid composition between the lyophilic region composed of the surface of the inorganic film and the liquid repellent region. Inadvertent protrusion can be surely prevented.

  In the present invention, the resin layer is constituted by using a liquid repellent resin material, and the lyophilic region is constituted by a region having a lyophilic treatment on the surface of the resin layer, and the liquid repellency About the area | region, you may comprise by the area | region where the said lyophilic process is not performed among the surfaces of the said resin layer. For example, in the resin layer, if the photocatalyst particles whose lyophilicity is increased by the light irradiation treatment as the lyophilic treatment is dispersed in the lyophobic resin material, the lyophilic region is the resin layer. The surface of the resin layer can be constituted by the region subjected to the light irradiation treatment, and the liquid repellent region can be constituted by a region of the surface of the resin layer that has not been subjected to the light irradiation treatment.

  The present invention can be applied to an organic EL device. In this case, on the upper side of the resin layer, a plurality of pixel electrodes made of an inorganic conductive film, an inorganic insulating film surrounding the pixel electrode, and an organic EL layered on the pixel electrode and the inorganic insulating film. An organic functional layer for the device and a counter electrode layer stacked on the upper layer side of the organic functional layer are provided.

  In such an organic EL device, the organic functional layer may include a layer formed by a coating method using the surface of the pixel electrode and the inorganic insulating film as the lyophilic region as the coating film. Can do. If comprised in this way, about an inorganic insulating film, it can be comprised as a pixel separation film between adjacent pixels, and there exists an advantage that it is not necessary to add a new inorganic insulating film.

  In the organic EL device to which the present invention is applied, it is possible to adopt a configuration in which the pixel electrode is formed on the lyophilic region as the coating film.

  In the organic EL device to which the present invention is applied, when the auxiliary wiring layer includes an auxiliary wiring layer that passes between adjacent pixel electrodes on the surface side of the resin layer and is electrically connected to the counter electrode layer, A configuration in which the coating film is formed on the lyophilic region can be employed.

  The present invention is preferably applied when a transistor electrically connected to the pixel electrode is formed on the lower layer side of the resin layer. With this configuration, the unevenness generated by the transistor can be planarized with the resin film.

  In the present invention, the pixel electrode may be formed on each of a plurality of pixels corresponding to a plurality of colors. In this case, the organic functional layer is formed independently on each of the plurality of pixels. A configuration including a light emitting layer can be employed.

  In the present invention, the pixel electrode is formed in each of a plurality of pixels corresponding to each of a plurality of colors, and the organic functional layer includes a light emitting layer formed across a plurality of pixels corresponding to the same color. An included configuration may be employed.

  In the present invention, in the plurality of pixels, it is preferable that a gap size between adjacent pixels corresponding to the same color is narrower than a gap size between adjacent pixels corresponding to different colors.

  The electro-optical device to which the present invention is applied is used, for example, in an electronic apparatus such as a mobile phone, a personal computer, or a PDA that includes the electro-optical device as a display unit.

  Embodiments of the present invention will be described with reference to the drawings. In the drawings used for the following description, the scales are different for each layer and each member in order to make each layer and each member large enough to be recognized on the drawing. In the following description, a common configuration in each embodiment will be described before each embodiment is described.

[Summary of Invention]
(First basic form of the present invention)
A first basic form of the present invention will be described with reference to FIG. FIG. 1 is an explanatory view showing a first basic form of the present invention, schematically showing a cross-sectional view when forming a coating film on the left side portion thereof, and a plan view when forming a coating film on the right side portion. Is shown schematically.

  When forming the coating film 2 on the upper layer side of the resin layer 17 as shown in FIG. 1C by using a droplet discharge method such as an inkjet method, in this embodiment, as shown in FIG. The lyophilic region 3 where the coating film 2 is formed and the lyophobic region 4 surrounding the lyophilic region 3 are formed on the surface side of the resin layer 17. Here, the liquid repellent region 4 is formed by the surface of the resin layer 17.

In forming the lyophilic region 3 and the lyophobic region 4, according to the present invention, first, a film formed by sputtering or the like on the surface of the resin layer 17 is etched using a photolithography technique to form the inorganic film 5. After the formation, oxygen plasma treatment (O ₂ plasma treatment) is performed to activate the surfaces of the resin layer 17 and the inorganic film 5, thereby making the surface of the inorganic film 5 lyophilic. Next, CF ₄ plasma treatment is performed as a liquid repellent treatment. As a result, in the surface of the resin layer 17, the liquid-repellent region 4 is formed by the region imparted with liquid repellency by fluorination, and the lyophilic region 3 is formed by the surface of the inorganic film 5.

  Next, as shown in FIG. 1B, droplets of the liquid composition M are discharged to the lyophilic region 3 using a droplet discharge method such as an ink jet method, so that the liquid composition M is lyophilic. After application to the region 3, the solvent is evaporated from the liquid composition M and dried to form a coating film 2 shown in FIG.

  According to such a method, when the liquid composition M for forming the coating film 2 is applied to the surface side of the resin layer 17, the periphery of the lyophilic region 3 is surrounded by the liquid repellent region 4. Therefore, the liquid composition M is selectively applied in the lyophilic region 3 and does not inadvertently protrude from the predetermined region. Here, since the liquid repellent region 4 is formed by the surface of the resin layer 17, it is not necessary to form a partition around the region where the coating film 2 is formed. Therefore, since the liquid composition M is not pushed away due to the liquid repellency of the partition walls, it is possible to prevent the coating film 2 from being uneven in film thickness. Further, since it is not necessary to form a partition wall, large unevenness is not formed on the upper layer side of the resin layer 17. Note that a jet dispenser method or a dispenser method may be employed as a droplet discharge method other than the ink jet method.

(Second basic form of the present invention)
The second basic form of the present invention will be described with reference to FIG. FIG. 2 is an explanatory view showing a second basic form of the present invention, schematically showing a cross-sectional view when forming a coating film on the left side portion thereof, and a plan view when forming a coating film on the right side portion thereof. Is shown schematically.

  When forming the coating film 2 on the upper layer side of the resin layer 17 as shown in FIG. 2C by using a droplet discharge method such as an inkjet method, in this embodiment, as shown in FIG. On the surface side of the resin layer 17, a lyophilic region 3 formed in the formation region of the coating film 2 and a lyophobic region 4 surrounding the lyophilic region 3 are formed. Here, the liquid repellent region 4 is formed by the surface of the resin layer 17.

  In forming the lyophilic region 3 and the lyophobic region 4, in the present invention, the resin layer 17 is configured using a lyophobic resin material, and the lyophilic region 3 is formed on the surface of the resin layer 17. The lyophobic region 4 is formed of a region of the surface of the resin layer 17 that has not been lyophilicized. For example, in the resin layer 17, photocatalyst particles such as titanium oxide whose lyophilic property is increased by a light irradiation process as a lyophilic process are dispersed in a liquid repellent resin material such as a fluororesin. Is constituted by a region where the surface of the resin layer 17 is subjected to light irradiation treatment, and the liquid repellent region 4 is constituted by a region of the surface of the resin layer which is not subjected to light irradiation treatment.

  Next, as shown in FIG. 2 (b), after droplets of the liquid composition M are ejected onto the lyophilic region 3 using an ink jet method, the liquid composition M is applied to the lyophilic region 3. Then, the solvent is evaporated from the liquid composition M and dried to form the coating film 2 shown in FIG.

  According to such a method, when the liquid composition M for forming the coating film 2 is applied to the surface side of the resin layer 17, the periphery of the lyophilic region 3 is surrounded by the liquid repellent region 4. Therefore, the liquid composition M is selectively applied in the lyophilic region 3 and does not inadvertently protrude from the predetermined region. Here, since the liquid repellent region 4 is formed by the surface of the resin layer 17, it is not necessary to form a partition around the region where the coating film 2 is formed. Therefore, since the liquid composition M is not pushed away due to the liquid repellency of the partition walls, it is possible to prevent the coating film 2 from being uneven in film thickness. Further, since it is not necessary to form a partition wall, large unevenness is not formed on the upper layer side of the resin layer 17.

[Overall configuration of organic EL display device]
A configuration of an organic EL device as an example of an electro-optical device to which the present invention is applied will be described with reference to FIGS. 3 and 4 are a plan view of an organic EL device (electro-optical device) to which the present invention is applied, and a block diagram showing an electrical configuration of the organic EL device.

  3 and 4, an organic EL device 100 is an organic EL device that drives and controls an EL element that emits light when a drive current flows through a light emitting layer by using a thin film transistor, and this type of EL device is used as a display device. Since the light emitting element self-emits, there is an advantage that a backlight is not required and the viewing angle dependency is small. In the organic EL device 100 shown here, a rectangular light emitting region 110 in which a plurality of pixels 10a are arranged in a matrix form in a substantially central region on the element substrate 20 and a rectangular frame shape surrounding the light emitting region 110 on the outer peripheral side. The non-light emitting region 120 is formed with a pair of scanning line driving circuits 54 in opposite regions, and the data line driving circuit 51 and the inspection circuit in other opposing regions. 58 is formed.

  In the light emitting region 110, a plurality of scanning lines 63, a plurality of data lines 64 extending in a direction intersecting with the extending direction of the scanning lines 63, and a plurality of common supplies parallel to the data lines 64 are provided. An electric wire 65 is formed, and a pixel 10a is configured corresponding to the intersection of the data line 64 and the scanning line 63. For the data line 64, data including a shift register, a level shifter, a video line, and an analog switch. A line drive circuit 51 is configured. A scanning line driving circuit 54 including a shift register and a level shifter is configured for the scanning line 63. Each of the pixels 10a includes a pixel switching thin film transistor 6 to which a scanning signal is supplied to the gate electrode via the scanning line 63, and a storage capacitor for holding an image signal supplied from the data line 64 via the thin film transistor 6. 33, the current control thin film transistor 7 to which the image signal held by the storage capacitor 33 is supplied to the gate electrode, and the common power supply line 65 when electrically connected to the common power supply line 65 through the thin film transistor 7. An organic EL element 10 into which a drive current flows is configured. The organic EL device 100 of this embodiment is for color display, and each pixel 10a corresponds to red (R), green (G), and blue (B). Here, in the plurality of pixels 10a, corresponding pixels having the same color are arranged in a straight line.

[Embodiment 1]
(Pixel configuration)
5A and 5B are a cross-sectional view schematically showing a planar configuration of a light emitting region of the organic EL device according to Embodiment 1 of the present invention, and a cross-sectional view thereof taken along A1-A1 ′. 6A and 6B are a plan view schematically showing a state before the organic functional layer is formed in the steps of manufacturing the organic EL device according to Embodiment 1 of the present invention, and the organic It is a top view which shows typically the mode after forming a functional layer. In addition, this form utilizes the 1st basic form demonstrated with reference to FIG.

  In the organic EL device 100 of this embodiment, in the light emitting region 110 on the element substrate 20, as shown in FIG. 5A, a plurality of pixels 10a (pixel electrodes 4) are arranged in a matrix. The planar shape of the pixel 10a may be any shape such as a circle, an ellipse, or a square. However, since the liquid composition has surface tension, in this embodiment, the pixel 10a has a rounded corner. Is formed to have an elliptical planar shape. However, in FIGS. 6A and 6B, the plurality of pixels 10a (pixel electrodes 4) are shown to have a rectangular planar shape.

  For example, as shown in FIG. 5B, the element substrate 20 is formed of a thin film transistor 7 shown in FIG. 4, an interlayer insulating film 16 made of a silicon oxide film, a resin made of an acrylic resin, etc. on a substrate 20b as a base. A pixel electrode 11 made of a transparent conductive film such as an ITO (Indium Tin Oxide) film, a pixel isolation insulating film 18 made of a silicon oxide film, the organic functional layer 12, and a cathode layer 15. (Counter electrode layer) is expressed as being formed in this order, and the organic EL element 10 is formed by the pixel electrode 11, the organic functional layer 12, and the cathode layer 15. In this embodiment, the organic functional layer 12 includes a hole injection layer 12a stacked on the pixel electrode 11 and a light emitting layer 12b stacked on the hole injection layer 12a.

  In the organic EL device 100 having such a configuration, when the organic EL device 100 is a top emission type that emits light emitted from the organic EL element 10 from the cathode layer 15 side, the substrate 20b may be opaque. Further, a ceramic substrate such as alumina, a substrate obtained by subjecting a metal sheet such as stainless steel to an insulation treatment such as surface oxidation, a resin substrate, or the like can be used. On the other hand, when the organic EL device 100 is a bottom emission type that emits light emitted from the organic EL element 10 from the substrate 20b side, a transparent substrate such as glass is used as the substrate 20b. A structure in which a sealing film made of a silicon nitride film or the like is formed on the surface side of the cathode layer 15 so that the organic functional layer 12 and the cathode layer 15 are not deteriorated by moisture or oxygen, or through an adhesive layer. The structure which stuck the sealing substrate is employ | adopted.

  Here, both the hole injection layer 12a and the light emitting layer 12b are the coating films described with reference to FIG. 1, but the organic functional layer 12 has a high height dimension called a so-called bank. No partition wall is formed. Instead, in this embodiment, as shown in FIG. 6A, a lyophilic region 3a is formed on the surface side of the resin layer 17 in the formation region of the organic functional layer 12 (coating film). The lyophilic region 3 a is surrounded by a liquid repellent region 4. For this reason, as shown in FIG. 6B, both the hole injection layer 12a and the light emitting layer 12b are independently formed in each of the plurality of pixels 10a and protrude toward the adjacent pixels 10a. Absent.

  In forming the lyophilic region 3a and the lyophobic region 4, in this embodiment, as will be described in detail later with reference to FIG. 7, the surface of the pixel electrode 11 and the pixel isolation insulating film 18 makes the lyophilic property. The region 3 a is formed, and the liquid repellent region 4 is formed by the surface of the resin layer 17.

(Method for manufacturing organic EL device)
FIG. 7 is a process cross-sectional view schematically showing a process after forming the pixel electrode and the pixel separation insulating film in the process of manufacturing the organic EL device according to the first embodiment of the present invention.

  In order to manufacture the organic EL device 100 of this embodiment, first, as shown in FIG. 7A, a thin film transistor 7, an interlayer insulating film 16 made of a silicon oxide film, a resin made of an acrylic resin, etc. on a substrate 20b. A layer 17, a pixel electrode 11 made of a light-transmitting conductive film such as an ITO film, and a pixel isolation insulating film 18 made of a silicon oxide film are formed. Here, the resin layer 17 is a planarizing film that prevents the unevenness caused by the thin film transistor 7 and the like from reflecting to the upper layer side. The pixel electrode 11 and the pixel isolation insulating film 18 can be formed by forming a film by a sputtering method, a vacuum evaporation method, a CVD method, or the like and then patterning using a photolithography technique.

Next, oxygen plasma treatment (O ₂ plasma treatment) is performed to activate the surfaces of the resin layer 17, the pixel electrode 11, and the pixel isolation insulating film 18 to make them lyophilic, and then a CF ₄ plasma treatment as a lyophobic treatment. The exposed portion of the surface of the resin layer 17 is fluorinated to impart liquid repellency. As a result, as shown in FIGS. 6A and 7B, the lyophilic region 3a is formed by the surfaces of the pixel electrode 11 and the pixel isolation insulating film 18, and the surface of the resin layer 17 is liquid repellent. Region 4 is formed.

  Next, as shown in FIG. 7C, the liquid composition 12e containing the hole injection layer forming material is applied from the inkjet head to the lyophilic region 3a (the surface of the pixel electrode 11 and the pixel isolation insulating film 18). The liquid composition 12e for forming the hole injection layer is applied to the lyophilic region 3a. Next, the solvent is removed by a vacuum and / or heat treatment or a flow of nitrogen gas or the like to form a hole injection layer 12a as shown in FIG.

  Examples of the liquid composition 12e for forming the hole injection layer include 3,4-polyethylenediosithiophene / polystyrenesulfonic acid (PEDOT / PSS), which is a polyolefin derivative, and polytetrahydrothiophenylphenylene as a polymer precursor. A composition in which a hole injection / transport layer forming material such as polyphenylene vinylene, 1,1-bis- (4-N, N-ditolylaminophenyl) cyclohexane or the like is dissolved in a polar solvent can be used. Examples of the polar solvent include isopropyl alcohol, normal butanol, γ-butyrolactone, N-methylpyrrolidone, 1,3-dimethyl-2-imidazolidinone and its derivatives, glycol ethers such as carbitol acetate and butyl carbitol acetate. And the like. As the hole injection forming material, the same material may be used in each of the red (R), green (G), and blue (B) pixels 10a, and the composition may be changed in each pixel 10a.

  In this embodiment, a 50% aqueous solution of diethylene glycol is used as a polar solvent, and after applying the liquid composition 12e for forming the hole injection layer, vacuum drying is performed, and then on a hot plate in a nitrogen atmosphere. The liquid composition 12e is dried by heat treatment at 200 ° C. for 10 minutes to form the hole injection layer 12a having a thickness of 50 nm.

  Next, as shown in FIG. 7E, a liquid composition 12f containing a light emitting layer forming material is ejected from the inkjet head toward the surface of the hole injection layer 12a to form the light emitting layer on the hole injection layer 12a. The liquid composition 12f is applied. Next, the solvent is removed by a vacuum and / or heat treatment or a flow of nitrogen gas or the like to form the light emitting layer 12b as shown in FIG. At that time, the surface of the hole injection layer 12a functions as the lyophilic region 3b for the liquid composition 12f for forming the light emitting layer, and the surface of the resin layer 17 functions as the lyophobic region 4.

  Here, in order to form a layer corresponding to each color of red, green, and blue as the light emitting layer 12b, a liquid composition for the red light emitting layer, a green light emitting material, using a polyfluorene-based material that emits light in these colors. The liquid composition for the layer and the liquid composition for the blue light emitting layer are prepared, and after applying all of these liquid compositions 12f to the lyophilic region 3a corresponding to the predetermined color, the liquid composition 12f is dried, The light emitting layer 12b for each color is formed.

  Examples of the liquid composition 12f for forming the light emitting layer include polyfluorene derivatives, polyphenylene derivatives, polyvinyl carbazole, polythiophene derivatives, or polymer materials such as perylene dyes, coumarin dyes, rhodamine dyes such as rubrene. , Perylene, 9,10-diphenylanthracene, tetraphenylbutadiene, nile red, coumarin 6, quinacridone and the like are mixed with a non-polar solvent. As a light-emitting layer forming material, a π-conjugated polymer material in which double-bonded π electrons are non-polarized on a polymer chain is also a conductive polymer, so that it has excellent light-emitting performance and is therefore preferably used. . In particular, a compound having a fluorene skeleton in the molecule, that is, a polyfluorene compound is more preferably used. In addition to such materials, for example, a composition for an organic EL device disclosed in JP-A-11-40358, that is, a precursor of a conjugated polymer organic compound, and at least one kind for changing light emission characteristics A composition for an organic EL device comprising the above fluorescent dye can also be used as a light emitting layer forming material. Moreover, as a nonpolar solvent, what is insoluble with respect to the positive hole injection layer 12a is preferable, for example, cyclohexylbenzene, dihydrobenzofuran, trimethylbenzene, tetramethylbenzene, etc. can be used.

  In this embodiment, in any of the liquid composition for the red light emitting layer, the liquid composition for the green light emitting layer, and the liquid composition for the blue light emitting layer, cyclohexylbenzene is used as a nonpolar solvent for forming the light emitting layer. After applying the liquid composition 12f, vacuum drying is performed, and then the liquid composition is dried by heat treatment at 130 ° C. for 1 hour on a hot plate in a nitrogen atmosphere to obtain a light emitting layer having a thickness of 100 nm. 12b is formed. The kind of the nonpolar solvent may be changed in the liquid composition for the red light emitting layer, the liquid composition for the green light emitting layer, and the liquid composition for the blue light emitting layer. For example, the liquid composition for the red light emitting layer For example, triethylbenzene may be used, cyclohexylbenzene may be used for the liquid composition for the green light-emitting layer, and isopropylbiphenyl may be used for the liquid composition for the blue light-emitting layer.

  Thus, after forming the organic functional layer 12 which consists of the positive hole injection layer 12a and the light emitting layer 12b, the cathode layer 15 shown in FIG.5 (b) is formed. For example, as the cathode layer 15, a laminated film of a lithium fluoride layer having a thickness of 5 nm and an aluminum layer having a thickness of 300 nm is formed by vacuum heating vapor deposition or the like, and then sealing is performed.

(Main effects of this form)
As described above, in this embodiment, since the resin layer 17 is formed on the upper layer side of the thin film transistor 7, the unevenness caused by the thin film transistor 7 is not reflected on the upper layer side. Therefore, the pixel electrode 11 and the organic functional layer 12 can be formed in a flat region.

  Further, when the liquid composition 12e for forming the hole injection layer 12a (coating film) is applied to the surface side of the resin layer 17, the lyophilic region 3a (the surface of the pixel electrode 11 and the pixel separation insulating film 18) is applied. ) Is surrounded by the liquid repellent region 4 (the surface of the resin layer 17), the liquid composition 12e is selectively applied in the lyophilic region 3a and inadvertently protrudes from the predetermined region. This can be prevented. Here, since the liquid repellent region 4 is formed by the surface of the resin layer 17 itself, it is not necessary to form a partition around the region where the hole injection layer 12a is formed. Therefore, since the liquid composition 12e is not pushed away by the liquid repellency of the partition walls, it is possible to prevent the film thickness unevenness from occurring in the hole injection layer 12a (liquid composition 12e). Moreover, since it is not necessary to form a partition, a large unevenness | corrugation is not formed in the upper layer side (surface side of the board | substrate 10b) of the resin layer 17 wastefully.

  Furthermore, in this embodiment, when the liquid composition 12f for forming the light emitting layer 12b (coating film) is applied to the surface side of the resin layer 17, the surface of the hole injection layer 12a functions as the lyophilic region 3b. The lyophilic region 3b (hole injection layer 12a) is surrounded by the liquid repellent region 4 (the surface of the resin layer 17). For this reason, the liquid composition 12f can be selectively applied in the lyophilic region 3b and can be prevented from inadvertently protruding from the predetermined region.

[Embodiment 2]
FIGS. 8A, 8B, and 8C are each a plan view schematically showing a state before the organic functional layer is formed in the process of manufacturing the organic EL device according to the second embodiment of the present invention. The figure and the top view which shows typically the mode after forming an organic functional layer, and the cross section which shows typically a mode that the organic EL apparatus was cut | disconnected in the position corresponded to the A2-A2 'line of Fig.8 (a) FIG. Since the basic configuration of the present embodiment is the same as that of the first embodiment, common portions are denoted by the same reference numerals, and detailed description thereof is omitted. Moreover, this form utilizes the first basic form described with reference to FIG.

  In Embodiment 1, both the hole injection layer 12a and the light emitting layer 12b are formed independently for each pixel 10a. However, as shown in FIG. 8A, the same color is used in the plurality of pixels 10a. The gap dimension L2 between adjacent pixels corresponding to is narrower than the gap dimension L1 between adjacent pixels corresponding to different colors. Accordingly, in this embodiment, as shown in FIGS. 8B and 8C, the hole injection layer 12a having a low electrical resistance is formed independently for each pixel 10a, while the light emitting layer having a high electrical resistance is formed. 12b is formed across a plurality of pixels 10a corresponding to the same color. If comprised in this way, when forming the light emitting layer 12b by the apply | coating method, the liquid composition for light emitting layer formation can be apply | coated efficiently. Since the organic EL device 100 having such a structure can be manufactured by the same method as in the first embodiment, the description thereof is omitted.

[Embodiment 3]
FIGS. 9A, 9B, and 9C are planes schematically showing the state before forming the organic functional layer in the steps of manufacturing the organic EL device according to Embodiment 3 of the present invention. The figure and the top view which shows typically the mode after forming auxiliary wiring, and sectional drawing which shows typically a mode that the organic electroluminescent apparatus was cut | disconnected in the position corresponded to the A3-A3 'line of Fig.9 (a) It is. Since the basic configuration of the present embodiment is the same as that of the first embodiment, common portions are denoted by the same reference numerals, and detailed description thereof is omitted. Moreover, this form utilizes the first basic form described with reference to FIG.

  In the first embodiment, since the pixel separation insulating film 18 is formed independently for each pixel 10a, the lyophilic region 3a (the surface of the pixel electrode 11 and the pixel separation insulating film 18) is also formed for each pixel 10a. It is formed independently. Therefore, although both the hole injection layer 12a and the light emitting layer 12b are formed independently for each pixel 10a, as shown in FIG. 9A, the hole injection layer 12a and the light emitting layer 12b straddle a plurality of pixels 10a corresponding to the same color. Thus, the pixel isolation insulating film 18 made of a silicon oxide film or the like may be formed in a strip shape.

  In this case, since the lyophilic region 3a (the surface of the pixel electrode 11 and the pixel separation insulating film 18) is formed in a strip shape across the plurality of pixels 10a, both the hole injection layer 12a and the light emitting layer 12b are formed. In this case, the strip is formed across the plurality of pixels 10a. With this configuration, when the hole injection layer 12a and the light emitting layer 12b are formed by a coating method, the liquid composition for forming the hole injection layer and the liquid composition for forming the light emitting layer are efficiently applied. Can do. Since the organic EL device 100 having such a structure can be manufactured by the same method as in the first embodiment, the description thereof is omitted.

[Embodiment 4]
(Pixel configuration)
FIGS. 10A and 10B are a cross-sectional view schematically showing a planar configuration of a light emitting region of an organic EL device according to Embodiment 4 of the present invention, and a cross-sectional view thereof taken along line A4-A4 ′. FIGS. 11A and 11B are plan views schematically showing a state before the pixel organic functional layer is formed in the steps of manufacturing the organic EL device according to Embodiment 4 of the present invention, and It is a top view which shows typically the mode after forming an organic functional layer. Moreover, this form utilizes the first basic form described with reference to FIG.

  As shown in FIG. 10A, also in the organic EL device 100 of this embodiment, a plurality of pixels 10a (pixel electrodes 4) are arranged in a matrix in the light emitting region 110 on the element substrate 20 as in the first embodiment. Has been placed. For example, as shown in FIG. 10B, the element substrate 20 is formed on a substrate 20b as a base, a thin film transistor 7 shown in FIG. 4, an interlayer insulating film 16 made of a silicon oxide film, a resin made of an acrylic resin, or the like. A layer 17 (planarization layer), a pixel electrode 11 made of a light-transmitting conductive film such as an ITO film, a pixel isolation insulating film 18 made of a silicon oxide film, the organic functional layer 12, and a cathode layer 15 are formed in this order. The organic EL element 10 is formed by the pixel electrode 11, the organic functional layer 12, and the cathode layer 15.

  Here, both the hole injection layer 12a and the light emitting layer 12b are the coating films described with reference to FIG. 1, but the organic functional layer 12 has a high height dimension called a so-called bank. No partition wall is formed. Instead, in this embodiment, as shown in FIGS. 10B and 11A, the pixel electrode 11 and the pixel isolation insulating film 18 are formed on the surface side of the resin layer 17 as in the first embodiment. A lyophilic region 3 a is formed by the surface, and a lyophobic region 4 is formed by the surface of the resin layer 17.

  In the organic EL device 100 having such a configuration, in this embodiment, the organic EL device 100 is configured as a top emission type in which light emitted from the organic EL element 10 is emitted from the cathode layer 15 side. For this reason, the cathode layer 15 has a small film thickness and a large electrical resistance. Therefore, in this embodiment, as shown in FIGS. 10A and 10B, the auxiliary wiring 19a is formed in the lower layer of the cathode layer 15 in the region between adjacent pixels corresponding to different colors, and the auxiliary wiring 19a. Is electrically connected to the cathode layer 15. Therefore, the auxiliary wiring 19a can solve the problem caused by the large electrical resistance of the cathode layer 15.

  Here, the auxiliary wiring 19a is formed by using a liquid composition (metal fine particle dispersion) in which metal fine particles such as copper, nickel, cobalt, silver, molybdenum, and titanium are dispersed in a dispersion medium, an inkjet method, a jet dispenser method, It is a coating-type metal film that is applied by a coating method such as a droplet coating method such as a dispenser method or a transfer method and then heat-treated. However, in this embodiment, a partition for defining the application range of the formation position (liquid composition) of the auxiliary wiring 19a is not formed around the auxiliary wiring 19a, but on the lower layer side of the auxiliary wiring 19 An inorganic film 14 formed simultaneously with the pixel electrode 11 or the pixel separation insulating film 18 is formed. Due to the inorganic film 14, a lyophilic region 3c is formed on the surface of the resin layer 17, The liquid repellent region 4 is formed by the surface of the resin layer 17.

(Method for manufacturing organic EL device)
FIG. 12 is a process cross-sectional view schematically showing a process after forming the pixel electrode and the pixel separation insulating film in the process of manufacturing the organic EL device according to the fourth embodiment of the present invention.

  In order to manufacture the organic EL device 100 of this embodiment, first, as shown in FIG. 12A, a thin film transistor 7, an interlayer insulating film 16 made of a silicon oxide film, a resin made of an acrylic resin, etc. on a substrate 20b. A layer 17, a pixel electrode 11 made of a light-transmitting conductive film such as an ITO film, and a pixel isolation insulating film 18 made of a silicon oxide film are formed. At that time, as shown in FIG. 10B and FIG. 11A, the inorganic film 14 is applied to the pixel electrode 11 or the pixel in the region where the auxiliary wiring 19a is to be formed in the region between adjacent pixels corresponding to different colors. It is formed simultaneously with the isolation insulating film 18.

Next, by performing an oxygen plasma treatment (O ₂ plasma treatment), the resin layer 17, the pixel electrode 11, after activating the surface of the pixel isolation insulating film 18 and the inorganic film 14, as the liquid-repellent treatment, CF ₄ Plasma treatment is performed to fluorinate the surface of the resin layer 17 and impart liquid repellency. As a result, the lyophilic region 3a is formed by the surface of the pixel electrode 11 and the pixel separation insulating film 18, the lyophilic region 3c is formed by the surface of the inorganic film 14, and the lyophobic region is formed by the surface of the resin layer 17. 4 is formed.

  Next, as shown in FIG. 11B and FIG. 12B, the liquid composition containing the hole injection layer forming material is transferred from the inkjet head to the lyophilic region 3a (the pixel electrode 11 and the pixel separation insulating film). 18 surface), and after applying the liquid composition for forming the hole injection layer to the lyophilic region 3a, the solvent is removed by vacuum and / or heat treatment, or a flow of nitrogen gas, The hole injection layer 12a is formed. Next, a liquid composition containing a light emitting layer forming material is discharged from the ink jet head toward the surface of the hole injection layer 1, and the liquid composition for forming the light emitting layer is applied to the hole injection layer 12a. Next, the solvent is removed by a vacuum and / or heat treatment or a flow of nitrogen gas or the like to form the light emitting layer 12b. At that time, the surface of the hole injection layer 12a functions as the lyophilic region 3b for the liquid composition for forming the light emitting layer, and the surface of the resin layer 17 functions as the lyophobic region 4. In this way, the organic functional layer 12 composed of the hole injection layer 12a and the light emitting layer 12b is formed.

  Next, as shown in FIG. 12C, the surface of the inorganic film 14 (lyophilic region 3c) formed between adjacent pixels corresponding to different colors is subjected to copper, nickel, cobalt, silver, After applying a liquid composition 19e (metal fine particle dispersion) in which metal fine particles such as molybdenum and titanium are dispersed in a dispersion medium by a droplet coating method such as an ink jet method, a jet dispenser method, or a dispenser method, or a transfer method. Then, heat treatment is performed to form auxiliary wiring 19 (coating metal film) as shown in FIG. Thereafter, after the cathode layer 15 shown in FIG. 10B is formed, sealing is performed.

(Main effects of this form)
As described above, in this embodiment, when the hole injection layer 12a (coating film) is formed by a coating method, the surfaces of the pixel electrode 11 and the pixel separation insulating film 18 function as the lyophilic region 3a. The surface of the resin layer 17 functions as the liquid repellent region 4. Further, when the light emitting layer 12b (coating film) is formed by a coating method, the surface of the hole injection layer 12a functions as the lyophilic region 3b, and the surface of the resin layer 17 functions as the lyophobic region 4. . Further, when the auxiliary wiring 19 (coating film) is formed by a coating method, the surface of the inorganic film 14 formed simultaneously with the pixel electrode 11 or the pixel separating insulating film 18 functions as the lyophilic region 3c, and the resin layer The surface of 17 functions as the liquid repellent region 4. Therefore, a coating film such as the hole injection layer 12a, the hole injection layer 12a, and the auxiliary wiring 19 can be formed in a predetermined region without forming a partition wall. When the inorganic film 14 is formed simultaneously with the pixel electrode 11 by the ITO film, the inorganic film 14 (ITO film) itself can be used as a part of the auxiliary wiring 19 to reduce the electrical resistance of the auxiliary wiring 19. There is an advantage that can be.

[Embodiment 5]
FIGS. 13A, 13B, and 13C are each a plan view schematically showing a state immediately before forming a pixel electrode in a process of manufacturing an organic EL device according to Embodiment 5 of the present invention. , And a plan view schematically showing the state after the organic functional layer is formed, and a cross-sectional view schematically showing a state in which the organic EL device is cut at a position corresponding to the line A5-A5 ′ in FIG. It is. FIG. 14 is a process cross-sectional view schematically showing processes after the formation of the insulating layer in the processes for manufacturing the organic EL device according to Embodiment 5 of the present invention. Since the basic configuration of the present embodiment is the same as that of the first embodiment, common portions are denoted by the same reference numerals, and detailed description thereof is omitted. Moreover, this form utilizes the first basic form and the second basic form described with reference to FIGS. 1 and 2.

  In Embodiment Mode 1, the pixel electrode 11 is formed by a physical deposition method such as sputtering, but in this embodiment mode, the pixel electrode 11 is formed by a coating method. In the first embodiment, the pixel separation insulating film 18 is formed around the pixel electrode 11. However, in this embodiment, as shown in FIGS. 13A and 13C, the pixel separation insulating film 18 is formed. Instead of forming, the region where the pixel electrode 11 is to be formed on the surface of the resin layer 17 is defined as the lyophilic region 3 d, and the periphery thereof is defined as the lyophobic region 4 due to the surface of the resin layer 17.

  In forming the lyophilic region 3d and the lyophobic region 4, in this embodiment, the resin layer 17 is made of a lyophobic resin material as described in detail below. The surface of the layer 17 is subjected to a lyophilic treatment to form a lyophilic region 3 d, and a region of the surface of the resin layer 17 that is not subjected to the lyophilic treatment is referred to as a lyophobic region 4.

  In order to manufacture the organic EL device 100 of this embodiment, first, as shown in FIG. 14A, the interlayer insulating film 16 made of the thin film transistor 7, the silicon oxide film, and the resin layer 17 are formed on the substrate 20b. To do. Here, in order to form the resin layer 17, a fluororesin is used as the liquid repellent resin material, and photocatalyst particles such as titanium oxide whose lyophilicity is enhanced by the light irradiation process as the lyophilic process are included in the fluororesin. Is distributed. For the resin layer 17, a contact hole is formed in the interlayer insulating film 16 in the course of exposure and development or after the resin layer 17 is formed.

  Next, as shown in FIG. 14B, the region where the pixel electrode 11 is to be formed on the surface of the resin layer 17 is irradiated with UV light to form the lyophilic region 3d. At this time, the region that is not irradiated with UV light becomes the liquid repellent region 4.

  Next, as shown in FIG. 14C, a liquid composition 11e in which ITO is dissolved or dispersed in an organic solvent, or a liquid composition 11e in which an ITO precursor is dissolved or dispersed in an organic solvent, an inkjet method, After applying to the lyophilic region 3d by a droplet application method such as a jet dispenser method or a dispenser method or a transfer method, heat treatment is performed to form the pixel electrode 11 as shown in FIG.

  Next, as shown in FIGS. 13B and 14E, a liquid composition containing a hole injection layer forming material is ejected from the inkjet head toward the surface of the pixel electrode 11, and After applying the liquid composition for forming the hole injection layer on the surface, the solvent is removed by vacuum and / or heat treatment or a flow of nitrogen gas or the like to form the hole injection layer 12a. At that time, the surface of the pixel electrode 11 functions as the lyophilic region 3 e for the liquid composition for forming the hole injection layer, and the surface of the resin layer 17 functions as the lyophobic region 4. Next, a liquid composition containing a light emitting layer forming material is discharged from the ink jet head toward the surface of the hole injection layer 1, and the liquid composition for forming the light emitting layer is applied to the hole injection layer 12a. Next, the solvent is removed by a vacuum and / or heat treatment or a flow of nitrogen gas or the like to form the light emitting layer 12b. At that time, the hole injection layer 12a functions as the lyophilic region 3b for the liquid composition for forming the light emitting layer, and the surface of the resin layer 17 functions as the lyophobic region 4. In this way, the organic functional layer 12 composed of the hole injection layer 12a and the light emitting layer 12b is formed.

  Thereafter, the cathode layer 15 shown in FIG. 13C is formed. For example, as the cathode layer 15, a laminated film of a lithium fluoride layer and an aluminum layer is formed by vacuum heating vapor deposition or the like, and then sealed.

  As described above, in this embodiment, when the pixel electrode 11 (coating film) is formed by the coating method, the region where the lyophilic process (light irradiation process) is performed on the resin layer 17 is a lyophilic area. The surface of the resin layer 17 functions as the liquid repellent region 4. When the hole injection layer 12a (coating film) is formed by a coating method, the surface of the pixel electrode 11 functions as the lyophilic region 3e, and the surface of the resin layer 17 functions as the lyophobic region 4. . Furthermore, when the light emitting layer 12b (coating film) is formed by a coating method, the surface of the hole injection layer 12a functions as the lyophilic region 3b, and the surface of the resin layer 17 functions as the lyophobic region 4. . Therefore, a coating film such as the pixel electrode 11, the hole injection layer 12a, and the light emitting layer 12b can be formed in a predetermined region without forming a partition wall.

[Embodiment 6]
FIGS. 15A, 15B, and 15C are plan views schematically showing the state immediately before the pixel electrode is formed in the steps of manufacturing the organic EL device according to the sixth embodiment of the present invention. , And a plan view schematically showing the state after the organic functional layer is formed, and a cross-sectional view schematically showing a state in which the organic EL device is cut at a position corresponding to the line A6-A6 ′ in FIG. It is. Since the basic configuration of this embodiment is the same as that of Embodiments 1 and 5, common portions are denoted by the same reference numerals and detailed description thereof is omitted. Further, the first basic form and the second basic form described with reference to FIGS. 1 and 2 are used.

  As shown in FIGS. 15A and 15C, in the organic EL device 100 of this embodiment, as in the fifth embodiment, the region on the surface of the resin layer 17 where the pixel electrode 11 is to be formed is a lyophilic solution. The region 3 d is a liquid repellent region 4 around the surface of the resin layer 17. In this embodiment, since the organic EL device 100 is configured as a top emission type that emits light emitted from the organic EL element 10 from the cathode layer 15 side, the cathode layer 15 is thin and electrically Resistance is great. Therefore, in the present embodiment, as in the fourth embodiment, in the region between adjacent pixels corresponding to different colors, the auxiliary wiring 19b is formed in the lower layer of the cathode layer 15, and the auxiliary wiring 19b is electrically connected to the cathode layer 15. Connected. For this reason, the auxiliary wiring 19 can solve the problem caused by the large electrical resistance of the cathode layer 15.

  Here, the auxiliary wiring 19b is a coating film formed simultaneously with the pixel electrode 11 by a coating method, and a region of the surface of the resin layer 17 where the auxiliary wiring 19b is formed becomes a lyophilic region 3f. A liquid repellent region 4 made of the surface of the resin layer 17 surrounds the periphery.

  In forming the lyophilic regions 3d and 3f and the lyophobic region 4, in the present embodiment, the resin layer 17 is configured using a lyophobic resin material, as in the fifth embodiment, and the resin The surface of the layer 17 is subjected to lyophilic treatment to form the lyophilic regions 3 d and 3 f, and the region of the surface of the resin layer 17 that has not been subjected to lyophilic treatment is referred to as the lyophobic region 4. That is, in order to form the resin layer 17, a fluororesin is used as the liquid repellent resin material, and photocatalyst particles such as titanium oxide whose lyophilicity is enhanced by light irradiation treatment as a lyophilic treatment are dispersed in the fluororesin. Has been. For this reason, UV light is irradiated to the area | region which should form the pixel electrode 11 and the auxiliary wiring 19b among the surfaces of the resin layer 17, and lyophilic area | regions 3d and 3f are formed. At this time, the region that is not irradiated with UV light becomes the liquid repellent region 4.

  A liquid composition obtained by dissolving or dispersing ITO in an organic solvent, or a liquid composition obtained by dissolving or dispersing an ITO precursor in an organic solvent is applied by a droplet coating method such as an inkjet method, a jet dispenser method, or a dispenser method. Alternatively, after applying to the lyophilic regions 3d and 3f by a transfer method, heat treatment is performed to form the pixel electrode 11 and the auxiliary wiring 19b as shown in FIG.

  In the present embodiment, as in the fifth embodiment, when the hole injection layer 12a (coating film) is formed by a coating method, the surface of the pixel electrode 11 functions as the lyophilic region 3e, and the resin layer 17 The surface functions as the liquid repellent region 4. Further, when the light emitting layer 12b (coating film) is formed by a coating method, the surface of the hole injection layer 12a functions as the lyophilic region 3b, and the surface of the resin layer 17 functions as the lyophobic region 4. .

  For this reason, even if a partition wall is not formed, coating films such as a pixel electrode 11, a hole injection layer 12a, a light emitting layer 12b, and an auxiliary wiring 19b are formed in a predetermined region as shown in FIG. 15B. can do.

  In this embodiment, when the auxiliary wiring is formed, a liquid composition in which metal fine particles such as copper, nickel, cobalt, silver, molybdenum, and titanium are dispersed in a dispersion medium (metal fine particle dispersion) as in the fourth embodiment. Body) is applied to the lyophilic region 3f by a droplet coating method such as an inkjet method, a jet dispenser method, or a dispenser method, or a transfer method, and then heat-treated to form an auxiliary wiring (coating-type metal film). May be.

[Other embodiments]
In the above embodiment, the present invention is applied to the manufacture of the organic EL element 10, but the present invention may be applied to the manufacture of a color filter substrate used for a liquid crystal device (electro-optical device).

It is explanatory drawing which shows the 1st basic form of this invention. It is explanatory drawing which shows the 2nd basic form of this invention. 1 is a plan view of an organic EL device (electro-optical device) to which the present invention is applied. It is a block diagram which shows the electric constitution of the organic electroluminescent apparatus to which this invention is applied. (A), (b) is sectional drawing which each shows typically the planar structure of the light emission area | region of the organic electroluminescent apparatus which concerns on Embodiment 1 of this invention, and its A1-A1 'sectional drawing. (A), (b) is the top view which shows typically a mode before forming an organic functional layer among the processes which manufacture the organic EL apparatus which concerns on Embodiment 1 of this invention, respectively, and an organic functional layer It is a top view which shows typically the mode after forming. It is process sectional drawing which shows typically the process after forming a pixel electrode and the insulating film for pixel separation among the processes which manufacture the organic electroluminescent apparatus which concerns on Embodiment 1 of this invention. (A), (b), (c) is the top view which shows typically the mode before forming an organic functional layer among the processes which manufacture the organic EL apparatus which concerns on Embodiment 2 of this invention, And a plan view schematically showing the state after the organic functional layer is formed, and a cross-sectional view schematically showing a state in which the organic EL device is cut at a position corresponding to the line A2-A2 ′ in FIG. is there. (A), (b), (c) is the top view which shows typically the mode before forming an organic functional layer among the processes which manufacture the organic EL apparatus which concerns on Embodiment 3 of this invention, And a plan view schematically showing the state after the organic functional layer is formed, and a cross-sectional view schematically showing a state in which the organic EL device is cut at a position corresponding to the line A3-A3 ′ in FIG. is there. (A), (b) is sectional drawing which each shows typically the planar structure of the light emission area | region of the organic electroluminescent apparatus which concerns on Embodiment 4 of this invention, and its A4-A4 'sectional drawing. (A), (b) is the top view which shows typically a mode before forming a pixel organic functional layer among processes which manufacture the organic EL device concerning Embodiment 4 of the present invention, and auxiliary wiring, respectively. It is a top view which shows typically the mode after forming. It is process sectional drawing which shows typically the process after forming a pixel electrode and the insulating film for pixel separation among the processes which manufacture the organic electroluminescent apparatus which concerns on Embodiment 4 of this invention. (A), (b), (c) is a plan view schematically showing a state immediately before forming a pixel electrode in the process of manufacturing an organic EL device according to Embodiment 5 of the present invention, and FIG. 14 is a plan view schematically showing a state after the organic functional layer is formed, and a cross-sectional view schematically showing a state in which the organic EL device is cut at a position corresponding to the line A5-A5 ′ in FIG. . It is process sectional drawing which shows typically the process after forming an insulating layer among the processes which manufacture the organic EL apparatus which concerns on Embodiment 5 of this invention. (A), (b), (c) is a plan view schematically showing a state immediately before forming a pixel electrode in a process of manufacturing an organic EL device according to Embodiment 6 of the present invention, and FIG. 16 is a plan view schematically showing a state after the organic functional layer is formed, and a cross-sectional view schematically showing a state in which the organic EL device is cut at a position corresponding to the line A6-A6 ′ in FIG. .

Explanation of symbols

2 .... Coating film, 3a to 3f .... Liquidity region, 4 .... Liquid repellent region, 5 .... Inorganic film, 10..Organic EL element, 10a ... Pixel, 11 .... Pixel electrode, 12. · Organic functional layer, 12a · · hole injection layer, 12b · · light emitting layer, · · · resin layer, 19a, 19b · · auxiliary wiring, 20 · · element substrate, 20b · · substrate, 100 · · organic EL device 110 ··· Light emitting area

Claims (12)

In an electro-optical device including a resin layer and a coating film formed in a predetermined region by a coating method on the upper side of the resin layer,
On the surface side of the resin layer, a lyophilic region formed in the formation region of the coating film and a lyophobic region surrounding the lyophilic region are formed,
The electro-optical device, wherein the liquid repellent region is formed by a surface of the resin layer. The lyophilic region is formed by an inorganic film formed on the surface of the resin layer,
The electro-optical device according to claim 1, wherein the liquid repellent region is a region where a liquid repellent process is performed on a surface of the resin layer. The resin layer is configured using a liquid repellent resin material,
The lyophilic region is a region subjected to lyophilic treatment on the surface of the resin layer,
The electro-optical device according to claim 1, wherein the liquid repellent region is a region of the surface of the resin layer that has not been subjected to the lyophilic treatment. In the resin layer, photocatalyst particles that are improved in lyophilicity by light irradiation treatment as the lyophilic treatment are dispersed in the liquid repellent resin material,
The lyophilic region is a region where the light irradiation treatment is performed on the surface of the resin layer,
The electro-optical device according to claim 3, wherein the liquid repellent region is a region of the surface of the resin layer that is not subjected to the light irradiation treatment. A plurality of pixel electrodes made of an inorganic conductive film on the upper side of the resin layer, an inorganic insulating film surrounding the pixel electrode, and an organic electroluminescence element laminated on the pixel electrode and the inorganic insulating film An organic functional layer and a counter electrode layer laminated on the upper side of the organic functional layer,
The said organic functional layer contains the layer formed by the apply | coating method by making the surface of the said pixel electrode and the said inorganic insulating film into the said lyophilic area | region as the said coating film, The said coating film is characterized by the above-mentioned. Electro-optic device. A plurality of pixel electrodes made of an inorganic conductive film on the upper side of the resin layer, an inorganic insulating film surrounding the pixel electrode, and an organic electroluminescence element laminated on the pixel electrode and the inorganic insulating film An organic functional layer and a counter electrode layer laminated on the upper side of the organic functional layer,
The electro-optical device according to claim 3, wherein the pixel electrode is formed on the lyophilic region as the coating film. A plurality of pixel electrodes made of an inorganic conductive film on the upper side of the resin layer, an inorganic insulating film surrounding the pixel electrode, and an organic electroluminescence element laminated on the pixel electrode and the inorganic insulating film An organic functional layer; a counter electrode layer stacked on the upper layer side of the organic functional layer; and an auxiliary wiring that passes between adjacent pixel electrodes on the surface side of the resin layer and is electrically connected to the counter electrode layer With layers,
The electro-optical device according to claim 2, wherein the auxiliary wiring layer is formed on the lyophilic region as the coating film.   The electro-optical device according to claim 5, wherein a transistor electrically connected to the pixel electrode is formed on a lower layer side of the resin layer. The pixel electrode is formed on each of a plurality of pixels corresponding to a plurality of colors,
9. The electro-optical device according to claim 5, wherein the organic functional layer includes a light emitting layer that is independently formed in each of the plurality of pixels. 10. The pixel electrode is formed on each of a plurality of pixels corresponding to a plurality of colors,
The electro-optical device according to claim 5, wherein the organic functional layer includes a light emitting layer formed across a plurality of pixels corresponding to the same color.   11. The electricity according to claim 9, wherein in the plurality of pixels, a gap size between adjacent pixels corresponding to the same color is narrower than a gap size between adjacent pixels corresponding to different colors. Optical device. In a method for manufacturing an electro-optical device comprising a resin layer and a coating film formed in a predetermined region by a coating method on the upper layer side of the resin layer,
When the liquid composition for forming the coating film is applied to the upper layer side of the resin layer, a lyophilic region is formed on the surface side of the resin layer in the coating film forming region. A method for producing an electro-optical device, wherein a liquid repellent region made of the surface of the resin layer is formed so as to surround the lyophilic region.

Images