JP2009032790A - Method and apparatus for peeling substrate - Google Patents

Method and apparatus for peeling substrate Download PDF

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Publication number
JP2009032790A
JP2009032790A JP2007193344A JP2007193344A JP2009032790A JP 2009032790 A JP2009032790 A JP 2009032790A JP 2007193344 A JP2007193344 A JP 2007193344A JP 2007193344 A JP2007193344 A JP 2007193344A JP 2009032790 A JP2009032790 A JP 2009032790A
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substrate
suction surface
peeling
outer peripheral
peripheral portion
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Yukiharu Okubo
至晴 大久保
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Nikon Corp
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Nikon Corp
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for peeling a substrate which quickly peel off the substrate provided on the attracting surface of an electrostatic chuck from the attracting surface without damaging the substrate attracted to the electrostatic chuck by a residual attractive force. <P>SOLUTION: The substrate peeling method for peeling off the substrate provided on the attracting surface of the electrostatic chuck from the attracting surface is characterized in that after the outer peripheral portion of the substrate is peeled off from the attracting surface, a portion inside the outer peripheral portion is peeled off from the attracting surface. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、静電チャックの吸着面上の基板を吸着面から剥離するための基板剥離方法および基板剥離装置に関する。   The present invention relates to a substrate peeling method and a substrate peeling apparatus for peeling a substrate on an adsorption surface of an electrostatic chuck from the adsorption surface.

一般に、EBL,EPL,EUVL等の露光装置では、真空雰囲気内にウエハステージが収容される。そして、ウエハステージには、ウエハを吸着するため静電チャックが使用される。
特開平9−139419号公報
Generally, in an exposure apparatus such as EBL, EPL, EUVL, a wafer stage is accommodated in a vacuum atmosphere. An electrostatic chuck is used for the wafer stage to attract the wafer.
JP-A-9-139419

しかしながら、静電チャックでは、電源を切っても電荷が残り、残った電荷による残留吸着力によりウエハの剥離に時間がかかるという問題があった。また、無理に剥離しようとするとウエハが損傷するおそれがあった。   However, the electrostatic chuck has a problem that charges remain even when the power is turned off, and it takes time to peel off the wafer due to the residual adsorption force due to the remaining charges. Moreover, there was a risk that the wafer could be damaged if it was forcibly separated.

本発明は、かかる従来の問題を解決するためになされたもので、残留吸着力により静電チャックに吸着される基板を損傷することなく迅速に剥離することができる基板剥離方法および基板剥離装置を提供することを目的とする。   The present invention has been made to solve such a conventional problem, and provides a substrate peeling method and a substrate peeling apparatus capable of quickly peeling without damaging a substrate attracted to an electrostatic chuck by a residual attracting force. The purpose is to provide.

第1の発明の基板剥離方法は、静電チャックの吸着面上の基板を、前記吸着面から剥離する基板剥離方法において、前記基板の外周部を前記吸着面から剥離した後、前記基板の外周部より内側を前記吸着面から剥離することを特徴とする。   A substrate peeling method according to a first aspect of the present invention is the substrate peeling method for peeling the substrate on the suction surface of the electrostatic chuck from the suction surface. After peeling the outer peripheral portion of the substrate from the suction surface, the outer periphery of the substrate The inside of the part is peeled off from the adsorption surface.

第2の発明の基板剥離方法は、静電チャックの吸着面上の基板を、前記吸着面から剥離する基板剥離方法において、前記基板の一部分の外周部を前記吸着面から剥離した後、前記基板の前記一部分の外周部より内側を前記吸着面から剥離し、この後、前記基板の前記一部分とは異なる部分を前記吸着面から剥離することを特徴とする。   The substrate peeling method according to a second aspect of the present invention is the substrate peeling method in which the substrate on the suction surface of the electrostatic chuck is peeled from the suction surface, and after the outer peripheral portion of a part of the substrate is peeled from the suction surface, the substrate The inside of the outer peripheral portion of the part of the substrate is peeled off from the suction surface, and thereafter, a portion different from the part of the substrate is peeled off from the suction surface.

第3の発明の基板剥離方法は、第2の発明の基板剥離方法において、前記一部分とは異なる部分の外周部より内側を前記吸着面から剥離した後、前記一部分とは異なる部分の外周部を前記吸着面から剥離することを特徴とする。   A substrate peeling method according to a third invention is the substrate peeling method according to the second invention, wherein the outer peripheral portion of a portion different from the portion is peeled from the suction surface inside the outer peripheral portion of a portion different from the portion. It peels from the said adsorption surface, It is characterized by the above-mentioned.

第4の発明の基板剥離装置は、静電チャックの吸着面上の基板を、前記吸着面から剥離する基板剥離装置において、前記吸着面に面した側から前記基板の外周部に当接する外側部材と、前記吸着面に面した側から前記基板に対して前記外周部より内側に当接する内側部材と、前記外側部材により前記基板の外周部を突き上げた後、前記内側部材により前記基板の外周部より内側を突き上げる駆動機構とを有することを特徴とする。   A substrate peeling apparatus according to a fourth aspect of the present invention is the substrate peeling apparatus for peeling the substrate on the suction surface of the electrostatic chuck from the suction surface, wherein the outer member contacts the outer peripheral portion of the substrate from the side facing the suction surface. And an inner member that is in contact with the substrate inward from the outer peripheral portion from the side facing the suction surface, and an outer peripheral portion of the substrate is pushed up by the inner member after the outer member is pushed up by the outer member. And a drive mechanism that pushes inward.

第5の発明の基板剥離装置は、第4の発明の基板剥離装置において、前記静電チャックの前記吸着面と反対側に配置され前記外側部材および内側部材が固定される移動部材を備え、前記外側部材の長さを、前記内側部材の長さより長くしてなり、前記駆動機構は、前記移動部材を突き上げ方向に移動することを特徴とする。   The substrate peeling apparatus of 5th invention is a board | substrate peeling apparatus of 4th invention, It is arrange | positioned on the opposite side to the said adsorption surface of the said electrostatic chuck, The moving member to which the said outer member and inner member are fixed, The length of the outer member is longer than the length of the inner member, and the drive mechanism moves the moving member in the push-up direction.

第6の発明の基板剥離装置は、第4の発明の基板剥離装置において、前記駆動機構は、前記外側部材と内側部材とを個別に突き上げ方向に移動可能であり、前記外側部材を移動した後、前記内側部材を移動することを特徴とする。   A substrate peeling apparatus according to a sixth invention is the substrate peeling apparatus according to the fourth invention, wherein the driving mechanism is capable of individually moving the outer member and the inner member in the push-up direction and moving the outer member. The inner member is moved.

第7の発明の基板剥離装置は、静電チャックの吸着面上の基板を、前記吸着面から剥離する基板剥離装置において、前記吸着面に面した側から前記基板の片側の外周部に当接する第1の外側部材と、前記吸着面に面した側から前記基板の他側の外周部に当接する第2の外側部材と、前記吸着面に面した側から前記基板に対して前記外周部より内側に当接する内側部材と、前記第1の外側部材により前記基板の片側の外周部を突き上げた後、前記内側部材により前記基板の外周部より内側を突き上げ、この後、前記第2の外側部材により前記基板の外周部の他側を突き上げる駆動機構とを有することを特徴とする。   A substrate peeling apparatus according to a seventh aspect of the invention is a substrate peeling apparatus for peeling a substrate on an adsorption surface of an electrostatic chuck from the adsorption surface, and abuts on an outer peripheral portion on one side of the substrate from the side facing the adsorption surface. A first outer member, a second outer member that contacts the outer peripheral portion on the other side of the substrate from the side facing the suction surface, and the outer peripheral portion with respect to the substrate from the side facing the suction surface After the inner member abutting on the inside and the first outer member push up the outer peripheral portion on one side of the substrate, the inner member pushes up the inner side from the outer peripheral portion of the substrate, and then the second outer member. And a drive mechanism that pushes up the other side of the outer peripheral portion of the substrate.

本発明では、残留吸着力により静電チャックに吸着される基板を損傷することなく迅速に剥離することができる。   In the present invention, the substrate that is attracted to the electrostatic chuck by the residual attracting force can be quickly peeled without being damaged.

以下、本発明の実施形態を図面を用いて詳細に説明する。
(第1の実施形態)
図1および図2は本発明の基板剥離装置の第1の実施形態を示している。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
(First embodiment)
1 and 2 show a first embodiment of a substrate peeling apparatus of the present invention.

静電チャック11は、チャック本体13を有している。チャック本体13の上面は、ウエハからなる基板15を吸着する吸着面13aとされている。チャック本体13の吸着面13a側には、周知の内部電極17が配置されている。内部電極17に電源(不図示)からの電圧を印加することにより基板15が吸着面13aに吸着される。   The electrostatic chuck 11 has a chuck body 13. The upper surface of the chuck body 13 is a suction surface 13a that sucks the substrate 15 made of a wafer. A known internal electrode 17 is disposed on the chucking surface 13 on the suction surface 13 a side. By applying a voltage from a power source (not shown) to the internal electrode 17, the substrate 15 is adsorbed to the adsorption surface 13a.

チャック本体13には、上下方向に外側貫通穴13bおよび内側貫通穴13cが形成されている。外側貫通穴13bは、図2に示すように、チャック本体13の中心Oから半径r1の位置に同心状に形成されている。外側貫通穴13bは、45度の角度を置いて8箇所に形成されている。外側貫通穴13bは、基板15の外周部に対応する位置に形成されている。内側貫通穴13cは、中心Oから半径r2の位置に同心状に形成されている。半径r2は、例えば半径r1の半分以下の寸法とされている。内側貫通穴13cは、90度の角度を置いて4箇所に形成されている。内側貫通穴13cは、基板15の外周部より内側に対応する位置に形成されている。   The chuck body 13 is formed with an outer through hole 13b and an inner through hole 13c in the vertical direction. As shown in FIG. 2, the outer through hole 13 b is formed concentrically at a radius r <b> 1 from the center O of the chuck body 13. The outer through holes 13b are formed at eight positions at an angle of 45 degrees. The outer through hole 13 b is formed at a position corresponding to the outer peripheral portion of the substrate 15. The inner through hole 13c is formed concentrically from the center O at a radius r2. The radius r2 is, for example, a dimension less than half of the radius r1. The inner through holes 13c are formed at four positions at an angle of 90 degrees. The inner through hole 13 c is formed at a position corresponding to the inner side of the outer peripheral portion of the substrate 15.

なお、以上の説明からも分かる通り、第1の実施形態中では、相対的にチャック本体13の中心Oに近い場所を内側、相対的にチャック本体13の周縁に近い場所を外側とする。例えば、チャック本体の中心Oを中心とする半径r1の円周上に配置される貫通穴13bは、チャック本体の中心Oを中心とする半径r2の円周上に配置される貫通穴13cよりも本体チャック13の中心Oから遠く、よりチャック本体13の周縁に近いため、「外側貫通穴13b」と称する。また、チャック本体の中心Oを中心とする半径r2の円周上に配置される貫通穴13cは、チャック本体の中心Oを中心とする半径r1の円周上に配置される貫通穴13bよりも本体チャック13の中心Oに近いため、「内側貫通穴13c」と称する。   As can be seen from the above description, in the first embodiment, a location that is relatively close to the center O of the chuck body 13 is an inside, and a location that is relatively close to the periphery of the chuck body 13 is an outside. For example, the through hole 13b arranged on the circumference of the radius r1 centered on the center O of the chuck body is more than the through hole 13c arranged on the circumference of the radius r2 centered on the center O of the chuck body. Since it is far from the center O of the main body chuck 13 and closer to the periphery of the chuck main body 13, it is referred to as an “outside through hole 13 b”. Further, the through hole 13c arranged on the circumference of the radius r2 centered on the center O of the chuck body is more than the through hole 13b arranged on the circumference of the radius r1 centered on the center O of the chuck body. Since it is close to the center O of the main body chuck 13, it is referred to as an “inner through hole 13c”.

外側貫通穴13bには、外側部材19が移動可能に挿入されている。外側部材19は、ピン状をしており、吸着面13aに面した側から基板15の外周部に当接可能とされている。内側貫通穴13cには、内側部材21が移動可能に挿入されている。内側部材21は、ピン状をしており、吸着面13aに面した側から基板15の外周部より内側に当接可能とされている。   The outer member 19 is movably inserted into the outer through hole 13b. The outer member 19 has a pin shape, and can contact the outer peripheral portion of the substrate 15 from the side facing the suction surface 13a. The inner member 21 is movably inserted into the inner through hole 13c. The inner member 21 has a pin shape, and can come into contact with the inner side of the outer peripheral portion of the substrate 15 from the side facing the suction surface 13a.

チャック本体13の吸着面13aと反対側には、移動部材23が配置されている。移動部材23は、円板状をしている。移動部材23の上面には、外側部材19および内側部材21の下端が固定されている。外側部材19の長さL1は、内側部材21の長さL2より、例えば0.5mm程度長くされている。従って、移動部材23を上方に移動すると、外側部材19が基板15に当接した後、内側部材21が基板15に当接する。   A moving member 23 is disposed on the opposite side of the chuck body 13 from the suction surface 13a. The moving member 23 has a disk shape. The lower ends of the outer member 19 and the inner member 21 are fixed to the upper surface of the moving member 23. The length L1 of the outer member 19 is longer than the length L2 of the inner member 21, for example, by about 0.5 mm. Therefore, when the moving member 23 is moved upward, the inner member 21 contacts the substrate 15 after the outer member 19 contacts the substrate 15.

移動部材23は、駆動機構25により上下方向に移動可能とされている。駆動機構25は、油圧または空圧アクチュエータからなり、シリンダ27とピストンロッド29を有している。そして、ピストンロッド29の先端が移動部材23の下面の中心に固定されている。なお、駆動機構25は、移動部材23を上下方向に移動可能であれば良く、例えばモータ、ピエゾアクチュエータ等を用いて構成しても良い。   The moving member 23 can be moved in the vertical direction by the drive mechanism 25. The drive mechanism 25 includes a hydraulic or pneumatic actuator, and includes a cylinder 27 and a piston rod 29. The tip of the piston rod 29 is fixed to the center of the lower surface of the moving member 23. The drive mechanism 25 only needs to be able to move the moving member 23 in the vertical direction, and may be configured using, for example, a motor, a piezoelectric actuator, or the like.

上述した静電チャック11では、静電チャック11の電源をオンにして基板15を吸着面13aに吸着すると、電源をオフにしても吸着面13aに電荷が残存する。そして、残った電荷による残留吸着力により基板15が吸着面13aに吸着状態になり、電荷が逃げるのを待ってから基板15を離脱する場合には、基板15の離脱に多大な時間が必要になりスループットが低下する。そこで、静電チャック11から基板15を強制的に剥離するのが望ましい。   In the electrostatic chuck 11 described above, when the electrostatic chuck 11 is turned on and the substrate 15 is attracted to the suction surface 13a, the charge remains on the suction surface 13a even when the power is turned off. Then, when the substrate 15 is attracted to the attracting surface 13a due to the residual attracting force due to the remaining charge and the substrate 15 is detached after waiting for the charge to escape, it takes a lot of time to remove the substrate 15. The throughput is reduced. Therefore, it is desirable to forcibly peel the substrate 15 from the electrostatic chuck 11.

この実施形態では、静電チャック11からの基板15の剥離が、図3に示すように駆動機構25により移動部材23を上方に移動することにより行われる。   In this embodiment, the substrate 15 is peeled from the electrostatic chuck 11 by moving the moving member 23 upward by the drive mechanism 25 as shown in FIG.

移動部材23を上方に移動すると、先ず、図3の(a)に示すように、外側部材19により基板15の外周部が突き上げられ、外周部がチャック本体13の吸着面13aから剥離する。基板15の外周部は、内側に比較して剥離し易いため、先ず、外周部から剥離することにより、比較的小さな剥離力で基板15を剥離することができる。これにより基板15の外周部に無理な剥離力が作用することがなくなり、基板15の外周部を損傷することなく剥離することができる。また、基板15の外周部を同心状に配置される複数の外側部材19で突き上げることにより、より小さな剥離力で剥離することができる。   When the moving member 23 is moved upward, first, as shown in FIG. 3A, the outer peripheral portion of the substrate 15 is pushed up by the outer member 19, and the outer peripheral portion is peeled off from the suction surface 13 a of the chuck main body 13. Since the outer peripheral portion of the substrate 15 is easier to peel compared to the inner side, the substrate 15 can be peeled with a relatively small peeling force by first peeling from the outer peripheral portion. Thereby, an excessive peeling force does not act on the outer peripheral portion of the substrate 15, and the outer peripheral portion of the substrate 15 can be peeled without being damaged. Further, by pushing up the outer peripheral portion of the substrate 15 with a plurality of outer members 19 arranged concentrically, the substrate 15 can be peeled off with a smaller peeling force.

そして、この後、移動部材23をさらに上方に移動すると、図3の(b)に示すように、内側部材21により基板15の外周部より内側が突き上げられ、外周部より内側がチャック本体13の吸着面13aから剥離する。基板15の内側は、外周部に比較して剥離し難いが、この時には、外側部材19により外周部が既に剥離されているため、比較的小さな剥離力で基板15を剥離することができる。これにより基板15の内側に無理な剥離力が作用することがなくなり、基板15を損傷することなく剥離することができる。また、基板15の内側を同心状に配置される複数の外側部材19で突き上げることにより、より小さな剥離力で剥離することができる。   After that, when the moving member 23 is further moved upward, as shown in FIG. 3B, the inner member 21 pushes the inner side of the outer periphery of the substrate 15 and the inner side of the outer periphery of the chuck body 13 is pushed up. Peel from the adsorption surface 13a. The inner side of the substrate 15 is harder to peel than the outer peripheral portion. At this time, since the outer peripheral portion has already been peeled off by the outer member 19, the substrate 15 can be peeled off with a relatively small peeling force. Thereby, an excessive peeling force does not act on the inside of the substrate 15 and the substrate 15 can be peeled without being damaged. Further, by pushing up the inside of the substrate 15 with a plurality of outer members 19 arranged concentrically, the substrate 15 can be peeled off with a smaller peeling force.

この実施形態では、基板15の外周部を剥離した後、基板15の外周部より内側を剥離するようにしたので、残留吸着力により静電チャック11に吸着される基板15を損傷することなく迅速に剥離することができる。   In this embodiment, after the outer peripheral portion of the substrate 15 is peeled off, the inner side is peeled off from the outer peripheral portion of the substrate 15. Can be peeled off.

また、移動部材23に外側部材19および内側部材21を固定し、外側部材19の長さを、内側部材21の長さより長くしたので、移動部材23を移動するだけで、基板15の外周部を剥離した後、基板15の外周部より内側を剥離することができる。従って、基板剥離装置を簡易な構造にすることができる。
(第2の実施形態)
図4および図5は本発明の基板剥離装置の第2の実施形態を示している。
Further, since the outer member 19 and the inner member 21 are fixed to the moving member 23 and the length of the outer member 19 is longer than the length of the inner member 21, the outer peripheral portion of the substrate 15 can be moved only by moving the moving member 23. After peeling, the inside can be peeled from the outer peripheral portion of the substrate 15. Therefore, the substrate peeling apparatus can be made a simple structure.
(Second Embodiment)
4 and 5 show a second embodiment of the substrate peeling apparatus of the present invention.

なお、この実施形態において第1の実施形態と同一の要素には、同一の符号を付して詳細な説明を省略する。また、前述の第1の実施形態と同様、第2の実施形態中でも、相対的にチャック本体13中心に近い場所を内側、相対的にチャック本体13の周縁に近い場所を外側として説明する。   In addition, in this embodiment, the same code | symbol is attached | subjected to the element same as 1st Embodiment, and detailed description is abbreviate | omitted. Similarly to the first embodiment described above, in the second embodiment, a location that is relatively close to the center of the chuck body 13 will be described as the inside, and a location that is relatively close to the periphery of the chuck body 13 will be described as the outside.

第1の実施形態では、外側部材19と内側部材21はともに移動部材23に固定されて一体的に上下動するのに対して、この第2の実施形態では、後述する駆動機構25Aが、外側部材19Aと内側部材21Aとを個別に移動させることが可能である。第1の実施形態では、外側部材19の長さL1は、内側部材21の長さL2より、例えば0.5mm程度長く構成されていたが、第2の実施形態では、必ずしも外側部材19Aの長さは内側部材21Aの長さより長く構成する必要はなく、外側部材19Aと内側部材21Aとが同じ長さであってもよい。また、外側部材19A、内側部材21Aの下端には大径部19a、21aが形成されている。静電チャック11のチャック本体13に形成される外側貫通穴13bおよび内側貫通穴13cの吸着面13aと反対側には、個々の外側部材19A、内側部材21Aそれぞれに対応して駆動機構25Aが配置されている。   In the first embodiment, both the outer member 19 and the inner member 21 are fixed to the moving member 23 and integrally move up and down. In the second embodiment, a driving mechanism 25A described later is provided on the outer side. The member 19A and the inner member 21A can be moved individually. In the first embodiment, the length L1 of the outer member 19 is configured to be, for example, about 0.5 mm longer than the length L2 of the inner member 21, but in the second embodiment, the length of the outer member 19A is not necessarily long. The length need not be longer than the length of the inner member 21A, and the outer member 19A and the inner member 21A may have the same length. Large diameter portions 19a and 21a are formed at the lower ends of the outer member 19A and the inner member 21A. On the opposite side of the chucking body 13 of the electrostatic chuck 11 from the outer through hole 13b and the inner through hole 13c on the suction surface 13a, drive mechanisms 25A are arranged corresponding to the respective outer members 19A and inner members 21A. Has been.

駆動機構25Aは、アクチュエータ31とコイルスプリング33とを有している。アクチュエータ31としては、例えばピエゾアクチュエータが用いられる。ピエゾアクチュエータは、ピエゾ素子を複数積み重ねて形成されており、電圧を印加されることにより伸長する性質を備えている。各駆動装置25Aは制御装置33に接続され、制御装置33で各駆動機構25Aそれぞれに個別に電圧を印加することにより、各駆動機構25Aのアクチュエータ31それぞれを個別に伸長させて、外側部材19および内側部材21を個別に上下移動させることが可能である。なお、駆動機構25Aは、外側部材19Aまたは内側部材21Aを個別に上下方向に移動可能であれば良く、例えばシリンダとピストンロッド、モータ等を用いて構成しても良い。   The drive mechanism 25 </ b> A includes an actuator 31 and a coil spring 33. As the actuator 31, for example, a piezo actuator is used. The piezo actuator is formed by stacking a plurality of piezo elements, and has a property of expanding when a voltage is applied. Each drive device 25A is connected to the control device 33, and the control device 33 individually applies a voltage to each drive mechanism 25A, thereby individually extending the actuator 31 of each drive mechanism 25A, and the outer member 19 and The inner member 21 can be individually moved up and down. The drive mechanism 25A only needs to be able to individually move the outer member 19A or the inner member 21A in the vertical direction, and may be configured using, for example, a cylinder, a piston rod, a motor, and the like.

アクチュエータ31の上端は、外側部材19Aまたは内側部材21Aの下端の大径部19a,21aに当接している。大径部19a,21aは、コイルスプリング33の反発力によりアクチュエータ31に対して押圧されている。また、アクチュエータ31の下端は、外側貫通穴13bまたは内側貫通穴13cの下端に螺子等で固定される蓋部材35に当接している。従って、アクチュエータ31に電圧が印加されない状態では、外側部材19Aまたは内側部材21Aの上端が、吸着面13aより下方の所定位置に位置している。   The upper end of the actuator 31 is in contact with the large diameter portions 19a and 21a at the lower end of the outer member 19A or the inner member 21A. The large diameter portions 19 a and 21 a are pressed against the actuator 31 by the repulsive force of the coil spring 33. The lower end of the actuator 31 is in contact with a lid member 35 that is fixed to the lower end of the outer through hole 13b or the inner through hole 13c with a screw or the like. Therefore, in a state where no voltage is applied to the actuator 31, the upper end of the outer member 19A or the inner member 21A is located at a predetermined position below the suction surface 13a.

この実施形態では、静電チャック11からの基板15の剥離が、外側部材19Aおよび内側部材21Aを個別に上方に移動することにより行われる。   In this embodiment, the substrate 15 is peeled from the electrostatic chuck 11 by individually moving the outer member 19A and the inner member 21A upward.

先ず、制御装置33により外側貫通穴13bに収容されるアクチュエータ31にのみ電圧が印加され、電圧の印加されたアクチュエータ31が伸長されることにより、図6の(a)に示すように、外側部材19Aが上方に移動し基板15の外周部が突き上げられ、外周部がチャック本体13の吸着面13aから剥離する。   First, a voltage is applied only to the actuator 31 accommodated in the outer through-hole 13b by the control device 33, and the actuator 31 to which the voltage is applied is extended, so that as shown in FIG. 19A moves upward, the outer peripheral portion of the substrate 15 is pushed up, and the outer peripheral portion is peeled off from the suction surface 13a of the chuck body 13.

次に、制御装置33により内側貫通穴13cに収容されるアクチュエータ31にも電圧が印加され、電圧の印加されたアクチュエータ31が伸長されることにより、図6の(b)に示すように、内側部材21Aが上方に移動し基板15の外周部より内側が突き上げられ、基板15の内側がチャック本体13の吸着面13aから剥離する。そして、基板15が吸着面13aから完全に剥離する。   Next, a voltage is also applied to the actuator 31 accommodated in the inner through-hole 13c by the control device 33, and the actuator 31 to which the voltage is applied is expanded, so that as shown in FIG. The member 21 </ b> A moves upward, the inner side is pushed up from the outer peripheral portion of the substrate 15, and the inner side of the substrate 15 is peeled off from the suction surface 13 a of the chuck body 13. And the board | substrate 15 peels completely from the adsorption | suction surface 13a.

この実施形態では、駆動機構25Aにより外側部材19Aおよび内側部材21Aを個別に移動するようにし、駆動機構25Aを静電チャック11に組み込んだので静電チャック11の下に別途スペースを確保する必要がなく、コンパクトな基板剥離装置を提供することができる。   In this embodiment, the outer member 19A and the inner member 21A are individually moved by the driving mechanism 25A, and the driving mechanism 25A is incorporated in the electrostatic chuck 11. Therefore, it is necessary to secure a separate space under the electrostatic chuck 11. And a compact substrate peeling apparatus can be provided.

また、第2の実施形態では、外側部材19Aを上方に移動させた後、内側部材21Aを上方に移動させるまでの時間を任意に設定できるので、基板15の厚さや面積、環境によって変化する静電気の残留状況に応じて、基板15の外側を突き上げた後、基板15の内側を突き上げるまでの時間を適切に調整することも可能である。   In the second embodiment, since the time until the inner member 21A is moved upward after the outer member 19A is moved upward can be arbitrarily set, the static electricity that changes depending on the thickness, area, and environment of the substrate 15 can be set. It is also possible to appropriately adjust the time until the inside of the substrate 15 is pushed up after the outside of the substrate 15 is pushed up according to the remaining state of the substrate.

なお、以上説明した第2の実施形態では、8つの外側部材19Aそれぞれが上方移動するタイミングについては言及しながったが、これは8つ同時に上方移動してもよいし、8つの外側部材19Aうちのn個(n=1〜7)が上方移動した後、残りのm個(m=8−n)の外側部材19Aが上方移動しても良い。   In the second embodiment described above, the timing at which each of the eight outer members 19 </ b> A moves upward is not mentioned, but this may move eight at the same time, or eight outer members. After n (n = 1 to 7) of 19A move upward, the remaining m (m = 8-n) outer members 19A may move upward.

さらに、図10に示すように吸着面13aをその中心Oを通る直線で分割した複数部分領域(図10では直線L1、L2で分割した13a1、13a2、13a3、13a4の4つの部分領域)を想定し、一部分(部分領域の1つ)に含まれる外側部材19Aを上方移動した後、同じ一部分に含まれる内側部材を上昇移動し、それと同時または所定時間後に、異なる部分(部分領域)の外側部材19Aを上方移動、例えば、部分領域13a1の2つの外側部材19Aを上方移動しても良い。例えば、部分領域13a1に含まれる2つの外側部材19Aを上方移動した後、部分領域13a1に含まれる1つの内側部材21Aを上方移動し、それと同時又は所定時間後に部分領域13a2に含まれる2つの外側部材19Aを上方移動しても良い。
(第3の実施形態)
図7および図8は本発明の基板剥離装置の第3の実施形態を示している。
Furthermore, as shown in FIG. 10, a plurality of partial regions (four partial regions 13a1, 13a2, 13a3, 13a4 divided by straight lines L1, L2 in FIG. 10) obtained by dividing the suction surface 13a by a straight line passing through the center O are assumed. Then, after the outer member 19A included in a part (one of the partial areas) is moved upward, the inner member included in the same part is moved upward, and at the same time or after a predetermined time, the outer members of different parts (partial areas) 19A may be moved upward, for example, the two outer members 19A of the partial region 13a1 may be moved upward. For example, after moving the two outer members 19A included in the partial region 13a1 upward, the one inner member 21A included in the partial region 13a1 is moved upward, and at the same time or after a predetermined time, two outer members included in the partial region 13a2 The member 19A may be moved upward.
(Third embodiment)
7 and 8 show a third embodiment of the substrate peeling apparatus of the present invention.

なお、この実施形態において第2の実施形態と同一の要素には、同一の符号を付して詳細な説明を省略する。   In this embodiment, the same elements as those of the second embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.

なお、第3の実施形態中では、チャック本体13の中心Oを通る中心線L3を想定し、中心線L3からの距離が相対的に近い側を内側と称し、中心線L3からの距離が相対的に遠い側を外側と称する。図8中に、想定されている中心線L3が二点鎖線で図示されている。   In the third embodiment, the center line L3 passing through the center O of the chuck body 13 is assumed, and the side that is relatively close to the center line L3 is referred to as the inner side, and the distance from the center line L3 is relative. The far side is called the outside. In FIG. 8, the assumed center line L3 is shown by a two-dot chain line.

この実施形態では、静電チャック11のチャック本体13には、図7または図8の紙面右側から順に、第1の外側部材19B、第1の内側部材21B、第2の内側部材21C、第2の外側部材19Cが配置されている。第1の外側部材19Bは、チャック本体13の右側の外周部に沿って円弧状に形成される3箇所の第1の外側貫通穴13dに収容されている。第1の内側部材21Bは、チャック本体13の右側の外周部より内側に直線状に形成される3箇所の第1の内側貫通穴13eに収容されている。第2の内側部材21Cは、チャック本体13の左側の外周部より内側に直線状に形成される3箇所の第2の内側貫通穴13fに収容されている。第2の外側部材19Cは、チャック本体13の左側の外周部に沿って円弧状に形成される3箇所の第2の外側貫通穴13hに収容されている。また、第1の外側部材19B、第1の内側部材21B、第2の内側部材21C、第2の外側部材19Cそれぞれの長さは同じ長さとし、それぞれに大径部が形成されている。   In this embodiment, the chuck body 13 of the electrostatic chuck 11 has a first outer member 19B, a first inner member 21B, a second inner member 21C, and a second member in order from the right side of FIG. The outer member 19C is disposed. The first outer member 19B is accommodated in three first outer through holes 13d formed in an arc shape along the outer peripheral portion on the right side of the chuck body 13. The first inner member 21 </ b> B is accommodated in three first inner through holes 13 e that are linearly formed inside the right outer peripheral portion of the chuck body 13. The second inner member 21 </ b> C is accommodated in three second inner through holes 13 f that are linearly formed on the inner side of the left outer peripheral portion of the chuck body 13. The second outer member 19 </ b> C is accommodated in three second outer through holes 13 h formed in an arc shape along the left outer peripheral portion of the chuck body 13. The first outer member 19B, the first inner member 21B, the second inner member 21C, and the second outer member 19C have the same length, and a large-diameter portion is formed in each.

さらに、第1の外側部材19B、第1の内側部材21B、第2の内側部材21C、第2の外側部材19Cそれぞれに対応して、第2実施形態と同様の、アクチュエータ31とコイルスプリングとを備えた駆動機構25Aが配置されている。各駆動機構25Aは制御装置33に接続され、制御装置33で各駆動機構25Aそれぞれに個別に電圧を印加することにより、各駆動機構25Aのアクチュエータ31それぞれを個別に伸長させて、第1の外側部材19B、第1の内側部材21B、第2の内側部材21C、第2の外側部材19Cを個別に上下移動させることが可能である。   Further, corresponding to each of the first outer member 19B, the first inner member 21B, the second inner member 21C, and the second outer member 19C, an actuator 31 and a coil spring similar to those of the second embodiment are provided. The provided drive mechanism 25A is arranged. Each drive mechanism 25A is connected to the control device 33, and the control device 33 individually applies a voltage to each drive mechanism 25A, whereby each actuator 31 of each drive mechanism 25A is individually extended, and the first outer side. The member 19B, the first inner member 21B, the second inner member 21C, and the second outer member 19C can be individually moved up and down.

この実施形態では、静電チャック11からの基板15の剥離が、第1の外側部材19B、第1の内側部材21B、第2の内側部材21C、第2の外側部材19Cを順次上方に移動することにより行われる。   In this embodiment, the peeling of the substrate 15 from the electrostatic chuck 11 sequentially moves the first outer member 19B, the first inner member 21B, the second inner member 21C, and the second outer member 19C upward. Is done.

先ず、図9の(a)に示すように、制御装置33Aにより第1の外側貫通穴13dに収容されるアクチュエータ31にのみ電圧が印加され、電圧の印加されたアクチュエータ31が伸長される。これにより第1の外側部材19Bが上方に移動し基板15の右側の外周部が突き上げられ、右側の外周部がチャック本体13の吸着面13aから剥離する。   First, as shown in FIG. 9A, a voltage is applied only to the actuator 31 accommodated in the first outer through hole 13d by the control device 33A, and the actuator 31 to which the voltage is applied is extended. As a result, the first outer member 19 </ b> B moves upward, the right outer peripheral portion of the substrate 15 is pushed up, and the right outer peripheral portion is peeled off from the suction surface 13 a of the chuck body 13.

次に、図9の(b)に示すように、制御装置33Aにより第1の内側貫通穴13eに収容されるアクチュエータ31にも電圧が印加され、電圧の印加されたアクチュエータ31が伸長される。これにより第1の内側部材21Bが上方に移動し基板15の右側の内側が突き上げられ、基板15の右側半部がチャック本体13の吸着面13aから剥離する。   Next, as shown in FIG. 9B, a voltage is also applied to the actuator 31 accommodated in the first inner through hole 13e by the control device 33A, and the actuator 31 to which the voltage is applied is extended. As a result, the first inner member 21 </ b> B moves upward, the right inner side of the substrate 15 is pushed up, and the right half of the substrate 15 is peeled off from the suction surface 13 a of the chuck body 13.

次に、図9の(c)に示すように、制御装置33Aにより第2の内側貫通穴13fに収容されるアクチュエータ31にも電圧が印加され、電圧の印加されたアクチュエータ31が伸長する。これにより第2の内側部材21Cが上方に移動し基板15の左側の内側が突き上げられ、基板15が左側の外周部を残してチャック本体13の吸着面13aから剥離する。   Next, as shown in FIG. 9C, a voltage is also applied to the actuator 31 accommodated in the second inner through hole 13f by the control device 33A, and the actuator 31 to which the voltage is applied extends. As a result, the second inner member 21 </ b> C moves upward, the left inner side of the substrate 15 is pushed up, and the substrate 15 is peeled off from the suction surface 13 a of the chuck body 13, leaving the left outer peripheral part.

次に、図9の(d)に示すように、制御装置33Aにより第2の外側貫通穴13hに収容されるアクチュエータ31にも電圧が印加され、電圧の印加されたアクチュエータ31が伸長する。これにより第2の外側部材19Cが上方に移動し基板15の左側の外周部が突き上げられ、基板15の全体がチャック本体13の吸着面13aから剥離する。   Next, as shown in FIG. 9D, a voltage is also applied to the actuator 31 accommodated in the second outer through hole 13h by the control device 33A, and the actuator 31 to which the voltage is applied extends. As a result, the second outer member 19 </ b> C moves upward, the left outer peripheral portion of the substrate 15 is pushed up, and the entire substrate 15 is peeled from the chucking surface 13 a of the chuck body 13.

この実施形態では、第1の外側部材19B、第1の内側部材21B、第2の内側部材21C、第2の外側部材19Cを順次上方に移動し、基板15の片側から他側に向けて順次基板15を剥離するようにしたので、残留吸着力により静電チャック11に吸着される基板15を損傷することなく迅速に剥離することができる。
(実施形態の補足事項)
以上、本発明を上述した実施形態によって説明してきたが、本発明の技術的範囲は上述した実施形態に限定されるものではなく、例えば、以下のような形態でも良い。
In this embodiment, the first outer member 19B, the first inner member 21B, the second inner member 21C, and the second outer member 19C are sequentially moved upward and sequentially from one side of the substrate 15 toward the other side. Since the substrate 15 is peeled off, the substrate 15 attracted to the electrostatic chuck 11 can be quickly peeled off without being damaged by the residual attracting force.
(Supplementary items of the embodiment)
As mentioned above, although this invention was demonstrated by embodiment mentioned above, the technical scope of this invention is not limited to embodiment mentioned above, For example, the following forms may be sufficient.

(1)上述した第2および第3の実施形態では、静電チャック11に駆動機構25Aを内蔵した例について説明したが、静電チャック11の外部に駆動機構25Aを設けるようにしても良い。   (1) In the second and third embodiments described above, the example in which the drive mechanism 25A is built in the electrostatic chuck 11 has been described. However, the drive mechanism 25A may be provided outside the electrostatic chuck 11.

(2)上述した第3の実施形態では、第1の外側部材19B、第1の内側部材21B、第2の内側部材21C、第2の外側部材19Cを駆動機構25Aにより個別に移動した例について説明したが、例えば、第1の実施形態のように、移動部材23に第1の外側部材19B、第1の内側部材21B、第2の内側部材21C、第2の外側部材19Cを、長さが順次短くなるように固定し、移動部材23を移動するようにしても良い。   (2) In the above-described third embodiment, the first outer member 19B, the first inner member 21B, the second inner member 21C, and the second outer member 19C are individually moved by the drive mechanism 25A. As described above, for example, as in the first embodiment, the moving member 23 has the first outer member 19B, the first inner member 21B, the second inner member 21C, and the second outer member 19C. May be fixed so as to be sequentially shortened, and the moving member 23 may be moved.

(3)上述した実施形態では、ウエハからなる基板の吸着に本発明を適用した例について説明したが、例えば、液晶パネル基板等の基板の吸着に広く適用することができる。   (3) In the above-described embodiment, an example in which the present invention is applied to adsorption of a substrate made of a wafer has been described. However, the present invention can be widely applied to adsorption of a substrate such as a liquid crystal panel substrate.

本発明の基板剥離装置の第1の実施形態を示す説明図である。It is explanatory drawing which shows 1st Embodiment of the board | substrate peeling apparatus of this invention. 図1の静電チャックを上方から見た状態を示す説明図である。It is explanatory drawing which shows the state which looked at the electrostatic chuck of FIG. 1 from upper direction. 図1の基板剥離装置の剥離動作を示す説明図である。It is explanatory drawing which shows peeling operation | movement of the board | substrate peeling apparatus of FIG. 本発明の基板剥離装置の第2の実施形態を示す説明図である。It is explanatory drawing which shows 2nd Embodiment of the board | substrate peeling apparatus of this invention. 図4の静電チャックを上方から見た状態を示す説明図である。It is explanatory drawing which shows the state which looked at the electrostatic chuck of FIG. 4 from upper direction. 図4の基板剥離装置の剥離動作を示す説明図である。It is explanatory drawing which shows peeling operation | movement of the board | substrate peeling apparatus of FIG. 本発明の基板剥離装置の第3の実施形態を示す説明図である。It is explanatory drawing which shows 3rd Embodiment of the board | substrate peeling apparatus of this invention. 図7の静電チャックを上方から見た状態を示す説明図である。It is explanatory drawing which shows the state which looked at the electrostatic chuck of FIG. 7 from upper direction. 図7の基板剥離装置の剥離動作を示す説明図である。It is explanatory drawing which shows peeling operation | movement of the board | substrate peeling apparatus of FIG. 図4の基板剥離装置の剥離方法を示す説明図である。It is explanatory drawing which shows the peeling method of the board | substrate peeling apparatus of FIG.

符号の説明Explanation of symbols

11…静電チャック、13…チャック本体、13a…吸着面、15…基板、19,19A…外側部材、19B…第1の外側部材、19C…第2の外側部材、21,21A…内側部材、21B…第1の内側部材、21C…第2の内側部材、25,25A…駆動機構。
DESCRIPTION OF SYMBOLS 11 ... Electrostatic chuck, 13 ... Chuck body, 13a ... Adsorption surface, 15 ... Substrate, 19, 19A ... Outer member, 19B ... First outer member, 19C ... Second outer member, 21, 21A ... Inner member, 21B: first inner member, 21C: second inner member, 25, 25A: drive mechanism.

Claims (7)

静電チャックの吸着面上の基板を、前記吸着面から剥離する基板剥離方法において、
前記基板の外周部を前記吸着面から剥離した後、前記基板の外周部より内側を前記吸着面から剥離することを特徴とする基板剥離方法。
In the substrate peeling method for peeling the substrate on the suction surface of the electrostatic chuck from the suction surface,
After peeling the outer peripheral part of the said board | substrate from the said adsorption | suction surface, the inner side from the outer peripheral part of the said board | substrate is peeled from the said adsorption | suction surface.
静電チャックの吸着面上の基板を、前記吸着面から剥離する基板剥離方法において、
前記基板の一部分の外周部を前記吸着面から剥離した後、前記基板の前記一部分の外周部より内側を前記吸着面から剥離し、この後、前記基板の前記一部分とは異なる部分を前記吸着面から剥離することを特徴とする基板剥離方法。
In the substrate peeling method for peeling the substrate on the suction surface of the electrostatic chuck from the suction surface,
After peeling the outer peripheral portion of a part of the substrate from the suction surface, the inner side from the outer peripheral portion of the part of the substrate is peeled from the suction surface, and thereafter, a portion different from the part of the substrate is removed from the suction surface. The substrate peeling method characterized by peeling from.
請求項2に記載の基板剥離方法において、
前記一部分とは異なる部分の外周部より内側を前記吸着面から剥離した後、前記一部分とは異なる部分の外周部を前記吸着面から剥離することを特徴とする基板剥離方法。
The substrate peeling method according to claim 2,
A substrate peeling method, comprising: peeling an inner part from an outer peripheral part of a part different from the part from the suction surface, and then peeling an outer peripheral part of a part different from the part from the suction surface.
静電チャックの吸着面上の基板を、前記吸着面から剥離する基板剥離装置において、
前記吸着面に面した側から前記基板の外周部に当接する外側部材と、
前記吸着面に面した側から前記基板に対して前記外周部より内側に当接する内側部材と、
前記外側部材により前記基板の外周部を突き上げた後、前記内側部材により前記基板の外周部より内側を突き上げる駆動機構と、
を有することを特徴とする基板剥離装置。
In the substrate peeling apparatus for peeling the substrate on the suction surface of the electrostatic chuck from the suction surface,
An outer member that comes into contact with the outer periphery of the substrate from the side facing the suction surface;
An inner member that comes into contact with the substrate on the inside from the outer peripheral portion from the side facing the suction surface;
A drive mechanism that pushes up the outer peripheral portion of the substrate by the outer member and then pushes the inner portion of the substrate from the outer peripheral portion by the inner member;
A substrate peeling apparatus comprising:
請求項4記載の基板剥離装置において、
前記静電チャックの前記吸着面と反対側に配置され前記外側部材および内側部材が固定される移動部材を備え、
前記外側部材の長さを、前記内側部材の長さより長くしてなり、
前記駆動機構は、前記移動部材を突き上げ方向に移動することを特徴とする基板剥離装置。
The substrate peeling apparatus according to claim 4, wherein
A movable member disposed on the opposite side of the electrostatic chuck to the attracting surface and to which the outer member and the inner member are fixed;
The outer member is made longer than the inner member,
The substrate peeling apparatus, wherein the driving mechanism moves the moving member in a push-up direction.
請求項4記載の基板剥離装置において、
前記駆動機構は、
前記外側部材と内側部材とを個別に突き上げ方向に移動可能であり、前記外側部材を移動した後、前記内側部材を移動することを特徴とする基板剥離装置。
The substrate peeling apparatus according to claim 4, wherein
The drive mechanism is
The substrate peeling apparatus, wherein the outer member and the inner member are individually movable in the push-up direction, and the inner member is moved after the outer member is moved.
静電チャックの吸着面上の基板を、前記吸着面から剥離する基板剥離装置において、
前記吸着面に面した側から前記基板の片側の外周部に当接する第1の外側部材と、
前記吸着面に面した側から前記基板の他側の外周部に当接する第2の外側部材と、
前記吸着面に面した側から前記基板に対して前記外周部より内側に当接する内側部材と、
前記第1の外側部材により前記基板の片側の外周部を突き上げた後、前記内側部材により前記基板の外周部より内側を突き上げ、この後、前記第2の外側部材により前記基板の外周部の他側を突き上げる駆動機構と、
を有することを特徴とする基板剥離装置。
In the substrate peeling apparatus for peeling the substrate on the suction surface of the electrostatic chuck from the suction surface,
A first outer member in contact with the outer peripheral portion on one side of the substrate from the side facing the suction surface;
A second outer member in contact with the outer peripheral portion on the other side of the substrate from the side facing the suction surface;
An inner member that comes into contact with the substrate on the inside from the outer peripheral portion from the side facing the suction surface;
After the outer peripheral portion on one side of the substrate is pushed up by the first outer member, the inner member pushes inward from the outer peripheral portion of the substrate, and thereafter, the outer member of the outer peripheral portion of the substrate is pushed by the second outer member. A drive mechanism that pushes up the side,
A substrate peeling apparatus comprising:
JP2007193344A 2007-07-25 2007-07-25 Method and apparatus for peeling substrate Pending JP2009032790A (en)

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Application Number Priority Date Filing Date Title
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009144938A1 (en) * 2008-05-30 2009-12-03 パナソニック株式会社 Plasma processing device and method
KR101607765B1 (en) 2013-08-29 2016-03-30 파나소닉 아이피 매니지먼트 가부시키가이샤 Apparatus for peeling a substrate

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JPH11243137A (en) * 1998-10-14 1999-09-07 Nec Corp Electrostatic chuck
JP2002246450A (en) * 2001-02-20 2002-08-30 Nikon Corp Substrate-holding device and substrate-transfer method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1064982A (en) * 1996-08-14 1998-03-06 Dainippon Screen Mfg Co Ltd Substrate support mechanism and substrate treatment unit
JPH11243137A (en) * 1998-10-14 1999-09-07 Nec Corp Electrostatic chuck
JP2002246450A (en) * 2001-02-20 2002-08-30 Nikon Corp Substrate-holding device and substrate-transfer method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009144938A1 (en) * 2008-05-30 2009-12-03 パナソニック株式会社 Plasma processing device and method
JP4769335B2 (en) * 2008-05-30 2011-09-07 パナソニック株式会社 Plasma processing apparatus and method
US8673166B2 (en) 2008-05-30 2014-03-18 Panasonic Corporation Plasma processing apparatus and plasma processing method
KR101607765B1 (en) 2013-08-29 2016-03-30 파나소닉 아이피 매니지먼트 가부시키가이샤 Apparatus for peeling a substrate

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