JP2009027013A - Semiconductor device - Google Patents

Semiconductor device Download PDF

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JP2009027013A
JP2009027013A JP2007189620A JP2007189620A JP2009027013A JP 2009027013 A JP2009027013 A JP 2009027013A JP 2007189620 A JP2007189620 A JP 2007189620A JP 2007189620 A JP2007189620 A JP 2007189620A JP 2009027013 A JP2009027013 A JP 2009027013A
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differential
resistor
semiconductor device
external connection
pads
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Takeshi Hosoya
武史 細谷
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Nippon CMK Corp
CMK Corp
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Nippon CMK Corp
CMK Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor device that is equipped with a differential transmission channel having no constraint on design flexibility. <P>SOLUTION: The semiconductor device 1 includes a semiconductor integrated circuit, arranged at least on a surface layer or inside; a plurality of external connection pads 2 for electrically connecting the semiconductor integrated circuit to the outside; and a differential signal transmission line 3, which is connected to two external connection pads that are used for differential signal transmission out of the external connection pads. A resistor is provided between the external connection pads which are used for differential signal transmission. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は半導体装置に係り、特に高速信号伝送に対応した半導体装置とその製造方法に関するものである。   The present invention relates to a semiconductor device, and more particularly, to a semiconductor device compatible with high-speed signal transmission and a manufacturing method thereof.

昨今、電子機器のデジタル化が進み、信号伝送の大容量化、高速化が必須となる中、プリント配線板上に実装された複数の半導体パッケージ間の高速データ伝送が求められている。   In recent years, with the progress of digitalization of electronic devices and the necessity of increasing the capacity and speed of signal transmission, high-speed data transmission between a plurality of semiconductor packages mounted on a printed wiring board is required.

これに対して、クロック同期型の高速入出力インターフェース仕様として、オープンドレイン方式のインターフェース仕様や、LVDS(Low Voltage Differential Signaling)のような小振幅インターフェース仕様が知られている。   On the other hand, open-drain interface specifications and small-amplitude interface specifications such as LVDS (Low Voltage Differential Signaling) are known as clock synchronous high-speed input / output interface specifications.

しかし、これら従来の入出力インターフェース仕様は、いずれも複数のデータビットを1本のデータ線で伝送する「シングル伝送方式」で、外来ノイズの影響を受け易いという問題があった。   However, each of these conventional input / output interface specifications is a “single transmission method” in which a plurality of data bits are transmitted through a single data line, and has a problem of being easily affected by external noise.

そこで、高速入出力インターフェース仕様としては、2本のデータ線を用いて1個のデータビットを伝送することでコモンモードノイズ除去性能を向上させた「差動伝送」を用いる方法が提案されている(例えば、特許文献1参照)。   Therefore, as a high-speed input / output interface specification, there has been proposed a method using “differential transmission” in which common mode noise removal performance is improved by transmitting one data bit using two data lines. (For example, refer to Patent Document 1).

この差動伝送方式を適正に機能させるための必要項目のひとつとして、差動配線に対する「終端」の技術が挙げられる。   One of the necessary items for properly functioning this differential transmission method is a technique of “termination” for differential wiring.

先に述べた電子機器の高速伝送化に加え、現代技術の基本的概念である「機器の軽薄短小化」の要望も強く、差動配線の適正且つ高集積な終端技術が切望されている。   In addition to the high-speed transmission of electronic devices described above, there is a strong demand for “lightening, thinning, and shortening of devices”, which is a basic concept of modern technology, and appropriate and highly integrated termination technology for differential wiring is eagerly desired.

終端は「抵抗値」で考えられ、差動伝送方式の場合には一般的に100Ωが用いられることが多い。   Termination is considered as “resistance value”, and in the case of the differential transmission method, generally 100Ω is often used.

この終端抵抗は、例えば100Ωの設計であれば、差動伝送路の2線間に100Ωのチップ抵抗器を挿入することでディファレンシャルモードノイズは理論上完全に整合し終端される。   For example, if the termination resistance is designed to be 100Ω, the differential mode noise is theoretically perfectly matched and terminated by inserting a 100Ω chip resistor between two lines of the differential transmission path.

ところが実際は、差動伝送を必要とするような高速伝送回路では、差動伝送路の2線間の間隔はチップ抵抗器の幅よりも狭く、従って、線間にチップ抵抗器を配置することはできない。   However, in fact, in a high-speed transmission circuit that requires differential transmission, the distance between two lines of the differential transmission path is narrower than the width of the chip resistor, and therefore it is not possible to arrange a chip resistor between the lines. Can not.

そこで通常、1対の差動2線の外側周辺にGNDに接続されたチップ抵抗器を設け、差動2線各々から分岐した接続配線により当該チップ抵抗器と接続する方法を用いる。   Therefore, a method is generally used in which a chip resistor connected to GND is provided around the outside of the pair of differential two lines, and the chip resistor is connected by connection wiring branched from each differential two line.

ここで、従来の一般的な差動伝送方式による実際の終端方法を図2を用いて説明する。   Here, an actual termination method using a conventional general differential transmission system will be described with reference to FIG.

図2において、20は基板内の回路において差動信号2Aを使用する半導体装置で、差動伝送ICが実装される領域21と、当該領域内に存在する複数のボールグリッドアレイ型パッケージIC外部接続用はんだボール受けパッド(以下「受けパッド」と云う)22と、当該受けパッド22のうち差動伝送に用いる受けパッド22と接続されている差動信号伝送線路(以下「差動伝送路」と云う)23と、当該受けパッド22のうち差動伝送に用いる受けパッド22から分岐し1対の差動伝送路23の分岐線路各々に接続されている終端抵抗器2Cと、を備えている。   In FIG. 2, reference numeral 20 denotes a semiconductor device that uses a differential signal 2A in a circuit on a substrate, and a region 21 where a differential transmission IC is mounted and a plurality of ball grid array type package ICs existing in the region. Solder ball receiving pads (hereinafter referred to as “receiving pads”) 22 and differential signal transmission lines (hereinafter referred to as “differential transmission lines”) connected to the receiving pads 22 of the receiving pads 22 used for differential transmission. 23) and a terminating resistor 2C branched from the receiving pad 22 of the receiving pad 22 used for differential transmission and connected to each branch line of the pair of differential transmission paths 23.

図2に示すように、1対の差動伝送路23は、領域24において受けパッド22から分岐し、分岐線路各々が終端抵抗器2Cに接続され、当該各々の終端抵抗器2CはGND(2B)に接続されているため、仮に当該終端抵抗器2Cが各々50Ωのチップ抵抗器であったとすると、当該差動伝送路23はGND(2B)をセンターとし±50Ω、つまり差動伝送路間に100Ωの差動終端抵抗を備えていることとなる。   As shown in FIG. 2, the pair of differential transmission lines 23 branches from the receiving pad 22 in the region 24, each branch line is connected to the termination resistor 2C, and each termination resistor 2C is connected to GND (2B If the termination resistors 2C are 50Ω chip resistors, the differential transmission line 23 is ± 50Ω with GND (2B) as the center, that is, between the differential transmission lines. A 100Ω differential termination resistor is provided.

ところが実際は、一般的に用いられる市販のチップ抵抗器は通常51Ωであり、当該差動伝送路間の終端抵抗値も102Ωとなるため、所望の抵抗値100Ωとの差異があった。   However, in practice, a commercially available chip resistor that is generally used is normally 51Ω, and the termination resistance value between the differential transmission lines is also 102Ω, which is different from the desired resistance value of 100Ω.

また、使用するチップ抵抗器の製品規格によっても異なるが、必ずバラツキが存在するため、例えば、±5%の精度を保証した規格の製品を用いた場合、当該差動伝送間の終端抵抗値は102Ωをセンターとして92Ω(−10%相当)から112Ω(+10%相当)の幅で変化する可能性があり、安定した終端を得ることが難しく、従って、安定した差動伝送を維持できない可能性があった。   In addition, although it varies depending on the product standard of the chip resistor to be used, there is always variation. For example, when a product with a standard that guarantees an accuracy of ± 5% is used, the termination resistance value between the differential transmissions is There is a possibility of changing in the range of 92Ω (equivalent to −10%) to 112Ω (equivalent to + 10%) with 102Ω as the center, and it is difficult to obtain a stable termination. Therefore, there is a possibility that stable differential transmission cannot be maintained. there were.

また、分岐した接続配線によりチップ抵抗器と接続する当該方法を用いた場合には、1対の差動2線各々から終端用のチップ抵抗までの線路を完全に等しくすることは難しく、差動2線のバランスを崩すこととなり、ディファレンシャルモードノイズ以外にコモンモードノイズが発生してしまうという問題があった。   Further, in the case of using the method of connecting to the chip resistor by the branched connection wiring, it is difficult to completely equalize the line from each of the pair of differential two lines to the terminating chip resistor. The balance between the two wires is lost, and there is a problem in that common mode noise occurs in addition to differential mode noise.

更に、差動2線各々から終端用のチップ抵抗までの接続配線自体が差動線路の直線性を妨げ、差動2線のバランスを崩す要因となるばかりでなく、差動伝送路を必要とするような高速伝送回路にとって遅延や損失等の悪影響を及ぼす要因となっていた。   Further, the connection wiring itself from each differential two line to the terminating chip resistor hinders the linearity of the differential line and causes the balance of the differential two lines to be lost, and also requires a differential transmission line. Such a high-speed transmission circuit is a factor that adversely affects delay and loss.

そこで、センタータップ方式と呼ばれる回路を用いて差動伝送路を終端する方法が提案されている(例えば、特許文献2参照)。   Thus, a method of terminating the differential transmission path using a circuit called a center tap method has been proposed (for example, see Patent Document 2).

ここで、センタータップ方式による差動伝送路の終端方法を図3を用いて説明する。   Here, the termination method of the differential transmission line by the center tap method will be described with reference to FIG.

図3において、30は基板内の回路において差動信号3Aを使用する半導体装置で、差動伝送ICが実装される領域31と、当該領域内に存在する複数の受けパッド32と、当該受けパッド32のうち差動伝送に用いる受けパッド32と接続されている差動伝送路33と、当該受けパッド32のうち差動伝送に用いる受けパッド32から分岐し1対の差動伝送路33の分岐線路各々に接続されている終端抵抗器3Cと、当該終端抵抗器3Cに接続されているコンデンサ3Dと、を備えている。   In FIG. 3, reference numeral 30 denotes a semiconductor device that uses a differential signal 3A in a circuit in a substrate, and includes an area 31 on which a differential transmission IC is mounted, a plurality of receiving pads 32 existing in the area, and the receiving pads. 32, a differential transmission path 33 connected to a receiving pad 32 used for differential transmission, and a branch of the pair of differential transmission paths 33 branched from the receiving pad 32 used for differential transmission. A termination resistor 3C connected to each line and a capacitor 3D connected to the termination resistor 3C are provided.

図3に示すように、1対の差動伝送路33は、領域34において受けパッドから分岐し、分岐線路各々が終端抵抗器3Cに接続され、当該各々の終端抵抗器3Cは直列に接続され、当該2つの終端抵抗器の接続部にコンデンサ3Dが接続され、当該コンデンサ3Dを介してGND(3B)に接続されているため、2つの終端抵抗のセンターが仮想上のGNDとなり、差動2線のバランスが崩れることを抑制する構成となっている。   As shown in FIG. 3, the pair of differential transmission lines 33 branches from the receiving pad in the region 34, each branch line is connected to the termination resistor 3C, and each termination resistor 3C is connected in series. Since the capacitor 3D is connected to the connection portion of the two termination resistors and is connected to the GND (3B) via the capacitor 3D, the center of the two termination resistors becomes a virtual GND, and the differential 2 It is the structure which suppresses that the balance of a line is lost.

このような構成により、コモンモードノイズは、各終端抵抗器3Cとコンデンサ3Dのインピーダンスによって消費され、結果、コモンモードノイズは抑制される。   With such a configuration, common mode noise is consumed by the impedance of each termination resistor 3C and capacitor 3D, and as a result, common mode noise is suppressed.

しかしながら、センタータップ終端回路は、図3に示す通り、少なくとも抵抗器2つとコンデンサ1つの計3つのチップ部品が必要となり、高集積化、高密度配線化を必要とする高速伝送の設計自由度を束縛するという問題があった。   However, as shown in FIG. 3, the center tap termination circuit requires at least two resistors and one capacitor in total, which is a total of three chip parts, and has high design flexibility for high-speed transmission that requires high integration and high-density wiring. There was a problem of binding.

また、少なくともコンデンサ3Dの片側一方の端子をGNDに接続する必要があり、設計自由度の束縛を更に強めてしまうという問題があった。
特開平10−303521号公報 特開2001−053192号公報
Further, it is necessary to connect at least one terminal of the capacitor 3D to the GND, and there is a problem that the constraint on the degree of freedom of design is further increased.
JP-A-10-303521 JP 2001-053192 A

本発明は、上記の問題と実状に鑑みてなされたもので、設計自由度の束縛が無い差動伝送路を備えた半導体装置を提供することを課題とする。   The present invention has been made in view of the above problems and actual circumstances, and an object of the present invention is to provide a semiconductor device including a differential transmission path that is free from constraints on design freedom.

即ち、請求項1に係る本発明は、少なくとも表層又は内部に半導体集積回路を配置すると共に、当該半導体集積回路と外部とを電気的に接続する外部接続用パッドを複数配置した差動信号伝送線路を備える半導体装置において、当該外部接続用パッドが複数配置された面に抵抗体が設けられていることを特徴とする半導体装置により上記課題を解決したものである。   That is, the present invention according to claim 1 is a differential signal transmission line in which a semiconductor integrated circuit is arranged at least on the surface layer or inside, and a plurality of pads for external connection for electrically connecting the semiconductor integrated circuit and the outside are arranged. In the semiconductor device including the above, the above problem is solved by a semiconductor device characterized in that a resistor is provided on a surface on which a plurality of pads for external connection are arranged.

これにより、設計自由度の束縛が無い差動信号伝送線路を備えた半導体装置が得られる。   As a result, a semiconductor device including a differential signal transmission line that is free from design flexibility is obtained.

また、請求項2に係る本発明は、前記抵抗体が、2つの外部接続用パッド間を接続していることを特徴としている。   The present invention according to claim 2 is characterized in that the resistor connects between two external connection pads.

これにより、迂回や分岐をすることなく、最適最短に配置された抵抗体を含む差動信号伝送線路を備えた半導体装置が得られる。   As a result, a semiconductor device including a differential signal transmission line including resistors arranged in the optimum shortest without detouring or branching can be obtained.

また、請求項3に係る本発明は、前記2つの外部接続用パッドが、互いに隣接して配置されていることを特徴としている。   The present invention according to claim 3 is characterized in that the two external connection pads are arranged adjacent to each other.

これにより、2つのパッドが隣接且つ接近した差動信号伝送線路用のパッド間においても、迂回や分岐をすることなく最適最短に配置された差動終端抵抗を設けることが可能となる。   This makes it possible to provide a differential termination resistor arranged at the optimum shortest without detouring or branching between the pads for differential signal transmission lines that are adjacent and close to each other.

また、請求項4に係る本発明は、前記2つの外部接続用パッドが、当該異なる2つの外部接続用パッドを対として差動信号を伝送する差動信号伝送用パッドであると共に、前記抵抗体が差動信号伝送線路を終端する差動信号伝送線路用終端抵抗であることを特徴としている。   According to a fourth aspect of the present invention, the two external connection pads are differential signal transmission pads for transmitting a differential signal with the two different external connection pads as a pair, and the resistor Is a termination resistor for a differential signal transmission line that terminates the differential signal transmission line.

これにより、差動信号伝送線路を備えた半導体装置においても、ディファレンシャルモードノイズ、コモンモードノイズが共に抑制され、設計自由度の束縛が無い差動伝送路を備えた半導体装置を得ることが可能となる。   As a result, even in a semiconductor device having a differential signal transmission line, it is possible to obtain a semiconductor device having a differential transmission path in which both differential mode noise and common mode noise are suppressed and there is no constraint on the degree of freedom of design. Become.

また、請求項5に係る本発明は、前記抵抗体が、形成抵抗体であることを特徴としている。   The present invention according to claim 5 is characterized in that the resistor is a forming resistor.

これにより、1対の差動2線の間隔やパッドの間隔に係らず、差動終端抵抗が配置可能となる。   As a result, the differential termination resistor can be arranged regardless of the distance between the pair of differential lines 2 and the distance between the pads.

本発明により、設計自由度の束縛が無い差動伝送路を備えた半導体装置を提供することができる。   According to the present invention, it is possible to provide a semiconductor device provided with a differential transmission path that is free from design flexibility.

本発明の実施の形態を図1(a)及び(b)を用いて説明する。   An embodiment of the present invention will be described with reference to FIGS. 1 (a) and 1 (b).

図1(a)は、本発明の半導体装置の概略平面説明図である。該図1(a)において、1は基板内の回路において差動信号1Aを使用する半導体装置で、複数のボールグリッドアレイ型パッケージIC外部接続用はんだボール受けパッド(以下「受けパッド」と云う)2と、当該受けパッド2のうち差動伝送に用いる受けパッド2つが互いに隣接して配置されている領域4と、当該差動伝送に用いる受けパッド2つと接続されている差動伝送路3と、当該差動伝送に用いる2つの受けパッド2間に接続されている形成抵抗5と、を備えている。   FIG. 1A is a schematic plan view of a semiconductor device of the present invention. In FIG. 1A, reference numeral 1 denotes a semiconductor device that uses a differential signal 1A in a circuit in a substrate, and a plurality of ball grid array type package IC external connection solder ball receiving pads (hereinafter referred to as "receiving pads"). 2, a region 4 where two receiving pads used for differential transmission among the receiving pads 2 are arranged adjacent to each other, and a differential transmission path 3 connected to the two receiving pads used for differential transmission And a forming resistor 5 connected between the two receiving pads 2 used for the differential transmission.

また、図1(b)は、図1(a)における形成抵抗5部の拡大概略断面説明図である。該図1(b)において、図1(a)と同じ符号は同じものを示していると共に、6は図示しない半導体ベアチップと受けパッド2を接続する接続導体、7は半導体装置1本体を構成する絶縁物、8は受けパッド2に溶着した半田ボールを示している。   FIG. 1B is an enlarged schematic cross-sectional explanatory view of the forming resistor 5 in FIG. In FIG. 1B, the same reference numerals as those in FIG. 1A denote the same components, 6 a connection conductor for connecting a semiconductor bare chip (not shown) and the receiving pad 2, and 7 a main body of the semiconductor device 1. An insulator 8 is a solder ball welded to the receiving pad 2.

尚、図1(b)は、本実施の形態をより分かり易く説明するために、図1(a)の領域4内にある受けパッド2に、半田ボール8を加えた状態で図示している。   FIG. 1 (b) shows the embodiment in a state where solder balls 8 are added to the receiving pad 2 in the region 4 of FIG. 1 (a) for easier understanding. .

図1(a)に示されるように、本願発明の半導体装置1は、領域4内の差動伝送に用いる2つの受けパッド2間に形成抵抗5を設けているため、迂回や分岐をすることなく、差動伝送路3にとって最適最短に配置された差動終端抵抗を得ることができる。   As shown in FIG. 1 (a), the semiconductor device 1 of the present invention has a forming resistor 5 between two receiving pads 2 used for differential transmission in the region 4, and therefore bypasses and branches. In other words, it is possible to obtain a differential termination resistor arranged in the shortest optimum for the differential transmission path 3.

これにより、差動信号伝送線路を備えた半導体装置においても、ディファレンシャルモードノイズ、コモンモードノイズが共に抑制され、設計自由度の束縛が無い差動伝送路を備えた半導体装置を得ることができる。   As a result, even in a semiconductor device provided with a differential signal transmission line, it is possible to obtain a semiconductor device provided with a differential transmission path in which both differential mode noise and common mode noise are suppressed and design freedom is not restricted.

また、本発明の終端方法を用いることにより、2つのパッドが隣接且つ接近した差動信号伝送線路用のパッド間においても、迂回や分岐をすることなく最適最短に配置された差動終端抵抗を得ることができる。   In addition, by using the termination method of the present invention, the differential termination resistor arranged at the optimum shortest without detouring or branching between the pads for differential signal transmission lines adjacent to and adjacent to each other by two pads can be provided. Obtainable.

従って、1対の差動2線の間隔やパッドの間隔に係らず、年々小型化が進む半導体パッケージICに対応した差動伝送路を備えた半導体装置を得ることができる。   Therefore, it is possible to obtain a semiconductor device including a differential transmission path corresponding to a semiconductor package IC that is becoming smaller year by year regardless of the distance between a pair of differential two wires and the distance between pads.

前記形成抵抗5は、抵抗機能を有するペースト等を使用する所謂厚膜技術を用いた厚膜形成抵抗であっても良く、この場合、通常の半導体パッケージICの半田ボール接合面に必要な箇所のみに厚膜抵抗を設けることが可能で、利便性及び経済性に優れる。   The forming resistor 5 may be a thick film forming resistor using a so-called thick film technology using a paste having a resistance function, and in this case, only a necessary portion on a solder ball bonding surface of a normal semiconductor package IC is used. It is possible to provide a thick film resistor, which is excellent in convenience and economy.

また、前記形成抵抗5は、スパッタ等の薄膜技術を用いた薄膜形成抵抗であっても良く、この場合、形成抵抗の形成性が高く当該抵抗自体の厚みも1μm前後若しくはそれ以下の薄さのため、製品における当該抵抗の抵抗値精度において非常に優れたものとなる。   The forming resistor 5 may be a thin film forming resistor using a thin film technique such as sputtering. In this case, the forming resistor is highly formed and the thickness of the resistor itself is about 1 μm or less. Therefore, the resistance value accuracy of the resistor in the product is extremely excellent.

また、前記形成抵抗5は、抵抗層付き銅箔を加工することで得られる配線抵抗体であっても良く、この場合、当該形成抵抗と同一面の他の形成抵抗を同時に加工することが可能で、且つ、製造工程上で追加または反復重複する工程がなく、タクト(製造スピード)及び製造コストの増加がなく、経済性に優れる。   The forming resistor 5 may be a wiring resistor obtained by processing a copper foil with a resistance layer. In this case, other forming resistors on the same surface as the forming resistor can be processed simultaneously. In addition, there are no additional or repeated processes in the manufacturing process, no increase in tact (manufacturing speed) and manufacturing cost, and excellent economy.

因に、現在のところ、当該形成抵抗5に匹敵する程小さい形状のチップ抵抗器は一般市場になく入手することは困難であるが、将来的に当該形成抵抗に匹敵する程小さい形状のチップ抵抗器が容易に入手することが可能となれば、当然、当該形成抵抗の代替として利用可能である。   Incidentally, at present, a chip resistor having a shape small enough to match the forming resistance 5 is difficult to obtain without being available in the general market. However, a chip resistor having a shape small enough to match the forming resistance in the future is difficult. If the vessel can be easily obtained, it can naturally be used as an alternative to the forming resistor.

尚、本発明の半導体装置1は、説明の便宜上、図1(a)においては、該図に示す数及び形状の受けパッドを設けた半導体パッケージ基板を用いて表現しているが、当然、本発明は半導体パッケージ基板の種類により別段限定されるものではなく、また、半導体パッケージ基板に限らず、同構成を成し得るプリント配線板でも実施し得る。   For convenience of explanation, the semiconductor device 1 of the present invention is expressed using a semiconductor package substrate provided with receiving pads having the number and shape shown in FIG. 1A. The invention is not particularly limited by the type of the semiconductor package substrate, and is not limited to the semiconductor package substrate, and may be implemented by a printed wiring board having the same configuration.

本発明を説明するに当たって、前述の実施の形態を例として説明したが、本発明の構成はこれらの限りでなく、また、これらの例により何ら制限されるものではなく、本発明の範囲内で種々の変更が可能である。   In the description of the present invention, the above-described embodiment has been described as an example. However, the configuration of the present invention is not limited to these, and is not limited to these examples, and is within the scope of the present invention. Various changes are possible.

(a)は本発明の半導体装置の概略平面説明図、(b)は同半導体装置における形成抵抗部の拡大概略断面説明図。(A) is a schematic plane explanatory view of the semiconductor device of the present invention, (b) is an enlarged schematic cross-sectional explanatory view of a forming resistance portion in the semiconductor device. 従来の半導体装置例を示す概略平面説明図。FIG. 7 is a schematic plan view showing an example of a conventional semiconductor device. 他の従来の半導体装置例を示す概略平面説明図。FIG. 10 is a schematic plan view showing another example of a conventional semiconductor device.

符号の説明Explanation of symbols

1:半導体装置
2,22,32:受けパッド
3,23,33:差動伝送路
4,24,34:差動伝送に用いる受けパッドを含む領域
5:形成抵抗
6:接続導体
7:絶縁物
8:半田ボール
20,30:半導体装置
21,31:差動伝送ICが実装される領域
2A,3A:差動信号
2B,3B:GND
2C,3C:チップ抵抗器
3D:チップコンデンサ
1: Semiconductor devices 2, 22, 32: receiving pads 3, 23, 33: differential transmission paths 4, 24, 34: regions including receiving pads used for differential transmission 5: forming resistor 6: connecting conductor 7: insulator 8: Solder balls 20, 30: Semiconductor devices 21, 31: Regions 2A, 3A where differential transmission ICs are mounted: Differential signals 2B, 3B: GND
2C, 3C: Chip resistor 3D: Chip capacitor

Claims (5)

少なくとも表層又は内部に半導体集積回路を配置すると共に、当該半導体集積回路と外部とを電気的に接続する外部接続用パッドを複数配置した差動信号伝送線路を備える半導体装置において、当該外部接続用パッドが複数配置された面に抵抗体が設けられていることを特徴とする半導体装置。   In a semiconductor device including a differential signal transmission line in which a semiconductor integrated circuit is disposed at least on the surface layer or inside and a plurality of pads for external connection for electrically connecting the semiconductor integrated circuit and the outside are disposed, the pad for external connection A semiconductor device, wherein a resistor is provided on a surface on which a plurality of semiconductor devices are arranged. 前記抵抗体が、2つの外部接続用パッド間を接続していることを特徴とする請求項1記載の半導体装置。   2. The semiconductor device according to claim 1, wherein the resistor connects between two external connection pads. 前記2つの外部接続用パッドが、互いに隣接して配置されていることを特徴とする請求項1又は2記載の半導体装置。   3. The semiconductor device according to claim 1, wherein the two external connection pads are arranged adjacent to each other. 前記2つの外部接続用パッドが、当該2つの外部接続用パッドを対として差動信号を伝送する差動信号伝送用パッドであると共に、前記抵抗体が差動信号伝送線路を終端する差動信号伝送線路用終端抵抗であることを特徴とする請求項1〜3の何れか1項記載の半導体装置。   The two external connection pads are differential signal transmission pads for transmitting a differential signal with the two external connection pads as a pair, and the differential body terminates the differential signal transmission line. The semiconductor device according to claim 1, wherein the semiconductor device is a transmission line termination resistor. 前記抵抗体が、形成抵抗体であることを特徴とする請求項1〜4の何れか1項記載の半導体装置。   The semiconductor device according to claim 1, wherein the resistor is a forming resistor.
JP2007189620A 2007-07-20 2007-07-20 Semiconductor device Pending JP2009027013A (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1041434A (en) * 1996-07-25 1998-02-13 Nec Corp Semiconductor device and manufacture thereof
JP2004273475A (en) * 2003-03-04 2004-09-30 Canon Inc Semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1041434A (en) * 1996-07-25 1998-02-13 Nec Corp Semiconductor device and manufacture thereof
JP2004273475A (en) * 2003-03-04 2004-09-30 Canon Inc Semiconductor device

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