JP2009024191A - Dispersion of metallic nanoparticle and metallic coating film - Google Patents
Dispersion of metallic nanoparticle and metallic coating film Download PDFInfo
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- JP2009024191A JP2009024191A JP2007185689A JP2007185689A JP2009024191A JP 2009024191 A JP2009024191 A JP 2009024191A JP 2007185689 A JP2007185689 A JP 2007185689A JP 2007185689 A JP2007185689 A JP 2007185689A JP 2009024191 A JP2009024191 A JP 2009024191A
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- metal
- dispersion
- organic compound
- ether
- metal nanoparticle
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- 239000006185 dispersion Substances 0.000 title claims abstract description 41
- 239000002105 nanoparticle Substances 0.000 title abstract description 13
- 239000011248 coating agent Substances 0.000 title abstract description 7
- 238000000576 coating method Methods 0.000 title abstract description 7
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 24
- 239000002245 particle Substances 0.000 claims abstract description 17
- 150000002148 esters Chemical class 0.000 claims abstract description 12
- 150000002170 ethers Chemical class 0.000 claims abstract description 11
- 150000002576 ketones Chemical class 0.000 claims abstract description 11
- 239000002082 metal nanoparticle Substances 0.000 claims description 40
- 229910052751 metal Inorganic materials 0.000 claims description 31
- 239000002184 metal Substances 0.000 claims description 31
- 239000010949 copper Substances 0.000 claims description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 12
- 229910052709 silver Inorganic materials 0.000 claims description 12
- 239000004332 silver Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 238000010304 firing Methods 0.000 claims description 5
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 5
- 238000009835 boiling Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 13
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- XSIFPSYPOVKYCO-UHFFFAOYSA-N butyl benzoate Chemical compound CCCCOC(=O)C1=CC=CC=C1 XSIFPSYPOVKYCO-UHFFFAOYSA-N 0.000 description 8
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 8
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 8
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 7
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 6
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 6
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- LAVARTIQQDZFNT-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-yl acetate Chemical compound COCC(C)OCC(C)OC(C)=O LAVARTIQQDZFNT-UHFFFAOYSA-N 0.000 description 4
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 4
- MPAGVACEWQNVQO-UHFFFAOYSA-N 3-acetyloxybutyl acetate Chemical compound CC(=O)OC(C)CCOC(C)=O MPAGVACEWQNVQO-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 239000001087 glyceryl triacetate Substances 0.000 description 4
- 235000013773 glyceryl triacetate Nutrition 0.000 description 4
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 229960002622 triacetin Drugs 0.000 description 4
- BPIUIOXAFBGMNB-UHFFFAOYSA-N 1-hexoxyhexane Chemical compound CCCCCCOCCCCCC BPIUIOXAFBGMNB-UHFFFAOYSA-N 0.000 description 3
- WMDZKDKPYCNCDZ-UHFFFAOYSA-N 2-(2-butoxypropoxy)propan-1-ol Chemical compound CCCCOC(C)COC(C)CO WMDZKDKPYCNCDZ-UHFFFAOYSA-N 0.000 description 3
- XYVAYAJYLWYJJN-UHFFFAOYSA-N 2-(2-propoxypropoxy)propan-1-ol Chemical compound CCCOC(C)COC(C)CO XYVAYAJYLWYJJN-UHFFFAOYSA-N 0.000 description 3
- JDSQBDGCMUXRBM-UHFFFAOYSA-N 2-[2-(2-butoxypropoxy)propoxy]propan-1-ol Chemical compound CCCCOC(C)COC(C)COC(C)CO JDSQBDGCMUXRBM-UHFFFAOYSA-N 0.000 description 3
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 3
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 3
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- -1 organic acid salts Chemical class 0.000 description 3
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 2
- IBLKWZIFZMJLFL-UHFFFAOYSA-N 1-phenoxypropan-2-ol Chemical compound CC(O)COC1=CC=CC=C1 IBLKWZIFZMJLFL-UHFFFAOYSA-N 0.000 description 2
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 2
- CUDYYMUUJHLCGZ-UHFFFAOYSA-N 2-(2-methoxypropoxy)propan-1-ol Chemical compound COC(C)COC(C)CO CUDYYMUUJHLCGZ-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 2
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- YYLLIJHXUHJATK-UHFFFAOYSA-N Cyclohexyl acetate Chemical compound CC(=O)OC1CCCCC1 YYLLIJHXUHJATK-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 description 2
- WDAXFOBOLVPGLV-UHFFFAOYSA-N ethyl isobutyrate Chemical compound CCOC(=O)C(C)C WDAXFOBOLVPGLV-UHFFFAOYSA-N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 229940095102 methyl benzoate Drugs 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 229940116423 propylene glycol diacetate Drugs 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 2
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- PZHIWRCQKBBTOW-UHFFFAOYSA-N 1-ethoxybutane Chemical compound CCCCOCC PZHIWRCQKBBTOW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- UHOPWFKONJYLCF-UHFFFAOYSA-N 2-(2-sulfanylethyl)isoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(CCS)C(=O)C2=C1 UHOPWFKONJYLCF-UHFFFAOYSA-N 0.000 description 1
- AVMSWPWPYJVYKY-UHFFFAOYSA-N 2-Methylpropyl formate Chemical compound CC(C)COC=O AVMSWPWPYJVYKY-UHFFFAOYSA-N 0.000 description 1
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- WFOFKPWNSNLDKF-UHFFFAOYSA-N CC(=O)C.B.CNC Chemical compound CC(=O)C.B.CNC WFOFKPWNSNLDKF-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- JGFBQFKZKSSODQ-UHFFFAOYSA-N Isothiocyanatocyclopropane Chemical compound S=C=NC1CC1 JGFBQFKZKSSODQ-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FUECIDVNGAUMGJ-UHFFFAOYSA-N acetic acid;2-(2-butoxyethoxy)ethanol Chemical compound CC(O)=O.CCCCOCCOCCO FUECIDVNGAUMGJ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- PWLNAUNEAKQYLH-UHFFFAOYSA-N butyric acid octyl ester Natural products CCCCCCCCOC(=O)CCC PWLNAUNEAKQYLH-UHFFFAOYSA-N 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- NWFNSTOSIVLCJA-UHFFFAOYSA-L copper;diacetate;hydrate Chemical compound O.[Cu+2].CC([O-])=O.CC([O-])=O NWFNSTOSIVLCJA-UHFFFAOYSA-L 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- DBLVXHJTZIDGHE-UHFFFAOYSA-N ethyl acetate;2-(2-hydroxyethoxy)ethanol Chemical compound CCOC(C)=O.OCCOCCO DBLVXHJTZIDGHE-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000445 field-emission scanning electron microscopy Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 238000001027 hydrothermal synthesis Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- UUIQMZJEGPQKFD-UHFFFAOYSA-N n-butyric acid methyl ester Natural products CCCC(=O)OC UUIQMZJEGPQKFD-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000003444 phase transfer catalyst Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- CQLFBEKRDQMJLZ-UHFFFAOYSA-M silver acetate Chemical compound [Ag+].CC([O-])=O CQLFBEKRDQMJLZ-UHFFFAOYSA-M 0.000 description 1
- 229940071536 silver acetate Drugs 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000005118 spray pyrolysis Methods 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
本発明は、金属ナノ粒子に関する発明、並びに当該粒子の好ましい製造方法、当該粒子を含む分散体および当該分散体により得られる金属被膜に関する発明である。 The present invention relates to an invention related to metal nanoparticles, a preferred method for producing the particles, a dispersion containing the particles, and a metal coating obtained from the dispersion.
近年、金属微粒子に関する発明、特に粒子径がナノサイズである金属に関する技術が提案され、ナノ粒子の製造方法に関する文献が多く見られている。例えば、有機金属塩を特定の有機酸と混合した後に還元剤を添加し還元処理をすることで微粒子を得る方法、金属塩と有機媒体とを相関移動触媒の存在下に攪拌混合し微粒子コロイドを得る方法、分散液に微粒子の核を投入し当該核の表面に新たに金属を還元付着させる方法、等である。 In recent years, inventions related to metal fine particles, in particular, technologies related to metals having a particle size of nano-size, have been proposed, and many literatures relating to methods for producing nanoparticles have been seen. For example, a method of obtaining fine particles by mixing an organic metal salt with a specific organic acid and then adding a reducing agent and subjecting it to a reduction treatment, stirring and mixing the metal salt and the organic medium in the presence of a phase transfer catalyst, And a method of introducing fine particle nuclei into the dispersion and newly depositing metal on the surface of the nuclei.
上記先行技術の方法では、ナノサイズの金属粒子を得ることが難しい。また、基板上に金属被膜を形成する際、分散体として基板に当該ナノ粒子を塗布することがあるが、膜の比抵抗値が高くなり易く、配線材料等に用いるには不向きとなることが多かった。 With the above prior art methods, it is difficult to obtain nano-sized metal particles. In addition, when forming a metal film on a substrate, the nanoparticles may be applied to the substrate as a dispersion, but the specific resistance of the film tends to be high, and may be unsuitable for use as a wiring material or the like. There were many.
本発明は、平均粒子径が1nm〜100nmである金属ナノ粒子と、エーテル類、ケトン類およびエステル類から選ばれる少なくとも1種の有機化合物(有機化合物X)とを含有することを特徴とする金属ナノ粒子分散体である。 The present invention contains a metal nanoparticle having an average particle diameter of 1 nm to 100 nm and at least one organic compound (organic compound X) selected from ethers, ketones and esters. Nanoparticle dispersion.
本発明に係る金属ナノ粒子分散体は分散性が良く、分散体を用いて金属被膜を形成するとき、金属性能の一つである比抵抗値を増加させることなく金属被膜を形成することができるものである。 The metal nanoparticle dispersion according to the present invention has good dispersibility, and when a metal film is formed using the dispersion, the metal film can be formed without increasing the specific resistance value which is one of the metal performances. Is.
本発明にかかる第一発明は、平均粒子径が1nm〜100nmである金属ナノ粒子と、エーテル類、ケトン類およびエステル類から選ばれる少なくとも1種の有機化合物(有機化合物X)とを含有することを特徴とする金属ナノ粒子分散体である。当該有機化合物Xの沸点が150〜350℃であることが好ましい。また、当該エーテル類、ケトン類およびエステル類から選ばれる少なくとも1種の有機化合物が1分子中に酸素原子を3個以上含有することが好ましい。当該分散体は金属ナノ粒子の含有量が10〜80質量%であり、有機化合物Xの含有量が1〜50質量%であることが好ましい。金属ナノ粒子の金属は銀および/または銅であることが好ましい。 1st invention concerning this invention contains the metal nanoparticle whose average particle diameter is 1-100 nm, and at least 1 sort (s) of organic compound (organic compound X) chosen from ethers, ketones, and esters. A metal nanoparticle dispersion characterized by the following. The boiling point of the organic compound X is preferably 150 to 350 ° C. Moreover, it is preferable that at least one organic compound selected from the ethers, ketones and esters contains three or more oxygen atoms in one molecule. The dispersion preferably has a metal nanoparticle content of 10 to 80% by mass and an organic compound X content of 1 to 50% by mass. The metal of the metal nanoparticle is preferably silver and / or copper.
本発明にかかる第二発明は、平均粒子径が1nm〜100nmである金属ナノ粒子を有機化合物Xに分散させることを特徴とする当該金属ナノ粒子分散体の製造方法である。 2nd invention concerning this invention is a manufacturing method of the said metal nanoparticle dispersion | distribution characterized by disperse | distributing the metal nanoparticle whose average particle diameter is 1 nm-100 nm to the organic compound X. FIG.
本発明にかかる第三発明は、金属ナノ粒子分散体を基板に塗布した後、100〜600℃で焼成して得られる金属被膜である。 3rd invention concerning this invention is a metal film obtained by apply | coating a metal nanoparticle dispersion to a board | substrate, and baking at 100-600 degreeC.
本発明にかかる金属ナノ粒子は、平均粒子径が1nm〜100nm、好ましくは2nm〜50nmであり、より好ましくは2nm〜30nmであり、更に好ましくは3nm〜10nmである。金属ナノ粒子の平均粒子径の測定方法は通常用いられる方法により測定できるが、好ましくは透過電子顕微鏡(TEM)、電界放射型透過電子顕微鏡(FE−TEM)、電界放射型走査電子顕微鏡(FE−SEM)等により粒子径を測定し平均値を求めることにより算出する。 The metal nanoparticles according to the present invention have an average particle diameter of 1 nm to 100 nm, preferably 2 nm to 50 nm, more preferably 2 nm to 30 nm, and still more preferably 3 nm to 10 nm. Although the measurement method of the average particle diameter of a metal nanoparticle can be measured by the method used normally, Preferably a transmission electron microscope (TEM), a field emission transmission electron microscope (FE-TEM), a field emission scanning electron microscope (FE-). The particle diameter is measured by SEM) or the like, and the average value is obtained.
本発明にかかる金属ナノ粒子は、通常何れの金属であってもよいが、好ましくはアルミニウム、タングステン、ニッケル、金、銀、銅であり、より好ましくはニッケル、金、銀、銅であり、更に好ましくは銀および/または銅である。なお、金属ナノ粒子とは、上記金属(0価)のナノ粒子、上記金属の酸化物からなるナノ粒子、およびこれらの混合物を包含するものである。 The metal nanoparticles according to the present invention may be any metal, but are preferably aluminum, tungsten, nickel, gold, silver, copper, more preferably nickel, gold, silver, copper, Silver and / or copper are preferred. The metal nanoparticles include the metal (zero-valent) nanoparticles, nanoparticles made of the metal oxide, and mixtures thereof.
また、当該金属ナノ粒子は、金属(0価)の状態で導電性を示すものが良く、金属被膜としたときの比抵抗値が10μΩ・cm以下であることが好ましい。更に好ましくは8μΩ・cm以下である。 In addition, the metal nanoparticle is preferably a metal (zero-valent) conductive material, and preferably has a specific resistance of 10 μΩ · cm or less when formed into a metal film. More preferably, it is 8 μΩ · cm or less.
本発明にかかる金属ナノ粒子は、平均粒子径が1nm〜100nmの粒子が得られるものであれば何れの製造方法によって製造されても良いが、好ましくはCVD法、ガス中蒸発法、噴霧熱分解法、ゾルゲル法、水熱合成法、液相還元法のいずれかの方法で製造されるのが良い。最も好ましくは液相還元法である。 The metal nanoparticles according to the present invention may be produced by any production method as long as particles having an average particle diameter of 1 nm to 100 nm can be obtained, but preferably CVD method, gas evaporation method, spray pyrolysis It may be produced by any one of a method, a sol-gel method, a hydrothermal synthesis method, and a liquid phase reduction method. Most preferred is a liquid phase reduction method.
本発明にかかる有機化合物Xは、沸点が150〜350℃であり、好ましくは200〜300℃である。また当該有機化合物は酸素原子を3個以上有するものが好ましく、更に好ましくは3個〜6個の酸素原子を有するものである。最も好ましいものは沸点が200〜300℃でありかつ酸素原子を3〜6個有するものである。 The organic compound X according to the present invention has a boiling point of 150 to 350 ° C, preferably 200 to 300 ° C. The organic compound preferably has 3 or more oxygen atoms, and more preferably has 3 to 6 oxygen atoms. The most preferable one has a boiling point of 200 to 300 ° C. and 3 to 6 oxygen atoms.
エーテル類としては、エチルブチルエーテル、ブチルエーテル、プロピレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、プロピレングリコールn−プロピルエーテル、アニソール、プロピレングリコールn−ブチルエーテル、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールメチルエーテル、ジエチレングリコールモノエチルエーテル、ジプロピレングリコールn−プロピルエーテル、ジヘキシルエーテル、ジプロピレングリコールn−ブチルエーテル、トリプロピレングリコールメチルエーテル、プロピレングリコールフェニルエーテル、トリプロピレングリコールn−ブチルエーテル、ジエチレングリコールモノブチルエーテル、ジフェニルエーテルであり、好ましくはアニソール、プロピレングリコールn−ブチルエーテル、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールメチルエーテル、ジエチレングリコールモノエチルエーテル、ジプロピレングリコールn−プロピルエーテル、ジヘキシルエーテル、ジプロピレングリコールn−ブチルエーテル、トリプロピレングリコールメチルエーテル、プロピレングリコールフェニルエーテル、トリプロピレングリコールn−ブチルエーテル、ジエチレングリコールモノブチルエーテル、ジフェニルエーテルであり、更に好ましくはジエチレングリコールモノエチルエーテル、ジプロピレングリコールn−プロピルエーテル、ジヘキシルエーテル、ジプロピレングリコールn−ブチルエーテル、トリプロピレングリコールメチルエーテル、プロピレングリコールフェニルエーテル、トリプロピレングリコールn−ブチルエーテル、ジエチレングリコールモノブチルエーテル、ジフェニルエーテルであり、ケトン類としては、ジエチルケトン、メチルイソブチルケトン、シクロペンタノン、シクロヘキサノン、メチルフェニルケトン、イソホロンであり、好ましくはシクロヘキサノン、メチルフェニルケトン、イソホロンであり、更に好ましくはメチルフェニルケトン、イソホロンであり、エステル類としては、アクリル酸エチル、ギ酸イソブチル、酢酸n−プロピル、プロピオン酸エチル、酪酸メチル、酢酸ブチル、酢酸イソブチル、酪酸エチル、イソ酪酸エチル、プロピオン酸プロピル、酢酸エチレングリコールモノメチルエーテル、酢酸プロピレングリコールモノメチルエーテル、酢酸エチレングリコールモノエチルエーテル、酢酸3−メトキシブチル、酢酸シクロヘキサノール、酢酸エチレングリコールモノブチルエーテル、プロピレングリコールジアセテート、安息香酸メチル、安息香酸エチル、酢酸ジプロピレングリコールメチルエーテル、酢酸ジエチレングリコールモノエチルエーテル、1,3−ブチレングリコールジアセテート、酢酸ジエチレングリコールモノブチルエーテル、安息香酸ブチル、トリアセチン、フタル酸ジブチルであり、好ましくは酢酸エチレングリコールモノエチルエーテル、酢酸3−メトキシブチル、酢酸シクロヘキサノール、酢酸エチレングリコールモノブチルエーテル、プロピレングリコールジアセテート、安息香酸メチル、安息香酸エチル、酢酸ジプロピレングリコールメチルエーテル、酢酸ジエチレングリコールモノエチルエーテル、1,3−ブチレングリコールジアセテート、酢酸ジエチレングリコールモノブチルエーテル、安息香酸ブチル、トリアセチン、フタル酸ジブチルであり、より好ましくは安息香酸エチル、酢酸ジプロピレングリコールメチルエーテル、酢酸ジエチレングリコールモノエチルエーテル、1,3−ブチレングリコールジアセテート、酢酸ジエチレングリコールモノブチルエーテル、安息香酸ブチル、トリアセチンであり、更に好ましくは酢酸ジプロピレングリコールメチルエーテル、酢酸ジエチレングリコールモノエチルエーテル、1,3−ブチレングリコールジアセテート、酢酸ジエチレングリコールモノブチルエーテル、トリアセチンである。また、エーテル類、ケトン類、エステル類のうち好ましくはエステル類である。 As ethers, ethyl butyl ether, butyl ether, propylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol n-propyl ether, anisole, propylene glycol n-butyl ether, dipropylene glycol dimethyl ether, dipropylene glycol methyl ether, diethylene glycol monoethyl Ether, dipropylene glycol n-propyl ether, dihexyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, propylene glycol phenyl ether, tripropylene glycol n-butyl ether, diethylene glycol monobutyl ether, diphenyl ether, preferably anisole, The Pyrene glycol n-butyl ether, dipropylene glycol dimethyl ether, dipropylene glycol methyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dihexyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, propylene glycol phenyl ether , Tripropylene glycol n-butyl ether, diethylene glycol monobutyl ether, diphenyl ether, more preferably diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dihexyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, propylene glycol Ruphenyl ether, tripropylene glycol n-butyl ether, diethylene glycol monobutyl ether, diphenyl ether, and the ketones are diethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, methyl phenyl ketone, isophorone, preferably cyclohexanone, methyl Preferred are phenyl ketone and isophorone, and more preferred are methyl phenyl ketone and isophorone. Examples of esters include ethyl acrylate, isobutyl formate, n-propyl acetate, ethyl propionate, methyl butyrate, butyl acetate, isobutyl acetate, and ethyl butyrate. , Ethyl isobutyrate, propyl propionate, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, ethylene acetate Glycol monoethyl ether, 3-methoxybutyl acetate, cyclohexanol acetate, ethylene glycol monobutyl ether, propylene glycol diacetate, methyl benzoate, ethyl benzoate, dipropylene glycol methyl ether acetate, diethylene glycol monoethyl ether acetate, 1,3 -Butylene glycol diacetate, diethylene glycol monobutyl ether acetate, butyl benzoate, triacetin, dibutyl phthalate, preferably ethylene glycol monoethyl ether acetate, 3-methoxybutyl acetate, cyclohexanol acetate, ethylene glycol monobutyl ether, propylene glycol Diacetate, methyl benzoate, ethyl benzoate, dipropylene glycol methyl ether acetate, diacetate Tylene glycol monoethyl ether, 1,3-butylene glycol diacetate, diethylene glycol monobutyl ether acetate, butyl benzoate, triacetin, dibutyl phthalate, more preferably ethyl benzoate, dipropylene glycol methyl ether acetate, diethylene glycol monoethyl acetate Ether, 1,3-butylene glycol diacetate, diethylene glycol monobutyl ether acetate, butyl benzoate, and triacetin, more preferably dipropylene glycol methyl ether acetate, diethylene glycol monoethyl ether acetate, 1,3-butylene glycol diacetate, acetic acid Diethylene glycol monobutyl ether and triacetin. Of ethers, ketones and esters, esters are preferred.
本発明にかかる金属ナノ粒子分散体は、少なくとも金属ナノ粒子と当該有機化合物とを含むものである。当該金属ナノ粒子分散体に対して当該金属ナノ粒子は10〜80質量%、好ましくは15〜70質量%、更に好ましくは20〜60質量%含まれるものであり、一方当該有機化合物は1〜50質量%、好ましくは2〜40質量%、より好ましくは3〜30質量%含まれるものである。当該金属ナノ粒子と当該有機化合物のみで当該分散体が形成されるときはそれらの合計で100質量%である。また他の成分(添加成分)を添加することもでき、例えば、脂肪族炭化水素、芳香族炭化水素、アルコール、金属アルコキシド、アルデヒド、有機酸、有機酸塩、チオール、アミン、好ましくは脂肪族炭化水素、芳香族炭化水素である。当該添加成分の量は、当該金属ナノ粒子と当該有機物とを含めた量が100質量%となる量である。 The metal nanoparticle dispersion according to the present invention contains at least metal nanoparticles and the organic compound. The metal nanoparticles are contained in an amount of 10 to 80% by mass, preferably 15 to 70% by mass, more preferably 20 to 60% by mass, while the organic compound is 1 to 50% by mass with respect to the metal nanoparticle dispersion. It is contained by mass%, preferably 2-40 mass%, more preferably 3-30 mass%. When the dispersion is formed only from the metal nanoparticles and the organic compound, the total amount is 100% by mass. Other components (additional components) can also be added, such as aliphatic hydrocarbons, aromatic hydrocarbons, alcohols, metal alkoxides, aldehydes, organic acids, organic acid salts, thiols, amines, preferably aliphatic carbonizations. Hydrogen and aromatic hydrocarbons. The amount of the additive component is such that the amount including the metal nanoparticles and the organic substance is 100% by mass.
当該分散体の粘度は、分散体の塗布方法に応じて適宜選択すればよいが、インクジェットヘッドを用いて分散体を基板上の必要な部分のみに塗布する場合には、50mPa・s以下であるものが好ましい。 The viscosity of the dispersion may be appropriately selected according to the method of applying the dispersion, but is 50 mPa · s or less when the dispersion is applied only to a necessary portion on the substrate using an inkjet head. Those are preferred.
当該分散体は金属の微粒子を必要とする用途であれば何れの用途にも用いることができ、例えば、金属被膜を形成する用途に用いられ特に薄膜を形成するときに用いることが好ましい。金属薄膜を形成する方法は、当該分散体を基板に塗布し100℃〜600℃、好ましくは100℃〜450℃、更に好ましくは100℃〜350℃で焼成するものである。 The dispersion can be used for any application as long as it requires metal fine particles. For example, the dispersion is preferably used for forming a metal film and particularly for forming a thin film. The metal thin film is formed by applying the dispersion to a substrate and firing at 100 ° C. to 600 ° C., preferably 100 ° C. to 450 ° C., more preferably 100 ° C. to 350 ° C.
当該被膜は、配線、電極、導電膜、半導体膜等に用いることができる。 The coating can be used for wiring, electrodes, conductive films, semiconductor films, and the like.
ナノ粒子製造から当該ナノ粒子分散体の製造方法のうち好ましい例を示すと、不活性ガス雰囲気下に第一有機酸金属塩とアミン化合物とを含む溶液に還元剤を添加し還元処理(第一還元処理)を行った後、該溶液中に第二有機酸金属塩とアミン化合物を含む溶液を添加し還元処理(第二還元処理)を行い平均粒子径が1nm〜100nmの金属ナノ粒子を得る(粒子製造工程)。次いで洗浄液を添加した後に、ろ過し沈殿物を分離し、更に当該沈殿物に有機溶媒を加え溶解する(再溶解工程)。更に当該有機溶媒の一部または全部を蒸留等により除去し、当該沈殿物に当該有機化合物Xを添加すること(有機化合物X添加工程)で金属ナノ粒子分散体を得る方法である。 A preferable example of the production method of nanoparticle dispersion from nanoparticle production is as follows. A reducing agent is added by adding a reducing agent to a solution containing a first organic acid metal salt and an amine compound in an inert gas atmosphere. (Reduction treatment), a solution containing the second organic acid metal salt and the amine compound is added to the solution and reduction treatment (second reduction treatment) is performed to obtain metal nanoparticles having an average particle diameter of 1 nm to 100 nm. (Particle manufacturing process). Subsequently, after adding a washing | cleaning liquid, it filters and isolate | separates a deposit, Furthermore, an organic solvent is added and melt | dissolved in the said deposit (re-dissolution process). Furthermore, a part or all of the organic solvent is removed by distillation or the like, and the organic compound X is added to the precipitate (organic compound X addition step) to obtain a metal nanoparticle dispersion.
本発明を実施例、比較例により更に詳細に説明するが、本発明の趣旨に反しない限り以下の実施例に限定されるものではない。 The present invention will be described in more detail with reference to examples and comparative examples, but is not limited to the following examples unless it is contrary to the spirit of the present invention.
(実施例1)
3Lのセパラブルフラスコに酢酸銅一水和物(和光純薬工業株式会社製)94.3gとオクチルアミン(和光純薬工業株式会社製)610.2gを仕込み、40℃にて20分間攪拌混合した。次に、溶液中に1.5L/min.の窒素ガスを供給してバブリングさせながら30分間保持して、セパラブルフラスコ内を不活性ガス雰囲気下とした。続いて、1.5L/min.の窒素ガスの供給を維持した状態で、上記セパラブルフラスコに10質量%ジメチルアミンボラン−アセトン溶液221.0gを徐々に添加することにより銅の還元処理を実施した。続いて、上記セパラブルフラスコ中に酢酸銀(キシダ化学株式会社製)46.4gをオクチルアミン(和光純薬工業株式会社製)359.4gに溶解した溶液を徐々に添加することにより銀の還元処理を実施した。銅および銀の還元処理中に液温は上昇したが、液温が55℃以上になることはなかった。
Example 1
A 3 L separable flask was charged with 94.3 g of copper acetate monohydrate (manufactured by Wako Pure Chemical Industries, Ltd.) and 610.2 g of octylamine (manufactured by Wako Pure Chemical Industries, Ltd.), and stirred and mixed at 40 ° C. for 20 minutes. did. Next, 1.5 L / min. Was held for 30 minutes while bubbling, and the inside of the separable flask was brought to an inert gas atmosphere. Subsequently, 1.5 L / min. In a state where the supply of nitrogen gas was maintained, 221.0 g of a 10% by mass dimethylamine borane-acetone solution was gradually added to the separable flask to reduce the copper. Subsequently, silver is reduced by gradually adding a solution prepared by dissolving 46.4 g of silver acetate (manufactured by Kishida Chemical Co., Ltd.) in 359.4 g of octylamine (manufactured by Wako Pure Chemical Industries, Ltd.) into the separable flask. Processing was carried out. Although the liquid temperature rose during the reduction treatment of copper and silver, the liquid temperature never exceeded 55 ° C.
上記還元処理後の溶液を15LのSUS製容器に移し変えた後、アセトン8Lを添加し、しばらく放置した後、ろ過により銅、銀および有機物からなる沈殿物をろ過により分離した。分離した沈殿物にヘキサンを添加して再溶解し、10℃以下まで冷却した後、0.1μmの孔径を有するメンブレンフィルターを用いてろ過した。続いて、ろ液からヘキサンを減圧除去した後、適量のテトラデカン(和光純薬工業株式会社製)およびアニソール(和光純薬工業株式会社)をくわえて攪拌混合することにより、銅および銀からなる金属ナノ粒子を50質量%含有し、アニソールを15質量%含有する分散体(1)を得た。 After the solution after the reduction treatment was transferred to a 15 L SUS container, 8 L of acetone was added and allowed to stand for a while, and then a precipitate composed of copper, silver and organic matter was separated by filtration. Hexane was added to the separated precipitate to redissolve it, cooled to 10 ° C. or lower, and filtered using a membrane filter having a pore size of 0.1 μm. Subsequently, hexane is removed from the filtrate under reduced pressure, and then an appropriate amount of tetradecane (manufactured by Wako Pure Chemical Industries, Ltd.) and anisole (Wako Pure Chemical Industries, Ltd.) are added and mixed with stirring to form a metal composed of copper and silver. A dispersion (1) containing 50% by mass of nanoparticles and 15% by mass of anisole was obtained.
上記分散体(1)をFE−SEMで観察したところ、金属ナノ粒子の平均粒子径は4nmであった。また、ICPを用いて分析したところ、銅と銀の質量比(Cu/Ag)は25/75であった。 When the dispersion (1) was observed with an FE-SEM, the average particle diameter of the metal nanoparticles was 4 nm. Moreover, when analyzed using ICP, the mass ratio (Cu / Ag) of copper and silver was 25/75.
(実施例2〜6)
実施例1におけるアニソールの代わりに、イソホロン、安息香酸エチル、安息香酸ブチル、フタル酸ジブチル、ジエチレングリコールモノブチルエーテルアセテートをくわえた以外は実施例1と同様にして分散体(2)〜(6)を得た。なお、いずれの分散体も銅および銀からなる金属ナノ粒子の含有量は50質量%であり、エーテル類、ケトン類およびエステル類から選ばれる少なくとも1種の有機化合物の含有量は15質量%であった。
(Examples 2 to 6)
Dispersions (2) to (6) were obtained in the same manner as in Example 1, except that isophorone, ethyl benzoate, butyl benzoate, dibutyl phthalate, and diethylene glycol monobutyl ether acetate were added instead of anisole in Example 1. It was. In each dispersion, the content of metal nanoparticles composed of copper and silver is 50% by mass, and the content of at least one organic compound selected from ethers, ketones and esters is 15% by mass. there were.
(比較例1)
実施例1においてアニソールをくわえなかった以外は実施例1と同様にして、銅および銀からなる金属ナノ粒子を50質量%含有する分散体(比較1)を得た。
(Comparative Example 1)
A dispersion (Comparative 1) containing 50% by mass of metal nanoparticles composed of copper and silver was obtained in the same manner as in Example 1 except that no anisole was added in Example 1.
(実施例7)
実施例1〜6および比較例1で得られた金属ナノ粒子分散体(1)〜(6)および(比較1)を、それぞれ2.5cm×3.5cmの面積のガラス基板上にスピンコーターを用いて塗布した後、ガラス基板を焼成炉に入れた。焼成炉内に4体積%の水素(残りの95体積%は窒素)を流通させながら室温から250℃まで0.5時間で昇温した。温度が250℃に到達してから0.5時間保持し還元性雰囲気中での焼成を行い、金属被膜を得た。金属被膜の膜厚は、いずれも0.5μmであった。続いて、得られた金属被膜の比抵抗値を低抵抗率計(ロレスタGP、三菱化学株式会社製)を用いて測定した。結果を表1に示す。
(Example 7)
The metal nanoparticle dispersions (1) to (6) and (Comparative 1) obtained in Examples 1 to 6 and Comparative Example 1 were each applied to a spin coater on a glass substrate having an area of 2.5 cm × 3.5 cm. After application, the glass substrate was placed in a firing furnace. The temperature was raised from room temperature to 250 ° C. in 0.5 hours while circulating 4% by volume of hydrogen (the remaining 95% by volume of nitrogen) in the firing furnace. After the temperature reached 250 ° C., the metal film was obtained by holding for 0.5 hour and firing in a reducing atmosphere. The thickness of each metal coating was 0.5 μm. Subsequently, the specific resistance value of the obtained metal coating was measured using a low resistivity meter (Loresta GP, manufactured by Mitsubishi Chemical Corporation). The results are shown in Table 1.
本発明は、金属ナノ粒子分散体であり、分散性に優れ特に当該分散体を用いて金属皮膜を形成すると薄膜で、均一な金属被膜を得ることができる。例えば、配線材料に用いることができ、当該金属被膜は比抵抗が低いものを得ることができる。 The present invention is a metal nanoparticle dispersion, which is excellent in dispersibility, and in particular, when a metal film is formed using the dispersion, a uniform metal film can be obtained with a thin film. For example, it can be used as a wiring material, and the metal film having a low specific resistance can be obtained.
Claims (7)
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011058041A (en) * | 2009-09-09 | 2011-03-24 | Osaka Municipal Technical Research Institute | Silver-copper based mixed powder and joining method using the same |
JP2012195079A (en) * | 2011-03-15 | 2012-10-11 | Dainippon Printing Co Ltd | Conductive substrate and method for manufacturing the same |
JP2013001966A (en) * | 2011-06-16 | 2013-01-07 | Ulvac Japan Ltd | Metal fine particle dispersion liquid and method for producing the same |
KR20140043741A (en) * | 2011-05-10 | 2014-04-10 | 바스프 에스이 | Novel color converters |
JP2014162966A (en) * | 2013-02-26 | 2014-09-08 | Nippon Steel & Sumikin Chemical Co Ltd | Metal fine particle composition, joining material, electronic component, formation method of junction layer, formation method of conductor layer, and ink composition |
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2007
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2011058041A (en) * | 2009-09-09 | 2011-03-24 | Osaka Municipal Technical Research Institute | Silver-copper based mixed powder and joining method using the same |
JP2012195079A (en) * | 2011-03-15 | 2012-10-11 | Dainippon Printing Co Ltd | Conductive substrate and method for manufacturing the same |
KR20140043741A (en) * | 2011-05-10 | 2014-04-10 | 바스프 에스이 | Novel color converters |
KR102047789B1 (en) * | 2011-05-10 | 2019-11-22 | 바스프 에스이 | Novel color converters |
JP2013001966A (en) * | 2011-06-16 | 2013-01-07 | Ulvac Japan Ltd | Metal fine particle dispersion liquid and method for producing the same |
JP2014162966A (en) * | 2013-02-26 | 2014-09-08 | Nippon Steel & Sumikin Chemical Co Ltd | Metal fine particle composition, joining material, electronic component, formation method of junction layer, formation method of conductor layer, and ink composition |
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