JP2009019174A5 - - Google Patents

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JP2009019174A5
JP2009019174A5 JP2007184759A JP2007184759A JP2009019174A5 JP 2009019174 A5 JP2009019174 A5 JP 2009019174A5 JP 2007184759 A JP2007184759 A JP 2007184759A JP 2007184759 A JP2007184759 A JP 2007184759A JP 2009019174 A5 JP2009019174 A5 JP 2009019174A5
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JP2009019174A (en
JP5264113B2 (en
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)光硬化性樹脂組成物を光硬化することで形成された膜状の成型体であって、表面に規則的に形成された微細な凸凹構造を有し、凸凹構造は、深さが0.01〜20μmの範囲であり、少なくとも1方向のピッチが0.01〜20μmの範囲である、該成型体の厚み方向について0.5MPa以上の耐圧縮性能を有することを特徴とする成型体、
)成型体を構成する樹脂が(a)1分子中に3以上のアクリル基及び/またはメタクリル基を含有する1種以上のユニットを、20〜60重量%の範囲で含有することを特徴とする、()に記載の成型体。
)成型体を構成する樹脂がN−ビニル化合物であるユニットを、5〜40重量%の範囲で含有することを特徴とする、()に記載の成型体。
)成型体を構成する樹脂がアクリル基及び/またはメタクリル基を含有するシリコン化合物を0.1〜10重量%の範囲で含有することを特徴とする、()または()に記載の成型体。
)プラスチックフィルム上に形成され、JIS K−5600−5−6に準拠した碁盤目剥離試験で、分類1以上の基材付着性を示すことを特徴とする、()〜()に記載の成型体、
( 1 ) A film-like molded body formed by photocuring a photocurable resin composition, having a fine uneven structure regularly formed on the surface, and the uneven structure has a depth of A molded article characterized by having a compression resistance of 0.5 MPa or more in the thickness direction of the molded article having a pitch in the range of 0.01 to 20 μm and a pitch in at least one direction of 0.01 to 20 μm. ,
( 2 ) The resin constituting the molded body contains (a) one or more units containing 3 or more acrylic groups and / or methacrylic groups in one molecule in a range of 20 to 60% by weight. The molded article according to ( 1 ).
( 3 ) The molded body according to ( 2 ), wherein the resin constituting the molded body contains a unit of N-vinyl compound in an amount of 5 to 40% by weight.
( 4 ) The resin constituting the molded body contains a silicon compound containing an acrylic group and / or a methacrylic group in a range of 0.1 to 10% by weight, as described in ( 2 ) or ( 3 ) Molded body.
( 5 ) It is formed on a plastic film, and exhibits a substrate adhesion of classification 1 or higher in a cross-cut peel test in accordance with JIS K-5600-5-6, ( 2 ) to ( 4 ) The molded article according to

)()〜()に記載の成型体を製造する方法であって、該成型体の表面構造の反転形状である、凹凸構造を有するモールドに、(a)1分子中に3以上のアクリル基及び/またはメタクリル基を含有する1種以上の単量体を、20〜60重量%の範囲で含有することを特徴とする光硬化性樹脂組成物であって、(b)光硬化反応によって結合して固形となる成分が98重量%以上であり、(c)25℃における粘度が10mPa・s以下である光硬化性樹脂組成物を流し込み、光硬化させ、該モールドの温度を25〜100℃の範囲に保つことを特徴とする、成型体の製造方法、
)前記光硬化性樹脂組成物が、N−ビニル化合物である単量体を、5〜40重量%の範囲で含有することを特徴とする、()に記載の成型体の製造方法、
)前記光硬化性樹脂組成物が、アクリル基及び/またはメタクリル基を含有するシリコン化合物を0.1〜10重量%の範囲で含有することを特徴とする、()または()に記載の成型体の製造方法。
( 6 ) A method for producing the molded article according to ( 2 ) to ( 5 ), wherein the mold has a concavo-convex structure which is an inverted shape of the surface structure of the molded article, and (a) 3 in one molecule. One or more monomers containing the above acryl group and / or methacryl group are contained in the range of 20 to 60% by weight, and (b) light The component which becomes solid by binding by the curing reaction is 98% by weight or more, and (c) a photocurable resin composition having a viscosity at 25 ° C. of 10 mPa · s or less is poured, photocured, and the temperature of the mold is set. A method for producing a molded body, characterized by maintaining the temperature in a range of 25 to 100 ° C.,
( 7 ) The method for producing a molded article according to ( 6 ), wherein the photocurable resin composition contains a monomer that is an N-vinyl compound in an amount of 5 to 40% by weight. ,
( 8 ) The photocurable resin composition contains an acrylic group and / or a methacrylic group-containing silicon compound in the range of 0.1 to 10% by weight ( 6 ) or ( 7 ) The manufacturing method of the molded object of description.

Claims (8)

光硬化性樹脂組成物を光硬化することで形成された膜状の成型体であって、表面に規則的に形成された微細な凸凹構造を有し、凸凹構造は、深さが0.01〜20μmの範囲であり、少なくとも1方向のピッチが0.01〜20μmの範囲である、該成型体の厚み方向について0.5MPa以上の耐圧縮性能を有することを特徴とする成型体。   A film-like molded body formed by photocuring a photocurable resin composition, having a fine uneven structure regularly formed on the surface, and the uneven structure has a depth of 0.01. A molded article characterized by having a compression resistance of 0.5 MPa or more in the thickness direction of the molded article, which is in the range of ~ 20 µm and the pitch in at least one direction is in the range of 0.01 to 20 µm. 成型体を構成する樹脂が(a)1分子中に3以上のアクリル基及び/またはメタクリル基を含有する1種以上のユニットを、20〜60重量%の範囲で含有することを特徴とする、請求項に記載の成型体。 The resin constituting the molded body contains (a) one or more units containing 3 or more acrylic groups and / or methacrylic groups in one molecule in a range of 20 to 60% by weight, The molded product according to claim 1 . 成型体を構成する樹脂がN−ビニル化合物ユニットを、5〜40重量%の範囲で含有することを特徴とする、請求項に記載の成型体。 The molded body according to claim 2 , wherein the resin constituting the molded body contains an N-vinyl compound unit in a range of 5 to 40% by weight. 成型体を構成する樹脂がアクリル基及び/またはメタクリル基を含有するシリコン化合物を0.1〜10重量%の範囲で含有することを特徴とする、請求項または請求項に記載の成型体。 The molded body according to claim 2 or 3 , wherein the resin constituting the molded body contains a silicon compound containing an acrylic group and / or a methacrylic group in an amount of 0.1 to 10% by weight. . プラスチックフィルム上に形成され、JIS K−5600−5−6に準拠した碁盤目剥離試験で、分類1以上の基材付着性を示すことを特徴とする、請求項〜請求項に記載の成型体。 Formed on a plastic film, in a cross-cut peeling test according to JIS K-5600-5-6, characterized in that it presents a classification of one or more substrate adhesion, according to claims 2 to 4 Molded body. 請求項〜請求項に記載の成型体を製造する方法であって、該成型体の表面構造の反転形状である、凹凸構造を有するモールドに、(a)1分子中に3以上のアクリル基及び/またはメタクリル基を含有する1種以上の単量体を、20〜60重量%の範囲で含有し、(b)光硬化反応によって結合して固形となる成分が98重量%以上であり、(c)25℃における粘度が10mPa・s以下である光硬化性樹脂組成物を流し込み、光硬化させ、該モールドの温度を25〜100℃の範囲に保つことを特徴とする、成型体の製造方法。 A method of manufacturing a molded body according to claims 2 to 5, an inverted shape of the surface structure of the component type body, the mold having an uneven structure, (a) 3 or more acrylic in one molecule 1 or more types of monomers containing a group and / or a methacryl group are contained in the range of 20 to 60% by weight, and (b) 98% by weight or more of components that are bonded and solidified by a photocuring reaction. (C) A photocurable resin composition having a viscosity at 25 ° C. of 10 mPa · s or less is poured, photocured, and the temperature of the mold is maintained in the range of 25 to 100 ° C. Production method. 前記光硬化性樹脂組成物が、N−ビニル化合物である単量体を、5〜40重量%の範囲で含有することを特徴とする、請求項に記載の成型体の製造方法。 The said photocurable resin composition contains the monomer which is a N-vinyl compound in 5-40 weight%, The manufacturing method of the molded object of Claim 6 characterized by the above-mentioned. 前記光硬化性樹脂組成物が、アクリル基及び/またはメタクリル基を含有するシリコン化合物を0.1〜10重量%の範囲で含有することを特徴とする、請求項または請求項に記載の成型体の製造方法。
The said photocurable resin composition contains the silicon compound containing an acrylic group and / or a methacryl group in 0.1 to 10weight% of range, The Claim 6 or Claim 7 characterized by the above-mentioned. A method for producing a molded body.
JP2007184759A 2007-07-13 2007-07-13 Photocurable resin composition, molded article, and method for producing molded article Active JP5264113B2 (en)

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JP2009019174A5 true JP2009019174A5 (en) 2010-08-26
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JP5483083B2 (en) * 2010-02-03 2014-05-07 富士フイルム株式会社 Fine pattern manufacturing method
KR101521486B1 (en) 2010-06-08 2015-05-20 디아이씨 가부시끼가이샤 Molded article having fine surface irregularities and method for producing same
CN102985857B (en) 2010-07-15 2016-02-24 旭硝子株式会社 The manufacture method of Meta Materials and Meta Materials
CN103052492B (en) * 2010-08-06 2014-12-31 综研化学株式会社 Resin mold for nanoimprinting
JP5725184B2 (en) * 2012-06-15 2015-05-27 三菱レイヨン株式会社 Laminated body
JP6165493B2 (en) * 2013-04-19 2017-07-19 株式会社Dnpファインケミカル Method for producing decorative film, method for producing decorative molded product, energy ray curable inkjet composition
KR101423618B1 (en) * 2013-06-17 2014-07-28 주식회사 위즈켐 Light curing type imprinting composition for fine patterning of light guide panel for display devices, imprinted light guide panel thereof, and back light unit and display device containing the same
CN107533286B (en) * 2015-04-29 2022-02-08 3M创新有限公司 Swellable film-forming composition and method for nanoimprint lithography using the same
CN109689700B (en) * 2016-10-14 2022-04-05 电化株式会社 Composition comprising a metal oxide and a metal oxide

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KR101237766B1 (en) * 2004-09-13 2013-02-28 다우 코닝 코포레이션 Lithography technique using silicone molds
JP2006150741A (en) * 2004-11-29 2006-06-15 Asahi Glass Co Ltd Method for forming pattern on transfer layer
JP2007030212A (en) * 2005-07-22 2007-02-08 Ricoh Co Ltd Manufacturing method of stamper for molding plastic
WO2007018287A1 (en) * 2005-08-11 2007-02-15 Kyowa Hakko Chemical Co., Ltd. Resin composition
JP4770354B2 (en) * 2005-09-20 2011-09-14 日立化成工業株式会社 Photocurable resin composition and pattern forming method using the same
JP5117002B2 (en) * 2006-07-10 2013-01-09 富士フイルム株式会社 Photocurable composition and pattern forming method using the same

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