JP2009003467A - Color filter substrate and electro-optical device, manufacturing method for color filter substrate and manufacturing method for electro-optical device, and electronic equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter substrate and transflective type electro-optical device capable of ensuring both brightness of reflective display and saturation of transmissive display, and to reduce the difference in color between reflective display and transmissive display. <P>SOLUTION: A reflective layer 211 having openings 211a is formed on a substrate 201, and subsequently, a transmissive layer 214 is partially formed, and upon these, a color filter 212 having colored layers 212r, 212g and 212b is formed. Thick portions 212TH provided to non-formation regions of the transmissive layer 214 are formed to the colored layer. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a color filter substrate and an electro-optical device, and a color filter substrate manufacturing method and an electro-optical device manufacturing method, and more particularly to a color filter structure suitable for use in a reflective transflective electro-optical device. .

  2. Description of the Related Art Conventionally, a reflective transflective liquid crystal display panel in which both a reflective display using external light and a transmissive display using illumination light such as a backlight are visible is known. This reflective transflective liquid crystal display panel has a reflective layer for reflecting external light in the panel, and this reflective layer is configured to transmit illumination light such as a backlight. is there. As this type of reflective layer, there is a layer having a pattern having a predetermined proportion of openings (slits) for each pixel of a liquid crystal display panel.

  FIG. 19 is a schematic cross-sectional view schematically showing a schematic structure of a conventional reflective transflective liquid crystal display panel 100. The liquid crystal display panel 100 has a structure in which a substrate 101 and a substrate 102 are bonded together with a sealant 103 and a liquid crystal 104 is sealed between the substrate 101 and the substrate 102.

  On the inner surface of the substrate 101, a reflective layer 111 having an opening 111a is formed for each pixel, and a color filter 112 having colored layers 112r, 112g, and 112b and a protective film 112p is formed on the reflective layer 111. Has been. A transparent electrode 113 is formed on the surface of the protective film 112 p of the color filter 112.

  On the other hand, a transparent electrode 121 is formed on the inner surface of the substrate 102 and is configured to intersect the transparent electrode 113 on the opposite substrate 101. Note that an alignment film, a hard transparent film, and the like are appropriately formed on the transparent electrode 113 on the substrate 101 and the transparent electrode 121 on the substrate 102 as necessary.

  In addition, a retardation plate (¼ wavelength plate) 105 and a polarizing plate 106 are sequentially arranged on the outer surface of the substrate 102, and a retardation plate (¼ wavelength plate) 107 and on the outer surface of the substrate 101. Polarizers 108 are sequentially arranged.

  When the liquid crystal display panel 100 configured as described above is installed in an electronic device such as a mobile phone or a portable information terminal, the liquid crystal display panel 100 is attached with a backlight 109 disposed behind it. In this liquid crystal display panel 100, in bright places such as daytime or indoors, external light passes through the liquid crystal 104 along the reflection path R, is reflected by the reflective layer 111, and then passes through the liquid crystal 104 again to be emitted. The reflective display is visually recognized. On the other hand, by turning on the backlight 109 in a dark place such as at night or outdoors, the light passing through the opening 111a out of the illumination light of the backlight 109 passes through the liquid crystal display panel 100 along the transmission path T and is emitted. Therefore, the transmissive display is visually recognized.

  However, in the conventional reflective transflective liquid crystal display panel 100, light passes through the color filter 112 twice in the reflection path R, whereas light passes through the color filter 112 in the transmission path T only once. Therefore, there is a problem that the saturation in the transmissive display is worse than that in the reflective display. That is, since the display brightness generally tends to be insufficient in the reflective display, it is necessary to ensure the display brightness by setting the light transmittance of the color filter 112 high. In the transmissive display, sufficient saturation cannot be obtained.

  In addition, as described above, the number of times light passes through the color filter is different between the reflective display and the transmissive display, so that the color of the reflective display and the color of the transmissive display are greatly different. There is also the problem of giving.

  Therefore, the present invention solves the above problems, and the problem is that when used in a display device that enables both reflective display and transmissive display, the brightness of the reflective display and the color of the transmissive display are displayed. An object of the present invention is to provide a color filter substrate capable of ensuring both the degree and the degree. Another object of the present invention is to provide a reflective transflective electro-optical device that can ensure both the brightness of the reflective display and the saturation of the transmissive display. It is another object of the present invention to realize a display technique capable of reducing the color difference between the reflective display and the transmissive display.

  In order to solve the above problems, a color filter substrate of the present invention includes a substrate, a reflective layer that is disposed on the substrate and has a transmissive portion that can substantially transmit light, and at least overlaps the reflective layer in a planar manner. And a colored layer having a thick part, and the reflective layer has a reflective part around the transmissive part, and the thick part is planarly overlapped with the transmissive part. The thickness of the thick-walled portion is greater than the sum of the thickness of the colored layer corresponding to the position of the reflective portion and the thickness of the reflective portion.

  According to the present invention, the thick portion having a thickness larger than the sum of the thickness of the portion corresponding to the reflective portion position of the colored layer and the thickness of the reflective portion is provided so as to overlap the transmission portion of the reflective layer in a planar manner. As a result, the saturation of the transmitted light passing through the transmission part of the reflective layer can be increased as compared with the prior art.

  Here, the transmissive portion of the reflective layer is substantially capable of transmitting light, and the transmissive portion may be configured by providing an opening in a part of the reflective layer, or alternatively, the reflective layer. The transmission part may be formed by forming a part of the film thinly.

  Here, the transmissive portion is an opening provided in the reflective layer, and includes a light transmissive layer that can substantially transmit light between the reflective layer excluding the opening and the colored layer. It is preferable. By forming a light-transmitting layer between the reflective layer and the colored layer, a step can be formed between the opening of the reflective layer and the light-transmitting layer, and the colored layer is formed on the step. By doing so, it becomes possible to provide a thick part easily. Further, even if the thick portion is provided due to the presence of the step, the surface of the colored layer can be formed flat.

  Moreover, it is preferable that the said translucent layer has a scattering function which scatters light. In this way, when the reflective display is viewed through the color filter substrate, it is possible to reduce illumination light caused by regular reflection of the reflective layer, illusion caused by sunlight, reflection of the background, and the like.

  Furthermore, it is preferable that the transmissive portion is an opening provided in the reflective layer, and a base layer is provided between the reflective layer excluding the opening and the substrate. By forming a base layer between the reflective layer and the substrate, a step can be formed between the opening of the reflective layer and the reflective surface raised by the base layer. It is possible to easily provide a thick part by forming a colored layer. Further, even if the thick portion is provided due to the presence of the step, the surface of the colored layer can be formed flat.

  Moreover, it is preferable that the surface of the base layer has irregularities, and the reflective layer has fine irregularities that scatter light. In this way, when the reflective display is viewed through the color filter substrate, it is possible to reduce illumination light caused by regular reflection of the reflective layer, illusion caused by sunlight, reflection of the background, and the like.

  Furthermore, it is preferable that the substrate has a recess, and the thick portion is disposed so as to overlap the recess in a plane. By forming the thick portion so as to overlap the concave portion of the substrate in a planar manner, it becomes possible to easily form the thick portion due to the step generated by the concave portion, and the thick portion is provided by the presence of the step. However, the surface of the colored layer can be formed flat.

  Next, another color filter substrate of the present invention includes a substrate and a colored layer disposed on the substrate and having a thick portion, wherein the thick portion is thicker than the other portions. To do.

  According to the present invention, by providing the colored layer with a thicker portion thicker than the other portions, the saturation of the transmitted light that passes through the thicker portion is made higher than the saturation of the transmitted light that passes through the other portion. be able to.

  Here, it is preferable that a light-transmitting layer capable of substantially transmitting light is provided between the substrate and the colored layer excluding the thick portion. By forming a light-transmitting layer between the substrate and the colored layer excluding the thick-walled portion, a step can be formed between the substrate and the light-transmitting layer, so that the thick-walled portion can be easily formed by the step. Moreover, even if the thick portion is formed due to the presence of the step, the surface of the colored layer can be formed flat.

  Moreover, it is preferable that the said board | substrate has a recessed part and the said thick part is arrange | positioned on the said recessed part. Since the step can be provided on the surface of the substrate by the recess, it is possible to easily form the thick portion by the step, and even if the thick portion is formed by the presence of the step, the surface of the colored layer can be formed. It can be formed flat.

  Next, an electro-optical device of the present invention includes an electro-optical layer containing an electro-optical material, a substrate that supports the electro-optical layer, and a transmission portion that is disposed on the substrate and substantially transmits light. A reflective layer, and a colored layer that is disposed so as to at least overlap the reflective layer in a plane and has a thick portion, and the reflective layer has a reflective portion around the transmissive portion, and has the thickness. The meat part is disposed so as to overlap the transmission part in a planar manner, and the thickness of the thick part is greater than the sum of the thickness of the colored layer corresponding to the reflection part position and the thickness of the reflection part. It is large.

  According to the present invention, by providing the colored layer with a thick portion thicker than the sum of the thickness of the portion corresponding to the reflective portion position of the colored layer and the thickness of the reflective portion, the transmitted light that passes through the transmissive portion of the reflective layer It becomes possible to increase the saturation of. In addition, the difference in saturation between the transmissive display and the reflective display can be reduced.

  Here, it is preferable that a translucent layer capable of substantially transmitting light is provided between the reflective layer excluding the opening and the colored layer. Due to the presence of the light transmissive layer, a step is formed between the transmissive portion of the reflective layer and the light transmissive layer, and the thick portion can be easily formed by the step. Moreover, even if the thick portion is formed due to the presence of the step, the surface of the colored layer can be configured to be flat.

In this case, it is desirable that the light transmitting layer has a scattering function for scattering light.
As a result, the reflected light is scattered by the light-transmitting layer, so that it is possible to prevent the reflection of the background in the reflective display and the occurrence of illusion due to the illumination light.

  Moreover, it is preferable that the said transmission part is an opening part, and is provided with the base layer between the said reflection layer except the said opening part and the said board | substrate. Due to the presence of the base layer, a step can be provided between the opening and the reflective layer excluding the opening, so that the thick portion can be easily formed by the step. Moreover, even if the thick portion is formed due to the presence of the step, the surface of the colored layer can be configured to be flat.

  Here, it is preferable that the surface of the underlayer has irregularities, and the reflective layer has fine irregularities that scatter light. By providing unevenness on the surface of the underlayer and having a fine unevenness that scatters light on the reflective layer above it, the reflected light is scattered by the unevenness. Can be reduced.

  Furthermore, it is preferable that the substrate has a recess, and the thick portion is disposed on the recess. By arranging the thick portion on the concave portion of the substrate, the thick portion can be easily formed by the step on the substrate surface existing by the concave portion, and the thick portion is formed by the presence of the step. However, the surface of the colored layer can be formed flat.

  The electro-optical device may include a counter substrate disposed to face the substrate via the electro-optical layer.

  Another electro-optical device according to the present invention includes an electro-optical layer containing an electro-optical material, a first substrate that supports the electro-optical layer, the first substrate, and a light that is substantially transmitted. A reflective layer having a transmissive portion that can be transmitted; a second substrate disposed opposite the first substrate; and a thick wall disposed on the second substrate and thicker than other portions. And the thick portion is disposed so as to overlap the transmission portion in a planar manner.

  According to the present invention, the thick portion of the colored layer disposed on the second substrate is disposed so as to overlap the transmissive portion of the reflective layer disposed on the first substrate, and thus passes through the transmissive portion. Since transmitted light to be transmitted is transmitted through the thick part, the saturation of the transmitted light can be increased as compared with the conventional case. In addition, the difference in saturation between the transmissive display and the reflective display can be reduced.

  Here, it is preferable that a translucent layer capable of substantially transmitting light is provided between the second substrate and the colored layer excluding the thick portion. By having a translucent layer between the second substrate and the colored portion excluding the thick portion, a step is formed between the substrate and the translucent layer, and the thick portion is easily configured by the step. Is possible. In addition, the presence of the step makes it possible to make the surface of the colored layer flat even when the thick portion is formed.

  In addition, it is preferable that the second substrate has a recess, and the thick portion is disposed on the recess. Since the thick portion is disposed on the concave portion of the second substrate, the thick portion can be easily formed due to the presence of a step caused by the concave portion. Moreover, even if the thick portion is formed due to the presence of the step, the surface of the colored layer can be configured to be flat.

  According to another aspect of the invention, an electro-optical device includes an electro-optical layer containing an electro-optical material, a first substrate that supports the electro-optical layer, the first substrate, and a substantially optical device. A reflective layer having a transmissive portion capable of transmitting through, a first colored layer disposed so as to overlap at least the reflective layer in a plane, a second substrate disposed to face the first substrate, A second colored layer disposed on the second substrate, wherein the reflective layer has a reflective part around the transmissive part, and the first colored layer includes at least the transmissive part and the reflective part. The second colored layer is disposed so as to overlap at least the transmission part in a planar manner.

  According to the present invention, the sum of the thicknesses of the first colored layer disposed on the first substrate and the second colored layer disposed on the second substrate is the other in the region overlapping the transmission portion in a plane. By being configured to be larger than the region, the saturation of the transmitted light passing through the transmission part of the reflective layer can be increased as compared with the conventional case. In addition, the difference in saturation between the transmissive display and the reflective display can be reduced.

  Furthermore, the electro-optical device according to the present invention includes an electro-optical layer containing an electro-optical material held between the first substrate and the second substrate, and a first colored layer disposed on the first substrate. The second colored layer comprising: a reflective layer disposed on the first substrate and having a transmission part capable of transmitting substantially light; and a second colored layer disposed on the second substrate. Is limited to a region that overlaps the transmission part in a planar manner.

  According to the present invention, in the second substrate, the second colored layer is disposed so as to be limited to a region that overlaps the transmission portion of the reflective layer disposed on the first substrate in a planar manner, thereby opening the reflective layer. Since the transmitted light passing through the part is transmitted not only through the first colored layer but also through the second colored layer, the saturation of the transmitted light can be increased as compared with the conventional art. In addition, the difference in saturation between the transmissive display and the reflective display can be reduced.

  Next, in the method for manufacturing a color filter substrate according to the present invention, a step of forming an insulating layer partially on the substrate, and a colored layer is formed on a region where the insulating layer is formed and a region where the insulating layer is not formed. And a process.

  More specifically, the method includes the step of forming a colored layer on the substrate and the step of partially forming a light-transmitting layer that can substantially transmit light on the substrate, and forming the colored layer. Then, the colored layer is formed thicker on the non-formation region of the translucent layer than on the translucent layer. Alternatively, a step of forming a colored layer on the substrate, a step of forming a reflective layer having an opening on the substrate, and a light-transmitting layer that can substantially transmit light on the reflective layer excluding the opening. In the step of forming the colored layer, the thickness of the colored layer is the thickness of the colored layer formed on the reflective layer around the opening and the thickness of the reflective layer. The thick part thicker than the sum is formed on the opening. And a step of forming a colored layer having a thick portion on the substrate, a step of partially forming a base layer on the substrate, and a step of forming a reflective layer on the base layer, In the step of forming the colored layer, the thick portion is formed on a non-formation region of the base layer.

  Further, another method for producing a color filter of the present invention includes a step of arranging a coloring material on the substrate, a step of partially changing the degree of curing of the coloring material, a curing treatment, And a step of forming a thick part thicker than other parts in a part of the colored layer by removing the cured part. According to this means, since the thick part is formed according to the degree of curing of the coloring material, the thick part can be easily provided only by changing the degree of the curing process.

  Furthermore, another color filter manufacturing method of the present invention includes a step of arranging a coloring material on the substrate, a step of partially changing the exposure degree of the coloring material and exposing the coloring material, and developing the coloring material. And forming a thick part thicker than the other part in a part of the colored layer.

  Next, a method for manufacturing an electro-optical device according to the present invention includes the above-described method for manufacturing a color filter as a process.

  According to another aspect of the invention, there is provided an electronic apparatus including the above electro-optical device.

  In each of the above means, it is preferable that the base layer and the light transmitting layer are configured to have a thickness substantially equal to the difference between the thick portion of the colored layer and the thickness of the other portions. As a result, it is possible to form a colored layer having the above-mentioned thick portion by simply applying a coloring material from above the underlayer or the light-transmitting layer in the manufacturing process, and the flatness on the surface of the colored layer. Can be improved.

  In each of the above means, when the colored layer has almost uniform optical characteristics as a whole, when emphasizing the flatness of the color filter substrate, the thickness of the thick portion is larger than the other thicknesses of the colored layer. It is preferable that the ratio is approximately double. More specifically, it is preferably in the range of 1.4 times to 2.6 times. In particular, in order to reduce the difference in color between the reflective display and the transmissive display, it is desirable to be within the range of 1.7 times to 2.3 times.

  In the case where importance is attached to the optical characteristics, the thickness of the thick portion is preferably in the range of about 2 to 6 times the thickness of the portion other than the thick portion of the colored layer. When the thickness of the thick part is less than twice, it is difficult to secure sufficient brightness of the reflective area if the color expression of the transmissive area is optimized, and when the brightness of the reflective area is optimized, It becomes difficult to ensure saturation. When the thickness of the thick part exceeds 6 times, it becomes difficult to secure the saturation of the reflective area if the color expression of the transmissive area is optimized, and the amount of light of the backlight is optimized if the color expression of the reflective area is optimized. If it is not increased, it will be difficult to ensure the brightness of the transmissive region, and it will also be difficult to ensure the flatness of the color filter substrate.

  Furthermore, in order to achieve both the flatness and the optical characteristics of the color filter, the thickness of the thick part is set to a value within the range of 1.0 to 3.0 μm, and the thickness of the part other than the thick part is 0. A value in the range of 2 to 1.5 μm is preferable. In this way, it is possible to improve the color display quality of the reflective region and the transmissive region while reducing the unevenness of the thickness of the color filter due to the presence of the thick portion. In the present invention, the base layer and the light-transmitting layer can be easily manufactured as described above by forming the base layer and the translucent layer so as to have a thickness substantially equal to the difference between the thickness of the thick portion of the colored layer and the thickness of the other portions. However, in this case as well, by providing a colored layer that satisfies the above thickness conditions, it is possible to further reduce the unevenness of the thickness of the color filter. The optical characteristics of the color filter can be improved.

  In each of the above means, the color filter substrate or the electro-optical device has a plurality of arranged pixel regions, the colored layer is disposed for each pixel region, and the thick portion is provided for each pixel region. It is desirable. In addition, it is desirable that the reflective layer includes a transmissive portion for each pixel region.

  In addition, in the inter-pixel region of the color filter, there is a case where either an overlapping light shielding layer formed by overlapping colored layers exhibiting different hues or a black light shielding layer is formed. When forming a black light-shielding layer, when a light-transmitting layer is formed on the reflective layer and a colored layer is formed thereon, the generation of residues generated when the black light-shielding layer is directly formed on the reflective layer Since it can reduce, the translucency of a color filter can be improved and display quality can be improved.

  Next, embodiments of a color filter substrate, an electro-optical device, and a manufacturing method thereof according to the present invention will be described in detail with reference to the accompanying drawings.

[First Embodiment]
FIG. 1 is a schematic sectional view schematically showing a substrate 201 which is a first embodiment of a color filter substrate according to the present invention and a liquid crystal display panel 200 which is a first embodiment of an electro-optical device using the color filter substrate. It is.

  In the liquid crystal display panel 200, a substrate 201 and a substrate 202 made of glass, plastic, or the like are bonded together with a sealant 203, and a liquid crystal 204 is sealed inside. The substrate 202, the transparent electrode 221 formed on the substrate 202, the phase difference plates 205 and 207, and the polarizing plates 206 and 208 are exactly the same as the conventional example shown in FIG.

  In the present embodiment, a reflective layer 211 having a thickness of about 50 nm to 250 nm is formed on the inner surface of the substrate 201 and has an opening 211a as a transmissive portion that can substantially transmit light. The reflective layer 211 can be formed of a thin film such as aluminum, an aluminum alloy, or a silver alloy. The opening 211a has a predetermined opening ratio (for example, 10 to 30%) with respect to the entire area of the pixel G for each pixel G arranged and set in a matrix in the vertical and horizontal directions along the inner surface of the substrate 210. Is formed. As shown in FIG. 7 which is a plan view of the substrate 201 viewed from above, the opening 211a may be formed in each pixel G, but a plurality of openings are provided for each pixel. It doesn't matter.

On the reflective layer 211, a translucent layer 214 having a thickness of about 0.5 μm to 2.5 μm is partially formed so as to avoid the opening 211a. The translucent layer 214 can be formed of an inorganic substance such as SiO ₂ or TiO ₂ , a resin such as an acrylic resin or an epoxy resin, and has translucency in the visible light region. On the other hand, it is preferably transparent, for example, having an average transmittance of 70% or more and a small wavelength dispersion (for example, a change in transmittance of 10% or less) in the visible light region.

  On the translucent layer 214, for example, in the case of a primary color filter, a thickness of about 0.5 μm to 2.0 μm composed of three colors of R (red), G (green), and B (blue) is provided. The colored layers 212r, 212g, and 212b have the pixel G in an appropriate arrangement mode (a color filter having a stripe arrangement is shown in FIG. 7) such as a known stripe arrangement, a delta (triangle) arrangement, and a diagonal mosaic (diagonal) arrangement. Each is arranged. Here, between the pixels G, the colored layers 212r, 212g, and 212b are overlapped with each other to form an overlapping light shielding portion 212BM that exhibits light shielding properties. Here, in each of the colored layers 212r, 212g, and 212b, the surface is basically substantially flat except for the overlapped light shielding portion 212BM.

  A protective film 212p made of a transparent resin or the like is formed on the colored layers 212r, 212g, and 212b and the overlapping light shielding portion 212BM. The protective film 212p is for protecting the colored layer from corrosion and contamination by chemicals and the like during the process, and for flattening the surface of the color filter 212.

  On the color filter 212, a transparent electrode 213 made of a transparent conductor such as ITO (indium tin oxide) is formed. In the present embodiment, a plurality of the transparent electrodes 213 are formed in a stripe shape. The transparent electrode 231 extends in a direction orthogonal to the transparent electrode 221 similarly formed in a stripe shape on the substrate 202, and the transparent electrode 213 and the transparent electrode 221 (shown by a one-dot chain line in FIG. 7). The components of the liquid crystal display panel 200 included in the intersection region (the portions in the intersection region of the reflective layer 211, the color filter 212, the transparent electrode 213, the liquid crystal 204, and the transparent electrode 221) form the pixel G. ing.

  In the present embodiment, since the light transmitting layer 214 is formed, the colored layers 212r, 212g, and 212b are not formed with the light transmitting layer 214, that is, the openings 211a of the reflective layer 211. A part of the colored layer enters a region that overlaps with the other in a plan view, thereby providing a thick part 212TH formed thicker than the other part.

  In the liquid crystal display panel 200, when reflection type display is performed, the light passes along the reflection path R and is visually recognized. When transmission type display is performed, the light passes along the transmission path T. Is visually recognized. At this time, the color filter 212 acts in the reflection path T in the same manner as in the past, but since the transmission path T passes through the opening 211a of the reflection layer 211, the transmitted light passes through the thick portions 212TH of the colored layers 212r, 212g, and 212b. As a result, the saturation in the transmissive display is improved as compared with the conventional structure shown in FIG.

  Therefore, in the present embodiment, the thick portion 212TH is formed in a position overlapping the opening 211a of the reflective layer 211 in the color filter 212 in a planar manner without impairing the brightness of the reflective display. It is possible to improve the saturation of the transmissive display. In particular, the difference in color between the reflective display and the transmissive display can be reduced as compared with the related art.

  In this embodiment, since the thick portion 212TH is provided in the color filter 212 by partially forming the light transmitting layer 214, the surfaces (upper surfaces in the drawing) of the colored layers 212r, 212g, and 212b of the color filter 212. Can be formed flat, so that the uniformity of the thickness of the liquid crystal layer can be improved and the display quality of the liquid crystal display panel can be improved.

  Here, when importance is attached to the flatness of the color filter 212, that is, when priority is given to forming the surface of the protective layer 212p flat or forming the electrode surface of the transparent electrode 213 flat. If the colored layer of the filter is formed substantially uniformly with respect to the optical characteristics, the thickness of the thick portion 212TH is approximately twice the thickness of the portion overlapping the reflective layer 211 in a plane, that is, the other portions. Preferably there is. More specifically, it is preferably in the range of 1.4 times to 2.6 times, and preferably in the range of 1.7 times to 2.3 times. In this way, the difference between the saturation of the reflective display and the saturation of the transmissive display can be further reduced, and the difference in color between the two displays can be further reduced.

  On the other hand, when importance is attached to the optical characteristics of the color filter 212, that is, when priority is given to having good color reproducibility in both the transmissive display and the reflective display, the thick portion 212TH. The thickness of is preferably in the range of 2 to 6 times the thickness of the other portions. When the thickness of the thick portion 212TH is less than twice, it is difficult to ensure sufficient brightness of the reflective area if the color expression of the transmissive area is optimized, and when the brightness of the reflective area is optimized, the transmissive area It becomes difficult to secure the saturation of. When the thickness of the thick part 212TH exceeds six times, it becomes difficult to secure the saturation of the reflective area if the color expression of the transmissive area is optimized, and when the color expression of the reflective area is optimized, the backlight If the amount of light is not increased, it is difficult to ensure the brightness of the transmissive region. This increases the power consumption of the backlight and also makes it difficult to ensure the flatness of the color filter substrate.

  By the way, when actually configuring a liquid crystal display device, the flatness of the color filter 212 is important for improving the display quality by ensuring the uniformity and reproducibility of the thickness of the liquid crystal layer, The optical characteristics of the color filter 212 are important for improving both the quality of the color display mode in the transmissive display and the reflective display. The inventors have found that in order to satisfy both the flatness and optical characteristics of the color filter 212, it is effective to limit the thicknesses of the colored layers 212r, 212g, and 212b within a predetermined range. . That is, as shown in FIG. 20, the thickness (thickness of the colored layer in the transmission region) Dt of the thick portions 212TH of the colored layers 212r, 212g, and 212b is 1.0 to 3.0 μm, and the thicknesses of the other portions. (Thickness of the colored layer in the reflective region) By setting Ds within the range of 0.2 to 1.5 μm, both the flatness and the optical characteristics of the color filter 212 can be achieved. When the thickness Dt exceeds the above range, it becomes difficult to ensure flatness because the step of the colored layer becomes large, and when the thickness Dt is below the above range, it becomes difficult to maintain the saturation of the transmissive display. . Further, if the thickness Ds exceeds the above range, the level difference of the colored layer becomes large, so that it is difficult to ensure flatness. If the thickness Ds is below the above range, the saturation of the reflective display can be maintained. It becomes difficult. Note that it is natural that the ratio of Dt and Ds is desirably in the range of 2 to 6 as described above even within the condition range of the thickness Dt and Ds of the colored layer.

  As shown in FIG. 20, the thickness Dt and Ds of the colored layer is set by forming a light transmitting layer 214 on the reflective layer 211. By this, the colored layers 212r, 212g, and 212b are formed. In this case, a depression 212d1 is generated on the upper surface of the thick part 212TH, and this causes the depression 212d2 on the surface of the protective layer 212p. By setting the above Dt and Ds within the above range, the depth ΔD1 of the depression 212d1 and the depth ΔD2 of the depression 212d2 can be reduced, thereby improving the uniformity and reproducibility of the thickness of the liquid crystal layer. More specifically, the depth ΔD1 of the depression 212d1 is preferably 0.5 μm or less, and the depth ΔD2 of the depression 212d2 is preferably 0.2 μm or less. In particular, by setting the depth ΔD2 of the depression 212d2 to 0.1 μm or less, a high-quality liquid crystal display without display unevenness can be realized.

[Second Embodiment]
Next, FIG. 2 is a schematic sectional view schematically showing the color filter substrate 301 of the second embodiment and the liquid crystal display panel 300 of the second embodiment using the color filter substrate according to the present invention. This embodiment includes substrates 301 and 302, a sealing material 303, a liquid crystal 304, transparent electrodes 313 and 321, retardation plates 305 and 307, and polarizing plates 306 and 308 that are configured in the same manner as in the first embodiment. Therefore, these explanations are omitted.

  In the present embodiment, the surface of the substrate 301 is provided with a recess 301a having a depth of about 0.5 μm to 2.5 μm provided for each pixel G arranged and set as in the first embodiment. The recess 301 a is provided in a region that overlaps the opening 311 a of the reflective layer 311 formed on the surface of the substrate 301 in a plane. The reflective layer 311 is formed with a thickness of about 50 nm to 250 nm. A color filter 312 having a colored layer 312r, 312g, 312b having a thickness of about 0.5 μm to 2.0 μm, an overlapping light shielding portion 312BM, and a protective film 312p is formed on the substrate 301 and the reflective layer 311. Yes.

  In the present embodiment, a concave portion 301a is provided in the substrate 301, and the colored portion 312r, 312g, 312b is provided with a thick portion 312TH on the concave portion 301a by filling the concave portion 301a with a coloring material. ing. Since the thick portion 312TH is formed corresponding to the opening 311a of the reflective layer 311, the transmitted light of the backlight 309 that passes through the transmission path T passes through the thick portion 312TH. Similar to the first embodiment, the saturation of the transmissive display can be increased, and the difference in color between the reflective display and the transmissive display can be reduced.

  In the present embodiment, since the thick portion 312TH is provided in the color filter 312 by partially forming the concave portion 301a, the surface (upper surface in the drawing) of the colored layers 312r, 312g, and 312b of the color filter 312 is flat. Therefore, the uniformity of the thickness of the liquid crystal layer can be improved, and the display quality of the liquid crystal display panel can be improved.

  In this embodiment, similarly to the first embodiment, when the optical characteristics of the color filter 312 are emphasized, that is, in both transmissive display and reflective display, both color display modes have good color reproducibility. In the case where priority is given to having the thickness, the thickness of the thick part 312TH is preferably in the range of 2 to 6 times the thickness of the other part.

  Further, the thickness D3 of the thick portion 312TH of the colored layers 312r, 312g, 312b (the thickness of the colored layer in the transmission region) is 1.0 to 3.0 μm, and the thickness of the other portion (the thickness of the colored layer in the reflection region). By setting the thickness (Ds) within the range of 0.2 to 1.5 μm, both the flatness and the optical characteristics of the color filter 312 can be achieved. Note that it is natural that the ratio of Dt and Ds is desirably in the range of 2 to 6 as described above even within the condition range of the thickness Dt and Ds of the colored layer.

  Further, the thicknesses Dt and Ds of the colored layer are set by forming the concave portion 301a in the substrate 301, but this reduces the depth of the depression generated on the upper surface of the thick portion 312TH of the colored layer. It is preferable that the depth of the depression generated on the surface of the protective layer 312p is 0.2 μm or less. In particular, a high-quality liquid crystal display without display unevenness can be realized by setting the depth of the recess in the protective layer 312p to 0.1 μm or less.

[Third Embodiment]
Next, a color filter substrate 401 and a liquid crystal display panel 400 according to a third embodiment of the present invention will be described with reference to FIG. This embodiment also includes substrates 401 and 402, a sealing material 403, a liquid crystal 404, transparent electrodes 413 and 421, retardation plates 405 and 407, and polarizing plates 406 and 408 that are configured in the same manner as in the first embodiment. Therefore, these explanations are omitted.

  In this embodiment, a reflective layer 411 having a thickness of about 50 nm to 250 nm having an opening 411a is formed on a substrate 401, and a colored layer 412r having a thickness of about 0.5 μm to 2.0 μm is directly formed thereon. A color filter 412 including 412g and 412b, an overlapping light shielding portion 412BM, and a protective film 412p is formed. Here, the colored layers 412r, 412g, and 412b are each provided with a thick portion 412TH in a portion immediately above the opening 411a of the reflective layer 411 (a region overlapping in a plane). The thick portion 412TH is provided by forming the surface of the portion immediately above the opening 411a in the colored layers 412r, 412g, 412b by about 0.5 μm to 2.0 μm higher than the other portions.

  In the present embodiment, the saturation of the transmissive display can be improved as in the above embodiments, and the difference in color between the transmissive display and the reflective display can be reduced. Further, in this embodiment, the unevenness due to the thick portion is formed on the surface of the colored layer. Instead, the light-transmitting layer of the first embodiment is formed, or the recess of the second embodiment is formed. There is no need to do it.

  In this embodiment, as in the first embodiment, when the optical characteristics of the color filter 412 are emphasized, that is, in both transmissive display and reflective display, the color display mode is good in both color display modes. In the case where priority is given to having the thickness, the thickness of the thick portion 412TH is preferably in the range of 2 to 6 times the thickness of the other portions.

[Fourth Embodiment]
Next, a color filter substrate 501 and a liquid crystal display panel 500 according to a fourth embodiment of the present invention will be described with reference to FIG. This embodiment also includes substrates 501 and 502, a sealing material 503, a liquid crystal 504, transparent electrodes 513 and 521, retardation plates 505 and 507, and polarizing plates 506 and 508 configured in the same manner as in the first embodiment. Therefore, these explanations are omitted.

  In this embodiment, unlike the first to third embodiments, the color filter is formed on the substrate 501 provided with the reflective layer 511, unlike the configuration in which the color filter is formed on the substrate provided with the reflective layer. Instead of being formed, a color filter 522 is formed on the substrate 502 facing the substrate 501.

  A reflective layer 511 having a thickness of about 50 nm to 250 nm is formed on the substrate 501 and has an opening 511a as a transmissive portion that can substantially transmit light, as in the above embodiments. A transparent insulating film 512 is formed, and a transparent electrode 513 is formed on the insulating film 512.

  On the other hand, a light-transmitting layer 524 having a thickness of about 0.5 μm to 2.5 μm is partially formed on the substrate 502, and a color having a thickness of about 0.5 μm to 2.0 μm is formed on the substrate 502 and the light transmitting layer 524. A color filter 522 including the layers 522r, 522g, and 522b, the overlapping light shielding portion 522BM, and the protective film 522p is formed.

  In the color filter 522, the colored layer is formed for each pixel G, and an overlapped light shielding portion 522BM is formed therebetween. Each colored layer is provided with a thick portion 522TH corresponding to a region where the light transmitting layer 524 is not formed. The thick portion 522TH is configured to be located in a region corresponding to the opening 511a of the reflective layer 511 formed on the substrate 501, that is, a region overlapping the opening 511a in a plan view.

  Also in this embodiment, outside light that passes through the reflection path R passes through the color filter 522 twice, whereas transmitted light of the backlight 509 that passes through the transmission path T passes through the color filter 522 only once. At this time, the reflection path R passes through a portion other than the thick portion 522TH of each colored layer, whereas the transmission path T is configured to pass through the thick portion 522TH of each colored layer. The display saturation can be improved as compared with the conventional structure, and the difference in color between the reflective display and the transmissive display can be reduced.

  The color filter substrate of this embodiment is a substrate 502, and unlike the previous embodiment, a reflective layer is not formed on the substrate 502. That is, the color filter substrate of this embodiment is formed as a substrate facing the substrate 501 on which the reflective layer is formed, and even in a color filter substrate that does not include the reflective layer as described above, for each pixel. By providing a thick portion in a part of the provided colored layer, the color-related characteristics of the reflective transflective liquid crystal display panel can be improved.

  In this embodiment, since the thick part 522TH is provided in the color filter 522 by partially forming the light transmitting layer 524, the surface (the upper surface in the drawing) of the colored layers 522r, 522g, and 522b of the color filter 522. Can be formed flat, so that the uniformity of the thickness of the liquid crystal layer can be improved and the display quality of the liquid crystal display panel can be improved.

  In this embodiment, the color filter 522 having the same structure as that of the first embodiment is formed on the substrate 502 facing the substrate 501 on which the reflective layer 511 is formed. The structure may be a structure formed on a substrate provided with a recess as in the second embodiment, and the surface of the colored layer is partially raised as in the third embodiment. It may be a structure.

  In this embodiment, similarly to the first embodiment, when the optical characteristics of the color filter 522 are emphasized, that is, in both transmissive display and reflective display, the color display mode is good in both color display modes. In the case where priority is given to having the thickness, the thickness of the thick portion 522TH is preferably in the range of 2 to 6 times the thickness of the other portions.

  In addition, the thickness (the thickness of the colored layer in the transmission region) Dt of the thick layer 522TH of the colored layers 522r, 522g, and 522b is 1.0 to 3.0 μm, and the thickness of the other portions (the thickness of the colored layer in the reflection region). By setting the thickness (Ds) within the range of 0.2 to 1.5 μm, both the flatness and the optical characteristics of the color filter 522 can be achieved. Note that it is natural that the ratio of Dt and Ds is desirably in the range of 2 to 6 as described above even within the condition range of the thickness Dt and Ds of the colored layer.

  Further, the thickness Dt and Ds of the colored layer is set by forming the light-transmitting layer 524 on the substrate 502, but the depth of the dent generated on the upper surface of the thick portion 522TH of the colored layer thereby. Is preferably 0.5 μm or less, and the depth of the depression formed on the surface of the protective layer 522 p is preferably 0.2 μm or less. In particular, a high-quality liquid crystal display without display unevenness can be realized by setting the depth of the depression of the protective layer 522p to 0.1 μm or less.

  [Fifth Embodiment]

  Next, a color filter substrate and an electro-optical device according to a fifth embodiment of the invention will be described with reference to FIG. FIG. 5 is a schematic cross-sectional view schematically showing the structure of the liquid crystal display panel 600 of the present embodiment.

  The liquid crystal display panel 600 includes substrates 601 and 602, a sealing material 603, a liquid crystal 604, transparent electrodes 613 and 621, retardation plates 605 and 607, and polarizing plates 606 and 608 configured in the same manner as in the first embodiment. Therefore, these explanations are omitted.

  Similarly to the first embodiment, a reflective layer 611 having a thickness of about 50 nm to 250 nm having an opening 611a as a transmissive portion that can substantially transmit light is formed on the surface of the substrate 601, and this reflection is performed. A light transmitting layer 614 having a thickness of about 0.5 μm to 2.5 μm is formed on the layer 611, and a color filter 612 is further formed thereon.

  In the present embodiment, a black light shielding layer 612BM is formed in the color filter 612 instead of the overlapping light shielding layer of the above embodiment. For the black light shielding layer 612BM, a black resin material, for example, a material in which a black pigment is dispersed in a resin can be used.

  Colored layers 612r, 612g, and 612b having a thickness of about 0.5 μm to 2.0 μm are sequentially formed on the black light shielding layer 612BM and the light transmitting layer 614, and a protective film 612p is formed thereon. Yes. Each colored layer is formed so that the periphery thereof overlaps with the black light shielding layer 612BM.

  In this embodiment, a step of forming the black light shielding layer 612BM is separately required, but the thickness of the color filter is reduced as compared with the case of using the overlapping light shielding layer, and the flatness of the color filter surface is improved. Can do.

  In this embodiment as well, as in the first embodiment, when the optical characteristics of the color filter 612 are emphasized, that is, in both transmissive display and reflective display, both color display modes have good color reproducibility. In the case where priority is given to having the thickness, the thickness of the thick portion 612TH is preferably in the range of 2 to 6 times the thickness of the other portions.

  Further, the thickness (the thickness of the colored layer in the transmission region) Dt of the thick layer 612TH of the colored layers 612r, 612g, and 612b is 1.0 to 3.0 μm, and the thickness of the other portions (the thickness of the colored layer in the reflection region). By setting the thickness (Ds) within the range of 0.2 to 1.5 μm, both the flatness and the optical characteristics of the color filter 612 can be achieved. Note that it is natural that the ratio of Dt and Ds is desirably in the range of 2 to 6 as described above even within the condition range of the thickness Dt and Ds of the colored layer.

  Further, the thickness Dt and Ds of the colored layer is set by forming the light-transmitting layer 614 on the substrate 601, however, the depth of the depression generated on the upper surface of the thick portion 612TH of the colored layer. Is preferably 0.5 μm or less, and the depth of the depression formed on the surface of the protective layer 612 p is preferably 0.2 μm or less. In particular, a high-quality liquid crystal display without display unevenness can be realized by setting the depth of the depression of the protective layer 612p to 0.1 μm or less.

[Sixth Embodiment]
Next, a liquid crystal display panel 700 according to a sixth embodiment of the present invention will be described with reference to FIG. In this embodiment, the substrate 701 and the substrate 702, the sealing material 703, the liquid crystal 704, the phase difference plates 705 and 707, the polarizing plates 706 and 708, and the opening, similar to the liquid crystal display panel 100 having the conventional structure shown in FIG. A reflective layer 711 having a thickness of about 50 nm to 250 nm and a color filter 712 having colored layers 712r, 712g, and 712b having a thickness of about 0.5 μm to 2.0 μm are provided.

In this embodiment, limited colored layers 722r, 722g, and 722b having the same color as the colored layers of the color filter 712 and having a thickness of about 0.5 μm to 2.0 μm are formed on the inner surface of the substrate 702. A transparent electrode 721 is formed.
The limited colored layers 722r, 722g, and 722b are each formed in a pattern shape limited to a range that overlaps the opening 711a of the reflective layer 711 formed on the substrate 701 in a plane.

  As a result, in this embodiment, the total thickness of the color layers 712r, 712g, and 712b of the color filter 712 on the substrate 701 and the thickness of the limited color layers 722r, 722g, and 722b on the substrate 702 is In a region overlapping the opening 711a of the reflective layer 711 in a plan view, the reflective layer 711 is configured to be thicker than other portions. Therefore, optically, the same effects as when the colored layer having the thick part is formed as in each of the above embodiments are produced.

[Seventh Embodiment]
Next, with reference to FIG. 8, the manufacturing method of a color filter substrate is demonstrated as 7th Embodiment concerning this invention. This method for manufacturing a color filter substrate relates to the manufacture of the color filter substrate used in the liquid crystal display panel 200 of the first embodiment.

  On the surface of the substrate 201, first, a metal such as aluminum, an aluminum alloy, a silver alloy, or chromium is formed into a thin film by a vapor deposition method, a sputtering method, or the like, and is patterned using a known photolithography method. As a result, as shown in FIG. 8A, a reflective layer 211 having an opening 211a and a thickness of about 50 nm to 250 nm is formed.

Next, as shown in FIG. 8B, a light-transmitting layer 214 having a thickness of about 0.5 μm to 2.5 μm is formed in a portion excluding the region immediately above the opening 211 a of the reflective layer 211. For example, the light-transmitting layer 214 is formed by selectively forming a portion directly above the opening 211a by a photolithography method or the like after an inorganic layer or an organic layer is formed on the entire surface of the substrate 201 and the reflective layer 211. It can be formed by removing. As a material for the light transmitting layer 214, a transparent inorganic material such as SiO ₂ or TiO ₂ , or an organic resin such as a transparent acrylic resin or epoxy resin can be used.

  Thereafter, as shown in FIG. 8C, a colored photosensitive resin (photosensitive resist) obtained by dispersing pigments or dyes exhibiting a predetermined hue is applied, and exposure and development are performed in a predetermined pattern. Then, the colored layers 212r, 212g, and 212b having a thickness of about 0.5 μm to 2.0 μm are sequentially formed by patterning. Here, the colored layers are patterned so as to overlap each other in the inter-pixel region, and an overlapping light shielding layer 212BM in which a plurality of (three in the illustrated example) colored layers are overlapped is formed.

  In the colored layer forming step, a highly leveling material is used as the photosensitive resin, and this is applied by a method that facilitates flatness such as spin coating. As a result, the surface of each colored layer is formed almost flat in the pixel. In each colored layer formed in this manner, the light-transmitting layer 214 is partially formed, so that an opening portion of the reflective layer 211 that is a region where the light-transmitting layer 214 is not formed in each pixel. A thick portion 212TH is provided in a region corresponding to 211a.

  The color filter substrate thus formed is formed to have a substantially flat surface by forming a protective layer 212p (not shown). Thereafter, the liquid crystal display panel 200 shown in FIG. 1 is formed using the substrate 201 which is the color filter substrate.

  When manufacturing the liquid crystal display panel 200 shown in FIG. 1, a transparent conductor is deposited on the color filter 212 formed on the substrate 201 as described above by sputtering, and is patterned by a known photolithography method. Thus, the transparent electrode 213 is formed. Thereafter, an alignment film made of polyimide resin or the like is formed on the transparent electrode 213, and a rubbing process or the like is performed.

  Next, the substrate 201 is bonded to the substrate 202 through the sealing material 203 to form a panel structure. At this time, the transparent electrode 221 and the alignment film similar to the above are already formed on the surface of the substrate 202. The substrate 201 and the substrate 202 are bonded to each other so as to have a substantially predetermined substrate interval by a spacer (not shown) distributed between the substrates, a spacer mixed in the sealing material 203, or the like.

  Thereafter, liquid crystal 204 is injected from an opening (not shown) of the sealing material 203, and the opening of the sealing material 203 is closed with a sealing material such as an ultraviolet curable resin. After the main panel structure is completed in this manner, the retardation plates 205 and 207 and the polarizing plates 206 and 208 are attached to the outer surfaces of the substrates 201 and 202 by a method such as sticking.

  In this embodiment, since the translucent layer 214 is formed on the reflective layer 211, the reflective layer can be protected in a cleaning process or a developing process during the manufacturing process. Contamination can be prevented.

  Next, a modification of the manufacturing method for manufacturing the same structure as described above will be described with reference to FIG. In this manufacturing method, first, a reflective material for forming the reflective layer 211 is deposited on the entire surface of the substrate 201, and then, a transparent material for forming a translucent layer 214 on the reflective material. Apply light material entirely. As a result, the reflective material and the translucent material are laminated on the entire surface of the substrate 201. In this state, the translucent material 214 is formed by selectively removing the translucent material in the upper layer by etching or the like using a known photolithography method or the like, and then the translucent material is removed. The reflection layer 211 having the opening 211a is formed by removing the exposed portion of the reflection material by etching or the like. Thereafter, the colored layer is formed by repeating application and patterning of the colored layer for each color in the same manner as described above. In the patterning of the reflective material, etching may be performed using the light transmitting layer 214 itself as a mask.

  According to this method, since the patterning of the reflective layer 211 and the light transmissive layer 214 can be performed using a mask formed by a common photolithography process, an effect that the number of processes can be reduced is obtained.

[Eighth Embodiment]
Next, with reference to FIG. 9, the manufacturing method of the color filter substrate which is 8th Embodiment concerning this invention is demonstrated. In this embodiment, first, as shown in FIG. 9A, a base layer 214 ′ having a thickness of about 0.5 μm to 2.5 μm is partially formed on a substrate 201. In the base layer 214 ′, an opening 214a ′ is formed for each pixel.

  Next, as shown in FIG. 9B, a reflective layer 211 'having a thickness of about 50 nm to 250 nm is formed on the base layer 214'. The reflective layer 211 ′ has an opening 211 a ′ corresponding to the opening 214 a ′ of the base layer 214 ′.

  Thereafter, as shown in FIG. 9C, colored layers 212r, 212g, and 212b having a thickness of about 0.5 μm to 2.0 μm are formed on the surfaces of the substrate 201 and the reflective layer 211 as in the sixth embodiment. . At this time, the overlapped light shielding portion 212BM and the thick portion 212TH are also formed in the same manner as described above.

  The underlayer 214 ′ can be formed using the same material and the same method as the translucent layer, but need not have translucency, and a light-shielding material may be used.

  The color filter substrate formed according to this embodiment can constitute a liquid crystal display panel substantially the same as that of the sixth embodiment. In this case, a liquid crystal display panel having a structure in which the base layer is formed between the substrate 201 and the reflective layer 211 can be configured instead of the light transmitting layer 214 of the liquid crystal display device 200 shown in FIG. Similarly, a liquid crystal display panel having a structure in which the base layer is formed between the substrate 601 and the reflective layer 611 can be configured instead of the liquid crystal display device 600 of the fifth embodiment shown in FIG.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 7th Embodiment.

  Also in this embodiment, the manufacturing can be performed by the same process as that of the modified example of the seventh embodiment described with reference to FIG. That is, as a first step for forming the base layer 214 ′, the base material is entirely deposited on the substrate 201, and then the reflective material for forming the reflective layer 211 ′ on the base material. To cover the entire surface. As a result, the base material and the reflective material are laminated on the entire surface of the substrate 201. In this state, the reflective layer 211 ′ having the opening 211a ′ is formed by selectively removing the reflective material in the upper layer by etching or the like using a known photolithography method or the like, The underlying layer 214 ′ is formed by removing the portion of the underlying material exposed by removing the reflective material by etching or the like. Thereafter, the colored layer is formed by repeating application and patterning of the colored layer for each color in the same manner as described above. In patterning the base material, etching may be performed using the reflective layer 211 ′ itself as a mask.

  According to this method, since the patterning of the base layer 214 ′ and the reflective layer 211 ′ can be performed using a mask formed by a common photolithography process, the number of processes can be reduced.

[Ninth Embodiment]
Next, with reference to FIG. 10, the manufacturing method of the color filter substrate which is 9th Embodiment concerning this invention is demonstrated. This embodiment is a method of manufacturing a color filter substrate corresponding to the substrate 301 used in the liquid crystal display panel 300 of the second embodiment shown in FIG.

  In this embodiment, first, as shown in FIG. 10A, a recess 301a having a depth of about 0.5 μm to 2.5 μm is formed in the substrate 301. The recess 301a can be formed by forming a mask made of a resist or the like (not shown) on the surface of the substrate 301 and selectively etching the substrate 301 by wet etching using a hydrofluoric acid-based etchant.

  Next, as shown in FIG. 10B, a reflective layer 311 having a thickness of about 50 nm to 250 nm is formed on the surface of the substrate 301 in the same manner as in the sixth and seventh embodiments. The reflective layer 311 is provided with an opening 311a in the formation region of the recess 301a by photolithography or the like.

  Thereafter, similarly to the above embodiments, colored layers 312r, 312g, and 312b having a thickness of about 0.5 μm to 2.0 μm are sequentially formed on the reflective layer 311 and the recesses 301a. In each colored layer, a thick portion 312TH is formed in a portion immediately above the recess 301a. The thick portion 312TH is formed thicker than the other portions.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 7th Embodiment.

[Tenth embodiment]
Next, with reference to FIG. 11, the manufacturing method of the color filter substrate which is 9th Embodiment concerning this invention is demonstrated. In this embodiment, first, as shown in FIG. 11A, a recess 301a ′ having a depth of about 0.5 μm to 2.5 μm is formed on a substrate 301, and then the substrate 301 is formed. A reflective layer 311 having a thickness of about 50 nm to 250 nm is formed thereon. In the reflective layer 311, an opening 311 a is formed at a portion corresponding to the recess 301 a ′.

  Next, as shown in FIG. 11B, a light transmitting layer 314 having a thickness of about 0.5 μm to 2.5 μm is formed on the surface of the reflective layer 311 ′. The translucent layer 314 is formed of the same material as that in the sixth embodiment and the seventh embodiment by the same method. The translucent layer 314 is provided with an opening 314a at a position directly above the recess 301a 'and the opening 311a of the reflective layer 311.

  Thereafter, colored layers 312r, 312g, and 312b having thicknesses of about 0.5 μm to 2.0 μm are sequentially formed on the light transmitting layer 314 and the recesses 301a ′. In these colored layers, a recessed portion 301a ′, an opening 311a of the reflective layer 311 and an opening 314a of the light transmitting layer 314 are formed, so that a thick portion 312TH formed thicker than the other portions is provided. It is done.

  In this embodiment, it is necessary to provide both the step of forming the recess 301a ′ and the step of forming the translucent layer 314. However, the depth of the recess 301a ′ and the thickness of the translucent layer 314 are reduced. be able to. In other words, the thick portion 312TH of the colored layer can be easily formed thick. In addition, since the reflective layer 311 can be protected by the light-transmitting layer 314, there is an effect that the reflective layer can be prevented from being corroded or contaminated during a cleaning process or a development process during the manufacturing process.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 7th Embodiment.

[Eleventh embodiment]
Next, with reference to FIG. 12, the manufacturing method of the color filter substrate of 11th Embodiment based on this invention is demonstrated. In this embodiment, a concave portion 301a ′ having a depth of about 0.5 to 2.5 μm is formed on the surface of the substrate 301, and the same as in the seventh embodiment is formed in a region excluding the concave portion 301a ′. A base layer 314 ′ having a thickness of about 0.5 to 2.5 μm is formed. Thereafter, a reflective layer 311 ′ having a thickness of about 50 nm to 250 nm is formed on the base layer 314 ′.

  In this embodiment, an opening 314 a ′ of the base layer 314 ′ is provided immediately above the recess 301 a ′, and an opening 311 a ′ of the reflective layer 311 ′ is further formed thereon. On these, the colored layers 312r, 312g, and 312b having a thickness of about 0.5 μm to 2.0 μm, which are the same as those in the ninth embodiment, are formed. These colored layers are provided with thick portions 312TH formed thicker than the other portions by the concave portions 301a ', the opening portions 314a', and the opening portions 311a '.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 7th Embodiment.

[Twelfth embodiment]
Next, with reference to FIG. 13, the manufacturing method of the color filter substrate of 12th Embodiment based on this invention is demonstrated. This embodiment relates to a method of manufacturing a color filter substrate (substrate 401) constituting the liquid crystal display panel 400 of the third embodiment.

  In this embodiment, as shown in FIG. 13A, a reflective layer 411 having a thickness of about 50 nm to 250 nm having an opening 411a is formed on a substrate 401, and then a predetermined layer is formed thereon. A photosensitive resin 412s exhibiting a hue is applied. In this state, as shown in FIG. 13B, the photosensitive resin 412s is exposed in a predetermined pattern using a transflective mask 400M, thereby forming a colored layer 412r as shown in FIG. 13C. .

  Here, the translucent mask 412 has a light shielding portion 400Ma that substantially blocks the irradiation light, a transmission portion 400Mb that substantially transmits the irradiation light, and the transmittance of the irradiation light is blocked according to the exposure pattern. A semi-transmission part 400Mc set to be intermediate between the part 400Ma and the transmission part 400Mb is provided. Such a mask capable of controlling the exposure amount provided with the light shielding portion 400Ma, the transmissive portion 400Mb, and the semi-transmissive portion 400Mc can be formed of a halftone mask or a phase difference mask.

  When the development process is performed after the above exposure process, as shown in FIG. 13C, for example, when a photo-curing type photosensitive resin is used, a region other than the light-shielding portion 400Ma, that is, the transmission portion 400Mb and the half portion The colored layer 412r is formed so as to remain in the region corresponding to the transmissive portion 400Mc, and the thick portion 412TH is provided in the region corresponding to the transmissive portion 400Mb.

  Similarly to the above, as shown in FIG. 13D, the colored layers 412g and 412b each having the thick portion 412TH can be formed by using the semi-transmissive mask for the other colored layers 412g and 412b. it can. The colored layers 412r, 412g, and 412b are each formed on the reflective layer 411 with a thickness of about 0.5 μm to 2.0 μm, and the thick portion 412TH is 0.5 μm to 2.0 μm than the surrounding colored layer. It is formed so as to be higher.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 7th Embodiment.

  In the present embodiment, the thick portion is provided in a part of the colored layer by changing the photosensitivity of the photosensitive resin. However, a similar structure can be configured by a two-layer colored layer. That is, it is possible to provide the thick portion by forming the second layer after forming the first layer of the colored layer and configuring the first layer and the second layer to partially overlap. In this case, the first layer may be a normal colored layer, and the second layer may be limited to the thick part, and conversely, the first layer may be limited to the thick part. And a second layer may be formed thereon.

[Thirteenth embodiment]
Next, with reference to FIG. 14, the manufacturing method of the color filter substrate of 13th Embodiment based on this invention is demonstrated. In this embodiment, first, as shown in FIG. 14A, a recess 401a having a depth of about 0.5 μm to 2.5 μm is formed on the surface of the substrate 401, and then the thickness is avoided by avoiding the recess 401a. A reflective layer 411 ′ having a thickness of about 50 nm to 250 nm is formed. At this time, the opening 411a ′ of the reflective layer 411 ′ is disposed on the recess 401a.

  Next, as shown in FIG. 14B, a photosensitive resin 412 s exhibiting a predetermined hue is applied on the substrate 401 and the reflective layer 411 ′, and the transflective mask 400 </ b> M similar to the twelfth embodiment is used. Exposure. Then, by performing development processing, a colored layer 412r is formed as shown in FIG. And as shown in FIG.14 (d), it forms also about the colored layers 412g and 412b of another hue similarly to the colored layer 412r, respectively. Each colored layer is provided with a thick portion 412TH in a region immediately above the recess 401a. The colored layers 412r, 412g, and 412b are each formed on the reflective layer 411 with a thickness of about 0.5 μm to 2.0 μm, and the thick portion 412TH is 0.5 μm to 2.0 μm than the surrounding colored layer. It is formed so as to be higher.

  In this embodiment, by forming the recess 401a, it is possible to reduce the amount of protrusion of the thick portion 412TH from the surface of each colored layer while ensuring the thickness of the thick portion 412TH.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 7th Embodiment.

[Fourteenth embodiment]
Next, with reference to FIG. 15, the manufacturing method of the color filter substrate of 14th Embodiment based on this invention is demonstrated. In this embodiment, first, as shown in FIG. 15A, a base layer 414 having a thickness of about 0.5 μm to 2.5 μm is formed on a substrate 401. The base layer 414 is provided with an opening 414a. Next, a reflective layer 411 ′ having a thickness of about 50 nm to 250 nm is formed on the base layer 414. The reflective layer 411 ′ is provided with an opening 411 a ′ immediately above the opening 414 a of the base layer 414.

  Next, as shown in FIG. 15B, a photosensitive resin 412 s is applied on the substrate 401 and the reflective layer 411 ′, and then exposed using the transflective mask 400 </ b> M similar to the twelfth embodiment. And the colored layer 412r shown in FIG.15 (c) is formed by performing a development process. Similarly, colored layers 412g and 412b are also formed as shown in FIG. At this time, a thick portion 412TH is formed in the colored layer immediately above the opening 414a of the base layer 414 and the opening 411a 'of the reflective layer 411'. The colored layers 412r, 412g, and 412b are each formed on the reflective layer 411 with a thickness of about 0.5 μm to 2.0 μm, and the thick portion 412TH is 0.5 μm to 2.0 μm than the surrounding colored layer. It is formed so as to be higher.

  In the color filter substrate formed in this manner, the bottom surface of the colored layer other than the portion in the opening 414a is raised by the thickness of the base layer 414, so that the thickness of the thick portion 412TH is increased. The protrusion amount of the thick portion 412TH can be reduced while ensuring.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 7th Embodiment.

[Fifteenth embodiment]
Next, with reference to FIG. 16, the manufacturing method of the color filter substrate of 15th Embodiment based on this invention is demonstrated. In this embodiment, first, as shown in FIG. 16A, a reflective layer 411 having a thickness of about 50 nm to 250 nm having an opening 411a is formed on a substrate 401, and the reflective layer 411 is formed on the reflective layer 411. A light-transmitting layer 414 ′ having a thickness of about 0.5 μm to 2.5 μm is formed. Here, the translucent layer 414 ′ includes an opening 414 a ′ on the opening 411 a of the reflective layer 411.

  Next, as shown in FIG. 16B, a photosensitive resin 412s exhibiting a predetermined hue is applied, and then the photosensitive resin 412s is exposed using a transflective mask 400M similar to that of the twelfth embodiment. Then, a development process is performed to form a colored layer 412r shown in FIG. Here, a thick portion 412TH is formed in a region overlapping the opening 411a of the reflective layer 411 and the opening 414a 'of the light transmitting layer 414'. Finally, as shown in FIG. 16D, colored layers 412g and 412b exhibiting other hues are sequentially formed in the same manner as described above. The colored layers 412r, 412g, and 412b are each formed on the translucent layer 414 ′ with a thickness of about 0.5 μm to 2.0 μm, and the thick portion 412TH is 0.5 μm to 2 μm than the surrounding colored layer. It is formed to be higher by about 0.0 μm.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 7th Embodiment.

[Sixteenth Embodiment]
Next, with reference to FIG. 17, the manufacturing method of the color filter of 16th Embodiment which concerns on this invention is demonstrated. This embodiment shows a method of manufacturing a color filter substrate (substrate 601) used in the liquid crystal display panel 600 of the sixth embodiment shown in FIG.

  First, as shown in FIG. 17A, a reflective layer 611 having an opening 611 a having a thickness of about 50 nm to 250 nm is formed on the surface of the substrate 601. A light-transmitting layer 614 having a thickness of about 5 μm to 2.5 μm is formed. The light transmitting layer 614 is provided with an opening 614 a over the opening 611 a of the reflective layer 611.

  Next, as shown in FIG. 17B, a black light shielding layer 612BM having a thickness of about 0.5 μm to 2.5 μm is formed on the substrate 601 and the light transmitting layer 614. More specifically, as shown in FIG. 17A, a black photosensitive resin 612s is applied, exposed in a predetermined pattern, and patterned by development processing.

  Next, as shown in FIG. 17C, a colored layer 612r is formed by the same process (exposure / development process using a transflective mask) as in the twelfth embodiment, and a colored layer exhibiting another hue. Similarly, 612g and 612b are formed as shown in FIG. In the colored layer thus formed, the light transmitting layer 614 is partially formed, so that a thick portion 612TH is provided immediately above the opening 611a of the reflective layer 611.

  In this embodiment, a light transmissive layer 614 is formed on the reflective layer 611, and a black light shielding layer 612 BM is formed on the light transmissive layer 614. Conventionally, when the black light shielding layer 612BM is directly formed on the reflective layer made of metal, a black resin residue adheres to a region where the black resin should be removed during patterning of the black resin, and this residue is the brightness of the color filter. The problem of lowering is known. However, in the present embodiment, since the black light shielding layer 612BM is formed on the light transmitting layer 614 that covers the reflective layer 611, a black resin residue hardly occurs, and a high-quality bright color filter 612 can be formed. .

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 7th Embodiment.

  In this embodiment, since the black light-shielding layer is formed instead of the overlapped light-shielding layer of each embodiment described above, the thickness of the color filter can be reduced and the flatness of the surface of the color filter can be improved. It is configured to be able to. This black light shielding layer can be used in place of the overlapping light shielding layer in the first to fourth embodiments and the sixth to fifteenth embodiments.

  [Other configuration examples]

  Finally, another configuration example that can be used in each of the embodiments described above will be described with reference to FIG.

  In the configuration example shown in FIG. 18A, a recess 801a having a depth of about 0.5 μm to 2.5 μm is formed on the surface of the substrate 801, and fine unevenness 801b is formed on the surface other than the recess 801a. A reflective layer 811 having a thickness of about 50 nm to 250 nm is formed on the fine irregularities 801b. The reflective layer 811 has an opening 811a in a region on the concave portion 801a. Since the reflection layer 811 is formed on the unevenness 801b, the reflective layer 811 is formed into a fine unevenness as a whole. For this reason, since the reflected light reflected by the reflective layer 811 is appropriately scattered, in the case of configuring a liquid crystal display panel, the reflective display is obscured by illumination light or sunlight, or the background of the display surface is It is possible to prevent reflection.

  Here, the unevenness 801b can be formed to have a surface roughness suitable for light scattering by selecting in advance the composition of a hydrofluoric acid-based etching solution and etching using the etching solution. It can also be formed by forming a mask using a photolithography method and performing etching through the mask.

  In this configuration example, since the colored layer 812 of the color filter is formed on the concave portion 801a and the reflective layer 811, even when the surface of the colored layer 812 is formed almost flat, a thick portion is provided at the site where the concave portion 801 is formed. be able to.

  This configuration example can be applied as it is to the above embodiments in which a recess is formed on the substrate surface and a reflective layer is directly formed on the substrate surface. Even in an embodiment in which no recess is formed, it is possible to apply only the structure of the unevenness 801b and the reflective layer 811 thereon.

  In the configuration example shown in FIG. 18B, a reflective layer 911 having an opening 911a having a thickness of about 50 nm to 250 nm is formed on a substrate 901, and a thickness of 0.5 μm to about 350 μm is formed on the reflective layer 911. A translucent layer 914 having a thickness of about 2.5 μm is formed. The opening 914a of the light transmitting layer 914 is formed on the reflection layer 911 corresponding to the opening 911a. A colored layer 912 of the color filter is formed on the light transmitting layer 914 with a thickness of about 0.5 μm to 2.0 μm. The colored layer 912 is provided with a thick portion in a region corresponding to the opening 914 a of the light transmitting layer 914 and the opening 911 a of the reflective layer 911.

In this configuration example, minute particles having a light refractive index different from that of the material of the light transmissive layer 914 are dispersed and arranged inside the light transmissive layer 914. For this reason, since both the light which goes to the reflective layer 911, and the light reflected by the reflective layer 911 are scattered by the translucent layer 914, the dazzling and reflection in reflection type display can be reduced similarly to the said structural example. Can do.
In addition, this structural example is applicable to all embodiment provided with the translucent layer on the reflective layer among each said embodiment.

In the configuration example shown in FIG. 18C, a reflective layer 1011 having a thickness of about 50 nm to 250 nm having an opening 1011a is formed on a substrate 1001, and a thickness of 0.5 μm to about 100 μm is formed on the reflective layer 1011. A translucent layer 1014 having a thickness of about 2.5 μm is formed. The opening 1014a of the light transmitting layer 1014 is formed on the opening 1011a corresponding to the opening 1011a of the reflective layer 1011. A colored layer 1012 of a color filter is formed on the light transmitting layer 1014 with a thickness of about 0.5 μm to 2.0 μm.
The colored layer 1012 is provided with a thick portion in a region corresponding to the opening 1014 a of the light transmitting layer 1014 and the opening 1011 a of the reflective layer 1011.

  In this configuration example, fine irregularities 1014b are formed on the surface of the light transmitting layer 1014, and both the light traveling toward the reflective layer 1011 and the light reflected by the reflective layer 1011 are scattered by the irregularities 1014b. Yes. Therefore, also in this configuration example, it is possible to reduce the illusion and reflection in the reflective display. In addition to the etching method described in the above description of the configuration example of FIG. 18A, the unevenness 1014b is softened by heating after forming a periodic structure by patterning a material arranged on the substrate at a predetermined period. There is a method of creating an uneven shape by imparting appropriate fluidity. In addition, this structural example is applicable to all embodiment provided with the translucent layer on the reflective layer among each said embodiment.

  In the configuration example shown in FIG. 18D, a base layer 1114 having a thickness of about 0.5 μm to 2.5 μm having an opening 1114 a is formed on a substrate 1101, and a fine layer is formed on the surface of the base layer 1114. An unevenness 1114b is formed, and a reflective layer 1111 having a thickness of about 50 nm to 250 nm is formed thereon. The reflective layer 1111 is provided with an opening 1111a immediately above the base layer 1114a. Here, the unevenness 1114b of the base layer 1114 can be formed by a method similar to the unevenness forming method for the light-transmitting layer shown in FIG. A colored layer 1112 of a color filter is formed on the reflective layer 1111 with a thickness of about 0.5 μm to 2.0 μm. The colored layer 1112 includes an opening 1114 a of the base layer 1114 and an opening 1111 a of the reflective layer 1111. A thick part is provided in a region corresponding to.

  In this configuration example, since the reflective layer 1111 is formed on the unevenness 1114b of the base layer 1114, the reflection surface is formed in a fine unevenness, thereby reducing illusion or reflection as described above. This configuration example can be applied to all embodiments in which the reflective layer is formed on the base layer.

[Electronics]
Finally, specific examples of an electronic apparatus including the electro-optical device (liquid crystal display panel) according to each of the above embodiments will be described. FIG. 22 is a schematic perspective view illustrating an appearance of a mobile phone 2000 as an example of an electronic device. The mobile phone 2000 is provided with an operation unit 2002 having an operation switch on the surface of the casing 2001, and also includes a sound detection unit 2003 including a detector such as a microphone and a sound generation unit 2004 including a sound generator such as a speaker. And are provided. A display unit 2005 is provided in a part of the casing 2001, and the display screen of the electro-optical device of each of the above-described embodiments disposed inside can be visually recognized through the display unit 2005. A display signal is sent to the electro-optical device from a control unit provided inside the casing 2001, and a display image corresponding to the display signal is displayed.

  FIG. 23 is a schematic perspective view illustrating an appearance of a wristwatch 3000 as an example of an electronic apparatus. This wrist watch 3000 has a watch body 3001 and a watch band 3002. The watch body 3001 is provided with external operation members 3003 and 3004. In addition, a display unit 3005 is provided on the front surface of the watch main body 3001, and the display screen of the electro-optical device of each of the above-described embodiments disposed inside can be viewed through the display unit 3005. A display signal is sent to the electro-optical device from a control unit (clock circuit) provided inside the watch body 3001, and a display image corresponding to the display signal is displayed.

  FIG. 24 is a schematic perspective view illustrating an appearance of a computer device 4000 as an example of an electronic apparatus. In the computer device 4000, an MPU (microprocessor unit) is configured inside a main body 4001, and an operation unit 4002 is provided on the outer surface of the main body 4001. Further, a display unit 4003 is provided, and the electro-optical device according to each of the above embodiments is accommodated in the display unit 4003. Then, the display screen of the electro-optical device can be viewed through the display unit 4003. The electro-optical device is configured to receive a display signal from an MPU provided in the main body 4001 and display a display image corresponding to the display signal.

  The color filter substrate and electro-optical device of the present invention, the method of manufacturing the color filter substrate, the method of manufacturing the electro-optical device, and the electronic apparatus are not limited to the illustrated examples described above. Of course, various changes can be made without departing from the scope of the invention.

  For example, in each of the embodiments described above, a passive matrix type liquid crystal display panel has been exemplified. However, as an electro-optical device of the present invention, an active matrix type liquid crystal display panel (for example, a TFT (thin film transistor), The present invention can be similarly applied to a liquid crystal display panel including a TFD (thin film diode) as a switching element. The present invention is similarly applied not only to a liquid crystal display panel but also to various electro-optical devices that can control the display state for each of a plurality of pixels, such as an electroluminescence device, an organic electroluminescence device, and a plasma display device. Is possible.

  Furthermore, the color filter substrate of the present invention is not limited to the electro-optical device, and can be used for various display devices, imaging devices, and other various optical devices.

It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 1st Embodiment which concerns on this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 2nd Embodiment which concerns on this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 3rd Embodiment concerning this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 4th Embodiment concerning this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 5th Embodiment concerning this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 6th Embodiment concerning this invention. It is a schematic plan view which shows typically the planar structure of the color filter substrate of 1st Embodiment. It is a schematic process figure (a)-(c) which shows typically the manufacturing method of the color filter substrate of a 7th embodiment concerning the present invention. It is a schematic process drawing (a)-(c) which shows typically the manufacturing method of the color filter substrate of an 8th embodiment concerning the present invention. It is a schematic process figure (a)-(c) which shows typically the manufacturing method of the color filter substrate of a 9th embodiment concerning the present invention. It is a schematic process figure (a)-(c) which shows typically the manufacturing method of the color filter substrate of a 10th embodiment concerning the present invention. It is a schematic process drawing (a)-(c) which shows typically the manufacturing method of the color filter substrate of an 11th embodiment concerning the present invention. It is a schematic process drawing (a)-(d) which shows typically the manufacturing method of the color filter substrate of a 12th embodiment concerning the present invention. It is a schematic process figure (a)-(d) which shows typically the manufacturing method of the color filter substrate of a 13th embodiment concerning the present invention. It is a schematic process figure (a)-(d) which shows typically the manufacturing method of the color filter substrate of a 14th embodiment concerning the present invention. It is a schematic process figure (a)-(d) which shows typically the manufacturing method of the color filter substrate of a 15th embodiment concerning the present invention. It is a schematic process drawing (a)-(d) which shows typically the manufacturing method of the color filter substrate of a 16th embodiment concerning the present invention. It is a general | schematic fragmentary sectional view (a)-(d) which shows typically the example of another structure applicable to each said embodiment. It is a schematic sectional drawing which shows typically the structure of the reflective transflective liquid crystal display panel of a conventional structure. It is an expanded partial sectional view which expands and shows the principal part of the color filter substrate of 1st Embodiment. It is a schematic flowchart which shows the process outline | summary of the modification of the manufacturing method of the color filter substrate of 7th Embodiment. 1 is a schematic perspective view illustrating an appearance of a mobile phone as an example of an electronic apparatus including an electro-optical device according to each embodiment. 1 is a schematic perspective view illustrating an appearance of a watch (watch) as an example of an electronic apparatus including an electro-optical device according to each embodiment. 1 is a schematic perspective view illustrating an appearance of a computer (information terminal) as an example of an electronic apparatus including an electro-optical device according to each embodiment.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 200 ... Liquid crystal display panel, 201, 202 ... Board | substrate, 203 ... Sealing material, 204 ... Liquid crystal, 205, 207 ... Phase difference plate, 206, 208 ... Polarizing plate, 209 ... Backlight, 211 ... Reflective layer, 211a ... Opening 212 ... Color filter, 212r, 212g, 212b ... Colored layer, 212BM ... Overlapping light shielding layer, 212TH ... Thick part, 213, 221 ... Transparent electrode, 214 ... Translucent layer, 214 '... Underlayer, R ... Reflection path , T: Transmission path.

Claims (17)

In the color filter substrate,
A substrate,
A reflective layer disposed on the substrate and having a transmissive portion capable of substantially transmitting light;
A colored layer that is disposed so as to overlap at least the reflective layer and has a thick portion, and
The reflection layer has a reflection part around the transmission part,
The thick part is arranged to overlap the transmission part in a plane,
The thickness of the thick part is larger than the sum of the thickness of the colored layer corresponding to the position of the reflection part and the thickness of the reflection part.   The said transmission part is an opening part provided in the said reflection layer, The light transmission layer which can permeate | transmit light substantially between the said reflection layer except the said opening part and the said colored layer was provided in Claim 1. The color filter substrate as described.   The color filter substrate according to claim 2, wherein the light transmitting layer has a scattering function of scattering light.   The color filter substrate according to claim 1, wherein the transmissive portion is an opening provided in the reflective layer, and a base layer is provided between the reflective layer excluding the opening and the substrate.   The color filter substrate according to claim 4, wherein the surface of the base layer has irregularities, and the reflective layer has fine irregularities that scatter light.   The color filter substrate according to claim 1, wherein the substrate has a recess, and the thick portion is disposed so as to overlap the recess in a planar manner. In the color filter substrate,
A substrate,
A colored layer disposed on the substrate and having a thick part,
The color filter substrate, wherein the thick portion is thicker than other portions.   The color filter substrate according to claim 7, further comprising a light-transmitting layer capable of substantially transmitting light between the substrate and the colored layer excluding the thick portion.   The color filter substrate according to claim 7, wherein the substrate has a concave portion, and the thick portion is disposed so as to overlap the concave portion in a plane. In an electro-optical device,
An electro-optic layer containing an electro-optic material;
A substrate supporting the electro-optic layer;
A reflective layer disposed on the substrate and having a transmissive portion capable of substantially transmitting light;
A colored layer that is disposed so as to overlap at least the reflective layer and has a thick portion, and
The reflection layer has a reflection part around the transmission part,
The thick part is arranged to overlap the transmission part in a plane,
The thickness of the thick part is larger than the sum of the thickness of the colored layer corresponding to the position of the reflective part and the thickness of the reflective part. In an electro-optical device,
An electro-optic layer containing an electro-optic material;
A first substrate supporting the electro-optic layer;
A reflective layer disposed on the first substrate and having a transmissive portion capable of substantially transmitting light;
A second substrate disposed opposite the first substrate;
A colored layer disposed on the second substrate and having a thick part thicker than other parts,
The electro-optical device, wherein the thick portion is disposed so as to overlap the transmission portion in a planar manner. In an electro-optical device,
An electro-optic layer containing an electro-optic material;
A first substrate supporting the electro-optic layer;
A reflective layer disposed on the first substrate and having a transmissive portion capable of substantially transmitting light;
A first colored layer disposed so as to overlap at least the reflective layer in a plane;
A second substrate disposed opposite the first substrate;
A second colored layer disposed on the second substrate,
The reflection layer has a reflection part around the transmission part,
The first colored layer is disposed so as to planarly overlap at least the transmission part and the reflection part,
The electro-optical device, wherein the second colored layer is disposed so as to overlap at least the transmission portion in a plane. In the manufacturing method of the color filter,
Partially forming an insulating layer on the substrate;
Forming a colored layer on a region where the insulating layer is formed and a region where the insulating layer is not formed, and a method for manufacturing a color filter substrate. In the manufacturing method of the color filter,
Placing a coloring material on the substrate;
A step of partially changing the degree of curing of the coloring material and applying a curing treatment;
And removing the uncured portion of the coloring material to form a thick portion thicker than other portions in part of the colored layer. In the manufacturing method of the color filter,
Placing a coloring material on the substrate;
A step of partially changing the exposure degree of the coloring material and exposing,
And a step of developing the coloring material to form a thick portion thicker than other portions in a part of the colored layer.   14. A method for manufacturing an electro-optical device, comprising the method for manufacturing a color filter according to claim 13 as a process.   An electronic apparatus comprising the electro-optical device according to claim 10.

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