JP4241315B2 - Color filter substrate, electro-optical device, method for manufacturing color filter substrate, method for manufacturing electro-optical device, and electronic apparatus - Google Patents

Description

  The present invention relates to a color filter substrate and an electro-optical device, and a color filter substrate manufacturing method and an electro-optical device manufacturing method, and more particularly to a color filter structure suitable for use in a reflective transflective electro-optical device. .

  2. Description of the Related Art Conventionally, a reflective transflective liquid crystal display panel in which both a reflective display using external light and a transmissive display using illumination light such as a backlight are visible is known. This reflective transflective liquid crystal display panel has a reflective layer for reflecting external light in the panel, and this reflective layer is configured to transmit illumination light such as a backlight. is there. As this type of reflective layer, there is a layer having a pattern having a predetermined proportion of openings (slits) for each pixel of a liquid crystal display panel.

  FIG. 18 is a schematic cross-sectional view schematically showing a schematic structure of a conventional reflective transflective liquid crystal display panel 100. The liquid crystal display panel 100 has a structure in which a substrate 101 and a substrate 102 are bonded together with a sealant 103 and a liquid crystal 104 is sealed between the substrate 101 and the substrate 102.

  On the inner surface of the substrate 101, a reflective layer 111 having an opening 111a is formed for each pixel, and a color filter 112 having colored layers 112r, 112g, and 112b and a protective film 112p is formed on the reflective layer 111. Has been. A transparent electrode 113 is formed on the surface of the protective film 112 p of the color filter 112.

  On the other hand, a transparent electrode 121 is formed on the inner surface of the substrate 102 and is configured to intersect the transparent electrode 113 on the opposite substrate 101. Note that an alignment film, a hard transparent film, and the like are appropriately formed on the transparent electrode 113 on the substrate 101 and the transparent electrode 121 on the substrate 102 as necessary.

  In addition, a retardation plate (¼ wavelength plate) 105 and a polarizing plate 106 are sequentially arranged on the outer surface of the substrate 102, and a retardation plate (¼ wavelength plate) 107 and on the outer surface of the substrate 101. Polarizers 108 are sequentially arranged.

  When the liquid crystal display panel 100 configured as described above is installed in an electronic device such as a mobile phone or a portable information terminal, the liquid crystal display panel 100 is attached with a backlight 109 disposed behind it. In this liquid crystal display panel 100, in bright places such as daytime or indoors, external light passes through the liquid crystal 104 along the reflection path R, is reflected by the reflective layer 111, and then passes through the liquid crystal 104 again to be emitted. The reflective display is visually recognized. On the other hand, by turning on the backlight 109 in a dark place such as at night or outdoors, the light passing through the opening 111a out of the illumination light of the backlight 109 passes through the liquid crystal display panel 100 along the transmission path T and is emitted. Therefore, the transmissive display is visually recognized.

  However, in the conventional reflective transflective liquid crystal display panel 100, light passes through the color filter 112 twice in the reflection path R, whereas light passes through the color filter 112 in the transmission path T only once. Therefore, there is a problem that the saturation in the transmissive display is worse than that in the reflective display. That is, since the display brightness generally tends to be insufficient in the reflective display, it is necessary to ensure the display brightness by setting the light transmittance of the color filter 112 high. In the transmissive display, sufficient saturation cannot be obtained.

  In addition, as described above, the number of times light passes through the color filter is different between the reflective display and the transmissive display, so that the color of the reflective display and the color of the transmissive display are greatly different. There is also the problem of giving.

  Therefore, the present invention solves the above problems, and the problem is that when used in a display device that enables both reflective display and transmissive display, the brightness of the reflective display and the color of the transmissive display are displayed. An object of the present invention is to provide a color filter substrate capable of ensuring both the degree and the degree. Another object of the present invention is to provide a reflective transflective electro-optical device that can ensure both the brightness of the reflective display and the saturation of the transmissive display. It is another object of the present invention to realize a display technique capable of reducing the color difference between the reflective display and the transmissive display.

In order to solve the above-described problems, an electro-optical device according to the present invention includes an electro-optical material sandwiched between first and second substrates disposed to face each other, and the substrate is one of the first and second substrates. A reflective layer is formed in each pixel, and a transmissive portion and a reflective portion are individually provided in one pixel, and each of the pixels has a light color portion and a dark color portion having a light density higher than that of the light color portion. An electro-optical device including a colored layer, wherein a concave portion corresponding to the transmission portion is formed on a surface of either the first or second substrate, and the dark layer of the colored layer is formed in the concave portion. A color portion is formed, and the light color portion of the colored layer is formed so as to cover a planar region corresponding to the reflection portion and the dark color portion .
Further, the light color portion is stacked on the dark color portion and is formed so as to cover the entire pixel .
In the electro-optical device manufacturing method according to the present invention, an electro-optical material is sandwiched between the first and second substrates arranged to face each other, and either the first or second substrate is placed on the substrate. A reflective layer is formed, and a transmissive portion and a reflective portion are individually provided in one pixel, and a colored layer having a light color portion and a dark color portion having a light density higher than the light color portion in the one pixel. A step of forming a recess in a planar region corresponding to a transmissive portion in the one pixel on the surface of one of the first and second substrates, and Forming the dark color portion of the colored layer in the concave portion, and forming the light color portion of the colored layer so as to cover the flat region corresponding to the reflective portion and the dark color portion. It is characterized by.
Further, in the step of forming the light color portion of the colored layer, the light color portion is stacked on the dark color portion and is formed so as to cover the entire pixel .
The color filter substrate is disposed on the substrate, and is disposed on the substrate and has a light color portion and a colored layer having a light color portion having a higher light density than the light color portion, and is substantially transparent to light. A reflective layer having a possible transmissive portion, and the dark color portion is disposed so as to overlap at least the transmissive portion in a plane.

  According to the present invention, a colored layer having a light color portion and a dark color portion is provided, and the dark color portion is disposed so as to overlap with at least the transmission portion of the reflection layer in a planar manner. Since the light passing through the light passes through the dark color portion, the saturation of the transmitted light can be improved as compared with the conventional case.

  Here, the light density refers to the ability per unit thickness of the colored layer to bias the wavelength distribution of light. If the light density is high (if it is large), the saturation of the transmitted light (coloriness) becomes strong, and the light density If it is low (small), the saturation of the transmitted light will be weak. When the colored layer contains a colorant such as a pigment or a dye, the light density usually has a positive correlation with the amount of the colorant.

Specific parameters having a correlation with the concept of color density include, for example, the Y value of the XYZ color system and the L ^* value of the Lab color system corresponding to the luminous transmittance or brightness, that is, the visible light region (for example, Integral value of spectral transmittance in a light wavelength range of 380 nm to 780 nm can be used. The Y value and L ^* value have a negative correlation (for example, an inversely proportional relationship) with the color density. Accordingly, the Y value and L ^* values of the dark color portion becomes smaller than the Y value and L ^* value of the color portion.

As a specific parameter having a correlation with the concept of color density, a polygonal area constituted by points corresponding to the hue of the colored layer on the chromaticity diagram can also be used. The area of this polygon has a positive correlation (for example, a proportional relationship) with the color density. Thus, for example, a polygon composed of points corresponding to hues of dark portions on the xy chromaticity diagram of the CIE (1931) color system or the a ^* b ^* chromaticity diagram of the CIE (1976) color system. The area is larger than the area of a polygon formed by points corresponding to the hue of the light color portion on the same chromaticity diagram. For example, in the case of having three colored layers, the polygon is a triangle.

  Further, the transmissive part of the reflective layer is substantially capable of transmitting light, and the transmissive part may be formed by providing an opening in a part of the reflective layer, or alternatively, You may comprise a permeation | transmission part by forming a part thinly.

  In this case, it is preferable that the light color portion is disposed so as to overlap the reflection layer excluding the transmission portion in a plane, and the dark color portion is disposed on the substrate on which the light color portion is not disposed. In this structure, since the light color portion and the dark color portion are formed in different plane regions, the thickness of the color filter can be reduced and the surface thereof can be made flat.

  The reflective layer has a reflective portion in a portion other than the transmissive portion, the transmissive portion is an opening provided in the reflective layer, and the light-colored portion overlaps at least the reflective portion in a plane. It is preferable to arrange | position.

  Furthermore, it is preferable that the colored layer has a laminated structure of the light color portion and the dark color portion. In this structure, since the light color portion and the dark color portion can be simply stacked, it can be easily manufactured. In this case, either the light color portion or the dark color portion may be formed on the upper side.

  Here, a light-transmitting layer that is partially disposed between the reflective layer and the colored layer and that can substantially transmit light is provided, and the dark color portion is disposed in a region where the light-transmitting layer is not disposed. It is preferable that If it does in this way, a surface level | step difference can be provided between a light color part and a dark color part by the presence or absence of a translucent layer. In addition, when the surface step between the light color portion and the dark color portion is configured to be less than the thickness of the partially disposed translucent layer, the dark color portion can be configured to be thicker than the light color portion. Therefore, it is possible to further increase the saturation of transmitted light.

  At this time, it is desirable that the light transmitting layer has a scattering function of scattering light. In this way, when the reflective display is viewed through the color filter substrate, it is possible to reduce illumination light caused by regular reflection of the reflective layer, illusion caused by sunlight, reflection of the background, and the like. Here, the scattering function of the light-transmitting layer can be obtained by fine irregularities on the surface of the light-transmitting layer, fine particles dispersed and arranged inside the light-transmitting layer, and the like.

Furthermore, it is preferable that a base layer partially disposed between the reflective layer and the substrate is provided, and the dark color portion is disposed in a region where the base layer is not disposed.
If it does in this way, a surface level | step difference can be provided between a light color part and a dark color part by the presence or absence of a base layer. Further, if the surface step between the light color portion and the dark color portion is configured to be less than the thickness of the partially disposed base layer, the dark color portion can be configured to be thicker than the light color portion. Therefore, it is possible to further increase the saturation of transmitted light.

  At this time, the surface of the reflective layer preferably has fine irregularities that scatter light. In this way, when the reflective display is viewed through the color filter substrate, it is possible to reduce illumination light caused by regular reflection of the reflective layer, illusion caused by sunlight, reflection of the background, and the like.

  In each of the above means, it is preferable that the substrate has a recess, and the dark color portion is disposed in the recess. By arranging the dark color portion in the recess, it is possible to provide a surface step between the light color portion and the dark color portion of the colored layer. Further, if the surface step between the light color portion and the dark color portion is configured to be less than the depth of the concave portion, the dark color portion can be configured to be thicker than the light color portion. Therefore, it is possible to further increase the saturation of transmitted light.

  Next, another color filter substrate of the present invention includes a colored layer disposed on the substrate and having a dark portion, and the dark portion has a light density higher than that of the other portions. When the colored layer has a dark portion, the saturation of light transmitted through the dark portion can be higher than the saturation of light transmitted through other portions. Therefore, this color filter substrate is used in a liquid crystal device having a reflective layer having a transmissive portion (opening) that substantially transmits light, and is arranged so that the dark color portion matches the transmissive portion. Can also increase the saturation of transmitted light. Here, the color filter substrate preferably has a dark portion for each of the plurality of pixel regions.

  In addition, a light-transmitting layer that is partially disposed between the substrate and the colored layer and that can substantially transmit light is provided, and the dark-colored portion is disposed in a region where the light-transmitting layer is not disposed. Preferably it is. According to this color filter substrate, a surface step can be provided between the light color portion and the dark color portion depending on the presence or absence of the light transmitting layer. In addition, when the surface step between the light color portion and the dark color portion is configured to be less than the thickness of the partially disposed translucent layer, the dark color portion can be configured to be thicker than the light color portion. Therefore, it is possible to further increase the saturation of transmitted light.

  Further, it is preferable that the substrate has a concave portion, and the dark color portion is disposed in the concave portion. By arranging the dark color portion in the recess, it is possible to provide a surface step between the light color portion and the dark color portion of the colored layer. Further, if the surface step between the light color portion and the dark color portion is configured to be less than the depth of the concave portion, the dark color portion can be configured to be thicker than the light color portion. Therefore, it is possible to further increase the saturation of transmitted light.

  Next, an electro-optical device of the present invention includes an electro-optical layer containing an electro-optical material, a substrate that supports the electro-optical layer, and a transmission portion that is disposed on the substrate and substantially transmits light. A reflective layer; and a colored layer disposed on the substrate and having a light color part and a dark color part having a light density higher than that of the light color part, and the dark color part at least overlaps the transmission part in a plane. It is arranged.

  According to the present invention, since the dark color portion is disposed so as to overlap the transmission portion of the reflection layer in a plane, light passing through the transmission portion of the reflection layer is transmitted through the dark color portion. The saturation of transmitted light can be improved as compared with the conventional case.

  Here, it is preferable that the light color portion is disposed so as to overlap the reflection layer excluding the transmission portion in a plane, and the dark color portion is disposed in an area where the light color portion is not disposed. In this structure, since the light color portion and the dark color portion are formed in different plane regions, the thickness of the color filter can be reduced and the surface thereof can be made flat.

  Moreover, it is preferable that the said colored layer has a laminated structure of the said light color part and the said dark color part. In this structure, since the light color portion and the dark color portion can be simply stacked, it can be easily manufactured. In this case, either the light color portion or the dark color portion may be formed on the upper side.

  Furthermore, it is provided with a light-transmitting layer disposed between the reflective layer and the colored layer that can substantially transmit light, and the dark color portion is disposed in a region where the light-transmitting layer is not disposed. Is preferred. If it does in this way, a surface level | step difference can be provided between a light color part and a dark color part by the presence or absence of a translucent layer. In addition, when the surface step between the light color portion and the dark color portion is configured to be less than the thickness of the partially disposed translucent layer, the dark color portion can be configured to be thicker than the light color portion. Therefore, it is possible to further increase the saturation of transmitted light.

  At this time, it is desirable that the light transmitting layer has a scattering function of scattering light. In this way, when the reflective display is viewed through the color filter substrate, it is possible to reduce illumination light caused by regular reflection of the reflective layer, illusion caused by sunlight, reflection of the background, and the like. Here, the scattering function of the light-transmitting layer can be obtained by fine irregularities on the surface of the light-transmitting layer, fine particles dispersed and arranged inside the light-transmitting layer, and the like.

  In addition, it is preferable that a base layer partially disposed between the reflective layer and the substrate is provided, and the dark color portion is disposed on the substrate on which the base layer is not disposed. If it does in this way, a surface level | step difference can be provided between a light color part and a dark color part by the presence or absence of a base layer. Further, if the surface step between the light color portion and the dark color portion is configured to be less than the thickness of the partially disposed base layer, the dark color portion can be configured to be thicker than the light color portion. Therefore, it is possible to further increase the saturation of transmitted light.

  Here, it is desirable that the surface of the reflective layer has fine irregularities that scatter light. In this way, when visually recognizing the reflective display, it is possible to reduce illumination light caused by regular reflection of the reflective layer, illusion caused by sunlight, reflection of the background, and the like.

  Furthermore, it is preferable that a concave portion is provided in the base, and the dark color portion is disposed in the concave portion. By arranging the dark color portion in the recess, it is possible to provide a surface step between the light color portion and the dark color portion of the colored layer. Further, if the surface step between the light color portion and the dark color portion is configured to be less than the depth of the concave portion, the dark color portion can be configured to be thicker than the light color portion. Therefore, it is possible to further increase the saturation of transmitted light.

  The electro-optical device may include a counter substrate disposed to face the substrate with the electro-optical layer interposed therebetween.

  Another electro-optical device according to the present invention includes an electro-optical layer containing an electro-optical material, a first substrate that supports the electro-optical layer, the first substrate, and a light that is substantially transmitted. A reflective layer having a transmissive portion that can be transmitted; a second substrate disposed opposite to the first substrate; and a light color portion disposed on the second substrate and having a light density higher than that of the light color portion and the light color portion. And a colored layer having a high dark portion, and the dark portion is arranged so as to overlap at least the transmission portion in a plane.

  According to the present invention, the reflective layer having the transmission part is disposed on the first substrate, the colored layer having the light color part and the dark color part is disposed on the second substrate, and the dark color part is at least planar with the transmission part. Since the light passing through the transmissive part of the reflective layer passes through the dark color part, the saturation of the transmitted light can be improved.

  Here, a light-transmitting layer that is partially disposed between the second substrate and the colored layer and that can substantially transmit light is provided, and the dark-colored portion is a region where the light-transmitting layer is not disposed. It is preferable to arrange | position. If it does in this way, a surface level | step difference can be provided between a light color part and a dark color part by the presence or absence of a translucent layer. In addition, when the surface step between the light color portion and the dark color portion is configured to be less than the thickness of the partially disposed translucent layer, the dark color portion can be configured to be thicker than the light color portion. Therefore, it is possible to further increase the saturation of transmitted light.

  Further, it is preferable that the second substrate has a concave portion, and the dark color portion is disposed in the concave portion. By arranging the dark color portion in the recess, it is possible to provide a surface step between the light color portion and the dark color portion of the colored layer. Further, if the surface step between the light color portion and the dark color portion is configured to be less than the depth of the concave portion, the dark color portion can be configured to be thicker than the light color portion. Therefore, it is possible to further increase the saturation of transmitted light.

  A first substrate and a second substrate disposed on both sides of an electro-optic layer containing an electro-optic material, and a colored layer is disposed on one of the first substrate and the second substrate. It is also possible to dispose the limited colored layer on the other substrate in a region that overlaps the transmission part of the reflective layer in a planar manner. In this case, since the light that has passed through the transmission part of the reflective layer passes through the limited colored layer, the saturation of the transmitted light can be improved. Here, it is desirable that the light density of the limited colored layer is higher than that of the colored layer.

  Next, in the method for manufacturing a color filter substrate of the present invention, the light color portion of the colored layer is formed in the first region, and the second region adjacent to the first region is lighter than the light color portion. And a step of forming a dark portion of a colored layer having a high concentration.

  In the electro-optical device manufacturing method according to the aspect of the invention, the step of forming the light color portion of the colored layer in the first region and the light density in the second region adjacent to the first region are higher than the light color portion. And a step of forming a dark portion of a colored layer having a high color layer as a process.

  Next, an electronic apparatus according to the present invention includes an electro-optic layer containing an electro-optic material, a substrate that supports the electro-optic layer, and a reflective member that is disposed on the substrate and substantially transmits light. A layer and a colored layer disposed on the substrate and having a light-colored portion and a dark-colored portion having a light density higher than that of the light-colored portion, and the dark-colored portion is disposed so as to overlap at least the transmission portion in a plane The electro-optical device is provided.

  Another electronic apparatus according to the present invention includes an electro-optic layer containing an electro-optic material, a first substrate supporting the electro-optic layer, the first substrate, and substantially transmitting light. A reflective layer having a possible transmissive portion; a second substrate disposed opposite the first substrate; and a light color portion disposed on the second substrate and having a higher light density than the light color portion and the light color portion. A colored layer having a dark color portion, and the dark color portion includes an electro-optical device disposed so as to overlap at least the transmission portion in a plane.

  Next, embodiments of a color filter substrate, an electro-optical device, and a manufacturing method thereof according to the present invention will be described in detail with reference to the accompanying drawings.

[First Embodiment]
FIG. 1 is a schematic sectional view schematically showing a substrate 201 which is a first embodiment of a color filter substrate according to the present invention and a liquid crystal display panel 200 which is a first embodiment of an electro-optical device using the color filter substrate. It is.

  In the liquid crystal display panel 200, a substrate 201 and a substrate 202 made of glass, plastic, or the like are bonded together with a sealant 203, and a liquid crystal 204 is sealed inside. The substrate 202, the transparent electrode 221 formed on the substrate 202, the phase difference plates 205 and 207, and the polarizing plates 206 and 208 are exactly the same as the conventional example shown in FIG.

  In the present embodiment, a reflective layer 211 having an opening 211 a as a transmissive portion that can substantially transmit light is formed on the inner surface of the substrate 201. The reflective layer 211 can be formed of a thin film such as aluminum, an aluminum alloy, or a silver alloy. The opening 211a has a predetermined opening ratio (for example, 10 to 30%) with respect to the entire area of the pixel G for each pixel G arranged and set in a matrix in the vertical and horizontal directions along the inner surface of the substrate 210. Is formed.

  FIG. 9 shows a plan view of the substrate 201 as viewed from above. For example, the opening 211 a is formed in a rectangular shape in plan view as indicated by a dotted lead line in FIG. 9, and one opening is formed in the pixel G at almost the center of the pixel G. However, the position of the opening 211a and the shape of the opening are arbitrary, and the number of the openings 211a is also arbitrary. Unlike this embodiment, a plurality of openings may be provided for each pixel.

  On the reflective layer 211, for example, in the case of a primary color filter, colored layers 212r, 212g, and 212b composed of three colors of R (red), G (green), and B (blue) are known, for example. They are arranged for each pixel G in an appropriate arrangement form (a stripe arrangement color filter is shown in FIG. 9) such as a stripe arrangement, a delta (triangle) arrangement, and a diagonal mosaic (diagonal) arrangement. Here, between the pixels G, the colored layers 212r, 212g, and 212b are overlapped with each other to form an overlapping light shielding portion 212BM that exhibits light shielding properties. Here, each of the colored layers 212r, 212g, and 212b basically has a substantially flat surface except for the overlapped light shielding portion 212BM.

  Each of the colored layers 212r, 212g, and 212b is provided with a dark portion 212c on the opening 211a of the reflective layer 211, and a portion other than the dark portion 212c has a light density lower than that of the dark portion 212c. It is a light colored part. The dark color portion 212c having a high light density is configured such that the concentration of a coloring material such as a pigment or a dye dispersed in the translucent resin is higher than that in the light color portion.

  A protective film 212p made of a transparent resin or the like is formed on the colored layers 212r, 212g, and 212b and the overlapping light shielding portion 212BM. The protective film 212p is for protecting the colored layer from corrosion and contamination by chemicals and the like during the process, and for flattening the surface of the color filter 212.

  On the color filter 212, a transparent electrode 213 made of a transparent conductor such as ITO (indium tin oxide) is formed. In the present embodiment, a plurality of the transparent electrodes 213 are formed in a stripe shape. The transparent electrode 231 extends in a direction orthogonal to the transparent electrode 221 similarly formed in a stripe shape on the substrate 202, and is transparent electrode 213 and transparent electrode 221 (shown by a one-dot chain line in FIG. 9). The components of the liquid crystal display panel 200 included in the intersection region (the portions in the intersection region of the reflective layer 211, the color filter 212, the transparent electrode 213, the liquid crystal 204, and the transparent electrode 221) form the pixel G. ing.

  In the present embodiment, in the colored layer 212, a dark color portion 212c having a higher light density than other portions is formed above the opening 211a of the reflective layer 211. The saturation of light passing through the dark color portions 212c of the colored layers 212r, 212g, and 212b is high, and the saturation of light passing through the other light color portions is relatively low.

  In the liquid crystal display panel 200, when reflection type display is performed, the light passes along the reflection path R and is visually recognized. When transmission type display is performed, the light passes along the transmission path T. Is visually recognized. At this time, the color filter 212 acts in the reflection path T in the same manner as in the past, but since the transmission path T passes through the opening 211a of the reflection layer 211, the transmitted light passes through the dark portions 212c of the colored layers 212r, 212g, and 212b. As a result, the saturation in the transmissive display is improved as compared with the conventional structure shown in FIG.

  Therefore, in the present embodiment, the dark color portion 212c is formed in a position that overlaps the opening 211a of the reflective layer 211 in the color filter 212 in a planar manner, thereby transmitting the light without impairing the brightness of the reflective display. It is possible to improve the saturation of the type display. In particular, the difference in color between the reflective display and the transmissive display can be reduced as compared with the related art.

  Here, in the case where the dark color portion 212c and the other light color portions have the same thickness, the dark color portion 212c transmits the same light to the dark color portion and the light color portion twice as thick. It is preferable that substantially the same color can be obtained. At this time, in this specification, it is assumed that the color density of the dark color portion 212c is twice that of the light color portion. More specifically, when the expression of the color density is used, the color density of the dark color portion is preferably in the range of 1.4 times to 2.6 times that of the light color portion, particularly 1.7 times to 2 times. It is desirable to be within the range of 3 times. In this way, the difference between the saturation of the reflective display and the saturation of the transmissive display can be further reduced, and the difference in color between the two displays can be further reduced. Moreover, if it is the said range, it can manufacture easily by adjusting the density | concentrations, such as a pigment and dye.

  In the present embodiment, the light layers and the dark portions 212c are arranged in a plane on the colored layers 212r, 121g, and 212b, so that the surfaces (upper surfaces in the drawing) of the colored layers 212r, 212g, and 212b are arranged. The unevenness can be reduced, and in particular, the colored layer can be formed flat by setting the light color portion and the dark color portion to the same thickness. Therefore, since the flatness of the surface of the color filter 212 can be improved, the display quality of the liquid crystal display panel can be improved.

  Note that the opening of the reflective layer is not limited to a case where the opening is substantive, and may be a transmissive portion configured to substantially transmit light. For example, the case where it is comprised so that light can be substantially permeate | transmitted by forming a part of reflection layer thinly is included.

[Second Embodiment]
Next, a color filter substrate 301 and a liquid crystal display panel 300 according to the second embodiment of the present invention will be described with reference to FIG. This embodiment includes substrates 301 and 302, a sealing material 303, a liquid crystal 304, transparent electrodes 313 and 321, retardation plates 305 and 307, and polarizing plates 306 and 308 that are configured in the same manner as in the first embodiment. Therefore, these explanations are omitted.

  In the present embodiment, a reflective layer 311 having an opening 311a as a transmissive portion that can substantially transmit light is provided on the surface of the substrate 301, and the colored layers 312r, 312g, and 312b are provided on the reflective layer 311. Is formed for each pixel. Each of these colored layers is formed on the entire pixel so as to cover the opening 311a. The colored layer is a light-colored portion formed over the entire pixel on the reflective layer 311 and a layer that is laminated on the light-colored portion and has the same hue as the light-colored portion and a higher color density than the light-colored portion. And a color portion 312c.

  In the present embodiment, since the colored layers 312r, 312g, and 312b are configured by the laminated structure of the light color portion and the dark color portion 312c, the light is transmitted through only the light color portion in the reflection path R as in the first embodiment. However, in the transmission path T, unlike the first embodiment, light is transmitted through both the light color portion and the dark color portion 312c. Therefore, as in the case of the first embodiment, the saturation of the transmissive display is improved, and the difference in color between the reflective display and the transmissive display can be reduced. In this case, since the transmitted light is configured to pass through both the light color portion and the dark color portion, in this embodiment, the thickness of the dark color portion 312c is reduced as compared with the thickness of the dark color portion of the first embodiment. can do. For example, in the case where the light density of the dark color portion is two of the light color portion, in order to obtain optical characteristics equivalent to those of the first embodiment in the present embodiment, the thickness of the dark color portion 312c is set to the thickness of the light color portion. You can halve it.

[Third Embodiment]
Next, a color filter substrate 401 and a liquid crystal display panel 400 according to a third embodiment of the present invention will be described with reference to FIG. This embodiment also includes substrates 401 and 402, a sealing material 403, a liquid crystal 404, transparent electrodes 413 and 421, retardation plates 405 and 407, and polarizing plates 406 and 408 that are configured in the same manner as in the first embodiment. Therefore, these explanations are omitted.

  Similarly to the above embodiment, also in this embodiment, a reflective layer 411 having an opening 411a as a transmissive portion that can substantially transmit light is formed on the substrate 401, and is directly colored thereon. A color filter 412 including layers 412r, 412g, and 412b, an overlapping light shielding portion 412BM, and a protective film 412p is formed.

  In this embodiment, a concave portion 401a is formed for each pixel on the substrate 401, and the concave portion 401a is configured in a position and shape that substantially coincides with the opening portion 411a of the reflective layer 411 in a plane. A dark color portion 412c constituting a part of the colored portion is formed in the concave portion 401a, and a light color light color portion having a light density lower than that of the dark color portion is formed on the entire pixel on the dark color portion 412c. Is formed.

  Also in this embodiment, since the colored layers 412r, 412g, and 412b have a structure in which a light color portion and a dark color portion are laminated, the same effects as those of the second embodiment are optically achieved. However, in the present embodiment, the concave portion 401a is formed on the substrate 401, and the dark color portion 412c is formed in the concave portion 401a. Therefore, the flatness of the surface of the colored layer is improved as compared with the second embodiment. be able to.

[Fourth Embodiment]
Next, a color filter substrate 501 and a liquid crystal display panel 500 according to a fourth embodiment of the present invention will be described with reference to FIG. This embodiment also includes substrates 501 and 502, a sealing material 503, a liquid crystal 504, transparent electrodes 513 and 521, retardation plates 505 and 507, and polarizing plates 506 and 508 configured in the same manner as in the first embodiment. Therefore, these explanations are omitted.

  In this embodiment, unlike the first to third embodiments, the color filter is formed on the substrate 501 provided with the reflective layer 511, unlike the configuration in which the color filter is formed on the substrate provided with the reflective layer. Instead of being formed, a color filter 522 is formed on the substrate 502 facing the substrate 501.

  A reflective layer 511 having an opening 511 a as a transmissive portion that can substantially transmit light is formed on the substrate 501, and a transparent insulating film 512 is formed on the reflective layer 511. The transparent electrode 513 is formed on the insulating film 512.

  On the other hand, colored layers 522r, 522g, and 522b are formed on the substrate 502, and a portion of each colored layer that overlaps the opening 511a of the reflective layer 511 in a plan view has a higher color density than other portions. This is a portion 522c. On the colored layer, an overlapping light shielding portion 522BM and a protective film 522p are provided, and a color filter 522 is configured.

  In the present embodiment, the light passing through the reflection path R passes through the light-colored portion of the colored layer twice, and the light passing through the transmission path T passes through the dark-colored portion 522c. Similar effects can be obtained.

  The color filter substrate of this embodiment is a substrate 502, and unlike the previous embodiment, a reflective layer is not formed on the substrate 502. That is, the color filter substrate of this embodiment is formed as a substrate facing the substrate 501 on which the reflective layer is formed, and even in a color filter substrate that does not include the reflective layer as described above, for each pixel. By providing a dark color portion in a part of the provided colored layer, it is possible to improve the color characteristics of the reflective transflective liquid crystal display panel.

  In the present embodiment, the color filter 522 having the same structure as that of the first embodiment is formed on the substrate 502 facing the substrate 501 on which the reflective layer 511 is formed. The structure may be a structure in which a dark color portion is superimposed on a light color portion as in the second embodiment, and a structure in which a light color portion is overlapped on a dark color portion as in the third embodiment. In particular, a structure in which a concave portion is provided on the substrate 502 and a dark color portion is formed in the concave portion may be used.

[Fifth Embodiment]
Next, a color filter substrate and an electro-optical device according to a fifth embodiment of the invention will be described with reference to FIG. FIG. 5 is a schematic cross-sectional view schematically showing the structure of the liquid crystal display panel 600 of the present embodiment.

  The liquid crystal display panel 600 includes substrates 601 and 602, a sealing material 603, a liquid crystal 604, transparent electrodes 613 and 621, retardation plates 605 and 607, and polarizing plates 606 and 608 configured in the same manner as in the first embodiment. Therefore, these explanations are omitted.

  Similarly to the first embodiment, a reflective layer 611 having an opening 611 a as a transmissive portion that can substantially transmit light is formed on the surface of the substrate 601, and the color filter 612 is formed on the reflective layer 611. Is formed. In the present embodiment, the color filter 612 includes colored layers 612r, 612g, and 612b having a uniform color density, an overlapping light shielding portion 612BM, and a protective layer 612p.

  On the other hand, on the substrate 602, dark color layers 622r, 622g, and 622b are formed only on the position overlapping the opening 611a of the reflective layer 611 in a plane, and transparent on the dark color layers 622r, 622g, and 622b. An electrode 621 is formed. The dark color layers 622r, 622g, and 622b have a color density higher than that of the colored layers 612r, 612g, and 612b.

  In this embodiment, the light passing through the reflection path R passes through the transmission path T although it passes through the colored layer on the substrate 601 twice without passing through the dark color layer formed in the limited range. After passing through the colored layer, the light further passes through the dark color layer. Therefore, compared with the liquid crystal display panel having the conventional structure shown in FIG. 18, the saturation of the transmissive display can be increased, and the difference in color between the reflective display and the transmissive display can be reduced.

  In this embodiment, the colored layer on the substrate 601 is formed over the entire pixel, and the dark color layer on the substrate 602 is configured to have a limited range that overlaps the opening 611a of the reflective layer 611 in a planar manner. Unlike this, the colored layer on the substrate 601 may be formed so as to avoid the portion of the opening 611 a of the reflective layer 611. In this embodiment, the light colored layer is formed on the substrate 601 on which the reflective layer 611 is formed. On the contrary, the dark color layer is formed on one substrate on which the reflective layer is formed. And a light colored layer may be formed on the other substrate.

[Sixth Embodiment]
Next, a liquid crystal display panel 700 according to a sixth embodiment of the present invention will be described with reference to FIG. In this embodiment, the substrate 701 and the substrate 702, the sealing material 703, the liquid crystal 704, the phase difference plates 705 and 707, the polarizing plates 706 and 708, and the openings are the same as those of the liquid crystal display panel 100 having the conventional structure shown in FIG. A reflective layer 711 provided with 711a and a color filter 712 having colored layers 712r, 712g, and 712b are provided.

In this embodiment, a reflective layer 711 having an opening 711 a as a transmissive portion that can substantially transmit light is formed for each pixel on the substrate 701, and the opening is formed on the reflective layer 711. The light transmitting layer 714 is partially formed so as to avoid 711a. The translucent layer 714 can be formed of an inorganic substance such as SiO ₂ or TiO _2, or a resin such as an acrylic resin or an epoxy resin, and may have any translucency in the visible light region. It is preferably transparent to visible light, for example, having an average transmittance of 70% or more and a small wavelength dispersion (for example, a change in transmittance of 10% or less) in the visible light region.

  In addition, a dark color portion 712 c is formed directly on the substrate 701 over the opening 711 a which is a region where the light transmitting layer 714 is not formed. Further, a light color portion having a light density lower than that of the dark color portion 712c is formed on the light transmitting layer 714, and a colored layer 712r, 712g, and 712b is formed by the dark color portion 712c and the light color portion. .

  In the present embodiment, since the light transmitting layer 714 is formed, a step is formed between the dark color portion 712c and the light color portion of the colored layer, and thereby the opening 711a of the reflective layer 711 in the pixel. The liquid crystal 704 is thick in a region that overlaps with the opening 711a, and the liquid crystal 704 is thin in a region other than the region that overlaps with the opening 711a. For this reason, as compared with the case where the thickness of the liquid crystal 704 is substantially equal between the region overlapping the opening of the reflective layer and the other region as in the first to fifth embodiments. The transmissive display can be made brighter. Here, it is preferable that the liquid crystal thickness in a region overlapping the opening of the reflective layer in a plane is approximately twice the liquid crystal thickness in other regions.

  FIG. 16 is an explanatory diagram for explaining the effect when the thickness of the liquid crystal is changed as described above. By forming the translucent layer T on the reflective layer R as described above, forming the light color portion C1 thereon, and forming the dark color portion C2 directly on the opening Ra of the reflective layer R, It is assumed that the liquid crystal thickness D2 in the region overlapping the opening Ra in plan view is twice the liquid crystal thickness D1 in other regions. Here, for convenience of explanation, it is assumed that a homogeneous liquid crystal cell is configured. The retardation of the liquid crystal cell is assumed to be Δn · D1 = λ / 4, and Δn · D2 = λ / 2 (Δn is the optical anisotropy of the liquid crystal, and λ is the wavelength of light).

  In the above situation, when the liquid crystal cell is in a light transmission state, in the transmissive display, as shown in FIG. 16A, the illumination light from the backlight or the like passes through the polarizing plate P2 and becomes linearly polarized light. By passing through the phase difference plate (quarter wave plate) D2, for example, it becomes a clockwise circularly polarized light and then passes through the liquid crystal layer of the cell thickness D2, so that the phase difference further advances by a half wavelength and a counterclockwise circle. It becomes polarized light, passes through the retardation plate D1, becomes the original linearly polarized light, and passes through the polarizing plate P1.

  When the liquid crystal cell is in a light transmission state as described above, in the reflective display, as shown in FIG. 16B, external light passes through the polarizing plate P1 to become linearly polarized light, and the retardation plate (1/1 By passing through the 4-wavelength plate D1, for example, it becomes clockwise circularly polarized light, and since it passes through the liquid crystal layer of the cell thickness D1 twice, the phase difference further advances by 1/2 wavelength to become counterclockwise circularly polarized light, By passing through the retardation plate D1 again, it returns to the original linearly polarized light and passes through the polarizing plate P1.

  In the transmissive display, as shown in FIG. 16C, if the thickness of the liquid crystal passing through is D1, the retardation is λ / 4, so that the illumination light is the polarizing plate P2 and the retardation plate D2. The polarization state after passing through the liquid crystal after passing through becomes a linearly polarized light in a direction orthogonal to the initial direction, then passes through the phase difference plate D1, becomes a counterclockwise circularly polarized light, and further passes through the polarizing plate P1. At this time, the polarization component that can pass through the polarizing plate P1 is approximately half the amount of light that can pass when the thickness of the liquid crystal is D2.

  As described above, in the case of the reflective transflective liquid crystal display panel as in the present embodiment, the thickness of the liquid crystal in the region overlapping the opening of the reflective layer in a planar manner is the thickness of the liquid crystal in the other region. If the thickness is greater than the thickness, the light transmission amount in the light transmission state is increased. In particular, when the thickness of the liquid crystal in the region overlapping the opening in a plane is twice the thickness of the liquid crystal in the other region, the light transmission amount is also almost doubled. Become. If the liquid crystal cell is not a homogeneous type and the twist is present in the liquid crystal layer, the transmittance may not be improved. For example, in the case of a 40 degree twisted liquid crystal, the thickness of the liquid crystal in the region overlapping the opening is doubled. In this case, the transmittance can be improved by about 40%.

[Seventh Embodiment]
Next, a liquid crystal display panel 800 according to a seventh embodiment of the present invention will be described with reference to FIG. In this embodiment, the substrate 801 and the substrate 802, the sealing material 803, the liquid crystal 804, the phase difference plates 805 and 807, the polarizing plates 806 and 808, and the opening, similar to the liquid crystal display panel 100 having the conventional structure shown in FIG. The color filter 812 which has the reflection layer 811 provided with 811a and the colored layers 812r, 812g, and 812b is provided.

  In this embodiment, the base layer 814 is partially formed on the substrate 801, and the reflective layer 811 is formed on the base layer 814. Here, the reflective layer 811 is provided with an opening 811a as a transmissive portion that can substantially transmit light for each pixel, and the opening 811a is provided corresponding to a region where the base layer 814 is not formed. . A dark portion 812 c is formed on the substrate 801 in a region where the base layer 814 is not formed. Further, a light color portion having a light density lower than that of the dark color portion 812c is formed on the reflective layer 811, and the light color portion and the dark color portion 812c constitute colored layers 812r, 812g, and 812b, respectively.

  In this embodiment, the underlayer 814 can be made of the same material as the light-transmitting layer of the sixth embodiment, but it is not necessarily required to have light-transmitting properties, and is formed of a light-shielding material. It doesn't matter.

  In the present embodiment, similarly to the sixth embodiment, the liquid crystal 804 is thick in a region overlapping the opening 811a of the reflective layer 811 in a planar manner, and the liquid crystal 804 is thin in other regions.

[Eighth Embodiment]
Next, a liquid crystal display panel 900 according to an eighth embodiment of the present invention will be described with reference to FIG. In this embodiment, the substrate 901 and the substrate 902, the sealing material 903, the liquid crystal 904, the phase difference plates 905 and 907, the polarizing plates 906 and 908, and the opening, similar to the liquid crystal display panel 100 having the conventional structure shown in FIG. A reflective layer 911 provided with 911a and a color filter 912 having colored layers 912r, 912g, and 912b are provided.

  In this embodiment, as in the sixth embodiment, a reflective layer 911 having an opening 911a as a transmissive portion that can substantially transmit light is formed on the substrate 901. The light-transmitting layer 914 is partially formed so as to avoid the opening 911a, the dark-colored portion 912c is formed on the substrate 901 in the formation region of the opening 911a, and the light-colored portion is formed on the light-transmitting layer 914. Thus, the colored layers 912r, 912g, and 912b are constituted by the dark color portion 912c and the light color portion, respectively.

  In the present embodiment, a black light-shielding layer 912BM is formed in the inter-pixel region on the light-transmitting layer 914 instead of the overlapped light-shielding layer in each of the above-described embodiments. For the black light shielding layer 612BM, a black resin material, for example, a material in which a black pigment is dispersed in a resin can be used. The colored layers 912r, 912g, and 912b are sequentially formed on the black light shielding layer 912BM, and a protective film 912p is formed thereon to form a color filter 912. Each colored layer is formed so that the periphery thereof overlaps with the black light shielding layer 912BM.

  In this embodiment, a step of forming the black light shielding layer 612BM is separately required, but the thickness of the color filter is reduced as compared with the case of using the overlapping light shielding layer, and the flatness of the color filter surface is improved. Can do.

[Ninth Embodiment]
Next, with reference to FIG. 10, the manufacturing method of a color filter substrate is demonstrated as 9th Embodiment concerning this invention. This method for manufacturing a color filter substrate relates to the manufacture of the color filter substrate used in the liquid crystal display panel 200 of the first embodiment.

  On the surface of the substrate 201, first, a metal such as aluminum, an aluminum alloy, a silver alloy, or chromium is formed into a thin film by a vapor deposition method, a sputtering method, or the like, and is patterned using a known photolithography method. Thus, as shown in FIG. 10A, the reflective layer 211 having the opening 211a is formed.

  Next, as shown in FIG. 10B, a colored photosensitive resin (photosensitive resist) in which a pigment or dye exhibiting a predetermined hue is dispersed is applied, and exposure and development are performed in a predetermined pattern. The light color portion of the colored layer 212r is formed by performing patterning. The light-colored portion has a pattern shape including a non-formation region (opening) in a portion on the opening 211a of the reflective layer 211. Thereafter, a photosensitive resin in which the concentration of a coloring material such as a pigment or a dye is made higher than that in the light color portion, and patterning is performed in the same manner as described above, whereby a dark color portion 212c is formed as shown in FIG. Is formed in the non-formation region of the light color portion. Then, by repeating the same process as above for the colored portions 212g and 212b of other hues, the colored layers of the respective colors each having the dark colored portion 212c are sequentially formed as shown in FIG. Go. Here, the colored layers are patterned so as to overlap each other in the inter-pixel region, and an overlapping light shielding layer 212BM in which a plurality of (three in the illustrated example) colored layers are overlapped is formed.

  In addition, as a procedure for forming the colored layer, the light color portion may be formed after forming the dark color portion 212c in the opposite manner. Alternatively, the light color portion may be formed sequentially for the colored layers of a plurality of hues, and then the dark color portion may be formed sequentially, and conversely, the dark color portions may be formed sequentially for the colored layers of the plurality of hues. The light color portions may be formed sequentially.

  In the colored layer forming step, a highly leveling material is used as the photosensitive resin, and this is applied by a method that facilitates flatness such as spin coating. As a result, the surface of each colored layer is formed almost flat in the pixel.

  The color filter substrate thus formed is formed to have a substantially flat surface by forming a protective layer 212p (not shown). Thereafter, the liquid crystal display panel 200 shown in FIG. 1 is formed using the substrate 201 which is the color filter substrate.

  When manufacturing the liquid crystal display panel 200 shown in FIG. 1, a transparent conductor is deposited on the color filter 212 formed on the substrate 201 as described above by sputtering, and is patterned by a known photolithography method. Thus, the transparent electrode 213 is formed. Thereafter, an alignment film made of polyimide resin or the like is formed on the transparent electrode 213, and a rubbing process or the like is performed.

  Next, the substrate 201 is bonded to the substrate 202 through the sealing material 203 to form a panel structure. At this time, the transparent electrode 221 and the alignment film similar to the above are already formed on the surface of the substrate 202. The substrate 201 and the substrate 202 are bonded to each other so as to have a substantially predetermined substrate interval by a spacer (not shown) distributed between the substrates, a spacer mixed in the sealing material 203, or the like.

  Thereafter, liquid crystal 204 is injected from an opening (not shown) of the sealing material 203, and the opening of the sealing material 203 is closed with a sealing material such as an ultraviolet curable resin. After the main panel structure is completed in this manner, the retardation plates 205 and 207 and the polarizing plates 206 and 208 are attached to the outer surfaces of the substrates 201 and 202 by a method such as sticking.

  In this embodiment, the method includes a step of forming a colored layer having a light color portion and a dark color portion having a light density higher than that of the light color portion on the substrate, and a step of forming a reflective layer having a transmission portion on the substrate. And in the process of forming the said colored layer, the said dark color part is formed on the said transmission part, and the said light color part is formed on the said reflection layer except the said transmission part. According to this, the saturation can be changed according to the light emission position by providing the light color portion and the dark color portion in the colored layer. In addition, by forming a dark color part in a predetermined area on the substrate and a light color part outside the predetermined area, a dark color part and a light color part are formed in different plane areas, thereby reducing the thickness of the color filter. Since the surface can be flattened, the characteristics of the electro-optical device can be improved.

[Tenth embodiment]
Next, with reference to FIG. 11, the manufacturing method of the color filter substrate which is 10th Embodiment based on this invention is demonstrated. This embodiment is a method of manufacturing a color filter substrate corresponding to the substrate 301 used in the liquid crystal display panel 300 of the second embodiment shown in FIG.

  In this embodiment, first, as shown in FIG. 11A, a reflective layer 311 having an opening 311 a is formed on a substrate 301.

  Next, as shown in FIG. 11B, a light color portion of the colored layer 312 r is formed on the reflective layer 311. The light color portion is formed so as to cover the opening 311a of the reflective layer 311.

  Thereafter, as shown in FIG. 11C, a dark color portion 312c is formed on the light color portion so as to be limited to a region immediately above the opening 311a of the reflective layer 311. A dark color is partially formed on the light color portion. A colored layer 312r in which the portions 312c are stacked is completed. Such a process is repeated for other hues in the same manner to form colored layers 312r, 312g, and 312b as shown in FIG. At this time, the overlapping light shielding portion 312BM is also formed in the same manner as described above.

  In the present embodiment, the colored layers are sequentially formed for each hue. However, after the light color portion is formed for a plurality of hues, the dark color portion may be sequentially formed for a plurality of hues.

  In addition, when forming the liquid crystal display panel 300 shown in FIG. 2 using the color filter substrate of this embodiment, it carries out similarly to the said 9th Embodiment.

  In this embodiment, the method includes a step of forming a colored layer having a light-colored portion and a dark-colored portion having a light density higher than that of the light-colored portion on the substrate, and the step of forming the colored layer reflects the dark-colored portion. The layer is formed only in a region overlapping with the transmissive portion of the layer, and the light color portion is formed on the substrate including the region. According to this, since the dark color portion and the light color portion overlap each other in the region overlapping with the transmission portion, it is not necessary to form the light color portion in accordance with the dark color portion, and it is possible to manufacture easily. In this case, either the light color portion or the dark color portion may be formed on the upper side, and even if the light color portion and the dark color portion are stacked on each other, they overlap each other in plan but are separated from each other. You may comprise so that it may be in a state.

[Eleventh embodiment]
Next, with reference to FIG. 12, the manufacturing method of the color filter substrate which is 11th Embodiment based on this invention is demonstrated. This embodiment is a method of manufacturing a color filter substrate corresponding to the substrate 401 used in the liquid crystal display panel 400 of the third embodiment shown in FIG.

  In this embodiment, first, as shown in FIG. 12A, a recess 401 a is formed in the substrate 401. The recess 401a can be formed by forming a mask made of a resist or the like (not shown) on the surface of the substrate 401 and selectively etching the substrate 401 by wet etching using a hydrofluoric acid-based etching solution.

  Next, the reflective layer 411 is formed on the surface of the substrate 401 in the same manner as in the ninth and tenth embodiments. The reflective layer 411 is provided with an opening 411a in the formation region of the recess 401a by photolithography or the like.

  Thereafter, as shown in FIG. 12B, a dark color portion 312c of the colored layer 312r is formed in the recess 401a. Then, as shown in FIG. 12C, a light color portion is further formed on the dark color portion 412c to form a colored layer 412r. Here, the light color portion is formed not only to cover the dark color portion 412c but also to cover the entire pixel. Thereafter, other hues are formed in the same manner as described above to form the colored layers 412g and 412b.

  In this embodiment, after forming the dark color portion, the light color portion of the same hue is formed to form the colored layer, and this procedure is repeated for each hue, but the dark color portion is formed for a plurality of hues. After that, the light color portion may be sequentially formed for a plurality of hues.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 9th Embodiment.

  In the present embodiment, the method includes a step of forming a recess on the surface of the substrate, and the transmission portion of the reflective layer is configured to overlap the recess. Therefore, the recess is formed after the recess is formed on the surface of the substrate. By forming the dark color portion, it is possible to form the dark color portion thickly.

[Twelfth embodiment]
Next, with reference to FIG. 13, the manufacturing method of the color filter substrate which is 12th Embodiment based on this invention is demonstrated. This embodiment is a method of manufacturing a color filter substrate corresponding to the substrate 701 used in the liquid crystal display panel 700 of the sixth embodiment shown in FIG.

  In this embodiment, first, a reflective layer 711 is formed on a substrate 701 as shown in FIG. In the reflective layer 711, an opening 711a is formed for each pixel. Next, as illustrated in FIG. 13B, a light transmitting layer 714 is formed on the reflective layer 711. The light-transmitting layer 714 is provided with a non-formation region (opening) on the opening 711a.

The translucent layer 714 is formed in a portion excluding the region directly above the opening 711a of the reflective layer 711. The light-transmitting layer 714 is formed by selectively forming a portion directly above the opening 711a by a photolithography method or the like after an inorganic layer or an organic layer is formed over the entire surface of the substrate 701 and the reflective layer 711, for example. It can be formed by removing. As a material for the light-transmitting layer 714, a transparent inorganic material such as SiO ₂ or TiO ₂ or an organic resin such as a transparent acrylic resin or epoxy resin can be used.

  Next, as shown in FIG. 13C, a dark color portion 712c is formed on the substrate 701 in the region of the opening 711a of the reflective layer 711, and a light color portion is formed on the light transmitting layer 714. A colored layer 712r composed of a dark color portion 712c and a light color portion is formed. Thereafter, the same steps are performed for the other hues to form colored layers 712g and 712b as shown in FIG. 13 (d).

  In the present embodiment, either the dark color portion 712c or the light color portion may be formed first. In the present embodiment, the dark color portion and the light color portion are formed in tandem for each colored layer, but the dark color portion is formed in tandem with respect to a plurality of hues, and the light color portion is formed in a plurality of hues. It may be formed before and after.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 9th Embodiment.

  In this embodiment, a step of forming a colored layer having a light-colored portion and a dark-colored portion having a light density higher than the light-colored portion on the substrate, a step of forming a reflective layer having a transmissive portion on the substrate, and on the reflective layer Forming a light-transmitting layer that can substantially transmit light. In the step of forming the light-transmitting layer, the step of forming the light-transmitting layer on the reflective layer excluding the transmitting portion and forming the colored layer The dark color part is formed on the transmission part and the light color part is formed on the light transmission layer. According to this, it is possible to provide a surface step between the light color portion and the dark color portion in the colored layer depending on the presence or absence of the light transmitting layer formed on the reflective layer. Further, it becomes possible to form the thick color portion thicker than the light color portion, and the saturation of transmitted light can be further improved.

[Thirteenth embodiment]
Next, with reference to FIG. 14, the manufacturing method of the color filter substrate which is 13th Embodiment based on this invention is demonstrated. This embodiment is a method of manufacturing a color filter substrate corresponding to the substrate 801 used in the liquid crystal display panel 800 of the seventh embodiment shown in FIG.

  In this embodiment, first, a base layer 814 is partially formed on a substrate 701 as shown in FIG. The base layer 814 includes a predetermined non-formation region (opening) for each pixel. Next, the reflective layer 811 is formed over the base layer 814. In the reflective layer 811, an opening 811 a is formed for each pixel. The opening 811a is configured to planarly match the non-formation region of the base layer 814.

  The underlayer 814 can be formed by using the same material as the light transmissive layer of the twelfth embodiment in the same manner, and can be formed by using any material other than the light transmissive material.

  Next, as shown in FIG. 14C, a dark color portion 812c is formed on the substrate 801 in the region of the opening 811a of the reflective layer 811, and a light color portion is formed on the reflective layer 811. A colored layer 812r composed of a dark color portion 812c and a light color portion is formed. Thereafter, the same steps are performed for the other hues to form the colored layers 812g and 812b as shown in FIG. 14 (d).

  In the present embodiment, either the dark color portion 812c or the light color portion may be formed first. In the present embodiment, the dark color portion and the light color portion are formed in tandem for each colored layer, but the dark color portion is formed in tandem with respect to a plurality of hues, and the light color portion is formed in a plurality of hues. It may be formed before and after.

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 9th Embodiment.

  In the present embodiment, a step of forming a colored layer having a light-colored portion and a dark-colored portion having a higher light density than the light-colored portion on the substrate, a step of partially forming a base layer on the substrate, and a transmitting portion on the substrate. Forming a reflective layer, and forming the reflective layer in a non-formation region of the base layer, and forming a colored layer in the step of forming the colored layer in the step of forming the reflective layer. A light color portion is formed on the reflection layer formed in the region and excluding the transmission portion of the reflection layer. Thereby, a surface level | step difference can be provided between the light color part and dark color part in a colored layer with the presence or absence of a base layer. In addition, the dark color portion can be formed thicker than the light color portion, and the saturation of transmitted light passing through the transmission portion can be improved.

[Fourteenth embodiment]
Next, with reference to FIG. 15, the manufacturing method of the color filter substrate of 14th Embodiment based on this invention is demonstrated. This embodiment is a method of manufacturing a color filter substrate corresponding to the substrate 901 used in the liquid crystal display panel 900 of the eighth embodiment shown in FIG.

  In this embodiment, first, as shown in FIG. 15A, a reflective layer 911 having an opening 911a is formed on the surface of a substrate 901, and then a light-transmitting layer 914 is formed on the reflective layer 911. Form. In the light transmitting layer 914, an opening 914 a is provided on the opening 911 a of the reflective layer 911.

  Next, as shown in FIG. 15B, a black light shielding layer 912BM is formed on the substrate 901 and the light transmitting layer 914. More specifically, as shown in FIG. 15A, a black photosensitive resin 912t is applied, exposed in a predetermined pattern, and patterned by a development process.

  Next, as shown in FIG. 15C, a colored layer 912r is formed by photolithography. More specifically, a dark color portion 912c is formed on the substrate 901 in the opening 911a of the reflective layer 911, and a light color portion having a lower color density than the dark color portion 912c is formed in a pixel area other than the opening 911a. The colored layer 912r is formed by the dark color portion 912c and the light color portion.

  Further, as shown in FIG. 15D, colored layers 912g and 912b exhibiting other hues are formed in the same manner. In this embodiment, either the dark color portion 912c or the light color portion may be formed first. In the present embodiment, the dark color portion and the light color portion are formed in tandem for each colored layer, but the dark color portion is formed in tandem with respect to a plurality of hues, and the light color portion is formed in a plurality of hues. It may be formed before and after.

  In this embodiment, a light transmissive layer 914 is formed on the reflective layer 911, and a black light shielding layer 912BM is formed on the light transmissive layer 914. By the way, conventionally, when the black light shielding layer 912BM is directly formed on the reflective layer made of metal, the black resin residue adheres to the area where the black resin is removed during patterning of the black resin, and this residue is the brightness of the color filter. The problem of lowering is known. However, in the present embodiment, since the black light shielding layer 912BM is formed on the light transmitting layer 914 that covers the reflective layer 911, a black resin residue hardly occurs, and a high-quality bright color filter 912 can be formed. .

  In addition, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it carries out similarly to the said 9th Embodiment.

  In this embodiment, since the black light-shielding layer is formed instead of the overlapped light-shielding layer of each embodiment described above, the thickness of the color filter can be reduced and the flatness of the surface of the color filter can be improved. It is configured to be able to. This black light shielding layer can be used in place of the overlapping light shielding layer in the first to thirteenth embodiments.

  In the present embodiment, a step of forming a colored layer having a light-colored portion and a dark-colored portion having a light density higher than the light-colored portion on the substrate, a step of forming a reflective layer having a transmissive portion on the substrate, and substantially on the reflective layer Forming a translucent layer through which light can be transmitted, and in the step of forming the translucent layer, in the step of forming a translucent layer on the reflective layer excluding the transmissive portion and forming a colored layer The dark color part is formed on the transmission part and the light color part is formed on the light transmission layer. Thereby, it becomes possible to provide a surface step between the light color portion and the dark color portion in the colored layer depending on the presence or absence of the light transmitting layer formed on the reflective layer. Further, it becomes possible to form the thick color portion thicker than the light color portion, and the saturation of transmitted light can be further improved.

[Other configuration examples]
Next, another configuration example that can be used in each of the embodiments described above will be described with reference to FIG.

  In the configuration example shown in FIG. 17A, the concave portion 1001a is formed on the surface of the substrate 1001, and the fine irregularities 1001b are formed on the surface other than the concave portion 1001a. A reflective layer 1011 is formed on the surface. The reflective layer 1011 is provided with an opening 1011a in a region on the concave portion 1001a. On these structures, the color filter 1012 having the colored layer shown in the above embodiments is formed.

  In the present configuration example, the reflective layer 1011 is formed on the unevenness 1001b, so that it is formed into a fine unevenness as a whole. For this reason, the reflected light reflected by the reflective layer 1011 is moderately scattered. Therefore, when a liquid crystal display panel is configured, in the reflective display, it is obscured by illumination light or sunlight, or the background of the display surface is It is possible to prevent reflection.

  Here, the unevenness 1001b can be formed to have a surface roughness suitable for light scattering by pre-selecting the composition of an etching solution such as hydrofluoric acid and etching using the etching solution. It can also be formed by forming a mask using a photolithography method and performing etching through the mask.

  This configuration example can be applied as it is to the above embodiments in which a recess is formed on the substrate surface and a reflective layer is directly formed on the substrate surface. Even in an embodiment in which no recess is formed, it is possible to apply only the structure of the unevenness 1001b and the reflective layer 1011 thereon.

  In the configuration example shown in FIG. 17B, a reflective layer 1111 having an opening 1111a is formed on a substrate 1101, and a light-transmitting layer 1114 is formed on the reflective layer 1111. The opening 1114a of the light transmitting layer 1114 is formed on the opening 1111a corresponding to the opening 1111a of the reflective layer 1111. A color filter 1112 is formed on the light transmitting layer 1114.

  In this configuration example, minute particles (for example, silica particles) having a light refractive index different from that of the material of the light transmissive layer 1114 are dispersedly arranged inside the light transmissive layer 1114. For this reason, since both the light which goes to the reflective layer 1111 and the light reflected by the reflective layer 1111 are scattered by the translucent layer 1114, it is possible to reduce the illusion and reflection in the reflective display as in the above configuration example. Can do. In addition, this structural example is applicable to all embodiment provided with the translucent layer on the reflective layer among each said embodiment.

  In the configuration example shown in FIG. 17C, a reflective layer 1211 having an opening 1211a is formed on a substrate 1201, and a light-transmitting layer 1214 is formed on the reflective layer 1211. The opening 1214a of the light transmitting layer 1214 is formed on the reflection layer 1211 corresponding to the opening 1211a. A color filter 1212 is formed on the light transmitting layer 1214.

  In this configuration example, fine unevenness 1214b is formed on the surface of the light transmitting layer 1214, and both the light traveling toward the reflective layer 1211 and the light reflected by the reflective layer 1211 are scattered by the unevenness 1214b. Yes. Therefore, also in this configuration example, it is possible to reduce the illusion and reflection in the reflective display. The unevenness 1214b is softened by heating after forming a periodic structure by patterning a material arranged on a substrate at a predetermined period, in addition to the etching method described in the above-described explanation of the configuration example shown in FIG. There is a method of creating an uneven shape by imparting appropriate fluidity. In addition, this structural example is applicable to all embodiment provided with the translucent layer on the reflective layer among each said embodiment.

  In the configuration example shown in FIG. 17D, a base layer 1314 having an opening 1314a is formed on a substrate 1301, fine irregularities 1314b are formed on the surface of the base layer 1314, and reflection is performed thereon. A layer 1311 is formed. The reflective layer 1311 is provided with an opening 1311a immediately above the base layer 1314a. Here, the unevenness 1314b of the base layer 1314 can be formed by a method similar to the unevenness forming method for the light-transmitting layer shown in FIG. A color filter 1312 is formed on the reflective layer 1311.

  In this configuration example, the reflective layer 1311 is formed on the unevenness 1314b of the base layer 1314, so that the reflective surface is formed in a fine unevenness, thereby reducing dazzling and reflection as described above. This configuration example can be applied to all embodiments in which the reflective layer is formed on the base layer.

[Example 1]
Next, with reference to FIG. 19, a more detailed example 1 that can be applied to each of the above-described embodiments will be described. FIG. 19 is an enlarged partial sectional view schematically showing a part of the sectional structure of the color filter substrate, and a schematic plan view of the color filter in a region corresponding thereto. Here, the enlarged partial cross-sectional view shows a cross section along the line PQ of the schematic plan view.

  In the first embodiment, a light transmitting layer 1414 is formed on the substrate 1401. The translucent layer 1414 is made of a material that can transmit light, for example, a transparent material. In particular, it is preferably composed of an organic insulating material. On the surface 1414a of the translucent layer 1414, a concavo-convex pattern composed of regular or irregular repetitive patterns of peaks and valleys is formed. This concavo-convex pattern can be formed by the method described with reference to FIGS. The thickness of the light transmissive layer 1414 is, for example, about 2 μm.

  A reflective layer 1411 made of a silver alloy such as Al, an Al alloy, silver, or an APC alloy is formed on the light transmitting layer 1414. The reflective layer 1411 can be formed by a sputtering method, a vapor deposition method, or the like. The reflective layer 1411 is formed on the surface of the translucent layer 1414 so that the reflective surface thereof is configured to be uneven. The thickness of the reflective layer 1411 is about 0.2 μm, for example. The reflective layer 1411 is provided with an opening 1411a for each pixel region.

  A color filter 1412 made of a known photosensitive resin material or the like is formed on the light transmitting layer 1414 and the reflective layer 1411. The color filter 1412 is formed on the reflective layer 1411 with a dark color portion 1412rc (red dark color portion), 1412gc (green dark color portion), 1412bc (blue dark color portion) formed on the opening 1411a. A colored layer having a light color portion 1412r (red light color portion), 1412g (green light color portion), and 1412b (blue light color portion) is included.

  In addition, an overlapped light-shielding portion 1412BM is formed between the pixel regions by laminating the dark color portions 1412rc, 1412gc, and 1412bc on the light color portions 1412r, 1412g, and 1412b. In this overlapping light shielding portion 1412BM, for example, the light color portion 1412b is about 1.0 μm, the light color portion 1412g is about 0.5 μm, and the light color portion 1412r is about 0.5 μm in order from the lower layer.

On the colored layer configured as described above, a protective layer 1412p made of a translucent material made of an acrylic resin or other organic resin is formed. The protective layer 1412p is formed on the light color portions 1412r, 1412g, and 1412b, but is not formed on the dark color portions 1412rc, 1412gc, and 1412bc. The protective layer 1412p can be formed, for example, by forming an inorganic layer or an organic layer over the entire surface, and then selectively removing a portion immediately above the region above the opening 1411a by a photolithography method or the like. As a material of the protective layer 1412p, a transparent inorganic material such as SiO ₂ or TiO ₂ can be used in addition to a transparent organic resin such as an acrylic resin or an epoxy resin. The thickness of the protective layer 1412p is about 2.2 μm, for example.

  A transparent electrode 1413 made of a transparent conductor is formed on the protective layer 1412p. The transparent electrode 1413 is formed on the protective layer 1412p and reflects the presence or absence of the protective layer 1412p as it is, and has a main height difference Δh between the portion where the protective layer 1412p exists and the portion where the protective layer 1412p does not exist. This height difference Δh is, for example, about 2.0 μm. Further, a gap between adjacent transparent electrodes 1413 is disposed on the overlapped light shielding portion 1412BM. The illustrated gap between adjacent transparent electrodes 1413 is about 8 to 10 μm.

  In the present embodiment, since the overlapping light shielding portion 1412BM is configured by stacking the dark color portions 1412rc, 1412gc, and 1412bc, the transmittance of this stacked structure can be reduced as compared with the case where the light color portions are stacked. It is possible to perform light shielding between regions more completely. In addition, since the overlapping light shielding portion 1412BM is directly stacked on any of the light color portions 1412r, 1412g, and 1412b formed in the pixel region, the light transmittance of the region where the overlapping light shielding portion 1412BM is disposed is further reduced. In addition, the height difference Δh can be easily provided. Note that the overlapped light-shielding portion 1412BM has a structure in which three layers are stacked on a light-colored portion, but may have a structure in which only two layers or only one layer is stacked.

  In Example 1, when configured with the thickness dimensions shown in the above examples, the total thickness of the color filter substrate is 5.2 to 5.3 μm, and the thickness of the liquid crystal layer in the reflective region is 3. When the thickness is 25 μm, a TN liquid crystal panel or an STN liquid crystal panel can be configured. In this case, the thickness of the liquid crystal layer in the transmissive region is 5.25 μm. In this case, as shown in FIG. 16, the liquid crystal layer is not a homogeneous liquid crystal layer, and the thickness of the liquid crystal layer in the transmissive region is not twice the thickness of the liquid crystal layer in the reflective region. Since the thickness of the liquid crystal layer is increased by about 60% with respect to the thickness of the liquid crystal layer in the reflective region, both the transmittance in the reflective display and the transmissive display can be improved by optimizing the retardation value of the liquid crystal layer. Therefore, a bright display can be obtained.

[Example 2]
Next, Example 2 that can be applied to the above embodiment will be described with reference to FIG. FIG. 20 is an enlarged partial sectional view schematically showing a part of the sectional structure of the color filter substrate and a schematic plan view of the color filter in a region corresponding thereto. Here, the enlarged partial cross-sectional view shows a cross section along the line PQ of the schematic plan view.

In the second embodiment, a concavo-convex pattern formed by etching or the like on the surface 1501a of the substrate 1501 is formed in which crests and troughs are repeated regularly or irregularly. A reflective layer 1511 made of a silver alloy such as Al, Al alloy, silver, or APC alloy is directly formed on the surface 1501a of the substrate 1501. This reflective layer 1511 can be formed by sputtering, vapor deposition, or the like.
The reflective layer 1511 is configured to have a concavo-convex reflective surface reflecting the concavo-convex pattern of the surface 1501a. The thickness of the reflective layer 1511 is about 0.2 μm, for example.
The reflective layer 1511 is provided with an opening 1511a for each pixel region.

  A color filter 1512 made of a known photosensitive resin material or the like is formed on the reflective layer 1511. The color filter 1512 is formed on the reflective layer 1511 with a dark color portion 1512rc (red dark color portion), 1512 gc (green dark color portion), 1512bc (blue dark color portion) formed on the opening 1511a. A colored layer having a light color portion 1512r (red light color portion), 1512g (green light color portion), and 1512b (blue light color portion) is included.

On the color filter 1512 configured as described above, a protective layer 1512p made of a translucent material made of an acrylic resin or other organic resin is formed. The protective layer 1512p is formed on the light color portions 1512r, 1512g, and 1512b, but is not formed on the dark color portions 1512rc, 1512gc, and 1512bc. The protective layer 1512p can be formed, for example, by forming an inorganic layer or an organic layer over the entire surface, and then selectively removing a portion immediately above the opening 1511a by a photolithography method or the like. As a material of the protective layer 1512p, a transparent inorganic material such as SiO ₂ or TiO ₂ can be used in addition to a transparent organic resin such as an acrylic resin or an epoxy resin. The thickness of the protective layer 1512p is about 2.2 μm, for example.

  A transparent electrode 1513 made of a transparent conductor is formed on the protective layer 1512p. The transparent electrode 1513 is formed on the protective layer 1512p to reflect the presence or absence of the protective layer 1512p as it is, and has a main height difference Δh between the portion where the protective layer 1512p exists and the portion where the protective layer 1512p does not exist. The height difference Δh is, for example, about 2.0 μm.

  In the second embodiment, the overlapping light shielding portion formed in the first embodiment is not formed. Instead, the gap G between adjacent transparent electrodes 1513 is narrowed to a width of about 4 to 6 μm. In this embodiment, in the gap G between the adjacent transparent electrodes 1513, a horizontal electric field is generated due to a potential difference between the adjacent transparent electrodes 1513 in the driving state of the display body. The light shielding effect in the gap G is obtained by utilizing the orientation of the liquid crystal molecules.

  Also in the second embodiment, when configured with the thickness dimensions shown in the above examples, the TN liquid crystal panel or the STN liquid crystal panel can be configured with the thickness of the liquid crystal layer in the reflective region set to 3.25 μm. become. In this case, the thickness of the liquid crystal layer in the transmissive region is 5.25 μm. In this case, as shown in FIG. 16, the liquid crystal layer is not a homogeneous liquid crystal layer, and the thickness of the liquid crystal layer in the transmissive region is not twice the thickness of the liquid crystal layer in the reflective region. Since the thickness of the liquid crystal layer is increased by about 60% with respect to the thickness of the liquid crystal layer in the reflective region, both the transmittance in the reflective display and the transmissive display can be improved by optimizing the retardation value of the liquid crystal layer. Therefore, a bright display can be obtained.

[Example 3]
Next, with reference to FIG. 21, a more detailed example 3 that can be applied to each of the above-described embodiments will be described. FIG. 21 is an enlarged partial sectional view schematically showing a part of the sectional structure of the color filter substrate and a schematic plan view of the color filter in a region corresponding thereto. Here, the enlarged partial cross-sectional view shows a cross section along the line PQ of the schematic plan view.

  In the third embodiment, a reflective layer 1611 made of a silver alloy such as Al, Al alloy, silver, or APC alloy is formed on the substrate 1601. This reflective layer 1611 can be formed by sputtering, vapor deposition, or the like. The reflective layer 1611 is formed flat on the flat surface of the substrate 1601. The thickness of the reflective layer 1611 is about 0.2 μm, for example. The reflective layer 1611 is provided with an opening 1611a for each pixel region.

  On the reflective layer 1611, a color filter 1612 made of a known photosensitive resin material or the like is formed. The color filter 1612 is formed on the reflective layer 1611 with a dark color portion 1612rc (red dark color portion), 1612 gc (green dark color portion), 1612bc (blue dark color portion) formed on the opening 1611a. A colored layer having a light color portion 1612r (red light color portion), 1612g (green light color portion), and 1612b (blue light color portion) is included.

  In addition, an overlapped light-shielding portion 1612BM is formed between the pixel regions by laminating the dark color portions 1612rc, 1612gc, and 1612bc on the light color portions 1612r, 1612g, and 1612b. In this overlapping light shielding portion 1612BM, for example, the light color portion 1612b is about 1.0 μm, the light color portion 1612g is about 0.5 μm, and the light color portion 1612r is about 0.5 μm in order from the lower layer.

On the color filter 1612 configured as described above, a protective layer 1612p made of a translucent material made of acrylic resin or other organic resin is formed. The protective layer 1612p has a substantially flat surface including the portion where the overlapped light shielding portion 1612BM is formed. As a material for the protective layer 1612p, a transparent inorganic material such as SiO ₂ or TiO ₂ can be used in addition to a transparent organic resin such as an acrylic resin or an epoxy resin. The thickness of the protective layer 1612p is about 2.2 μm, for example.

  A transparent electrode 1613 made of a transparent conductor is formed on the protective layer 1612p.

  In the present embodiment, since the overlapping light shielding portion 1612BM is configured by stacking the dark color portions 1612rc, 1612gc, and 1612bc, light shielding between the pixel regions can be more completely performed. In addition, since the overlapping light shielding portion 1612BM is directly stacked on any of the light color portions 1612r, 1612g, and 1612b formed in the pixel region, the light transmittance of the overlapping light shielding portion 1612BM can be further reduced. Note that the overlapped light shielding portion 1612BM has a structure in which three layers are stacked on a light color portion, but may have a structure in which only two layers or only one layer is stacked.

  In Example 3, a scattering layer 1619 is disposed on the observation side of the color filter 1612. The scattering layer 1619 reduces background reflection in the specific viewing angle direction, illusion, lack of lightness, and the like caused by regular reflection of external light by the reflection layer 1611. The scattering layer 1619 preferably has forward scattering characteristics. For example, the thing which disperse | distributed the fine particle comprised with another transparent raw material in which a refractive index differs a little in this transparent base material etc. is mentioned.

  For the scattering layer 1619, an adhesive layer having an adhesive function can be used. For example, a transparent adhesive is used as a base material, and transparent fine particles having a slightly different refractive index from the base material are dispersed. In this case, as shown in the drawing, the substrate 1602 on the observation side (indicated by a two-dot chain line in the drawing) and a retardation plate 1605 or polarizing plate 1606 disposed on the observation side are used as an adhesive layer. Can do. Note that the structure on the surface of the substrate 1602 and the liquid crystal layer are omitted in the drawing.

[Example of color filter configuration]
Finally, with reference to FIGS. 22 and 23, configuration examples of the color filters 1412, 1512, and 1612 according to the first to third embodiments according to the present invention will be described. In addition, this structural example is applicable similarly to the color filter of said each embodiment other than the said Examples 1-3. FIG. 22 is a spectral characteristic diagram (a) showing the spectral characteristics of the transmitted light in the dark part of the color filter, an xy chromaticity diagram (b) of the CIE (1931) color system of the transmitted light, and the transmitted light. FIG. 23 is an a ^* b ^* chromaticity diagram (c) of the CIE (1976) color system, and FIG. 23 is a spectral characteristic diagram (a) showing the spectral characteristics of the transmitted light of the light color portion of the color filter. It is an xy chromaticity diagram (b) of the CIE (1931) color system and an a ^* b ^* chromaticity diagram (c) of the CIE (1976) color system of the transmitted light. Here, each of the above figures shows the result of obtaining the spectral transmittance and chromaticity coordinates of transmitted light obtained by transmitting light through each dark color portion or each light color portion once using the same C light source.

  As shown in FIG. 22, the main transmission region of the dark red color portion (R) is 600 to 700 nm, and the average transmittance of this region is about 90%, and the transmittance is particularly maximum in the region of 640 to 700 nm. (About 95%). The main transmission region of the dark green part (G) is 495 to 570 nm, and the average transmittance of this region is about 85%, and the maximum transmittance (about 90%) particularly in the region of 510 to 550 nm. ing. The main transmission region of the blue dark color part (B) is 435 to 500 nm, and the average transmittance of this region is about 85%, and the transmittance is maximum (about 88%) especially in the region of 445 to 480 nm. ing.

The Y value of the CIE color system (1931) is about 24 to 26 in the red dark color part (R), 70 to 72 in the green dark color part (G), and about 29 to 31 in the blue dark color part (B). It is. L ^* values of the CIE color system (1976) are about 56 to 58 for the red dark color portion (R), 86 to 88 for the green dark color portion (G), and about 60 to 62 for the blue dark color portion (B). is there.

Further, the area of a triangle having apexes at three points corresponding to the hues of the red dark color portion (R), green dark color portion (G), and blue dark color portion (B) on the chromaticity diagram is about 0. 0. 05 (on the xy chromaticity diagram) and about 7000 (on the a ^* b ^* chromaticity diagram).

  On the other hand, as shown in FIG. 23, the main transmission region of the light red color portion (R) is 585 to 700 nm, and the average transmittance of this region is about 93%, and the transmittance is particularly in the region of 590 to 700 nm. Maximum (about 96%). The main transmission region of the light green color portion (G) is 480 to 600 nm, and the average transmittance of this region is about 92%, and the transmittance is maximum (about 94%) particularly in the region of 500 to 580 nm. Yes. The main transmission region of the light blue portion (B) is 430 to 510 nm, and the average transmittance of this region is about 89%, and the transmittance is maximum (about 92%) especially in the region of 440 to 500 nm. Yes.

The Y value of the CIE color system (1931) is 46 to 48 in the red light color portion (R), 89 to 91 in the green light color portion (G), and 44 to 46 in the blue light color portion (B). L ^* values of the CIE color system (1976) are about 73 to 75 for the red dark color portion (R), 95 to 97 for the green dark color portion (G), and about 72 to 74 for the blue dark color portion (B). is there.

Further, the area of a triangle having apexes at three points corresponding to the hues of the red light color part (R), green light color part (G), and blue light color part (B) on the chromaticity diagram is about 0.01 (xy). On the chromaticity diagram) and about 1700 (on the a ^* b ^* chromaticity diagram).

As described above, the relationship in optical characteristics between the dark color portion and the light color portion relating to the light density is that the light color portion is larger than the dark color portion in the Y value or L ^* value corresponding to the luminous transmittance or lightness. . Here, the value of the light color portion is preferably about 1.2 to 2.5 times the value of the dark color portion. As for the area of the triangle on the chromaticity diagram corresponding to the saturation, the area of the triangle on the chromaticity diagram of the dark color portion is larger than the area of the triangle on the chromaticity diagram of the light color portion. Here, the area of the triangle on the chromaticity diagram of the dark color portion is preferably about 3 to 8 times the area of the triangle on the chromaticity diagram of the light color portion.

  The light density can be defined not only by the above-mentioned index on optical characteristics but also by manufacturing conditions and structure. For example, when forming a colored layer of a color filter, there is a magnitude relationship of the amount of a coloring material such as a pigment or a dye mixed in a dispersed state in the colored layer. That is, in the dark color portion, the amount (weight or volume) of the coloring material per unit volume is larger than that in the light color portion.

[Electronics]
Finally, specific examples of an electronic apparatus including the electro-optical device (liquid crystal display panel) according to each of the above embodiments will be described. FIG. 24 is a schematic perspective view illustrating an appearance of a mobile phone 2000 as an example of an electronic device. The mobile phone 2000 is provided with an operation unit 2002 having an operation switch on the surface of the casing 2001, and also includes a sound detection unit 2003 including a detector such as a microphone and a sound generation unit 2004 including a sound generator such as a speaker. And are provided. A display unit 2005 is provided in a part of the casing 2001, and the display screen of the electro-optical device of each of the above-described embodiments disposed inside can be visually recognized through the display unit 2005. A display signal is sent to the electro-optical device from a control unit provided inside the casing 2001, and a display image corresponding to the display signal is displayed.

  FIG. 25 is a schematic perspective view showing an appearance of a wristwatch 3000 as an example of an electronic apparatus. This wrist watch 3000 has a watch body 3001 and a watch band 3002. The watch body 3001 is provided with external operation members 3003 and 3004. In addition, a display unit 3005 is provided on the front surface of the watch main body 3001, and the display screen of the electro-optical device of each of the above-described embodiments disposed inside can be viewed through the display unit 3005. A display signal is sent to the electro-optical device from a control unit (clock circuit) provided inside the watch body 3001, and a display image corresponding to the display signal is displayed.

  FIG. 26 is a schematic perspective view illustrating an appearance of a computer device 4000 as an example of an electronic apparatus. In the computer device 4000, an MPU (microprocessor unit) is configured inside a main body 4001, and an operation unit 4002 is provided on the outer surface of the main body 4001. Further, a display unit 4003 is provided, and the electro-optical device according to each of the above embodiments is accommodated in the display unit 4003. Then, the display screen of the electro-optical device can be viewed through the display unit 4003. The electro-optical device is configured to receive a display signal from an MPU provided in the main body 4001 and display a display image corresponding to the display signal.

  The color filter substrate and electro-optical device of the present invention, the method of manufacturing the color filter substrate, the method of manufacturing the electro-optical device, and the electronic apparatus are not limited to the illustrated examples described above. Of course, various changes can be made without departing from the scope of the invention.

  For example, in each of the embodiments described above, a passive matrix type liquid crystal display panel has been exemplified. However, as an electro-optical device of the present invention, an active matrix type liquid crystal display panel (for example, a TFT (thin film transistor), The present invention can be similarly applied to a liquid crystal display panel including a TFD (thin film diode) as a switching element. The present invention is similarly applied not only to a liquid crystal display panel but also to various electro-optical devices that can control the display state for each of a plurality of pixels, such as an electroluminescence device, an organic electroluminescence device, and a plasma display device. Is possible.

  Furthermore, the color filter substrate of the present invention is not limited to the electro-optical device, and can be used for various display devices, imaging devices, and other various optical devices.

It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 1st Embodiment which concerns on this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 2nd Embodiment which concerns on this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 3rd Embodiment concerning this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 4th Embodiment concerning this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 5th Embodiment concerning this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 6th Embodiment concerning this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 7th Embodiment concerning this invention. It is a schematic sectional drawing which shows typically the structure of the liquid crystal display panel of 8th Embodiment concerning this invention. It is a schematic plan view which shows typically the planar structure of the color filter substrate of 1st Embodiment. It is a schematic process figure (a)-(d) which shows typically the manufacturing method of the color filter substrate of a 9th embodiment concerning the present invention. It is a schematic process figure (a)-(d) which shows typically the manufacturing method of the color filter substrate of a 10th embodiment concerning the present invention. It is a schematic process figure (a)-(d) which shows typically the manufacturing method of the color filter substrate of an 11th embodiment concerning the present invention. It is a schematic process drawing (a)-(d) which shows typically the manufacturing method of the color filter substrate of a 12th embodiment concerning the present invention. It is a schematic process figure (a)-(d) which shows typically the manufacturing method of the color filter substrate of a 13th embodiment concerning the present invention. It is a schematic process figure (a)-(d) which shows typically the manufacturing method of the color filter substrate of a 14th embodiment concerning the present invention. It is explanatory drawing for demonstrating the optical function of the liquid crystal display panel which concerns on this invention. It is a general | schematic fragmentary sectional view (a)-(d) which shows typically the example of another structure applicable to each said embodiment. It is a schematic sectional drawing which shows typically the structure of the reflective transflective liquid crystal display panel of a conventional structure. FIG. 2 is an enlarged partial sectional view of a color filter substrate of Example 1 and a plan view of the color filter for showing a more specific structure. FIG. 6 is an enlarged partial sectional view of a color filter substrate of Example 2 and a plan view of the color filter for showing a more specific structure. FIG. 6 is an enlarged partial sectional view of a color filter substrate of Example 3 and a plan view of the color filter for showing a more specific structure. It is a figure which shows the spectral transmittance in the dark color part of the color filter formed in Examples 1-3, xy chromaticity diagram, and a ^* b ^* chromaticity diagram. It is a figure which shows the spectral transmittance in the light color part of the color filter formed in Examples 1-3, xy chromaticity diagram, and a ^* b ^* chromaticity diagram. 1 is a schematic perspective view illustrating an appearance of a mobile phone as an example of an electronic apparatus including an electro-optical device according to each embodiment. 1 is a schematic perspective view illustrating an appearance of a watch (watch) as an example of an electronic apparatus including an electro-optical device according to each embodiment. 1 is a schematic perspective view illustrating an appearance of a computer (information terminal) as an example of an electronic apparatus including an electro-optical device according to each embodiment.

Explanation of symbols

200 liquid crystal display panel, 201, 202 substrate, 203 sealing material, 204 liquid crystal, 205, 207 retardation plate, 206, 208 polarizing plate, 209 backlight, 211 reflective layer, 211a opening, 212 color filter, 212r, 212g, 212b Colored layer, 212BM Overlapping light blocking layer, 212c Dark color part, 213, 221 Transparent electrode, R reflection path, T transmission path

Claims (4)

An electro-optic material is sandwiched between the first and second substrates arranged opposite to each other, a reflective layer is formed on either the first or second substrate, and transmission is performed in one pixel. part the reflective portion and is separately provided, an electro-optical device including a colored layer and a dark color portion is a light density higher than light-colored portion and the color portion in said one pixel,
A concave portion corresponding to the transmissive portion is formed on the surface of either the first or second substrate, and the dark color portion of the colored layer is formed in the concave portion, corresponding to the reflective portion. An electro-optical device, wherein the light color portion of the colored layer is formed so as to cover a planar region and the dark color portion . The electro-optical device according to claim 1, wherein the light-colored portion is stacked on the dark-colored portion and is formed so as to cover the entire pixel . An electro-optic material is sandwiched between the first and second substrates arranged opposite to each other, a reflective layer is formed on either the first or second substrate, and transmission is performed in one pixel. part the reflective portion and is separately provided, a method of manufacturing an electro-optical device provided with a colored layer and a dark color portion is a light density higher than light-colored portion and the color portion in said one pixel,
Forming a recess in a planar region corresponding to a transmissive portion in the one pixel on the surface of either the first or second substrate;
Forming the dark portion of the colored layer in the concave portion;
Forming the light color portion of the colored layer so as to cover the planar region corresponding to the reflective portion and the dark color portion ;
A method for manufacturing an electro-optical device. The electro-optical device according to claim 3 , wherein in the step of forming the light color portion of the colored layer, the light color portion is stacked on the dark color portion and is formed so as to cover the entire pixel . Production method.

Images