JP2008530312A5 - - Google Patents

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Publication number
JP2008530312A5
JP2008530312A5 JP2007555373A JP2007555373A JP2008530312A5 JP 2008530312 A5 JP2008530312 A5 JP 2008530312A5 JP 2007555373 A JP2007555373 A JP 2007555373A JP 2007555373 A JP2007555373 A JP 2007555373A JP 2008530312 A5 JP2008530312 A5 JP 2008530312A5
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JP
Japan
Prior art keywords
group
processing method
zeolite
molecular sieve
rsio
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Ceased
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JP2007555373A
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Japanese (ja)
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JP2008530312A (en
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Priority claimed from PCT/US2006/005412 external-priority patent/WO2006086789A2/en
Publication of JP2008530312A publication Critical patent/JP2008530312A/en
Publication of JP2008530312A5 publication Critical patent/JP2008530312A5/ja
Ceased legal-status Critical Current

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Claims (4)

POSS及びPOSからなる群より選択されるナノ構造材料で、ゼオライト若しくは分子篩の内部表面を被覆することを含むゼオライト若しくは分子篩の透過性の調整方法であって、ゼオライト若しくは分子篩の気体分離特性が、被覆の結果変性されものである、方法。 A method of adjusting the permeability of a zeolite or molecular sieve comprising coating the inner surface of the zeolite or molecular sieve with a nanostructured material selected from the group consisting of POSS and POS, wherein the gas separation characteristics of the zeolite or molecular sieve are coated As a result of the modification. 請求項記載の方法であって、ゼオライト若しくは分子篩は、無溶媒技術及び超臨界流体支援技術から成る群より選択される技術を使用して、ナノ構造材料で被覆される方法。 The method of claim 1 , wherein the zeolite or molecular sieve is coated with the nanostructured material using a technique selected from the group consisting of solventless technology and supercritical fluid assist technology. 請求項記載の方法であって、その技術が、溶融状態処理法、噴霧処理法、流動処理法及び混合処理法から成る群より選択される処理方法である方法。 3. The method according to claim 2 , wherein the technique is a processing method selected from the group consisting of a molten state processing method, a spray processing method, a flow processing method and a mixing processing method. 請求項記載の方法であって、ナノ構造材料が、POSS-シラノール、式[(RSiO1.5)( XSiO1.0)Σ7のシロキサイド、ポリシルセスキオキサン[(RSiO1.5)Σ#及びPOSS断片[(RSiO1.5)( XSiO1.0)Σ#から成る群より選択される化合物由来であり、ここで、RとR は、有機置換基を表し、同一か異なることができ、Xは、官能基であり、m及びnは、式の化学量論を表し、Σは、ナノ構造を表し、#は、ナノ構造内に含まれる珪素原子の数を表す、方法。 A The method of claim 1, nanostructured material, POSS-silanols, formula [(RSiO 1.5) 4 (R 1 XSiO 1.0) 3] Σ7 siloxide of polysilsesquioxane [( RSiO 1.5) n] Σ # and POSS fragments [(RSiO 1.5) m (R 1 XSiO 1.0) n] Σ Ri compounds derived der selected from the group consisting of #, where the R R 1 represents an organic substituent, which can be the same or different, X is a functional group, m and n represent the stoichiometry of the formula, Σ represents a nanostructure, and # represents a nanostructure A method representing the number of silicon atoms contained in a structure .
JP2007555373A 2005-02-14 2006-02-14 Porosity control by polyhedral oligomeric silsesquioxane Ceased JP2008530312A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65292205P 2005-02-14 2005-02-14
PCT/US2006/005412 WO2006086789A2 (en) 2005-02-14 2006-02-14 Porosity control with polyhedral oligomeric silsesquioxanes

Publications (2)

Publication Number Publication Date
JP2008530312A JP2008530312A (en) 2008-08-07
JP2008530312A5 true JP2008530312A5 (en) 2009-04-02

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JP2007555373A Ceased JP2008530312A (en) 2005-02-14 2006-02-14 Porosity control by polyhedral oligomeric silsesquioxane

Country Status (3)

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EP (1) EP1848762A4 (en)
JP (1) JP2008530312A (en)
WO (1) WO2006086789A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5221539B2 (en) * 2006-08-18 2013-06-26 ハイブリッド・プラスティックス・インコーポレイテッド Nanoscopic guarantee coating for lead-free solder
CN101945696B (en) 2008-03-11 2013-10-09 东丽株式会社 Composite separation membrane
JP5333723B2 (en) * 2008-07-23 2013-11-06 住友ゴム工業株式会社 Rubber composition
US20120205315A1 (en) * 2011-02-14 2012-08-16 Dionex Corporation Nanometer size chemical modified materials and uses
CN104781322B (en) 2012-11-19 2018-04-27 陶氏环球技术有限责任公司 The polymeric foam of the graft polymers of silsesquioxane containing polyhedral oligomeric
KR20160002796A (en) * 2013-04-23 2016-01-08 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 Polyamide resin composition, and molded article
US20150224473A1 (en) * 2014-02-07 2015-08-13 Thermo Electron Manufacturing Limited Chromatographic material and methods for the synthesis thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10130013A (en) * 1996-09-09 1998-05-19 Toyota Central Res & Dev Lab Inc Cluster inclusion material
KR20020059354A (en) * 1999-08-04 2002-07-12 하이브리드 플라스틱스 Process for the formation of polyhedral oligomeric silsesquioxanes
EP1268635B8 (en) * 2000-03-24 2005-09-28 Hybrid Plastics LLP Nanostructured chemicals as alloying agents in polymers
US6709560B2 (en) * 2001-04-18 2004-03-23 Biosource, Inc. Charge barrier flow-through capacitor

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