JP2008311338A5 - - Google Patents
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- Publication number
- JP2008311338A5 JP2008311338A5 JP2007156135A JP2007156135A JP2008311338A5 JP 2008311338 A5 JP2008311338 A5 JP 2008311338A5 JP 2007156135 A JP2007156135 A JP 2007156135A JP 2007156135 A JP2007156135 A JP 2007156135A JP 2008311338 A5 JP2008311338 A5 JP 2008311338A5
- Authority
- JP
- Japan
- Prior art keywords
- detection means
- intermittently
- low energy
- continuously
- discharge generated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims 3
- 230000002159 abnormal effect Effects 0.000 claims 1
Claims (1)
First detection means for detecting low energy discharge generated continuously or intermittently in the vacuum chamber, and low energy discharge generated by the first detection means continuously or intermittently for a fixed time. abnormal discharge prediction apparatus according to claim 1, in response to detected, characterized in that it comprises a second detection means for generating the prediction signal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007156135A JP2008311338A (en) | 2007-06-13 | 2007-06-13 | Vacuum treatment apparatus and abnormal discharge precognition device used therefor, and control method of vacuum treatment apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007156135A JP2008311338A (en) | 2007-06-13 | 2007-06-13 | Vacuum treatment apparatus and abnormal discharge precognition device used therefor, and control method of vacuum treatment apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008311338A JP2008311338A (en) | 2008-12-25 |
| JP2008311338A5 true JP2008311338A5 (en) | 2010-07-22 |
Family
ID=40238710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007156135A Pending JP2008311338A (en) | 2007-06-13 | 2007-06-13 | Vacuum treatment apparatus and abnormal discharge precognition device used therefor, and control method of vacuum treatment apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008311338A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG176565A1 (en) * | 2009-06-30 | 2012-01-30 | Lam Res Corp | Methods and apparatus to predict etch rate uniformity for qualification of a plasma chamber |
| JP6226777B2 (en) * | 2014-03-06 | 2017-11-08 | Ｓｐｐテクノロジーズ株式会社 | Abnormal discharge prediction method and apparatus for plasma processing apparatus, and plasma processing apparatus with abnormal discharge prediction function |
| JP6582292B2 (en) * | 2015-07-28 | 2019-10-02 | 東京電子交易株式会社 | Discharge analysis method and discharge analysis apparatus |
| JP6807558B2 (en) * | 2016-11-08 | 2021-01-06 | パナソニックＩｐマネジメント株式会社 | Plasma processing method and plasma processing equipment |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09266097A (en) * | 1996-03-29 | 1997-10-07 | Seiko Epson Corp | Plasma processing method and device |
| JPH09266098A (en) * | 1996-03-29 | 1997-10-07 | Seiko Epson Corp | Plasma condition detecting device and method, and etching terminating point detecting device and method |
| JP2002176034A (en) * | 2000-12-08 | 2002-06-21 | Yoshio Fujino | Automatic device for preventing abnormal discharge in plasma etching |
| JP2004220923A (en) * | 2003-01-15 | 2004-08-05 | Ulvac Japan Ltd | Abnormal discharge detection device and method, and plasma treatment device comprising the abnormal discharge detection device |
| US20060252283A1 (en) * | 2003-08-07 | 2006-11-09 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus and sustrate processing method |
| JP2005259941A (en) * | 2004-03-11 | 2005-09-22 | Renesas Technology Corp | Sputter etching apparatus, sputter etching system, and sputter etching method |
| JP4673653B2 (en) * | 2005-03-30 | 2011-04-20 | オリジン電気株式会社 | Abnormal discharge prevention method and vacuum apparatus in vacuum apparatus |
| JP2006328510A (en) * | 2005-05-30 | 2006-12-07 | Ulvac Japan Ltd | Plasma treatment method and device |
| JP5094002B2 (en) * | 2005-09-06 | 2012-12-12 | ルネサスエレクトロニクス株式会社 | Plasma processing apparatus and method for suppressing abnormal discharge thereof |
| JP5159055B2 (en) * | 2006-03-08 | 2013-03-06 | 株式会社ＥＭ・Ｐｒｅｄｉｘ | AC power supply |
-
2007
- 2007-06-13 JP JP2007156135A patent/JP2008311338A/en active Pending
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