JP2008304626A - Manufacturing method of color filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a color filter with which shapes of RGB pixels in a display region are flattened by giving level difference to a black matrix used as a partition wall when ink is ejected into the display region and the stable color filter free from color mixing and repellent can be obtained. <P>SOLUTION: A cross section of the partition wall 2 which constitutes a black matrix pattern and divides an aperture comprises a lower part 2,002 which is joined to a substrate 1 and a central part 2,004 which has breadth smaller than that of the lower part 2,002 and which projects from a center of a width direction of the lower part 2,002. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a color filter used in a liquid crystal display device or the like. More specifically, in a color filter in which each pixel is printed by the ink jet method, the shape of the RGB pixels in the display area is flattened by providing a step in the black matrix as a partition when ink is ejected to the display area. Further, the present invention relates to a method for producing a stable color filter free from color mixing and repellency.

  A color filter used in a color liquid crystal display device or the like is an indispensable member for a color liquid crystal display device or the like, and has a role of improving the image quality of the liquid crystal display device or giving each pixel a color of each primary color. Yes. Various studies have been made on the manufacturing method of this color filter, and a photolithography method, an ink jet method, and the like are known as typical methods. In the photolithography method, a coating film of a photosensitive resin layer of each color is formed on the entire substrate, and unnecessary portions of the coating film are removed later, and the remaining pattern is used as each color pixel. In this method, many of the coating films are unnecessary, and a large amount of materials such as pigments are wasted when manufacturing the color filter. In addition, since the exposure and development processes are performed for each color pixel, the number of processes increases. For this reason, the production of color filters by the photolithography method has problems in both cost and environment. In this respect, the ink jet method has recently attracted attention. In the production of a color filter by the ink jet method, each of the colors can be printed at the same time using three colored resin compositions of R, G, and B as inks. For this reason, there is little waste of material and the pixel formation process is shortened, so that it is possible to expect a reduction in environmental load and a significant cost reduction.

  As a method for producing a color filter substrate using an ink jet method, methods described in Patent Documents 1 to 4 have been proposed. In Patent Document 1, in order to prevent the ink from spreading outside the desired colored layer region on the glass substrate, a pattern is formed by adding a fluorine-based water / oil repellent to the black partition wall that separates each pixel in advance. By doing so, it is described that the ink is fixed only in the colored region. Patent Document 2 and Patent Document 3 describe that a black resin layer containing a fluorine-containing compound and / or a silicon-containing compound is used as a partition wall for bleeding in ink and preventing color mixing in a colored layer forming step. Has been. Patent Document 4 discloses a manufacturing method that includes a substrate processing step of eliminating the water and oil repellency after forming the partition wall and the pixel of each pixel so that any surface has water and oil repellency. Are listed. These methods do not require the step of imparting ink repellency to the partition wall surface after forming the partition walls or imparting ink repellency to the openings surrounded by the partition walls, and the number of processes is small. This can be said to be a very preferable method that can reduce the load and the manufacturing cost.

However, in the above conventional method, since the ink repellency is also imparted to the side surface portion of the pattern when the partition wall pattern is formed, the portion applied to the peripheral portion of the black matrix pattern during RGB coating is There is a problem that the shape is not flattened because the thickness becomes thinner due to the ink repellency and the center of the display area is raised.
JP-A-6-347637 JP-A-7-35915 JP-A-7-35917 JP-A-7-248413

  The present invention has been made to solve the above-mentioned problems, and the problem is that an ink jet method is used in a region surrounded by a partition in a color filter in which each pixel is printed by an ink jet method. When ejecting ink to the display area partitioned by the partition to form the colored part used for display, the shape is flattened by making the partition wall height around the black matrix pattern lower than the center part. Another object of the present invention is to provide a method for manufacturing a color filter free from color mixing and repellency.

  By the way, according to the study of the present inventor, a photosensitive resin composition containing a material imparting ink repellency (ink repellent agent) is applied to a substrate, and the partition wall height at the periphery of the black matrix pattern is lowered. After exposing and developing the pattern using a halftone mask using a semi-transmissive film at the location where the concave pattern is to be provided, the barrier ribs are photocured or radiation cured by light irradiation or radiation irradiation, and then baked at 160 ° C. Therefore, it is possible to make a difference in the partition wall height of the black matrix pattern part, the film thickness at the time of RGB coating is flattened, the film thickness uniformity in the pixel is improved, and the optical density of the black matrix part is improved. A color filter satisfying the above has been obtained.

  The present invention has been made based on such knowledge, and the invention according to claim 1 is a coating step of applying a black photosensitive resin containing a material imparting ink repellency to a substrate, after drying, A pattern forming process for forming a black matrix pattern having ink repellency by exposure and development, and a colored layer forming process for forming a colored layer by discharging ink of a desired color to the openings of the black matrix pattern by an ink jet method In the method of manufacturing a color filter, the cross section of the partition wall forming the black matrix pattern and partitioning the opening has a lower part joined to a substrate, a width smaller than the lower part, and a center in the width direction of the lower part A color filter manufacturing method comprising a central portion protruding from the center portion.

  The invention described in claim 2 is a coating step of applying a black photosensitive resin containing a material imparting ink repellency to a substrate, drying, exposing and developing to form a black matrix pattern having ink repellency. In a color filter manufacturing method comprising a pattern forming step of forming, and a colored layer forming step of forming a colored layer by discharging ink of a desired color to the openings of the black matrix pattern by an ink jet method, the black matrix pattern The section of the partition wall configured and partitioning the opening includes a lower part joined to a substrate, and a central part that has a smaller width than the lower part and protrudes from the center in the width direction of the lower part. In the method for producing a color filter, ink is also discharged onto a lower portion of the partition wall in the layer forming step.

  According to a third aspect of the present invention, in the color filter manufacturing method according to the first or second aspect, the height of the lower portion of the partition wall is 2/3 or less of the height of the central portion. Is the method.

  The invention according to claim 4 is the method for producing a color filter according to claim 1 or 2, wherein the optical density (OD value) of the lower part of the partition is 1.0 or more.

  According to a fifth aspect of the present invention, in the pattern forming step, a mask used for exposure is a so-called halftone mask in which a portion corresponding to the lower portion has a lower transmittance than a portion corresponding to the central portion. 3. The method for producing a color filter according to claim 1, wherein the color filter is used.

  The invention described in claim 6 is characterized in that the material imparting ink repellency is a fluorine-containing copolymer having a weight average molecular weight of 10,000 to 100,000. The method for producing a color filter according to any one of the above.

  According to a seventh aspect of the present invention, in the colored layer forming step, the colored layer is formed by ejecting an organic solvent-based pigment-dispersed ink by an ink jet method. It is a manufacturing method of a color filter given in any 1 paragraph.

  According to the present invention, a pattern is exposed and developed using a halftone mask using a semi-transmissive film at a portion where the height of the partition wall at the periphery of the black matrix pattern is lowered, and then the partition is photocured by light irradiation or radiation irradiation. Alternatively, it is possible to give a difference in the height of the partition wall of the black matrix pattern portion by radiation curing and then baking at 160 ° C., the film thickness at the time of RGB coating is flattened, and the film in the pixel The thickness uniformity was improved, and a color filter satisfying the optical density of the black matrix portion could be obtained.

  As shown in FIG. 1, a color filter manufactured by forming a colored layer by an ink jet method is a transparent substrate 1 in order to prevent color mixing of red (R), green (G), and blue (B) colored inks. A partition wall 2 is provided on the top. Furthermore, in order to improve the contrast of the color filter, it is desirable to provide light shielding properties to a part or all of the partition walls 2. In general, as a means for imparting a light shielding property, a black material is used for a part or all of the partition wall 2 and a black part is provided. In the following description, part or all of the partition walls 2 are referred to as a “black matrix” for convenience, but the black matrix does not necessarily have a black portion. Next, when a colored layer 3 of red (R), green (G), and blue (B) is formed on a transparent substrate, and this is used for liquid crystal, a transparent conductive layer and an alignment film layer are sequentially laminated. For example, a liquid crystal display device is configured through a liquid crystal layer facing a counter substrate on which an electrode such as a thin film transistor is formed. Hereinafter, the transparent substrate, the black matrix, and the red, green, and blue colored pixel layers are combined to form a color filter. If necessary, a protective layer 4 can be provided on the color filter.

  As described above, the colored layer 3 is provided in the openings between the black matrices (openings partitioned by the partition walls 2), and usually includes the red pixel pattern (R), the green pixel pattern (G), and the blue pixel pattern (B). A pixel pattern composed of three primary colors is arranged in a desired shape. Examples of the general forming method include a pigment dispersion method, a dye method, an electrodeposition method, a printing method, a transfer method, and an ink jet method. In the present invention, the colored resin composition is patterned by an ink jet apparatus, and the colored layer 3 is formed through a heating process.

  For the transparent substrate 1 of the color filter, a known transparent substrate material such as a glass substrate, a quartz substrate, or a plastic substrate can be used. Among them, the glass substrate is excellent in transparency, strength, heat resistance, and weather resistance.

  The colored resin composition used for the colored layer 3 of the color filter can use a known material such as a colorant, a thermosetting resin, or a solvent, and is prepared by adding an additive such as a dispersant as necessary. be able to. As the colorant, a dye or a pigment can be used, but a pigment dispersion type is particularly preferable in terms of reliability such as heat resistance and weather resistance. Moreover, water-based and organic solvent-based solvents can be used as the solvent. However, the organic solvent is highly soluble in a wide range of resin compositions and can discharge an ink jet even at a high solid content concentration. It is particularly preferable to use

  Hereinafter, the formation of the black matrix will be described in detail. In the present invention, the black matrix is formed by a photolithography method. More specifically, a coating process in which a photosensitive resin composition containing a material imparting ink repellency is applied to a substrate, and a half-transparent film is used at a location where the partition wall height in the periphery of the black matrix pattern is lowered. A pattern forming step of forming a barrier rib pattern by pattern exposure and development using a tone mask, a step of forming a barrier rib pattern by developing, a light curing or a radiation irradiation treatment to the barrier rib pattern, and photocuring or radiation It comprises at least a step of curing and a step of baking and thermally curing the partition pattern irradiated with light or radiation.

  In the coating step in which the photosensitive resin composition containing the material imparting ink repellency is applied to the substrate, the substrate 1 that has been appropriately washed is applied to the substrate 1 that has been described later and also contains the ink repellant described later. The photosensitive resin composition is uniformly coated using a known coating apparatus such as a slit die coater or a spin coater. Then, in order to remove a solvent component, a reduced pressure drying process and a prebaking process can be performed as needed. In this case, when a fluorine-based ink repellent agent is used, the ink repellent agent dispersed in the coating film has a property of gradually segregating on the surface of the coating film. The segregation state of the ink repellent agent changes depending on the time until completion and the conditions. Therefore, in order to obtain the partition wall 2 with uniform performance, it is desirable to keep the time interval from coating to vacuum drying or pre-baking and the conditions thereof uniform in this step.

  A process of forming a barrier rib pattern by pattern exposure and development using a halftone mask using a semi-transmissive film at a portion where the barrier rib height around the black matrix pattern is lowered will be described in detail below.

FIG. 2 shows a step of forming a barrier rib pattern by pattern exposure and development using a halftone mask using a semi-transmissive film at a portion where the barrier rib height around the black matrix pattern is lowered.
a shows the application | coating process which coats the photosensitive resin composition 100 containing the material which provides ink repellency, and the apply | coated board | substrate 1 is translucent in pattern exposure process b (1), (2). By the mask 8 having the film 6 and the light-shielding film 7, the light intensity 9 is attenuated by 30 to 70% by the semi-transmissive film 6 and the intensity of the light is reduced to 30 to 70%. It is possible to make a difference.
That is, the cross section of the partition wall 2 constituting the black matrix pattern and partitioning the opening is a lower part 2002 joined to the substrate 1 and a central part 2004 having a width smaller than the lower part 2002 and protruding from the center in the width direction of the lower part 2002. It is comprised including.

  As for the above developing method, the pattern of the partition wall 2 having the lower part 2002 and the central part 2004 can be formed by a conventionally known developing method.

  In the step (d) in which the partition pattern is subjected to light irradiation or radiation irradiation treatment for light curing or radiation curing, the partition wall 2 is cured by irradiation with ultraviolet rays or electron beams (11) from the upper surface of the substrate 1. The light or radiation to be irradiated is not particularly limited as long as it has an absorption wavelength at which the photosensitive resin composition is cured, but ultraviolet rays or electron beams are particularly preferable. However, those containing a wavelength that promotes the decomposition of the ink repellent agent are not preferable because the decomposed ink repellent agent contaminates the substrate surface of the opening. It is desirable to cut unnecessary wavelengths through an appropriate filter. Ultraviolet irradiation treatment with an ultra-high pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp or the like is particularly preferable.

  Further, when the black matrix formed of the photosensitive resin composition containing the ink repellent agent is a light shielding layer having a light shielding property, in the light irradiation treatment, the surface of the partition wall 2 is cured, but is internally shielded. May not be cured. In that case, the process of heat-processing and heat-curing can be provided. As a heating method, a hot air circulation type oven, a hot plate, heating by infrared rays, or the like can be used, and is not particularly limited.

When the black matrix formed of the photosensitive resin composition containing the ink repellent agent is a light shielding layer having a light shielding property, the difference in film thickness (height difference) between the lower part 2002 and the central part 2004 is the optical density. There is no limitation as long as it is between 30% and 80% in consideration of the minimum amount of liquid that can be preliminarily ejected to a light-shielding film portion having a low height other than the display area. That is, the height of the lower part 2002 of the partition wall 2 is preferably 2/3 or less of the height of the central part 2004.
The optical density (OD value) of the lower part 2002 of the partition wall 2 is preferably 1.0 or more.

  Here, the central portion 2004 of the partition wall 2 is preferably formed with a height of 1.0 μm or more. Furthermore, it is more preferable to form with a height of 1.5 μm to 5 μm. When the height of the central portion 2004 of the partition wall 2 is 1.0 μm or less, color mixing of colored inks occurs. On the other hand, if the height of the central portion 2004 of the partition wall 2 is too high, it is difficult to form a fine black matrix and a step difference from the colored layer 3 is not preferable.

  On the substrate 1 formed as described above, preliminary discharge with red colored ink (f), preliminary discharge with green colored ink (g), preliminary discharge with blue colored ink (h) on the lower part 2002 installed in the peripheral region other than the display region (h) ) And the partition wall portion 12 are sequentially preliminarily discharged.

  The substrate formed by the above method is fired (j) to form a color filter. Here, the firing conditions are preferably 200 to 250 ° C. and heated for 10 to 60 minutes. In this baking, the black matrix is completely cured together with the colored ink, and sufficient resistance as a color filter is obtained.

  The components and materials contained in the photosensitive resin composition used for forming the black matrix will be described.

The photosensitive resin composition of the present invention is a negative photosensitive resin composition, the main components of which are a binder resin, a radically polymerizable compound, a photopolymerization initiator, a solvent, an ink repellent agent, and, if necessary. It consists of a light-shielding member.
First, as the binder resin, an alkane-soluble thermosetting resin is preferable, and specific examples include cresol-novolak resin, polyvinylphenol resin, acrylic resin, and methacrylic resin. These binder resins may be used alone or in combination of two or more. Moreover, in order to accelerate | stimulate sclerosis | hardenability at low temperature, in addition to these resins, a melamine derivative and a photo-acid generator can also be contained. The melamine derivative may be a compound having a methylol group or a methoxymethyl group, but is particularly preferably a compound having high solubility in a solvent.

  The photoacid generator promotes the dehydration reaction and the crosslinking reaction between the melamine derivative and the binder resin by the action of the acid generated upon exposure, and has a particularly high solubility in a solvent among the photoacid generators. Those are preferred. As an example, specifically, diphenyliodonium, ditolyliodonium, phenyl (4-anisyl) iodonium, bis (3-nitrophenyl) iodonium, bis (4-tert-butylphenyl) iodonium, bis (4-chlorophenyl) iodonium Bis (4-n-dodecylphenyl) iodonium, 4-isobutylphenyl (4-tolyl) iodonium, diaryliodonium such as 4-isopyrphenyl (4-tolyl) iodonium, or triarylsulfonium such as triphenylsulfonium Triarylsulfonium chloride, bromide, borofluoride, hexafluorophosphate, hexafluoroarsenate, aromatic sulfonate, tetrakis (pentafluorophenyl) borate, Sulfonium organoboron complex salts such as phenylphenacylsulfonium (n-butyl) triphenylborate, or 2-methyl-4,6-bistrichloromethyltriazine, 2- (4-methoxyphenyl) -4,6-bistrichloro Triazine compounds such as methyltriazine, 2- {2- (5-methylfuran-2-yl) ethenyl} -4,6-bis (trichloromethyl) -s-triazine, or 1,2-naphthoquinonediazide, 1,2-naphtho Quinonediazide-4-sulfonsan sodium, 1,2-naphthoquinonediazide-5-sulfonic acid sodium, 1,2-naphthoquinonediazide-4-sulfonic acid ester derivative, 1,2-naphthoquinonediazide-5-sulfonic acid ester derivative, etc. Examples thereof include diazonaphthoquinone compounds.

  As the compound having radical polymerizability in the present invention, for example, a monomer or oligomer having a vinyl group or an allyl group, or a polymer having a vinyl group or an allyl group at the terminal or side chain can be used. Specifically, (meth) acrylic acid and salts thereof, (meth) acrylic acid esters, (meth) acrylamides, maleic anhydride, maleic acid esters, itaconic acid esters, styrenes, vinyl ethers, vinyl esters, N -Vinyl heterocycles, allyl ethers, allyl esters, and derivatives thereof. Suitable compounds include, for example, relatively low molecular weight polyfunctional acrylates such as pentaerythritol triacrylate, trimethylolpropane triacrylate, pentaerythritol tetraacrylate, ditrimethylolpropane tetraacrylate, dipentaerythritol pentaacrylate, and hexaacrylate. Yes, but not this. These radically polymerizable compounds may be used alone or in combination of two or more. The amount of the compound having radical polymerizability can be in the range of 1 to 200 parts by weight, preferably 50 to 150 parts by weight with respect to 100 parts by weight of the binder resin.

  In the present invention, the photopolymerization initiator generates radicals upon exposure and crosslinks the binder resin through a compound having radical polymerizability. Specific examples of the photopolymerization initiator include benzophenone compounds such as benzophenone, 4,4′-bis (dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, 1-hydroxycyclohexylacetophenone, 2,2 Acetophenone derivatives such as 2-dimethoxy-2-phenylacetophenone and 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, thioxanthone, 2,4-diethylthioxanthone, 2-isopropyl Thioxanthone derivatives such as thioxanthone, 2-chlorothioxanthone, 2-methylanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone, anthraquinone derivatives such as chloroanthraquinone, benzoin methyl ether, benzoin ethyl ether, benzoin Benzoin ether derivatives such as phenyl ether, acylphosphine derivatives such as phenylbis- (2,4,6-trimethylbenzoyl) -phosphine oxide, 2- (o-chlorophenyl) -4,5-bis (4′-methyl) Lophine isomers such as phenyl) imidazolyl dimer, N-aryl glycines such as N-phenylglycine, organic azides such as 4,4′-diazidochalcone, 3,3 ′, 4,4′-tetra ( tert-butylperoxycarboxy) benzophenone, quinonediazide group-containing compounds, and the like. These photopolymerization initiators may be used alone or in combination of two or more. The quantity of a photoinitiator can take the range of 0.1-50 weight part with respect to 100 weight part of binder resin, Preferably it is 1-20 weight part.

EXAMPLES Hereinafter, although this invention is demonstrated in detail using an Example and a comparative example, this invention is not limited to this form.
<Comparative Examples 1-2>
(Create black matrix)
As the photosensitive resin composition containing a material imparting ink repellency, a photosensitive resin composition blended at the following composition ratio and sufficiently kneaded with three rollers was used. As the transparent substrate, non-alkali glass (“# 1737” manufactured by Corning) was used, and this photosensitive resin composition was applied thereon and pre-baked at 90 ° C. for 2 minutes to form a film having a thickness of 2.0 μm. .
[Photosensitive resin composition A]
Cresol-Novolac resin “EP4050G” (Asahi Organic Materials Co., Ltd.) 20 parts by weight cyclohexanone 80 parts by weight Carbon pigment “MA-8” (Mitsubishi Materials Co., Ltd.) 23 parts by weight Dispersant “Solsperse # 5000” (manufactured by Zeneca) 4 parts by weight of radically polymerizable compound “trimethylolpropane triacrylate” (manufactured by Osaka Organic Chemicals) 5 parts by weight of photopolymerization initiator “Irgacure 369” (manufactured by Ciba Specialty Chemicals) 2 parts by weight of fluorine-containing compound “Modiper F- 600 "(manufactured by NOF Corporation, weight average molecular weight 35000)
0.5 parts by weight Thereafter, using a photomask which is a lattice-like pattern having no semi-transmissive film in the peripheral region (lower part 2002), 100 mJ / cm 2 exposure was performed with an ultra-high pressure mercury lamp, and development processing was performed. Subsequently, an electron beam irradiation treatment of 1000 mJ / cm 2 was performed, and then a heat treatment was performed on a hot plate for 10 minutes.

  Subsequently, when the OD value (optical density) of the black matrix was measured, it was 6, and since it had sufficient light-shielding properties, it was confirmed that any of them could be used as a light-shielding layer.

The definition of the OD value is shown below. When visible light is transmitted through a 1 μm sample, the incident light intensity is I ₀ , and the transmitted light intensity is I.
OD value = -log (I / I ₀ )

  Further, when printing was performed on the substrate having the black matrix with various colored inks having the conditions shown in Table 1 using an ink jet apparatus, either a pixel flatness or a color mixing defect occurred.

<Examples 1-2>
In the creation of the black matrix described above, 100 mJ / cm 2 exposure was performed with an ultra-high pressure mercury lamp using a photomask which is a lattice-like pattern having a semi-transmissive film in the peripheral region (lower part 2002), and development processing was performed. Subsequently, an electron beam irradiation treatment of 1000 mJ / cm 2 was performed, and then a heat treatment was performed on a hot plate for 10 minutes.

  The film thickness at this time was 1.0 μm under the semipermeable membrane and 2.0 μm at other locations. Further, when the OD value (optical density) was measured, it was 3.0 under the semipermeable membrane and 6.0 at other locations.

  In addition, when printed on a substrate having this black matrix with various colored inks as shown in Table 2 using an ink jet apparatus, the pixel flatness is good, and there is no color mixing or repelling. A filter was obtained.

  When the OD value (optical density) of the peripheral area portion (lower part 2002) after ink jet printing was measured, the value under the semipermeable membrane was 4.5 in Example 1, and 4. in Example 2. 5 and the value of the place other than under the semi-permeable membrane is 6, and it has sufficient light shielding properties, so it was confirmed that any of them can be used as a light shielding layer. It was also confirmed that there was no unevenness.

It is explanatory drawing of the cross-sectional shape of the color filter provided with the black matrix of this invention. BRIEF DESCRIPTION OF THE DRAWINGS In the explanatory drawing of the black matrix manufacturing method of this invention, a is a process figure which coats the photosensitive resin composition which contains or does not contain an ink repellent agent on a board | substrate, b is a pattern exposure process figure, c is a development process figure. , D is a process diagram for curing by light irradiation or radiation irradiation treatment, and e is a process for thermal curing. FIG. 4 is an explanatory diagram of the ink jet ejection method of the present invention, wherein f is a process diagram for forming a red colored layer by ejecting ink by an ink jet system, and g is a process for ejecting ink by an ink jet system to form a green colored layer. Figure, h is a process diagram for forming a blue colored layer by ejecting ink by an ink jet method, i is a process diagram for repeatedly forming a red, green and blue colored layer by ejecting ink by an ink jet method, j is a color filter It is sectional drawing.

Explanation of symbols

1 ... Transparent substrate 2 ... Partition (black matrix)
3 ... colored layer 4 ... protective layer 5 ... coated substrate 1
6 ... Semi-transmissive film 7 ... Light shielding film 8 ... Photomask 1
9: Light intensity 1
10: Light intensity 2
11 ... Light irradiation or radiation irradiation 12 ... Partition (peripheral region)
13 ... Ink head

Claims (7)

A coating step of applying a black photosensitive resin containing a material imparting ink repellency to a substrate, a pattern forming step of forming a black matrix pattern having ink repellency by drying, exposure, and development; In the method for producing a color filter having a colored layer forming step of forming a colored layer by discharging ink of a desired color by an ink jet method to the opening,
The cross section of the partition wall constituting the black matrix pattern and partitioning the opening includes a lower part joined to a substrate and a central part having a smaller width than the lower part and protruding from the center in the width direction of the lower part. It is configured,
A method for producing a color filter characterized by the above. A coating step of applying a black photosensitive resin containing a material imparting ink repellency to a substrate, a pattern forming step of forming a black matrix pattern having ink repellency by drying, exposure, and development; In the method for producing a color filter having a colored layer forming step of forming a colored layer by discharging ink of a desired color by an ink jet method to the opening,
The cross section of the partition wall constituting the black matrix pattern and partitioning the opening includes a lower part joined to a substrate and a central part having a smaller width than the lower part and protruding from the center in the width direction of the lower part. Configured,
Ink is also discharged on the lower part of the partition wall in the colored layer forming step.
A method for producing a color filter characterized by the above.   The method for producing a color filter according to claim 1 or 2, wherein a height of the lower portion of the partition wall is 2/3 or less of a height of the central portion.   The method for producing a color filter according to claim 1 or 2, wherein an optical density (OD value) of the lower part of the partition wall is 1.0 or more.   The mask used for exposure in the pattern forming step uses a so-called halftone mask in which a portion corresponding to the lower portion has a lower transmittance than a portion corresponding to the central portion. A method for producing a color filter according to 1 or 2.   The color filter production according to any one of claims 1 to 5, wherein the material imparting ink repellency is a fluorine-containing copolymer having a weight average molecular weight of 10,000 to 100,000. Method.   The method for producing a color filter according to any one of claims 1 to 6, wherein the colored layer forming step forms a colored layer by discharging an organic solvent-based pigment-dispersed ink by an ink jet method. .

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