JP2008296149A - Coating mechanism and apparatus for correcting defect by using the same - Google Patents

Coating mechanism and apparatus for correcting defect by using the same Download PDF

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JP2008296149A
JP2008296149A JP2007145667A JP2007145667A JP2008296149A JP 2008296149 A JP2008296149 A JP 2008296149A JP 2007145667 A JP2007145667 A JP 2007145667A JP 2007145667 A JP2007145667 A JP 2007145667A JP 2008296149 A JP2008296149 A JP 2008296149A
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substrate
tip
application needle
needle
defect
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JP5263861B2 (en
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Akihiro Yamanaka
昭浩 山中
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NTN Corp
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NTN Toyo Bearing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a coating mechanism capable of applying a liquid material thinly, uniformly and quickly and an apparatus for correcting a defect by using the coating mechanism. <P>SOLUTION: The apparatus for correcting the defect by using the coating mechanism is characterized in that a tapered part 2 is formed at the tip of a coating needle 1, a flat plane 3 is formed at the tip of the tapered part, a correction fluid 4 is applied to the tip of the coating needle 1, the correction fluid-applied tip of the coating needle 1 is brought into contact with a substrate 5 and the coating needle 1 of such a contacted state is moved in parallel to the substrate 5 to apply the correction fluid 4 linearly. Therefore, the correction fluid 4 can be applied thinly, uniformly and quickly. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

この発明は塗布機構およびそれを用いた欠陥修正装置に関し、特に、基板に液状材料を塗布する塗布機構と、それを用いた欠陥修正装置に関する。   The present invention relates to an application mechanism and a defect correction apparatus using the same, and more particularly to an application mechanism for applying a liquid material to a substrate and a defect correction apparatus using the same.

近年、LCD(液晶表示装置)の大型化、高精細化に伴い画素数も増大し、LCDを無欠陥で製造することは困難となり、欠陥の発生確率も増加してきている。このような状況下において歩留まり向上のために、LCDのカラーフィルタの製造工程において発生する欠陥を修正する欠陥修正装置が生産ラインに不可欠となってきている。   In recent years, the number of pixels has increased along with the increase in size and definition of LCDs (liquid crystal display devices), making it difficult to manufacture LCDs without defects and increasing the probability of occurrence of defects. Under such circumstances, in order to improve the yield, a defect correcting device for correcting defects generated in the manufacturing process of the color filter of the LCD has become indispensable for the production line.

また最近では、LCDでも37〜45インチ程度のものが市販されており、1画素のサイズも小型パネルの60μm×200μm程度から200μm×600μm程度と大きくなってきている。画素サイズが大きくなるに伴い、欠陥サイズも大きくなり、修正サイズも大きくなってきている。このような状況において、従来の小さな修正サイズでは問題とされなかった修正品位でも、大きな修正サイズでは目視で見える領域となるため問題になる場合がでてきている。   Recently, LCDs having a size of about 37 to 45 inches are also commercially available, and the size of one pixel has increased from about 60 μm × 200 μm to about 200 μm × 600 μm of a small panel. As the pixel size increases, the defect size increases and the correction size also increases. In such a situation, even with the correction quality that was not a problem with the conventional small correction size, it may become a problem because it becomes an area that can be seen with a large correction size.

図7(a)〜(c)は、LCDのカラーフィルタの製造工程において発生する欠陥を示す図である。図7(a)〜(c)において、カラーフィルタは、ガラス基板と、その表面に形成されたブラックマトリクス50と呼ばれる格子状のパターンと、複数組のR(赤色)画素51、G(緑色)画素52、およびB(青色)画素53とを含む。カラーフィルタの製造工程においては、図7(a)に示すように画素やブラックマトリクス50の色が抜けてしまった白欠陥54や、図7(b)に示すように隣の画素と色が混色したり、ブラックマトリクス50が画素にはみ出してしまった黒欠陥55や、図7(c)に示すように画素に異物が付着した異物欠陥56などが発生する。   7A to 7C are diagrams showing defects that occur in the manufacturing process of the color filter of the LCD. 7A to 7C, the color filter includes a glass substrate, a lattice pattern called a black matrix 50 formed on the surface thereof, a plurality of sets of R (red) pixels 51, and G (green). A pixel 52 and a B (blue) pixel 53. In the manufacturing process of the color filter, the white defect 54 in which the color of the pixel or the black matrix 50 is lost as shown in FIG. 7A, or the color of the adjacent pixel is mixed as shown in FIG. 7B. Or a black defect 55 in which the black matrix 50 protrudes from the pixel, or a foreign substance defect 56 in which a foreign substance adheres to the pixel as shown in FIG.

白欠陥54を修正する方法としては、白欠陥54が存在する画素と同色のインクを塗布針の先端部に付着させ、針先端の円形平坦面のインク層を白欠陥54に転写し、円形のインク層で白欠陥54を覆う方法がある(たとえば特許文献1参照)。   As a method for correcting the white defect 54, ink having the same color as that of the pixel in which the white defect 54 is present is attached to the tip of the application needle, the ink layer on the circular flat surface at the tip of the needle is transferred to the white defect 54, and the circular defect There is a method of covering the white defect 54 with an ink layer (see, for example, Patent Document 1).

また、黒欠陥55や異物欠陥56を修正する方法としては、欠陥部分をレーザカットして矩形の白欠陥54を形成し、矩形の先端平坦面を有する塗布針を用いて矩形の白欠陥54内に矩形のインク層を転写する方法がある(たとえば特許文献2参照)。   Further, as a method of correcting the black defect 55 and the foreign matter defect 56, the defective portion is laser-cut to form a rectangular white defect 54, and the rectangular white defect 54 is formed using a coating needle having a rectangular tip flat surface. There is a method of transferring a rectangular ink layer (see, for example, Patent Document 2).

また、塗布針の先端部に追加工を施し、基板と塗布針が接触している時間で、インクの塗布量を調整する方法もある(特許文献3参照)。   There is also a method in which additional processing is performed on the tip of the application needle and the amount of ink applied is adjusted by the time during which the substrate and the application needle are in contact (see Patent Document 3).

図8(a)は、そのような塗布針61の先端部を示す正面図であり、同図(b)はその下面図であり、同図(c)は同図(a)のVIIIC−VIIIC線断面図であり、同図(d)は同図(a)のVIIID−VIIID線断面図であり、同図(e)は同図(a)のVIIIE−VIIIE線断面図である。   FIG. 8A is a front view showing the tip of such an application needle 61, FIG. 8B is a bottom view thereof, and FIG. 8C is a VIIIC-VIIIC of FIG. 8A. FIG. 4D is a cross-sectional view taken along line VIIID-VIIID in FIG. 4A, and FIG. 5E is a cross-sectional view taken along line VIIIE-VIIIE in FIG.

図8(a)〜(e)において、この塗布針61は、円柱状の先端部を90度間隔で斜めに切削したものである。これにより、塗布針61の先端部には、中心軸に対して斜めに形成された4つの平坦面62が形成され、先端には正方形の平坦面63が形成される。塗布針61は、金属で形成されている。   8A to 8E, the application needle 61 is obtained by cutting a cylindrical tip portion obliquely at intervals of 90 degrees. As a result, four flat surfaces 62 formed obliquely with respect to the central axis are formed at the tip of the application needle 61, and a square flat surface 63 is formed at the tip. The application needle 61 is made of metal.

図9(a)は図8(a)〜(e)に示した塗布針61の先端部にインク64を付着させた状態を示す断面図であり、同図(b)は同図(a)のIXB−IXB線断面図であり、同図(c)は同図(a)のIXC−IXC線断面図であり、同図(d)は同図(a)のIXD−IXD線断面図である。   FIG. 9A is a cross-sectional view showing a state in which the ink 64 is attached to the tip portion of the application needle 61 shown in FIGS. 8A to 8E, and FIG. IXB-IXB sectional view taken along the line IXC-IXC taken along the line IXC-IXC, and FIG. 4D taken along the line IXD-IXD of FIG. is there.

塗布針61の先端部をインク64に浸漬させて引き上げると、表面張力によって平坦面62の上部にインク溜まりが発生し、平坦面63およびその近傍は薄いインク層で覆われる。平坦面62にはインク64の表面張力により、平坦面62以外の外周面と比較して、より多くのインク64が保持される。塗布針61の先端の平坦面63を基板表面に接触させると、インク64が基板表面に付着することによって表面張力の不均衡が生じ、平坦面62に溜まったインク64が先端に供給され、基板に塗布される。   When the tip end of the application needle 61 is immersed in the ink 64 and pulled up, an ink pool is generated on the flat surface 62 due to surface tension, and the flat surface 63 and its vicinity are covered with a thin ink layer. The flat surface 62 holds more ink 64 than the outer peripheral surface other than the flat surface 62 due to the surface tension of the ink 64. When the flat surface 63 at the tip of the application needle 61 is brought into contact with the substrate surface, the ink 64 adheres to the substrate surface, causing an imbalance in surface tension, so that the ink 64 accumulated on the flat surface 62 is supplied to the tip, and the substrate To be applied.

図10(a)〜(c)は、図9(a)〜(d)に示した塗布針61を用いて白欠陥54にインク64を塗布する方法を示す図であり、特に図10(b)は図10(a)のXB−XB線断面図である。カラーフィルタの製造工程においてG画素52に異物欠陥が発生し、図10(a)に示すように、G画素52全体がレーザカットされてG画素52が白欠陥54に変換されているものとする。白欠陥54では、カラーフィルタのガラス基板65が露出している。   FIGS. 10A to 10C are diagrams showing a method of applying the ink 64 to the white defect 54 using the application needle 61 shown in FIGS. 9A to 9D, and particularly FIG. ) Is a cross-sectional view taken along line XB-XB in FIG. In the manufacturing process of the color filter, a foreign substance defect occurs in the G pixel 52, and the entire G pixel 52 is laser-cut to convert the G pixel 52 into a white defect 54 as shown in FIG. . In the white defect 54, the glass substrate 65 of the color filter is exposed.

この塗布方法では、塗布針61の先端を白欠陥54の一方端部に接触させ、その状態で塗布針61を白欠陥54の幅の広い方向で、かつ基板65の表面に水平な方向に、基板65に対して相対移動させて白欠陥54全体に塗布する。塗布針61の先端を基板65の表面に接触させると、インク溜まりから塗布針61と基板65の接触部にインク64が供給される。これにより、インク64を白欠陥54に短時間に均一に塗布することができる。   In this coating method, the tip of the coating needle 61 is brought into contact with one end of the white defect 54, and in this state, the coating needle 61 is wide in the width direction of the white defect 54 and in a direction horizontal to the surface of the substrate 65. It is moved relative to the substrate 65 and applied to the entire white defect. When the tip of the application needle 61 is brought into contact with the surface of the substrate 65, the ink 64 is supplied from the ink reservoir to the contact portion between the application needle 61 and the substrate 65. Thereby, the ink 64 can be uniformly applied to the white defect 54 in a short time.

なお、図11(a)〜(c)に示すように、塗布針61を白欠陥54の中心に停止させて塗布した場合は、インク64が白欠陥54の全域に広がる前に、隣接する画素51,53にはみ出てしまう。また、図12(a)〜(c)に示すように、白欠陥54の長手方向に複数回(図では3回)に分けて塗布した場合は、インク64の表面に凹凸ができ、色むらが発生する。
特開平9−61296号公報 特開平9−262520号公報 特開2007−94341号公報
As shown in FIGS. 11A to 11C, when the application needle 61 is stopped and applied at the center of the white defect 54, before the ink 64 spreads over the entire area of the white defect 54, adjacent pixels are used. 51 and 53. Further, as shown in FIGS. 12A to 12C, when the white defect 54 is applied in a plurality of times (three times in the figure) in the longitudinal direction, irregularities are formed on the surface of the ink 64, resulting in uneven color. Will occur.
Japanese Patent Laid-Open No. 9-61296 JP-A-9-262520 JP 2007-94341 A

以上のように、カラーフィルタの着色層に発生した欠陥は塗布針を用いて修正されるが、最近では、カラーフィルタの着色層上に形成されるオーバーコート層、ITO透明電極層、および配向膜層や、TFT電極層上に形成される配向膜層でも欠陥修正が行なわれるようになってきている。   As described above, defects generated in the colored layer of the color filter are corrected by using a coating needle. Recently, an overcoat layer, an ITO transparent electrode layer, and an alignment film formed on the colored layer of the color filter are used. Defect correction is also being performed on the layer and the alignment film layer formed on the TFT electrode layer.

しかし、配向膜層の膜厚(0.1μm以下)はカラーフィルタの着色層の膜厚(2μm程度)に比べて大変薄いので、図8〜図10で示した方法で配向膜層を修正すると、修正層の膜厚が大きくなり過ぎるという問題があった。   However, since the film thickness of the alignment film layer (0.1 μm or less) is much thinner than the film thickness of the colored layer of the color filter (about 2 μm), the alignment film layer is corrected by the method shown in FIGS. There is a problem that the thickness of the correction layer becomes too large.

また、TFT電極層上の配向膜の欠陥を修正する場合、TFT電極層と塗布針61の先端部との間で静電気による放電が発生し、TFT電極層がダメージを受けるという問題もあった。   Further, when correcting a defect in the alignment film on the TFT electrode layer, there is a problem in that a discharge due to static electricity is generated between the TFT electrode layer and the tip of the coating needle 61 and the TFT electrode layer is damaged.

それゆえに、この発明の主たる目的は、液状材料を薄く均一に迅速に塗布することが可能な塗布機構と、それを用いた欠陥修正装置を提供することである。   Therefore, a main object of the present invention is to provide an application mechanism that can apply a liquid material thinly and uniformly and a defect correcting apparatus using the same.

この発明に係る塗布機構は、基板に液状材料を塗布する塗布機構において、その先端に平坦面が形成され、その先端から軸方向に沿って漸次その断面が拡大するテーパ部が先端部に形成された塗布針と、塗布針の先端部に液状材料を付着させて塗布針の先端を基板に接触させ、塗布針を基板に対して平行移動させて液状材料を塗布する駆動手段とを備えたことを特徴とする。   In the coating mechanism according to the present invention, a flat surface is formed at the tip of the coating mechanism for coating a liquid material on a substrate, and a tapered portion whose cross section gradually increases along the axial direction from the tip is formed at the tip. And a driving means for applying the liquid material by causing the liquid material to adhere to the tip of the application needle, bringing the tip of the application needle into contact with the substrate, and moving the application needle parallel to the substrate. It is characterized by.

好ましくは、塗布針の少なくとも先端部の表面は絶縁材料で形成されている。
また好ましくは、絶縁材料はセラミックである。
Preferably, at least the surface of the tip of the application needle is formed of an insulating material.
Preferably, the insulating material is ceramic.

また、この発明に係る欠陥修正装置は、上記塗布機構を備え、この塗布機構は、基板上の欠陥部に液状材料を塗布して欠陥部を修正する。   In addition, a defect correcting apparatus according to the present invention includes the coating mechanism, and the coating mechanism corrects the defective portion by applying a liquid material to the defective portion on the substrate.

好ましくは、基板は、液晶表示装置用のTFT電極基板であり、欠陥部は、TFT電極基板の最上層である配向膜層が正常に成膜されていない部分である。   Preferably, the substrate is a TFT electrode substrate for a liquid crystal display device, and the defective portion is a portion where the alignment film layer which is the uppermost layer of the TFT electrode substrate is not normally formed.

また好ましくは、基板は、液晶表示装置用のカラーフィルタ基板であり、欠陥部は、カラーフィルタ基板の最上層である配向膜層が正常に成膜されていない部分である。   Preferably, the substrate is a color filter substrate for a liquid crystal display device, and the defective portion is a portion where the alignment film layer which is the uppermost layer of the color filter substrate is not normally formed.

この発明に係る塗布機構および欠陥修正装置では、その先端から軸方向に沿って漸次その断面が拡大するテーパ部が先端部に形成された塗布針と、塗布針の先端部に液状材料を付着させて塗布針の先端を基板に接触させ、塗布針を基板に対して平行移動させて液状材料を塗布する駆動手段とが設けられる。したがって、液状材料を薄く均一に迅速に塗布することができる。   In the coating mechanism and the defect correcting device according to the present invention, a liquid material is attached to the coating needle having a tapered portion formed at the tip portion, the cross-section of which gradually increases in the axial direction from the tip, and the tip portion of the coating needle. Driving means for applying the liquid material by bringing the tip of the application needle into contact with the substrate and moving the application needle in parallel with the substrate. Therefore, the liquid material can be applied thinly and rapidly.

また、塗布針の少なくとも先端部の表面を絶縁材料で形成することにより、静電気の放電によって基板の表面がダメージを受けるのを防止することができる。   In addition, by forming the surface of at least the tip of the application needle with an insulating material, it is possible to prevent the surface of the substrate from being damaged by electrostatic discharge.

図1(a)は本発明の一実施の形態による欠陥修正装置で用いられる塗布針1の先端部を示す正面図であり、同図(b)はその下面図であり、同図(c)は同図(a)のIC−IC線断面図であり、同図(d)は同図(a)のID−ID線断面図であり、同図(e)は同図(a)のIE−IE線断面図である。   Fig.1 (a) is a front view which shows the front-end | tip part of the application needle | hook 1 used with the defect correction apparatus by one Embodiment of this invention, The same figure (b) is the bottom view, The same figure (c) FIG. 4A is a cross-sectional view taken along the line IC-IC in FIG. 1A, FIG. 4D is a cross-sectional view taken along the line ID-ID in FIG. 1A, and FIG. FIG.

図1(a)〜(e)において、この塗布針1の先端部には、塗布針1の先端から基端に向かって塗布針1の断面積が漸次拡大するテーパ部2が設けられ、塗布針1の先端には平坦面3が設けられている。   In FIGS. 1A to 1E, a tip portion of the application needle 1 is provided with a tapered portion 2 in which the cross-sectional area of the application needle 1 gradually increases from the distal end of the application needle 1 toward the proximal end. A flat surface 3 is provided at the tip of the needle 1.

また、塗布針1の少なくとも先端部の表面は、低帯電性、絶縁性、耐薬品性に優れるセラミックで形成されている。塗布針1全体をセラミックで形成してもよいし、塗布針1の先端部の表面のみをセラミックで形成し、他の部分を金属で形成してもよい。また、低帯電性、絶縁性、耐薬品性に優れる絶縁材料であれば、セラミック以外の材料を用いてもよい。   Further, at least the surface of the tip of the application needle 1 is made of ceramic having excellent low chargeability, insulation and chemical resistance. The entire application needle 1 may be formed of ceramic, or only the surface of the tip of the application needle 1 may be formed of ceramic, and the other part may be formed of metal. Further, a material other than ceramic may be used as long as it is an insulating material excellent in low chargeability, insulation, and chemical resistance.

図2(a)は図1(a)〜(e)に示した塗布針1の先端部に修正液4を付着させた状態を示す断面図であり、同図(b)は同図(a)のIIB−IIB線断面図であり、同図(c)は同図(a)のIIC−IIC線断面図であり、同図(d)は同図(a)のIID−IID線断面図である。   2A is a cross-sectional view showing a state in which the correction liquid 4 is attached to the tip of the application needle 1 shown in FIGS. 1A to 1E, and FIG. ) Is a cross-sectional view taken along the line IIB-IIB of FIG. 5C, FIG. 2C is a cross-sectional view taken along the line IIC-IIC of FIG. 1A, and FIG. It is.

塗布針1の先端部を修正液4に浸漬させて引き上げると、表面張力によってテーパ部2の上部に修正液溜まりが発生し、平坦面3およびその近傍は薄い修正液層で覆われる。塗布針1の先端の平坦面3を基板表面に接触させると、修正液が基板表面に付着することによって表面張力の不均衡が生じ、テーパ部2の上部に溜まった修正液4が先端に供給され、基板に塗布される。   When the tip of the application needle 1 is immersed in the correction liquid 4 and pulled up, a correction liquid pool is generated at the upper portion of the taper portion 2 due to surface tension, and the flat surface 3 and the vicinity thereof are covered with a thin correction liquid layer. When the flat surface 3 at the tip of the application needle 1 is brought into contact with the substrate surface, the correction liquid adheres to the substrate surface, causing an imbalance in surface tension, and the correction liquid 4 accumulated on the upper portion of the taper portion 2 is supplied to the tip. And applied to the substrate.

図3(a)(b)は、図2(a)(b)に示した塗布針1を用いて基板5の表面に修正液4を塗布する動作を示す断面図である。図3(a)(b)において、塗布針1先端の平坦面3を基板5表面に接触させた状態で塗布針1と基板5を相対的に水平方向に移動させることにより、基板5の表面にライン状に修正液4を均一に短時間で塗布することができる。このとき、塗布針1のテーパ部2に図8で示したような平坦面62が形成されていないので、修正液層が厚くなり過ぎることがない。   FIGS. 3A and 3B are cross-sectional views showing the operation of applying the correction liquid 4 to the surface of the substrate 5 using the application needle 1 shown in FIGS. 2A and 2B. 3A and 3B, the surface of the substrate 5 is moved by relatively moving the coating needle 1 and the substrate 5 in the horizontal direction with the flat surface 3 at the tip of the coating needle 1 being in contact with the surface of the substrate 5. The correction liquid 4 can be uniformly applied in a short time in a line. At this time, since the flat surface 62 as shown in FIG. 8 is not formed on the tapered portion 2 of the application needle 1, the correction liquid layer does not become too thick.

図4(a)は、修正対象である基板5を例示する断面図である。図4(a)において、基板5は、液晶表示装置用のTFT電極基板であり、ガラス基板6の表面にTFT電極層7および配向膜層8を積層したものである。配向膜層8の一部が欠けた欠陥部8aが発生し、欠陥部8aからTFT電極層7が露出しているものとする。このような欠陥部8aは、たとえば、TFT電極層7の表面に異物が付着した状態で配向膜層8が成膜され、その後に異物が脱離した場合に発生する。TFT電極層7は、互いに交差して配置された複数のX電極および複数のY電極と、X電極とY電極の各交差部に配置されたTFTとを含む。   FIG. 4A is a cross-sectional view illustrating the substrate 5 to be corrected. In FIG. 4A, a substrate 5 is a TFT electrode substrate for a liquid crystal display device, in which a TFT electrode layer 7 and an alignment film layer 8 are laminated on the surface of a glass substrate 6. It is assumed that a defective portion 8a in which a part of the alignment film layer 8 is missing occurs and the TFT electrode layer 7 is exposed from the defective portion 8a. Such a defective portion 8a occurs, for example, when the alignment film layer 8 is formed in a state in which foreign matter adheres to the surface of the TFT electrode layer 7, and then the foreign matter is detached. The TFT electrode layer 7 includes a plurality of X electrodes and a plurality of Y electrodes arranged so as to intersect with each other, and TFTs disposed at respective intersections of the X electrodes and the Y electrodes.

図3(a)(b)で示した方法を用いて、図4(b)に示すように、欠陥部8aに修正液4を塗布した後、修正液4を硬化させることにより、欠陥部8aを修正することができる。このとき、塗布針4の少なくとも先端部の表面がセラミックで形成されているので、塗布針4の先端部とTFT電極層7の間で静電気の放電が発生してTFT電極層7がダメージを受けることはない。なお、この修正方法は、カラーフィルタ基板の最上層である配向膜層の欠陥部の修正にも適用可能であることは言うまでもない。   Using the method shown in FIGS. 3 (a) and 3 (b), as shown in FIG. 4 (b), after applying the correction liquid 4 to the defective portion 8a, the correction liquid 4 is cured, thereby causing the defective portion 8a. Can be corrected. At this time, since at least the surface of the tip of the application needle 4 is made of ceramic, electrostatic discharge occurs between the tip of the application needle 4 and the TFT electrode layer 7 and the TFT electrode layer 7 is damaged. There is nothing. Needless to say, this correction method can also be applied to correction of a defective portion of the alignment film layer which is the uppermost layer of the color filter substrate.

図5は、塗布針1を用いて修正液4を塗布する修正液塗布機構10の構成を示す一部省略した斜視図である。図5において、この修正液塗布機構10は、修正液塗布用の塗布針1と、塗布針1を垂直駆動させるための塗布針駆動シリンダ11とを含む。塗布針1は、保持部材13を介して塗布針駆動シリンダ11の駆動軸12の先端部に設けられる。   FIG. 5 is a partially omitted perspective view showing the configuration of the correction liquid application mechanism 10 that applies the correction liquid 4 using the application needle 1. In FIG. 5, the correction liquid application mechanism 10 includes an application needle 1 for applying correction liquid and an application needle drive cylinder 11 for driving the application needle 1 vertically. The application needle 1 is provided at the distal end portion of the drive shaft 12 of the application needle drive cylinder 11 via a holding member 13.

この修正液塗布機構10は、水平に設けられた回転テーブル14を含み、回転テーブル14上には円周方向に複数の修正液タンク17〜20が順次配置され、さらに、回転テーブル14上には洗浄装置21とエアパージ装置22とが設けられる。回転テーブル14の中心には回転軸15が立設されている。また、回転テーブル14には、修正液塗布時に針1を通過させるための切欠部16が形成されている。修正液タンク17〜20には、互いに異なる種類の修正液4が適宜注入されている。洗浄装置21は、塗布針1に付着した修正液4を除去するためのものであり、エアパージ装置22は塗布針1に付着した洗浄液を吹き飛ばすためのものである。   The correction liquid application mechanism 10 includes a rotary table 14 provided horizontally, and a plurality of correction liquid tanks 17 to 20 are sequentially arranged on the rotary table 14 in the circumferential direction. A cleaning device 21 and an air purge device 22 are provided. A rotary shaft 15 is erected at the center of the rotary table 14. Further, the rotary table 14 is formed with a notch 16 for allowing the needle 1 to pass when applying the correction liquid. Different types of correction fluids 4 are appropriately injected into the correction fluid tanks 17 to 20. The cleaning device 21 is for removing the correction liquid 4 attached to the application needle 1, and the air purge device 22 is for blowing off the cleaning liquid attached to the application needle 1.

さらに、この修正液塗布機構10は、回転テーブル14の回転軸15を回転させるためのインデックス用モータ23を含み、さらに回転軸15とともに回転するインデックス板24と、インデックス板24を介して回転テーブル14の回転位置を検出するためのインデックス用センサ25と、インデックス板24を介して回転テーブル14の回転位置が原点に復帰したことを検出するための原点復帰用センサ26とが設けられる。モータ23はセンサ25,26の出力に基づいて制御され、回転テーブル14を回転させて切欠部16、修正液タンク17〜20、洗浄装置21およびエアパージ装置22のうちいずれかを塗布針1の下方に位置させる。   Further, the correction fluid application mechanism 10 includes an index motor 23 for rotating the rotary shaft 15 of the rotary table 14, and further includes an index plate 24 that rotates together with the rotary shaft 15, and the rotary table 14 via the index plate 24. An index sensor 25 for detecting the rotation position of the rotary table 14 and an origin return sensor 26 for detecting that the rotation position of the rotary table 14 has returned to the origin via the index plate 24 are provided. The motor 23 is controlled based on the outputs of the sensors 25 and 26, and rotates the rotary table 14 so that any one of the notch 16, the correction liquid tanks 17 to 20, the cleaning device 21, and the air purge device 22 is below the application needle 1. To be located.

なお、塗布針駆動シリンダ11とモータ23はZ軸テーブル(図示せず)に固定され、Z軸テーブルと欠陥修正の対象となる基板5とは、塗布針1の下方のXYテーブル(図示せず)によって相対的に位置決めされる。   The application needle drive cylinder 11 and the motor 23 are fixed to a Z-axis table (not shown), and the Z-axis table and the substrate 5 to be repaired are an XY table (not shown) below the application needle 1. ) Relative positioning.

次に、この修正液塗布機構10の動作について説明する。まず、XYテーブルおよびZ軸テーブルが駆動され、基板5の欠陥部8aの上方の所定位置に塗布針1の先端が位置決めされる。次いで、モータ23によって回転テーブル14が回転され、所望の修正液タンク(たとえば17)が塗布針1の下に移動される。次に、塗布針駆動シリンダ11によって塗布針1が上下に駆動され、塗布針1の先端部に修正液4が付着される。   Next, the operation of the correction fluid application mechanism 10 will be described. First, the XY table and the Z-axis table are driven, and the tip of the application needle 1 is positioned at a predetermined position above the defective portion 8 a of the substrate 5. Next, the rotary table 14 is rotated by the motor 23, and a desired correction liquid tank (for example, 17) is moved below the application needle 1. Next, the application needle 1 is driven up and down by the application needle drive cylinder 11, and the correction liquid 4 is attached to the tip of the application needle 1.

次いで、モータ23によって回転テーブル14が回転され、切欠部16が塗布針1の下に移動される。次に、塗布針駆動シリンダ11によって塗布針1が下方に駆動され、塗布針1先端の平坦面3が欠陥部8aの一方端部に当接される。この状態でXYテーブルが駆動されて塗布針1が欠陥部8aの他方端部まで相対移動され、さらに、塗布針駆動シリンダ11によって塗布針1が上方に駆動される。これにより、塗布針1の先端部に付着した修正液4が基板5の欠陥部8aに塗布される。   Next, the rotary table 14 is rotated by the motor 23, and the notch 16 is moved below the application needle 1. Next, the application needle 1 is driven downward by the application needle drive cylinder 11, and the flat surface 3 at the tip of the application needle 1 is brought into contact with one end portion of the defective portion 8a. In this state, the XY table is driven so that the application needle 1 is relatively moved to the other end of the defective portion 8a, and the application needle 1 is driven upward by the application needle driving cylinder 11. As a result, the correction liquid 4 attached to the tip of the application needle 1 is applied to the defective portion 8 a of the substrate 5.

塗布針1の洗浄時は、モータ23によって回転テーブル14が回転され、洗浄装置21が塗布針1の下に移動される。次に、塗布針駆動シリンダ11によって塗布針1が上下に駆動され、塗布針1に付着した修正液4が洗浄される。次いで、モータ23によって回転テーブル14が回転され、エアパージ装置22が塗布針1の下に移動される。次に、塗布針駆動シリンダ11によって塗布針1が上下に駆動され、塗布針1に付着した洗浄液が吹き飛ばされる。   When cleaning the application needle 1, the rotary table 14 is rotated by the motor 23, and the cleaning device 21 is moved below the application needle 1. Next, the application needle 1 is driven up and down by the application needle drive cylinder 11, and the correction liquid 4 attached to the application needle 1 is washed. Next, the rotary table 14 is rotated by the motor 23, and the air purge device 22 is moved below the application needle 1. Next, the application needle 1 is driven up and down by the application needle drive cylinder 11, and the cleaning liquid adhering to the application needle 1 is blown off.

図6は、図5に示した修正液塗布機構10を搭載した欠陥修正装置の全体構成を示す図である。図6において、この欠陥修正装置は、大きく分類すると、観察光学系30、CCDカメラ31、レーザ32、修正液塗布機構10、および修正液硬化用照明33から構成される欠陥修正ヘッド部と、この欠陥修正ヘッド部を基板5に対して垂直方向(Z軸方向)に移動させるZ軸テーブル34と、Z軸テーブル34を搭載してX軸方向に移動させるためのX軸テーブル35と、基板5を搭載してY軸方向に移動させるためのY軸テーブル36と、装置全体の動作を制御する制御用コンピュータ37と、制御用コンピュータ37に作業者からの指令を入力するための操作パネル38から構成される。   FIG. 6 is a diagram showing an overall configuration of a defect correction apparatus equipped with the correction liquid application mechanism 10 shown in FIG. In FIG. 6, this defect correction apparatus can be roughly classified into a defect correction head unit including an observation optical system 30, a CCD camera 31, a laser 32, a correction liquid application mechanism 10, and a correction liquid curing illumination 33, and A Z-axis table 34 for moving the defect correction head portion in a direction perpendicular to the substrate 5 (Z-axis direction), an X-axis table 35 for mounting the Z-axis table 34 and moving it in the X-axis direction, and the substrate 5 From a Y-axis table 36 for moving in the Y-axis direction, a control computer 37 for controlling the operation of the entire apparatus, and an operation panel 38 for inputting instructions from the operator to the control computer 37 Composed.

観察光学系30は、基板5の表面状態や、修正液塗布機構10で修正液4を塗布した後の状態を観察するためのものである。観察光学系30によって観察される画像は、CCDカメラ31により電気信号に変換され、制御用コンピュータ37のモニタ画面に表示される。修正液硬化用照明33は、修正液塗布機構10で塗布された修正液4を硬化させるための光を照射する。修正液4が紫外線硬化タイプの場合は、紫外線照明が修正液硬化用照明33として選択されて装置に搭載される。修正液4が熱硬化タイプの場合は、ハロゲン照明が修正液硬化用照明33として選択されて装置に搭載される。レーザ32は、異物を除去するために用いられる。   The observation optical system 30 is for observing the surface state of the substrate 5 and the state after the correction liquid 4 is applied by the correction liquid application mechanism 10. An image observed by the observation optical system 30 is converted into an electric signal by the CCD camera 31 and displayed on the monitor screen of the control computer 37. The correction liquid curing illumination 33 irradiates light for curing the correction liquid 4 applied by the correction liquid application mechanism 10. When the correction liquid 4 is an ultraviolet curing type, the ultraviolet illumination is selected as the correction liquid curing illumination 33 and mounted on the apparatus. When the correction liquid 4 is a thermosetting type, the halogen illumination is selected as the correction liquid curing illumination 33 and mounted on the apparatus. The laser 32 is used to remove foreign matter.

今回開示された実施の形態はすべての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は上記した説明ではなくて特許請求の範囲によって示され、特許請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。   The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

この発明の一実施の形態による欠陥修正装置で用いられる塗布針の先端部の構成を示す図である。It is a figure which shows the structure of the front-end | tip part of the application needle | hook used with the defect correction apparatus by one Embodiment of this invention. 図1に示した塗布針の先端部の修正液付着状態を示す図である。It is a figure which shows the correction liquid adhesion state of the front-end | tip part of the application needle | hook shown in FIG. 図2に示した塗布針を用いた修正液塗布方法を示す図である。It is a figure which shows the correction liquid application | coating method using the application needle | hook shown in FIG. 修正対象の基板を例示する断面図である。It is sectional drawing which illustrates the board | substrate of correction object. 図1に示した塗布針を用いた修正液塗布機構の構成を示す図である。It is a figure which shows the structure of the correction liquid application | coating mechanism using the application needle | hook shown in FIG. 図5に示した修正液塗布機構を備えた欠陥修正装置の全体構成を示す図である。It is a figure which shows the whole structure of the defect correction apparatus provided with the correction liquid application | coating mechanism shown in FIG. カラーフィルタに発生する欠陥を示す図である。It is a figure which shows the defect which generate | occur | produces in a color filter. 従来の欠陥修正装置で用いられる塗布針の先端部の構成を示す図である。It is a figure which shows the structure of the front-end | tip part of the application needle | hook used with the conventional defect correction apparatus. 図8に示した塗布針の先端部の修正液付着状態を示す図である。It is a figure which shows the correction liquid adhesion state of the front-end | tip part of the application needle | hook shown in FIG. 図9に示した塗布針を用いた修正液塗布方法を示す図である。It is a figure which shows the correction liquid application | coating method using the application needle | hook shown in FIG. 図10に示した修正液塗布方法の効果を説明するための図である。It is a figure for demonstrating the effect of the correction liquid application | coating method shown in FIG. 図10に示した修正液塗布方法の効果を説明するための他の図である。It is another figure for demonstrating the effect of the correction liquid application | coating method shown in FIG.

符号の説明Explanation of symbols

1,61 塗布針、2 テーパ部、3,62,63 平坦面、4,64 修正液、5 基板、6,65 ガラス基板、7 TFT電極層、8 配向膜層、8a 欠陥部、10 修正液塗布機構、11 塗布針駆動シリンダ、12 駆動軸、13 保持部材、14 回転テーブル、15 回転軸、16 切欠部、17〜20 修正液タンク、21 洗浄装置、22 エアパージ装置、23 モータ、24 インデックス板、25 インデックス用センサ、26 原点復帰用センサ、30 観察光学系、31 CCDカメラ、32 レーザ、33 修正液硬化用照明、34 Z軸テーブル、35 X軸テーブル、36 Y軸テーブル、37 制御用コンピュータ、38 操作パネル、50 ブラックマトリクス、51 R画素、52 G画素、53 B画素、54 白欠陥、55 黒欠陥、56 異物欠陥、64 インク。   1,61 coating needle, 2 taper portion, 3,62,63 flat surface, 4,64 correction solution, 5 substrate, 6,65 glass substrate, 7 TFT electrode layer, 8 alignment film layer, 8a defect portion, 10 correction solution Application mechanism, 11 Application needle drive cylinder, 12 Drive shaft, 13 Holding member, 14 Rotation table, 15 Rotation shaft, 16 Notch, 17-20 Correction liquid tank, 21 Cleaning device, 22 Air purge device, 23 Motor, 24 Index plate , 25 Index sensor, 26 Origin return sensor, 30 Observation optical system, 31 CCD camera, 32 Laser, 33 Correction liquid curing illumination, 34 Z-axis table, 35 X-axis table, 36 Y-axis table, 37 Control computer 38 Operation panel 50 Black matrix 51 R pixel 52 G pixel 53 B pixel 54 White defect 55 black defect, 56 defective foreign matter, 64 ink.

Claims (6)

基板に液状材料を塗布する塗布機構において、
その先端に平坦面が形成され、その先端から軸方向に沿って漸次その断面が拡大するテーパ部が先端部に形成された塗布針と、
前記塗布針の先端部に前記液状材料を付着させて前記塗布針の先端を前記基板に接触させ、前記塗布針を前記基板に対して平行移動させて前記液状材料を塗布する駆動手段とを備えたことを特徴とする、塗布機構。
In an application mechanism that applies a liquid material to a substrate,
An application needle in which a flat surface is formed at the tip, and a tapered portion whose cross section gradually increases along the axial direction from the tip is formed at the tip.
Drive means for applying the liquid material by adhering the liquid material to the tip of the application needle, bringing the tip of the application needle into contact with the substrate, and moving the application needle in parallel with the substrate; An application mechanism characterized by that.
前記塗布針の少なくとも先端部は絶縁材料で形成されていることを特徴とする、請求項1に記載の塗布機構。   The coating mechanism according to claim 1, wherein at least a tip portion of the coating needle is formed of an insulating material. 前記絶縁材料はセラミックであることを特徴とする、請求項2に記載の塗布機構。   The coating mechanism according to claim 2, wherein the insulating material is ceramic. 請求項1から請求項3までのいずれかに記載の塗布機構を備え、
前記塗布機構は、前記基板上の欠陥部に前記液状材料を塗布して前記欠陥部を修正することを特徴とする、欠陥修正装置。
A coating mechanism according to any one of claims 1 to 3,
The defect correction apparatus, wherein the coating mechanism applies the liquid material to a defective portion on the substrate to correct the defective portion.
前記基板は、液晶表示装置用のTFT電極基板であり、
前記欠陥部は、前記TFT電極基板の最上層である配向膜層が正常に成膜されていない部分であることを特徴とする、請求項4に記載の欠陥修正装置。
The substrate is a TFT electrode substrate for a liquid crystal display device,
5. The defect correction apparatus according to claim 4, wherein the defect portion is a portion where an alignment film layer that is the uppermost layer of the TFT electrode substrate is not normally formed.
前記基板は、液晶表示装置用のカラーフィルタ基板であり、
前記欠陥部は、前記カラーフィルタ基板の最上層である配向膜層が正常に成膜されていない部分であることを特徴とする、請求項4に記載の欠陥修正装置。
The substrate is a color filter substrate for a liquid crystal display device,
5. The defect correction apparatus according to claim 4, wherein the defect portion is a portion where an alignment film layer that is the uppermost layer of the color filter substrate is not normally formed.
JP2007145667A 2007-05-31 2007-05-31 Defect correction device Expired - Fee Related JP5263861B2 (en)

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WO2022014642A1 (en) * 2020-07-15 2022-01-20 Ntn株式会社 Coating mechanism and coating apparatus
JP7362556B2 (en) 2020-07-15 2023-10-17 Ntn株式会社 Coating mechanism and coating device

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