JP2008296126A - Liquid-liquid mixing treatment apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid-liquid mixing treatment apparatus capable of efficiently stirring to mix a liquid with another liquid, and to provide a liquid-liquid mixing treatment apparatus capable of making the liquid efficiently react with the other liquid such as for neutralization of alkaline waste water. <P>SOLUTION: The apparatus comprises a treating tank containing a treating liquid, a rotating impeller structure having an impeller on a rotating shaft having a rotating drive structure provided therein, an additive liquid supplying structure for supplying an additive liquid into a rotating region, and a gas supplying structure for supplying a gas into the rotating region. The additive liquid supplying structure comprises an introducing space partially covering the rotating region of the impeller, and a supplying path communicating the introducing space with a supplying source. The additive liquid supplied into the introducing space is drawn in the rotating region with a negative pressure generated by the rotation of the impeller, and dispersed rapidly with a sharing force of the impeller and a liquid dispersion force of fine bubbles, thereby to be efficiently stirred and mixed to react with the treating solution. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention mainly mixes and mixes liquids and liquids appropriately and, if necessary, mixes liquids and liquids, for example, to efficiently perform a reaction between liquids and liquids, for example, neutralization reaction of alkaline wastewater. The present invention relates to a processing apparatus.

  In general, the liquid and the liquid are stirred and mixed by a rotary blade mechanism provided in the treatment tank. However, sufficient mixing of the two liquids cannot be obtained in a short time by simply rotating the rotor blade and stirring. In particular, in order to purify wastewater, it is not suitable for mixing involving a reaction that causes an oxidative decomposition of a COD component contained in wastewater by adding and mixing an aqueous oxidizing agent solution to the wastewater.

  For this reason, there exists what performs stirring by the bubbling stirring means by which a fine bubble is produced | generated. This technique provides a bubbling stirring means in which a plurality of impellers are provided at the lower end portion of a rotating shaft that also serves as an air suction pipe, and a plurality of air ejection holes are formed in the shaft periphery of the rotating shaft corresponding to the back surface portion of the impeller Is disposed in a treatment tank in which wastewater as a liquid to be treated is accommodated. An additive solution that is mixed with the wastewater and reacted, for example, an aqueous oxidizer solution such as an aqueous sodium hypochlorite solution, is supplied toward the spiral flow containing fine bubbles generated by the bubbling stirring means (Patent Document 1). .

JP-A-7-328658

  However, since the technique described in Patent Document 1 merely contacts the oxidant aqueous solution with the swirl flow of the wastewater generated by the bubbling stirring means, the mixing force is weak and the reaction between the wastewater and the oxidant aqueous solution is weak. ineffective. In order to solve this problem, if the impeller is enlarged so as to generate a large spiral flow, the apparatus becomes larger and the initial cost also increases. When a large amount of the oxidizing agent aqueous solution is added, the running cost is also increased.

  In the above prior art, the amount of the oxidizing agent aqueous solution is usually set to be fixed. Therefore, it is necessary to manually adjust the addition amount of the additive liquid with respect to the amount of waste water and the fluctuation of water quality. However, for example, in the neutralization reaction or the like, a fine adjustment of the addition amount is necessary, and the above prior art cannot substantially cope with it.

  In view of the above-mentioned problems of the prior art, the present invention can sufficiently mix liquids in a predetermined region while being relatively small, and it is sufficient to add a necessary and sufficient amount of the additive liquid to be added. An object of the present invention is to provide a liquid-liquid mixing apparatus capable of reducing the amount of the liquid.

  Another object of the present invention is to maintain a predetermined amount proportional to the target value by adding the amount of the additive liquid added to the liquid to be processed, thereby automatically responding to a predetermined reaction in response to the water quality and water amount fluctuation of the liquid to be processed. It is providing the liquid-liquid mixing processing apparatus which can obtain a result.

The present invention has the following configuration in order to achieve the above-described object.
That is, the present apparatus according to claim 1 is a rotating blade mechanism in which a plurality of impellers are provided at the other end of a rotating shaft provided with a rotation driving mechanism at one end in a processing tank containing a liquid to be processed. And an additive liquid supply mechanism for supplying the additive liquid into the rotation region of the impeller. The additive solution supply mechanism includes an additive solution supply source provided outside the processing tank, an introduction space provided above or below the rotation region of the impeller of the rotor blade mechanism and partially covering the rotor blade from above or below, A supply path that communicates the supply source with the introduction space. Then, the additive liquid is introduced from the supply source through the supply path into the rotation region of the impeller from the introduction space, and the liquid to be treated is stirred and mixed with the additive liquid by the shearing force of the impeller.

The rotary blade mechanism is generally one in which the rotation drive mechanism is located outside the treatment tank and the impeller is located in the treatment tank, but the rotation drive mechanism may also be arranged in the treatment tank. good.
The introduction space constituting the supply mechanism of the additive liquid is, for example, a space surrounded by a partition wall disposed above or below the impeller with a predetermined interval and an upper end of the impeller blade plate. The partition wall is formed by a horizontal portion facing the upper surface or the lower surface of the rotation region of the impeller and a peripheral wall portion (falling portion or rising portion) falling or rising from the horizontal plate portion. The leading end of the supply path opens in the horizontal portion or the peripheral wall portion or the horizontal portion and the peripheral wall portion that form the introduction space.

In the present invention, the apparatus according to claim 1 may be provided with a gas supply mechanism for supplying gas into the rotation region of the impeller (claim 3).
In this case, for example, at least the other end portion of the rotating shaft constituting the rotating blade mechanism is formed hollow and a discharge port is formed in the peripheral wall of the other end portion. The gas supply mechanism includes a gas supply source and a supply path that communicates the discharge port. And the to-be-processed liquid in a processing tank and the addition liquid discharged in the impeller rotation area | region from the introduction space were discharged from the shear force of the impeller, and the discharge port (center side of the impeller rotation area | region) of a rotating shaft. It is agitated and mixed by the liquid dispersion force of fine bubbles formed by gas. When the gas supply source is the atmosphere, the rotation axis may be a supply path that communicates with the discharge port.

  The discharge port provided in the rotating shaft is located at the peripheral surface of the end of the rotating shaft to which the impeller is attached, that is, around the lower end of the rotating shaft extending from the top to the bottom, and from the bottom to the rotating shaft. Is provided around the upper end. This discharge port is constituted by a large number of through holes, slits or openings formed in the peripheral wall at the other end of the rotating shaft.

  The gas supply mechanism may include a gas supply source, a discharge port that discharges the gas into the introduction space, and a supply path that communicates the supply source and the discharge port. In this case, the liquid to be processed in the treatment tank and the additive liquid discharged from the introduction space into the impeller rotation region are formed by the shear force of the impeller and the gas discharged from the introduction space into the impeller rotation region. The mixture is stirred and mixed by the liquid dispersion force of the fine bubbles.

  Both the gas supply mechanism and the additive liquid supply mechanism may have a structure having a plurality of supply paths and discharge ports.

According to a second aspect of the present invention, there is provided a rotating blade mechanism comprising a plurality of impellers provided at the other end of a rotating shaft having a rotation driving mechanism at one end in a processing tank in which a liquid to be processed is accommodated. In addition to being installed, an additive liquid supply mechanism and a gas supply mechanism for supplying the additive liquid or gas are provided in the rotation region of the impeller. Both supply mechanisms include respective supply sources of the additive liquid and gas, a supply path for supplying the additive liquid and gas individually or together to or within the impeller rotation region, and a discharge port provided at the tip of the supply path. Then, the liquid to be treated in the treatment tank and the additive liquid discharged in or near the impeller rotation area are formed by the shear force of the impeller and the fine bubbles formed by the gas discharged in or near the impeller rotation area. It is stirred and mixed by the liquid dispersion force.
Incidentally, in the apparatus of claim 2 or later, gas is supplied together with the additive liquid to mix the liquid to be treated and the additive liquid.

  3. The apparatus according to claim 2, wherein at the time of supplying the additive liquid to the liquid to be treated, at least the other end portion of the rotary shaft of the rotary blade mechanism is formed hollow and a discharge port is formed on the peripheral wall of the other end portion. The supply path of the additive liquid supply mechanism and the discharge port may be communicated with each other. In this case, the liquid to be processed in the treatment tank and the additive liquid discharged from the discharge port of the rotating shaft into the impeller rotation region are caused by the shear force of the impeller and the gas discharged in or near the impeller rotation region. The mixture is stirred and mixed by the liquid dispersion force of the fine bubbles to be formed (Claim 5).

  The apparatus according to claim 2, wherein at least the other end of the rotating shaft of the rotary blade mechanism is formed hollow and a discharge port is provided in the peripheral wall of the other end as another configuration aspect of the supply mechanism of the additive liquid and gas. It may be formed so that the supply passages of the additive liquid supply mechanism and the gas supply mechanism and the discharge port communicate with each other. In this case, the liquid to be treated in the treatment tank and the additive liquid discharged into the impeller rotation region from the discharge port of the rotating shaft are similarly applied to the shearing force of the impeller and the rotation region of the impeller from the discharge port of the rotation shaft. The mixture is agitated and mixed by the liquid dispersion force of fine bubbles formed by the discharged gas.

  In the apparatus according to claim 2, the supply mechanism for the additive liquid and the gas may be further configured. That is, at least the other end portion of the rotary shaft of the rotary blade mechanism is formed hollow and a discharge port is formed in the peripheral wall of the other end portion, and the supply path of the additive liquid supply mechanism and the discharge port are communicated with each other. The gas supply mechanism communicates the supply source and the introduction space with a gas supply source, an introduction space provided above or below the rotation region of the impeller of the rotor blade mechanism and partially covering the rotor blade from above or below. And a supply path. Then, the liquid to be treated in the treatment tank and the additive liquid discharged from the discharge port of the rotating shaft into the impeller rotation region are the shear force of the impeller and the gas discharged from the introduction space into the impeller rotation region. The mixture is agitated and mixed by the liquid dispersion force of the fine bubbles formed by (Claim 7).

In the apparatus according to claim 2, the supply mechanism of the additive liquid and the gas can be configured opposite to that of claim 5.
That is, at least the other end portion of the rotating shaft of the rotary blade mechanism is formed hollow and a discharge port is formed in the peripheral wall of the other end portion. The additive liquid supply mechanism has a discharge port facing the rotation region of the impeller. The gas supply mechanism has a supply path communicating with the discharge port. Then, the liquid to be treated in the treatment tank and the additive liquid discharged in or near the impeller rotation region are caused by the shear force of the impeller and the gas discharged into the rotation region of the impeller from the discharge port of the rotation shaft. The mixture is stirred and mixed by the liquid dispersion force of the fine bubbles to be formed (claim 8).

The present invention is also applicable to a case where a plurality of processing tanks are used.
In other words, a first rotary blade mechanism comprising a plurality of impellers at the other end of a rotating shaft having a rotational drive mechanism at one end is installed in the first processing tank containing the liquid to be processed. In addition, an additive liquid supply mechanism for supplying the additive liquid toward the rotation region of the impeller is provided. A second treatment tank that receives the primary treated water from the first treatment tank is provided in the first treatment tank. In this second treatment tank, a second rotary blade mechanism comprising a plurality of impellers is installed at the other end of a rotary shaft having a rotation drive mechanism at one end, and the impeller rotation region A gas supply mechanism for supplying gas is provided. And in a 1st processing tank, to-be-processed liquid and an additive liquid are stirred and mixed by the shear force of an impeller, and in a 2nd processing tank, primary treated water is driven by the shearing force of an impeller and the discharged gas. The mixture is stirred and mixed by the liquid dispersion force of the fine bubbles formed (claim 9).

In the apparatus according to claim 9, the following configuration may be added.
That is, in this apparatus, the gas supply mechanism supplies gas also toward the rotation region of the impeller provided in the first treatment tank. And in a 1st processing tank, a to-be-processed liquid and an addition liquid are stirred and mixed by the shear force of an impeller, and the liquid dispersion | distribution force of a fine bubble.

In the apparatus according to claims 9 and 10, the additive liquid supply mechanism provided in the first treatment tank may be configured as follows.
That is, the additive solution supply mechanism includes an additive solution supply source provided outside the processing tank, an introduction space provided above or below the rotation region of the impeller of the rotor blade mechanism and partially covering the rotor blade from above or below. And a supply path that communicates the supply source with the introduction space. Then, in the first treatment tank, the liquid to be treated and the additive liquid supplied from the introduction space into the impeller rotation region, the shearing force of the impeller, and the first and second treatment tanks or the second treatment tank The mixture is agitated and mixed by the liquid dispersion force of the fine bubbles formed by the gas discharged to the surface (claim 11).

  It is an apparatus of Claim 9, 10, Comprising: As another structure aspect of the additive liquid supply mechanism provided in a 1st processing tank, at least the said other end part of the rotating shaft of a rotary blade mechanism is formed hollow, and the other end part A discharge port may be formed in the peripheral wall, and the supply path of the additive liquid supply mechanism and the discharge port may be communicated with each other (claim 12).

The apparatus according to claims 9 and 10 may be modified as follows.
That is, at least the other end portion of the rotating shaft of the rotary blade mechanism provided in the first treatment tank is formed hollow and a discharge port is formed in the peripheral wall of the other end portion. The additive liquid supply mechanism includes an additive liquid supply source provided outside the processing tank, an introduction space provided above or below the rotation area of the impeller of the rotor blade mechanism and partially covering the rotor blade from above or below, and supply A supply path that communicates the source and the introduction space. The gas supply mechanism has a supply path communicating with the discharge port. Then, the liquid to be treated in the treatment tank and the additive liquid supplied from the introduction space into the impeller rotation region are formed by the shear force of the impeller and the gas discharged from the discharge port into the impeller rotation region. The mixture is stirred and mixed by the liquid dispersion force of the fine bubbles.

  In the apparatus of the present invention, the type of the liquid to be treated and the additive liquid to be applied are not particularly limited. For example, when used as a neutralizer, the liquid to be treated is an alkaline or acidic waste water, and the additive liquid Becomes a neutralizing agent for neutralizing the wastewater. Various types of gas may be employed depending on the purpose of the apparatus. In general, air is used, but in the case of a neutralizer, carbon dioxide gas is used. Thereby, it becomes possible to neutralize alkaline or acidic wastewater in two stages with a neutralizing agent and carbon dioxide.

  The apparatus of the present invention may further be provided with an automatic control device for proportionally controlling the flow rate of the additive solution.

  According to the present invention, since the additive liquid is supplied into the rotation area of the impeller provided in the treatment tank in which the liquid to be processed is accommodated, the additive liquid is caused to enter the rotation area by the negative pressure generated by the rotation of the impeller. The two liquids can be reliably mixed using the shearing force of the impeller. For this reason, not only can a small-sized mixing processing apparatus be provided, but also the additive liquid can be made into a necessary and sufficient amount, so that the initial cost and running cost can be reduced.

  In particular, according to the inventions according to claims 1, 3, 4, 11 and 13, since the introduction space is provided above or below the impeller, the rotation region of the impeller and the impeller without being dispersed in the liquid to be treated, and The liquid can be quickly and uniformly distributed around the periphery, and both liquids can be mixed without waste.

  According to the fifth, sixth, seventh and twelfth aspects of the present invention, the additive liquid is supplied to the inside of the impeller rotation region from the discharge port formed at the end of the rotary shaft via the supply pipe. Can be uniformly distributed and supplied only to the impeller rotation region without being dispersed in the liquid to be treated, and both liquids can be mixed without waste.

  According to the inventions according to claims 2 to 14, since not only the additive liquid but also gas is supplied into the processing tank in which the liquid to be processed is accommodated, the apparent specific gravity of the liquid to be processed is reduced and stirring by the impeller In addition, the shearing action can be obtained by the swirling flow of fine bubbles generated in the rotating region of the impeller, and the mixing treatment of the liquid to be treated and the additive liquid can be performed efficiently.

  According to the fifteenth aspect of the invention, since the flow rate of the additive liquid supplied into the impeller rotation region is maintained at a constant value proportional to the target value, the water quality of the liquid to be treated and the fluctuation of the water amount are automatically dealt with. To obtain a predetermined reaction result. In particular, as in the invention according to claim 14, when used as a neutralization device, the amount of additive liquid added can be finely controlled, and a stable and economically efficient device can be provided. is there.

Hereinafter, the best mode for carrying out the present invention will be described in detail together with illustrated examples.
FIG. 1 is a conceptual configuration diagram of an apparatus according to an embodiment of the present invention, and FIG. 9 is an enlarged view of a main part thereof.
In the figure, reference numeral 1 is a treatment tank in which wastewater such as a cement factory which is a liquid to be treated is accommodated, and a rotary blade mechanism 2 is installed therein. The rotary blade mechanism 2 includes a motor 3 fixed outside the tank, a rotary shaft 4 driven to rotate by the motor 3, and an impeller 5 projecting radially on the lower peripheral surface of the rotary shaft 4. . The rotary blade mechanism 2 is installed by immersing a part of the rotary shaft 4 in the liquid to be treated.

In the impeller 5, the lower end of each vane plate 5a is connected by a bottom plate 5b, while the upper end 5c of each vane plate 5a has a notch 6 at the outer end.
Reference numeral 7 denotes an introduction space for the additive liquid provided above the impeller 5. The introduction space 7 is formed by a partition wall 9 fixed to the lower end of the guide 8 that covers the rotating shaft 4 in the longitudinal direction, and the upper end 5c of the impeller blade plate 5a. The partition wall 9 includes a horizontal portion 9a facing the impeller upper end 5c with a gap, and a falling portion 9b falling from the outer peripheral end of the horizontal portion 9a to a notch 6 at the upper end of the impeller blade plate 5a ( (See the enlarged view of the main part in FIG. 9).

  Reference numeral 11 denotes a supply pipe line that communicates the supply source 10 of the additive liquid (for example, sulfuric acid in the case of cement wastewater) installed outside the treatment tank 1 and the introduction space 7. The front end of the supply pipe 11 is opened in the horizontal portion 9a of the partition wall 9 that forms the introduction space 7 (forms a discharge port), and the additive liquid is discharged from above the introduction space 7 toward the rotation region of the impeller 5. The

Reference numeral 12 denotes a control device for controlling the flow rate of the additive liquid that is interposed in the middle of the supply pipe 11.
The control device 12 includes a proportional control device that maintains a flow rate at a constant value proportional to a target value.

Although not shown, the tip of the supply pipe line can be opened at the falling portion of the partition wall. The additive liquid is discharged in the horizontal direction into the introduction space through the supply pipe line. Such means for supplying the additive liquid may be provided in both the falling part and the horizontal part of the partition wall.
Moreover, you may comprise a partition wall only by a horizontal part. The introduction space is a space portion formed between the partition wall formed only of the horizontal portion and the upper end of the impeller blade plate. The front end of the supply pipe is opened in the horizontal part.
The introduction space can also be provided below the impeller. In this case, the blade plate is connected at the upper end by the upper plate and does not have the bottom plate. The tip of the supply pipe is opened at the same position as in the above-described embodiment.
Further, the rotary blade mechanism may be of a type that is submerged in water.

In any case, when the mixing processing apparatus configured as described above drives the motor 3 to rotate the rotating shaft 4 and the impeller 5, a negative pressure is generated in the rotating region of the impeller 5. The additive liquid supplied to the introduction space 7 through the supply pipe 11 is diffused upward because the upper portion of the introduction space 7 is surrounded by the horizontal portion 9a and the falling portion 9b of the partition wall 9. Instead, it receives the negative pressure of the impeller 5 and is dragged inward from the outer end of the rotation area of the impeller 5. The dragged-in additive liquid is refined by receiving the shearing force of the impeller blade plate 5a, and combined with the stirring force of the impeller blade plate 5a, quickly and quickly into the liquid to be treated in the rotation region of the impeller 5 and in the peripheral portion. Evenly dispersed and efficiently mixed with the liquid to be treated.
At this time, the flow rate of the additive liquid is proportionally controlled by the control device 12. For example, when the present apparatus is a neutralization apparatus using cement wastewater as a liquid to be treated, sulfuric acid as an additive liquid is supplied in an appropriate amount according to the pH value and the liquid amount of cement wastewater. As a result, in the neutralizing device in which the pH value is likely to fluctuate slightly depending on the addition amount of the additive solution, stable mixing can be performed in response to the fluctuation of the pH value immediately.
Further, the impeller 5 may be a normal impeller in which the upper end of the blade plate 5a is connected by a disk-shaped upper plate. In this case, the additive liquid supplied to the introduction space is dragged from the outer peripheral end of the introduction space to the outer periphery of the rotation area of the impeller, and mixed with the liquid to be processed.
Further, the blade plate 5a may have a structure not having a notch at the upper end.

FIG. 2 is a conceptual block diagram of an apparatus according to another embodiment of the present invention.
The rotary blade mechanism 22 has a rotating shaft 24 that is hollow, and a plurality of through holes (not shown) are formed on the outer periphery of the lower portion to which the impeller 25 is attached. The through-hole is configured by a small-diameter circular hole as in the conventional case. Of course, it may be a slit or an opening of various shapes.
The leading end of the communication pipe 34 from the gas supply source 33 is opened above the guide 28 that covers the rotating shaft 24 in the longitudinal direction. Thus, although not shown, the gas released to the opening passes through the inside of the rotary shaft 24 from the through hole provided in the upper portion of the rotary shaft 24 and is released from the through hole on the outer periphery of the lower end of the rotary shaft. When the gas supply source is the atmosphere, the rotating shaft serves as the communication pipe 34, and the gas passes through the rotating shaft 24 from the rotating shaft upper through hole and is released from the through hole at the outer periphery of the lower end of the rotating shaft.
The structure for forming the additive liquid introduction space 27 is the same as that of the embodiment of FIG. The introduction space 27 is formed above the impeller 25, and the tip of the additive liquid supply pipe 31 is opened in the horizontal portion and / or the falling portion of the partition wall. In the figure, reference numeral 30 is a supply source of the additive liquid.

In the apparatus according to the present embodiment, not only the additive liquid is supplied into the rotating region of the impeller 25 by negative pressure, but also gas is released from the through hole. The gas is sucked from the gas supply source through the communication pipe by the negative pressure and is released into the impeller rotation region, but in some cases, the gas may be forcibly supplied. The released gas becomes fine bubbles due to the shearing force of the impeller 25, and generates a vortex in and around the rotation region of the impeller 25. For this reason, the liquid to be treated and the additive liquid are mixed and processed even better not only by the shearing force and stirring force of the impeller 25 but also by the vortex. Further, by introducing bubbles into the liquid, the apparent specific gravity is reduced, and a high stirring force can be obtained with a small amount of power.

The gas may be supplied from below the rotating shaft. FIG. 3 shows an example.
In this case, at least the lower end portion 44a of the rotating shaft 44 of the rotary blade mechanism 42 is hollow, and a plurality of through holes (not shown) are formed on the peripheral surface of the rotating shaft lower end portion 44a. The gas supply source 53 and the rotating shaft lower end 44 a are connected via a communication pipe 54.
The additive solution introduction space 47 is provided below the impeller. In the figure, reference numeral 49 is a partition wall for forming an introduction space, 50 is a supply source of the additive liquid, 51 is a supply pipe for the additive liquid, and its tip opens to the horizontal part and / or the rising part of the partition wall. ing. From FIG. 8 to FIG. 8, the description is simplified as compared with FIG. 1 and FIG. 2, while the discharge port is described in a rectangular shape at the tip of the supply pipe and the tip of the communication pipe.

In the embodiment of FIGS. 2 and 3 in which the gas is diffused from the inside of the rotation region of the impeller through the hollow portion of the rotating shaft, various means described in the embodiment of FIG. For example, the wall may consist only of a horizontal portion, and the leading end of the supply pipe opens into the horizontal portion.
In addition, when the partition wall is composed of both a horizontal part and a falling part (or a rising part), the gas may be branched in the middle and the leading end of the branch pipe may be opened at these parts. good.
Although not shown, contrary to FIGS. 2 and 3, the additive liquid is discharged into the impeller rotation region from the through hole at the outer periphery of the lower end of the hollow rotation shaft, and the gas is discharged from the introduction space to the impeller rotation region. May be.

FIG. 4 is a conceptual configuration diagram of an apparatus according to still another embodiment of the present invention.
In this embodiment, the tip of the gas communication pipe 74 is opened to the horizontal portion and / or the falling portion of the partition wall 69 that forms the introduction space in the same manner as the tip of the additive liquid supply conduit. is there. 70 is an additive liquid supply source, and 73 is a gas supply source.
Like the additive liquid, the gas is drawn into the rotation region of the impeller 65 by the negative pressure accompanying the rotation of the impeller 65 and is sheared by the blades of the impeller 65. The additive liquid is mixed with the liquid to be processed by stirring and shearing the impeller and the vortex of the gas as in the embodiment of FIGS. 2 and 3.
When introducing gas from a partition wall, the thing of the various aspect of each above-mentioned Example is employable as a structure of a partition wall.

FIG. 5 is a conceptual configuration diagram of an apparatus according to still another embodiment of the present invention.
In this example, the introduction space by the partition wall is not formed in the rotary blade mechanism 82. Instead, the rotary shaft 84 of the rotary blade mechanism 82 is formed in a hollow shape, and the addition liquid and gas are supplied from the inside into the rotation region of the impeller 85 through a large number of through holes formed in the peripheral surface of the lower end of the rotary shaft. Is done. That is, as shown in the figure, the distal end of the supply liquid supply pipe 91 communicates with the lower end of the rotating shaft, while the distal end of the gas communication tube 94 communicates with the upper end of the rotating shaft. The additive liquid passes through the through hole from below the rotation shaft 84 and is discharged into the impeller rotation region, and the gas is guided from the upper end of the rotation shaft 84 and discharged into the impeller rotation region from the through hole.
In the figure, reference numeral 90 denotes a supply source of the additive liquid, and 93 denotes a gas supply source.
The mixing process of the additive liquid and the liquid to be processed in this apparatus is performed in the same manner as shown in FIGS.

FIG. 6 is a conceptual block diagram showing a modification of the apparatus of FIG.
In this apparatus, at least the lower end of the rotating shaft is hollow, the additive liquid and the gas are supplied from below the rotating shaft 104, and the impeller 105 has a through hole formed in the peripheral surface of the lower end of the rotating shaft. Released into the rotating region.
In the figure, reference numeral 110 denotes a supply source of the additive liquid, 111 denotes a supply pipe for the additive liquid, 113 denotes a gas supply source, and 114 denotes a gas communication pipe.
Although not shown, contrary to FIG. 6, the additive liquid and gas may be supplied from the upper end of the hollow rotary shaft toward the through hole formed in the lower end of the rotary shaft.

FIG. 7 is a conceptual configuration diagram showing another example of an apparatus in which the rotary blade mechanism 122 does not have an introduction space, similarly to FIGS. 5 and 6.
In this apparatus, at least the lower end portion of the rotating shaft 124 is formed hollow, and a large number of through holes are provided on the outer periphery of the lower end portion of the rotating shaft. The tip of the additive liquid supply pipe 131 extending from the supply source 130 is communicated with the lower end of the rotating shaft. The front end of the communication passage 134 extending from the gas supply source 133 has a discharge opening at a position close to the rotation region of the impeller 125 (in this case, a position close to the upper end of the blade plate of the impeller 125).
Therefore, with the rotation of the rotating shaft 124, the additive liquid is discharged into the impeller rotating region from the through hole at the lower end of the rotating shaft, and the gas is introduced from above the impeller blade plate by the negative pressure generated by the impeller rotation. Led in.

The supply means for the additive liquid and gas can be reversed from that shown in FIG. The tip of the gas communication path is communicated with the lower end of the rotating shaft, and the tip of the supply pipe for the additive liquid is disposed at a position close to the rotation area of the impeller.
Further, by making the entire rotating shaft hollow, the gas or the additive liquid may be supplied from the upper end of the rotating shaft.
Further, a through hole may be provided on the outer periphery of the rotary shaft end portion and supplied from the through hole.
The disposition position of the discharge port at the front end of the communication passage or the front end of the supply pipe provided near the impeller rotation region may be the horizontal position of the impeller rotation region.

  In addition, as an example of an apparatus in which the rotor blade mechanism does not have an introduction space, the discharge port at the front end of the gas communication path and the front end of the supply pipe of the additive liquid can be disposed opposite to the position close to the rotation area of the impeller. .

FIG. 8 is a conceptual configuration diagram of an apparatus according to still another embodiment of the present invention.
In this embodiment, the processing tank 141 is divided into a first processing tank 141F and a second processing tank 141S by a partition wall 141G.
In the first treatment tank 141F, a liquid to be treated is accommodated, and a first rotary blade mechanism 142F having an impeller 145F having a plurality of blade plates at the lower end of the rotary shaft 144F is installed. The first rotary blade mechanism 142F has the same structure as the rotary blade mechanism shown in the embodiment of FIG. That is, an introduction space 147 surrounded by the blade upper end and the partition wall is provided above the impeller 145F provided at the lower end of the rotating shaft 144F.
Further, the first treatment tank 141F is provided with an additive liquid supply mechanism that supplies the additive liquid toward the rotation region of the impeller. This supply mechanism has a supply source 150 of the additive liquid and a supply pipe 151 extending therefrom, and the front discharge port of the supply pipe is opened at the horizontal portion and / or the falling portion of the partition wall.

The second treatment tank 141S receives the primary treated water from the first treatment tank 141F, and an impeller having a plurality of blades at the lower end of the rotating shaft 144S is provided in the second treatment tank. The provided second rotary blade mechanism 142S is installed.
The rotary shaft 144S of the second rotary blade mechanism 142S is formed in a hollow shape, and includes a large number of through holes in the upper surface and a peripheral surface of the lower end portion to which the impeller 145S is attached. Release into the rotating area.

Therefore, in the apparatus according to the present embodiment, when the impeller 145F of the first rotary blade mechanism 142F rotates in the first treatment tank 141F, the additive liquid is introduced from the introduction space 147 by the negative pressure generated in the rotation region. It is drawn into the rotation area. Then, the additive liquid is refined by the shearing force of the impeller 145F and uniformly dispersed in the liquid to be processed, and is mixed with the liquid to be processed by the stirring force of the impeller 145F.
The primary treated water subjected to the mixing treatment flows into the second treatment tank. In the second treatment tank 141S, the second rotary blade mechanism 142S rotates the impeller 145S. Due to the negative pressure generated along with this, gas passes from the gas supply source 153 through the inside of the rotating shaft, and is discharged as bubbles from the through hole into the rotating region. The bubbles are subdivided by the impeller 145S to become fine bubbles. The liquid to be treated and the additive liquid are further mixed by the vortex flow of the fine bubbles and the above-described action force of the impeller 145S.

When this mixing treatment apparatus is used as a neutralization apparatus, if the liquid to be treated is alkaline waste water, the additive liquid is used, for example, sulfuric acid as a neutralizing agent for neutralizing the waste water, and gas is used. When used in combination, carbon dioxide gas may be used. In particular, neutralization to a predetermined pH value can be easily performed by using an automatic control device using the proportional control described above. Moreover, by using together the carbon dioxide gas which is a weak acid, neutralization in the vicinity of the neutral region where the addition amount needs to be finely adjusted can be easily performed.
For acidic wastewater, an alkaline neutralizing agent is used as an additive solution.

  In the case of a plurality of treatment tanks as shown in FIG. 8, the configurations of the first rotary blade mechanism and the additive liquid supply mechanism can be combined with those of the various embodiments described in FIGS. For example, the rotary shaft is hollow and the additive liquid and / or gas is discharged from the through hole of the rotary shaft. In addition, an additive liquid supply mechanism and a gas supply mechanism may be provided in the first treatment tank so that the gas dispersion action is performed twice in the first treatment tank and the second treatment tank. These are appropriately selected depending on the relationship between the liquid to be treated and the additive liquid.

  In the case of a plurality of treatment tanks as shown in FIG. 8, the configurations of the second rotary blade mechanism and the gas supply mechanism can be employed in combination with the various embodiments described in FIGS. 1 to 7. Any device may be used as long as it generates bubbles capable of obtaining a liquid dispersion force. For example, those disclosed in Japanese Examined Patent Publication Nos. Sho 62-15249 and 62-34436 can be used. These are appropriately selected depending on the relationship between the liquid to be treated and the additive liquid.

  In the case of a plurality of treatment tanks as shown in FIG. 8, the number of treatment tanks is not limited to two. The number of processing tanks, the configuration of the rotary blade mechanism and additive liquid supply mechanism installed in the processing tank, and the configuration of the rotary blade mechanism and gas supply mechanism are appropriately selected depending on the relationship between the liquid to be processed and the additive liquid.

When using this equipment by immersing this device in the liquid to be treated using an underwater motor, the motor is attached to the lower end of the rotating shaft, and the impeller is disposed at the upper end of the rotating shaft. Can also be implemented. When the additive liquid and / or gas is discharged from the hollow rotating shaft, a through hole is provided on the peripheral surface of the upper end portion of the rotating shaft.
The automatic control apparatus for the additive solution described with reference to the embodiment of FIG. 1 can also be adopted as needed when supplying the additive solution in the apparatus of FIG.

The conceptual block diagram of the apparatus which concerns on one Embodiment of this invention. The conceptual block diagram of the apparatus which concerns on different embodiment of this invention. The conceptual block diagram of the apparatus which concerns on another embodiment of this invention. The conceptual block diagram of the apparatus which concerns on another embodiment of this invention. The conceptual block diagram of the apparatus which concerns on another embodiment of this invention in which a rotary blade mechanism does not have introduction space. The conceptual block diagram of the apparatus which concerns on the modification of the apparatus of FIG. The conceptual block diagram which shows the other example of the apparatus in which a rotary blade mechanism does not have introduction space. The conceptual block diagram of the apparatus which concerns on another embodiment of this invention with a some processing tank. The principal part enlarged view of the apparatus of FIG.

Explanation of symbols

1,141 Treatment tanks 2, 22, 42, 62, 82, 102, 122, 142F, 142S Rotary blade mechanism 3 Motors 4, 24, 44, 64, 84, 104, 124, 144F, 144S Rotating shaft 5, 25, 45, 65, 85, 105, 125, 145F, 145S Impeller 6 Notch 7, 27, 47, 147 Introduction space 8 Guide 9, 29, 49, 79 Partition wall 12 Control device

Claims (15)

A rotating blade mechanism comprising a plurality of impellers provided at the other end of a rotating shaft provided with a rotation driving mechanism at one end is installed in a processing tank in which a liquid to be processed is accommodated, and within the rotation region of the impeller An additive liquid supply mechanism for supplying the additive liquid to
The supply mechanism of the additive liquid includes an additive liquid supply source provided outside the processing tank, and an introduction space that is provided above or below the rotation region of the impeller of the rotor blade mechanism and partially covers the rotor blade from above or below. A supply path that communicates the supply source with the introduction space,
The additive liquid is introduced from the supply source through the supply path into the rotation region of the impeller from the introduction space,
The liquid to be treated is stirred and mixed with the additive liquid by the shearing force of the impeller.
A liquid-liquid mixing apparatus characterized by that. A rotating blade mechanism comprising a plurality of impellers provided at the other end of a rotating shaft provided with a rotation driving mechanism at one end is installed in a processing tank in which a liquid to be processed is accommodated, and within the rotation region of the impeller An additive liquid supply mechanism and a gas supply mechanism for supplying an additive liquid or gas to
Each of the supply mechanisms includes a supply source of additive liquid and gas, a supply path for supplying the additive liquid and gas individually or together to or near the impeller rotation region, and a discharge port provided at the tip of the supply path.
Dispersion of fine bubbles formed by the liquid to be treated in the treatment tank and the additive liquid discharged in or near the impeller rotation region by the shear force of the impeller and the gas discharged in or near the impeller rotation region Stirred and mixed by force,
A liquid-liquid mixing apparatus characterized by that. The apparatus of claim 1.
Furthermore, a gas supply mechanism for supplying gas into the rotation region of the impeller is provided,
The rotating blade mechanism has at least the other end portion of the rotating shaft formed hollow and a discharge port formed in the peripheral wall of the other end portion,
The gas supply mechanism includes a gas supply source and a supply path that communicates the discharge port.
Liquid dispersion of fine bubbles formed by the liquid to be processed in the treatment tank and the additive liquid discharged from the introduction space into the impeller rotation region by the shear force of the impeller and the gas discharged from the discharge port of the rotating shaft Stirred and mixed by force,
A liquid-liquid mixing apparatus characterized by that. The apparatus of claim 1.
Furthermore, a gas supply mechanism for supplying gas into the rotation region of the impeller is provided,
The gas supply mechanism includes a gas supply source, a discharge port that discharges gas into the introduction space, and a supply path that communicates the supply source and the discharge port.
The liquid to be treated in the treatment tank and the additive liquid discharged from the introduction space into the impeller rotation region are formed by the shear force of the impeller and fine bubbles formed by the gas introduced from the introduction space into the impeller rotation region. Agitated and mixed by liquid dispersion force,
A liquid-liquid mixing apparatus characterized by that. The rotating blade mechanism has at least the other end portion of the rotating shaft formed hollow and a discharge port formed in the peripheral wall of the other end portion,
In the additive solution supply mechanism, the supply path and the discharge port are communicated with each other,
The liquid to be treated in the treatment tank and the additive liquid discharged into the impeller rotation region from the discharge port of the rotating shaft are formed by the shearing force of the impeller and the gas discharged in or near the rotation region of the impeller. Agitated and mixed by the liquid dispersion force of fine bubbles,
The liquid-liquid mixing apparatus according to claim 2. The rotating blade mechanism has at least the other end portion of the rotating shaft formed hollow and a discharge port formed in the peripheral wall of the other end portion,
In each of the additive liquid supply mechanism and the gas supply mechanism, each supply path communicates with the discharge port.
The liquid to be treated in the treatment tank and the additive liquid discharged from the discharge port of the rotating shaft into the impeller rotation region are similarly discharged from the discharge port of the rotation shaft into the rotation region of the impeller. Agitated and mixed by the liquid dispersion force of the fine bubbles formed by the gas
The liquid-liquid mixing apparatus according to claim 2. The rotating blade mechanism has at least the other end portion of the rotating shaft formed hollow and a discharge port formed in the peripheral wall of the other end portion,
In the additive solution supply mechanism, the supply path and the discharge port are communicated with each other,
The gas supply mechanism communicates a gas supply source, an introduction space provided above or below the rotation region of the impeller of the rotor blade mechanism and partially covering the rotor blade from above or below, and the supply source and the introduction space. And a supply path to
The liquid to be treated in the treatment tank and the additive liquid discharged from the discharge port of the rotating shaft into the impeller rotation region are formed by the shear force of the impeller and the gas discharged from the introduction space into the impeller rotation region. Agitated and mixed by the liquid dispersion force of the fine bubbles to be
The liquid-liquid mixing apparatus according to claim 2. The rotating blade mechanism has at least the other end portion of the rotating shaft formed hollow and a discharge port formed in the peripheral wall of the other end portion,
The additive solution supply mechanism has a discharge port facing the rotation region of the impeller,
The gas supply mechanism is in communication with a discharge port formed in the peripheral wall of the other end of the rotating shaft.
The liquid to be processed in the treatment tank and the additive liquid discharged into the impeller rotation region are formed by the shearing force of the impeller and the gas discharged into the rotation region of the impeller from the discharge port of the rotation shaft. Agitated and mixed by the liquid dispersion force of the bubbles,
The liquid-liquid mixing apparatus according to claim 2. In the first treatment tank containing the liquid to be treated, a first rotary blade mechanism comprising a plurality of impellers at the other end of the rotary shaft having a rotation drive mechanism at one end is installed. , Provided with an additive liquid supply mechanism for supplying the additive liquid toward the rotation region of the impeller,
In the first treatment tank, a second treatment tank that receives the primary treated water from the first treatment tank is provided,
In this second treatment tank, a second rotary blade mechanism comprising a plurality of impellers is installed at the other end of a rotary shaft having a rotation drive mechanism at one end, and the impeller rotation region A gas supply mechanism for supplying gas toward the
In the first treatment tank, the liquid to be treated and the additive liquid are stirred and mixed with the additive liquid by the shearing force of the impeller,
In the second treatment tank, the primary treated water is stirred and mixed by the shear force of the impeller and the liquid dispersion force of the fine bubbles formed by the discharged gas.
A liquid-liquid mixing apparatus characterized by that. The apparatus of claim 9.
The gas supply mechanism further supplies gas toward the rotation region of the impeller provided in the first treatment tank,
In the first treatment tank, the liquid to be treated and the additive liquid are agitated and mixed by the shear force of the impeller and the liquid dispersion force of the fine bubbles formed by the discharged gas.
A liquid-liquid mixing processing mechanism. The additive solution supply mechanism provided in the first treatment tank is provided above or below the rotation region of the impeller of the rotary blade mechanism and the supply source of the additive liquid provided outside the treatment tank, and the rotary blades are arranged from above or below. A partially covering introduction space, and a supply path that communicates the supply source and the introduction space;
In the first treatment tank, the liquid to be treated and the additive liquid supplied into the impeller rotation region from the introduction space are separated by the shearing force of the impeller and the liquid dispersion force of the fine bubbles formed by the discharged gas. Stirring, mixing,
The liquid-liquid mixing processing apparatus according to claim 9 and 10. The rotary blade mechanism provided in the first treatment tank has a hollow at least the other end of the rotating shaft and a discharge port formed on the peripheral wall of the other end.
In the additive solution supply mechanism, the supply path and the discharge port are communicated with each other,
The liquid to be treated in the treatment tank and the additive liquid discharged into the impeller rotation region from the discharge port of the rotating shaft are caused by the shear force of the impeller and the liquid dispersion force of the fine bubbles formed by the discharged gas. Stirring, mixing,
The liquid-liquid mixing processing apparatus according to claim 9 and 10. The rotary blade mechanism provided in the first treatment tank has a hollow at least the other end of the rotating shaft and a discharge port formed on the peripheral wall of the other end.
The additive solution supply mechanism includes an additive solution supply source provided outside the processing tank, an introduction space that is provided above or below the rotation region of the impeller of the rotor blade mechanism and partially covers the rotor blade from above or below, A supply path that communicates the supply source with the introduction space;
In the gas-liquid supply mechanism, a supply path is communicated with a discharge port formed in the peripheral wall at the other end of the rotating shaft,
The liquid to be treated in the treatment tank and the additive liquid supplied from the introduction space into the impeller rotation area are formed by the shearing force of the impeller and the gas discharged into the rotation area of the impeller from the discharge port of the rotating shaft. Agitated and mixed by the liquid dispersion force of the fine bubbles to be
The liquid-liquid mixing processing apparatus according to claim 9 and 10 The liquid to be treated is alkaline or acidic waste water,
The additive solution is a neutralizing agent that neutralizes this wastewater,
The gas is carbon dioxide gas,
Alkaline or acidic wastewater is neutralized in two stages with a neutralizing agent and carbon dioxide,
The liquid-liquid mixing apparatus according to any one of claims 2 to 13. The device according to any of claims 1 to 14,
An automatic control device for proportionally controlling the flow rate of the additive solution;
A liquid-liquid mixing apparatus characterized by that.

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