JP2008240122A - Sheet plasma apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a sheet plasma apparatus capable of removing reaction products formed on an anode. <P>SOLUTION: The sheet plasma apparatus 100 comprises: a pressure-reducible container 60 whose inside can be pressure-reduced; a plasma gun 10; a planar anode 51 receiving plasma at the inside of the pressure-reducible vessel; a sheet plasma deforming tank 20 formed so as to form a part of the pressure-reducible vessel, fluidizing columnar plasma 22 to the inside thereof and deforming the columnar plasma into sheet-shaped plasma 27; a film deposition tank 30 formed so as to form a part of the pressure-reducible vessel; a rotary mechanism 75 rotating the anode; a permanent magnet 52 arranged at the back of the anode and also on the central axis 22 of the columnar plasma; a cleaning member 76 arranged at a position far from the sheet-shaped plasma so as to be confronted with the front face of the anode; a pressing mechanism 81 pressing the cleaning member against the anode; and a shielding plate 82 arranged between the cleaning member and the sheet-shaped plasma. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a sheet plasma apparatus that performs film formation by sputtering using plasma formed in a sheet shape (hereinafter referred to as sheet-shaped plasma), and more particularly to a technique for cleaning an anode provided in the sheet plasma apparatus.

  In recent years, a sheet is formed by using a sheet-like plasma (hereinafter referred to as a sheet-like plasma) formed by applying a magnetic field generated by a permanent magnet to a cylindrical plasma generated from a plasma source (hereinafter referred to as a cylindrical plasma). Attention has been focused on plasma devices (see Patent Document 1). In this sheet plasma apparatus, a cylindrical plasma flow from the cathode side is formed into a sheet plasma by a permanent magnet, and this sheet plasma is guided to an anode using a magnetic field coil. Then, sputtered particles are generated from the target in the sputtering chamber by the action of the flowing sheet-like plasma, and a film is formed on the substrate. This makes it possible to form a film even on a large-area substrate.

  Here, a reaction product such as an insulating film may adhere to the surface of the anode (anode), and in this case, the discharge may become unstable. Therefore, although not related to the sheet plasma apparatus, the anode is constituted by a roll-like conductive movable body, a permanent magnet is disposed inside the roll-like anode, and the film-forming material attached to the anode is arranged. A CVD apparatus provided with a cleaning device for removal is disclosed (see Patent Document 2, particularly FIGS. 2 and 4). According to such a CVD apparatus, stable discharge over a long period of time becomes possible.

  Further, in a thin film generating apparatus that emits plasma from a plasma gun provided in a vacuum vessel toward an electrode and forms a thin film on a substrate using the plasma flow, the electrode is formed in a cylindrical shape and a permanent magnet is formed inside A cylindrical electrode provided with the permanent magnet is positioned horizontally downstream of the plasma flow, and a rotating means is connected to the electrode, and the electrode attached to the surface of the electrode is attached to the electrode. What provided the scraping tool which removes a kimono in contact is disclosed (refer patent document 3).

  Also, a method of cleaning a plasma generating electrode of a film forming apparatus that forms a film using plasma, the reaction adhering to the surface of the electrode while maintaining a predetermined temperature and pressure of the film forming apparatus, respectively. A technique for mechanically removing a product by scraping means is disclosed (see Patent Document 4).

Furthermore, a method for improving a sputter deposition process, comprising: providing a vacuum; providing an electrode in the vacuum; providing a substrate in contact with the electrode in the vacuum; and relative to the electrode Bringing into the vacuum a device that is in mechanical contact with an electrode over the entire contact zone in motion, the device removing solid material from the electrode or being solid to the electrode A method of attaching a substance is disclosed (see Patent Document 5).
JP 2005-179767 A Japanese Utility Model Publication No. 7-2464 (utility model registration publication No. 2600478) JP-A-6-179966 JP 2001-335939 A JP-T-2006-521468

  However, in the configuration of Patent Document 1, as described above, when a reaction product such as an insulating film is formed on the anode, the conductivity of the anode is lowered, the discharge becomes unstable, and the film cannot be formed. There is sex.

  Further, the configuration of Patent Document 2 is not a technique related to sheet-like plasma, and furthermore, a permanent magnet is disposed inside the roll-shaped anode, so that the device configuration becomes complicated.

  Further, the configuration of Patent Document 3 has a complicated apparatus structure because a permanent magnet is provided inside the anode, and a scraper is provided on the axis from which the plasma is emitted, so that the scraped particles are deposited. Easy to diffuse into space.

  Similarly, in the configurations of Patent Documents 4 and 5, there is a possibility that particles made of the removed substance may diffuse into the film formation space.

  The present invention has been made to solve the above-described problems, and removes a reaction product such as an insulating film formed on an anode and prevents the scattered reaction product from being scattered. The object is to provide a device.

  Therefore, in order to solve the above problems, a sheet plasma apparatus according to the present invention includes a decompression container capable of decompressing an interior thereof, a plasma gun that generates plasma inside the decompression container, and the plasma within the decompression container. A plate-shaped anode to be received; plasma flow means for forming plasma generated by the plasma gun into a cylindrical shape and flowing toward the anode along the central axis of the formed cylindrical plasma; A part of the decompression vessel, and a sheet plasma deformation tank in which the columnar plasma is flowed and the flowed columnar plasma is transformed into a sheet-like plasma. The film formation tank formed in this manner and the anode that rotates the anode hermetically around an axis that is parallel to and deviated from the central axis of the cylindrical plasma A permanent magnet disposed behind the anode and on the central axis of the cylindrical plasma to focus the sheet-like plasma on the anode, and a front surface of the anode at a position away from the sheet-like plasma. A cleaning member disposed so as to face the cleaning member, a pressing mechanism for pressing the cleaning member against the anode, and a shielding plate disposed between the cleaning member and the sheet-like plasma.

  With such a configuration, even when a reaction product such as an insulating film is formed on the front surface of the anode, the reaction product is scraped off and removed by pressing the cleaning member against the anode with a pressing mechanism. Can be cleaned. In addition, since the pressing force of the cleaning member to the anode can be easily controlled by the pressing mechanism, the cleaning member can prevent the anode from being scraped off more than necessary.

  In addition, a permanent magnet that rotates the anode parallel to the center axis of the cylindrical plasma and airtightly about an axis that is offset (offset) from the center axis, and focuses the sheet-like plasma behind the anode is disposed. Therefore, the apparatus configuration is simplified.

  Furthermore, since the shielding plate is disposed between the cleaning member and the sheet-like plasma, the reaction product removed from the anode by the cleaning member is prevented from diffusing into the film formation space.

  The pressing mechanism may be configured to press the cleaning member against the anode so as to contact / separate.

  With such a configuration, the cleaning member is brought into contact with the anode only when a reaction product such as an insulating film formed on the anode is removed, and in other cases, the cleaning member and the anode are separated from each other. Further, the anode is further prevented from being scraped off more than necessary.

  The cleaning member may be a polishing member.

  With such a configuration, the reaction product such as an insulating film formed on the anode can be removed by polishing, and thus the removal is facilitated.

  The anode may be formed in a disc shape.

  With such a configuration, the anode can be easily manufactured.

  The rotation mechanism may include a rotation shaft provided at the center of the anode and a motor that rotates the rotation shaft.

  The motor may be an air motor.

  With such a configuration, seizure is prevented when the cleaning member is pressed against the anode by the pressing mechanism. This stabilizes the operation of the sheet plasma apparatus.

  Since the sheet plasma apparatus of the present invention is configured as described above, reaction products such as an insulating film formed on the anode can be removed, and scattering of the removed reaction products can be prevented. There is an effect.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(Embodiment)
FIG. 1 is a front view showing an example of a schematic configuration of a sheet plasma apparatus according to an embodiment of the present invention. FIG. 2 is a partial front view showing a schematic configuration of an anode tank constituting the sheet plasma apparatus of FIG. In FIG. 2, for easy understanding, the central axis 22 </ b> A of the columnar plasma 22 formed inside the decompression vessel 60 is drawn with a one-dot chain line, and the sheet-like plasma 27 is drawn with a solid line. Hereinafter, the sheet plasma apparatus according to the present embodiment will be described with reference to FIGS. 1 and 2. Here, for convenience, as shown in FIG. 1, the direction of plasma transport is taken in the Z direction, the magnetization direction of the permanent magnets 24A and 24B (described later) is taken in the Y direction, and these Z directions are taken. The configuration of the sheet plasma apparatus will be described with the direction orthogonal to both the Y direction and the X direction.

  As shown in FIG. 1, the sheet plasma apparatus 100 according to the present embodiment includes a plasma gun 10 that forms plasma in high density in order as viewed from the plasma transport direction (Z direction), and an axis in the Z direction. A cylindrical sheet plasma deformation tank 20, a cylindrical film formation tank 30 centered on the axis in the Y direction, and a cylindrical anode tank 50 centered on the axis in the Z direction. Yes. Here, the sheet plasma deformation tank 20, the film formation tank 30, the anode tank 50, and flanges 29 and 47 to be described later constitute a decompression vessel 60. These parts 10, 20, 29, 30, 47, and 50 are communicated with each other while maintaining an airtight state through a passage for transporting plasma.

  The plasma gun 10 has a discharge space 14 that can be depressurized constituted by a cylindrical member 13, and a flange 11 is disposed at one end of the plasma gun 10 in the Z direction so as to close the discharge space 14. The cylindrical member 13 is made of glass, for example. The flange 11 is provided with a cathode 12 that emits thermoelectrons for inducing plasma discharge. The flange 11 is provided with gas introduction means 17 for introducing argon (Ar) gas as a discharge gas ionized by this discharge into the discharge space 14. A mass flow controller 16 is disposed in the gas introduction means 17. The mass flow controller 16 adjusts the flow rate of the discharge gas to the discharge space 14. As the discharge gas, an inert gas such as a rare gas other than argon can be used.

Then, the above cathode 12, (specifically, fitted with anodes 51 rotary shaft 59) anode 51 to be described later, but each connected to the negative terminal and the positive terminal of the resistor via the R _V primary bias voltage applying device V ₁ Has been. The plasma gun 10 includes a first intermediate electrode G ₁ and the second intermediate electrode G _2. The first intermediate electrode G ₁ is connected to the positive terminal of the main bias voltage applying device V ₁ via a resistor R _1. Second intermediate electrode G ₂ is is connected to the positive terminal of the main bias voltage applying device V ₁ via a resistor R _2. Then, in order to maintain the plasma discharge (glow discharge) between the cathode 12 and the anode 51, the appropriate main bias voltage applying device V ₁ of the DC resistor R _V, given by a combination of R _1, R ₂ A positive voltage is applied. Due to such plasma discharge, plasma as an aggregate of charged particles (here, Ar ⁺ and electrons) is formed in the discharge space 14 of the plasma gun 10. Note here, the DC arc discharge of low voltage and large current based on the main bias voltage applying device V _1, to allow high-density plasma discharge between the anode 51 to be described later as a cathode 12, a known pressure gradient type The plasma gun 10 is employed. The plasma gun 10 generates a cylindrical source plasma (hereinafter referred to as “cylindrical plasma 22”).

  A sheet plasma deformation tank 20 is disposed at the other end of the plasma gun 10 in the Z direction. The plasma gun 10 and the sheet plasma deformation tank 20 are connected via an insulator 15. The sheet plasma deformation tank 20 includes a cylindrical member 19. The inside of the cylindrical member 19 has a cylindrical transport space 21 centering on the axis in the Z direction. The cylindrical member 19 is made of a nonmagnetic material, and is made of, for example, glass or stainless steel. The cross-sectional shape parallel to the XY plane of the cylindrical member 19 is, for example, a circle or a quadrangle, and is configured to be a circle in the present embodiment. A pair of permanent magnets 24 </ b> A and 24 </ b> B are disposed outside the cylindrical member 19. The pair of permanent magnets 24A and 24B are arranged so that the N poles of the permanent magnets 24A and 24B face each other with the cylindrical member 19 sandwiched in the Y direction. A first electromagnetic coil (plasma flow means) 23 and a second electromagnetic coil (plasma flow means) 28 are disposed on both sides of the permanent magnets 24A and 24B in the longitudinal direction of the cylindrical member 19. The first electromagnetic coil 23 is used to draw the cylindrical plasma 22 from the plasma gun 10 to the cylindrical member 19. The 1st electromagnetic coil 23 and the 2nd electromagnetic coil 28 are used in order to arrange the shape of the width direction (X direction) of the sheet-like plasma 27 mentioned later. The first electromagnetic coil 23, the second electromagnetic coil 28, and the third electromagnetic coil 48, which will be described later, are columnar shapes generated by the plasma gun 10 when it is assumed that the permanent magnets 24A and 24B are not provided. This is a plasma flow means for causing the plasma 22 to flow toward the anode 51 while being restricted to its cylindrical shape. In other words, the first electromagnetic coil 23, the second electromagnetic coil 28, and the third electromagnetic coil 48, which will be described later, form the source plasma generated from the plasma gun 10 and diffused in the decompression vessel 60 into a cylindrical shape. This is a plasma flow means for flowing the shaped cylindrical plasma 22 to the anode 51 side. Further, the second electromagnetic coil 28 and the third electromagnetic coil 48 to be described later regulate the shape of the sheet-like plasma 27 when the permanent magnets 24A and 24B are provided as in the present embodiment. This is plasma flow means for flowing toward the anode 51 side.

  As shown in FIG. 1, when the cylindrical plasma 22 emitted from the plasma gun 10 advances to a position where the permanent magnets 24A and 24B are disposed in the transport space 21, the magnetic field formed by the permanent magnets 24A and 24B. Thus, it is deformed into a sheet shape (hereinafter referred to as sheet-shaped plasma 27). The shape of the sheet plasma 27 in the width direction (X direction) is regulated by the second electromagnetic coil 28. The formed sheet-like plasma 27 is guided to the anode 51 described later.

  The front end of the sheet plasma deformation tank 20 in the Z direction is connected to the film formation tank 30. The film forming tank 30 includes a cylindrical conductive chamber 40. One end of the chamber 40 is closed by an upper lid 35, and the other end of the chamber 40 is closed by a lower lid 36. The chamber 40 is made of a nonmagnetic material such as stainless steel. The chamber 40 is provided with a first opening 42 substantially in the middle of the height direction (Y direction). The internal space of the first opening 42 is formed in a size that allows the formed sheet-like plasma 27 to pass through the opening. A first flange 29 that is joined to the opening is disposed in the first opening 42. The sheet plasma deformation tank 20 and the film formation tank 30 are connected via a first opening 42 and a first flange 29 formed on the side wall of the chamber 40.

  The chamber 40 has a film formation space 31 therein. Here, in the following, the film-forming space 31 has a function as a boundary in the vertical direction (Y direction) with a central space along the horizontal plane (XZ plane) corresponding to the internal space of the first opening 42 as a boundary. The description will be made by dividing into a target space 31A defined by an enclosure storing a sputtering target 33A described later and a base material space 31B defined by an enclosure storing a substrate 34A described later. The central space is a space in which the high density portion of the sheet plasma 27 is transported in the film formation tank 30.

  A conductive target holder 33 that holds the sputtering target 33A is disposed in the target space 31A. The target holder 33 includes a disk-shaped conductive holder 33B. A cylindrical conductive support shaft 33C extending in the Y direction is connected to the holder 33B. The support shaft 33 </ b> C is inserted through a through hole (not shown) provided in the upper lid 35 of the film formation tank 30. The support shaft 33C is attached to the upper lid 35 via an insulating member 33D. That is, the support shaft 33 </ b> C is electrically insulated from the film formation tank 30 so as not to be short-circuited with the film formation tank 30. As the insulating member 33D, an insulator such as alumina ceramic or a resin such as polytetrafluoroethylene is used. The support shaft 33 </ b> C is airtightly disposed with respect to the chamber 40 so that the degree of vacuum of the film formation space 31 inside the film formation tank 30 can be maintained. As a material of the sputtering target 33A, a single metal material, an insulator material such as a dielectric, or other materials can be used. This material is appropriately selected according to a film formed on the base material 34A described later.

The target holder 33, the bias voltage applying unit V ₂ is connected. By this bias voltage application device V ₂ , a negative DC bias voltage with respect to the potential of the sheet-like plasma 27 is applied to the sputtering target 33 A through the target holder 33.

  In addition, a conductive base material holder 34 that holds the base material 34A is disposed in the base material space 31B. The base material holder 34 includes a disk-shaped conductive holder 34B. A cylindrical conductive support shaft 34C extending in the Y direction is connected to the holder 34B. The support shaft 34 </ b> C is inserted into a through hole (not shown) provided in the lower lid 36 of the film formation tank 30. The support shaft 34C is attached to the lower lid 36 via an insulating member 34D. That is, the support shaft 34 </ b> C is electrically insulated from the film formation tank 30 so as not to be short-circuited with the film formation tank 30. As the insulating member 34D, an insulator such as alumina ceramic or a resin such as polytetrafluoroethylene is used. The substrate holder 34 is disposed so as to face the target holder 33 with the formed sheet-shaped plasma 27 interposed therebetween (here, both are horizontal). The support shaft 34 </ b> C is airtightly disposed with respect to the film formation tank 30 so that the degree of vacuum of the film formation space 31 inside the film formation tank 30 can be maintained.

A bias voltage applying device V ₃ is connected to the base material holder 34. By this bias voltage application device V ₃ , a negative DC bias voltage with respect to the potential of the sheet plasma 27 is applied to the base material 34 A via the base material holder 34.

  An exhaust port 32 for evacuating the film formation space 31 in the chamber 40 is provided at an appropriate position of the chamber 40. The exhaust port 32 is configured to be opened and closed by a valve 37. A vacuum pump 38 is connected to the exhaust port 32. The vacuum pump 38 quickly depressurizes the film formation space 31 to a level at which the sheet-like plasma 27 can be transported.

  A second opening 45 is formed at the rear end (Z direction) of the chamber 40 of the film formation tank 30. The second opening 45 is provided with a second flange 47 that is joined to the opening. The film formation tank 30 and an anode tank 50 described later are connected via a second opening 45 and a second flange 47.

  As shown in FIGS. 1 and 2, the anode tank 50 includes a cylindrical member 53. In the present embodiment, the cylindrical member 53 is made of glass. The anode tank 50 is formed by connecting one end of a cylindrical member 53 to the second flange 47 and closing the other end of the cylindrical member 53 with a disc-shaped mounting plate 54. Around the cylindrical member 53, a third electromagnetic coil (plasma flow means) 48 is disposed. The third electromagnetic coil 48 is used for adjusting the shape of the formed sheet-like plasma 27 in the width direction.

As shown in FIG. 2, a through hole 55 is formed in the mounting plate 54. The through hole 55 is formed in the mounting plate 54 at a position parallel to the center axis 22A of the cylindrical plasma 22 and deviated from the center axis 22A. A housing 61 is fitted into the through hole 55. The housing 61 is formed in a cylindrical shape and includes a flange. The lower portion of the housing 61 is fitted into the through hole 55 of the mounting plate 54, and is attached to the mounting plate 54 by appropriate means (bolts or the like) at the flange. The housing 61 is airtightly attached to the attachment plate 54 by a seal member (not shown). The housing 61 is insulatively attached to the attachment plate 54 by an insulating member (not shown). The housing 61 is provided with a bearing 62 and a vacuum seal 63. A rotary shaft 59 is inserted through the bearing 62 and the vacuum seal 63. Therefore, the rotating shaft 59 can be rotated by the bearing 62 and is hermetically sealed by the vacuum seal 63. Further, the rotary shaft 59 through the carbon brush 58, and the positive terminal of the main bias voltage applying device V ₁ is connected (see Figure 1).

  The rotating shaft 59 includes an inner tube 64 and an outer tube 65. That is, in this embodiment, the inside of the rotating shaft 59 has a double tube structure. The rotating shaft 59 is made of a conductive material. A cooling medium supply device 66 is connected to one end of the rotating shaft 59 (outside of the anode tank 50 (atmosphere side)). The cooling medium supply device 66 is attached to the rotary shaft 59 so as to supply the cooling medium to the inside 67 of the inner tube 64 and to discharge the cooling medium from the gap 68 between the inner tube 64 and the outer tube 65. ing. The cooling medium supply device 66 is configured by a known rotary joint. An anode 51 is attached to the other end of the rotating shaft 59 (inside the anode tank 50). In the present embodiment, the anode 51 is formed in a disc shape. The anode 51 is grounded via the rotating shaft 59 (and the carbon brush 58). The anode 51 has a space 57 formed therein, and this space 57 constitutes a cooling medium flow path. The anode 51 is mounted such that a space (cooling medium flow path) 57 formed therein communicates with a gap 68 between the inner tube 64 and the outer tube 65 of the rotating shaft 59. The anode 51 is attached to the tip of the outer tube 65 by appropriate means (bolts or the like). A disc-shaped partition plate 56 is attached to the tip of the inner tube 64. The partition plate 56 is attached to the inner tube 64 so as to be accommodated in the space 57 inside the anode 51.

  A permanent magnet 52 is disposed behind the anode 51 and on the central axis 22 </ b> A of the cylindrical plasma 22. The permanent magnet 52 is attached to the attachment plate 54. The permanent magnet 52 is attached so that its south pole faces the anode 51 side. The permanent magnet 52 converges the end of the sheet plasma 27 in the Z direction.

  With the above configuration, the anode 51 is cooled by the cooling medium. Specifically, the cooling medium is supplied from the cooling medium supply device 66 to the inside 67 of the inner tube 64 of the rotating shaft 59 (in the direction of arrow IN in FIG. 2). The cooling medium thus supplied flows into the space (cooling medium flow path) 57 formed inside the anode 51 through the inside 67 of the inner pipe 64. The flow of the cooling medium flowing in this way is regulated by the partition plate 56, and heat is recovered from the anode 51 by circulating through the cooling medium flow path 57. The cooling medium that has recovered the heat passes through the gap 68 between the inner tube 64 and the outer tube 65 of the rotating shaft 59 and is returned to the cooling medium supply device 66 (in the direction of the arrow OUT in FIG. 2).

  A first pulley 69 is attached to the rotating shaft 59 so as to be fitted. The first pulley 69 is attached to the atmosphere side of the rotary shaft 59. A belt 73 is hung on the first pulley 69 and a second pulley 74 described later (see FIG. 1).

  Further, the sheet plasma apparatus 100 includes a motor 70. A known motor can be used as the motor 70, but an air motor is particularly preferable. A second pulley 74 is attached to the drive shaft 72 of the motor 70. As described above, the belt 73 is hung on the second pulley 74 and the first pulley 69. Here, the rotation shaft 59, the first pulley 69, the second pulley 74, the belt 73, and the motor 70 constitute a rotation mechanism 75.

  With the above configuration, the anode 51 is rotated. That is, the rotational force of the motor 70 is transmitted to the drive shaft 72 and the second pulley 74. The rotational force of the second pulley 74 is transmitted to the first pulley 69 via the belt 73. The rotational force transmitted to the first pulley 69 rotates the rotary shaft 59 to which the first pulley is attached. Along with the rotation of the rotation shaft 59, the anode 51 attached to the rotation shaft 59 (the inner side of the anode tank 50 of the rotation shaft 59) rotates. Specifically, the anode 51 is an axis that is parallel to the central axis 22A of the cylindrical plasma 22 and is offset (offset) from the central axis 22A by the formed through-hole 55 and the rotating shaft 59 inserted through the through-hole 55. It is rotated airtight around the center.

  Next, a mechanism for cleaning the anode 51 rotated as described above will be described.

  A cleaning member 76 is disposed in front of the anode 51 so as to face the anode 51. The cleaning member 76 is disposed on the opposite side of the sheet plasma 27 with the center of the anode 51 interposed therebetween. The position where the cleaning member 76 is disposed is not limited to this, and may be any place other than the portion where the sheet plasma 27 and the anode 51 overlap. Here, as will be described later, in consideration of scattering of particles made of a reaction product such as an insulating film scraped from the anode 51 by the cleaning member 76, it is positioned in front of the anode 51 and as far as possible from the sheet-like plasma 27. It is preferable to arrange. The cleaning member 76 is made of a material harder than a reaction product such as an insulating film formed on the anode 51, which can scrape off a reaction product such as an attached insulating film. Further, the cleaning member 76 may be composed of a metal plate, a metal piece, a member made of ceramic, or the like made of a metal material having a higher hardness than the material constituting the anode 51 in order to activate the surface of the anode 51. preferable. Furthermore, the surface of the cleaning member 76 that is pressed against the anode 51 is preferably formed in a file-like shape or a shape having irregularities. In the present embodiment, the cleaning member 76 uses a polishing member made of a metal plate.

  One end of a movable shaft 78 is attached to the cleaning member 76. The movable shaft 78 is slidably inserted through a through hole 79 formed in the second flange 47. The movable shaft 78 is attached to the through hole 79 via a vacuum seal (not shown). The other end of the movable shaft 78 is attached to the drive source 80. In the present embodiment, the drive source 80 is configured by an air cylinder. Note that the movable shaft 78 is insulatively attached to the second flange 47 according to the type of the drive source 80. Here, the movable shaft 78 and the drive source 80 constitute a pressing mechanism 81.

  With the above configuration, first, the drive source 80 moves (moves forward) the movable shaft 78 in the direction of the arrow 85. Along with this, the cleaning member 76 attached to the movable shaft 78 also moves in the direction of the arrow 85. Thereby, the cleaning member 76 contacts the front surface of the anode 51 and is pressed. At this time, if a reaction product such as an insulating film is formed on the front surface of the anode 51, the reaction product such as the insulating film is scraped off. Thereafter, the drive source 80 moves (withdraws) the movable shaft 78 in the direction opposite to the arrow 85. Along with this, the cleaning member 76 attached to the movable shaft 78 also moves in the direction opposite to the arrow 85. Thereby, the cleaning member 76 is separated from the front surface of the anode 51.

  A shielding plate 82 is disposed between the cleaning member 76 and the sheet-like plasma 27. The shielding plate 82 is disposed so as to face the front surface of the anode 51 with a predetermined distance from the anode 51. The shielding plate 82 is attached to the second flange 47. The shielding plate 82 prevents particles made of a reaction product such as an insulating film scraped off by the cleaning member 76 from diffusing into the anode tank 50 and thus into the decompression vessel 60.

In addition, the sheet plasma apparatus 100 of the present embodiment includes a control device 90. The control device 90 controls operations of the main bias voltage application device V ₁ , the vacuum pump 38, the bias voltage application devices V ₂ and V ₃ , the cooling medium supply device 66, the motor 70, the drive source 80, and the like. The control device 90 is configured by an arithmetic device such as a microcomputer, and controls necessary components of the sheet plasma device 100 to control the operation of the sheet plasma device 100. Here, in this specification, the control device 90 means not only a single controller but also a controller group in which a plurality of controllers cooperate to execute control. Therefore, the control device 90 does not necessarily need to be configured by a single controller, and a plurality of controllers are arranged in a distributed manner, and they are configured to control the operation of the sheet plasma apparatus 100 in cooperation with each other. May be.

  In the present embodiment, the first electromagnetic coil 23 to the third electromagnetic coil 48 are used as the magnetic field generating means for adjusting the shapes of the columnar plasma 22 and the sheet plasma 27, but other means are used. Is also possible. For example, instead of the first electromagnetic coil 23 to the third electromagnetic coil 48, a permanent magnet or a superconductor (Meissner effect generated by) can be used.

<Operation>
Next, the operation of the sheet plasma apparatus 100 of the present embodiment will be described. Here, the operation of the sheet plasma apparatus 100 is performed by the controller 90.

  First, a general operation of the sheet plasma apparatus 100 of the present embodiment will be briefly described.

In the sheet plasma apparatus 100 of the present embodiment, the inside of the film forming tank 30 is evacuated to the order of 1 × 10 ⁻⁶ Pa by the vacuum pump 38. Next, the cylindrical plasma 22 formed by the plasma gun 10 is introduced into the sheet plasma deformation tank 20. The columnar plasma 22 is formed into a sheet-like plasma 27 by a pair of permanent magnets 24 </ b> A and 24 </ b> B and is introduced into the film formation tank 30. Thereafter, the pressure in the film formation tank 30 is set to the order of 1 × 10 ⁻² Pa.

In the film forming tank 30, a negative bias voltage is applied to the target 33 </ b> A via the target holder 33 from the bias voltage applying device V <b> ₂ . On the other hand, a negative bias voltage from the bias voltage applying unit V ₃ is applied to the substrate 34A via the substrate holder 34. Then, when the target 33A is charged to a negative bias, the argon ions in the sheet plasma 27 are attracted to the target 33A. Argon ions attracted to the target 33A sputter target atoms in the target 33A. The sputtered target atoms pass through the sheet plasma 27 in the thickness direction and are converted into ions at that time. The converted ions are deposited on the surface of the substrate 34A to form a film.

  In the process of forming a film on the surface of the base material 34A as described above, the anode 51 may or may not be rotated by the rotation mechanism 75.

  Next, a characteristic operation of the sheet plasma apparatus 100 of the present embodiment will be described. The following operation is performed at a time other than the above-described film formation (film formation). The following operation is performed when a reaction product such as an insulating film is formed on the anode 51.

  First, when the anode 51 is rotated in the process of forming a film on the surface of the base material 34A, the control device 90 maintains that state. On the other hand, when the anode 51 is not rotated, the control device 90 rotates the anode 51 by driving the motor 70.

  Next, the control device 90 drives the drive source 80 to advance the movable shaft 78, and the cleaning member 76 attached to the movable shaft 78 is brought into contact with and pressed against the surface of the anode 51. Here, the control device 90 preferably controls the pressing force of the cleaning member 76 against the anode 51 so that the anode 51 is not scraped more than necessary. In addition, the control device 90 preferably controls the pressing force of the cleaning member 76 against the anode 51 so as not to stop the rotation of the anode 51 by the rotation mechanism 75. In this case, the control device 90 can also control the driving force of the motor 70 according to the pressing force of the cleaning member 76 against the anode 51. Thereby, a reaction product such as an insulating film formed on the front surface of the anode 51 is scraped off. In this case, the particles made of the reaction product such as the insulating film thus scraped off are prevented from being scattered into the anode tank 50 (the decompression vessel 60) by providing the shielding plate 82.

  Next, when the cleaning member 76 is pressed against the surface of the anode 51 for a predetermined time and it is determined that a reaction product such as an insulator has been removed from the front surface of the anode 51, the control device 90 uses the drive source 80. The movable shaft 78 is retracted, and the cleaning member 76 is separated from the surface of the anode 51. This prevents the anode 51 from being scraped more than necessary after scraping reaction products such as an insulating film from the surface of the anode 51.

  After scraping reaction products such as an insulating film from the surface of the anode 51 as described above, film formation, which is a general operation, is performed.

  In summary, the sheet plasma apparatus 100 of the present embodiment is configured so that, even when a reaction product such as an insulating film is formed on the front surface of the anode 51, the pressing member 81 presses the cleaning member 76 against the anode 51. The product can be scraped off and the anode 51 can be cleaned.

  Moreover, since the sheet plasma apparatus 100 according to the present embodiment can easily control the pressing force of the cleaning member 76 against the anode 51 by the pressing mechanism 81, the cleaning member 76 can prevent the anode 51 from being scraped off more than necessary.

  Further, in the sheet plasma apparatus 100 of the present embodiment, the anode 51 is hermetically rotated around the axis parallel to the central axis 22A of the cylindrical plasma 22 and deviated from the central axis 22A, and behind the anode 51. Since the permanent magnet 52 for converging the sheet-like plasma 27 is disposed on the apparatus, the apparatus configuration is simplified.

  In addition, the sheet plasma apparatus 100 of the present embodiment is configured such that the pressing mechanism 81 presses the cleaning member 76 against the anode 51 so as to be able to contact / separate, so that a reaction product such as an insulating film formed on the anode 51 is removed. Only at the time of removal, the cleaning member 76 is brought into contact with the anode 51. In other cases, the cleaning member 76 and the anode 51 are separated from each other, thereby further suppressing the anode 51 from being scraped more than necessary.

  In addition, since the sheet plasma apparatus 100 according to the present embodiment uses an air motor as the drive source 80 of the pressing mechanism 81, the seizure of the motor does not occur when the cleaning member 76 is pressed against the front surface of the anode 51. . Thereby, the operation of the sheet plasma apparatus 100 is stabilized.

  The sheet plasma apparatus of the present invention is useful as a sheet plasma apparatus capable of removing reaction products such as an insulating film formed on an anode and preventing the removed reaction products from scattering. is there.

It is a front view which shows an example of schematic structure of the sheet plasma apparatus which concerns on embodiment of this invention. It is a partial front view which shows schematic structure of the anode tank which comprises the sheet plasma apparatus of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Plasma gun 11 Flange 12 Cathode 13 Cylindrical member 14 Discharge space 15 Insulator 16 Mass flow controller 17 Discharge gas introduction tube 19 Cylindrical member 20 Sheet plasma deformation tank 21 Transport space 22 Cylindrical plasma 22A Center axis 23 of cylindrical plasma One electromagnetic coil (plasma flow means)
24A, 24B Permanent magnet 27 Sheet plasma 28 Second electromagnetic coil (plasma flow means)
29 First flange 30 Film formation tank 31 Film formation space 31A Target space 31B Base material space 32 Exhaust port 33 Target holder 33A Sputtering target 33B Holder 33C Support shaft 33D Insulating member 34 Base material holder 34A Base material 34B Holder 34C Support shaft 34D Insulation Member 35 Upper lid 36 Lower lid 37 Valve 38 Vacuum pump 40 Chamber 42 First opening 45 Second opening 47 Second flange 48 Third electromagnetic coil (plasma flow means)
50 Anode tank 51 Anode 52 Permanent magnet 53 Cylindrical member 54 Mounting plate 55 Through-hole 56 Partition plate 57 Space (cooling medium flow path)
58 Carbon brush 59 Rotating shaft 60 Depressurization vessel 61 Housing 62 Bearing 63 Vacuum seal 64 Inner tube 65 Outer tube 66 Cooling medium supply device 67 Inner tube interior 68 Clearance between inner tube and outer tube 69 First pulley 70 Motor 72 Drive shaft 73 Belt 74 Second pulley 75 Rotating mechanism 76 Cleaning member 78 Movable shaft 79 Through hole 80 Drive source 81 Pressing mechanism 82 Shielding plate 85 Moving direction (forward direction) of the movable shaft
100 Sheet Plasma Device G ₁ First Intermediate Electrode G ₂ Second Intermediate Electrode V ₁ Main Bias Voltage Application Device V ₂ , V ₃ Bias Voltage Application Device

Claims (6)

A decompression vessel capable of decompressing the interior;
A plasma gun for generating plasma inside the decompression vessel;
A plate-like anode that receives the plasma inside the vacuum vessel;
Plasma flow means for shaping the plasma generated by the plasma gun into a cylindrical shape and flowing toward the anode side along the central axis of the shaped cylindrical plasma,
A sheet plasma deformation tank that is formed so as to form a part of the decompression vessel, causes the columnar plasma to flow therein, and transforms the flowing columnar plasma into sheet-like plasma;
A film formation tank formed to form a part of the decompression vessel;
A rotating mechanism for hermetically rotating the anode around an axis parallel to and offset from the central axis of the cylindrical plasma;
A permanent magnet disposed behind the anode and on the central axis of the cylindrical plasma to focus the sheet-like plasma on the anode;
A cleaning member arranged to face the front surface of the anode at a position away from the sheet-like plasma;
A pressing mechanism for pressing the cleaning member against the anode;
A sheet plasma apparatus comprising: a shielding plate disposed between the cleaning member and the sheet-like plasma.   The sheet plasma apparatus according to claim 1, wherein the pressing mechanism is configured to press the cleaning member against the anode so as to be freely contacted / separated.   The sheet plasma apparatus according to claim 1, wherein the cleaning member is a polishing member.   The sheet plasma apparatus according to claim 1, wherein the anode is formed in a disk shape.   The sheet plasma apparatus according to claim 1, wherein the rotation mechanism includes a rotation shaft provided at a center of the anode and a motor that rotates the rotation shaft.   The sheet plasma apparatus according to claim 5, wherein the motor is an air motor.

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