JP2008238417A5 - - Google Patents

Claims (14)

A photocurable resin composition for nanoimprinting, which comprises a cationically polymerizable compound having curing expandability and a radiation-sensitive cationic polymerization initiator, wherein the radiation-sensitive cationic polymerization initiator has an anion moiety of SbF ₆ ^- or the following formula ( 1)

(Wherein, x1 to x4 represent integers of 0 to 5. However, the total value of x1 to x4 is 1 or more)
A photocurable resin composition for nanoimprinting, which is a radiation-sensitive cationic polymerization initiator that is a borate represented by the formula:   The resin composition according to claim 1, wherein the cationically polymerizable compound having curing expandability is a cyclic ether compound and / or a carbonate-based compound. The cyclic ether compound is represented by the following formula (2)

(Wherein R ^{1 to} R ¹⁸ are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group)
The carbonate compound is a compound represented by the following formula (3):

Wherein R ^19a is the same or different and is a hydrogen atom, a monovalent or polyvalent hydrocarbon group having 1 to 10 carbon atoms, a monovalent or polyvalent alkyl ester, or a monovalent or polyvalent alkyl ether. R ^19b represents a hydrogen atom or an alkyl group, and R ^{20 to} R ²³ are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, and p represents an integer of 1 to 6. , M and n represent an integer of 0 to 3, and X, Y and Z represent an oxygen atom or a sulfur atom, provided that when p is 1, R ^19a is a hydrogen atom or a monovalent group having 1 to 10 carbon atoms. An alkyl group, a monovalent alkyl ester, or a monovalent alkyl ether, and when p is 2 or more, R ^19a is a single bond, a p-valent hydrocarbon group, a p-valent alkyl group, or a p-valent alkoxy group. Indicates
The resin composition according to claim 2, which is a cyclic carbonate compound represented by the formula:   The resin composition according to any one of claims 1 to 3, wherein the cationically polymerizable compound having curable expansion property is contained in an amount of 1 to 90 parts by weight with respect to 100 parts by weight of the resin composition.   Furthermore, the resin composition in any one of Claims 1-4 containing a sensitizer and / or a sensitizing dye.   Furthermore, as nanoscale particles, oxides, nitrides, phosphides, carbonates, carboxylates, phosphates, sulfates, silicates, titanates, zirconates, aluminates, tin The resin composition according to any one of claims 1 to 5, comprising nanoscale particles made of at least one selected from the group consisting of acid salts and lead acid salts.   Hardened | cured material formed by hardening | curing the resin composition as described in any one of Claims 1-6.   The manufacturing method of the fine structure which gives a nano structure to the resin composition in any one of Claims 1-6, and obtains a fine structure. (1) A step of forming a film comprising the resin composition according to any one of claims 1 to 6 on a support,
9. The method for producing a microstructure according to claim 8, comprising: (2) a step of transferring a pattern to the coating using a nano stamper; and (3) a step of curing the coating to which the pattern is transferred to obtain a microstructure.   The manufacturing method of the fine structure of Claim 9 which forms the film which consists of a resin composition on a transparent support body in a process (1).   The method for producing a microstructure according to claim 9, wherein a nano stamper made of at least one selected from silicone, glass, and silica glass is used in the step (2). Further, (4) The method of producing a fine structure according to any one of claims 9-11 comprising the step of etching the cured film. Any of the microstructure obtained by the manufacturing method according to the preceding claims 8-12. Semiconductor material, diffraction type light-condensing films, polarizing films, optical waveguides, or claim 13 microstructures according a hologram.