JP2008235765A - Light-emitting device - Google Patents

Light-emitting device Download PDF

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Publication number
JP2008235765A
JP2008235765A JP2007076354A JP2007076354A JP2008235765A JP 2008235765 A JP2008235765 A JP 2008235765A JP 2007076354 A JP2007076354 A JP 2007076354A JP 2007076354 A JP2007076354 A JP 2007076354A JP 2008235765 A JP2008235765 A JP 2008235765A
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Prior art keywords
light emitting
electrode
light
emitting device
emitting element
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Inventor
Masami Obara
正美 小原
Takaaki Onizuka
崇彰 鬼塚
Susumu Tada
晋 多田
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Priority to JP2007076354A priority Critical patent/JP2008235765A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a light-emitting device whose mounted device can be reduced in size by making it possible to be thinned further. <P>SOLUTION: The light emitting device includes an insulating substrate 2 through which a through hole 21 is formed, an anode electrode 31 which is formed at one edge of the insulating substrate 2, a cathode electrode 32 which is formed at another edge so as to close the opening of the through hole 21 on the back B, a light-emitting element 4 which is die-bonded on the cathode electrode 32 exposed by the through hole 21, and wires 5a, 5b which are first bonded to the light-emitting element 4 and is second bonded to the anode electrode 31 and cathode electrode 32. The through hole 21 is formed so that the opening area increase expanded, starting from the back B toward the front F, thereby, the surrounding wall surface S is inclined. A plated layer 36 is formed on the inclined surface S. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、発光素子と、発光素子に電源を供給する電極が両端部に設けられた基板とを備えた発光装置に関する。   The present invention relates to a light emitting device including a light emitting element and a substrate provided with electrodes for supplying power to the light emitting element at both ends.

両端部に電極が設けられた絶縁基板と、それぞれの電極に接続する発光素子とが設けられた発光装置が特許文献1に記載されている。   Patent Document 1 discloses a light emitting device in which an insulating substrate provided with electrodes at both ends and a light emitting element connected to each electrode are provided.

この特許文献1に記載のチップ部品型LEDは、貫通穴が形成された絶縁基板の表面に金属層が形成され、裏面に貫通穴の開口を塞ぐ金属薄板が添設され、金属層と金属薄板とを接続し、かつ貫通穴の傾斜面および底面(金属薄板)まで延設するように一方の配線パターンが形成され、この配線パターンにLEDチップが実装されたものである。
特開平7−235696号公報
In the chip component type LED described in Patent Document 1, a metal layer is formed on the surface of an insulating substrate in which a through hole is formed, and a metal thin plate that closes the opening of the through hole is provided on the back surface. One wiring pattern is formed so as to extend to the inclined surface and bottom surface (thin metal plate) of the through hole, and an LED chip is mounted on this wiring pattern.
JP 7-235696 A

特許文献1に記載のチップ部品型LEDは、絶縁基板に貫通孔を形成して貫通孔の開口を塞ぐ金属薄板上に設けた配線パターンによってできる凹部にLEDチップを配置することで薄型化が図られている。   The chip component type LED described in Patent Document 1 is thinned by disposing the LED chip in a recess formed by a wiring pattern formed on a thin metal plate that forms a through hole in an insulating substrate and closes the opening of the through hole. It has been.

しかし、薄型化の要求は、更に高く、例えば、発光装置が搭載される携帯電話などは、携帯性の向上を図ると共に、デザイン性の向上を図るために、全ての部品に対して数μmオーダーでも小型化を図ることが求められている。従って、発光装置においても更なる薄型化が要求されている。   However, the demand for thinning is even higher. For example, cellular phones equipped with light-emitting devices are on the order of several μm for all parts in order to improve portability and design. However, miniaturization is required. Therefore, further thinning is required also in the light emitting device.

そこで本発明は、更なる薄型化を可能とすることで、搭載される装置の小型化が可能な発光装置を提供することを目的とする。   Therefore, an object of the present invention is to provide a light-emitting device that can be reduced in size by enabling further reduction in thickness.

本発明の発光装置は、貫通孔が形成された絶縁基板と、前記絶縁基板の一方の端部に形成された一方の電極、および他方の端部に裏面側の前記貫通孔の開口を塞ぐように形成された他方の電極と、前記貫通孔によって露出した前記他方の電極上にダイボンドされた発光素子とを備えたことを特徴とする。   In the light emitting device of the present invention, an insulating substrate in which a through hole is formed, one electrode formed at one end of the insulating substrate, and an opening of the through hole on the back surface side at the other end. And the light emitting element die-bonded on the other electrode exposed through the through hole.

本発明は、絶縁基板の板厚分ほど低い位置に発光素子を搭載することができるので、発光装置全体の厚みを薄くすることができる。よって、更なる薄型化を可能とすることで、搭載される装置の小型化が可能である。   In the present invention, since the light emitting element can be mounted at a position as low as the plate thickness of the insulating substrate, the thickness of the entire light emitting device can be reduced. Therefore, by further reducing the thickness, the mounted device can be reduced in size.

本願の第1の発明は、貫通孔が形成された絶縁基板と、絶縁基板の一方の端部に形成された一方の電極、および他方の端部に裏面側の貫通孔の開口を塞ぐように形成された他方の電極と、貫通孔によって露出した他方の電極上にダイボンドされた発光素子とを備えたことを特徴としたものである。   In the first invention of the present application, an insulating substrate in which a through hole is formed, one electrode formed at one end of the insulating substrate, and the opening of the through hole on the back surface side at the other end are blocked. The other electrode formed and the light emitting element die-bonded on the other electrode exposed by the through-hole are provided.

本発明の発光装置は、発光素子が、貫通孔の開口を塞ぐように形成された他方の電極に、直接ダイボンドされているので、絶縁基板の板厚分ほど低い位置に発光素子を搭載することができる。従って、発光装置全体の厚みを薄くすることができる。   In the light emitting device of the present invention, since the light emitting element is directly die-bonded to the other electrode formed so as to close the opening of the through hole, the light emitting element is mounted at a position as low as the thickness of the insulating substrate. Can do. Therefore, the thickness of the entire light emitting device can be reduced.

本願の第2の発明は、発光素子にファーストボンドされ、一方の電極にセカンドボンドされたワイヤを備えたことを特徴としたものである。   The second invention of the present application is characterized in that a wire first bonded to the light emitting element and second bonded to one of the electrodes is provided.

例えば、ワイヤを、本発明の発光装置とは反対に、一方の電極にファーストボンドし、発光素子にセカンドボンドするように配線すると、絶縁基板の上面からワイヤを垂直に立ち上げることになる。本発明の発光装置は、発光素子にファーストボンドしてワイヤを垂直に立ち上げ、そしてワイヤを弓なりに延ばし、一方の電極にセカンドボンドしている。従って、ワイヤをファーストボンドした発光素子から垂直に立ち上げても、発光素子を貫通孔の開口を塞ぐ他方の電極にダイボンドすることで、絶縁基板の板厚分ほど発光素子が搭載される位置が低くなっているので、一方の電極にファーストボンドするより配線高さを低くすることができる。従って、より発光装置の厚みを薄くすることができる。   For example, when the wire is wired so as to be first-bonded to one electrode and second-bonded to the light-emitting element, contrary to the light-emitting device of the present invention, the wire is raised vertically from the upper surface of the insulating substrate. In the light-emitting device of the present invention, the wire is first bonded to the light-emitting element to raise the wire vertically, and the wire is extended in a bow shape and is second-bonded to one electrode. Therefore, even if the wire is raised vertically from the first bonded light emitting element, the position where the light emitting element is mounted by the thickness of the insulating substrate is die-bonded to the other electrode that closes the opening of the through hole. Since it is lower, the wiring height can be made lower than when first bonding to one electrode. Therefore, the thickness of the light emitting device can be further reduced.

本願の第3の発明は、絶縁基板は、貫通孔の周壁面にメッキ層が形成されていることを特徴としたものである。   According to a third invention of the present application, the insulating substrate is characterized in that a plating layer is formed on the peripheral wall surface of the through hole.

絶縁基板に設けた貫通孔の周壁面は、発光素子の側面からの光を受ける。この周壁面にメッキ層を形成することで、受けた光を反射させることができ、輝度の向上を図ることができる。またメッキ層は、周壁面に設けているので、発光装置全体の厚みの増加には影響しない。   The peripheral wall surface of the through hole provided in the insulating substrate receives light from the side surface of the light emitting element. By forming a plating layer on the peripheral wall surface, the received light can be reflected, and the luminance can be improved. Further, since the plating layer is provided on the peripheral wall surface, it does not affect the increase in the thickness of the entire light emitting device.

(実施の形態)
本発明の実施の形態に係る発光装置を、図面に基づいて説明する。まずは、本実施の形態に係る発光装置の構成を、図1から図3に基づいて説明する。図1は、本発明の実施の形態に係る発光装置を示す断面図である。図2は、図1に示す発光装置の平面図である。図3は、図1に示す発光装置の底面図である。
(Embodiment)
A light emitting device according to an embodiment of the present invention will be described with reference to the drawings. First, the structure of the light emitting device according to the present embodiment will be described with reference to FIGS. FIG. 1 is a cross-sectional view showing a light emitting device according to an embodiment of the present invention. FIG. 2 is a plan view of the light-emitting device shown in FIG. FIG. 3 is a bottom view of the light-emitting device shown in FIG.

図1から図3に示すように、発光装置1は、絶縁基板2と、電極3と、半導体で形成された発光素子4と、金属細線であるワイヤ5a,5bと、樹脂で形成された封止部6と、レジスト膜7とを備えている。   As shown in FIGS. 1 to 3, the light emitting device 1 includes an insulating substrate 2, an electrode 3, a light emitting element 4 formed of a semiconductor, wires 5 a and 5 b that are thin metal wires, and a sealing formed of a resin. A stop portion 6 and a resist film 7 are provided.

発光装置1は、両端部分の電極3を含む長さ方向の長さは約1.6mm、幅方向の長さは約0.8mm、レジスト膜7から封止部6までの厚みは0.2mmに形成されている。   The light emitting device 1 has a length in the length direction including the electrodes 3 at both ends of about 1.6 mm, a length in the width direction of about 0.8 mm, and a thickness from the resist film 7 to the sealing portion 6 of 0.2 mm. Is formed.

絶縁基板2は、厚みが0.06mmのガラスエポキシ樹脂またはBTレジンで形成され、中央部に貫通孔21が設けられている。貫通孔21は、絶縁基板2の裏面B側の開口が約0.43mmに形成され、裏面B側から表面F側へ向かって徐々に開口面積が広がるように形成されることで、周壁面Sが水平に対して約45°の傾斜面となっている。この傾斜面は、銀メッキなどのメッキ層が施されることで、反射面として機能する。   The insulating substrate 2 is formed of a glass epoxy resin or BT resin having a thickness of 0.06 mm, and a through hole 21 is provided at the center. The through-hole 21 is formed so that the opening on the back surface B side of the insulating substrate 2 is about 0.43 mm and the opening area gradually increases from the back surface B side to the front surface F side. Has an inclined surface of about 45 ° with respect to the horizontal. This inclined surface functions as a reflective surface by being provided with a plating layer such as silver plating.

電極3は、厚み約23.5μmの配線パターンで形成され、絶縁基板2の長手方向の一方の端部にアノード電極31が、他方の端部にカソード電極32が設けられている。アノード電極31とカソード電極32とは、表面Fから裏面Bに至るまで形成されることで、垂直断面が略コ字状に形成されている。カソード電極32は、裏面Bの貫通孔21の開口を塞ぐように形成されている。電極3には、ワイヤボンディング用配線パターン33が、アノード電極31とカソード電極32とのそれぞれの内側の位置に略L字状に設けられ、先端部がワイヤボンディングされるボンディング部33aとなっている。このワイヤボンディング用配線パターン33の基端部には、封止部6を形成するために金型を型締めしたときの樹脂漏れを防止するレジスト膜34が形成されている。   The electrode 3 is formed in a wiring pattern having a thickness of about 23.5 μm, and an anode electrode 31 is provided at one end in the longitudinal direction of the insulating substrate 2 and a cathode electrode 32 is provided at the other end. The anode electrode 31 and the cathode electrode 32 are formed from the front surface F to the back surface B, so that the vertical cross section is formed in a substantially U shape. The cathode electrode 32 is formed so as to close the opening of the through hole 21 on the back surface B. The electrode 3 is provided with a wire bonding wiring pattern 33 in a substantially L shape at the inner position of each of the anode electrode 31 and the cathode electrode 32, and a tip portion is a bonding portion 33a to be wire bonded. . A resist film 34 for preventing resin leakage when the mold is clamped to form the sealing portion 6 is formed at the base end portion of the wire bonding wiring pattern 33.

発光素子4は、例えば、絶縁性基板であるサファイヤ基板などに、半導体層であるn層、発光層、およびp層が積層された青色発光素子である。発光素子4は、p層および発光層とn層の一部とをエッチングして形成された領域にn電極が、p層にp電極がそれぞれボンディング電極として設けられている。発光素子4は、カソード電極32上に、銀ペーストなどの導電性接着剤41を介在してダイボンドされている。   The light emitting element 4 is, for example, a blue light emitting element in which an n layer, a light emitting layer, and a p layer that are semiconductor layers are stacked on a sapphire substrate that is an insulating substrate. In the light emitting element 4, an n electrode is provided as a bonding electrode in a p layer, a region formed by etching the light emitting layer and a part of the n layer, and a p electrode is provided in the p layer as a bonding electrode. The light emitting element 4 is die-bonded on the cathode electrode 32 with a conductive adhesive 41 such as silver paste interposed therebetween.

ワイヤ5aは、発光素子4のp電極からアノード電極31側のワイヤボンディング用配線パターン33のボンディング部33aへ配線され、ワイヤ5bは、n電極からカソード電極32側のワイヤボンディング用配線パターン33のボンディング部33aへ配線されている。   The wire 5a is wired from the p electrode of the light emitting element 4 to the bonding portion 33a of the wire bonding wiring pattern 33 on the anode electrode 31 side, and the wire 5b is bonded to the wire bonding wiring pattern 33 on the cathode electrode 32 side from the n electrode. It is wired to the part 33a.

封止部6は、エポキシ系樹脂で形成されている。この封止部6には、発光素子4からの光を波長変換して補色となる色を発光する蛍光体を含有させていてもよい。本実施の形態では、発光素子4が青色に発光するので、蛍光体としては黄色に波長変換するものを使用すれば、封止部6の表面を、発光素子4からの青色と波長変換された黄色とが混色して白色に発光させることができる。   The sealing part 6 is formed of an epoxy resin. The sealing portion 6 may contain a phosphor that emits a complementary color by converting the wavelength of light from the light emitting element 4. In the present embodiment, since the light emitting element 4 emits blue light, if the phosphor that converts the wavelength to yellow is used, the surface of the sealing portion 6 is wavelength-converted to blue from the light emitting element 4. Yellow can be mixed to emit white light.

レジスト膜7は、アノード電極31とカソード電極32との短絡防止と、極性表示とを目的として設けられている。   The resist film 7 is provided for the purpose of preventing a short circuit between the anode electrode 31 and the cathode electrode 32 and displaying the polarity.

以上のように構成される本発明の実施の形態に係る発光装置の製造方法について、図4から図8に基づいて説明する。図4は、電極が形成された絶縁基板を示す図であり、(A)は平面図、(B)は底面図、(C)は断面図である。図5は、貫通孔を設けた絶縁基板を示す図であり、(A)は平面図、(B)は断面図である。図6は、レジスト膜を設けた絶縁基板を示す図であり、(A)は平面図、(B)は底面図、(C)は断面図である。図7は、メッキ層が形成された絶縁基板を示す断面図である。図8は、発光素子が搭載され、ワイヤが配線された絶縁基板を示す図であり、(A)は平面図、(B)は断面図である。   A method of manufacturing the light emitting device according to the embodiment of the present invention configured as described above will be described with reference to FIGS. 4A and 4B are diagrams showing an insulating substrate on which an electrode is formed. FIG. 4A is a plan view, FIG. 4B is a bottom view, and FIG. 4C is a cross-sectional view. 5A and 5B are diagrams showing an insulating substrate provided with through holes, where FIG. 5A is a plan view and FIG. 5B is a cross-sectional view. 6A and 6B are diagrams showing an insulating substrate provided with a resist film, where FIG. 6A is a plan view, FIG. 6B is a bottom view, and FIG. 6C is a cross-sectional view. FIG. 7 is a cross-sectional view showing an insulating substrate on which a plating layer is formed. 8A and 8B are diagrams illustrating an insulating substrate on which a light-emitting element is mounted and wires are wired. FIG. 8A is a plan view and FIG. 8B is a cross-sectional view.

まず、基板形成工程を行う。基板形成工程では、全面に銅箔が形成された絶縁基板材をエッチングして、図4(A)から同図(C)に示すように、絶縁基板2の両端部に、アノード電極31と、カソード電極32と、そのそれぞれに接続するワイヤボンディング用配線パターン33とを有する電極3を形成する。   First, a substrate forming process is performed. In the substrate forming step, the insulating substrate material with the copper foil formed on the entire surface is etched, and as shown in FIGS. 4A to 4C, the anode electrode 31 and the both ends of the insulating substrate 2, An electrode 3 having a cathode electrode 32 and a wire bonding wiring pattern 33 connected to each of them is formed.

次に、図5(A)および同図(B)に示すように、ドリル、金型、またはレーザ光などにより絶縁基板2の中央部に貫通孔21を形成する。この貫通孔21は、絶縁基板2のみを貫通するもので、カソード電極32を表面F側から露出するものである。貫通孔21を形成するときには、周壁面Sが傾斜面となるように穿孔する。この貫通孔21を形成することで、カソード電極32が底面、絶縁基板2の厚みが周壁面となった凹部22が形成される。   Next, as shown in FIGS. 5A and 5B, a through hole 21 is formed in the central portion of the insulating substrate 2 by a drill, a mold, laser light, or the like. The through-hole 21 penetrates only the insulating substrate 2 and exposes the cathode electrode 32 from the surface F side. When forming the through-hole 21, it drills so that the surrounding wall surface S may become an inclined surface. By forming the through-hole 21, a recess 22 is formed in which the cathode electrode 32 is a bottom surface and the insulating substrate 2 is a peripheral wall surface.

図6(A)から同図(C)に示すように、表面F側のワイヤボンディング用配線パターン33の基端部に半円状のレジスト膜34を形成すると共に、裏面B側のアノード電極31およびカソード電極32に跨る位置に、略ホームベース状のレジスト膜7を形成する。   6A to 6C, a semicircular resist film 34 is formed on the base end portion of the wire bonding wiring pattern 33 on the front surface F side, and the anode electrode 31 on the back surface B side. A substantially home-base resist film 7 is formed at a position straddling the cathode electrode 32.

そして、図7に示すように、レジスト膜34,7で覆われた部分を除く電極3にニッケルメッキおよび金メッキを施し、周壁面(傾斜面)Sに銀メッキを施すことでメッキ層35,36を形成する。周壁面Sにメッキ層36を形成することで、発光素子4から側方へ出射される光をメッキ層36で反射させることができるので、輝度向上を図ることができる。   Then, as shown in FIG. 7, nickel plating and gold plating are performed on the electrode 3 excluding the portions covered with the resist films 34 and 7, and silver plating is performed on the peripheral wall surface (inclined surface) S, thereby plating layers 35 and 36. Form. By forming the plating layer 36 on the peripheral wall surface S, the light emitted from the light emitting element 4 to the side can be reflected by the plating layer 36, so that the luminance can be improved.

基板形成工程の次に、発光素子4を搭載する搭載工程を行う。搭載工程は、図8(A)および同図(B)に示すように、カソード電極32を底面とする凹部22に、導電性接着剤41を介在させて発光素子4をダイボンドする。発光素子4を凹部22の底面であるカソード電極32に直接搭載することで、絶縁基板2の板厚分ほど低い位置に発光素子4を搭載することができる。   Following the substrate forming step, a mounting step for mounting the light emitting element 4 is performed. In the mounting process, as shown in FIGS. 8A and 8B, the light emitting element 4 is die-bonded with the conductive adhesive 41 interposed in the recess 22 having the cathode electrode 32 as the bottom surface. By directly mounting the light emitting element 4 on the cathode electrode 32, which is the bottom surface of the recess 22, the light emitting element 4 can be mounted at a position lower by the plate thickness of the insulating substrate 2.

搭載工程が終了すると、次に配線工程を行う。配線工程は、図8(A)および同図(B)に示すように、ワイヤ5a,5bを配線する。ワイヤ5aは、発光素子4のp電極にファーストボンドし、アノード電極31側のボンディング部33aにセカンドボンドすることで形成する。ワイヤ5bは、n電極にファーストボンドし、カソード電極32側のボンディング部33aにセカンドボンドすることで形成する。ワイヤ5a,5bを配線するときには、発光素子4にファーストボンドした後に、ワイヤ5a,5bを垂直に引き延ばしながら立ち上げ、そしてワイヤ5a,5bを接続方向へ弓なりに延ばして電極3(アノード電極31,カソード電極32)にセカンドボンドする。従って、絶縁基板2の板厚分ほど発光素子4が搭載される位置が低くなっているので、ファーストボンドした後に、ワイヤをそのまま引き延ばしながら垂直に立ち上げても、配線高さを低くすることができる。   When the mounting process is completed, a wiring process is performed next. In the wiring process, as shown in FIGS. 8A and 8B, wires 5a and 5b are wired. The wire 5a is formed by first bonding to the p electrode of the light emitting element 4 and second bonding to the bonding portion 33a on the anode electrode 31 side. The wire 5b is formed by first bonding to the n electrode and second bonding to the bonding portion 33a on the cathode electrode 32 side. When wiring the wires 5a and 5b, after first bonding to the light emitting element 4, the wires 5a and 5b are raised while being vertically extended, and then the wires 5a and 5b are extended in a bow in the connecting direction to form the electrode 3 (anode electrode 31, A second bond is made to the cathode electrode 32). Accordingly, since the position where the light emitting element 4 is mounted becomes lower by the thickness of the insulating substrate 2, the wiring height can be lowered even if the wire is stretched as it is after the first bond and then the wire is raised vertically. it can.

配線工程が終了すると、次に封止工程を行う。封止工程は、発光素子4をダイボンドし、ワイヤボンドした絶縁基板2を、封止部6を形成するキャビティを有する金型で型締めして樹脂を充填することで、封止部6を形成する。封止部6を形成することで、図1から図3に示すような発光装置1となる。   When the wiring process is completed, a sealing process is performed next. In the sealing step, the light-emitting element 4 is die-bonded, and the insulating substrate 2 that has been wire-bonded is clamped with a mold having a cavity for forming the sealing portion 6 and filled with resin to form the sealing portion 6. To do. By forming the sealing portion 6, the light emitting device 1 as shown in FIGS. 1 to 3 is obtained.

凹部22内に樹脂が圧入されても、導電性接着剤41が発光素子4を固定しているので、発光素子4が凹部22内で移動してしまうことはない。封止部6は、ワイヤ5a,5bの配線高さを低く抑えることができるので、厚みを薄く形成しても、発光素子4およびワイヤ5a,5bの保護機能を損なうことはない。従って、発光素子4を、カソード電極32を底面とする凹部22に直接ダイボンドすることで、発光装置1全体の厚みを薄くすることができる。   Even if the resin is pressed into the recess 22, the light-emitting element 4 does not move in the recess 22 because the conductive adhesive 41 fixes the light-emitting element 4. Since the sealing part 6 can suppress the wiring height of the wires 5a and 5b to be low, the protective function of the light emitting element 4 and the wires 5a and 5b is not impaired even if the thickness is formed thin. Therefore, the thickness of the entire light emitting device 1 can be reduced by die-bonding the light emitting element 4 directly to the recess 22 having the cathode electrode 32 as a bottom surface.

このように発光装置1は、全体の厚みを薄く形成することができるので、例えば、携帯電話などの小型化に寄与することができる。   As described above, since the entire thickness of the light emitting device 1 can be reduced, for example, it can contribute to downsizing of a mobile phone or the like.

次に、本発明の他の実施の形態に係る発光装置を、図9から図11に基づいて説明する。図9は、本発明の他の実施の形態に係る発光装置を示す断面図である。図10は、図9に示す発光装置の平面図である。図11は、図9に示す発光装置の底面図である。なお、図9から図11においては、図1から図3に示す構成と同じものは同符号を付して説明を省略する。   Next, a light emitting device according to another embodiment of the present invention will be described with reference to FIGS. FIG. 9 is a cross-sectional view showing a light emitting device according to another embodiment of the present invention. FIG. 10 is a plan view of the light-emitting device shown in FIG. FIG. 11 is a bottom view of the light-emitting device shown in FIG. 9 to 11, the same components as those shown in FIGS. 1 to 3 are denoted by the same reference numerals, and description thereof is omitted.

図9から図11に示すように、本発明の他の実施の形態に係る発光装置10は、発光素子11として、カソード電極32にダイボンドすることでn電極と導通接続するものを採用している。   As shown in FIGS. 9 to 11, a light emitting device 10 according to another embodiment of the present invention employs a light emitting element 11 that is conductively connected to an n electrode by die bonding to a cathode electrode 32. .

発光素子11は、導電性基板であるGaN基板に半導体層であるn層、発光層、およびp層が積層され、p層上にp電極が、半導体層が積層された側とは反対となる基板の裏面側にn電極が形成されている。従って、p電極はワイヤ5aによってアノード電極31と導通接続され、n電極はカソード電極32にダイボンドすることで導通接続するので、図1および図2に示すようなワイヤ5bは省略することができる。   In the light-emitting element 11, an n-layer, a light-emitting layer, and a p-layer that are semiconductor layers are stacked on a GaN substrate that is a conductive substrate, and a p-electrode is opposite to the side on which the semiconductor layer is stacked on the p-layer. An n-electrode is formed on the back side of the substrate. Accordingly, the p electrode is conductively connected to the anode electrode 31 by the wire 5a, and the n electrode is conductively connected by die bonding to the cathode electrode 32. Therefore, the wire 5b as shown in FIGS. 1 and 2 can be omitted.

このように発光装置10は、発光素子11をカソード電極32にダイボンドすることでn電極と導通接続させることができるので、新たな配線パターンを絶縁基板2に設けたり、新たなワイヤを設けたりする必要がない。   Thus, since the light emitting device 10 can be conductively connected to the n electrode by die-bonding the light emitting element 11 to the cathode electrode 32, a new wiring pattern is provided on the insulating substrate 2 or a new wire is provided. There is no need.

また、電極3は、カソード電極32が裏面B側の貫通孔21の開口を塞ぐように形成され、かつワイヤボンディング用配線パターン33が接続されているので、図1から図3に示す発光装置1であっても、図9から図11に示す発光装置10であっても、電極3が形成された絶縁基板2を共通して使用することができる。   The electrode 3 is formed so that the cathode electrode 32 closes the opening of the through-hole 21 on the back surface B side, and the wiring pattern 33 for wire bonding is connected, so that the light-emitting device 1 shown in FIGS. Even in the light emitting device 10 shown in FIGS. 9 to 11, the insulating substrate 2 on which the electrodes 3 are formed can be used in common.

本発明は、更なる薄型化を可能とすることで、搭載される装置の小型化が可能なので、発光素子と、発光素子に電源を供給する電極が両端部に設けられた基板とを備えた発光装置に好適である。   According to the present invention, since the device to be mounted can be reduced in size by enabling further reduction in thickness, the device includes a light emitting element and a substrate provided with electrodes for supplying power to the light emitting element at both ends. Suitable for light emitting devices.

本発明の実施の形態に係る発光装置を示す断面図Sectional drawing which shows the light-emitting device which concerns on embodiment of this invention 図1に示す発光装置の平面図FIG. 1 is a plan view of the light emitting device shown in FIG. 図1に示す発光装置の底面図Bottom view of the light emitting device shown in FIG. 電極が形成された絶縁基板を示す図であり、(A)は平面図、(B)は底面図、(C)は断面図It is a figure which shows the insulated substrate in which the electrode was formed, (A) is a top view, (B) is a bottom view, (C) is sectional drawing. 貫通孔を設けた絶縁基板を示す図であり、(A)は平面図、(B)は断面図It is a figure which shows the insulated substrate which provided the through-hole, (A) is a top view, (B) is sectional drawing. レジスト膜を設けた絶縁基板を示す図であり、(A)は平面図、(B)は底面図、(C)は断面図It is a figure which shows the insulated substrate which provided the resist film, (A) is a top view, (B) is a bottom view, (C) is sectional drawing. メッキ層が形成された絶縁基板を示す断面図Sectional view showing an insulating substrate on which a plating layer is formed 発光素子が搭載され、ワイヤが配線された絶縁基板を示す図であり、(A)は平面図、(B)は断面図It is a figure which shows the insulated substrate with which the light emitting element was mounted and the wire was wired, (A) is a top view, (B) is sectional drawing. 本発明の他の実施の形態に係る発光装置を示す断面図Sectional drawing which shows the light-emitting device which concerns on other embodiment of this invention. 図9に示す発光装置の平面図FIG. 9 is a plan view of the light emitting device shown in FIG. 図9に示す発光装置の底面図9 is a bottom view of the light emitting device shown in FIG.

符号の説明Explanation of symbols

1 発光装置
2 絶縁基板
3 電極
4 発光素子
5a,5b ワイヤ
6 封止部
7 レジスト膜
10 発光装置
11 発光素子
21 貫通孔
22 凹部
31 アノード電極
32 カソード電極
33 ワイヤボンディング用配線パターン
33a ボンディング部
34 レジスト膜
35,36 メッキ層
41 導電性接着剤
B 裏面
F 表面
S 周壁面
DESCRIPTION OF SYMBOLS 1 Light-emitting device 2 Insulating substrate 3 Electrode 4 Light-emitting element 5a, 5b Wire 6 Sealing part 7 Resist film 10 Light-emitting device 11 Light-emitting element 21 Through-hole 22 Recessed part 31 Anode electrode 32 Cathode electrode 33 Wire bonding wiring pattern 33a Bonding part 34 Resist Films 35 and 36 Plating layer 41 Conductive adhesive B Back surface F Surface S Circumferential wall surface

Claims (3)

貫通孔が形成された絶縁基板と、
前記絶縁基板の一方の端部に形成された一方の電極、および他方の端部に裏面側の前記貫通孔の開口を塞ぐように形成された他方の電極と、
前記貫通孔によって露出した前記他方の電極上にダイボンドされた発光素子と
を備えたことを特徴とする発光装置。
An insulating substrate having a through hole;
One electrode formed on one end of the insulating substrate, and the other electrode formed on the other end so as to close the opening of the through hole on the back surface side;
A light emitting device comprising: a light emitting element die-bonded on the other electrode exposed through the through hole.
前記発光素子にファーストボンドされ、前記一方の電極にセカンドボンドされたワイヤを備えたことを特徴とする請求項1記載の発光装置。 The light emitting device according to claim 1, further comprising a wire that is first bonded to the light emitting element and second bonded to the one electrode. 前記絶縁基板は、前記貫通孔の周壁面にメッキ層が形成されていることを特徴とする請求項1または2記載の発光装置。 The light emitting device according to claim 1, wherein the insulating substrate has a plating layer formed on a peripheral wall surface of the through hole.
JP2007076354A 2007-03-23 2007-03-23 Light-emitting device Pending JP2008235765A (en)

Priority Applications (1)

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Family

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07235696A (en) * 1994-02-25 1995-09-05 Sharp Corp Chip part type led and manufacture thereof
JPH08125227A (en) * 1994-10-21 1996-05-17 Shichizun Denshi:Kk Light emitting diode
JP2002324917A (en) * 2001-04-26 2002-11-08 Citizen Electronics Co Ltd Surface mount light emitting diode and method of manufacturing the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07235696A (en) * 1994-02-25 1995-09-05 Sharp Corp Chip part type led and manufacture thereof
JPH08125227A (en) * 1994-10-21 1996-05-17 Shichizun Denshi:Kk Light emitting diode
JP2002324917A (en) * 2001-04-26 2002-11-08 Citizen Electronics Co Ltd Surface mount light emitting diode and method of manufacturing the same

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