JP2008232362A - Equipment supporting device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an equipment supporting device which is not seismically isolated and on which equipment mounted on a seismic isolation plate and equipment mounted on an equipment mount are arranged neighboring each other while avoiding collision with each other. <P>SOLUTION: In earthquake, a seismic isolation sliding material 17 freely slides on a seismic isolation sliding plate 18 in a moving range at a coefficient of dynamic friction μ and is insulated from the vibration of a floor surface 15 to seismically isolate a precision apparatus 10 mounted on the base isolation plate 11. The equipment mount 61 on which supported equipment 30 is mounted is supported by a guide 64, and the guide 64 slides on a rail 66 which has a small coefficient of dynamic friction μ<SB>2</SB>in the direction of leaving the seismic isolation plate 11 and a great coefficient of dynamic friction μ<SB>1</SB>in the direction of approaching the seismic isolation plate 11. Herein, μ1>μ>μ2 is set. Thus, when the seismic isolation plate 11 is moved in the direction of approaching the equipment mount 61, it cannot catch up with the equipment mount 61, and when the equipment mount 61 is moved in the direction of approaching the seismic isolation plate 11, it cannot catch up with the seismic isolation plate 11. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a device support device that mounts a device disposed adjacent to a seismic isolation device and supports the device in a movable manner.

  Expensive and precious equipment (precision equipment) operated in a clean room is installed on a seismic isolation floor to avoid earthquake damage (Patent Document 1).

  By the way, in order to operate precision equipment, in addition to supplying electricity, water, etc. to precision equipment, equipment that supports the supply of raw materials to precision equipment and the receipt of processed products from precision equipment (support) Equipment).

  As an example, as shown in FIG. 11, a support device 20 that supplies raw materials or receives processed products is arranged adjacent to one side of the precision device 10, and The support devices 30 are arranged next to each other.

  In such a layout, it is necessary to install not only the precision device 10 but also the support devices 20 and 30 on the seismic isolation floor 40 so that the precision device 10 and the support devices 20 and 30 do not collide during an earthquake.

  Typical examples of the support devices 20 and 30 include a coater and a developer arranged adjacent to a stepper installed in a clean room, but have sufficient seismic strength and can easily be replaced even if broken. Some devices do not need to be seismically isolated because they are relatively inexpensive.

  From such a fact, as shown in FIG. 12, not the seismic isolation floor 40 but only the precision device 10 is seismically isolated by the seismic isolation device 12, and the support devices 20 and 30 move the precision device 10 at the time of the earthquake. It is conceivable to avoid the range 13 and arrange it with a distance S from the seismic isolation device 12.

  However, in such an arrangement, the precision device 10 and the support devices 20 and 30 are separated from each other by an interval S, which causes inconvenience in the delivery of objects, and the work efficiency of the precision device 10 decreases. There is.

Furthermore, the space S is a space in which equipment or the like cannot be installed, and there is a problem that the layout efficiency of the clean room is lowered from the viewpoint of effective use of the clean room.
JP-A-10-246394

  In view of the above-mentioned fact, the present invention does not make the device support device seismic isolation, and even if the device mounted on the base isolation table and the device mounted on the device mounting table are arranged adjacent to each other, they can collide with each other. The challenge is to avoid it.

  The invention according to claim 1 is a device mounting base disposed adjacent to a base isolation table of a base isolation device, and the device mounting base is movably supported, and the device mounting base is supported by the base isolation in an earthquake. And a support mechanism for moving in a direction away from the table.

  In the first aspect of the invention, the support mechanism moves the device mounting base in a direction away from the base isolation table during an earthquake.

    Thereby, the collision of the equipment mounting base arrange | positioned adjacent to the base isolation table can be avoided. As a result, even if the device mounted on the base isolation table and the device mounted on the device mounting table are arranged adjacent to each other, it is possible to avoid collision with each other during an earthquake.

  In addition, the support mechanism can be moved only in one horizontal direction to move the equipment mounting base away from the base isolation base of the base isolation device, so it is simpler than the base isolation system of the base isolation device that requires movement in the entire horizontal range. Can be realized with a simple mechanism, and the cost is low, and the cost increase is suppressed.

  Furthermore, the support mechanism may be moved only in one horizontal direction, and the range of movement of the device mounting base is limited, so that the layout efficiency of the clean room can be improved.

  The invention according to claim 2 is characterized in that, in the device support apparatus according to claim 1, a support device for supporting operation of the device mounted on the base isolation table is mounted on the device mounting table. .

  In the invention according to claim 2, the device mounting base on which the support device for supporting the operation of the device mounted on the base isolation table moves in a direction away from the base isolation table during an earthquake.

  Thereby, even if the support equipment mounted on the equipment mounting base is arranged adjacent to the equipment mounted on the base isolation base, it is possible to avoid mutual collision during an earthquake.

  According to a third aspect of the present invention, in the equipment support device according to the first or second aspect, the support mechanism includes a spring member that urges the equipment mounting base in a direction away from the base isolation table, and the spring member. A locking mechanism for fixing the device mounting base next to the base isolation table and a release means for detecting the earthquake and releasing the locking mechanism based on the detection result. It is characterized by that.

  In the invention according to claim 3, the release means detects the earthquake and releases the lock mechanism based on the detection result. The device mounting base that has been released moves in a direction away from the base isolation table by the restoring force of the spring member biased away from the base isolation base.

  Thereby, even if the device mounted on the base isolation table and the device mounted on the device mounting base are arranged adjacent to each other, it is possible to avoid collision with each other during an earthquake.

According to a fourth aspect of the present invention, in the equipment support device according to the first or second aspect, the seismic isolation device includes a seismic isolation sliding material that supports the base isolation table, and a seismic isolation slip disposed on a floor surface. A seismic isolation sliding plate that receives the material, and the support mechanism includes a sliding material that supports the device mounting base, and a sliding plate that is disposed on a floor surface and receives the sliding material, and the sliding material of the support mechanism And the sliding plate, the direction in which the equipment mounting base approaches the base isolation table is μ ₁ , the direction in which the equipment mounting base is separated from the base isolation base is μ ₂ , and the base isolation sliding material and the sliding plate When the dynamic friction coefficient with the seismic isolation sliding plate is μ, the relationship between the dynamic friction coefficients μ, μ ₁ , and μ ₂ is μ ₁ >μ> μ ₂ .

In the invention according to claim 4, when the base is moved in a direction approaching the equipment mounting table and at the same time the equipment mounting base is moved in a direction away from the base mounting table, a slip that supports the equipment mounting base. towards the dynamic friction coefficient mu ₂ of wood and the sliding plate is smaller than the dynamic friction coefficient between seismic isolation skids and seismic isolation sliding plate supporting the MenShindai mu, for easy movement, the device mounting base is separated from the MenShindai The distance traveled in the direction is longer than the distance traveled by the base isolation table toward the equipment mounting base, and the base isolation base cannot catch up with the equipment mounting base.

On the other hand, when the equipment mounting base moves in the direction approaching the base isolation base and at the same time the base isolation base moves away from the equipment mounting base, the seismic isolation sliding material that supports the base isolation base and the base isolation sliding plate The coefficient of dynamic friction μ is smaller than the coefficient of dynamic friction μ ₁ between the sliding material and the sliding plate that supports the equipment mounting base, and it is easy to move. The base will be longer than the moving distance in the direction of approaching the base, and the equipment mounting base cannot catch up with the base.

  As a result, the equipment mounting base and the base isolation table do not approach each other more than the distance before the earthquake, and the equipment mounted on the base isolation base and the equipment mounted on the equipment mounting base are arranged adjacent to each other. Even during an earthquake, you can avoid collisions with each other.

According to a fifth aspect of the present invention, in the equipment support device according to the first or second aspect, the seismic isolation device includes a seismic isolation sliding material that supports the base isolation table, and a seismic isolation slip disposed on a floor surface. A base-isolating sliding plate that receives the material, and the support mechanism includes a rail disposed on a floor surface, and a guide member that is provided on the equipment mounting base and moves along the rail. , The slope is descending in a direction away from the base, the resistance when the guide member goes up the rail is F ₁ , and the resistance when the guide member goes down the rail is F ₂ , In the case where the resistance force when the base isolation sliding material slides on the base isolation sliding plate is F, the relationship between the resistance forces F, F ₁ and F ₂ is F ₁ >F> F ₂ Yes.

In the invention according to claim 5, when the seismic isolation table moves in a direction approaching the equipment mounting table at the time of an earthquake and the equipment mounting table moves in a direction away from the seismic isolation table at the same time, the equipment mounting table has a downward slope. better resistive force F ₂ at the time down the rail, less than the resistance force F when the seismic isolation sliding member slides the seismic isolation sliding plate, easy to move. As a result, the movement distance of the equipment mounting base becomes longer than the movement distance of the base isolation base, and the base isolation base cannot catch up with the equipment mounting base.

On the other hand, when the equipment mounting base moves in the direction approaching the base mounting base and at the same time the base isolation base moves away from the equipment mounting base, the resistance force F when the base isolation sliding material slides on the base isolation sliding plate F it is less likely to move than the resistance force F ₁ when climbing the rail upper surface of the slope device mounting base is lowered in. As a result, the movement distance of the base isolation table becomes longer than the movement distance of the equipment mounting base, and the equipment mounting base cannot catch up with the base isolation base.

  As a result, the equipment mounting base and the base isolation table do not approach each other more than the distance before the earthquake, and even if the equipment mounted on the base isolation base and the equipment mounted on the equipment mounting base are arranged next to each other, In the event of an earthquake, collisions can be avoided.

  Since the present invention has the above-described configuration, even if the equipment mounted on the base isolation table and the equipment mounted on the equipment mounting base are arranged adjacent to each other without making the equipment support device seismic isolation, they collide with each other. Can be avoided.

(First embodiment)
As shown in FIG. 1 and FIG. 2, the precision instrument 10 is operating in a state where it is seismically isolated by a seismic isolation device 12 that insulates vibration during an earthquake. In the event of an earthquake, the seismic isolation device 12 segregates the precision device 10 while freely moving in the XY direction within the movement range surrounded by the broken line 14 to prevent the precision device 10 from being damaged or broken.

  The seismic isolation device 12 has a base isolation table 11 on which the precision device 10 is mounted. Between the lower surface of the base isolation table 11 and the floor surface 15, there is provided a base isolation mechanism 16 that insulates the base isolation table 11 from the vibration of the floor surface 15 during an earthquake.

  The seismic isolation mechanism 16 has a base isolation sliding member 17 that is attached to the lower surface of the base isolation base 11 and supports the base isolation base 11 movably.

  The seismic isolation sliding member 17 is a resin-coated steel material and is in contact with the seismic isolation sliding plate 18 with a circular contact surface.

  The seismic isolation sliding plate 18 is made of, for example, flat stainless steel, is disposed on the floor surface 15 where the seismic isolation sliding material 17 is located, and receives the seismic isolation sliding material 17. The base isolation sliding plate 18 is disposed in a range larger than the movement range 14 in the XY direction of the base isolation base 11.

As a result, the seismic isolation sliding member 17 freely slides on the seismic isolation sliding plate 18 in the XY direction up to a distance of S ₁ within the moving range of the broken line 14 during the earthquake, and the base isolation table 11 is placed on the floor. It insulates from the vibration of the surface 15 and isolates the precision device 10 mounted on the base isolation table 11.

  A support device 30 is disposed adjacent to the precision device 10. The support device 30 is a device that directly or indirectly supports the operation of the precision device 10 such as supplying a processing material to the precision device 10 or receiving a processed product from the precision device 10.

  The support device 30 is placed on the device support device 32 and supports the precision device 10 in a state of being placed on the device support device 32.

  The device support device 32 has a device mounting base 31 on which the support device 30 is mounted.

  The equipment mounting base 31 is supported by a support mechanism 39 provided between the equipment mounting base 31 and the floor surface 15 so as to be movable with respect to the floor surface 15. Separate from 11.

  A guide 36 is attached to the lower part of the device mounting base 31. The guide 36 is formed of a steel plate or resin so as to straddle the rail 34, and slides on the rail 34 while supporting the device mounting base 31.

The rail 34 is disposed on the floor 15 and receives a guide 36. The rail 34 is formed of a steel material and extends in the illustrated right direction (R direction), that is, in a direction away from the seismic isolation table 11. The length of the rail 34 is the length required for device mounting base 31 moves the distance S _2. Here, the distance S ₂ is longer than the distance S _{1 at} which the base isolation table 11 moves in the direction of the device mounting table 31.

  Further, the support mechanism 39 includes a spring mechanism 40 that urges the device mounting base 31 in a direction away from the seismic isolation base 11. The spring mechanism 40 attaches one end of the spring 41 to the end surface 31b of the equipment mounting base 31, attaches the other end of the spring 41 to the spring member fixing tool 42, and removes the equipment mounting base 31 from the base isolation base 11 by the restoring force of the spring. It is energized in the direction of separation (R direction in the figure). The spring member fixture 42 is fixed to the floor 15.

  The support mechanism 39 has a lock mechanism 43 that fixes the device mounting base 31 next to the base isolation table 11 in a state where the spring mechanism 40 biases the device mounting base 31 away from the base isolation table 11. ing.

  The lock mechanism 43 includes an air cylinder 44 fixed to the floor surface. The lot 48 of the air cylinder 44 can be expanded and contracted, and in the extended state, the air cylinder 44 is inserted into a fixed concave portion 47 provided in a concave shape at the lower portion of the device mounting base 31, and is removed from the fixed concave portion 47 of the lot 48 when contracted.

  The expansion and contraction of the lot 48 is performed based on a command (fixed command, release command) from a control unit (not shown) provided on the floor 15. Further, a vibration sensor (not shown) is disposed on the floor surface 15. When this vibration sensor detects an earthquake, it outputs earthquake information to the control unit.

  Next, the operation of the present invention will be described with reference to FIG.

  When the device mounting base 31 is installed at a predetermined position, the control unit issues a lock command to the air cylinder 41 in response to the operator's locking operation. The air cylinder 41 receives the fixing command, extends the lot 48, inserts the lot 48 into the fixing recess 47, and locks the fixing recess 47. As a result, the device mounting base 31 is locked at a predetermined position. Furthermore, the locked state is maintained.

  On the other hand, during an earthquake, the vibration sensor detects the earthquake and outputs earthquake information to the control unit. The control unit determines the input earthquake information, and issues a release command to the air cylinder 41 when the input value is larger than a predetermined threshold value. In response to the release command, the air cylinder 41 contracts the lot 48 and extracts the lot 48 from the fixed recess 47. As a result, the lock of the device mounting base 31 is released.

By releasing the lock between the lot 48 and the fixed recess 47, the device mounting base 31 is restored by the spring 41, and the guide 34 and the guide 34 are moved away from the seismic isolation base 11 along the rail 34. was moved a distance S ₂ while sliding, it reaches the position of the dashed line 34 (see FIG. 1).

As a result, even if the precision device 10 is mounted on the base isolation table 11 and moved by the distance S _{1 in} the direction of the support device 30, the device mounting table 31 is separated from the base isolation table 11 (indicated by the arrow R). is moving in the direction) by a distance _{S 2,} the outside of the movement range 14 of S 1 _{<S 2} Tosureba MenShindai 11.

  For this reason, even if the precision device 10 and the support device 30 are arranged adjacent to each other, the precision device 10 mounted on the base isolation table 11 and the support device 30 mounted on the device mounting table 31 may collide. There is no.

  Further, since the support mechanism 39 only needs to move in one horizontal direction away from the base isolation table 11 of the base isolation device 12, the support mechanism 39 can be used as the base isolation mechanism 16 of the base isolation device 12 that is required to move in the entire horizontal range. Compared to a simple mechanism, the cost can be reduced and the cost can be suppressed.

  Furthermore, since the equipment mounting base 31 moves only in one horizontal direction away from the base isolation table 11, it does not move to the shaded portion 35 shown in FIG. 4, and the shaded portion 35 is used for other purposes. Can do. Thus, since the movement range of the device mounting base 31 is limited, the clean room can be used efficiently.

The other support device 20 that supports the operation of the seismic isolation device 10 is placed on the device support device 22 and arranged next to the seismic isolation device 10. Here, the configuration, operation, and effect of the device support device 22 are the same as those of the device support device 32 described above, and a description thereof will be omitted.
(Second Embodiment)
The second embodiment will be described with reference to FIGS.

  The arrangement of the precision device 10 and the support devices 20 and 30 in the second embodiment is the same as that shown in FIG. Furthermore, the configuration of the seismic isolation device 12 for isolating the precision device 10 is the same as that of the first embodiment. The description of the same parts as those in the first embodiment is omitted.

  As shown in FIG. 5, the support device 30 is placed on the device support device 60 and is disposed adjacent to the base isolation table 11.

  The device support device 60 includes a device mounting table 61 on which the support device 30 is mounted. The device mounting device 61 supports the device mounting table 61 between the lower surface and the floor surface of the device mounting table 61, and at the time of an earthquake, the device mounting table. A support mechanism 62 for moving 61 in a direction away from the base isolation table 11 is provided.

  The support mechanism 62 has a guide 64 attached to the lower part of the device mounting base 61. Here, the guide 64 is formed of a steel plate or a resin so as to straddle the rail 66, and is arranged so as to be slidable on the rail 66 in both directions of arrows A and B while supporting the device mounting base 61. Yes.

  The rail 66 is formed of a steel material, receives the guide 64, and extends linearly on the floor 15 in a direction away from the base isolation table 11 (A direction in the drawing).

The length of the rail 66, the instrument mounting base 61 there is a longer distance than the distance S ₂ is the distance required to move. Here, the distance S ₂ is longer than the distance S _{1 at} which the base isolation table 11 moves in the direction of the support equipment mounting table 61.

In such a configuration, the dynamic friction coefficient between the guide 64 and the rail 66 is set to a different value depending on the traveling direction of the guide 64. That is, the dynamic friction coefficient μ _{2 in} the direction in which the guide 64 moves away from the base isolation table 11 (A direction) is small, and the dynamic friction coefficient μ _{1 in the} direction approaching the base isolation table 11 (B direction) is large and is set to a different value. Yes. At this time, the dynamic friction coefficient μ between the base isolation sliding member 17 constituting the base isolation mechanism 16 of the base isolation device 12 and the base isolation sliding plate 18 supporting the base isolation sliding member 17 is the dynamic friction coefficient μ ₁ and μ _2. Is set to an intermediate value.

  FIG. 6 shows an example of a specific shape of the rail 66 for changing the dynamic friction coefficient according to the moving direction.

That is, the upper surface of the rail 66, a certain distance L ₁ in a direction (direction of arrow A) away from MenShindai 11 has a gentle upward slope rising by a height h. Followed by a constant distance L ₂ has a steep downward slope that drops by a height h. The ascending slope L ₁ and the descending slope L ₂ are configured to repeat continuously. In this case, the distance L ₁ of the upstream slope is set longer than the distance L ₂ of the downslope.

  By making the surface of the rail 66 into such a slope shape, when the guide 64 slides in the direction away from the base isolation table 11 (arrow A direction), it will continue to travel on a gentle up slope, The coefficient of dynamic friction between the surface of the rail 66 and the guide 64 is kept small.

  On the other hand, when the guide 64 slides in the direction approaching the seismic isolation base 11 (the direction of arrow B), the guide 64 travels continuously over the steep ascending slope having a height h, and the surface of the rail 66 and the guide 64 are moved. The coefficient of dynamic friction increases with difficulty.

With this configuration, the dynamic friction coefficient μ _{2 in a} direction away from the base isolation table 11 and the dynamic friction coefficient μ _{1 in a} direction approaching the base isolation table 11 can be set to different values.

  Next, the behavior of the base isolation table 11 and the equipment mounting table 61 at the time of an earthquake caused by changing the dynamic friction coefficient of the support device depending on the traveling direction will be described with the results obtained by numerical calculation under the following conditions. .

  In the calculation method, the base isolation table 11 and the equipment mounting base 61 are arranged at the positions shown in FIG. 5, and in this arrangement state, the seismic wave for numerical calculation is input, and the base isolation base 11 and the support equipment mounting base for the input seismic wave. For 61, the response acceleration, relative acceleration, and movement distance were calculated.

In the calculation, the coefficient of dynamic friction between the base isolation sliding member 17 and the base isolation sliding plate 18 which is the base isolation mechanism 16 of the base isolation base 11 is μ, and the direction in which the equipment mounting base 61 approaches the base isolation base 11 (arrow B). The dynamic friction coefficient is μ ₁ , the dynamic friction coefficient in the direction in which the device mounting base 62 is separated from the base isolation table 11 (arrow A) is μ ₂ , and the relationship between the dynamic friction coefficients μ, μ ₁ , and μ ₂ is μ ₁ >μ> μ ₂ . did.

FIG. 7 shows the calculation result in the base isolation table 11. The horizontal axis shows the elapsed time (seconds) since the occurrence of the earthquake. 7A shows acceleration (cm / s ² ), FIG. 7B shows relative acceleration (cm / s ² ), and FIG. 7C shows relative displacement (cm). ing.

FIG. 7A shows an input acceleration X ₁ (acceleration of the floor 15) that is an acceleration of an input seismic wave and a base isolation acceleration X ₂ that is an acceleration at which the base isolation table 11 moves in response to the input acceleration X ₁ . The time change is shown.

Since the dynamic friction coefficient of the seismic isolation mechanism 16 is μ, the seismic isolation mechanism X ₂ slips in the seismic isolation mechanism 16 in the time zone T ₁ where the input acceleration X ₁ does not exceed the acceleration μg (g is gravitational acceleration). does not occur, the input acceleration X ₁ and the same acceleration, moving floor 15 and together.

On the other hand, in the time zones T ₂ and T ₃ where the input acceleration X ₁ exceeds the acceleration μg, the seismic isolation sliding material 17 supporting the base isolation table 11 starts to slide on the seismic isolation sliding plate 18. As a result, the seismic isolation accelerations X ₂ are not exceed the acceleration [mu] g, becomes constant value at acceleration [mu] g, seismic isolation effect is exhibited. On the other hand, input acceleration X ₁ is the acceleration continues for more than the acceleration [mu] g. As a result, the difference between the input acceleration X ₁ and seismic isolation accelerations X ₂ (relative acceleration) occurs.

The time period T ₃ which negative portion of the acceleration has occurred, indicates that the direction of acceleration is the direction opposite (acceleration direction of the positive portion) a predetermined direction.

  Next, the relative acceleration between the acceleration of the base isolation table 11 and the acceleration of the floor 15 will be described.

In FIG. 7A, in the time zones T ₂ and T ₃ , there is a difference between the input acceleration X ₁ and the seismic isolation acceleration X ₂ . This acceleration difference is the relative acceleration Y ₁ between the base isolation table 11 and the floor 15. FIG. 7 (B) shows the relative acceleration _{Y 1} determined from the difference between the input acceleration _{X 1} and seismic isolation accelerations _{X 2.}

The relative acceleration Y ₁ is not generated at the relative speed 54 of zero because the input acceleration X ₁ is small in the time zone T ₁ and the floor 15 and the base isolation table 11 are moving together. However, the input acceleration X ₁ large time period T2, since the seismic isolation accelerations X ₂ is kept constant at the input acceleration X ₁ value less than ([mu] g), relative acceleration Y ₁ occurs. Further, even in the time zone _{T 3,} also the relative acceleration _{Y 2} has occurred. In this case, since the acceleration direction is opposite, the value is in the minus direction.

Next, using the values of the relative accelerations Y ₁ and Y _{2 in} the time zones T ₂ and T ₃ , the relative accelerations Y ₁ and Y ₂ are second-order integrated, so that the relative displacement of the base isolation table 11 relative to the floor surface 15 is achieved. determine the amount _{Z 1.}

The result is a gentle wave shape having a peak, as shown in FIG. From the results, the relative displacement amount Z ₁ is about 2 cm at the maximum on the plus side and about 3 cm at the maximum on the minus side. In order to avoid a collision with the base isolation table 11, It is necessary to move the mounting table 61.

  FIG. 8 shows the calculation result for the device mounting base 61. This is a result of inputting the same seismic wave as the calculation of the base isolation table 11 shown in FIG. 7 and performing the same processing based on the same calculation conditions. The display of the vertical axis and the horizontal axis is the same as in FIG.

FIG. 8 (A) is an input acceleration X _1, is device mounting base 61 in response to input acceleration X ₁ shows a device accelerations X ₃ which has moved. In addition, since the value of the coefficient of dynamic friction of the equipment mounting base 61 varies depending on the moving direction, the direction in which the equipment mounting base 61 is separated from the base isolation table 11 (plus side) and the direction in which the equipment mounting base 61 approaches the base isolation base 11 ( the value of the device acceleration X ₃ de negative side) is different.

That is, since the dynamic friction coefficient μ ₂ is small on the plus side, the device acceleration X ₃ is kept constant at a small value (μ ₂ g). On the other hand, since the dynamic friction coefficient μ ₁ is large on the minus side, the device acceleration X ₃ is also kept constant at a large value (μ ₁ g).

FIG. 8B shows the relative acceleration Y ₃ obtained from the difference in acceleration between the input acceleration X ₁ and the device acceleration X ₃ . Due to the difference in the characteristics of the device acceleration X ₃ described above, the relative acceleration Y ₃ increases on the plus side, and the relative acceleration Y ₃ decreases on the minus side.

FIG. 8 (C) from the value of the relative acceleration Y _3, is a result of obtaining the relative displacement amount Z ₂ relative to the floor of the relative acceleration Y ₃ a second-order integration to support equipment accelerations X _3. As in FIG. 7C, it has a gentle wave shape having a peak. However, the difference in characteristics of the devices described above accelerations X _3, relative displacement amount Z ₂ direction (plus side) away from MenShindai 11 is large, the relative amount of displacement Z direction (minus side) closer to MenShindai 11 ₂ shifts to the smaller side.

Figure 9 is a relative displacement amount Z ₁ of MenShindai 11 shown in FIG. 7 (C), and a relative displacement amount Z ₂ of the device mounting base 61 shown in FIG. 8 (C), superimposed on the same coordinates It is the result shown. In the direction (plus side) in which the device mounting base 61 moves away from the base isolation table 11, the relative displacement amount Z ₂ of the device mounting base 61 is larger than the relative displacement amount Z ₁ of the base isolation base 11. On the other hand, in the direction in which the equipment mounting base 61 approaches the base isolation table 11 (minus side), the relative displacement amount Z ₁ of the base isolation base 11 is greater than the relative displacement amount Z ₂ of the equipment mounting base 61. Yes.

  From the above, when the seismic isolation base 11 moves in the direction approaching the equipment mounting base 61 and at the same time the equipment mounting base 61 moves away from the base isolation base 11 during an earthquake, the equipment mounting base 61 is in the base isolation base. The amount of displacement that moves in a direction away from 11 becomes larger than the amount of displacement that the base isolation table 11 moves toward the device mounting table 61, and the base isolation table 11 cannot catch up with the device mounting table 61.

  On the other hand, when the equipment mounting base 61 moves in a direction approaching the base isolation base 11 and at the same time the base isolation base 11 moves in a direction away from the equipment mounting base 61, the direction in which the base isolation base 11 moves away from the equipment mounting base 61. Is larger than the displacement amount in the direction in which the device mounting base 61 approaches the base isolation table 11, and the device mounting base 61 cannot catch up with the base isolation base 11.

  Thereby, the equipment mounting base 61 and the base isolation base 11 do not approach each other more than the distance before the earthquake, and the precision equipment 10 and the equipment mounting base 61 mounted on the base isolation base 11 of the base isolation device 12 are connected to each other. Even if the installed support devices 30 are arranged next to each other, it is possible to avoid a collision with each other during an earthquake.

  Further, since the support mechanism 39 moves on the rail 66 in one horizontal direction away from the base isolation table 11 of the base isolation device 12, the base isolation device is required to move in the entire horizontal range. This can be realized with a simpler mechanism than the 12 seismic isolation mechanisms 16, becomes inexpensive in cost, and suppresses an increase in cost.

Further, since the device mounting base 31 moves on the rail 66 in one horizontal direction away from the seismic isolation base 11, it does not move the shaded portion 35 of FIG. It can be used for other purposes and the clean room can be used efficiently.
(Third embodiment)
The basic configuration of the third embodiment is the same as that of the second embodiment shown in FIG. Furthermore, the structure of the seismic isolation device 12 is the same as that of the first and second embodiments. The third embodiment is different from the second embodiment in that the rail 66 constituting the support mechanism 62 is changed to a rail 70. A description of the same parts as those of the second embodiment already described is omitted.

As shown in FIG. 10, the rail 70 is disposed on the floor 15 in one horizontal direction. Rail 70 is linearly formed from steel, the length of the rail 70, the instrument mounting base 61 there is a longer distance than the distance S ₂ to be moved. Here, the distance S ₂ is set to a value larger than the distance S _{1 at} which the base isolation table 11 moves in the direction of the device mounting table 61.

  Further, the rail 70 is formed with a downward gradient (inclination angle θ) in a direction away from the base isolation table 11 (arrow A direction).

  A guide 72 is disposed on the upper surface of the rail 70 so as to be slidable in both directions of arrows A and B. The guide 72 is formed of a steel plate and has a shape straddling the rail 70, and an equipment mounting base 61 (not shown) is supported on the guide 72, and the support equipment 30 (not shown) is supported on the equipment mounting base 61. It is installed.

The dynamic friction coefficient on the friction surface between the rail 70 and the guide 72 is μ ₀ , and the dynamic friction coefficient of the seismic isolation mechanism is also the same μ ₀ . Other basic configurations are the same as those of the second embodiment.

  Next, the operation of the rail 70 will be described.

Since the dynamic friction coefficient of the friction surface between the rail 70 and the guide member 72 is μ ₀ , the dynamic friction coefficient of the seismic isolation mechanism is also μ ₀ , and the inclination angle of the rail 70 with respect to the horizontal is θ, the guide member 72 moves up the rail 70. resistance F ₂ when sliding in the direction direction down the resistance force F ₁ and the rail when the slide (in the direction of arrow B) (the direction of arrow a), the secondary of the main and additional gravity caused by the inertia force Except for these terms, they are expressed by equations (1) and (2).

  Here, m is the total mass of the support device 30 supported by the guide 72 and the mass of the device mounting base 61 (including the guide 72), and g is the gravitational acceleration.

As apparent from the equations (1) and (2), when the apparent dynamic friction coefficients are expressed as μ ₁ and μ ₂ and the dynamic friction coefficients of F ₁ and F ₂ are expressed as μ ₁ and μ ₂ , the expression (3) (4).

F ₁ = μ ₀ mg + mg tan θ = (μ ₀ + tan θ) mg (1)
F ₂ = μ ₀ mg-mg tan θ = (μ ₀ −tan θ) mg (2)
μ ₁ = μ ₀ + tan θ (3)
μ ₂ = μ ₀ −tan θ (4)
Here, if the resistance force when the seismic isolation sliding member 17 slides on the seismic isolation sliding plate 18 is F, the relationship between the resistance forces F, F _{2 and} F ₁ can be F ₁ >F> F _2. .

  That is, when the rail 70 is inclined downwardly in a direction away from the base isolation table 11, the device mounting base 61 approaches the base isolation base 11, and the device mounting base 61 appears in a direction away from the base isolation base 11. The dynamic friction coefficient can be set to a different value (a value in which the direction of separation is small), and the dynamic friction coefficient of the base isolation table 11 can be set in the middle.

  From this, as explained in the second embodiment, during the earthquake, the base isolation table 11 moves in a direction approaching the equipment mounting base 61 and at the same time, the equipment mounting base 61 moves in a direction away from the base isolation base 11. In this case, the movement distance of the equipment mounting base 61 is longer than the movement distance of the base isolation base 11, and the base isolation base 11 cannot catch up with the equipment mounting base 61.

  On the other hand, when the equipment mounting base 61 moves in a direction approaching the base isolation base 11 and the base isolation base 11 moves away from the equipment mounting base 61 at the same time, the movement distance of the base isolation base 11 is the equipment mounting base 61. Thus, the device mounting base 61 cannot catch up with the base isolation base 11.

  Thereby, the equipment mounting base 61 and the base isolation base 11 do not approach each other more than the distance before the earthquake, and the precision equipment 10 and the equipment mounting base 61 mounted on the base isolation base 11 of the base isolation device 12 are connected to each other. Even if the installed support devices 30 are arranged next to each other, it is possible to avoid a collision with each other during an earthquake.

  Moreover, since the rail track is in one horizontal direction and the guide 72 slides with the rail 70 interposed therebetween, the device mounting base 61 does not move in a direction perpendicular to the straight line. Since the device mounting base 61 does not move in the direction orthogonal to the rail 70, the shaded portion 35 of FIG. 4 can be effectively used, and the layout efficiency of the clean room can be increased.

  In the first to third embodiments described above, the device disposed adjacent to the precision device 10 has been described as the support device 30. However, the device mounted base 31 is disposed adjacent to the precision device 10. , 61 is not necessarily limited to the support device 30 and may be a device arranged adjacent to the precision device 10 although it is not a support device, such as a line for transporting a product.

It is a figure which shows the equipment arrangement | positioning around the precision equipment which concerns on the 1st Embodiment of this invention. It is explanatory drawing which shows the structure of the support mechanism and base isolation table which concern on the 1st Embodiment of this invention. It is explanatory drawing which shows the effect | action of the support mechanism which concerns on the 1st Embodiment of this invention. It is explanatory drawing which shows the movement range of the equipment mounting base and base isolation table which concern on the 1st Embodiment of this invention. It is explanatory drawing which shows the structure of the support mechanism which concerns on the 2nd Embodiment of this invention. It is a figure which shows the surface shape of the rail which concerns on the 2nd Embodiment of this invention. It is explanatory drawing which shows the behavior of the base isolation table at the time of an earthquake. It is explanatory drawing which shows the behavior of the equipment mounting base which concerns on the 2nd Embodiment of this invention at the time of an earthquake. It is explanatory drawing which shows the relative positional relationship of the base isolation table and the apparatus mounting base which concerns on the 2nd Embodiment of this invention at the time of an earthquake. It is a figure which shows the structure of the rail which concerns on the 3rd Embodiment of this invention. It is a figure which shows the equipment arrangement | positioning around the conventional precision instrument. It is a figure which shows the surrounding device arrangement | positioning at the time of isolating the conventional precision instrument.

Explanation of symbols

10 Equipment (Precision equipment)
12 Seismic Isolation Device 11 Seismic Isolation Table 16 Seismic Isolation Mechanism 17 Seismic Isolation Sliding Material 18 Seismic Isolation Sliding Plate 30 Supporting Equipment 31 Equipment Mounting Base 32 Equipment Supporting Device 34 Rail (Sliding Board)
36 Guide members (sliding materials, guides)
39 Support Mechanism 41 Spring Member (Spring)
43 Locking mechanism 60 Device support device 61 Device mounting base 62 Support mechanism 64 Guide member (sliding material, guide)
66 rail (sliding plate)

Claims (5)

An equipment mounting base arranged adjacent to the base isolation base of the base isolation device;
A support mechanism for movably supporting the device mounting table and moving the device mounting table in a direction away from the base isolation table during an earthquake;
A device support device comprising: The device support apparatus according to claim 1, wherein a support device that supports operation of the device mounted on the base isolation table is mounted on the device mounting table. The support mechanism is
A spring member for biasing the device mounting base in a direction away from the base isolation table;
A lock mechanism for fixing the device mounting base next to the base isolation table in a state of being biased by the spring member;
Release means for detecting the earthquake and releasing the lock mechanism based on the detection result;
The apparatus supporting apparatus according to claim 1, wherein the apparatus supporting apparatus is provided. The seismic isolation device includes a base isolation sliding material that supports the base isolation table, and a base isolation sliding plate that is disposed on a floor and receives the base isolation sliding material,
The support mechanism includes a sliding material that supports the device mounting base, and a sliding plate that is disposed on a floor surface and receives the sliding material,
The coefficient of dynamic friction between the sliding material and the sliding plate of the support mechanism is defined as μ _{1 in} the direction in which the device mounting base approaches the base isolation table, and μ _{2 in the} direction in which the device mounting base is separated from the base isolation table,
In the case where the dynamic friction coefficient between the seismic isolation sliding material and the base isolation sliding plate is μ,
The apparatus support device according to claim ₁ , wherein the relationship between the dynamic friction coefficients μ, μ ₁ , and μ ₂ is μ ₁ >μ> μ ₂ . The seismic isolation device includes a base isolation sliding material that supports the base isolation table, and a base isolation sliding plate that is disposed on a floor and receives the base isolation sliding material,
The support mechanism is
Rails placed on the floor,
A guide member provided on the device mounting base and moving along the rail;
Consisting of
The rail has a downward slope in a direction away from the base isolation table,
The resistance force when the guide member goes up the rail is F ₁ , and the resistance force when the guide member goes down the rail is F ₂ ,
In the case where the resistance force when the base isolation sliding material slides on the base isolation sliding plate is F,
The apparatus support apparatus according to claim ₁ , wherein the relationship between the resistance forces F, F ₁ and F ₂ is F ₁ >F> F ₂ .

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