JP2008198681A5 - - Google Patents
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- Publication number
- JP2008198681A5 JP2008198681A5 JP2007029998A JP2007029998A JP2008198681A5 JP 2008198681 A5 JP2008198681 A5 JP 2008198681A5 JP 2007029998 A JP2007029998 A JP 2007029998A JP 2007029998 A JP2007029998 A JP 2007029998A JP 2008198681 A5 JP2008198681 A5 JP 2008198681A5
- Authority
- JP
- Japan
- Prior art keywords
- conductive polymer
- silica
- alumina
- insulating portion
- solid electrolytic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001940 conductive polymer Polymers 0.000 claims 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 8
- 239000003990 capacitor Substances 0.000 claims 7
- 239000007787 solid Substances 0.000 claims 7
- LRCFXGAMWKDGLA-UHFFFAOYSA-N dioxosilane;hydrate Chemical compound O.O=[Si]=O LRCFXGAMWKDGLA-UHFFFAOYSA-N 0.000 claims 4
- 239000000377 silicon dioxide Substances 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- 238000001035 drying Methods 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 229920000123 polythiophene Polymers 0.000 claims 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007029998A JP4770750B2 (ja) | 2007-02-09 | 2007-02-09 | 固体電解コンデンサおよびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007029998A JP4770750B2 (ja) | 2007-02-09 | 2007-02-09 | 固体電解コンデンサおよびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008198681A JP2008198681A (ja) | 2008-08-28 |
| JP2008198681A5 true JP2008198681A5 (cg-RX-API-DMAC7.html) | 2010-03-04 |
| JP4770750B2 JP4770750B2 (ja) | 2011-09-14 |
Family
ID=39757380
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007029998A Expired - Fee Related JP4770750B2 (ja) | 2007-02-09 | 2007-02-09 | 固体電解コンデンサおよびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4770750B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5091710B2 (ja) * | 2008-02-18 | 2012-12-05 | 三洋電機株式会社 | 固体電解コンデンサおよびその製造方法 |
| JP5274344B2 (ja) * | 2009-04-01 | 2013-08-28 | 三洋電機株式会社 | 固体電解コンデンサ |
| US8354166B2 (en) | 2011-02-28 | 2013-01-15 | General Electric Company | Coated polymer dielectric film |
| JP6400584B2 (ja) * | 2013-08-09 | 2018-10-03 | 昭和電工株式会社 | 固体電解コンデンサ素子 |
| CN108701547B (zh) | 2016-03-10 | 2020-10-30 | 松下知识产权经营株式会社 | 固体电解电容器及其制造方法 |
| JP2023104024A (ja) * | 2022-01-17 | 2023-07-28 | テイカ株式会社 | 電解コンデンサおよびその製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2790100B2 (ja) * | 1994-11-25 | 1998-08-27 | 日本電気株式会社 | 固体電解コンデンサ及びその製造方法 |
| JPH1050561A (ja) * | 1996-07-31 | 1998-02-20 | Hitachi Aic Inc | 固体電解コンデンサ |
| JPH10247612A (ja) * | 1997-03-04 | 1998-09-14 | Fujitsu Towa Electron Kk | 固体電解コンデンサ |
| JP2000133556A (ja) * | 1998-10-23 | 2000-05-12 | Hitachi Ltd | 固体電解コンデンサ及びその製造方法 |
| JP4019902B2 (ja) * | 2002-11-13 | 2007-12-12 | 松下電器産業株式会社 | 固体電解コンデンサおよびその製造方法 |
-
2007
- 2007-02-09 JP JP2007029998A patent/JP4770750B2/ja not_active Expired - Fee Related
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