JP2008197673A - Liquid crystal display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid crystal display device which positively prevents the light leakage of blue light that occurs in the outer part of a display region when a shielding film is constituted by piling up a red color filter and a blue color filter. <P>SOLUTION: A liquid crystal display device has: a TFT substrate 150 having a plurality of pixel electrodes formed on one of the face sides and an orientation membrane 156 that covers the pixel electrodes; a CF substrate 160 having color filters of red, green and blue that are disposed opposed to the pixel electrodes, and a black matrix constituted by piling up a blue color filter and a red color filter, a counter electrode that covers the color filters and the black matrix, and an orientation membrane 166 that covers the counter electrode; and a liquid crystal 49 with negative dielectric constant anisotropy that is sealed between the TFT substrate 150 and the CF substrate 160. A redundant shielding membrane 163 to interrupt blue light is formed at the outside part of the display region. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display device in which color filters are stacked to form a light shielding film.

  The active matrix liquid crystal display device prevents crosstalk by providing each pixel with a switch that shuts off a signal when it is not selected, and is superior to a simple matrix liquid crystal display device. Display characteristics are shown. In particular, a liquid crystal display device using a TFT (Thin Film Transistor) as a switch has a high TFT driving capability, and thus exhibits excellent display characteristics comparable to a CRT (Cathode-Ray Tube).

  FIG. 43 is a cross-sectional view showing the structure of a general TN (Twisted Nematic) type liquid crystal display device. The TN liquid crystal display device has a structure in which a liquid crystal 69 having a positive dielectric anisotropy is sealed between two glass substrates 61 and 71 arranged opposite to each other. On the upper surface side of one glass substrate 61, TFTs (not shown), pixel electrodes 62, bus lines 63, a planarizing layer 64, and an alignment film 66 are formed. The pixel electrode 62 is made of ITO (indium-tin oxide) which is a transparent conductive material, and a voltage corresponding to an image is supplied to the pixel electrode 62 through the bus line 63 and the TFT at a predetermined timing. The The planarization layer 64 is formed of an insulating material and covers the pixel electrode 62 and the bus line 63. A horizontal alignment film 66 made of polyimide or the like is formed on the planarizing layer 64. The surface of the alignment film 66 is subjected to an alignment process in order to determine the alignment direction of the liquid crystal molecules when no voltage is applied. As a typical method of alignment treatment, a rubbing method is known in which the surface of an alignment film is rubbed in one direction with a cloth roller.

  A black matrix 72, a color filter 73, a planarizing layer 74, a counter electrode 75 and an alignment film 76 are formed on the lower surface side of the glass substrate 71. The black matrix 72 is made of a metal such as Cr (chromium) in order to prevent light from passing through the region between the pixels. The color filter 73 has three colors of red (R), green (G), and blue (B), and one of the R, G, and B color filters 73 faces one pixel electrode 62. The planarizing layer 74 is formed so as to cover the black matrix 72 and the color filter 73, and a counter electrode 75 made of ITO is formed below the planarizing layer 74. A horizontal alignment film 76 is formed below the counter electrode 75. The surface of the alignment film 76 is also rubbed. However, the rubbing direction of the alignment film 66 and the rubbing direction of the alignment film 76 differ by 90 °.

  The substrates 61 and 71 are arranged with a spherical or cylindrical spacer 79 interposed therebetween, and the layer thickness (hereinafter referred to as “cell thickness”) of the liquid crystal 69 is maintained constant by the spacer 79. The spacer 79 is made of, for example, plastic or glass. Further, polarizing plates (not shown) are attached to the lower surface side of the glass substrate 61 and the upper surface side of the glass substrate 71, respectively. In the normally white mode liquid crystal display device, the two polarizing plates are arranged so that the polarization axes are orthogonal to each other, and in the normally black mode liquid crystal display device, the two polarizing plates are arranged in parallel.

  Hereinafter, a substrate on which a TFT, a pixel electrode, an alignment film and the like are formed is referred to as a TFT substrate, and a substrate on which a color filter, a counter electrode, an alignment film and the like are formed is referred to as a CF substrate. FIG. 44 is a schematic diagram showing the operation of a normally white mode TN liquid crystal display device. As shown in FIG. 44, in the normally white mode liquid crystal display device, the two polarizing plates 67 and 77 are arranged so that their polarization axes are orthogonal to each other. Since the TN liquid crystal display device uses the liquid crystal 69 having a positive dielectric anisotropy and the horizontal alignment films 66 and 76, the liquid crystal molecules 69 a in the vicinity of the alignment films 66 and 76 are rubbed in the alignment films 66 and 76. Oriented to As shown in FIG. 44 (a), in a TN liquid crystal display device in which two polarizing plates 67 and 77 are arranged so that their polarization axes are orthogonal, the liquid crystal molecules 69a between the two alignment films 66 and 76 are The orientation direction is spirally changed from one substrate 61 side toward the other substrate 71 side. At this time, the light passing through the polarizing plate 67 becomes linearly polarized light and enters the liquid crystal 69 layer. Since the liquid crystal molecules 69 a are gradually twisted and aligned, the polarization direction of the input light is also gradually twisted, and the light passes through the polarizing plate 77.

  When the voltage between the pixel electrode 62 and the counter electrode 75 is gradually increased, the liquid crystal molecules 69a start to rise in the direction of the electric field at a certain voltage (threshold), and when a sufficient voltage is applied, FIG. As shown in (b), the liquid crystal molecules 69 a are substantially perpendicular to the substrates 61 and 71. At this time, the light passing through the polarizing plate 67 cannot pass through the polarizing plate 77 because the polarization axis does not rotate in the layer of the liquid crystal 69.

  In other words, in the TN liquid crystal display device, the liquid crystal molecules change from a state almost parallel to the substrates 61 and 71 to a state almost perpendicular to the substrates 61 and 71 according to the applied voltage, and the transmittance of light transmitted through the liquid crystal display device is also increased. Will change accordingly. A desired image can be displayed on the liquid crystal display device by controlling the light transmittance for each pixel. By the way, the TN liquid crystal display device having the above-described structure has poor viewing angle characteristics. That is, when an image is viewed from a direction perpendicular to the substrate, good display quality can be obtained, but when the image is viewed from an oblique direction, the contrast is remarkably lowered or the contrast is reversed.

  As a method for improving the viewing angle characteristics of a TN liquid crystal display device, alignment division is known. This is achieved by providing two or more regions having different orientation directions in one pixel. Specifically, one pixel region is divided into two or more regions, and rubbing is performed so that the rubbing directions of the alignment films are different. As a result, light leaking in one region is blocked in the other region, so that a reduction in contrast in halftone display is improved.

  In recent years, a vertical alignment type liquid crystal display device has attracted attention as a liquid crystal display device having a better viewing angle characteristic and display quality than a TN type liquid crystal display device. A TN liquid crystal display device uses a combination of a liquid crystal having a positive dielectric anisotropy (positive liquid crystal) and a horizontal alignment film, whereas a vertical alignment liquid crystal display device has a negative dielectric anisotropy. A liquid crystal (negative liquid crystal) having a vertical alignment film is used in combination. In a vertical alignment type liquid crystal display device, when no voltage is applied between the pixel electrode and the counter electrode, the liquid crystal molecules are aligned in a direction substantially perpendicular to the substrate, and a voltage is applied between the pixel electrode and the counter electrode. The alignment direction of the liquid crystal molecules is inclined in a horizontal direction with respect to the substrate.

  By the way, in the conventional vertical alignment type liquid crystal display device, the cell thickness is maintained at a constant thickness by the spacer as in the TN type liquid crystal display device shown in FIG. As described above, the spacer is made of a spherical or cylindrical plus chip or glass, and is spread on one of the substrates when the TFT substrate and the CF substrate are bonded together.

  Therefore, the conventional vertical alignment type liquid crystal display device requires a step of spraying spacers, which is complicated. Further, the cell thickness becomes non-uniform due to the dispersion of the dispersion density of the spacers, and the display quality is deteriorated. Further, when a vibration or impact is applied, the spacer moves and causes variation in cell thickness. Furthermore, when a strong pressure is applied to the glass substrate, the spacers sink into the color filter and the cell thickness changes.

  An object of this invention is to provide the liquid crystal display device with favorable display quality.

  The above-described problem is, as illustrated in FIG. 39, a first substrate 150 having a plurality of first electrodes formed on one surface side and a first alignment film 156 covering the first electrodes. A red matrix of red, green, and blue color filters disposed opposite to the first electrode of the first substrate 150; a black matrix configured by overlapping at least two color filters; and the color filter And a second substrate 160 having a second electrode that covers the black matrix and a second alignment film 166 that covers the second electrode, and the first substrate 150 and the second substrate 160. In a liquid crystal display device having a liquid crystal 49 having negative dielectric anisotropy enclosed between them, redundant light shielding for blocking blue light in an outer portion of a display region in which the plurality of first electrodes are arranged Film 163 is formed It is solved by a liquid crystal display device comprising that.

  When the red color filter and the blue color filter are overlapped to form a light shielding film, light leakage of blue light may occur in the outer portion of the display area. In order to prevent this, in the present invention, a redundant light-shielding film that blocks blue light is formed in the outer portion of the display area. Thereby, the light leakage of the blue light in the outer part of the display area can be surely prevented, and the display quality is improved. The present invention can be applied not only to a VA (Vertically Aligned) mode liquid crystal display device using a vertical alignment film, but also to a liquid crystal display device using a horizontal alignment film.

  As shown in FIG. 1, the first liquid crystal display device related to the present invention includes a first electrode 32 formed on one surface side and a first vertical covering the first electrode 32. A first substrate 30 having an alignment film 36, a second electrode 44 formed on the side of the first substrate 30 facing the one surface, and insulation on the second electrode 44 A first protrusion pattern 45 formed of a material; and a second vertical alignment film 46 covering the second electrode 44 and the first protrusion pattern 45, and a tip of the first protrusion pattern 45. A second substrate 40 having a portion in contact with the first substrate 30, and a liquid crystal 49 having negative dielectric anisotropy sealed between the first substrate 30 and the second substrate 40, It is characterized by having.

  The vertical alignment type liquid crystal display device has better viewing angle characteristics than the TN type liquid crystal display device, but the viewing angle characteristics can be further improved by alignment division. In the vertical alignment type liquid crystal display device, the alignment division can be achieved by providing the protrusion patterns 35 and 45 above the electrode (at least one of the pixel electrode 32 and the counter electrode 44). That is, in the vertical alignment type liquid crystal display device, since the liquid crystal molecules are aligned in the direction perpendicular to the surface of the vertical alignment film, when the protrusion patterns 33 and 45 are provided above the electrodes 32 and 45, one of the protrusion patterns 32 and 45 is provided. The alignment direction of the liquid crystal molecules is different between the first and second inclined surfaces, and alignment division is achieved.

  In the first liquid crystal display device, the alignment division is achieved by providing the protrusion patterns 35 and 45 made of an insulator above the electrodes, and at least a part of the protrusion pattern 45 is transferred from the one substrate 40 side to the other substrate 30. The tip portion of the protrusion pattern 45 is brought into contact with the other substrate 30 so that the cell thickness is kept constant. As described above, in the first liquid crystal display device, the cell thickness is kept constant by the projection pattern 45 for achieving the alignment division, so that the step of spraying the spherical or cylindrical spacers becomes unnecessary, and the spacer The display quality is prevented from deteriorating due to the movement of the display and the color filter.

  If the pattern width of the projection pattern (projection pattern 35 formed in the pixel region) for achieving alignment division is too narrow, the effect of alignment division cannot be sufficiently obtained. On the contrary, if the pattern width of the protrusion pattern 35 for achieving the orientation division is too wide, the aperture ratio is lowered and a bright image cannot be displayed. For this reason, it is preferable that the pattern width of the protrusion pattern 35 for achieving orientation division is 3 to 15 μm.

  Further, if the height of the projection pattern 35 for achieving the alignment division is too low, the effect of the alignment division cannot be sufficiently obtained. Therefore, the height of the projection pattern 35 for achieving the alignment division needs to be 1/5 or more of the cell thickness at the opening of the light shielding film 42 (black matrix). Instead of the projection pattern 35 for achieving the alignment division, the slits 6 and 32a may be formed in the electrodes 2b and 32 as illustrated in FIGS. Thereby, when a voltage is applied, the direction of the electric field is slightly inclined with respect to the surface of the electrode in the vicinity of the slits 6 and 32a, so that the alignment division is achieved in the same manner as when the projection pattern is provided.

  JP-A-7-311383 discloses a liquid crystal display device in which a protrusion pattern made of silicon nitride or silicon oxide is provided on a substrate and a transparent electrode and an alignment film are formed thereon. However, the technique disclosed in Japanese Patent Application Laid-Open No. 7-311383 relates to a horizontal alignment type liquid crystal display device, and is different in operation and effect from the first liquid crystal display device. That is, in the technique disclosed in Japanese Patent Laid-Open No. 7-311383, since the electrode is on the projection pattern, the electrode has a surface inclined with respect to the substrate. When the above technique is applied to a vertical alignment type liquid crystal display device, when no voltage is applied, the liquid crystal molecules are aligned perpendicular to the inclined surface, and when a voltage is applied, the liquid crystal molecules are aligned in a direction parallel to the inclined surface. try to. However, to which side the liquid crystal molecules in the vicinity of the inclined surface rotate when a voltage is applied is indeterminate, which causes disorder of alignment. On the other hand, in the first liquid crystal display device, since the electrodes are parallel to the substrate, when a voltage is applied, an electric field is applied from an oblique direction to the liquid crystal molecules facing the direction perpendicular to the inclined surface of the protrusion pattern. Join. Therefore, the rotation direction of the liquid crystal molecules is determined, and the alignment disorder is avoided.

  As illustrated in FIG. 1, the first method for manufacturing a liquid crystal display device according to the present invention includes a step of forming a light-shielding film 42 that shields light between the pixel regions on the first substrate 41, and A step of forming a color filter 43 on the pixel region on one substrate 41, a step of forming a counter electrode 44 on the color filter 43, and a first made of an insulating material on the counter electrode 44. A step of forming a protrusion pattern 45; a step of forming a first vertical alignment film 46 covering the counter electrode 44 and the first protrusion pattern 45 on the upper side of the first substrate 41; and a second substrate 31. Forming a plurality of pixel electrodes 32 on the upper side of the substrate, forming a second vertical alignment film 36 covering the pixel electrodes 32 on the upper side of the second substrate 31, and the first substrate 41 and the The second substrate 31 and the first vertical The surface on which the counter film 46 and the second vertical alignment film 36 are formed is opposed to each other, and the tip portion of the first protrusion pattern 45 is in contact with the second vertical alignment film 36 of the second substrate 31. And a step of arranging them. In addition, as a method of sealing liquid crystal between the first substrate and the second substrate, a method of injecting liquid crystal between both substrates after the first substrate and the second substrate are bonded with a sealing material; There is a method in which liquid crystal is dropped on one of the first substrate and the second substrate, and then the other substrate is disposed on one substrate and these substrates are bonded. Either method may be adopted as the method for manufacturing the first liquid crystal display device.

  In the liquid crystal display device formed by the manufacturing method of the first liquid crystal display device, alignment division is achieved by the projection pattern 45 and the cell thickness is kept constant by the projection pattern 45. As a result, the step of spraying the spacers becomes unnecessary, and the deterioration of the display quality due to the movement of the spacers and the penetration into the color filter is avoided.

  As illustrated in FIG. 8, the second liquid crystal display device related to the present invention includes a plurality of first electrodes 32 formed on one side and a first vertical covering the first electrodes 32. A first substrate 30 having an alignment film 36 and a surface of the first substrate 30 facing the one surface are formed in a region between the first electrodes 32 of the first substrate 30. A light shielding film 52 disposed in a corresponding region, a plurality of color filters 53 disposed to face each first electrode 32 of the first substrate 30, and above the light shielding film 52 and the color filter 53. A second projection 54 formed of an insulating material on the second electrode 54, the second electrode 54 and at least the second electrode 54. And a second vertical alignment film 56 covering the first protrusion pattern 55. The second substrate 50 in which the tip portion of the first projection pattern 55 above the light shielding film 52 is in contact with the first substrate 30, and the first substrate 30 and the second substrate 50. And a liquid crystal 49 having negative dielectric anisotropy enclosed therebetween.

  In the second liquid crystal display device, the light-shielding film 52 is formed thick, and the projection pattern 55 is formed on the light-shielding film 52 and is brought into contact with the other substrate. By disposing the portion of the projection pattern that contacts the other substrate on the light shielding film, a decrease in the aperture ratio can be avoided. Further, as illustrated in FIG. 11, the light shielding film 52 may be formed by overlapping two or more color filters of three colors of red (R), green (G), and blue (B). In this case, the manufacturing process can be simplified as compared with a method of forming a light shielding film using a metal such as chromium (Cr).

  In the second method for manufacturing a liquid crystal display device related to the present invention, as illustrated in FIG. One of them is selectively formed, and at least two of the red, green, and blue color filters 53R, 53G, and 53B are overlapped between the pixel regions to form a light shielding film 52. A step of forming a counter electrode 54 on the color filters 53R, 53G, and 53B, a step of forming a first protrusion pattern 55 made of an insulating material on the counter electrode 54, and the first Forming a first vertical alignment film 56 covering the counter electrode 54 and the first protrusion pattern 55 on the substrate 51, and a plurality of pixel electrodes on the second substrate 31. 2, a step of forming a second vertical alignment film 36 covering the pixel electrode 32 on the second substrate 31, and the first substrate 51 and the second substrate 31. The surfaces on which the first vertical alignment film 56 and the second vertical alignment film 36 are formed are opposed to each other, and the tip portion of the first protrusion pattern 55 is used as the vertical alignment film of the second substrate 31. And a step of arranging them in contact with each other.

  In the second method for manufacturing a liquid crystal display device, at least two of the color filters 53R, 53G, and 53B are overlaid to form the light shielding film 52. Therefore, the process of forming the light shielding film with Cr or the like. Becomes unnecessary. In addition, since the tip portion of the protrusion pattern 55 above the light shielding film 52 is brought into contact with the other substrate 30 to keep the cell thickness constant, a step of spraying spacers is unnecessary. These simplify the manufacturing process.

  As illustrated in FIGS. 17 and 18, the third liquid crystal display device related to the present invention includes a plurality of first electrodes 102 formed on one surface side and a first electrode 102 covering the first electrode 102. A first substrate 100 having one vertical alignment film 106, and red, green, and blue color filters 113R, 113G, and 113B disposed to face the first electrode 102 of the first substrate 100; In addition, at least two of these color filters 113R, 113G, and 113B are configured to overlap, and the light shielding film 112 disposed in a region corresponding to the region between the first electrodes 102, and at least the above-mentioned The second electrode 114 covering the color filters 113R, 113G, and 113B, the cell thickness adjusting layer 117 selectively formed above the light shielding film 112, and the second electrode 1 4 and the protrusion pattern 115 formed of an insulating material above the cell thickness adjusting layer 117, and the second vertical alignment film covering the second electrode 114 and at least the protrusion pattern 115 on the second electrode 114. 116, and a tip portion of the protrusion pattern 115 is sealed between the second substrate 110 in contact with the first substrate 100, and the first substrate 100 and the second substrate 110. And a liquid crystal 49 having negative dielectric anisotropy.

  In the third liquid crystal display device, the cell thickness can be adjusted by the cell thickness adjusting layer 117 provided on the light shielding film 112. As a result, the color cell 113R, 113G, 113B can be adjusted to an optimum cell thickness without increasing the thickness. In this case, as illustrated in FIG. 23, the second substrate includes red, green, and blue color filters 113R, 113G, and 113B disposed to face the first electrode of the first substrate, and these And at least two color filters of the color filters 113R, 113G, and 113B are overlapped, and the light shielding film 112 disposed in a region corresponding to the region between the first electrodes, the color filters 113R, 113G, 113B and the second electrode 116 covering the light shielding film 112, a projection pattern 117 formed of an insulating material on the second electrode, and the projection pattern 117 above the light shielding film 112 Even if the substrate having the formed cell thickness adjusting layer 118 and the second vertical alignment film 116 covering the second electrode and the cell thickness adjusting layer is used. There.

  As illustrated in FIG. 24, the fourth liquid crystal display device related to the present invention includes a plurality of first electrodes 102 formed on one surface side, and a first vertical alignment covering the first electrodes. A first substrate 100 having a film 10; a light-shielding film 122 made of a non-translucent material disposed in a region corresponding to a region between the first electrodes 102 of the first substrate 100; Red, green, and blue color filters 123R, 123G, and 123B that are disposed to face the first electrode 102 of one substrate 100 and at least one covers the light shielding film 122, and the color filter 123R. , 123G, 123B, a projection pattern 125 formed of an insulating material on the second electrode 126, the second electrode 126, and at least the second electrode 126. A second vertical alignment film 126 that covers the protrusion pattern 125, a second substrate 120 in which a tip portion of the protrusion pattern 125 is in contact with the first substrate 100, and the first substrate 100. A liquid crystal 49 having negative dielectric anisotropy sealed between the second substrate 120 and the second substrate 120 is provided.

  Even in the fourth liquid crystal display device, the cell thickness can be adjusted by the light-shielding film 122 made of a non-translucent material such as a black resin. The cell thickness can be adjusted. In this case, as illustrated in FIG. 25, the light shielding film may be composed of a film (light shielding film) 132 made of a metal or a metal compound and a resist 137 formed on the film 132. .

  In the fourth liquid crystal display device, the resist 137 used for the patterning of the light shielding film 132 is left, and the tip portion of the projection pattern 135 formed on the resist 137 is brought into contact with the first substrate 100 to increase the cell thickness. Keep constant. Thereby, there exists an advantage that a manufacturing process is simple.

  The third liquid crystal display device manufacturing method related to the present invention includes color filters 113R, 113G, and pixel filters 113R, 113G, and a pixel region on the first substrate 111, as illustrated in FIGS. 113B, and forming a light shielding film 112 by overlapping two or more layers of the color filters 113R, 113G, 113B in a region between the pixel regions, and a counter electrode on at least the color filters 113R, 113G, 113B 114, a step of forming a cell thickness adjusting layer 117 made of an insulating material in a predetermined region above the light shielding film 112, and a domain regulating means on the counter electrode 114 and the cell thickness adjusting layer 117. Forming a protrusion pattern 115 made of an insulating material; and the counter electrode 114 and at least the protrusion on the counter electrode 114. A step of forming a first vertical alignment film 116 covering the pattern 115; a step of forming a plurality of pixel electrodes 102 on the second substrate 101; and a second vertical alignment film 106 covering the pixel electrodes 102. Forming the first substrate 111 and the second substrate 101 with the surfaces on which the first vertical alignment film 116 and the second vertical alignment film 106 are formed facing each other, and the protrusion pattern And a step of placing the tip portion of 115 in contact with the second vertical alignment film 106 of the second substrate 101.

  In the third method for manufacturing a liquid crystal display device, since the cell thickness can be adjusted by the cell thickness adjusting layer 117, it is not necessary to excessively increase the thickness of the color filters 113R, 113G, and 113B.

  In a fourth method of manufacturing a liquid crystal display device according to the present invention, as illustrated in FIGS. 25 to 27, a metal film and a photosensitive resist film are formed on a first substrate, and the photosensitive film is formed by photolithography. Forming a light-shielding film 132 made of the metal film and a resist film 137 covering the light-shielding film 132 by patterning the resist and the metal film to leave the metal film and the resist film in a region between pixels; Forming red, green, and blue color filters 133R, 133G, and 133B in the pixel region, and forming one or more color filters 133R, 133G, and 133B on the resist film 132; and the color filters 133R, Forming a counter electrode 133 on 133G and 133B and insulating the counter electrode 133 on the counter electrode 133 as a domain regulating means; A step of forming a projection pattern 135 made of a material, a step of forming a first vertical alignment film 136 covering the counter electrode 134 and at least the projection pattern 135 on the counter electrode 134, and an upper side of the second substrate 101. Forming a plurality of pixel electrodes 102, forming a second vertical alignment film 106 covering the pixel electrodes 102, the first substrate 131, and the second substrate 101. And a step of disposing the surface on which the vertical alignment film 136 and the second vertical alignment film 106 are formed facing each other and placing the tip portion of the protrusion pattern 135 in contact with the second substrate 101 side. Features.

  In the fourth method for manufacturing a liquid crystal display device, the cell thickness can be adjusted by the resist film 137 used for patterning the light-shielding film 132, and can be manufactured relatively easily.

  As illustrated in FIGS. 28 and 29, the fifth liquid crystal display device related to the present invention includes a plurality of first electrodes 102 formed on one surface side and a first electrode covering the first electrodes. A first substrate 100 having a vertical alignment film 106, and red, green, and blue color filters 143R, 143G, and 143B disposed to face the first electrode 102 of the first substrate 100; A blue color filter 143B and a red color filter 143R above the blue color filter 143B are formed around the red pixel, and a blue color filter 143B and a green color filter 143G above the blue color filter 143B are formed around the green pixel. And the second electrode 14 covering the color filters 143R, 143G, and 143B and the light shielding film 142. And a second substrate 140 having a second vertical alignment film 146 covering the second electrode 144, and a negative dielectric sealed between the first substrate 100 and the second substrate 140. And a liquid crystal 49 having a rate anisotropy.

  In the fifth liquid crystal display device, the light shielding film 142 is configured by two color filters of the blue color filter 143B and the red color filter 143R around the red pixel, and the blue color filter 143B and the green color filter around the green pixel. The light shielding film 142 is configured by 143G. As a result, the inclination angle of the step on the red pixel side and the inclination angle of the step on the green side are reduced, and light leakage due to an abnormal alignment of liquid crystal molecules can be reduced.

  In the fifth method for manufacturing a liquid crystal display device related to the present invention, as illustrated in FIGS. 29 to 32, a step of forming a blue color filter 143B in the blue pixel region and the light shielding region on the first substrate 141 is performed. And a red color filter 143R on a red pixel region on the first substrate 141, a light shielding region around the red pixel region, and a part of the blue color filter 143B in the light shielding region around the blue pixel region. Forming a green color on the blue color filter 143B in the green pixel region on the first substrate 141, the light shielding region around the green pixel region, and the remaining light shielding region around the blue pixel region. A step of forming a filter 143G, and a counter electrode on the red color filter 143R, the blue color filter 143B, and the green color filter 143G; Forming a projection pattern 145 made of an insulating material as a domain regulating means on the counter electrode 144; and a first vertical alignment film 146 covering the counter electrode 144 and the projection pattern 145. Forming a plurality of pixel electrodes 102 on the second substrate 101, forming a second vertical alignment film 106 covering the pixel electrodes 102, and the first substrate 141. The surface on which the first vertical alignment film 146 and the second vertical alignment film 106 are formed is opposed to the second substrate 101, and the tip portion of the protrusion pattern 145 is on the second substrate 100 side. It arrange | positions in contact with, It is characterized by the above-mentioned.

  In the fifth method for manufacturing a liquid crystal display device, the color filter is formed in two layers to form a light shielding film, and the cell thickness is maintained constant at the tip portion of the projection pattern 145 formed thereon, so that it is relatively easy. Can be manufactured.

  According to the liquid crystal display device of the present invention, the redundant light-shielding film for blocking the blue light is provided on the outer portion of the display area. Therefore, when the light-shielding film is configured by overlapping the red color filter and the blue color filter, the display area is displayed. It is possible to reliably prevent the light leakage of blue light generated in the outer portion of the.

  Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

(First embodiment)
1 is a sectional view of a liquid crystal display device according to a first embodiment of the present invention, FIG. 2 is a plan view of a TFT substrate 30 of the liquid crystal display device, and FIG. 3 is a plan view of a CF substrate 40 of the liquid crystal display device. FIG. In FIG. 3, the projection pattern 35 formed on the TFT substrate 30 side is indicated by a one-dot chain line.

  The liquid crystal display device of the present embodiment has a structure in which a liquid crystal 49 having a negative dielectric anisotropy is sealed between the TFT substrate 30 and the CF substrate 40. Further, polarizing plates (not shown) are disposed on the upper side of the TFT substrate 30 and the lower side of the CF substrate 40, respectively. These polarizing plates are arranged so that their polarization axes are orthogonal to each other. The TFT substrate 30 includes a glass substrate 31, pixel electrodes 32 formed on the lower surface side of the glass substrate 31, insulating films 34a to 34c, an alignment film 36, and the like. That is, as shown in FIG. 2, a plurality of gate bus lines 33 b are formed in parallel to each other on the lower surface side of the glass substrate 31. Further, an auxiliary capacitance electrode 33c is formed between each gate bus line 33b. The gate bus line 33b and the auxiliary capacitance electrode 33c are covered with an insulating film (gate insulating film) 34a formed on the lower surface side of the glass substrate 31 (see FIG. 1). Under this insulating film 34a, a silicon film 37b to be an active layer of the TFT 37 is selectively formed. The silicon film 37b is made of amorphous silicon or polysilicon. Each rectangular area defined by the gate bus line 33b and the drain bus line 33a is a pixel area.

  An insulating film 34b is formed under the insulating film 34a and the silicon film 37a. A plurality of drain bus lines 33a and a drain electrode 37a and a source electrode 37c of the TFT 37 are formed under the insulating film 34b. The drain bus line 33a is formed to be orthogonal to the gate bus line 33a. The drain electrode 37a is electrically connected to the drain bus line 33a. The drain bus line 33a, the drain electrode 37a, and the source electrode 37c are covered with an insulating film (final protective film) 34c formed under the insulating film 34b. A pixel electrode 32 made of ITO is formed on the lower side of the insulating film 34c for each pixel. The pixel electrode 32 is electrically connected to the source electrode 37c through a contact hole formed in the insulating film 34c.

  On the lower side of the pixel electrode 32, a projection pattern 35 is formed in a zigzag shape as shown by a one-dot chain line in FIG. The protrusion pattern 35 is formed with an insulating resin to a height of about 1.5 μm. A vertical alignment film 36 is formed on the entire lower surface of the glass substrate 31, and the surface of the pixel electrode 32 and the protrusion pattern 35 is covered with the vertical alignment film 36. In FIG. 2, a trapezoidal portion indicated by a broken line at a portion where the data bus line 33a and the gate bus line 33b intersect with each other indicates a position where a projection pattern 45 of the CF substrate 40 described later contacts.

  On the other hand, the CF substrate 40 includes a glass substrate 41, a black matrix 42 formed on the upper surface side of the glass substrate 41, a color filter 43, a counter electrode 44, a vertical alignment film 46, and the like. That is, as shown in FIG. 3, a black matrix 42 made of a chromium (Cr) thin film is formed on the upper surface of the glass substrate 41. The black matrix 42 is formed in a shape that covers the drain bus line 33 a, the gate bus line 33 b, the auxiliary capacitance electrode 33 c, and the TFT 37 of the TFT substrate 30.

  On the glass substrate 41, red (R), green (G) and blue (B) color filters 43 are formed. These color filters 43 are arranged at positions facing the pixel electrodes 32 of the TFT substrate 30, and one of the color filters 43 corresponding to red, green, or blue corresponds to one pixel electrode 32. Further, the edge of the color filter 43 overlaps with the edge of the black matrix 42.

  On the black matrix 42 and the color filter 43, a counter electrode 44 made of ITO is formed. On the counter electrode 44, a protrusion pattern 45 is formed in a zigzag shape as shown by a thick line in FIG. The protrusion pattern 45 has a height of about 4.0 μm and is formed of an insulating resin. A vertical alignment film 46 is formed on the counter electrode 44, and the surface of the protrusion pattern 45 is covered with the vertical alignment film 46. The protrusion pattern 45 on the CF substrate 40 side is disposed between the protrusion patterns 35 on the TFT substrate 30 side as shown in FIG.

  In the present embodiment, the projection pattern 35 on the TFT substrate 30 side is formed with a height of about 1.5 μm, and the projection pattern 45 on the CF substrate 40 side is formed with a height of about 4.0 μm. . As shown in FIG. 1, the tip portion of the protrusion pattern 45 on the CF substrate 40 side is in contact with the TFT substrate 30 to keep the cell thickness constant. For this reason, in the present embodiment, a conventionally required spacer (spherical or cylindrical member) is unnecessary, and a short circuit between the pixel electrode 32 on the TFT substrate 30 side and the counter electrode 44 on the CF substrate 40 side is prevented. It can be avoided reliably. In addition, when a spherical or cylindrical spacer is used as in a conventional liquid crystal display device, liquid crystal molecules are aligned along the surface of the spacer in the vicinity of the spacer. May be. However, in this embodiment, since a spherical or cylindrical spacer is not used, good display quality can be obtained.

  Further, in the present embodiment, alignment division is achieved by the projection pattern 35 on the TFT substrate 30 side and the projection pattern 45 on the CF substrate 40 side. FIG. 4A is a schematic diagram for explaining the principle that alignment division is achieved by the protrusion pattern. In the liquid crystal display device shown in FIG. 4A, an electrode 2a is formed on one substrate 1a, and a projection pattern 3a made of an insulating material is formed on the electrode 2a. The surfaces of these electrodes 2a and protrusion patterns 3a are covered with a vertical alignment film 4a. An electrode 2b is formed on the lower side of the other substrate 1b, and a projection pattern 3b made of an insulating material is formed below the electrode 2b. The surfaces of these electrodes 2b and protrusion patterns 3b are covered with a vertical alignment film 4b.

  In general, in a vertical alignment type liquid crystal display device, a rubbing process is performed on the surface of an alignment film in order to make the direction in which liquid crystal molecules tilt when a voltage is applied between a pixel electrode and a counter electrode. Yes. However, as shown in FIG. 4A, when the protrusion pattern 3a is provided between the electrode 2a and the alignment film 4a and the protrusion pattern 3b is provided between the electrode 2b and the alignment film 4b, the protrusion pattern 3a, The liquid crystal molecules 5 in the vicinity of 3b are aligned in a direction perpendicular to the surfaces of the protrusion patterns 3a and 3b. When a voltage is applied between the electrodes 2a and 2b in this state, the tilting direction of the liquid crystal molecules 5 between the electrodes 2a and 2b is determined by the influence of the liquid crystal molecules 5 in the vicinity of the protrusion patterns 3a and 3b. That is, the direction in which the liquid crystal molecules 5 are inclined is reversed on both sides of the protrusion patterns 3a and 3b. As a result, alignment division can be achieved without rubbing the alignment films 4a and 4b.

  Further, instead of providing the projection pattern 3b on the one substrate 1b side, as shown in FIG. 4B, a slit 6 may be provided in the electrode 2b. Also in this case, when a voltage is applied between the electrodes 2a and 2b, the direction in which the liquid crystal molecules are inclined is reversed on both sides of the protrusion pattern 3a and the slit 6 to achieve alignment division. In this embodiment, as shown in FIG. 1, zigzag-shaped protrusion patterns 45 and 35 are formed on the counter electrode 44 and the pixel electrode 32, respectively. The orientation direction is divided into two or more. Thereby, good viewing angle characteristics (including contrast characteristics) can be obtained. In the present embodiment, the cell thickness is kept constant by the protrusion pattern 45 provided on the CF substrate 40 side. The protrusion pattern 45 is fixed on the counter electrode 44, and the cell thickness is not changed by vibration or impact. Therefore, deterioration of display quality is avoided.

  A method for manufacturing the liquid crystal display device according to the first embodiment will be described below. The TFT substrate 30 is formed as follows. First, the drain bus line 33a, the gate bus line 33b, the auxiliary capacitance electrode 33c, the TFT 37, the pixel electrode 32, and the insulating films 34a to 34c are formed on the glass substrate 31 (on the lower surface side in FIG. 1) by a known method. The drain bus line 33a, the gate bus line 33b, and the auxiliary capacitance electrode 33c have a thickness of, for example, 0.15 μm, the gate insulating film 34a has a thickness of, for example, about 0.35 μm, and the silicon film 37b has a thickness of, for example, 0.03 μm. The thickness of the electrode 32 is, for example, 0.07 μm, and the thickness of the insulating film 34 c is, for example, 0.33 μm.

  Next, after applying a photoresist to a thickness of about 1.5 μm on the entire upper surface of the glass substrate 31, the photoresist is exposed using a mask having a predetermined pattern. Thereafter, a development process is performed to form a zigzag projection pattern 35 having a thickness of about 1.5 μm and a width of about 10 μm. In this case, as shown in FIG. 2, one pixel region is divided into at least two regions by the protrusion pattern 35.

  Next, a vertical alignment film 36 made of polyamic acid is formed in a predetermined pattern on the upper side of the glass substrate 31 to a thickness of about 0.1 μm. Thereby, the TFT substrate 30 is completed. In addition to the polyamic acid film described above, a polyimide film or an inorganic film formed by oblique deposition or the like can be used as the vertical alignment film. The CF substrate 40 is formed as follows. First, a chromium (Cr) film is formed to a thickness of about 0.16 μm on the glass substrate 41, a photoresist having a predetermined pattern is formed on the chromium film, and the chromium film is formed using the photoresist as a mask. Are etched to form a black matrix 42.

  Next, a blue resin, a red resin, and a green resin are respectively applied on the glass substrate 41 to form the color filters 43 of red (R), green (G), and blue (B). The thickness of the color filter 43 is about 1.5 μm, for example. The edge of each color filter 43 is slightly overlapped with the edge of the black matrix 42. Next, for example, ITO is sputtered on the entire upper surface of the substrate 41 to form a counter electrode 44 having a thickness of about 0.15 μm. Thereafter, a photoresist is applied on the counter electrode 44 to a thickness of about 4.0 μm, and the photoresist is exposed and developed to form a protrusion pattern 45 having a thickness of about 4.0 μm and a width of about 10 μm. 3 are formed in a zigzag shape as shown in FIG.

  Next, a vertical alignment film 46 made of polyamic acid is formed on the upper side of the glass substrate 41 to a thickness of about 0.1 μm. Thereby, the CF substrate 40 is completed. After the TFT substrate 30 and the CF substrate 40 are formed in this way, the surfaces on which the alignment films 36 and 46 are formed are arranged to face each other, and the edge of the TFT substrate 30 and the edge of the CF substrate 40 are connected to the liquid crystal. Join with leaving part of the inlet. Thereafter, the bonded substrates 30 and 40 are cut into a predetermined size as necessary.

  Next, a liquid crystal 49 having a negative dielectric anisotropy is injected between the TFT substrate 30 and the CF substrate 40 to seal the liquid crystal injection port. Thereafter, a polarizing plate is attached to the outside of the TFT substrate 30 and the CF substrate 40, respectively. Thereby, the liquid crystal display device of the present embodiment is completed. In the present embodiment, since the cell thickness is kept constant by the protrusion pattern 45 provided on the CF substrate 40, the step of spraying spherical or cylindrical spacers that has been conventionally required is unnecessary. In addition, since the change in the cell thickness due to the movement of the spacer is prevented, the occurrence of display unevenness is avoided. Further, since the alignment division is realized by the protrusion patterns 35 and 45, it is not necessary to perform the rubbing process on the alignment films 36 and 46, and the rubbing process and the cleaning process after the rubbing process can be omitted. Further, since the protrusion pattern 45 is fixed on the counter electrode 44, there is no displacement due to vibration or impact, and a change in cell thickness is prevented. Thereby, the reliability of the liquid crystal display device is improved. Further, in the present embodiment, since the liquid crystal molecules are aligned so as to be orthogonal to the inclined surfaces of the protrusion patterns 35 and 45, the alignment directions of the liquid crystal molecules are different on both sides of the protrusion patterns 35 and 45, and alignment division is realized. The Thereby, a favorable viewing angle characteristic is obtained.

  In the present embodiment, the case where the protrusion pattern 35 is provided on the TFT substrate side has been described. Instead of providing the protrusion pattern 35, a slit may be provided in the pixel electrode 32 (see FIG. 4B). ). Also in this case, orientation division is realized, and the same effect as the above embodiment can be obtained. FIG. 5 is a diagram showing an example in which a slit is formed in the pixel electrode 32 on the TFT substrate side. In this example, the pixel electrode 32 is provided with a slit 32a that is parallel to the protrusion pattern 45 on the CF substrate 40 side. With such a configuration, when a voltage is applied, the direction of the electric field is inclined with respect to the substrate in the vicinity of the slit, and the liquid crystal molecules are inclined in a direction toward the protrusion pattern. Thereby, as in the above-described embodiment, alignment division is achieved.

  In the present invention, when the width of the protrusion pattern for realizing the alignment division is too wide and when the height of the protrusion pattern is too high, the aperture ratio decreases and the transmittance decreases. Conversely, when the width of the protrusion pattern is too narrow and the height of the protrusion pattern is too low, the effect of orientation division cannot be obtained, or pattern breakage is likely to occur when forming the protrusion pattern. Accordingly, it is preferable to appropriately set the width and height of the protrusion pattern for realizing the alignment division according to the cell thickness.

  Hereinafter, the height and width of the protrusion pattern (in the first embodiment, the protrusion pattern 35) for achieving the alignment division will be described. FIG. 6 is a graph showing the relationship between the ratio of the height of the projection pattern and the cell thickness (projection pattern height / cell thickness) on the horizontal axis and the light transmittance during white display on the horizontal axis. It is. As can be seen from FIG. 6, when the ratio between the height of the projection pattern and the cell thickness is 0.2 or more, the transmittance is about 3% or more, and a bright and high-contrast image can be displayed. For this reason, it is preferable that the height of the protrusion pattern for realizing the alignment division is 0.2 times or more the cell thickness. A more preferable range of the height of the protrusion pattern is 0.2 to 0.8 times the cell thickness, and a further preferable range is 0.3 to 0.5 times.

  FIG. 7 is a diagram showing the relationship between the pattern width of the projection pattern on the horizontal axis and the light transmittance during white display on the vertical axis. As can be seen from this figure, by setting the pattern width of the protrusion pattern to 5 μm to 15 μm, the transmittance is about 3% or more, and a bright and high-contrast image can be displayed. For this reason, it is preferable that the pattern width of a protrusion pattern shall be 5-15 micrometers.

(Second Embodiment)
FIG. 8 is a cross-sectional view of a liquid crystal display device according to a second embodiment of the present invention, and FIG. 9 is a plan view of a CF substrate of the liquid crystal display device. Since this embodiment is different from the first embodiment in that the structure of the CF substrate is different, in FIG. 8, the same components as those in FIG.

  On the glass substrate 51 on the CF substrate 50 side, a black matrix 52 is formed at a position aligned with the gate bus line 33b, the drain bus line 33a, the TFT, and the auxiliary capacitance electrode of the TFT substrate 30. The black matrix 52 is formed with a thickness of about 4 μm using a black resin. Further, red (R), green (G), and blue (B) color filters 53 are formed in the openings of the black matrix 52. Each of these color filters 53 has a thickness of about 1.5 μm. A counter electrode 54 made of ITO is formed on the black matrix 52 and the color filter 53, and a protrusion pattern 55 having a height of about 1.5 μm is formed on the counter electrode 54 in FIG. As shown, it is formed in a zigzag shape. A vertical alignment film 56 is formed on the counter electrode 54, and the surface of the protrusion pattern 55 is also covered with the alignment film 56. The protrusion pattern 55 on the CF substrate 50 side contacts the TFT substrate 30 at a portion where the data bus line 33a and the gate bus line 33b intersect (a trapezoidal portion indicated by a broken line in FIG. 2).

  Hereinafter, a method for manufacturing the liquid crystal display device of the present embodiment will be described. However, since the manufacturing method of the TFT substrate is the same as that of the first embodiment, it is omitted here. First, a black matrix 52 having a thickness of about 4.0 μm is formed on a glass substrate 51 with a black resin. The material of the black matrix 52 is not particularly limited. For example, an acrylic resin mixed with carbon black can be used. In this case, the black matrix 52 is formed by applying an acrylic resin mixed with carbon black on the substrate 51.

  Next, a red resin, a green resin, and a blue resin are sequentially applied to the opening of the black matrix 52 on the glass plate 51 to a thickness of about 1.5 μm, and red (R), green is applied to each pixel region. A color filter 53 of (G) or blue (B) is formed. As a result, a step of about 2.5 μm is formed between the black matrix 54 and the color filter 53.

  Next, the counter electrode 54 having a thickness of about 0.15 μm is formed on the entire upper surface of the glass substrate 51 by sputtering ITO. Thereafter, a protrusion pattern 55 having a height of about 1.5 μm and a width of about 10 μm is formed on the counter electrode 54 in a zigzag shape. The projection pattern 55 is formed using a photoresist as in the first embodiment. In this case, if the width of the projection pattern of the exposure mask is uniform, as shown in FIG. 10, the width of the projection pattern 55 on the black matrix 52 becomes narrower than the other portions after the exposure and development processing, and as a spacer There is a risk that the required strength cannot be secured. For this reason, it is preferable that the width of the protrusion pattern 55 on the black matrix 52 is wider than other portions as shown in FIG.

  Next, a vertical alignment film 56 made of polyamic acid is formed on the upper side of the counter electrode 54 to a thickness of about 0.15 μm, and the surfaces of the counter electrode 54 and the protrusion pattern 55 are covered with the vertical alignment film 56. Thereby, the CF substrate 50 is completed. After that, as shown in FIG. 8, the TFT substrate 30 and the CF substrate 50 are overlapped with the surface on which the alignment films 36 and 56 are formed inside. In this case, the protrusion pattern 55 on the black matrix 52 comes into contact with the TFT substrate 30, and the gap (cell thickness) between the CF substrate 50 and the TFT substrate 30 is maintained constant (about 4 μm).

  Next, the edges of the TFT substrate 30 and the CF substrate 50 are joined, and a liquid crystal having negative dielectric anisotropy is sealed between them. Thereafter, polarizing plates (not shown) are respectively disposed outside the TFT substrate 30 and the CF substrate 50. Thereby, the liquid crystal display device of the present embodiment is completed. Also in the present embodiment, alignment division is realized by the protrusion patterns 35 and 55, and good viewing angle characteristics can be obtained as in the first embodiment. Further, the cell thickness is kept constant by the protrusion pattern 55 on the black matrix 52, and the cell thickness does not change even when vibration or impact is applied, so that deterioration of display quality is avoided. Furthermore, there is no need for the step of spraying spherical or cylindrical spacers and the step of rubbing the alignment film, which are conventionally required, and there is an advantage that the manufacturing process of the liquid crystal display device is simplified. Furthermore, since the alignment direction of the liquid crystal molecules is determined by the protrusion patterns 35 and 55, it is not necessary to form a planarizing film (overcoat) on the CF substrate. Furthermore, in the present embodiment, since the width of the projection pattern 55 on the black matrix 52 is thicker than that of other portions, the pattern of the projection pattern 55 on the black matrix 52 is formed when the projection pattern 55 is formed. A narrowing of the width is avoided. For this reason, the height of the protrusion pattern 55 in the portion that holds the cell thickness becomes uniform, and the variation in the cell thickness is suppressed.

  Also in this embodiment, as shown in FIG. 5, a slit may be provided in the pixel electrode 32 instead of forming the protrusion 35 on the TFT substrate 30 side.

(Third embodiment)
FIG. 11 is a sectional view showing a liquid crystal display device according to a third embodiment of the present invention, and FIG. 12 is a plan view of the CF substrate. This embodiment is different from the second embodiment in that the structure on the CF substrate side is different, and other parts are basically the same as those of the second embodiment. 8 and 9, the same reference numerals are given to the same components, and detailed description thereof is omitted.

  A red (R) color filter 53R, a green (G) color filter 53G, and a blue (B) color filter 53B are formed on the glass substrate 51 on the CF substrate 50 side. The color filters 53R, 53G, and 53B overlap the three layers to form the black matrix 52 at positions matching the bus line 33b, the drain bus line 33a, the TFT, and the auxiliary capacitance electrode. Each of the color filters 53R, 53G, and 53B has a thickness of about 1.5 μm. However, these color filters 53R, 53G, and 53B are formed by applying red, green, or blue resin. If the color filters 53R, 53G, and 53B are formed in this way, overlapping portions (black matrix 52) are formed. The thickness of the color filters 53R, 53G, and 53B is slightly thinner than the color filters 53R, 53G, and 53B in the flat portion (pixel region).

  On these color filters 53R, 53G, 53B, a counter electrode 54 made of ITO is formed to a thickness of about 0.15 μm. On the counter electrode 54, a protrusion pattern 55 made of an insulating resin having a height of about 1.5 μm is formed in a zigzag shape as shown in FIG. Further, the width of the protrusion pattern 55 is thick at the four corners of each pixel region. Further, it is preferable to reinforce the strength of the protrusion pattern 55 by providing a protrusion pattern 55a at the intersection of the protrusion pattern 55 and the black matrix 52 as shown in FIG.

  A vertical alignment film 56 made of polyamic acid is formed on the counter electrode 54, and the surfaces of the protrusion patterns 55 and 55 a are also covered with the alignment film 56. Hereinafter, a method for manufacturing the liquid crystal display device of the present embodiment will be described with reference to FIGS. However, since the manufacturing method of the TFT substrate is the same as that of the first embodiment, it is omitted here.

  First, as shown in FIG. 13A, a blue resin is applied to a portion to be a blue pixel region and a black matrix 52 on a glass substrate 51 to a thickness of about 1.5 μm, and a color filter 53B is formed. Form. Next, as shown in FIG. 13B, a red resin is applied to the red pixel area and the black matrix 52 on the glass substrate 51 to a thickness of about 1.5 μm, and the color filter 53R is applied. Form. Thereafter, as shown in FIG. 13C, a green resin is applied to a thickness of about 1.5 μm on the green pixel region and the black matrix 52 on the glass substrate 51 to form a color filter. 53G is formed.

  Next, as shown in FIG. 14A, the counter electrode 54 is formed by covering the entire upper surface of the glass substrate 51 with ITO to a thickness of about 0.15 μm. Thereafter, a photosensitive resin is applied on the counter electrode 54, and the photosensitive resin is exposed through an exposure mask having a protrusion pattern, and then subjected to a development process, as shown in FIG. 14 (c). A pattern 55 is formed. Thereafter, polyamic acid is applied to the upper side of the glass substrate 11 to a thickness of about 0.1 μm to form a vertical alignment film 56.

  Next, as shown in FIG. 11, the CF substrate 50 and the TFT substrate 30 are overlapped with the surface on which the alignment film 36.56 is formed inside, and a liquid crystal 49 having negative electrostatic anisotropy therebetween. Enclose. At this time, the CF substrate 50 and the TFT substrate 30 are in contact with each other at the protruding pattern 55 on the black matrix 52, and the cell thickness is kept constant. Thereby, the liquid crystal display device of the present embodiment is completed.

In the present embodiment, the color filters 55R. 55G. The black matrix 52 is formed by superimposing 55B. Accordingly, the process of forming the black matrix with the black resin required in the second embodiment is not necessary, and the manufacturing process is combined with the fact that the process of spraying the spacers and the process of performing the rubbing process are unnecessary. The process is further simplified. In this example, the black matrix 52 is formed by superimposing three colors of R, G, and B. However, two or more color filters including a blue color filter having the highest light shielding property are superposed to form a black matrix 52. It may be a matrix. For example, since the shading rate (OD value) is 2.0 or more (transmittance is 10 ⁻² or less) by superimposing red and blue, it is possible to simply superimpose the red and blue color filters 55R and 55B. Sufficient light shielding properties can be obtained.

  Further, in the present embodiment, the color filter 55R, 55G, and 55B are overlapped so that the portion of the black matrix 52 protrudes from the other portion, the protrusion pattern 55 is formed thereon, and the portion of the protrusion pattern 55 is formed. The CF substrate 50 and the TFT substrate 30 are brought into contact with each other to maintain the cell thickness constant. Therefore, there is no possibility that the cell thickness fluctuates due to vibration or impact, and good display quality can be maintained.

  In the above embodiment, the color filters 53R, 53G, and 53B are formed by applying red, green, and blue resins on a glass substrate. However, these color filters are formed by a thermal transfer film (dry film). May be. When a color filter is formed by applying a resin as in the above embodiment, a so-called leveling phenomenon occurs when the resin is high to low before the drying of the resin is completed. For this reason, depending on the cell thickness, it may be difficult to form a black matrix having a predetermined height by overlapping color filters. In such a case, a black matrix having a desired height can be formed by using a thermal transfer film.

  For example, after a blue thermal transfer film with a colored layer having a thickness of 2.0 μm is thermally transferred (laminated) on the entire surface of the glass substrate 51, exposure and development are performed to form a blue color filter 53B. Next, the red thermal transfer film is thermally transferred to the entire surface on the glass substrate 51, and then exposed and developed to form a red color filter 53R. Further, the green thermal transfer film is applied to the entire surface on the glass substrate 51. Then, the green color filter 53G is formed by performing exposure and development processing.

  In this method, since the colored layer is transferred to the glass substrate 51 in a temporarily dried state, leveling does not occur even in the overlapping portion of the color filters, and the thicknesses of the color filters 53R, 53G, and 53B are about 1. A black matrix having a total film thickness of about 4.5 μm can be formed. FIG. 15 is a cross-sectional view of a liquid crystal display device showing a modification of the third embodiment. In this example, the thickness of the blue (B) color filter 53B is larger than the thickness of the other color filters 53R and 53G. Specifically, the thickness of the blue color filter 55B is about 2.0 μm, and the thickness of the red and green color filters 55R and 55G is about 1.5 μm. Accordingly, the cell thickness is about 3.5 μm in the blue pixel portion, and the cell thickness is about 4.0 μm in the red and green pixel portions.

  FIG. 16 is a diagram showing the relationship between the cell thickness (liquid crystal layer thickness) and the transmittance of each color pixel, with the horizontal axis representing the cell thickness and the vertical axis representing the light transmittance (relative value). . As is clear from this figure, in the case of the blue (B) pixel, the liquid crystal layer has a transmittance peak around 3.5 μm, and in the case of the red (R) and green (G) pixels. There is a transmittance peak when the thickness of the liquid crystal layer is about 4.0 to 4.5 μm.

  As described above, the optical characteristic Δnd is optimized by adjusting the thickness of the liquid crystal layer for each color (pixel) of the color filter. In the case of a normally black mode liquid crystal display device, the chromaticity characteristic, the transmittance characteristic, The effect of improving the characteristics such as contrast is obtained.

(Fourth embodiment)
17 is a cross-sectional view of a liquid crystal display device according to a fourth embodiment of the present invention, FIG. 18 is a partially enlarged view of the liquid crystal display device, and FIG. 19 is a plan view of the CF substrate 110 of the liquid crystal display device. It is. In FIGS. 17 and 18, the CF substrate 110 is shown on the upper side and the TFT substrate 100 is shown on the lower side. In FIG. 17, the alignment films 106 and 116 shown in FIG. 18 are not shown. Further, in FIG. 19, a slit 102a provided in the pixel electrode 102 on the TFT substrate 100 side is indicated by a one-dot chain line. 17 is a cross-sectional view taken along line AA in FIG.

  The liquid crystal display device of this embodiment has a structure in which a liquid crystal 49 having a negative dielectric anisotropy is sealed between a TFT substrate 100 and a CF substrate 110. In addition, polarizing plates (not shown) are disposed on the lower side of the TFT substrate 100 and the upper side of the CF substrate 110, respectively. These polarizing plates are arranged so that their polarization axes are orthogonal to each other.

  The TFT substrate 100 includes a glass substrate 101, pixel electrodes 102 formed on the upper surface side of the glass substrate 101, insulating films 104a and 104b, an alignment film 106, TFTs, and the like. That is, as shown in FIG. 18, a plurality of gate bus lines 103b, a plurality of drain bus lines 103a, and a pixel electrode 102 made of ITO are formed on the upper surface side of the glass substrate 101. The gate bus line 103b and the drain bus line 103a are insulated by an insulating film 104a, and the drain bus line 103a and the pixel electrode 102 are insulated by an insulating film 104b. The pixel electrode 102 is provided with a slit 102a for determining the alignment direction of liquid crystal molecules (see FIG. 5). As shown in FIG. 19, the slit 102a is provided in a zigzag shape so as to divide the pixel into a plurality of regions. A vertical alignment film 106 is formed on the entire upper surface of the glass substrate 101, and the surface of the pixel electrode 102 is covered with the vertical alignment film 106.

  On the other hand, the CF substrate 110 includes a glass substrate 111, color filters 113R, 113G, and 113B formed on the lower surface side of the glass substrate 111, a counter electrode 114, an alignment film 116, and the like. That is, as shown in FIG. 18, color filters 113R (red), 113G (green), and 113B (blue) are formed on the lower surface of the glass substrate 111. In each pixel region, a filter of any one of these color filters 113R, 113G, 113B is arranged. In the area between the pixels, the color filters 113R, 113G, and 113B overlap the three layers to form the black matrix 112. A counter electrode 114 made of ITO is formed on the lower surface side of the glass substrate 111 so as to cover the color filters 113R, 113G, 113B and the black matrix 112.

  A cell thickness adjusting layer 117 made of an insulating resin is formed below the black matrix 112 at a portion where the gate bus line 103b and the drain bus line 103a intersect. Further, as shown in FIG. 19, a projection pattern 115 is formed in a zigzag shape on the counter electrode 114 and below the cell thickness adjusting layer 117. Furthermore, a vertical alignment film 116 is formed on the entire lower surface of the counter electrode 114, and the surface of the pixel electrode 114 and the surface of the projection pattern 115 are covered with the vertical alignment film 116.

  The TFT substrate 100 and the CF substrate 110 are disposed so that the surfaces on which the alignment films 102 and 116 are formed are opposed to each other, and the gate bus line 103b and the drain bus line 103a of the TFT substrate 100 intersect with each other. When the protrusion pattern 115 below the cell thickness adjusting layer 117 is in contact, the distance (cell thickness) between the TFT substrate 100 and the CF substrate 110 is kept constant. Hereinafter, a portion that maintains a constant cell thickness between the TFT substrate and the CF substrate is referred to as a spacer portion.

  20 and 21 are cross-sectional views showing the method of manufacturing the CF substrate of the liquid crystal display device of this embodiment in the order of steps. 20 and 21, the CF substrate is shown with the surface on which the color filter is formed facing upward. First, as shown in FIG. 20A, a blue color filter 113B is 1.5 μm in a mark formation region such as a blue pixel region, a black matrix formation region, and an alignment mark (not shown) on the glass substrate 111. Form to thickness. As a material for the blue color filter 113B, a photosensitive resist in which a blue pigment is dispersed is used. After the photosensitive resist is applied on the glass substrate 111, exposure and development are performed to form the blue color filter 113B. be able to.

  Next, as shown in FIG. 20B, a red color filter 113R of 1.5 μm is formed in the red pixel region and the black matrix formation region on the glass substrate 111 using a photosensitive resist in which a red pigment is dispersed. Form to thickness. Next, as shown in FIG. 20C, using a photosensitive resist in which a green pigment is dispersed, a green color filter 113G is 1.5 μm in the green pixel formation region and the black matrix formation region on the glass substrate 111. The thickness is formed.

  In this embodiment, the color filters 113R, 113G, and 113B are overlapped to form a black matrix, but the thickness of the filter is thinner than the pixel area in the overlapping portion of the filters. As described above, when the thickness of each of the filters 113R, 113G, and 113B is 1.5 μm, the height of the overlapping portion (the protruding height of the pixel region from the color filter surface) is about 1.8 μm.

  Next, as shown in FIG. 21A, ITO is formed on the entire upper surface of the glass substrate 111 to a thickness of 1500 mm to form the counter electrode 114. Next, as shown in FIG. 21B, a cell thickness adjusting layer 117 having a height of about 3.0 μm is formed in a predetermined region (spacer portion) on the counter electrode 114. As a material of the cell thickness adjusting layer 117, for example, a positive type novolac resin (photosensitive resist) can be used. In this case, the cell thickness adjusting layer 117 is formed by applying a novolac resin to the entire upper surface of the glass substrate 111 and then performing exposure and development processing.

  Next, as shown in FIG. 21C, a protrusion pattern 115 having a height of about 1.5 μm is formed on the upper side of the glass substrate 111. However, the height of the protrusion pattern 115 is slightly reduced in the overlapping portion of the color filters. The protrusion pattern 115 can also be formed using a positive novolac resin. Thereafter, an alignment film 116 is formed on the entire upper surface of the glass substrate 111. Thereby, the CF substrate 110 is completed. In this example, the height of the spacer portion (the protruding height of the pixel region from the filter surface) is about 4.0 μm.

  In the above example, the case where the color filters 113R, 113G, and 113B are formed using a pigment dispersion type photosensitive resist has been described. However, the color filters 113R, 113G, and 113B are formed using other materials. May be. For example, a color filter may be formed by using a resin containing a dye or a pigment and patterning it into a predetermined shape by etching. In addition, a color filter can be formed by a method such as printing.

  Furthermore, in the above example, the cell thickness adjusting layer 117 is formed of novolac resin, but may be formed of other materials such as acrylic, polyimide, and epoxy resin. Hereinafter, effects of the present embodiment will be described. An acrylic resin is used as a binder for a coloring material (pigment) in the photosensitive resist that is a raw material for the color filters 113R, 113G, and 113B. In the present embodiment, a photosensitive novolac resin is used as the material of the protrusion pattern 115. Since these materials have good flatness, the thickness of the overlapping portion of the color filter is thinner than the thickness of the pixel region (flat portion).

  Normally, when these resins are applied with a spinner or slit coater, leveling occurs in the resin layer of the second and third layers that overlap each other until the resin dries. The thickness of the filter is about 70% of the first layer, and the thickness of the color filter of the third layer is as thin as about 50% of the first layer. If the cell thickness adjusting layer 117 is not provided, the cell thickness is determined by the thickness of the overlapping portion of the color filter, and thus it is necessary to increase the thickness of each color filter in the overlapping portion of the color filter. In order to increase the thickness of the color filters of the second layer and the third layer, for example, a method of shortening drying by vacuum drying to reduce leveling or a method of increasing the coating film thickness of the resin can be considered. However, in these methods, uneven coating and dry unevenness occur, resulting in a decrease in manufacturing yield.

  FIG. 22 is a diagram showing the relationship between the color filter thickness in the pixel region on the horizontal axis and the height of the spacer portion on the vertical axis. However, ▲ indicates the case where the thickness of each color filter is the same as the height of the protrusion pattern, and □ indicates the case where the height of the protrusion pattern is constant at 2 μm. As can be seen from this figure, in order to set the cell thickness to 4 μm, it is necessary to set the thickness of each color filter in the pixel region and the height of the protrusion pattern to 3 μm. However, when the height of the protrusion pattern is 30% or less or 50% or more of the cell thickness, the transmittance and the contrast are lowered. For this reason, it is preferable that the height of the projection pattern is 1.2 to 2.0 μm, and it is necessary to further increase the thickness of the color filter.

  In general, when a thickness of a pigment dispersion resist used as a color filter material exceeds 3 μm, fine patterning becomes difficult. Moreover, the drying rate after application | coating becomes slow, and the problem that productivity falls also generate | occur | produces. Therefore, it is not realistic to set the thickness of the color filter to 3 μm or more. It is also conceivable to use a material with poor flatness, such as polyimide, as the color filter material. However, since polyimide is non-photosensitive, an etching process is required for patterning, and the manufacturing cost increases due to an increase in the number of processes. Even if the color filter is formed thick, the distance between the counter electrode in the spacer portion and the pixel electrode on the TFT substrate side is very close, and short circuit failure is likely to occur.

  In the present embodiment, as described above, the cell thickness adjusting layer 117 is provided between the overlapping portions of the color filters 113R, 113G, and 113B and the protrusion pattern 115, and the cell thickness can be adjusted by the cell thickness adjusting layer 117. Even if the thickness of the color filters 113R, 113G, and 113B is 3 μm or less, a sufficient cell thickness can be secured. Therefore, a decrease in productivity and a decrease in manufacturing yield are avoided. In addition, since the color filter is formed from a photosensitive resist, an increase in the number of steps can be avoided as compared with the case where the color filter is manufactured from a non-photosensitive resin such as polyimide. Furthermore, since the cell thickness can be adjusted to the optimum value by the protrusion pattern 117, it is possible to avoid a decrease in transmittance and a decrease in contrast. Furthermore, since the cell thickness adjusting layer 117 can provide a sufficient distance between the counter electrode 114 and the pixel electrode 102 on the TFT substrate 100 side, even if the alignment films 106 and 116 are damaged at the contact portion, Short circuit failure can be avoided.

  In the above embodiment, the cell thickness adjusting layer 117 is formed and then the protrusion pattern 115 is formed. However, this process may be reversed. That is, as shown in FIG. 23, the protrusion pattern 117 is formed on the counter electrode 114, and then the cell thickness adjusting layer 118 is formed on the protrusion pattern 117 of the spacer portion. In this case, the same effect as the above embodiment can be obtained.

  In the above embodiment, three layers of color filters 113R, 113G, and 113B are stacked to form the black matrix 112. However, any two layers of color filters may be stacked to form a black matrix. Further, when there is no short circuit between the counter electrode 114 and the pixel electrode 102 in the spacer portion, the counter electrode 114 may be formed after the cell thickness adjusting layer 117 is formed.

(Fifth embodiment)
FIG. 24 is a sectional view showing a liquid crystal display device according to a fifth embodiment of the present invention. Since the structure on the TFT substrate side is the same as that of the fourth embodiment, the same components in FIG. 24 as those in FIG. On one surface (lower surface in the figure) of the glass substrate 121 on the CF substrate 120 side, a black matrix 122 made of black resin is formed in a predetermined pattern. The thickness of the black matrix 122 made of the black resin is, for example, 3.5 μm. The black matrix 122 is patterned through an exposure and development process using a photosensitive resist in which a black pigment is dispersed.

  In each pixel region on the lower surface of the glass substrate 121, red (R), green (G), and blue (B) color filters 123R, 123G, and 123B are formed. Under the black matrix 124, these color filters 123R, 123G, and 123B are laminated in three layers. A counter electrode 124 made of ITO is formed on the lower surface side of the glass substrate 121 so as to cover the color filters 123R, 123G, and 123B. A projection pattern 125 is formed below the counter electrode 124. Similar to the fourth embodiment, this protrusion pattern is disposed between the slits 102a of the pixel electrode 102 provided on the TFT substrate 110 side (see FIG. 19).

  A vertical alignment film 126 is formed on the lower surface of the counter electrode 124, and the surface of the protrusion pattern 125 is covered with the vertical alignment film 126. In the present embodiment, since the cell thickness is adjusted by the resin black matrix 124, as in the fourth embodiment, it is necessary to increase the thickness of the color filter or increase the height of the protrusion pattern. Therefore, the optimum cell thickness can be adjusted. Thereby, the same effect as the fourth embodiment can be obtained.

  In the above embodiment, the case where the color filters 123R, 123G, and 123B are stacked in three layers under the black matrix 124 has been described. However, the color filter under the black matrix 124 may be one layer or two layers. When there is no possibility that the counter electrode 124 and the pixel electrode 102 are short-circuited, the counter electrode 124 may be formed after the projection pattern 125 is formed.

  Furthermore, the color filter may not be overlaid on the resin black matrix 122 in portions other than the spacer portion, or may be formed by overlapping the color filter in the same manner as the spacer portion. However, if a protrusion exceeding 1/3 of the cell thickness is formed in a portion other than the spacer portion, it is covered with an insulating layer (an insulating layer made of the same material as the protrusion pattern 125) formed on the protrusion pattern 125. It is preferable to do. As a result, it is possible to more reliably prevent the occurrence of a short circuit between the pixel electrode 102 on the TFT substrate 100 side and the counter electrode 124 on the CF substrate 120 side.

(Sixth embodiment)
FIG. 25 is a cross-sectional view showing a liquid crystal display device according to a sixth embodiment of the present invention. In this embodiment as well, the structure on the TFT substrate side is the same as that of the fourth embodiment. Therefore, in FIG. 25, the same components as those in FIG.

  A black matrix 132 made of low-reflection Cr (chrome) is formed in a predetermined pattern on the lower surface side of the glass substrate 131 on the CF substrate 130 side. A resist 137 is formed under the black matrix 132 with the same pattern as the black matrix 132. In each pixel region on the lower surface of the glass substrate 131, red (R), green (G), and blue (B) color filters 133R, 133G, and 133B are formed. Under the black matrix 124, these color filters 133R, 133G, and 133B are stacked in three layers.

  A counter electrode 134 made of ITO is formed on the lower surface side of the glass substrate 131 so as to cover the color filters 133R, 133G, and 133B. Further, a protrusion pattern 135 is formed under the counter electrode 134. Similar to the fourth embodiment, this protrusion pattern is disposed between the slits 102a of the pixel electrode 102 provided on the TFT substrate 110 side (see FIG. 19).

  Furthermore, a vertical alignment film 136 is formed under the counter electrode 134, and the surface of the projection pattern 135 is covered with the vertical alignment film 136. 26 and 27 are cross-sectional views showing the method of manufacturing the CF substrate 130 of the liquid crystal display device of this embodiment in the order of steps. First, as shown in FIG. 26A, a low reflection Cr film is formed on a glass substrate 131 to a thickness of about 0.16 μm, and a photosensitive resist 137 made of a positive novolac resin is formed on the glass substrate 131 about 4 times. A thickness of 0.0 μm is formed. Then, the resist 137 is exposed and developed to form a predetermined black matrix pattern. Thereafter, the portion of the Cr film not covered with the resist 137 is removed by etching, and the Cr film remains only under the resist 137. The Cr film remaining under the resist 137 becomes the black matrix 132.

  Next, as shown in FIG. 26B, a blue color filter 133B is formed on the glass substrate 131 to a thickness of 1.5 μm. As a material of the blue color filter 133B, a photosensitive resist in which a blue pigment is dispersed is used. After the photosensitive resist is applied on the glass substrate 131, the blue color filter 133B is formed by performing exposure and development processing. be able to.

  Next, as shown in FIG. 26C, a red color filter 133R is formed to a thickness of 1.5 μm on the glass substrate 131 using a photosensitive resist in which a red pigment is dispersed. Next, as shown in FIG. 27A, a green color filter 133G is formed to a thickness of 1.5 μm on a glass substrate 131 using a photosensitive resist in which a green pigment is dispersed. In the process so far, the height of the overlapping portion of the low reflection Cr black matrix 132, the resist 137 on the black matrix 132, and the color filters 133R, 133G, and 133B (the protruding height of the pixel portion from the filter surface) is about 3. .8 μm.

  Next, as shown in FIG. 27B, a counter electrode 114 made of ITO is formed on the entire surface to a thickness of 1500 mm, for example. Next, as shown in FIG. 27C, a projection pattern 135 is formed in a zigzag shape (see FIG. 19) on the counter electrode 114. The height of the protrusion pattern 135 is about 1.5 μm. In the overlapping portion of the color filters, the height of the protrusion pattern 135 is lower than 1.5 μm. As a material of the projection pattern 135, a positive novolac resin can be used.

  Thereafter, an alignment film 136 is formed on the entire upper surface of the glass substrate 131. Thereby, the CF substrate 130 is completed. In this example, the height of the spacer portion (the protruding height of the pixel region from the filter surface) is about 4.0 μm. In this embodiment, in addition to the same effects as those of the fourth embodiment, the cell thickness adjusting spacer is left as it is when the black matrix made of low reflection Cr is formed. Therefore, there is an advantage that an increase in the number of steps can be avoided.

  Although three layers of RGB color filters are stacked on the resist 137 in this embodiment, one layer or two layers may be stacked. In this embodiment, since the color filter is overlaid on the resist 137, the thickness of the color filter on the resist 137 is reduced. For this reason, in order to ensure a predetermined cell thickness, it is preferable that the total thickness of the black matrix 132 and the resist 137 is made larger than the thickness in the pixel region of each of the color filters 133R, 133G, and 133B.

(Seventh embodiment)
FIG. 28 is a plan view showing a liquid crystal display device according to a seventh embodiment of the present invention, FIG. 29A is a cross-sectional view taken along line BB in FIG. 28, and FIG. 29B is CC in FIG. It is sectional drawing by a line. The structure on the TFT substrate side of the liquid crystal display device of this embodiment is the same as that of the fourth embodiment. Therefore, in FIG. 29, the same components as those in FIG. To do. In FIG. 29, the TFT substrate is shown on the upper side and the CF substrate is shown on the lower side.

  The liquid crystal display device of this embodiment has a structure in which a liquid crystal 49 having negative dielectric anisotropy is sealed between a TFT substrate 100 and a CF substrate 140. Further, polarizing plates (not shown) are disposed on the upper side of the TFT substrate 100 and the lower side of the CF substrate 140, respectively. These polarizing plates are arranged so that their polarization axes are orthogonal to each other.

  The CF substrate 140 includes a glass substrate 141, color filters 143R (red), 143G (green), 143B (blue) formed on the upper side of the glass substrate 141, a counter electrode 144, an alignment film 146, and the like. In other words, as shown in FIG. 29, color filters 143R, 143G, and 143B are formed on the glass substrate 141. Any one of these color filters 143R, 143G, and 143B is disposed in each pixel region. In the region between the pixels, the color filter 143B and any one of the color filter 143R or the color filter 143G overlap each other to form a black matrix 142. Further, in the spacer portion 148 near the point where the gate bus line 103b and the drain bus line 103a intersect, the color filters 143R, 143G, and 143B are overlapped in three layers.

  On these color filters 143R, 143G, 143B, a counter electrode 144 made of ITO is formed. On the counter electrode 144, as shown in FIG. 28, a projection pattern 145 made of an insulating resin is formed in a zigzag shape. Further, a vertical alignment film 144 is formed so as to cover the surfaces of the counter electrode 144 and the protrusion pattern 145.

  The thus configured CF substrate 140 comes into contact with the TFT substrate 100 at the tip of the protrusion 145 of the spacer portion 148, and the cell thickness between the TFT substrate 100 and the CF substrate 140 is kept constant. Yes. The size of the spacer portion 148 is 30 μm × 30 μm. 30 and 31 are plan views showing the method of manufacturing the CF substrate of the liquid crystal display device of the present embodiment in the order of steps, and FIG. 32 is a sectional view of the same. FIG. 32 shows a cross section taken along the line CC of FIG.

  First, as shown in FIGS. 30A and 32A, a photosensitive resist in which a blue pigment is dispersed is used, and a blue color filter 143B is provided in a blue pixel formation region and a black matrix region on a glass substrate 141. It is formed to a thickness of 1.5 μm. Next, as shown in FIGS. 30B and 32B, a photosensitive resist in which a red pigment is dispersed is used, and a red color filter 143R is formed in a red pixel formation region on the glass substrate 141 by about 1.5 μm. The thickness is formed. At the same time, the red color filter 143R is formed on the black color filter 143B in the black matrix formation region around the red pixel, the spacer portion formation region, and the black matrix formation region around the blue pixel. However, in the black matrix formation region between the red pixel and the green pixel, the red color filter 143R is formed only in the half region on the red pixel side. Further, the red color filter 143R is not formed on the black matrix formation region between the green pixel and the blue pixel.

  Next, as shown in FIGS. 31 and 32C, a green color filter 143G is formed in a green pixel formation region on the glass substrate 141 to a thickness of about 15 μm using a photosensitive resist in which a green pigment is dispersed. To do. At the same time, the green color filter 143G is formed on the black matrix forming region around the green pixel and the blue color filter 143B or the red color filter 143R in the spacer forming region. However, in the black matrix formation region between the green pixel and the red pixel, the green color filter 143G is formed only in the half region on the green pixel side.

  Next, as shown in FIGS. 28 and 29, ITO is formed on the color filters 143R, 143G, and 143B to a thickness of about 1000 mm to form a pixel electrode 144. Thereafter, a positive resist film is formed on the pixel electrode 144, and exposure and development processes are performed to form a protrusion pattern 145 having a width of about 10 μm and a height of about 1.5 μm. Then, a vertical alignment film 146 is formed on the entire upper surface of the glass substrate 141 to a thickness of about 800 mm. Thereby, the CF substrate 140 is completed. When the CF substrate 140 is thus formed, the height of the spacer portion 148 is about 3.8 μm.

  Hereinafter, effects of the present embodiment will be described. When the black matrix has a three-layer structure of RGB color filters, the inclination angle of the side wall portion of the black matrix increases, and the angle of the liquid crystal molecules becomes substantially horizontal to the substrate in the vicinity of the side wall portion of the black matrix. Such an orientation abnormality causes light leakage when no voltage is applied, and also causes a decrease in transmittance when a voltage is applied, resulting in a significant decrease in contrast.

  FIG. 33 is a diagram showing the relationship between the step of the pixel region edge and the contrast, with the horizontal axis representing the step between the pixel region and the black matrix and the vertical axis representing the contrast. As can be seen from this figure, when the step exceeds 1.5 μm, the contrast is less than 200. Therefore, in this embodiment, the black matrix 142 is configured by two layers of the blue color filter 143B and the red color filter 143R or the green color filter 143G. As a result, the level difference between the pixel region and the black matrix is about 2/3 of the three-layer structure, and the region where the liquid crystal molecules are aligned almost horizontally with respect to the substrate is about 2/3 in the cell gap direction. , Light leakage is reduced.

  In addition, when the step inclination angle between the black matrix and the pixel region is large, the alignment of the liquid crystal molecules approaches horizontal with respect to the substrate, and when the step inclination angle is small, the alignment of liquid crystal molecules approaches perpendicular to the substrate. FIG. 34 is a diagram showing the relationship between the horizontal axis with the step angle and the vertical axis with contrast. As shown in this figure, when the tilt angle is 30 degrees or less, the contrast is 250 or more, and sufficient contrast is obtained.

  By the way, when the contribution to the brightness of each color filter is considered, the contribution to the brightness of RGB is R: G: B = 3: 3: 1. Therefore, the light leakage at the blue pixel portion has little influence on the decrease in contrast, and the light leakage at the red or blue pixel portion greatly affects the decrease in contrast. In the present embodiment, the uppermost layer of the black matrix is composed of a red color filter around the red pixel, and the uppermost layer of the black matrix is composed of the green color filter around the green pixel. For this reason, the slopes between the red pixel and the surrounding black matrix and between the green pixel and the surrounding black matrix become gentle, and it is possible to reduce a decrease in contrast due to an abnormal alignment. Although the tilt angle increases around the blue pixel, as described above, since the contribution to the brightness of the blue pixel is small, light leakage at the blue pixel due to the large tilt angle is a problem. Absent.

  When the liquid crystal display device was actually produced by the above method and the contrast was examined, the contrast was 400 or more. As a method of changing the inclination angle of the step between the pixel region and the black matrix, there are a method of changing an exposure condition and a development condition when forming a color filter, and a method of changing a resin as a material of the color filter. . By using these methods, the inclination angle of the step between the pixel region and the black matrix can be set to 30 degrees or less.

(Eighth embodiment)
FIG. 35 is a sectional view showing a liquid crystal display device according to an eighth embodiment of the present invention. In the present embodiment, a redundant light-shielding film is arranged outside the display area of the liquid crystal display device, and the configuration of the other portions is applied, for example, to the configuration shown in the first to seventh embodiments. can do.

  In the present embodiment, the redundant light shielding film 152 is formed on the glass substrate 151 outside the display area of the TFT substrate 150. The redundant light shielding film 152 is made of, for example, a multilayer metal film of an Al (aluminum) film and a Ti (titanium) film, or a metal film such as a Cr film or a metal oxide film that blocks light. The edge of the vertical alignment film 156 on the TFT substrate 150 side overlaps the edge of the redundant light shielding film 152 on the display area side. In this embodiment, the width of the redundant light shielding film 152 is set to 2.0 mm. However, the width of the redundant light shielding film 152 is determined according to the positioning accuracy at the time of pattern formation so that no gap is generated between the redundant light shielding film 152 and the alignment film 156. It is necessary to.

  In the display area of the TFT substrate 150, a plurality of pixel electrodes (not shown), TFTs (not shown) arranged for each pixel electrode, and bus lines (not shown) connected to the TFTs. ) And a vertical alignment film 156 that covers the pixel electrode. Similar to the first to seventh embodiments, the CF substrate 160 includes a color filter (not shown) arranged in each pixel region, a black matrix 162, and a color filter and a black that exist in the display region. A counter electrode (not shown) that covers the matrix 162 and a vertical alignment film 166 that covers the counter electrode are formed. In this embodiment, it is assumed that the black matrix 162 is composed of two layers of a blue color filter and a red color filter. Further, it is assumed that the edge of the black matrix 162 (outside the display area) is not covered with the alignment film 166. The redundant light shielding film 152 on the TFT substrate 150 side is arranged so as to face the black matrix 162 outside the display area.

  A bus line (gate bus line or drain bus line) on the TFT substrate 150 side is drawn from the display area to the end of the substrate 151 to be connected to an external circuit. Therefore, it is necessary to form the redundant light shielding film 152 between the bus lines or in a layer different from the bus line so that the bus lines are not electrically connected via the redundant light shielding film 152. When the redundant light shielding film 152 is formed in a layer different from the bus line, in order to prevent capacitive coupling between the bus lines, as shown in FIG. It is preferable not to arrange.

  Hereinafter, effects of the present embodiment will be described. In the case where the color filters are overlapped to form a black matrix, if the three layers of color filters are stacked, the thickness of the black matrix increases, and the disconnection (so-called step disconnection) of the counter electrode is likely to occur at the step portion. For this reason, when the color filters are overlapped to form a black matrix, the number of color filter layers is preferably two. Table 1 shows the transmittance when the color filters are stacked in two or three layers. However, the OD value is a log value of transmittance.

  As can be seen from this table, when two color filters are overlapped to form a black matrix, the combination of a blue color filter and a red color filter can block light most efficiently. However, when a liquid crystal display device in which a black matrix is actually configured with a blue color filter and a red color filter is produced, light leakage of blue light occurs in an outer portion of the display area. This is considered to be due to the following reason.

  FIG. 37 is a cross-sectional view of a liquid crystal display device without a redundant light shielding film. 37, the same components as those in FIG. 35 are denoted by the same reference numerals, and detailed description thereof is omitted. In this liquid crystal display device, it is assumed that a black matrix is formed by overlapping a red color filter on a blue color filter. In general, as shown in FIG. 37, the edge of the black matrix 162 outside the display area on the CF substrate 160 side is not covered with the alignment film 166. In this part, since the liquid crystal molecules are randomly oriented, the light transmittance is increased when no voltage is applied.

  FIG. 38 is a diagram illustrating wavelength spectral characteristics of the blue, green, and red color filters. As shown in this figure, the transmittance of the red color filter with respect to the light of the wavelength in the blue region is relatively high, so even if the blue color filter and the red color filter are overlapped, the light in the short wavelength region is sufficiently cut off. I can't. For this reason, in the black matrix comprised of a blue color filter and a red color filter, light on the short wavelength side (blue light) is transmitted and observed as blue light leakage.

  However, in this embodiment, since the redundant light shielding film 152 is disposed outside the display area, it is possible to reliably block blue light leakage that occurs outside the display area. In the present embodiment, since the black matrix 162 on the CF substrate 160 side is composed of blue and red color filters, the reflectance is lower than that of the redundant light shielding film 152 made of metal on the TFT substrate 150 side. There is also an effect as an external light antireflection film. Thereby, there is an advantage that display quality is improved.

(Ninth embodiment)
FIG. 39 is a sectional view showing a liquid crystal display device according to a ninth embodiment of the present invention. 39, the same components as those in FIG. 35 are denoted by the same reference numerals, and detailed description thereof is omitted. In the present embodiment, the color filter 162 formed on the CF substrate 160 is configured by laminating a blue color filter and a red color filter. Further, a redundant light shielding film 163 made of a UV (ultraviolet) coat film is formed on the upper surface of the CF substrate 160 (the surface opposite to the surface facing the TFT substrate 150) and outside the display region. . The UV coat film is formed by laminating a TiO ₂ film and a SiO ₂ film in multiple layers, for example, by vapor deposition, and has a cutoff wavelength of 500 nm or less.

  In the present embodiment, even if blue light is transmitted through the black matrix composed of the blue color filter and the red color filter in the outer portion of the display area, the blue light is blocked by the redundant light shielding film 163. Leakage can be reliably prevented. In this embodiment, the redundant light shielding film 163 made of the UV coating film is formed on the CF substrate 160 side. However, the redundant light shielding film may be formed on the TFT substrate 150 side, and the CF substrate 160 and the TFT substrate 150 may be formed. You may form in both.

(Tenth embodiment)
FIG. 40 is a sectional view showing a liquid crystal display device according to a tenth embodiment of the present invention. 40, the same components as those in FIG. 35 are denoted by the same reference numerals, and detailed description thereof is omitted. A pair of polarizing plates 158 and 168 are arranged with a liquid crystal panel formed by bonding the TFT substrate 150 and the CF substrate 160 interposed therebetween. These polarizing plates 158 and 168 are arranged so that the polarization axes are orthogonal to each other. In this embodiment, a UV coat film is formed as a redundant light shielding film 169 on at least one of the polarizing plates 158 and 168. However, the redundant light shielding film 169 is formed in a region corresponding to a portion outside the display region and where the black matrix 162 is not covered with the vertical alignment film 166.

  In this embodiment, in addition to obtaining the same effect as in the eighth embodiment, the redundant light shielding film 169 (UV coat film) is not directly formed on the liquid crystal panel. Has the advantage of being easy.

(Eleventh embodiment)
FIG. 41 is a plan view showing a CF substrate of the liquid crystal display device according to the eleventh embodiment of the present invention. In this embodiment, the structure shown in the first to seventh embodiments can be applied to the structure of the TFT substrate, for example. 41, reference numeral 177 denotes a display area, 178 denotes an outer portion of the display area, and 179 denotes a transfer connection portion. FIG. 42A is a cross-sectional view of the CF substrate in the display area 177, and FIG. 42B is a cross-sectional view of the CF substrate in the outside of the display area.

  In the present embodiment, the black matrix in the display region 177 on the CF substrate 170 side has a two-layer structure of a blue color filter and a red color filter. In addition, in the portion 178 outside the display area, a redundant light shielding film 175 is configured by a three-layer structure of red, green, and blue color filters. In general, in a liquid crystal display device, a counter electrode on the CF substrate side and a voltage application unit on the TFT substrate side are electrically connected to each other through a conductor called a transfer at a portion outside the display region. The transfer is arranged at the transfer connection 179.

  If all of the redundant light-shielding films on the outer side of the display area have a three-layer structure of three color filters, the step between the display area 177 and the outer part 178 becomes large, and the counter electrode (ITO film) is continuous. There is a risk of disconnection (disconnection). Therefore, in the present embodiment, as shown in FIG. 42B, the color filters of the transfer connection portion 179 are stacked in two layers to prevent connection failure.

  As described above, in the present embodiment, the redundant light shielding film 175 in the outer portion of the display area is configured by the three layers of the red, green, and blue color filters. Can be reliably avoided. In addition, since the color filter of the portion (transfer connection portion 179) that is electrically connected to the electrode on the TFT substrate side by transfer is outside the display area, two layers of color filters are stacked, resulting in disconnection during the formation of the ITO film. It is difficult to avoid a decrease in manufacturing yield.

(Appendix)
(1) In the first liquid crystal display device, a second protrusion pattern lower than the first protrusion pattern is provided between the first electrode of the first substrate and the first vertical alignment film. It is preferable to have.

  (2) In the first liquid crystal display device, it is preferable that a slit is provided in the first electrode of the first substrate.

  (3) In the second liquid crystal display device, it is preferable that a blue color filter among the color filters is formed with a thickness different from that of other color filters.

  (4) In the second liquid crystal display device, it is preferable that the light shielding film is formed of a black resin so as to be thicker than the color filter.

  (5) In the second liquid crystal display device, it is preferable that the light-shielding film is formed by overlapping at least two color filters including a blue color filter among the color filters.

  (6) In the second liquid crystal display device, it is preferable that a second protrusion pattern is formed between the first electrode of the first substrate and the first vertical alignment film.

  (7) In the second liquid crystal display device, it is preferable that a slit is provided in the first electrode of the first substrate.

  (8) In the method for manufacturing the first liquid crystal display device, after the step of forming a plurality of pixel electrodes on the second substrate, a second protrusion pattern made of an insulating material is formed above the pixel electrodes. It is preferable to have the process of forming.

  (9) In the manufacturing method of the first liquid crystal display device, it is preferable that the light shielding film is formed of a black resin and the color filter is formed thinner than the light shielding film.

  (10) In the manufacturing method of the first liquid crystal display device, it is preferable that a blue color filter among the color filters is formed with a thickness different from that of other color filters.

  (11) In the method for manufacturing the second liquid crystal display device, after the step of forming a plurality of pixel electrodes on the second substrate, a second protrusion pattern made of an insulating material is formed above the pixel electrodes. It is preferable to have the process of forming.

  (12) In the method for manufacturing the second liquid crystal display device, at least one of the red color filter, the green color filter, and the blue color filter is formed with a thickness different from that of the other color filters. It is preferable.

  (13) In the fourth liquid crystal display device, it is preferable that a thickness of the light shielding film is larger than a thickness of the color filter.

  (14) In the fourth liquid crystal display device, it is preferable that the light shielding film includes a film made of a metal or a metal compound and a resist formed thereon.

  (15) In the fifth liquid crystal display device, any of an inclination angle between the red pixel region and the surrounding light shielding film and an inclination angle between the green pixel region and the surrounding light shielding film Is preferably 30 degrees or less.

  (16) In the fifth liquid crystal display device, the step between the red pixel region and the surrounding light shielding film and the step between the green pixel region and the surrounding light shielding film are all 1 It is preferable that it is 5 μm or less.

  (17) In the liquid crystal display device of the first aspect, it is preferable that the redundant light shielding film is made of a metal or a metal compound.

  (18) In the liquid crystal display device according to claim 1, it is preferable that the redundant light shielding film is made of a UV coat film having a cut wavelength of 500 nm or less.

  (19) In the liquid crystal display device according to claim 1, it is preferable that the redundant light-shielding film has a three-layer structure of red, green and blue color filters.

FIG. 1 is a cross-sectional view of a liquid crystal display device according to a first embodiment of the present invention. FIG. 2 is a plan view of the TFT substrate of the liquid crystal display device according to the first embodiment. FIG. 3 is a plan view of the CF substrate of the liquid crystal display device according to the first embodiment. FIG. 4A is a diagram showing the principle that alignment division is achieved by the projection pattern, and FIG. 4B is a diagram showing the principle that alignment division is achieved by the projection pattern and the slit of the pixel electrode. FIG. 5 is a diagram showing an example in which a slit is formed in the pixel electrode on the TFT substrate side. FIG. 6 is a diagram showing the relationship between the protrusion pattern height / cell thickness and the light transmittance during white display. FIG. 7 is a diagram showing the relationship between the pattern width of the protrusion pattern and the light transmittance during white display. FIG. 8 is a cross-sectional view of a liquid crystal display device according to a second embodiment of the present invention. FIG. 9 is a plan view of a CF substrate of the liquid crystal display device according to the second embodiment. FIG. 10 is a plan view of the CF substrate showing problems when the width of the protrusion pattern on the black matrix is made the same as that of other portions. FIG. 11 is a cross-sectional view showing a liquid crystal display device according to a third embodiment of the present invention. FIG. 12 is a plan view of a CF substrate of the liquid crystal display device according to the third embodiment. FIG. 13 is a sectional view (No. 1) showing the method for manufacturing the liquid crystal display device of the third embodiment. FIG. 14 is a sectional view (No. 2) showing the method for manufacturing the liquid crystal display device according to the third embodiment. FIG. 15 is a cross-sectional view showing a modification of the third embodiment. FIG. 16 is a diagram showing the relationship between cell thickness and transmittance when red, green, and blue color filters are used. FIG. 17 is a cross-sectional view of a liquid crystal display device according to a fourth embodiment of the present invention. FIG. 18 is an enlarged view of a part of FIG. FIG. 19 is a plan view showing a CF substrate of the liquid crystal display device according to the fourth embodiment. FIG. 20 is a diagram (part 1) illustrating the method for manufacturing the CF substrate of the liquid crystal display device according to the fourth embodiment. FIG. 21 is a diagram (No. 2) illustrating the method for manufacturing the CF substrate of the liquid crystal display device according to the fourth embodiment. FIG. 22 is a diagram showing the relationship between the thickness of the color filter and the height of the spacer portion. FIG. 23 is a cross-sectional view showing a modification of the fourth embodiment. FIG. 24 is a sectional view showing a liquid crystal display device according to a fifth embodiment of the present invention. FIG. 25 is a cross-sectional view showing a liquid crystal display device according to a sixth embodiment of the present invention. FIG. 26 is a diagram (part 1) illustrating the method for manufacturing the CF substrate of the liquid crystal display device according to the sixth embodiment. FIG. 27 is a diagram (No. 2) illustrating the method for manufacturing the CF substrate of the liquid crystal display device according to the sixth embodiment. FIG. 28 is a plan view showing a liquid crystal display device according to a seventh embodiment of the present invention. 29A is a cross-sectional view taken along line BB in FIG. 28, and FIG. 29B is a cross-sectional view taken along line CC in FIG. FIG. 30 is a plan view (part 1) illustrating the method for manufacturing the CF substrate of the liquid crystal display device according to the seventh embodiment. FIG. 31 is a plan view (part 2) illustrating the method for manufacturing the CF substrate of the liquid crystal display device according to the seventh embodiment. FIG. 32 is a cross-sectional view showing the method for manufacturing the CF substrate of the liquid crystal display device of the seventh embodiment. FIG. 33 is a diagram showing the relationship between the level difference of the pixel region edge and the contrast. FIG. 34 is a diagram showing the relationship between the inclination angle of the step of the pixel region edge and the contrast. FIG. 35 is a sectional view showing a liquid crystal display device according to an eighth embodiment of the present invention. FIG. 36 is a perspective view showing a liquid crystal display device according to an eighth embodiment. FIG. 37 is a cross-sectional view of a liquid crystal display device without a redundant light shielding film. FIG. 38 is a diagram showing the wavelength spectral characteristics of the blue, green and red color filters. FIG. 39 is a sectional view showing a liquid crystal display device according to a ninth embodiment of the present invention. FIG. 40 is a sectional view showing a liquid crystal display device according to a tenth embodiment of the present invention. FIG. 41 is a plan view showing a CF substrate of the liquid crystal display device according to the eleventh embodiment of the present invention. FIG. 42A is a cross-sectional view of the CF substrate in the display region of the liquid crystal display device according to the eleventh embodiment, and FIG. 42B is a cross-sectional view of the CF substrate outside the display region. FIG. 43 is a cross-sectional view showing the structure of a general TN (Twisted Nematic) type liquid crystal display device. FIG. 44 is a schematic diagram showing the operation of a normally white mode TN liquid crystal display device.

Explanation of symbols

1a, 1b, 31, 41, 51, 61, 71, 101, 111, 151, 161, glass substrate,
3a, 3b, 35, 45, 55, 115, 125, 135, 145 Projection pattern,
4a, 4b, 36, 46, 56, 106, 116, 146, 156, 166, 176, a vertical alignment film,
6, 32a, 102a slit,
30, 100, 150 TFT substrate,
32, 62, 102 pixel electrodes,
40, 50, 110, 120, 130, 160 CF substrate,
42, 52, 72, 112, 122, 132, 142, 162 Black matrix,
43, 53, 53R, 53G, 53B, 73, 113R, 113G, 113B, 143R, 143G, 143B, 173R, 173G, 173B color filters,
44, 54, 75, 114, 124, 174 counter electrode,
49 Liquid crystal (negative liquid crystal),
66, 67 horizontal alignment film,
69 liquid crystal (positive liquid crystal),
70 spacer,
67, 77 Polarizing plates 117, 118 Cell thickness adjusting layer 137 Resist 148 Spacers 152, 163, 169 Redundant light shielding films.

Claims (7)

A first substrate having a plurality of first electrodes formed on one surface side and a first alignment film covering the first electrodes;
A black matrix formed by overlapping red, green and blue color filters disposed opposite to the first electrode of the first substrate; and at least two color filters; and the color filters and the black A second substrate having a second electrode covering the matrix and a second alignment film covering the second electrode;
In a liquid crystal display device having a liquid crystal having negative dielectric anisotropy sealed between the first substrate and the second substrate,
A liquid crystal display device, wherein a redundant light-shielding film for blocking blue light is formed on an outer portion of a display area where the plurality of first electrodes are arranged.   The liquid crystal display device according to claim 1, wherein the redundant light shielding film is made of a UV coat film having a cutoff wavelength of 500 nm or less. 3. The liquid crystal display device according to claim 2, wherein the UV coat film is formed by laminating a TiO ₂ film and a SiO ₂ film in multiple layers.   The redundant light shielding film is formed on the first substrate on the surface opposite to the surface on which the first electrode is formed and on the second substrate on the surface on the opposite side to the surface on which the second electrode is formed. The liquid crystal display device according to claim 1, wherein the liquid crystal display device is formed on any one of the above.   The redundant light shielding film is formed on the first substrate on the surface opposite to the surface on which the first electrode is formed and on the second substrate on the surface on the opposite side to the surface on which the second electrode is formed. The liquid crystal display device according to claim 1, wherein the liquid crystal display device is formed on both of them.   The liquid crystal display device according to claim 1, wherein the black matrix is configured by overlapping a blue color filter and a red color filter.   The liquid crystal display device according to claim 1, wherein the first and second alignment films are vertical alignment films.

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