JPH10221700A - Liquid crystal display device manufacturing method - Google Patents

Liquid crystal display device manufacturing method

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Publication number
JPH10221700A
JPH10221700A JP2640697A JP2640697A JPH10221700A JP H10221700 A JPH10221700 A JP H10221700A JP 2640697 A JP2640697 A JP 2640697A JP 2640697 A JP2640697 A JP 2640697A JP H10221700 A JPH10221700 A JP H10221700A
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substrate
liquid crystal
band
pass filter
sealing material
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JP2640697A
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JP3874871B2 (en )
Inventor
Arihiro Takeda
Kunihiro Tashiro
有広 武田
国広 田代
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Fujitsu Ltd
富士通株式会社
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Abstract

PROBLEM TO BE SOLVED: To provide a liquid crystal display device manufacturing method capable of avoiding it that oriented films and liquid crystal are irradiated with the short wavelength ultraviolet rays at the time of curing sealing material without adding a complicated process and capable of manufacturing a liquid crystal display device in which the optical degradation of the liquid crystal and the oriented films is suppressed to the minimum and which is excellent in a display performance in a liquid crystal display device manufacturing method in which ultraviolet-curing resin is used as sealing material. SOLUTION: Band-pass filters 23a are formed thinner than color filters 23 like surround outsides of display areas on the substrate 20 of a side where the color filters 23 are formed. These band-pass filters 23a are simultaneously formed by the same material (resist) as that of a blue color filter. Thereafter, a substrate 10 and the substrate 20 are joined by sealing material 18 and light shielding masks 27 covering the display areas are arranged at the substrate 20 side and then the sealing material 18 is cured by being irradiated with ultraviolet rays.

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【発明の属する技術分野】本発明は、一対の透明基板間に液晶を封入した液晶表示装置の製造方法に関し、特に一対の基板を接合するシール材として紫外線硬化型樹脂を用いた液晶表示装置の製造方法に関する。 The present invention relates to relates to a method of manufacturing a liquid crystal display device in which liquid crystal is sealed between a pair of transparent substrates, the liquid crystal display device using the ultraviolet curing resin as a sealing material in particular joining a pair of substrates It relates to a method for manufacturing.

【0002】 [0002]

【従来の技術】液晶表示装置は、薄くて軽量であるとともに低電圧で駆動できて消費電力が少ないという長所があり、各種電子機器に広く使用されている。 A liquid crystal display device, has advantages that the power consumption can be driven at a low voltage as well as a light weight less thin and are widely used in various electronic devices. 特に、近年、TFT(Thin Film Transistor:薄膜トランジスタ)等の能動素子が画素毎に設けられたアクティブマトリクス方式の液晶表示装置は、表示品質の点でもCRT In particular, in recent years, TFT: a liquid crystal display device of active matrix type (Thin Film Transistor TFT) active element or the like is provided for each pixel, CRT in terms of display quality
(Cathode-Ray Tube)に匹敵するほど優れたものが得られるようになり、携帯テレビやパーソナルコンピュータ等のディスプレイにも使用されている。 Become excellent as comparable to (Cathode-Ray Tube) is obtained, it is also used to display such as a portable television or a personal computer.

【0003】一般的に、液晶表示装置は2枚の透明基板の間に液晶を封入した構造を有している。 [0003] Generally, a liquid crystal display device has a structure in which liquid crystal is sealed between two transparent substrates. それらの透明基板の相互に対向する2つの面(対向面)のうち、一方の面側には対向電極、カラーフィルタ及び配向膜等が形成され、また他方の面側にはアクティブマトリクス回路、画素電極及び配向膜等が形成されている。 Of the two surfaces facing each other of their transparent substrate (opposing surface), the counter electrode is on one surface side, a color filter and an alignment film or the like is formed, also the active matrix circuit on the other surface side, the pixel electrode and an alignment film, etc. are formed. 更に、各透明基板の対向面と反対側の面には、それぞれ偏光板が貼り付けられている。 Furthermore, the opposing surface opposite to the surface of the transparent substrate, and polarizing plates are attached. これらの2枚の偏光板は、例えば偏光板の偏光軸が互いに直交するように配置され、これによれば、電界をかけない状態では光を透過し、電界を印加した状態では遮光するモード、すなわちノーマリーホワイトモードとなる。 These two polarizing plates, for example, the polarization axis of the polarizing plate is arranged so as to be perpendicular to each other, according to this, transmits light in the state without applying an electric field, shielded in a state of applying an electric field mode, that is, the normally white mode. また、2枚の偏光板の偏光軸が平行な場合には、ノーマリーブラックモードとなる。 Further, the polarization axes of two polarizing plates is a parallel case is a normally black mode.

【0004】通常、液晶表示装置の製造工程では、対向電極、カラーフィルタ及び配向膜等が形成された基板(以下、CF基板という)と、アクティブマトリクス回路、画素電極及び配向膜等が形成された基板(以下、T [0004] Normally, in the manufacturing process of the liquid crystal display device, the counter electrode, the substrate on which the color filter and an alignment film, etc. are formed (hereinafter, CF referred substrate) and an active matrix circuit, the pixel electrode and the alignment film is formed substrate (hereinafter, T
FT基板という)とを接合するシール材として、紫外線硬化型樹脂が使用されている。 As a sealing material for bonding the FT of the substrate), an ultraviolet curable resin is used. 図10(a)は従来の液晶表示装置の製造方法を示す断面図、図10(b)は同じくその基板接合部の近傍を詳細に示す拡大図である。 10 (a) is a cross-sectional view illustrating the manufacturing method of the conventional liquid crystal display device, FIG. 10 (b) is likewise enlarged view showing the vicinity of the substrate bonding unit in detail.
但し、図10(a)では、対向電極64及び配向膜5 However, in FIG. 10 (a), the counter electrode 64 and an alignment film 5
4,65の図示を省略している。 It is not shown 4,65.

【0005】TFT基板50は、ガラス基板51と、このガラス基板51の一方の面上にマトリクス状に配置された複数の画素電極52と、各画素電極52にそれぞれ接続されたTFT(図示せず)と、これらの画素電極5 [0005] TFT substrate 50 includes a glass substrate 51, and one plurality of pixel electrodes 52 arranged in a matrix on the surface of the glass substrate 51, without each connected TFT (shown to the pixel electrodes 52 a), the pixel electrodes 5
2及びTFTを覆う配向膜54とにより構成されている。 Is constituted by a 2 and the alignment film 54 covering the TFT. また、CF基板60は、ガラス基板61と、このガラス基板61の一方の面上に形成され、TFT基板50 Further, CF substrate 60 includes a glass substrate 61, is formed on one surface of the glass substrate 61, TFT substrate 50
の画素電極52に対応する開口部が設けられたブラックマトリクス62と、ブラックマトリクス62の各開口部に対応して設けられ、開口部毎にR(赤)・G(緑)・ A black matrix 62 which is provided with an opening corresponding to the pixel electrodes 52, provided corresponding to the openings of the black matrix 62, each opening R (red), G (green)
B(青)のいずれか一色を有するカラーフィルタ63 The color filter 63 having any one color of B (blue)
と、ブラックマトリクス62及びカラーフィルタ63上の全面を覆う対向電極64と、この対向電極64を覆う配向膜65とにより構成されている。 When, a counter electrode 64 which covers the entire surface of the black matrix 62 and the color filter 63 is constituted by the alignment film 65 covering the counter electrode 64. なお、画素電極5 The pixel electrode 5
2及び対向電極64は、いずれも透明なITO(インジウム酸化スズ)膜により形成されている。 2 and the counter electrode 64 is formed by any transparent ITO (indium tin oxide) film.

【0006】これらのTFT基板50及びCF基板60 [0006] These TFT substrate 50 and the CF substrate 60
を接合する際には、まず、CF基板60の内面の表示領域(画素電極がマトリクス状に配置された領域)を囲むように額縁状にシール材(紫外線硬化型樹脂)58を塗布する。 In joining, first, the display area of ​​the inner surface of the CF substrate 60 is coated with a sealing material (ultraviolet curable resin) 58 in a frame shape so as to surround the (pixel electrode regions arranged in a matrix). このとき、後工程で基板間に液晶を注入するための液晶注入口として、一部分樹脂を塗布しない部分を設けておく。 At this time, as the liquid crystal injection port for injecting the liquid crystal between the substrates in a later step, preferably provided a portion not coated with the partially resin.

【0007】次に、基板50,60間にスペーサ57を散布し、TFT基板50とCF基板60とを対向させてシール材58により接合する。 [0007] Next, the spacer 57 is sprayed between the substrates 50 and 60, the TFT substrate 50 and the CF substrate 60 are opposed to joining the sealing material 58. 次に、CF基板60上に表示領域を覆う遮光マスク67を配置し、CF基板60 Next, place the light shielding mask 67 covering the display region on the CF substrate 60, the CF substrate 60
側から紫外線を照射してシール材58を硬化させ、TF By irradiating ultraviolet rays from the side to cure the sealing material 58, TF
T基板50及びCF基板60が接合されてなる液晶パネル(空パネル)を形成する。 T substrate 50 and the CF substrate 60 to form a liquid crystal panel formed by bonding (empty panel). このとき、配向膜54,6 In this case, the orientation film 54,6
5は、遮光マスク67により紫外線に照射されることが防止される。 5, it is irradiated to the ultraviolet light is prevented by the light shielding mask 67.

【0008】次いで、遮光マスク67を取り外し、液晶パネルを真空チャンバ内に入れる。 [0008] Then, remove the light shielding mask 67, put the liquid crystal panel in a vacuum chamber. そして、チャンバ内を真空にして液晶注入口を液晶が入った容器中に浸漬した後、チャンバ内を大気圧に戻す。 Then, after immersing the liquid crystal inlet by the vacuum inside the chamber into a vessel containing liquid crystal, back in the chamber to atmospheric pressure. そうすると、圧力差により液晶がパネル内に充填される。 Then, liquid crystal is filled in the panel due to the pressure difference. その後、液晶注入口に封止材として紫外線硬化型樹脂を充填し、紫外線を照射して樹脂を硬化させる。 Thereafter, an ultraviolet curable resin was packed as a sealing material in the liquid crystal injection port, by irradiating ultraviolet rays to cure the resin. このようにして、液晶表示装置が形成される。 Thus, the liquid crystal display device is formed.

【0009】ところで、配向膜54,65や液晶に紫外線が照射されると、配向膜54,65や液晶が劣化し、 [0009] By the way, when ultraviolet rays are irradiated to the alignment film 54, 65 and a liquid crystal, an alignment film 54 and 65 and a liquid crystal is deteriorated,
焼き付きや表示むらが発生して表示性能が低下してしまう。 Display performance seizure or uneven display is generated is lowered. このため、上述の如く、CF基板60の外面側に遮光マスク67を設け、紫外線硬化樹脂を硬化させる際に配向膜54,65や液晶に紫外線が照射されることを防止している。 Therefore, as described above, so as to prevent the ultraviolet rays are irradiated on the alignment film 54, 65 and the liquid crystal in the provided light shielding mask 67 on the outer surface side of the CF substrate 60 to cure the ultraviolet curing resin.

【0010】なお、特開昭52−73757号には、金属酸化物の皮膜により、波長が450nm以下の可視光及び紫外線をカットする技術が提案されている。 [0010] Incidentally, in the JP-52-73757, a film of metal oxides, techniques wavelength is cut below the visible light and ultraviolet 450nm has been proposed. また、 Also,
特開平8−176549号には、紫外線吸収材を液晶中に添加し、液晶の劣化及び異性化を防止する技術が提案されており、特開平5−150223号には、紫外線硬化型樹脂に替えて可視光線硬化型樹脂を使用する技術が提案されている。 The JP-8-176549, was added a UV absorber in the liquid crystal has been proposed a technique for preventing deterioration and isomerization of the liquid crystal, Japanese Unexamined Patent Publication No. 5-150223, instead of the ultraviolet curable resin technology using visible light curable resin Te are proposed.

【0011】 [0011]

【発明が解決しようとする課題】しかしながら、上述した従来の技術では、図11に示すように、遮光マスク6 [SUMMARY OF THE INVENTION However, in the conventional technique described above, as shown in FIG. 11, the light blocking mask 6
7の縁部から回り込んだ紫外線により配向膜54,65 The alignment film 54, 65 by ultraviolet light wrapping around from 7 of the edge
や液晶が劣化してしまうという欠点がある。 And there is a disadvantage that a liquid crystal is deteriorated. 例えば、配向膜54,65の縁部の部分が紫外線に照射された場合であっても、配向膜54,65に液晶中の不純物が付着しやすくなって、長時間使用するとこれらの不純物が配向膜54,65の端部から画素電極側に拡散し、焼き付きや色むら等の原因になる。 For example, even when the part of the edge portion of the alignment film 54, 65 is irradiated on the ultraviolet, making it easier to adhere impurities in the liquid crystal alignment film 54, 65, these impurities orientation prolonged use diffused into the pixel electrode side from an end portion of the film 54, 65, cause such sticking or uneven color.

【0012】また、特開昭52−73757号に開示された技術では、金属酸化物の被膜を形成するときに高温(500〜600℃)を要し、本発明のように特定領域のみに被膜を形成する場合、そのエッチング工程はかなり煩雑なものになる。 Further, in the technique disclosed in JP-A-52-73757, it requires a high temperature (500 to 600 ° C.) when forming a film of metal oxides, coating only a specific area as in the present invention when forming a the etching process becomes quite complicated ones. 特開平8−176549号に開示された技術では、液晶に添加する紫外線吸収材により液晶の電気的特性が変化するという問題点がある。 The disclosed in JP-A-8-176549 technology, there is a problem that the electrical characteristics of the liquid crystal is changed by ultraviolet absorber to be added to the liquid crystal. また、 Also,
紫外線吸収材の添加により液晶の色づきや配向膜の劣化が発生するという問題点もある。 The addition of the UV absorber is a problem that deterioration of the liquid crystal of the coloring and the alignment film is produced.

【0013】特開平5−150223号に開示された技術では、一般的に可視光線硬化型樹脂の強度が紫外線硬化型樹脂に比べて劣ることから、用途が限定され、高強度が要求される部分に使用するシール材として適用することは難しい。 [0013] In JP-A 5-150223 Patent technique disclosed, part strength generally visible light curable resin from the inferior to the UV-curable resin, the applications are limited, high strength is required it is difficult to apply as a sealing material to be used for. 紫外線硬化樹脂をメインシール及び封止材に用いた液晶表示装置では、樹脂部に硬化に必要な紫外線を当て、且つ樹脂境界部の液晶劣化を最小限に食い止めるため、上記の紫外線カットフィルタや吸収材ではなく、樹脂硬化に必要な紫外線の特定波長域を透過し、 In the liquid crystal display device using the ultraviolet curing resin to the main seal and the sealing material is irradiated with ultraviolet rays necessary for curing the resin portion, and to halt the liquid crystal deterioration of the resin boundary to a minimum, the above-mentioned UV cut filter and the absorption rather than wood, and it transmits the specific wavelength range of ultraviolet required resin curing,
それ以外の波長をカットするバンドパスフィルタ機能が必要になる。 Band-pass filter function to cut the other wavelengths is required. また、プロセス的にも、パネル基板上の特定領域に容易に形成可能であることが条件になる。 Further, also process basis, it is a condition can be easily formed in a specific area of ​​the panel on the substrate.

【0014】 [0014]

【課題を解決するための手段】上記した課題は、一対の透明基板のいずれか一方の基板の表示領域の外側に紫外線をカットするバンドパスフィルタを形成する工程と、 Aforementioned problems SUMMARY OF THE INVENTION includes the steps of: forming a band-pass filter for cutting ultraviolet rays outside the display area of ​​one substrate of the pair of transparent substrates,
前記バンドパスフィルタを形成した面を内側にして、前記一対の透明基板を前記バンドパスフィルタの外縁に沿って塗布したシール材により接合する工程と、前記一方の基板の外側に前記表示領域を覆う遮光マスクを配置し、前記一方の基板側から紫外線を照射して前記シール材を硬化させる工程とを有することを特徴とする液晶表示装置の製造方法により解決する。 And a surface formed with the band-pass filter on the inside, cover and bonding the coated sealing material along said pair of transparent substrates at the outer edge of the band-pass filter, the display area on the outside of one substrate a light shielding mask was placed, solved by a method of manufacturing a liquid crystal display device characterized by a step of curing the sealing material by irradiating ultraviolet rays from the substrate side of the one.

【0015】この場合に、前記バンドパスフィルタは、 [0015] In this case, the band-pass filter,
青のカラーフィルタと同じ材料により形成することが好ましい。 It is preferably formed of the same material as a blue color filter. また、上記した課題は、一対の透明基板のいずれか一方の基板に、複数の画素電極と各画素電極間の領域を覆うブラックマトリクスとを形成する工程と、他方の基板の表示領域の外側に紫外線をカットするバンドパスフィルタを形成する工程と、前記画素電極及び前記バンドパスフィルタを形成した面を内側にして、前記一対の透明基板を前記バンドパスフィルタの外縁に沿って塗布したシール材により接合する工程と、前記他方の基板の外側に前記表示領域を覆う遮光マスクを配置し、前記他方の基板側から紫外線を照射して前記シール材を硬化させる工程とを有することを特徴とする液晶表示装置の製造方法により解決する。 Moreover, the problem described above, on one substrate of the pair of transparent substrates, a step of forming a black matrix covering the region between the plurality of pixel electrodes and the pixel electrodes, outside the display area of ​​the other substrate forming a band-pass filter for cutting ultraviolet rays, and the pixel electrode and the surface formed with the band-pass filter on the inside, a sealing material was applied along the pair of transparent substrates at the outer edge of the band-pass filter and bonding, the place the other light shielding mask covering the display area on the outside of the substrate, characterized by a step of curing the sealing material by irradiating ultraviolet rays from the other substrate side LCD It is solved by a method of manufacturing a display device.

【0016】以下、本発明の作用について説明する。 [0016] The following is a description of the operation of the present invention. 本発明においては、一方の透明基板の表示領域の外側にバンドパスフィルタを形成する。 In the present invention, to form a band-pass filter outside the display area of ​​the one transparent substrate. 従って、遮光マスクの縁部から紫外線が配向膜又は液晶側に回り込んだとしても、バンドパスフィルタにより有害な紫外線短波長はカットされ、配向膜及び液晶の光劣化は最小限に抑えられる。 Therefore, even if the wrapping around the ultraviolet light alignment film or the liquid crystal side from the edge of the light shielding mask, harmful UV short wavelength by the band-pass filter is cut, photodegradation of the alignment film and the liquid crystal is minimized.

【0017】カラー液晶表示装置の場合、バンドパスフィルタは、例えば青のカラーフィルタと同一の材料により同時に形成することができる。 [0017] When the color liquid crystal display device, a band-pass filter can be formed simultaneously by, for example, blue same material as the color filter. 通常使用されている青のカラーフィルタは、一般的な紫外線硬化型樹脂の反応波長域(約330〜380nm)の光を透過し、反応波長域よりも短い波長(250〜330nm)の光を殆ど透過しない。 Normal color filters and blue being used to transmit light of reactions wavelength range of typical UV-curable resin (about 330~380Nm), light of shorter wavelength than the reaction wave zone (250~330Nm) most It does not pass through. 従って、青のカラーフィルタは、本発明において使用するバンドパスフィルタとして、極めて好適である。 Therefore, the color filter of blue as a band-pass filter used in the present invention, is very suitable. また、バンドパスフィルタを、青のカラーフィルタと同一の材料により形成することにより、製造工程数の増加が回避される。 Further, the band-pass filter, by forming the same material as the color filter of blue, is avoided an increase in the number of manufacturing steps.

【0018】この場合に、通常、青のカラーフィルタは、色純度を確保するために1.0〜2.5μmの厚さに形成される。 [0018] In this case, typically, the color filter of blue is formed to a thickness of 1.0~2.5μm to ensure color purity. しかし、前記バンドパスフィルの厚さをカラーフィルタと同じにすると、バンドパスフィルタ下のシール材に十分な紫外線を照射することが困難になる。 However, when the thickness of the band-pass fill the same as the color filter, it is difficult to irradiate sufficient ultraviolet sealant under the bandpass filter. 従って、青のカラーフィルタと同一材料によりバンドパスフィルタを形成するときは、バンドパスフィルタの厚さをカラーフィルタの厚さよりも薄くすることが好ましい。 Therefore, when forming a band-pass filter is a color filter of the same material of blue, it is preferable thinner than the thickness of the color filter thickness of the band-pass filter.

【0019】また、一方の透明基板に画素電極及びTF Further, the pixel electrode and TF on one transparent substrate
Tとともにブラックマトリクスを形成し、他方の基板にカラーフィルタを形成するいわゆるBMオンTFT方式の液晶表示装置の場合、他方の透明基板のバンドパスフィルタをブラックマトリクスの縁部よりも内側に配置することが可能になる。 A black matrix formed with T, the liquid crystal display device of the so-called BM on TFT method of forming a color filter on the other substrate, placing inside the edge of the black matrix of the bandpass filter of the other transparent substrate It becomes possible. これにより、表示領域のサイズを変えることなく、基板サイズを縮小することが可能になる。 Thus, without changing the size of the display area, it is possible to reduce the substrate size. 更に、このとき、基板上に液晶を滴下した後、液晶を一対の基板で挟み込んで封入するいわゆる滴下注入法を用いることにより、製造に要する時間が著しく短縮される。 Further, at this time, after dropping a liquid crystal on a substrate, by using a so-called drop injection method of encapsulating sandwich the liquid crystal in a pair of substrates, the time required for manufacturing can be significantly reduced.

【0020】 [0020]

【発明の実施の形態】以下、本発明の実施の形態について、添付の図面を参照して説明する。 BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. (第1の実施の形態)図1(a)は本発明の第1の実施の形態の液晶表示装置の製造方法を示す断面図、図1 Cross-sectional view showing a manufacturing method of a liquid crystal display device of the first embodiment of the First Embodiment FIG. 1 (a) the present invention, FIG. 1
(b)は同じくその基板接合部の近傍を詳細に示す拡大図である。 (B) is a magnified view showing the vicinity of the substrate bonding unit in detail. 但し、図1(b)では、対向電極24及び配向膜13,25の図示を省略する。 However, in FIG. 1 (b), the not shown counter electrode 24 and an alignment film 13, 25.

【0021】TFT基板10は、従来と同様に形成する。 The TFT substrate 10 is formed similarly to the conventional. すなわち、ガラス基板11上にTFT(図示せず) That, TFT on a glass substrate 11 (not shown)
及び画素電極12を形成し、これらのTFT及び画素電極12上に配向膜13を形成する。 And forming a pixel electrode 12, an alignment film is formed 13 to these TFT and the pixel electrode 12. そして、配向膜13 Then, an orientation film 13
の表面をラビング処理する。 The surface rubbing of. 一方、CF基板20は以下のように形成する。 On the other hand, CF substrate 20 is formed as follows. すなわち、まず、ガラス基板21上に、画素電極12に対応する部分が開口されたブラックマトリクス22を形成する。 That is, first, on a glass substrate 21, to form a black matrix 22 which portions corresponding to the pixel electrode 12 is opened. また、ガラス基板21上の画素電極12に対応する位置に、R(赤)・G(緑)・ At a position corresponding to the pixel electrodes 12 on the glass substrate 21, R (red), G (green)
B(青)の各カラーフィルタ23を約1.0〜2.5μ B each color filter 23 (blue) about 1.0~2.5μ
mの厚さで形成するとともに、ブラックマトリクス22 While a thickness of m, the black matrix 22
の縁部からその外側の領域を覆うバンドパスフィルタ2 Bandpass filter 2 from the edge covering region outside
3aを形成する。 3a is formed. このバンドパスフィルタ23aは青のカラーフィルタと同じ材料により形成し、露光量を調整することにより約0.6μmの厚さに形成するその後、 Then the band pass filter 23a is formed of the same material as the color filter of blue, it is formed to a thickness of about 0.6μm by adjusting the exposure amount,
基板21上の全面にITOからなる対向電極24を形成し、更に対向電極24上に配向膜25を形成する。 Forming a counter electrode 24 made of ITO on the entire surface of the substrate 21 is further formed an alignment film 25 on the counter electrode 24. そして、配向膜25の表面をラビング処理する。 Then, rubbing the surface of the alignment film 25.

【0022】次に、CF基板20のバンドパスフィルタ23aの縁部に沿って額縁状にシール材(紫外線硬化型樹脂)18を約1mmの幅で塗布する。 Next, applying a band-pass frame-shaped sealing material along edges of the filter 23a width of about 1mm (the UV-curable resin) 18 of the CF substrate 20. このとき、後工程で液晶を注入するための液晶注入口として、一部にシール材18を塗布しない領域を設けておく。 At this time, as the liquid crystal injection port for injecting the liquid crystal in a later step, preferably provided a region not a sealing material 18 is applied to a part. そして、T Then, T
FT基板10とCF基板20との間に球形のスペーサ1 Spherical spacers between the FT substrate 10 and the CF substrate 20 1
7を散布し、両方の基板10,20を配向膜13,25 7 sparged with orientation both substrates 10 and 20 film 13, 25
が形成されている面を内側にして対向配置し、シール材18により接合する。 Face arranged to be a plane but are formed on the inner side, joined by a sealing member 18.

【0023】次に、CF基板20の外側に表示領域を覆う遮光マスク(遮光性の金属膜又はフィルム等)27を配置し、CF基板20側から紫外線を照射してシール材18を硬化させる。 Next, place the light-shielding mask (light shielding metal film or a film, etc.) 27 that outwardly covers the display area of ​​the CF substrate 20 to cure the sealing material 18 is irradiated with ultraviolet rays from the CF substrate 20 side. これにより、2枚の基板10,20 As a result, the two substrates 10 and 20
が接合されてなる液晶パネル(空パネル)が形成される。 There the liquid crystal panel (empty panel) is formed consisting joined. この場合に、遮光マスク27の端部から回り込んだ紫外線短波長はバンドパスフィルタ23aによりカットされ、配向膜13,25の光劣化は最小限に抑えられる。 In this case, UV short wavelength wrapping around from the end portion of the light shielding mask 27 is cut by the band-pass filter 23a, the light deterioration of the alignment film 13, 25 is minimized.

【0024】その後、液晶パネルを真空チャンバ内に入れ、チャンバ内を真空にした後、液晶注入口を液晶中に浸漬し、チャンバ内を大気圧に戻す。 [0024] Thereafter, to get the liquid crystal panel in a vacuum chamber, after the chamber is evacuated, by immersing the liquid crystal injection port in the liquid crystal to return the chamber to atmospheric pressure. そうすると、パネル内の圧力と大気圧との差により、パネル内に液晶が充填される。 Then, the difference between the pressure and the atmospheric pressure in the panel, liquid crystal is filled in the panel. 次いで、液晶注入口に封止材として紫外線硬化型樹脂を充填し、CF基板20の外側に遮光マスク2 Then, an ultraviolet curable resin was packed as a sealing material in the liquid crystal injection port, shielding on the outer side of the CF substrate 20 a mask 2
7を配置した後、紫外線を照射して封止材を硬化させる。 After placing the 7 to cure the sealing material by irradiating ultraviolet rays. このようにして、液晶表示装置が製造される。 Thus, the liquid crystal display device is manufactured.

【0025】図2は、横軸に波長をとり、縦軸に相対強度をとって、シール材の硬化に使用されている水銀ショートアークランプの輝線スペクトルを示す図である。 [0025] Figure 2 takes a wavelength on the horizontal axis, and the vertical axis represents the relative intensity, which is a diagram illustrating a bright line spectrum of a mercury short arc lamp used to cure the sealant. 紫外線硬化型樹脂は、主に波長が330〜380nmの光により硬化し、液晶や配向膜の劣化は主にそれよりも短い波長(図中Aで示す波長域)の光により発生する。 UV-curable resin is mainly wavelength is cured by light 330~380Nm, deterioration of the liquid crystal and the alignment film is mainly caused by light having a wavelength shorter than that (wavelength region shown in figure A). 図3及び図4は、横軸に波長をとり、縦軸に透過率をとって、ガラス(無アルカリガラス)基板の光透過率特性を示す図である。 3 and 4, taking the wavelength on the horizontal axis, the vertical axis represents the transmittance is a diagram showing the light transmittance characteristics of the glass (non-alkali glass) substrate. なお、図3はガラス基板のみの光透過率特性を示し、図4は表面にITO膜を有するガラス基板の光透過率特性を示す。 Incidentally, FIG. 3 shows the light transmittance properties of the glass substrate only, Figure 4 shows the light transmission characteristics of the glass substrate having an ITO film on the surface. 図3に示すようにITO膜がないガラス基板では波長が約250nmよりも長い光を透過するのに対し、図4に示すようにITO膜を有するガラス基板では波長が約280nmよりも長い波長の光を透過する。 Whereas wavelengths in the glass substrate there is no ITO film as shown in FIG. 3 is transmitted through the light longer than about 250 nm, the wavelength of wavelengths longer than about 280nm in a glass substrate having an ITO film as shown in FIG. 4 transmitted through the light. すなわち、ITO膜を有するガラス基板では、波長が280nm以下の光はほぼ100%カットされる。 That is, in the glass substrate having an ITO film, a wavelength light below 280nm is almost 100% reduction.

【0026】図5は、横軸に波長をとり、縦軸に光の透過率をとって、青のカラーフィルタの透過率特性を示す図である。 [0026] Figure 5 takes the wavelength on the horizontal axis, taking the vertical axis the transmittance of light is a diagram showing the transmittance characteristic of the blue color filter. 但し、このカラーフィルタは、顔料分散法により形成したものであり、フィルタの厚さは約1.3μ However, the color filter is obtained by forming a pigment dispersion method, the thickness of the filter is from about 1.3μ
mである。 A m. この図に示すように、青のカラーフィルタは、波長が約320〜590nmの光を透過し、波長が約460nmの光を最もよく透過する。 As shown in this figure, the color filter of blue wavelength and transmits light of about 320~590Nm, wavelength is best transmits approximately 460nm light. このカラーフィルタをバンドパスフィルタとして使用した場合、紫外線硬化樹脂の硬化に有効な波長が330〜380nmの光は比較的多く(図中斜線で示す)透過し、液晶及び配向膜の劣化の原因となる波長が330nm以下の光はほぼ遮断される。 Using this color filter as a band-pass filter, the optical effective wavelength of 330~380nm the curing of the ultraviolet curing resin is relatively large (shown in FIG hatched) transmitted, and causes of deterioration of the liquid crystal and the alignment film wavelengths of the following optical 330nm is substantially blocked. この図から、青のカラーフィルタと同一材料により形成したバンドパスフィルタは、シール材の硬化に必要な波長の光を比較的よく透過し、液晶及び配向膜の劣化の原因となる紫外線短波長を効率よく遮断することが明らかである。 From this figure, a band-pass filter formed by the color filters of the same material of the blue light of a wavelength required for curing of the sealing material relatively well permeable, ultraviolet short-wavelength that causes degradation of the liquid crystal and the alignment film it is apparent that efficiently blocked.

【0027】本実施の形態では、紫外線照射時に遮光マスクの端部から紫外線が回り込んだとしても、バンドパスフィルタ23aにより液晶及び配向膜に有害な紫外線短波長が照射されることが抑制される。 [0027] In this embodiment, even if the wrapping around ultraviolet from the end of the light shielding mask during UV irradiation is prevented from harmful UV short wavelength in the liquid crystal and the alignment film is irradiated by the band-pass filter 23a . これにより、液晶及び配向膜の光劣化は最小限に抑えられ、表示品質の劣化は回避される。 Thus, the light deterioration of the liquid crystal and the alignment film is minimized, the degradation in display quality can be avoided. また、本実施の形態では、バンドパスフィルタ23aは、青のカラーフィルタと同一材料により同時に形成するので、工程数の増加が抑制される。 Further, in the present embodiment, the band pass filter 23a, since simultaneously formed by the color filter of the same material of blue, increase in the number of steps can be suppressed.

【0028】以下、バンドパスフィルタの厚さの最適値について調べた結果について説明する。 [0028] The following describes the results of examining the optimal value of the thickness of the band-pass filter. 第1の実施の形態においては、バンドパスフィルタは、青のカラーフィルタと同一材料により同時に形成する。 In the first embodiment, the bandpass filter is simultaneously formed by the color filter of the same material and blue. そこで、カラーフィルタに使用するレジストの膜厚と紫外線の遮蔽特性との関係について調べた。 Therefore, we investigated the relationship between the shielding characteristics of the film thickness and UV resist used in the color filter. なお、通常、カラーフィルタは、色純度を確保するために、1.0〜2.5μmの厚さに形成される。 Normally, the color filter, in order to ensure color purity, is formed to a thickness of 1.0 to 2.5 [mu] m.

【0029】まず、ネガ型アクリル樹脂の感光性レジスト(CB−2000:富士ハント社製)に青の顔料を分散させ、このレジストをローラコータによりガラス基板上に塗布した。 Firstly, the photosensitive negative resist acrylic resin (CB-2000: Fuji Hunt Co., Ltd.) to disperse the pigment and blue were coated with the resist on the glass substrate by roller coater. そして、ガラス基板をホットプレート上で110℃の温度で90秒間加熱し予備硬化させた後、 Then, after pre-cured by heating for 90 seconds at a temperature of 110 ° C. The glass substrate on a hot plate,
露光及び現像処理を施した。 Exposure and was subjected to a developing process. その後、230℃の温度で10分間加熱することによりレジストを本硬化させて、 Thereafter, the resist is cured to by heating at a temperature of 230 ° C. 10 min,
青のバンドパスフィルタを得た。 To give a blue band-pass filter.

【0030】この場合、紫外線露光量を調整して、種々の膜厚のバンドパスフィルタを形成した。 [0030] In this case, by adjusting the UV exposure, to form a band-pass filter of various thickness. 図6は横軸に紫外線露光量をとり、縦軸にバンドパスフィルタの膜厚をとって、両者の関係を示す図である。 Figure 6 takes the ultraviolet exposure amount on the horizontal axis and the vertical axis represents the film thickness of the band-pass filter is a diagram showing a relationship between them. この図6に示すように、紫外線露光量を調整することにより、所望の膜厚のバンドパスフィルタを形成することができる。 As shown in FIG. 6, by adjusting the ultraviolet exposure, it is possible to form a band-pass filter having a desired thickness. 次に、分光器(キャノン製LC−SP)を使用し、膜厚が0.3μm、0.6μm及び1.3μmのバンドパスフィルタの分光特性を調べた。 Next, using a spectroscope (manufactured by Canon Inc. LC-SP), the film thickness was investigated 0.3 [mu] m, the spectral characteristics of the bandpass filter of 0.6μm and 1.3 .mu.m. 図7は、横軸に波長をとり、縦軸に光の透過率をとって、バンドパスフィルタの膜厚と透過率との関係を示す図である。 Figure 7 takes the wavelength on the horizontal axis, taking the vertical axis the transmittance of light is a diagram showing the relationship between the film thickness and the transmittance of the band-pass filter. この図7に示すように、バンドパスフィルタの膜厚を薄くすると光の透過率は上昇するが、過度に薄くすると液晶や配向膜の劣化の原因となる波長の光も透過して、バンドパスフィルタとしての性能が低下する。 As shown in FIG. 7, but when reducing the thickness of the band-pass filter transmittance of light increases, the excessive thinner light of a wavelength that causes degradation of the liquid crystal and the orientation film by transmitting a band-pass the performance of the filter is reduced. 一方、バンドパスフィルタの厚さを厚くすると、シール材の硬化に有効な波長の光も遮断されて、バンドパスフィルタの下のシール材を十分に硬化させることができなくなる。 On the other hand, when the thickness of the band-pass filter, light of a wavelength effective to cure the sealing material be cut off, it becomes impossible to sufficiently cure the sealing material under the bandpass filter. 第1の実施の形態では、紫外線硬化樹脂の硬化に寄与する波長が約330 In the first embodiment, the wavelength that contributes to curing of the ultraviolet curing resin of about 330
〜380nmの光をできるだけ透過し、且つ液晶及び配向膜に対し有害な短波長成分をカットできるバンドパスフィルタとして、約0.6μmの厚さのカラーフィルタが好適である。 Passes as possible light ~380Nm, and a liquid crystal and a band pass filter that can keep unwanted short-wavelength component with respect to the alignment film, it is preferable thickness color filter of about 0.6 .mu.m. しかし、この図5に示すように、膜厚が0.3〜1.3μmのカラーフィルタでもバンドパスフィルタとして使用することができる。 However, as shown in FIG. 5, it is possible thickness used as a band-pass filter in the color filter of 0.3~1.3Myuemu.

【0031】次に、上記のようにして形成したバンドパスフィルタに対するシール材(紫外線硬化樹脂)の接合強度について調べた結果について説明する。 A description will now be given the results of examining the bond strength of the sealing material (ultraviolet curable resin) for the band-pass filter formed as described above. まず、15 First of all, 15
×50mmの2枚のガラス基板の中央に紫外線硬化型樹脂を直径が3mmの点状に塗布し、直径が約5μmの球形スペーサ(SP−205:積水ファインケミカル製) × diameter UV-curable resin in the middle of the two glass substrates of 50mm is applied to 3mm punctate, diameter of about 5μm spherical spacers (SP-205: manufactured by Sekisui Fine Chemical)
散布して、これらの基板を貼合わせた。 Spraying to, it was laminated these substrates. これと同様に、 In the same way,
2枚のガラス基板にカラーフィルタ用レジストの膜を形成し、このレジスト膜上に紫外線硬化型樹脂を塗布し、 Forming a two layer glass substrate in a resist for a color filter, an ultraviolet curable resin was applied on the resist film,
基板間にスペーサを散布して2枚の基板を貼合わせた。 If it is sprayed with spacers was laminated to two substrates between the substrates.
更に、ガラス基板にカラーフィルタ用レジストの膜をストライプ状に形成し、紫外線硬化樹脂を半分がガラス基板に接触し、残りがレジスト膜に接触するように塗布して、基板間にスペーサを散布した後、貼合わせた。 Furthermore, the film of the resist for a color filter on a glass substrate formed in a stripe shape, half an ultraviolet curable resin is in contact with the glass substrate, by applying to the remaining contacts the resist film was sprayed spacers between the substrates after, it was laminated.

【0032】そして、これらの基板に対し、3000m [0032] and, with respect to these substrates, 3000m
J/cm 2の光量で紫外線を照射して樹脂を硬化させた。 By ultraviolet irradiation at a light intensity of J / cm 2 to cure the resin. その後、剥離試験機を使用して剥離強度を測定した。 Then, the peel strength was measured using a peel tester. その結果、ガラス基板に直接紫外線硬化型樹脂を塗布した場合の剥離強度は1.5kgf/cm 2であった。 As a result, the peel strength when applied directly ultraviolet curing resin on the glass substrate was 1.5 kgf / cm 2. また、レジスト膜上に紫外線硬化型樹脂を塗布した場合の剥離強度は0.7kgf/cm 2であった。 Also, the peel strength in the case of an ultraviolet curable resin was applied on the resist film was 0.7 kgf / cm 2. さらに、半分がガラス基板に接触し、残りがレジスト膜に接触するように紫外線硬化型樹脂を塗布した場合の剥離強度は1.2kgf/cm 2であった。 Furthermore, half in contact with the glass substrate, the peel strength when the remaining is an ultraviolet curable resin so as to be in contact with the resist film was coated was 1.2 kgf / cm 2.

【0033】図8は、横軸にシール材とカラーフィルタ用レジスト膜との重ね合わせの割合をとり、縦軸に剥離強度をとって、両者の関係を示す図である。 [0033] Figure 8, takes the ratio of the superposition of the sealing material and the resist film for color filter on the horizontal axis and the vertical axis the peel strength is a diagram showing a relationship between them. 通常、液晶表示装置では、パネル強度や耐湿性の点から、剥離強度は1.0kgf/cm 2以上必要であるとされている。 Normally, in the liquid crystal display device, in terms of the panel strength and moisture resistance, peel strength is to be required 1.0 kgf / cm 2 or more.
この図8から、シール材がガラス基板に直接接触している部分が30%以上であれば、剥離強度は1.0kgf From FIG 8, if parts 30% or more of the sealing member is in direct contact with the glass substrate, the peeling strength 1.0kgf
/cm 2以上になり、十分な剥離強度を確保することができることがわかる。 / Cm is 2 or more, it is understood that it is possible to secure a sufficient peel strength.

【0034】(第2の実施の形態)図9(a)は本発明の第2の実施の形態の液晶表示装置を示す断面図、図9 [0034] (Second Embodiment) FIG. 9 (a) cross-sectional view showing a liquid crystal display device of the second embodiment of the present invention, FIG. 9
(b)は同じくその基板接合部の近傍を詳細に示す拡大図である。 (B) is a magnified view showing the vicinity of the substrate bonding unit in detail. 本実施の形態は、TFT基板側にブラックマトリクスを形成するいわゆるBMオンTFT方式の液晶表示装置に本発明を適用したものである。 This embodiment is an application of the present invention to a liquid crystal display device of the so-called BM on TFT method of forming a black matrix on the TFT substrate side. なお、図9 It should be noted that, as shown in FIG. 9
(a)では、対向電極44及び配向膜34,45の図示を省略している。 (A), the are not shown counter electrode 44 and an alignment film 34, 45.

【0035】TFT基板30は、以下のように形成する。 The TFT substrate 30 is formed as follows. すなわち、まず、ガラス基板31上に、ブラックマトリクス32を所定のパターンで形成する。 That is, first, on a glass substrate 31, to form a black matrix 32 in a predetermined pattern. その後、各画素領域にそれぞれ画素電極33とTFT(図示せず) Thereafter, the respective pixel electrodes 33 in each pixel region TFT (not shown)
とを形成する。 To form the door. そして、基板31上に、これらの画素電極33及びTFTを覆う配向膜34を形成した後、配向膜34の表面をラビング処理する。 Then, on the substrate 31, after forming an orientation film 34 for covering these pixel electrodes 33 and TFT, rubbing the surface of the alignment film 34.

【0036】一方、CF基板40は以下のように形成する。 On the other hand, CF substrate 40 is formed as follows. すなわち、ガラス基板41の上に、各画素領域毎に、R(赤)・G(緑)・B(青)のいずれか一色のカラーフィルタ43を形成する。 That is, on the glass substrate 41, for each pixel region to form a color filter 43 of any color of R (red) · G (green) · B (blue). このとき、青のカラーフィルタと同一の材料により、表示領域の縁部に沿って額縁状にバンドパスフィルタ43aを形成する。 In this case, the same material and blue color filters, to form a band-pass filter 43a in a frame shape along the edge of the display area. 次に、基板41の表示領域上を覆う対向電極44を形成し、この対向電極44上に配向膜45を形成する。 Next, a counter electrode 44 covering the display area of ​​the substrate 41, to form an alignment film 45 on the counter electrode 44. その後、配向膜45の表面をラビング処理する。 Thereafter, rubbing the surface of the alignment film 45.

【0037】なお、画素電極33及び対向電極44はいずれもITOにより形成し、カラーフィルタ43は約1.0〜2.5μm、バンドパスフィルタ43aは約0.6μmの厚さに形成する。 [0037] Incidentally, both the pixel electrode 33 and the counter electrode 44 is formed by ITO, the color filter 43 is about 1.0 to 2.5 [mu] m, the band-pass filter 43a to a thickness of approximately 0.6 .mu.m. 次に、CF基板40のバンドパスフィルタ43aの縁部に沿って額縁状にシール材(紫外線硬化型樹脂)を塗布し、TFT基板30とC Next, the sealing material (ultraviolet curable resin) is applied in a frame shape along the edge of the band-pass filter 43a of the CF substrate 40, TFT substrate 30 and the C
F基板40との間にスペーサ37を散布するとともに、 With spraying spacers 37 between the F substrate 40,
液晶を滴下し、両方の基板30,40を配向膜34,4 Liquid crystal is dropped, orientation both substrates 30 and 40 film 34,4
5が形成されている面を内側にして対向配置し、シール材18により接合する。 A face 5 is formed in the inner faces disposed, it is joined with a sealing material 18.

【0038】その後、CF基板40上に表示領域を覆う遮光マスク47を配置し、CF基板40側から紫外線を照射してシール材38を硬化させる。 [0038] After that, place the light shielding mask 47 covering the display region on the CF substrate 40 to cure the sealing material 38 is irradiated with ultraviolet rays from the CF substrate 40 side. このようにして液晶表示装置が形成される。 In this way, the liquid crystal display device is formed. 本実施の形態においては、ブラックマトリクス32がTFT基板30側に形成されており、バンドパスフィルタ43aはブラックマトリクス32の縁部よりも内側に配置することができるので、狭額縁化が達成でき、第1の実施の形態に比べ基板の寸法を削減できる。 In the present embodiment, the black matrix 32 is formed on the TFT substrate 30 side, since the band-pass filter 43a can be arranged inside the edge of the black matrix 32, frame narrowing can be achieved, It reduces the size of the substrate than in the first embodiment. また、TFT基板30とCF基板40とを接合するときに両者の間に液晶を滴下し、TFT基板30とCF基板40との接合と同時に基板間に液晶を封入するので、第1の実施の形態に比べて製造に要する時間が著しく短縮される。 Further, liquid crystal is dropped therebetween when joining the TFT substrate 30 and the CF substrate 40, since the liquid crystal is sealed between the substrate simultaneously with the bonding of the TFT substrate 30 and the CF substrate 40, the first embodiment the time required for manufacture as compared to the embodiment is significantly reduced.

【0039】以下、第2の実施の形態の液晶表示装置を実際に形成し、表示部のセル厚のばらつき、イオン密度及び残留DC電圧を測定した結果について説明する。 [0039] Hereinafter, a liquid crystal display device of the second embodiment is actually formed, the variation of the cell thickness of the display unit, the results of measurement of ion density and residual DC voltage will be described. 液晶表示装置の劣化は、イオン密度及び残留DC電圧に関係し、イオン密度又は残留DC電圧が高いほど劣化しやすいということが知られている。 Deterioration of the liquid crystal display device is related to the ion density and residual DC voltage, it is known that easily degrade higher ion density or residual DC voltage. 実施例のパネルとして、上記の方法によりBMオンTFT方式の液晶表示装置を形成した。 As panels of Examples, to form a liquid crystal display device of the BM on TFT type by the method described above. パネル内に充填した液晶には、標準液晶ZLI−4792(メルク社製)を用いた。 The liquid crystal filled in the panel, using standard liquid crystal ZLI-4792 (manufactured by Merck). なお、シールに混入させるファイバスペーサの径は青のカラーフィルタ膜厚分だけ小さくした。 The diameter of the fiber spacers to be mixed in the seal is reduced by the color filter the film thickness of the blue. また、ブラックマトリクスの外縁部(額縁部)の幅は4.5mm、バンドパスフィルタ43aの幅は3mm、バンドパスフィルタ43aの外縁からブラックマトリクス32の外縁までの距離は0.5mmである。 The width of the outer edge portion of the black matrix (frame portion) is 4.5 mm, the distance of the width of the band-pass filter 43a is 3 mm, from the outer edge of the band-pass filter 43a to the outer edge of the black matrix 32 is 0.5 mm.

【0040】また、従来例として、バンドパスフィルタを有しないこと以外は実施例と同様の液晶表示装置を形成した。 Further, as a conventional example, except that no it has a band pass filter to form a liquid crystal display device similar to the embodiment. そして、これらの実施例及び従来例の液晶表示装置について、セル厚のばらつき、イオン密度及び残留DC電圧を調べた。 Then, a liquid crystal display device of these embodiments and the conventional example, variations in cell thickness, was investigated ion density and residual DC voltage. その結果を、下記表1に示す。 The results are shown in Table 1 below. 但し、セル厚のばらつきは、シール端部から3.5mmの位置(表示部端)におけるセル厚と、表示領域の中央の厚さを測定し、その差を求めることによって評価した。 However, variations in cell thickness, and the cell thickness at a position of 3.5mm from the seal end portion (display portion end), the thickness of the center of the display area was measured and evaluated by determining the difference.
また、イオン密度は、温度が50℃の条件で電極間に波高値が10V、周波数が0.05Hzの三角波電圧を印加して測定した。 The ion density, temperature peak value between the electrodes under the conditions of 50 ° C. 10V, frequency is measured by applying a triangular wave voltage of 0.05 Hz. 更に残留DC電圧は、温度が50℃の条件で、波高値が2.0V、周波数が30Hz、オフセット電圧が4Vの矩形波電圧を電極間に約10分間印加した後、測定した。 Further residual DC voltage, under the condition of temperature of 50 ° C., the peak value is 2.0 V, frequency 30 Hz, after the offset voltage has been applied for about 10 minutes between the electrodes a rectangular wave voltage of 4V, were measured.

【0041】 [0041]

【表1】 [Table 1]

【0042】この表1に示すように、実施例及び従来例の液晶表示装置は、いずれもセル厚のばらつきは±0. [0042] As shown in Table 1, the liquid crystal display device of Example and Conventional Example are all variations of the cell thickness ± 0.
1μmの範囲であり、実施例と従来例との間で差異は認められなかった。 In the range of 1 [mu] m, the difference between the embodiment and the conventional example was not observed. また、実施例の液晶表示パネルは、イオン密度が従来例の1/6〜1/7、残留DC電圧が従来例の約1/3と低い値を示した。 The liquid crystal display panel of the embodiment, the ion density conventional example 1 / 6-1 / 7, the residual DC voltage showed a low value of about 1/3 of the conventional example. このことから、実施例の液晶表示装置は、従来例に比べて、紫外線による液晶及び配向膜の劣化が発生しにくいことが明らかである。 Therefore, the liquid crystal display device of Example, as compared with the conventional example, deterioration of the liquid crystal and the alignment film due to ultraviolet rays is evident that hardly occurs.

【0043】 [0043]

【発明の効果】以上説明したように、本発明によれば、 As described in the foregoing, according to the present invention,
一方の透明基板の表示領域の外側にバンドパスフィルタを設け、このバンドパスフィルタを形成した面を内側にして一対の基板をシール材で接合し、前記一方の基板の外側に遮光マスク配置して紫外線を照射することによりシール材を硬化させるので、遮光マスクの端部から回り込んだ紫外線短波長がバンドパスフィルタによりカットされ、配向膜及び液晶の光劣化を最小限に抑えることができ、焼き付きや表示むらのない液晶表示装置を製造できる。 The band-pass filter outside the display area of ​​the one transparent substrate is provided, the band-pass filter and the formed surface in the inner joining a pair of substrates with a sealing material, and light-shielding mask disposed outside of said one substrate because curing the sealing material by irradiation of ultraviolet rays, ultraviolet short-wavelength wrapping around from the end portion of the shading mask is cut by the band-pass filter, it is possible to minimize the alignment film and the liquid crystal light deterioration, seizure It can be produced and there is no display unevenness liquid crystal display device.

【0044】また、青のカラーフィルタと同一材料で前記バンドパスフィルタを形成することにより、工程数の増加を回避できる。 [0044] Further, by forming the band-pass filter of the same material and blue color filters, it can avoid an increase in the number of steps. 更に、本発明をBMオンTFT方式の液晶表示装置に適用することにより、表示領域の外側の寸法を縮小することができるという。 Further, by applying the present invention to a liquid crystal display device of the BM on TFT type, that it is possible to reduce the outer dimensions of the display area. 更にまた、滴下注入法により基板間に液晶を封入することにより、製造に要する時間が著しく短縮される。 Furthermore, by sealing a liquid crystal between the substrates by a one drop filling method, the time required for manufacturing can be significantly reduced.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】(a)は本発明の第1の実施の形態の液晶表示装置の製造方法を示す断面図、(b)は同じくその基板接合部の近傍を詳細に示す拡大図である。 1 (a) is a cross-sectional view, (b) is also enlarged view showing the vicinity of the substrate bonding unit in detail showing the manufacturing method of the liquid crystal display device of the first embodiment of the present invention.

【図2】水銀ショートアークランプの輝線スペクトルを示す図である。 FIG. 2 is a diagram showing a bright-line spectrum of mercury short arc lamp.

【図3】ガラス基板のみの光透過率特性を示す図である。 3 is a diagram showing the light transmittance characteristics of the glass substrate only.

【図4】ITO膜を有するガラス基板の光透過率特性を示す図である。 4 is a diagram showing the light transmittance characteristics of the glass substrate having an ITO film.

【図5】青のカラーフィルタの透過率特性を示す図である。 5 is a diagram showing the transmittance characteristic of the blue color filter.

【図6】紫外線露光量とバンドパスフィルタの膜厚との関係を示す図である。 6 is a diagram showing the relationship between the thickness of the ultraviolet exposure amount and a band-pass filter.

【図7】バンドパスフィルタの膜厚と透過率との関係を示す図である。 7 is a diagram showing the relationship between the thickness of the band-pass filter and the transmittance.

【図8】シール材及びフィルタの重ね合わせの割合と剥離強度との関係を示す図である。 8 is a diagram showing the relationship between the ratio and the peel strength of the sealing material and the superposition of the filter.

【図9】(a)は本発明の第2の実施の形態の液晶表示装置を示す断面図、(b)は同じくその基板接合部の近傍を詳細に示す拡大図である。 9 (a) is a cross-sectional view, (b) is also enlarged view showing the vicinity of the substrate junction detail showing a liquid crystal display device of the second embodiment of the present invention.

【図10】(a)は従来の液晶表示装置の製造方法を示す断面図、(b)は同じくその基板接合部の近傍を詳細に示す拡大図である。 [10] (a) is a sectional view showing the manufacturing method of the conventional liquid crystal display device is an enlarged view showing in detail the vicinity of (b) is also the substrate junction.

【図11】従来の問題点を示す図である。 11 is a diagram illustrating a conventional problem.

【符号の説明】 DESCRIPTION OF SYMBOLS

10,30,50 TFT基板 11,21,31,42,51,61 ガラス基板 12,33,52 画素電極 13,25,34,45,54,65 配向膜 17,37,57 スペーサ 18,38,58 シール材 20,40,60 CF基板 22,32,62 ブラックマトリクス 23,43,63 カラーフィルタ 24,44,64 対向電極 27,47,67 遮光マスク 23a,43a バンドパスフィルタ 10, 30, 50 TFT substrate 11,21,31,42,51,61 glass substrate 12,33,52 pixel electrode 13,25,34,45,54,65 alignment film 17,37,57 spacer 18, 38, 58 sealing material 20, 40, 60 CF substrate 22,32,62 black matrix 23,43,63 color filters 24,44,64 counter electrode 27,47,67 shielding mask 23a, 43a bandpass filter

Claims (5)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 一対の透明基板のいずれか一方の基板の表示領域の外側に紫外線をカットするバンドパスフィルタを形成する工程と、 前記バンドパスフィルタを形成した面を内側にして、前記一対の透明基板を前記バンドパスフィルタの外縁に沿って塗布したシール材により接合する工程と、 前記一方の基板の外側に前記表示領域を覆う遮光マスクを配置し、前記一方の基板側から紫外線を照射して前記シール材を硬化させる工程とを有することを特徴とする液晶表示装置の製造方法。 [1 claim: a step of forming a band-pass filter for cutting ultraviolet rays outside the display area of ​​one substrate of the pair of transparent substrates, and the surface formed with the band-pass filter on the inside, of the pair and bonding the transparent substrate was coated along the outer edge of the band-pass filter sealing material, said placing a light shielding mask covering the display area on the outside of the substrate hand, ultraviolet rays are irradiated from the substrate side of the one method of manufacturing a liquid crystal display device characterized by a step of curing the sealant Te.
  2. 【請求項2】 前記一方の基板の前記表示領域に青のカラーフィルタを形成する工程を有し、 前記バンドパスフィルタは、前記青のカラーフィルタと同一の材料により形成することを特徴とする請求項1に記載の液晶表示装置の製造方法。 2. A comprising the step of forming a blue color filter in the display area of ​​the one substrate, said band-pass filter, claims and forming the same material as the color filter of the blue the method according to claim 1.
  3. 【請求項3】 前記バンドパスフィルタは、前記青のカラーフィルタよりも薄く形成することを特徴とする請求項2に記載の液晶表示装置の製造方法。 Wherein said band-pass filter, The method according to claim 2, characterized in that formed thinner than the color filter of the blue.
  4. 【請求項4】 一対の透明基板のいずれか一方の基板に、複数の画素電極と各画素電極間の領域を覆うブラックマトリクスとを形成する工程と、 他方の基板の表示領域の外側に紫外線をカットするバンドパスフィルタを形成する工程と、 前記画素電極及び前記バンドパスフィルタを形成した面を内側にして、前記一対の透明基板を前記バンドパスフィルタの外縁に沿って塗布したシール材により接合する工程と、 前記他方の基板の外側に前記表示領域を覆う遮光マスクを配置し、前記他方の基板側から紫外線を照射して前記シール材を硬化させる工程とを有することを特徴とする液晶表示装置の製造方法。 4. A one substrate of the pair of transparent substrates, a step of forming a black matrix covering the region between the plurality of pixel electrodes and the pixel electrodes, a UV outside the display area of ​​the other substrate forming a band-pass filter for cutting, and the pixel electrode and the surface formed with the band-pass filter on the inside, joined by a sealing material coated along the pair of transparent substrates at the outer edge of the band-pass filter a step, a light shielding mask covering the display area on the outside of the other substrate are arranged, a liquid crystal display device characterized by having a step of curing the sealing material by irradiating ultraviolet rays from the other substrate side the method of production.
  5. 【請求項5】 前記一対の透明基板をシール材で接合する工程において、滴下注入法により前記一対の基板間に液晶を封入することを特徴とする請求項4に記載の液晶表示装置の製造方法。 5. A step of bonding the pair of transparent substrates with a sealing material, a method of manufacturing a liquid crystal display device according to claim 4, characterized in that the liquid crystal is sealed between the pair of substrates by a dropping injection method .
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