JP2008170587A - Method for manufacturing color filter for transflective liquid crystal display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter for a transflective liquid crystal display device by which colored pixels of respective colors are formed by one photomask even if areas of openings are different by colored pixels of two or more colors. <P>SOLUTION: (1) The photomask PM-B for forming the colored pixel 13B having the opening 17B of the maximum area is used as the photomask for forming the colored pixels of two or more colors. (2) (A) The exposure is performed through the photomask to form the colored pixel having the opening of the maximum area. (B) When the colored pixel 13R other than the colored pixel having the opening of the maximum area is formed, the first exposure is performed through the photomask, the photomask is moved by ΔY1 so that the opening has the area other than the maximum area and the second exposure is performed through the photomask to form the colored pixel other than the colored pixel having the opening of the maximum area. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to the production of a color filter for a transflective liquid crystal display device. In particular, even if the area of the opening is different for each color pixel of a plurality of colors, one photomask can be used for each color. The present invention relates to a method of manufacturing a color filter for a transflective liquid crystal display device capable of forming colored pixels.

Since the liquid crystal display device is not a self-luminous display device, the display needs light from the other, for example, a backlight is provided behind the display, and the display is performed by the light from the back. Such a liquid crystal display device is called a transmissive liquid crystal display device, and is mainly used in a dark environment such as indoors.
Further, for example, there is a liquid crystal display device in which a light reflection layer is provided behind the liquid crystal display device, and display is performed by external light from the surroundings when viewing the liquid crystal display device. Such a liquid crystal display device is called a reflection type liquid crystal display device, and is mainly used in a bright environment such as outdoors.

  A liquid crystal display device called a transflective liquid crystal display device is a liquid crystal display device that has both a transmissive type and a reflective type function in one liquid crystal display device. This transflective liquid crystal display device can be used in a very bright environment such as outdoors or in a dark environment such as indoors, and is used in mobile devices.

  FIG. 9 shows an example of a color filter used in a transflective liquid crystal display device, and is a plan view showing an enlarged portion corresponding to one pixel. FIG. 10 is an explanatory cross-sectional view showing a pixel portion of a transflective liquid crystal display device using the color filter shown in FIG. The cross section taken along line X-X ′ in FIG. 9 corresponds to the cross section of the color filter (30) shown in FIG.

As shown in FIGS. 9 and 10, this transflective liquid crystal display device includes a color filter (30), a transparent electrode (14) formed on the color filter, a liquid crystal (50), a TFT element (not shown). ) And the like, and a transparent electrode (41) and a reflective electrode (42) formed on the TFT substrate.
The color filter (30) has a black matrix (12) and colored pixels (13) formed on a glass substrate (11). The transparent electrode (41) and the reflective electrode (42) are connected to the drain electrode of the TFT element.

Except for the black matrix (12), one pixel region (Px) is composed of a light transmission region (Tr) and a light reflection region (Re).
The light transmissive region (Tr) is a region that functions as a transmissive liquid crystal display device, and the light reflective region (Re) is a region that functions as a reflective liquid crystal display device.

The colored layer (15) in one pixel region (Px) and the colored layer (16) having a through hole (opening) are colored layers of the same thickness provided using the same colored layer forming material. . In FIG. 10, for the sake of explanation, the left and right oblique lines are used. Further, in FIG. 10, the upper part of both ends of the reflective electrode (42) is the boundary between the colored layer (15) and the colored layer (16) having a through hole (opening) (17), and is indicated by a chain line. .
In the light transmission region (Tr) of the colored pixel (13), a uniform colored layer (15) having a thickness D1 is formed in the entire region, and external light enters and reflects in the light reflection region (Re). A colored layer (16) having through holes (openings) (17) to be formed is formed.

That is, in a region (Px) of one pixel, a colored layer (16) having a uniform colored layer (15) in the light transmitting region (Tr) and a through hole (opening) (17) in the light reflecting region (Re) (16). ) Constitutes a colored pixel (13). The color density thickness of the colored layer (16) having the through hole (opening) (17) is represented by the average thickness (D2).
Further, when the through hole (opening) (17) of the colored layer (16) is in a state where nothing is provided and the colored layer is missing, the flatness of the surface of the color filter is deteriorated. As a result, the alignment of the liquid crystal is disturbed, which adversely affects the display quality. Therefore, in general, the through-hole (opening) (17) of the colored layer (16) is filled with a colorless and transparent resin to maintain flatness.

The spectral transmittance of the uniform colored layer (15) having the thickness D1 shown in FIG. 10 has a spectral transmittance suitable for the over-type liquid crystal display device. In the light transmission region (Tr), white light from the backlight indicated by the white arrow (A) is colored through the TFT substrate (40), the transparent electrode (41), the liquid crystal (50), and the transparent conductive film (14). The light passes through the colored layer (15) in the light transmission region (Tr) of the pixel (13), becomes colored light, and is emitted to the outside as indicated by a thin white arrow (P).
Therefore, when the backlight of the transflective liquid crystal display device is turned on and used as a transmissive liquid crystal display device, a transmissive color display having saturation and lightness as the transmissive liquid crystal display device is performed.

  In addition, when the backlight of this transflective liquid crystal display device is turned off and used as a reflective liquid crystal display device in a bright environment such as outdoors, a hatched thick arrow (B) in the light reflection region (Re) The external light from the surroundings shown in FIG. 5 passes through the colored layer (16) having the through-hole (opening) (17) of the glass substrate (11) and the average thickness (D2, D2 <D1) to become colored light, which is a reflective electrode The light is reflected at (42) and is emitted to the outside again as indicated by the hatched thin arrow (Q).

The reflected light at this time passes through the colored layer (16) having through holes (openings) (17) having an average thickness (D2) twice, so that the colored pixels used in the transmissive liquid crystal display device It has a spectral transmittance close to the spectral transmittance.
By using such a color filter, transmissive color display having chromaticity and lightness as a transmissive liquid crystal display device, and reflective color display having chromaticity and lightness as a reflective liquid crystal display device are performed. Is possible.

The color gamut for transmissive color display and the chromaticity coordinates for white display are determined by the saturation and brightness of the colored layer (15) of each color. However, in reflective color display, the aperture is set with more importance on brightness than saturation, so the color reproduction range in reflective color display is narrower than in transparent color display. ing.
Further, when setting the openings in the colored layers (16) of the respective colors, the areas of the openings are set for the respective colors in accordance with the brightness of the colored layers (16) of the respective colors, and the colors of the respective colors in the reflection color display are set. The brightness and brightness, that is, the color reproduction range of the reflective color display and the chromaticity coordinates at the time of white display are adjusted to approximate those of the transparent color display.

FIG. 1 is a plan view showing a colored pixel in an example of a color filter for a transflective liquid crystal display device in which the area of the opening provided in the colored pixel is different for each color.
As shown in FIG. 1, the color filter (13) for a transflective liquid crystal display device is composed of a green colored pixel (13G), a red colored pixel (13R), and a blue colored pixel (13B). Three colored pixels constitute one unit as a color reproduction filter of a liquid crystal display device. The colored pixel units are arranged on the entire screen of the color filter.

In FIG. 1, the upper half of the colored pixel (13) is a light transmission region (Tr), and colored layers (15G, 15R, 15B) of each color are provided on the upper half. The lower half is the light reflection region (R
e), and the lower half is provided with colored layers (16G, 16R, 16B) of respective colors having through holes (openings) (17G, 17R, 17B).
Each color opening (17G, 17R, 17B) is rectangular. One side of each rectangle, for example, the upper side in FIG. 1 is parallel to the X axis and is located on a straight line (dotted line) parallel to the X axis. In FIG. 1, the dimensions in the X-axis direction are the same (aG = aR = aB), and the dimensions in the Y-axis direction are different.

In the example shown in FIG. 1, the area of the opening increases in the order of the green colored pixel (13G), the red colored pixel (13R), and the blue colored pixel (13B). This is because the lightness of the colored layer is smaller in the order of the green colored pixel (13G), the red colored pixel (13R), and the blue colored pixel (13B).
That is, an opening having a large area is provided in a colored layer having a low brightness among the three parties.

  FIG. 2 is an explanatory diagram of a procedure for forming the colored pixel (13) shown in FIG. The colored pixels shown in FIG. 1 are arranged in the order of green colored pixels (13G), red colored pixels (13R), and blue colored pixels (13B) from left to right in FIG. In FIG. 2, for the sake of explanation, a case where colored pixels are formed in order from the largest opening to the smallest opening will be described as an example.

FIG. 2A is an explanatory diagram of the photomask (PM-B) when forming the blue colored pixel (13B) and the formed blue colored pixel (13B). The photomask (PM-B) is provided with a light shielding portion (18B) corresponding to the blue opening (17B). In this case, a negative colored photoresist is used as the colored photoresist for forming the colored pixels.
In order to form the blue colored pixels (13B) on the glass substrate on which the black matrix is formed, a blue colored photoresist coating film is provided, and the photomask (PM-B) is applied to the coating film. The blue colored pixel (13B) having the opening (17B) is formed by the exposure and development processing performed.

  FIG. 2B is an explanatory diagram of the photomask (PM-R) when the red colored pixel (13R) is formed and the formed red colored pixel (13R). The photomask (PM-R) is provided with a light shielding portion (18R) corresponding to the red opening (17R). The red colored pixel (13R) having the opening (17R) is formed at a position adjacent to the blue colored pixel (13B).

  FIG. 2C is an explanatory diagram of the photomask (PM-G) when forming the green colored pixel (13G) and the formed green colored pixel (13G). The photomask (PM-G) is provided with a light shielding portion (18G) corresponding to the green opening (17G). The green colored pixel (13G) having the opening (17G) is formed at a position adjacent to the red colored pixel (13R).

For forming these blue colored pixels (13B), red colored pixels (13R), and green colored pixels (13G), a photomask (PM-B) and a photomask (PM) corresponding to the formation of each colored pixel are used. -R) and three photomasks (PM-G) are used.
However, since the photomask used for forming the colored pixels is expensive, for example, when manufacturing a prototype of such a color filter for a transflective liquid crystal display device, the cost of the expensive photomask is required. I have a problem that it is bulky.
JP 2004-29400 A

  The present invention has been made to solve the above-described problem, and when manufacturing a color filter for a transflective liquid crystal display device in which an opening is provided in a colored pixel, a colored pixel having an area of the opening having a plurality of colors. It is an object of the present invention to provide a method for manufacturing a color filter for a transflective liquid crystal display device, which can form colored pixels of each color with a single photomask, even if they are different for each.

The present invention relates to a method for producing a color filter for a transflective liquid crystal display device having a configuration in which a plurality of colored pixels provided with openings having different areas for each color are adjacent to each other.
1) As a photomask used for forming the colored pixels of the plurality of colors, a photomask used for forming a colored pixel having an opening of the largest area in the colored pixels of the plurality of colors is used.
2) A) When forming a colored pixel having an opening with the largest area, exposure through the photomask is performed, and a colored pixel having an opening with the largest area is formed by subsequent development processing,
B) When forming a colored pixel other than a colored pixel having an opening with the maximum area, the first exposure through the photomask and the area of the opening to be formed are areas other than the maximum area. Then, after giving the photomask movement parallel to the coating surface, second exposure is performed through the photomask, and colored pixels other than the colored pixels having the maximum area opening are formed by subsequent development processing. A method for producing a color filter for a transflective liquid crystal display device.

  According to the present invention, in the method for manufacturing a color filter for a transflective liquid crystal display device according to the above invention, all the openings of the colored pixels of the plurality of colors are rectangular, and the sides of the rectangle are parallel to each other and have the same dimensions. In some cases, as a movement parallel to the coating film surface, a movement in a direction perpendicular to the one side is given to the photomask.

  The present invention uses 1) a photomask used for forming a colored pixel having an opening of the largest area in a plurality of colored pixels as a photomask used when forming colored pixels of a plurality of colors. 2) A) When forming a colored pixel having an opening with the largest area, exposure through the photomask is performed, and a colored pixel having an opening with the largest area is formed by subsequent development processing, and B) When forming a colored pixel other than a colored pixel having an opening, the first exposure via the photomask and the coating surface so that the area of the formed opening is an area other than the maximum area. A transflective liquid crystal display in which a second pixel is exposed through the photomask after a parallel movement is given to the photomask, and a colored pixel other than a colored pixel having an opening of the maximum area is formed by subsequent development processing. Equipment -Because it is a method for manufacturing a filter, even if the area of the opening is different for each colored pixel of a plurality of colors, it is possible to form colored pixels of each color with a single photomask. It becomes a manufacturing method of a color filter.

Hereinafter, embodiments of the present invention will be described in detail.
3 to 6 are plan views for explaining an embodiment of a method for manufacturing a color filter for a transflective liquid crystal display device according to the invention of claim 2. 3 to 6 will be described by taking as an example the case of manufacturing a color filter composed of the colored pixels shown in FIG.

  As shown in FIG. 1, the colored pixel (13) of this color filter is a three-color colored pixel, a green colored pixel (13G) provided with openings (17G, 17R, 17B) having different areas for each color. The red colored pixel (13R) and the blue colored pixel (13B) are adjacent to each other. All of the openings (17G, 17R, 17B) provided in the three colored pixels are rectangular. One side of each rectangle, for example, the upper side in FIG. 1 is parallel to the X axis and is located on a straight line (dotted line) parallel to the X axis. In FIG. 1, the dimensions in the X-axis direction are the same (aG = aR = aB), and the dimensions in the Y-axis direction are different.

In the present invention, as a photomask used when forming colored pixels (13G, 13R, 13B) of a plurality of colors, a photo used for forming a colored pixel having an opening of the maximum area in the colored pixels of a plurality of colors. A mask is commonly used for exposure when forming colored pixels of a plurality of colors.
For example, in FIG. 1, a photomask used for forming a blue colored pixel (13B) having an opening (17B) having the maximum area is used for exposure when forming the blue colored pixel (13B). Also used for exposure when forming colored pixels (13G, 13R) of other colors.

FIG. 3 is an explanatory diagram for forming a colored pixel having an opening with the largest area.
That is, in FIG. 1, the photomask (PM-B) used at the time of exposure when forming the blue colored pixel (13B) and the formed blue colored pixel (13B) are shown. The photomask (PM-B) is provided with a light shielding portion (18B) corresponding to the blue opening (17B). In this case, a negative colored photoresist is used as the colored photoresist for forming the colored pixels.
A blue colored photoresist coating film for forming blue colored pixels (13B) is provided on the glass substrate on which the black matrix is formed, and the photomask (PM-B) is applied to the coating film. The blue colored pixel (13B) having the opening (17B) is formed by the exposure and development processing performed.

FIGS. 5A to 5C are explanatory diagrams in the case of forming a colored pixel other than the colored pixel having the opening with the largest area. That is, a photomask (PM-B) used at the time of exposure when forming the blue colored pixel (13B) in FIG. 3, two exposures through this photomask, and the next largest opening ( It is explanatory drawing of the red coloring pixel (13R) which has 17R).
This photomask (PM-B) is the same photomask used for forming the blue colored pixels (13B). Moreover, as exposure when forming colored pixels other than the colored pixel having the opening of the largest area, two exposures of the first exposure and the second exposure are given to the same coating film surface.

Fig.5 (a) represents the 1st exposure through a photomask (PM-B), and the exposure state (13R-1) to the coating film by 1st exposure. In this photomask (PM-B), as shown by an arrow in FIG. 5A, the position is formed parallel to the coating surface to the position where the red colored pixel (13R) in the X-axis direction is formed. The movement of the colored pixels by one pitch (Pi) is given.
If development processing is performed at this stage, the area of the opening becomes the same as the area of the opening (17B) of the blue colored pixel (13B), as indicated by reference numeral (17R-1). End up.

FIG.5 (b) represents the 2nd exposure through a photomask (PM-B), and the exposure state (13R-2) to the coating film by 2nd exposure. In this photomask (PM-B), the area of the opening (17R) formed in the red colored pixel (13R) is formed in the area of the opening (17R) shown in FIG. In 5 (b), a movement parallel to the coating film surface is given in the Y-axis direction as indicated by an arrow.
The amount of movement is the dimension (bB) in the Y-axis direction of the opening (17B) of the blue colored pixel (13B) and the Y-axis direction of the opening (17R) of the red colored pixel (13R) shown in FIG. ΔY1 (ΔY1 = bB−bR).

The code | symbol (13R-2) represents the part of the coating film exposed by the 2nd exposure through the photomask (PM-B) in this position. After the two exposures of the first exposure and the second exposure, development processing is performed, and as shown in FIG. 5C, next to the opening (17B) of the blue colored pixel (13B). A red colored pixel (13R) having a large opening (17R) is formed.
The area of the opening (17R) is represented by 17R = (17R-1)-(13R-2).

FIGS. 6A to 6C are explanatory diagrams in the case of forming a colored pixel other than a colored pixel having an opening with the largest area, but a colored pixel having an opening (17G) with the smallest area in FIG. It is explanatory drawing in the case of forming (13G). That is, a photomask (PM-B) used at the time of exposure when forming the blue colored pixel (13B) in FIG. 3, the two exposures through this photomask, and the opening (with the smallest area formed) It is explanatory drawing of the green coloring pixel (13G) which has 17G).
This photomask (PM-B) is the same photomask used for forming the blue colored pixels (13B). Further, as the exposure for forming the colored pixels, two exposures of the first exposure and the second exposure are given to the same coating film surface.

  Fig.6 (a) represents the 1st exposure through a photomask (PM-B), and the exposure state (13G-1) to the coating film by 1st exposure. In this photomask (PM-B), as shown by the arrows in FIG. 6A, green colored pixels (13G) in the X-axis direction are formed from the position of the photomask shown in FIG. 5A. To the position, the movement of one pitch (Pi) of the colored pixels parallel to the coating film surface is given.

FIG. 6B shows the second exposure through the photomask (PM-B) and the exposure state (13G-2) of the coating film by the second exposure. In this photomask (PM-B), the area of the opening (17G) formed in the green colored pixel (13G) is formed in the area of the opening (17G) shown in FIG. In 6 (b), a movement parallel to the coating film surface is given in the Y-axis direction as indicated by an arrow.
The amount of movement is the dimension (bR) in the Y-axis direction of the opening (17R) of the red colored pixel (13R) shown in FIG. 4 and the Y-axis direction of the opening (17G) in the green colored pixel (13G). ΔY2 (ΔY2 = bR−bG).

In addition, when this movement amount is converted from the blue colored pixel (13B) shown in FIG. 4, the dimension (bB) in the Y-axis direction of the opening (17B) of the blue colored pixel (13B) and the green colored pixel A difference from the dimension (bG) in the Y-axis direction of the opening (17G) of (13G) is ΔY3 (ΔY3 = bB−bG).
The code | symbol (13G-2) represents the part of the coating film exposed by the 2nd exposure through the photomask (PM-B) in this position. After the two exposures of the first exposure and the second exposure, a development process is performed, and as shown in FIG. 6C, a green colored pixel (13G) having an opening (17G) with a minimum area. ).
The area of the opening (17G) is represented by 17G = (17R-1)-(13G-2).

  As described above, according to the present invention, even if the color filter has different openings for each color pixel of a plurality of colors, the color pixels of each color can be formed with one photomask. Thus, it is possible to reduce the cost of trial production when manufacturing a prototype of a color filter for a transflective liquid crystal display device, or to manufacture a small amount of product at low cost.

  7 and 8 are plan views for explaining an example of a method for manufacturing a color filter for a transflective liquid crystal display device according to the first aspect of the present invention. FIG. 7 is an explanatory diagram in the case of forming a colored pixel having an opening having the maximum area. FIG. 7 shows a photomask (PMmax) used for exposure when forming a colored pixel (23max) having an opening with the largest area, and a colored pixel (23max) having an opening with the largest area formed. It is.

The photomask (PMmax) is provided with a square light shielding portion (28max) corresponding to the opening portion (27max) having the maximum area. In this case, a negative colored photoresist is used as the colored photoresist for forming the colored pixels.
On the glass substrate on which the black matrix is formed, a coating film of a colored photoresist for forming a colored pixel (23max) having an opening of the maximum area is provided, and the photomask (PMmax) applied to the coating film is provided. The colored pixel (23max) having the opening (27max) having the maximum area is formed by the exposure and the developing process.

FIGS. 8A to 8C are explanatory diagrams in the case of forming a colored pixel other than the colored pixel having the opening with the maximum area. That is, a photomask (PMmax) used at the time of exposure when forming a colored pixel (23max) having an opening of the maximum area, two exposures through the photomask, and an opening that is not the maximum area formed It is explanatory drawing of the coloring pixel (23) which has (27).
This photomask (PMmax) is the same photomask used for forming the colored pixel (23max) having the opening with the maximum area. Further, as the exposure for forming the colored pixels, two exposures of the first exposure and the second exposure are given to the same coating film surface.

  FIG. 8A shows the first exposure through the photomask (PMmax) and the exposure state (23-1) of the coating film by the first exposure. In this photomask (PMmax), one pitch (Pi) of the colored pixels parallel to the coating film surface is formed to the position where the colored pixels (23) having the openings (27) which are not the maximum area are formed. Movement in the X-axis direction is given (Pi = Y1 to Y2).

FIG. 8B shows the second exposure through the photomask (PMmax) and the exposure state (23-2) to the coating film by the second exposure. In this photomask (PMmax), the area of the opening (27) formed in the colored pixel (23) is formed in the area of the opening (27) shown in FIG. 8 (c). In (b), as indicated by an arrow, a movement (ΔY4) parallel to the coating surface in the Y-axis direction is given, and a movement (ΔX4) parallel to the coating surface in the X-axis direction is given. ing.
This movement amount is, for example, ½ of one side of the square light-shielding portion (28max).

  The code | symbol (23-2) represents the part of the coating film exposed by the 2nd exposure through the photomask (PMmax) in this position. After the two exposures of the first exposure and the second exposure, development processing is performed, and as shown in FIG. 8 (c), an opening (27) having an area smaller than the maximum area of the opening (27max) is obtained. ) Are formed.

  7 and 8, the case where the shape of the opening is a square has been described as an example. However, the invention according to claim 1 can color the area of the opening in a plurality of colors without specifying the shape of the opening. This is a method that can be different between pixels.

It is a top view which shows the color pixel in an example of the color filter for transflective liquid crystal display devices from which the area of the opening part provided in the color pixel differs for every color. (A) is explanatory drawing of the photomask at the time of forming a blue colored pixel, and the formed blue colored pixel. (B) is explanatory drawing of the photomask at the time of forming a red colored pixel, and the formed red colored pixel. (C) is explanatory drawing of the photomask at the time of forming a green coloring pixel, and the formed green coloring pixel. It is explanatory drawing in the case of forming the colored pixel which has an opening part of the largest area. It is explanatory drawing of the dimension of the Y-axis direction of the opening part of the coloring pixel of each color, and a dimension difference (movement amount of a photomask). (A) represents the 1st exposure through a photomask, and the exposure state to the coating film by 1st exposure. (B) represents the exposure state to the coating film by the 2nd exposure through a photomask, and a 2nd exposure. (C) is a red colored pixel obtained by performing development after two exposures. (A) represents the 1st exposure through a photomask, and the exposure state to the coating film by 1st exposure. (B) represents the exposure state to the coating film by the 2nd exposure through a photomask, and a 2nd exposure. (C) is a green colored pixel obtained by performing development after two exposures. It is explanatory drawing in the case of forming the colored pixel which has an opening part of the largest area in the invention concerning Claim 1. (A) represents the 1st exposure through a photomask, and the exposure state to the coating film by 1st exposure. (B) represents the exposure state to the coating film by the 2nd exposure through a photomask, and a 2nd exposure. (C) is a colored pixel having an opening that is not the maximum area obtained by performing development after two exposures. It is the top view which showed the part of one pixel of an example of the color filter used for a transflective liquid crystal display device. FIG. 10 is an explanatory cross-sectional view illustrating a pixel portion of a transflective liquid crystal display device using the color filter illustrated in FIG. 9.

Explanation of symbols

DESCRIPTION OF SYMBOLS 11 ... Glass substrate 12 ... Black matrix 13 ... Colored pixel 13B ... Blue colored pixel 13G ... Green colored pixel 13R ... Red colored pixel 13R-1, 13G-1 ..Exposure state of coating film by first exposure when forming colored pixels of each color 13R-2, 13G-2 ... Exposure state of coating film by second exposure when forming colored pixels of each color 14 ... Transparent conductive film 15 ... Uniform colored layers 15B, 15G, 15R in the light transmission region ... Color layers 16 for each color ... Color layers 16B, 16G, 16R having openings in the light reflection region ... Colored layers 17 of each color having through holes (openings) ... through holes (openings)
17B, 17G, 17R: Each color through hole (opening)
18B, 18G, 18R: light-shielding portion 23 on photomask corresponding to each color opening 23 ... colored pixel 23-1 having opening that is not maximum area ... coloring having opening that is not maximum area The state of exposure to the coating film by the first exposure when forming the pixel 23-2... The exposure state of the coating film by the second exposure when forming the colored pixel having an opening that is not the maximum area 23max. Colored pixel PMmax having an opening with the largest area ... Photomask 27 when opening a colored pixel having an opening with the largest area ... An opening 27max that is not the largest area ... An opening 28max with the largest area ... Light-shielding part 30 on the photomask corresponding to the opening of the largest area ... Color filter 40 used in the transflective liquid crystal display device ... TFT substrate 4 on which TFT elements are formed ... Transparent electrode 42 formed on the TFT substrate ... Reflective electrode 50 formed on the TFT substrate ... Liquid crystal A ... White light B from the backlight B ... External light D1 from the surroundings ... thickness D2 of the colored layer ... average thickness Px of the colored layer having openings ... area 1 pixel Re ... light reflection area P ... color light Pi in the light transmission area ... Pitch PM-B, PM-G, PM-R in the X-axis direction of colored pixels ... Photomask Q when forming colored pixels of each color ... Color light Tr in light reflection region ... Light transmission region aG , AR, aB ... Dimensions of each color rectangle in the X-axis direction

Claims (2)

In the method of manufacturing a color filter for a transflective liquid crystal display device having a configuration in which colored pixels of a plurality of colors provided with openings having different areas for each color are adjacent to each other,
1) As a photomask used for forming the colored pixels of the plurality of colors, a photomask used for forming a colored pixel having an opening of the largest area in the colored pixels of the plurality of colors is used.
2) A) When forming a colored pixel having an opening with the largest area, exposure through the photomask is performed, and a colored pixel having an opening with the largest area is formed by subsequent development processing,
B) When forming a colored pixel other than a colored pixel having an opening with the maximum area, the first exposure through the photomask and the area of the opening to be formed are areas other than the maximum area. Then, after giving the photomask movement parallel to the coating surface, second exposure is performed through the photomask, and colored pixels other than the colored pixels having the maximum area opening are formed by subsequent development processing. A method for producing a color filter for a transflective liquid crystal display device.   When all the openings of the colored pixels of the plurality of colors are rectangular and the sides of the rectangle are parallel to each other and have the same dimensions, the movement in a direction perpendicular to the one side is performed as the movement parallel to the coating film surface. 2. The method for producing a color filter for a transflective liquid crystal display device according to claim 1, wherein the method is applied to the photomask.

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