JP2008130817A - Pattern drawing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a pattern drawing apparatus that can prevent the contamination of an aperture, by which replacement work of the aperture to be mounted onto a plurality of optical heads is automated to efficiently exchange the aperture. <P>SOLUTION: The pattern drawing apparatus 1 mainly performs an exchange processing for the aperture AP mounted to each of the optical heads 32a, 32b, ..., 32g by operating an aperture exchange section 40 and an aperture unit 36 on the basis of instructions from a control unit 50. Specifically, a hand 41 is moved along the plurality of the optical heads 32a to 32g and the aperture AP is delivered by making the hand 41 move closer to and separate from the aperture unit that is moved toward the -Y direction, thereby automatically and efficiently exchanging the aperture AP and preventing the contamination of the aperture AP. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a pattern drawing apparatus for drawing a pattern on the surface of a substrate such as a glass substrate for a color filter, a glass substrate for a flat panel display, a semiconductor substrate, or a printed board.

  2. Description of the Related Art Conventionally, there has been known a pattern drawing apparatus that draws a predetermined pattern on the surface of a substrate by irradiating light onto the surface of the substrate coated with a photosensitive material. The pattern drawing apparatus includes a stage on which a substrate is placed, a moving mechanism for moving the stage, and a plurality of optical heads that irradiate light onto the surface of the substrate on the stage. The pattern drawing apparatus draws a predetermined pattern on the surface of the substrate by irradiating light from a plurality of optical heads while moving the substrate in the horizontal direction together with the stage.

  An aperture, which is a glass plate on which a predetermined light shielding portion is formed, is mounted inside each optical head of such a pattern drawing apparatus. The light emitted from the light source passes through the aperture in each optical head, and is irradiated onto the surface of the substrate as a light beam having a predetermined pattern. As described above, the pattern drawing apparatus is configured such that an aperture is mounted on each of a plurality of optical heads. For this reason, the size of each aperture can be reduced, the problem of deflection of the aperture is reduced, and handling of the aperture is facilitated.

  The configuration of such a pattern drawing apparatus is disclosed in Patent Document 1, for example.

JP 2006-145745 A

  In such a pattern writing apparatus, the aperture mounted on each optical head is exchanged according to the pattern to be drawn. However, if the operator manually replaces the aperture, the operator must remove the used aperture from the optical head and attach a new aperture to the optical head. The burden increases. Further, when the operator directly touches the aperture, there is a possibility that foreign matters such as particles adhere to the aperture.

  The present invention has been made in view of such circumstances, and is a pattern that can automatically replace apertures mounted on a plurality of optical heads, efficiently replace the apertures, and prevent contamination of the apertures. An object is to provide a drawing apparatus.

  In order to solve the above-mentioned problem, the invention according to claim 1 is a pattern drawing apparatus for drawing a pattern on the surface of a substrate by irradiating the substrate with light from a plurality of optical heads arranged along a predetermined direction. In each of the plurality of optical heads, aperture holding means for holding an aperture member for transmitting light in a predetermined pattern shape, aperture replacement means for replacing the aperture member held by the aperture holding means, The aperture exchanging means includes a hand unit that conveys the aperture member while holding the aperture member, and the hand unit in a direction parallel to the predetermined direction over at least a range in which the plurality of optical heads are arranged. A moving means for moving, and the hand means is moved to each of the plurality of aperture holding means by the moving means. Control means for transferring an aperture member between the aperture holding means and the hand part by moving the hand part toward and away from the aperture holding means after moving to a position facing It is characterized by having.

  According to a second aspect of the present invention, in the pattern drawing apparatus according to the first aspect, the aperture holding means moves forward and backward between an irradiation position in the optical head and a position on the movement path of the hand unit. The apparatus further comprises means.

  The invention according to claim 3 is the pattern drawing apparatus according to claim 1 or 2, wherein the hand portion holds the aperture member by picking an end portion of the aperture member with a pair of holding claws. And

  The invention according to claim 4 is the pattern drawing apparatus according to any one of claims 1 to 3, wherein the aperture holding means has a notch for allowing the hand portion to enter. Features.

  According to a fifth aspect of the present invention, in the pattern drawing apparatus according to any one of the first to fourth aspects, the cassette unit that is disposed on the moving path of the hand unit by the moving unit and stores the aperture member is provided. It is further provided with the feature.

  According to a sixth aspect of the present invention, in the pattern drawing apparatus according to the fifth aspect, the cassette unit stores a plurality of aperture members in multiple stages in the vertical direction, and elevating means for moving the cassette unit up and down is provided. It is further provided with the feature.

  The invention according to claim 7 is the pattern drawing apparatus according to claim 5 or 6, wherein the cassette portion has a plurality of storage portions around a predetermined rotation axis, and the rotation axis is the center. And further comprising a rotating means for rotating the cassette portion.

  According to an eighth aspect of the present invention, in the pattern drawing apparatus according to any one of the fifth to seventh aspects, the cassette portion has a guide portion for holding both end portions of an aperture member, and the guide The portion has a mounting surface on which both end portions of the aperture member are mounted, and a tapered surface that rises outside the mounting surface.

  The invention according to claim 9 is the pattern drawing apparatus according to any one of claims 1 to 8, wherein the aperture holding means fixes the aperture member, and releases the aperture member. It is characterized by having a fixing release means for switching between.

  According to the first to ninth aspects of the present invention, the pattern drawing apparatus moves the hand portion along the plurality of optical heads, and then moves the hand portion toward and away from the aperture holding means, thereby the aperture. The aperture member is transferred between the holding means and the hand portion. For this reason, an aperture member can be replaced automatically and efficiently, and contamination of the aperture member can also be prevented.

  In particular, according to the second aspect of the present invention, the pattern drawing apparatus further includes advancing / retreating means for moving the aperture holding means between the irradiation position in the optical head and the position on the movement path of the hand unit. . For this reason, it is possible to perform the transfer operation of the aperture member on the movement path of the hand unit, and it is possible to retract the aperture holding means when moving the hand unit.

  In particular, according to the third aspect of the present invention, the hand portion holds the aperture member by pinching the end portion of the aperture member with the pair of holding claws. For this reason, the transfer operation of the aperture member can be performed without inserting the hand portion to a deep position in the aperture holding portion.

  In particular, according to the fourth aspect of the present invention, the aperture holding means has a notch for allowing the hand portion to enter. For this reason, it is possible to perform the transfer operation of the aperture member while avoiding interference between the aperture holding means and the hand portion.

  In particular, according to the fifth aspect of the present invention, the pattern drawing apparatus further includes a cassette portion that is disposed on the moving path of the hand portion by the moving means and that stores the aperture member. For this reason, the used aperture member and the replacement aperture member can be stored together in one place.

  In particular, according to the invention described in claim 6, the cassette unit accommodates a plurality of aperture members in multiple stages in the vertical direction, and the pattern drawing apparatus further includes elevating means for elevating and moving the cassette unit. For this reason, a plurality of aperture members can be stored in a compact manner, and the height of the cassette portion can be adjusted according to the stage at which the aperture member is taken out or stored.

  In particular, according to the seventh aspect of the present invention, the cassette unit has a plurality of storage units around a predetermined rotation axis, and the pattern drawing device rotates the cassette unit around the rotation axis. Rotating means is further provided. Therefore, the used aperture and the replacement aperture can be stored separately in a plurality of storage units, and each storage unit can be easily switched.

  In particular, according to the eighth aspect of the present invention, the cassette portion has guide portions for holding both end portions of the aperture member, and the guide portion includes a mounting surface on which both end portions of the aperture member are mounted. And a tapered surface that rises outside the mounting surface. For this reason, even if the position of the aperture member is slightly deviated in the horizontal direction, the aperture member can be placed on the placement surface, and the aperture member can be easily stored in the cassette portion.

  In particular, according to the ninth aspect of the present invention, the aperture holding means has the fixing release means for switching between a state in which the aperture member is fixed and a state in which the fixation of the aperture member is released. Therefore, the aperture member can be securely held during the drawing process, and the aperture member can be easily taken out when the aperture member is replaced.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. In addition, in each figure referred in the following description, in order to clarify the positional relationship and operation direction of each member, the common XYZ orthogonal coordinate system is attached | subjected.

<1. Overall Configuration of Pattern Drawing Device>
FIG. 1 is a side view of a pattern drawing apparatus 1 according to an embodiment of the present invention. FIG. 2 is a top view of the pattern drawing apparatus 1 as viewed from the position II-II in FIG. The pattern drawing device 1 is a device for drawing a predetermined pattern on the upper surface of a glass substrate (hereinafter simply referred to as “substrate”) 9 for a color filter in a process of manufacturing a color filter of a liquid crystal display device. As shown in FIGS. 1 and 2, the pattern writing apparatus 1 includes a stage 10 for holding a substrate 9, a stage driving unit 20 connected to the stage 10, and a head having a plurality of optical heads 32 a to 32 g. , 32g, and an aperture exchanging unit 40 for exchanging aperture APs mounted on the optical heads 32a, 32b,..., 32g, and a control unit 50 for controlling the operation of each unit.

  The stage 10 has a flat outer shape, and is a holding unit for placing and holding the substrate 9 on the upper surface thereof in a horizontal posture. A plurality of suction holes (not shown) are formed on the upper surface of the stage 10. For this reason, when the substrate 9 is placed on the stage 10, the substrate 9 is fixedly held on the upper surface of the stage 10 by the suction pressure of the suction holes. A layer of a photosensitive material such as a color resist is formed on the surface of the substrate 9 held on the stage 10.

  The stage drive unit 20 is a mechanism for moving the stage 10 in the main scanning direction (Y-axis direction), the sub-scanning direction (X-axis direction), and the rotation direction (rotation direction around the Z-axis). The stage drive unit 20 includes a rotation mechanism 21 that rotates the stage 10, a support plate 22 that rotatably supports the stage 10, a sub-scanning mechanism 23 that moves the support plate 22 in the sub-scanning direction, and a sub-scanning mechanism 23. And a main scanning mechanism 25 for moving the base plate 24 in the main scanning direction.

  The rotation mechanism 21 includes a linear motor 21 a that includes a mover attached to the end portion on the −Y side of the stage 10 and a stator laid on the upper surface of the support plate 22. A rotation shaft 21 b is provided between the lower surface side of the center portion of the stage 10 and the support plate 22. For this reason, when the linear motor 21a is operated, the mover moves in the X-axis direction along the stator, and the stage 10 rotates within a predetermined angle range around the rotation shaft 21b on the support plate 22.

  The sub-scanning mechanism 23 includes a linear motor 23 a configured by a mover attached to the lower surface of the support plate 22 and a stator laid on the upper surface of the base plate 24. In addition, a pair of guide portions 23 b extending in the sub-scanning direction is provided between the support plate 22 and the base plate 24. For this reason, when the linear motor 23a is operated, the support plate 22 moves in the sub-scanning direction along the guide portion 23b on the base plate 24.

  The main scanning mechanism 25 has a linear motor 25 a composed of a mover attached to the lower surface of the base plate 24 and a stator laid on the base 60 of the apparatus 1. A pair of guide portions 25 b extending in the main scanning direction is provided between the base plate 24 and the base 60. For this reason, when the linear motor 25a is operated, the base plate 24 moves in the main scanning direction along the guide portion 25b on the base 60.

  The head unit 30 is a mechanism for irradiating a predetermined pattern of pulsed light onto the upper surface of the substrate 9 held on the stage 10. The head unit 30 includes a frame 31 installed on the base 60 so as to straddle the stage 10 and the stage driving unit 20, and seven optical heads 32a to 32a attached to the frame 31 at equal intervals along the sub-scanning direction. 32g. A laser oscillator 34 is connected to each optical head 32a, 32b,..., 32g via an illumination optical system 33. In addition, a laser driving unit 35 is connected to the laser oscillator 34. Therefore, when the laser driving unit 35 is operated, pulsed light is oscillated from the laser oscillator 34, and the oscillated pulsed light is introduced into each optical head 32a, 32b,..., 32g via the illumination optical system 33. .

  In each of the optical heads 32a, 32b,..., 32g, an aperture unit 36 for partially shielding the pulsed light and a projection optical system 37 for imaging the pulsed light on the upper surface of the substrate 9 are provided. It has been. In the aperture unit 36, an aperture AP which is a glass plate on which a predetermined light shielding pattern is formed is set. The aperture AP is a small piece of about 100 mm × 150 mm, for example. The pulse light introduced into the optical heads 32a, 32b,..., 32g via the illumination optical system 33 is partially shielded when passing through the aperture AP set in the aperture unit 36, and has a predetermined pattern. To the projection optical system 37. Then, a predetermined pattern is drawn on the photosensitive material on the substrate 9 by irradiating the upper surface of the substrate 9 with the pulsed light that has passed through the projection optical system 37.

  FIG. 3 is a top view showing details of the aperture unit 36. As shown in FIG. 3, the aperture unit 36 has a mounting table 361 for mounting the aperture AP. The mounting table 361 is configured by a flat plate-like member, and the aperture AP is mounted on the upper surface thereof. A window 361 a for allowing pulsed light to pass in the vertical direction is formed at the center of the mounting table 361. Further, a notch portion 361b for allowing the hand portion 41 to be described later to enter is formed on the −X side side portion of the mounting table 361.

  At the upper part of the mounting table 361, contact pins 362 and 363 that contact the side portion of the aperture AP mounted on the mounting table 361 are provided. The pair of contact pins 362 arranged on the −Y side are each attached to the mounting table 361 via a spring 362a. For this reason, a pair of contact pins 362 contact the side surface on the −Y side of the aperture AP mounted on the mounting table 361, and the aperture AP receives an urging force in the main scanning direction from each contact pin 362.

  In addition, the pair of contact pins 363 arranged on the + Y side on the mounting table 361 are connected to contact pin driving units 363a each formed of a motor or the like. For this reason, when the contact pin driving unit 363a is operated, the pair of contact pins 363 move forward and backward in the main scanning direction. In the pattern drawing apparatus, the aperture AP is fixed by pressing the + Y side surface of the aperture AP by the pair of contact pins 363, and the aperture is fixed by separating the pair of contact pins 363 from the aperture AP. You can switch between states. Accordingly, the pattern drawing apparatus can reliably hold the aperture AP during the drawing process, and can easily take out the aperture AP when the aperture AP is replaced.

  The aperture unit 36 is connected to an advance / retreat mechanism 364 that moves the aperture unit 36 forward and backward in the main scanning direction. FIG. 4 is a side view showing a schematic configuration of the advance / retreat mechanism 364. The advance / retreat mechanism 364 is a mechanism for moving the aperture unit 36 forward and backward along the beam portion 364 a protruding from the frame 31 to the −Y side. Specifically, the advance / retreat mechanism 364 includes a linear guide laid along the main scanning direction on the lower surface of the beam portion 364a, and a linear motor provided between the beam portion 364a and the aperture unit 36. Yes. Then, by operating the linear motor, the aperture unit 36 moves forward and backward in the main scanning direction along the linear guide.

  The advance / retreat mechanism 364 is provided in each of the plurality of optical heads 32a to 32g, and the aperture units 36 of the optical heads 32a, 32b,..., 32g are irradiated to the irradiation positions in the optical heads 32a, 32b,. And a position on the movement path of the hand unit 41 to be described later. Therefore, when the aperture AP mounted on each of the optical heads 32a, 32b,..., 32g is exchanged, the aperture AP can be transferred on the moving path of the hand unit 41 described later.

  Returning to FIG. 1 and FIG. 2, the aperture exchanging unit 40 is a mechanism for exchanging the aperture AP mounted on each of the optical heads 32 a, 32 b,. The aperture exchange unit 40 includes a hand unit 41 for holding the aperture AP, a hand moving mechanism 42 for moving the hand unit 41 in the vertical direction and the sub-scanning direction on the −Y side of the head unit 30, and And a cassette portion 43 for storing the aperture AP after replacement.

  FIG. 5 is a side view of the vicinity of the hand unit 41 and the hand moving mechanism 42 as viewed from the + Y side. FIG. 6 is a top view of the vicinity of the hand unit 41 and the hand moving mechanism 42. As shown in FIGS. 5 and 6, the hand unit 41 holds the aperture AP by gripping the aperture AP from the −X side by the pair of holding claws 411 and 412. The pair of holding claws 411 and 412 are each connected to a motor (for example, a stepping motor) 413. For this reason, when the motor 413 is operated, the pair of holding claws 411 and 412 move in the approaching direction and the separation direction, thereby realizing the operation of holding and releasing the aperture AP.

  Further, contact portions 411 a and 412 a made of a cushioning material (for example, urethane) are provided on the lower surface side of the distal end portion of the holding claw 411 and the upper surface side of the distal end portion of the holding claw 412, respectively. For this reason, when holding the aperture AP, the holding claws 411 and 412 abut against the aperture AP via the abutting portions 411a and 412a, respectively, to prevent damage to the aperture AP.

  The hand moving mechanism 42 includes an elevating mechanism 421 for moving the hand unit 41 up and down, and a traversing mechanism 422 for moving the elevating mechanism 421 and the hand unit 41 together in the sub-scanning direction. As shown in FIG. 1, the traversing mechanism 422 is provided at a portion of the upper portion of the frame 31 that protrudes to the −Y side, and an elevating mechanism 421 disposed below via a bent arm portion 423 and The hand unit 41 is connected.

  As shown in FIG. 5, the elevating mechanism 421 includes a pair of a ball screw 421a erected in the vertical direction, a motor (for example, an AC servo motor) 421b for rotating the ball screw 421a, and a pair laid along the ball screw 421a. Linear guide 421c. The hand portion 41 is screwed to the ball screw 421a. Therefore, when the motor 421 is operated, the ball screw 421a rotates and the hand unit 41 moves up and down along the linear guide 421c.

  On the other hand, as shown in FIG. 6, the traversing mechanism 422 includes a ball screw 422a extending in the sub-scanning direction, a motor (for example, an AC servo motor) 422b for rotating the ball screw 422a, and a pair laid along the ball screw 422a. Linear guide 422c. The arm portion 423 is screwed to the ball screw 422a. For this reason, when the motor 422b is operated, the ball screw 422a rotates, and the arm portion 423, the lifting mechanism 421, and the hand portion 41 integrally move in the sub-scanning direction along the linear guide 422c.

  When the lifting mechanism 421 and the traversing mechanism 422 are operated while holding the aperture AP by the hand portion 41, the aperture AP is conveyed in the vertical direction and the sub-scanning direction along the head portion 30. Thereby, the aperture AP can be transported between a cassette unit 43 to be described later and a position on the −Y side of each optical head 32a, 32b,..., 32g (a position where each aperture unit 36 advances). When the aperture AP is transferred at each position, the vertical position of the aperture AP can be adjusted according to the height of the cassette unit 43 or the aperture unit 36.

  At the position on the most + X side on the movement path of the hand unit 41, a cassette unit 43 for storing the replacement aperture AP is provided. FIG. 7 is a longitudinal sectional view of the cassette unit 43 cut along the XZ plane. As shown in FIG. 7, the cassette unit 43 includes a first storage unit 431 for storing the used aperture AP and a second storage unit 432 for storing the replacement aperture AP. Each of the storage units 431 and 432 is configured to store up to seven aperture APs (the same number as the number of optical heads 32a to 32g) in multiple stages. A pair of guide portions 433 for receiving the + Y side and −Y side sides of the aperture AP from below is provided at each stage of the storage portions 431 and 432. The aperture AP is housed in each stage in a state where both ends are placed on such a pair of guide portions 433.

  FIG. 8 is a longitudinal sectional view of the pair of guide portions 433 cut along the YZ plane. As shown in FIG. 8, each guide portion 433 is formed with a placement surface 433a for placing the end of the aperture AP and a tapered surface 433b that rises outside the placement surface 433a. . For this reason, even when the position of the aperture AP is slightly shifted in the horizontal direction from above the placement surface 433a when the aperture AP is set on the guide portion 433, the aperture AP is located on the placement surface 433a along the tapered surface 433b. The horizontal position is corrected. For this reason, the aperture AP can be easily set on the guide portion 433. Further, the width of the mounting surface 433a is defined so that a slight gap d (for example, 0.5 mm) is secured around the aperture AP mounted on the mounting surface 433a. For this reason, the aperture AP does not fit inside the tapered surface 433b, and the operation of placing and removing the aperture AP can be performed smoothly.

  FIG. 9 is a diagram showing the configuration of the drive mechanism connected to the cassette unit 43. As shown in FIG. 9, a first gear 434 a is attached to the lower portion of the cassette portion 43, and the cassette portion 43 and the first gear 434 a are arranged around a rotation shaft 434 b erected on the lifting platform 44. Can be rotated. The first gear 434a is engaged with the second gear 434c, and the second gear 434c is connected to a motor (for example, a stepping motor) 434d provided on the lifting platform 44. For this reason, when the motor 434d is operated, the driving force is transmitted to the first gear 434a via the second gear 434c, and the cassette portion 43 rotates about the rotation shaft 434b. That is, the first gear 434a, the rotation shaft 434b, the second gear 434c, and the motor 434d constitute a rotation mechanism 434 for rotating the cassette unit 43. The rotation mechanism 434 can switch between a state in which the first storage unit 431 faces the hand unit 41 side and a state in which the second storage unit 432 faces the hand unit 41 side.

  Further, on the side of the cassette unit 43, there are a ball screw 435a erected in the vertical direction, a motor (for example, an AC servo motor) 435b for rotating the ball screw, and a guide shaft 435c extending along the ball screw 435a. Is provided. The elevator 44 is connected to the ball screw 435a and the guide shaft 435c. For this reason, when the motor 435b is operated, the ball screw 435a is rotated, and the elevator 44, the rotating mechanism 434 on the elevator 44 and the cassette unit 43 are moved up and down along the guide shaft 435c. That is, the ball screw 435a, the motor 435b, and the guide shaft 435c constitute an elevating mechanism 435 for moving the cassette unit 43 up and down. The elevating mechanism 435 can adjust the height of the cassette unit 43 according to the stage where the aperture AP is taken out or stored.

  The cassette unit 43 can be removed from the upper part of the lifting platform 44. When the operator takes out the aperture AP from the first storage unit 431 or inserts the aperture AP into the second storage unit 432, the operator performs the work by removing the cassette unit 43 from the lifting platform 44.

  The control unit 50 is a processing unit for controlling the operation of each unit in the pattern drawing apparatus 1. FIG. 10 is a block diagram illustrating a connection configuration between the above-described units of the pattern drawing apparatus 1 and the control unit 50. As shown in FIG. 10, the control unit 50 includes the linear motors 21a, 23a, 25a, the laser driving unit 35, the illumination optical system 33, the projection optical system 37, the contact pin driving unit 363a, the advance / retreat mechanism 364, and the motor. 413, 421b, 422b, 434d, and 435b are electrically connected to control these operations. In addition, the control part 50 is comprised by the computer which has CPU and memory, for example, and performs said control when a computer operate | moves according to the program installed in the computer.

  When performing a drawing process in such a pattern drawing apparatus 1, pulse light is emitted from each of the optical heads 32a, 32b,..., 32g while moving the stage 10 in the main scanning direction and the sub-scanning direction according to the inputted drawing data. Irradiate to draw a pattern on the substrate 9. Specifically, first, pulse light is irradiated from each of the optical heads 32a, 32b,..., 32g while moving the stage 10 in the main scanning direction. Thus, a plurality of patterns are drawn on the upper surface of the substrate 9 in the main scanning direction with a predetermined exposure width (for example, 50 mm width). When one drawing in the main scanning direction is completed, the pattern drawing apparatus 1 moves the stage 10 by the exposure width in the sub-scanning direction, and moves the stage 10 in the main scanning direction again while moving the optical heads 32a, 32b, ..., 32g is irradiated with pulsed light. As described above, the pattern drawing apparatus 1 repeats drawing in the main scanning direction a predetermined number of times (for example, four times) while shifting the substrate 9 in the sub-scanning direction by the exposure width of the optical heads 32a, 32b,. Then, a color filter pattern is drawn on the substrate 9.

<2. Operation during aperture replacement>
Subsequently, regarding the operation when the aperture AP mounted on each of the optical heads 32a, 32b,..., 32g is replaced in the pattern drawing apparatus 1, refer to the flowchart of FIG. 11 and the operation state diagrams of FIGS. However, it will be explained. In the operation state diagrams of FIGS. 12 to 22, the used aperture AP is indicated by a solid rectangle, and the replacement aperture AP is indicated by a hatched rectangle.

  When replacing the aperture AP in the pattern drawing apparatus 1, first, the operator removes the cassette unit 43 from the lifting platform 44, and places replacement aperture APs on the seven stages of the second storage unit 432 of the cassette unit 43. insert. Then, the operator sets the cassette unit 43 on the lifting platform 44 (step S1). The operator sets the cassette unit 43 in a predetermined direction (for example, the direction in which the first storage unit 431 faces the + Y side). After the setting, the rotation mechanism 434 operates, and the first storage unit 431 moves the hand unit 41 side. The orientation of the cassette unit 43 is adjusted so that it faces. Thereafter, the operator inputs a predetermined instruction to the control unit 50, and based on the instruction input, the pattern drawing apparatus 1 starts automatic aperture AP replacement processing.

  First, the pattern drawing apparatus 1 adjusts the height position of the cassette unit 43 by the lifting mechanism 434 (step S2). Thereby, the uppermost stage of the 1st accommodating part 431 is positioned in the height equivalent to the hand part 41, and the 1st accommodating part 431 will be in the state which waits for insertion of aperture AP to an uppermost stage. Next, the aperture exchange unit 40 operates the traversing mechanism 422 to move the hand unit 41 to a position further to the −X side than the optical head 32g closest to the −X side (step S3, state of FIG. 12). Thereafter, the optical head 32g advances the aperture unit 36 in the −Y direction by the advance / retreat mechanism 364 (step S4, state of FIG. 13). At this time, since the hand unit 41 is located on the −X side with respect to the optical head 32g, the aperture unit 36 and the hand unit 41 do not interfere with each other.

  The aperture unit 36 that has advanced to the −Y side retracts the contact pin 363 by the contact pin drive unit 363a (see FIG. 3), and releases the fixation of the aperture AP. On the other hand, the aperture exchanging unit 40 moves the hand unit 41 closer to the aperture unit 36 and inserts the holding claws 411 and 412 into the notch 361 of the mounting table 361, and holds the aperture AP on the mounting table 361 with the holding claw 411. Pick and hold at 412 (step S5, state of FIG. 14). Then, the aperture exchanging unit 40 slightly raises the hand unit 41 and retracts in the −X direction, and takes out the aperture AP from the aperture unit 36 (step S6).

  When the aperture AP is taken out from the aperture unit 36, the optical head 32g moves the aperture unit 36 backward by the advance / retreat mechanism 364 (step S7, state of FIG. 15). As a result, a transport path for the aperture AP is secured between the hand unit 41 and the cassette unit 43. Thereafter, the aperture exchanging unit 40 moves the hand unit 41 in the + X direction and transports the aperture AP to the cassette unit 43 (step S8). When the hand unit 41 approaches the cassette unit 43, the aperture AP is inserted into the uppermost stage of the first storage unit 431, the aperture AP is slightly lowered, and the aperture AP is released from being held, so that the aperture AP is guided to the guide unit 433. Place it on top (step S9, state of FIG. 16).

  When the aperture AP is stored in the uppermost stage of the first storage unit 431, the hand unit 41 temporarily retracts to the −X side. And the cassette part 43 is rotated by the rotation mechanism 433, and the 2nd accommodating part 432 is switched to the state which faces the hand part 41 side (step S10, state of FIG. 17). Thereafter, the hand unit 41 again approaches the cassette unit 43 and holds the replacement aperture AP stored in the uppermost stage of the second storage unit 432 with the holding claws 411 and 412 (the state shown in FIG. 18). Then, the aperture AP is taken out from the second storage portion 432 by slightly raising the hand portion 41 and retracting the hand portion 41 to the −X side (step S11).

  When the aperture AP is taken out from the second storage unit 432, the hand unit 41 moves to the position on the −X side of the optical head 32g, thereby transporting the aperture AP in the −X direction (step S12, FIG. 19). Status). Then, the optical head 32g advances the aperture unit 36 in the −Y direction by the advance / retreat mechanism 364 (step S13, state of FIG. 20).

  The aperture exchanging unit 40 causes the hand unit 41 to approach the aperture unit 36 advanced in the −Y direction, lowers the hand unit 41 slightly, and releases the holding of the aperture AP, thereby bringing the aperture AP onto the mounting table 361. Place (step S14, state of FIG. 21). The aperture unit 36 fixes the aperture AP by moving the pair of contact pins 363 forward. Thereafter, the hand unit 41 is retracted in the −X direction, the aperture unit 36 is retracted in the + Y direction, and the aperture AP replacement process for the optical head 32g is completed (step S15, state of FIG. 22).

  When the aperture AP replacement process for the optical head 32g is completed, the pattern drawing apparatus 1 rotates the cassette unit 43 by the rotation mechanism 433 and switches the first storage unit 431 to the hand unit 41 side (step). S16). Then, returning to step S <b> 2, the height position of the cassette unit 43 is adjusted so that the second step from the top of the first storage unit 431 has the same height as the hand unit 41. Thereafter, the operations of steps S3 to S16 are performed again for the optical head 32f, and the aperture AP replacement process for the optical head 32f is performed.

  Thereafter, the same operation is sequentially performed on the remaining optical heads 32e, 32d, 32c, 32b, and 32a while raising the height position of the cassette unit 43 step by step, and the aperture AP mounted on each optical head is replaced. I do. As a result, the used aperture AP taken out from the optical heads 32g, 32f, 32e, 32d, 32c, 32b, and 32a is stored in the first storage unit 431 of the cassette unit 43 in order from the top. Further, the replacement aperture AP is taken out in order from the upper stage of the second storage portion 432 and mounted on each aperture unit 36 of the optical heads 32g, 32f, 32e, 32d, 32c, 32b, and 32a. Then, when the aperture AP replacement process is completed for all the optical heads 32a to 32g, the pattern drawing apparatus 1 ends the aperture AP automatic replacement process.

  As described above, the pattern drawing apparatus 1 is mounted on each of the optical heads 32a, 32b,..., 32g by operating the aperture exchanging unit 40 and the aperture unit 36 based on commands from the control unit 50. Aperture AP replacement processing is performed. Specifically, the hand AP 41 is moved along the plurality of optical heads 32a to 32g, and the hand AP 41 is moved toward and away from the aperture unit 36 advanced to the −Y side. I do. For this reason, the aperture AP can be exchanged automatically and efficiently, and contamination of the aperture AP can be prevented.

  Further, the hand portion 41 of the pattern drawing apparatus 1 holds the aperture AP by gripping the end portion of the aperture AP with the pair of holding claws 411 and 412. For this reason, the aperture AP can be delivered without inserting the hand portion 41 to a deep position of the aperture unit 36 and the cassette portion 43.

<3. Modification>
As mentioned above, although one Embodiment of this invention was described, this invention is not limited to said example. For example, the pattern drawing apparatus 1 has realized the operation of each unit by a mechanism using a combination of a motor and a ball screw, or a mechanism using a linear motor. The structure which implement | achieves operation | movement may be sufficient.

  In the pattern drawing apparatus 1, the aperture unit 36 is advanced to the −Y side by the advance / retreat mechanism 364, and the hand unit 41 is brought close to the aperture unit 36 using the traversing mechanism 422 of the hand moving mechanism 42. However, such an operation relationship is not necessarily required. For example, a mechanism for moving the hand unit 41 back and forth in the main scanning direction is added, and the hand unit 41 is approached from the −Y side into the aperture unit 36 that is stationary in each of the optical heads 32a, 32b,. May be.

  In the pattern drawing apparatus 1 described above, the cassette unit 43 has the two storage units 431 and 432. However, the storage unit 431 may be one and can rotate around the shaft 433b. The structure provided with three or more storage parts may be sufficient.

  Moreover, although said pattern drawing apparatus 1 has seven optical heads 32a-32g, the number of optical heads is not limited to seven. In addition, the pattern drawing apparatus 1 described above is targeted for processing the glass substrate 9 for color filters, but other than glass substrates for TFT (Thin Film Transistor), semiconductor substrates, printed boards, glass substrates for plasma display devices, and the like. The substrate to be processed may be used.

It is a side view of the pattern drawing apparatus which concerns on one Embodiment of this invention. It is the top view which looked at the pattern drawing apparatus from the II-II position of FIG. It is the top view which showed the detail of the aperture unit. It is the side view which showed schematic structure of the advance / retreat mechanism. It is the side view which looked at the vicinity of a hand part and a hand movement mechanism from the + Y side. It is a top view of the vicinity of a hand part and a hand moving mechanism. It is the longitudinal cross-sectional view which cut | disconnected the cassette part along XZ plane. It is the longitudinal cross-sectional view which cut | disconnected a pair of guide part along the YZ plane. It is the figure which showed the structure of the drive mechanism attached to the cassette part. It is the block diagram which showed the connection structure between each part and control part of a pattern drawing apparatus. It is the flowchart which showed the flow of operation | movement when exchanging an aperture. It is an operation state figure when exchanging an aperture. It is an operation state figure when exchanging an aperture. It is an operation state figure when exchanging an aperture. It is an operation state figure when exchanging an aperture. It is an operation state figure when exchanging an aperture. It is an operation state figure when exchanging an aperture. It is an operation state figure when exchanging an aperture. It is an operation state figure when exchanging an aperture. It is an operation state figure when exchanging an aperture. It is an operation state figure when exchanging an aperture. It is an operation state figure when exchanging an aperture.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Pattern drawing apparatus 9 Board | substrate 10 Stage 20 Stage drive part 30 Head part 32a-32g Optical head 36 Aperture unit 40 Aperture exchange part 41 Hand part 42 Hand moving mechanism 43 Cassette part 361b Notch part 362,363 Contact pin 364 Advance / Retreat mechanism 411, 412 Holding claws 421 Lifting mechanism 422 Traversing mechanism 431 First storage part 432 Second storage part 433 Guide part 434 Rotating mechanism 435 Lifting mechanism 50 Control part AP aperture

Claims (9)

In a pattern drawing apparatus that draws a pattern on the surface of a substrate by irradiating light toward the substrate from a plurality of optical heads arranged along a predetermined direction,
Aperture holding means for holding an aperture member for transmitting light in a predetermined pattern shape in each of the plurality of optical heads;
Aperture replacement means for replacing the aperture member held by the aperture holding means;
With
The aperture exchange means is
A hand unit that conveys the aperture member while holding the aperture member;
Moving means for moving the hand unit in a direction parallel to the predetermined direction over at least a range in which the plurality of optical heads are arranged;
After the hand unit is moved to a position facing each of the plurality of aperture holding units by the moving unit, the hand unit is moved closer to and away from the aperture holding unit, thereby the aperture holding unit and the aperture holding unit. Control means for delivering the aperture member to and from the hand unit;
A pattern drawing apparatus comprising: The pattern drawing apparatus according to claim 1,
The pattern drawing apparatus, further comprising: advancing / retreating means for moving the aperture holding means back and forth between an irradiation position in the optical head and a position on a moving path of the hand unit. The pattern drawing apparatus according to claim 1 or 2,
The pattern drawing apparatus, wherein the hand unit holds the aperture member by gripping an end portion of the aperture member with a pair of holding claws. In the pattern drawing apparatus in any one of Claim 1- Claim 3,
The pattern drawing apparatus, wherein the aperture holding means has a notch for allowing the hand portion to enter. The pattern drawing apparatus according to any one of claims 1 to 4,
A pattern drawing apparatus, further comprising a cassette unit disposed on a moving path of the hand unit by the moving unit and storing an aperture member. The pattern drawing apparatus according to claim 5, wherein
The cassette unit is for storing a plurality of aperture members in multiple stages in the vertical direction,
A pattern drawing apparatus, further comprising elevating means for elevating and moving the cassette unit. In the pattern drawing apparatus according to claim 5 or 6,
The cassette unit has a plurality of storage units around a predetermined rotation axis,
A pattern drawing apparatus, further comprising a rotating means for rotating the cassette portion about the rotation axis. In the pattern drawing apparatus in any one of Claim 5 to Claim 7,
The cassette portion has guide portions for holding both end portions of the aperture member,
The pattern drawing apparatus, wherein the guide portion includes a placement surface on which both end portions of the aperture member are placed, and a tapered surface that rises outside the placement surface. In the pattern drawing apparatus in any one of Claim 1- Claim 8,
The pattern drawing apparatus, wherein the aperture holding means includes fixing release means for switching between a state of fixing the aperture member and a state of releasing the fixing of the aperture member.

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