JP2008107606A - Color filter for transflective liquid crystal display device and transflective liquid crystal display device using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a high-quality color filter for transflective liquid crystal display device which has high-luminance colored layer formed in a reflection light region and, when being used for a transflective liquid crystal display device, does not disturb alignment of liquid crystal. <P>SOLUTION: The color filter for transflective liquid crystal display device comprises: a transparent substrate; a transparent resin layer formed on the transparent substrate in a pattern shape; a colored layer formed so as to cover the transparent substrate and transparent resin layer; and light shielding parts which are formed on the transparent substrate and demarcate pixel parts, wherein a region in which the transparent substrate, the transparent resin layer and the colored layer are stacked is used as the reflection light region, and a region in which the transparent substrate and the colored layer are stacked is used as a transmission light region. The color filter for transflective liquid crystal display device is characterized in that the transparent resin layer is continuously formed over a plurality of pixel parts demarcated by the light shielding parts on the reflection light region and has recessed parts on regions where the light shielding parts are formed. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a color filter for a transflective liquid crystal display device used in a transflective liquid crystal display device and the like, and a transflective liquid crystal display device using the same.

  In recent years, a transflective liquid crystal display device utilizing external light reflection and backlight transmitted light has been developed as a liquid crystal display device. The transflective liquid crystal display device uses external light to display. The conventional reflective color liquid crystal display device is advantageous in that it also has a backlight and can perform display (transmission display) using the backlight even when the surroundings are dark.

  In such a transflective liquid crystal display device, since the number of times the transmitted light and the reflected light pass through the liquid crystal is different, in order to improve the visibility of the transmissive display and the reflective display, the transmitted light and the reflected light are used. However, it was necessary to adjust the distance through each liquid crystal. Therefore, for example, as shown in FIG. 3, the transparent resin layer 2 having a predetermined film thickness is formed only in the reflected light region (region indicated by r) used for reflective display in the transparent substrate 1, There is a method of adjusting the optical path difference between the reflected light region (region indicated by r) and the transmitted light region (region indicated by t) by forming the colored layer 3 so as to cover the transparent resin layer 2. Commonly used.

  However, in such a transflective liquid crystal display device, outside light that has entered in the reflected light region normally passes through the color filter twice, whereas in the transmitted light region, it usually passes through the color filter only once. In other words, there is a problem in that color characteristics are different between transmissive display and reflective display.

  In order to solve the above problems, the transmitted light region and the reflected light region are adjusted by adjusting the film thickness ratio between the colored layer formed in the transmitted light region and the colored layer formed in the reflected light region. Attempts have been made to control the color characteristics of the areas. Generally, when the thickness of the colored layer formed in the transmitted light region is compared with the thickness of the colored layer on the transparent resin layer formed in the reflected light region, The film thickness of the colored layer on the transparent resin layer needs to be formed thinner.

  In order to form a thinner colored layer on the transparent resin layer in the reflected light region, for example, in Patent Document 1, the transparent resin layer is divided into dots on the reflected light region in one pixel. Thereafter, a method of forming a colored layer by applying a colored layer forming coating solution on the divided transparent resin layer has been proposed. According to this method, since the colored layer forming coating solution applied on the transparent resin layer flows between the divided transparent resin layers, the colored layer forming coating solution applied on the transparent resin layer is a film. It can be reduced and a thinner colored layer can be formed on the transparent resin layer.

  However, when the transparent resin layer is divided into dots by using, for example, a photolithographic method, the degree of shoulder drop at the end of the transparent resin layer, that is, the degree of corner removal becomes large. Since the coating liquid for forming a colored layer applied on such a transparent resin layer follows the shape of the transparent resin layer, a colored layer having a low surface flatness is formed. Further, even in the colored layer portion formed by flowing the colored layer forming coating liquid between the transparent resin layers, the height from the substrate to the surface is the same as the colored layer formed on the transparent resin layer from the substrate to the surface. Since the height is lower than the height, the flatness of the colored layer surface is further lost. Therefore, when such a color filter for a transflective liquid crystal display device with extremely low flatness is used in a transflective liquid crystal display device, the orientation of the liquid crystal is disturbed and high-quality display becomes difficult. occured.

JP 2004-85986 A

  Therefore, the color of the colored layer formed in the reflected light region is high, and when used in a transflective liquid crystal display device, the color for a high quality transflective liquid crystal display device does not disturb the alignment of the liquid crystal. It is desirable to provide a filter.

  The present invention is formed on a transparent substrate, a transparent resin layer formed in a pattern on the transparent substrate, a colored layer formed so as to cover the transparent substrate and the transparent resin layer, and the transparent substrate. A region where the transparent substrate, the transparent resin layer, and the colored layer are laminated is used as a reflected light region, and the transparent substrate, the colored layer, Is a color filter for a transflective liquid crystal display device that uses a layered region as a region for transmitted light, and the transparent resin layer extends over a plurality of pixel portions defined by the light shielding unit on the reflected light region. Provided is a color filter for a transflective liquid crystal display device, which is continuously formed and has a concave portion on a region where the light shielding portion is formed.

According to the present invention, since the concave portion is formed on the transparent resin layer, when the colored layer is formed, the colored layer forming coating solution applied on the transparent resin layer is a transparent substrate in the transmitted light region. Since it flows not only above but also into the concave portion, it is possible to form a thinner colored layer on the transparent resin layer. Therefore, a color filter for a transflective liquid crystal display device with high brightness in the reflected light region can be obtained.
Further, according to the present invention, since the transparent resin layer has a concave portion and is formed continuously over a plurality of pixel portions, for example, when the transparent resin layer is formed by a photolithography method, the transparent resin layer is divided and formed. Compared to the case, the degree of shoulder drop at the end portion of the recess, that is, the degree of corner removal can be suppressed. Thereby, the flatness of the colored layer formed on the transparent resin layer can be made high, and when used in a liquid crystal display device, a high-quality color filter for a liquid crystal display device that does not disturb the alignment of the liquid crystal It becomes possible.
Furthermore, according to the present invention, since the concave portion of the transparent resin layer is provided on the region where the light shielding portion is formed, the colored layer is formed thin and flat on the transparent resin layer without affecting the display region. be able to. Thereby, a color filter for a transflective liquid crystal display device capable of high-quality color display can be provided.

  In the said invention, it is preferable that the depth of the recessed part in the said transparent resin layer exists in the range of 0.3 micrometer-4.0 micrometers. This is because a colored layer having a thinner and higher flatness can be formed on the transparent resin layer.

  The present invention also provides a transflective liquid crystal display device using the color filter for the transflective liquid crystal display device.

  According to the present invention, since the color filter for the transflective liquid crystal display device having a thin film thickness in the reflected light region and a high surface flatness is used, the brightness in the reflected light region is high. Thus, a transflective liquid crystal display device capable of high-quality display with little disturbance in the alignment of the liquid crystal can be obtained.

  According to the present invention, when used in a transflective liquid crystal display device, the color for the transflective liquid crystal display device is high in the brightness of the reflected light region and less disturbed in the alignment of the liquid crystal and capable of high quality display. There is an effect that a filter can be provided.

  The present invention relates to a color filter for a transflective liquid crystal display device and a transflective liquid crystal display device using the same. Each will be described separately below.

A. First, a color filter for a transflective liquid crystal display device according to the present invention will be described.
The color filter for a transflective liquid crystal display device of the present invention includes a transparent substrate, a transparent resin layer formed in a pattern on the transparent substrate, and a color formed so as to cover the transparent substrate and the transparent resin layer. A region formed on the transparent substrate and having a light-shielding portion for defining a pixel portion, and a region in which the transparent substrate, the transparent resin layer, and the colored layer are laminated is used as a region for reflected light. A color filter for a transflective liquid crystal display device using a region in which the transparent substrate and the colored layer are laminated as a region for transmitted light, wherein the transparent resin layer is shielded from light on the region for reflected light. It is formed continuously over a plurality of pixel portions defined by the portion, and has a concave portion on the region where the light shielding portion is formed.

  The color filter for a transflective liquid crystal display device of the present invention will be described with reference to the drawings. FIG. 1 is a schematic cross-sectional view showing an example of a region for reflected light in a color filter for a transflective liquid crystal display device of the present invention. As shown in FIG. 1, for example, the color filter for a transflective liquid crystal display device of the present invention includes a transparent substrate 1, a transparent resin layer 2 formed in a pattern on the transparent substrate 1, and the transparent resin layer 2. The transparent resin layer 2 formed in the reflected light region has a plurality of regions defined by the light shielding portions 4 on the reflected light region. And a concave portion 5 on the region where the light shielding portion 4 is formed. The region where the light shielding portion 4 is formed is a non-display region a, and the region where the pixel portion defined by the light shielding portion 4 is formed is a display region b.

  Generally, as a method of forming a thin colored layer on the reflected light region, a method of forming a transparent resin layer in a pattern on the reflected light region and applying a colored layer forming coating solution thereon It has been known. According to this method, the colored layer forming coating solution applied on the transparent resin layer flows down to the transmitted light region side, so that a thin colored layer is formed on the transparent resin layer. However, it has been difficult to form a desired colored layer with a small thickness only by moving the colored layer forming coating solution only in the direction of the transmitted light region.

  On the other hand, in the present invention, since the concave portion is formed on the transparent resin layer, the colored layer forming coating liquid applied on the transparent resin layer is formed in the concave portion and for transmitted light. It will flow down to the area side. As a result, the moving efficiency of the colored layer forming coating liquid applied on the transparent resin layer is increased compared to the case where the colored layer forming coating liquid is applied on the transparent resin layer on which no recess is formed. Is possible. Therefore, a desired colored layer having a thin film thickness can be formed on the transparent resin layer, and a color filter for a transflective liquid crystal display device with high brightness in the reflected light region can be obtained.

  Further, the transparent resin layer used in the present invention is continuously formed over a plurality of pixel portions in the reflected light region and has a recess. When such a transparent resin layer is formed by, for example, a photolithography method, the depth of the removed portion at the time of development is shallow compared to the case of forming a transparent resin layer divided into dots, so that the end portion of the recess is It is possible not to reach the display area. Therefore, when the colored layer is formed on the transparent resin layer, the colored layer in the display region can have high flatness, and when used in a liquid crystal display device, the quality of the liquid crystal is not disturbed. A color filter for a liquid crystal display device can be obtained.

Furthermore, according to the present invention, since the concave portion of the transparent resin layer is formed on the region where the light shielding portion is formed, that is, on the non-display region, the reflected light can be used without affecting the display region. A colored layer with a thin film thickness and high flatness can be formed over the region. Accordingly, it is possible to provide a color filter for a transflective liquid crystal display device capable of high-quality color display.
Hereafter, each structure of the color filter for transflective liquid crystal display devices of this invention is demonstrated in detail.

1. Transparent resin layer First, the transparent resin layer in this invention is demonstrated. The transparent resin layer in the present invention is formed in a pattern in a reflected light region on a transparent substrate, which will be described later, and is continuously formed over a plurality of pixel portions defined by a light shielding portion, which will be described later, on the reflected light region. And having a recess on the region where the light shielding portion is formed. Here, the transparent resin layer continuously formed over a plurality of pixel portions refers to a transparent resin layer formed so as to cover the transparent substrate and the light shielding portion without being interrupted on the reflected light region. For example, as shown in FIG. 1, it can be set as the transparent resin layer from which the light-shielding part 4 is not exposed from the bottom part of the recessed part 5. FIG.

The depth of the concave portion in the transparent resin layer is not particularly limited as long as the light shielding portion is not exposed, but in the present invention, it is preferably within a range of 0.3 μm to 4.0 μm, In particular, it is preferably in the range of 0.5 μm to 3.0 μm, particularly preferably in the range of 0.5 μm to 2.0 μm. If the depth of the concave portion is less than the above range, the colored layer forming coating liquid may not flow into the concave portion when the colored layer is formed, and thus may not be a thin colored layer. Because. Also, if the depth of the recess exceeds the above range, the end of the transparent resin layer tends to have a large shoulder drop shape, and the flatness of the colored layer in the reflected light region formed thereon tends to be low. Because there is.
The depth of the concave portion of the transparent resin layer is a distance from the surface of the transparent resin layer in the display region to the bottom of the concave portion (a distance indicated by h in FIG. 2).

The width of the concave portion in the transparent resin layer is preferably in the range of 3 μm to 40 μm, more preferably in the range of 5 μm to 30 μm, and particularly preferably in the range of 5 μm to 20 μm. When the width of the upper end portion of the concave portion is within the above range, the concave portion can be formed in the non-display area. This is because a color filter for a liquid crystal display device can be obtained.
In addition, as the width | variety of a recessed part here, as shown, for example in FIG. 2, the depth h (distance h from the surface of the transparent resin layer 2 in the display area to the bottom part of a recessed part) of the recessed part 5 mentioned above is 100%. In this case, the distance k is measured from the contact point between the straight line m drawn from the bottom surface of the concave portion 5 to a position corresponding to 90% of the depth h of the concave portion and the wall surface of the concave portion 5.

  Here, the depth and width of the recess as described above are calculated from a cross-section of a color filter for a transflective liquid crystal display device taken with a scanning electron microscope (SEM) or the like.

  Moreover, in this invention, it is preferable that the said recessed part has penetrated the transparent resin layer in the line width direction of the transparent resin layer. Thereby, when forming the colored layer, the colored layer forming coating liquid that has flowed in from the transparent resin layer can further flow down to the transmitted light region side.

  Further, the shape of the recess is not particularly limited, and may be, for example, a shape whose width decreases from the top to the bottom (for example, the shape of the recess 5 shown in FIG. 1), or from the top to the bottom. The shape of the same width may be sufficient.

  Further, the pattern of the transparent resin layer used in the present invention is not particularly limited as long as it is a pattern having a shape capable of forming a concave portion. For example, the pattern can be a mosaic shape, a triangle shape, a stripe shape, or the like. In the present invention, among these, a stripe shape is preferable.

  In addition, the film thickness of the transparent resin layer in the present invention is usually about 1.0 μm to 5.0 μm, more preferably about 2.0 μm to 4.5 μm, and particularly preferably about 2.5 μm to 3.5 μm. As a result, when the color filter for a transflective liquid crystal display device of the present invention is used in a transflective liquid crystal display device, the optical path difference between the reflected light region and the transmitted light region can be adjusted. is there. The film thickness of the transparent resin layer referred to here is the film thickness of the transparent resin layer formed in the display area, that is, the portion of the transparent resin layer where no recess is formed.

  The line width of the transparent resin layer in the present invention is appropriately determined according to the use of the transflective liquid crystal display device, etc., but is usually in the range of 20 μm to 150 μm, and in particular, 30 μm to 80 μm. It is preferable that it exists in the range of 35 micrometers-60 micrometers especially.

  The material used for the transparent resin layer is not particularly limited as long as it is transparent to the external light incident on the color filter for the transflective liquid crystal display device and the reflected light from which the external light is reflected. It is not a thing. Examples of the material used for such a transparent resin layer include photosensitive acrylic resin, photosensitive polyimide, positive resist, cardo resin, polysiloxane, benzocyclobutene, and the like.

2. Next, the light shielding part in the present invention will be described. The light shielding part in the present invention is formed on a transparent substrate and demarcates a pixel part. The region where such a light shielding portion is formed is a region which is a non-display region not related to display when the color filter for a transflective liquid crystal display device of the present invention is a transflective liquid crystal display device.

  The width of the light-shielding portion in the present invention is not particularly limited as long as it is the same as the width of the concave portion of the transparent resin layer described above or wider than the width of the concave portion. It is decided according to. The width of such a light-shielding portion is usually in the range of 3 μm to 40 μm, and preferably in the range of 5 μm to 20 μm. In addition, the measurement of the said width | variety can be performed by the method mentioned above.

  In addition, such a light shielding portion can be generally the same as that used as a light shielding portion of a color filter for a transflective liquid crystal display device. A thin metal film such as chromium of about 1000 to 2000 mm may be formed, and this thin film may be patterned. For example, carbon fine particles, metal oxides, inorganic pigments, organic pigments, etc. are shielded from light in a resin binder. For example, a method in which a layer containing conductive particles is formed by a photolithography method, a printing method, or the like may be used.

3. Next, the colored layer used in the present invention will be described. The colored layer used in the present invention is formed so as to cover the transparent resin layer and a transparent substrate to be described later, and is formed in each region of the reflected light region and the transmitted light region.

  The colored layer used in the present invention is usually formed with three colors of red (R), green (G), and blue (B). The colored pattern shape in the colored layer can be a known arrangement such as a stripe type, a mosaic type, a triangle type, or a four-pixel arrangement type, and the colored area can be arbitrarily set.

  In the present invention, when the thickness of the colored layer formed on the transparent resin layer, that is, the colored layer in the reflected light region is 1, the colored layer formed on the transparent substrate, that is, transmitted light. The thickness of the colored layer in the use area is preferably in the range of 1.4 to 7.0, particularly in the range of 2.0 to 3.3. This is because the color characteristics of the colored layer in the reflected light region and the transmitted light region can be adjusted.

  The specific thickness of the colored layer formed on the transparent resin layer is appropriately selected depending on the type of the colored layer and the like, and is usually within a range of 0.1 μm to 2.0 μm. In particular, it is preferably in the range of 0.2 μm to 1.0 μm.

  In addition, about the formation area of the colored layer in this invention, since it is the same as that of what is generally used as a colored layer of the color filter for transflective liquid crystal display devices, detailed description here is abbreviate | omitted.

4). Transparent substrate The transparent substrate used in the present invention is not particularly limited as long as it can form the transparent resin layer and the colored layer and is transparent to visible light. It can be the same as the transparent substrate used for the color filter for liquid crystal display devices.

  Specific examples of the transparent substrate include a non-flexible transparent rigid material such as quartz glass, Pyrex (registered trademark) glass, and synthetic quartz plate, or a flexible resin film or optical resin plate. The transparent flexible material etc. which have are mentioned.

5. Next, a color filter for a transflective liquid crystal display device according to the present invention will be described. FIG. 3 is a schematic sectional view showing a reflected light region portion and a transmitted light region portion in the color filter for a transflective liquid crystal display device of the present invention. As shown in FIG. 3, for example, the color filter for a transflective liquid crystal display device of the present invention includes a transparent substrate 1, a transparent resin layer 2 formed in a pattern on the transparent substrate 1, the transparent substrate 1 and It has a colored layer 3 formed so as to cover the transparent resin layer 2 and a light shielding part (not shown) formed on the transparent substrate 1, and the light shielding part on the transparent resin layer 2 A concave portion (not shown) is formed on the region where is formed. At this time, the transparent substrate 1, the transparent resin layer 2, and the colored layer 3 are laminated as the reflected light region r, and the transparent substrate 1 and the colored layer 3 are laminated. The transparent resin layer 2 is continuously formed over a plurality of pixel portions defined by the light shielding portions on the reflected light region r.

  Such a color filter for a transflective liquid crystal display device is not particularly limited as long as it has the transparent substrate, the colored layer, the transparent resin layer, and the light shielding portion, and has other configurations as necessary. It may be a thing. As such another configuration, for example, an arbitrary configuration can be adopted according to the use of the color filter for the transflective liquid crystal display device of the present invention, such as a protective layer formed on the colored layer.

6). Next, a method for manufacturing a color filter for a transflective liquid crystal display device according to the present invention will be described. The method for producing a color filter for a transflective liquid crystal display device of the present invention is not particularly limited as long as it is a method capable of producing a color filter for a transflective liquid crystal display device having the above-described configuration. As such a method, for example, a transparent resin layer that uses a color filter substrate for a transflective liquid crystal display device in which the light-shielding portion is formed on the transparent substrate, and forms the transparent resin layer in a reflected light region. Examples of the method include a forming step and a colored layer forming step of forming a colored layer so as to cover the transparent resin layer and the transparent substrate.
Hereinafter, each process of the manufacturing method of the color filter for transflective liquid crystal display devices in this invention is demonstrated.

(Transparent resin layer forming process)
In this step, examples of the method for forming the transparent resin layer include a method for forming the transparent resin layer by a photolithography method using a transparent resin layer forming coating solution containing a photosensitive resin. As such a method, for example, as shown in FIG. 4, a transparent resin layer-forming coating solution 2 is formed on a color filter substrate for a transflective liquid crystal display device in which a light shielding portion 4 is formed on a transparent substrate 1. '(FIG. 4 (a)) and the UV light 9 is applied to the transparent resin layer forming coating solution 2' using, for example, a photomask 8 provided with a shielding part 6 and an opening part 7 or the like. By irradiating, pattern exposure (FIG. 4 (b)) is performed, and the transparent resin layer 2 having the recess 5 is formed by developing (FIG. 4 (c)).

  In this step, the method for coating the transparent resin layer forming coating solution on the transparent substrate is not particularly limited, and examples thereof include general coating methods such as a spin coating method and a die coating method. Can do.

  Further, the material of the coating liquid for forming the transparent resin layer is not particularly limited, and is used when a transparent resin layer of a general color filter for a transflective liquid crystal display device is formed by a photolithography method. It can be similar to that.

  The photomask used in the pattern exposure in this step is not particularly limited as long as it can form a transparent resin layer having a recess having a desired depth and width. For example, FIG. As shown in (b), there can be mentioned one provided with a normal shielding part 6 and an opening 7. However, instead of the normal shielding part 6, a part of the light is shielded. You may use the shielding part (halftone mask) by which the transmittance | permeability was adjusted.

  In addition, the conditions for pattern exposure of the transparent resin layer forming coating solution are particularly limited as long as the concave portions of the obtained transparent resin layer can have the above-described depth and width. Instead, in a general method for manufacturing a color filter for a transflective liquid crystal display device, the exposure conditions for forming the transparent resin layer can be the same.

(Colored layer formation process)
In this step, the colored layer can be formed by, for example, applying a colored layer forming coating solution so as to cover the transparent substrate and the transparent resin layer, and then drying by reduced pressure drying or the like. . In this step, the method for applying the colored layer forming coating solution is not particularly limited, and examples thereof include general application methods such as a spin coating method and a die coating method. In addition, the material used for the colored layer forming coating liquid used at this time can be the same as that used for forming a colored layer of a general color filter for a transflective liquid crystal display device.

In this step, the colored layer forming coating solution applied on the transparent resin layer is applied between the concave portion of the transparent resin layer and the transmitted light during the period from application of the colored layer forming coating solution to drying. By flowing down to the use area, a thin colored layer can be formed on the transparent resin layer. Therefore, the colored layer forming coating solution is dried after a predetermined time has elapsed since the colored layer forming coating solution was applied. The predetermined time is a time until the coating liquid for forming a colored layer applied on the transparent resin layer becomes a coating film that becomes a target colored layer after drying.
Moreover, it does not specifically limit as a drying method of the coating liquid for colored layer formation in this process, For example, it can be set as general drying methods, such as reduced pressure drying.

B. Next, the transflective liquid crystal display device of the present invention will be described. The transflective liquid crystal display device of the present invention is not particularly limited as long as the color filter for the transflective liquid crystal display device described above is used. It can have the same configuration as the apparatus. Specifically, the color filter for a transflective liquid crystal display device, a counter substrate disposed opposite to the liquid crystal, liquid crystal sealed between the counter substrate, and external light formed in a pattern are used. It can be a thing which has a reflecting plate for reflecting.

  According to the present invention, since the color filter for the transflective liquid crystal display device is used, the orientation of the liquid crystal in the reflected light region sealed between the counter substrate and the color filter for the transflective liquid crystal display device is disturbed. Therefore, a transflective liquid crystal display device capable of high-quality color display with high brightness in the reflected light region can be obtained.

  The members used in the transflective liquid crystal display device can be the same as those used in a general transflective liquid crystal display device. Furthermore, the members used in the transflective liquid crystal display device are not limited to those described above. For example, an alignment film, an electrode layer, and the like can be appropriately provided as necessary.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

  The following examples illustrate the present invention more specifically.

[Example 1]
(Formation of light shielding part)
As a transparent substrate, a glass substrate (Corning Corporation 1317 glass) having a size of 300 mm × 400 mm and a thickness of 0.7 mm was prepared. This transparent substrate was washed according to a conventional method, and a chromium thin film (thickness 1600 mm) was formed on one side of the transparent substrate by sputtering. A positive photosensitive resist (OFPR-800 manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied on the chromium thin film, and exposed through a predetermined mask to form a resist pattern. Next, the chromium thin film was etched using this resist pattern as a mask to form a light-shielding portion having a line width of 20 μm.

(Formation of transparent resin layer)
Subsequently, a coating solution for forming a transparent resin layer having the following composition was applied and dried so as to cover the transparent substrate and the light shielding portion. This transparent resin layer-forming coating solution was exposed and developed through a predetermined photomask (a photomask having a shielding portion at a position corresponding to the recessed portion forming region and the transmitted light region). Then, it baked for 30 minutes at 230 degreeC, and formed the transparent resin layer which has a recessed part of depth 0.7micrometer and width | variety (k shown in FIG. 2) 10 micrometers on the area | region in which the light-shielding part was formed. At this time, the average film thickness of the transparent resin layer on the display region was 3.3 μm, and the line width was 50 μm. The width of the reflected light region was 50 μm, and the width of the transmitted light region was 55 μm.

<Coating liquid for forming transparent resin layer>
· Methyl methacrylate-styrene-methacrylic acid copolymer ··· 42 parts by weight · Epicoat 180s70 (Mitsubishi Yuka Shell Co., Ltd.) ··· 18 parts by weight · Pentaerythritol pentaacrylate ··· 32 parts by weight · Irgacure 907 (Ciba Specialty Chemicals) ··· 8 parts by weight · Propylene glycol monomethyl ether acetate ··· 300 parts by weight

(Formation of red colored layer)
A coating solution for forming a colored layer (negative photosensitive resin composition) for the red colored layer having the following composition was applied on the transparent substrate by a spin coating method so as to cover the transparent resin layer. Subsequently, exposure and development were performed using the red pattern photomask. Then, the red colored layer was formed by baking. The average thickness of the red colored layer in the reflected light region was 0.95 μm, and the average thickness of the red colored layer in the transmitted light region was 2.4 μm. Each said film thickness was computed from what image | photographed the cross-sectional shape of the red colored layer with the scanning electron microscope (SEM).

<Red colored layer forming coating solution>
Red pigment (Ciba Specialty Chemicals Chromophthal Red A2B) 4.8 parts by weight Yellow pigment (BASF Pariotor Yellow D1819) 1.2 parts by weight Dispersant (by Big Chemie) Dispersic 161) ... 3.0 parts by weight / monomer (SR399 manufactured by Sartomer) ... 4.0 parts by weight / polymer I ... 5.0 parts by weight / Irgacure 907 (Ciba Specialty Chemicals) ) ... 1.4 parts by weight- (2,2'-bis (o-chlorophenyl) -4,5,4 ', 5'-tetraphenyl-1,2'-biimidazole) ... 0.6 Parts by weight / propylene glycol monomethyl ether acetate 80.0 parts by weight * Polymer I is benzyl methacrylate: styrene: acrylic acid: 2-hydroxyethyl 2-methacryloyloxyethyl isocyanate is added in an amount of 16.9 mol% to 100 mol% of a copolymer of methacrylate = 15.6: 37.0: 30.5: 16.9 (molar ratio). The weight average molecular weight is 42500.

(Formation of green colored layer)
On the transparent substrate on which the red colored layer has been formed, a green colored layer-forming coating solution (negative photosensitive resin composition) for the green colored layer having the following composition is used to produce a green color in the same manner as the red colored layer. A colored layer was formed. The average thickness of the green colored layer in the reflected light region was 0.95 μm, and the average thickness of the green colored layer in the transmitted light region was 2.4 μm. The film thickness was calculated from the cross-sectional shape of the green colored layer taken with a scanning electron microscope (SEM) or the like.

<Coating liquid for forming green colored layer>
Green pigment (Avisia Monastral Green θY-C) 4.2 parts by weight Yellow pigment (BASF Pariotor Yellow D1819) 1.8 parts by weight Dispersant (Big Chemie Disper) BIC 161) ... 3.0 parts by weight / monomer (SR399, manufactured by Sartomer) ... 4.0 parts by weight / polymer I ... 5.0 parts by weight / Irgacure 907 (manufactured by Ciba Specialty Chemicals)・ ・ ・ 1.4 parts by weight ・ (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-biimidazole) ・ ・ ・ 0.6 weight Parts ・ Propylene glycol monomethyl ether acetate ・ ・ ・ 80.0 parts by weight

(Formation of blue colored layer)
Similar to the red colored layer on the transparent substrate on which the red colored layer and the green colored layer are formed, using a colored layer forming coating liquid (negative photosensitive resin composition) for the blue colored layer having the following composition: A blue colored layer was formed by the method described above. The average film thickness of the blue colored layer in the reflected light region was 0.95 μm, and the average film thickness of the blue colored layer in the transmitted light region was 2.4 μm. The film thickness was calculated from the cross-sectional shape of the blue colored layer taken with a scanning electron microscope (SEM) or the like.

<Blue colored layer forming coating solution>
-Blue pigment (BASF Heiogen Blue L6700F)-6.0 parts by weight-Pigment derivative (Avicia Solsperse 6000)-0.6 parts by weight-Dispersant (Bic Chemie Dispersic 161)- 2.4 parts by weight / monomer (SR399 manufactured by Sartomer Co., Ltd.) 4.0 parts by weight Polymer I 5.0 parts by weight Irgacure 907 (Ciba Specialty Chemicals) 1.4 Parts by weight · (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-biimidazole)... 0.6 parts by weight propylene glycol monomethyl ether Acetate: 80.0 parts by weight

[Example 2]
A color filter was formed in the same manner as in Example 1 except that the depth of the concave portion of the transparent resin layer was 2.6 μm and the width (k shown in FIG. 2) was 18 μm. At this time, the average thickness of the red colored layer, the green colored layer and the blue colored layer in the reflected light region is 0.93 μm, and the average of the red colored layer, the green colored layer and the blue colored layer in the transmitted light region The film thickness was 2.4 μm.

[Comparative Example 1]
A color filter was formed in the same manner as in Example 1 except that no concave portion was formed in the transparent resin layer. At this time, the average thickness of the red colored layer, the green colored layer and the blue colored layer in the reflected light region is 1.02 μm, and the average of the red colored layer, the green colored layer and the blue colored layer in the transmitted light region The film thickness was 2.4 μm.

[Evaluation]
In Example 1 and Example 2 in which the concave portion was formed in the transparent resin layer, compared with Comparative Example 1 in which the concave portion was not formed in the transparent resin layer, a colored layer (colored layer in the region for reflected light) was formed on the transparent resin layer. ) Could be formed thinly.

It is a schematic sectional drawing which shows an example of the color filter for transflective liquid crystal display devices of this invention. It is explanatory drawing for demonstrating the depth and width | variety of a recessed part in this invention. It is a schematic sectional drawing which shows an example of a structure of the color filter for transflective liquid crystal display devices of this invention. It is explanatory drawing for demonstrating the transparent resin layer formation process in this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Transparent substrate 2 ... Transparent resin layer 3 ... Colored layer 4 ... Light-shielding part 5 ... Recessed part t ... Transmitted light area r ... Reflected light area

Claims (3)

A transparent substrate; a transparent resin layer formed in a pattern on the transparent substrate; a colored layer formed so as to cover the transparent substrate and the transparent resin layer; and a pixel portion formed on the transparent substrate. A light shielding portion that defines the region, and a region where the transparent substrate, the transparent resin layer, and the colored layer are laminated is used as a region for reflected light, and the transparent substrate and the colored layer are laminated. A color filter for a transflective liquid crystal display device using the region as a region for transmitted light,
The transparent resin layer is formed continuously over a plurality of pixel portions defined by the light shielding portion on the reflected light region, and has a recess on the region where the light shielding portion is formed. A color filter for a transflective liquid crystal display device.   2. The color filter for a transflective liquid crystal display device according to claim 1, wherein a depth of the concave portion in the transparent resin layer is in a range of 0.3 μm to 4.0 μm.   A transflective liquid crystal display device comprising the color filter for a transflective liquid crystal display device according to claim 1.

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