JP2008093746A - Manufacturing method of plate-like body for holding polishing object - Google Patents

Manufacturing method of plate-like body for holding polishing object Download PDF

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JP2008093746A
JP2008093746A JP2006274957A JP2006274957A JP2008093746A JP 2008093746 A JP2008093746 A JP 2008093746A JP 2006274957 A JP2006274957 A JP 2006274957A JP 2006274957 A JP2006274957 A JP 2006274957A JP 2008093746 A JP2008093746 A JP 2008093746A
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sheet
plate
holes
thin plate
polishing
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Katsuharu Takahashi
克治 高橋
Minoru Yonekura
稔 米倉
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Resonac Corp
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Shin Kobe Electric Machinery Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a plate-like body suitable for constituting a holding member of a polishing object hardly adhering to an upper panel of a polishing device or clogged with a polishing agent for reducing the defect of the polishing object due to a line trouble and achieving homogeneous polishing of the polishing object. <P>SOLUTION: When a sheet of thermosetting resin impregnated sheet fiber substrate or a plurality of the overlapped sheets are heated and pressurized between templates to mold the plate-like body, a sheet-like thin plate with thickness of 150 μm or less while having through-holes dotted therein is arranged at least on one side of the sheet fiber substrate to be heated and pressurized, thereby giving the shapes of the through-holes to the molded plate-like body. Preferably, the thickness of the sheet-like thin plate dotted with through-holes is 40-150 μm, and the numerical aperture is 1-60%. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

シリコンウエハ,ハードディスクなどの製造工程には、これらの表面を研磨する工程がある。本発明は、前記研磨工程で、シリコンウエハ,ハードディスクなどの被研磨物を保持するための保持材に適用する成形板状体の製造法に関する。   The manufacturing process of silicon wafers and hard disks includes a process of polishing these surfaces. The present invention relates to a method for producing a shaped plate-like body applied to a holding material for holding an object to be polished such as a silicon wafer or a hard disk in the polishing step.

上記被研磨物保持材は、駆動用のギアを周囲に形成した円板に、被研磨物保持用の貫通穴を1個ないし複数個あけた構造である。前記貫通穴に被研磨物を嵌め込んで研磨装置に装着し、保持材を平面で駆動させることにより被研磨物の研磨を行なう。   The object to be polished holding material has a structure in which one or a plurality of through holes for holding the object to be polished are formed in a disk having a driving gear around it. The object to be polished is fitted into the through hole, mounted on a polishing apparatus, and the holding material is driven in a plane to polish the object to be polished.

従来、このような被研磨物保持材は、熱硬化性樹脂積層板を加工した板状体で構成されている。前記熱硬化性樹脂積層板は、ガラス繊維織布基材エポキシ樹脂積層板、アラミド繊維不織布基材エポキシ樹脂積層板、綿布基材フェノール樹脂積層板などである。被研磨物保持材を構成するための積層板は、一般に、無機物や有機物の粒子などを含有しない熱硬化性樹脂をガラス繊維織布やアラミド繊維不織布あるいは綿布等の基材に含浸乾燥してプリプレグとし、このプリプレグ1枚若しくは重ね合せた複数枚を加熱加圧成形して製造する。
これら積層板は、前記のように被研磨物保持材に加工され、シリコンウエハ,ハードディスクなどの研磨に使用される。
Conventionally, such an object holding material is constituted by a plate-like body obtained by processing a thermosetting resin laminate. The thermosetting resin laminate is a glass fiber woven fabric base epoxy resin laminate, an aramid fiber non-woven fabric base epoxy resin laminate, a cotton fabric base phenol resin laminate, or the like. Laminates for constituting the material to be polished are generally prepared by impregnating and drying a base material such as a glass fiber woven fabric, an aramid fiber nonwoven fabric or cotton cloth with a thermosetting resin containing no inorganic or organic particles. And one prepreg or a plurality of stacked prepregs are manufactured by heating and pressing.
These laminated plates are processed into a workpiece holding material as described above, and are used for polishing silicon wafers, hard disks and the like.

研磨作業は、上記被研磨物保持材を研磨装置に装着し、被研磨物保持材の貫通穴に被研磨物を保持し、シリカ(SiO),アルミナ(Al),セリア(CeO)などの微粒子を分散した水系研磨液を供給して行なわれる。
被研磨物保持材を新しいものと交換する場合など、被研磨物保持材を研磨装置に脱着する操作は、手作業もしくは自動機で行なわれるが、最近は、自動機で行なわれることが多くなってきた。また、研磨を終了した被研磨物の取出しと新たに研磨する被研磨物の供給も自動機で行なわれることが多くなってきた。また、最近の傾向として、従来より研磨粒子の小さなコロイダルシリカが多用されるようになりつつあり、研磨保持材が研磨装置の上盤に密着しやすい状況になってきた。
The polishing operation is performed by mounting the object to be polished on a polishing apparatus, holding the object to be polished in the through hole of the object to be polished, silica (SiO 2 ), alumina (Al 2 O 3 ), ceria (CeO). 2 ) and the like, and an aqueous polishing liquid in which fine particles are dispersed is supplied.
The operation of detaching the workpiece holding material from the polishing apparatus, such as when replacing the workpiece holding material with a new one, is performed manually or by an automatic machine, but recently, it has been frequently performed by an automatic machine. I came. In addition, the removal of a polished object that has been polished and the supply of a new object to be polished have been increasingly performed by an automatic machine. Further, as a recent trend, colloidal silica having small abrasive particles has been frequently used conventionally, and it has become a situation in which the polishing holding material tends to adhere to the upper plate of the polishing apparatus.

上述のように、研磨作業には水系研磨液を使用するために、被研磨物保持材は研磨装置の上盤に密着しやすい状況にある。被研磨物保持材の脱着や被研磨物の取出しに際し、被研磨物保持材が上盤に密着して上盤と共に持ち上げられてしまい、さらには被研磨物も一緒に持ち上げられることがある。このような事態は、被研磨物保持材の着脱や被研磨物の取出し・供給を手作業で行なう場合には大きな問題とはならないが、自動機で行なわせる場合にはライントラブルの原因となる。   As described above, since the water-based polishing liquid is used for the polishing operation, the object holding material is in a state of being in close contact with the upper plate of the polishing apparatus. When the object to be polished is attached or detached and the object to be polished is taken out, the object to be polished is in close contact with the upper board and lifted together with the upper board, and the object to be polished may also be lifted together. Such a situation does not pose a major problem when manually attaching / detaching an object holding material or taking out / supplying an object to be polished, but it causes a line trouble when an automatic machine is used. .

その対策として、熱硬化性樹脂含浸シート状繊維基材を熱可塑性樹脂製離型フィルムに挟み、型板の間で加熱加圧成形するに当たり、前記熱可塑性樹脂製離型フィルムの厚さを0.04mm〜0.1mmとし、当該離型フィルムと型板の間に織布を配置する被研磨物保持材用板状体の製造法が提案されている(特許文献1)。
上記のように加熱加圧成形することにより、成形中に軟化した熱可塑性樹脂製離型フィルムを通して板状体の表面に織布の織目を転写し、前記板状体の表面には、前記織目に対応した凹凸が付与されるものであり、研磨装置の上盤への密着防止に一応の効果は認められる。しかし、付与された凹凸の高さが30〜40μm程度であり、また凹凸の凹形状がなだらかであるため、研磨剤(スラリー)が前記凹凸に目詰まりすることにより研磨剤がスムーズに循環せず、被研磨物の研磨が不均一になるという欠点があった。
As a countermeasure, when the thermosetting resin-impregnated sheet-like fiber base material is sandwiched between thermoplastic resin release films and molded by heating and pressing between mold plates, the thickness of the thermoplastic resin release film is set to 0.04 mm. A method for producing a plate-like body for a workpiece holding material in which a woven fabric is disposed between the release film and the template is proposed (Patent Document 1).
By heating and pressing as described above, the texture of the woven fabric is transferred to the surface of the plate-like body through the release film made of thermoplastic resin softened during the molding, Irregularities corresponding to the texture are given, and a temporary effect is recognized in preventing adhesion to the upper plate of the polishing apparatus. However, since the height of the provided unevenness is about 30 to 40 μm and the uneven shape of the unevenness is gentle, the abrasive (slurry) clogs the unevenness so that the abrasive does not circulate smoothly. There is a drawback that the polishing of the object to be polished becomes non-uniform.

特開2004−314207号公報JP 2004-314207 A

本発明が解決しようとする課題は、研磨装置上盤と密着しにくく、また研磨剤が目詰まりしにくい被研磨物保持材を構成するのに適した板状体を提供し、ライントラブルによる被研磨物の不良を低減させるとともに、被研磨物の均一な研磨を達成することである。   The problem to be solved by the present invention is to provide a plate-like body suitable for constructing an object holding material that is difficult to adhere to the upper plate of the polishing apparatus and that is difficult to clog the abrasive, and is subject to line trouble. It is to reduce the defect of the polished object and achieve uniform polishing of the object to be polished.

上記課題を解決するために、本発明に係る方法は、以下のように被研磨物保持材用板状体を製造する。すなわち、熱硬化性樹脂を含浸したシート状繊維基材1枚若しくは重ね合せた複数枚を型板の間で加熱加圧して板状体を成形するに当たり、前記シート状繊維基材の少なくとも片側に、厚さが150μm以下であり、貫通穴が点在するシート状薄板を配置して加熱加圧し、前記貫通穴の形状を成形した板状体に付与することを特徴とする(請求項1)。前記貫通穴が点在するシート状薄板は、好ましくは、厚さが40〜150μmであり(請求項2)、開孔率が1〜60%である(請求項3)。   In order to solve the above-described problems, the method according to the present invention produces a plate-like body for an object holding material as follows. That is, in forming a plate-like body by heating and pressurizing one sheet-like fiber base impregnated with a thermosetting resin or a plurality of superposed sheets between mold plates, at least on one side of the sheet-like fiber base, A sheet-like thin plate having a thickness of 150 μm or less is disposed and heated and pressurized, and the shape of the through-hole is imparted to the molded plate-like body (claim 1). The sheet-like thin plate interspersed with the through holes preferably has a thickness of 40 to 150 μm (Claim 2) and a hole area ratio of 1 to 60% (Claim 3).

上記のように加熱加圧成形することにより、板状体の表面にシート状薄板の開孔パターンを転写する。前記板状体の表面には、前記シート状薄板の開孔部に対応した凹凸が付与される。
板状体の表面に付与される凹凸の高さは、シート状薄板の厚さに依存し、研磨装置の上盤への密着防止効果の持続性や被研磨物の研磨の均一性に影響する。シート状薄板の厚さが150μmを超えると、板状体の表面に付与される凹凸の高さが高すぎて、加熱加圧成形後の離型フィルムの離型性が悪化する。また、離型フィルムを離型する際に離型フィルムが破れることがある。このため、シート状薄板の厚さは150μm以下とする。また、好ましくは、シート状薄板の厚さを40〜150μmとする。厚さ40μm以上とすることにより、板状体の表面に十分な高さの凹凸を付与することができ、研磨装置の上盤への密着防止効果の持続性や被研磨物の研磨の均一性が良好となる。
The hole pattern of the sheet-like thin plate is transferred to the surface of the plate-like body by heating and pressing as described above. The surface of the plate-like body is provided with irregularities corresponding to the opening portions of the sheet-like thin plate.
The height of the unevenness imparted to the surface of the plate-like body depends on the thickness of the sheet-like thin plate, and affects the durability of the effect of preventing adhesion to the upper plate of the polishing apparatus and the polishing uniformity of the object to be polished. . If the thickness of the sheet-like thin plate exceeds 150 μm, the height of the unevenness imparted to the surface of the plate-like body is too high, and the releasability of the release film after heat and pressure molding is deteriorated. Moreover, when releasing a release film, a release film may be torn. For this reason, the thickness of a sheet-like thin plate shall be 150 micrometers or less. Moreover, Preferably, the thickness of a sheet-like thin plate shall be 40-150 micrometers. By setting the thickness to 40 μm or more, the surface of the plate-like body can be provided with a sufficiently high unevenness, the durability of the effect of preventing adhesion to the upper plate of the polishing apparatus, and the uniformity of polishing of the object to be polished Becomes better.

また、板状体の表面に付与される凹凸の面積比は、シート状薄板の開孔率に依存し、研磨装置の上盤への密着防止効果に影響する。シート状薄板の開孔率は、好ましくは、1〜60%とする。これにより、板状体の表面に十分な面積の凸部を付与することができ、研磨装置の上盤への密着防止効果が良好となる。ここで、開孔率とは、シート状薄板の単位面積中に占める貫通穴の面積の比率をいう。測定方法は、例えば、円形の場合は、貫通穴の直径を測定して面積を算出し、その穴数から開孔率を計算する。また、四角形の場合は、タテとヨコの長さを測定して面積を算出し、その穴数から開孔率を計算する。
前記貫通穴の大きさが小さいと、研磨中に凹凸が研磨され、研磨装置の上盤への密着防止効果の持続が少なくなる。また、貫通穴の大きさが大きいと、研磨剤がスムーズに循環せず、被研磨物の研磨が不均一になる。このため、例えば、円形の場合はφ0.3〜30mm、四角形の場合は、0.3×0.3〜30×30mmが好ましい。
Moreover, the area ratio of the unevenness | corrugation provided on the surface of a plate-shaped body is dependent on the aperture ratio of a sheet-like thin plate, and influences the contact | adherence prevention effect to the upper board of a grinding | polishing apparatus. The aperture ratio of the sheet-like thin plate is preferably 1 to 60%. Thereby, the convex part of sufficient area can be provided to the surface of a plate-shaped object, and the contact | adherence prevention effect to the upper board of a grinding | polishing apparatus becomes favorable. Here, the hole area ratio refers to the ratio of the area of the through hole in the unit area of the sheet-like thin plate. For example, in the case of a circular shape, the diameter of the through hole is measured to calculate the area, and the hole area ratio is calculated from the number of holes. In the case of a quadrangle, the area is calculated by measuring the lengths of the vertical and horizontal sides, and the hole area ratio is calculated from the number of holes.
If the size of the through hole is small, the irregularities are polished during polishing, and the effect of preventing adhesion to the upper plate of the polishing apparatus is reduced. Further, if the size of the through hole is large, the abrasive does not circulate smoothly, and the polishing of the object to be polished becomes uneven. Therefore, for example, φ0.3 to 30 mm is preferable in the case of a circle, and 0.3 × 0.3 to 30 × 30 mm in the case of a rectangle.

上記板状体を所定形状に加工して被研磨物保持材とするわけであるが、表面層に上記の凹凸をもつ被研磨物保持材が、研磨装置の上盤に密着しにくい理由は、以下のように考えられる。
被研磨物保持材の表面に、凹凸がある場合、表面が全くフラットで平滑な場合と比較して、被研磨物保持材が研磨パッドと接触して密着する面積が小さくなる。研磨パッドとキャリアとの間には極微量の空隙が存在していると考えられる。また、密着する強度が凹凸の場所によって変化し、不均一になる。従って、密着力を比較した場合、凹凸をもつ被研磨物保持材は全体としての密着力が低くなり、また、密着力の低い箇所から剥がれやすいので、研磨装置上盤に密着しにくくなっているのである。
The plate-like body is processed into a predetermined shape to obtain a workpiece holding material, but the reason why the workpiece holding material having the unevenness on the surface layer is difficult to adhere to the upper plate of the polishing apparatus is as follows. It is considered as follows.
When the surface of the object to be polished is uneven, the area where the object to be polished is in contact with and in close contact with the polishing pad is smaller than when the surface is completely flat and smooth. It is considered that a very small amount of air gap exists between the polishing pad and the carrier. In addition, the strength of adhesion varies depending on the location of the unevenness and becomes non-uniform. Therefore, when the adhesion force is compared, the material to be polished having unevenness has a low adhesion force as a whole, and is easily peeled off from a portion having a low adhesion force, so that it is difficult to adhere to the upper plate of the polishing apparatus. It is.

ここで、被研磨物保持材の表面に凹凸を付与した面を上面とし、反対面には凹凸を付与していない平滑な面を下面として、被研磨物保持材を研磨装置に装着した場合、表面が平滑な下面と比較して凹凸をもつ上面の密着力が低くなり、研磨装置の上盤への密着防止効果がより顕著になる。このため、シート状薄板の開孔パターンを転写する被研磨物保持材の面は、両面よりも片面のみとするほうが好ましい。
また、被研磨物保持材の表面に凹凸を付与した面を上面とし、反対面には上面より開孔率の大きいシート状薄板により凹凸を付与した面を下面として、被研磨物保持材を研磨装置に装着した場合、凸部面積の大きい下面と比較して凸部面積の小さい上面の密着力が低くなり、研磨装置の上盤への密着防止効果がより顕著になる。このため、上面と下面で異なる開孔パターンをもつシート状薄板を配置して成形することが好ましい。
Here, when the surface of the workpiece holding material is provided with irregularities on the upper surface, the opposite surface is a smooth surface without irregularities on the lower surface, and the workpiece holding material is attached to the polishing apparatus, Compared with the lower surface having a smooth surface, the adhesion force of the upper surface having irregularities is lowered, and the effect of preventing adhesion to the upper plate of the polishing apparatus becomes more remarkable. For this reason, it is preferable that the surface of the workpiece holding material to which the hole pattern of the sheet-like thin plate is transferred is only one side rather than both sides.
Also, the surface of the workpiece holding material is polished on the surface, and the surface of the workpiece is polished on the opposite surface, and the surface on which the surface roughness is given by a sheet-like thin plate having a larger porosity than the upper surface is used as the lower surface. When mounted on the apparatus, the adhesion force of the upper surface having a small convex area is lower than that of the lower surface having a large convex area, and the effect of preventing the adhesion of the polishing apparatus to the upper plate becomes more prominent. For this reason, it is preferable to arrange and form sheet-like thin plates having different opening patterns on the upper surface and the lower surface.

さらに、織布の織目を転写した場合に比べて均一な研磨が得られる理由は、以下のように考えられる。
織布の場合、一般的に、横糸と縦糸を交互に織り込んであるため、それを転写した場合、凹凸の凹形状がなだらかであるため、スラリーがスムーズに循環せずに滞留する場合がある。それに対して、貫通穴が点在するシート状薄板を転写させた場合は、開孔部に樹脂が入り込み凸部となり、その他の凹部はフラットで平面を形成している。したがって、スラリーが凹部の平面部分をスムーズに循環することにより均一な研磨が得られるのである。
Further, the reason why uniform polishing can be obtained as compared with the case where the texture of the woven fabric is transferred is considered as follows.
In the case of a woven fabric, generally, wefts and warp yarns are alternately woven, and when transferred, the concave and convex shape of the irregularities is gentle, so that the slurry may stay without circulating smoothly. On the other hand, when a sheet-like thin plate interspersed with through-holes is transferred, the resin enters the opening portion to form a convex portion, and the other concave portions are flat and form a flat surface. Therefore, uniform polishing can be obtained by smoothly circulating the slurry through the flat portion of the recess.

従来技術の織布により被研磨物保持材表面に凹凸を付与する方法では、研磨装置の上盤への密着防止効果はあるが、凹凸のピッチが短く、また凹凸の凹形状がなだらかであるため、キャリアとパッド間にスラリーが均一に循環せず、均一な研磨が得られにくい。   The method of providing unevenness on the surface of the workpiece holding material with the woven fabric of the prior art has an effect of preventing adhesion to the upper plate of the polishing apparatus, but the pitch of the unevenness is short and the uneven shape of the unevenness is gentle. The slurry does not circulate uniformly between the carrier and the pad, and uniform polishing is difficult to obtain.

しかし、本発明に係る製造法においては、熱硬化性樹脂を含浸したシート状繊維基材を加熱加圧成形して被研磨物保持材用板状体を製造するに当たり、前記シート状繊維基材の少なくとも片側に、厚さが150μm以下であり、貫通穴が点在するシート状薄板を配置して、前記貫通穴の形状を成形した板状体に付与したので、研磨装置上盤と密着しにくく、かつ、均一な研磨を行う被研磨物保持材を構成するのに適した板状体を提供することができる。   However, in the production method according to the present invention, the sheet-like fiber base material is produced by subjecting the sheet-like fiber base material impregnated with the thermosetting resin to heat-press molding to produce a plate-like body for a material to be polished. A sheet-like thin plate having a thickness of 150 μm or less and interspersed with through-holes is disposed on at least one side of the plate, and the shape of the through-hole is imparted to the molded plate-like body. It is difficult to provide a plate-like body that is difficult and that is suitable for constituting a workpiece holding material that performs uniform polishing.

密着を効果的に防止し、かつ均一な研磨を得るためには、貫通穴が点在するシート状薄板で付与する凹凸の高さを制御することが必要である。凹凸の高さの上限は特に限定するものではないが、研磨パッドの材質と表面状態、および被研磨物の厚みから適宜選択することができる。凹凸高さは、シート状薄板の厚みと相関があるので、適切にシートの厚みを選定する。
また、パッド密着防止の効果は凹凸の高さだけでなく、凹部と凸部の面積比にも依存する。パッドに密着する部分の面積は多すぎても少なすぎても密着防止の効果は十分に得られないため、密着防止の効果を考慮し、適宜選択することができる。凹凸の面積比は、シート状薄板の開孔率(単位面積中の開孔部分の面積比率)と相関があるので、適切に開孔率を選定する。
In order to effectively prevent adhesion and obtain uniform polishing, it is necessary to control the height of the unevenness imparted by the sheet-like thin plate interspersed with through holes. The upper limit of the height of the unevenness is not particularly limited, but can be appropriately selected from the material and surface state of the polishing pad and the thickness of the object to be polished. Since the uneven height has a correlation with the thickness of the sheet-like thin plate, the thickness of the sheet is appropriately selected.
In addition, the effect of preventing pad adhesion depends not only on the height of the unevenness but also on the area ratio between the concave and convex portions. If the area of the portion that is in close contact with the pad is too large or too small, the effect of preventing adhesion cannot be obtained sufficiently, and can be appropriately selected in consideration of the effect of preventing adhesion. The area ratio of the unevenness has a correlation with the hole area ratio of the sheet-like thin plate (the area ratio of the hole area in the unit area), so the area ratio is appropriately selected.

上述のように、本発明に係る製造法は、熱硬化性樹脂を含浸したシート状繊維基材を加熱加圧成形して被研磨物保持材用板状体を製造するに当たり、前記シート状繊維基材の少なくとも片側に、厚さが150μm以下であり、貫通穴が点在するシート状薄板を配置して、前記貫通穴の形状を成形した板状体に付与することを特徴とする。
シート状繊維基材は、ガラス繊維やアラミド繊維の織布又は不織布あるいは綿布など、被研磨物保持材を構成可能なシート状繊維基材であれば特に限定するものではない。しかし、有機繊維シート状繊維基材を選択した被研磨物保持材に対しては、特に研磨装置上盤への密着防止の効果が顕著になる。なぜなら、被研磨物保持材を構成する樹脂が同じであるならシート状繊維基材の種類に拘わらず研磨装置上盤と被研磨物保持材との密着力は同程度であるが、有機繊維シート状基材を使用した被研磨物保持材は比較的軽量であるため、研磨装置上盤に密着すると一緒に持ち上げられやすいからである。
As described above, in the production method according to the present invention, the sheet-like fiber is used for producing a plate-like body for a workpiece holding material by heat-pressing a sheet-like fiber base impregnated with a thermosetting resin. A sheet-like thin plate having a thickness of 150 μm or less and dotted with through holes is disposed on at least one side of the base material, and the shape of the through holes is imparted to the molded plate-like body.
The sheet-like fiber base material is not particularly limited as long as it is a sheet-like fiber base material that can constitute the material to be polished, such as a woven or non-woven fabric or cotton cloth of glass fiber or aramid fiber. However, the effect of preventing adhesion to the upper plate of the polishing apparatus is particularly remarkable for the workpiece holding material in which the organic fiber sheet fiber substrate is selected. Because, if the resin constituting the material to be polished is the same, the adhesion between the polishing apparatus upper plate and the material to be polished is almost the same regardless of the type of the sheet-like fiber base material, but the organic fiber sheet This is because an object holding material using a shaped substrate is relatively lightweight and is easily lifted together with the upper surface of the polishing apparatus.

シート状繊維基材に含浸する熱硬化性樹脂は、フェノール樹脂,エポキシ樹脂,ポリエステル,ポリイミドなどであり特に限定するものではない。しかし、フェノール樹脂やポリイミドなど、比較的耐熱性の高い熱硬化性樹脂(例えば、ベンゼン核など接着に直接関与しない部分を分子骨格に高密度で有している樹脂)は、樹脂自体は硬いものの、接着性が比較的低いため研磨時に基材と樹脂の界面剥離が発生しやすかったり、樹脂自体の破壊・摩耗が起こりやすい。このようなことから、熱硬化性樹脂としてエポキシ樹脂を使用することが好ましい。   The thermosetting resin impregnated into the sheet-like fiber base material is not particularly limited, and may be phenol resin, epoxy resin, polyester, polyimide, or the like. However, thermosetting resins with relatively high heat resistance such as phenol resin and polyimide (for example, resins having a high density in the molecular skeleton such as a benzene nucleus), although the resin itself is hard Since the adhesiveness is relatively low, peeling of the interface between the base material and the resin is likely to occur during polishing, or the resin itself is liable to be destroyed or worn. For this reason, it is preferable to use an epoxy resin as the thermosetting resin.

貫通穴が点在するシート状薄板の材質は、加熱加圧成形時に溶融、変形したり破損したりしない程度の耐熱性と強度を有していればよく、金属(SUS、鉄など)、プラスチック(ポリエステル、ナイロン、ポリプロピレン、フッ素樹脂、エンプラなど)などであるが特に限定するものではない。金属製のシート状薄板に開孔部を設ける方法としては、金型による打ち抜き孔あけが一般的であり、プラスチック製のシート状薄板に開孔部を設ける方法としては、金型による打ち抜き孔あけと加熱された針による孔あけのいずれでもよい。所定の規則的な形状に孔があけばよく、特に限定するものではないが、打ち抜きの場合、抜きかすが発生し、それがフィルムに残留して悪影響を及ぼすことがあるので加熱された針による孔あけのほうが好ましい。ここで、加熱された針の温度が低いと、針の抜き差しがスムーズにいかない。また、加熱された針の温度が高いと、所望の大きさよりも大きな貫通穴が開いてしまう。このため、使用するプラスチックシートの溶融温度+10℃が好ましい。   The material of the sheet-like thin plate interspersed with through-holes is only required to have heat resistance and strength that does not melt, deform or break during heat and pressure molding, and is made of metal (SUS, iron, etc.), plastic (Polyester, nylon, polypropylene, fluororesin, engineering plastic, etc.) are not particularly limited. As a method of providing an opening in a metal sheet-shaped thin plate, punching by a mold is common, and as a method of providing an opening in a plastic sheet-shaped thin plate, a punching by a die is used. And drilling with a heated needle. It is only necessary to make a hole in a predetermined regular shape, and it is not particularly limited. However, in the case of punching, a hole is generated by a heated needle because it may cause debris to remain on the film and have an adverse effect. Opening is preferred. Here, when the temperature of the heated needle is low, the insertion and removal of the needle does not go smoothly. Moreover, when the temperature of the heated needle is high, a through hole larger than a desired size is opened. For this reason, the melting temperature of the plastic sheet to be used is preferably + 10 ° C.

加熱加圧成形時には、シート状繊維基材と貫通孔が点在するシート状薄板の間に離型フィルムを配置する。使用する離型フィルムは、成形時の熱履歴に耐え、成形後離型可能な材料からなるものであれば特に限定しない。ポリメチルペンテンフィルム、フッ素樹脂フィルム、ポリプロピレンフィルムなどから、必要な耐熱性の度合いに応じて選定すればよい。
離型フィルムの厚さは、0.05mm〜0.06mmが好ましい。離型フィルム厚さが薄くなると、シート状薄板の開孔部形状に忠実に凹凸が形成される一方で、これに当接しているシート状薄板の開孔部の凹凸に引っ張られ破損する心配があり、離型フィルム厚さが厚くなると、破損の可能性は小さくなるが、シート状薄板の開孔部形状が離型フィルムに吸収されてしまい、板状体に凹凸が付与されにくくなるからである。
At the time of heat and pressure molding, a release film is disposed between the sheet-like fiber base material and the sheet-like thin plate interspersed with through holes. The release film to be used is not particularly limited as long as it is made of a material that can withstand the heat history during molding and can be released after molding. What is necessary is just to select from a polymethylpentene film, a fluororesin film, a polypropylene film, etc. according to a required degree of heat resistance.
The thickness of the release film is preferably 0.05 mm to 0.06 mm. When the release film thickness is reduced, irregularities are faithfully formed in the shape of the opening of the sheet-like thin plate, but there is a concern that it will be pulled and damaged by the irregularities of the opening of the sheet-like thin plate in contact therewith. Yes, as the release film thickness increases, the possibility of breakage decreases, but the shape of the opening of the sheet-like thin plate is absorbed by the release film, and it becomes difficult to provide unevenness to the plate-like body. is there.

上記板状体の加熱加圧成形は、プレス熱盤間で実施することができる。被研磨物の種類や厚さなど研磨条件により被研磨物の厚さは変わるが、これは、シート状繊維基材の厚さや重ね合せ枚数を変えることにより調整する。シート状繊維基材の外側に離型フィルム、貫通穴が点在するシート状薄板、型板の順に配置することによって凹凸を付与することができる。加熱加圧成形中に、シート状薄板の開孔部に離型フィルムを介して溶融した樹脂が入り込み、板状体はその部分が凸の形状を形成する。したがってそのシート状薄板の厚みによって凹凸高さを制御することができる。
なお、シート状繊維基材の外側に貫通穴が点在するシート状薄板を配置する際、シート状薄板と型板の間に離型フィルムを介在させてもよい。これにより、加熱加圧成形後の型板の汚れを防ぐことができる。
The heating and pressing of the plate-like body can be performed between press hot plates. The thickness of the object to be polished varies depending on the polishing conditions such as the type and thickness of the object to be polished, and this is adjusted by changing the thickness of the sheet-like fiber substrate and the number of sheets to be overlapped. Unevenness can be imparted by disposing the release film, the sheet-like thin plate dotted with through-holes, and the template in this order on the outside of the sheet-like fiber substrate. During the heat and pressure molding, the melted resin enters the opening of the sheet-like thin plate through the release film, and the plate-like body forms a convex shape. Therefore, the uneven height can be controlled by the thickness of the sheet-like thin plate.
In addition, when arrange | positioning the sheet-like thin plate in which a through-hole is scattered on the outer side of a sheet-like fiber base material, you may interpose a release film between a sheet-like thin plate and a template. Thereby, the stain | pollution | contamination of the template after heat-press molding can be prevented.

シート状繊維基材として、以下のものを準備した。
(アラミド繊維不織布基材)
パラ系アラミド繊維(ポリp−フェニレン3,4−ジフェニールエーテルテレフタラミド繊維)チョップ(繊維径:1.5デニール,繊維長:3mm,帝人製「テクノーラ」)を水中に分散して抄造し、これに水溶性エポキシ樹脂バインダ(ガラス転移温度110℃)をスプレーして加熱乾燥により単位質量60g/mの不織布とした。パラ系アラミド繊維/樹脂バインダの配合質量比は、90/10である。
The following were prepared as a sheet-like fiber base material.
(Aramid fiber nonwoven fabric substrate)
Para-aramid fiber (poly p-phenylene 3,4-diphenyl ether terephthalamide fiber) chop (fiber diameter: 1.5 denier, fiber length: 3 mm, Teijin's “Technola”) dispersed in water and made into paper This was sprayed with a water-soluble epoxy resin binder (glass transition temperature 110 ° C.), and heat dried to form a nonwoven fabric having a unit mass of 60 g / m 2 . The blending mass ratio of para-aramid fiber / resin binder is 90/10.

プリプレグとして、以下のものを準備した。
先ず、硬化剤としてジシアンジアミドを、また、硬化促進剤として2−エチル−4メチルイミダゾールを配合したビスフェノールA型エポキシ樹脂ワニスを準備する。
上記アラミド繊維不織布基材に、上記ワニスを含浸し加熱乾燥してプリプレグとした。プリプレグは、その1枚を加熱加圧成形したときの厚さが0.1mmになるように樹脂付着量を調整した。
The following were prepared as prepregs.
First, a bisphenol A type epoxy resin varnish containing dicyandiamide as a curing agent and 2-ethyl-4methylimidazole as a curing accelerator is prepared.
The aramid fiber nonwoven fabric substrate was impregnated with the varnish and dried by heating to obtain a prepreg. The amount of resin prepreg was adjusted so that the thickness when one of the prepregs was heated and pressed was 0.1 mm.

離型フィルムとしてポリプロピレン製フィルム(0.05mm)を、また、貫通穴が点在するシート状薄板として以下のものを準備した。ここで、貫通穴の形状は円形とし、大きさはφ3mmとした。
貫通穴が点在するシート状薄板A(厚さ:0.05mm、ポリプロピレンフィルム、孔あけ法:加熱針による孔あけ加工、開孔率3%)
貫通穴が点在するシート状薄板B(厚さ:0.1mm、SUS板、孔あけ法:金型による打ち抜き加工、開孔率5%)
貫通穴が点在するシート状薄板C(厚さ:0.15mm、SUS板、孔あけ法:金型による打ち抜き加工、開孔率5%)
貫通穴が点在するシート状薄板D(厚さ:0.05mm、ポリプロピレンフィルム、孔あけ法:加熱針による孔あけ加工、開孔率1%)
貫通穴が点在するシート状薄板E(厚さ:0.05mm、ポリプロピレンフィルム、孔あけ法:加熱針による孔あけ加工、開孔率60%)
貫通穴が点在するシート状薄板F(厚さ:0.3mm、SUS板、孔あけ法:金型による打ち抜き加工、開孔率5%)
貫通穴が点在するシート状薄板G(厚さ:0.025mm、ポリプロピレンフィルム、孔あけ法:加熱針による孔あけ加工、開孔率3%)
貫通穴が点在するシート状薄板H(厚さ:0.05mm、ポリプロピレンフィルム、孔あけ法:加熱針による孔あけ加工、開孔率0.5%)
貫通穴が点在するシート状薄板I(厚さ:0.05mm、ポリプロピレンフィルム、孔あけ法:加熱針による孔あけ加工、開孔率70%)
実施例1
プリプレグ10枚を重ね合せた両側に離型フィルム(0.05mm厚)を配置し、これを型板に挟む。このとき、両側の離型フィルムと型板の間には貫通穴が点在するシート状薄板Aを介在させる。この構成物をプレス熱盤間に投入し、熱盤との間にはクラフト紙層からなる厚さ10mmのクッション材を配置して加熱加圧成形し、厚さ1.0mmの積層板を得た。
この積層板を被研磨物保持材に加工した。この被研磨物保持材は、周囲にギアを形成した直径10インチの円板であり、被研磨物を嵌め込むための直径3.5インチの貫通穴を4個設けたものである。
A polypropylene film (0.05 mm) was prepared as a release film, and the following were prepared as sheet-like thin plates dotted with through holes. Here, the shape of the through hole was circular, and the size was 3 mm.
Sheet-like thin plate A dotted with through-holes (thickness: 0.05 mm, polypropylene film, drilling method: drilling with a heating needle, aperture ratio 3%)
Sheet-like thin plate B interspersed with through-holes (thickness: 0.1 mm, SUS plate, drilling method: punching with a mold, opening rate 5%)
Sheet-like thin plate C interspersed with through-holes (thickness: 0.15 mm, SUS plate, drilling method: punching with a mold, opening rate 5%)
Sheet-like thin plate D interspersed with through-holes (thickness: 0.05 mm, polypropylene film, drilling method: drilling with a heating needle, aperture ratio 1%)
Sheet-like thin plate E interspersed with through holes (thickness: 0.05 mm, polypropylene film, drilling method: drilling with a heated needle, aperture ratio 60%)
Sheet-like thin plate F interspersed with through-holes (thickness: 0.3 mm, SUS plate, drilling method: punching with a mold, opening rate 5%)
Sheet-like thin plate G interspersed with through-holes (thickness: 0.025 mm, polypropylene film, drilling method: drilling with a heating needle, aperture ratio 3%)
Sheet-like thin plate H interspersed with through holes (thickness: 0.05 mm, polypropylene film, drilling method: drilling with a heating needle, aperture ratio 0.5%)
Sheet-like thin plate I interspersed with through-holes (thickness: 0.05 mm, polypropylene film, drilling method: drilling with a heating needle, aperture ratio 70%)
Example 1
A release film (thickness: 0.05 mm) is placed on both sides of 10 prepregs that are overlapped, and this is sandwiched between molds. At this time, the sheet-like thin plate A in which through holes are scattered is interposed between the release films on both sides and the template. This composition is put between the press hot plates, and a cushion material with a thickness of 10mm consisting of a kraft paper layer is placed between the hot plates and heat-pressed to obtain a 1.0mm thick laminate. It was.
This laminated board was processed into a workpiece holding material. This object to be polished is a disk having a diameter of 10 inches with a gear formed around it, and is provided with four through holes having a diameter of 3.5 inches for fitting the object to be polished.

実施例2
貫通穴が点在するシート状薄板Aの代わりに貫通穴が点在するシート状薄板Bを使用し、そのほかは実施例1と同様とした。
Example 2
Instead of the sheet-like thin plate A dotted with through-holes, a sheet-like thin plate B dotted with through-holes was used, and the others were the same as in Example 1.

実施例3
貫通穴が点在するシート状薄板Aの代わりに貫通穴が点在するシート状薄板Cを使用し、そのほかは実施例1と同様とした。
Example 3
Instead of the sheet-like thin plate A dotted with through-holes, a sheet-like thin plate C dotted with through-holes was used, and the others were the same as in Example 1.

実施例4
貫通穴が点在するシート状薄板Aの代わりに貫通穴が点在するシート状薄板Dを使用し、そのほかは実施例1と同様とした。
Example 4
Instead of the sheet-like thin plate A dotted with through-holes, the sheet-like thin plate D dotted with through-holes was used, and the others were the same as in Example 1.

実施例5
貫通穴が点在するシート状薄板Aの代わりに貫通穴が点在するシート状薄板Eを使用し、そのほかは実施例1と同様とした。
Example 5
Instead of the sheet-like thin plate A interspersed with through-holes, a sheet-like thin plate E interspersed with through-holes was used, and the others were the same as in Example 1.

比較例1
貫通穴が点在するシート状薄板Aの代わりに貫通穴が点在するシート状薄板Fを使用し、そのほかは実施例1と同様としたが、成形後の離型性が著しく悪く、離型時にフィルム破れが発生し、離型フィルムが局所的に積層板に残存したので、研磨評価はできなかった。
Comparative Example 1
Instead of the sheet-like thin plate A dotted with through-holes, a sheet-like thin plate F dotted with through-holes was used, and the others were the same as in Example 1. However, the mold release property after molding was extremely poor, and the mold release Sometimes film tearing occurred, and the release film remained locally on the laminate, so that polishing evaluation could not be performed.

実施例6
貫通穴が点在するシート状薄板Aの代わりに貫通穴が点在するシート状薄板Gを使用し、そのほかは実施例1と同様とした。
Example 6
Instead of the sheet-like thin plate A dotted with through-holes, a sheet-like thin plate G dotted with through-holes was used, and the others were the same as in Example 1.

実施例7
貫通穴が点在するシート状薄板Aの代わりに貫通穴が点在するシート状薄板Hを使用し、そのほかは実施例1と同様とした。
Example 7
Instead of the sheet-like thin plate A dotted with through-holes, a sheet-like thin plate H dotted with through-holes was used, and the others were the same as in Example 1.

実施例8
貫通穴が点在するシート状薄板Aの代わりに貫通穴が点在するシート状薄板Iを使用し、そのほかは実施例1と同様とした。
Example 8
Instead of the sheet-like thin plate A dotted with through-holes, a sheet-like thin plate I dotted with through-holes was used, and the others were the same as in Example 1.

従来例1
実施例1において、離型フィルムと型板の間にはメッシュ(0.4mm厚、ポリエステル、40メッシュ)を介在させて加熱加圧成形を実施し、そのほかは実施例1と同様とした。
Conventional Example 1
In Example 1, heat and pressure molding was performed with a mesh (0.4 mm thickness, polyester, 40 mesh) interposed between the release film and the template, and the others were the same as in Example 1.

従来例2
実施例1において、離型フィルムと型板の間にはガラス織布(0.18mm厚、日東紡製、WEA−7628)を介在させて加熱加圧成形を実施し、そのほかは実施例1と同様とした。
Conventional example 2
In Example 1, heat and pressure molding was performed with a glass woven fabric (0.18 mm thick, manufactured by Nittobo, WEA-7628) interposed between the release film and the template, and the others were the same as in Example 1. did.

以上の各実施例、比較例、ならびに従来例における被研磨物保持材を使用して研磨作業を行なった。被研磨物は3.5インチアルミニウム製ハードディスクである。被研磨物保持材の研磨装置上盤への密着頻度および研磨の均一性を評価した結果を表2、表3に示す。
被研磨物保持材の表面粗さは、表1に示す条件で測定した。
研磨装置上盤への密着頻度評価として、被研磨物保持材が、研磨装置上盤に密着して持ち上げられた回数(トラブル回数)を評価した。トラブル回数は、1000バッチの研磨作業(1バッチは、研磨装置に5個の被研磨物保持材を装着し、20個のハードディスクを研磨する)において、被研磨物の持ち上げられた回数を調査した。
研磨の均一性評価として、ハードディスクの平坦性により評価した(○:良好、△通常、×:劣る)。ここで、ハードディスクの平坦性とは、ハードディスク1枚中の表面粗さのばらつきをいう。
Polishing operations were performed using the workpiece holding materials in the above Examples, Comparative Examples, and Conventional Examples. The object to be polished is a 3.5 inch aluminum hard disk. Tables 2 and 3 show the results of evaluating the frequency of adhesion of the workpiece holding material to the upper plate of the polishing apparatus and the uniformity of polishing.
The surface roughness of the workpiece holding material was measured under the conditions shown in Table 1.
As an evaluation of the frequency of contact with the upper plate of the polishing apparatus, the number of times (the number of troubles) that the workpiece holding material was lifted in close contact with the upper plate of the polishing apparatus was evaluated. The number of troubles was determined by examining the number of times the workpiece was lifted in 1000 batches of polishing work (one batch was equipped with 5 workpiece holding materials and polishing 20 hard disks in a polishing machine). .
The uniformity of polishing was evaluated by the flatness of the hard disk (◯: good, Δ normal, x: inferior). Here, the flatness of the hard disk means a variation in surface roughness in one hard disk.

Figure 2008093746
Figure 2008093746

Figure 2008093746
Figure 2008093746

Figure 2008093746
Figure 2008093746

表2、表3から明らかなように、本発明に係る方法で製造した板状体を被研磨物保持材に適用することにより、被研磨物保持材が研磨装置上盤に密着して一緒に持ち上げられる現象を防止する効果が得られ、かつ研磨の均一性に寄与する。
これによって、被研磨物の生産歩留まり向上とハードディスクの品質向上を図ることができる。
As is apparent from Tables 2 and 3, by applying the plate-like body manufactured by the method according to the present invention to the object to be polished, the object to be polished is closely attached to the upper plate of the polishing apparatus together. The effect of preventing the phenomenon of being lifted is obtained, and contributes to the uniformity of polishing.
As a result, the production yield of the object to be polished and the quality of the hard disk can be improved.

Claims (3)

熱硬化性樹脂を含浸したシート状繊維基材1枚若しくは重ね合せた複数枚を型板の間で加熱加圧して板状体を成形するに当たり、
前記シート状繊維基材の少なくとも片側に、厚さが150μm以下であり、貫通穴が点在するシート状薄板を配置して加熱加圧し、前記貫通穴の形状を成形した板状体に付与することを特徴とする被研磨物保持材用板状体の製造法。
In forming a plate-like body by heating and pressurizing one sheet-like fiber base material impregnated with a thermosetting resin or a plurality of superposed sheets between mold plates,
A sheet-like thin plate having a thickness of 150 μm or less and interspersed with through-holes is placed on at least one side of the sheet-like fiber base material, and heated and pressed to give the shape of the through-holes to the shaped plate-like body. A method for producing a plate-like body for an object-holding material.
前記貫通穴が点在するシート状薄板の厚さが、40〜150μmであることを特徴とする請求項1記載の被研磨物保持材用板状体の製造法。   The method for producing a plate for an object-holding material according to claim 1, wherein a thickness of the sheet-like thin plate interspersed with the through holes is 40 to 150 µm. 前記貫通穴が点在するシート状薄板の開孔率が、1〜60%であることを特徴とする請求項1又は2のいずれかに記載の被研磨物保持材用板状体の製造法。   The method for producing a plate-like body for an object holding material according to claim 1, wherein the sheet-like thin plate interspersed with the through holes has a hole area ratio of 1 to 60%. .
JP2006274957A 2006-10-06 2006-10-06 Manufacturing method of plate-like body for holding polishing object Pending JP2008093746A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013132745A (en) * 2011-12-27 2013-07-08 Asahi Glass Co Ltd Polishing carrier, method for polishing glass substrate for magnetic recording medium, and method for manufacturing glass substrate for magnetic recording medium
WO2017171052A1 (en) * 2016-03-31 2017-10-05 Hoya株式会社 Carrier and substrate manufacturing method using this carrier

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013132745A (en) * 2011-12-27 2013-07-08 Asahi Glass Co Ltd Polishing carrier, method for polishing glass substrate for magnetic recording medium, and method for manufacturing glass substrate for magnetic recording medium
WO2017171052A1 (en) * 2016-03-31 2017-10-05 Hoya株式会社 Carrier and substrate manufacturing method using this carrier
JP6236191B1 (en) * 2016-03-31 2017-11-22 Hoya株式会社 Carrier and method of manufacturing substrate using the carrier
JP2018022549A (en) * 2016-03-31 2018-02-08 Hoya株式会社 Carrier and method for producing substrate using the same
JP7018292B2 (en) 2016-03-31 2022-02-10 Hoya株式会社 Carrier and method of manufacturing a substrate using the carrier

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