JP2008087469A5 - - Google Patents

Claims (7)

A plurality of liquid chambers communicating with discharge ports for discharging the liquid and pressurizing the liquid; a lower electrode provided corresponding to each of the plurality of liquid chambers and stacked in order from the liquid chamber side; and a piezoelectric body A plurality of piezoelectric elements having a film and an upper electrode, and a liquid ejection head in which the lower electrode is provided over a corresponding region between the plurality of liquid chambers,
The piezoelectric film is provided in a region corresponding to a space between the plurality of liquid chambers, and a region corresponding to the space between the plurality of liquid chambers is smaller than a region corresponding to the liquid chamber. a liquid discharge head characterized by Flooding the lower electrode.   The liquid ejection head according to claim 1, wherein the piezoelectric film is formed by laminating a plurality of piezoelectric films having different etching rates in the film thickness direction. A plurality of liquid chambers communicating with discharge ports for discharging the liquid and pressurizing the liquid; a lower electrode provided corresponding to each of the plurality of liquid chambers and stacked in order from the liquid chamber side; and a piezoelectric body A plurality of piezoelectric elements having a film and an upper electrode, wherein the lower electrode is provided over a corresponding region between the plurality of liquid chambers, and at least the lower electrode provided in the region is a manufacturing method Urn liquid discharge head covering piezoelectric film,
Forming a material film of the piezoelectric film on the lower electrode;
The material film of the piezoelectric film is formed such that a region corresponding to the space between the plurality of liquid chambers of the material film of the piezoelectric film is smaller than a region corresponding to the liquid chamber. Etching a corresponding region between a plurality of liquid chambers;
A method of manufacturing a liquid ejection head, comprising:   The method of manufacturing a liquid ejection head according to claim 3, wherein the etching is dry etching, and the lower electrode contains Pt.   In the forming step, the material film is formed by laminating a plurality of piezoelectric films having different etching rates in the film thickness direction, and in the etching step, the piezoelectric film on the liquid chamber side in the material film The method of manufacturing a liquid discharge head according to claim 3, wherein etching is performed using as an etching stop layer.   6. The method of manufacturing a liquid ejection head according to claim 5, wherein the piezoelectric film to be etched is in an uncrystallized state in the material film, and the piezoelectric film to be the etching stop layer is in a crystallized state. The method of manufacturing a liquid discharge head according to claim 6 , further comprising a step of crystallizing the piezoelectric film in the non-crystallized state after the forming step.