JP2008036809A - Wire guide device - Google Patents

Wire guide device Download PDF

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JP2008036809A
JP2008036809A JP2006218362A JP2006218362A JP2008036809A JP 2008036809 A JP2008036809 A JP 2008036809A JP 2006218362 A JP2006218362 A JP 2006218362A JP 2006218362 A JP2006218362 A JP 2006218362A JP 2008036809 A JP2008036809 A JP 2008036809A
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wire electrode
wire
guide
buffer
machining
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JP5142497B2 (en
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Kazuyuki Miyamura
一幸 宮村
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Ogura Jewel Ind Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a wire guide device capable of enhancing working accuracy and working speed, and improving the working quality of a wire cut electric discharge processing machine. <P>SOLUTION: This wire guide device has a wire electrode insertion section 2 through which a wire electrode 1 is inserted, a coolant inlet 3 introducing a coolant in the wire electrode insertion section 2 from a cross direction relative to the insertion direction of the wire electrode 1, and a liquid flow buffering section 4 buffering the collision force of a liquid flow introduced from the coolant inlet 3 to the wire electrode 1. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、ワイヤガイド装置に関するものであり、より詳細には、ワイヤカット放電加工機に着脱自在に装着され、ワイヤ電極を加工位置にガイドするダイヤモンド等からなるワイヤガイドのアッセンブリ体として構成されるワイヤガイド装置に関するものである。   The present invention relates to a wire guide device, and more specifically, is configured as an assembly of a wire guide made of diamond or the like that is detachably attached to a wire cut electric discharge machine and guides a wire electrode to a machining position. The present invention relates to a wire guide device.

内部に挿通されるワイヤ電極を冷却液によって冷却するワイヤガイド装置としては、従来、特許文献1に記載されたものが知られている。例えば当該公報の図7において、ワイヤガイド装置は、ワイヤ電極を挿通させる直線状の細穴が穿孔されたケースに対してワイヤガイドを固定して形成され、上記ケースには、該ケース外部から上記細穴に対して直交方向から連通する冷却水導入口が開設される。   As a wire guide device that cools a wire electrode inserted through the inside with a cooling liquid, a device described in Patent Document 1 is conventionally known. For example, in FIG. 7 of the publication, the wire guide device is formed by fixing a wire guide to a case in which a linear thin hole through which a wire electrode is inserted is drilled. A cooling water inlet is established that communicates with the narrow hole from the orthogonal direction.

上記ケースはワイヤカット放電加工機本体に固定され、その外周側に被さるように配置される加工液供給部とケース外部との間に供給される加工液を冷却液として上記冷却水導入口から貫通孔内に導入し、貫通孔内でワイヤ電極を冷却する。
特開平6-55348号公報
The case is fixed to the wire-cut electric discharge machine body, and the machining liquid supplied between the machining liquid supply unit arranged to cover the outer periphery of the case and the outside of the case is penetrated from the cooling water inlet as the cooling liquid. It introduce | transduces in a hole and cools a wire electrode in a through-hole.
JP-A-6-55348

近年、ワイヤカット放電加工機には加工精度、加工速度のさらなる向上が求められており、これを実現するためにより細いワイヤ電極をより高速で走行させ、また放電時の電気的条件や加工屑の除去を良好にするために加工液の供給圧力がより高められている。一方、このような加工精度、加工速度の向上への取り組みに伴い、ワイヤ電極に大きな振動が生じやすくなり、この振動がワークの加工部位にまで達することにより加工面にすじが入り、加工品質の悪化を起こしているという問題があった。   In recent years, wire-cut electrical discharge machines have been required to further improve machining accuracy and machining speed. To achieve this, thinner wire electrodes are run at higher speeds, and electrical conditions during machining and machining waste are reduced. In order to improve the removal, the supply pressure of the working fluid is further increased. On the other hand, along with efforts to improve machining accuracy and machining speed, the wire electrode is likely to generate large vibrations, and when this vibration reaches the machining part of the workpiece, streaks enter the machining surface and the machining quality is improved. There was a problem that it was getting worse.

かかる問題を解決すべく、本発明者は、鋭意研究の結果、上述した振動の一因が冷却液のワイヤガイド装置内への導入状態にあることを見出した。すなわち、上述した従来例のように冷却液導入口からワイヤガイド装置内に加工液を兼ねる冷却液を導入してワイヤ電極の発熱による溶断を防止する場合において、加工液の圧力を高めてしまうと、冷却液導入口から噴流となってワイヤガイド装置内に流れ込む冷却液がワイヤ電極に衝突し、その衝撃によってワイヤ電極に振動を生じさせてしまう。   As a result of intensive studies, the present inventor has found that the cause of the vibration described above is in the state of introducing the coolant into the wire guide device. That is, when the coolant that also serves as the machining fluid is introduced into the wire guide device from the coolant introduction port as in the above-described conventional example to prevent the wire electrode from fusing due to heat generation, the pressure of the machining fluid is increased. Then, the coolant that flows into the wire guide device as a jet from the coolant introduction port collides with the wire electrode, and the impact causes the wire electrode to vibrate.

本発明は、以上の欠点を解消すべくなされたものであって、ワイヤカット放電加工機の加工精度、加工速度を高めることが可能で、かつ、加工品質を改善することができるワイヤガイド装置の提供を目的とする。   The present invention has been made to eliminate the above drawbacks, and is a wire guide device that can increase the processing accuracy and processing speed of a wire cut electric discharge machine and can improve the processing quality. For the purpose of provision.

本発明によれば上記目的は、
ワイヤ電極1が挿通されるワイヤ電極挿通部2と、
ワイヤ電極1の挿通方向に対して交差する方向からワイヤ電極挿通部2内に冷却液を導入する冷却液導入口3と、
該冷却液導入口3から導入される液流のワイヤ電極1への衝突力を緩和させる液流緩衝部4とを有するワイヤガイド装置を提供することにより達成される。
According to the present invention, the object is
A wire electrode insertion portion 2 through which the wire electrode 1 is inserted;
A coolant introduction port 3 for introducing a coolant into the wire electrode insertion portion 2 from a direction intersecting the insertion direction of the wire electrode 1;
This is achieved by providing a wire guide device having a liquid flow buffering portion 4 that relieves the collision force of the liquid flow introduced from the coolant introduction port 3 to the wire electrode 1.

ワイヤ電極挿通部2はワイヤ電極1の挿通スペースとなる例えば直線で貫通状の細穴等により構成される中空部であり、冷却液導入口3は、上記中空部の容積等を考慮して適宜細径にされ、中空部の長手方向に対して交差する方向に開口される。上述した従来例におけるように冷却液導入口3からワイヤ電極挿通部2内に導入される冷却液の液流は、ワイヤ電極挿通部2内に挿通されるワイヤ電極1への衝突力を液流緩衝部4により緩和され、衝突時の衝撃によるワイヤ電極1への振動の発生が抑制される。   The wire electrode insertion portion 2 is a hollow portion that is formed by, for example, a straight, through-hole, or the like serving as a insertion space for the wire electrode 1, and the coolant introduction port 3 is appropriately set in consideration of the volume of the hollow portion and the like. It is made into a small diameter and opened in a direction intersecting with the longitudinal direction of the hollow portion. As in the conventional example described above, the liquid flow of the cooling liquid introduced from the cooling liquid introduction port 3 into the wire electrode insertion portion 2 is caused by the collision force against the wire electrode 1 inserted into the wire electrode insertion portion 2. It is relieved by the buffer part 4 and the occurrence of vibration to the wire electrode 1 due to the impact at the time of collision is suppressed.

液流緩衝部4は、例えば冷却液導入口3とワイヤ電極1との間に設けられる緩衝体5として構成され、冷却液導入口3からワイヤ電極挿通部2内に向かって流れる噴流のワイヤ電極1への直射を防ぐようにしたり、若しくは、冷却液導入口3からワイヤ電極挿通部2へと繋がる流路の断面積を拡大する流路拡大スペースとして構成され、あるいは複数の冷却液導入口3、3・・からの噴流を相互に干渉させる合流流路として構成され、流速を低減するようにしたりするなど多様に構成することが可能である。この場合において、上述したように緩衝体5として構成した場合には、ワイヤガイド装置の大きさをより小さく抑えることができるとともに、既存のワイヤガイド装置に多少の改変を加えるだけで構成することができる。緩衝体5はワイヤ電極1への液流の衝突力を緩和できるものであればよく、例えば網などの液流の抵抗になるものや、壁などのワイヤ電極1に向かう液流を迂回させるものとして構成することが可能である。緩衝体5を壁により構成する場合には、ワイヤ電極1周りに曲率面にすれば液流をスムーズに迂回させることができる。   The liquid buffer 4 is configured, for example, as a buffer 5 provided between the coolant introduction port 3 and the wire electrode 1, and a jet wire electrode that flows from the coolant introduction port 3 into the wire electrode insertion portion 2. 1 is configured to prevent direct exposure to 1, or as a flow path expansion space that expands the cross-sectional area of the flow path that connects the coolant introduction port 3 to the wire electrode insertion portion 2, or a plurality of coolant introduction ports 3 3. It is configured as a confluence channel that causes the jets from 3... To interfere with each other, and various configurations such as reducing the flow velocity are possible. In this case, when the buffer 5 is configured as described above, the size of the wire guide device can be further reduced, and the existing wire guide device can be configured only by making some modifications. it can. The buffer 5 only needs to be able to relieve the collision force of the liquid flow to the wire electrode 1. For example, the buffer 5 can be a resistance to the liquid flow such as a net, or can bypass the liquid flow toward the wire electrode 1 such as a wall. It can be configured as. In the case where the buffer body 5 is constituted by a wall, the liquid flow can be smoothly bypassed by providing a curved surface around the wire electrode 1.

以上のワイヤガイド装置は、ダイヤモンド等からなるワイヤガイドが組み付けられる例えばステンレス鋼等の成形品あるいは削りだし品からなるホルダにおいて、ワイヤ電極挿通部2となる直線で貫通状の細穴等を設けるとともに、この細穴に対して交差する方向に冷却液導入口3を開設した上で、図2(a)に示すように液流緩衝部4としての壁や流路をホルダに一体成形したり、図3(a)に示すように上記壁等をワイヤガイドとともにホルダに対して個別に組み付けるようにしたり、あるいは図3(b)に示すように上記壁等をワイヤガイドに一体成形してホルダに組み付けるようにして効率よく製造することができる。   The wire guide device described above is provided with a straight through hole or the like serving as the wire electrode insertion portion 2 in a holder made of a molded product such as stainless steel or a machined product, for example, which is assembled with a wire guide made of diamond or the like. Then, after opening the coolant introduction port 3 in the direction intersecting the narrow hole, as shown in FIG. 2A, the wall and the flow path as the liquid flow buffer portion 4 are integrally formed in the holder, As shown in FIG. 3 (a), the wall or the like is individually assembled to the holder together with the wire guide, or the wall or the like is integrally formed with the wire guide as shown in FIG. 3 (b). It can be manufactured efficiently by assembling.

したがって本発明によれば、冷却液の供給圧力が高められた場合でも、冷却液導入口3からのワイヤ電極挿通部2内への冷却液の導入に伴って生じる液流のワイヤ電極1への衝突力を緩和することができ、冷却に伴うワイヤ電極1への振動の発生や、振動の増大を防止することができる。また、より線径が小さく、走行速度が高速なワイヤ電極1に対しても、振動を生じにくくさせることができる。   Therefore, according to the present invention, even when the supply pressure of the cooling liquid is increased, the liquid flow generated by the introduction of the cooling liquid from the cooling liquid introduction port 3 into the wire electrode insertion portion 2 is applied to the wire electrode 1. The collision force can be relaxed, and the occurrence of vibration to the wire electrode 1 accompanying cooling and the increase in vibration can be prevented. Moreover, vibration can be made difficult to occur even for the wire electrode 1 having a smaller wire diameter and a high traveling speed.

また、ワイヤ電極1に向かう冷却液の液流をワイヤ電極1の長手方向に対して直交、あるいはほぼ直交させてワイヤ電極1周りの360度から、いわゆる向心力のように流れるようにすれば、より振動の発生等を抑制することができる。この場合、上述した緩衝体5をワイヤ電極1周りに円筒形状をなす壁にし、その端縁を利用してワイヤ電極1の全周方向から包囲するように冷却水を供給すれば、上述したワイヤガイド装置の小型化等と両立して簡易に構成することができる。   Further, if the liquid flow of the cooling liquid toward the wire electrode 1 is made orthogonal or almost orthogonal to the longitudinal direction of the wire electrode 1 and flows from 360 degrees around the wire electrode 1 like a so-called centripetal force, Generation of vibrations and the like can be suppressed. In this case, if the buffer body 5 described above is formed into a cylindrical wall around the wire electrode 1 and the cooling water is supplied so as to surround the wire electrode 1 from the entire circumferential direction using the edge thereof, the wire described above is used. The guide device can be configured simply and in a compact manner.

以上の説明から明らかなように、本発明によれば、ワイヤカット放電加工機の加工精度、加工速度を高めることが可能で、かつ、加工品質を改善することができるワイヤガイド装置を提供することができ、加工能力に優れたワイヤカット放電加工機を構成することができる。   As is apparent from the above description, according to the present invention, it is possible to provide a wire guide device capable of increasing the processing accuracy and processing speed of a wire cut electric discharge machine and improving the processing quality. Therefore, it is possible to configure a wire-cut electric discharge machine with excellent machining capability.

ワイヤカット放電加工機は、図1(a)に示すようにワーク11を挟んで一対のワイヤガイドユニットA、A’を配置し、ワイヤガイドユニットA,A’間でワイヤ電極1を直線状にガイドする。このワイヤ電極1は図示しないボビンから巻き解されて適宜にテンションを付与された状態で図1(b)における矢印D方向に走行し、ワイヤガイドユニットA内に配置される超硬材料からなる電極ピン12により給電を受ける。ワーク11はワイヤ電極1と極性の異なる電位にされ、近接するワイヤ電極1からの放電により加熱されて加工される。なお、図1(a)において13は上方のワイヤガイドユニットAを支持する上ガイドユニット支持部、14は下方のワイヤガイドユニットA’を支持する下ガイドユニット支持部、15はワーク11を載置するテーブルである。   In the wire cut electric discharge machine, a pair of wire guide units A and A ′ are arranged with a workpiece 11 interposed therebetween as shown in FIG. 1A, and the wire electrode 1 is linearly arranged between the wire guide units A and A ′. To guide. This wire electrode 1 is unwound from a bobbin (not shown) and travels in the direction of arrow D in FIG. The pin 12 receives power. The workpiece 11 is set to a potential having a polarity different from that of the wire electrode 1 and is heated and processed by the discharge from the adjacent wire electrode 1. In FIG. 1A, 13 is an upper guide unit support for supporting the upper wire guide unit A, 14 is a lower guide unit support for supporting the lower wire guide unit A ′, and 15 is for placing the work 11. It is a table to do.

ワイヤガイドユニットAは、図1(b)に示すように、ユニット本体16に対してワイヤガイド装置10とノズル17とを組み付けて形成される。ユニット本体16はワイヤ電極1を挿通させる直線状の細穴18が貫通して穿孔されたブロック体であり、図示しない電源に接続された電極ピン12がワイヤ電極1に接するように上記細穴18内に露出して組み込まれる。また、細穴18の一端部側にはワイヤガイド装置10を組み付けるためのネジ16aが設けられ、反対端部側にはワイヤガイド装置10とともにワイヤ電極1の走行方向をガイドするサブガイド19が固定される。サブガイド19は、例えばルビー等からなるサブダイスガイド19aをサブガイドホルダ19bで保持して形成され、サブダイスガイド19aには、挿通されるワイヤ電極1の走行位置をガイドする上記ユニット本体16の細穴18よりも細径のサブガイド孔19cが穿孔される。サブガイド19はワイヤ電極1を電極ピン12に押し付けるように位置合わせされて固定される。   The wire guide unit A is formed by assembling the wire guide device 10 and the nozzle 17 to the unit main body 16 as shown in FIG. The unit main body 16 is a block body in which a linear thin hole 18 through which the wire electrode 1 is inserted is penetrated, and the fine hole 18 is connected so that an electrode pin 12 connected to a power source (not shown) is in contact with the wire electrode 1. Incorporated exposed. Further, a screw 16a for assembling the wire guide device 10 is provided on one end side of the narrow hole 18, and a sub guide 19 that guides the traveling direction of the wire electrode 1 together with the wire guide device 10 is fixed on the opposite end side. Is done. The sub guide 19 is formed by holding a sub die guide 19a made of, for example, ruby or the like by a sub guide holder 19b. The sub die guide 19a has the unit main body 16 that guides the travel position of the inserted wire electrode 1. A sub guide hole 19c having a diameter smaller than that of the narrow hole 18 is formed. The sub guide 19 is aligned and fixed so as to press the wire electrode 1 against the electrode pin 12.

さらに、上記ユニット本体16には、図示しない加工液タンクから供給された加工液(冷却液)をワイヤガイドユニットA、A’間のワイヤ電極1、すなわちワーク11の加工部位へと導くための加工液供給路16bが形成される。加工液供給路16bは、上記細穴18の周りを囲むように、より具体的には上記ネジ16aによりワイヤガイド装置10を組み付けた状態でワイヤガイド装置10の取り付け基端部の外周に対してその内周が接する円環状にされ、ユニット本体16のネジ16a側が配置される端面を凹状に彫り込んで形成されることによりワイヤガイド装置10側に開放される。上述した加工液タンクからこの加工液供給路16b内に加工液を引き込むために、図1(b)に示すようにユニット本体16には加工液引き込み口16cが開設される。   Further, the unit main body 16 has a machining fluid (cooling fluid) supplied from a machining fluid tank (not shown) for guiding the wire electrode 1 between the wire guide units A and A ′, that is, the machining portion of the workpiece 11. A liquid supply path 16b is formed. More specifically, the machining fluid supply path 16b surrounds the narrow hole 18 with respect to the outer periphery of the attachment base end of the wire guide device 10 in a state where the wire guide device 10 is assembled by the screw 16a. The inner periphery of the unit main body 16 is formed into an annular shape, and the end surface on which the screw 16a side of the unit main body 16 is disposed is engraved in a concave shape to be opened to the wire guide device 10 side. In order to draw the machining liquid from the above-described machining liquid tank into the machining liquid supply passage 16b, a machining liquid inlet 16c is opened in the unit main body 16 as shown in FIG.

ワイヤガイド装置10は、略円筒形状のホルダ20に対してワイヤガイド21を組み付けて形成される。ホルダ20は、ステンレス鋼の一体成形品あるいは削りだし品であり、ワイヤ電極1を挿通させる直線で貫通状の細穴としてのワイヤ電極挿通部2を内部に有し、一端部にはユニット本体16への固定手段としてユニット本体16に設けられたものと噛み合うネジ20aが設けられる。上記ワイヤ電極挿通部2は上述したユニット本体16に形成される細穴18に続く適宜断面積の円形断面であり、ホルダ20のユニット本体16への固定状態でユニット本体16の上記細穴18と同心に連通する。このホルダ20には上述した加工液供給路16bからワーク11の加工部位へと加工液をスムーズに導くために、ワーク11側、すなわちネジ20aの反対端側に先端に行くに従って胴体部分の外形が漸次縮径する縮径部20bが形成され、この縮径部20bの先端には、ワイヤガイド21を固定するガイド装着凹部22がワイヤ電極挿通部2の一部を拡径するようにして形成される。   The wire guide device 10 is formed by assembling a wire guide 21 to a substantially cylindrical holder 20. The holder 20 is an integrally molded product or cut-out product of stainless steel, and has a wire electrode insertion part 2 as a straight through hole through which the wire electrode 1 is inserted, and a unit body 16 at one end. Screws 20a that mesh with those provided in the unit main body 16 are provided as fixing means. The wire electrode insertion portion 2 has a circular cross section with an appropriate cross-sectional area following the narrow hole 18 formed in the unit main body 16 described above, and is fixed to the thin hole 18 of the unit main body 16 in a state where the holder 20 is fixed to the unit main body 16. Communicate concentrically. In order to smoothly guide the machining fluid from the above-described machining fluid supply path 16b to the machining site of the workpiece 11, the outer shape of the body portion of the holder 20 is increased toward the workpiece 11 side, that is, the opposite end side of the screw 20a. A diameter-reducing portion 20b that gradually decreases in diameter is formed, and a guide mounting recess 22 that fixes the wire guide 21 is formed at the tip of the diameter-reduced portion 20b so as to expand a part of the wire electrode insertion portion 2. The

ワイヤガイド21は、中心にワイヤ電極1を挿通させるガイド孔23aが穿孔されたダイヤモンドダイス23にルビーやセラミックス等からなる支持ガイド24を積層して形成される。ダイヤモンドダイス23のガイド孔23aは上述したサブガイド孔19cよりもさらに小径で、挿通されるワイヤ電極1とのクリアランスを0.002mmから0.01mm程度にしてワイヤ電極1のワーク11近傍における走行位置を精密にガイドする。支持ガイド24はワイヤ電極1をクリアランスの小さいガイド孔23a内に導くためものであり、上記ガイド孔23aへと近づくに従って漸次縮径する略漏斗形状で、ダイヤモンドダイス23のワイヤ電極1挿通方向の両面に積層される。   The wire guide 21 is formed by laminating a support guide 24 made of ruby or ceramics on a diamond die 23 having a guide hole 23a through which the wire electrode 1 is inserted at the center. The guide hole 23a of the diamond die 23 is smaller in diameter than the above-described sub guide hole 19c, and the clearance with the inserted wire electrode 1 is set to about 0.002 mm to 0.01 mm, so that the traveling position of the wire electrode 1 in the vicinity of the workpiece 11 is set. Is precisely guided. The support guide 24 is for guiding the wire electrode 1 into the guide hole 23a having a small clearance. The support guide 24 has a substantially funnel shape that gradually decreases in diameter as it approaches the guide hole 23a, and both surfaces of the diamond die 23 in the wire electrode 1 insertion direction. Is laminated.

以上のワイヤガイド装置10は、ホルダ20のガイド装着凹部22内にワイヤガイド21を接着固定して形成され、この固定状態においてワイヤ電極挿通部2とガイド孔23aが同心にされ、細穴18内で電極ピン12に当接した後サブガイド19を経由してワイヤ電極挿通部2から支持ガイド24の漏斗状内壁面を介してガイド孔23a内にスムーズにワイヤ電極1が挿通できるようにされる。また、かかるワイヤガイド装置10をユニット本体16に組み付けた状態で、上ガイドユニット支持部13に支持されたワイヤガイドユニットAにおいては、加工液引き込み口16cからユニット本体16内に導入された加工液が加工液供給路16bを経てワイヤガイド装置10の外面、より正確にはホルダ20の外面に沿ってワイヤガイドユニットA、A’間に流れ込むようになるが、加工液の供給圧力をポンプ等により適宜高めたときにワイヤ電極1とワーク11の加工部位との隙間に加工液を強制注入でき、また、下ガイドユニット支持部14に支持されたワイヤガイドユニットA’側からも加工液を強制注入できるようにするために、ユニット本体16には上述したノズル17が組み付けられる。   The wire guide device 10 described above is formed by bonding and fixing the wire guide 21 in the guide mounting recess 22 of the holder 20, and in this fixed state, the wire electrode insertion portion 2 and the guide hole 23 a are concentric, and the inside of the narrow hole 18. Then, the wire electrode 1 can be smoothly inserted into the guide hole 23a from the wire electrode insertion portion 2 through the funnel-shaped inner wall surface of the support guide 24 via the sub guide 19 after contacting the electrode pin 12. . Further, in the wire guide unit A supported by the upper guide unit support portion 13 in a state in which the wire guide device 10 is assembled to the unit main body 16, the processing liquid introduced into the unit main body 16 from the processing liquid drawing port 16c. Will flow between the wire guide units A and A ′ along the outer surface of the wire guide device 10 and more precisely along the outer surface of the holder 20 via the machining liquid supply path 16b. When it is appropriately raised, the machining liquid can be forcibly injected into the gap between the wire electrode 1 and the machining part of the workpiece 11, and the machining liquid is also forcibly injected from the side of the wire guide unit A ′ supported by the lower guide unit support portion 14. In order to make it possible, the nozzle 17 described above is assembled to the unit body 16.

ノズル17は、先端部に漸次すぼまる漏斗形状の吐出部17aを備えた略円筒形状に形成され、後端部に形成されるフランジ部17bによりユニット本体16にネジ止め等によって適宜固定される。このノズル17はワイヤガイド装置10よりひとまわり大きく形成され、ユニット本体16への固定によりワイヤガイド装置10に被さり、その内壁面とワイヤガイド装置10の外面との間に加工液ガイド路25を形成する。   The nozzle 17 is formed in a substantially cylindrical shape having a funnel-shaped discharge portion 17a that gradually narrows at the front end portion, and is appropriately fixed to the unit body 16 by screws or the like by a flange portion 17b formed at the rear end portion. . The nozzle 17 is formed to be slightly larger than the wire guide device 10, covers the wire guide device 10 by being fixed to the unit body 16, and forms a machining liquid guide path 25 between the inner wall surface and the outer surface of the wire guide device 10. To do.

以上のワイヤガイドユニットAは、例えば最大圧力を0.1MPaから0.15MPaとする高圧の加工液を加工液引き込み口16cから加工液供給路16bへと供給されると、図1(b)において矢印で示すように、加工液ガイド路25を通り、ホルダ20の縮径部20bとノズル17の吐出部17aによってワイヤ電極1近傍に集まるようにしてワイヤ電極1の長手方向に沿うようにワーク11の加工部位に加工液を強制注入させる。成分調整により電気抵抗を調整された加工液のワーク11の加工部位への強制注入は放電を良好に促し、これにより加工速度、加工精度が高められる。また、ワーク11の表面とノズル17の先端との間はこの実施の形態においては0.2mm以下の間隔で密着されるが、強制注入を続けることにより加工液はワーク11の加工済みの部分などの隙間を流れ、同時に加工屑を加工部位から排出する。さらに、加工液が熱を奪うことにより、ワーク11の加工部位やワイヤガイド21外部ではワイヤ電極1の溶断が防止される。加えて、ワイヤ電極1が不測の切断を生じた場合には、供給圧力を適宜高めることによりガイド孔23aからワーク11に向かって噴出する加工液によってワイヤ電極1をワイヤガイドユニットA、A’間に結線させることも可能である。   When the above-described wire guide unit A is supplied with a high-pressure machining fluid having a maximum pressure of 0.1 MPa to 0.15 MPa from the machining fluid inlet port 16c to the machining fluid supply path 16b, for example, in FIG. As shown by the arrow, the workpiece 11 passes along the machining liquid guide path 25 and is gathered in the vicinity of the wire electrode 1 by the reduced diameter portion 20b of the holder 20 and the discharge portion 17a of the nozzle 17 so as to be along the longitudinal direction of the wire electrode 1. The machining fluid is forcibly injected into the machining site. The forced injection of the machining fluid, whose electric resistance is adjusted by the component adjustment, into the machining portion of the workpiece 11 favors the discharge well, thereby increasing the machining speed and machining accuracy. Further, in this embodiment, the surface of the workpiece 11 and the tip of the nozzle 17 are in close contact with each other at an interval of 0.2 mm or less. However, by continuing the forced injection, the machining liquid is a processed portion of the workpiece 11 or the like. At the same time, the processing waste is discharged from the processing site. Furthermore, since the machining fluid deprives the heat, the wire electrode 1 is prevented from being melted outside the machining part of the workpiece 11 or outside the wire guide 21. In addition, when the wire electrode 1 is unexpectedly cut, the wire electrode 1 is moved between the wire guide units A and A ′ by the processing liquid ejected from the guide hole 23a toward the workpiece 11 by appropriately increasing the supply pressure. It is also possible to connect them.

また、この実施の形態において、ワイヤ電極1のワイヤ電極挿通部2内における冷却効果を実現するとともに、これに伴うワイヤ電極1の振動の発生を抑制するために、ワイヤガイド装置10は、加工液をワイヤ電極挿通部2内に導入する冷却液導入口3と、ワイヤ電極挿通部2内に導入された加工液の液流のワイヤ電極1への衝突力を緩和する液流緩衝部4とを有する。冷却液導入口3は、ホルダ20外部の加工液ガイド路25を流れる加工液をワイヤ電極挿通部2内に導入させるためのもので、ホルダ20外部からワイヤ電極挿通部2に向かって上述したいわゆる自動結線を考慮して直径0.3mm程度の小さな断面円形の直線状に穿孔して形成される。この冷却液導入口3は、図1(b)および図2に示すように、加工液導入当初のワイヤ電極挿通部2内の空気の抜けを良くするためにホルダ20の先端部、すなわちワイヤガイド21側の端部寄りに配置されてこの実施の形態においては縮径部20bに位置し、また、ワイヤ電極挿通部2の長手方向に対して直交あるいはほぼ直交する方向で、かつ、当該直交面内において均等な4方向に開口される。以上の冷却液導入口3は、ワイヤ電極挿通部2の手前まで、すなわちホルダ20外部とワイヤ電極挿通部2を連通させない程度の長さに形成され、ワイヤ電極挿通部2への加工液の導入は液流緩衝部4を経てなされる。   In this embodiment, in order to realize the cooling effect in the wire electrode insertion portion 2 of the wire electrode 1 and to suppress the occurrence of vibration of the wire electrode 1 associated therewith, the wire guide device 10 Are introduced into the wire electrode insertion portion 2, and a liquid flow buffer portion 4 that alleviates the collision force of the working fluid introduced into the wire electrode insertion portion 2 against the wire electrode 1. Have. The coolant introduction port 3 is used to introduce the machining fluid flowing through the machining fluid guide path 25 outside the holder 20 into the wire electrode insertion portion 2, and the so-called above-described direction from the holder 20 toward the wire electrode insertion portion 2. In consideration of automatic connection, it is formed by drilling into a small straight circular shape with a cross section of about 0.3 mm in diameter. As shown in FIGS. 1B and 2, the coolant introduction port 3 is provided at the tip end of the holder 20, that is, a wire guide in order to improve air escape from the wire electrode insertion portion 2 at the beginning of the introduction of the machining fluid. In this embodiment, it is located near the end on the 21st side and is located in the reduced diameter portion 20b, and is in a direction orthogonal or substantially orthogonal to the longitudinal direction of the wire electrode insertion portion 2, and the orthogonal plane Inside, it is opened in four equal directions. The above coolant introduction port 3 is formed to a length before the wire electrode insertion portion 2, that is, a length that does not allow the outside of the holder 20 to communicate with the wire electrode insertion portion 2. Is made through the liquid buffer 4.

液流緩衝部4は、上記冷却液導入口3からワイヤ電極挿通部2内に導入される加工液の液流のワイヤ電極1への衝突力を弱めるためのもので、この実施の形態においては図2に示すように、冷却液導入口3に正対する緩衝壁(緩衝体5)をホルダ20に形成し、ワイヤ電極1の挿通方向に緩衝壁5を迂回する迂回流路6を通った加工液をワイヤ電極挿通部2内に導入する冷却液供給口7(包囲供給口)をホルダ20に設けて形成される。緩衝壁5は、ワイヤ電極1周りに連続する円形壁面であり、ホルダ20に形成されるワイヤ電極挿通部2をガイド装着凹部22よりも小径にしたこの実施の形態において、ガイド装着凹部22からワイヤ電極挿通部2周りに一定の間隔を隔てて沿うように円形の溝を掘り、該溝を冷却液導入口3に対して直交方向から連通させて形成される。   The liquid buffer part 4 is for weakening the collision force of the liquid flow of the processing liquid introduced into the wire electrode insertion part 2 from the cooling liquid inlet 3 to the wire electrode 1 in this embodiment. As shown in FIG. 2, a buffer wall (buffer body 5) that faces the coolant introduction port 3 is formed in the holder 20, and processing is performed through a bypass channel 6 that bypasses the buffer wall 5 in the insertion direction of the wire electrode 1. A cooling liquid supply port 7 (enclosed supply port) for introducing the liquid into the wire electrode insertion portion 2 is formed in the holder 20. The buffer wall 5 is a circular wall surface continuous around the wire electrode 1, and in this embodiment in which the wire electrode insertion portion 2 formed in the holder 20 has a smaller diameter than the guide mounting recess 22, the wire from the guide mounting recess 22 A circular groove is dug around the electrode insertion portion 2 so as to follow a certain interval, and the groove is formed to communicate with the coolant introduction port 3 from an orthogonal direction.

また、冷却液供給口7は、上述した緩衝壁5を形成する円筒状の溝の直径をガイド装着凹部22の直径よりも小寸にしたこの実施の形態においては、緩衝壁5の頂部を少なくとも冷却液導入口3に正対しない程度まで、すなわちガイド装着凹部22に接しないように低くし、ワイヤ電極1周りにワイヤ電極挿通部2を緩衝壁5を形成する溝によりやや拡径させるようにして形成される。また、冷却液の冷却液供給口7への迂回流路6からの流入や冷却液供給口7からのワイヤ電極挿通部2への流入はこれらの境界部分に施される面取りによってスムーズにされる。以上の緩衝壁5を形成する溝の幅や、冷却液供給口7を形成する緩衝壁5のガイド装着凹部22の底面からの低さは、加工液の冷却液導入口3からワイヤ電極挿通部2への流路となり、したがってワイヤ電極1への液流の衝突力を考慮して実験的に適宜寸法に決定することができる。   Further, in this embodiment in which the diameter of the cylindrical groove forming the buffer wall 5 described above is smaller than the diameter of the guide mounting recess 22, the coolant supply port 7 has at least the top of the buffer wall 5. It is lowered so as not to face the coolant introduction port 3, that is, so as not to contact the guide mounting recess 22, and the wire electrode insertion portion 2 is slightly enlarged around the wire electrode 1 by a groove forming the buffer wall 5. Formed. Further, the inflow of the coolant from the bypass channel 6 to the coolant supply port 7 and the flow from the coolant supply port 7 to the wire electrode insertion portion 2 are made smooth by chamfering applied to these boundary portions. . The width of the groove forming the buffer wall 5 and the height from the bottom surface of the guide mounting recess 22 of the buffer wall 5 forming the coolant supply port 7 are determined from the coolant introduction port 3 for the machining fluid to the wire electrode insertion portion. Therefore, the dimensions can be appropriately determined experimentally in consideration of the collision force of the liquid flow to the wire electrode 1.

したがってこの実施の形態において、ホルダ20は一体成形品、削りだし品、あるいは一体成型品に対する機械加工により、冷却液導入口3および緩衝壁5を備えるとともに、冷却液供給口7となる空隙を備えて形成され、ガイド装着凹部22にワイヤガイド21を固定することにより冷却液供給口7を形成するために、一体成形品のように型の抜けにくさを考慮することなく製造効率をあまり損ねることはない。冷却液導入口3を介して外部からホルダ20内に進入した供給圧力が高められている加工液は、図2(a)において矢印で示すように、緩衝壁5に衝突して勢いを弱められ、また緩衝壁5に沿ってワイヤ電極1の長手方向および周方向に迂回流路6により広がってさらに勢いを弱められ、さらに冷却液供給孔7によりワイヤ電極1の全周方向からワイヤ電極1の長手方向に対して直交あるいはほぼ直交してワイヤ電極1に接触することにより、接触時にワイヤ電極1に対して衝撃をあまり与えることはない。また、このようにワイヤ電極1への衝撃による振動の発生を防止できるため、振動によりワイヤ電極1周りに泡が生じることもなく、泡によるワイヤ電極1の冷却不良も生じることはない。   Therefore, in this embodiment, the holder 20 is provided with the coolant introduction port 3 and the buffer wall 5 and the gap serving as the coolant supply port 7 by machining the integrally molded product, the machined product, or the integrally molded product. In order to form the coolant supply port 7 by fixing the wire guide 21 to the guide mounting recess 22, the manufacturing efficiency is greatly impaired without considering the difficulty of removing the mold as in the case of an integrally molded product. There is no. The machining fluid whose supply pressure that has entered the holder 20 from the outside through the coolant introduction port 3 has been increased collides with the buffer wall 5 as shown by an arrow in FIG. Further, along the buffer wall 5, the wire electrode 1 spreads in the longitudinal direction and the circumferential direction by the bypass flow path 6 and is further weakened. Further, the cooling liquid supply hole 7 allows the wire electrode 1 from the entire circumferential direction. By making contact with the wire electrode 1 perpendicularly or substantially perpendicular to the longitudinal direction, the wire electrode 1 is hardly impacted at the time of contact. Moreover, since generation | occurrence | production of the vibration by the impact to the wire electrode 1 can be prevented in this way, a bubble does not arise around the wire electrode 1 by vibration, and the cooling failure of the wire electrode 1 by a bubble does not arise.

発明者の観察によれば、本実施の形態におけるワイヤガイド装置10に改造を加えて上述した従来例の構成を再現した場合にはワイヤ電極挿通部2内でワイヤ電極1に30ミクロン程度の振動幅を確認したが、この実施の形態においては、その振動幅は10ミクロン程度に改善されていることが確認された。   According to the inventor's observation, when the wire guide device 10 according to the present embodiment is modified and the configuration of the conventional example described above is reproduced, the wire electrode 1 is vibrated by about 30 microns in the wire electrode insertion portion 2. Although the width was confirmed, in this embodiment, it was confirmed that the vibration width was improved to about 10 microns.

また、このようにしてワイヤ電極挿通部2内に導入された加工液は、ワイヤ電極挿通部2内に位置するワイヤ電極1や電極ピン12を冷却し、これらの溶断や溶解を防止すると、主にワイヤ電極1とサブダイスガイド19aとの隙間を通ってワイヤガイドユニットA外に流れ出し、このような循環により温度上昇が防止される。   In addition, the machining liquid introduced into the wire electrode insertion portion 2 in this manner cools the wire electrode 1 and the electrode pin 12 located in the wire electrode insertion portion 2 and prevents them from being melted or melted. Then, it flows out of the wire guide unit A through the gap between the wire electrode 1 and the sub die guide 19a, and the temperature rise is prevented by such circulation.

図3(a)に液流緩衝部4の変形例を示す。なお、以下に示す変形例において上述した実施の形態と同一の要素には同一の符号を付して説明を省略する。この変形例において、ホルダ20にはガイド装着凹部22のホルダ20内方側に緩衝部形成凹部30が形成され、この緩衝部形成凹部30には緩衝体5が装着される。この変形例における緩衝体5は、ステンレス鋼によりホルダ20とは別体で一体成形され、緩衝部形成凹部30の内壁面に外壁面をほぼ当接させた状態で内部にワイヤ電極挿通部2と同じ内径寸法の中空部を形成する円筒形状の太径部32と、この太径部32の一端から上述した実施の形態において緩衝壁5を形成する溝の幅に一致する程度の間隔を隔てて緩衝壁5と同様の外径寸法を有して内部にワイヤ電極挿通部2と同じ内径寸法の中空部を形成する円筒形状の細径部33を延設して形成される。上記太径部32は緩衝体5を太径部32を先頭に緩衝部形成凹部30内にその底面まで挿入したときに冷却液導入口3に正対しない程度の高さに形成され、上記細径部33は、この緩衝体5の挿入状態において冷却液導入口3に正対するとともに、挿入後端がガイド装着凹部22に達しない高さ、具体的には上述した上述した緩衝壁5のガイド装着凹部22の底面との間隔に相当する高さだけガイド装着凹部22から離れるように形成される。   FIG. 3A shows a modification of the liquid buffer 4. In addition, in the modification shown below, the same code | symbol is attached | subjected to the element same as embodiment mentioned above, and description is abbreviate | omitted. In this modified example, the holder 20 is formed with a buffer portion forming recess 30 on the inner side of the holder 20 of the guide mounting recess 22, and the buffer body 5 is mounted on the buffer portion forming recess 30. The buffer body 5 in this modified example is integrally formed with stainless steel separately from the holder 20, and the wire electrode insertion portion 2 and the inner wall surface of the buffer portion forming recess 30 are in contact with the inner wall surface. A cylindrical-shaped large-diameter portion 32 forming a hollow portion having the same inner diameter size is spaced from one end of the large-diameter portion 32 so as to coincide with the width of the groove forming the buffer wall 5 in the above-described embodiment. It is formed by extending a cylindrical small-diameter portion 33 having the same outer diameter as that of the buffer wall 5 and forming a hollow portion having the same inner diameter as that of the wire electrode insertion portion 2. The large-diameter portion 32 is formed to a height that does not face the coolant inlet 3 when the shock absorber 5 is inserted into the buffer-portion-forming recess 30 with the large-diameter portion 32 at the top to the bottom surface. The diameter portion 33 faces the coolant introduction port 3 in a state where the buffer body 5 is inserted, and the height at which the rear end of the insertion portion does not reach the guide mounting recess 22, specifically, the guide of the buffer wall 5 described above. It is formed so as to be separated from the guide mounting recess 22 by a height corresponding to the distance from the bottom surface of the mounting recess 22.

したがって太径部32を先頭にして緩衝部形成凹部30内にその底面まで緩衝体5を挿入して太径部32を緩衝部形成凹部30に対して接着等により適宜固定した後、ガイド装着凹部22内にワイヤガイド21を装着すると、緩衝部形成凹部30と緩衝体5により上述した実施の形態と同様の液流緩衝部4が形成される。この変形例においては上述した実施の形態に比べてホルダ20の成形、加工をより簡単にすることができる。   Therefore, after inserting the buffer body 5 into the buffer portion forming recess 30 from the large diameter portion 32 to the bottom and fixing the large diameter portion 32 to the buffer portion forming recess 30 as appropriate by bonding or the like, the guide mounting recess When the wire guide 21 is mounted in the buffer 22, the buffer buffer forming recess 30 and the buffer body 5 form the liquid buffer 4 similar to the embodiment described above. In this modification, the holder 20 can be formed and processed more easily than in the embodiment described above.

図3(b)は液流緩衝部4の他の変形例を示すもので、この変形例においてはワイヤガイド21のホルダ20内方側に配置される支持ガイド24に対して上述した細径部33が一体成形、あるいは削りだしにより設けられる。ガイド装着凹部22内にワイヤガイド21を装着すると、緩衝部形成凹部30内に位置する細径部33は冷却液導入口3に正対するとともに、ガイド装着凹部22と細径部33との間には上述した実施の形態における緩衝壁5を形成する溝と同じ寸法の隙間が形成され、かつ、その挿入先端と緩衝部形成凹部30の底面との間には冷却液供給口7と同様の高さ寸法の隙間が形成されて液流緩衝部4が形成される。したがってこの変形例の場合においては、上述した変形例に比べて部品点数を少なくすることができる。   FIG. 3B shows another modification of the liquid buffer 4, and in this modification, the small diameter portion described above with respect to the support guide 24 disposed on the inner side of the holder 20 of the wire guide 21. 33 is provided by integral molding or shaving. When the wire guide 21 is mounted in the guide mounting recess 22, the small diameter portion 33 positioned in the buffer portion forming recess 30 faces the coolant introduction port 3 and between the guide mounting recess 22 and the small diameter portion 33. Is formed with a gap having the same dimensions as the groove forming the buffer wall 5 in the above-described embodiment, and a height similar to that of the coolant supply port 7 between the insertion tip and the bottom surface of the buffer part forming recess 30. A gap of a small size is formed to form the liquid buffer 4. Therefore, in the case of this modification, the number of parts can be reduced as compared with the modification described above.

なお、以上の実施の形態などにおいては、冷却液導入口3をワイヤ電極1周りに90度間隔で4個形成する場合を示したが、冷却液導入口3の断面積と大きさを調整して適宜決定することが可能で、数を増減すれば製造効率や流量等を調整することが可能である。また、自動結線のための噴流について、ワイヤ電極1とワーク11の加工部位に加工液を供給するホルダ20とノズル17の隙間の加工液ガイド路25により、供給圧力が高められた加工液を用いて生じさせる場合を示したが、別途自動結線のための流路を設けてもよく、この場合には例えばホルダ20の外部にノズル17を2重に被せてホルダ20とノズル17との間を自動結線のための流路とし、ノズル17間のワーク11の加工部位への供給のための加工液ガイド路25とするなどすれば足りる。   In the above embodiment and the like, the case where four coolant introduction ports 3 are formed around the wire electrode 1 at intervals of 90 degrees is shown. However, the cross-sectional area and size of the coolant introduction port 3 are adjusted. The production efficiency and flow rate can be adjusted by increasing or decreasing the number. Further, for the jet for automatic connection, a machining liquid whose supply pressure is increased by the machining liquid guide path 25 in the gap between the holder 20 that supplies the machining liquid to the machining part of the wire electrode 1 and the workpiece 11 and the nozzle 17 is used. However, in this case, for example, a double nozzle 17 is placed outside the holder 20 so that the space between the holder 20 and the nozzle 17 can be reduced. It suffices to use a flow path for automatic connection and a machining fluid guide path 25 for supplying the workpiece 11 between the nozzles 17 to the machining site.

本発明を示す図で、(a)はワイヤカット放電加工機の要部を説明する図、(b)はワイヤガイドユニットを説明する図である。It is a figure which shows this invention, (a) is a figure explaining the principal part of a wire cut electric discharge machine, (b) is a figure explaining a wire guide unit. ワイヤガイドの要部拡大図で、(a)は断面図、(b)は(a)の2B-2B線断面図である。It is a principal part enlarged view of a wire guide, (a) is sectional drawing, (b) is the 2B-2B sectional view taken on the line of (a). 液流緩衝部の変形例等を示す図で、(a)は変形例を示すワイヤガイドの断面図、(b)は他の変形例を示すワイヤガイドの断面図である。It is a figure which shows the modification etc. of a liquid flow buffer part, (a) is sectional drawing of the wire guide which shows a modification, (b) is sectional drawing of the wire guide which shows another modification.

符号の説明Explanation of symbols

1 ワイヤ電極
2 ワイヤ電極挿通部
3 冷却液導入口
4 液流緩衝部
5 緩衝体
6 迂回流路
7 包囲供給口


DESCRIPTION OF SYMBOLS 1 Wire electrode 2 Wire electrode insertion part 3 Coolant introduction port 4 Liquid flow buffer part 5 Buffer body 6 Detour flow path 7 Surrounding supply port


Claims (3)

ワイヤ電極が挿通されるワイヤ電極挿通部と、
ワイヤ電極の挿通方向に対して交差する方向からワイヤ電極挿通部内に冷却液を導入する冷却液導入口と、
該冷却液導入口から導入される液流のワイヤ電極への衝突力を緩和させる液流緩衝部とを有するワイヤガイド装置。
A wire electrode insertion portion through which the wire electrode is inserted;
A coolant introduction port for introducing a coolant into the wire electrode insertion portion from a direction intersecting the wire electrode insertion direction;
The wire guide apparatus which has a liquid flow buffer part which relieves the collision force to the wire electrode of the liquid flow introduce | transduced from this cooling liquid inlet.
前記液流緩衝部は冷却液導入口に緩衝体を正対させて形成され、緩衝体内の通過により、あるいは緩衝体周りに形成される迂回流路により液流のワイヤ電極に対する直接衝突を防止する請求項1記載のワイヤガイド装置。   The liquid flow buffer portion is formed with a buffer body facing the cooling liquid inlet, and prevents a liquid flow from directly colliding with the wire electrode by passing through the buffer body or by a detour channel formed around the buffer body. The wire guide device according to claim 1. 前記緩衝体はワイヤ電極周りに円筒形状に形成され、端縁においてワイヤ電極の全周方向に開放する包囲供給口を形成する請求項2記載のワイヤガイド装置。


The wire guide device according to claim 2, wherein the buffer body is formed in a cylindrical shape around the wire electrode, and forms an enclosed supply port that opens at an end edge in the entire circumferential direction of the wire electrode.


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WO2024112591A1 (en) * 2022-11-22 2024-05-30 Ge Infrastructure Technology Llc Electrical discharge machining system with integrated flushing

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WO2024112591A1 (en) * 2022-11-22 2024-05-30 Ge Infrastructure Technology Llc Electrical discharge machining system with integrated flushing

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