JP2008019116A - Method and equipment for automatically replenishing acid treatment liquid - Google Patents

Method and equipment for automatically replenishing acid treatment liquid Download PDF

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JP2008019116A
JP2008019116A JP2006190906A JP2006190906A JP2008019116A JP 2008019116 A JP2008019116 A JP 2008019116A JP 2006190906 A JP2006190906 A JP 2006190906A JP 2006190906 A JP2006190906 A JP 2006190906A JP 2008019116 A JP2008019116 A JP 2008019116A
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acid treatment
treatment liquid
concentration
circulation tank
acid
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Yasushi Ueno
泰 上野
Osamu Asai
治 浅井
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Central Glass Co Ltd
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Central Glass Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To replenish automatically an acid treatment liquid prepared by mixing an acid and pure water so as to keep the concentration of the acid treatment liquid in a circulation tank, which tends to increase by evaporation, at a specific level. <P>SOLUTION: At a point of time when a liquid level sensor of an acid treatment liquid in a circulation tank detects a supply level, the concentration of the acid treatment liquid in the circulation tank is continuously measured. When the concentration is higher than specified concentration, pure water is supplied until the concentration of the acid treated liquid in the circulation tank reaches within a specified range. Then the acid and pure water are simultaneously supplied at a specified ratio calculated beforehand so as to be equal to the specified concentration of the acid treatment liquid in the circulation tank until the liquid level in the circulation tank reaches a supply stop level. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、ガラス板面の酸処理に使用する酸処理液の濃度管理と酸処理液の自動補給の方法に関する。   The present invention relates to a method for controlling the concentration of an acid treatment liquid used for acid treatment of a glass plate surface and automatically replenishing the acid treatment liquid.

ガラス板は、その製造工程において様々な汚れや付着物が膜状に残る場合があるが、これらの付着物はその種類、発生位置、サイズ、さらに使用目的によっては欠陥となり、これらの欠陥を酸処理等によって除去する必要がある。   Various stains and deposits may remain in the glass plate during the manufacturing process, but these deposits may become defects depending on the type, location, size, and purpose of use. It is necessary to remove by processing or the like.

特に、プラズマディスプレイや液晶ディスプレイ等のフラットパネルディスプレイ等に用いられるガラス基板は、その表面に付着した微小な落下物やドロス、錫等の付着跡の膜についても欠陥となるので、通常の酸処理では除去できないような汚れや付着物を除去するために、各種の酸による酸処理液によって酸処理する方法が知られ、タンク内の酸処理液の濃度を測定し、その結果に基づいてタンク内に酸処理液を補充するものがいくつか知られている。   In particular, glass substrates used for flat panel displays such as plasma displays and liquid crystal displays also have defects on the film of traces of fine fallen objects, dross, tin, etc. adhering to the surface, so that normal acid treatment In order to remove dirt and deposits that cannot be removed, acid treatment with various acid treatment solutions is known. The concentration of the acid treatment solution in the tank is measured, and the result is based on the result. There are some known replenishers with acid treatment solutions.

例えば、特開2000−57953号公報には、ガラスの洗浄工程に使用するふっ酸処理液の自動供給装置であって前記ふっ酸処理液を濾過するフィルタを有する自動前酸処理装置と、前記濾過されたふっ酸処理液のふっ酸濃度を測定する濃度測定装置及び前記測定されたふっ酸濃度に基づいて、所定濃度になるように前記ふっ酸処理液にふっ酸を供給する供給装置を有するふっ酸自動濃度調整装置とを有することを特徴とするふっ酸処理液の自動供給装置が開示されている(特許文献1)。   For example, Japanese Patent Application Laid-Open No. 2000-57953 discloses an automatic pre-acid treatment apparatus having a filter for filtering the hydrofluoric acid treatment liquid, which is an automatic supply apparatus for the hydrofluoric acid treatment liquid used in a glass cleaning process, and the filtration A concentration measuring device for measuring the concentration of hydrofluoric acid in the hydrofluoric acid treatment liquid, and a supply device for supplying the hydrofluoric acid to the hydrofluoric acid treatment liquid to a predetermined concentration based on the measured hydrofluoric acid concentration. An automatic supply device for hydrofluoric acid treatment liquid characterized by having an acid automatic concentration adjusting device is disclosed (Patent Document 1).

また、特開平7−258875号公報には、噴流酸洗設備の循環タンク内の液質制御方法において、脱スケール性の異なる鋼帯を連続的に酸洗する場合や、鋼帯の走行速度が変化する場合における循環タンク内の酸濃度調整の応答性が高い噴流酸洗設備の循環タンク内の液質制御方法が開示されている(特許文献2)。
特開2000−57953号公報 特開平7−258875号公報
Further, in JP-A-7-258875, in the liquid quality control method in the circulation tank of the jet pickling equipment, when the steel strips having different descaling properties are pickled continuously, the traveling speed of the steel strip is A liquid quality control method in a circulation tank of a jet pickling facility having high responsiveness in adjusting the acid concentration in the circulation tank when changing is disclosed (Patent Document 2).
JP 2000-57953 A JP 7-258875 A

従来、酸処理液を取り扱う設備においては、配管、タンク、その他周辺設備について酸処理液によって腐食しない材質のものを使用してきたが、酸処理設備でのガラス板の酸処理中、酸処理設備内へのガラス板の投入口や取出口付近の作業者に蒸発した雰囲気ガスが悪影響を及ぼす恐れが高い。   Conventionally, in facilities that handle acid treatment liquids, pipes, tanks, and other peripheral equipment have been made of materials that do not corrode with acid treatment liquids. During acid treatment of glass plates in acid treatment equipment, There is a high risk that the atmosphere gas that has evaporated to workers near the glass plate inlet and outlet is adversely affected.

このため、酸処理設備の投入口や取出口、および酸処理設備に酸処理液を供給し、また酸処理後の液を回収する循環タンク内の雰囲気ガスを排気する排気設備を設けて、酸処理液の蒸発した雰囲気ガスを排出する必要がある。この排気設備で排出されるガス中に含まれる成分は、酸処理液が硝酸液等の場合、大半が水分であるが、酸処理液の濃度、温度等によって酸も蒸発し、その量に変動がある。   For this reason, an acid equipment is supplied to the inlet and outlet of the acid treatment equipment, and the acid treatment equipment, and an exhaust equipment for exhausting the atmospheric gas in the circulation tank for collecting the acid-treated liquid is provided. It is necessary to discharge the atmospheric gas from which the processing liquid has evaporated. When the acid treatment liquid is nitric acid, etc., the components contained in the gas discharged from this exhaust system are mostly water, but the acid also evaporates depending on the concentration, temperature, etc. of the acid treatment liquid, and the amount varies. There is.

このように、排気設備によって排気するだけで、循環タンク内の酸処理液の濃度は、酸処理液の蒸発による水分の減少によって濃度が高くなる。   In this way, the concentration of the acid treatment liquid in the circulation tank increases only by exhausting with the exhaust equipment, due to a decrease in moisture due to evaporation of the acid treatment liquid.

酸処理液によってガラス板を酸処理し、ガラス板を排出すると、ガラス面に酸処理液が付着した状態で排出されるので、ガラス板によって持ち出される酸処理液の比率は酸処理液と同一である。   When the glass plate is acid-treated with the acid treatment liquid and the glass plate is discharged, the acid treatment liquid is discharged on the glass surface, so the ratio of the acid treatment liquid carried out by the glass plate is the same as the acid treatment liquid. is there.

前記特許文献1に記載の発明は、ガラスパネルの酸処理に使用するふっ酸処理液の濃度管理作業に自動分析装置を組み込むことにより、ふっ酸処理液の維持管理を自動化するもので、2つの酸処理液タンクの濃度を測定するにあたりそれぞれフィルタユニットを経由して濃度を測定したり、また、フィルタを洗浄したり、さらに2つの酸処理液タンクとは別に、新処理液供給タンクを用意する等、設備が大掛かりであるという問題点があった。   The invention described in Patent Document 1 automates the maintenance and management of the hydrofluoric acid treatment liquid by incorporating an automatic analyzer into the concentration management work of the hydrofluoric acid treatment liquid used for the acid treatment of the glass panel. When measuring the concentration of the acid treatment solution tank, measure the concentration via the filter unit, wash the filter, and prepare a new treatment solution supply tank separately from the two acid treatment solution tanks. There was a problem that the facilities were large.

また、前記特許文献2に記載の発明は、脱スケール性の異なる鋼帯を連続的に酸洗する場合や、鋼帯の走行速度が変化する場合に、循環タンク内の酸濃度をすばやく対応させるために、酸液の水素イオン濃度、鉄イオン濃度、あるいは液面を検出し、さらに所定時間後に必要な各イオン濃度の目標値に基づいて循環タンク内からの廃酸、新酸、及び純水のいずれかを制御して各循環タンク内に投入するという複雑な制御を必要とするという問題点があった。   In addition, the invention described in Patent Document 2 quickly corresponds to the acid concentration in the circulation tank when steel strips having different descaling properties are pickled continuously or when the traveling speed of the steel strip changes. Therefore, the hydrogen ion concentration, iron ion concentration, or liquid level of the acid solution is detected, and the waste acid, new acid, and pure water from the circulation tank are further determined based on the target values of each ion concentration required after a predetermined time. There is a problem that complicated control is required to control one of these and put it into each circulation tank.

本発明は、上記問題点の解決を図る、すなわち、タンク内の酸処理液の濃度を一定にするとともに、酸処理設備を停止させることなく、酸処理液を補給できて生産性を向上させ、取扱い作業に危険を伴う酸処理液を自動的に補給でき、所定の濃度の酸処理液とすることで、酸処理によるガラス板の品質レベルを一定に保つことを目的とする。   The present invention aims to solve the above problems, that is, while keeping the concentration of the acid treatment liquid in the tank constant and improving the productivity by replenishing the acid treatment liquid without stopping the acid treatment facility, The purpose is to keep the quality level of the glass plate by the acid treatment constant by making it possible to automatically replenish the acid treatment liquid which is dangerous in handling work and to make the acid treatment liquid of a predetermined concentration.

すなわち、本発明は、酸と純水からなる酸処理液であって、蒸発により濃度が上昇する酸処理液の循環タンク内の濃度を一定、かつ自動的に補給する方法において、循環タンク内の酸処理液の液面センサが補給レベルを検出した時点で、該循環タンク内の酸処理液の濃度を連続的に測定し、設定濃度より高い濃度のとき、循環タンク内の酸処理液の濃度を設定範囲内となるまで純水を補給し、次いで、前記高濃度の酸の原液と純水を予め演算によって循環タンク内の酸処理液の設定濃度と同一となるように算出した所定の比率で同時に循環タンクの液面が補給停止レベルに到達するまで補給を行うことを特徴とする酸処理液の自動補給方法である。   That is, the present invention provides an acid treatment liquid composed of an acid and pure water, wherein the concentration of the acid treatment liquid whose concentration increases by evaporation is replenished in a constant and automatic manner in the circulation tank. When the acid level sensor detects the replenishment level, the concentration of the acid treatment liquid in the circulation tank is continuously measured, and when the concentration is higher than the set concentration, the concentration of the acid treatment liquid in the circulation tank. Is supplied at a predetermined ratio until the water concentration is within the set range, and then the high concentration acid stock solution and pure water are calculated in advance to be equal to the acid treatment solution set concentration in the circulation tank. At the same time, replenishment is performed until the liquid level in the circulation tank reaches the replenishment stop level.

あるいは、本発明は、循環タンク内の酸処理液面レベルが下限レベルと上限レベル間にあって、該酸処理液の濃度測定を連続的に行い、該酸処理液の濃度が設定値以上の時、該濃度が設定範囲内となるまで純水の補給を行い、また、液面センサが補給下限レベルを検出した時点で、原液と純水を予め演算によって算出した所定の比率で循環タンクの液面が補給停止レベルに到達するまで行うことを特徴とする酸処理液の自動補給方法である。   Alternatively, in the present invention, when the acid treatment liquid level in the circulation tank is between the lower limit level and the upper limit level, the concentration measurement of the acid treatment liquid is continuously performed, and the concentration of the acid treatment liquid is equal to or higher than a set value. Pure water is replenished until the concentration falls within the set range, and when the liquid level sensor detects the replenishment lower limit level, the liquid level of the circulation tank is determined at a predetermined ratio calculated in advance by calculation of the stock solution and pure water. Is an automatic replenishment method of an acid treatment solution, which is performed until a replenishment stop level is reached.

あるいはまた、本発明は、前記酸処理液は、搬送されるプラズマディスプレイ、または液晶ディスプレイ等のフラットパネルディスプレイ用ガラス基板の表面を酸処理するために使用する18vol%〜30vol%の濃度の硝酸と純水を混合した硝酸水溶液としたことを特徴とする上述の酸処理液の自動補給方法である。     Alternatively, in the present invention, the acid treatment liquid may be used for acid treatment of a surface of a glass substrate for a flat panel display such as a plasma display or a liquid crystal display, and nitric acid having a concentration of 18 vol% to 30 vol%. It is an automatic replenishment method of the above-mentioned acid treatment liquid characterized by using a nitric acid aqueous solution mixed with pure water.

あるいはまた、本発明は、上述のいずれかに記載の酸処理液の自動補給方法に用いる自動補給装置であって、ガラス板面を酸処理する酸処理室と酸処理液を供給する循環タンク間とで酸処理液を循環させる酸処理液循環手段と、該循環タンク内の酸処理液の濃度を測定する濃度測定手段と、原液タンク内の酸処理液原液を循環タンク内に供給する原液供給手段と、純水タンク内の純水を循環タンク内に供給する純水供給手段と、前記酸処理室と循環タンク内の雰囲気ガスを排気する排気手段とからなり、前記循環タンクの液面レベル信号、及び濃度測定手段による測定データに基づき、原液供給手段の原液定量ポンプと純水供給手段の純水定量ポンプの流量制御をコントローラによって行い、酸処理液原液と、純水との供給比率をコントローラで演算し所定の濃度の供給量となるように流量制御を行うことを特徴とする上述の酸処理液の自動補給方法に用いる酸処理液の自動補給装置である。   Alternatively, the present invention is an automatic replenishing device used in any of the above-described automatic replenishing methods of an acid treatment liquid, between an acid treatment chamber for acid-treating a glass plate surface and a circulation tank for supplying the acid treatment liquid. The acid treatment liquid circulating means for circulating the acid treatment liquid, the concentration measuring means for measuring the concentration of the acid treatment liquid in the circulation tank, and the raw solution supply for supplying the acid treatment liquid stock solution in the stock tank to the circulation tank Means, pure water supply means for supplying pure water in the pure water tank into the circulation tank, and exhaust means for exhausting atmospheric gas in the acid treatment chamber and the circulation tank, the liquid level of the circulation tank The controller controls the flow rate of the stock solution metering pump of the stock solution supply unit and the pure water metering pump of the pure water supply unit based on the signal and the measurement data by the concentration measuring unit, and the supply ratio of the acid treatment solution stock solution and the pure water is determined. control In an operational automatic supply device of the acid treatment solution for use in automatic replenishment process of the above-mentioned acid treatment solution, characterized in that the flow rate controlled so that the supply amount of the predetermined concentration.

極めてシンプルな構成にして、循環タンク内の不揮発性の酸処理液の濃度を設定範囲内に自動的に調整することができ、また、循環タンク内に補充する酸処理液が容易に購入可能な市販の酸処理液であるため、酸処理設備を運転しながら酸処理液を自動的に補充することができ、酸処理液の補給作業時に酸処理設備を停止させることがない。   With a very simple configuration, the concentration of the non-volatile acid treatment liquid in the circulation tank can be automatically adjusted within the set range, and the acid treatment liquid to be replenished in the circulation tank can be easily purchased. Since it is a commercially available acid treatment liquid, the acid treatment liquid can be automatically replenished while operating the acid treatment equipment, and the acid treatment equipment is not stopped during the replenishment work of the acid treatment liquid.

これによって、作業者が人体に有害な酸原液を直接取り扱ったり、触れたりすることなく、また、作業者の安全を確保できる。   Thereby, the operator can ensure the safety of the operator without directly handling or touching the acid stock solution harmful to the human body.

本発明の酸処理液の自動補給装置の実施の形態は、図1に示されるように、ガラス板G面を酸処理液で酸処理する酸処理設備1と所定濃度の酸処理液を貯蔵可能な循環タンク11との間に、酸処理液を供給する供給配管13と酸処理液を回収する回収配管14を接続し、循環ポンプ12によって、循環タンク11内の酸処理液を供給配管13を通して酸処理設備1内の上部側シャワー2および下部側シャワー3に供給し、搬送コンベア4にて搬送されるガラス基板Gに酸処理液をシャワーした後の酸処理設備1内の酸処理液の残液は回収配管14を通って循環タンク11内に回収する酸処理液循環手段10からなる。   As shown in FIG. 1, the embodiment of the automatic replenishing device for acid treatment liquid of the present invention can store acid treatment equipment 1 for acid treatment of the glass plate G surface with acid treatment liquid and an acid treatment liquid of a predetermined concentration. A supply pipe 13 for supplying the acid treatment liquid and a recovery pipe 14 for collecting the acid treatment liquid are connected between the circulation tank 11 and the acid treatment liquid in the circulation tank 11 is supplied by the circulation pump 12 through the supply pipe 13. The remaining acid treatment liquid in the acid treatment equipment 1 after being supplied to the upper shower 2 and the lower shower 3 in the acid treatment equipment 1 and showering the acid treatment liquid on the glass substrate G conveyed by the conveyer 4 The liquid consists of acid treatment liquid circulating means 10 that recovers into the circulation tank 11 through the recovery pipe 14.

また、前記酸処理設備1と循環タンク11には、酸処理液が蒸発した雰囲気ガスを排気する図示しない排気設備を設け、さらに、循環タンク11には酸処理液の液面レベルの上限レベル16、補給レベル17、下限レベル18、およびオーバーフロー防止のための極上限レベルを検出するためのセンサが設けられている。   Further, the acid treatment equipment 1 and the circulation tank 11 are provided with an exhaust equipment (not shown) for exhausting the atmospheric gas from which the acid treatment liquid has evaporated, and the circulation tank 11 has an upper limit level 16 of the liquid level of the acid treatment liquid. A sensor for detecting the replenishment level 17, the lower limit level 18, and the extreme upper limit level for preventing overflow is provided.

さらに、循環タンク11の近傍に酸処理液の原液を貯蔵する原液タンク21と、純水を貯蔵する純水タンク31を配設し、原液タンク21と純水タンク31のそれぞれより供給配管を循環タンク11に接続して、原液タンク21内の酸処理液の原液を原液定量ポンプ22によって循環タンク11内に供給する原液供給手段20と、純水タンク31内の純水を純水定量ポンプ32によって循環タンク11内に供給する純水供給手段30を設けた。   Further, a stock solution tank 21 for storing the stock solution of the acid treatment solution and a pure water tank 31 for storing pure water are disposed in the vicinity of the circulation tank 11, and supply pipes are circulated from the stock solution tank 21 and the pure water tank 31, respectively. Connected to the tank 11, a raw solution supply means 20 for supplying the stock solution of the acid treatment solution in the stock solution tank 21 to the circulation tank 11 by the stock solution metering pump 22, and pure water in the pure water tank 31 to the pure water metering pump 32. The pure water supply means 30 which supplies in the circulation tank 11 by this was provided.

また、該循環タンク11内の酸処理液の濃度を測定する濃度測定手段として酸処理液内に浸漬した電極棒42をセンサとする導電率計41を設け、さらに、前記酸処理設備1と循環タンク11内の雰囲気ガスをそれぞれ排気する排気手段(図示せず)を設けるようにした。   Further, as a concentration measuring means for measuring the concentration of the acid treatment liquid in the circulation tank 11, a conductivity meter 41 is provided that uses an electrode rod 42 immersed in the acid treatment liquid as a sensor. Exhaust means (not shown) for exhausting the atmospheric gas in the tank 11 was provided.

前記循環タンク11の液面レベル信号、及び濃度測定手段40の導電率計41による測定データは図示しないコントローラに入力され、このコントローラによって原液供給手段20の原液定量ポンプ22と純水供給手段30の純水定量ポンプ32のオンオフ制御を行い、酸処理液の原液と、純水との供給比率をコントローラで演算し循環タンク内の酸処理液の設定濃度である所定の濃度の供給量となるように流量制御を行う。   The liquid level signal of the circulation tank 11 and the measurement data by the conductivity meter 41 of the concentration measuring means 40 are input to a controller (not shown), and the controller controls the stock solution metering pump 22 of the stock solution supply means 20 and the pure water supply means 30. The ON / OFF control of the pure water metering pump 32 is performed, the supply ratio of the acid treatment liquid stock solution to the pure water is calculated by the controller, and the supply amount of a predetermined concentration which is the set concentration of the acid treatment liquid in the circulation tank is obtained. Control the flow rate.

前記酸処理設備1、循環タンク11、原液タンク21、供給配管13、回収配管14は、酸処理液によって腐食しない材質とし、例えば硝酸の場合は、ステンレス鋼、または樹脂製とする。   The acid treatment equipment 1, the circulation tank 11, the stock solution tank 21, the supply pipe 13, and the recovery pipe 14 are made of a material that does not corrode by the acid treatment liquid. For example, in the case of nitric acid, it is made of stainless steel or resin.

以下は、循環タンク11内の酸処理液の濃度を一定としながら、かつ自動的に酸処理液を循環タンク11内に補給する方法の実施の形態である。   The following is an embodiment of a method for automatically replenishing the acid treatment liquid into the circulation tank 11 while keeping the concentration of the acid treatment liquid in the circulation tank 11 constant.

その第1の実施の形態である酸処理液の自動補給方法は、酸と純水からなる酸処理液であって、蒸発により濃度が上昇する酸処理液の循環タンク11内の濃度を一定、かつ自動的に補給する方法において、循環タンク11内の酸処理液の液面センサが補給レベル17を検出した時点で、該循環タンク11内の酸処理液の濃度を連続的に測定し、設定濃度より高い濃度のとき、循環タンク11内の酸処理液の濃度を設定範囲内となるまで純水を補給し、次いで、高濃度の酸の原液と純水を予め演算によって循環タンク11内の酸処理液の設定濃度となるように算出した所定の比率で同時に循環タンク11の液面が上限レベル16に到達するまで補給を行う方法である。   The acid treatment liquid automatic replenishment method according to the first embodiment is an acid treatment liquid composed of acid and pure water, and the concentration in the circulation tank 11 of the acid treatment liquid whose concentration increases by evaporation is constant, In the automatic replenishment method, when the acid level sensor of the acid treatment liquid in the circulation tank 11 detects the replenishment level 17, the concentration of the acid treatment liquid in the circulation tank 11 is continuously measured and set. When the concentration is higher than the concentration, pure water is replenished until the concentration of the acid treatment liquid in the circulation tank 11 falls within the set range, and then the stock solution of pure acid and pure water with a high concentration are preliminarily calculated. In this method, replenishment is performed until the liquid level of the circulation tank 11 reaches the upper limit level 16 at a predetermined ratio calculated so as to obtain the set concentration of the acid treatment liquid.

その第2の実施の形態として、循環タンク11内の酸処理液面レベルが下限レベル18と上限レベル16間にあって、該酸処理液の濃度測定を連続的に行い、該酸処理液の濃度が設定値以上の時、該濃度が設定範囲内となるまで前記純水の補給を行い、
また、液面センサが補給レベル17を検出した時点で、原液と純水を予め演算によって循環タンク11内の酸処理液の設定濃度となるように算出した所定の比率で循環タンク11の液面が上限レベル16に到達するまで行う方法である。
As the second embodiment, the acid treatment liquid level in the circulation tank 11 is between the lower limit level 18 and the upper limit level 16, and the concentration of the acid treatment liquid is continuously measured. When above the set value, replenish the pure water until the concentration falls within the set range,
Further, when the liquid level sensor detects the replenishment level 17, the liquid level of the circulation tank 11 is calculated at a predetermined ratio calculated in advance so that the stock solution and the pure water become the set concentration of the acid treatment liquid in the circulation tank 11 by calculation. Is performed until the upper limit level 16 is reached.

前記酸処理液としては、搬送されるプラズマディスプレイ、または液晶ディスプレイ等のフラットパネルディスプレイ用ガラス基板の表面を酸処理するために使用する硝酸水溶液等の酸に、純水を混合した酸処理液で、その濃度を18vol%〜30vol%とし、さらに、該処理液を40℃〜50℃とするのが望ましい。   The acid treatment liquid is an acid treatment liquid in which pure water is mixed with an acid such as an aqueous nitric acid solution used for acid treatment of the surface of a glass substrate for a flat panel display such as a plasma display or a liquid crystal display to be conveyed. The concentration is preferably 18 vol% to 30 vol%, and the treatment liquid is preferably 40 ° C. to 50 ° C.

次に、本発明の作用について説明する。   Next, the operation of the present invention will be described.

循環タンク11内の酸処理液の補給が必要になった時点で、まず循環タンク11内の酸処理液の濃度を測定し、純水だけを先に補給するようにしたのは、例えば硝酸による酸処理液の場合には、酸処理液の蒸発によって循環タンク11内や酸処理設備1内の雰囲気ガス中に含まれる酸処理液の蒸発分の大半が水分であり、硝酸等の蒸発量は少ないので、酸処理液の濃度は所定濃度より高い濃度に変動していくため、まず循環タンク11内に純水を補給することにより、酸処理液の濃度を所定の濃度範囲内に戻すものである。   When the acid treatment liquid in the circulation tank 11 needs to be replenished, the concentration of the acid treatment liquid in the circulation tank 11 is first measured and only pure water is replenished first, for example with nitric acid. In the case of the acid treatment liquid, most of the evaporation of the acid treatment liquid contained in the atmospheric gas in the circulation tank 11 or the acid treatment facility 1 due to the evaporation of the acid treatment liquid is moisture, and the evaporation amount of nitric acid or the like is Since the concentration of the acid treatment liquid changes to a concentration higher than the predetermined concentration, the concentration of the acid treatment liquid is first returned to the predetermined concentration range by replenishing the circulation tank 11 with pure water. is there.

その後さらに、純水と酸処理液の原液を所定の比率で同時に循環タンク11の液面が上限レベル16に到達するまで補給を行うようにしたのは、酸処理液の原液だけを僅かであっても補給すると、循環タンク11内の酸処理液の濃度の変動が激しくなり、純水の補給により所定濃度に戻すのに時間がかかる上に、制御が複雑化するためである。   After that, the pure water and the acid treatment liquid stock solution were replenished at a predetermined ratio at the same time until the liquid level of the circulation tank 11 reached the upper limit level 16. Even if it is replenished, the concentration of the acid treatment liquid in the circulation tank 11 fluctuates greatly, and it takes time to return to a predetermined concentration by replenishing pure water, and the control becomes complicated.

特に液面レベルが循環タンク11の上限レベル16寸前の状態で、濃度の高い酸処理液の原液だけを補給すると、その後純水の供給が必要になっても上限レベルの検出で純水の補給ができなくなり、濃度調整ができなくなるためである。   In particular, when only the stock solution of the acid treatment liquid having a high concentration is supplied in a state where the liquid level is just before the upper limit level 16 of the circulation tank 11, even if it is necessary to supply pure water thereafter, the upper limit level is detected to supply pure water. This is because density cannot be adjusted.

前記酸処理液の濃度を18vol%以上30vol%未満としたのは、ガラス基板Gに付着する付着物等の汚れや落下物等を除去するのに、酸処理液の濃度を18vol%以上とすれば十分であり、逆に30vol%以上の高い濃度の酸処理液は、酸処理液自体のコストアップとなるだけでなく、設備に腐食等の悪影響を及ぼす恐れもあり、またガラス基板Gや処理液タンク等に付着している酸処理液に誤って作業者が接触したとき、高濃度ほど危険性が増し、取り扱いが困難となるためである。   The concentration of the acid treatment liquid is set to 18 vol% or more and less than 30 vol% because the concentration of the acid treatment liquid is 18 vol% or more in order to remove dirt such as adhering matter or falling matter attached to the glass substrate G. On the contrary, the acid treatment solution having a high concentration of 30 vol% or more not only increases the cost of the acid treatment solution itself, but also may cause adverse effects such as corrosion on the equipment. This is because when the operator accidentally contacts the acid treatment liquid adhering to the liquid tank or the like, the higher the concentration, the greater the danger and the handling becomes difficult.

また、酸処理液の温度を40℃前後まで加熱するようにしたのは、ガラス基板Gの表面に付着した微小な落下物やドロス、錫等の付着跡の膜等の汚れや付着物を除去するのに、酸処理液を40℃前後まで加熱した方が汚れの除去が早く、常温で処理する場合に比べてよりクリーンに除去できるためであるが、該加熱温度をさらに高くした場合、よりきれいに洗浄できる代わりに、酸処理液を供給する配管の材質、および酸処理設備に使用する材質についても樹脂系の材質が使用できなくなり、設備の腐食も増加するため安全性に問題があり、又、酸処理液の蒸発、特に水分の蒸発が増して濃度が変動するので好ましくない。   In addition, the temperature of the acid treatment solution is heated to about 40 ° C. to remove dirt and deposits such as minute falling matter, dross, tin, etc. attached to the surface of the glass substrate G. However, if the acid treatment liquid is heated to around 40 ° C., the removal of dirt is faster, and it can be removed more cleanly than in the case of treatment at room temperature, but if the heating temperature is further increased, Instead of cleaning it cleanly, the piping material that supplies the acid treatment liquid and the material used for the acid treatment equipment cannot be used with resin-based materials, which increases the corrosion of the equipment, and there is a safety problem. Further, the concentration of the acid treatment liquid, particularly the evaporation of water, increases and the concentration changes, which is not preferable.


[実施例1] 図1に示すように、容積濃度が3規定(18vol%)で40℃に加熱した硝酸水溶液を貯蔵した循環タンク11と、循環タンク11に接続され、工業用硝酸として市販されている濃度が67.5vol%の硝酸を貯蔵した硝酸の原液タンク21と、同じく循環タンク11に接続され、純水を貯蔵した純水タンク31をPDPや液晶等に使用されるガラス基板Gの酸処理設備1の近傍に配設した。

Example 1 As shown in FIG. 1, a circulation tank 11 storing a nitric acid aqueous solution heated to 40 ° C. with a volume concentration of 3 N (18 vol%), and connected to the circulation tank 11 and commercially available as industrial nitric acid. The nitric acid stock solution tank 21 storing nitric acid having a concentration of 67.5 vol% and the pure water tank 31 connected to the circulation tank 11 and storing pure water are used for a glass substrate G used for PDP, liquid crystal, etc. Arranged in the vicinity of the acid treatment facility 1.

前記循環タンク11内には、上端側から酸処理液のオーバーフロー防止のための極上限レベル(図示せず)、酸処理液の補給を上限とする上限レベル16、酸処理液の補給開始を検知する補給レベル17、酸処理液の下限レベル18のそれぞれのレベルを検出できるセンサを設けた。   In the circulation tank 11, the upper limit level (not shown) for preventing the overflow of the acid treatment liquid from the upper end side, the upper limit level 16 with the upper limit of replenishment of the acid treatment liquid, and the start of replenishment of the acid treatment liquid are detected. A sensor capable of detecting the replenishment level 17 and the lower limit level 18 of the acid treatment liquid was provided.

前記循環タンク11内の酸処理液は、循環ポンプによって酸処理設備1内の搬送されるガラス板Gの上面側と下面側に3規定(18vol%)の濃度の硝酸からなる酸処理液によってシャワー処理し、酸処理設備1内のガラス板Gにシャワーした残液を循環タンク11内に回収する。   The acid treatment liquid in the circulation tank 11 is showered by an acid treatment liquid composed of nitric acid having a concentration of 3 N (18 vol%) on the upper surface side and the lower surface side of the glass plate G conveyed in the acid treatment facility 1 by a circulation pump. The residual liquid that has been treated and showered on the glass plate G in the acid treatment facility 1 is collected in the circulation tank 11.

また、硝酸の原液タンク21内の67.5vol%の硝酸の原液を定量ポンプによって循環タンク11内に供給し、純水タンク31内の純水を定量ポンプによって循環タンク11内に供給する。   Also, a 67.5 vol% nitric acid stock solution in the nitric acid stock solution tank 21 is supplied into the circulation tank 11 by a metering pump, and pure water in the pure water tank 31 is supplied into the circulation tank 11 by a metering pump.

この酸処理設備1内で酸処理するガラス板Gの投入側と取出側開口部から酸処理液の蒸発した雰囲気ガスが漏れないように、図示しない排気手段によって雰囲気ガスを図示しない別の排ガス処理設備に排出し、同様に、循環タンク11内の蒸発した雰囲気ガスも図示しない排気手段によって排出するようにした。   Another exhaust gas treatment (not shown) is performed by an exhaust means (not shown) so that the atmosphere gas evaporated from the acid treatment liquid does not leak from the opening side and the opening side of the glass plate G to be acid treated in the acid treatment facility 1. Similarly, the atmosphere gas evaporated in the circulation tank 11 was also discharged by an exhaust means (not shown).

前記循環タンク11の液の濃度を測定するために導電率計の電極棒が液面内にセットされている。例えば18vol%の濃度の硝酸液を導電率計で測定したところ、測定値700ミリジーメンス(msc)/cmが得られたが、この値を濃度に換算すると3規定(18vol%)となることを、滴定分析にて確認した。

循環タンク11内の酸処理液を酸処理設備1に循環させ、ガラス板Gの酸処理中に、循環タンク11中の酸処理液の液面レベルが補給レベル17となった時点で、酸処理液の補給を開始する。
In order to measure the concentration of the liquid in the circulation tank 11, an electrode bar of a conductivity meter is set in the liquid surface. For example, when a nitric acid solution having a concentration of 18 vol% was measured with a conductivity meter, a measured value of 700 millisiemens (msc) / cm was obtained. When this value is converted into a concentration, it becomes 3 regulations (18 vol%). This was confirmed by titration analysis.

The acid treatment liquid in the circulation tank 11 is circulated to the acid treatment facility 1, and the acid treatment is performed when the level of the acid treatment liquid in the circulation tank 11 reaches the replenishment level 17 during the acid treatment of the glass plate G. Start replenishing the liquid.

まず、循環タンク11内の酸処理液の濃度を測定し、酸処理液の濃度が高いので、所定の濃度となるまで純水を補給した。   First, the concentration of the acid treatment liquid in the circulation tank 11 was measured, and since the concentration of the acid treatment liquid was high, pure water was replenished until a predetermined concentration was reached.

次いで、その後さらに、酸処理液の原液である67.5vol%(15.2N)の工業用硝酸と純水とを1:4の比率で循環タンク11内に同時に供給し、3N(規定)とする酸処理液の液面が補給停止レベルである上限レベル16をセンサで検出するまで補給を行った。   Subsequently, 67.5 vol% (15.2 N) of industrial nitric acid and pure water, which is a stock solution of the acid treatment liquid, are simultaneously supplied into the circulation tank 11 at a ratio of 1: 4, and 3N (normative). The acid treatment solution was replenished until the upper limit level 16 that is the replenishment stop level was detected by the sensor.

これにより、ガラス板の酸処理設備1を停止することなく、運転しながら循環タンク11内の硝酸水溶液の酸処理液の濃度を一定としながら、補給することができる。   Thereby, it can replenish, making the density | concentration of the acid treatment liquid of the nitric acid aqueous solution in the circulation tank 11 constant, operating, without stopping the acid treatment equipment 1 of a glass plate.

[実施例2]
実施例2で使用する設備は、前記実施例1に記載の設備と同一設備を用いて行う。循環タンク11内の酸処理液面レベルが下限レベル18と上限レベル16間にあって、該酸処理液の濃度測定を連続的に行い、該酸処理液の濃度が設定値以上の時、該濃度が設定範囲内となるまで前記純水の補給を行い、
また、液面センサが補給レベル17を検出した時点で、原液と純水を予め演算によって設定濃度となるように算出した所定の比率で循環タンク11の液面が上限レベル16に到達するまで行う。
[Example 2]
The equipment used in Example 2 is performed using the same equipment as that described in Example 1. When the acid treatment liquid level in the circulation tank 11 is between the lower limit level 18 and the upper limit level 16, the concentration of the acid treatment liquid is continuously measured, and when the concentration of the acid treatment liquid is equal to or higher than a set value, the concentration is Supply the pure water until it is within the set range,
Further, when the liquid level sensor detects the replenishment level 17, it is performed until the liquid level of the circulation tank 11 reaches the upper limit level 16 at a predetermined ratio calculated so that the stock solution and pure water have a preset concentration by calculation in advance. .

以上、好適な実施の形態について述べたが、本発明はこれに限定されるものではない。   The preferred embodiment has been described above, but the present invention is not limited to this.

本発明の酸処理設備の全体構成を示した概略図。Schematic which showed the whole structure of the acid treatment equipment of this invention.

符号の説明Explanation of symbols

G ガラス基板
1 酸処理設備
2 上部側シャワー
3 下部側シャワー
4 搬送コンベア
10 酸処理液循環手段
11 循環タンク
12 循環ポンプ
13 供給配管
14 回収配管
16 上限レベル
17 補給レベル
18 下限レベル
20 原液供給手段
21 原液タンク
22 定量ポンプ
30 純水供給手段
31 純水タンク
32 定量ポンプ
40 濃度測定手段
41 導電率計
42 電極棒
G glass substrate 1 acid treatment equipment 2 upper shower 3 lower shower 4 transport conveyor 10 acid treatment liquid circulation means 11 circulation tank 12 circulation pump 13 supply pipe 14 recovery pipe 16 upper limit level 17 replenishment level 18 lower limit level 20 stock solution supply means 21 Stock solution tank 22 Metering pump 30 Pure water supply means 31 Pure water tank 32 Metering pump 40 Concentration measuring means 41 Conductivity meter 42 Electrode bar

Claims (4)

酸と純水を混合した酸処理液であって、蒸発により濃度が上昇する酸処理液の循環タンク内の濃度を一定に維持し、かつ自動的に酸と純水を循環タンク内に補給する方法において、循環タンク内の酸処理液の液面センサが補給レベルを検出した時点で、該循環タンク内の酸処理液の濃度を連続的に測定し、設定濃度より高い濃度のとき、循環タンク内の酸処理液の濃度を設定範囲内となるまで純水を補給し、次いで、酸と純水を予め演算によって循環タンク内の酸処理液の設定濃度と同一となるように算出した所定の比率で酸と純水を同時に循環タンクの液面が補給停止レベルに到達するまで補給を行うことを特徴とする酸処理液の自動補給方法。 An acid treatment liquid in which acid and pure water are mixed, and the concentration of the acid treatment liquid whose concentration increases by evaporation is maintained constant, and the acid and pure water are automatically supplied to the circulation tank. In the method, when the level sensor of the acid treatment liquid in the circulation tank detects the replenishment level, the concentration of the acid treatment liquid in the circulation tank is continuously measured, and when the concentration is higher than the set concentration, the circulation tank The pure water is replenished until the concentration of the acid treatment liquid within the set range is reached, and then the acid and the pure water are calculated in advance so as to be equal to the set concentration of the acid treatment liquid in the circulation tank. An acid replenishment liquid automatic replenishment method, wherein acid and pure water are replenished at a ratio at the same time until the liquid level in the circulation tank reaches a replenishment stop level. 循環タンク内の酸処理液面レベルが下限レベルと上限レベル間にあって、該酸処理液の濃度測定を連続的に行い、該酸処理液の濃度が設定値以上の時、該濃度が設定範囲内となるまで純水の補給を行い、また、液面センサが補給下限レベルを検出した時点で、原液と純水を予め演算によって算出した所定の比率で循環タンクの液面が補給停止レベルに到達するまで行うことを特徴とする酸処理液の自動補給方法。 When the acid treatment liquid level in the circulation tank is between the lower limit level and the upper limit level, the concentration of the acid treatment liquid is continuously measured, and when the concentration of the acid treatment liquid is equal to or higher than the set value, the concentration is within the set range. When the water level sensor detects the replenishment lower limit level, the liquid level in the circulation tank reaches the replenishment stop level at a predetermined ratio calculated in advance for the stock solution and pure water. An automatic replenishment method of an acid treatment liquid, which is performed until 前記酸処理液は、搬送されるプラズマディスプレイ、または液晶ディスプレイ等のフラットパネルディスプレイ用ガラス基板の表面を酸処理するために使用する18vol%〜30vol%の濃度の硝酸と純水を混合した硝酸水溶液としたことを特徴とする請求項1または2に記載の酸処理液の自動補給方法。 The acid treatment liquid is a nitric acid aqueous solution in which nitric acid having a concentration of 18 vol% to 30 vol% used for acid treatment of the surface of a glass substrate for a flat panel display such as a plasma display or a liquid crystal display to be transported is mixed with pure water. The method for automatically replenishing an acid treatment liquid according to claim 1 or 2, wherein: 前記請求項1乃至3のいずれかに記載の酸処理液の自動補給方法に用いる自動補給装置であって、ガラス板面を酸処理する酸処理室と酸処理液を供給する循環タンク間とで酸処理液を循環させる酸処理液循環手段と、該循環タンク内の酸処理液の濃度を測定する濃度測定手段と、原液タンク内の酸処理液原液を循環タンク内に供給する原液供給手段と、純水タンク内の純水を循環タンク内に供給する純水供給手段と、前記酸処理室と循環タンク内の雰囲気ガスを排気する排気手段とからなり、前記循環タンクの液面レベル信号、及び濃度測定手段による測定データに基づき、原液供給手段の原液定量ポンプと純水供給手段の純水定量ポンプの流量制御をコントローラによって行い、酸処理液原液と、純水との供給比率をコントローラで演算し所定の濃度の供給量となるように流量制御を行うことを特徴とする酸処理液の自動補給方法に用いる酸処理液の自動補給装置。 It is an automatic replenishment apparatus used for the automatic replenishment method of the acid treatment liquid in any one of the said Claim 1 thru | or 3, Comprising: Between the acid treatment chamber which acid-treats a glass plate surface, and the circulation tank which supplies an acid treatment liquid Acid treatment liquid circulation means for circulating the acid treatment liquid, concentration measurement means for measuring the concentration of the acid treatment liquid in the circulation tank, and raw solution supply means for supplying the acid treatment liquid stock solution in the raw solution tank to the circulation tank A pure water supply means for supplying pure water in the pure water tank into the circulation tank, and an exhaust means for exhausting the atmosphere gas in the acid treatment chamber and the circulation tank, and a liquid level signal of the circulation tank, The controller controls the flow rate of the stock solution metering pump of the stock solution supply unit and the pure water metering pump of the pure water supply unit based on the measurement data obtained by the concentration measuring unit, and the controller supplies the supply ratio of the acid treatment solution stock solution to the pure water. Calculate Automatic replenishment device for the acid treatment solution for use in automatic replenishment process of acid treatment solution, characterized in that the flow rate controlled so that the supply amount of the constant concentration.
JP2006190906A 2006-07-11 2006-07-11 Method and equipment for automatically replenishing acid treatment liquid Pending JP2008019116A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109516696A (en) * 2017-09-20 2019-03-26 蓝思科技(长沙)有限公司 Strip equipment and display screen production system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109516696A (en) * 2017-09-20 2019-03-26 蓝思科技(长沙)有限公司 Strip equipment and display screen production system
CN109516696B (en) * 2017-09-20 2021-09-07 蓝思科技(长沙)有限公司 Deplating equipment and display screen production system

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