JP2007528607A5 - - Google Patents
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- JP2007528607A5 JP2007528607A5 JP2007502838A JP2007502838A JP2007528607A5 JP 2007528607 A5 JP2007528607 A5 JP 2007528607A5 JP 2007502838 A JP2007502838 A JP 2007502838A JP 2007502838 A JP2007502838 A JP 2007502838A JP 2007528607 A5 JP2007528607 A5 JP 2007528607A5
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- JP
- Japan
- Prior art keywords
- target
- start site
- plasma
- path
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 210000002381 Plasma Anatomy 0.000 claims 16
- 238000003384 imaging method Methods 0.000 claims 10
- 238000004458 analytical method Methods 0.000 claims 5
- 238000001514 detection method Methods 0.000 claims 4
- 238000006073 displacement reaction Methods 0.000 claims 3
- 238000000926 separation method Methods 0.000 claims 3
- 230000000875 corresponding Effects 0.000 claims 2
- 230000000977 initiatory Effects 0.000 claims 2
Claims (11)
ターゲット追跡及びフィードバックシステム、
を含み、
前記ターゲット追跡及びフィードバックシステムは、
ターゲットストリーム進路の画像を出力として供給する少なくとも1つの撮像装置と、 望ましいプラズマ開始サイトと交差する望ましいストリーム進路からの前記ターゲットストリーム進路にほぼ垂直な少なくとも1つ軸線における該ターゲットストリーム進路の位置の誤差を検出するストリーム進路誤差検出器と、
を含む、
ことを特徴とするシステム。 A laser generated plasma (LPP) extreme ultraviolet (EUV) light source control system comprising a target delivery system adapted to deliver a plasma initiation target and an EUV light focusing optics having a focal point defining a desired plasma initiation site, ,
Target tracking and feedback system,
Including
The target tracking and feedback system includes:
At least one imager that provides as an output an image of the target stream path, and an error in the position of the target stream path in at least one axis substantially perpendicular to the target stream path from the desired stream path intersecting the desired plasma start site A stream path error detector for detecting
including,
A system characterized by that.
を更に含むことを特徴とする請求項1に記載の機器。 At least one target crossing detector aiming at the target path and detecting the passage of the target through a selected spot in the target path;
The device of claim 1 further comprising:
ことを更に含むことを特徴とする請求項2に記載の機器。 The at least one target crossing detector is at least a first target crossing detector and a second target crossing detector;
The device of claim 2 further comprising:
を更に含むことを特徴とする請求項2に記載の機器。 A drive laser output pulse utilizes the output of the cross-target detector to intersect the plasma start target at a selected plasma start site at about its closest approach to the desired plasma start site along the target path. Drive laser trigger mechanism to determine the timing of the drive laser trigger,
The device of claim 2 further comprising:
を更に含むことを特徴とする請求項1に記載の機器。 A plasma start detector for aiming at the target path and detecting the position of the plasma start site along the target path for each target;
The device of claim 1 further comprising:
を更に含むことを特徴とする請求項1に記載の機器。 An intermediate focus illuminator that illuminates the aperture formed in the intermediate focus and images the aperture on the at least one imaging device;
The device of claim 1 further comprising:
ことを更に含むことを特徴とする請求項6に記載の機器。 The at least one imaging device is at least two imaging devices, each based on an analysis of an image at a respective one of the at least two imaging devices, and the target from a vertical central axis of the intermediate focus image Provide error signals related to path separation,
The device of claim 6 further comprising:
を更に含み、
前記ターゲット送出フィードバック及び制御システムは、
ターゲット送出ユニットと、
少なくとも第1の撮像装置内の画像の分析から導出された第1の変位誤差信号に対応する軸線において、及び少なくとも第2の撮像装置内の画像の分析から導出された第2の変位誤差信号に対応する軸線において前記ターゲット送出機構を変位させるターゲット送出変位制御機構と、
を含む、
ことを特徴とする請求項7に記載の機器。 Target delivery feedback and control system,
Further including
The target delivery feedback and control system includes:
A target delivery unit;
At least in the axis corresponding to the first displacement error signal derived from the analysis of the image in the first imaging device and at least in the second displacement error signal derived from the analysis of the image in the second imaging device. A target delivery displacement control mechanism for displacing the target delivery mechanism in a corresponding axis;
including,
The device according to claim 7.
を更に含み、
前記EUV出力光エネルギ検出機構は、
前記中間焦点に到達するEUV光エネルギを測定するために配置され、各々がそれぞれの検出器によって検出したEUV光エネルギの量を表す出力信号を供給する複数のEUV光エネルギ検出器と、
各EUV光エネルギ検出器の出力を受信し、かつ前記それぞれのEUV光エネルギ検出器の前記出力信号のそれぞれの値の比較に基づいてEUV光エネルギ誤差信号を判断するEUV光エネルギ誤差信号発生器と、
を含む、
ことを特徴とする請求項8に記載の機器。 EUV output light energy detection mechanism,
Further including
The EUV output light energy detection mechanism includes:
A plurality of EUV light energy detectors arranged to measure EUV light energy reaching said intermediate focus, each providing an output signal representing the amount of EUV light energy detected by a respective detector;
An EUV light energy error signal generator that receives the output of each EUV light energy detector and determines an EUV light energy error signal based on a comparison of the respective values of the output signals of the respective EUV light energy detectors; ,
including,
The device according to claim 8.
を更に含み、
前記開始サイト誤差検出機構は、
画像データを供給する前記少なくとも2つの撮像装置の1つ、
を含み、
前記画像データから、前記少なくとも2つの撮像装置の前記それぞれのものにおける該画像データの分析に基づく望ましいプラズマ開始サイトからの実際のプラズマ開始サイトの第1の軸線における分離と、該それぞれの撮像装置における該画像の分析に基づく前記中間焦点の前記画像の水平中心軸からの該プラズマ開始サイトの該第1の軸線と直交する第2の軸線における分離とに関連する第1の誤差信号を判断することができる、
ことを特徴とする請求項9に記載の機器。 Start site error detection mechanism,
Further including
The start site error detection mechanism includes:
One of the at least two imaging devices for supplying image data;
Including
A separation in the first axis of the actual plasma start site from a desired plasma start site based on an analysis of the image data in the respective one of the at least two imaging devices from the image data; and in the respective imaging device Determining a first error signal associated with a separation in a second axis perpendicular to the first axis of the plasma start site from a horizontal central axis of the image at the intermediate focus based on an analysis of the image; Can
The device according to claim 9.
ターゲット追跡及びフィードバック方法を利用する段階、
を含み、
前記方法は、
少なくとも1つの撮像装置を用いて、ターゲットストリーム進路の画像を準備する段階と、
ストリーム進路誤差検出器を用いて、望ましいプラズマ開始サイトと交差する望ましいストリーム進路からの前記ターゲットストリーム進路にほぼ垂直な少なくとも1つの軸線内の該ターゲットストリーム進路の位置の誤差を検出する段階と、
を含む、
ことを特徴とする方法。 Laser-produced plasma (LPP) extreme ultraviolet (EUV) light comprising using a control system that includes a target delivery system for delivering a moving plasma forming target and an EUV light collection optics having a focal point that defines a desired plasma start site A method for generating
Using target tracking and feedback methods;
Including
The method
Using at least one imaging device to prepare an image of the target stream path;
Using a stream path error detector to detect an error in the position of the target stream path in at least one axis substantially perpendicular to the target stream path from the desired stream path intersecting the desired plasma start site;
including,
A method characterized by that.
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/798,740 | 2004-03-10 | ||
US10/798,740 US7217940B2 (en) | 2003-04-08 | 2004-03-10 | Collector for EUV light source |
US10/803,526 | 2004-03-17 | ||
US10/803,526 US7087914B2 (en) | 2004-03-17 | 2004-03-17 | High repetition rate laser produced plasma EUV light source |
US10/900,839 US7164144B2 (en) | 2004-03-10 | 2004-07-27 | EUV light source |
US10/900,839 | 2004-07-27 | ||
PCT/US2005/005935 WO2005091879A2 (en) | 2004-03-10 | 2005-02-24 | Euv light source |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007528607A JP2007528607A (en) | 2007-10-11 |
JP2007528607A5 true JP2007528607A5 (en) | 2008-04-10 |
JP4917014B2 JP4917014B2 (en) | 2012-04-18 |
Family
ID=34922843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007502838A Active JP4917014B2 (en) | 2004-03-10 | 2005-02-24 | EUV light source |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4917014B2 (en) |
Families Citing this family (24)
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US7193229B2 (en) * | 2004-12-28 | 2007-03-20 | Asml Netherlands B.V. | Lithographic apparatus, illumination system and method for mitigating debris particles |
US8071963B2 (en) * | 2006-12-27 | 2011-12-06 | Asml Netherlands B.V. | Debris mitigation system and lithographic apparatus |
US7960701B2 (en) | 2007-12-20 | 2011-06-14 | Cymer, Inc. | EUV light source components and methods for producing, using and refurbishing same |
JP5534647B2 (en) * | 2008-02-28 | 2014-07-02 | ギガフォトン株式会社 | Extreme ultraviolet light source device |
US7872245B2 (en) * | 2008-03-17 | 2011-01-18 | Cymer, Inc. | Systems and methods for target material delivery in a laser produced plasma EUV light source |
JP5603135B2 (en) * | 2009-05-21 | 2014-10-08 | ギガフォトン株式会社 | Apparatus and method for measuring and controlling target trajectory in chamber apparatus |
JP5670174B2 (en) * | 2010-03-18 | 2015-02-18 | ギガフォトン株式会社 | Chamber apparatus and extreme ultraviolet light generation apparatus |
JP2013065804A (en) | 2010-12-20 | 2013-04-11 | Gigaphoton Inc | Laser device and ultraviolet light generation system equipped with the same |
JP2012199512A (en) * | 2011-03-10 | 2012-10-18 | Gigaphoton Inc | Extreme ultraviolet light generation apparatus and extreme ultraviolet light generation method |
US8993976B2 (en) * | 2011-08-19 | 2015-03-31 | Asml Netherlands B.V. | Energy sensors for light beam alignment |
JP5275424B2 (en) * | 2011-08-31 | 2013-08-28 | ギガフォトン株式会社 | Extreme ultraviolet light source device |
JP5275425B2 (en) * | 2011-08-31 | 2013-08-28 | ギガフォトン株式会社 | Extreme ultraviolet light source device |
JP6021454B2 (en) * | 2011-10-05 | 2016-11-09 | ギガフォトン株式会社 | Extreme ultraviolet light generation apparatus and extreme ultraviolet light generation method |
KR20140071490A (en) * | 2011-10-07 | 2014-06-11 | 에이에스엠엘 네델란즈 비.브이. | Radiation source |
WO2013083335A2 (en) * | 2011-12-06 | 2013-06-13 | Asml Netherlands B.V. | Radiation source |
JP6291477B2 (en) * | 2012-04-23 | 2018-03-14 | エーエスエムエル ネザーランズ ビー.ブイ. | Contamination trap for lithographic apparatus |
WO2015029137A1 (en) * | 2013-08-27 | 2015-03-05 | ギガフォトン株式会社 | Extreme ultraviolet light generation apparatus and extreme ultraviolet light generation system |
JP6513025B2 (en) | 2013-09-17 | 2019-05-15 | ギガフォトン株式会社 | Extreme ultraviolet light generator |
WO2016147255A1 (en) | 2015-03-13 | 2016-09-22 | ギガフォトン株式会社 | Target image-capture device and extreme-ultraviolet-light generation device |
TWI739755B (en) * | 2015-08-12 | 2021-09-21 | 荷蘭商Asml荷蘭公司 | Target expansion rate control in an extreme ultraviolet light source |
WO2017077614A1 (en) | 2015-11-05 | 2017-05-11 | ギガフォトン株式会社 | Extreme ultraviolet light generating device |
WO2017154111A1 (en) * | 2016-03-08 | 2017-09-14 | ギガフォトン株式会社 | Extreme ultraviolet light generation device |
US9778022B1 (en) * | 2016-09-14 | 2017-10-03 | Asml Netherlands B.V. | Determining moving properties of a target in an extreme ultraviolet light source |
US10314154B1 (en) * | 2017-11-29 | 2019-06-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for extreme ultraviolet source control |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4273572B2 (en) * | 1999-05-25 | 2009-06-03 | 株式会社ニコン | X-ray generator, X-ray exposure apparatus having the same, and X-ray generation method |
JP2001108799A (en) * | 1999-10-08 | 2001-04-20 | Nikon Corp | Method of manufacturing x-ray generator, x-ray exposure device, and semiconductor device |
US6792076B2 (en) * | 2002-05-28 | 2004-09-14 | Northrop Grumman Corporation | Target steering system for EUV droplet generators |
JP4088485B2 (en) * | 2002-07-04 | 2008-05-21 | オムロンレーザーフロント株式会社 | Light wave generator and light wave generation method |
-
2005
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