JP2007525315A - Electromagnetic control method of chemical catalyst - Google Patents

Abstract

In the method and system of this embodiment, at least one part of the particle is used to initiate and / or promote at least one catalytic chemical reaction, via at least photon-electron resonance, also known as excitation. Supply heat. In embodiments, the particles are structures such as nanostructures or metal structures. One or more metal structures are heated as a result of the interaction of delocalized surface electrons of one or more particles caused by the incidence of electromagnetic waves having at least a specific frequency and / or a specific frequency band . In this way, the catalytic chemical reaction can be controlled by spatially and temporally controlling the heat generated at the nanometer dimension in a manner similar to the method of providing the catalytic chemical reaction temperature.

Description

[Cross-reference of related applications]
This application claims the priority of the invention, Process of Chemical Vapor Deposition of Arrayed Nanostructures: Photon-Electron Assisted CVD, US Provisional Application No. 60 / 529,869, filed December 15, 2003, by reference. This is incorporated here.

  The present invention aims at locally heating a micro- or nanostructure, and further aims at this heating method and utilization method. In particular, from a certain point of view, the present invention provides a method of heating nano and microstructures that promote catalytic chemical reactions, particularly in a very limited range. From one point of view, as disclosed, heat is generated in a structure or in the vicinity of a structure or structures that generate heat by photon-electron resonance and / or in a chemical reaction that occurs. The purpose is to supply.

  It is well known to utilize catalysts on a wide scale in successive chemical reactions. Many catalytic reactions have thermal thresholds. Prior art methods generally use a small heat source that supplies heat to the reaction. Small heat sources generally cause poor transmission, conduction and radiation. Examples of the minute heat source include a hot wire, an oven, a lamp, and a heated gas.

  When a commonly used heating method is used, it is difficult to control the temperature of the catalyst, the temperature around the catalyst, and / or the supplied heat both temporally and spatially. For example, it is preferable to cause the reaction to occur in a predetermined time that is considered to be less than the time determined by the time constant associated with the container or substrate occurring in, on, or in the vicinity, respectively. For example, if there is a means that can supply desired heat to a very narrow specific area without heating the container and / or the chamber and / or the substrate, the heat capacity of the container and the substrate can be ignored. The temporal control over the temperature and the temporal control of the catalyst can be made better, for example, the reaction time can be effectively shortened. It is also preferred that the reaction occur spatially and locally on the order of nanometers and / or microns.

ここでε0は、自由空間での誘電率であり、εは粒子の誘電率であり、εｍは、ナノ粒子の誘電率である。共鳴は、空間的に一定で、時間変化がある場において以下の条件が満たされるとき、生ずる。
。

貴金属はこの条件を満たす。そして、これに対応するナノ構造体は、スペクトルの可視領域において光子・電子共鳴（Photon-Electron resonance）と関連し、強い吸収性を有することが知られている。「U.K.Kreibig and M. Vollmer's, Optical Properties of Metal Clusters. Springer-Verlag., New York, 1995」を引用し、この内容を本明細書に取り込む。共鳴周波数の近傍では、吸収は桁が変わる程度に増加する。パーティクルが適切な共鳴周波数を完全に吸収すると仮定すると、σをシュテファン・ボルツマン定数として、シュテファン・ボルツマンの式

を解くだけで、粒子を所定温度にするために必要な力を計算することができる。 The heat generated when photons and metal nanoparticles are combined is given by the following equation. It is assumed that the polarizability is α and the radius of the metal sphere is R.

Here, ε0 is the dielectric constant in free space, ε is the dielectric constant of the particles, and εm is the dielectric constant of the nanoparticles. Resonance occurs when the following conditions are met in a field that is spatially constant and time-varying.
.

Precious metals satisfy this condition. And the nanostructure corresponding to this is known to have strong absorptivity in connection with photon-electron resonance in the visible region of the spectrum. "UKKreibig and M. Vollmer's, Optical Properties of Metal Clusters. Springer-Verlag., New York, 1995" is incorporated herein by reference. In the vicinity of the resonance frequency, the absorption increases to the extent that the digit changes. Assuming that the particle fully absorbs the appropriate resonance frequency, the Stefan-Boltzmann equation, where σ is the Stefan-Boltzmann constant

By simply solving, the force required to bring the particles to a given temperature can be calculated.

  As mentioned above, local nanoscale reactions and, in particular, devices, structures, methods and systems that can be used for this are considered particularly necessary in various applications and fields.

  One aspect of the present invention is to provide a technique aimed at chemical treatment. It is another object of the present invention to provide a micro or nano structure and a method for using them. The present invention can also be used in other fields and usage methods such as life science, chemistry, material science, nanotechnology, and electronics.

  In the present embodiment, the temperature-dependent chemical reaction is promoted by localized heat generated at least by photon-electron resonance. Photon / electron resonance is cited in the literature as plasmon resonance or is known to those skilled in the art.

  As shown in the Examples and Embodiments, the present invention provides Photon-Electron Assisted Chemical Vapor Deposition (PACVD). In photon / electron assisted chemical vapor deposition, heat generated by photon / electron interaction in a nanometer-sized structure is used as a heat source for initiating or promoting a catalytic chemical reaction associated with a deposited material.

  In this embodiment, as disclosed, the reaction product may be a reaction product simply heated by photon-electron interaction. The reactants heated in this manner can be used for additional steps and / or treatments if necessary. As specifically disclosed, by utilizing electromagnetic waves of a specific predetermined frequency and / or frequency band, a nanometer-sized structure that excites photon / electron resonance in a structure having at least a nanometer size and further causes a chemical reaction. Control body heat and relative temperature.

  In this embodiment, the laser emits an electromagnetic wave that is used to excite at least photon / electron resonance.

  In the present embodiment, the present invention uses a light source such as a laser light source and a general optical system in order to generate a desired electromagnetic wave. The desired electromagnetic waves are those that selectively generate photon-electron resonances in nanometer-sized structures at substantially lower energy densities than those commonly used to heat materials in the prior art. This can further encourage the initiation and / or promotion of the reaction.

  According to this embodiment, spatial control on the nanometer scale of chemical treatment such as chemical synthesis, deposition, and / or decomposition on the catalyst substrate is possible. This likewise allows a high degree of temporal control of the treatment temperature and reaction temperature. When the flow of electromagnetic waves incident on the nanometer-sized structure is stopped, the temperature of the nanometer-sized structure quickly decreases. For example, the photon-electron resonances of these structures already generated are attenuated / reduced, as are the local heat generation associated therewith.

  Techniques for using micro or nanostructures as electromagnetically controlled chemical catalysts are provided. More particularly, according to the present invention, a method and system for promoting a chemical reaction via a catalyst by combining a microstructure functioning as a catalyst and controlling heat and temperature by photon / electron resonance generated by electromagnetics The result can be provided.

In this embodiment, the method includes reactants adjacent to one or more particles, such as but not limited to reactive species (eg, titanium (2,2,6,6-tetramethyl-3, 5-hepta). Corresponding to the step of preparing the screwone, SiH ₄ , GeH ₄ )) and the P-ERF of the surface electrons of one or more structures such as particles or particles, or the photon-electron resonance frequency, or Irradiating one or more particles with an electromagnetic wave having a substantially corresponding predetermined frequency (emitted from a laser light source or other light source). The word “adjacent” includes the case where one object is actually in contact with the other. The reactant may be an element or a component that promotes or becomes a part of the reaction caused by exposure to heat generated by at least photon / electron resonance excitation disclosed herein. The rise in the temperature of one or more particles to at least a predetermined temperature (for example, reaction temperature) is caused by the influence of an electromagnetic wave having at least a predetermined frequency. This method causes a chemical reaction of the reactants by raising the temperature of one or more particles at least.

  In this embodiment, another method for accelerating the catalytic chemical reaction using electromagnetic waves is also provided. This method comprises the step of preparing one or more particles. Preferably, the one or more particles have thermal properties. This method includes a step of irradiating one or more particles with an electromagnetic wave having a predetermined frequency using at least one reactant and / or one or more particles adjacent to each other. This method raises the temperature of one or more particles to a predetermined temperature under the influence of at least an electromagnetic wave having a predetermined frequency, and causes a catalytic chemical reaction of at least one reactant from the temperature increase of one or more particles. And a step of causing. This heat can also be used for other processes, such as initiating the formation of reaction products.

  In this embodiment, the particles themselves heated by the irradiation of electromagnetic waves and the photon / electron interaction function as a catalyst in the chemical reaction process. In other embodiments, a plurality of particles can be used together. While other particles are functioning as a catalyst, some of these particles can be locally heated by the photon-electron interaction described above so that the desired chemical reaction occurs at the preferred temperature or temperature range. It may be used to generate. Spatial and temporal control may be performed in either one or both of the cases described above.

  Further, according to the present invention, there is provided a method of forming a reaction product using heat generated by at least photon / electron resonance in a structure disposed on a substrate by a predetermined method as disclosed in the embodiment, for example. Provided. For example, the method comprises providing a substrate comprising a pattern of at least one or more structures, preferably one or more nanostructures formed from a predetermined material. The method includes the steps of determining a P-ERF of a nanostructured material, and an electromagnetic wave source that supplies an electromagnetic wave having a frequency or frequency band overlapping with the P-ERF that generates and increases the thermal energy of a given material. And exciting at least a part of the predetermined material. In this method, at least one reactant is supplied so as to cover / adjacent the substrate and a predetermined material excited by P-ERF, and at least the supplied reactant generates a desired reaction product. And a step of causing.

  As in the embodiments, the present invention provides one or more features described below, for example. These characteristics will be further clarified in the present specification, particularly by the contents described below.

  1. Photon-electron resonance in metal nanostructures is used as a method for generating local temperature characteristics or a method for generating sufficient heat to initiate a chemical reaction.

2. In the embodiment, photon / electron excitation in a metal nanostructure capable of generating heat locally in a predetermined space is disclosed. A continuous process is provided as shown below.
a. For example, without limitation, an array of palladium or gold particles may be formed on a pre-existing substrate by a predetermined method, such as, but not limited to, electron beam lithography, precipitation, nanoimprinting, etc. Create and / or prepare metal nanostructures.
b. P-ERF (or frequency band, for example) is calculated and / or used for the material, space, particle size, etc. of the metal nanostructure.
c. A light source having a density sufficient to generate photon-electron resonance that generates heat in at least one nanostructure and an appropriate frequency and / or frequency band is used. At the same time, it is also possible to use a light source or a diffusion source that concentrates on a specific region so that all nanostructures can be excited simultaneously.
d. At least one reactant, eg, a reactant such as a vaporized chemical precursor, is supplied and contacted with a metal nanostructure that is heated to function as a catalyst for the chemical reaction, and step c is performed in a predetermined space.

  Controlling the electromagnetic wave source can also be used to start / stop heating. It will be stopped more quickly. Since the interaction generated through at least photon / electron resonance by the electromagnetic wave irradiated to the metal nanostructure heats a specific region of the metal structure, not the entire substrate, heating is started more quickly. When the electromagnetic wave having an appropriate frequency or frequency band is stopped from being incident on the metal structure, the metal structure can be cooled at a very high speed because the metal structure has a small size and capacity.

  Depending on the embodiment, one or more of these features may be provided. Of course, various changes, modifications, and alternatives can be made by those skilled in the art. In particular, various types of particles, nanoparticles, and nanostructures can be used in the same processing. Particles or nanostructures are used to control temperature in the above-described method, but do not have catalytic activity. Other particles may be set and installed to function with the catalyst when an appropriate temperature is reached.

  In addition, according to the embodiment, it is possible to provide a processing method and an apparatus that are compatible with and harmonize with a conventionally used manufacturing / processing technique without substantially changing equipment. Preferably, according to the technique disclosed herein, an improved processing method can be provided which is suitable for design criteria of nanometer scale or lower scale. These or other advantages will be apparent from the description, particularly as described below.

  In an embodiment, particularly local heating of a structure, for example a nanostructure, is obtained at least from photon-electron resonance. In other embodiments, heat is generated until a desired temperature is reached, and in particular, local heating of these structures can also be obtained by other effects, such as collisions of electromagnetic waves incident on the structures, or combinations of effects. . For example, the local heating effect of the present invention includes photon / electron resonance excitation, phonon lattice vibration, hole generation / dynamics, Landau damping, or a combination thereof.

  From a certain viewpoint, according to the present invention, it is possible to provide a method for promoting a chemical reaction using local heat. This method includes a step of preparing a substrate on which at least one structure is disposed, a step of introducing at least one reactant in the vicinity of at least one structure, and a step of irradiating at least one structure with electromagnetic waves. And comprising. In the embodiment, a plurality of structures are used. The electromagnetic wave is absorbed by at least one structure and has a predetermined frequency or frequency band for exciting photon / electron resonance in the at least one structure. This allows heat to be generated locally from at least one structure by photon-electron resonance up to a temperature that promotes at least one catalytic chemical reaction with one reactant producing at least one reaction product. Can be raised.

  In an embodiment, at least one structure is pre-formed and placed on a substrate in a desired configuration to determine a region where one catalytic chemical reaction occurs. In this case, the term “preliminarily formed” includes at least one structure or a plurality of structures, and the at least one structure is, for example, a particle, a dot, a sphere, a wire, a line, a film, or a combination thereof. It is formed in any shape. In embodiments, particles, dots, spheres, wires, lines, films, combinations thereof have nanoscale dimensions (height, length, width, radius, diameter, diagonal, etc.). In embodiments, the particles and / or spheres have a radius of about 0.5 to 500 nm, or about 1 to 100 nm.

  In embodiments, the at least one structure is at least one metal or includes one metal. The metal is any of gold, copper, silver, titanium, aluminum, nickel, palladium, platinum, ruthenium, iridium, iron, cobalt, rhodium, osmium, zinc, or a combination thereof. The at least one metal functions as a catalyst in at least one chemical reaction and / or functions as a local heat source that supplies heat at the reaction temperature. In embodiments, the at least one reactant is any of gas, liquid, plasma, solid, and combinations thereof.

  In an embodiment, the at least one structure includes at least one element or a combination of elements described in the periodic table of elements, or a combination thereof. The at least one structure functions as a catalyst in at least one chemical reaction and / or functions as a local heat source that supplies heat to the chemical reaction temperature. In embodiments, the at least one reactant is a gas, liquid, plasma, solid, or a combination thereof.

  In embodiments, the at least one chemical reaction involving at least one reactant may be, for example, a dissociation reaction in which at least one reaction product is at least one reactant or includes a portion. In an embodiment, the at least one reactant is a compound with a specific elemental ratio, and the at least one reaction product has the same elemental ratio as the compound, but the at least one reaction product has at least the pre-reaction compound and Are different in one characteristic. For example, the characteristic change is a change in the arrangement of elements, a change in the number of bonds, a change in bond type, or a change in bond angle. In an embodiment, the reaction causes at least one property change, resulting in at least one reactant isomer. In embodiments, such isomers may be optical isomers.

  In embodiments, the at least one chemical reaction involving at least one reactant is, for example, any of a substitution reaction, an addition reaction, a removal reaction, a condensation reaction, or a combination thereof. In embodiments, at least one reactant is combined with at least a second reactant to yield a reaction product.

  The electromagnetic wave used in the embodiment is a laser supplied from a laser light source. Various laser light sources and lasers can be used in the present invention. For example, the electromagnetic wave may be ultraviolet light, visible light, infrared light, or a combination thereof. In the embodiment, the electromagnetic wave is applied to at least a part of the substrate.

  From one aspect, the present invention provides a method wherein at least one reactant is a carbon compound. In embodiments, at least a second reactant is provided, at least one reactant is a carbon compound, and the second compound is a hydrogen compound.

  In the embodiment, the substrate is made of silicon, a group III / V element, SOI (Silicon On Insulator), germanium, quartz, glass, or a combination thereof.

  In the embodiment, an electromagnetic wave having a predetermined frequency or frequency band is irradiated onto a plurality of structures or a set of a plurality of structures. The plurality of structures include at least a first set and a second set of structures. Each set differs from the other sets in its components. In some embodiments, the first set rises in temperature to a first reaction temperature that advances at least one catalytic chemical reaction due to an interaction caused by irradiating the first set with electromagnetic waves. Further, in the next step, unlike the electromagnetic wave supplied earlier, the second set is further supplied with an electromagnetic wave having a predetermined frequency or frequency band that excites photon / electron resonance, which is necessary for an additional reaction. The correct temperature.

  In the present invention, in addition to photon / electron resonance that generates heat, phonon lattice vibration, hole generation / dynamics, Landau damping, or a combination thereof locally supplies heat to at least a part. Methods and apparatus are provided.

  In the present invention, an apparatus used for photon-electron assisted deposition is disclosed. In an embodiment, such an apparatus is installed in a predetermined space, at least one inlet connected to the predetermined space and introducing at least one reactant into the space, and at least one structure. A prepared substrate. There is also an electromagnetic wave supply source arranged so that the substrate can be irradiated with an electromagnetic wave having a predetermined frequency or frequency band that is absorbed by at least one structure and excites photon / electron resonance in at least one structure. . In the embodiment, the electromagnetic wave is supplied so as to irradiate at least a part of the substrate on which at least one structure is disposed. Accordingly, at least one structure and at least photon / electron resonance can be used to locally heat to a temperature that promotes at least one catalytic chemical reaction involving at least a reactant. The device further includes at least one outlet connected to the predetermined space. At least one outlet leads at least one reaction product from the predetermined space. A second inlet connected to the predetermined space and / or a second outlet leading out from the predetermined space may be further provided.

  In embodiments relating to the apparatus, the at least one structure is, but is not limited to, any of gold, copper, silver, titanium, aluminum, nickel, palladium, platinum, ruthenium, iridium, iron, zinc, or combinations thereof Among these, at least one kind of metal is included. At least one structure is formed in any shape among particles, dots, spheres, wires, lines, films, or combinations thereof. As described above, an apparatus embodiment has at least one structure in the shape of any of particles, dots, spheres, wires, lines, films, or combinations thereof with nanoscale dimensions. For example, dimensions such as height, width, and thickness are any of 0.5 to 500 nm. In the embodiment, a structure having a dimension of 1 to 100 nm, a structure having a dimension of 10 to 50 nm, or a structure having a dimension substantially the same as or between them is used.

  According to embodiments, at least one metal of the at least one structure is a catalyst in at least one deposition reaction and / or functions as a heat source for the reaction. For example, the at least one reactant may be a gas, a liquid, a plasma, a solid, or a combination thereof.

  Various other objects, features and advantages of the present invention will become more apparent with reference to the detailed description and drawings set forth below.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings schematically showing the disclosed technology. Other embodiments and utilization methods of the technology disclosed in this specification can also be implemented, and further, structural and functional without departing from the technical idea and scope disclosed in this embodiment. It is possible to make changes. In addition, the drawings are for illustrative purposes and do not indicate limitations on relative shapes, sizes, scales, ratios.

  Provided are technologies aimed at micro- or nanostructures and their utilization. In addition, from one aspect, the techniques disclosed herein can be used to form nano- or microstructures using common deposition techniques that can be widely used in a variety of applications. Methods, systems, results, and methods of using these are provided. By way of example only, such deposition methods are applied in forming single layers or multilayers in the manufacture of electrical products such as integrated circuits, storage media, volatile and non-volatile storage, for example. The present invention is considered to be applied more widely than this. Although not meant to limit, for example, generating heat by electromagnetic resonance excitation of surface electrons dissociated by irradiating electromagnetic waves on the surface of a specific structure formed in particles, rods, wires, spheres, etc. The present invention can be applied to various manufacturing techniques, and can be used particularly for nano-scale manufacturing techniques, chemical treatments, and applications that require local heat generation.

  In this embodiment, as related to the techniques described and disclosed herein, the size of the structure that is exposed to electromagnetic waves to provide / generate heat is heated to a desired temperature, such as the reaction temperature. Having a dimension of about 0.5 to about 500 nm, preferably about 1 to 100 nm, or a range between them, so that at least photon-electron resonance for supplying the light occurs.

  In the present embodiment, the outline of the thin film forming method using the photon / electron assist method based on the example of the present invention is as follows.

  A substrate having a surface region on which a metal structure, preferably a metal nanostructure, is provided is provided. In the present embodiment, the metal structure has particularly thermal characteristics, for example, characteristics such that it can be exposed to an appropriate electromagnetic wave having an appropriate P-ERF or P-ERF region to generate photon / electron resonance. One or more particles provided. P-ERF is a frequency at which electromagnetic energy from electromagnetic waves is effectively intensively converted into selective electronic operation within an individual. The photon-electron resonance frequency can be derived by solving the Maxwell equation using appropriate band states or by experimentally measuring the reflection or absorption spectrum. One of the particles is arranged on at least a part of the surface area of the substrate. At least one reactant is provided around one or more particles. Although at least one reactant is composed of at least one component, the reactant may include two or more components. One or more particles are irradiated with an electromagnetic wave having a predetermined frequency in a predetermined space region. The spatial region is substantially defined by the placement of one or more particles on the substrate. An overcrowded space region can also include a region where one or more particles on the substrate are not disposed. A spatial area is an area that is less than the area on the substrate where one or more particles are placed, for example, if the irradiation is on some particles but not on other particles within a given time. May be.

  The preselected frequency of the electromagnetic wave to irradiate is a frequency that matches or substantially matches the P-ERF of the placed metal structure, here one or more particles. Accordingly, the temperature of one or more particles having thermal characteristics is increased to at least a predetermined temperature due to the influence of an electromagnetic wave having at least a predetermined frequency. The substrate surrounding the particles is not overheated compared to one or more particles. In this way, at least one space and place are heated by photon / electron resonance generated by irradiating electromagnetic waves having a predetermined frequency to surface electrons delocalized in one or more particles. Desired energy (eg, heat) can be supplied that causes a chemical reaction involving at least one reactant from an increase in temperature of one or more particles. This can initiate a reaction that can be used to form / deposit a thin film of a predetermined material with at least one reactant.

  The metal structure 8 shown in FIGS. 1 and 1A-1C is simply expressed as a rectangle for convenience of explanation, but may be any shape as described above. For example, but not in a limiting sense, the metal structures 8 are made by injecting electromagnetic waves 4 into an array on the substrate 2 in a CVD environment in which at least one reactant such as a vaporized chemical precursor 6 is present. Is excited.

FIGS. 1A-1C are schematic diagrams illustrating an enlarged surface of a structure with respect to heat disclosed by the photon-electron interaction in a nanometer-sized structure for the disclosed technique. Taking the metal structure 8 as an example in FIG. 1A, dissociated surface electrons are expressed as e ⁻ . When an electromagnetic wave 4 having a frequency that matches the photon / electron resonance of these surface electrons is incident, excitation occurs and photon / electron resonance occurs. This resonance generates heat up to the reaction temperature at which the reaction between the metal structure 8 and at least one reactant such as the chemical precursor 6 occurs and / or the reaction between the chemical precursors 6 occurs. By this reaction, the deposited layer 10 is formed. In an embodiment, at least one structure functions as a catalyst as well as generates heat. As disclosed herein, when heat is localized, chemical reactions and deposition can occur in conjunction.

Turning to FIG. 1B, the material that forms the deposited layer 10 itself comprises dissociated surface electrons as illustrated as e ⁻ . A secondary electromagnetic wave 20 and a second reactant such as a second chemical precursor 21 are introduced. The secondary electromagnetic wave 20 has a frequency that coincides with the photon / electron resonance of the surface electrons (e ⁻ ), causes excitation, and causes at least secondary photon / electron resonance, which is accompanied by heat. Is generated. The thermal effect resulting from the photon-electron interaction in the nanoparticles is related to the average kinetic energy of the conduction electrons. When electromagnetic waves are incident, the amplitude of electrons of the surface electrons of the metal is generated, and the average kinetic energy is increased. The increase in the kinetic energy of the surface electrons is transferred in a so-called random manner to the electrons inside the surface, ie bulk electrons. This is the basis of radiant heating. However, if the electromagnetic wave is the same as or near the P-ERF, the amplitude or resonance of the surface electrons generally occurs and the heat is maximized. When the size of the structure is reduced, the ratio of the surface area to the volume, that is, the ratio represented by 1 / R, where R is the particle radius, increases. Nanoparticles have a particularly high volume to surface area ratio so that a large amount of surface electrons are present compared to bulk electrons. It is generally considered that this is the reason why nanoparticles can be efficiently heated by electromagnetic waves having a plasmon resonance frequency. The most preferred absorption frequency depends on the shape of the individual nanoparticles as well as how to select the geometrical arrangement of the nanoparticle population (such as on the surface). For spherical nanoparticles, the calculation of absorption spectra was done by Mie et al. At the beginning of the last century. Recent experimental results suggest that the heating process occurs on a fairly fast time scale. The heat generated effectively raises the temperature and causes a chemical reaction. The heat acts between the deposition layer 10 and the second chemical precursor 21 and / or between the second chemical precursor 21 itself, and the deposition layer 18 of the second material on the already formed deposition layer 10. Is formed.

  For example, metals such as copper, silver, gold, nickel, palladium, platinum, rhodium, and yttrium (which can be used to form metal structures) can dissociate into dissociated surface electrons known as plasmons in the visible wavelength range. The resulting absorption resonance occurs. By utilizing at least photon-electron resonance by excitation of surface electrons with incident light having an appropriate wavelength and power, and heating of the associated metal nanostructure, for example, a nanometer-sized structure, for example Heat, without limitation, spherical, linear, arrayed, rod-shaped nanostructures to a temperature suitable to promote deposition reactions, including but not limited to material growth be able to.

  In the embodiment, the lower layer substrate may be made of silicon, III / V group (of the periodic table), SOI (silicon on insulator), germanium, quartz, glass, or a combination thereof. Regardless of which one is used here, the electromagnetic waves are transmitted to the structure at a constant ratio and / or pulse so that heat is generated at least by photon-electron interaction within the structure or the components of the structure. Supplied. In embodiments, these components are metals with nanostructures. An accelerated reaction that provides several types of reactions produces a product that may be deposited on the substrate 2.

  In an embodiment, the substrate may be silicon, one of III / V elements (of the periodic table), SOI, germanium, quartz, glass, or a combination thereof. Regardless of which one is used here, the electromagnetic wave is generated on the structure so that heat is generated as a result of photon / electron resonance occurring in the structure or structures in the metal including the nanostructure. It is supplied in a fixed ratio and / or in pulses.

  Various chemical reactions can occur on and / or near at least one structure, or multiple structures (eg, an array, etc.). Furthermore, at least one structure that functions as a localized heat source also functions as a catalyst in at least one chemical reaction at the same time. As described above, the at least one structure is preferably, but not limited to, gold, copper, silver, titanium, aluminum, nickel, palladium, platinum, ruthenium, iridium, iron, cobalt, osmium, zinc, Rhodium, including combinations thereof. In embodiments, the plurality of nanostructured particles at least some function only as a heat source and some function as a catalyst. In an embodiment in which a plurality of structures are used, at least a first set of structures and a second set may be used. The assembly is made of the same material, each formed in a different shape and shape, and placed on the substrate 2 (eg, as an array or a plurality of wires). In other possible embodiments, a collection of multiple structures composed of different materials may be placed on the substrate. This set of structures is a thermal structure in which, for example, photons / electron resonances are excited and heat is generated when exposed to electromagnetic waves of a predetermined frequency or frequency band where photons / electron resonances are not excited in other assemblies. Each has its own characteristics. Thereby, specific heat can be supplied by a specific set for a specific chemical reaction in a state adjacent to another second set arranged on the substrate.

  As described above, at least one structure in the form of particles, dots, spheres, wires, lines, films, or combinations thereof with nano-scale dimensions can be provided. The nanoscale dimension is any one or a combination of height, length, width, radius, diagonal, diameter, and is between 0.5 and 500 nm, preferably between 1 and 100 nm, or between these. Have approximately the same range.

  In connection with the above-described embodiment, the reactant in the chemical reaction may be a gas, a liquid, a plasma, a solid, or a combination thereof. In the example described above, various types of reactions can occur. An example of the reaction includes a decomposition reaction in which at least one reaction product is at least one reactant or includes a part of the reactant. This is illustrated in FIG. 2A. A plurality of metal structures 8 are illustrated on the substrate 2. An electromagnetic wave 4 having a predetermined frequency or frequency band that can excite at least photon / electron resonance enters the metal structure 8. For example, the decomposition reaction product 62 is similarly supplied. FIG. 2B is an enlarged schematic view of one metal structure 8. The metal structure 8 generates heat, which is illustrated in FIG. At this chemical reaction temperature, at least the photon / electron electrons of the metal structure 8 interact with each other by the electromagnetic wave 4 having an appropriate photon / electron resonance frequency or frequency band, and the photon / electron resonance is excited. Caused by As a result, the temperature rises in the adjacent region of the catalyst (which may be a metal structure) and / or on the peripheral region. The exemplary decomposition reactant 62 leads to decomposition and is divided into at least two parts 62A and 62B, thereby producing at least one desired reaction product. The reaction shown in FIG. 2A and FIG. 2B, which is an example, may be an elimination reaction when the components are decomposed and the reactants are removed.

  Examples of other chemical reactions include substitution reactions. A substitution reaction is one in which at least one reactant reacts with at least a second reactant, and the reactant itself, or a portion of the reactant replaces a portion of the second reactant, and / or the second To produce a reaction product. This is illustrated in FIG. 3A. In this example, a plurality of metal structures 8 are arranged on the substrate 2. When an appropriate electromagnetic wave 4 is irradiated, heat is generated from the metal structure 8 by at least excitation of photon / electron resonance in the plurality of metal structures 8. Here, the first reactant is shown by two connected triangles 62 and the second reactant is shown by a connected circle 6. As shown in the enlarged schematic view of FIG. 3B, heat 29 brings the desired reaction temperature near, above and / or in the space around the catalyst (which may be a metal structure). At least one chemical reaction occurs. In this example, one of the triangles, for example part of the first reactant, replaces part of the second reactant. And it becomes reaction of the reaction product which has a part of 1st reactant, and a part of 2nd reactant. This is illustrated as a connected circle and triangle 64 as shown in FIG. 3B. In other reaction examples, at least the second reactant and the first reactant are combined as a whole to produce a reaction product. That is, as shown in FIG. 5 for example, the first reactant shown as a star 82 and the second reactant shown as a circle 83 are both bonded at a predetermined chemical reaction temperature to become a reaction product. That is, the two combine as shown here as a combination of stars 82 and circles 83 to produce an additional reaction product 88.

  In an embodiment, at least one reactant of at least one chemical reaction is a reaction initiator 73 having a predetermined component ratio exemplified as an initiator using circles, squares, and triangles in FIG. 4A. As described above, when an appropriate electromagnetic wave 4 is supplied, heat suitable for the chemical reaction temperature is generated in the metal structure 8 by at least photon / electron resonance. Then, as shown in FIG. 4B, at least one chemical reaction occurs. Here, at least one chemical reaction and at least one reaction product are shown as altered compound 79. The compound 79 has the same component ratio as that of the starting material 73, but has a difference in characteristics from the starting material 73 due to a chemical reaction. For example, this difference in characteristics is any one of a rearrangement of atoms, a change in the number of bonds, a change in bond type, a change in bond angle, or a combination thereof. For example, in embodiments, at least one reaction results in a change in the properties of at least one initiator 73, eg, at least an isomer of the compound. In the embodiment, the isomer as such a product may be an optical isomer.

  FIG. 6 shows a configuration example of the apparatus according to the embodiment of the present invention. In this example, the apparatus includes a predetermined space 1200, at least one inlet 1217 connected to the predetermined space 1200 for introducing at least one reactant from the reactant supply source 1204 to the predetermined space 1200, and at least one inlet. And a substrate 2 on which the structure is disposed. The structure is an array 7 having a plurality of metal structures 8 in this example. Other configurations are possible within the scope of the present disclosure. The substrate 2 is installed in a predetermined space, and an electromagnetic wave supply source 1202 is also installed. The source 1202 of the electromagnetic wave 1202 is provided with at least one structure so that, in this example, it can irradiate a substrate and / or a part of the substrate, which is shown as an array 7 having a plurality of metal structures 8. Be placed. Here, the electromagnetic wave is absorbed by at least one structure exemplified as an array 7 having a plurality of metal structures 8, and has a predetermined frequency or frequency band for exciting photon / electron resonance with the plurality of metal structures. Have. In the embodiment, the electromagnetic wave supply source 4 is disposed so as to irradiate a part of the substrate on which at least one structure is disposed. Thereby, the at least one structure and at least the photon-electron resonance results are localized at a chemical reaction temperature that promotes at least one chemical reaction involving at least one reactant supplied from the reactant source 1204. Can be heated. In addition, at least one outlet 1219 connected to the predetermined space 1200 is installed. The at least one outlet 1219 guides at least one reaction product from the predetermined space 1200. In this embodiment, it has the 2nd inlet 1218 connected to the predetermined space 1200, and the 2nd reactant supply source 1206 provided with the 2nd reactant. Furthermore, in this embodiment, an additional outlet 1220 connected to the predetermined space 1200 and an analyzer 1210 such as a gas chromatography are installed. In addition, a vacuum pump 1208 is installed to collect at least one reaction product and / or lead the reaction product to the analyzer 1210. Of course, a suitable valve 1205 is installed as illustrated in FIG. Operation of the entire apparatus, reaction monitoring, and control as disclosed herein are performed by at least one computer system 1021. The computer system 1021 is operably connected to each component of the apparatus. The reactants of the reactant supply sources 1204 and 1206 are supplied to the predetermined space 1200 in a desired state such as gas, liquid, solid, plasma, or a combination thereof.

  In embodiments relating to the apparatus, at least one structure shown here as a plurality of metal structures 8 is not meant to be limiting, but is gold, copper, silver, titanium, aluminum, nickel, palladium, platinum, ruthenium. And / or rhodium, iridium, iron, zinc, or a combination thereof. As described above, at least one structure is formed in any shape of particles, dots, spheres, wires, lines, films, and combinations thereof. As described above, the embodiment of the present apparatus also uses at least one structure formed in the shape of particles, dots, spheres, wires, lines, films, and combinations thereof and having a nanoscale size. For example, the dimensions of these structures such as height, width, thickness, radius, length, combinations thereof, etc. are about 0.5-500 nm. In an embodiment, the at least one structure is about 1 to 500 nm in size. In addition, it may be 10 to 50 nm. The overall size should be such that at least photon-electron resonance that supplies heat at the desired reaction temperature can be generated and used.

  In an embodiment, the at least one metal of the at least one structure functions as a catalyst at the chemical reaction temperature in at least one chemical reaction and / or functions as a heat source for the chemical reaction. For example, the chemical reaction temperature may be several hundred degrees Celsius, 60-1200 degrees, and as disclosed, such temperature is reached by local heating. In embodiments, the time and temperature of the chemical reaction can be controlled, for example by applying pulses with a laser. In the apparatus given as an example, various chemical reactions disclosed in the above-described embodiments can be controlled.

  In the above-described embodiment, for example, the apparatus includes at least the electromagnetic wave source 1202. The source of electromagnetic waves is not limited, but from a laser light source such as a solid state laser, semiconductor diode laser, helium neon gas laser, argon ion gas laser, krypton ion gas laser, xenon ion gas, tunable laser, lamp, etc. It may be configured. Preferably, the predetermined wavelength is in the range of about 100 nm to 10 μm. The electromagnetic wave 4 used in the exemplified apparatus may be any one of ultraviolet rays, visible rays, infrared rays, or a combination thereof. Further, for example, the electromagnetic wave supply source supplies a pulsed electromagnetic wave having a predetermined frequency or frequency band.

  As described above, the electromagnetic waves used in the embodiments can be supplied from a plurality of light sources such as lasers and lamps. Further, the electromagnetic wave 4 may be any one of ultraviolet rays, visible light, infrared rays, electromagnetic waves, or a combination thereof.

  The photon / electron resonance has been described in detail. However, various other effects that can contribute to generating heat locally and in a specific region as described above can be used alone or in combination. These effects include Landau damping and hole generation / dynamics as well as phonon lattice vibrations.

  The examples and embodiments described herein are for illustrative purposes and include various variations and modifications that could be equivalent to those skilled in the art, and these variations and modifications are within the scope of the claims of the present invention. It is included in the scope of the idea of the present technology.

FIG. 1 is a diagram schematically illustrating a structure and at least one reactant. FIG. 1A is a diagram schematically showing an enlarged surface of a structure, and shows an incident electromagnetic wave, surface electrons on the surface of the structure, and at least one reactant. FIG. 1B is a diagram showing a first material layer formed on the surface of the structure, incidence of a second electromagnetic wave, a second reactant, and surface electrons deposited on the first material layer. . FIG. 1C illustrates a second material layer deposited on the first material layer. FIG. 2A is a diagram illustrating a configuration example of a substrate and a plurality of structures. FIG. 2B is an enlarged view showing the structure shown in FIG. 2A and reactants in the proceeding chemical reaction. FIG. 3A is a diagram schematically illustrating a substrate, a plurality of structures, and two reactants. FIG. 3B is an enlarged schematic view of the structure shown in FIG. 3A and other reactions. FIG. 4A is a diagram schematically illustrating a substrate, a plurality of structures, and a reactant. FIG. 4B is a diagram schematically showing an enlarged view of the structure shown in FIG. 4A and other reactions. FIG. 5 is a diagram schematically showing another structure, heat, and further another reaction in an enlarged manner. FIG. 6 is a diagram schematically illustrating a configuration example of an apparatus used in the present embodiment.

Claims (75)

A method of promoting catalytic chemical reaction by local heating using photon-electron resonance,
Providing a substrate on which at least one structure is disposed;
Introducing at least one reactant in the vicinity of at least one structure;
Irradiating the at least one structure with an electromagnetic wave having a predetermined frequency or frequency band for exciting photon-electron resonance in at least one structure;
Supplying local heat from the at least one structure as a result of the at least photon-electron resonance to promote at least one catalytic chemical reaction involving at least one reactant at a temperature of the catalytic chemical reaction. Process,
Producing at least one reactant.   The method of claim 1, wherein the at least one structure is installed on the substrate in a desired preformed structure.   The method of claim 1, wherein the at least one structure includes at least one metal.   4. The method of claim 3, wherein the at least one structure is a shape selected from particles, dots, spheres, wires, lines, films, and combinations thereof.   The at least one metal is selected from gold, copper, silver, titanium, aluminum, nickel, palladium, platinum, ruthenium, iridium, iron, cobalt, osmium, zinc, rhodium, and combinations thereof. 5. A method according to claim 4, characterized in that   6. The method of claim 5, wherein the at least one metal functions as a catalyst in the at least one catalytic chemical reaction.   6. The method of claim 5, wherein the at least one metal functions as a local heat source supplying heat at the temperature of the catalytic chemical reaction.   5. The method of claim 4, wherein the dots, spheres, wires, lines, films, and combinations thereof comprise nanoscale dimensions.   6. The method of claim 5, wherein the metal is composed of one or more particles having a radius of about 0.5 to 500 nm.   The method of claim 1, wherein the at least one reactant is a gas.   The method of claim 1, wherein the at least one reactant is a liquid.   The method of claim 1, wherein the at least one reactant is a plasma.   The method of claim 1, wherein the at least one reactant is a solid.   The at least one chemical reaction involving the at least one reactant is a dissociation reaction, and the at least one reaction product is part of the at least one reactant, or part of one reactant. The method of claim 1, comprising: The at least one reactant is a compound having a specific component ratio;
The method of claim 1, wherein the at least one reaction product has the same component ratio as the compound, and the at least one catalytic chemical reaction changes at least one property of the compound.   The at least one property change is selected from atomic rearrangement, bond number change, bond type change, bond angle change, and combinations thereof. Method.   16. The method of claim 15, wherein the at least one property change results in an isomer of the at least one reactant.   The method according to claim 1, wherein the isomer includes an optical isomer.   The one catalytic chemical reaction involving the at least one reactant is a substitution reaction, the at least one reactant reacts with the at least second reactant, and a portion of the second reactant. 2. A process according to claim 1 wherein the reaction yields a reaction product. The one catalytic chemical reaction involving the at least one reactant is an addition reaction;
2. The method of claim 1, wherein the at least one reactant and the at least second reactant are each combined to yield a reaction product. The one catalytic chemical reaction involving the at least one reactant is an elimination reaction;
The method of claim 1, wherein the at least one reactant is separated into reaction products, and at least two of the reaction products are formed.   The method according to claim 1, wherein the electromagnetic wave is a laser supplied from a laser light source.   The method according to claim 1, wherein the electromagnetic wave is selected from any one of ultraviolet rays, visible rays, infrared rays, and combinations thereof.   The method of claim 1, wherein the electromagnetic wave having the predetermined frequency or frequency band is pulsed onto the at least one structure.   The method according to claim 1, wherein the electromagnetic wave having the predetermined frequency or frequency band is applied to at least a part of the substrate on which the at least one structure is disposed.   The method according to claim 1, wherein the electromagnetic wave having the predetermined frequency or frequency band is at least partially absorbed by the at least one structure.   The method of claim 1, wherein the at least one structure is disposed on the substrate by any of nanoimprinting, precipitation, electron beam lithography, or a combination thereof. A method of promoting chemical reaction using local heat,
Preparing a substrate on which a plurality of structures are installed;
Introducing at least one reactant in the vicinity of the plurality of structures;
Irradiating the plurality of structures with electromagnetic waves having a frequency or a frequency band that excites at least photons and electron resonance in the plurality of structures;
Supplying local heat from the plurality of structures as a result of at least photon-electron resonance to promote the one chemical reaction with the at least one reactant at a chemical reaction temperature;
Producing at least one reaction product.   30. The method of claim 28, wherein the plurality of structures are pre-formed and placed on the substrate in a desired structure.   30. The method of claim 28, wherein the plurality of structures includes at least one type of metal.   29. The method according to claim 28, wherein the electromagnetic wave having the predetermined frequency or frequency band and being irradiated is at least partially absorbed by the plurality of structures.   The at least one metal is selected from gold, copper, silver, titanium, aluminum, nickel, palladium, platinum, ruthenium, iridium, iron, cobalt, zinc, osmium, rhodium, and combinations thereof. 32. The method of claim 30, wherein the method is characterized.   29. The method of claim 28, wherein the substrate comprises silicon, a group III / V element, SOI (silicon on insulator), germanium, quartz, glass, or a combination thereof.   The method of claim 32, wherein the metal structure is composed of particles each having a radius of about 0.5 to about 500 nm.   33. The method of claim 32, wherein the metal structure is composed of particles each having a radius of about 1 to about 100 nm.   The method according to claim 28, wherein the electromagnetic wave is a laser supplied from a laser light source.   30. The method of claim 28, wherein the electromagnetic wave is selected from any of ultraviolet light, visible light, infrared light, and combinations thereof.   30. The method of claim 28, wherein the at least one reactant is a gas.   30. The method of claim 28, wherein the at least one reactant is a liquid.   30. The method of claim 28, wherein the at least one reactant is a plasma.   30. The method of claim 28, wherein the at least one reactant is a solid.   29. The method of claim 28, wherein the electromagnetic wave having the predetermined frequency or frequency band is pulsed on the plurality of structures or on a set of the plurality of structures.   29. The method of claim 28, wherein the plurality of structures have at least a first set and a second set, each set having a different component from one set.   29. The method of claim 28, wherein the first set is raised to the first reaction temperature when irradiated with the electromagnetic wave, and promotes at least one catalytic chemical reaction. In addition, the method further includes a step of supplying electromagnetic waves,
In this step, the additional electromagnetic wave has a predetermined frequency or frequency band and is different from the electromagnetic wave, at least in the second set of structures, to excite photon and electron resonance, and to an additional chemical reaction. 44. The method of claim 43, wherein heat is supplied.   The local heat is generated, at least in part, by at least one of phonon lattice vibration, hole generation / dynamics, Landau damping, or a combination thereof in addition to the photon-electron resonance. The method of claim 28.   30. The method of claim 28, wherein the at least one structure is disposed on the substrate by any of nanoimprinting, precipitation, electron beam lithography, or a combination thereof. An apparatus for carrying out a chemical catalytic reaction,
A reaction chamber;
At least one inlet connected to the reaction chamber for introducing at least one reactant into the reaction chamber;
A substrate disposed in the reaction chamber and having at least one structure disposed thereon;
At least one catalytic chemical reaction that is absorbed in the at least one structure and excites at least photon-electron resonance of the at least one structure, thereby causing at least one reactant by the at least photon-electron resonance. An electromagnetic wave source installed to irradiate the substrate with an electromagnetic wave having a predetermined frequency or a predetermined frequency band capable of supplying local heat at a chemical reaction temperature that promotes
An apparatus comprising: at least one outlet connected to the reaction chamber and allowing at least one reaction product to be led out from the reaction chamber.   49. The apparatus of claim 48, wherein the at least one structure includes at least one metal.   49. The apparatus of claim 48, wherein the at least one structure is a shape selected from particles, dots, spheres, wires, lines, films, and combinations thereof.   The at least one metal is selected from gold, copper, silver, titanium, aluminum, nickel, palladium, platinum, ruthenium, iridium, iron, cobalt, osmium, rhodium, and combinations thereof. 50. The apparatus of claim 49.   50. The apparatus of claim 49, wherein the at least one metal is a catalyst in the at least one chemical reaction.   50. The apparatus of claim 49, wherein the at least one metal functions only as a local heat source that provides heat to reach the chemical reaction temperature.   51. The apparatus of claim 50, wherein the particles, dots, spheres, wires, lines, films, and combinations thereof are nanoscale dimensions.   55. The apparatus of claim 54, wherein the nanoscale dimension is from about 0.5 to about 500 nm.   55. The apparatus of claim 54, wherein the nanoscale dimension is from about 1 to about 100 nm.   49. The apparatus of claim 48, wherein the at least one reactant is a gas.   49. The apparatus of claim 48, wherein the at least one reactant is a liquid.   49. The apparatus of claim 48, wherein the at least one reactant is a plasma.   49. The apparatus of claim 48, wherein the at least one reactant is a solid.   The apparatus according to claim 48, wherein at least a second inlet is connected to the reaction chamber.   The at least one chemical catalytic reaction involving the at least one reactant is a dissociation reaction, and the at least reaction product is or comprises a component of the at least one reactant. 49. The apparatus of claim 48. The at least one reactant has a predetermined component ratio;
49. The apparatus of claim 48, wherein the at least one reaction product has the same component ratio as the reactant, and wherein at least one property of the compound changes in the at least one catalytic chemical reaction. .   64. The at least one property change is selected from any of atomic rearrangement, bond number change, bond type change, bond angle change, and combinations thereof. The device described.   64. The apparatus of claim 63, wherein the at least one property change produces an isomer of the at least one reactant.   66. The apparatus of claim 65, wherein the isomer comprises an optical isomer.   The at least one catalytic chemical reaction involving the at least one reactant is a substitution reaction, the at least one reactant reacts with at least a second reactant and replaces a portion of the second reactant. 49. The apparatus of claim 48, wherein said reaction product is produced.   The at least one catalytic chemical reaction involving the at least one reactant is an addition reaction, wherein the at least one reactant and at least a second reactant are bonded together to produce the reaction product. 49. The apparatus of claim 48.   The at least one catalytic chemical reaction involving the at least one reactant is a desorption reaction, the at least one reactant is separated into reaction products, and at least two reaction products are generated. 49. The apparatus of claim 48.   49. The apparatus of claim 48, wherein the electromagnetic wave is selected from any of ultraviolet light, visible light, infrared light, and combinations thereof.   49. The apparatus according to claim 48, wherein the electromagnetic wave source emits a pulsed electromagnetic wave having the predetermined frequency or frequency band.   49. The electromagnetic wave supply source that emits the electromagnetic wave having the predetermined frequency or frequency band is disposed so as to irradiate at least a part of the substrate on which at least one structure is disposed. The device described in 1.   49. The apparatus of claim 48, wherein the at least one structure is disposed on the substrate by nanoimprinting, precipitation or electron beam lithography, or a combination thereof. A method for promoting a chemical catalytic reaction using photon / electron resonance derived from local heating,
Irradiating at least one of the structures with an electromagnetic wave having a predetermined frequency or frequency band for exciting at least photon-electron resonance of the structure;
Introducing at least one reactant in the vicinity of the at least one structure;
Generating local heat from the result of the at least one structure and the photon-electron resonance at a catalytic chemical reaction temperature to promote the at least one chemical reaction involving the at least one reactant;
Providing a substrate on which at least one structure is installed. 75. The method of claim 74, further comprising the step of producing the at least one reaction product.

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