JP2007514277A - リチウム・マイクロ電池の製造方法 - Google Patents
リチウム・マイクロ電池の製造方法 Download PDFInfo
- Publication number
- JP2007514277A JP2007514277A JP2006538889A JP2006538889A JP2007514277A JP 2007514277 A JP2007514277 A JP 2007514277A JP 2006538889 A JP2006538889 A JP 2006538889A JP 2006538889 A JP2006538889 A JP 2006538889A JP 2007514277 A JP2007514277 A JP 2007514277A
- Authority
- JP
- Japan
- Prior art keywords
- thin layer
- layer
- electrolyte
- masking
- protective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 229910052744 lithium Inorganic materials 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title description 16
- 230000000873 masking effect Effects 0.000 claims abstract description 84
- 239000003792 electrolyte Substances 0.000 claims abstract description 62
- 230000001681 protective effect Effects 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 238000005530 etching Methods 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 23
- 150000001875 compounds Chemical class 0.000 claims abstract description 20
- 238000000206 photolithography Methods 0.000 claims abstract description 13
- 239000010410 layer Substances 0.000 claims description 153
- 239000000463 material Substances 0.000 claims description 34
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 26
- 239000011241 protective layer Substances 0.000 claims description 26
- 238000000151 deposition Methods 0.000 claims description 22
- 229910003481 amorphous carbon Inorganic materials 0.000 claims description 21
- 230000008021 deposition Effects 0.000 claims description 13
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 11
- 230000015572 biosynthetic process Effects 0.000 claims description 9
- 238000005229 chemical vapour deposition Methods 0.000 claims description 7
- 238000011109 contamination Methods 0.000 claims description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000010409 thin film Substances 0.000 abstract 4
- 239000010408 film Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 8
- 238000004377 microelectronic Methods 0.000 description 8
- 238000001020 plasma etching Methods 0.000 description 8
- 238000005538 encapsulation Methods 0.000 description 7
- 238000005240 physical vapour deposition Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910010271 silicon carbide Inorganic materials 0.000 description 4
- 239000002245 particle Substances 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- SESRATMNYRWUTR-UHFFFAOYSA-N sulfinyltitanium Chemical compound [Ti].S=O SESRATMNYRWUTR-UHFFFAOYSA-N 0.000 description 2
- CFJRPNFOLVDFMJ-UHFFFAOYSA-N titanium disulfide Chemical compound S=[Ti]=S CFJRPNFOLVDFMJ-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001868 water Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010297 TiOS Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- -1 for example Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/058—Construction or manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/04—Construction or manufacture in general
- H01M10/0436—Small-sized flat cells or batteries for portable equipment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/052—Li-accumulators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0561—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of inorganic materials only
- H01M10/0562—Solid materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/36—Accumulators not provided for in groups H01M10/05-H01M10/34
- H01M10/38—Construction or manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
- H01M4/0402—Methods of deposition of the material
- H01M4/0421—Methods of deposition of the material involving vapour deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
- H01M4/139—Processes of manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M50/00—Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
- H01M50/10—Primary casings; Jackets or wrappings
- H01M50/116—Primary casings; Jackets or wrappings characterised by the material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/42—Methods or arrangements for servicing or maintenance of secondary cells or secondary half-cells
- H01M10/4235—Safety or regulating additives or arrangements in electrodes, separators or electrolyte
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M2300/00—Electrolytes
- H01M2300/0017—Non-aqueous electrolytes
- H01M2300/0065—Solid electrolytes
- H01M2300/0068—Solid electrolytes inorganic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49108—Electric battery cell making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49108—Electric battery cell making
- Y10T29/4911—Electric battery cell making including sealing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49108—Electric battery cell making
- Y10T29/49115—Electric battery cell making including coating or impregnating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Secondary Cells (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Primary Cells (AREA)
- Conductive Materials (AREA)
Abstract
Description
・集電体と、正極とが設けられた基板上への電解質性薄層の堆積と、
・電解質薄層上への、リチウムに対して化学的に不活性な第1の保護薄層と、それに次ぐ第1のマスキング薄層との堆積と、
・第1のマスキング薄層上への、フォトリソグラフィによるマスクの製作と、
・第1のマスキング薄層の選択的エッチングと、それに次ぐマスクの除去と、
・電解質性薄層中に電解質を形成するための、第1の保護薄層と電解質薄層との選択的エッチングと、第1の保護薄層と第1のマスキング薄層との除去とを含むことによって達成される。
・集電体と、正極と、電解質とが設けられた基板上への負極性薄層の堆積と、
・負極性薄層上への、第3の保護薄層と、それに次ぐ第2のマスキング薄層との堆積と、
・第2のマスキング薄層上への、フォトリソグラフィによるマスクの製作と、
・第2のマスキング薄層の選択的エッチングと、それに次ぐマスクの除去と、
・負極性薄層中に負極を形成するための、第3の保護薄層と負極性薄層との選択的エッチングと、保護及びマスキング薄層の除去とを含む。
2a 第1の集電体
2b 第2の集電体
3 正極
4a 第1のマスキング要素
4b 第2のマスキング要素
4c 第3のマスキング要素
4d 第4のマスキング要素
4e 第5のマスキング要素
5 電解質
5a 電解質性薄層
6a 第1の保護薄層
6b 第2の保護薄層
6c 第3の保護薄層
6d 第4の保護薄層
7a 第1のマスキング層
7b 第2のマスキング層
8 負極
9 保護外被
9a 第1の封入層
9b 第2の封入層
9c 中間層
Claims (12)
- 基板(1)上への、第1及び第2の集電体(2a、2b)と、正極(3)と、リチウム化された化合物を含む電解質(5)と、リチウムを含む負極(8)との形成を順次含むリチウム・マイクロ電池の製造方法であって、前記電解質(5)の前記形成ステップが、少なくとも以下の連続する工程、すなわち、
前記集電体(2a、2b)と、前記正極(3)とが設けられた前記基板(1)上への電解質性薄層(5a)の堆積と、
前記電解質性薄層(5a)上への、リチウムに対して化学的に不活性な第1の保護薄層(6a)と、それに次ぐ第1のマスキング薄層(7a)との堆積と、
前記第1のマスキング薄層(7a)上への、フォトリソグラフィによるマスク(4d)の製作と、
前記第1のマスキング薄層(7a)の選択的エッチングと、それに次ぐ前記マスク(4d)の除去と、
前記電解質性薄層(5a)中に前記電解質(5)を形成するための、前記第1の保護薄層(6a)と前記電解質性薄層(5a)との選択的エッチングと、前記第1の保護薄層(6a)と前記第1のマスキング薄層(7a)との除去とを含むことを特徴とする方法。 - 前記第1の保護薄層(6a)が、水素化アモルファス炭化ケイ素と、水素化アモルファス酸炭化ケイ素と、水素化アモルファス炭窒化ケイ素と、水素化アモルファス炭素と、フッ化且つ水素化されたアモルファス炭素と、フッ化且つ水素化されたアモルファス窒化炭素との中から選択された第1の材料からなることを特徴とする、請求項1記載の方法。
- 前記第1のマスキング薄層(7a)が、前記第1の材料とは異なり、且つ水素化アモルファス炭化ケイ素と、水素化アモルファス酸炭化ケイ素と、水素化アモルファス炭窒化ケイ素と、窒化ケイ素と、酸化ケイ素との中から選択された第2の材料からなることを特徴とする、請求項2記載の方法。
- 前記電解質(5a)が形成された後、前記集電体(2a、2b)と、前記正極(3)と、前記電解質(5)とを含む前記基板(1)全体の上に、第2の保護薄層(6b)が堆積されることを特徴とする、請求項1乃至3のいずれか一項記載の方法。
- 前記第2の保護薄層(6b)が、前記第1の保護薄層(6a)と同じ材料からなることを特徴とする、請求項4記載の方法。
- 前記負極(8)の形成が、少なくとも以下のステップ、すなわち
前記集電体(2a、2b)と、前記正極(3)と、前記電解質(5)とが設けられた前記基板(1a)上への負極性薄層(8a)の堆積と、
前記電解質性薄層(5a)上への、第3の保護薄層(6c)と、それに次ぐ第2のマスキング薄層との堆積と、
前記第2のマスキング薄層(7b)上への、フォトリソグラフィによるマスク(4e)の製作と、
前記第2のマスキング薄層(7b)の選択的エッチングと、それに次ぐ前記マスク(4e)の除去と、
前記負極性薄層(8a)中に前記負極(8)形成するための、前記第3の保護薄層(6c)と前記負極性薄層(8a)との選択的エッチングと、前記保護薄層(6c)と前記マスキング薄層(7b)との除去とを含むことを特徴とする、請求項1乃至5のいずれか一項記載の方法。 - 前記第3の保護薄層(6c)が、前記第1の保護薄層(6a)と同じ材料からなり、一方、前記第2のマスキング薄層(7b)が、前記第1のマスキング薄層(7a)と同じ材料からなることを特徴とする、請求項6記載の方法。
- 前記負極(8)が形成された後、前記集電体(2a、2b)と、前記正極(3)と、前記電解質(5)と、前記負極(8)とによって形成されたスタック上に、第4の保護層(6d)を堆積させることにあることを特徴とする、請求項1乃至7のいずれか一項記載の方法。
- 前記第4の保護薄層(6d)が、前記第1の保護薄層(6a)と同じ材料からなることを特徴とする、請求項8記載の方法。
- 前記負極(8)が形成された後、前記集電体(2a、2b)と、前記正極(3)と、前記電解質(5)と、前記負極(8)とによって形成された前記スタック上に、前記スタック全体を覆って前記負極をどんな外部汚染からも保護する保護外被(9)を堆積させることにあることを特徴とする、請求項1乃至7のいずれか一項記載の方法。
- 前記保護外被(9)が、少なくとも第1及び第2の重ね合わされた異なる封入層(9a、9b)を含み、
前記第1の封入層(9a)が、リチウムに対して化学的に不活性であって、水素化アモルファス炭化ケイ素と、水素化アモルファス酸炭化ケイ素と、水素化アモルファス炭素と、フッ化アモルファス炭素と、水素化アモルファスケイ素との中から選択された少なくとも1つの材料を含み、
一方、前記第2の封入層(9b)が、水素化アモルファス炭窒化ケイ素と、水素化アモルファス窒化ケイ素と、フッ化アモルファス炭素との中から選択された材料を含み、
前記第1及び第2の封入層(9a、9b)が、プラズマ化学気相成長法によって、150℃以下の堆積温度で、前記負極(8)全体の上に順次堆積されることを特徴とする、請求項10記載の方法。 - 前記第2の封入層(9b)の堆積前に、プラズマ化学気相成長法によって、150℃以下の堆積温度で、リン・ドープ酸化ケイ素と、水素化アモルファス炭素と、フッ化アモルファス炭素との中から選択された材料を含む中間層(9c)を堆積させることにあることを特徴とする、請求項11記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0313325 | 2003-11-14 | ||
FR0313325A FR2862437B1 (fr) | 2003-11-14 | 2003-11-14 | Procede de fabrication d'une micro-batterie au lithium |
PCT/FR2004/002842 WO2005050756A2 (fr) | 2003-11-14 | 2004-11-04 | Procede de fabrication d'une micro-batterie au lithium |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007514277A true JP2007514277A (ja) | 2007-05-31 |
JP4795963B2 JP4795963B2 (ja) | 2011-10-19 |
Family
ID=34508456
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006538889A Expired - Fee Related JP4795963B2 (ja) | 2003-11-14 | 2004-11-04 | リチウム・マイクロ電池の製造方法 |
Country Status (10)
Country | Link |
---|---|
US (1) | US7695531B2 (ja) |
EP (1) | EP1683217B1 (ja) |
JP (1) | JP4795963B2 (ja) |
KR (1) | KR101068431B1 (ja) |
CN (1) | CN100456549C (ja) |
AT (1) | ATE370522T1 (ja) |
DE (1) | DE602004008320T2 (ja) |
ES (1) | ES2290780T3 (ja) |
FR (1) | FR2862437B1 (ja) |
WO (1) | WO2005050756A2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011501388A (ja) * | 2007-10-25 | 2011-01-06 | アプライド マテリアルズ インコーポレイテッド | 薄膜電池の大量製造方法 |
JP2012060180A (ja) * | 2004-06-03 | 2012-03-22 | Koninkl Philips Electronics Nv | 発光装置用の発光セラミック |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2880198B1 (fr) * | 2004-12-23 | 2007-07-06 | Commissariat Energie Atomique | Electrode nanostructuree pour microbatterie |
US7931989B2 (en) * | 2005-07-15 | 2011-04-26 | Cymbet Corporation | Thin-film batteries with soft and hard electrolyte layers and method |
US7776478B2 (en) * | 2005-07-15 | 2010-08-17 | Cymbet Corporation | Thin-film batteries with polymer and LiPON electrolyte layers and method |
EP2044642B1 (en) * | 2006-07-18 | 2014-02-26 | Cymbet Corporation | Photolithographic manufacture of a solid-state microbattery |
JP2010524166A (ja) * | 2007-04-02 | 2010-07-15 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 電気化学的エネルギー源、及び斯様な電気化学的エネルギー源を具備する電子デバイス |
WO2008149272A1 (en) * | 2007-06-04 | 2008-12-11 | Koninklijke Philips Electronics N.V. | Solid-state battery and method for manufacturing of such a solid-state battery |
FR2925227B1 (fr) * | 2007-12-12 | 2009-11-27 | Commissariat Energie Atomique | Dispositif electrochimique au lithium encaspule. |
FR2943181B1 (fr) * | 2009-03-16 | 2011-05-13 | Commissariat Energie Atomique | Microbatterie au lithium et son procede de fabrication |
US20100261049A1 (en) * | 2009-04-13 | 2010-10-14 | Applied Materials, Inc. | high power, high energy and large area energy storage devices |
EP2299515B1 (fr) * | 2009-08-28 | 2013-04-03 | STMicroelectronics (Tours) SAS | Procédé d'encapsulation d'une batterie de type lithium-ion en couches minces directement sur le substrat |
DE102010029060A1 (de) * | 2010-05-18 | 2011-11-24 | Robert Bosch Gmbh | Verfahren zur Herstellung einer Dünnschichtbatterie und entsprechende Dünnschichtbatterie |
DE102010043111A1 (de) | 2010-10-29 | 2012-05-03 | Robert Bosch Gmbh | Ex-situ-Herstellung einer Lithiumanodenschutzschicht |
US10601074B2 (en) | 2011-06-29 | 2020-03-24 | Space Charge, LLC | Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices |
US11527774B2 (en) | 2011-06-29 | 2022-12-13 | Space Charge, LLC | Electrochemical energy storage devices |
US11996517B2 (en) | 2011-06-29 | 2024-05-28 | Space Charge, LLC | Electrochemical energy storage devices |
US9853325B2 (en) | 2011-06-29 | 2017-12-26 | Space Charge, LLC | Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices |
KR101327283B1 (ko) * | 2012-03-20 | 2013-11-11 | 한국과학기술연구원 | 집전체 표면위에 형성된 고분자패턴을 이용하여 고성능 실리콘 전극제조 및 이를 포함하는 리튬계 이차전지음전극의 제조방법 |
FR3009136B1 (fr) * | 2013-07-29 | 2017-10-27 | Commissariat Energie Atomique | Procede de fabrication d'une microbatterie au lithium |
US10069138B2 (en) | 2014-04-24 | 2018-09-04 | Toyota Motor Engineering & Manufacturing North America, Inc. | Vanadium oxysulfide based cathode materials for rechargeable battery |
US9711793B2 (en) | 2014-04-24 | 2017-07-18 | Toyota Motor Engineering & Manufacturing North America, Inc. | Vanadium oxysulfide based cathode materials for rechargeable battery |
JP7097700B2 (ja) * | 2015-05-04 | 2022-07-08 | ビーエーエスエフ コーポレーション | 電気化学的水素吸蔵電極および電気化学的電池 |
US9876200B2 (en) * | 2015-08-07 | 2018-01-23 | International Business Machines Corporation | All-silicon hermetic package and processing for narrow, low-profile microbatteries |
CN105529489B (zh) * | 2016-01-20 | 2017-12-29 | 深圳先进技术研究院 | 全固态二次电池组件的制备方法 |
US11362382B2 (en) * | 2016-05-09 | 2022-06-14 | International Business Machines Corporation | Simplified hermetic packaging of a micro-battery |
EP3762989A4 (en) | 2018-03-07 | 2021-12-15 | Space Charge, LLC | THIN FILM SOLID STATE ENERGY STORAGE DEVICES |
WO2020112938A1 (en) * | 2018-11-29 | 2020-06-04 | Silcotek Corp | Fluid contact process, coated article, and coating process |
GB2582177B (en) * | 2019-03-14 | 2023-04-19 | Ilika Tech Limited | Method of processing layered structures |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5561004A (en) * | 1994-02-25 | 1996-10-01 | Bates; John B. | Packaging material for thin film lithium batteries |
KR100305903B1 (ko) | 1998-08-21 | 2001-12-17 | 박호군 | 수직으로통합연결된박막형전지를구비하는전기및전자소자와그제작방법 |
US6280875B1 (en) * | 1999-03-24 | 2001-08-28 | Teledyne Technologies Incorporated | Rechargeable battery structure with metal substrate |
US6168884B1 (en) * | 1999-04-02 | 2001-01-02 | Lockheed Martin Energy Research Corporation | Battery with an in-situ activation plated lithium anode |
JP2001148240A (ja) * | 1999-11-22 | 2001-05-29 | Nec Corp | 二次電池およびその製造方法 |
US20020071989A1 (en) * | 2000-12-08 | 2002-06-13 | Verma Surrenda K. | Packaging systems and methods for thin film solid state batteries |
WO2002065573A1 (fr) * | 2001-02-15 | 2002-08-22 | Matsushita Electric Industrial Co., Ltd. | Cellule d'electrolyse solide et procede de production de cette derniere |
US7094500B2 (en) * | 2001-04-24 | 2006-08-22 | Matsushita Electric Industrial Co., Ltd. | Secondary battery |
JP2003282142A (ja) * | 2002-03-26 | 2003-10-03 | Matsushita Electric Ind Co Ltd | 薄膜積層体、薄膜電池、コンデンサ、及び薄膜積層体の製造方法と製造装置 |
-
2003
- 2003-11-14 FR FR0313325A patent/FR2862437B1/fr not_active Expired - Fee Related
-
2004
- 2004-11-04 CN CNB2004800332143A patent/CN100456549C/zh not_active Expired - Fee Related
- 2004-11-04 ES ES04805392T patent/ES2290780T3/es active Active
- 2004-11-04 DE DE602004008320T patent/DE602004008320T2/de active Active
- 2004-11-04 JP JP2006538889A patent/JP4795963B2/ja not_active Expired - Fee Related
- 2004-11-04 AT AT04805392T patent/ATE370522T1/de not_active IP Right Cessation
- 2004-11-04 WO PCT/FR2004/002842 patent/WO2005050756A2/fr active IP Right Grant
- 2004-11-04 EP EP04805392A patent/EP1683217B1/fr active Active
- 2004-11-04 KR KR1020067009122A patent/KR101068431B1/ko not_active IP Right Cessation
- 2004-11-04 US US10/576,511 patent/US7695531B2/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012060180A (ja) * | 2004-06-03 | 2012-03-22 | Koninkl Philips Electronics Nv | 発光装置用の発光セラミック |
JP2011501388A (ja) * | 2007-10-25 | 2011-01-06 | アプライド マテリアルズ インコーポレイテッド | 薄膜電池の大量製造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1683217B1 (fr) | 2007-08-15 |
KR20060122842A (ko) | 2006-11-30 |
ES2290780T3 (es) | 2008-02-16 |
CN1879247A (zh) | 2006-12-13 |
KR101068431B1 (ko) | 2011-09-28 |
CN100456549C (zh) | 2009-01-28 |
FR2862437A1 (fr) | 2005-05-20 |
WO2005050756A3 (fr) | 2006-01-26 |
EP1683217A2 (fr) | 2006-07-26 |
ATE370522T1 (de) | 2007-09-15 |
US7695531B2 (en) | 2010-04-13 |
FR2862437B1 (fr) | 2006-02-10 |
DE602004008320T2 (de) | 2008-05-08 |
DE602004008320D1 (de) | 2007-09-27 |
US20070067984A1 (en) | 2007-03-29 |
WO2005050756A2 (fr) | 2005-06-02 |
JP4795963B2 (ja) | 2011-10-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4795963B2 (ja) | リチウム・マイクロ電池の製造方法 | |
TWI528613B (zh) | 降低複雜度的薄膜電池方法 | |
JP4818927B2 (ja) | 保護外被が設けられたリチウム・マイクロ電池、及び当該マイクロ電池の製造方法 | |
US8591602B2 (en) | Lithium microbattery comprising an encapsulating layer and fabrication method | |
US8475963B2 (en) | Lithium microbattery and fabrication method thereof | |
JP7059299B2 (ja) | 固体リチウム・ベースの電池および固体リチウム・ベースの電池を形成する方法 | |
JP7128260B2 (ja) | 固体リチウムベース電池および固体リチウムベース電池を形成する方法 | |
US9373864B2 (en) | Lithium microbattery fabrication method | |
US10581109B2 (en) | Fabrication method of all solid-state thin-film battery | |
JP2004146297A (ja) | 固体電池 | |
CN113795960A (zh) | 处理层状结构的方法 | |
US10879568B2 (en) | Thin film lithium ion battery |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070831 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110225 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110519 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110708 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110728 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140805 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |