JP2007283457A - Apparatus for wet polishing - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for wet polishing, which apparatus can reduce the accurrence of defects by preventing the drying of polishing fluid in an apparatus for carrying a workpiece. <P>SOLUTION: The apparatus for wet polishing comprises a polishing section for polishing a workpiece (S) by holding it between an upper surface plate and a lower surface plate arranged so as to be opposed to each other in the vertical direction while supplying polishing fluid, and mounting/carrying sections (40) (70) comprising mounting trays (45) (75), which are arranged in at least one of the front side and the rear side of the polishing section, and mounts the workpiece (S) thereon, and a moving apparatus which grips the workpiece (S) by means of gripping sections (56) (86), and moves the workpiece between the mounting position and the polishing section. The mounting trays (45) (75) of the mounting/carrying sections (40) (70) have recessed portions on their upper surfaces so as to store cleaning fluid (W) therein. The workpiece (S) is mounted in the state that the workpiece (S) has been submerged in the cleaning fluid (W). The gripping sections (56) (86) grip or release the workpiece (S) existing in the mounting trays (45) (75) in the cleaning fluid (W). <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a wet polishing apparatus for polishing while supplying a polishing liquid.

  In polishing processing that requires a high degree of finished surface accuracy, such as polishing of a magnetic disk substrate, a planetary gear system that uses a polishing cloth and a polishing liquid in which fine abrasive grains are suspended is used to polish both surfaces of the substrate. There are known wet polishing apparatuses and polishing liquid supply apparatuses (see Patent Documents 1 to 6).

  As illustrated in FIG. 2, the polishing unit (10) of this type of wet polishing apparatus includes a sun gear (20), an internal gear (22) arranged concentrically on the outer side, a sun gear ( 20) and a plurality of carriers (30) that mesh with the internal gear (22) and revolve and rotate according to the rotation of the sun gear (20) and / or the internal gear (22), and holding each carrier (30) An upper surface plate (15) and a lower surface plate (11) capable of sandwiching a plurality of workpieces (S) loaded in the hole (31) from above and below are provided. Abrasive cloths (12b) and (12a) are respectively attached to the holding surfaces of the upper surface plate (15) and the lower surface plate (11). The upper surface plate (15) has a number of polishing liquid supply holes (18). A donut-shaped region between the sun gear (20) and the internal gear (22) and sandwiched between the upper surface plate (15) and the lower surface plate (11) is an actual polishing region. The polishing liquid is supplied to the doughnut-shaped polishing region from the polishing liquid supply section (34) installed above through the polishing liquid supply hole (18) formed in the upper surface plate (15).

In addition, in order to efficiently process a large number of workpieces (S), a loader portion and an unloader portion are provided at the front stage of the polishing section (10), and an unloader section is provided at the rear stage. And transferred in a batch by a transfer device having the same number of gripping portions as the workpiece.
JP 2004-243503 A JP 2004-249444 A JP 2004-255530 A JP 2004-255532 A JP 2002-217138 A JP-A-11-58237

  In the continuous process described above, the polishing liquid adheres to the gripping portion when the workpiece is loaded on the carrier of the polishing portion or when the workpiece in the carrier is gripped. When the polishing liquid adhering to the gripping part dries, the abrasive grains solidify, and the gripped workpiece may be scratched.

  Scratches caused by the dried polishing liquid are often generated, and measures are taken to prevent drying in the polishing liquid supply section and gears of the polishing section (see Patent Documents 4, 5, and 6). No measures are taken in the transfer device.

  In view of the above-described technical background, an object of the present invention is to provide a wet polishing apparatus capable of preventing the polishing liquid from being dried in the workpiece transfer apparatus and reducing the generation of scratches.

  That is, the wet polishing apparatus of the present invention has the configurations described in [1] to [9] below.

[1] A carrier having a holding hole for loading a workpiece, and the workpiece loaded on the carrier is sandwiched between an upper surface plate and a lower surface plate that are vertically opposed to each other and polished. A polishing unit that polishes while supplying a liquid, and a mounting tray that is disposed at least one of the preceding stage and the subsequent stage of the polishing unit, and holds the workpiece by the gripping unit, and the polishing unit A wet polishing apparatus comprising a mounting transfer unit having a transfer apparatus for transferring a workpiece between
The mounting tray of the mounting / transferring section has a recessed portion for storing the cleaning liquid on the upper surface, and the workpiece is mounted in a state immersed in the cleaning liquid. A wet polishing apparatus characterized in that a workpiece is gripped or released in a cleaning liquid.

  [2] The placement transfer unit is a loader unit disposed in front of the polishing unit, grips the workpiece in the placement tray in the cleaning liquid, and transfers it to the carrier holding hole of the polishing unit. 2. The wet polishing apparatus according to item 1 above.

  [3] The placement transfer unit described above is an unloader unit disposed at a subsequent stage of the polishing unit, and transfers the workpiece gripped by the carrier of the polishing unit to the mounting tray and releases the grip in the cleaning liquid. 3. The wet polishing apparatus according to item 1 or 2.

  [4] Any of the preceding items 1 to 3, wherein the placement / transfer section has the same number of placement trays and gripping portions as the carrier holding holes of the polishing section, and collectively transfers all workpieces. 2. The wet polishing apparatus according to item 1.

  [5] The wet polishing apparatus according to item 4, wherein the placement transfer unit has the same number of plates as the carrier of the polishing unit, and each plate has the same number of placement trays as the holding holes of each carrier.

  [6] In the preceding item 5, a recessed portion is formed by fitting a ring-shaped mounting tray into a bottomed recessed portion formed in the plate, and a groove is provided in the bottom portion of the recessed portion to communicate the recessed portion. The wet polishing apparatus as described.

  [7] The wet polishing apparatus according to any one of items 1 to 6, wherein water or a dispersion medium of polishing liquid is used as the cleaning liquid.

  [8] The wet polishing apparatus according to any one of [1] to [9], wherein the workpiece is a magnetic disk substrate having a through hole in the center, and the gripping portion is a claw for gripping a peripheral surface of the through hole.

  [9] The placement / transfer section described above is controlled such that the gripping section is immersed in the cleaning liquid in the placement tray and waits at a time when the workpiece is not transferred. The wet polishing apparatus according to claim 1.

  The magnetic disk substrate polishing method of the present invention has the configuration described in [10] below.

  [10] A method for polishing a magnetic disk substrate, comprising polishing the magnetic disk substrate using the wet polishing apparatus according to any one of [1] to [9].

  According to the wet polishing apparatus described in [1] above, the gripping part is washed with the cleaning liquid each time the workpiece is transferred between the mounting tray and the polishing part of the mounting / transferring apparatus. The workpiece is always gripped by the cleaned gripping portion, and the generation of scratches due to the solidified polishing liquid can be reduced.

  According to the wet polishing apparatus described in [2] above, the gripping portion can be cleaned when the workpiece is transferred to the polishing portion in the previous stage of the polishing portion.

  According to the wet polishing apparatus described in [3] above, the gripping part can be cleaned when the workpiece is transferred from the polishing part in the subsequent stage of the polishing part.

  According to the wet polishing apparatus described in [4] above, a plurality of workpieces can be efficiently transferred.

  According to the wet polishing apparatus described in [5] above, the area immersed in the cleaning liquid is partitioned, and the apparatus and maintenance can be simplified.

  According to the wet polishing apparatus described in [6] above, it is easy to adjust the water level of the plurality of mounting trays on the plate.

  According to the wet polishing apparatus described in [7] above, there is no problem even when the cleaning liquid is brought into the polishing section.

  According to the wet polishing apparatus described in [8] above, it is possible to reduce the occurrence of scratches when holding and transferring the through hole of the magnetic disk substrate.

  According to the wet polishing apparatus as described in [9] above, the cleaning effect of the gripping part can be improved without extending the working time.

  According to the method for polishing a magnetic disk substrate described in [10] above, it is possible to reduce the generation of scratches caused by the polishing liquid and obtain high polishing quality.

  In the present invention, the wet polishing apparatus (1) shown in FIGS. For example, the polishing apparatus may include a supply unit (60), a loader unit (40), a polishing unit (10), an unloader unit (70), a cleaning / drying unit (61), and a discharge unit (62). The loader section (40) and the unloader section (70) correspond to the placement / transfer section in the present invention. This wet polishing apparatus (1) is an apparatus used for polishing a magnetic disk substrate (S) on a disk having a through hole (S1), and is stored in a cassette case (C) and transported in large numbers. The magnetic disk substrate (S) is polished, washed, and dried in order, and the operations from the storage to the cassette case (C) and the discharge are continuously performed.

  In the wet polishing apparatus (1), the polishing unit (10) simultaneously polishes a predetermined plurality of magnetic disk substrates (S), and transfers the magnetic disk substrate (S) to the polishing unit (10) and the polishing unit ( The transfer from 10) may be performed in batches in units of the number of polished sheets. Therefore, in the loader unit (40), the magnetic disk substrate (S) is transferred from the cassette case (C) conveyed from the supply unit (60). ) Are taken out one by one, and a predetermined number of sheets are developed and placed in a polishing posture. Similarly, the polished magnetic disk substrate (S) is collectively transferred from the polishing unit (10) to the unloader unit (70) in the polishing posture, and washed one by one from the unloader unit (70). It is transferred to the drying section (61). A predetermined number of magnetic disk substrates (S) that have been washed and dried are stored in the cassette case (C), and discharged from the discharge section (62) to the outside of the apparatus.

  The detailed configuration and operation of each part will be described in detail below.

[Polishing part]
As shown in FIGS. 2 and 3, the polishing section (10) is composed of a lower surface plate (11), an upper surface plate (15), a sun gear (20), an internal gear (22), a carrier (30), and the like. A configured planetary gear type polishing unit may be employed, for example.

  The lower surface plate (11) is a disk member having an annular horizontal upper surface, and a polishing cloth (12a) is attached to the upper surface. The lower surface of the lower surface plate (11) is fixed to a lower support member (13) rotatable about a vertical axis (Q), and the lower support member (13) is linked to the lower surface plate rotation drive unit (14). The lower surface plate (11) and the lower support member (13) are configured to rotate.

  The upper surface plate (15) is also a disk member having an annular horizontal lower surface, and a polishing cloth (12b) is bonded to the lower surface facing the lower surface plate (11). The upper surface of the upper surface plate (15) is fixed to an upper support member (16) that is rotatable about a vertical axis (Q), and the upper support member (16) is attached to the upper surface plate rotation drive unit (17). The upper surface plate (15) and the upper support member (16) are rotated in association with each other. The upper surface plate (15) and the upper support member (16) are supported so as to be movable up and down along the vertical axis (Q) and are moved up and down by driving an upper surface plate lifting and lowering drive unit (not shown). ing. The upper surface plate (15) is provided with a number of polishing liquid supply holes (18) and peeling fluid supply holes (19) penetrating the polishing pad (12b).

  The sun gear (20) is rotatably provided at the center position of the polishing section (10), and is rotated about the vertical axis (Q) by driving the sun gear rotation driving section (21). Yes. However, when rotating the internal gear (22), the sun gear (20) may be fixed so as not to rotate. As the sun gear (20), a spur gear, a pin gear, or the like in which a tooth row is integrally formed on a side surface portion is used.

  The internal gear (22) is a ring-shaped gear having a tooth row on the inner peripheral side, and is arranged concentrically on the outer side of the sun gear (20). The internal gear (22) of the present embodiment is fixed so as not to rotate, but an internal gear rotation drive unit may be additionally installed to be rotatable about the vertical axis (Q). Also, in the internal gear (22), a pin gear or the like may be used in addition to the spur gear.

  The carrier (30) is a thin plate-like disk member having a tooth row on the outer periphery, and a plurality of holding holes (31) for loading and holding the workpiece (S) are formed. In the polishing section (10), a plurality of carriers (30) are arranged. These carriers (30) mesh with the sun gear (20) and the internal gear (22), and the sun gear (20) and / or According to the rotation of the internal gear (22), it rotates while revolving around the sun gear (20).

  In the polishing section (10), the workpiece (S) held by the carrier (30) is sandwiched between the upper surface plate (15) and the lower surface plate (11), and the carrier (30) is rotated and rotated in this state. By doing so, the upper and lower surfaces of the workpiece (S) are polished. In this polishing section (10), a donut-shaped region sandwiched between the sun gear (20) and the internal gear (22) and between the upper surface plate (15) and the lower surface plate (11) is actually polished. It becomes an area.

  A polishing liquid supply device (34) is provided above the upper surface plate (15). The polishing liquid supply device (34) includes a bowl-shaped main body (35), nozzles (36) and (37) for introducing the polishing liquid and the rinse liquid into the bowl-shaped main body (35), and a tank for storing the polishing liquid and the rinse liquid. (Not shown), a tube (not shown) for connecting these tanks and the nozzles (36), (37) in communication, and a tank-shaped body (35) connected to supply the polishing liquid to the polishing section (10). A tube (38) is provided. The tube (38) is connected in communication with the polishing liquid supply hole (18) of the upper surface plate (15). Reference numeral (39) denotes a tube for introducing a peeling fluid for peeling the workpiece (S) stuck to the upper surface plate (15).

  In the present embodiment, the number of carriers (30) is eight, and each carrier (30) has five holding holes (31).

[Loader section]
For example, as shown in FIG. 2, the loader section (40) is arranged in front of the polishing section (10), and a circular table (41) rotatably installed on a table (not shown) and the table ( 41) and a transfer device (50) disposed above.

  On the table (41), the same number of plates (42) as the carrier (30) of the polishing section (10) are attached in the same arrangement as the carrier (30). As shown in FIGS. 4 and 6, each plate (42) has a bottomed circular recess (43) at a position corresponding to the holding hole (31) of the carrier (30), and a groove provided at the bottom. (44) communicate with each other. Then, by fitting the ring-shaped resin mounting tray (45) into the recesses (43) flush with each other, a bottomed recess is formed to store the cleaning liquid (W). The inner peripheral portion of the mounting tray (45) is rolled into a concave shape to form a step portion (45a), and this ring-shaped step portion (45a) supports the lower outer edge portion of the magnetic disk substrate (S). The Further, a bank (46) for damming the cleaning liquid (W) is provided at the periphery of the upper surface of the plate (42). When the cleaning liquid (W) is supplied onto the plate (42) from the water supply pipe (47) provided radially from the center of the table (41), it flows into the mounting tray (45) and passes through the groove (44). It is supplied into all the loading trays (45) and becomes a constant water level. In this way, the water level of the plurality of loading trays (45) can be easily adjusted by communicating the recesses (43). The discharge of the cleaning liquid (W) in the placing tray (45) can be appropriately performed by overflowing from the plate (42), or by providing a drain outlet at the bottom of the table groove (44).

  As shown in FIGS. 2 and 5, the transfer device (50) moves the movable substrate (51) horizontally between the table (41) and the lower surface plate (11) of the polishing unit (10). The movable substrate (51) can be moved up and down, and the same number of gripping units (52) as the plate (42) are attached to corresponding positions of the plate (42) on the lower surface of the movable substrate (51). The gripping unit (52) attaches the same number of gripping portions (54) as the mounting tray (45) in the plate (42) to a circular mounting plate (53), and attaches the mounting plate (53) to a mounting shaft (55). ) Attached to the movable substrate (51). Each gripping portion (54) has a pair of resin-made claws (56) (56) that can be opened and closed by air supply and discharge, etc., and the through-holes of the magnetic disk substrate (S) are formed on the outer surfaces of these claws (56). A groove (57) for gripping the peripheral end face of (S1) is formed (see FIG. 6). The attachment position of each gripping part (54) corresponds to the mounting tray (45) on the plate (42).

[Unloader section]
The unloader unit (70) is disposed at the rear stage of the polishing unit (10), and is disposed above the table (71) and a circular table (71) rotatably installed on a table (not shown). And a transfer device (80).

  The table (71) and the transfer device (80) have the same configuration as the table (41) and the transfer device (50) of the loader unit (40) except that the respective parts are arranged symmetrically. The description of the same name is omitted because it has the same function, and only the symbol is changed to distinguish it from the loader (40). That is, (72) is a plate, (73) is a recess, (74) is a groove, (75) is a loading tray, (75a) is a step, (76) is a bank, and (77) is a water supply pipe. (81) is a movable substrate, (82) is a gripping unit, (83) is a circular mounting plate, (84) is a gripping part, (85) is a mounting shaft, (86) (86) is a pair of claws, (87) is a groove.

〔Working process〕
In the above-described wet polishing apparatus, polishing, cleaning, and drying may be continuously performed in the order of the following (i) to (ix) while the magnetic disk substrate (S) is transferred through each part.

  As preparation for continuous processing, cleaning liquid (W) is supplied from the water supply pipe (47) of the loader section (40) and the water supply pipe (77) of the unloader section (70), and is placed in the loading tray (45) (75). Store it. The cleaning liquid (W) is not limited, but it is preferable to use water or a dispersion medium of a polishing liquid. Since the dispersion medium is a constituent of the polishing liquid, there is no problem even if it is brought into the polishing section (10) at the time of transfer and mixed into the polishing liquid. In addition, the use of water other than the dispersion medium has little effect.

  (I) The cassette case (C) is conveyed to the side of the table (41) of the loader section (40) by the conveyor of the supply section (60).

  (Ii) The magnetic disk substrates (S) in the cassette case (C) are taken out one by one, transferred to the table (41), and placed on the placement tray (45) so that the polishing surface is horizontal. The above transfer operation is performed while appropriately rotating the table (41), and the magnetic disk substrates (S) are developed and mounted on all the mounting trays (45). Since the cleaning liquid (W) is stored in the mounting tray (45), the magnetic disk substrate (S) is immersed in the liquid (see FIG. 6).

  (Iii) The transfer device (50) of the loader unit (40) is moved directly above the table (41), and then the movable substrate (51) is lowered. The claws (56) (56) of each gripping part (54) are opened after being inserted into the through hole (S1) of the magnetic disk substrate (S), and the peripheral end surface of the through hole (S1) is gripped by the groove (57) ( (See FIG. 6). Since the gripping part (54) is provided corresponding to all the mounting trays (45), all the magnetic disk substrates (S) are gripped simultaneously. Further, since the inside of the mounting tray (45) is filled with the cleaning liquid (W), the claws (56) and (56) of the gripping part (54) are immersed in the cleaning liquid and cleaned.

  (Iv) The movable substrate (51) is raised and moved directly above the lower surface plate (11) of the polishing section (10). Subsequently, the movable substrate (51) is lowered, and the magnetic disk substrate (S) is loaded into the holding hole (31) of the carrier (30). Then, after closing the claws (56) and (56) of the gripping part (54), the movable substrate (51) is lifted and horizontally moved back to the loader part (40). As a result, a predetermined number of magnetic disk substrates (S) are collectively transferred from the loader unit (40) to the polishing unit (10).

  (V) In the polishing section (10), the upper surface plate (15) is lowered to sandwich the magnetic disk substrate (S) loaded in the carrier (30), and the polishing liquid is supplied from the polishing liquid supply device (34). At the same time, both surfaces of the magnetic disk substrate (S) are polished. After polishing, the upper surface plate (15) is raised.

  (Vi) The movable substrate (81) of the transfer device (80) of the unloader section (70) is moved immediately above the lower surface plate (11) and then lowered. The claws (86) of each gripping part (84) are opened after being inserted into the through hole (S1) of the magnetic disk substrate (S), and the peripheral end face of the through hole (S1) is gripped by the groove (87). Since the holding portion (84) is provided corresponding to all the magnetic disk substrates (S), all the magnetic disk substrates (S) are simultaneously held.

  (Vii) The movable substrate (81) is raised and moved directly above the table (71) of the unloader section (70), and then the movable substrate (81) is lowered. When the magnetic disk substrate (S) is placed on the placement tray (75), the claws (86) and (86) of the grip portion (84) are closed to release the grip, and the movable substrate (81) is raised. Since the cleaning liquid (W) is stored in the mounting tray (75), the magnetic disk substrate (S) is placed in a state immersed in the liquid, and the claws (86) (86) of the gripping part (84) are placed. Rises after being immersed in the cleaning liquid (W) and cleaned. As a result, a predetermined number of magnetic disk substrates (S) are collectively transferred from the polishing section (10) to the unloader section (70).

  (Viii) The magnetic disk substrates (S) placed on the unloader unit (70) are transferred one by one to the cleaning / drying unit (61) to perform cleaning and drying. The dried magnetic disk substrate (S) is transferred, stored in the cassette case (C), and discharged out of the apparatus by the discharge conveyor of the discharge section (62).

  (Ix) The cycle of (i) to (viii) is repeated.

  In the wet polishing apparatus (1) described above, since the cleaning liquid (W) is stored in the mounting tray (45) of the loader section (40), each time the magnetic disk substrate (S) is gripped, the grip section (54) The nails (56) and (56) are immersed in the cleaning liquid (W). Since the claws (56) and (56) are immersed in the cleaning liquid (W) prior to the gripping operation of the magnetic disk substrate (S), they are attached to the claws (56) and (56) of the grip portion (54) in the previous cycle. The polishing liquid is removed and always held by the cleaned nails (56) (56). On the other hand, in the unloader section (70), the claws (86) and (86) of the gripping section (84) gripping the magnetic disk substrate (S) by the polishing section (10) are transferred to the mounting tray (75). At the same time, since it is immersed in the cleaning liquid (W), the polishing liquid adhering to the nails (86) (86) is cleaned soon before drying. In the next cycle, the nail (86) (86) that has been cleaned is always gripped. In this way, the claws (56) and (86) of the gripping portions (54) and (84) are cleaned each time they are transferred, and the attached polishing liquid is not carried over to the next cycle. Therefore, it is possible to prevent the polishing liquid adhering to the claws (56) and (86) of the grip portions (54) and (84) from solidifying and scratching the magnetic disk substrate (S). In addition, since the magnetic disk substrate (S) is immersed in the cleaning liquid (W), is the solidified polishing liquid dispersed in the cleaning liquid (W) even if it falls into the mounting trays (45) and (75)? Even if it is not dispersed, the liquid is softened and softened, so that the generation of scratches is reduced as compared with mounting the magnetic disk substrate in the air. Moreover, there is no need to change or add to the operation of the transfer devices (50) and (80), and there is no extension of the work time.

  In the above cycle, after the step (iv), the loading tray (45) of the loader section (40) is emptied, and the transfer device (50) is in a standby state until the next cycle. During the standby, the cleaning effect is improved by lowering the movable substrate (51) and immersing the claws (56) (56) of the gripping part (54) in the cleaning liquid (W) of the mounting tray (45). The attached polishing liquid is easier to remove if it is washed before drying and solidifies, and even if the polishing liquid is left unwashed in step (iv), it can be washed here. Further, if the movable substrate (51) is moved up and down, left and right in small increments, the cleaning effect is further improved. In such standby cleaning, even if the magnetic disk substrate (S) is deployed and mounted on the mounting tray (45), the claw (56) is inserted into the through-hole (S1) to form the cleaning liquid (W). Since it can be immersed, it can also be performed after the step (ii).

  In the unloader section (70), the claws (86) and (86) of the grip section (84) can be cleaned with the cleaning liquid (W) in the mounting tray (85). Specifically, in the step (viii), after all the polished magnetic disk substrates (S) of the mounting tray (75) are transferred to the cleaning / drying unit (61), they are on standby until the next cycle is transferred. Alternatively, cleaning can be performed even when the magnetic disk substrate (S) is mounted in the mounting tray (85) in a waiting state for transfer to the cleaning / drying section (61).

  As long as the above-described additional cleaning is performed during standby, the working time is not extended. However, cleaning beyond the waiting time is optional.

  According to the wet polishing apparatus of the present invention, scratches caused by the solidified polishing liquid can be reduced, and thus the wet polishing apparatus is suitable for polishing a workpiece that requires a high level of polishing quality. Examples of the workpiece include a magnetic disk substrate made of aluminum or an aluminum alloy plate, a glass substrate, or a magnetic disk substrate having a Ni-P plating film on the surface of the substrate.

  The wet polishing apparatus of the present invention is not limited to the above embodiment.

  In the present invention, the loading / unloading apparatus having the loading tray for storing the cleaning liquid may be installed in at least one of the front stage and the rear stage of the polishing unit. That is, it suffices that at least one of the front-stage loader unit and the rear-stage unloader unit be provided with a mounting tray capable of storing the cleaning liquid, and the present invention also includes a case where the gripping unit is cleaned with only one of them. Even with only one cleaning, a corresponding effect can be obtained and the generation of scratches can be suppressed. Further, the configuration of the polishing unit is not limited to the combination of the sun gear and the internal gear of the embodiment described above to rotate and revolve the carrier, and any sliding means can be incorporated. Furthermore, the apparatus configuration other than the loader unit and the unloader unit, the method of transferring the workpiece to the loader unit, and the method of transferring the unloader unit to the next process are not limited.

  It is sufficient that there is at least one loading tray for the loader unit and the unloader unit, and the case where the number of loading trays does not match the total number of holding holes of the carrier is also included in the present invention. However, by providing the same number of mounting trays as the carrier holding holes, batch transfer is possible and work efficiency is improved. In this embodiment, the mounting trays are grouped using plates corresponding to the carriers, but the present invention is not limited to grouping using plates. By grouping the mounting trays, the area immersed in the cleaning liquid is divided, and the apparatus can be simplified and maintenance can be performed more easily than water supply for each mounting tray or collective water supply to all mounting trays. In addition, a configuration in which the mounting tray and the plate are integrated and a configuration in which the mounting tray on the plate is independent without being communicated are also included in the present invention. Furthermore, the method of supplying cleaning water is not limited at all.

  Further, the workpiece is not limited, and the mounting posture can be set according to the shape of the workpiece and the polishing portion, and the shapes of the mounting tray and the gripping portion can be designed. As long as the workpiece is immersed in the liquid, the gripper is immersed in the cleaning liquid regardless of the shape of the workpiece, the loading tray, and the holding unit. Is removed.

  A polishing test of the workpiece (S) was performed using the wet polishing apparatus (1) which is an example of the present invention shown in FIGS.

  As an embodiment of the present invention, the cleaning liquid (W) is stored in the mounting trays (45) and (75) of the loader unit (40) and the unloader unit (70), and the transfer device (before and after the polishing unit (10)) A polishing test of the workpiece (S) was performed while washing the claws (56) and (86) of the grip portions (54) and (84) of 50 and (80).

  On the other hand, as a comparative example, the cleaning liquid is not put in the loading trays (45) and (75) of the loader unit (40) and the unloader unit (70) of the wet polishing apparatus (1), and the workpiece (S ) Was mounted and polished.

  As a test workpiece (S), an aluminum plate having a diameter of 95 mm having Ni-P plating films on both sides was used. This aluminum plated plate is used as a magnetic disk substrate. The polishing liquid was colloidal silica, and the cleaning liquid (W) supplied to the mounting trays (45) and (75) was pure water as a dispersion medium for the polishing liquid.

  In the wet polishing apparatuses of the example and the comparative example, 40 workpieces (8 carriers, 5 holding holes) are processed as one unit, and the loader unit (40) to the polishing unit (10) And transfer from the polishing section (10) to the unloader section (70) were performed in batches for each unit, and further washed and dried. The cycle from transfer to polishing to cleaning and drying was repeated as one cycle, and both surfaces of a total of 15,000 aluminum plating plates were polished.

  When the polished aluminum plated plate was inspected with an inspection apparatus, the use of the wet polishing apparatus of the example caused 40% of scratches that were judged to be caused by the polishing liquid adhering to the gripping part as compared with the comparative example. Reduced.

  Since the wet polishing apparatus of the present invention can clean the polishing liquid adhering to the gripping part that holds the workpiece, it is possible to reduce the occurrence of scratches caused by the solidified polishing liquid. Therefore, it is suitable for polishing a magnetic disk substrate that requires high polishing quality.

It is a front view which shows schematic structure of one Embodiment of the wet polishing apparatus of this invention. FIG. 2 is a perspective view showing a loader unit, a polishing unit, and an unloader unit in the wet polishing apparatus of FIG. 1. It is principal part sectional drawing of a grinding | polishing part. It is a perspective view which shows the plate of a loader part and an unloader part. It is a perspective view which shows the principal part of the transfer apparatus of a loader part and an unloader part. It is principal part sectional drawing which shows a mounting tray and a holding part.

Explanation of symbols

1 ... Wet polishing equipment
10 ... Polishing part
11 ... Lower surface plate
15… Upper surface plate
30 ... Career
31 ... Holding hole
40… Loader section (mounting / transferring section)
42,72… Plate
43 ... recess
44 ... Groove
45,75 ... Loading tray
70 ... Unloader section (mounting / transferring section)
50,80 ... Transfer device
54,84… Holding part
56,86 ... Nail S ... Magnetic disk substrate (workpiece)
S1 ... through hole W ... cleaning liquid

Claims (10)

A carrier having a holding hole for loading a workpiece is provided, and the workpiece loaded in the carrier is sandwiched between an upper surface plate and a lower surface plate that are vertically opposed to supply polishing liquid. Between the polishing unit to be polished while being placed in at least one of the preceding stage and the subsequent stage of the polishing unit and the workpiece tray to be held by the gripping unit. A wet polishing apparatus including a mounting transfer unit having a transfer apparatus for transferring a workpiece in
The mounting tray of the mounting / transferring section has a recessed portion for storing the cleaning liquid on the upper surface, and the workpiece is mounted in a state immersed in the cleaning liquid, and the gripping section is placed in the mounting tray. A wet polishing apparatus characterized in that a workpiece is gripped or released in a cleaning liquid.   The loading / unloading unit described above is a loader unit disposed in front of the polishing unit, grips a workpiece in the mounting tray in a cleaning liquid, and transfers the workpiece to a holding hole of a carrier of the polishing unit. 2. The wet polishing apparatus according to 1.   2. The loading / unloading unit described above is an unloader unit disposed at a subsequent stage of the polishing unit, and transfers the workpiece gripped by the carrier of the polishing unit to the mounting tray and releases the grip in the cleaning liquid. Or the wet polishing apparatus of 2.   4. The apparatus according to claim 1, wherein the placement / transfer section includes the same number of placement trays and gripping portions as the carrier holding holes of the polishing section, and collectively transfers all workpieces. The wet polishing apparatus according to 1.   The wet polishing apparatus according to claim 4, wherein the placement transfer unit has the same number of plates as the carrier of the polishing unit, and each plate has the same number of placement trays as the holding holes of each carrier.   The recessed portion is formed by fitting a ring-shaped mounting tray into a recessed portion with a bottom formed on the plate, and a groove for communicating the recessed portion is provided at the bottom portion of the recessed portion. Wet polishing equipment.   The wet polishing apparatus according to claim 1, wherein water or a dispersion medium of a polishing liquid is used as the cleaning liquid.   The wet polishing apparatus according to claim 1, wherein the workpiece is a magnetic disk substrate having a through hole in the center, and the gripping portion is a claw for gripping a peripheral surface of the through hole.   The said transfer part is controlled so that a holding part may be immersed in the washing | cleaning liquid in a mounting tray, and it waits at the time when the workpiece is not transferred. The wet polishing apparatus according to Item. A method for polishing a magnetic disk substrate, comprising polishing the magnetic disk substrate using the wet polishing apparatus according to claim 1.

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