JP2007262394A - Surface-treating agent - Google Patents

Surface-treating agent Download PDF

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JP2007262394A
JP2007262394A JP2007047642A JP2007047642A JP2007262394A JP 2007262394 A JP2007262394 A JP 2007262394A JP 2007047642 A JP2007047642 A JP 2007047642A JP 2007047642 A JP2007047642 A JP 2007047642A JP 2007262394 A JP2007262394 A JP 2007262394A
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copper
acid
surface treatment
mass
treatment agent
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JP4968909B2 (en
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Yoshiaki Furukawa
良昭 古川
Noriko Yaguma
紀子 矢熊
Kenji Nishie
健二 西江
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MEC Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/14Nitrogen-containing compounds
    • C23F11/149Heterocyclic compounds containing nitrogen as hetero atom
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/06Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/06Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
    • C23C22/48Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates
    • C23C22/52Treatment of copper or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/12Oxygen-containing compounds
    • C23F11/122Alcohols; Aldehydes; Ketones
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/173Macromolecular compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/282Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a surface-treating agent which can inhibit the formation of coating films on a different kind of metal and can reduce environmental loads. <P>SOLUTION: This surface-treating agent for treating the surface of copper or a copper alloy is characterized by comprising an imidazole compound and a sugar alcohol. The surface-treating agent can inhibit the formation of coating films on a different kind of metal, because copper ion eluted in the surface-treating agent is bound to the sugar alcohol. Furthermore, waste liquids can easily be treated, and environmental loads can be reduced, because the sugar alcohol is used. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、銅又は銅合金の表面処理剤に関する。   The present invention relates to a surface treatment agent for copper or copper alloy.

従来から、銅又は銅合金(以下、単に「銅」ともいう。)からなる回路配線の防錆やはんだ付け性向上のための表面処理剤として、ベンゾイミダゾール等のイミダゾール化合物を含むOSP(水溶性プリフラックス)が知られている(例えば、特許文献1〜4参照)。   Conventionally, an OSP (water-soluble) containing an imidazole compound such as benzimidazole as a surface treatment agent for improving the rust prevention and solderability of circuit wiring made of copper or a copper alloy (hereinafter also simply referred to as “copper”). Preflux) is known (see, for example, Patent Documents 1 to 4).

他方、プリント配線板では、銅配線上に金、銀、アルミニウム、スズ、はんだ等の銅以外の金属(以下、「異種金属」ともいう。)が共存している場合がある。このような異種金属が共存している基板を、上記のようなイミダゾール化合物を含む水溶性プリフラックスで処理すると、異種金属上にも皮膜が形成されて変色等の不具合が生じるおそれがある。   On the other hand, in printed wiring boards, metals other than copper, such as gold, silver, aluminum, tin, and solder (hereinafter also referred to as “foreign metals”) may coexist on the copper wiring. When a substrate in which such a different metal coexists is treated with a water-soluble preflux containing the imidazole compound as described above, a film may be formed on the different metal to cause a problem such as discoloration.

異種金属上に皮膜が形成される理由として、上記水溶性プリフラックスで処理する際、銅表面から水溶性プリフラックス液中に溶出した銅イオンが酸化物や水酸化物として異種金属上に付着し、この付着した異種金属上の銅とイミダゾール化合物とが結合して皮膜が形成されることが考えられる。   The reason why a film is formed on a dissimilar metal is that when treating with the above-mentioned water-soluble preflux, copper ions eluted from the copper surface into the water-soluble preflux liquid adhere to the dissimilar metal as oxides or hydroxides. It is considered that a film is formed by bonding copper and imidazole compound on the adhered dissimilar metal.

上記問題を解決するため、表面処理剤中に基板から溶出した銅イオンをキレート化して異種金属上への銅イオンの付着を防止する技術が提案されている(例えば、特許文献5〜7参照)。
特開平7−54169号公報 特開平5−237688号公報 特開平5−163585号公報 特開平11−177218号公報 特開昭52−72342号公報 特開平6−81161号公報 特開平9−291372号公報
In order to solve the above problem, a technique for chelating the copper ions eluted from the substrate into the surface treatment agent to prevent the copper ions from adhering to the different metal has been proposed (for example, see Patent Documents 5 to 7). .
JP-A-7-54169 JP-A-5-237688 JP-A-5-163585 Japanese Patent Laid-Open No. 11-177218 JP-A-52-72342 JP-A-6-81161 Japanese Patent Laid-Open No. 9-291372

しかし、特許文献5〜7に記載の方法では、廃液処理時に処理方法が煩雑となるキレート剤を使用しているため、環境負荷が高くなる可能性がある。また、特許文献5〜7に記載のキレート剤は銅上に皮膜が形成されるのを阻害するため、特許文献5〜7に記載の方法では、はんだ付け性が低下するおそれがある。   However, the methods described in Patent Documents 5 to 7 use a chelating agent that complicates the treatment method at the time of waste liquid treatment, which may increase the environmental load. Moreover, since the chelating agent described in Patent Documents 5 to 7 inhibits the formation of a film on copper, the methods described in Patent Documents 5 to 7 may reduce solderability.

本発明は、このような事情に鑑みなされたもので、銅上への皮膜形成を阻害せずに異種金属上への皮膜形成を抑制できる上、環境負荷を低減できる表面処理剤を提供する。   The present invention has been made in view of such circumstances, and provides a surface treatment agent that can suppress the formation of a film on a dissimilar metal without inhibiting the formation of a film on copper and can reduce the environmental burden.

本発明の表面処理剤は、銅又は銅合金の表面処理剤であって、イミダゾール化合物と糖アルコールとを含むことを特徴とする。   The surface treatment agent of the present invention is a copper or copper alloy surface treatment agent, and contains an imidazole compound and a sugar alcohol.

本発明の表面処理剤によれば、表面処理剤中に溶出した銅イオンと糖アルコールとが結合するため、銅上への皮膜形成を阻害せずに異種金属上への皮膜形成を抑制できる。また、糖アルコールを使用しているため、廃液処理が容易となり、環境負荷を低減できる。   According to the surface treatment agent of the present invention, since the copper ions eluted in the surface treatment agent and the sugar alcohol bind to each other, it is possible to suppress the film formation on the dissimilar metal without inhibiting the film formation on the copper. Moreover, since sugar alcohol is used, waste liquid processing becomes easy and an environmental load can be reduced.

本発明の表面処理剤は、例えば防錆やはんだ付け性向上等のために、配線を形成する銅の表面に皮膜を形成する目的で使用される。上記表面処理剤は、形成される皮膜の主成分となるイミダゾール化合物と、上記表面処理剤中に溶出した銅イオンと結合する糖アルコールとを含む。これにより、異種金属上への皮膜形成を抑制できる上、糖アルコールを使用しているため、従来のキレート剤を使用した表面処理剤よりも廃液処理が容易となり、環境負荷を低減できる。また、上記表面処理剤を水溶性プリフラックスとして使用すると、リフロー等の高温処理工程後においてもはんだ付け性が低下せず、耐熱性が高い皮膜を形成できる。   The surface treating agent of the present invention is used for the purpose of forming a film on the surface of copper for forming wiring, for example, for rust prevention and solderability improvement. The said surface treating agent contains the imidazole compound used as the main component of the membrane | film | coat formed, and the sugar alcohol couple | bonded with the copper ion eluted in the said surface treating agent. As a result, film formation on different metals can be suppressed, and since sugar alcohol is used, waste liquid treatment becomes easier than conventional surface treatment agents using chelating agents, and the environmental burden can be reduced. Moreover, when the surface treatment agent is used as a water-soluble preflux, a film having high heat resistance can be formed without lowering the solderability even after a high temperature treatment step such as reflow.

上記表面処理剤は、例えばイミダゾール化合物と糖アルコールを溶媒に溶解させることによって調製できる。溶媒としては、イオン交換水、純水、超純水等の水や、有機酸、無機酸等の酸や、水溶性有機溶剤等を使用することができる。溶媒として酸や水溶性有機溶剤を使用した場合には、イミダゾール化合物の溶解を促進させることができる。   The surface treatment agent can be prepared, for example, by dissolving an imidazole compound and a sugar alcohol in a solvent. As the solvent, water such as ion-exchanged water, pure water or ultrapure water, acids such as organic acids and inorganic acids, water-soluble organic solvents, and the like can be used. When an acid or a water-soluble organic solvent is used as the solvent, dissolution of the imidazole compound can be promoted.

上記イミダゾール化合物は特に限定されないが、例えば、2−プロピルベンゾイミダゾール、2−シクロヘキシルベンゾイミダゾール、2−フェニルベンゾイミダゾール、2−ベンジルベンゾイミダゾール、2−(3−フェニルプロピル)−5−メチルベンゾイミダゾール、2−(メルカプトメチル)ベンゾイミダゾール、2−(1−ナフチルメチル)ベンゾイミダゾール、2−(5’−フェニル)ペンチルベンゾイミダゾール、2−フェニルエチルベンゾイミダゾール等のベンゾイミダゾール化合物や、2,4−ジフェニル−5−メチルイミダゾール、2−ペンチルイミダゾール、2−ウンデシル−4−メチルイミダゾール、2,4−ジメチルイミダゾール、2,4−ジフェニルイミダゾール、2,4,5−トリフェニルイミダゾール、2−ベンジルイミダゾール、2−ベンジル−4−メチルイミダゾール等のイミダゾール化合物等が使用できる。また、本発明の表面処理剤は、これらのイミダゾール化合物を2種類以上含んでいても良い。   Although the imidazole compound is not particularly limited, for example, 2-propylbenzimidazole, 2-cyclohexylbenzimidazole, 2-phenylbenzimidazole, 2-benzylbenzimidazole, 2- (3-phenylpropyl) -5-methylbenzimidazole, Benzimidazole compounds such as 2- (mercaptomethyl) benzimidazole, 2- (1-naphthylmethyl) benzimidazole, 2- (5′-phenyl) pentylbenzimidazole, 2-phenylethylbenzimidazole, 2,4-diphenyl -5-methylimidazole, 2-pentylimidazole, 2-undecyl-4-methylimidazole, 2,4-dimethylimidazole, 2,4-diphenylimidazole, 2,4,5-triphenylimidazole, 2 Benzyl imidazole, 2-benzyl-4-imidazole compounds such methylimidazole can be used. Moreover, the surface treating agent of this invention may contain 2 or more types of these imidazole compounds.

上記表面処理剤中のイミダゾール化合物の濃度は、好ましくは0.01〜5質量%であり、より好ましくは0.05〜1質量%である。イミダゾール化合物の濃度が0.01質量%未満の場合は、皮膜が形成されなくなる可能性がある。一方、イミダゾール化合物の濃度が5質量%を超える場合は、イミダゾール化合物の沈殿物が生じる場合がある。   The concentration of the imidazole compound in the surface treatment agent is preferably 0.01 to 5% by mass, more preferably 0.05 to 1% by mass. When the concentration of the imidazole compound is less than 0.01% by mass, a film may not be formed. On the other hand, when the concentration of the imidazole compound exceeds 5% by mass, a precipitate of the imidazole compound may be generated.

上記糖アルコールについても特に限定されず、マンニトール、ソルビトール、キシリトール、エリスリトール、マルチトール、ラクチトール等の単糖アルコール、スクロース等の二糖アルコール、オリゴ糖アルコール等の多糖アルコール等が使用できる。なかでも、マンニトール、ソルビトール及びキシリトールは、コストが安く、入手もし易いため好ましい。また、本発明の表面処理剤は、これらの糖アルコールを2種類以上含んでいても良い。   The sugar alcohol is not particularly limited, and monosaccharide alcohols such as mannitol, sorbitol, xylitol, erythritol, maltitol, and lactitol, disaccharide alcohols such as sucrose, polysaccharide alcohols such as oligosaccharide alcohol, and the like can be used. Among these, mannitol, sorbitol, and xylitol are preferable because they are inexpensive and easily available. The surface treatment agent of the present invention may contain two or more kinds of these sugar alcohols.

上記表面処理剤中の糖アルコールの濃度は、好ましくは0.01〜7質量%であり、より好ましくは0.05〜4質量%であり、最も好ましくは0.1〜1質量%である。糖アルコールの濃度が0.01質量%未満の場合は、異種金属上への皮膜形成を抑制する効果が低減するおそれがある。一方、糖アルコールの濃度が7質量%を超える場合は、それ以上の効果が見込めずに不経済となる可能性がある。   The concentration of the sugar alcohol in the surface treatment agent is preferably 0.01 to 7% by mass, more preferably 0.05 to 4% by mass, and most preferably 0.1 to 1% by mass. When the concentration of the sugar alcohol is less than 0.01% by mass, the effect of suppressing film formation on the dissimilar metal may be reduced. On the other hand, when the concentration of the sugar alcohol exceeds 7% by mass, no further effect can be expected, which may be uneconomical.

本発明の表面処理剤が有機酸を含む場合、使用できる有機酸の具体例としては、ギ酸、酢酸、プロピオン酸、グリコール酸、n−酪酸、イソ酪酸、アクリル酸、クロトン酸、イソクロトン酸、シュウ酸、マロン酸、コハク酸、アジピン酸、マレイン酸、アセチレンジカルボン酸、モノクロロ酢酸、トリクロロ酢酸、モノブロモ酢酸、乳酸、オキシ酪酸、グリセリン酸、酒石酸、リンゴ酸、クエン酸、エナント酸、カプロン酸や、これらのうち2種以上を混合したもの等が例示できる。上記表面処理剤中の有機酸の濃度は、好ましくは1〜80質量%であり、より好ましくは1.5〜45質量%であり、最も好ましくは3〜30質量%である。有機酸の濃度が1質量%未満の場合は、イミダゾール化合物の沈殿物が生じる場合がある。一方、有機酸の濃度が80質量%を超える場合は、皮膜が形成され難くなる可能性がある。   When the surface treatment agent of the present invention contains an organic acid, specific examples of the organic acid that can be used include formic acid, acetic acid, propionic acid, glycolic acid, n-butyric acid, isobutyric acid, acrylic acid, crotonic acid, isocrotonic acid, and shu Acid, malonic acid, succinic acid, adipic acid, maleic acid, acetylenedicarboxylic acid, monochloroacetic acid, trichloroacetic acid, monobromoacetic acid, lactic acid, oxybutyric acid, glyceric acid, tartaric acid, malic acid, citric acid, enanthic acid, caproic acid, What mixed 2 or more types among these can be illustrated. The concentration of the organic acid in the surface treatment agent is preferably 1 to 80% by mass, more preferably 1.5 to 45% by mass, and most preferably 3 to 30% by mass. When the concentration of the organic acid is less than 1% by mass, a precipitate of an imidazole compound may be generated. On the other hand, when the concentration of the organic acid exceeds 80% by mass, it is difficult to form a film.

本発明の表面処理剤が無機酸を含む場合、使用できる無機酸の具体例としては、塩酸、硫酸、硝酸、リン酸や、これらのうち2種以上を混合したもの等が例示できる。上記表面処理剤中の無機酸の濃度は、好ましくは1〜80質量%であり、より好ましくは1.5〜30質量%であり、最も好ましくは3〜15質量%である。無機酸の濃度が1質量%未満の場合は、イミダゾール化合物の沈殿物が生じる場合がある。一方、無機酸の濃度が80質量%を超える場合は、皮膜が形成され難くなる可能性がある。   When the surface treating agent of the present invention contains an inorganic acid, specific examples of the inorganic acid that can be used include hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, and a mixture of two or more thereof. The density | concentration of the inorganic acid in the said surface treating agent becomes like this. Preferably it is 1-80 mass%, More preferably, it is 1.5-30 mass%, Most preferably, it is 3-15 mass%. When the concentration of the inorganic acid is less than 1% by mass, a precipitate of the imidazole compound may be generated. On the other hand, when the concentration of the inorganic acid exceeds 80% by mass, it is difficult to form a film.

本発明の表面処理剤が水溶性有機溶剤を含む場合、使用できる水溶性有機溶剤の具体例としては、メタノール、エタノール、2−プロパノール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル等が例示できる。上記表面処理剤中の水溶性有機溶剤の濃度は、好ましくは1〜80質量%であり、より好ましくは1.5〜30質量%であり、最も好ましくは3〜15質量%である。水溶性有機溶剤の濃度が1質量%未満の場合は、イミダゾール化合物の沈殿物が生じる場合がある。一方、水溶性有機溶剤の濃度が80質量%を超える場合は、皮膜が形成され難くなる可能性がある。   When the surface treating agent of the present invention contains a water-soluble organic solvent, specific examples of the water-soluble organic solvent that can be used include methanol, ethanol, 2-propanol, ethylene glycol monomethyl ether, and ethylene glycol monoethyl ether. The concentration of the water-soluble organic solvent in the surface treatment agent is preferably 1 to 80% by mass, more preferably 1.5 to 30% by mass, and most preferably 3 to 15% by mass. When the concentration of the water-soluble organic solvent is less than 1% by mass, a precipitate of an imidazole compound may be generated. On the other hand, when the concentration of the water-soluble organic solvent exceeds 80% by mass, it is difficult to form a film.

本発明の表面処理剤の使用方法は特に限定されず、例えば、浸漬法、スプレー法等により使用することができる。浸漬法により使用する場合は、例えば浸漬時間を15〜120秒程度とすればよい。また、本発明の表面処理剤には、上記例示した成分の他に、必要に応じて皮膜形成補助剤、溶解安定剤等の添加剤が配合されていてもよい。なお、上記表面処理剤の使用温度は、通常25〜35℃の範囲である。   The usage method of the surface treating agent of this invention is not specifically limited, For example, it can use by the immersion method, the spray method, etc. When using the immersion method, for example, the immersion time may be about 15 to 120 seconds. In addition to the above-exemplified components, additives such as a film forming aid and a dissolution stabilizer may be blended with the surface treatment agent of the present invention as necessary. In addition, the use temperature of the said surface treating agent is the range of 25-35 degreeC normally.

本発明の表面処理剤を、装置を用いて使用する場合には、例えば前記表面処理剤の全成分を所定の組成になるように調製した後に装置に供給してもよく、あるいは各成分を個別に装置に供給し、装置内で前記各成分を混合して所定の組成になるように調製してもよい。また、前記表面処理剤の各成分を装置に供給する際において、前記各成分の濃度は特に限定されず、例えば、高濃度の前記各成分を装置に供給し、装置内で酸や水を用いて希釈し、所定の濃度に調製してもよい。   When the surface treatment agent of the present invention is used with an apparatus, for example, all components of the surface treatment agent may be prepared to have a predetermined composition and then supplied to the apparatus, or each component may be individually supplied. The components may be supplied to the apparatus and the components may be mixed in the apparatus so as to have a predetermined composition. Further, when supplying each component of the surface treatment agent to the apparatus, the concentration of each component is not particularly limited. For example, each component having a high concentration is supplied to the apparatus, and acid or water is used in the apparatus. May be diluted to a predetermined concentration.

なお、銅上に防錆皮膜を形成するための表面処理剤には皮膜を形成しやすくする目的で銅イオンが添加されていることがあるが、異種金属が共存するプリント基板の場合には、銅イオンを添加すると異種金属上にも皮膜が形成されてしまうため銅イオンを添加できず、銅表面に皮膜が形成されにくくなるおそれがあった。本発明の表面処理剤では、糖アルコールの作用により銅イオンを添加しなくても銅表面への皮膜形成性が低下することがない。   In addition, copper ions may be added to the surface treatment agent for forming a rust preventive film on copper for the purpose of easily forming a film. When copper ions are added, a film is also formed on the dissimilar metal, so copper ions cannot be added, and there is a possibility that the film is difficult to be formed on the copper surface. In the surface treatment agent of the present invention, the film-forming property on the copper surface is not lowered even if copper ions are not added due to the action of the sugar alcohol.

以下、本発明の表面処理剤の実施例について比較例と併せて説明する。なお、本発明は下記の実施例に限定されるものではない。   Examples of the surface treatment agent of the present invention will be described below together with comparative examples. In addition, this invention is not limited to the following Example.

実験1(異種金属上に形成された皮膜量の評価)
まず、イオン交換水に0.1質量%の2−(1−ナフチルメチル)ベンゾイミダゾールと、5.25質量%のギ酸と、表1に示す濃度のキシリトールを加えて実施例1〜12の表面処理剤を調製した。また、比較例1として、キシリトールを加えないこと以外は実施例1〜12と同様に調製した表面処理剤を準備した。
Experiment 1 (Evaluation of the amount of film formed on different metals)
First, 0.1% by mass of 2- (1-naphthylmethyl) benzimidazole, 5.25% by mass of formic acid, and xylitol at the concentrations shown in Table 1 were added to ion-exchanged water, and the surfaces of Examples 1-12. A treating agent was prepared. Further, as Comparative Example 1, a surface treatment agent prepared in the same manner as in Examples 1 to 12 except that xylitol was not added was prepared.

次に、ガラスエポキシ基材(日立化成工業製GEA-67N、厚み:1.6mm)の両面に厚さ18μmの銅箔が貼付された両面銅張積層板(4cm×4cm)を用意し、両面の銅箔上に厚さ0.5μmのNiめっき膜を形成し、更に、このNiめっき膜上に厚さ0.05μmの金めっき膜を形成して被処理材を作製した。続いて、この被処理材を、実施例1〜12及び比較例1の表面処理剤のそれぞれに1枚ずつ60秒間浸漬した後、水洗、乾燥を行った。この際、それぞれの表面処理剤に酢酸銅を銅イオン濃度で30mg/L添加した場合と添加しない場合の2通りで行った。なお、表面処理剤の温度は、いずれも30℃とした。次に、乾燥後の被処理材を、35質量%塩酸とメタノールの混合液(質量比は塩酸:メタノール=0.5:99.5)に5分間浸漬して、金上に付着した皮膜成分を上記混合液中に溶解させた。そして、皮膜成分が溶解した上記混合液をサンプリングし、紫外可視吸光分光光度計にて2−(1−ナフチルメチル)ベンゾイミダゾールの吸収ピーク(277nm)の吸光度を測定した。そして、比較例1の銅イオンを添加しない場合の吸光度を1として、その他の表面処理剤を使用した場合の吸光度の相対値を算出し、その値から金上の皮膜量を評価した。結果を表1に示す。   Next, a double-sided copper-clad laminate (4 cm x 4 cm) with 18 μm thick copper foil attached to both sides of a glass epoxy substrate (GEA-67N manufactured by Hitachi Chemical Co., Ltd., thickness: 1.6 mm) was prepared. A Ni-plated film having a thickness of 0.5 μm was formed on the copper foil, and a gold-plated film having a thickness of 0.05 μm was further formed on the Ni-plated film to prepare a material to be processed. Then, after immersing this to-be-processed material one by one in each of the surface treating agent of Examples 1-12 and Comparative Example 1, it washed with water and dried. At this time, each of the surface treatment agents was performed in two ways: when copper acetate was added at a concentration of 30 mg / L at a copper ion concentration and when not added. The temperature of the surface treatment agent was 30 ° C. for all. Next, the treated material after drying was immersed in a mixed liquid of 35% by mass hydrochloric acid and methanol (mass ratio hydrochloric acid: methanol = 0.5: 99.5) for 5 minutes, and the film component adhered on the gold Was dissolved in the above mixture. And the said liquid mixture with which the film | membrane component melt | dissolved was sampled, and the light absorbency of the absorption peak (277 nm) of 2- (1-naphthylmethyl) benzimidazole was measured with the ultraviolet visible absorption spectrophotometer. And the light absorbency when not adding the copper ion of the comparative example 1 was set to 1, the relative value of the light absorbency when another surface treating agent was used was calculated, and the film amount on gold | metal | money was evaluated from the value. The results are shown in Table 1.

Figure 2007262394
Figure 2007262394

実施例1〜12は、目視観察による外観不良がない上、表1に示すように比較例1に比べて吸光度が小さく(即ち金上の皮膜量が少なく)、金上への皮膜形成を抑制できることが分かった。特に、キシリトールの濃度を0.05〜4質量%とした実施例3〜10では、目視観察による外観が良好で、銅イオンを30mg/L添加した場合でも金上への皮膜形成を効果的に抑制することができた。   In Examples 1 to 12, there is no appearance defect by visual observation, and as shown in Table 1, the absorbance is smaller than that of Comparative Example 1 (that is, the amount of film on gold is small), and the film formation on gold is suppressed. I understood that I could do it. In particular, in Examples 3 to 10 in which the concentration of xylitol was 0.05 to 4% by mass, the appearance by visual observation was good, and even when copper ion was added at 30 mg / L, film formation on gold was effectively performed. I was able to suppress it.

実験2(表面処理剤中の銅イオンの濃度と皮膜量との関係)
まず、イオン交換水に0.3質量%の2−メチルベンゾイミダゾールと、4.5質量%の酢酸と、0.5質量%のD−ソルビトールとを添加し、更に表2に示す銅イオン濃度となるように酢酸銅を添加して実施例13〜20の表面処理剤を調製した。また、比較例として、D−ソルビトールを添加しないこと以外は、それぞれ実施例13〜20と同様に調製した比較例2〜9の表面処理剤を準備した。そして、実施例13〜20及び比較例2〜9のそれぞれについて、上記実験1と同様に被処理材を処理し、上記実験1と同様の方法で金上の皮膜量を評価した。結果を表2に示す。
Experiment 2 (Relationship between the concentration of copper ions in the surface treatment agent and the coating amount)
First, 0.3% by mass of 2-methylbenzimidazole, 4.5% by mass of acetic acid, and 0.5% by mass of D-sorbitol were added to ion-exchanged water, and the copper ion concentrations shown in Table 2 were further added. Copper acetate was added so that the surface treatment agents of Examples 13 to 20 were prepared. Moreover, the surface treating agent of Comparative Examples 2-9 prepared similarly to Examples 13-20, respectively, except not adding D-sorbitol as a comparative example was prepared. And about each of Examples 13-20 and Comparative Examples 2-9, the to-be-processed material was processed like the said experiment 1, and the film amount on gold | metal | money was evaluated by the method similar to the said experiment 1. The results are shown in Table 2.

Figure 2007262394
Figure 2007262394

表2に示すように、実施例13〜20は、それぞれ対応する比較例2〜9に比べて、銅イオン濃度が高くなっても金上の皮膜量が少なく、金上への皮膜形成を抑制できることが分かった。   As shown in Table 2, Examples 13 to 20 have a smaller amount of film on the gold even when the copper ion concentration is higher than those of the corresponding Comparative Examples 2 to 9, and suppress the film formation on the gold. I understood that I could do it.

以上の結果から、本発明の表面処理剤によれば、異種金属上への皮膜形成を抑制できることが分かる。また、イミダゾール化合物を変更して同様に金上の皮膜量を評価した表3や、糖アルコールを変更して同様に金上の皮膜量を評価した表4に示すように、本発明の表面処理剤では、イミダゾール化合物の種類や糖アルコールの種類によらず、上記効果を発揮させることができる。なお、表3では、いずれも酢酸銅を銅イオン濃度で30mg/L添加した場合について吸光度を測定し、糖アルコールを添加していない場合をブランク(吸光度:1)として皮膜量を評価した。また、表4では、0.1質量%の2−(5’−フェニル)ペンチルベンゾイミダゾールと、4.5質量%の酢酸とを使用した系について、糖アルコールの種類を変えて皮膜量を評価した。   From the above results, it can be seen that according to the surface treatment agent of the present invention, film formation on different metals can be suppressed. Further, as shown in Table 3 in which the amount of the film on gold was similarly evaluated by changing the imidazole compound and in Table 4 in which the amount of the film on gold was similarly evaluated by changing the sugar alcohol, the surface treatment of the present invention was performed. The agent can exert the above effect regardless of the type of imidazole compound or the type of sugar alcohol. In Table 3, the absorbance was measured when copper acetate was added at a concentration of 30 mg / L at a copper ion concentration, and the amount of film was evaluated using a blank (absorbance: 1) when no sugar alcohol was added. Moreover, in Table 4, about the type | system | group which uses 0.1 mass% 2- (5'-phenyl) pentyl benzimidazole and 4.5 mass% acetic acid, the kind of sugar alcohol was changed and the film amount was evaluated. did.

Figure 2007262394
Figure 2007262394

Figure 2007262394
Figure 2007262394

実験3(はんだ付け性向上効果の確認)
まず、イオン交換水に0.3質量%の2−(5’−フェニル)ペンチルベンゾイミダゾールと、4.5質量%の酢酸と、表5に示す糖アルコールとを添加して実施例35〜44の表面処理剤を調製した。また、比較例11として、糖アルコールを添加しないこと以外は実施例35〜44と同様に調製した表面処理剤を準備した。
Experiment 3 (Confirmation of solderability improvement effect)
First, 0.3% by mass of 2- (5′-phenyl) pentylbenzimidazole, 4.5% by mass of acetic acid, and a sugar alcohol shown in Table 5 were added to ion-exchanged water, and Examples 35 to 44 were performed. A surface treatment agent was prepared. Further, as Comparative Example 11, a surface treatment agent prepared in the same manner as in Examples 35 to 44 except that no sugar alcohol was added was prepared.

次に、ガラスエポキシ基材(日立化成工業製GEA-67N、厚み:1.6mm)の両面に厚さ18μmの銅箔が貼付された両面銅張積層板(7.8cm×4.8cm)を用意し、これに0.8mm径のスルーホールを160個形成して被処理材を作製した。続いて、この被処理材を、メックブライトCB−801(メック株式会社製マイクロエッチング剤)に浸漬して銅箔表面を1μmだけエッチングして水洗した後、実施例35〜44及び比較例11の表面処理剤のそれぞれに1枚ずつ60秒間浸漬し、水洗、乾燥を行った。なお、表面処理剤の温度は、いずれも30℃とした。次に、乾燥後の被処理材のそれぞれについて、リフロー処理を1〜4回行った。リフロー処理には熱風循環型リフロー炉を用い、1回のリフロー処理につき、被処理材の表面温度が240〜245℃となる温度で40秒間加熱した。続いて、スプレーにより被処理材をポストフラックス処理した。ポストフラックス剤としては、株式会社アサヒ化学研究所製AGF−880を用いた。その後、フロー処理を行った。フロー処理では、まず、プレヒート処理として被処理材の表面温度が100℃となる温度で80秒間加熱した後、はんだの温度が255℃となる条件でダブルウェーブ処理した。この際、使用したはんだは、質量比(Sn:Ag:Cu)が96.5:3:0.5であった。なお、本実験におけるダブルウェーブ処理では、被処理材とはんだとを2.5秒間接触させた後、2.5秒の間隔をあけて、再度被処理材とはんだとを3秒間接触させる処理を行った。そして、上記被処理材のそれぞれについてはんだ付け不良率を確認した。結果を表5に示す。表5のはんだ付け不良率は、160個のスルーホールのうち、はんだ付け不良が発生したスルーホールの割合とした。なお、本実験におけるはんだ付け不良とは、目視観察によって、はんだがスルーホール内に完全に充填されていないことが確認できる場合をいう。   Next, a double-sided copper-clad laminate (7.8 cm × 4.8 cm) in which a 18 μm thick copper foil was pasted on both sides of a glass epoxy substrate (GEA-67N, manufactured by Hitachi Chemical Co., Ltd., thickness: 1.6 mm). Prepared, 160 through-holes with a diameter of 0.8 mm were formed in this, and the to-be-processed material was produced. Then, after immersing this to-be-processed material in Meckbright CB-801 (micro etching agent by Meck Co., Ltd.), etching the copper foil surface only 1 micrometer, and washing with water, Examples 35-44 and Comparative Example 11 One sheet was immersed in each surface treatment agent for 60 seconds, washed with water and dried. The temperature of the surface treatment agent was 30 ° C. for all. Next, the reflow process was performed 1 to 4 times for each of the processed materials after drying. A hot air circulation type reflow furnace was used for the reflow treatment, and for each reflow treatment, the surface temperature of the material to be treated was heated at a temperature of 240 to 245 ° C. for 40 seconds. Subsequently, the material to be treated was post-flux treated by spraying. As a post-flux agent, AGF-880 manufactured by Asahi Chemical Research Co., Ltd. was used. Thereafter, flow processing was performed. In the flow treatment, first, as a preheating treatment, the surface temperature of the material to be treated was heated for 80 seconds at a temperature of 100 ° C., and then subjected to a double wave treatment under the condition of a solder temperature of 255 ° C. At this time, the used solder had a mass ratio (Sn: Ag: Cu) of 96.5: 3: 0.5. In the double wave treatment in this experiment, the treatment material and the solder are brought into contact with each other for 2.5 seconds, and then the treatment material and the solder are again brought into contact with each other for 3 seconds at an interval of 2.5 seconds. went. And the soldering defect rate was confirmed about each of the said to-be-processed material. The results are shown in Table 5. The soldering failure rate in Table 5 is the ratio of through holes where soldering failure occurred out of 160 through holes. In addition, the soldering defect in this experiment means the case where it can be confirmed by visual observation that the solder is not completely filled in the through hole.

Figure 2007262394
Figure 2007262394

表5に示すように、実施例35〜44では、比較例11に比べはんだ付け不良率を低減することができた。以上の結果から、本発明の表面処理剤によれば、耐熱性が高い皮膜を形成できることがわかる。   As shown in Table 5, in Examples 35 to 44, the soldering failure rate could be reduced as compared with Comparative Example 11. From the above results, it can be seen that the surface treatment agent of the present invention can form a film having high heat resistance.

実験4(はんだ濡れ性向上効果の確認)
まず、イオン交換水に0.3質量%の2−(5’−フェニル)ペンチルベンゾイミダゾールと、4.5質量%の酢酸と、表6に示す糖アルコールとを添加して実施例45〜54の表面処理剤を調製した。また、比較例12として、糖アルコールを添加しないこと以外は実施例45〜54と同様に調製した表面処理剤を準備した。
Experiment 4 (Confirmation of solder wettability improvement effect)
First, Examples 45-54 were prepared by adding 0.3% by mass of 2- (5′-phenyl) pentylbenzimidazole, 4.5% by mass of acetic acid, and the sugar alcohol shown in Table 6 to ion-exchanged water. A surface treatment agent was prepared. Further, as Comparative Example 12, a surface treatment agent prepared in the same manner as in Examples 45 to 54 except that no sugar alcohol was added was prepared.

次に、ガラスエポキシ基材(日立化成工業製GEA-67N、厚み:1.6mm)の片面に厚さ18μmの銅箔が貼付された片面銅張積層板を用意し、これに0.3mm×8mmの矩形状の導体パターンを40個形成して被処理材を作製した。続いて、この被処理材を、メックブライトCB−801(メック株式会社製マイクロエッチング剤)に浸漬して銅箔表面を1μmだけエッチングして水洗した後、実施例45〜54及び比較例12の表面処理剤のそれぞれに1枚ずつ60秒間浸漬し、水洗、乾燥を行った。なお、表面処理剤の温度は、いずれも30℃とした。その後、上記導体パターン上の中央部にソルダーペースト(ソルダーコート社製 TAS650 S10/011/M9.5)を印刷した。この際、印刷パターンは円形状とした。また、各々の印刷パターンは、直径が0.4mmで、厚みが100μmであった。印刷後、上記実験3と同様のリフロー炉を用いて被処理材の表面温度が225〜230℃となる温度で40秒間加熱した。そして、このリフロー処理によって拡がったはんだの領域(40箇所)について、それぞれ最も長い径の長さを顕微鏡で計測し、その平均値を算出した。結果を表6に示す。   Next, a single-sided copper-clad laminate in which a copper foil having a thickness of 18 μm was pasted on one side of a glass epoxy substrate (GEA-67N, manufactured by Hitachi Chemical Co., Ltd., thickness: 1.6 mm) was prepared. Forty pieces of 8 mm rectangular conductor patterns were formed to produce a material to be treated. Then, after immersing this to-be-processed material in Meckbright CB-801 (micro etching agent by MEC Co., Ltd.), etching the copper foil surface only 1 micrometer, and washing with water, Examples 45-54 and Comparative Example 12 One sheet was immersed in each surface treatment agent for 60 seconds, washed with water and dried. The temperature of the surface treatment agent was 30 ° C. for all. Thereafter, a solder paste (TAS650 S10 / 011 / M9.5 manufactured by Solder Coat Co., Ltd.) was printed on the central portion of the conductor pattern. At this time, the printing pattern was circular. Each printed pattern had a diameter of 0.4 mm and a thickness of 100 μm. After printing, using the same reflow furnace as in Experiment 3, the surface temperature of the material to be treated was heated for 40 seconds at a temperature of 225 to 230 ° C. And about the area | region (40 places) of the solder expanded by this reflow process, the length of the longest diameter was measured with the microscope, respectively, and the average value was computed. The results are shown in Table 6.

Figure 2007262394
Figure 2007262394

表6に示すように、比較例12に比べ、実施例45〜54のいずれの場合もはんだ濡れ性が向上した。   As shown in Table 6, the solder wettability was improved in any of Examples 45 to 54 as compared with Comparative Example 12.

本発明の表面処理剤は、水溶性プリフラックス、防錆処理剤等に有用である。   The surface treatment agent of the present invention is useful for a water-soluble preflux, a rust prevention treatment agent, and the like.

Claims (3)

銅又は銅合金の表面処理剤であって、
イミダゾール化合物と糖アルコールとを含むことを特徴とする表面処理剤。
A surface treatment agent for copper or copper alloy,
A surface treatment agent comprising an imidazole compound and a sugar alcohol.
前記糖アルコールが0.01〜7質量%の範囲で含まれている請求項1に記載の表面処理剤。   The surface treatment agent according to claim 1, wherein the sugar alcohol is contained in a range of 0.01 to 7 mass%. 前記糖アルコールは、マンニトール、ソルビトール及びキシリトールから選ばれる少なくとも1つである請求項1又は2に記載の表面処理剤。   The surface treatment agent according to claim 1 or 2, wherein the sugar alcohol is at least one selected from mannitol, sorbitol, and xylitol.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0681161A (en) * 1992-08-31 1994-03-22 Hitachi Ltd Surface treating agent for copper and copper alloy
JPH09291372A (en) * 1996-02-26 1997-11-11 Shikoku Chem Corp Surface treating agent of copper and copper alloy
JPH09316649A (en) * 1996-05-27 1997-12-09 Matsushita Electric Ind Co Ltd Electroless plating solution
JP2005208329A (en) * 2004-01-22 2005-08-04 Parker Corp Resist developing solution and method for manufacturing semiconductor device using the resist developing solution
JP2006011297A (en) * 2004-06-29 2006-01-12 Kanto Chem Co Inc Removing composition for photoresist residue and polymer residue

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0681161A (en) * 1992-08-31 1994-03-22 Hitachi Ltd Surface treating agent for copper and copper alloy
JPH09291372A (en) * 1996-02-26 1997-11-11 Shikoku Chem Corp Surface treating agent of copper and copper alloy
JPH09316649A (en) * 1996-05-27 1997-12-09 Matsushita Electric Ind Co Ltd Electroless plating solution
JP2005208329A (en) * 2004-01-22 2005-08-04 Parker Corp Resist developing solution and method for manufacturing semiconductor device using the resist developing solution
JP2006011297A (en) * 2004-06-29 2006-01-12 Kanto Chem Co Inc Removing composition for photoresist residue and polymer residue

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