JP2007260600A - Application apparatus and application method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an application apparatus and an application method by which a coating solution is applied onto a substrate while preventing oxidation of the coating solution. <P>SOLUTION: A 1st box is provided by surrounding a stage and partitions a space where a nozzle moving mechanism is arranged and a space where the stage is arranged and an opening where at least a part of a nozzle protrudes and reciprocates is formed in an upper face thereof. A 2nd box is provided by surrounding the nozzle moving mechanism. A 1st feed port feeds predetermined gas into the internal space of the 1st box. A 1st exhaust port discharges the gas in the internal space of the 1st box to the outside. A 2nd exhaust port discharges the gas in the internal space of the 2nd box to the outside. The gas fed from the 1st feed port is discharged from the 1st exhaust port and the 2nd exhaust port till oxygen concentration in a predetermined space in the 1st box reaches a predetermined value. When the oxygen concentration in the predetermined space reaches the predetermined value, the gas fed from the 1st feed port is discharged from the 2nd exhaust port. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a coating apparatus and a coating method, and more particularly to a coating apparatus and a coating method for coating a substrate placed on a stage by discharging a coating liquid such as an organic EL material from a nozzle.

  2. Description of the Related Art Conventionally, various coating apparatuses that apply a coating liquid to a target object such as a substrate have been developed. For example, in an apparatus for manufacturing an organic EL (Electro Luminescence) display device, coating is performed by applying a hole transport material or an organic EL material in a predetermined pattern shape to the main surface of a substrate such as a glass substrate placed on a stage. A device is used. In this coating apparatus, a coating liquid (organic EL material or hole transport material) is discharged from a nozzle at a predetermined pressure. Specifically, after the coating liquid is stored in a supply source such as a tank provided in the coating apparatus, the coating liquid supplied from the supply source is increased in pressure by a pump, and foreign matter is removed by a filter provided in the pipe , Discharged from the nozzle.

In general, it is known that the quality of organic EL materials deteriorates when oxidized. Therefore, when the organic EL material is applied to the substrate, oxidation of the organic EL material must be prevented. In order to prevent such quality deterioration of the organic EL material, a technique of manufacturing while controlling the oxygen concentration is disclosed (for example, see Patent Document 1). The manufacturing apparatus disclosed in Patent Document 1 is manufactured by arranging a coating apparatus, a drying apparatus, a thermosetting apparatus, a substrate laminating apparatus, and the like in a chamber and setting the inside of the chamber to a nitrogen atmosphere.
JP 2004-164873 A

  However, in the manufacturing apparatus disclosed in Patent Document 1, a plurality of apparatuses are installed in one chamber, so that the volume in the chamber increases. In other words, a huge amount of nitrogen must be supplied in order to create a nitrogen atmosphere in the chamber. Further, in order to supply nitrogen to the chamber and maintain a desired oxygen concentration, it is necessary to provide a large number of intake / exhaust pumps and gates, which complicates the apparatus itself. Therefore, there is a problem that manufacturing costs and device costs increase. In addition, when a large space is made into a nitrogen atmosphere, a human being enters the space to create a risk factor such as suffocation, which causes a safety problem.

  Therefore, an object of the present invention is to provide a coating apparatus and a coating method for coating a substrate while preventing oxidation of the coating solution.

In order to achieve the above object, the present invention has the following features.
1st invention is the coating device which apply | coats a coating liquid on a board | substrate. The coating apparatus includes a nozzle, a stage, a nozzle moving mechanism, a first box, a second box, a first supply port, a first exhaust port, and a second exhaust port. The nozzle discharges the coating liquid from its tip. The stage places the substrate on its upper surface. The nozzle moving mechanism reciprocates the nozzle in a direction crossing the stage surface in the space on the stage. The first box is provided so as to surround the stage, partitions the space in which the nozzle moving mechanism is disposed from the space in which the stage is disposed, and reciprocates with at least a part of the nozzle projecting from the nozzle moving mechanism side on the upper surface. A moving opening is formed. The second box surrounds the nozzle moving mechanism and is provided at the top of the first box. The first supply port is provided in the first box and supplies a predetermined gas to the internal space of the first box. The first exhaust port is provided in the first box, and discharges the gas in the internal space of the first box to the outside. The second exhaust port is provided in the second box and discharges the gas in the internal space of the second box to the outside. The gas supplied from the first supply port is discharged from the first and second exhaust ports until the predetermined space in the first box reaches a predetermined oxygen concentration. When the predetermined space reaches a predetermined oxygen concentration, the gas supplied from the first supply port is discharged from the second exhaust port.

  According to a second invention, in the first invention, an oxygen concentration detection means, a first valve, and a control means are further provided. The oxygen concentration detection means detects the oxygen concentration in a predetermined space in the first box. The first valve is provided at the first exhaust port. The control means opens the first valve when the oxygen concentration detected by the oxygen concentration detection means does not reach the predetermined oxygen concentration, and when the oxygen concentration detected by the oxygen concentration detection means reaches the predetermined oxygen concentration Close the first valve.

  According to a third invention, in the first invention, a control means is further provided. When the predetermined space reaches a predetermined oxygen concentration, the control means starts the reciprocating movement of the nozzle by the nozzle moving mechanism and performs the coating process on the substrate.

  In a fourth aspect based on the first aspect, the predetermined space is a space on the stage in the first box.

  According to a fifth invention, in the fourth invention, a relative movement mechanism is further provided. The relative movement mechanism relatively moves at least one of the nozzle and the stage in a direction parallel to the placement surface of the stage. In the first box, the predetermined space is a space where the nozzle discharges the coating liquid and a space on the stage where the coating portion of the substrate coated with the coating liquid is relatively moved in accordance with the relative movement of the stage by the relative movement mechanism. is there.

  In a sixth aspect based on the fifth aspect, the apparatus further includes a second supply port. The second supply port is fixed in the first box, supplies a predetermined gas to the predetermined space, and forms a flow of the gas in a direction toward the opening through the predetermined space.

  In a seventh aspect based on the fifth aspect, the first box is provided so as to surround a space in which the stage moves relative to the substrate. The coating device further includes a third exhaust port. The third exhaust port is provided at the bottom of the first box, and the stage is provided at a position behind the relative movement, and discharges the gas in the internal space of the first box to the outside.

  In an eighth aspect based on the first aspect, a plurality of first supply ports and a plurality of first exhaust ports are provided for the first box.

  In a ninth aspect of the invention, coating is performed on a substrate placed on the upper surface of the stage by applying a coating liquid discharged from a nozzle that is reciprocated while the space on the stage is supported by a nozzle moving mechanism in a direction crossing the stage surface. Is the method. A predetermined gas is supplied from one side of the predetermined space until the predetermined space reaches a predetermined oxygen concentration, and gas is supplied from the other side of the predetermined space and the upper part of the stage through the space where the nozzle and the nozzle moving mechanism are arranged. Discharge. When the predetermined space reaches a predetermined oxygen concentration, a predetermined gas is supplied from one side of the predetermined space, and the coating liquid is applied to the substrate in a state where the gas is discharged from the upper part of the stage through the space where the nozzle and the nozzle moving mechanism are arranged. Apply.

  In a tenth aspect based on the ninth aspect, the predetermined space is included in a space in the chamber. The chamber has an opening for the nozzle to protrude from the outside of the chamber into a predetermined space. A predetermined gas is supplied from one side of the chamber until the predetermined space reaches a predetermined oxygen concentration, and the gas in the chamber is discharged from the other side of the chamber and the opening. When the predetermined space reaches a predetermined oxygen concentration, a predetermined gas is supplied from one side of the chamber, and the coating liquid is applied to the substrate in a state where the gas in the chamber is discharged from the opening.

  According to the first aspect, by supplying a predetermined gas locally and applying the coating liquid in an atmosphere having a predetermined oxygen concentration, it is possible to prevent the coating liquid from being oxidized in the coating process. And since the limited space is replaced with a predetermined oxygen concentration atmosphere, it is possible to suppress consumption of gas supplied for the replacement. In addition, the connection mode excellent in the effect of shortening the arrival time until the oxygen concentration reaches the predetermined oxygen concentration after loading the substrate, and the effect of stabilizing the oxygen concentration during the coating process after reaching the predetermined oxygen concentration By switching between excellent connection modes, both effects can be achieved.

  According to the second aspect, the oxygen concentration in the coating process can be automatically detected, and the flow path can be switched at an appropriate timing.

  According to the third aspect, even when the reciprocating movement of the nozzle is started and the gas in the second box is stirred, the gas flow flowing from the first box to the opening → the second box is formed. The gas in the second box rarely flows out into the first box, and the gas does not flow in the direction from the opening to the predetermined space. Therefore, even if oxygen remains in the second box, it is possible to prevent oxygen from flowing out into the predetermined space, and it is possible to prevent the oxygen concentration during the coating processing time from increasing.

  According to the fourth and fifth aspects of the invention, the oxygen concentration in the space where the coating liquid is discharged and the space where the coating liquid is applied and the substrate is placed is managed. Can be prevented from being oxidized.

  According to the sixth aspect, since the predetermined gas is directly supplied to the predetermined space, it is possible to further prevent the oxygen concentration from increasing during the coating process. For example, even when the gas in the second box flows out from the opening portion to the first box, the gas flow from the predetermined space toward the opening portion is formed, so that the gas from the second box is the predetermined amount in the first box. It flows in the direction opposite to the space, that is, the direction in which the substrate before application is placed. Therefore, even if oxygen remains in the second box, it is possible to prevent oxygen from flowing out into the predetermined space, and it is possible to prevent the oxygen concentration from increasing during the coating processing time.

  According to the seventh aspect, since the flow in which the gas in the first box is discharged from the third exhaust port provided at the bottom of the first box is formed, it falls into the first box. Dust and the like can be discharged out of the first box, and an effect as a dust countermeasure in the first box can be expected.

  According to the eighth aspect, since the predetermined gas is supplied to the predetermined space from a plurality of locations, the gas supply into the predetermined space does not concentrate on a part. Further, since the gas in the predetermined space is discharged from a plurality of locations, the gas discharge from the predetermined space does not concentrate on a part. Therefore, the predetermined gas to be supplied can be spread evenly throughout the predetermined space.

  Moreover, according to the coating method of the present invention, the same effects as those of the coating apparatus described above can be obtained.

  Before describing specific embodiments of the present invention, an outline of a coating apparatus according to the present invention will be described with reference to the drawings. In order to make the description more specific, the following description will be given using an example in which the coating apparatus is applied to a coating apparatus that manufactures an organic EL display device that uses an organic EL material, a hole transport material, or the like as a coating liquid. . The said coating apparatus manufactures an organic EL display apparatus by apply | coating organic EL material, a hole transport material, etc. on the glass substrate mounted on the stage in a predetermined pattern shape. FIG. 1 is a plan view and a front view illustrating a schematic configuration of a main part of the coating apparatus 1. Note that the coating apparatus 1 uses a plurality of coating liquids such as an organic EL material and a hole transport material as described above, and the organic EL material will be described as a coating liquid as a representative thereof.

  In FIG. 1, the coating device 1 generally includes a substrate mounting device 2 and an organic EL coating mechanism 5. The organic EL coating mechanism 5 includes a nozzle moving mechanism 51, a nozzle unit 50, and liquid receivers 53L and 53R. The nozzle moving mechanism 51 has a guide member 511 extending in the X-axis direction in the figure, and moves the nozzle unit 50 in the X-axis direction in the figure along the guide member 511. The nozzle unit 50 holds the nozzles 52a to 52c that discharge one of the organic EL materials of red, green, and blue in a state of being arranged in parallel. To each of the nozzles 52a to 52c, an organic EL material of any one color of red, green, and blue is supplied from a supply unit (see FIG. 2). As described above, the organic EL material of the same color is typically ejected from the three nozzles 52a to 52c. However, for the sake of specific explanation, the red organic EL material is ejected from the three nozzles 52a to 52c. A discharged example is used. In addition, although the circumference | surroundings and the inside of the coating device 1 are partitioned off with the 1st-3rd boxes 61-63 etc., the detail is mentioned later.

  The substrate mounting apparatus 2 includes a stage 21, a turning unit 22, a parallel movement table 23, a guide receiving unit 24, and a guide member 25. The stage 21 places a substrate P such as a glass substrate to be coated on the upper surface of the stage. The lower part of the stage 21 is supported by the turning unit 22, and the stage 21 is configured to be rotatable in the θ direction shown in the figure by the turning operation of the turning unit 22. Further, inside the stage 21, a heating mechanism for preheating the substrate P coated with the organic EL material on the stage surface, a suction mechanism for the substrate P, and a delivery pin mechanism are provided.

  A guide member 25 is extended and fixed in the illustrated Y-axis direction perpendicular to the X-axis direction so as to pass under the organic EL coating mechanism 5. On the lower surface of the parallel movement table 23, a guide receiving portion 24 that is in contact with the guide member 25 and slides on the guide member 25 is fixed. In addition, the swivel unit 22 is fixed on the upper surface of the translation table 23. Accordingly, the parallel movement table 23 can be moved in the Y-axis direction along the guide member 25 by receiving a driving force from, for example, a linear motor (not shown), and the stage 21 supported by the turning unit 22 can be moved. Movement is also possible.

  When the substrate P is placed and sucked on the stage 21 via the delivery pin mechanism and sucked, and the parallel movement table 23 moves to the lower side of the organic EL coating mechanism 5, the substrate P nozzles the coating of the red organic EL material. This is the position received from 52a to 52c. Then, the control unit (see FIG. 2) controls the nozzle moving mechanism unit 51 to reciprocate the nozzle unit 50 in the X-axis direction, and moves the stage 21 by a predetermined pitch in the Y-axis direction for each linear movement. The parallel movement table 23 is controlled to discharge the organic EL material at a predetermined flow rate from the nozzles 52a to 52c. Further, at the discharge positions in the X-axis direction of the nozzles 52a to 52c, in both side spaces deviating from the substrate P placed on the stage 21, a liquid receiving portion 53L that receives the organic EL material discharged and discharged from the substrate P, and 53R is respectively fixed. The nozzle moving mechanism 51 is arranged so as to cross the substrate P from the upper space of the liquid receiver 53 disposed outside one side of the substrate P and be disposed outside the other side of the substrate P. The nozzle unit 50 is reciprocated to the upper space. The translation table 23 moves the stage 21 by a predetermined pitch in a predetermined direction (Y-axis direction in the drawing) perpendicular to the nozzle reciprocating direction when the nozzle unit 50 is disposed in the upper space of the liquid receiving portion 53. Let Simultaneously with the operation of the nozzle moving mechanism 51 and the parallel moving table 23, the organic EL material is ejected from the nozzles 52a to 52c in a liquid column state, whereby the red organic EL material is formed in a stripe shape formed on the substrate P. A so-called stripe arrangement arranged for each groove is formed on the substrate P.

  Next, with reference to FIG. 2, the schematic configuration of the control function and the supply unit in the coating apparatus 1 will be described. FIG. 2 is a block diagram illustrating the control function and the supply unit of the coating apparatus 1.

  In FIG. 2, the coating apparatus 1 is provided with the control part 3, the 1st supply part 54a, the 2nd supply part 54b, and the 3rd supply part 54c other than the structure part mentioned above. The first to third supply parts 54a to 54c supply the red organic EL material to the nozzles 52a to 52c, respectively, via pipes. Note that pipes made of PE (polyethylene), PP (polypropylene), Teflon (registered trademark), or the like are used for the respective pipes from the supply sources 541a to 541c to the nozzles 52a to 52c.

  The first supply unit 54a includes an organic EL material supply source 541a, a pump 542a for taking out the organic EL material from the supply source 541a, and a flow meter 543a for detecting the flow rate of the organic EL material. The second supply unit 54b includes an organic EL material supply source 541b, a pump 542b for taking out the organic EL material from the supply source 541b, and a flow meter 543b for detecting the flow rate of the organic EL material. The third supply unit 54c includes an organic EL material supply source 541c, a pump 542c for taking out the organic EL material from the supply source 541c, and a flow meter 543c for detecting the flow rate of the organic EL material. And the control part 3 controls each operation | movement of the 1st-3rd supply parts 54a-54c, the turning part 22, the parallel movement table 23, and the nozzle movement mechanism part 51. FIG.

  The nozzle 52a has a filter part 521a for removing foreign substances in the organic EL material supplied from the supply part 54a. The nozzle 52b has a filter part 521b for removing foreign substances in the organic EL material supplied from the supply part 54b. The nozzle 52c has a filter unit 521c for removing foreign substances in the organic EL material supplied from the supply unit 54c. In addition, since the nozzles 52a to 52c have the same structure, the reference numeral “52” is used for the description in the generic description.

  Here, on the surface of the substrate P to which the red organic EL material is applied, a plurality of stripe-shaped grooves corresponding to a predetermined pattern shape to which the organic EL material is to be applied are formed in parallel. . As the organic EL material, for example, an organic EL material having a viscosity enough to flow in a groove on the substrate P is used, and specifically, a polymer type organic EL material for each color is used. It is done. The nozzle unit 50 is rotatably supported around a predetermined support shaft, and can be adjusted around the support shaft by the control of the control unit 3 to adjust the coating pitch interval.

  Based on the position and direction of the substrate P placed on the stage 21, the control unit 3 adjusts the angle of the swivel unit 22 so that the direction of the groove formed in the substrate P becomes the X-axis direction, and the coating is performed. , That is, a coating start position at which coating is started at one end side of the groove formed in the substrate P is calculated. The application start position is an upper space of one liquid receiving portion 53. Then, the control unit 3 drives the parallel movement table 23 and the nozzle movement mechanism unit 51 as described above.

  At the application start position, the control unit 3 instructs the pumps 542a to 542c to start discharging the organic EL material from the nozzles 52a to 52c. At this time, according to the moving speed of the nozzles 52a to 52c, the control unit 3 makes the coating amount of the organic EL material uniform at each point of the striped groove and discharges the organic EL material in a liquid column state. The application amount is controlled, and flow rate information from the flow meters 543a to 543c is fed back and controlled. Then, the control unit 3 moves the nozzle unit 50 into the guide member 511 so that the organic EL material flows along the groove on the substrate P in order to flow the organic EL material into the groove on the substrate P. It is controlled to move along. By this operation, the red organic EL material discharged from the nozzles 52a to 52c in the liquid column state is poured into the respective grooves at the same time.

  When the control unit 3 is positioned on the other liquid receiving unit 53 fixed on the outside of the other end of the groove across the substrate P, the control unit 3 moves the organic EL material from the nozzles 52a to 52c. While the discharge is continued, the movement of the nozzle unit 50 by the nozzle movement mechanism 51 is stopped. By this one movement, the application of the organic EL material to the grooves for three rows is completed. Specifically, since the organic EL material of the same color is ejected from each of the nozzles 52a to 52c, the organic EL material is applied to a total of three rows of grooves, where one row of grooves is applied every three rows. .

  Next, the control unit 3 pitches the parallel movement table 23 by a predetermined distance (for example, 9 rows of grooves) in the positive direction of the Y axis, and can apply the organic EL material to the grooves to be applied next. Like that. When the control unit 3 moves the nozzle unit 50 from the upper space of the other liquid receiving unit 53 across the substrate P in the opposite direction and is positioned on the one liquid receiving unit 53, the organic material from the nozzles 52a to 52c. While the discharge of the EL material is continued, the movement of the nozzle unit 50 by the nozzle moving mechanism 51 is stopped. By this second movement, the application of the organic EL material to the next three rows of grooves is completed. By repeating such an operation, the red organic EL material is poured into the groove for applying red.

  Hereinafter, the local atmosphere generation mechanism installed in the coating apparatus 1 will be described with reference to FIGS. FIG. 3 is a plan view showing a schematic configuration of a local atmosphere generating mechanism provided in the coating apparatus 1. FIG. 4 is a side sectional view showing a schematic configuration of a local atmosphere generating mechanism provided in the coating apparatus 1. FIG. 5 is a perspective view showing an appearance of the third box 63. FIG. 6 is a cross-sectional view showing the structure of the nitrogen inlet. FIG. 7 is a perspective view showing the structure of the diffusion plate 731. FIG. 8 is a graph for explaining the oxygen concentration management value at point C. FIG. 9 is a block diagram showing a flow of nitrogen supply in the local atmosphere generation mechanism.

  3 to 5, the coating apparatus 1 is installed by being shielded from the outside by a first box 61, a second box 62, and a third box 63. The first box 61 is provided so as to surround and shield the space (hereinafter referred to as a chamber space) in which the substrate platform 2 reciprocates in the Y-axis direction in the figure. The first box 61 is installed so as to partition the chamber space and the space where the organic EL coating mechanism 5 is installed, except for the opening S1 for the nozzle 52 to project back and forth into the chamber space. The The third box 63 includes a space in which the organic EL coating mechanism 5 is installed, and is provided so as to surround a space (hereinafter referred to as a slider space) in which the nozzle unit 50 and the like reciprocate in the X-axis direction in the drawing. The third box 63 also has an opening S1 for the nozzle 52 to project back and forth from the slider space to the chamber space (see FIG. 5). Further, on the upper surface of the third box 63, there is an opening S2 through which piping (not shown) for supplying the organic EL material from the first to third supply parts 54a to 54c to the nozzles 52a to 52c, respectively. It is formed. When the nozzle unit 50 is provided with a static pressure bearing, a pipe for supplying gas to the static pressure bearing is also connected through the opening S2. The second box 62 is provided so as to surround the upper space of the first box 61. Inside the second box 62, the organic EL coating mechanism 5 and the third box 63 are installed, and the second box 62 also has an opening S1 for the nozzle 52 to project from the slider space to the chamber space and reciprocate. Has been. Of the space surrounded by the second box 62, the space excluding the slider space is referred to as a box space. Thus, the coating apparatus 1 is partitioned and installed in the chamber space, the slider space, and the box space by the first to third boxes 61 to 63, respectively. The first to third boxes 61 to 63 are all formed with an upper surface, but in FIG. 3, the upper surface and the lower surface are omitted for easy understanding of the relationship with the inside, and the side walls are in the hatched or intersecting region. Only shows.

  In the first to third boxes 61 to 63, a supply pipe 71 for supplying an inert gas such as nitrogen (hereinafter simply referred to as nitrogen) to the internal space, and a gas in the internal space are discharged. The exhaust pipe 72 is connected. In the example of FIG. 4, the supply pipe 71 is connected to the wall surface on the Y axis negative direction side of the first box 61 (hereinafter, the wall surface on the Y axis negative direction side is the front surface) and the front surface of the third box 63. In the example of FIG. 4, the plurality of supply pipes 71 a to 71 c are connected to the wall surface of the first box 61, and the supply pipe 71 d is connected to the wall surface of the third box 63. In FIG. 3, the supply pipe 71d is omitted.

  Further, the exhaust pipe 72 is provided on the wall surface on the Y axis positive direction side of the first box 61 (hereinafter, the wall surface on the Y axis positive direction side is referred to as the back surface), the back surface of the second box 62, and the back surface of the third box 63. It is connected. In the example of FIG. 4, the plurality of exhaust pipes 72 a and 72 b are connected to the wall surface of the first box 61, the exhaust pipe 72 d is connected to the wall surface of the second box 62, and the exhaust pipe 72 c is connected to the wall surface of the third box 63. Has been. In FIG. 3, the exhaust pipe 72c is omitted.

  When the supply pipe 71 and the exhaust pipe 72 are connected as shown in FIG. 4, the nitrogen supplied from the supply pipes 71a to 71c is supplied to the chamber space and flows out from the exhaust pipes 72a and 72b on the back surface thereof. Further, the nitrogen supplied from the supply pipes 71a to 71c flows into the slider space through the opening S1, and merges with the nitrogen supplied from the supply pipe 71d. The combined nitrogen flows out from the exhaust pipe 72c on the back surface of the slider space, or flows out from the exhaust pipe 72d after flowing into the box space through the opening S2.

  Further, the first box 61 is provided with a loading port 611 for carrying in and carrying out the substrate P. The insertion port 611 can be opened and closed by a gate that rotates around the rotation axis (in the direction of the arrow in the drawing). The substrate P is loaded into the chamber space by the transfer robot (not shown) and placed on the stage 21 with the input port 611 open. Further, when a coating process is performed by the coating apparatus 1, the gate is closed to shield the chamber space from the outside.

  A diffusion unit 73 is provided in the vicinity of connecting the first box 61 and the supply pipes 71a and 71b and in the vicinity of connecting the third box 63 and the supply pipe 71d. Specifically, the diffusing section 73 is provided on the internal space side near the entrance that flows into the internal space from the supply pipes 71a, 71b, and 71d. As shown in FIGS. 6 and 7, the diffusing portion 73 includes a diffusing plate 731 and a punching metal 732. The diffusion plate 731 is a plate-like member fixed at a position that prevents nitrogen flowing into the internal space from the supply pipes 71a, 71b, and 71d, and a predetermined gap is formed around the plate-like member. Nitrogen flowing into the internal space from the supply pipes 71a, 71b, and 71d is blocked by the diffusion plate 731 and flows directly in the internal space without changing the flow direction around the diffusion plate 731. . The punching metal 732 is a plate-like member in which a large number of holes are punched and fixed to the inner space side with respect to the diffusion plate 731. Further, the punching metal 732 is disposed on the flow path of nitrogen flowing from the periphery of the diffusion plate 731. That is, nitrogen supplied from the supply pipes 71a, 71b, and 71d always flows into the internal space through the hole formed in the punching metal 732. Therefore, in the diffusing section 73, nitrogen supplied from the supply pipes 71a, 71b, and 71d can be diffused and supplied into the first to third boxes 61 to 63.

  Further, a supply pipe 71c is connected in the vicinity of the inlet 611. Generally, in the vicinity of the input port 611, outside air is likely to enter due to opening and closing during loading / unloading of the substrate P, and the oxygen concentration tends to be high. Can diffuse. Note that the flow path is bent near the entrance flowing into the internal space from the supply pipe 71c, and no diffusion portion is provided near the entrance.

  A punching metal 733 is provided at a connection portion between the exhaust pipe 72 and the first to third boxes 61 to 63. The punching metal 733 is fixed on the inner space side of the exhaust pipe 72 and is disposed on a gas flow path that flows toward the exhaust pipe 72. That is, the gas discharged to the exhaust pipe 72 is always discharged through the hole formed in the punching metal 733. Thus, by arranging the punching metal 733 in the vicinity of the discharge port, it is possible to prevent the location where the gas is discharged from being concentrated, and the gas in the entire internal space can be discharged without variation.

  By discharging nitrogen in the first to third boxes 61 to 63 from the exhaust pipe 72 while supplying nitrogen from the supply pipe 71 into the first to third boxes 61 to 63, the first to third boxes 61 to 61 are discharged. 63 The inside becomes a nitrogen atmosphere, and the oxygen concentration inside decreases. Thereby, the coating apparatus 1 can prevent oxidation when the organic EL material is applied to the substrate P. Here, in order to prevent oxidation of the organic EL material, the oxygen concentration in the chamber space may be reduced. However, the organic EL material is discharged from the nozzle 52 in the space where the oxygen concentration is to be reduced most. This is a space (point C shown in FIG. 4) in which the space and the coated substrate P surface are sequentially sent to the Y axis positive direction. For example, when the upper limit of the oxygen concentration when applying the organic EL material to the substrate P is an oxygen concentration management value (for example, 10 ppm), at least the oxygen concentration at the point C must satisfy the oxygen concentration management value. In the first box 61, an oxygen concentration detector 88 for detecting the oxygen concentration at the point C is provided. The oxygen concentration detection unit 88 displays the detection result of the oxygen concentration at the point C on a display device (not shown) to notify the user of the coating device, or reports the detection result to a control unit (for example, the control unit 3 (FIG. 2))).

  In order to perform the coating process in a state where the oxygen concentration at the point C satisfies the oxygen concentration management value, the coating process must be started after the oxygen concentration at the point C is lowered to the oxygen concentration management value or less. Therefore, the coating apparatus 1 is efficiently operated by shortening the time (the “arrival time” shown in FIG. 8) from when the substrate P is carried in until the oxygen concentration at the point C decreases below the oxygen concentration control value. be able to. Further, during the coating process, it is necessary to prevent the oxygen concentration at the point C from exceeding the oxygen concentration control value (“coating process time” shown in FIG. 8), so that the nitrogen from the supply pipe 71 is also applied during the coating process. Gas supply and exhaust from the exhaust pipe 72 is continued. Here, as the nozzle unit 50 and the nozzle 52 reciprocate in the X-axis direction, the gas in the slider space and the gas in the vicinity of the opening S1 are agitated. Therefore, for example, when oxygen remains in the slider space, the oxygen may flow out to the point C by stirring and increase the oxygen concentration at the point C. That is, in managing the oxygen concentration at the point C, it is necessary to consider the fluid balance before and during the coating process. In the embodiments described later, the inside of the slider space or the box space is also replaced with a low oxygen atmosphere, or the gas flowing out from the slider space is prevented from flowing to the point C side, so that The increase in oxygen concentration at point C is prevented.

  In order to stabilize the oxygen concentration at the point C, the pressure in the first to third boxes 61 to 63 is also important. For example, when the first to third boxes 61 to 63 are not completely sealed with respect to the outside, the pressure in the first to third boxes 61 to 63 is maintained below atmospheric pressure (that is, lower than the outside). And external gas flows into the first to third boxes 61 to 63. Therefore, in this embodiment, the fluid balance before and during the coating process is maintained so that the pressure in the first to third boxes 61 to 63 can be maintained at atmospheric pressure or higher (that is, the same or higher pressure as the outside). Adjusted. As a result, even if the first to third boxes 61 to 63 are not completely sealed with respect to the outside, the oxygen concentration at the point C can be managed. As described above, the local atmosphere can be managed in the first to third boxes 61 to 63, and the reduced internal oxygen concentration can be particularly managed.

  In FIG. 9, the local atmosphere generation mechanism includes a nitrogen cylinder 81, a filter 83, a pressure adjustment unit 84, a supply side flow rate adjustment unit 85, an exhaust side flow rate adjustment unit 86, and a suction unit 87 in addition to the above-described components. Are connected to each other by piping or the like. Here, the nitrogen cylinder 81, the filter 83, the pressure adjustment unit 84, and the flow rate adjustment unit 85 correspond to a supply system for supplying nitrogen from the supply pipe 71. On the other hand, the flow rate adjusting unit 86 and the suction unit 87 correspond to an exhaust system for discharging gas from the exhaust pipe 72. These mechanisms may be incorporated in the coating apparatus 1 or provided as an external device of the coating apparatus 1. When provided as an external device of the coating device 1, facilities (for example, a nitrogen supply device or a suction device in a factory) provided in advance at the installation location may be used.

  The nitrogen cylinder 81 stores liquid nitrogen or the like therein. Nitrogen is extracted from the nitrogen cylinder 81 in a gaseous state, supplied as factory utility, and flows to the filter 83. The filter 83 removes foreign matter in the flowing nitrogen and sends it to the pressure adjusting unit 84 and the flow rate adjusting unit 85. Then, the nitrogen pressure supplied to the coating apparatus 1 is adjusted by the pressure adjusting unit 84 and the nitrogen flow rate supplied to the coating apparatus 1 is adjusted by the flow rate adjusting unit 85, and then nitrogen is supplied to the supply pipe 71. On the other hand, the suction part 87 sucks gas from the exhaust pipe 72 and discharges the gas in the first to third boxes 61 to 63 to the outside. Then, the flow rate adjusting unit 86 adjusts the flow rate of sucking gas from the exhaust pipe 72 and discharging it to the outside. The user can adjust the fluid balance with respect to the coating apparatus 1 described above by adjusting the restriction, the set value, and the like of the flow paths provided in the pressure adjustment unit 84, the flow rate adjustment unit 85, and the flow rate adjustment unit 86. .

(First embodiment)
Hereinafter, with reference to FIG. 10 and FIG. 11, the coating apparatus 1 which concerns on the 1st Embodiment of this invention is demonstrated. In the first embodiment, during the coating process, a gas flow from the chamber space to the slider space (box space) through the opening S1 is positively formed to stabilize the oxygen concentration at the point C. is there. FIG. 10 is a schematic diagram showing a nitrogen flow flow in the coating apparatus 1 according to the first embodiment. FIG. 11 is a flowchart showing an operation when the coating apparatus 1 performs the coating process. In FIG. 10, for simplicity of explanation, only the first to third boxes 61 to 63, the chamber space, the box space, and the chamber space are simplified for the coating apparatus 1.

  In FIG. 10, a plurality of supply pipes 71 are connected to the front surface of the first box 61, and nitrogen is supplied to the chamber space via the plurality of supply pipes 71 (shown as arrows Ci × n; supply Ci × n). . Each supply pipe 71 connected to the first box 61 is provided with a valve Vci (referred to as valve Vci × n). For example, the supply Ci × n corresponds to the supply pipes 71a to 71c shown in FIG. Specifically, a total of six supply pipes 71 including three supply pipes 71 a connected in parallel in the horizontal direction and three supply pipes 71 b connected in parallel in the horizontal direction are the first box 61. Connected to the front of the. These supply pipes 71 are connected by a connection method similar to the structure described with reference to FIG. Note that the supply pipe 71c may be added to the six supply pipes 71 and connected to the front surface of the first box 61. Further, a supply pipe 71 provided with a valve Vsi is connected to the front surface of the third box 63, and nitrogen is supplied to the slider space via the supply pipe 71 (arrow Si in the figure; referred to as supply Si). For example, the supply Si corresponds to the supply pipe 71d shown in FIG.

  A plurality of exhaust pipes 72 are connected to the back surface of the first box 61, and the gas in the chamber space is exhausted through the plurality of exhaust pipes 72 (shown as arrows Co × n; exhausted Co × n). Each exhaust pipe 72 is provided with a valve Vco (referred to as valve Vco × n). For example, the exhaust Co × n corresponds to the exhaust pipes 72a and 72b shown in FIG. For example, a total of six exhaust pipes 72 are connected to the back surface of the first box 61 in the same manner as the supply pipes 71 connected to the front surface of the first box 61. In addition, about the some exhaust pipe 72 connected to the back surface of the 1st box 61, it connects with the connection method similar to the structure demonstrated with reference to FIG. In addition, an exhaust pipe 72 provided with a valve Vbo is connected to the rear surface of the second box 62, and the gas in the box space is exhausted through the exhaust pipe 72 (shown by an arrow Bo; shown as exhaust Bo). In addition, an exhaust pipe 72 provided with a valve Vso is connected to the back surface of the third box 63, and the gas in the slider space is exhausted through the exhaust pipe 72 (shown by arrows So; shown as exhaust So).

  Next, with reference to FIG. 10 and FIG. 11, the operation | movement at the time of the coating device 1 performing a coating process is demonstrated. These operations may be performed by a control unit of the coating apparatus (for example, the control unit 3 (see FIG. 2)), or a user of the coating apparatus may perform each operation. It may be performed by a user of the coating apparatus.

  First, the insertion port 611 is opened (step S71). Next, the substrate P is carried in by the transfer robot or the like from the opened input port 611, and the substrate P is placed on the stage 21 (step S72). Then, the inlet 611 is closed (step S73), and the chamber space becomes a space shielded from the outside.

  Next, the valves Vci × n, Vsi, Vco × n, Vbo, and Vso are opened (step S74). Then, supply of nitrogen from the supply pipe 71 into the first to third boxes 61 to 63 is started, and discharge of the gas in the first to third boxes 61 to 63 to the exhaust pipe 72 is started (step S75). . And based on the oxygen concentration detection result by the oxygen concentration detection part 88, it waits until the oxygen concentration in the 1st-3rd boxes 61-63 (for example, point C) reaches below an oxygen concentration management value (step S76). ).

  Here, the nitrogen supplied from the supply Ci × n in steps S75 and S76 flows into the chamber space, and then is discharged from the discharge Co × n on the back surface of the first box 61. Further, nitrogen supplied from the supply Ci × n flows into the chamber space, and then flows into the slider space from the opening S1. Then, the nitrogen flowing into the slider space merges with the nitrogen supplied from the supply Si. The merged nitrogen is discharged from the discharge So, or flows into the box space from the opening S2 and is discharged from the discharge Bo. Therefore, in a state in which the valves Vci × n, Vsi, Vco × n, Vbo, and Vso are opened, nitrogen supplied from a plurality of locations on one side of the chamber space extends to a plurality of locations on the other side of the chamber space. A flow is formed through each of the slider spaces through S1. As described above, in a state where the valves Vci × n, Vsi, Vco × n, Vbo, and Vso are opened, the gas in the chamber space is directly supplied while supplying nitrogen to the chamber space through a plurality of supply pipes. Since the gas is discharged from the plurality of exhaust pipes, the amount of gas flowing into and out of the chamber space increases, and the rate at which the gas in the chamber space is replaced with the nitrogen atmosphere increases. That is, since the oxygen concentration at the point C shown in FIG. 4 is also rapidly reduced, the arrival time shown in FIG. 8 can be shortened.

  When the oxygen concentration in the first to third boxes 61 to 63 reaches the oxygen concentration control value or less (Yes in step S76), the valve Vco × n is closed (valves Vci × n, Vsi, Vbo, and Vso). Is kept open) (step S77). Then, a coating process is performed on the substrate P (step S78). At this time, when the control unit of the coating apparatus has acquired the detection result of the oxygen concentration from the oxygen concentration detection unit 88, the control unit uses the detection result so that the oxygen concentration at point C is equal to or lower than the oxygen concentration management value. It can be determined whether or not. When the control unit determines that the oxygen concentration management value is less than or equal to, the control unit closes the valve Vco × n. On the other hand, when the oxygen concentration detection unit 88 displays the detection result of the oxygen concentration on the display device to notify the user of the coating device, the notified user closes the valve Vco × n. As described above, the determination of reaching the oxygen concentration management value and the closing of the valve Vco × n may be automatically performed by the control unit of the coating apparatus, or may be performed by the user of the coating apparatus.

  Here, the nitrogen supplied from the supply Ci × n in step S78 flows into the chamber space, and then flows into the slider space from the opening S1. The nitrogen flowing into the slider space merges with the nitrogen supplied from the supply Si. The merged nitrogen is discharged from the discharge So, or flows into the box space from the opening S2 and is discharged from the discharge Bo. Therefore, when the valve Vco × n is closed and the valves Vci × n, Vsi, Vbo, and Vso are opened, the nitrogen supplied from one side of the chamber space flows through the opening S1 to the slider space. It is formed to be strengthened. That is, even if the gas in the slider space is agitated by the reciprocating movement of the nozzle unit 50, the gas flow in the chamber space → the opening S1 → the slider space is formed, so the gas in the slider space flows out into the chamber space. The gas does not flow in the direction from the opening S1 to the point C. Therefore, even if oxygen remains in the slider space, it is possible to prevent oxygen from flowing out into the chamber space (point C), and to increase the oxygen concentration during the coating treatment time shown in FIG. Can be prevented.

  Next, when the coating process on the substrate P is completed (Yes in step S79), the supply of nitrogen from the supply pipe 71 is stopped, and the discharge of gas to the exhaust pipe 72 is stopped (step S80). Next, the loading port 611 is opened (step S81), and the substrate P after the coating process placed on the stage 21 is unloaded from the opened loading port 611 by a transfer robot or the like (step S82). When the coating process is continued (Yes in step S83), the process returns to step S72 and the operation is repeated. On the other hand, when the coating process is terminated (No in step S83), the operation according to the flowchart is terminated.

  As described above, the connection mode excellent in the effect of shortening the arrival time from when the substrate P is loaded until the oxygen concentration at the point C decreases below the oxygen concentration control value, and the oxygen at the point C during the coating processing time. There is a connection mode excellent in the effect of stabilizing the concentration. Specifically, in order to increase the former effect, it is required to exhaust directly from the chamber space, and in order to increase the latter effect, gas from the chamber space to the slider space (box space) through the opening S1. It is required to positively form a flow or to prevent a gas flow from the opening S1 to the point C. Therefore, in the operation described above, a plurality of connection modes are used in combination in order to achieve both of these effects.

  As described above, the coating apparatus according to the first embodiment is locally applied to the coating space including the space in which the nozzle discharges the coating liquid and the space to which the substrate to which the coating liquid is applied (application site) is sent. Nitrogen is supplied to the substrate, and the coating solution is applied in a low-oxygen atmosphere to prevent the coating solution from being oxidized in the coating process. Therefore, since the limited space is replaced with a low oxygen atmosphere, consumption of nitrogen or the like supplied for the replacement can be suppressed. In addition, the coating apparatus has a connection mode excellent in the effect of shortening the arrival time from when the substrate P is carried in until the oxygen concentration at the point C falls below the oxygen concentration control value, and the point C during the coating processing time. By switching the connection mode that is excellent in the effect of stabilizing the oxygen concentration, both effects can be achieved.

(Second Embodiment)
Hereinafter, with reference to FIGS. 12-14, the coating device 1 which concerns on the 2nd Embodiment of this invention is demonstrated. FIG. 12 is a side sectional view showing a schematic configuration of a local atmosphere generating mechanism provided in the coating apparatus 1 according to the second embodiment. FIG. 13 is a perspective view showing a schematic structure of the back-side gas supply unit 75. FIG. 14 is a schematic diagram showing a nitrogen flow flow in the coating apparatus 1. In FIG. 14, for simplicity of explanation, only the first to third boxes 61 to 63, the back side gas supply unit 75, the chamber space, the box space, and the chamber space are illustrated and simplified for the coating apparatus 1. It has become. In addition, 2nd Embodiment is the back side of the point C by further providing the supply system which supplies gas to the back side gas supply part 75 and its back side gas supply part 75 with respect to 1st Embodiment. This is a mode in which the gas flow from the gas to the opening S1 is positively formed to stabilize the oxygen concentration at the point C. Since the other components in the second embodiment are the same as those in the first embodiment described above, the same components are denoted by the same reference numerals and detailed description thereof is omitted.

  In FIG. 12, the back side gas supply unit 75 is fixed inside the first box 61. And the supply pipe 71e which supplies nitrogen is connected to the back side gas supply part 75 similarly to the other supply pipes 71a-71d. The back side gas supply unit 75 is located at a position close to the top surface of the stage 21 on which the substrate P is placed when the substrate placing apparatus 2 moves to the Y axis positive direction side in the figure along with the coating process (state of FIG. 12). It is fixed.

  As shown in FIG. 13, the back side gas supply unit 75 includes a casing 751, a diffusion plate 752, and a punching metal 753. Note that FIG. 13 shows the internal structure of the housing 751 with the top surface omitted. The housing 751 is a hollow long body extending in the X-axis direction inside the upper surface of the first box 61, and a part thereof is made of a punching metal 753. Then, at least one supply pipe 71e (three in FIG. 13) is connected to the casing 751, and nitrogen is supplied into the casing 751 from the supply pipe 71e. The diffusion plate 752 is a plate-like member fixed at a position that prevents nitrogen flowing into the housing 751 from the supply pipe 71e, and a predetermined gap is formed around it. Nitrogen flowing into the housing 751 from the supply pipe 71e is blocked by the diffusion plate 752 and does not flow directly into the housing 751, but flows in the direction of flowing around the diffusion plate 752. The punching metal 753 is a plate-like member in which a large number of holes are punched, and forms the side surface of the casing 751 on the Y axis negative direction side (that is, the front surface side).

  The long dimension of the casing 751 (that is, the long width of the punching metal 753) is configured to be equal to or larger than the width of the stage 21 in the X-axis direction. Further, the height dimension of the casing 751 (that is, the short width of the punching metal 753) is configured to be greater than or equal to the gap between the stage 21 and the upper surface of the first box 61 at the point C. Therefore, the nitrogen supplied to the inside of the housing 751 passes through the hole formed in the punching metal 732 by fixing the back side gas supply unit 75 to the upper surface inside the first box 61 close to the upper surface of the stage 21. The point C flows in the negative Y-axis direction. For example, as shown in FIG. 12, when the substrate platform 2 moves to the Y axis positive direction side in the figure along with the coating process, nitrogen supplied from the back side gas supply unit 75 is placed on the stage 21. It flows to the opening S1 side along the upper surface of the applied substrate P. Further, even if the substrate platform 2 is not moved to the Y axis positive direction side, the nitrogen supplied from the back side gas supply unit 75 flows from the back side through the point C to the opening S1 side. That is, the nitrogen supplied from the back side gas supply unit 75 is locally supplied to the point C in the chamber space and forms a flow toward the opening S1.

  In FIG. 14, a supply pipe 71 is connected to the backside gas supply section 75, and nitrogen is supplied to the chamber space via the supply pipe 71 (shown as arrow Cir; supply Cir). A valve Vcir (referred to as valve Vcir) is provided in the supply pipe 71 connected to the back side gas supply unit 75. For example, the supply Ccir corresponds to the supply pipe 71e shown in FIG. The other supply and exhaust are the same as those in the first embodiment described with reference to FIG.

  Next, an operation when the coating apparatus 1 according to the second embodiment performs a coating process will be described. First, similarly to the first embodiment, the substrate P is carried in from the insertion port 611 and the substrate P is placed on the stage 21. Then, the inlet 611 is closed, and the chamber space is a space shielded from the outside.

  Next, the valves Vci × n, Vsi, Vcir, Vco × n, Vbo, and Vso are opened. Then, supply of nitrogen from the supply pipe 71 into the first to third boxes 61 to 63 is started, and discharge of gas in the first to third boxes 61 to 63 to the exhaust pipe 72 is started. At this time, nitrogen is also locally supplied from the back side gas supply unit 75 to the point C (supply Cir). And based on the oxygen concentration detection result by the oxygen concentration detection part 88, it waits for the oxygen concentration in the 1st-3rd boxes 61-63 (for example, point C) to reach below an oxygen concentration management value.

  Here, the nitrogen supplied from the supply Ci × n flows into the chamber space, and then merges with the nitrogen supplied from the supply Cir. And the nitrogen which merged in the chamber space is discharged | emitted from discharge | emission Coxn in the back surface of the 1st box 61. FIG. Further, the nitrogen merged in the chamber space flows into the slider space from the opening S1. Then, the nitrogen flowing into the slider space merges with the nitrogen supplied from the supply Si. Nitrogen merged in the slider space is discharged from the discharge So, or flows into the box space from the opening S2 and is discharged from the discharge Bo. Therefore, in a state in which the valves Vci × n, Vsi, Vcir, Vco × n, Vbo, and Vso are opened, nitrogen supplied from a plurality of locations on the front side and the back side of the chamber space is supplied to the back side of the chamber space. A flow is formed to escape to the slider space through a plurality of locations and through the opening S1. As described above, in a state where the valves Vci × n, Vsi, Vcir, Vco × n, Vbo, and Vso are opened, nitrogen is supplied to the chamber space through a plurality of supply pipes while directly in the chamber space. Since the gas is discharged from the plurality of exhaust pipes, the amount of gas flowing into / out of the chamber space increases, and the rate at which the gas in the chamber space is replaced with the nitrogen atmosphere increases. That is, since the oxygen concentration at point C shown in FIG. 12 is also rapidly reduced, the arrival time shown in FIG. 8 can be shortened.

  When the oxygen concentration in the first to third boxes 61 to 63 reaches the oxygen concentration control value or less, the valve Vco × n is closed (valves Vci × n, Vsi, Vci, Vbo, and Vso are opened). Continue). Then, a coating process is performed on the substrate P. At this time, similarly to the above-described first embodiment, when the control unit of the coating apparatus acquires the detection result of the oxygen concentration from the oxygen concentration detection unit 88, the control unit uses the detection result. It can be determined whether or not the oxygen concentration at point C is equal to or lower than the oxygen concentration management value. When the control unit determines that the oxygen concentration management value is less than or equal to, the control unit closes the valve Vco × n. On the other hand, when the oxygen concentration detection unit 88 displays the detection result of the oxygen concentration on the display device to notify the user of the coating device, the notified user closes the valve Vco × n. As described above, the determination of reaching the oxygen concentration management value and the closing of the valve Vco × n may be automatically performed by the control unit of the coating apparatus, or may be performed by the user of the coating apparatus.

  Here, the nitrogen supplied from the supply Ci × n flows into the chamber space, and then flows into the slider space from the opening S1. Further, the nitrogen supplied from the supply Cir flows through the point C of the chamber space and then flows into the slider space from the opening S1. The nitrogen flowing into the slider space merges with the nitrogen supplied from the supply Si. The merged nitrogen is discharged from the discharge So, or flows into the box space from the opening S2 and is discharged from the discharge Bo. Therefore, when the valve Vco × n is closed and the valves Vci × n, Vsi, Vcir, Vbo, and Vso are opened, the nitrogen supplied from the supply Ci × n flows through the opening S1 into the slider space. Is strengthened and formed. A flow is also formed in which nitrogen supplied from the supply Cir passes through the opening S1 from the point C to the slider space. That is, even if the gas in the slider space is agitated by the reciprocating movement of the nozzle unit 50, the gas flow in the chamber space → the opening S1 → the slider space is formed, so the gas in the slider space flows out into the chamber space. There are few things. Even when the gas in the slider space flows out into the chamber space, the flow of nitrogen from the point C toward the opening S1 is formed, so that the gas from the slider space moves toward the front of the chamber space, that is, before coating. It flows in the direction in which the substrate P is placed. Therefore, even if oxygen remains in the slider space, it is possible to prevent oxygen from flowing out to the point C, and to prevent the oxygen concentration during the coating treatment time shown in FIG. 8 from increasing. it can. That is, it is possible to prevent the coating liquid after coating on the substrate P from being oxidized.

  Thus, in the second embodiment, in addition to the effects in the first embodiment, it is possible to prevent an increase in the oxygen concentration at point C during the coating process. In the above-described operation, nitrogen is always supplied from the backside gas supply unit 75, but nitrogen may be supplied from the backside gas supply unit 75 only during a part of the coating operation. As long as nitrogen is supplied to the point C from the back side gas supply unit 75 at least during the coating process on the substrate P, the valve Vcir may be closed in another period.

  Further, as shown in FIG. 15, further exhaust may be provided near the bottom surface of the first box 61. In FIG. 15, an exhaust pipe 72 is further connected in the vicinity of the bottom on the front side of the first box 61, and the gas in the chamber space is exhausted through the exhaust pipe 72 (shown as arrow Cou, exhausted Cou). A valve Vcou (referred to as a valve Vcou) is provided in the exhaust pipe 72 connected to the vicinity of the bottom on the front side of the first box 61.

  When the valves Vci × n, Vsi, Vcir, Vco × n, Vcou, Vbo, and Vso are opened before the coating process, the nitrogen supplied from the supply Ci × n flows into the chamber space and is supplied from the supply Cir. After being merged with the discharged nitrogen, it is discharged from the discharged Co × n and the discharged Cou at the back of the first box 61. Further, the nitrogen merged in the chamber space flows into the slider space from the opening S1. Then, the nitrogen flowing into the slider space merges with the nitrogen supplied from the supply Si. Nitrogen merged in the slider space is discharged from the discharge So, or flows into the box space from the opening S2 and is discharged from the discharge Bo. Therefore, a flow is formed in which the gas in the chamber space is discharged from the discharge Cou provided at the bottom of the chamber space before the coating process. Thereby, in addition to the above-described effects, dust falling into the chamber space can be discharged out of the chamber space, and an effect as a countermeasure against dust in the chamber space can be expected.

  On the other hand, when the valve Vco × n was closed and the valves Vci × n, Vsi, Vcir, Vcou, Vbo, and Vso were opened during the coating process, the nitrogen supplied from the supply Ci × n flowed into the chamber space. After that, it flows into the slider space from the opening S1 or is discharged from the discharge Cou. Further, the nitrogen supplied from the supply Cir flows through the point C of the chamber space and then flows into the slider space from the opening S1. The nitrogen flowing into the slider space merges with the nitrogen supplied from the supply Si. The merged nitrogen is discharged from the discharge So, or flows into the box space from the opening S2 and is discharged from the discharge Bo. Therefore, when the valve Vco × n is closed and the valves Vci × n, Vsi, Vcir, Vcou, Vbo, and Vso are opened, a flow is formed in which the nitrogen supplied from the supply Ci × n is discharged from the discharge Cou. However, the flow through the opening S1 to the slider space is strengthened and formed before the coating process. A flow is also formed in which nitrogen supplied from the supply Cir passes through the opening S1 from the point C to the slider space. Even if the discharge Cou is provided, the gas flow in the chamber space → the opening S1 → the slider space is formed, so that the gas in the slider space hardly flows out to the chamber space. Even when the gas in the slider space flows out into the chamber space, a nitrogen flow from the point C toward the opening S1 is formed, and the outflowed gas flows forward in the chamber space and is discharged from the discharge cou. That is, since the gas flowing out from the slider space does not flow into the space where the coating liquid is present during the coating process and after the coating process (the chamber space on the Y axis positive direction side from the opening S1), the gas from the slider space does not flow. It flows in the front direction of the chamber space, that is, the direction in which the substrate P before coating is placed. Therefore, even if oxygen remains in the slider space, it is possible to prevent oxygen from flowing out to the point C, and to prevent the oxygen concentration during the coating treatment time shown in FIG. 8 from increasing. it can. That is, it is possible to prevent the coating liquid after coating on the substrate P from being oxidized. Further, even during the coating process, a flow is formed in which the gas in the chamber space is discharged from the discharge Cou provided at the bottom of the chamber space, so that dust that falls into the chamber space during the coating process is removed from the chamber. It can be discharged out of the space, and an effect as a countermeasure against dust in the chamber space can be expected.

  Note that there may be a plurality of supply pipes and exhaust pipes (that is, supply Si, discharge So, and discharge Bo) provided in the box space and slider space in the first and second embodiments described above. In addition, the supply pipe and the exhaust pipe (that is, supply Ci × n and discharge Co × n) provided in the chamber space may each be a single pipe. If the fluid balance as described above is adjusted, the effects of the present invention can be obtained with a single pipe or a plurality of pipes.

  Further, the supply pipe (that is, supply Si) provided in the slider space in the first and second embodiments described above may not be provided. When there is no supply Si, only nitrogen that merges in the slider space disappears, and it goes without saying that the same effect can be obtained by adjusting the fluid balance described above.

  Further, the third box 63, the discharge So, and the supply Si in the first and second embodiments described above may be omitted. That is, the organic EL application mechanism 5 is installed in a box space surrounded by the second box 62. In this case, before the coating process, the nitrogen supplied to the chamber space is discharged from the discharge Co × n or flows from the opening S1 to the box space and discharged from the discharge Bo. During the coating process, the nitrogen supplied to the chamber space flows from the opening S1 to the box space and is discharged from the discharge Bo. That is, even if the third box 63, the discharge So, and the supply Si are not provided, a flow is formed in which nitrogen supplied to the chamber space passes through the opening S1 and flows into the box space. That is, even if the gas in the box space is agitated by the reciprocating movement of the nozzle unit 50, the gas flow in the chamber space → the opening S1 → the box space is formed, so that the gas in the box space flows out into the chamber space. There are few things. Therefore, even if oxygen remains in the box space, oxygen can be prevented from flowing out into the chamber space.

  In the operation of step S76 and the like, the procedure for waiting for the oxygen concentration detection result by the oxygen concentration detection unit 88 to be equal to or lower than the oxygen concentration management value and then starting the coating process is shown. The coating process may be started with. For example, the relationship between the flow rate or pressure of nitrogen supplied to the coating apparatus and the arrival time (see FIG. 8) at which the point C is equal to or lower than the oxygen concentration control value is previously investigated. Then, the oxygen concentration management at the point C may be performed using the flow rate or pressure of nitrogen actually supplied and the supply time. In this case, the coating process is started after waiting for a predetermined time (arrival time) to elapse after starting the supply of nitrogen.

  Further, when the nozzle unit 50 is provided with a static pressure bearing, an inert gas such as nitrogen may be supplied to the static pressure bearing. As a result, oxygen is not contained in the gas supplied to constitute the hydrostatic bearing, so that the oxygen concentration in the slider space can be further reduced.

  In the above-described embodiment, red, green, and blue red organic EL materials are poured into the groove of the substrate P by a set of three nozzles 52a to 52c. This is an intermediate process for manufacturing an EL display device. The processing procedure when manufacturing an organic EL display device is as follows: hole transport material (PEDOT) coating → drying → red organic EL material coating → drying → green organic EL material coating → drying → blue organic EL material coating → drying It becomes the procedure. In this case, the coating apparatus of the present invention can be used in a step of coating a hole transport material, a red organic EL material, a green organic EL material, and a blue organic EL material, respectively.

  Further, red, green, and blue organic EL materials may be discharged from the nozzles 52a to 52c, respectively. In this case, a so-called stripe arrangement arranged in the order of red, green, and blue is formed in one coating process. In the above-described embodiment, the organic EL material is poured into each groove of the substrate P by one set of three nozzles 52a to 52c, but a plurality of sets of three sets of nozzles 52a to 52c are provided. An organic EL material may be poured into each groove of P.

  In the above-described embodiment, the manufacturing apparatus of an organic EL display device using an organic EL material or a hole transport material as a coating liquid has been described as an example. However, the present invention can also be applied to other coating apparatuses. . For example, the present invention can be applied to an apparatus for applying a fluorescent material used to manufacture a resist solution, a SOG (Spin On Glass) solution, or a PDP (plasma display panel). Further, the present invention can also be applied to an apparatus for applying a color material used for manufacturing a color filter configured in a liquid crystal cell in order to perform color display on a liquid crystal color display.

  The coating method and the coating apparatus according to the present invention can prevent the coating liquid from being oxidized when the coating liquid is applied to the substrate, and are useful as an apparatus and a method for discharging various coating liquids from nozzles.

The top view and front view which show the principal part schematic structure of the coating device 1 which concerns on one Embodiment of this invention. The block diagram which shows the control function and supply part of the coating device 1 of FIG. The top view which shows schematic structure of the local atmosphere production | generation mechanism provided in the coating device 1 of FIG. 1 is a side sectional view showing a schematic configuration of a local atmosphere generating mechanism provided in the coating apparatus 1 of FIG. The perspective view which shows the external appearance of the 3rd box 63 Sectional view showing the structure of the nitrogen inlet The perspective view which shows the structure of the diffusion plate 731 Graph for explaining oxygen concentration management value at point C Block diagram showing the flow of nitrogen supply in the local atmosphere generation mechanism The schematic diagram which shows the nitrogen flow flow in the coating device 1 which concerns on the 1st Embodiment of this invention. The flowchart which shows the operation | movement at the time of the coating device 1 performing a coating process. Side sectional view which shows schematic structure of the local atmosphere production | generation mechanism provided in the coating device 1 which concerns on the 2nd Embodiment of this invention. The perspective view which shows schematic structure of the back side gas supply part 75 of FIG. Schematic diagram showing the nitrogen flow in the coating apparatus 1 of FIG. The schematic diagram which shows the modification of the nitrogen flow flow in the coating device 1 of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Coating apparatus 2 ... Substrate mounting apparatus 21 ... Stage 22 ... Turning part 23 ... Parallel movement table 24 ... Guide receiving part 25, 511 ... Guide member 3 ... Control part 5 ... Organic EL coating mechanism 50 ... Nozzle unit 51 ... Nozzle Moving mechanism parts 52a, 52b, 52c ... Nozzle 521 ... Filter part 53 ... Liquid receiving part 54 ... Supply part 541 ... Supply source 542 ... Pump 543 ... Flow meter 61 ... First box 611 ... Inlet 62 ... Second box 63 ... Third box 64 ... partition plate 71 ... supply pipe 72 ... exhaust pipe 73 ... diffusion parts 731, 752 ... diffusion plates 732, 733, 753 ... punching metal 75 ... back side gas supply part 751 ... casing 81 ... nitrogen cylinder 83 ... Filter 84 ... Pressure adjustment unit 85, 86 ... Flow rate adjustment unit 87 ... Suction unit 88 ... Oxygen concentration detection unit

Claims (10)

A coating apparatus for coating a coating liquid on a substrate,
A nozzle for discharging the coating liquid from the tip,
A stage for placing the substrate on its upper surface;
A nozzle moving mechanism for reciprocally moving the nozzle in a direction across the stage surface in the space on the stage;
Surrounding the stage, partitioning the space in which the nozzle moving mechanism is arranged and the space in which the stage is arranged, and at least a part of the nozzle projects from the nozzle moving mechanism side on the upper surface to reciprocate. A first box in which an opening is formed;
A second box that surrounds the nozzle moving mechanism and is provided on top of the first box;
A first supply port provided in the first box for supplying a predetermined gas to the internal space of the first box;
A first exhaust port provided in the first box for exhausting gas in the internal space of the first box to the outside;
A second exhaust port provided in the second box for discharging the gas in the internal space of the second box to the outside;
Until the predetermined space in the first box reaches a predetermined oxygen concentration, the gas supplied from the first supply port is discharged from the first and second exhaust ports,
A coating apparatus that discharges gas supplied from the first supply port from the second exhaust port when the predetermined space reaches a predetermined oxygen concentration. Oxygen concentration detection means for detecting the oxygen concentration in a predetermined space in the first box;
A first valve provided at the first exhaust port;
When the oxygen concentration detected by the oxygen concentration detection means does not reach the predetermined oxygen concentration, the first valve is opened, and when the oxygen concentration detected by the oxygen concentration detection means reaches the predetermined oxygen concentration The coating apparatus according to claim 1, further comprising control means for closing the first valve.   2. The coating apparatus according to claim 1, further comprising a control unit configured to start a reciprocating movement of the nozzle by the nozzle moving mechanism to perform a coating process on the substrate when the predetermined space reaches a predetermined oxygen concentration.   The coating apparatus according to claim 1, wherein the predetermined space is a space on the stage in the first box. A relative movement mechanism for relatively moving at least one of the nozzle and the stage in a direction parallel to the mounting surface of the stage;
In the first box, the space in which the nozzle discharges the coating liquid and the application portion of the substrate to which the coating liquid has been applied are relatively moved in accordance with the relative movement of the stage by the relative movement mechanism. The coating apparatus according to claim 4, which is a space on the stage.   A second supply port fixed in the first box and configured to supply the predetermined gas to the predetermined space and form a flow of the gas in the direction toward the opening through the predetermined space; The coating apparatus of Claim 5 provided. The first box is provided so as to surround a space where the stage places the substrate and relatively moves,
The coating apparatus further includes a third exhaust port that is provided at a bottom portion of the first box and the stage is provided at a rear position of the relative movement, and discharges gas in the internal space of the first box to the outside. The coating apparatus of Claim 5 provided.   The coating apparatus according to claim 1, wherein a plurality of the first supply ports and the first exhaust ports are provided for the first box. A coating method in which a coating liquid discharged from a nozzle that is reciprocated and supported by a nozzle moving mechanism in a direction crossing the stage surface is applied to a substrate placed on the top surface of the stage,
A predetermined gas is supplied from one side of the predetermined space until the predetermined space reaches a predetermined oxygen concentration, and from the other side of the predetermined space and the upper part of the stage through the space where the nozzle and the nozzle moving mechanism are arranged. Each exhausts gas,
When the predetermined space reaches a predetermined oxygen concentration, the predetermined gas is supplied from one side of the predetermined space, and the gas is discharged from the upper part of the stage through the space where the nozzle and the nozzle moving mechanism are arranged. A coating method in which the coating solution is coated on the substrate. The predetermined space is included in a space in the chamber,
The chamber has an opening for the nozzle to protrude from the outside of the chamber into the predetermined space,
The predetermined gas is supplied from one side of the chamber until the predetermined space reaches a predetermined oxygen concentration, and the gas in the chamber is discharged from the other side of the chamber and the opening, respectively.
When the predetermined space reaches a predetermined oxygen concentration, the predetermined gas is supplied from one side of the chamber, and the coating liquid is applied to the substrate in a state where the gas in the chamber is discharged from the opening. Item 10. The coating method according to Item 9.

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